JP3538353B2 - Cleaning liquid suction device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used in a manufacturing process of a flat panel display such as a liquid crystal display device and a plasma display panel (PDP) or a semiconductor substrate, and a cleaning liquid remaining on the object after cleaning the object. The present invention relates to a cleaning liquid suction device for sucking and removing water.

[0002]

2. Description of the Related Art For example, a conventional cleaning liquid removing method used in a manufacturing process of a liquid crystal display element will be described. FIG. 5 is a schematic diagram illustrating a cleaning liquid removing method using the air knife 1, and FIG. 6 is a schematic diagram illustrating a cleaning liquid removing method using the spatula-type remover 9. The glass substrate 2 as the object to be cleaned is transported in the transport direction B by the plurality of transport rollers 3, and is cleaned by the cleaning liquid ejected from the cleaning device 5. At this time, the cleaning liquid 8 in the form of a film remains on the one surface 11 of the glass substrate and is transported in the transport direction B by the transport roller 3.

As shown in FIG. 5, the air knife 1 is disposed downstream of the cleaning device 5 in the transport direction B. A pressurized gas is jetted from a slit-shaped jet port 6 of the air knife 1, and the pressure of the gas causes a gas curtain 7 to flow.
Is formed. The gas curtain 7 blocks the above-mentioned film-like cleaning liquid 8 to remove the cleaning liquid from the glass substrate 2. In the removal method using the air knife 1,
It is possible to control the amount of the cleaning liquid to be removed by adjusting the pressure of the gas to be ejected.

[0004] As shown in FIG. 6, a spatula-type remover 9 comprises:
It is arranged downstream of the cleaning device 5 in the transport direction B, and is made of a sheet-like rubber or the like. As in the case of the gas curtain 7 described above, the remover 9 blocks the cleaning liquid 8 in the form of a film, whereby the cleaning liquid is removed from the glass substrate 2. To completely remove the film-like cleaning liquid 8 from the glass substrate 2, the lower end 10 of the remover 9 is brought into contact with one surface 11 of the glass substrate 2. Then, the remover 9 is moved by the transport force of the transport roller 3 and the pressure generated by the deformation of the remover 9 so that the glass substrate 2 is removed.
Therefore, the film-like cleaning liquid 8 can be completely wiped off. When only a part of the film-like cleaning liquid 8 is to be removed, a gap may be provided between the lower end 10 of the remover 9 and one surface 11 of the glass substrate 2. Thus, only the cleaning liquid at a position higher than the lower end 10 of the remover 9 can be blocked and removed. As described above, the thickness of the cleaning liquid remaining on the glass substrate 2 can be controlled by adjusting the distance of the gap.

In Japanese Patent Application Laid-Open No. 10-163153, an inlet for introducing a cleaning liquid, an injection port for injecting the introduced cleaning liquid onto an object to be cleaned, and an outlet for collecting the injected cleaning liquid are integrally provided. A specifically formed cleaning nozzle is described. According to this cleaning nozzle, the cleaning liquid used for cleaning can be collected without remaining on the object to be cleaned.

[0006]

FIG. 7 is a diagram showing a cleaning mechanism of a general cleaning apparatus. By applying physical energy 12 such as pressure, vibration and heat to an object to be cleaned, for example, the glass substrate 2,
The contaminants 13 float up in the cleaning liquid 8 from one surface 11 of the glass substrate 2. Then, the contaminants 13
In the cleaning liquid 8. This prevents the contaminants 13 that have floated up from re-adhering to the glass substrate 2 and the one surface 11 of the glass substrate 2 is cleaned.
That is, in order to improve the cleaning efficiency of the glass substrate 2, the physical energy 12 applied at the time of cleaning is increased, or the contaminants 13 are removed from the cleaning liquid 8 before the floating contaminants 13 adhere to the glass substrate 2 again. The cleaning liquid 8 may be removed from the glass substrate 2 before the contaminants 13 diffused therein or lifted up adhere to the glass substrate 2.

