JP3502467B2 - Exhaust gas treatment tank - Google Patents
Exhaust gas treatment tankInfo
- Publication number
- JP3502467B2 JP3502467B2 JP02765595A JP2765595A JP3502467B2 JP 3502467 B2 JP3502467 B2 JP 3502467B2 JP 02765595 A JP02765595 A JP 02765595A JP 2765595 A JP2765595 A JP 2765595A JP 3502467 B2 JP3502467 B2 JP 3502467B2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- strip
- treatment tank
- shaped opening
- riser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、排ガス処理槽に関し、
更に詳細には槽内に吸収液を収容し、槽に導入した排ガ
ス中の有害物質を吸収液によって接触、除去するように
した排ガス処理槽、特にジョットバブリング反応槽とし
て最適な排ガス処理槽に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust gas treatment tank,
More specifically, the present invention relates to an exhaust gas treatment tank in which an absorbent is contained in the tank, and harmful substances in the exhaust gas introduced into the tank are brought into contact with and removed by the absorbent, particularly an exhaust gas treatment tank most suitable as a jot bubbling reaction tank. Is.
【0002】[0002]
【従来の技術】排ガスから亜硫酸ガス、ダスト等の環境
汚染物質を除去するために、湿式排煙脱硫法が多用され
ている。湿式排煙脱硫法とは、排ガスと固定剤スラリと
を気液接触反応させ、亜硫酸ガスを硫酸塩として固定
化、除去する方法である。使用される固定剤スラリは、
亜硫酸ガスを硫酸塩として固定する固定剤、例えば石灰
石を水に溶解及び/又は懸濁させたスラリ状水溶液であ
る。なかでも、排ガスと、槽内に収容した固定剤スラリ
とを気液接触させて、排ガス中の環境汚染物質を除去す
る排ガス処理槽として、ジェットバブリング反応槽を使
用した湿式排煙脱硫装置は、環境汚染物質の除去率が高
くかつ経済的にも優れた装置として広く採用されてい
る。排ガス中の亜硫酸ガスを除去する場合を例にして、
湿式排煙脱硫装置に使用されている従来のジョットバブ
リング反応槽の構成を以下に説明する。ジェットバブリ
ング反応槽は、典型的には例えば特公昭55−3729
5号公報の第1図及び特公平3−70532号公報の第
1図に示すように、亜硫酸ガス等の環境汚染物質を固定
する固定剤スラリを槽内下部に収容し、亜硫酸ガスを含
む排ガスを固定剤スラリ中に分散導入してジェットバブ
リング層を形成しつつ固定剤と反応させて亜硫酸ガスを
硫酸塩として固定する気液接触式の反応槽である。2. Description of the Related Art Wet flue gas desulfurization is widely used to remove sulfur dioxide, dust and other environmental pollutants from exhaust gas. The wet flue gas desulfurization method is a method in which an exhaust gas and a fixative slurry are subjected to a gas-liquid contact reaction to fix and remove sulfurous acid gas as a sulfate. The fixative slurry used is
A fixing agent that fixes sulfurous acid gas as a sulfate, for example, a slurry-like aqueous solution in which limestone is dissolved and / or suspended in water. Among them, a wet flue gas desulfurization device using a jet bubbling reaction tank as an exhaust gas treatment tank for removing the environmental pollutants in the exhaust gas by bringing the exhaust gas and the fixative slurry contained in the tank into gas-liquid contact, It is widely used as a device that has a high removal rate of environmental pollutants and is economically superior. Taking the case of removing the sulfurous acid gas in the exhaust gas as an example,
The structure of a conventional Jott bubbling reaction tank used in a wet flue gas desulfurization apparatus will be described below. A jet bubbling reaction tank is typically, for example, Japanese Patent Publication No. 55-3729.
As shown in FIG. 1 of Japanese Patent Publication No. 5 and FIG. 1 of Japanese Patent Publication No. 3-70532, a fixative slurry for fixing environmental pollutants such as sulfurous acid gas is contained in the lower part of the tank, and exhaust gas containing sulfurous acid gas is contained. Is a gas-liquid contact type reaction tank in which sulfur dioxide is fixed as a sulfate by reacting with a fixative while forming a jet bubbling layer by dispersing and introducing the fixative into a fixative slurry.
【0003】更に、図5を参照しつつ、固定剤として石
灰石を使用し、排ガス中の亜硫酸ガスを除去するジェッ
トバブリング反応槽(以下、簡単に反応槽と略称する)
10を説明する。図5に示すように、反応槽10は、上
から順に排ガス出口室12と、槽体を横断するように設
けられた排ガス入口室14と、石灰石を含む吸収液を収
容する下部空間とに区画されている。排ガス出口室12
と排ガス入口室14とは、槽体を横断して水平に伸びる
第1隔板16によって仕切られ、排ガス入口室14と下
部空間とは、第1隔板16に平行に伸びる第2隔板18
によって仕切られている。第2隔板18は、吸収液層2
0の液面より上方に位置し、その間に排ガス流出用の空
間部22を形成している。排ガス出口室12は出口ダク
ト24に接続し、その下の排ガス入口室14は入口ダク
ト26に接続している。また、処理排ガスを空間部22
から排ガス出口室12に流入させるガスライザとして、
複数本のパイプ状の連通管28(図5では、簡単に1本
のみ図示)が排ガス入口室14を貫通して、空間部22
と排ガス出口室12とを連通させている。Further, referring to FIG. 5, a jet bubbling reaction tank (hereinafter simply referred to as a reaction tank) which uses limestone as a fixing agent and removes sulfurous acid gas in exhaust gas.
