JP3573530B2 - Epoxy resin mixture, epoxy resin composition and cured product thereof - Google Patents
Epoxy resin mixture, epoxy resin composition and cured product thereof Download PDFInfo
- Publication number
- JP3573530B2 JP3573530B2 JP17801695A JP17801695A JP3573530B2 JP 3573530 B2 JP3573530 B2 JP 3573530B2 JP 17801695 A JP17801695 A JP 17801695A JP 17801695 A JP17801695 A JP 17801695A JP 3573530 B2 JP3573530 B2 JP 3573530B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- mixture
- formula
- cured product
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title claims description 68
- 239000003822 epoxy resin Substances 0.000 title claims description 66
- 229920000647 polyepoxide Polymers 0.000 title claims description 66
- 150000001875 compounds Chemical class 0.000 claims description 17
- 239000003795 chemical substances by application Substances 0.000 claims description 15
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000000047 product Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 8
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 8
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 8
- -1 alkyl monosubstituted phenols Chemical class 0.000 description 8
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 229940015043 glyoxal Drugs 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229930185605 Bisphenol Natural products 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- NFIDBGJMFKNGGQ-UHFFFAOYSA-N 2-(2-methylpropyl)phenol Chemical compound CC(C)CC1=CC=CC=C1O NFIDBGJMFKNGGQ-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- YDSWCNNOKPMOTP-UHFFFAOYSA-N mellitic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O YDSWCNNOKPMOTP-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- IXQGCWUGDFDQMF-UHFFFAOYSA-N o-Hydroxyethylbenzene Natural products CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- CZAZXHQSSWRBHT-UHFFFAOYSA-N 2-(2-hydroxyphenyl)-3,4,5,6-tetramethylphenol Chemical compound OC1=C(C)C(C)=C(C)C(C)=C1C1=CC=CC=C1O CZAZXHQSSWRBHT-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- OCKYMBMCPOAFLL-UHFFFAOYSA-N 2-ethyl-3-methylphenol Chemical compound CCC1=C(C)C=CC=C1O OCKYMBMCPOAFLL-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- DUIOKRXOKLLURE-UHFFFAOYSA-N 2-octylphenol Chemical compound CCCCCCCCC1=CC=CC=C1O DUIOKRXOKLLURE-UHFFFAOYSA-N 0.000 description 1
- LCHYEKKJCUJAKN-UHFFFAOYSA-N 2-propylphenol Chemical compound CCCC1=CC=CC=C1O LCHYEKKJCUJAKN-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- SDJUKATYFRSDAS-UHFFFAOYSA-N 2-tert-butyl-3-methylphenol Chemical compound CC1=CC=CC(O)=C1C(C)(C)C SDJUKATYFRSDAS-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- YLIYUDQRTWXQSQ-UHFFFAOYSA-N 3-methyl-2-(2-methylpropyl)phenol Chemical compound CC(C)CC1=C(C)C=CC=C1O YLIYUDQRTWXQSQ-UHFFFAOYSA-N 0.000 description 1