[0007] However, even if the cleaning efficiency is improved as described above, the glass substrate 2 after cleaning is in contact with the cleaning liquid 8 containing the contaminants 13, so that the glass substrate 2 is again contaminated. The problem occurs. In the removal method using the air knife 1 shown in FIG. 5, the contaminated cleaning liquid concentrates on the blocking section 14 where the cleaning liquid 8 is blocked by the gas curtain 7, and the probability of the contamination progressing at the blocking section 14 increases. Similarly, in the removal method using the spatula-type remover 9, the probability of the contamination progressing at the blocking unit 15 where the remover 9 blocks the cleaning liquid 8 is increased. This problem,
The above two methods of blocking and removing the cleaning liquid 8 cannot solve the problem.

On the other hand, when the one surface 11 of the glass substrate 2 is transported in the transport direction B in a wet state, the remaining film-like cleaning liquid 8 functions as a protective film, and the one surface 11 of the glass substrate 2 is exposed to the atmosphere. Contamination is prevented.
However, if the amount of the remaining cleaning liquid 8 is small,
During the transportation, the cleaning liquid may be volatilized, and dissolved components such as the contaminants 13 in the cleaning liquid 8 may remain as stains. For this reason, the cleaning liquid 8 remaining on the one surface 11 of the glass substrate 2 needs to leave an amount that does not completely evaporate during transportation.

As described above, it is necessary to control the amount of the cleaning liquid remaining on the one surface 11 of the glass substrate 2 to a predetermined amount so as to prevent the contaminant 13 from re-adhering and not to completely volatilize the cleaning liquid. However, in the removal method using the air knife 1 shown in FIG. 5, it is difficult to control the pressure of the gas ejected from the ejection port 6, and thus it is also difficult to control the amount of the remaining cleaning liquid 8. On the other hand, in the removal method using the spatula-type remover 9 shown in FIG. 6, the amount of the remaining cleaning liquid can be easily controlled by controlling the distance between the lower end 10 of the remover 9 and one surface 11 of the glass substrate 2. But,
In this method, since the remover 9 is always in contact with the cleaning liquid 8 containing the contaminant 13, the remover 9 is contaminated and the remover 9 causes secondary contamination.

In the cleaning nozzle disclosed in Japanese Patent Application Laid-Open No. 10-163153, the cleaning liquid is completely removed from the object to be cleaned. There was a problem that occurred.

SUMMARY OF THE INVENTION An object of the present invention is to provide a cleaning liquid suction apparatus for preventing a flat cleaning object after cleaning from being contaminated again by a residual cleaning liquid.

[0012]

According to the present invention, there is provided a cleaning liquid for removing a cleaning liquid remaining in a film form on one surface of a cleaning object by suctioning the cleaning liquid after cleaning the flat object to be cleaned with the cleaning liquid. In the suction device, a tip surface of the suction nozzle is disposed on the upper surface of the film-like cleaning liquid with a gap therebetween, and an area of the tip surface of the suction nozzle is at least three times an area of a suction hole of the suction nozzle. A cleaning liquid suction device characterized in that:

According to the present invention, the flat cleaning object is cleaned by the cleaning liquid, and the film-like cleaning liquid remains on one surface of the cleaning object. The film-like cleaning liquid is sucked and removed by the suction nozzle. At this time, a gap is provided between the tip surface of the suction nozzle and the upper surface of the film-like cleaning liquid, and the suction nozzle sucks and removes the cleaning liquid without contacting the film-like cleaning liquid. As described above, the suction nozzle does not come into contact with the cleaning liquid containing the contaminants after being used for cleaning, so that the suction nozzle is prevented from being contaminated by the contaminants in the cleaning liquid. Thus, the suction nozzle does not cause secondary contamination of the cleaning liquid and the object to be cleaned. Further, the suction nozzle does not physically damage the object to be cleaned when the object is to be cleaned. According to the present invention, if the area of the tip surface of the suction nozzle is three times or more the area of the suction hole, a negative pressure is applied to the gap between the tip surface of the suction nozzle and the upper surface of the film-like cleaning liquid during suction. Since the region of the atmosphere can be formed, the cleaning liquid can be efficiently suctioned in a state where the suction nozzle is not in contact with the film-shaped cleaning liquid. The cleaning liquid sucked in this way is discharged through the suction holes. At this time, the cleaning liquid can be sucked in a region larger than the area of the suction hole.

