JP3539701B2 - Method for producing hydrohalic acid - Google Patents
Method for producing hydrohalic acid Download PDFInfo
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- JP3539701B2 JP3539701B2 JP09907395A JP9907395A JP3539701B2 JP 3539701 B2 JP3539701 B2 JP 3539701B2 JP 09907395 A JP09907395 A JP 09907395A JP 9907395 A JP9907395 A JP 9907395A JP 3539701 B2 JP3539701 B2 JP 3539701B2
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- Prior art keywords
- halogen
- hydrohalic acid
- water
- cathode
- exchange membrane
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- 239000002253 acid Substances 0.000 title claims description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 229910052736 halogen Inorganic materials 0.000 claims description 36
- 150000002367 halogens Chemical class 0.000 claims description 35
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 25
- 238000005868 electrolysis reaction Methods 0.000 claims description 13
- 238000005341 cation exchange Methods 0.000 claims description 12
- 239000012528 membrane Substances 0.000 claims description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 35
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 15
- 239000000758 substrate Substances 0.000 description 11
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 9
- 229910052801 chlorine Inorganic materials 0.000 description 9
- 239000000460 chlorine Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 7
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 239000003014 ion exchange membrane Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- -1 for example Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- 229920000557 Nafion® Polymers 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910001508 alkali metal halide Inorganic materials 0.000 description 2
- 150000008045 alkali metal halides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 229910000457 iridium oxide Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- GPRLSGONYQIRFK-MNYXATJNSA-N triton Chemical compound [3H+] GPRLSGONYQIRFK-MNYXATJNSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- RXPRRQLKFXBCSJ-GIVPXCGWSA-N vincamine Chemical compound C1=CC=C2C(CCN3CCC4)=C5[C@@H]3[C@]4(CC)C[C@](O)(C(=O)OC)N5C2=C1 RXPRRQLKFXBCSJ-GIVPXCGWSA-N 0.000 description 1
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- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Description
【0001】
【産業上の利用分野】
本発明は、ハロゲン化水素酸の製造方法に関するものであり、とくに電気分解によってハロゲンを原料に高純度のハロゲン化水素酸を製造する方法に関するものである。
【0002】
【従来の技術】