- FCUBUGPGVCEURB-UHFFFAOYSA-N 3-methyl-2-propylphenol Chemical compound CCCC1=C(C)C=CC=C1O FCUBUGPGVCEURB-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- VGYLMOJQAHXYCK-UHFFFAOYSA-N CN1CNCC1 Chemical compound CN1CNCC1 VGYLMOJQAHXYCK-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 150000003944 halohydrins Chemical class 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Description
【0001】
【産業上の利用分野】
本発明は溶融粘度が低くフィラーの高充填化が可能であり、しかも耐熱性に優れた硬化物を与えるエポキシ樹脂混合物、エポキシ樹脂組成物に関する。
【0002】
【従来の技術】
エポキシ樹脂は種々の硬化剤で硬化させることにより、一般的に機械的性質、耐水性、耐薬品性、耐熱性、電気的性質などに優れた硬化物となり、接着剤、塗料、積層板、成形材料、注型材料などの幅広い分野に利用されている。従来、工業的に最も使用されているエポキシ樹脂としてビスフェノ−ルAにエピクロルヒドリンを反応させて得られる液状および固形のビスフェノ−ルA型エポキシ樹脂がある。その他液状のビスフェノ−ルA型エポキシ樹脂にテトラブロムビスフェノ−ルAを反応させて得られる難燃性臭素含有エポキシ樹脂などが汎用エポキシ樹脂として工業的に使用されている。また、特に半導体の封止用途としては、オルソクレゾールノボラックにエピクロルヒドリンを反応させて得られる多官能エポキシ樹脂などが主に利用されている。
【0003】
【発明が解決しようとする課題】
しかしながら、前記したようなオルソクレゾールノボラック型エポキシ樹脂は分子量が大きくなるにつれて、それを使用して得られる硬化物の耐熱性は向上するものの、溶融粘度が高くなるという欠点がある。また分子量の小さなオルソクレゾール型エポキシ樹脂、或は結晶性のテトラメチルビフェノール型エポキシ樹脂などは、溶融粘度は低くなるものの、その硬化物の耐熱性は低下するという欠点がある。近年、半導体封止材の高性能化を図るためフィラーの高充填化が可能なほど低粘度で、しかも、その硬化物の耐熱性の高いエポキシ樹脂の開発が求められている。
【0004】
【課題を解決するための手段】
本発明者らはこうした実状に鑑み、低粘度でしかも耐熱性に優れる硬化物を与えるエポキシ樹脂を求めて鋭意研究した結果、下記の特定の構造の化合物をグリシジルエーテル化して得られるエポキシ樹脂混合物が、極めて溶融粘度が低く、しかもその硬化物に対して優れた耐熱性を付与するものであることを見い出して本発明を完成させるに到った。
【0005】
すなわち本発明は
(1)式(1)
【0006】
【化3】
【0007】
(式中Rは水素原子、炭素数1〜9のアルキル基、アリール基、ハロゲン原子を表し、互いに同一であっても異なっていてもよい。Gはグリシジル基を表す。)で表される化合物からなる混合物であって、該混合物中の式(1)で表される化合物の総モル数を100とした場合の下式(2)で表される化合物の総モル数が80以上であることを特徴とするエポシキシ樹脂混合物、
【0008】
【化4】
【0009】
(式中、R及びGは式(1)におけるのと同じ意味を表す。)
(2)上記(1)記載のエポキシ樹脂混合物、硬化剤、必要により硬化促進剤を含むエポキシ樹脂組成物、
(3)上記(2)記載のエポキシ樹脂組成物を硬化してなる硬化物
を提供するものである。
【0010】
以下、本発明の詳細を説明する。
式(1)表される化合物を得るには公知の方法が採用できる。例えばフェノール類を酸触媒の存在下でグリオキザールと縮合反応させる。用いうるフェノール類の具体例としては、フェノールまたは、クレゾール、エチルフェノール、n−プロピルフェノール、イソブチルフェノール、t−ブチルフェノール、オクチルフェノール、ノニルフェノール等のアルキル一置換フェノールの各種o−,m−,p−異性体、またはキシレノール、メチルエチルフェノール、メチル−n−プロピルフェノール、メチルイソブチルフェノール、メチル−t−ブチルフェノール等のアルキル二置換フェノールの各種o−,m−,p−異性体並びにこれらのハロゲン置換体が挙げられる。これらは1種あるいは2種以上を混合して使用することができる。フェノール類の使用量は、グリオキザール1モルに対して通常4〜50モル、好ましくは5〜40モルである。また、グリオキザール類は通常その水溶液が用いられる。
【0011】
縮合に際して用いうる酸触媒の具体例としては通常p−トルエンスルホン酸、塩酸、硫酸、シュウ酸等の無機あるいは有機酸または三弗化ホウ素、無水塩化アルミニウム、塩化亜鉛等のルイス酸が挙げられ、特にp−トルエンスルホン酸、塩酸、硫酸が好ましい。これら酸触媒の使用量は、特に限定されるものではないが、グリオキザール1モルに対して通常0.001〜0.1モルである。
【0012】
上記反応は無溶剤下で、あるいは有機溶剤の存在下で行うことができる。用いうる有機溶剤の具体例としてはトルエン、キシレン、メチルイソブチルケトンなどが挙げられる。有機溶剤の使用量は仕込んだ原料の総重量に対して50〜300重量%が好ましく、特に100〜250重量%が好ましい。反応温度は、通常50〜150℃、反応時間は通常1〜10時間である。
【0013】
反応終了後、中和処理あるいは水洗処理を行った後、加熱減圧下で、未反応のフェノール類及び溶剤を留去して生成物の濃縮を行う。このようにして下式(3)表される化合物からなる混合物を得ることができる。
