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JP3573257B2 - Single crystal manufacturing equipment - Google Patents
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JP3573257B2 - Single crystal manufacturing equipment - Google Patents

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Publication number
JP3573257B2
JP3573257B2 JP24480398A JP24480398A JP3573257B2 JP 3573257 B2 JP3573257 B2 JP 3573257B2 JP 24480398 A JP24480398 A JP 24480398A JP 24480398 A JP24480398 A JP 24480398A JP 3573257 B2 JP3573257 B2 JP 3573257B2
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Japan
Prior art keywords
melt
crucible
tube
single crystal
innermost
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JP24480398A
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Japanese (ja)
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JP2000072586A (en
Inventor
英志 久保田
裕基 山崎
生剛 八木
道雄 小野
正弘 笹浦
欽之 今井
彰之 館
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NTT Inc
NTT Inc USA
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Nippon Telegraph and Telephone Corp
NTT Inc USA
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Description

【0001】
【産業上の利用分野】
本発明は、引き上げ法による単結晶製造装置に係る。より詳細には、例えば、酸化物単結晶(より具体的には、例えばニオブ酸ストロンチウム・バリウム(SBN))などの光学単結晶の製造に際して、融液内の温度変動に基づく単結晶の組成変化から生ずる結晶特性の劣化、例えばm屈折率の変化などの光学的特性の劣化、の問題を解決することが可能な単結晶製造装置に関するものである。
【0002】
【従来の技術】
従来、高品質が要求される例えば光学単結晶の成長には引き上げ法が用いられてきた。引き上げ法における結晶引き上げ時に、融液の温度が変動すると偏析現象により結晶組成が微妙に変化し、その結果、光学的屈折率も変化してしまうことが知られている。酸化物単結晶であるSBN結晶もその例である。
【0003】
SBN結晶を光素子に用いるには、屈折率の変動を10−5以下に抑えることが望ましいとされているが、そのためには融液の温度変動を出来る限り小さくする必要がある。温度変動を引き起こす主な要因は2つある。1つは融液およびルツボを囲む雰囲気ガスの温度変動によるものであり、もう1つは融液内の対流によるものである。
【0004】
前者は加熱源の温度変動を抑え、加熱炉内を密閉に近い状態にして外気の影響を遮断し雰囲気ガスの乱流を抑えることによって防止できる。この防止策はすでに結晶引上げ装置に一般に採用されている。
【0005】
一方、後者による融液の温度変動は融液中の対流を止めることで防止できる。SBN結晶では、融液の深さを浅くするか、または融液中に円形の金属板を入れることによって実効的に対流の影響を弱める方法が試みられた。しかし、成長界面とルツボ底または金属板との距離を十分小さく(通常、数mmに)しなければならず、結晶成長が困難で実用的ではなかった。
【0006】
また、Siなどの半導体結晶では融液を磁場中に置くことで、対流を止め温度変動が抑えられている。しかし、この方法は融液が電気的な良導体であることが必要であり、光学結晶は一般に高抵抗体であることから対流防止効果が弱く、強磁場を発生する大がかりな装置が必要となり実用的でなかった。
【0007】
したがって、対流による温度変動に対しては十分な対策が取られていなかった。
【0008】
このため、光学的屈折率変化のないSBN結晶が得られず、光デバイス特性にバラツキが生じ、実用的な応用が実現されていないのが現状であった。
【0009】
【発明が解決しようとする課題】
従来の技術で光学結晶を成長させた場合、融液内の温度変動を小さく抑えられないために、結晶内に温度変動に対応した結晶特性の変化(結晶が光学結晶の場合は光学的屈折率の変化)が生じた。
【0010】
このため、例えば光学結晶の場合には、光デバイスに利用して十分な信頼性が得られないという問題を有している。
【0011】
本発明は、軸方向の温度分布を調節して融液内の対流を抑え、融液内の温度変動を抑制することによって、結晶内における結晶特性の変化のない(例えば光学的屈折率の変化のない)結晶を製造することが可能な単結晶製造装置を提供することを目的とする。
【0013】
本発明の単結晶製造装置は、ルツボと、
耐熱性の円筒多重管よりなるルツボ支持台と、
を有する引き上げ法による単結晶製造装置において、
該ルツボの底部外面の中心に向かって開口するガス供給管を、該円筒多重管の最内管内に設け、
さらに、前記最内管の内径より小さな外径を有し、前記ガス供給管の外径より大きな内径を有する円筒を、前記ルツボ底部に前記ルツボと一体的に設け、融液の深さを 20 30 mmとし、ルツボの直径に対する融液深さの比を 2 10 3 10 として、融液中心部軸方向の融液の流れを止め結晶成長部直下の融液の温度変動を抑えるようにしたことを特徴とする。
【0014】
本発明の単結晶製造装置は、ルツボと、
耐熱性の円筒多重管よりなるルツボ支持台と、
を有する引き上げ法による単結晶製造装置において、