[0014]

[0015]

The present invention also provides a box having a storage space for temporarily storing the cleaning liquid sucked by the suction nozzle, facing the storage space, and provided with a discharge hole for discharging the cleaning liquid discharged into the storage space. Comprising a body, wherein the suction nozzle comprises:
The upper end surface is arranged at a position higher than the upper end portion of the discharge hole in the storage space and is connected to the box.

According to the present invention, the suction nozzle has an upper end projecting from the bottom wall of the box into the storage space and connected to the box, and the box has a suction pump for sucking the air in the storage space. Is connected. When the suction pump is driven, the air in the storage space is sucked to a negative pressure, and the cleaning liquid is sucked from the suction nozzle. The suctioned cleaning liquid is discharged from the upper end surface of the suction nozzle into the inside of the box. The cleaning liquid discharged inside the box is temporarily stored in a storage space inside the box, and is sucked and discharged from the discharge hole. As described above, even if the suction pressure of the suction pump temporarily drops due to the interposition of the box between the suction nozzle and the suction pump, the storage space becomes a buffer. In addition, the suction force from the suction nozzle can be stabilized.

The box has a discharge hole for discharging the stored cleaning liquid. The upper end surface of the suction nozzle is disposed at a position higher than the upper end of the discharge hole, and the liquid level of the cleaning liquid in the storage space does not become higher than the upper end of the discharge hole. Even if the bias of the negative pressure is generated and the cleaning liquid cannot be suctioned or the suction pump is stopped, the cleaning liquid stored in the storage space is prevented from flowing back to the object to be cleaned. Thus, only the amount of the cleaning liquid that flows back to the object to be cleaned remains in the suction hole, and recontamination of the object to be cleaned can be minimized.

[0019]

FIG. 1 is a schematic view of a cleaning liquid suction device 21 according to an embodiment of the present invention, FIG. 2 is a simplified cross-sectional view of the cleaning liquid suction device 21, and FIG. FIG. 3 is a diagram showing a tip surface 29 of a second embodiment. The cleaning liquid suction device 21 of the present invention is used in, for example, a manufacturing process of a liquid crystal display element and the like, and after cleaning a flat cleaning object with a cleaning liquid, suctions a cleaning liquid remaining on one surface of the cleaning object in a film form. This is a device that sucks and removes with the nozzle 22.

As shown in FIG. 1, a glass substrate 25 to be cleaned is transported in a transport direction B by a plurality of transport rollers 24 with a surface 41 to be cleaned facing upward.
A cleaning device 23 is arranged above the glass substrate 25,
The cleaning device 23 cleans the glass substrate 25 by spraying a cleaning liquid toward the surface 41 to be cleaned. The washed glass substrate 25 is transported in the transport direction B by the transport rollers 24 with the cleaning liquid used for cleaning remaining on the surface 41 to be cleaned remaining in a film form. This film-like cleaning solution 26
It contains contaminants such as dirt attached to the surface 41 to be cleaned, and the contaminants may adhere to the surface 41 to be cleaned while the glass substrate 25 is being transported after cleaning. For this reason,
It is necessary to remove the film-like cleaning liquid 26 from the surface 41 to be cleaned, and the cleaning liquid suction device 21 of the present invention is disposed downstream of the cleaning device 23 in the transport direction B and above the glass substrate 25.