【0014】
【化5】
【0015】
(式中Rは式(1)におけるのと同じ意味を表す。)
次いで式(3)で表される化合物からなる混合物から公知の方法で精製を繰り返し式(4)で表される化合物のモル分率が80%以上、好ましくは85%以上の混合物を得る。
【0016】
【化6】
【0017】
(式中Rは式(1)におけるのと同じ意味を表す。)
ここで、精製の方法は特に制限がなく、例えば得られたガラス状固体をトルエン、キシレン、メチルイソブチルケトン等の有機溶剤に溶解し、n−ヘキサン、n−ヘプタン等の貧溶媒を加える操作を数回繰り返すことにより結晶を析出させる方法などが挙げられる。また、上記の方法以外でも例えば特開平7−76538号に記載の方法に準じてもよい。このようにして得られた式(3)で表される化合物からなる混合物であって、式(4)で表される化合物のモル分率が80%以上、好ましくは85%以上である混合物を以下、特に断りのない限り混合物(A)という。
【0018】
混合物(A)から本発明のエポキシ樹脂混合物を得る方法としては公知の方法が採用できる。例えば混合物(A)と過剰のエピハロヒドリンの溶解混合物にアルカリ金属水酸化物を添加し、または添加しながら20〜120℃の温度で反応させることにより得ることが出来る。上記反応において、アルカリ金属水酸化物はその水溶液を使用してもよく、その場合は該アルカリ金属水酸化物の水溶液を連続的に反応混合物内に添加すると共に減圧下、または常圧下、連続的に水及びエピハロヒドリンを留出させ、更に分液し水は除去しエピハロヒドリンは反応混合物内に連続的に戻す方法でもよい。
【0019】
混合物(A)とエピハロヒドリンの溶解混合物にテトラメチルアンモニウムクロライド、テトラメチルアンモニウムブロマイド、トリメチルベンジルアンモニウムクロライドなどの第4級アンモニウム塩を触媒として添加し50〜150℃で反応させて得られる混合物(A)のハロヒドリンエーテル化物にアルカリ金属水酸化物の固体または水溶液を加え、20〜120℃の温度で反応させ脱ハロゲン化水素(閉環)させる方法でもよい。
【0020】
通常これらの反応において使用されるエピハロヒドリンの量は混合物(A)の水酸基1当量に対し、通常1〜20モル、好ましくは1.5〜10モルである。アルカリ金属水酸化物の使用量は混合物(A)の水酸基1当量に対し0.8〜1.5モル、好ましくは0.9〜1.1モルである。更に反応を円滑に進行させるためにメタノール、エタノール等のアルコール類の他、ジメチルスルホン、ジメチルスルホキシドなどの非プロトン性極性溶媒などを添加して反応を行うことが好ましい。
【0021】
アルコール類を添加する場合、その使用量はエピハロヒドリンの使用量に対して2〜40重量%が好ましく、特に4〜30重量%が好ましい。また非プロトン性極性溶媒を添加する場合、その使用量はエピハロヒドリンの使用量に対して5〜100重量%が好ましく、特に10〜90重量%が好ましい。
【0022】
これらのエポキシ化反応の反応物を水洗後、または水洗無しに加熱減圧下、エピハロヒドリンや、溶媒などを除去し、必要により更に後処理を行う。後処理は、疎水性溶剤に得られたエポキシ樹脂を溶解する。用いうる疎水性溶剤の具体例としてはメチルイソブチルケトン、ベンゼン、トルエン、キシレン等が挙げられるが、メチルイソブチルケトン、トルエンが好ましい。これらは単独もしくは混合して使用できる。
【0023】
その後、原料として用いた混合物(A)の水酸基1モルに対して、0.025〜0.3モルのアルカリ金属水酸化物を加え、好ましくは40〜90℃で30〜3時間撹拌し、脱ハロゲン化反応を行う。この際、アルカリ金属水酸化物は5〜50重量%水溶液を用いることが好ましい。
【0024】
反応終了後、得られた樹脂溶液を数回水洗した後、疎水性溶剤を減圧下で留去することにより、目的とするエポキシ樹脂混合物を得ることが出来る。
【0025】
本発明のエポキシ樹脂混合物は単独でまたは他のエポキシ樹脂との併用で通常のエポキシ樹脂の場合と同様に硬化剤、さらに必要により硬化促進剤等を添加することにより硬化させることができる。
本発明のエポキシ樹脂混合物と他のエポキシ樹脂とを併用する場合、本発明のエポキシ樹脂混合物が全エポキシ樹脂中に占める割合は30重量%以上が好ましく、40重量%以上が特に好ましい。この場合用いうるエポキシ樹脂の例としては通常は1分子中に2個以上のエポキシ基を有する化合物が挙げられ、電子機器用として一般に用いられるものであれば特に制限はない。例えば、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ナフトールノボラック型エポキシ樹脂等のノボラック型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールAD型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビスフェノールI型エポキシ樹脂、ビフェニル型エポキシ樹脂等の、芳香族2価フェノール類から得られるエポキシ樹脂、フタル酸、ダイマー酸などの多塩基酸とエピハロヒドリンの反応により得られるグリシジルエステル型エポキシ樹脂、またジアミノジフェニルメタン、イソシアヌール酸などのポリアミンとエピハロヒドリンの反応により得られるグリシジルアミン型エポキシ樹脂などが挙げられる。これらのエポキシ樹脂は単独で用いてもよく、2種以上を混合してもよい。
【0026】
本発明で用いる硬化剤はアミン系化合物、酸無水物系化合物、アミド系化合物、フェノ−ル系化合物などである。用いうる硬化剤の具体例としては、ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、ジシアンジアミド、リノレン酸の2量体とエチレンジアミンとより合成されるポリアミド樹脂、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、フェノ−ルノボラック、及びこれらの変性物、イミダゾ−ル、BF3 −アミン錯体、グアニジン誘導体などが挙げられる。また、本発明のエポキシ樹脂混合物を調製する際に用いた混合物(A)も硬化剤として用いることができる。これらの硬化剤はそれぞれ単独で用いてもよいし、2種以上組み合わせて用いてもよい。
