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JP3569259B2 - Perpendicular conduction type magnetoresistive element, magnetic head, and magnetic recording / reproducing device - Google Patents
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JP3569259B2 - Perpendicular conduction type magnetoresistive element, magnetic head, and magnetic recording / reproducing device - Google Patents

Perpendicular conduction type magnetoresistive element, magnetic head, and magnetic recording / reproducing device Download PDF

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JP3569259B2
JP3569259B2 JP2001398384A JP2001398384A JP3569259B2 JP 3569259 B2 JP3569259 B2 JP 3569259B2 JP 2001398384 A JP2001398384 A JP 2001398384A JP 2001398384 A JP2001398384 A JP 2001398384A JP 3569259 B2 JP3569259 B2 JP 3569259B2
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film
magnetoresistive
magnetic
magnetic field
facing surface
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JP2002305338A (en
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知己 船山
雅幸 高岸
将寿 吉川
公一 館山
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Toshiba Corp
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Toshiba Corp
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  • Measuring Magnetic Variables (AREA)
  • Magnetic Heads (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は垂直通電型磁気抵抗効果素子、垂直通電型磁気抵抗効果素子を含む磁気ヘッド、およびこの磁気ヘッドを搭載した磁気記録再生装置に関する。
【0002】
【従来の技術】
近年、ハードディスク装置などの磁気記録装置では急速に小型・高密度化が進んでおり、今後さらに高密度化されることが見込まれている。磁気記録において高密度化を達成するには、記録トラック幅を狭くして記録トラック密度を高めるとともに、長手方向の記録密度すなわち線記録密度を高める必要がある。
【0003】
しかし、面内の長手記録方式では記録密度が高くなるにつれ反磁界が大きくなり、再生出力の低下を招くとともに安定な記録が行えなくなるという問題点がある。これらの問題点を改善するために垂直記録方式が提案されている。垂直記録方式は記録媒体を膜面と垂直方向に磁化して記録するものであり、長手記録方式と比較して、記録密度を高めても反磁界の影響が少なく再生出力の低下などが抑制される。
【0004】
従来、長手記録方式、垂直記録方式ともに、媒体信号の再生には誘導型ヘッドが用いられてきたが、誘導型ヘッドでは高密度化に伴い記録トラック幅が狭くなり記録された磁化の大きさが小さくなると、十分な再生信号出力が得られなくなる。そこで、記録された磁化の大きさが小さくなっても十分な再生信号出力が得られるように、異方性磁気抵抗効果(AMR)を用いた再生感度の高いAMRヘッドが開発され、シールド型再生ヘッドとして用いられるようになった。最近では、巨大磁気抵抗効果(GMR)を応用した、より感度の高いスピンバルブ型GMRヘッドが用いられるようになっている。
【0005】
また、さらに高い再生感度が期待されるトンネル磁気抵抗効果(TMR)やCPP(Current Perpendicular to the Plane)−GMR素子を用いた磁気ヘッドの開発と実用化のための研究も進められている。これらの素子では膜面に垂直方向にセンス電流が流される。CPP−GMR素子は、例えば特開平10−55512号公報および米国特許第5,668,688号公報に開示されている。このように再生感度の高い磁気ヘッドが開発され、それらを用いることによって、記録ビットサイズがごく小さくなっても記録信号の再生が可能になってきた。
【0006】
記録トラックの線記録密度を高めるためには、磁気ヘッドのギャップを狭くする必要がある。従来の磁気抵抗効果を用いた磁気ヘッドでは1対のシールド間の間隔で規定されるヘッドギャップ内に磁気抵抗効果素子を形成している。AMRヘッドでもスピンバルブGMRヘッドでも、磁気抵抗効果素子の厚さとして30nm程度を必要とし、シールドとの絶縁を考慮するとシールド間の間隔として100nm程度を必要とする。このように従来の磁気ヘッドにおいては、ヘッドギャップを狭めることができる限度は100nm程度であり、線記録密度を高める上で大きな制約が生じている。こうした背景から、狭ギャップ化に対応するために、媒体対向面側にフラックスガイドを形成し、センサー部を媒体対向面から後退させて形成する構造が提案されている。特に、CPP−GMR素子では、シールド間にGMR素子と上下一対の電極を設置する必要があり、これらの厚さが狭ギャップ化に対して大きな制約となっている。そこで、CPP−GMR素子で狭ギャップ化に対応するためには、媒体対向面側にフラックスガイドを形成して電極部分を媒体対向面から後退させ、媒体対向面においてシールド間に薄いフラックスガイドのみが配置されるようにすることが有効である。
【0007】
磁気抵抗効果膜におけるバルクハウゼンノイズ(Barkhausen noise)を抑制するためには、磁気抵抗効果膜の両端にバイアス膜を設置してバイアス磁界を印加することが有効である。しかし、本発明者らは、記録密度向上のために狭トラック化が進むにつれ、バイアス膜間の距離を狭くすると、磁気抵抗効果膜にバイアス磁界が強くかかりすぎて磁化反転が困難になるため素子の感度が低下するという問題が生ずることを見出した。
【0008】
また、従来の膜面内にセンス電流を通電するCIP(Current In Plane)−GMR素子では、センス電流が作り出す電流磁界、ピン層からフリー層への静磁結合磁界、およびピン層−フリー層間の層間結合磁界という3つの磁界のバランスを取ることで動作点を決めていた。しかし、膜面に垂直にセンス電流を通電する素子では、センス電流磁界が電流中心に対し円形に加わるため、上述した動作点の設計手法が使えなくなる。しかも、センス電流磁界はセンス電流を供給する電極のエッジ部で最も強くかかるために、センサー感磁部である電極下部の磁気抵抗効果膜への媒体磁束の流入が妨げられ、センサーの感度が低下する。
【0009】
これらの問題は前述した特開平10−55512号公報および米国特許第5,668,688号のいずれにも示唆されておらず、これらの文献に開示されている構成では十分な解決が困難な課題である。
【0010】
上述したセンス電流磁界によって媒体磁束の流入が阻害されるという問題は、記録密度が高まるほどすなわちセンサーである磁気抵抗効果素子および電極のサイズが小さくなるほど顕著になる。例えば、100Gbpsiを越える記録密度に対応するために、電極のサイズを1μm□以下にすると、電極下部の磁気抵抗効果膜への媒体磁束の流入が妨げられる。特に電極のサイズが小さい場合、ある程度の出力を得るためには大きなセンス電流を通電する必要があるので、上述の問題点が顕著になる。
【0011】
実際に、(電極サイズ、GMR膜サイズ)が、それぞれ(0.5μm□、1.2μm□)、(0.3μm□、0.7μm□)、(0.2μm□、0.5μm□)、(0.1μm□、0.3μm□)である4種類のCPP−GMR素子を作製し、5mAのセンス電流を通電して、センス電流磁界が加わった状態でのGMR膜の磁束密度分布を調べた。その結果、(電極サイズ、GMR膜サイズ)が(0.5μm□、1.2μm□)であるCPP−GMR素子ではGMR膜の磁束密度は十分小さかったが、電極サイズが小さくなるにつれて、他の領域に比べて電極のエッジ部において、GMR膜の磁束密度が顕著に強くなることが認められた。図22に、電極サイズと、電極のエッジ部におけるGMR膜の最大磁束密度との関係を示す。また、図23に、(電極サイズ、GMR膜サイズ)が(0.1μm□、0.3μm□)であるCPP−GMR素子について、センス電流の大きさと電極のエッジ部におけるGMR膜の最大磁束密度との関係を示す。
【0012】
これらの結果を総合的に判断して、電極サイズが0.3μm□以下でセンス電流値が1mA以上の場合、特に0.1μm□以下でセンス電流値が3mA以上の場合には、電極下部への媒体磁束の流入が妨げられないような対策をとり、センサーの感度を上げることが必要になる。
【0013】
また、ハードディスクなどの磁気記憶装置では高記録密度化が進むにつれ磁気ヘッドと記憶媒体との距離である浮上量が徐々に低下している。このような浮上量の低下は、記憶媒体のわずかな突起にヘッドが衝突する確率が高まることを意味し、実際TA(Thermal Asperity)ノイズが問題となっている。したがって、磁気抵抗効果素子が直接媒体対向面に露出しないように、ヨークを介して磁束を磁気抵抗効果素子に引き込むヨーク型のヘッド構造を採用することが好ましい。ヨーク型磁気ヘッドのうちでも、磁気抵抗効果素子をその膜面が媒体対向面と平行するように設ける水平ヨーク型磁気ヘッドは、磁気抵抗効果素子全体を媒体近くに設置することができるため有利である。こうしたヨーク型磁気ヘッドにおいても、強いバイアス磁界が印加されたり、強いセンス電流磁界が印加されたりすると、センサーの感度が低下するという問題があり、センサーの感度を上げることが必要になる。
【0014】
【発明が解決しようとする課題】
本発明の目的は、垂直通電磁界およびバイアス磁界の影響を低減して感度を上げることができる垂直通電型磁気抵抗効果素子、この垂直通電型磁気抵抗効果素子を含む磁気ヘッド、およびこの磁気ヘッドを搭載した磁気記録再生装置を提供することにある。
【0015】
【課題を解決するための手段】
本発明の一態様に係る垂直通電型磁気抵抗効果素子は、磁気記録媒体に対向する媒体対向面を備え、磁気記録媒体からの信号磁束を検出する磁気抵抗効果素子であって、磁気抵抗効果膜と、前記磁気抵抗効果膜の膜面に対して垂直な方向に電流を通電可能とする一対の電極と、前記磁気抵抗効果膜の膜面に対して平行な方向にバイアス磁界を付与するバイアス印加膜とを具備し、前記電極のサイズは0.3μm□以下で前記磁気抵抗効果膜のサイズよりも小さく、前記磁気抵抗効果膜における信号磁束の流入部分の近傍で、前記バイアス印加膜の磁界の方向と前記磁気抵抗効果膜の膜面に対して垂直な方向に通電される電流により発生する磁界の方向とが実質的に反平行となることを特徴とする。