Next, the cleaning liquid suction device 21 will be described with reference to FIGS. The cleaning liquid suction device 21
One or a plurality of suction nozzles 22, a box 39 to which the suction nozzles 22 are connected, and a storage space 28 inside the box.
And a suction pipe 27 for reducing the pressure.

The suction nozzle 22 is, for example, a long cylindrical body, and has a suction hole 32 formed in the center thereof in a longitudinal direction (vertical direction in FIG. 2). As shown in FIG. 3, the area A2 of the distal end face 29 is at least three times (A2 ≧ 3A1) the area A1 of the suction hole 32, and preferably at least ten times or more.
0 or less. In the present embodiment, the diameter D1 of the suction hole 32 is 3 mm, and the area A1 is 2.25πmm ^2.
It is. The diameter D2 of the tip surface 29 is 18 mm,
The area A2 is 81πmm ² . That is, the tip surface 29
Area A2 is 36 times the area A1 of the suction hole 32.

A discharge hole 33 is formed in the lower part of one side wall 43 of the box 39, and the suction pipe 27 is connected to the discharge hole 33 with one end thereof being disposed in the storage space 28. A suction pump (not shown) is connected to the other end of the suction pipe 27. The suction nozzle 22 is attached to the box 39 with the upper end face 30 protruding into the storage space 28 and the tip end face 29 protruding below the box. At this time, the upper end surface 30 is the upper end 4 of the suction pipe 27.
4, and the tip surface 29 faces the film-like cleaning liquid 41.

Next, referring to FIG.
The suction method of the cleaning liquid 26 will be described. When sucking the film-like cleaning solution 26 on the glass substrate 2, first, the upper end surface of the film-like cleaning solution 26 and the tip end surface 29 of the suction nozzle 22 are opposed to each other with a predetermined slight gap t1.
In the present embodiment, the predetermined slight gap t1 is 1 m
A value between m and 5 mm is selected.

When the pressure in the storage space 28 is reduced through a suction pipe 27 by a suction pump (not shown), the suction holes 3
From 2, air outside the suction nozzle 22 is sucked into the storage space 28. At this time, as described above, since the area A2 of the distal end face 29 of the suction nozzle 22 is at least three times the area A1 of the suction hole 32, and 36 times larger in the present embodiment, the distal end face 29 of the suction nozzle 22 The area 40 of the negative pressure atmosphere is generated between the cleaning liquid 26 and the upper end surface 49 of the cleaning liquid 26. When the negative pressure atmosphere region 40 is generated as described above, the upper end surface 49 of the film-like cleaning liquid is sucked toward the front end surface 29 of the suction nozzle 22. Then, the suctioned cleaning liquid flows into the suction hole 32, passes through the suction hole 32, and moves from the upper end surface 30 to the storage space 28.
Is discharged. With the configuration described above, the cleaning liquid can be sucked even if a slight gap t1 is provided between the tip surface 29 of the suction nozzle 22 and the film-shaped cleaning liquid 26. That is, since the suction nozzle 22 can suck the cleaning liquid without contacting the film-like cleaning liquid 26, the suction nozzle 22 is not contaminated by the cleaning liquid containing contaminants. Thereby, the suction nozzle 2
2 does not cause secondary contamination of the glass substrate 25. Further, the glass substrate 25 is not damaged by the suction nozzle 22 hitting the glass substrate 25.

The cleaning liquid discharged into the box is temporarily stored in the storage space 28. The cleaning liquid stored in the storage space 28 is sucked by a suction pump (not shown) and discharged through the suction pipe 27 as indicated by an arrow 46.
The discharged cleaning liquid is discarded or circulated and reused.

Even if the suction pump (not shown) breaks down and the pressure in the storage space 28 cannot be reduced, or if the pressure in the storage space 28 is temporarily reduced for some reason, the storage space 28 is not The gas volume serves as a buffer, and the suction pressure of the suction nozzle 22 can be stabilized.