【0027】
これらの硬化剤の使用量は、エポキシ基に対して0.7〜1.2当量が好ましい。エポキシ基に対して、0.7当量に満たない場合、あるいは1.2当量を超える場合、いずれも硬化が不完全となり良好な硬化物性が得られない恐れがある。
【0028】
また本発明のエポキシ樹脂組成物には硬化促進剤を添加しても差し支えない。用いうる硬化促進剤の具体例としては2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール等のイミダゾ−ル類、2−(ジメチルアミノメチル)フェノール、1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等の第3級アミン類、トリフェニルホスフィン等のホスフィン類、オクチル酸スズなどの金属化合物などが挙げられる。硬化促進剤はエポキシ樹脂100重量部に対して0.1〜5.0重量部が必要に応じ用いられる。
更に本発明のエポキシ樹脂組成物には必要に応じてシリカ、アルミナ、タルク等の無機あるいは有機充填材、シランカップリング剤、離型剤、顔料等の種々の配合剤を添加することができる。
【0029】
本発明のエポキシ樹脂混合物、硬化剤更に必要により硬化促進剤の配合された本発明のエポキシ樹脂組成物は従来知られている方法と同様の方法で容易にその硬化物を得ることができる。例えば本発明のエポキシ樹脂混合物と硬化剤、必要により硬化促進剤及びその他の配合剤とを必要に応じて押出機、ニ−ダ、ロ−ル等を用いて均一になるまで充分に混合してエポキシ樹脂組成物を得、そのエポキシ樹脂組成物を溶融後注型あるいはトランスファ−成形機などを用いて成形し、さらに80〜200℃に加熱することによりその硬化物を得ることができる。
【0030】
また本発明のエポキシ樹脂組成物を溶剤に溶解させ、ガラス繊維、カ−ボン繊維、ポリエステル繊維、ポリアミド繊維、アルミナ繊維、紙などの基材に含浸させ加熱乾燥して得たプリプレグを熱プレス成形して硬化物を得ることなどもできる。
【0031】
この際用いうる溶剤の具体例としてはメチルエチルケトン、アセトン、メチルイソブチルケトン等が挙げられる。溶剤は、エポキシ樹脂組成物と溶剤の混合物において通常10〜70重量%、好ましくは15〜65重量%を占める量を使用する。
【0032】
【実施例】
次に本発明を実施例により更に具体的に説明するが、以下において部は特に断わりのない限り重量部である。尚、ガラス転移温度、吸水率の測定条件は次の通りである。
溶融粘度
I.C.Iコーンアンドプレート粘度計:リサーチエクイップメント社
ガラス転移温度
熱機械測定装置(TMA):真空理工社製 TM−7000
昇温速度:2℃/min
【0033】
実施例1
温度計、冷却官、撹拌器を取り付けたフラスコに窒素ガスパージを施しながら下記式(5)
【0034】
【化7】
【0035】
で表される化合物からなる混合物であって式(6)
【0036】
【化8】
【0037】
で表される化合物のモル分率が98%である混合物149部、エピクロルヒドリン555部、メタノール111部を仕込み溶解させた。更に70℃に加熱しフレーク状水酸化ナトリウム60部を100分かけて分割添加し、その後、更に70℃で75分間反応させた。反応終了後ロータリエバポレーターを使用し130℃、5mHgの加熱減圧下で、過剰のエピクロルヒドリン及びメタノールを留去し、残留物に470部のメチルイソブチルケトンを加え、溶解した。
【0038】
更に、このメチルイソブチルケトンの溶液を70℃に加熱し、メタノール23部、30重量%の水酸化ナトリウム水溶液10部を添加し1時間反応させた後、水洗を繰り返し洗浄液のpHを中性とした。更に水層は分離除去し、ロータリーエバポレーターを使用して油層から加熱減圧下メチルイソブチルケトンを留去し下記式(7)
【0039】
【化9】
【0040】
(式中、Gはグリシジル基を表す。)
で表される化合物からなる混合物であって、式(8)
【0041】
【化10】
【0042】
(式中Gはグリシジル基を表す。)
で表される化合物のモル分率が98%である本発明のエポキシ樹脂混合物(A)219部を得た。得られたエポキシ樹脂混合物のエポキシ当量は164g/eq、150℃における溶融粘度は0.4ポイズ、軟化点は81.4℃であった。
【0043】
実施例2
エポキシ樹脂混合物(A)、硬化剤としてフェノールノボラック(水酸基当量106g/eq、軟化点80℃)を用い、表1の配合物の組成の欄に示す組成で配合して、70℃で15分ロールで混練し、150℃、180秒でトランスファー成形して、その後160℃で2時間、更に180℃で8時間硬化せしめて試験片を作成し、ガラス転移温度を測定した。結果を表1に示す。尚、表中の配合物の組成の欄の数値は部を表す。
【0044】
【表1】
表1
配合物の組成
エポキシ樹脂混合物(A) 100
フェノールノボラック 64.6
硬化物の物性
ガラス転移温度(℃) 192
【0045】
【発明の効果】
本発明のエポキシ樹脂混合物又は組成物は、適度な軟化点及び極めて低い溶融粘度を有するにも拘らず、それを使用して得られる硬化物は、耐熱性に非常に優れるという特性を備えている。
すなわち本発明のエポキシ樹脂混合物はフィラーの高充填が可能で耐熱性に優れた硬化物を与えることができ、成形材料、注型材料、積層材料、塗料、接着剤、レジストなどの広範囲の用途に極めて有用であり、更にアクリル酸やメタクリル酸と反応させることにより、紫外線硬化型樹脂として使用することも可能である。[0001]
[Industrial applications]
TECHNICAL FIELD The present invention relates to an epoxy resin mixture and an epoxy resin composition which have a low melt viscosity and can be filled with a filler, and provide a cured product having excellent heat resistance.