10 will be described. As shown in FIG. 5, the reaction tank 10 is divided into an exhaust gas outlet chamber 12, an exhaust gas inlet chamber 14 provided so as to cross the tank body, and a lower space for accommodating an absorbing liquid containing limestone in order from the top. Has been done. Exhaust gas outlet chamber 12
The exhaust gas inlet chamber 14 and the exhaust gas inlet chamber 14 are partitioned by a first partition plate 16 extending horizontally across the tank body, and the exhaust gas inlet chamber 14 and the lower space are separated by a second partition plate 18 extending parallel to the first partition plate 16.
It is partitioned by. The second partition plate 18 is the absorption liquid layer 2
It is located above the liquid level of 0 and forms a space portion 22 for flowing out the exhaust gas therebetween. The exhaust gas outlet chamber 12 is connected to the outlet duct 24, and the exhaust gas inlet chamber 14 therebelow is connected to the inlet duct 26. Further, the treated exhaust gas is supplied to the space 22.
As a gas riser to flow into the exhaust gas outlet chamber 12 from
A plurality of pipe-like communication pipes 28 (only one is shown in FIG. 5 for simplicity) penetrates through the exhaust gas inlet chamber 14 to form a space 22.
And the exhaust gas outlet chamber 12 are communicated with each other.
【0004】排ガス分散管30は、上端部で排ガス入口
室14に連通し、下端部でスラリ20に浸漬するように
排ガス入口室14の第2隔板18から下方に下降してい
る。その下端部には多数の小さな開口が設けてあり、排
ガスはそれら開口から吸収液層20中に分散して、ジェ
ットバブリング層Aを形成する。ジェットバブリング層
Aは、排ガスの気泡と石灰石を含む吸収液とからなる液
相連続の気液接触層である。反応槽10の下部は、吸収
液層20を収容するようになっており、槽下部には吸収
液を攪拌するための攪拌機32と、亜硫酸ガスの石膏固
定化に必要な酸素を供給するための酸素含有ガス、例え
ば空気を噴出する噴出ノズルを備えた空気供給管34と
が設けられている。攪拌機32は、その回転軸36が槽
上の駆動装置38から連通管28の一本を経由して下方
に延びている。図5中、40はスラリ供給管、42は反
応により生じた石膏スラリの排出管である。The exhaust gas dispersion pipe 30 communicates with the exhaust gas inlet chamber 14 at the upper end and descends downward from the second partition plate 18 of the exhaust gas inlet chamber 14 so as to be immersed in the slurry 20 at the lower end. A large number of small openings are provided at the lower end thereof, and the exhaust gas is dispersed in the absorbing liquid layer 20 through these openings to form a jet bubbling layer A. The jet bubbling layer A is a liquid-phase continuous gas-liquid contact layer composed of bubbles of exhaust gas and an absorbing liquid containing limestone. The lower part of the reaction tank 10 is adapted to accommodate the absorbing liquid layer 20, and the lower part of the tank is provided with a stirrer 32 for stirring the absorbing liquid, and for supplying oxygen necessary for immobilizing gypsum of sulfurous acid gas. An air supply pipe 34 having a jet nozzle for jetting an oxygen-containing gas such as air is provided. The stirrer 32 has a rotary shaft 36 extending downward from a drive device 38 on the tank via one of the communication pipes 28. In FIG. 5, 40 is a slurry supply pipe, and 42 is a gypsum slurry discharge pipe produced by the reaction.
【0005】以下に、反応槽10の運転を説明する。図
5において、反応槽10の下部には、亜硫酸ガスと反応
して、石膏に固定化する石灰石粉末を水に溶解及び/又
は懸濁させたスラリが吸収液として収容されている。排
ガスは、入口ダクト26から排ガス入口室14を経由し
て排ガス分散管30の開口より吸収液の液面下に導入さ
れ、ジェット状に噴出してバブリングしながら上昇す
る。これにより、所謂ジェットバブリング層Aが液面下
に生成される。亜硫酸ガスは、水、酸素、石灰石と反応
して石膏となって除去され、生じた石膏はスラリ化す
る。The operation of the reaction tank 10 will be described below. In the lower part of the reaction tank 10 in FIG. 5, a slurry obtained by dissolving and / or suspending limestone powder that reacts with sulfurous acid gas and is immobilized on gypsum in water is stored as an absorption liquid. Exhaust gas is introduced from the inlet duct 26 through the exhaust gas inlet chamber 14 through the opening of the exhaust gas dispersion pipe 30 to below the liquid surface of the absorbing liquid, and jets out in a jet form to rise while bubbling. As a result, the so-called jet bubbling layer A is generated below the liquid surface. Sulfurous acid gas reacts with water, oxygen and limestone to form gypsum and is removed, and the resulting gypsum is slurried.
【0006】亜硫酸ガスを除去された排ガスは、連通管
28及び排ガス出口室12を経て出口ダクト24により
系外に排出される。一方、晶析した石膏を濃厚に含有す
るスラリは、排出管42より排出される。また、排出管
42より抜き出されたスラリに見合う量の石灰石スラリ
がスラリ供給管40より連続的に反応槽10に補給され
る。The exhaust gas from which the sulfurous acid gas has been removed is discharged to the outside of the system through the communication pipe 28 and the exhaust gas outlet chamber 12 by the outlet duct 24. On the other hand, the slurry containing the crystallized gypsum in a concentrated manner is discharged from the discharge pipe 42. Further, an amount of limestone slurry commensurate with the slurry extracted from the discharge pipe 42 is continuously supplied to the reaction tank 10 from the slurry supply pipe 40.