As described above, the upper end surface 29 of the suction nozzle 22 is disposed at a position higher than the upper end 44 of the suction pipe 27, and the level of the stored cleaning liquid is:
Since the pressure is not higher than the upper end 44, the suction force of the suction pump (not shown) is biased, and the negative pressure required to suction the cleaning liquid into the negative pressure atmosphere region 40 cannot be obtained. When the suction pump (not shown) is stopped, or when some of the plurality of suction nozzles 22 cannot suction, the cleaning liquid stored in the storage space 28 is transferred to the glass substrate 2. Backflow is prevented. As a result, only the amount of the cleaning liquid flowing backward to the glass substrate 2 remains in the suction holes 32, and the glass substrate 2
Recontamination can be minimized.

By adjusting the suction pressure of a suction pump (not shown), a predetermined amount of the cleaning liquid on the glass substrate 2 can be left.

The present inventor studied the suction characteristics of the cleaning liquid suction device 21. FIG. 4 is a diagram of an experimental apparatus. The cleaning liquid suction device 21 and two suction pumps 34a,
34b, a drain tank 37 is interposed, and the drain tank 37 and the cleaning liquid suction device 21 are connected by two suction pipes 27.
And the suction pumps 34a and 34b are connected by a pipe 36.

Table 1 shows the suction pumps 34 used in this experiment.
a and 34b show the exhaust characteristics. As shown in Table 1, when the pipe diameter of the suction pipe 27 is 1 inch, the first suction pump 3
4a can exhaust 300 liters of gas inside the box body per minute, the second suction pump 34b can exhaust 500 liters per minute, and can exhaust 650 liters per minute by using two suction pumps 34a and 34b simultaneously. Suction pipe 2
7 is 1/2 inch, the first suction pump 34
a can exhaust 315 liters of gas inside the box per minute,
The second suction pump 34b can exhaust 400 liters per minute,
When two suction pumps 34a and 34b are used at the same time,
It can exhaust 450 liters per minute.

[0032]

[Table 1]

The experiment was performed under the following conditions. A total of 29 suction nozzles 22 were connected to the cleaning liquid suction device 21. About half of the 15 suction nozzles 22 can be sealed. The suction pipe 27 is
The pipe diameter was 1/2 inch or 1 inch. The diameter of the pipe 36 connected to the drain tank 37 is about 100 mm, and the suction pumps 34a, 34
The pipe diameter on the side connected to b is about 40 mm. As the two suction pumps 34a and 34b, only the second suction pump 34b is used, or the two suction pumps 34a and 34b are used.
b was used together. The thickness t2 of the cleaning liquid 26 remaining on the glass substrate 25 was 2 mm. Film-like cleaning solution 2
The gap t1 between the upper end face 49 of No. 6 and the tip end face 29 of the suction nozzle 22 was changed to any one of 1 to 7 mm. In this experiment, water was used as the cleaning liquid.

By changing the above experimental conditions,
It was observed whether or not the cleaning liquid suction device 21 suctioned the film-like cleaning liquid 26. The results are shown in Table 2. In Table 2, the symbol ○ indicates that the cleaning liquid was suctioned by all the suction nozzles 22, the symbol 示 し indicates that the cleaning liquid was suctioned by some of the suction nozzles 22, and the symbol ×
Indicates that the cleaning liquid was not sucked.

[0035]

[Table 2]