該円筒多重管の最内管の下部を開放し、さらに、前記最内管内に、上下動可能なシリンダーを設け、融液の深さを 20 30 mmとし、ルツボの直径に対する融液深さの比を 2 10 3 10 として、融液中心部軸方向の融液の流れを止め結晶成長部直下の融液の温度変動を抑えるようにしたことを特徴とする。
【0015】
本発明の結晶製造装置は、ルツボと、
耐熱性の円筒多重管よりなるルツボ支持台と、
を有する引き上げ法による単結晶製造装置において、
該円筒多重管の最内管内を外部に連通せしめるとともに、該最内管の内部にヒータを設け、融液の深さを 20 30 mmとし、ルツボの直径に対する融液深さの比を 2 10 3 10 として、融液中心部軸方向の融液の流れを止め結晶成長部直下の融液の温度変動を抑えるようにしたことを特徴とする。
【0016】
【作用】
前記の課題を解決する具体的手段として本発明は以下の方法を用いた。まず、通常の融液内の温度分布は、径方向に対してはルツボ壁より中心方向に向けて温度が低く、軸方向に対してはルツボ下部より融液表面方向に向けて温度が低くなっている。したがって、融液中に生じる対流はルツボ壁近くで上昇し、ルツボ中心で下降している。
【0017】
そこで、本発明では、ルツボ底部の中心のみを局部的に冷却するための手段を設けることにより、ルツボ中心の軸方向の温度勾配が緩くなるよう調節して融液中央部の温度を均一に近い状態にする。この結果、対流の生じる範囲がルツボ壁近くのみに留まり融液中央部には存在しなくなる。こうして、融液中央部の温度変動は抑止される。
【0018】
なお、SBN結晶のような熱伝導率が小さい材料の場合には、潜熱の放出は結晶側ではなく液側に放出される。ルツボ底部を冷却することは、この放出された潜熱を吸収する効果を有するので、結晶成長を継続させる駆動力となるためより有効である。
【0019】
以上の手段および作用によって、融液の温度変動を抑えて結晶特性の変化(例えば結晶屈折率の変化)のない結晶を製造することができる。
【0020】
【発明の実施の形態】
ルツボ底部の中心のみを局部的に冷却するための手段としては、例えば、次の技術があげられる。
【0021】
▲1▼まず、ルツボの底部外面の中心に向かって開口するガス供給管を、該円筒多重管の最内管内に設け、さらに、前記最内管の内径より小さな外径を有し、前記ガス供給管の外径より大きな内径を有する円筒を、前記ルツボ底部に前記ルツボと一体的に設ける技術である。
【0022】
本技術では、ガス供給管から冷却ガスをルツボの底部外面の中心に向かって吹き付ける。もし、円筒がルツボと一体的に設けられていない場合には、最内筒のの上端とルツボ底部の外面との間にある隙間を冷却ガスが流れてしまい、中心だけではなくルツボ全体が冷却ガスにより冷却されてしまう。
【0023】
しかるに、円筒がルツボ底部にルツボと一体的に設けてあると、ガス供給管の開口から吹き出た冷却ガスは、ルツボ底部に当たり、ルツボ底部外面に沿って左右に流れるが、円筒の内側壁に当たり方向を変え、円筒内側壁と最内管外壁との間を通って下方に流れ、外部に排出される。これによりルツボ底部の円筒の内径に対応部分のみを局部的に冷却することができる。
【0024】
かかる技術により、融液内の径方向に中央部が低く均一で、周辺部で急激に高くなるように温度勾配が形成できる。
【0025】
最内管の内径としては、ルツボの半分が好ましく、10〜20mmがより好ましい。
【0026】
ガス供給管の内径としては、ルツボの半分が好ましく、3〜10mmがより好ましい。かかる径範囲とすることにより、より一層効果的に融液内の径方向に中央部が低く均一で、周辺部で急激に高くなるように温度勾配が形成でき、ひいては結晶特性の変化がより少ない単結晶を製造することができる。
【0027】
ガス供給管から供給するガスとしては、例えば、空気、アルゴン、ヘリウムガス等のガスを用いればよい。冷却ガスは使用上便宜の点からは室温において供給すればよいが、ガス温度を適宜制御してもよい。
【0028】
なお、冷却ガスを外部に排出するためには、円筒多重管の側部に孔Aを設けておけばよいが、最内管の上下端を解放しておき、そこから冷却ガスを外部に排出する構造としてもよい。
【0029】
▲2▼他の技術としては、円筒多重管の最内管内に、上下動可能なシリンダーを設ける技術である。
【0030】
まず、シリンダーを最内管内の上方に位置せしめた場合には、最内管において上部から下部への熱の流れが遮断されている。一方、シリンダを下方に移動させると熱の流れは遮断されず最内管中の中心軸における温度分布は下部が冷却されれ、ルツボ下部より開放端に向けて温度が低下する。これによりルツボ底部の中心のみが局部的に冷却される。
【0031】
なお、融液の対流は、結晶引き上げ中の結晶の直径の変化中に生じるため、結晶の変化中にシリンダの下方への移動を行えばよい。
【0032】
▲3▼さらに他の技術としては、円筒多重管の最内管内を外部に連通せしめるとともに、該最内管の内部にヒータを設ける技術である。
【0033】
円筒多重管の最内管が外部に連通せしめているため、ルツボ底部外面の最内管に対応する部分は他の部分に比べて局部的に冷却される。ただ、最内管を外部に連通せしめただけでは、外部の外気による温度変動の影響を受けるため、必要に応じてヒータをオンすることにより熱を補完して温度変動を抑える。
【0034】
【実施例】
(実施例1)
図1に実施例1に係る単結晶製造装置を示す。
【0035】
本実施例の結晶製造装置は、ルツボ3と、耐熱性の円筒多重管7a,7bよりなるルツボ支持台7とを有し、ルツボ3の底部外面の中心に向かって開口するガス供給管8を、円筒多重管の最内管7b内に設け、さらに、最内管7bの内径より小さな外径を有し、ガス供給管8の外径より大きな内径を有する円筒9を、ルツボ3底部にルツボ3と一体的に設けてある。
【0036】
以下、より詳細に本実施例を説明する。
本例ではCeドープのSBN単結晶の引き上げに適用した例を示す。
【0037】
図1において、1および2は上下2ゾーンの縦型加熱炉の抵抗加熱ヒーターであって、上下のヒーター温度を調整して縦方向の温度勾配を設定する。
【0038】
縦方向の温度勾配を10〜30℃/cmに設定した。そのとき、径方向の温度勾配はその0.5〜1倍で20℃/cm以下の勾配となった。
【0039】