【0007】[0007]
【発明が解決しようとする課題】ところで、従来の反応
槽では、ジョットバブリング層上の空間と排ガス出口室
とを連通させて、ジョットバブリング層から上昇した処
理排ガスを排ガス出口室に流出させるガスライザは、排
ガス入口室を貫通する多数のパイプ状の連通管で構成さ
れている。パイプ状の連通管は、内径300mm〜600
mmのパイプで形成され、第2隔板の開口の周縁から上方
に第1隔板の開口の周縁まで伸びている。第2隔板で
は、多数本の連通管28と、多数本の内径50mm〜20
0mmの排ガス分散管30とが、例えば、図6に示すよう
に配列で配置されている。By the way, in the conventional reaction tank, the gas riser for communicating the space above the jot bubbling layer with the exhaust gas outlet chamber and allowing the treated exhaust gas rising from the jot bubbling layer to flow out to the exhaust gas outlet chamber is provided. It is composed of a number of pipe-shaped communicating pipes that penetrate the exhaust gas inlet chamber. The pipe-shaped communication tube has an inner diameter of 300 mm to 600
It is formed of a pipe of mm and extends upward from the peripheral edge of the opening of the second partition plate to the peripheral edge of the opening of the first partition plate. In the second partition plate, a large number of communication tubes 28 and a large number of inner diameters of 50 mm to 20
The exhaust gas dispersion pipes 30 of 0 mm are arranged in an array as shown in FIG. 6, for example.
【0008】しかし、排ガス処理量の増大と共に反応槽
が益々大型化し、それとともに槽体の横断寸法が大きく
なっている。そのため、反応槽内で処理排ガスを吸収液
上の空間から排ガス出口室に流出させる際、処理排ガス
が円滑に流出し難いと言う問題があった。処理排ガスを
円滑に流出させるには、排ガス入口室を貫通して伸びる
連通管を多数本均等に配置することが必要であるが、そ
うすると、排ガス入口室内での被処理排ガスの流れが阻
害されて、均等な分布で排ガス分散管に流入しない。更
には、連通管は現場で第1隔板及び第2隔板の開口周縁
に接合されているため、連通管の本数を増やすと、益々
現場工事の工事量が増大する。現場工事は、単位工事量
当たりの原価が工場製作に比べて格段に高いので、現場
工事量が増大すると、反応槽の建設費が嵩む。However, as the amount of exhaust gas treated increases, the reaction tank becomes larger and larger, and the transverse dimension of the tank becomes larger accordingly. Therefore, when the treated exhaust gas is caused to flow from the space above the absorbent to the exhaust gas outlet chamber in the reaction tank, there is a problem that the treated exhaust gas is difficult to smoothly flow out. In order to allow the treated exhaust gas to flow out smoothly, it is necessary to evenly arrange a number of communication pipes that extend through the exhaust gas inlet chamber, but this hinders the flow of the treated exhaust gas in the exhaust gas inlet chamber. , Even distribution does not flow into the exhaust gas dispersion pipe. Furthermore, since the communication pipe is joined to the opening peripheral edges of the first partition plate and the second partition plate on site, increasing the number of communication pipes further increases the amount of construction work on site. Since the cost per unit amount of work on site construction is much higher than that of factory production, if the amount of site construction increases, the construction cost of the reaction tank increases.
【0009】以上の状況に照らして、本発明の目的は、
大型排ガス処理槽であっても、排ガス入口室での排ガス
の流れに悪い影響を与えることなく、処理排ガスを円滑
に排ガス出口室に流出させることができるガスライザ構
造を備えた排ガス処理槽を提供することである。In view of the above situation, the object of the present invention is to
Provided is an exhaust gas treatment tank having a gas riser structure capable of smoothly flowing out the treated exhaust gas to the exhaust gas outlet chamber without adversely affecting the flow of the exhaust gas in the exhaust gas inlet chamber even in a large exhaust gas treatment tank. That is.
【0010】[0010]
【課題を解決するための手段】上記目的を達成するため
に、本発明に係る排ガス処理槽は、槽に収容した吸収液
内に排ガスを導入して気液接触させ、排ガス中の有害物
質を吸収液によって接触、除去するようにした排ガス処
理槽において、処理槽上部に上から順に配置された、排
ガスを排出する出口ダクトに連通する排ガス出口室と、
処理槽の横断方向に延びる第1隔板によって排ガス出口
室から区画され、かつ排ガスを導入する入口ダクトに連
通する排ガス入口室と、処理槽の横断方向に延びる第2
隔板によって排ガス入口室から区画された空間部とを備
え、更に排ガス入口室を貫通して空間部と排ガス出口室
とを連通する断面帯状の中空部を有するガスライザと、
排ガス入口室から空間部に下降する排ガス分散筒とを備
え、第1隔板は入口ダクトから排ガス入口室に導入され
る排ガス導入方向に沿って延びる第1帯状開口を有し、
第2隔板は第1帯状開口に対向する位置に配置された第
2帯状開口と第2帯状開口以外の領域に配列された複数
個の開口孔を有し、ガスライザは、中空部の側壁が第2
帯状開口の周縁から上方に延びて対向する第1帯状開口
の周縁に達するように設けてあり、排ガス分散筒は、開
口孔の孔縁から下方に下降して吸収液に浸漬するように
設けてあることを特徴としている。In order to achieve the above object, the exhaust gas treating tank according to the present invention introduces the exhaust gas into the absorbing liquid contained in the tank and brings them into gas-liquid contact to remove harmful substances in the exhaust gas. In the exhaust gas treatment tank to be contacted and removed by the absorbing liquid, the exhaust gas outlet chamber, which is arranged in order from the top in the treatment tank, communicates with the outlet duct for discharging the exhaust gas,
An exhaust gas inlet chamber that is partitioned from the exhaust gas outlet chamber by a first partition plate that extends in the transverse direction of the treatment tank and communicates with an inlet duct that introduces the exhaust gas, and a second exhaust gas chamber that extends in the transverse direction of the treatment tank.