[0002]
[Prior art]
Epoxy resins can be cured with various curing agents to give cured products with excellent mechanical properties, water resistance, chemical resistance, heat resistance, and electrical properties. It is used in a wide range of fields such as materials and casting materials. Conventionally, there is a liquid and solid bisphenol A type epoxy resin obtained by reacting bisphenol A with epichlorohydrin as the epoxy resin most used industrially. Other flame-retardant bromine-containing epoxy resins obtained by reacting tetrabromobisphenol A with a liquid bisphenol A-type epoxy resin are industrially used as general-purpose epoxy resins. In particular, as a semiconductor encapsulation application, a polyfunctional epoxy resin obtained by reacting ortho-cresol novolak with epichlorohydrin is mainly used.
[0003]
[Problems to be solved by the invention]
However, as described above, as the molecular weight of the ortho-cresol novolac epoxy resin increases, the heat resistance of a cured product obtained by using the resin increases, but the melt viscosity increases. Orthocresol type epoxy resin having a small molecular weight or crystalline tetramethylbiphenol type epoxy resin has a disadvantage that although the melt viscosity is low, the heat resistance of the cured product is low. In recent years, in order to improve the performance of semiconductor encapsulants, there has been a demand for the development of an epoxy resin having a viscosity low enough to allow a high filling of a filler and a cured product having high heat resistance.
[0004]
[Means for Solving the Problems]
In view of such circumstances, the present inventors have conducted intensive studies for an epoxy resin that provides a cured product having a low viscosity and excellent heat resistance.As a result, an epoxy resin mixture obtained by glycidyl etherifying a compound having the following specific structure is obtained. The present invention has been found to have an extremely low melt viscosity and to impart excellent heat resistance to the cured product, thereby completing the present invention.
[0005]
That is, the present invention provides the following equation (1).
[0006]
Embedded image
[0007]
(Wherein R represents a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, an aryl group, or a halogen atom, which may be the same or different, and G represents a glycidyl group). Wherein the total number of moles of the compound represented by the following formula (2) is 80 or more when the total number of moles of the compound represented by the formula (1) in the mixture is 100. An epoxy resin mixture,
[0008]
Embedded image
[0009]
(In the formula, R and G represent the same meaning as in Formula (1).)
(2) an epoxy resin composition containing the epoxy resin mixture according to the above (1), a curing agent, and if necessary, a curing accelerator,
(3) A cured product obtained by curing the epoxy resin composition according to (2).
[0010]
Hereinafter, details of the present invention will be described.
Known methods can be employed to obtain the compound represented by the formula (1). For example, a phenol is subjected to a condensation reaction with glyoxal in the presence of an acid catalyst. Specific examples of phenols that can be used include various o-, m-, and p-isomers of phenol or alkyl monosubstituted phenols such as cresol, ethyl phenol, n-propyl phenol, isobutyl phenol, t-butyl phenol, octyl phenol, and nonyl phenol. Or the various o-, m-, p-isomers of alkyl disubstituted phenols such as xylenol, methylethylphenol, methyl-n-propylphenol, methylisobutylphenol, methyl-t-butylphenol, and halogen-substituted products thereof. No. These can be used alone or in combination of two or more. The amount of the phenol used is usually 4 to 50 mol, preferably 5 to 40 mol, per 1 mol of glyoxal. In addition, an aqueous solution of glyoxal is usually used.