3は直径10cmの白金製ルツボであり、4はSBN単結晶の調和溶融組成を持つ融液であって温度1450〜1600℃、深さ20〜30mmであり、5は成長中のSBN単結晶である。6は単結晶引き上げ棒であって、最初にSBN種結晶を結びつけて融液4に接触させ融液温度を調節しながら矢印R,Xの方向に回転と引き上げを行うと単結晶が引き上がる。
【0040】
回転速度は結晶径に合わせて3〜30rpm、引き上げ速度は0.1〜10mm/時とした。7はセラミックス製の耐熱性の円筒2重管であってルツボ3を支持するルツボ支持台を構成している。本例では2重円筒管7a,7bの例を示している。もちろん3重、4重円筒管でもよい。また、本例では、2重円筒管の最内管7bの内径を20mmとしている。
【0041】
8は冷却ガスのガス供給管であって、ルツボ3の底部外面の中心に向かって開口している。ガス供給管の開口の径は3〜4mmとした。
【0042】
9はルツボ3と一体化した白金製の円筒である。本例ではその外径を最内管7bの内径(20mm)より若干小さくしてある。従って、ルツボ3をルツボ支持台7に載置する際には、円筒9を最内管7bにはめ込めば、最内管7bが円筒9の案内となり、位置ずれを招くことなくルツボ3をルツボ支持台7に容易に載置することができる。従って、炉内におけるルツボ3の左右方向の位置ずれに起因する融液の不均一加熱を防止することができる。
【0043】
なお、本例では、ガスを外部に排出するために、円筒多重管7a,7bの側部に孔Aを設けてある。
【0044】
ガス供給管8の開口より冷却ガスをルツボ3の底部外面の中心に吹き付けると、吹き出たガスは円筒9によって方向転換され、円筒9の側壁に沿って下方に流れ、孔Aを通過して炉内に排出された。
【0045】
なお、10は熱遮断用の耐熱性繊維である。
図1に示す装置を用いてCeドープのSBNの結晶成長を行った。
【0046】
まず、ガス供給管8から、0、10、15L/min(リットル/分)の流量で冷却ガスを流し、それぞれの流量における融液表面近傍の温度変動抑制の結果を測定した。その結果を図2に示す。
【0047】
図2に示すように、温度変動はガス冷却なしの場合は±1.5℃であった。しかし、流量の増加と伴に表面温度は低下するが、温度変動は小さくなっていた。すなわち、融液中央部の温度変動をガス冷却により±1.5℃から±0.3℃以下に抑えることができた。この結果、光学的屈折率変化のないC軸方位のSBN単結晶を再現性良く製造することができた。
【0048】
本実施例の装置を用いることにより、C軸方位のCeドープのSBN結晶引き上げに用いた。得られた結晶はC軸に平行に2mm厚にスライスして40mm×40mmサイズの板状に加工し、両面研磨したものをデジタルホログラムメモリの記録媒体として使用した。この結晶は屈折率変化が10−5以下と小さく、低温度勾配下で製造したため結晶性およびフォトリフラクティブ特性も良好であるので、読込みおよび書込みエラーの少ない高密度の記録装置が実現できた。
【0049】
(実施例2)
図3に実施例2に係る単結晶製造装置を示す。
本例の単結晶製造装置は、ルツボ3と、耐熱性の円筒多重管よりなるルツボ支持台7とを有し、円筒多重管7a,7bの最内管11内に、上下動可能なシリンダー11を設けてある。
【0050】
以下、より詳細に説明する。
図3において11は耐熱性の上下可動のシリンダーであり、7bは耐熱性のルツボ支持7を構成する円筒多重管の最内管である。本実施例では円筒ルツボ支持台7を構成する最内管7bの下部を開放することにより下部雰囲気を冷却し、かつ内側に挿入した耐熱性の可動のシリンダー11の位置を上下に変化させてルツボ底部の温度を調節した。
【0051】
原理を図3で明する。まず、シリンダー11がない場合の最内管7b内の中心軸における温度分布は下部が冷却されているため、ルツボ下部より開放端に向けて温度が低下している。
【0052】
ここに、シリンダー11を入れると上部から下部への熱の流れが遮断されるので、図3に示すA1の位置にすると右の3の温度分布となり、A2の位置にすると4の温度分布となり、数十℃の温度低下が生じる。
【0053】
このA1およびA2の位置を調整することにより、ルツボ底の温度を実施例1と同様に調節できた。したがって、融液はルツボ直上を中心に局所的に冷却されるので、融液内の径方向に中央部が低く均一で、周辺部で急激に高くなるように温度勾配が形成できた。
【0054】
このようにして融液中央部の温度変動を抑えることができた。この結果、光学的屈折率変化のないC軸方位のSBN単結晶を再現性良く製造することができた。
【0055】
(実施例3)
図4に実施例3に係る単結晶結晶製造装置を示す。
本実施例の単結晶製造装置は、ルツボ3と、耐熱性の円筒多重管7a,7bよりなるルツボ支持台7とを有し、円筒多重管の最内管7b内を外部に連通せしめるとともに、最内管7bの内部にヒータ13を設けた。
【0056】
図4において、13は小型ヒーターで最内管7b内に挿入されている。このヒーターの温度を変化させることにより実施例2の可動シリンダーと同じ効果が実現できた。したがって融液はルツボ直上を中心に局所的に冷却されるので、融液内の径方向に中央部が低く均一で、周辺部で急激に高くなるように温度勾配が形成できた。このようにして融液中央部の温度変動を抑えることができた。
【0057】
この結果、光学的屈折率変化のないC軸方位のSBN単結晶を再現性良く製造することができた。
【0058】
【発明の効果】
以上説明したように、本発明はルツボ下部を局部的に冷却する簡便な方法により、ルツボ中心の軸方向温度勾配を緩くなるよう調節して融液中央部の温度を均一に近い状態にした結果、対流の生じる範囲がルツボ壁近くのみに留まり融液中央部には存在しないので、融液中央部の温度変動を±0.3℃以下に抑制することがで、結晶特性の変化が極めて小さな単結晶を製造することができる。
【図面の簡単な説明】
【図1】実施例1に係る単結晶製造装置の断面図である。
【図2】実施例1における温度変動抑制効果を示すグラフである。
【図3】実施例2に係る端化粧製造装置の断面及びシリンダ位置による温度変化を示すグラフである。
【図4】実施例3に係る単結晶製造装置の断面図である。
【符号の説明】
1,2 上下2ゾーンの縦型加熱炉の抵抗加熱ヒーター、
3 白金製ルツボ、
4 SBNの融液、
5 成長中のSBN単結晶、
6 単結晶引き上げ棒、
7 ルツボ支持台、
7a,7b 円筒多重管
7b 最内管、
8 ガス供給管、
9 円筒、
10 熱遮断用の耐熱性繊維、
11 耐熱性の上下可動のシリンダー、
12 耐熱性の円筒ルツボ支持台、
13 小型ヒーター。
[0001]
[Industrial applications]