A gas riser having a space portion partitioned from the exhaust gas inlet chamber by a partition plate, further having a hollow portion having a band-shaped cross section that penetrates the exhaust gas inlet chamber and communicates the space portion and the exhaust gas outlet chamber,
An exhaust gas dispersion cylinder descending from the exhaust gas inlet chamber to the space portion, the first partition plate having a first strip-shaped opening extending along the exhaust gas introduction direction introduced from the inlet duct to the exhaust gas inlet chamber,
The second partition plate has a second strip-shaped opening arranged at a position facing the first strip-shaped opening and a plurality of opening holes arranged in a region other than the second strip-shaped opening, and the gas riser has a hollow side wall. Second
The exhaust gas dispersion cylinder is provided so as to extend upward from the peripheral edge of the strip-shaped opening and reach the peripheral edge of the first strip-shaped opening that opposes, and the exhaust gas dispersion cylinder is provided so as to descend downward from the hole edge of the opening hole and be immersed in the absorbing liquid. It is characterized by being.
【0011】本発明に係る排ガス処理槽は、排ガス中か
ら亜硫酸ガス等の環境汚染物質を吸収液で接触、除去す
る処理槽である限り、限定なく適用できる。また、排ガ
ス処理槽の槽体の形状も、特に限定はなく、その横断面
が方形、円形、多角形でも良い。ガスライザの中空部断
面、即ち帯状開口は、その形状が必ずしも長方形に限ら
れることもなく、幅方向側縁が平行である必要もない。
その幅を全ての帯状開口について同じ幅にする必要もな
く、また帯状開口が必ずしも等間隔に配置される必要も
ない。帯状開口の位置及び寸法は、周りの排ガス分散筒
の本数に合わせて、その帯状開口によって排ガス出口室
に流出させる処理排ガスの流速に基づいて定められる。The exhaust gas treating tank according to the present invention can be applied without limitation as long as it is a treating tank for contacting and removing environmental pollutants such as sulfurous acid gas from the exhaust gas with an absorbing liquid. Further, the shape of the tank body of the exhaust gas treatment tank is not particularly limited, and its cross section may be rectangular, circular, or polygonal. The shape of the hollow section of the gas riser, that is, the band-shaped opening is not necessarily limited to the rectangular shape, and the widthwise side edges do not need to be parallel.
The width does not have to be the same for all the band-shaped openings, and the band-shaped openings do not necessarily have to be evenly spaced. The position and the size of the strip-shaped opening are determined according to the flow velocity of the treated exhaust gas flowing into the exhaust gas outlet chamber through the strip-shaped opening in accordance with the number of surrounding exhaust gas dispersion cylinders.
【0012】本発明の好適な実施態様は、排ガス処理槽
が、長方形及び正方形のいずれかの横断面を有する箱型
槽体で形成され、第1帯状開口及び第2帯状開口は、そ
れぞれの形状が同一であって、かつ幅方向側縁が相互に
平行であってかつ槽体を横断する一方向に延在し、ガス
ライザは第1帯状開口及び第2帯状開口と同じ形状の中
空部断面を備え、更に、前記幅方向側縁の延在方向と同
じ流れ方向で排ガス入口室に排ガスを導入するように入
口ダクトが設けられていることを特徴としている。In a preferred embodiment of the present invention, the exhaust gas treatment tank is formed of a box-shaped tank body having a rectangular or square cross section, and the first strip-shaped opening and the second strip-shaped opening have respective shapes. Are parallel to each other, and the side edges in the width direction are parallel to each other and extend in one direction across the tank body, and the gas riser has a hollow portion cross section having the same shape as the first band-shaped opening and the second band-shaped opening. Further, it is characterized in that an inlet duct is provided so as to introduce the exhaust gas into the exhaust gas inlet chamber in the same flow direction as the extending direction of the widthwise side edge.
【0013】ガスライザとガスライザとの間隔、即ち帯
状開口と帯状開口との間隔は、長い程ガスライザの本数
を少なくすることができるが、ガスライザの幅寸法に関
係なく、好適には、100cmから10mの範囲、更に望
ましくは200cmから5mの範囲である。10m以上の
間隔にすると、ガスライザ1本当たりの流量がそれだけ
増大し、第2隔板下の空間部で処理排ガスの流速が増大
してミストを同伴し易くなる。逆に、100cm以下にな
ると、装置が複雑になって排ガス入口室での点検、保守
が困難になり、かつ建設費も増大して好ましくない。ま
た、ガスライザの幅は、好適には30cmから200cmの
範囲、更に望ましくは40cmから100cmの範囲であ
る。また、排ガス分散筒の排ガス流速をV1 、ガスライ
ザの排ガスの流速をV2 とすると、V1 :V2 が1:
0.2〜2の範囲にあることが好ましい。The distance between the gas risers, that is, the distance between the band-shaped openings can be reduced as the distance between the band-shaped openings increases. However, regardless of the width of the gas risers, it is preferably 100 cm to 10 m. The range is more preferably 200 cm to 5 m. When the distance is 10 m or more, the flow rate per gas riser increases by that amount, the flow velocity of the treated exhaust gas increases in the space below the second partition plate, and mist is easily entrained. On the other hand, if the height is 100 cm or less, the apparatus becomes complicated and inspection and maintenance in the exhaust gas inlet chamber becomes difficult, and the construction cost increases, which is not preferable. The width of the gas riser is preferably in the range of 30 cm to 200 cm, more preferably 40 cm to 100 cm. Further, when the exhaust gas flow rate of the exhaust gas dispersion cylinder is V 1 and the exhaust gas flow rate of the gas riser is V 2 , V 1 : V 2 is 1:
It is preferably in the range of 0.2 to 2.