[0011]
Specific examples of the acid catalyst that can be used in the condensation include inorganic or organic acids such as p-toluenesulfonic acid, hydrochloric acid, sulfuric acid, and oxalic acid, or boron trifluoride, anhydrous aluminum chloride, and Lewis acids such as zinc chloride. Particularly, p-toluenesulfonic acid, hydrochloric acid and sulfuric acid are preferred. The use amount of these acid catalysts is not particularly limited, but is usually 0.001 to 0.1 mol per 1 mol of glyoxal.
[0012]
The above reaction can be performed in the absence of a solvent or in the presence of an organic solvent. Specific examples of the organic solvent that can be used include toluene, xylene, and methyl isobutyl ketone. The amount of the organic solvent used is preferably 50 to 300% by weight, and more preferably 100 to 250% by weight, based on the total weight of the charged raw materials. The reaction temperature is usually 50 to 150 ° C, and the reaction time is usually 1 to 10 hours.
[0013]
After completion of the reaction, a neutralization treatment or a water washing treatment is performed, and then the unreacted phenols and the solvent are distilled off under heating and reduced pressure to concentrate the product. Thus, a mixture comprising the compound represented by the following formula (3) can be obtained.
[0014]
Embedded image
[0015]
(In the formula, R represents the same meaning as in formula (1).)
Next, the mixture of the compound represented by the formula (3) is repeatedly purified by a known method to obtain a mixture in which the mole fraction of the compound represented by the formula (4) is 80% or more, preferably 85% or more.
[0016]
Embedded image
[0017]
(In the formula, R represents the same meaning as in formula (1).)
Here, the purification method is not particularly limited. For example, an operation of dissolving the obtained glassy solid in an organic solvent such as toluene, xylene, or methyl isobutyl ketone and adding a poor solvent such as n-hexane or n-heptane is performed. A method in which crystals are precipitated by repeating the method several times may be used. Further, other than the above method, for example, a method described in JP-A-7-76538 may be used. A mixture comprising the compound represented by the formula (3) thus obtained, wherein the molar fraction of the compound represented by the formula (4) is 80% or more, preferably 85% or more. Hereinafter, unless otherwise specified, it is referred to as a mixture (A).
[0018]
As a method for obtaining the epoxy resin mixture of the present invention from the mixture (A), a known method can be employed. For example, it can be obtained by adding an alkali metal hydroxide to a dissolved mixture of the mixture (A) and an excess of epihalohydrin, or reacting the mixture at a temperature of 20 to 120 ° C. while adding the alkali metal hydroxide. In the above reaction, an aqueous solution of the alkali metal hydroxide may be used. In that case, the aqueous solution of the alkali metal hydroxide is continuously added to the reaction mixture and under reduced pressure or normal pressure. In this method, water and epihalohydrin are distilled off, the liquid is further separated, water is removed, and epihalohydrin is continuously returned to the reaction mixture.
[0019]
A quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, or trimethylbenzylammonium chloride is added as a catalyst to the mixture (A) and the dissolved mixture of epihalohydrin as a catalyst, and the mixture is reacted at 50 to 150 ° C (A). A method of adding a solid or aqueous solution of an alkali metal hydroxide to the halohydrin etherified product of the above and reacting at a temperature of 20 to 120 ° C. to dehydrohalide (ring closure) may be used.
[0020]
The amount of epihalohydrin used in these reactions is usually 1 to 20 mol, preferably 1.5 to 10 mol, per 1 equivalent of the hydroxyl group of the mixture (A). The amount of the alkali metal hydroxide to be used is 0.8 to 1.5 mol, preferably 0.9 to 1.1 mol, per 1 equivalent of the hydroxyl group of the mixture (A). Further, in order to make the reaction proceed smoothly, it is preferable to carry out the reaction by adding an aprotic polar solvent such as dimethyl sulfone or dimethyl sulfoxide in addition to alcohols such as methanol and ethanol.
[0021]
When alcohols are added, the amount used is preferably 2 to 40% by weight, particularly preferably 4 to 30% by weight, based on the amount of epihalohydrin used. When an aprotic polar solvent is added, the amount used is preferably 5 to 100% by weight, particularly preferably 10 to 90% by weight, based on the amount of epihalohydrin used.
[0022]
After the reaction product of the epoxidation reaction is washed with or without water, epihalohydrin, a solvent, and the like are removed under heating and reduced pressure, and further post-treatment is performed as necessary. Post-treatment dissolves the resulting epoxy resin in a hydrophobic solvent. Specific examples of the hydrophobic solvent that can be used include methyl isobutyl ketone, benzene, toluene, xylene and the like, and methyl isobutyl ketone and toluene are preferred. These can be used alone or in combination.
[0023]
Thereafter, 0.025 to 0.3 mol of an alkali metal hydroxide is added to 1 mol of the hydroxyl group of the mixture (A) used as a raw material, and the mixture is preferably stirred at 40 to 90 ° C. for 30 to 3 hours to remove Perform a halogenation reaction. At this time, it is preferable to use a 5 to 50% by weight aqueous solution of the alkali metal hydroxide.