As shown in Table 2, the gap distance t1 is 2 mm
Or when it was 3 mm, it was found that the cleaning liquid was sucked by all the suction nozzles 22 under any conditions.
The gap distance t1 is 4 mm and the pipe diameter of the suction pipe 27 is 1
At 1/2 inch, the cleaning liquid is sucked by some of the suction nozzles 22. When the gap distance t1 is 4 mm and the diameter of the suction pipe 27 is 1 inch, the cleaning liquid is suctioned to all the suction nozzles 22. It turned out to be. Gap distance t
When 1 was 5 mm, the pipe diameter of the suction pipe 27 was イ ン チ inch, and only the suction pump 34 b was driven, the cleaning liquid was not sucked. When the gap distance t1 is 5 mm, the diameter of the suction pipe 27 is 1/2 inch, and the first and second suction pumps 34a and 34b are driven together, the cleaning liquid is sucked by only some of the suction nozzles 22. I found out. When the gap distance t1 was 5 mm, the pipe diameter of the suction pipe 27 was 1 inch, and only the second suction pump 34b was driven, it was found that only part of the suction nozzles 22 sucked the cleaning liquid. When the gap distance t1 is 5 mm, the diameter of the suction pipe 27 is 1 inch, and both the first and second suction pumps 34a and 34b are driven, it is understood that the cleaning liquid is sucked by all the suction nozzles 22. Was. When the gap distance t1 became 6 mm or more, it was found that the cleaning liquid was not sucked under any conditions.

From the above observation results, when the gap distance t1, that is, the distance between the tip surface 29 of the suction nozzle 22 and the upper end surface 49 of the film-like cleaning liquid 26 becomes 3 mm or less, suction is performed under all conditions. I understood. Further, it has been found that the gap distance t1 should be at least 5 mm or less in order for the cleaning liquid suction device 21 to suction the cleaning liquid.

Next, using the experimental apparatus, the film-like cleaning liquid 26 is sucked, and the time until the water level of the cleaning liquid stored in the storage space 28 of the inside 31 of the box reaches a predetermined height is measured. did. From the measurement result, the suction amount of the cleaning liquid per unit time of the cleaning liquid suction device 21 was calculated. Table 3 shows the results. In this experiment, the suction pipe 27 was used.
Used a pipe having a diameter of 1 inch.

[0039]

[Table 3]

As shown in Table 3, the second suction pump 34b
When only the suction nozzles 22 are driven and all the 29 suction nozzles 22 suck the film-like cleaning liquid, when the gap distance t1 is 1 mm, the cleaning liquid at 2362.6 g / min can be sucked, and the gap distance t1 Is 2mm.
It was found that the cleaning liquid at 8 g / min could be sucked, and when the gap distance t2 was 3 mm, the cleaning liquid at 583.6 g / min could be sucked. At this time, the pressure in the negative pressure atmosphere region 40 is -30 mmHg (9.73 kP
a). The first and second suction pumps 34
a and 34b are driven to suck the film-like cleaning liquid 26 with all 29 suction nozzles 22, the gap distance t1 is 1 m.
m, a cleaning liquid of 2438.6 g / min can be sucked, and when the gap distance t1 is 2 mm, 2
480.8 g / min of the cleaning liquid can be sucked,
When the gap distance t1 is 3 mm, 2487.9 g / m
It was found that the in cleaning solution could be sucked. At this time, the pressure in the negative pressure atmosphere region 40 is -100 mmHg.
(8.80 kPa). Further, the first and second suction pumps 34a and 34b are driven, and one of the 29
When the five suction nozzles 22 are stopped and the film-like cleaning liquid 26 is suctioned by the remaining fourteen suction nozzles 22, when the gap distance t1 is 1 mm, 1774.4 g / min.
Can be sucked, and the gap distance t1 is 2 mm.
In the case of (1), the cleaning liquid at 1737.4 g / min can be sucked, and when the gap distance t1 is 3 mm, 193
It was found that 42.8 g / min of the cleaning liquid could be sucked. At this time, the pressure in the negative pressure atmosphere region 40 is -120.
mmHg (8.53 kPa).

From the above results, when the pipe diameter of the suction pipe 27 is 1/2 inch, the amount of cleaning liquid absorbed is about 1 at a maximum.
When the pipe diameter of the suction pipe 27 is set to 1 inch, whereas the liter / min (about 1000 g / min), the amount of the cleaning liquid absorbed is irrespective of the gap distance t1 and the exhaust capacity of the suction pump 34. , About 2.5 liters / mi
n (about 2500 g / min).