【0014】[0014]
【作用】本発明では、吸収液の液面上の空間と排ガス出
口室とを連通させるガスライザは、その長手方向が入口
ダクトから排ガス入口室に導入する排ガスの導入方向に
一致するように配置されている。よって、排ガス入口室
において、ガスライザの長手方向が排ガスの導入方向に
一致しているので、被処理排ガスは、ガスライザに邪魔
されることなくガスライザとガスライザとの間の空間を
流れ、均等に分散して排ガス分散筒に流入することがで
きる。一方、排ガス入口室下の空間において、吸収液よ
り上昇した処理排ガスは、排ガス分散筒を横切るように
して最も近くのガスライザに流入し、ガスライザを経由
して排ガス出口室に入ることができる。In the present invention, the gas riser for communicating the space above the liquid surface of the absorbing liquid with the exhaust gas outlet chamber is arranged such that the longitudinal direction thereof coincides with the introduction direction of the exhaust gas introduced from the inlet duct into the exhaust gas inlet chamber. ing. Therefore, in the exhaust gas inlet chamber, the longitudinal direction of the gas riser coincides with the introduction direction of the exhaust gas, so the exhaust gas to be treated flows through the space between the gas riser and the gas riser without being disturbed by the gas riser and is evenly distributed. Can flow into the exhaust gas dispersion cylinder. On the other hand, in the space below the exhaust gas inlet chamber, the treated exhaust gas that has risen above the absorption liquid can flow into the nearest gas riser across the exhaust gas dispersion cylinder and enter the exhaust gas outlet chamber via the gas riser.
【0015】[0015]
【実施例】以下、添付図面を参照し、実施例に基づいて
本発明をより詳細に説明する。図1は本発明をジョット
バブリング反応槽(以下、簡単に反応槽と略称する)に
適用した実施例の要部構成を示す反応槽の平面図、図2
は図1の線I−Iでの反応槽の側面断面図、図3は図1
の線II−IIでの反応槽の側面断面図及び図4は第2隔板
の部分的平面図である。本実施例の反応槽50は、図1
から図3に示すように、断面長方形の箱型槽体で形成さ
れている。反応槽50は、図2に示すように、上から順
に排ガス出口室52と、槽体を横断するように設けられ
た排ガス入口室54と、吸収液を収容する下部空間とに
区画されている。排ガス出口室52と排ガス入口室54
とは、反応槽50を横断して水平に伸びる第1隔板56
によって仕切られ、排ガス入口室54と下部空間とは、
第1隔板56に平行に伸びる第2隔板58によって仕切
られている。第2隔板58は、吸収液60の液面より上
方に位置し、その間に排ガス流出用の空間部62を形成
している。排ガス出口室52は出口ダクト64に接続
し、その下の排ガス入口室54は入口ダクト66(図1
及び図3参照)に接続している。反応槽50は、出口ダ
クト64との接続口から反対側に向かって下向きに傾斜
している天板68、出口ダクト64側の側板70、それ
に対向する側板72、入口ダクト66側の前面板74、
後面板76及び底板78とで形成されている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will now be described in more detail based on embodiments with reference to the accompanying drawings. FIG. 1 is a plan view of a reaction tank showing a main configuration of an embodiment in which the present invention is applied to a Giotto bubbling reaction tank (hereinafter simply referred to as a reaction tank).
1 is a side sectional view of the reaction vessel taken along the line I-I in FIG. 1, and FIG.
FIG. 4 is a side sectional view of the reaction vessel taken along line II-II in FIG. 4 and FIG. 4 is a partial plan view of the second partition plate. The reaction tank 50 of this embodiment is shown in FIG.
3 to 3, it is formed of a box-shaped tank body having a rectangular cross section. As shown in FIG. 2, the reaction tank 50 is partitioned into an exhaust gas outlet chamber 52, an exhaust gas inlet chamber 54 provided so as to cross the tank body, and a lower space for accommodating the absorbing liquid in order from the top. . Exhaust gas outlet chamber 52 and exhaust gas inlet chamber 54
Is a first partition plate 56 that extends horizontally across the reaction tank 50.
The exhaust gas inlet chamber 54 and the lower space are partitioned by
It is partitioned by a second partition plate 58 extending parallel to the first partition plate 56. The second partition plate 58 is located above the liquid surface of the absorbing liquid 60, and forms a space 62 for the outflow of exhaust gas therebetween. The exhaust gas outlet chamber 52 is connected to the outlet duct 64, and the exhaust gas inlet chamber 54 thereunder is connected to the inlet duct 66 (see FIG.
And FIG. 3). The reaction tank 50 includes a top plate 68 inclined downward from the connection port with the outlet duct 64 toward the opposite side, a side plate 70 on the outlet duct 64 side, a side plate 72 facing the side plate 72, and a front plate 74 on the inlet duct 66 side. ,
It is formed of a rear plate 76 and a bottom plate 78.
【0016】本実施例では、排ガスを空間部62から排
ガス出口室52に流出させる手段として、中空部断面が
細長い長方形の3個のガスライザ80A、B、Cが、第
1隔板56から下に排ガス入口室54を貫通して第2隔
板58まで設けられている。各ガスライザ80A、B、
Cは、それぞれ同じ幅であって、その長手方向が前面板
74に直交する排ガスの導入方向に一致して相互に平行
に配置されている。図1に示すように、ガスライザ80
Bは、反応槽50の中央に配置され、ガスライザ80A
及び80Cは、それぞれのガスライザ80Bまで距離
が、後述するように、ガスライザ80Aと側板72又は
ガスライザ80Cと側板70との距離の約2倍に等しく
なるように配置されている。第1隔板56及び第2隔板
58には、ガスライザ80A、B、Cとの接合位置にガ
スライザ80の中空部断面と同じ開口周縁を有する第1
帯状開口82A、B、C及び第2帯状開口84A、B、
Cがそれぞれ設けてあり、ガスライザ80の側壁と第1
帯状開口82及び第2帯状開口84の開口周縁とが接合
されている。In this embodiment, three gas risers 80A, 80B, 80C each having a rectangular hollow section are provided below the first partition plate 56 as means for flowing the exhaust gas from the space 62 to the exhaust gas outlet chamber 52. The exhaust gas inlet chamber 54 is penetrated to the second partition plate 58. Each gas riser 80A, B,
The Cs have the same width, and the longitudinal directions thereof are arranged in parallel with each other so as to match the exhaust gas introduction direction orthogonal to the front plate 74. As shown in FIG. 1, the gas riser 80
B is located in the center of the reaction tank 50 and is equipped with a gas riser 80A.