The present invention relates to a single crystal manufacturing apparatus using a pulling method. More specifically, for example, in the production of an optical single crystal such as an oxide single crystal (more specifically, for example, strontium barium niobate (SBN)), a change in the composition of the single crystal due to a temperature change in the melt The present invention relates to a single crystal manufacturing apparatus capable of solving the problem of deterioration of crystal characteristics resulting from the above, for example, deterioration of optical characteristics such as a change in m refractive index.
[0002]
[Prior art]
Conventionally, a pulling method has been used for growing, for example, an optical single crystal that requires high quality. It is known that when the temperature of the melt fluctuates during crystal pulling in the pulling method, the crystal composition is slightly changed due to the segregation phenomenon, and as a result, the optical refractive index is also changed. An SBN crystal, which is an oxide single crystal, is also an example.
[0003]
In order to use an SBN crystal for an optical element, it is desirable to suppress the change in the refractive index to 10 −5 or less. For this purpose, it is necessary to minimize the change in the temperature of the melt. There are two main factors that cause temperature fluctuations. One is due to the temperature fluctuation of the atmosphere gas surrounding the melt and the crucible, and the other is due to convection in the melt.
[0004]
The former can be prevented by suppressing the temperature fluctuation of the heating source, keeping the inside of the heating furnace close to hermeticity, blocking the influence of outside air, and suppressing the turbulence of the atmosphere gas. This precaution is already commonly used in crystal pullers.
[0005]
On the other hand, the temperature fluctuation of the melt due to the latter can be prevented by stopping the convection in the melt. In the case of SBN crystal, a method of reducing the depth of the melt or putting a circular metal plate in the melt to effectively reduce the influence of convection has been attempted. However, the distance between the growth interface and the crucible bottom or metal plate must be made sufficiently small (usually several mm), making crystal growth difficult and impractical.
[0006]
Further, in a semiconductor crystal such as Si, convection is stopped by placing the melt in a magnetic field to suppress temperature fluctuation. However, this method requires that the melt be a good electrical conductor, and the optical crystal is generally a high-resistance material, so the convection prevention effect is weak, and a large-scale device that generates a strong magnetic field is required, and this method is practical. Was not.