【0016】
本発明の他の態様に係る垂直通電型磁気抵抗効果素子は、磁気記録媒体に対向する媒体対向面を備え、磁気記録媒体からの信号磁束を検出する磁気抵抗効果素子であって、磁気抵抗効果膜と、前記磁気抵抗効果膜の膜面に対して垂直な方向に電流を通電可能とする一対の電極と、前記磁気抵抗効果膜の膜面に対して平行な方向にバイアス磁界を付与するバイアス印加膜と、前記磁気抵抗効果膜における信号磁束の流入部分の近傍に信号磁束を前記磁気抵抗効果膜に導くよう設けられた磁性層とを具備し、前記電極のサイズは0.3μm□以下で前記磁気抵抗効果膜のサイズよりも小さく、前記磁性層において前記バイアス印加膜の磁界の方向と前記磁気抵抗効果膜の膜面に対して垂直な方向に通電される電流により発生する磁界の方向とが実質的に反平行となることを特徴とする。
【0017】
上記の磁気抵抗効果膜の信号磁束が流入する側に設けられた磁性層は、信号磁束を磁気抵抗効果膜へ導入するフラックスガイドとして機能する。この磁性層は、磁気抵抗効果膜全体でもよいし、磁気抵抗効果膜のうちフリー層を媒体対向面側に延長して形成された磁性層でもよいし、磁気抵抗効果膜とは別に設けたNiFeなどの軟磁性層でもよい。
【0018】
【発明の実施の形態】
磁気抵抗効果膜はTMR膜であってもCPP−GMR膜であってもよい。CPP−GMR膜に含まれるGMR膜としては、例えば2層の強磁性層の間に導電性の非磁性中間層を挟んだ構造を有するものが挙げられる。この構造では、一方の強磁性層は例えば反強磁性層を積層することにより磁化が固着された磁化固着層(ピン層)として、他方の強磁性層は外部磁界により磁化が自由に回転する磁化自由層(フリー層)として機能する。なお、これらの層に加えて、下地層、保護層などを設けてもよい。
【0019】
バイアス印加膜としては、CoPtなどの硬質磁性膜や、PtMn、IrMnなどの反強磁性膜を用いることができる。磁気抵抗効果膜の膜面に沿って所定の方向にバイアス磁界を印加するように、磁気抵抗効果膜の両側に一対のバイアス印加膜が設けられる。バイアス印加膜は、磁気抵抗効果膜の両側に隣接して設置してもよいし、磁気抵抗効果膜の両側の下または上に設置してもよいし、磁気抵抗効果膜の両側の一部にオーバーラップさせるように設置してもよい。これらの設置方法はバイアス印加膜の磁気特性や膜厚に応じて、最適なバイアス磁界が磁気抵抗効果膜にかかるような組み合わせで選ぶことが望ましい。
【0020】
磁気抵抗効果膜の膜面に対してほぼ垂直な方向に電流を通電するように、磁気抵抗効果膜の上下に一対の電極が設けられる。電極はCuなどの導電膜で形成してもよく、また磁気抵抗効果膜のフリー層以外の部分、例えば保護膜、反強磁性膜、ピン層の部分を電極として用いてもよい。これらの電極は、磁気抵抗効果膜の中央部に、磁気抵抗効果膜の両側に設けられたバイアス印加膜から離し、かつ媒体対向面から後退するように設けることが好ましい。このように電極を設けると、電極と媒体対向面との間に存在する磁気抵抗効果膜はフラックスガイドとして機能する。なお、上述したように、フラックスガイドは、媒体対向面側へ延長して形成されたフリー層の一部でもよいし、磁気抵抗効果膜とは別に設けた軟磁性層でもよい。このようにして磁気抵抗効果膜の上下に設置された電極は、ピラー形状をなしており、バイアス印加膜近傍にあり強いバイアス磁界を受けて感度が低くなる領域を避けて感度の高い領域の磁気抵抗効果膜にのみセンス電流を絞って通電することができる。このため、磁気抵抗効果膜としてGMR膜を用いた場合に、その膜内の電流分布を最適にするのに有利である。なお、ほぼ同じ大きさの電極を磁気抵抗効果膜の上下に位置ずれなく形成することは困難なので、どちらか一方の電極を他方の電極に比べ広くすることで位置ずれ誤差の影響を軽減することが好ましい。
【0021】
フラックスガイドとする磁性層を磁気抵抗効果膜と別に設ける場合、この磁性層は、磁気抵抗効果膜のフリー層に接する構成となることが好ましいが、フリー層に磁束を導入可能であればこの構成に限定されるものではない。例えばフリー層とフラックスガイドとしての磁性層とが接触していなくともよく、これらの間に非磁性の薄い密着層などを介してもよい。
【0022】
また、フラックスガイドとしての磁性層は、バイアス印加膜に接する構成となることが好ましいが、バイアス印加膜がこの磁性層の端部で磁化が安定する程度に十分なバイアス磁界を印加可能であれば、この構成に限定されるものではない。例えばバイアス印加膜とフラックスガイドしての磁性層とが接触していなくともよく、これらの間に非磁性の薄い密着膜などを介してもよい。
【0023】
バイアス印加膜はフラックスガイドを含む磁気抵抗効果膜の両側に設けることが好ましい。この場合、フラックスガイドの媒体対向面側の端部を、バイアス印加膜の媒体対向面側の端部と同一平面上となるように形成してもよい。また、フラックスガイドの媒体対向面側の端部の一部を、バイアス印加膜の媒体対向面側の端部よりも媒体側へ突出するように形成してもよい。
【0024】
本実施形態の垂直通電型磁気抵抗効果素子では、信号磁束がセンサー感磁部へ流入する側において、バイアス印加膜の磁界と磁気抵抗効果膜の膜面に垂直に通電されるセンス電流磁界とが実質的に反平行となり、互いに打ち消す方向に働く。このため、磁気抵抗効果膜の信号磁束がセンサー感磁部へ流入する側の透磁率を高めることができ、磁気抵抗効果素子の最適な動作点を得ることができ、センサーの感度を高めることができる。なお、バイアス磁界とセンス電流磁界は必ずしも完全に打ち消す必要はなく、むしろ信号磁束流入側に弱いバイアス磁界をかけて単磁区化を図れば、バルクハウゼンノイズを抑制することもできる。このように、媒体対向面側においてセンス電流磁界とバイアス磁界とが反平行となるようにし、それぞれの磁界を適切に設定すれば、出力向上とバルクハウゼンノイズ抑制という2つの効果を両立させることができる。
【0025】
また、フラックスガイドの媒体対向面側の端部と、バイアス印加膜の媒体対向面側の端部とが、同一平面上となるように形成されている場合には、フラックスガイドにおいてバイアス磁界が安定になるうえに、製造工程も簡単になるという利点がある。
【0026】
本実施形態は、高記録密度化に対応するために、電極を小さくし、センス電流値を大きくした場合に、特に有効である。具体的には、電極サイズが0.3μm□以下でセンス電流値が1mA以上の場合、特に0.1μm□以下でセンス電流値が3mA以上の場合に、顕著な効果が得られる。
【0027】
センス電流Iは、磁気抵抗効果膜の信号磁束が流入する側でバイアス磁界の方向に対して実質的に反平行なセンス電流磁界が発生するように通電する場合を+方向とした場合、0<I<20mAの範囲に設定することが好ましい。この条件を満たしていれば、出力向上とバルクハウゼンノイズ抑制の両立が可能となる。このとき、センス電流磁界強度をバイアス磁界強度に対抗できるようにするのが好ましいが、センス電流が大きすぎると素子の発熱が問題となる。これらの観点から、センス電流Iを3≦I≦15mAの範囲に設定することがより好ましい。
【0028】
他の実施形態の垂直通電型磁気抵抗効果素子において、磁気抵抗効果膜は信号磁束に対する対向面の長さが信号磁束に対する対向面からの奥行よりも大きくしてもよい。この場合、磁気抵抗効果膜に形状異方性磁界が付与され、磁気抵抗効果膜の磁化が長手方向に安定になる。また、センス電流磁界、バイアス磁界および形状異方性磁界が印加されるので、磁気抵抗効果膜の透磁率を高めて最適動作点を安定して得られるようになるとともに、磁気抵抗効果膜の単磁区化も容易になり、結果として感度を高めることができる。
【0029】
さらに他の実施形態の垂直通電型磁気抵抗効果素子において、電極は信号磁束に対する対向面の長さが信号磁束に対する対向面からの奥行よりも大きくしてもよい。この場合、センス電流磁界が直線的になり、上記の効果が安定に得られるようになる。
【0030】
上記のような垂直通電型磁気抵抗効果素子は、これを挟むように形成された1対の磁気シールドと組み合わせて、シールド型ヘッドに適用することができる。この場合、磁気抵抗効果膜の媒体対向面側にフラックスガイドを設け、媒体対向面ではシールド間にフラックスガイドのみが配置されるようにし、媒体対向面側でバイアス磁界と磁気抵抗効果膜の膜面に垂直に通電されるセンス電流により発生する磁界とが実質的に反平行となるようにする。
【0031】
上記のような垂直通電型磁気抵抗効果素子は、信号磁束が導入される磁気ヨークと組み合わせてヨーク型ヘッドに適用することもできる。例えば、水平ヨーク型の場合、電極をギャップ直上からずらしてヨーク上などの実質的に不感部になる部分に対応する位置に配置し、ギャップ直上の最も感度の高い磁気抵抗効果膜の部分でバイアス磁界の方向と膜面に垂直に通電されるセンス電流により発生する磁界の方向が実質的に反平行となるようにすればよい。
【0032】
さらに他の実施形態においては、磁気記録媒体と、上記のような磁気ヘッドとを有する磁気記録再生装置も提供される。この磁気記録再生装置を用いて磁気記録を再生する際には、磁気記録媒体からの信号磁束が流入する側で、バイアス印加膜の磁界の方向と磁気抵抗効果膜の膜面に垂直に通電されるセンス電流により発生する磁界の方向とが実質的に反平行となるようにセンス電流を通電する。
【0033】
以下、本発明の実施形態について図面を参照しながら説明する。
図1は一実施形態に係る垂直通電型磁気抵抗効果素子の平面図である。この図において、下側が媒体対向面となる。磁気抵抗効果膜1としてはトンネル接合型磁気抵抗効果膜(TMR膜)またはCPP−GMR膜が用いられており、紙面に直交する方向に膜が積層されている。磁気抵抗効果膜1の上下には、Cuからなる電極2が形成されている。磁気抵抗効果膜1の両側にCoPtからなるバイアス印加膜3、3が配置されている。
【0034】
図2にTMR膜の例を示す。図2のTMR膜は、Taからなる下地層21、PtMnからなる反強磁性層22、CoFe/Ru/CoFeの三層膜からなる磁化固着層(ピン層)23、AlOxからなるトンネル接合層24、CoFe/NiFeの二層膜からなる磁化自由層(フリー層)25およびTaからなる保護層26を積層した構造を有する。
【0035】
図3にCPP−GMR膜の例を示す。図3のCPP−GMR膜は、Taからなる下地層31、PtMnからなる反強磁性層32、CoFe/Ru/CoFeの三層膜からなる磁化固着層(ピン層)33、Cuからなる非磁性中間層(スペーサー層)34、CoFe/NiFeの二層膜からなる磁化自由層(フリー層)35およびTaからなる保護層36を積層した構造を有する。
【0036】
なお、TMR膜またはCPP−GMR膜の各層の積層順序は図2または図3と逆になっていてもよい。また、TMR膜またはCPP−GMR膜は、フリー層を中心としてピン層が上下対称に設けられたデュアル型となっていてもよい。
【0037】
図4は図1の垂直通電型磁気抵抗効果素子の断面図である。この図に示されるように、バイアス印加膜3、3は、磁気抵抗効果膜1の両側に隣接して設置されている。なお、バイアス印加膜は、図5または図6に示すような仕方で配置してもよい。図5はバイアス印加膜3、3に磁気抵抗効果膜1をオーバーラップさせた場合を示している。図6は磁気抵抗効果膜1の上にバイアス印加膜3、3を設置した場合を示している。
【0038】