And 80C are arranged such that the distance to each gas riser 80B is equal to about twice the distance between the gas riser 80A and the side plate 72 or between the gas riser 80C and the side plate 70, as will be described later. The first partition plate 56 and the second partition plate 58 have the same opening periphery as the hollow section of the gas riser 80 at the joint position with the gas risers 80A, B, C.
Strip-shaped openings 82A, B, C and second strip-shaped openings 84A, B,
C are provided respectively, and the side wall of the gas riser 80 and the first
The strip-shaped opening 82 and the opening peripheral edge of the second strip-shaped opening 84 are joined.
【0017】図4に示すように、第2隔板58の第2帯
状開口84A、B、C以外の領域には、多数個の約10
0mmの円形開口86が設けてあって、各開口86の周縁
から排ガス分散筒88が下方に下降し、下端部で吸収液
60に浸漬している。開口86は、縦横同じピッチの枡
目状に配置され、しかも第2帯状開口84に平行な方向
に見て、第2帯状開口84Aと第2帯状開口84Bとの
間に配置された開口86の列数は、側板72側の側縁と
第2帯状開口84Aとの間に配置された開口86の列数
の2倍になるように配置されている。これにより、側板
72付近の排ガスも、第2帯状開口84Aと84Bとの
間の丁度中間付近の排ガスも、同じような距離を横切っ
て第2帯状開口84Aに流入することができる。本実施
例では、第2帯状開口84の幅が500mmであり、第2
帯状開口84の個数n2 が3、排ガス分散筒88の総個
数n1 が約950個であるから、n1 /n2 は、約31
6であり、排ガス分散筒88の排ガス流速をV1 、ガス
ライザ80の排ガスの流速をV2 とすると、V1 :V2
が1:0.5である。攪拌機90は、その回転軸92が
槽上の駆動装置94から中央のガスライザ80Bを貫通
して下方に延びている。排ガス分散筒88の下端部の詳
細を含む反応槽50の下部構成は、図5に示す従来の反
応槽10の下部構成と同じである。As shown in FIG. 4, in the area other than the second strip-shaped openings 84A, B, C of the second partition plate 58, a large number of about 10 pieces are provided.
A 0 mm circular opening 86 is provided, the exhaust gas dispersion cylinder 88 descends downward from the peripheral edge of each opening 86, and is immersed in the absorbent 60 at the lower end. The openings 86 are arranged in a grid pattern having the same vertical and horizontal pitches, and when viewed in a direction parallel to the second strip-shaped openings 84, the openings 86 arranged between the second strip-shaped openings 84A and the second strip-shaped openings 84B. The number of rows is arranged to be twice the number of rows of the openings 86 arranged between the side edge on the side plate 72 side and the second band-shaped opening 84A. As a result, the exhaust gas in the vicinity of the side plate 72 and the exhaust gas in the vicinity of just the middle between the second strip openings 84A and 84B can flow into the second strip opening 84A across the same distance. In the present embodiment, the width of the second strip-shaped opening 84 is 500 mm,
Since the number n 2 of the strip-shaped openings 84 is 3 and the total number n 1 of the exhaust gas dispersion cylinders 88 is about 950, n 1 / n 2 is about 31.
6 and V 1 is the exhaust gas flow rate of the exhaust gas dispersion cylinder 88 and V 2 is the exhaust gas flow rate of the gas riser 80, V 1 : V 2
Is 1: 0.5. The stirrer 90 has a rotary shaft 92 extending downward from a drive device 94 on the tank through the central gas riser 80B. The lower structure of the reaction tank 50 including the details of the lower end of the exhaust gas dispersion cylinder 88 is the same as the lower structure of the conventional reaction tank 10 shown in FIG.
【0018】以上のガスライザ80A、B、Cの構成に
より、吸収液60より上昇した処理排ガスが、空間部6
2内で激しい乱れを生じないで均一に分散して第2帯状
開口84に流入できる。また、総断面積が同じであって
も、ガスライザ84は、一本当たりの断面積が従来の比
較的小径の連通管に比べて格段に大きいので、流体力学
的に言ってそれだけ圧力損失を小さく抑えることができ
る。また、排ガス入口室54内では、従来の連通管のよ
うな多数の障害物が排ガスの流れ方向に存在しないの
で、入口ダクト66を経て排ガス入口室54に導入され
た排ガスは、ガスライザ80の間の空間を通って排ガス
入口室54の奥まで流れ、そこに配置された排ガス分散
筒88にも排ガス入口室54の手前の排ガス分散筒88
と同じように流入することができる。With the structure of the gas risers 80A, 80B, and 80C, the treated exhaust gas higher than the absorption liquid 60 is treated as the space 6
It is possible to evenly disperse into the second strip-shaped opening 84 without causing severe turbulence in the second inside. Further, even if the total cross-sectional area is the same, the gas riser 84 has a remarkably large cross-sectional area per unit as compared with the conventional communication pipe having a relatively small diameter, so that the pressure loss is reduced by that much in terms of hydrodynamics. Can be suppressed. Further, in the exhaust gas inlet chamber 54, since many obstacles such as conventional communication pipes do not exist in the flow direction of the exhaust gas, the exhaust gas introduced into the exhaust gas inlet chamber 54 via the inlet duct 66 flows between the gas riser 80. Flow through the space of the exhaust gas inlet chamber 54 to the depth of the exhaust gas inlet chamber 54, and the exhaust gas dispersing cylinder 88 disposed there also has the exhaust gas dispersing cylinder 88 in front of the exhaust gas inlet chamber 54.