[0007]
Therefore, sufficient measures have not been taken against temperature fluctuation due to convection.
[0008]
For this reason, an SBN crystal having no change in optical refractive index cannot be obtained, the characteristics of the optical device vary, and no practical application has been realized at present.
[0009]
[Problems to be solved by the invention]
When an optical crystal is grown by the conventional technique, a change in the crystal characteristics corresponding to the temperature change in the crystal (if the crystal is an optical crystal, the optical refractive index cannot be suppressed because the temperature fluctuation in the melt cannot be suppressed to a small value). Change).
[0010]
For this reason, for example, in the case of an optical crystal, there is a problem that sufficient reliability cannot be obtained by using it for an optical device.
[0011]
The present invention suppresses the convection in the melt by adjusting the temperature distribution in the axial direction and suppresses the temperature fluctuation in the melt, so that there is no change in crystal characteristics in the crystal (for example, a change in the optical refractive index). The present invention aims to provide a single crystal manufacturing apparatus capable of manufacturing a crystal having no).
[0013]
The apparatus for producing a single crystal according to the present invention comprises: a crucible;
A crucible support made of a heat-resistant cylindrical multi-tube,
In a single crystal manufacturing apparatus by a pulling method having
A gas supply pipe opening toward the center of the bottom outer surface of the crucible is provided in the innermost pipe of the cylindrical multiple pipe,
Further, a cylinder having an outer diameter smaller than the inner diameter of the innermost pipe and having an inner diameter larger than the outer diameter of the gas supply pipe is provided integrally with the crucible at the bottom of the crucible, and the depth of the melt is set to 20. and ~ 30 mm, the ratio of the melt depth to diameter of the crucible as a 2 / 10-1 3/10, suppress the temperature fluctuation of the melt just below the crystal growth part stopping the flow of the melt central axis of the melt It is characterized by doing so.
[0014]
The apparatus for producing a single crystal according to the present invention comprises: a crucible;
A crucible support made of a heat-resistant cylindrical multi-tube,
In a single crystal manufacturing apparatus by a pulling method having
The lower part of the innermost tube of the cylindrical multiple tube is opened, and a cylinder that can move up and down is provided in the innermost tube, the depth of the melt is set to 20 to 30 mm, and the melt depth with respect to the diameter of the crucible is set. as the ratio of 2 / 10-1 3/10, characterized in that it has to suppress the temperature fluctuation of the melt just below the crystal growth part stopping the flow of the melt central axis of the melt.
[0015]
The crystal manufacturing apparatus of the present invention comprises: a crucible;
A crucible support made of a heat-resistant cylindrical multi-tube,
In a single crystal manufacturing apparatus by a pulling method having
The inside of the innermost tube of the cylindrical multiple tube is communicated with the outside, a heater is provided inside the innermost tube, the depth of the melt is 20 to 30 mm, and the ratio of the melt depth to the crucible diameter is 2. / of 10 to 3/10, characterized in that it has to suppress the temperature fluctuation of the melt just below the crystal growth part stopping the flow of the melt central axis of the melt.
[0016]
[Action]
The present invention uses the following method as a specific means for solving the above-mentioned problems. First, the normal temperature distribution in the melt is such that the temperature is lower toward the center than the crucible wall in the radial direction, and lower toward the melt surface from the lower part of the crucible in the axial direction. ing. Therefore, the convection generated in the melt rises near the crucible wall and falls at the center of the crucible.
[0017]
Thus, in the present invention, by providing a means for locally cooling only the center of the crucible bottom, the temperature gradient in the axial direction of the center of the crucible is adjusted so that the temperature of the central portion of the melt is nearly uniform. State. As a result, the range in which convection occurs is limited only near the crucible wall, and does not exist in the central portion of the melt. Thus, the temperature fluctuation in the central part of the melt is suppressed.
[0018]
In the case of a material having a low thermal conductivity such as an SBN crystal, the latent heat is released not to the crystal but to the liquid. Cooling the crucible bottom has an effect of absorbing the released latent heat and is more effective because it serves as a driving force for continuing the crystal growth.
[0019]
By the above means and operation, it is possible to manufacture a crystal without a change in crystal characteristics (for example, a change in crystal refractive index) while suppressing a temperature change of the melt.
[0020]
BEST MODE FOR CARRYING OUT THE INVENTION
As a means for locally cooling only the center of the crucible bottom, for example, the following technique can be cited.
[0021]
(1) First, a gas supply pipe that opens toward the center of the bottom outer surface of the crucible is provided in the innermost pipe of the cylindrical multiple pipe, and further has an outer diameter smaller than the inner diameter of the innermost pipe. This is a technique in which a cylinder having an inner diameter larger than the outer diameter of the supply pipe is provided integrally with the crucible at the bottom of the crucible.
[0022]
In the present technology, the cooling gas is blown from the gas supply pipe toward the center of the bottom outer surface of the crucible. If the cylinder is not provided integrally with the crucible, the cooling gas will flow through the gap between the upper end of the innermost cylinder and the outer surface of the crucible bottom, and not only the center but also the entire crucible will be cooled. It is cooled by gas.