バイアス印加膜3、3としてCoPtのような硬質磁性膜を用いる場合は図4または図5の構造が望ましい。バイアス印加膜3、3としてPtMnのような反強磁性膜を用いる場合には図5または図6の構造が望ましい。
【0039】
図1に示したように、CoPtからなるバイアス印加膜3、3の着磁方向は図の左向きの方向に設定されている。センス電流は電極2に対して紙面の下から上向きに磁気抵抗効果膜1の膜面に垂直に通電され、電極2を中心として図の矢印で示す方向にセンス電流磁界が発生する。この結果、媒体からの信号磁束が流入する媒体対向面側で、バイアス印加膜3の磁界の方向と磁気抵抗効果膜1の膜面に垂直に通電される電流により発生する磁界の方向とが実質的に反平行となる。このように、媒体対向面側でバイアス磁界とセンス電流磁界が互いに打ち消す方向に働くので、磁気抵抗効果膜1の信号磁束がセンサー感磁部へ流入する側の透磁率の低下を抑制できる。また、媒体磁束が、センス電流磁界によって妨げられることなく、感磁部である電極直下の磁気抵抗効果膜に流入するので感度を維持することができる。一方、媒体対向面と反対側では両者の磁界が重なり合うため強いバイアス磁界が加わり、その部分での透磁率が低下する。しかし、この部分は感磁部でもなく媒体磁束の吸い込みにも寄与しないので問題とならない。
【0040】
図7は他の実施形態に係る垂直通電型磁気抵抗効果素子の平面図である。図7の素子は、バイアス印加膜3を磁気抵抗効果膜1の媒体対向面よりも後退して設けた以外は、図1と同様な構造を有する。
【0041】
この構造では、例えばバイアス膜間の距離が狭い場合のようにバイアス膜からの磁界が強すぎるときに、適度な大きさの磁界を磁気抵抗効果膜1の媒体対向面側にかけることが可能になる。
【0042】
図8および図9はそれぞれ他の実施形態に係る垂直通電型磁気抵抗効果素子の平面図である。図8の素子は、媒体対向面と反対側で電極2と重なっていない磁気抵抗効果膜1の部分をなくした以外は図1と同様な構造を有する。また、図9の素子は、媒体対向面と反対側で電極2と重なっていない磁気抵抗効果膜1の部分をなくした以外は図7と同様な構造を有する。
【0043】
図8または図9の素子では、媒体対向面と反対側においてバイアス磁界とセンス電流磁界が重なり合って透磁率が低下して磁化が動きにくくなる部分をなくしているので、その部分の影響により他の部分の磁化が動きにくくなるのを防ぐことができ、全体として感度の低下を防止できる。
【0044】
図10は他の実施形態に係る垂直通電型磁気抵抗効果素子の平面図である。この素子における磁気抵抗効果膜1は、媒体対向面に沿う長さが媒体対向面からの奥行よりも大きく、媒体対向面に沿って横長の形状となっている以外は図8と同様な構造を有する。この場合、磁気抵抗効果膜1に横方向の形状異方性を付与することができ、バイアス印加膜3、3からのバイアス磁界に異方性磁界を加えることができるので、磁気抵抗効果膜1を容易に単磁区化することができる。
【0045】
図11および図12はそれぞれ他の実施形態に係る垂直通電型磁気抵抗効果素子の平面図である。図11の素子は、バイアス印加膜3を磁気抵抗効果膜1の媒体対向面よりも後退して設けた以外は、図10と同様な構造を有する。図12の素子は、媒体対向面側の磁気抵抗効果素子1の突出部分の幅を電極2とほぼ同程度の幅にしている以外は図11と同様な構造を有する。
【0046】
これらの構造では、磁気抵抗効果膜にバイアス磁界とともに形状異方性磁界を加えて磁気抵抗効果膜を単磁区化しやすくするとともに、例えばバイアス膜間の距離が狭い場合のようにバイアス膜からの磁界が強すぎるときに適度な大きさの磁界を磁気抵抗効果膜1の媒体対向面側にかけることが可能になる。
【0047】
図13は他の実施形態に係る垂直通電型磁気抵抗効果素子の平面図である。図13の素子における電極2は、媒体対向面に沿う長さが媒体対向面からの奥行よりも大きく、媒体対向面に沿って横長の形状となっている以外は図1と同様な構造を有する。
【0048】
この構造では、媒体対向面側でのセンス電流磁界の直線性が良好になり、バイアス磁界との相殺効果が向上する。したがって、媒体対向面側の磁気抵抗効果膜1のバイアス制御がより容易になる。
【0049】
図14および図15はそれぞれ他の実施形態に係る垂直通電型磁気抵抗効果素子の平面図である。図14の素子は、バイアス印加膜3を磁気抵抗効果膜1の媒体対向面よりも後退して設けた以外は、図13と同様な構造を有する。図15の素子は、媒体対向面側の磁気抵抗効果素子1の突出部分の幅を電極2とほぼ同程度の幅にしている以外は図14と同様な構造を有する。
【0050】
これらの構造では、媒体対向面側でのセンス電流磁界の直線性が良好になりバイアス磁界との相殺効果が向上するともに、例えばバイアス膜間の距離が狭い場合のようにバイアス膜からの磁界が強すぎるときに適度な大きさの磁界を磁気抵抗効果膜1の媒体対向面側にかけることが可能になる。したがって、媒体対向面側の磁気抵抗効果膜1のバイアス制御がより一層容易になる。
【0051】
さらに図15のように、媒体対向面側の磁気抵抗効果素子1の突出部分の幅を電極2とほぼ同程度の幅にすると、磁気抵抗効果膜1に横方向の形状異方性を付与できる。したがって、バイアス磁界に形状異方性磁界を加えることができ、磁気抵抗効果膜をさらに容易に単磁区化することができる。
【0052】
図1および図7〜図15に示した磁気抵抗効果素子の構造のうちでは、図1、図8、図10および図13のように、磁気抵抗効果膜1の媒体対向面側の端部と、バイアス印加膜3の媒体対向面側の端部とが、同一平面上となっていることが好ましい。この場合、磁気抵抗効果膜1の媒体対向面側においてバイアス磁界が安定になるうえに、製造工程も簡単になるという効果が得られる。
【0053】
また、図1、図8、図10および図13では、磁気抵抗効果膜1の一部をフラックスガイドとして用いており、フラックスガイド部分の厚さは他の部分の磁気抵抗効果膜1の厚さと等しくなっている。一方、図16に示すように、磁気抵抗効果膜1と媒体対向面との間に、例えばNiFeなどからなる軟磁性層11を設けてフラックスガイドを形成し、軟磁性層11の媒体対向面側の端部と、バイアス印加膜3の媒体対向面側の端部とが、同一平面上となるようにしてもよい。なお、図16に示すフラックスガイドは、磁気抵抗効果膜1のフリー層のみを媒体対向面側に延長して形成してもよい。この場合にも、磁気抵抗効果膜1の媒体対向面側においてバイアス磁界が安定になるうえに、新たな層を形成する工程を要しないことから製造工程も簡単になるという効果が得られる。また、上記のようにフラックスガイドを磁気抵抗効果膜1とは別に設けられた磁性層または磁気抵抗効果膜1のフリー層の一部で形成すれば、フラックスガイドをより薄くできるので、狭ギャップ化に有利である。
【0054】
図17は一実施形態に係るシールド型磁気ヘッドの斜視図である。この図において、下側が媒体対向面となる。磁気抵抗効果膜1の上下には、Cuからなる電極2が形成されている。磁気抵抗効果膜1の両側にCoPtからなるバイアス印加膜3、3が配置されている。この磁気抵抗効果素子は図1と同様な構造を有する。さらに、電極2に接してNiFeからなる磁気シールド4が配置されている。なお、この図では、片側の磁気シールドは図示を省略している。
【0055】
図18は図17のシールド型磁気ヘッドを媒体対向面から見た平面図である。磁気抵抗効果膜1の上下には電極2、2が形成されている。磁気抵抗効果膜1の両側にはバイアス印加膜3、3が配置されている。これらの部材は一対のシールド4、4間にAlなどからなる絶縁膜6によって絶縁された状態で挟まれている。この実施形態では、磁気シールド4は通電リードを兼ねるものとして形成されている。
【0056】
このシールド型磁気ヘッドでは、媒体対向面側でCoPtからなるバイアス印加膜3の着磁方向とセンス電流磁界が相殺されるように、センス電流の通電方向が決められている。したがって、媒体磁束が、センス電流磁界に妨げられることなく、感磁部である電極2直下の磁気抵抗効果膜1に流入するので、シールド型磁気ヘッドの感度を維持することができる。
【0057】
なお、図1、図7乃至図15では、電極2の媒体対向面側の端面が磁気抵抗効果膜1の媒体対向面側の端面より後退した例を示した。しかし、原理的に磁気抵抗効果膜の信号磁束が流入する側でバイアス磁界の方向とセンス電流磁界の方向とが実質的に反平行になっていればよいので、これらの例に限らず、電極2の媒体対向面側の端面が磁気抵抗効果膜1の端面と同一面あるいはそれよりも媒体よりに形成された形態も本発明に含まれる。
【0058】
図19は一実施形態に係る水平ヨーク型磁気ヘッドの斜視図である。この図において、下側が媒体対向面となる。磁気抵抗効果膜1の上には、Cuからなる電極2が形成されている。磁気抵抗効果膜1の両側にCoPtからなるバイアス印加膜3、3が配置されている。さらに、磁気抵抗効果膜1の下側には、磁気ギャップを規定するNiFeからなる磁気ヨーク5が形成されている。電極2は磁気ヨーク5のギャップの真上からずれた位置に形成されており、磁気ヨーク5のギャップの真上に磁気抵抗効果膜1が位置している。電極2の下側に位置する磁気ヨーク5は他方の電極として機能する。
【0059】
この水平ヨーク型磁気ヘッドでは、磁気ヨーク5のギャップの真上に位置する磁気抵抗効果膜1の部分で、媒体対向面側でCoPtからなるバイアス印加膜3の着磁方向とセンス電流磁界が相殺されるように、センス電流の通電方向が決められている。したがって、媒体磁束が、センス電流磁界に妨げられることなく、感磁部である磁気抵抗効果膜1に流入するので、水平ヨーク型磁気ヘッドの感度を維持することができる。
【0060】
図20は他の実施形態に係る水平ヨーク型磁気ヘッドの斜視図である。図20の水平ヨーク型磁気ヘッドは、磁気ヨーク5の磁気ギャップの真上からずれた位置に、磁気ギャップに対して対称的な位置に2つの電極2、2を形成している以外は図19と同様な構造を有する。また、図示は省略しているが、磁気ヨーク5の磁気ギャップ先端部分は磁気抵抗効果膜よりも導電率の高いCuで埋められている。この水平ヨーク型磁気ヘッドでは、センス電流は一方の電極2から、磁気抵抗効果膜1、磁気ヨーク5、磁気ギャップ部のCu、磁気ヨーク5、磁気抵抗効果膜1を通り、他方の電極2へと流れる。
【0061】
この水平ヨーク型磁気ヘッドでも、磁気ヨーク5のギャップの真上に位置する磁気抵抗効果膜1の部分で、媒体対向面側でCoPtからなるバイアス印加膜3の着磁方向とセンス電流磁界が相殺されるように、センス電流の通電方向が決められている。したがって、媒体磁束が、センス電流磁界に妨げられることなく、感磁部である磁気抵抗効果膜1に流入するので、水平ヨーク型磁気ヘッドの感度を維持することができる。
【0062】
次に、本発明に係る磁気ヘッドを搭載した磁気ヘッドアセンブリ、およびこの磁気ヘッドアセンブリを搭載した磁気ディスク装置について説明する。
【0063】
図21(a)はCPP−GMRヘッドを搭載した磁気ヘッドアセンブリの斜視図である。アクチュエータアーム201は、磁気ディスク装置内の固定軸に固定されるための穴が設けられ、図示しない駆動コイルを保持するボビン部等を有する。アクチュエータアーム201の一端にはサスペンション202が固定されている。サスペンション202の先端にはCPP−GMRヘッドを搭載したヘッドスライダ203が取り付けられている。また、サスペンション202には信号の書き込みおよび読み取り用のリード線204が配線され、このリード線204の一端はヘッドスライダ203に組み込まれたCPP−GMRヘッドの各電極に接続され、リード線204の他端は電極パッド205に接続されている。
【0064】