[0024]
After completion of the reaction, the obtained resin solution is washed with water several times, and then the hydrophobic solvent is distilled off under reduced pressure to obtain the desired epoxy resin mixture.
[0025]
The epoxy resin mixture of the present invention can be cured alone or in combination with other epoxy resins by adding a curing agent and, if necessary, a curing accelerator, as in the case of ordinary epoxy resins.
When the epoxy resin mixture of the present invention is used in combination with another epoxy resin, the proportion of the epoxy resin mixture of the present invention in the total epoxy resin is preferably 30% by weight or more, and particularly preferably 40% by weight or more. Examples of the epoxy resin that can be used in this case include compounds having two or more epoxy groups in one molecule, and are not particularly limited as long as they are generally used for electronic devices. For example, phenol novolak type epoxy resin, cresol novolak type epoxy resin, novolak type epoxy resin such as naphthol novolak type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AD type epoxy resin, bisphenol S type epoxy resin, Epoxy resins obtained from aromatic dihydric phenols, such as bisphenol I type epoxy resins and biphenyl type epoxy resins, glycidyl ester type epoxy resins obtained by the reaction of epihalohydrin with polybasic acids such as phthalic acid and dimer acid, and diamino Glycidylamine-type epoxy resins obtained by the reaction of a polyamine such as diphenylmethane and isocyanuric acid with epihalohydrin are exemplified. These epoxy resins may be used alone or in combination of two or more.
[0026]
The curing agent used in the present invention is an amine compound, an acid anhydride compound, an amide compound, a phenol compound, or the like. Specific examples of the curing agent that can be used include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, a polyamide resin synthesized from a dimer of linolenic acid and ethylenediamine, phthalic anhydride, and trianhydride. Mellitic acid, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, phenol-novolak, and modified products thereof, Imidazole, BF 3 -amine complex, guanidine derivative and the like. Further, the mixture (A) used for preparing the epoxy resin mixture of the present invention can also be used as a curing agent. These curing agents may be used alone or in combination of two or more.
[0027]
The use amount of these curing agents is preferably 0.7 to 1.2 equivalents to the epoxy group. If the amount is less than 0.7 equivalents or more than 1.2 equivalents with respect to the epoxy group, curing may be incomplete and good cured physical properties may not be obtained.
[0028]
Further, a curing accelerator may be added to the epoxy resin composition of the present invention. Specific examples of the curing accelerator that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2- (dimethylaminomethyl) phenol, and 1,8-diaza- Examples include tertiary amines such as bicyclo (5,4,0) undecene-7, phosphines such as triphenylphosphine, and metal compounds such as tin octylate. The curing accelerator is used, if necessary, in an amount of 0.1 to 5.0 parts by weight based on 100 parts by weight of the epoxy resin.
Further, various compounding agents such as inorganic or organic fillers such as silica, alumina and talc, silane coupling agents, release agents and pigments can be added to the epoxy resin composition of the present invention, if necessary.
[0029]
The epoxy resin composition of the present invention containing the epoxy resin mixture of the present invention, a curing agent and, if necessary, a curing accelerator can be easily obtained by a method similar to a conventionally known method. For example, the epoxy resin mixture of the present invention and a curing agent, and if necessary, a curing accelerator and other compounding agents are sufficiently mixed using an extruder, a kneader, a roll, or the like, if necessary, until the mixture becomes uniform. An epoxy resin composition is obtained, and the epoxy resin composition is melted, molded using a casting or transfer molding machine, and further heated to 80 to 200 ° C. to obtain a cured product.
[0030]
Further, a prepreg obtained by dissolving the epoxy resin composition of the present invention in a solvent, impregnating a base material such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper, etc. and drying by heating is subjected to hot press molding. To obtain a cured product.
[0031]
Specific examples of the solvent that can be used at this time include methyl ethyl ketone, acetone, and methyl isobutyl ketone. The solvent is used in an amount that usually accounts for 10 to 70% by weight, preferably 15 to 65% by weight in the mixture of the epoxy resin composition and the solvent.
[0032]
【Example】
Next, the present invention will be described in more detail with reference to Examples. In the following, parts are by weight unless otherwise specified. The measurement conditions of the glass transition temperature and the water absorption are as follows.
Melt viscosity C. I cone and plate viscometer: Research Equipment Company glass transition temperature thermomechanical analyzer (TMA): TM-7000 manufactured by Vacuum Riko Co., Ltd.
Heating rate: 2 ° C / min
[0033]
Example 1
The following formula (5) is applied to a flask equipped with a thermometer, a cooling agent and a stirrer while purging with nitrogen gas.