[0023]
However, when the cylinder is provided integrally with the crucible at the bottom of the crucible, the cooling gas blown out from the opening of the gas supply pipe hits the bottom of the crucible, flows right and left along the outer surface of the crucible bottom, but hits the inner wall of the cylinder in the direction of And flows downward between the inner wall of the cylinder and the outer wall of the innermost tube, and is discharged to the outside. Thereby, only the portion corresponding to the inner diameter of the cylinder at the bottom of the crucible can be locally cooled.
[0024]
By such a technique, a temperature gradient can be formed such that the central portion is low and uniform in the radial direction in the melt, and the temperature gradient rapidly increases in the peripheral portion.
[0025]
The inner diameter of the innermost tube is preferably half of the crucible, more preferably 10 to 20 mm.
[0026]
The inner diameter of the gas supply pipe is preferably half of the crucible, and more preferably 3 to 10 mm. By adopting such a diameter range, the temperature gradient can be formed so that the central portion is lower and uniform in the radial direction in the melt more effectively, and the temperature gradient is sharply increased in the peripheral portion. Single crystals can be produced.
[0027]
As a gas supplied from the gas supply pipe, for example, a gas such as air, argon, or helium gas may be used. The cooling gas may be supplied at room temperature for convenience in use, but the gas temperature may be appropriately controlled.
[0028]
In order to discharge the cooling gas to the outside, a hole A may be provided on the side of the cylindrical multi-tube, but the upper and lower ends of the innermost tube are opened, and the cooling gas is discharged to the outside from the opening. It is good also as a structure which does.
[0029]
{Circle around (2)} Another technique is to provide a vertically movable cylinder in the innermost tube of a cylindrical multiple tube.
[0030]
First, when the cylinder is positioned above the innermost pipe, the flow of heat from the upper part to the lower part is interrupted in the innermost pipe. On the other hand, when the cylinder is moved downward, the flow of heat is not interrupted and the lower part of the temperature distribution in the central axis in the innermost tube is cooled, and the temperature decreases from the lower part of the crucible toward the open end. Thereby, only the center of the crucible bottom is locally cooled.
[0031]
Since the convection of the melt occurs during the change of the diameter of the crystal during the crystal pulling, the downward movement of the cylinder may be performed during the change of the crystal.
[0032]
{Circle around (3)} As another technique, the inside of the innermost tube of the cylindrical multiple tube is communicated with the outside, and a heater is provided inside the innermost tube.
[0033]
Since the innermost tube of the cylindrical multiple tube communicates with the outside, the portion corresponding to the innermost tube on the outer surface of the crucible bottom is locally cooled as compared with other portions. However, simply connecting the innermost tube to the outside is affected by the temperature fluctuation due to the outside air, so that the heater is turned on as necessary to supplement the heat and suppress the temperature fluctuation.
[0034]
【Example】
(Example 1)
FIG. 1 shows a single crystal manufacturing apparatus according to the first embodiment.
[0035]
The crystal manufacturing apparatus of the present embodiment includes a crucible 3 and a crucible support 7 composed of heat-resistant cylindrical multi-tubes 7a and 7b, and a gas supply pipe 8 opening toward the center of the bottom outer surface of the crucible 3 is provided. A cylinder 9 having an outer diameter smaller than the inner diameter of the innermost pipe 7b and an inner diameter larger than the outer diameter of the gas supply pipe 8 is provided in the crucible 3 at the bottom of the crucible 3. 3 and provided integrally.
[0036]
Hereinafter, the present embodiment will be described in more detail.
In this example, an example in which the present invention is applied to pulling a Ce-doped SBN single crystal is shown.
[0037]
In FIG. 1, reference numerals 1 and 2 denote resistance heating heaters of a vertical heating furnace having upper and lower two zones, and adjust the temperature of the upper and lower heaters to set a temperature gradient in a vertical direction.
[0038]
The temperature gradient in the vertical direction was set at 10 to 30 ° C / cm. At that time, the temperature gradient in the radial direction was 0.5 to 1 times the gradient of 20 ° C./cm or less.
[0039]
Reference numeral 3 denotes a platinum crucible having a diameter of 10 cm, reference numeral 4 denotes a melt having a harmonic melting composition of SBN single crystal, which has a temperature of 1450 to 1600 ° C. and a depth of 20 to 30 mm. Reference numeral 5 denotes a growing SBN single crystal. is there. Reference numeral 6 denotes a single crystal pulling rod, which is first brought into contact with the melt 4 and brought into contact with the melt 4 and rotated and pulled in the directions of arrows R and X while adjusting the melt temperature to pull up the single crystal.
[0040]
The rotation speed was 3 to 30 rpm according to the crystal diameter, and the pulling speed was 0.1 to 10 mm / hour. Reference numeral 7 denotes a heat resistant cylindrical double tube made of ceramics, which constitutes a crucible support for supporting the crucible 3. This example shows an example of the double cylindrical tubes 7a and 7b. Of course, a triple or quadruple cylindrical tube may be used. In this example, the inner diameter of the innermost tube 7b of the double cylindrical tube is set to 20 mm.
[0041]
Reference numeral 8 denotes a cooling gas supply pipe, which opens toward the center of the bottom outer surface of the crucible 3. The diameter of the opening of the gas supply pipe was 3 to 4 mm.