ハロゲン化水素酸として代表的な、塩酸は、一般には塩素と水素との燃焼反応によって得られる塩化水素を直ちに水に吸収させて製造している。高純度な塩化水素あるいは塩酸が必要な場合には、工業用の塩化水素を精製した高純度品と称される塩化水素あるいはそれらから製造した塩酸を入手して使用している。塩化水素、塩酸はいずれも腐食性が大きく、容器に保存したものでは、保存中に容器による汚染等のおそれもあり、使用場所において必要な量の高純度の塩化水素あるいは塩酸を製造する方法が求められていた。ところが、従来の塩化水素の合成方法では、高温の操作が必要となり、大規模な設備を要するので少量のみを使用場所において製造することはできなかった。
【0003】
純粋な塩酸を小規模に製造する方法として、塩酸を電解液として、ガス拡散電極からなる水素酸化極と塩素還元極を用い、水素および塩素を気相で供給し、塩素と水素の電池反応によって、塩酸の合成と電気エネルギーを得る方法が提案されている。この方法は、製造量を制御しながら合成可能であるという利点もあるが、塩酸あるいは塩素に対して耐久性に優れたガス拡散電極は得られておらず、またガス電極を透過した塩素が塩酸中に溶解し、対極の水素極で還元されるという欠点を有していた。
【0004】
【発明が解決しようとする課題】
本発明は、高純度のハロゲン化水素酸の製造方法を提供することを課題とするものであり、高度な分離精製操作を行うことなく高純度のハロゲン化水素酸を得ることを課題とするものであり、使用場所において高純度のハロゲン化水素酸を製造する方法を提供することを課題とするものである。
【0005】
【課題を解決するための手段】
本発明は、陽イオン交換膜で区画した電解槽の陰極室に、ハロゲンもしくはハロゲンを溶存する水を供給し、多孔性陽極および多孔性陰極を陽イオン交換膜と密着して電気分解を行い、陰極室からハロゲン化水素酸を得るハロゲン化水素酸の製造方法である。
すなわち、本発明の方法では、陽イオン交換膜を電解質として使用しているので、陰極室にはハロゲンまたはハロゲンを含有した水を供給し、陽極室もしくは陰極室の少なくともいずれか一方に水を加えながら電気分解を行ってハロゲン化水素酸を得ることができる。したがって、ハロゲン以外のものが混入する可能性はなく高純度のハロゲン化水素酸を得ることができる。
【0006】
本発明の方法に使用するハロゲンは、ボンベ等から供給あるいはアルカリ金属ハロゲン化物の水溶液の電気分解によって得られるものを用いることができる。また、陽極室、陰極室の少なくともいずれか一方に供給する水には超純水と称される純度の高いものを用いることによって高純度のハロゲン化水素酸を得ることができる。
【0007】
本発明のハロゲン化水素酸の製造方法を、図を参照して説明する。図1は、本発明のハロゲン化水素酸の製造方法を説明する図である。
ハロゲン1は、ハロゲン溶解槽2で水中または薄いハロゲン化水素酸中に溶解され、ハロゲン水を生成する。また、切換弁3および4によって流路を切り換えてハロゲンをハロゲン溶解槽を介さずに直接に電解槽に供給することもでき、この場合は、水を直接に陰極室あるいは陽極室に供給する。陽極室に供給した水は電気分解の電流によって陰極室に運搬される。
ハロゲンまたはハロゲン水は、陽イオン交換膜5で陽極室6と陰極室7に区画した電解槽8の陰極室7に導入する。多孔性の陽極9および多孔性の陰極10が陽イオン交換膜5と密着している。陽極室には水を導入して電気分解をすると、陰極室にはハロゲン化水素が生成し、ハロゲン化水素酸11として取り出される。また、陰極室に水またはハロゲン含有水が加えられる場合は、陰極室の水分が陽極室に供給されるために、陽極室に水を加えなくても良い。このように、ハロゲンは気体で供給するか低濃度のハロゲン化水素酸に溶解したハロゲンの溶解水として供給できる。気体として供給する場合は、1〜5気圧として、ガス拡散性の大きい陰極を使用した方が良い。電流密度は10〜50A/dm2 が好ましい。生成したハロゲン化水素酸、例えば塩化水素酸や塩酸中には、未反応のハロゲンが混入している。これを、水に吸収させた水溶液として再び電解槽に送り、溶解度分のハロゲンの還元に必要な電気量以上を通電することにより残留するハロゲンをほとんど分解することが可能である。
【0008】
本発明のハロゲン化水素酸の製造方法に用いる電解槽には、ハロゲン化水素酸等によって腐食を生じにくい電極、イオン交換膜等の構成材料が必要である。 陽極基体には、イオン交換膜を透過してハロゲンイオンが泳動する可能性があるので、ハロゲンに対して安定なチタン、ニオブ、タンタルおよびそれらの合金等の材料が好ましく、酸やハロゲン中において安定な酸化チタン等の導電性のセラミックスを用いてもよい。これらのなかでも、ニオブは導電性が大きく、ハロゲン中で安定であるのでとくに好ましい。
【0009】
また、電極触媒としては、白金、イリジウム等の貴金属、あるいはそれらの酸化物、又はそれらと薄膜形成性金属との複合酸化物が耐食性の面から好ましい。これらの触媒は粉末としてフッ素樹脂等の結着剤樹脂を用いて基体上に固着したり、あるいは電析、共電着、めっき、蒸着、熱分解被覆等により基体上に形成させても良い。電極触媒としては酸化イリジウムが消耗速度が小さいのでとくに好ましく、さらに、酸化イリジウムと酸化タンタルまたは酸化チタンの複合酸化物が好ましい。
ハロゲンをアルカリ金属ハロゲン化物水溶液の電解によって製造する場合には、ハロゲンとともに併産する水素を、陽極として用いた水素拡散電極に供給することによって電解電圧を減少させることができる。
【0010】
また、陰極基体にはハロゲン化水素酸中において安定な、炭素、ジルコニウム、ハフニウムニウム等の多孔性基体を用いることが好ましく、電極触媒には、白金、パラジウム等の白金族の金属を用いることが好ましい。陰極は、多孔体上に触媒粒子とフッ素樹脂および界面活性剤を有機溶媒に混合した組成物を塗布し、300〜370℃の温度において焼成して固着することによって作製することができる。溶液中に気体を溶解した溶液を使用した場合も、この陰極を使用することができるが、多孔性材料上に電着により白金を担持したものも使用することができる。陰極基体としては、ジルコニウムがとくに好ましく、電極触媒には白金がとくに好ましい。