Can flow in the same way as.
【0019】[0019]
【発明の効果】本発明の構成によれば、吸収液の液面上
の空間と排ガス出口室とを連通するガスライザは、その
長手方向が入口ダクトから排ガス入口室に導入する排ガ
スの導入方向に一致するように配置されている。よっ
て、排ガス入口室内では、従来の連通管のような障害物
が排ガスの流れ方向に存在しないので、入口ダクトを経
て排ガス入口室に導入された排ガスは、ガスライザとガ
スライザとの間の空間を通って排ガス入口室の奥まで流
れてそこに配置された排ガス分散筒にも均一に流入する
ことができる。更には、従来の排ガス処理槽の場合、連
通管のような障害物があって、排ガス入口室での排ガス
の流れが乱れ、排ガス中の固体粒子が局所的に付着、堆
積し、排ガス分散筒等を閉塞し易く、局所的なエロージ
ョンも生じ易かったが、本発明に係る排ガス処理槽で
は、かかる問題は発生しない。また、排ガス入口室下の
空間において、吸収液より上昇した処理排ガスは、排ガ
ス分散筒を横切るようにして最も近くのガスライザに流
入し、ガスライザを経由して排ガス出口室に入ることが
できる。ガスライザの開口が大きいので、圧力損失も小
さく、また排ガスが流入し易い。更には、従来のパイプ
状の連通管と同じ排ガス流れ断面積であっても、本実施
例のガスライザは、従来のパイプ状の連通管に比べて、
遙に構造が簡単であるから、現場での工事量が格段に減
少し、建設費を節減することができ、メンテナンスも容
易なる。According to the structure of the present invention, the gas riser for communicating the space above the liquid surface of the absorbing liquid with the exhaust gas outlet chamber has its longitudinal direction in the direction of introduction of the exhaust gas introduced from the inlet duct into the exhaust gas inlet chamber. It is arranged to match. Therefore, in the exhaust gas inlet chamber, there are no obstacles such as conventional communication pipes in the exhaust gas flow direction, so the exhaust gas introduced into the exhaust gas inlet chamber through the inlet duct passes through the space between the gas riser and the gas riser. It is possible to flow to the depth of the exhaust gas inlet chamber and evenly flow into the exhaust gas dispersion cylinder arranged there. Furthermore, in the case of the conventional exhaust gas treatment tank, there are obstacles such as communication pipes, the flow of the exhaust gas in the exhaust gas inlet chamber is disturbed, and solid particles in the exhaust gas locally adhere and accumulate, causing the exhaust gas dispersion cylinder. However, such problems do not occur in the exhaust gas treatment tank according to the present invention. Further, in the space below the exhaust gas inlet chamber, the treated exhaust gas that has risen above the absorption liquid can flow into the nearest gas riser across the exhaust gas dispersion cylinder and enter the exhaust gas outlet chamber via the gas riser. Since the opening of the gas riser is large, the pressure loss is small and the exhaust gas easily flows in. Further, even if the exhaust gas flow cross-sectional area is the same as the conventional pipe-shaped communication pipe, the gas riser of the present embodiment, compared to the conventional pipe-shaped communication pipe,
Since the structure is much simpler, the amount of work at the site is significantly reduced, the construction cost can be reduced, and the maintenance is easy.
【図1】本発明に係る排ガス処理槽の実施例(ジョット
バブリング反応槽)の要部構成を示す反応槽の平面図で
ある。FIG. 1 is a plan view of a reaction tank showing an essential configuration of an embodiment of an exhaust gas treatment tank (Jotte bubbling reaction tank) according to the present invention.
【図2】図1の線I−Iでの反応槽の側面断面図であ
る。2 is a side cross-sectional view of the reaction vessel taken along the line II of FIG.
【図3】図1の線II−IIでの反応槽の側面断面図であ
る。FIG. 3 is a side sectional view of the reaction vessel taken along the line II-II in FIG.
【図4】第2隔板の部分的平面図である。FIG. 4 is a partial plan view of a second partition plate.
【図5】従来のジョットバブリング反応槽の模式図であ
る。FIG. 5 is a schematic view of a conventional Giotto bubbling reaction tank.
【図6】第2隔板の部分的平面図である。FIG. 6 is a partial plan view of a second partition plate.