図21(b)は図21(a)に示す磁気ヘッドアセンブリを搭載した磁気ディスク装置の内部構造を示す斜視図である。磁気ディスク211はスピンドル212に装着され、図示しない駆動装置制御部からの制御信号に応答する図示しないモータにより回転する。アクチュエータアーム201は固定軸213に固定され、サスペンション202およびその先端のヘッドスライダ203を支持している。磁気ディスク211が回転すると、ヘッドスライダ203の媒体対向面は磁気ディスク211の表面から所定量浮上した状態で保持され、情報の記録再生を行う。アクチュエータアーム201の基端にはリニアモータの1種であるボイスコイルモータ214が設けられている。ボイスコイルモータ214はアクチュエータアーム201のボビン部に巻き上げられた図示しない駆動コイルとこのコイルを挟み込むように対向して配置された永久磁石および対向ヨークからなる磁気回路とから構成される。アクチュエータアーム201は固定軸213の上下2個所に設けられた図示しないボールベアリングによって保持され、ボイスコイルモータ214により回転摺動が自在にできるようになっている。
【0065】
本発明の種々の実施形態に係る磁気抵抗効果素子は長手磁気記録方式だけでなく垂直磁気記録方式の磁気ヘッドまたは磁気記録再生装置にも適用することができ、同様の効果を得ることができる。磁気記録再生装置は固定式の記録媒体を備えたものでもよく、記録媒体がリムーバブルなものでもよい。
【0066】
本発明の種々の実施形態に係る磁気抵抗効果素子は、磁気的に情報を書き換え可能なMRAM(Magnetic Random Access Memory)にも適用することができ、同様の効果を得ることができる。
【0067】
その他、上述した実施形態に基づいて当業者が適宜設計変更して実施しうるすべての磁気抵抗効果素子、磁気ヘッドおよび磁気記憶再生装置も同様に本発明の範囲に属する。
【0068】
【発明の効果】
以上詳述したように本発明によれば、垂直通電磁界の影響を低減させることができる垂直通電型磁気抵抗効果素子、この垂直通電型磁気抵抗効果素子を含む磁気ヘッド、およびこの磁気ヘッドを搭載した磁気記録再生装置を提供することができる。
【図面の簡単な説明】
【図1】一実施形態に係る磁気抵抗効果素子の平面図。
【図2】TMR膜からなる磁気抵抗効果膜の断面図。
【図3】CPP−GMR膜からなる磁気抵抗効果膜の断面図。
【図4】一実施形態に係る磁気抵抗効果素子の断面図。
【図5】他の実施形態に係る磁気抵抗効果素子の断面図。
【図6】他の実施形態に係る磁気抵抗効果素子の断面図。
【図7】他の実施形態に係る磁気抵抗効果素子の平面図。
【図8】他の実施形態に係る磁気抵抗効果素子の平面図。
【図9】他の実施形態に係る磁気抵抗効果素子の平面図。
【図10】他の実施形態に係る磁気抵抗効果素子の平面図。
【図11】他の実施形態に係る磁気抵抗効果素子の平面図。
【図12】他の実施形態に係る磁気抵抗効果素子の平面図。
【図13】他の実施形態に係る磁気抵抗効果素子の平面図。
【図14】他の実施形態に係る磁気抵抗効果素子の平面図。
【図15】他の実施形態に係る磁気抵抗効果素子の平面図。
【図16】他の実施形態に係る磁気抵抗効果素子の平面図。
【図17】一実施形態に係るシールド型ヘッドの斜視図。
【図18】図17のシールド型ヘッドを媒体対向面から見た平面図。
【図19】一実施形態に係る水平ヨーク型ヘッドの斜視図。
【図20】他の実施形態に係る水平ヨーク型ヘッドの斜視図。
【図21】一実施形態に係る磁気ヘッドアセンブリの斜視図、および磁気ディスク装置の内部構造を示す斜視図。
【図22】電極サイズと電極のエッジ部において磁気抵抗効果膜にかかる最大磁束密度との関係を示す図。
【図23】センス電流の大きさと電極のエッジ部において磁気抵抗効果膜にかかる最大磁束密度との関係を示す図。
【符号の説明】
1…磁気抵抗効果膜
2…電極
3…バイアス印加膜
4…磁気シールド
5…磁気ヨーク
6…絶縁膜
11…軟磁性層
21…下地層
22…反強磁性層
23…磁化固着層(ピン層)
24…トンネル接合層
25…磁化自由層(フリー層)
26…保護層
31…下地層
32…反強磁性層
33…磁化固着層(ピン層)
34…非磁性中間層(スペーサー層)
35…磁化自由層(フリー層)
36…保護層
201…アクチュエータアーム
202…サスペンション
203…ヘッドスライダ
204…リード線
205…電極パッド
211…磁気ディスク
212…スピンドル
213…固定軸
214…ボイスコイルモータ
[0001]
TECHNICAL FIELD OF THE INVENTION
1. Field of the Invention The present invention relates to a perpendicular conduction type magneto-resistance effect element, a magnetic head including the perpendicular conduction type magneto-resistance effect element, and a magnetic recording / reproducing apparatus equipped with the magnetic head.
[0002]
[Prior art]
2. Description of the Related Art In recent years, magnetic recording devices such as hard disk devices have been rapidly reduced in size and density, and are expected to have even higher densities in the future. In order to achieve high density in magnetic recording, it is necessary to increase the recording density in the longitudinal direction, that is, to increase the recording density in the longitudinal direction, that is, increase the recording density in the recording direction by narrowing the recording track width.
[0003]
However, in the in-plane longitudinal recording method, there is a problem that the demagnetizing field increases as the recording density increases, which causes a decrease in the reproduction output and makes it impossible to perform stable recording. To improve these problems, a perpendicular recording system has been proposed. In the perpendicular recording method, recording is performed by magnetizing the recording medium in the direction perpendicular to the film surface.Compared with the longitudinal recording method, even if the recording density is increased, the influence of the demagnetizing field is small and the decrease in the reproduction output is suppressed. You.
[0004]
Conventionally, in both the longitudinal recording method and the perpendicular recording method, an inductive head has been used to reproduce a medium signal.However, in the inductive head, the recording track width becomes narrower as the density increases, and the magnitude of the recorded magnetization becomes smaller. If it becomes smaller, a sufficient reproduction signal output cannot be obtained. Therefore, an AMR head having high reproduction sensitivity using an anisotropic magnetoresistive effect (AMR) has been developed so that a sufficient reproduction signal output can be obtained even if the magnitude of the recorded magnetization is small. It was used as a head. In recent years, a spin valve type GMR head with higher sensitivity, which uses the giant magnetoresistance effect (GMR), has been used.
[0005]
In addition, researches for the development and practical use of a magnetic head using a tunnel magnetoresistive effect (TMR) and a current perpendicular to the plane (GMP) -GMR element, which are expected to have higher reproduction sensitivity, are also being conducted. In these elements, a sense current flows in a direction perpendicular to the film surface. The CPP-GMR element is disclosed in, for example, JP-A-10-55512 and U.S. Pat. No. 5,668,688. As described above, magnetic heads having high reproduction sensitivity have been developed, and by using them, it has become possible to reproduce a recording signal even when the recording bit size becomes extremely small.