[0034]
Embedded image
[0035]
A mixture comprising a compound represented by the formula (6):
[0036]
Embedded image
[0037]
149 parts of a mixture having a molar fraction of 98% of the compound represented by the formula, 555 parts of epichlorohydrin, and 111 parts of methanol were charged and dissolved. The mixture was further heated to 70 ° C., and 60 parts of flake sodium hydroxide was added in portions over 100 minutes, and then the reaction was further performed at 70 ° C. for 75 minutes. After completion of the reaction, excess epichlorohydrin and methanol were distilled off at 130 ° C. and under reduced pressure of 5 mHg using a rotary evaporator, and 470 parts of methyl isobutyl ketone was added to the residue to dissolve.
[0038]
Further, the solution of methyl isobutyl ketone was heated to 70 ° C., 23 parts of methanol and 10 parts of a 30% by weight aqueous sodium hydroxide solution were added, and the mixture was reacted for 1 hour. . Further, the aqueous layer was separated and removed, and methyl isobutyl ketone was distilled off from the oil layer under reduced pressure by heating using a rotary evaporator to obtain the following formula (7)
[0039]
Embedded image
[0040]
(In the formula, G represents a glycidyl group.)
A mixture comprising a compound represented by the formula:
[0041]
Embedded image
[0042]
(In the formula, G represents a glycidyl group.)
219 parts of the epoxy resin mixture (A) of the present invention having a molar fraction of the compound represented by the formula of 98% was obtained. The obtained epoxy resin mixture had an epoxy equivalent of 164 g / eq, a melt viscosity at 150 ° C. of 0.4 poise, and a softening point of 81.4 ° C.
[0043]
Example 2
Using the epoxy resin mixture (A), phenol novolak (hydroxyl equivalent 106 g / eq, softening point 80 ° C.) as a curing agent, the composition shown in the composition column of the composition in Table 1 was blended, and the mixture was rolled at 70 ° C. for 15 minutes. , And transfer-molded at 150 ° C. for 180 seconds, and then cured at 160 ° C. for 2 hours and further at 180 ° C. for 8 hours to prepare a test piece, and the glass transition temperature was measured. Table 1 shows the results. In addition, the numerical value in the column of the composition of the compound in the table represents part.
[0044]
[Table 1]
Table 1
Composition of formulation Epoxy resin mixture (A) 100
Phenol novolak 64.6
Physical properties of cured product Glass transition temperature (° C) 192
[0045]
【The invention's effect】
Although the epoxy resin mixture or composition of the present invention has a moderate softening point and an extremely low melt viscosity, a cured product obtained by using the same has the property of being extremely excellent in heat resistance. .
That is, the epoxy resin mixture of the present invention can provide a cured product with high heat resistance and high filling of filler, and can be used in a wide range of applications such as molding materials, casting materials, laminate materials, paints, adhesives, and resists. It is extremely useful and can be used as an ultraviolet-curable resin by reacting with acrylic acid or methacrylic acid.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17801695A JP3573530B2 (en) | 1995-06-22 | 1995-06-22 | Epoxy resin mixture, epoxy resin composition and cured product thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17801695A JP3573530B2 (en) | 1995-06-22 | 1995-06-22 | Epoxy resin mixture, epoxy resin composition and cured product thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH093162A JPH093162A (en) | 1997-01-07 |
| JP3573530B2 true JP3573530B2 (en) | 2004-10-06 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17801695A Expired - Lifetime JP3573530B2 (en) | 1995-06-22 | 1995-06-22 | Epoxy resin mixture, epoxy resin composition and cured product thereof |
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| Country | Link |
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| JP (1) | JP3573530B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011090022A1 (en) | 2010-01-20 | 2011-07-28 | 三菱瓦斯化学株式会社 | Cyanate ester compound and cured product thereof |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3349963B2 (en) * | 1998-10-21 | 2002-11-25 | 日本電気株式会社 | Flame-retardant epoxy resin composition and semiconductor device using the same |
| TWI346111B (en) * | 2004-02-09 | 2011-08-01 | Nippon Kayaku Kk | Photosensitive resin composition and products of cured product thereof |
| JP2006213823A (en) * | 2005-02-03 | 2006-08-17 | Nippon Kayaku Co Ltd | Heat-resistant epoxy resin composition |
| JP4915896B2 (en) * | 2005-07-07 | 2012-04-11 | 日本化薬株式会社 | Production method of epoxy resin |
| JPWO2007046262A1 (en) | 2005-10-18 | 2009-04-23 | 日本化薬株式会社 | Epoxy resin, epoxy resin composition, photosensitive resin composition and cured product thereof |
| JP5268233B2 (en) * | 2006-04-18 | 2013-08-21 | 日本化薬株式会社 | Epoxy resin, epoxy resin composition, and cured product thereof |
-
1995
- 1995-06-22 JP JP17801695A patent/JP3573530B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011090022A1 (en) | 2010-01-20 | 2011-07-28 | 三菱瓦斯化学株式会社 | Cyanate ester compound and cured product thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH093162A (en) | 1997-01-07 |
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