【0011】
イオン交換膜には、ハロゲン、ハロゲン化水素酸に対して安定なフッ素樹脂系陽イオン交換膜が好ましく、ナフィオン350(デュポン社)等を挙げることができる。
陽極とイオン交換膜は水圧差或いは外部からの締付圧力により接触させるか、前もってホットプレス等により接合させる。
電解槽材料には、チタン等の金属基体上にガラスライニング材料を被覆することが好ましい。また耐食性が大きなフッ素樹脂を用いても良い。
電解液温度は10℃〜100℃が好ましく、1A/dm2〜100A/dm2の電流密度で運転することが好ましい。圧力は1〜5気圧とすることが好ましい。
【0012】
【作用】
本発明の方法は、陽イオン交換膜で区画し、陽イオン交換膜の両面に多孔性陽極と多孔性陰極を密着した電解槽の陰極室にハロゲンもしくはハロゲン溶解水を供給して電気分解をおこないハロゲン化水素酸を製造するものであり、原料にはハロゲンと水を使用しているのみであり、陰極室からは不純物が含まれていない高純度のハロゲン化水素酸を得る方法である。
【0013】
【実施例】
実施例1
電極面積0.2dm2 の陽極基体には、気液透過性のチタン製多孔体(東京製綱製の厚さ2mmのチタン繊維焼結体)を、陰極基体にはジルコニウム製多孔体(東京製綱製の厚さ2mmのチタン繊維焼結体)を用いた。平均粒径10nmの白金微粉末(真空冶金製)とフッ素樹脂の水懸濁液(三井・デュポンフロロケミカル製 30J)を、白金とフッ素樹脂の固形分の体積が等量となるように界面活性剤(ローム&ハース製 トライトン)を加えて混練し、陽極基体および陰極基体上に塗布し350℃において30分間焼成した。電極上の白金量は50g/m2 であった。
陽イオン交換膜(デュポン社製 ナフィオン117)の両側にそれらの電極を密着させた電解セルを構成した。陽極液として純水を毎分1mlの流量で供給し、陰極には毎分100mlの流量で塩素ガスを供給した。温度を30℃とし、10Aの電流を通電したところ、0.5Vの電解電圧で、陰極室出口から毎分0.7mlの塩化水素酸(35重量%)が回収された。収率は80%であった。
【0014】
実施例2
ハロゲンとして、塩素に代えて臭素を用いるとともに、陽極液として純水を毎分1mlで供給し、陰極室には毎分100mlで臭素を供給したところ、0.7Vの電解電圧で、陰極室出口から毎分0.7mlの臭化水素酸(50重量%)が得られた。収率は75%であった。
【0015】
実施例3
塩素をハロゲン溶解槽において水に溶解した得た塩素濃度5g/lの塩素溶存水を毎分10mlで陰極室に供給した点を除き実施例1と同様にして電気分解を行ったところ、濃度0.5重量%の塩化水素酸が毎分10ml得られた。
【0016】
【発明の効果】
水とハロゲンを原料として、ハロゲン化水素酸の使用箇所において高純度のハロゲン化水素酸を得ることができる。
【図面の簡単な説明】
【図1】本発明のハロゲン化水素酸の製造方法を説明する図である。
【符号の説明】
1…ハロゲン、2…ハロゲン溶解槽、3、4…切換弁、5…陽イオン交換膜、6…陽極室、7…陰極室、8…電解槽、9…多孔性の陽極、10…多孔性の陰極、11…ハロゲン化水素酸[0001]
[Industrial applications]
The present invention relates to a method for producing hydrohalic acid, and more particularly to a method for producing high-purity hydrohalic acid by using electrolysis as a raw material.
[0002]
[Prior art]
Hydrochloric acid, a typical example of hydrohalic acid, is generally produced by immediately absorbing hydrogen chloride obtained by a combustion reaction between chlorine and hydrogen into water. When high-purity hydrogen chloride or hydrochloric acid is required, hydrogen chloride called industrially-purified high-purity hydrogen chloride or hydrochloric acid produced therefrom is obtained and used. Both hydrogen chloride and hydrochloric acid are highly corrosive, and if they are stored in containers, there is a risk of contamination by the containers during storage.Therefore, there is a method to produce the required amount of high-purity hydrogen chloride or hydrochloric acid at the place of use. Was sought. However, in the conventional method for synthesizing hydrogen chloride, high-temperature operation is required, and large-scale equipment is required, so that it was not possible to produce only a small amount at the place of use.