[0042]
Reference numeral 9 denotes a platinum cylinder integrated with the crucible 3. In this embodiment, the outer diameter is slightly smaller than the inner diameter (20 mm) of the innermost tube 7b. Therefore, when placing the crucible 3 on the crucible support 7, if the cylinder 9 is fitted into the innermost tube 7 b, the innermost tube 7 b serves as a guide for the cylinder 9 and supports the crucible 3 without causing displacement. It can be easily placed on the table 7. Accordingly, it is possible to prevent uneven heating of the melt caused by the displacement of the crucible 3 in the furnace in the left-right direction.
[0043]
In this example, holes A are provided on the sides of the cylindrical multiple tubes 7a and 7b in order to discharge the gas to the outside.
[0044]
When the cooling gas is blown from the opening of the gas supply pipe 8 to the center of the bottom outer surface of the crucible 3, the direction of the blown gas is changed by the cylinder 9 and flows downward along the side wall of the cylinder 9. Was discharged into.
[0045]
Reference numeral 10 denotes a heat-resistant fiber for heat insulation.
Crystal growth of Ce-doped SBN was performed using the apparatus shown in FIG.
[0046]
First, a cooling gas was flowed at a flow rate of 0, 10, and 15 L / min (liter / minute) from the gas supply pipe 8, and the results of the temperature fluctuation suppression near the melt surface at each flow rate were measured. The result is shown in FIG.
[0047]
As shown in FIG. 2, the temperature fluctuation was ± 1.5 ° C. without gas cooling. However, the surface temperature decreased with an increase in the flow rate, but the temperature fluctuation was small. That is, the temperature fluctuation in the central part of the melt could be suppressed from ± 1.5 ° C. to ± 0.3 ° C. or less by gas cooling. As a result, a CBN single crystal with no change in optical refractive index could be produced with good reproducibility.
[0048]
The apparatus of this example was used for pulling a Ce-doped SBN crystal in the C-axis direction. The obtained crystal was sliced in a thickness of 2 mm in parallel with the C axis, processed into a plate shape of 40 mm × 40 mm size, and polished on both sides to be used as a recording medium of a digital hologram memory. Since this crystal has a small change in the refractive index of 10 −5 or less and is manufactured under a low temperature gradient and has good crystallinity and photorefractive characteristics, a high-density recording device with few reading and writing errors can be realized.
[0049]
(Example 2)
FIG. 3 shows a single crystal manufacturing apparatus according to the second embodiment.
The apparatus for producing a single crystal according to the present embodiment has a crucible 3 and a crucible support 7 composed of a heat-resistant cylindrical multi-tube, and a vertically movable cylinder 11 is provided in the innermost tube 11 of the cylindrical multi-tubes 7a and 7b. Is provided.
[0050]
Hereinafter, this will be described in more detail.
In FIG. 3, reference numeral 11 denotes a heat-resistant vertically movable cylinder, and reference numeral 7b denotes an innermost tube of a cylindrical multi-tube constituting the heat-resistant crucible support 7. In this embodiment, the lower atmosphere is cooled by opening the lower part of the innermost tube 7b constituting the cylindrical crucible support 7 and the position of the heat-resistant movable cylinder 11 inserted inside is changed up and down. The temperature at the bottom was adjusted.
[0051]
To explain the principle in Figure 3. First, the temperature distribution on the central axis in the innermost tube 7b when the cylinder 11 is not provided is such that the temperature is lower toward the open end from the lower part of the crucible because the lower part is cooled.
[0052]
Here, when the cylinder 11 is inserted, the flow of heat from the upper part to the lower part is shut off. Therefore, when the position is A1 shown in FIG. 3, the temperature distribution is 3 on the right, and when the position is A2, the temperature distribution is 4; A temperature drop of several tens of degrees Celsius occurs.
[0053]
By adjusting the positions of A1 and A2, the temperature of the crucible bottom could be adjusted in the same manner as in Example 1. Therefore, since the melt is locally cooled centering directly above the crucible, a temperature gradient could be formed such that the central portion was low and uniform in the radial direction in the melt and rapidly increased in the peripheral portion.
[0054]
In this way, temperature fluctuations in the central part of the melt could be suppressed. As a result, a CBN single crystal with no change in optical refractive index could be produced with good reproducibility.
[0055]
(Example 3)
FIG. 4 shows a single crystal crystal manufacturing apparatus according to the third embodiment.
The apparatus for producing a single crystal according to the present embodiment has a crucible 3 and a crucible support 7 composed of heat-resistant cylindrical multi-tubes 7a and 7b, and allows the inside of the innermost tube 7b of the cylindrical multi-tube to communicate with the outside. The heater 13 was provided inside the innermost tube 7b.
[0056]
In FIG. 4, a small heater 13 is inserted into the innermost tube 7b. By changing the temperature of the heater, the same effect as that of the movable cylinder of Example 2 was realized. Therefore, since the melt is locally cooled centering directly above the crucible, a temperature gradient could be formed such that the central portion was low and uniform in the radial direction in the melt, and rapidly increased at the peripheral portion. In this way, temperature fluctuations in the central part of the melt could be suppressed.
[0057]
As a result, a CBN single crystal with no change in optical refractive index could be produced with good reproducibility.