10 ジョットバブリング反応槽
12、52 排ガス出口室
14、54 排ガス入口室
16、56 第1隔板
18、58 第2隔板
20、60 吸収液層
22、62 空間部
24、64 出口ダクト
26、66 入口ダクト
28、80 ガスライザ
30、88 排ガス分散管
32、90 攪拌機
34 空気供給管
36、92 回転軸
38、94 駆動装置
40 スラリ供給管
42 排出管
50 本発明に係る排ガス処理槽の実施例(ジョットバ
ブリング反応槽)
68 天板
70、72 側板
74 前面板
76 後面板
78 底板
82 第1帯状開口
84 第2帯状開口
86 円形開口10 Giotto bubbling reaction tank 12, 52 Exhaust gas outlet chamber 14, 54 Exhaust gas inlet chamber 16, 56 First partition plate 18, 58 Second partition plate 20, 60 Absorbing liquid layer 22, 62 Space part 24, 64 Outlet duct 26, 66 Inlet duct 28, 80 Gas riser 30, 88 Exhaust gas dispersion pipe 32, 90 Stirrer 34 Air supply pipe 36, 92 Rotating shaft 38, 94 Drive device 40 Slurry supply pipe 42 Discharge pipe 50 Example of exhaust gas treatment tank according to the present invention (Jott) Bubbling reaction tank) 68 top plate 70, 72 side plate 74 front plate 76 rear plate 78 bottom plate 82 first belt-shaped opening 84 second belt-shaped opening 86 circular opening
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平5−317634(JP,A) 特開 平8−229339(JP,A) (58)調査した分野(Int.Cl.7,DB名) B01D 53/14 - 53/18 B01D 53/34 - 53/85 ─────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-5-317634 (JP, A) JP-A-8-229339 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) B01D 53/14-53/18 B01D 53/34-53/85
Claims (4)
て気液接触させ、排ガス中の有害物質を吸収液によって
接触、除去するようにした排ガス処理槽において、 処理槽上部に上から順に配置された、排ガスを排出する
出口ダクトに連通する排ガス出口室と、処理槽の横断方
向に延びる第1隔板によって排ガス出口室から区画さ
れ、かつ排ガスを導入する入口ダクトに連通する排ガス
入口室と、処理槽の横断方向に延びる第2隔板によって
排ガス入口室から区画された空間部とを備え、更に排ガ
ス入口室を貫通して空間部と排ガス出口室とを連通する
断面帯状の中空部を有するガスライザと、排ガス入口室
から空間部に下降する排ガス分散筒とを備え、 第1隔板は入口ダクトから排ガス入口室に導入される排
ガス導入方向に沿って延びる第1帯状開口を有し、第2
隔板は第1帯状開口に対向する位置に配置された第2帯
状開口と第2帯状開口以外の領域に配列された複数個の
開口孔を有し、 ガスライザは、中空部の側壁が第2帯状開口の周縁から
上方に延びて対向する第1帯状開口の周縁に達するよう
に設けてあり、 排ガス分散筒は、開口孔の孔縁から下方に下降して吸収
液に浸漬するように設けてあることを特徴とする排ガス
処理槽。1. An exhaust gas treatment tank in which exhaust gas is introduced into an absorption liquid housed in the tank and brought into gas-liquid contact so that harmful substances in the exhaust gas are brought into contact with and removed by the absorption liquid. An exhaust gas outlet chamber, which is arranged in order and communicates with an outlet duct for discharging the exhaust gas, and an exhaust gas inlet which is partitioned from the exhaust gas outlet chamber by a first partition plate extending in the transverse direction of the treatment tank and which communicates with an inlet duct for introducing the exhaust gas. Chamber and a space portion partitioned from the exhaust gas inlet chamber by a second partition plate extending in the transverse direction of the treatment tank, and further having a band-shaped hollow section that penetrates the exhaust gas inlet chamber and connects the space portion and the exhaust gas outlet chamber. A gas riser having a portion and an exhaust gas dispersion cylinder that descends from the exhaust gas inlet chamber to the space portion, and the first partition plate extends along the exhaust gas introduction direction introduced from the inlet duct to the exhaust gas inlet chamber. It has Jo opening, the second
The partition plate has a second strip-shaped opening arranged at a position facing the first strip-shaped opening and a plurality of opening holes arranged in a region other than the second strip-shaped opening. The gas riser has a hollow side wall having a second side. It is provided so as to extend upward from the peripheral edge of the strip-shaped opening to reach the peripheral edge of the first strip-shaped opening that opposes, and the exhaust gas dispersion cylinder is provided so as to descend downward from the hole edge of the opening hole and be immersed in the absorbing liquid. Exhaust gas treatment tank characterized by being present.
ずれかの横断面を有する箱型槽体で形成され、第1帯状
開口及び第2帯状開口は、それぞれの形状が同一であっ
て、かつ幅方向側縁が相互に平行であってかつ槽体を横
断する一方向に延在し、ガスライザは第1帯状開口及び
第2帯状開口と同じ形状の中空部断面を備え、更に、前
記幅方向側縁の延在方向と同じ流れ方向で排ガス入口室
に排ガスを導入するように入口ダクトが設けられている
ことを特徴とする請求項1に記載の排ガス処理槽。2. The exhaust gas treatment tank is formed of a box-shaped tank body having a rectangular or square cross section, and the first strip-shaped opening and the second strip-shaped opening have the same shape, and The side edges in the width direction are parallel to each other and extend in one direction across the tank body, and the gas riser has a hollow section cross-section having the same shape as the first band-shaped opening and the second band-shaped opening. The exhaust gas treatment tank according to claim 1, wherein an inlet duct is provided so as to introduce the exhaust gas into the exhaust gas inlet chamber in the same flow direction as the extending direction of the side edge.
0cmから10mの範囲であり、かつガスライザの幅が3
0cmから200cmの範囲であることを特徴とする請求項
2に記載の排ガス処理槽。3. The distance between the gas risers is 10
It is in the range of 0 cm to 10 m and the width of the gas riser is 3
The exhaust gas treatment tank according to claim 2, which is in a range of 0 cm to 200 cm.
ライザの排ガスの流速をV2 とすると、V1 :V2 が
1:0.2〜2の範囲にあることを特徴とする請求項2
又は3のうちのいずれか1項に記載の排ガス処理槽。4. When the exhaust gas flow rate of the exhaust gas dispersion cylinder is V 1 and the exhaust gas flow rate of the gas riser is V 2 , V 1 : V 2 is in the range of 1: 0.2 to 2. Two
Or the exhaust gas treatment tank according to any one of 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02765595A JP3502467B2 (en) | 1995-01-24 | 1995-01-24 | Exhaust gas treatment tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02765595A JP3502467B2 (en) | 1995-01-24 | 1995-01-24 | Exhaust gas treatment tank |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08196854A JPH08196854A (en) | 1996-08-06 |
| JP3502467B2 true JP3502467B2 (en) | 2004-03-02 |
Family
ID=12226950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02765595A Expired - Lifetime JP3502467B2 (en) | 1995-01-24 | 1995-01-24 | Exhaust gas treatment tank |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3502467B2 (en) |
-
1995
- 1995-01-24 JP JP02765595A patent/JP3502467B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08196854A (en) | 1996-08-06 |
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