[0006]
In order to increase the linear recording density of the recording track, it is necessary to narrow the gap of the magnetic head. In a conventional magnetic head using the magnetoresistive effect, a magnetoresistive element is formed in a head gap defined by a gap between a pair of shields. In both the AMR head and the spin valve GMR head, the thickness of the magnetoresistive element is required to be about 30 nm. In consideration of insulation with the shield, the distance between the shields is required to be about 100 nm. As described above, in the conventional magnetic head, the limit that the head gap can be reduced is about 100 nm, and there is a great restriction in increasing the linear recording density. From such a background, in order to cope with the narrowing of the gap, there has been proposed a structure in which a flux guide is formed on the medium facing surface side, and the sensor unit is formed to recede from the medium facing surface. In particular, in a CPP-GMR element, it is necessary to provide a GMR element and a pair of upper and lower electrodes between shields, and their thickness is a great constraint on narrowing the gap. Therefore, in order to cope with the narrowing of the gap in the CPP-GMR element, a flux guide is formed on the medium facing surface side to retreat the electrode portion from the medium facing surface, and only a thin flux guide is provided between the shields on the medium facing surface. It is effective to arrange them.
[0007]
In order to suppress Barkhausen noise in the magnetoresistive film, it is effective to provide a bias film at both ends of the magnetoresistive film and apply a bias magnetic field. However, the inventors of the present invention have proposed that, as the track becomes narrower in order to improve the recording density, if the distance between the bias films is reduced, the bias magnetic field is applied too strongly to the magnetoresistive film, and the magnetization reversal becomes difficult. Has been found to cause a problem that the sensitivity of the film decreases.
[0008]
Further, in a conventional CIP (Current In Plane) -GMR element in which a sense current flows in a film plane, a current magnetic field generated by the sense current, a magnetostatic coupling magnetic field from the pin layer to the free layer, and a magnetic field between the pin layer and the free layer The operating point has been determined by balancing the three magnetic fields called interlayer coupling magnetic fields. However, in an element in which a sense current flows perpendicularly to the film surface, the sense current magnetic field is applied in a circular shape with respect to the current center, so that the above-described operating point design method cannot be used. In addition, since the sense current magnetic field is strongest at the edge of the electrode supplying the sense current, the flow of the medium magnetic flux into the magnetoresistive film under the electrode, which is the sensor magnetic sensing part, is prevented, and the sensitivity of the sensor decreases. I do.
[0009]
These problems are not suggested in any of the above-mentioned Japanese Patent Application Laid-Open No. H10-55512 and US Pat. No. 5,668,688, and the configuration disclosed in these documents is difficult to solve sufficiently. It is.
[0010]
The problem that the inflow of the medium magnetic flux is inhibited by the sense current magnetic field described above becomes more remarkable as the recording density increases, that is, as the size of the magnetoresistive element and the electrode serving as a sensor decreases. For example, in order to cope with a recording density exceeding 100 Gbpsi, if the size of the electrode is set to 1 μm □ or less, the flow of the medium magnetic flux into the magnetoresistive film under the electrode is prevented. In particular, when the size of the electrode is small, it is necessary to supply a large sense current in order to obtain a certain level of output.
[0011]
Actually, (electrode size, GMR film size) are (0.5 μm □, 1.2 μm □), (0.3 μm □, 0.7 μm □), (0.2 μm □, 0.5 μm □), respectively. (0.1 μm □, 0.3 μm □), four types of CPP-GMR elements were fabricated, a 5 mA sense current was passed, and the magnetic flux density distribution of the GMR film in a state where a sense current magnetic field was applied was examined. Was. As a result, in the CPP-GMR element having (electrode size, GMR film size) of (0.5 μm □, 1.2 μm □), the magnetic flux density of the GMR film was sufficiently small. It was recognized that the magnetic flux density of the GMR film was significantly higher at the edge of the electrode than in the region. FIG. 22 shows the relationship between the electrode size and the maximum magnetic flux density of the GMR film at the edge of the electrode. FIG. 23 shows the magnitude of the sense current and the maximum magnetic flux density of the GMR film at the edge of the electrode for the CPP-GMR element in which (electrode size, GMR film size) is (0.1 μm □, 0.3 μm □). Shows the relationship with
[0012]
Judging these results comprehensively, when the electrode size is 0.3 μm or less and the sense current value is 1 mA or more, particularly when the electrode size is 0.1 μm or less and the sense current value is 3 mA or more, It is necessary to take measures to prevent the flow of the medium magnetic flux from being obstructed and to increase the sensitivity of the sensor.
[0013]
Further, in magnetic storage devices such as hard disks, the flying height, which is the distance between the magnetic head and the storage medium, gradually decreases as the recording density increases. Such a decrease in the flying height means that the probability that the head collides with a slight protrusion of the storage medium increases, and TA (Thermal Asperity) noise is actually a problem. Therefore, it is preferable to adopt a yoke type head structure in which magnetic flux is drawn into the magnetoresistive element via the yoke so that the magnetoresistive element is not directly exposed to the medium facing surface. Among the yoke type magnetic heads, the horizontal yoke type magnetic head in which the magnetoresistive element is provided so that its film surface is parallel to the medium facing surface is advantageous because the entire magnetoresistive element can be installed near the medium. is there. Even in such a yoke type magnetic head, when a strong bias magnetic field is applied or a strong sense current magnetic field is applied, there is a problem that the sensitivity of the sensor decreases, and it is necessary to increase the sensitivity of the sensor.
[0014]
[Problems to be solved by the invention]
SUMMARY OF THE INVENTION An object of the present invention is to provide a vertical conduction type magnetoresistive element capable of increasing the sensitivity by reducing the effects of a vertical conduction magnetic field and a bias magnetic field, a magnetic head including the vertical conduction type magnetoresistive element, and a magnetic head including the same. It is an object of the present invention to provide a magnetic recording / reproducing device mounted.
[0015]
[Means for Solving the Problems]
The perpendicular conduction type magnetoresistive element according to one embodiment of the present invention, A magneto-resistive element having a medium facing surface facing the magnetic recording medium and detecting a signal magnetic flux from the magnetic recording medium, A magnetoresistive film, a pair of electrodes that allow current to flow in a direction perpendicular to the film surface of the magnetoresistive film, and a bias magnetic field in a direction parallel to the film surface of the magnetoresistive film. And a bias applying film to be applied. The size of the electrode is 0.3 μm or less and smaller than the size of the magnetoresistive film, In the vicinity of the influx of the signal magnetic flux in the magnetoresistive film, the direction of the magnetic field generated by the current flowing in the direction perpendicular to the film surface of the magnetoresistive film and the direction of the magnetic field of the bias applying film. Are substantially antiparallel.
[0016]
The perpendicular conduction type magnetoresistive element according to another aspect of the present invention, A magneto-resistive element having a medium facing surface facing the magnetic recording medium and detecting a signal magnetic flux from the magnetic recording medium, A magnetoresistive film, a pair of electrodes that allow current to flow in a direction perpendicular to the film surface of the magnetoresistive film, and a bias magnetic field in a direction parallel to the film surface of the magnetoresistive film. A bias applying film to be applied, and a magnetic layer provided near the inflow portion of the signal magnetic flux in the magnetoresistive effect film, the magnetic layer being provided to guide the signal magnetic flux to the magnetoresistive effect film, The size of the electrode is 0.3 μm or less and smaller than the size of the magnetoresistive film, In the magnetic layer, a direction of a magnetic field of the bias applying film and a direction of a magnetic field generated by a current flowing in a direction perpendicular to a film surface of the magnetoresistive film are substantially antiparallel. And
[0017]
The magnetic layer provided on the side of the magnetoresistive film into which the signal magnetic flux flows functions as a flux guide for introducing the signal magnetic flux into the magnetoresistive film. This magnetic layer may be the entire magnetoresistive film, a magnetic layer formed by extending the free layer of the magnetoresistive film toward the medium facing surface, or a NiFe film formed separately from the magnetoresistive film. Or a soft magnetic layer.
[0018]
BEST MODE FOR CARRYING OUT THE INVENTION
The magnetoresistive film may be a TMR film or a CPP-GMR film. As the GMR film included in the CPP-GMR film, for example, a film having a structure in which a conductive non-magnetic intermediate layer is sandwiched between two ferromagnetic layers is exemplified. In this structure, one ferromagnetic layer is a pinned layer (pinned layer) in which the magnetization is fixed by stacking, for example, an antiferromagnetic layer, and the other ferromagnetic layer is a magnetization in which the magnetization is freely rotated by an external magnetic field. It functions as a free layer (free layer). Note that a base layer, a protective layer, and the like may be provided in addition to these layers.
[0019]
As the bias applying film, a hard magnetic film such as CoPt or an antiferromagnetic film such as PtMn or IrMn can be used. A pair of bias applying films are provided on both sides of the magnetoresistive film so as to apply a bias magnetic field in a predetermined direction along the film surface of the magnetoresistive film. The bias application film may be provided adjacent to both sides of the magnetoresistive film, may be provided below or above both sides of the magnetoresistive film, or may be provided on a part of both sides of the magnetoresistive film. You may install so that it may overlap. It is desirable to select these installation methods in a combination such that an optimum bias magnetic field is applied to the magnetoresistive film according to the magnetic characteristics and the film thickness of the bias application film.
[0020]
A pair of electrodes are provided above and below the magnetoresistive film so that current flows in a direction substantially perpendicular to the film surface of the magnetoresistive film. The electrode may be formed of a conductive film such as Cu, or a portion of the magnetoresistive effect film other than the free layer, for example, a protective film, an antiferromagnetic film, or a pinned layer may be used as the electrode. These electrodes are preferably provided at the center of the magnetoresistive film so as to be separated from the bias application films provided on both sides of the magnetoresistive film and to recede from the medium facing surface. When the electrodes are provided in this manner, the magnetoresistive film existing between the electrodes and the medium facing surface functions as a flux guide. As described above, the flux guide may be a part of the free layer formed to extend to the medium facing surface side, or may be a soft magnetic layer provided separately from the magnetoresistive film. The electrodes placed above and below the magnetoresistive film are pillar-shaped, and are located near the bias application film, avoiding the region where the sensitivity is low due to the strong bias magnetic field and avoiding the region where the sensitivity is low. It is possible to conduct current by narrowing the sense current only to the resistance effect film. Therefore, when a GMR film is used as the magnetoresistive effect film, it is advantageous to optimize the current distribution in the film. Since it is difficult to form electrodes of substantially the same size above and below the magnetoresistive effect film without displacement, it is necessary to reduce the effect of displacement errors by making one of the electrodes wider than the other. Is preferred.