[0003]
As a method of producing pure hydrochloric acid on a small scale, hydrogen and chlorine are supplied in a gas phase using hydrochloric acid as an electrolyte, a hydrogen oxidation electrode composed of a gas diffusion electrode and a chlorine reduction electrode, and a battery reaction of chlorine and hydrogen is performed. A method for synthesizing hydrochloric acid and obtaining electric energy has been proposed. This method has the advantage that it can be synthesized while controlling the production amount.However, a gas diffusion electrode having excellent durability against hydrochloric acid or chlorine has not been obtained, and chlorine permeating the gas electrode cannot be converted into hydrochloric acid. It had the disadvantage that it was dissolved in and reduced at the counter electrode hydrogen electrode.
[0004]
[Problems to be solved by the invention]
An object of the present invention is to provide a method for producing high-purity hydrohalic acid, and to obtain high-purity hydrohalic acid without performing an advanced separation and purification operation. It is an object of the present invention to provide a method for producing high-purity hydrohalic acid at a place of use.
[0005]
[Means for Solving the Problems]
The present invention provides a cathode chamber of an electrolytic cell partitioned by a cation exchange membrane, by supplying halogen or water in which halogen is dissolved, performing electrolysis by bringing a porous anode and a porous cathode into close contact with the cation exchange membrane, This is a method for producing hydrohalic acid from which a hydrohalic acid is obtained from a cathode chamber.
That is, in the method of the present invention, since the cation exchange membrane is used as the electrolyte, halogen or water containing halogen is supplied to the cathode chamber, and water is added to at least one of the anode chamber and the cathode chamber. While performing electrolysis, hydrohalic acid can be obtained. Therefore, it is possible to obtain a high-purity hydrohalic acid without the possibility that anything other than halogen is mixed.
[0006]
As the halogen used in the method of the present invention, a halogen supplied from a cylinder or the like or obtained by electrolysis of an aqueous solution of an alkali metal halide can be used. In addition, high-purity hydrohalic acid can be obtained by using high-purity water called ultrapure water as water supplied to at least one of the anode chamber and the cathode chamber.
[0007]
The method for producing hydrohalic acid of the present invention will be described with reference to the drawings. FIG. 1 is a diagram illustrating the method for producing hydrohalic acid of the present invention.
Halogen 1 is dissolved in water or dilute hydrohalic acid in halogen dissolving
Halogen or halogen water is introduced into a
[0008]
The electrolytic cell used in the method for producing hydrohalic acid according to the present invention requires constituent materials such as an electrode and an ion exchange membrane that are not easily corroded by hydrohalic acid or the like. Since the anode substrate has a possibility that halogen ions migrate through the ion-exchange membrane, materials such as titanium, niobium, tantalum and their alloys, which are stable against halogen, are preferable, and are stable in acids and halogens. Conductive ceramics such as titanium oxide may be used. Among these, niobium is particularly preferred because it has high conductivity and is stable in halogen.
[0009]
As the electrode catalyst, noble metals such as platinum and iridium, or oxides thereof, or composite oxides of these with thin film-forming metals are preferable from the viewpoint of corrosion resistance. These catalysts may be fixed on the substrate by using a binder resin such as a fluororesin as a powder, or may be formed on the substrate by electrodeposition, co-electrodeposition, plating, vapor deposition, thermal decomposition coating, or the like. As the electrode catalyst, iridium oxide is particularly preferred because of its low consumption rate, and a composite oxide of iridium oxide and tantalum oxide or titanium oxide is more preferred.
When the halogen is produced by electrolysis of an aqueous alkali metal halide solution, the electrolysis voltage can be reduced by supplying hydrogen produced together with the halogen to the hydrogen diffusion electrode used as the anode.
[0010]
Further, it is preferable to use a porous substrate such as carbon, zirconium, and hafniumium, which is stable in hydrohalic acid, as the cathode substrate, and to use a platinum group metal such as platinum or palladium as the electrode catalyst. preferable. The cathode can be prepared by applying a composition in which catalyst particles, a fluororesin and a surfactant are mixed with an organic solvent on a porous body, and baking and fixing the mixture at a temperature of 300 to 370 ° C. When a solution in which a gas is dissolved in a solution is used, the cathode can be used, but a material in which platinum is supported on a porous material by electrodeposition can also be used. Zirconium is particularly preferred for the cathode substrate, and platinum is particularly preferred for the electrode catalyst.