[0058]
【The invention's effect】
As described above, the present invention provides a simple method of locally cooling the crucible lower part, by adjusting the temperature gradient in the center of the crucible in the axial direction to be gentle to make the temperature of the central part of the melt nearly uniform. Since the range of convection occurs only near the crucible wall and does not exist in the central part of the melt, the temperature fluctuation in the central part of the melt can be suppressed to ± 0.3 ° C or less, and the change in crystal characteristics is extremely small. Single crystals can be produced.
[Brief description of the drawings]
FIG. 1 is a sectional view of a single crystal manufacturing apparatus according to a first embodiment.
FIG. 2 is a graph showing a temperature fluctuation suppressing effect in Example 1.
FIG. 3 is a graph showing a cross section of the edge makeup manufacturing apparatus according to the second embodiment and a temperature change depending on a cylinder position.
FIG. 4 is a sectional view of a single crystal manufacturing apparatus according to a third embodiment.
[Explanation of symbols]
1,2 vertical resistance heating heaters in two vertical zones,
3 platinum crucible,
4 SBN melt,
5 growing SBN single crystal,
6 Single crystal pulling rod,
7 Crucible support,
7a, 7b cylindrical multi-tube 7b innermost tube,
8 gas supply pipes,
9 cylinders,
10 heat-resistant fibers for heat insulation,
11 heat-resistant vertically movable cylinder,
12 Heat-resistant cylindrical crucible support,
13 Small heater.

Claims (3)

ルツボと、
耐熱性の円筒多重管よりなるルツボ支持台と、
を有する引き上げ法による単結晶製造装置において、
該ルツボの底部外面の中心に向かって開口するガス供給管を、該円筒多重管の最内管内に設け、
さらに、前記最内管の内径より小さな外径を有し、前記ガス供給管の外径より大きな内径を有する円筒を、前記ルツボ底部に前記ルツボと一体的に設け、融液の深さを 20 30 mmとし、ルツボの直径に対する融液深さの比を 2 10 3 10 として、融液中心部軸方向の融液の流れを止め結晶成長部直下の融液の温度変動を抑えるようにしたことを特徴とする単結晶製造装置。
Crucible and
A crucible support made of a heat-resistant cylindrical multi-tube,
In a single crystal manufacturing apparatus by a pulling method having
A gas supply pipe opening toward the center of the bottom outer surface of the crucible is provided in the innermost pipe of the cylindrical multiple pipe,
Further, a cylinder having an outer diameter smaller than the inner diameter of the innermost pipe and having an inner diameter larger than the outer diameter of the gas supply pipe is provided integrally with the crucible at the bottom of the crucible, and the depth of the melt is set to 20. and ~ 30 mm, the ratio of the melt depth to diameter of the crucible as a 2 / 10-1 3/10, suppress the temperature fluctuation of the melt just below the crystal growth part stopping the flow of the melt central axis of the melt An apparatus for producing a single crystal, characterized in that:
ルツボと、
耐熱性の円筒多重管よりなるルツボ支持台と、
を有する引き上げ法による単結晶製造装置において、
該円筒多重管の最内管の下部を開放し、さらに、前記最内管内に、上下動可能なシリンダーを設け、融液の深さを 20 30 mmとし、ルツボの直径に対する融液深さの比を 2 10 3 10 として、融液中心部軸方向の融液の流れを止め結晶成長部直下の融液の温度変動を抑えるようにしたことを特徴とする結晶製造装置。
Crucible and
A crucible support made of a heat-resistant cylindrical multi-tube,
In a single crystal manufacturing apparatus by a pulling method having
The lower part of the innermost tube of the cylindrical multiple tube is opened, and a cylinder that can move up and down is provided in the innermost tube, the depth of the melt is set to 20 to 30 mm, and the melt depth with respect to the diameter of the crucible is set. as 2 / 10-1 3/10 ratio, crystal manufacturing apparatus is characterized in that so as to suppress the temperature fluctuation of the melt just below the crystal growth part stopping the flow of the melt central axis of the melt.
ルツボと、
耐熱性の円筒多重管よりなるルツボ支持台と、
を有する引き上げ法による単結晶製造装置において、
該円筒多重管の最内管内を外部に連通せしめるとともに、該最内管の内部にヒータを設け、融液の深さを 20 30 mmとし、ルツボの直径に対する融液深さの比を 2 10 3 10 として、融液中心部軸方向の融液の流れを止め結晶成長部直下の融液の温度変動を抑えるようにしたことを特徴とする結晶製造装置。
Crucible and
A crucible support made of a heat-resistant cylindrical multi-tube,
In a single crystal manufacturing apparatus by a pulling method having
The inside of the innermost tube of the cylindrical multiple tube is communicated with the outside, a heater is provided inside the innermost tube, the depth of the melt is 20 to 30 mm, and the ratio of the melt depth to the crucible diameter is 2. / 10 as 1-3 / 10, crystal manufacturing apparatus is characterized in that so as to suppress the temperature fluctuation of the melt just below the crystal growth part stopping the flow of the melt central axis of the melt.
JP24480398A 1998-08-31 1998-08-31 Single crystal manufacturing equipment Expired - Lifetime JP3573257B2 (en)

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