[0021]
When a magnetic layer serving as a flux guide is provided separately from the magnetoresistive film, it is preferable that the magnetic layer be in contact with the free layer of the magnetoresistive film. However, the present invention is not limited to this. For example, the free layer and the magnetic layer as a flux guide do not need to be in contact with each other, and a non-magnetic thin adhesive layer may be interposed between them.
[0022]
The magnetic layer serving as a flux guide preferably has a configuration in contact with the bias applying film. However, if the bias applying film can apply a bias magnetic field sufficient to stabilize the magnetization at the end of the magnetic layer. However, the present invention is not limited to this configuration. For example, the bias application film and the flux-guided magnetic layer need not be in contact with each other, and a non-magnetic thin adhesive film or the like may be interposed between them.
[0023]
It is preferable that the bias applying films are provided on both sides of the magnetoresistive film including the flux guide. In this case, the end of the flux guide on the medium facing surface side may be formed so as to be flush with the end of the bias applying film on the medium facing surface side. Further, a part of the end of the flux guide on the medium facing surface side may be formed so as to protrude more toward the medium than the end of the bias applying film on the medium facing surface side.
[0024]
In the perpendicular conduction type magnetoresistive element of this embodiment, on the side where the signal magnetic flux flows into the sensor magnetic sensing part, the magnetic field of the bias applying film and the sense current magnetic field perpendicularly applied to the film surface of the magnetoresistive effect film are different. They are substantially anti-parallel and work in directions to cancel each other. For this reason, the magnetic permeability on the side where the signal magnetic flux of the magnetoresistive film flows into the magnetic sensing part of the sensor can be increased, and the optimum operating point of the magnetoresistive element can be obtained, and the sensitivity of the sensor can be increased. it can. It is not always necessary to completely cancel the bias magnetic field and the sense current magnetic field. Rather, a Barkhausen noise can be suppressed by applying a weak bias magnetic field to the signal flux inflow side to achieve a single magnetic domain. As described above, if the sense current magnetic field and the bias magnetic field are antiparallel to each other on the medium facing surface side and the respective magnetic fields are appropriately set, the two effects of output enhancement and Barkhausen noise suppression can be achieved at the same time. it can.
[0025]
When the end of the flux guide on the medium facing surface side and the end of the bias applying film on the medium facing surface are formed on the same plane, the bias magnetic field is stable in the flux guide. In addition, there is an advantage that the manufacturing process is simplified.
[0026]
This embodiment is particularly effective when the electrodes are made smaller and the sense current value is made larger in order to cope with higher recording density. Specifically, a remarkable effect is obtained when the electrode size is 0.3 μm □ or less and the sense current value is 1 mA or more, particularly when the electrode size is 0.1 μm □ or less and the sense current value is 3 mA or more.
[0027]
The sense current I is 0 <when the current is applied to generate a sense current magnetic field substantially anti-parallel to the direction of the bias magnetic field on the side where the signal magnetic flux of the magnetoresistive film flows, and 0 < It is preferable to set the range of I <20 mA. If this condition is satisfied, it is possible to achieve both improvement in output and suppression of Barkhausen noise. At this time, it is preferable that the intensity of the sense current magnetic field be made to be able to oppose the intensity of the bias magnetic field. However, if the sense current is too large, heat generation of the element becomes a problem. From these viewpoints, it is more preferable to set the sense current I in the range of 3 ≦ I ≦ 15 mA.
[0028]
In another embodiment, the length of the surface of the magnetoresistive film facing the signal magnetic flux may be larger than the depth of the surface facing the signal magnetic flux from the surface facing the signal magnetic flux. In this case, a shape anisotropic magnetic field is applied to the magnetoresistive film, and the magnetization of the magnetoresistive film becomes stable in the longitudinal direction. In addition, since the sense current magnetic field, the bias magnetic field, and the shape anisotropic magnetic field are applied, the permeability of the magnetoresistive effect film is increased, so that the optimum operating point can be stably obtained. Magnetic domain formation is also facilitated, and as a result, sensitivity can be increased.
[0029]
In still another embodiment of the vertical conduction type magnetoresistive element, the length of the surface of the electrode facing the signal magnetic flux may be larger than the depth from the surface facing the signal magnetic flux. In this case, the sense current magnetic field becomes linear, and the above effect can be obtained stably.
[0030]
The perpendicular conduction type magnetoresistance effect element as described above can be applied to a shield type head in combination with a pair of magnetic shields formed so as to sandwich the element. In this case, a flux guide is provided on the medium facing surface side of the magnetoresistive film, and only the flux guide is arranged between the shields on the medium facing surface, and the bias magnetic field and the film surface of the magnetoresistive film are arranged on the medium facing surface side. And a magnetic field generated by a sense current that is perpendicularly applied to the sensor is substantially anti-parallel.
[0031]
The perpendicular conduction type magnetoresistance effect element as described above can be applied to a yoke type head in combination with a magnetic yoke into which a signal magnetic flux is introduced. For example, in the case of the horizontal yoke type, the electrode is shifted from immediately above the gap and arranged at a position corresponding to a substantially insensitive portion such as on the yoke, and the bias is applied to the most sensitive magnetoresistive film immediately above the gap. It is sufficient that the direction of the magnetic field is substantially antiparallel to the direction of the magnetic field generated by the sense current flowing perpendicularly to the film surface.
[0032]
In still another embodiment, a magnetic recording / reproducing apparatus including a magnetic recording medium and a magnetic head as described above is also provided. When reproducing magnetic recording using this magnetic recording / reproducing apparatus, a current is applied perpendicularly to the direction of the magnetic field of the bias applying film and the film surface of the magnetoresistive film on the side where the signal magnetic flux from the magnetic recording medium flows. The sense current is applied so that the direction of the magnetic field generated by the sense current is substantially anti-parallel.
[0033]
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a plan view of a perpendicular conduction type magnetoresistive element according to one embodiment. In this figure, the lower side is the medium facing surface. As the magnetoresistive film 1, a tunnel junction type magnetoresistive film (TMR film) or a CPP-GMR film is used, and the films are stacked in a direction perpendicular to the plane of the drawing. Above and below the magnetoresistive film 1, electrodes 2 made of Cu are formed. Bias applying films 3 and 3 made of CoPt are arranged on both sides of the magnetoresistive film 1.
[0034]
FIG. 2 shows an example of the TMR film. The TMR film of FIG. 2 includes an underlayer 21 made of Ta, an antiferromagnetic layer 22 made of PtMn, a pinned layer (pin layer) 23 made of a three-layered film of CoFe / Ru / CoFe, and a tunnel junction layer 24 made of AlOx. , A free layer 25 composed of a two-layer film of CoFe / NiFe and a protective layer 26 composed of Ta are laminated.
[0035]
FIG. 3 shows an example of the CPP-GMR film. The CPP-GMR film shown in FIG. 3 includes a base layer 31 made of Ta, an antiferromagnetic layer 32 made of PtMn, a pinned layer (pin layer) 33 made of a three-layer film of CoFe / Ru / CoFe, and a nonmagnetic layer made of Cu. It has a structure in which an intermediate layer (spacer layer) 34, a magnetization free layer (free layer) 35 composed of a two-layer film of CoFe / NiFe, and a protective layer 36 composed of Ta are laminated.
[0036]
Note that the stacking order of each layer of the TMR film or the CPP-GMR film may be opposite to that of FIG. 2 or FIG. Further, the TMR film or the CPP-GMR film may be of a dual type in which a pin layer is provided symmetrically with respect to a free layer.
[0037]
FIG. 4 is a sectional view of the vertical conduction type magnetoresistive element of FIG. As shown in this figure, the bias application films 3 are disposed adjacent to both sides of the magnetoresistive film 1. The bias application film may be arranged in a manner as shown in FIG. 5 or FIG. FIG. 5 shows a case where the magnetoresistive film 1 overlaps the bias applying films 3 and 3. FIG. 6 shows a case where the bias application films 3 and 3 are provided on the magnetoresistive film 1.
[0038]
When a hard magnetic film such as CoPt is used as the bias applying films 3 and 3, the structure shown in FIG. 4 or 5 is desirable. When an antiferromagnetic film such as PtMn is used as the bias applying films 3 and 3, the structure shown in FIG.
[0039]
As shown in FIG. 1, the magnetization direction of the bias application films 3 and 3 made of CoPt is set to the left direction in the figure. The sense current is applied perpendicularly to the film surface of the magnetoresistive film 1 with respect to the electrode 2 from the bottom of the paper upward, and a sense current magnetic field is generated around the electrode 2 in the direction indicated by the arrow in the figure. As a result, on the side of the medium facing surface where the signal magnetic flux from the medium flows, the direction of the magnetic field of the bias applying film 3 and the direction of the magnetic field generated by the current flowing perpendicularly to the film surface of the magnetoresistive film 1 are substantially the same. Become antiparallel. As described above, since the bias magnetic field and the sense current magnetic field act in the direction to cancel each other out on the medium facing surface side, it is possible to suppress a decrease in the magnetic permeability on the side where the signal magnetic flux of the magnetoresistive film 1 flows into the sensor magnetic sensing part. In addition, since the medium magnetic flux flows into the magnetoresistive film just below the electrode, which is the magnetic sensing portion, without being hindered by the sense current magnetic field, the sensitivity can be maintained. On the other hand, on the side opposite to the medium facing surface, both magnetic fields overlap, so a strong bias magnetic field is applied, and the magnetic permeability at that portion decreases. However, this part is not a problem because it is not a magnetically sensitive part and does not contribute to the suction of the medium magnetic flux.
[0040]
FIG. 7 is a plan view of a vertical conduction type magnetoresistive element according to another embodiment. The device of FIG. 7 has the same structure as that of FIG. 1 except that the bias application film 3 is provided to be recessed from the medium facing surface of the magnetoresistive effect film 1.
[0041]
With this structure, when the magnetic field from the bias film is too strong, for example, when the distance between the bias films is small, it is possible to apply an appropriate magnetic field to the medium facing surface side of the magnetoresistive film 1. Become.