[0011]
The ion exchange membrane is preferably a fluororesin-based cation exchange membrane that is stable against halogen and hydrohalic acid, and includes Nafion 350 (DuPont) and the like.
The anode and the ion exchange membrane are brought into contact with each other by a water pressure difference or an external tightening pressure, or are previously joined by a hot press or the like.
The electrolytic cell material is preferably coated with a glass lining material on a metal substrate such as titanium. Further, a fluorine resin having high corrosion resistance may be used.
The temperature of the electrolyte is preferably from 10 ° C. to 100 ° C., and the operation is preferably performed at a current density of 1 A / dm 2 to 100 A / dm 2 . The pressure is preferably 1 to 5 atm.
[0012]
[Action]
In the method of the present invention, electrolysis is performed by supplying halogen or halogen-dissolved water to a cathode chamber of an electrolytic cell in which a porous anode and a porous cathode are adhered to both surfaces of a cation exchange membrane by partitioning with a cation exchange membrane. This is a method for producing hydrohalic acid, in which only halogen and water are used as raw materials, and a method for obtaining high-purity hydrohalic acid containing no impurities from a cathode chamber.
[0013]
【Example】
Example 1
A porous body made of gas-liquid permeable titanium (sintered titanium fiber having a thickness of 2 mm made by Tokyo Steel) is used for an anode substrate having an electrode area of 0.2 dm 2, and a porous body made of zirconium (made by Tokyo) is used for a cathode substrate. A 2 mm thick titanium fiber sintered body) was used. Surface activity of platinum fine powder (manufactured by vacuum metallurgy) having an average particle diameter of 10 nm and an aqueous suspension of fluororesin (30J, manufactured by DuPont Fluorochemicals, Mitsui) so that the volumes of solids of platinum and fluororesin are equal. An agent (Triton manufactured by Rohm & Haas) was added and kneaded, applied on the anode substrate and the cathode substrate, and baked at 350 ° C. for 30 minutes. The amount of platinum on the electrode was 50 g / m 2 .
An electrolysis cell was constructed in which the electrodes were adhered to both sides of a cation exchange membrane (Nafion 117 manufactured by DuPont). Pure water was supplied as an anolyte at a flow rate of 1 ml / min, and chlorine gas was supplied to the cathode at a flow rate of 100 ml / min. When the temperature was set to 30 ° C. and a current of 10 A was applied, 0.7 ml of hydrochloric acid (35% by weight) was recovered per minute from the cathode chamber outlet at an electrolysis voltage of 0.5 V. The yield was 80%.
[0014]
Example 2
As a halogen, bromine was used in place of chlorine, pure water was supplied as an anolyte at a rate of 1 ml / min, and bromine was supplied to the cathode chamber at a rate of 100 ml / min. Yielded 0.7 ml of hydrobromic acid (50% by weight) per minute. The yield was 75%.
[0015]
Example 3
Electrolysis was performed in the same manner as in Example 1 except that chlorine-dissolved water having a chlorine concentration of 5 g / l obtained by dissolving chlorine in water in a halogen dissolving tank was supplied to the cathode chamber at 10 ml / min. 10 ml of 0.5% by weight hydrochloric acid were obtained per minute.
[0016]
【The invention's effect】
Using water and halogen as raw materials, high-purity hydrohalic acid can be obtained at the location where hydrohalic acid is used.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating a method for producing hydrohalic acid of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Halogen, 2 ... Halogen dissolution tank, 3, 4 ... Switching valve, 5 ... Cation exchange membrane, 6 ... Anode compartment, 7 ... Cathode compartment, 8 ... Electrolyzer, 9 ... Porous anode, 10 ... Porous Negative electrode, 11 ... hydrohalic acid
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09907395A JP3539701B2 (en) | 1995-04-25 | 1995-04-25 | Method for producing hydrohalic acid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09907395A JP3539701B2 (en) | 1995-04-25 | 1995-04-25 | Method for producing hydrohalic acid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08296075A JPH08296075A (en) | 1996-11-12 |
| JP3539701B2 true JP3539701B2 (en) | 2004-07-07 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09907395A Expired - Fee Related JP3539701B2 (en) | 1995-04-25 | 1995-04-25 | Method for producing hydrohalic acid |
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| Country | Link |
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| JP (1) | JP3539701B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3307891B2 (en) * | 1998-12-22 | 2002-07-24 | 株式会社豊田中央研究所 | High heat-resistant polymer electrolyte and electrochemical device using the same |
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| JPH08296075A (en) | 1996-11-12 |
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