[0042]

According to the present invention, the film-like cleaning liquid remaining on the flat cleaning object after cleaning is removed by suction by the suction nozzle. At this time, a gap is formed between the tip surface of the suction nozzle and the upper end surface of the film-like cleaning liquid, and the suction nozzle sucks the cleaning liquid without contacting the film-like cleaning liquid. In this manner, the suction nozzle sucks the cleaning liquid without contacting the cleaning liquid containing the contaminants after being used for cleaning, so that the suction nozzle is prevented from being contaminated by the contaminants in the cleaning liquid. . Thus, the suction nozzle does not cause secondary contamination of the cleaning liquid and the object to be cleaned. Further, the suction nozzle does not hit the object to be cleaned and does not physically damage the object to be cleaned.

According to the present invention, the area of the tip surface of the suction nozzle is at least three times the area of the suction hole. A region of a negative pressure atmosphere is formed in the gap. Thus, the cleaning liquid can be sucked in a state where the suction nozzle does not come into contact with the film-shaped cleaning liquid. At this time, the cleaning liquid can be sucked in a region larger than the area of the suction hole.

Further, according to the present invention, the upper end surface of the suction nozzle is disposed at a position higher than the upper end of the discharge hole in the storage space, and the liquid level of the stored cleaning liquid is higher than the upper end. Since it does not rise, a negative pressure bias occurs during the suction of the cleaning liquid, and the suction of the cleaning liquid becomes impossible,
Alternatively, the cleaning liquid stored in the storage space when the suction pump is stopped is prevented from flowing back to the object to be cleaned. As a result, only the amount of the cleaning liquid that flows back to the object to be cleaned remains in the suction hole, and recontamination of the object to be cleaned can be minimized.

According to the present invention, even if an unstable state such as a temporary decrease in the suction pressure of the suction pump is caused by interposing a box between the suction nozzle and the suction pump. The volume of the gas in the storage space serves as a buffer, so that the suction pressure of the suction nozzle can be stabilized.

[Brief description of the drawings]

FIG. 1 is a schematic diagram showing a cleaning liquid removing method using a cleaning liquid suction device 21 according to an embodiment of the present invention.

FIG. 2 is a simplified cross-sectional view of the cleaning liquid suction device 21.

FIG. 3 is a view showing a distal end surface 29 of the suction nozzle 22;

FIG. 4 is an experimental apparatus diagram of an experiment on a suction characteristic of the cleaning liquid suction apparatus 21 of the present invention.

FIG. 5 is a schematic view showing a conventional cleaning liquid removing method using an air knife 1.

FIG. 6 is a schematic view showing a conventional cleaning liquid removing method using a spatula-type remover 9;

FIG. 7 is a view showing a cleaning mechanism of a general cleaning device.

[Explanation of symbols] 5,23 Cleaning device 8,26 cleaning solution 21 Cleaning liquid suction device 22 Suction nozzle 24 transport rollers 25 Glass substrate 27 Suction piping 28 storage space 29 Tip 30 Top face 34 Suction pump 39 box 40 Negative pressure atmosphere area

────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-10-64798 (JP, A) JP-A-10-50650 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) B08B 3/04 H01L 21/027 H01L 21/304

Claims (2)

(57) [Claims] 1. A cleaning liquid suction device for cleaning a flat cleaning object with a cleaning liquid and removing a cleaning liquid remaining on one surface of the cleaning object in a film form by a suction nozzle. A tip end surface of the suction nozzle is arranged on the upper surface of the cleaning liquid with a gap therebetween, and an area of the tip end surface of the suction nozzle is at least three times an area of a suction hole of the suction nozzle. . 2. A box having a storage space for temporarily storing the cleaning liquid sucked by the suction nozzle, facing the storage space, and provided with a discharge hole for discharging the cleaning liquid discharged into the storage space. The cleaning liquid suction device according to claim 1, wherein the suction nozzle is disposed at a position higher than an upper end portion of the discharge hole in a storage space and connected to a box.