[0042]
8 and 9 are plan views of a current-perpendicular-to-plane type magnetoresistive element according to another embodiment. The element shown in FIG. 8 has the same structure as that of FIG. 1 except that the portion of the magnetoresistive film 1 not overlapping the electrode 2 on the side opposite to the medium facing surface is eliminated. 9 has the same structure as that of FIG. 7 except that the portion of the magnetoresistive film 1 that does not overlap the electrode 2 on the side opposite to the medium facing surface is eliminated.
[0043]
In the element shown in FIG. 8 or FIG. 9, since the bias magnetic field and the sense current magnetic field overlap each other on the side opposite to the medium facing surface, the portion where the magnetic permeability is reduced and the magnetization becomes difficult to move is eliminated. It is possible to prevent the magnetization of the portion from becoming difficult to move, and to prevent a decrease in sensitivity as a whole.
[0044]
FIG. 10 is a plan view of a vertical conduction type magnetoresistive element according to another embodiment. The magnetoresistive effect film 1 of this element has the same structure as that of FIG. 8 except that the length along the medium facing surface is longer than the depth from the medium facing surface and is horizontally long along the medium facing surface. Have. In this case, it is possible to impart lateral shape anisotropy to the magnetoresistive effect film 1 and to apply an anisotropic magnetic field to the bias magnetic field from the bias applying films 3, 3. Can be easily made into a single magnetic domain.
[0045]
FIG. 11 and FIG. 12 are plan views of a perpendicular conduction type magnetoresistive element according to another embodiment. The device of FIG. 11 has the same structure as that of FIG. 10 except that the bias applying film 3 is provided so as to be recessed from the medium facing surface of the magnetoresistive effect film 1. The element of FIG. 12 has the same structure as that of FIG. 11 except that the width of the protruding portion of the magnetoresistive element 1 on the medium facing surface side is set to be substantially the same as the width of the electrode 2.
[0046]
In these structures, a bias magnetic field and a shape anisotropic magnetic field are applied to the magnetoresistive effect film to easily form the magnetoresistive effect film into a single magnetic domain, and the magnetic field from the bias film as in the case where the distance between the bias films is small, for example. Is too strong, an appropriate magnetic field can be applied to the medium facing surface side of the magnetoresistive film 1.
[0047]
FIG. 13 is a plan view of a vertical conduction type magnetoresistive element according to another embodiment. The electrode 2 in the element of FIG. 13 has the same structure as that of FIG. 1 except that the length along the medium facing surface is longer than the depth from the medium facing surface and the shape is horizontally long along the medium facing surface. .
[0048]
With this structure, the linearity of the sense current magnetic field on the medium facing surface side is improved, and the effect of canceling the bias magnetic field is improved. Therefore, the bias control of the magnetoresistive film 1 on the medium facing surface side becomes easier.
[0049]
14 and 15 are plan views of a current-perpendicular-to-plane type magnetoresistive element according to another embodiment. The device of FIG. 14 has the same structure as that of FIG. 13 except that the bias applying film 3 is provided so as to be recessed from the medium facing surface of the magnetoresistive effect film 1. The element of FIG. 15 has the same structure as that of FIG. 14 except that the width of the protruding portion of the magnetoresistive element 1 on the medium facing surface side is set to be substantially the same as the width of the electrode 2.
[0050]
With these structures, the linearity of the sense current magnetic field on the medium facing surface side is improved, the effect of offsetting with the bias magnetic field is improved, and the magnetic field from the bias film is reduced, for example, when the distance between the bias films is small. When it is too strong, it is possible to apply an appropriate magnetic field to the medium facing surface side of the magnetoresistive film 1. Therefore, the bias control of the magnetoresistive film 1 on the medium facing surface side is further facilitated.
[0051]
Further, as shown in FIG. 15, when the width of the protruding portion of the magnetoresistive element 1 on the medium facing surface side is set to be substantially the same as the width of the electrode 2, the magnetoresistive film 1 can be given lateral shape anisotropy. . Therefore, a shape anisotropic magnetic field can be applied to the bias magnetic field, and the magnetoresistive film can be more easily made into a single magnetic domain.
[0052]
In the structure of the magnetoresistance effect element shown in FIGS. 1 and 7 to 15, as shown in FIGS. 1, 8, 10 and 13, the end of the magnetoresistance effect film 1 on the medium facing surface side is Preferably, the end of the bias applying film 3 on the medium facing surface side is on the same plane. In this case, the bias magnetic field is stabilized on the medium facing surface side of the magnetoresistive film 1, and the manufacturing process is simplified.
[0053]
1, 8, 10, and 13, a part of the magnetoresistive film 1 is used as a flux guide, and the thickness of the flux guide portion is the same as that of the other portions. Are equal. On the other hand, as shown in FIG. 16, a soft magnetic layer 11 made of, for example, NiFe is provided between the magnetoresistive film 1 and the medium facing surface to form a flux guide. And the end of the bias applying film 3 on the medium facing surface side may be on the same plane. The flux guide shown in FIG. 16 may be formed by extending only the free layer of the magnetoresistive film 1 toward the medium facing surface. Also in this case, the bias magnetic field is stabilized on the medium facing surface side of the magnetoresistive effect film 1, and the effect of simplifying the manufacturing process can be obtained because a step of forming a new layer is not required. If the flux guide is formed of a magnetic layer provided separately from the magnetoresistive effect film 1 or a part of the free layer of the magnetoresistive effect film 1 as described above, the flux guide can be made thinner. Is advantageous.
[0054]
FIG. 17 is a perspective view of a shielded magnetic head according to one embodiment. In this figure, the lower side is the medium facing surface. Above and below the magnetoresistive film 1, electrodes 2 made of Cu are formed. Bias applying films 3 and 3 made of CoPt are arranged on both sides of the magnetoresistive film 1. This magnetoresistive element has the same structure as that of FIG. Further, a magnetic shield 4 made of NiFe is arranged in contact with the electrode 2. In this figure, the magnetic shield on one side is not shown.
[0055]
FIG. 18 is a plan view of the shielded magnetic head of FIG. 17 viewed from the medium facing surface. Electrodes 2 and 2 are formed above and below the magnetoresistive film 1. On both sides of the magnetoresistive film 1, bias applying films 3, 3 are arranged. These members are provided between a pair of shields 4 2 O 3 It is sandwiched in a state of being insulated by an insulating film 6 made of, for example. In this embodiment, the magnetic shield 4 is formed so as to also serve as a conducting lead.
[0056]
In this shield type magnetic head, the direction of the supply of the sense current is determined so that the magnetization direction of the bias application film 3 made of CoPt and the sense current magnetic field are offset on the medium facing surface side. Therefore, the magnetic flux of the medium flows into the magnetoresistive film 1 immediately below the electrode 2 as the magnetic sensing portion without being hindered by the sense current magnetic field, so that the sensitivity of the shield type magnetic head can be maintained.
[0057]
FIGS. 1 and 7 to 15 show examples in which the end surface of the electrode 2 on the medium facing surface side is recessed from the end surface of the magnetoresistive film 1 on the medium facing surface side. However, in principle, the direction of the bias magnetic field and the direction of the sense current magnetic field only need to be substantially anti-parallel on the side where the signal magnetic flux of the magnetoresistive film flows, so it is not limited to these examples. The embodiment in which the end face on the medium facing surface side of No. 2 is formed on the same plane as the end face of the magnetoresistive film 1 or on the medium side thereof is also included in the present invention.
[0058]
FIG. 19 is a perspective view of a horizontal yoke type magnetic head according to one embodiment. In this figure, the lower side is the medium facing surface. An electrode 2 made of Cu is formed on the magnetoresistive film 1. Bias applying films 3 and 3 made of CoPt are arranged on both sides of the magnetoresistive film 1. Further, a magnetic yoke 5 made of NiFe for defining a magnetic gap is formed below the magnetoresistive film 1. The electrode 2 is formed at a position shifted from immediately above the gap of the magnetic yoke 5, and the magnetoresistive film 1 is located directly above the gap of the magnetic yoke 5. The magnetic yoke 5 located below the electrode 2 functions as the other electrode.
[0059]
In this horizontal yoke type magnetic head, the magnetization direction of the bias application film 3 made of CoPt and the sense current magnetic field cancel out at the portion of the magnetoresistive film 1 located directly above the gap of the magnetic yoke 5 on the medium facing surface side. In this case, the direction in which the sense current flows is determined. Therefore, the magnetic flux of the medium flows into the magnetoresistive film 1, which is the magnetic sensing portion, without being hindered by the sense current magnetic field, so that the sensitivity of the horizontal yoke type magnetic head can be maintained.
[0060]
FIG. 20 is a perspective view of a horizontal yoke type magnetic head according to another embodiment. The horizontal yoke type magnetic head of FIG. 20 has two electrodes 2 and 2 formed at positions shifted from directly above the magnetic gap of the magnetic yoke 5 at positions symmetrical to the magnetic gap, as shown in FIG. It has the same structure as Although not shown, the tip of the magnetic gap of the magnetic yoke 5 is filled with Cu having higher conductivity than the magnetoresistive film. In this horizontal yoke type magnetic head, a sense current flows from one electrode 2 to the other electrode 2 through the magnetoresistive film 1, the magnetic yoke 5, Cu in the magnetic gap, the magnetic yoke 5, and the magnetoresistive film 1. And flows.
[0061]
Also in this horizontal yoke type magnetic head, the magnetization direction of the bias applying film 3 made of CoPt and the sense current magnetic field cancel each other on the medium facing surface side in the portion of the magnetoresistive film 1 located directly above the gap of the magnetic yoke 5. In this case, the direction in which the sense current flows is determined. Therefore, the magnetic flux of the medium flows into the magnetoresistive film 1, which is the magnetic sensing portion, without being hindered by the sense current magnetic field, so that the sensitivity of the horizontal yoke type magnetic head can be maintained.
[0062]
Next, a magnetic head assembly equipped with the magnetic head according to the present invention and a magnetic disk drive equipped with the magnetic head assembly will be described.
[0063]
FIG. 21A is a perspective view of a magnetic head assembly on which a CPP-GMR head is mounted. The actuator arm 201 is provided with a hole to be fixed to a fixed shaft in the magnetic disk drive, and has a bobbin or the like for holding a drive coil (not shown). A suspension 202 is fixed to one end of the actuator arm 201. A head slider 203 on which a CPP-GMR head is mounted is attached to the tip of the suspension 202. A lead wire 204 for writing and reading signals is wired to the suspension 202, and one end of the lead wire 204 is connected to each electrode of the CPP-GMR head incorporated in the head slider 203. The end is connected to the electrode pad 205.
[0064]
FIG. 21B is a perspective view showing the internal structure of a magnetic disk drive on which the magnetic head assembly shown in FIG. 21A is mounted. The magnetic disk 211 is mounted on a spindle 212 and is rotated by a motor (not shown) responsive to a control signal from a drive controller (not shown). The actuator arm 201 is fixed to a fixed shaft 213, and supports the suspension 202 and the head slider 203 at the tip thereof. When the magnetic disk 211 rotates, the medium facing surface of the head slider 203 is held in a state of floating above the surface of the magnetic disk 211 by a predetermined amount, and information is recorded and reproduced. At the base end of the actuator arm 201, a voice coil motor 214, which is a kind of linear motor, is provided. The voice coil motor 214 includes a drive coil (not shown) wound around a bobbin portion of the actuator arm 201, and a magnetic circuit including a permanent magnet and an opposing yoke, which are opposed to each other so as to sandwich the coil. The actuator arm 201 is held by ball bearings (not shown) provided at two positions above and below the fixed shaft 213, and is rotatable and slidable by a voice coil motor 214.
[0065]
The magnetoresistive element according to various embodiments of the present invention can be applied not only to a longitudinal magnetic recording system but also to a magnetic head or a magnetic recording / reproducing apparatus of a perpendicular magnetic recording system, and similar effects can be obtained. The magnetic recording / reproducing device may be provided with a fixed recording medium, or the recording medium may be removable.
[0066]
The magnetoresistive effect element according to various embodiments of the present invention can be applied to a magnetic random access memory (MRAM) in which information can be magnetically rewritten, and the same effect can be obtained.
[0067]
In addition, all magnetoresistive elements, magnetic heads, and magnetic storage / reproducing devices that can be implemented by a person skilled in the art by appropriately modifying the design based on the above-described embodiment also belong to the scope of the present invention.
[0068]
【The invention's effect】
As described in detail above, according to the present invention, a perpendicular conduction type magnetoresistive element capable of reducing the influence of a perpendicular conduction magnetic field, a magnetic head including the perpendicular conduction type magnetoresistive element, and the magnetic head mounted thereon The magnetic recording / reproducing device can be provided.
[Brief description of the drawings]
FIG. 1 is a plan view of a magnetoresistive element according to one embodiment.
FIG. 2 is a cross-sectional view of a magnetoresistive film made of a TMR film.
FIG. 3 is a sectional view of a magnetoresistive film formed of a CPP-GMR film.
FIG. 4 is a sectional view of a magnetoresistive element according to one embodiment.
FIG. 5 is a sectional view of a magnetoresistive element according to another embodiment.
FIG. 6 is a sectional view of a magnetoresistive element according to another embodiment.
FIG. 7 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 8 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 9 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 10 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 11 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 12 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 13 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 14 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 15 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 16 is a plan view of a magnetoresistive element according to another embodiment.
FIG. 17 is a perspective view of a shield type head according to one embodiment.
FIG. 18 is a plan view of the shield type head of FIG. 17 viewed from a medium facing surface.
FIG. 19 is a perspective view of a horizontal yoke type head according to one embodiment.
FIG. 20 is a perspective view of a horizontal yoke type head according to another embodiment.
FIG. 21 is a perspective view of a magnetic head assembly according to one embodiment and a perspective view showing the internal structure of a magnetic disk drive.
FIG. 22 is a diagram showing the relationship between the electrode size and the maximum magnetic flux density applied to the magnetoresistive film at the edge of the electrode.
FIG. 23 is a view showing the relationship between the magnitude of a sense current and the maximum magnetic flux density applied to a magnetoresistive film at an edge of an electrode.
[Explanation of symbols]
1 .... Magnetoresistance effect film
2 ... Electrode
3: Bias application film
4: Magnetic shield
5. Magnetic yoke
6 ... Insulating film
11 Soft magnetic layer
21: Underlayer
22 ... Antiferromagnetic layer
23: magnetization fixed layer (pin layer)
24 ... Tunnel junction layer
25: magnetization free layer (free layer)
26 ... Protective layer
31 ... Underlayer
32: Antiferromagnetic layer
33: magnetization fixed layer (pin layer)
34: Non-magnetic intermediate layer (spacer layer)
35: magnetization free layer (free layer)
36 ... Protective layer
201: Actuator arm
202 ... Suspension
203 ... Head slider
204: Lead wire
205 ... electrode pad
211 ... magnetic disk
212 ... spindle
213: Fixed shaft
214 ... voice coil motor

Claims (9)

磁気記録媒体に対向する媒体対向面を備え、磁気記録媒体からの信号磁束を検出する磁気抵抗効果素子であって、磁気抵抗効果膜と、前記磁気抵抗効果膜の膜面に対して垂直な方向に電流を通電可能とする一対の電極と、前記磁気抵抗効果膜の膜面に対して平行な方向にバイアス磁界を付与するバイアス印加膜とを具備し、前記電極のサイズは0.3μm□以下で前記磁気抵抗効果膜のサイズよりも小さく、前記磁気抵抗効果膜における信号磁束の流入部分の近傍で、前記バイアス印加膜の磁界の方向と前記磁気抵抗効果膜の膜面に対して垂直な方向に通電される電流により発生する磁界の方向とが実質的に反平行となることを特徴とする垂直通電型磁気抵抗効果素子。 A magnetoresistive element having a medium facing surface facing a magnetic recording medium and detecting a signal magnetic flux from the magnetic recording medium , wherein the magnetoresistive film and a direction perpendicular to the film surface of the magnetoresistive film are provided. And a bias application film for applying a bias magnetic field in a direction parallel to the film surface of the magnetoresistive effect film, and the size of the electrodes is 0.3 μm or less. The size of the magnetoresistive film is smaller than that of the magnetoresistive film, and the direction of the magnetic field of the bias applying film and the direction perpendicular to the film surface of the magnetoresistive film near the inflow portion of the signal flux in the magnetoresistive film. Wherein the direction of a magnetic field generated by a current flowing through the element is substantially anti-parallel. 磁気記録媒体に対向する媒体対向面を備え、磁気記録媒体からの信号磁束を検出する磁気抵抗効果素子であって、磁気抵抗効果膜と、前記磁気抵抗効果膜の膜面に対して垂直な方向に電流を通電可能とする一対の電極と、前記磁気抵抗効果膜の膜面に対して平行な方向にバイアス磁界を付与するバイアス印加膜と、前記磁気抵抗効果膜における信号磁束の流入部分の近傍に信号磁束を前記磁気抵抗効果膜に導くよう設けられた磁性層とを具備し、前記電極のサイズは0.3μm□以下で前記磁気抵抗効果膜のサイズよりも小さく、前記磁性層において前記バイアス印加膜の磁界の方向と前記磁気抵抗効果膜の膜面に対して垂直な方向に通電される電流により発生する磁界の方向とが実質的に反平行となることを特徴とする垂直通電型磁気抵抗効果素子。 A magnetoresistive element having a medium facing surface facing a magnetic recording medium and detecting a signal magnetic flux from the magnetic recording medium , wherein the magnetoresistive film and a direction perpendicular to the film surface of the magnetoresistive film are provided. A pair of electrodes that allow a current to flow therethrough, a bias application film that applies a bias magnetic field in a direction parallel to the film surface of the magnetoresistive film, and a portion near the influx of the signal magnetic flux in the magnetoresistive film. A magnetic layer provided so as to guide a signal magnetic flux to the magnetoresistive effect film, wherein the size of the electrode is 0.3 μm or less and smaller than the size of the magnetoresistive effect film; A direction of a magnetic field generated by a current flowing in a direction perpendicular to a film surface of the magnetoresistive film is substantially antiparallel to a direction of a magnetic field of the applied film. resistance Fruit element. 前記磁気抵抗効果膜の媒体対向面側の端部と、前記バイアス印加膜の媒体対向面側の端部とが、同一平面上となるように形成されていることを特徴とする請求項1に記載の垂直通電型磁気抵抗効果素子。2. The device according to claim 1, wherein an end of the magnetoresistive film on the medium facing surface side and an end of the bias applying film on the medium facing surface side are formed on the same plane. The current-perpendicular-to-the-plane type magnetoresistance effect element described in the above. 前記磁性層の媒体対向面側の端部と、前記バイアス印加膜の媒体対向面側の端部とが、同一平面上となるように形成されていることを特徴とする請求項2に記載の垂直通電型磁気抵抗効果素子。3. The magnetic recording medium according to claim 2, wherein an end of the magnetic layer on the medium facing surface side and an end of the bias applying film on the medium facing surface are formed on the same plane. Vertically conducting magnetoresistive element. 前記磁気抵抗効果膜が、2層の強磁性層の間に非磁性導電層を挟んだ構造を有することを特徴とする請求項1ないし4のいずれかに記載の磁気抵抗効果素子。5. The magnetoresistance effect element according to claim 1, wherein said magnetoresistance effect film has a structure in which a nonmagnetic conductive layer is sandwiched between two ferromagnetic layers. 前記磁気抵抗効果膜の膜面に対して垂直な方向に通電される電流Iは、3mA≦I≦15mAの範囲であることを特徴とする請求項1ないし5のいずれかに記載の磁気抵抗効果素子。6. The magnetoresistance effect according to claim 1, wherein a current I flowing in a direction perpendicular to a film surface of the magnetoresistance effect film is in a range of 3 mA ≦ I ≦ 15 mA. element. 媒体対向面と反対側において前記電極の端部と前記磁気抵抗効果膜の端部とが一致していることを特徴とする請求項1ないし6のいずれかに記載の磁気抵抗効果素子。7. The magnetoresistive element according to claim 1, wherein an end of the electrode coincides with an end of the magnetoresistive film on a side opposite to the medium facing surface. 請求項1ないし7のいずれかに記載の垂直通電型磁気抵抗効果素子を備える磁気ヘッド。 A magnetic head comprising the perpendicular conduction type magnetoresistive element according to claim 1 . 磁気記録媒体と、請求項8に記載の磁気ヘッドとを具備したことを特徴とする磁気記録再生装置。A magnetic recording / reproducing apparatus comprising: a magnetic recording medium; and the magnetic head according to claim 8 .
JP2001398384A 2001-01-19 2001-12-27 Perpendicular conduction type magnetoresistive element, magnetic head, and magnetic recording / reproducing device Expired - Fee Related JP3569259B2 (en)

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