JP3600845B2 - 中空高分子微粒子及びその製造法 - Google Patents
中空高分子微粒子及びその製造法 Download PDFInfo
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- JP3600845B2 JP3600845B2 JP2004063485A JP2004063485A JP3600845B2 JP 3600845 B2 JP3600845 B2 JP 3600845B2 JP 2004063485 A JP2004063485 A JP 2004063485A JP 2004063485 A JP2004063485 A JP 2004063485A JP 3600845 B2 JP3600845 B2 JP 3600845B2
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- monomer
- crosslinkable monomer
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- 239000002904 solvent Substances 0.000 claims description 40
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- 239000000243 solution Substances 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical group C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 claims description 6
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- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 2
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- 125000004103 aminoalkyl group Chemical group 0.000 description 2
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- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 2
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- HPUCAWBFVXHLDN-UHFFFAOYSA-N 1-but-1-enyl-2-phenylbenzene Chemical group CCC=CC1=CC=CC=C1C1=CC=CC=C1 HPUCAWBFVXHLDN-UHFFFAOYSA-N 0.000 description 1
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- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
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- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
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- 239000002994 raw material Substances 0.000 description 1
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- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Landscapes
- Polymerisation Methods In General (AREA)
- Manufacturing Of Micro-Capsules (AREA)
Description
分散安定剤(A)
本発明で使用する分散安定剤(A)は、上記架橋性モノマー(B)(又は架橋性モノマー(B)と単官能性モノマー(B’)との混合物)、開始剤(C)及び溶媒(D)からなる混合物を水中に分散して形成した液滴が合一しないようにする作用を有するものが広い範囲から使用でき、例えば、ポリビニルアルコール、メチルセルロース、エチルセルロース、ポリアクリル酸、ポリアクリルイミド、ポリエチレンオキシド、ポリ(ハイドロオキシステアリン酸−g−メタクリル酸メチル−co−メタクリル酸)共重合体等の高分子分散安定剤、ノニオン系界面活性剤、アニオン系界面活性剤、両性界面活性剤等が挙げられる。このなかでも、ポリビニルアルコール等の高分子分散安定剤が好ましい。
架橋性モノマー(B)及び単官能性モノマー(B’)
架橋性モノマー(B)としては、重合性反応基、特に重合性2重結合を2個以上(特に、2〜4個)有する多官能性モノマーが例示でき、例えば、ジビニルベンゼン、ジビニルビフェニル、ジビニルナフタレン、ジアリルフタレート、トリアリルシアヌレート、エチレングリコールジメタクリレート、テトラエチレングリコールジメタクリレートが挙げられる。これらは単独であるいは2種以上を混合して使用できる。
上記一般式(1)において、R1は、水素原子、メチル基又は塩素原子が好ましく、R2は、水素原子、塩素原子、メチル基又は−SO3Na基であるのが好ましい。
一般式(2)において、R3は、水素原子又はメチル基であるのが好ましく、R4は、水素原子、炭素数1〜8のアルキル基、フェニル基、低級ヒドロキシアルキル基、低級アミノアルキル基が好ましい。
上記ビニルエステル系単量体の具体例としては、ギ酸ビニル、酢酸ビニル、プロピオン酸ビニル等が挙げられる。
上記ビニルエーテル系単量体の具体例としては、ビニルメチルエーテル、ビニルエチルエーテル、ビニルn−ブチルエーテル、ビニルフェニルエーテル、ビニルシクロヘキシルエーテル等が挙げられる。
上記モノオレフィン系単量体の具体例としては、エチレン、プロピレン、ブテン−1、ペンテン−1、4−メチルペンテン−1等が挙げられる。
溶媒(D)
本発明で使用する溶媒(D)は、上記架橋性モノマー(B)又は架橋性モノマー(B)と単官能性モノマー(B’)との混合物、及び重合開始剤(C)を溶解するが、少なくとも1種の架橋性モノマー(B)から得られる重合体若しくは共重合体又は少なくとも1種の架橋性モノマー(B)と少なくとも1種の単官能性モノマー(B’)との共重合体に対する相溶性が低く、これら重合体又は共重合体の相分離を促進し、且つ、架橋性モノマー(B)の重合被膜又は架橋性モノマー(B)と単官能性モノマー(B’)との混合物の重合皮膜の形成を妨げないものであれば、各種の有機溶媒が使用できる。
分散工程
本発明では、上記分散安定剤(A)の水溶液中に、架橋性モノマー(B) (又は架橋性モノマー(B)と前記単官能性モノマー(B’)との混合物)、開始剤(C)及び前記溶媒(D)を前記使用割合で含有する混合物を分散させ、懸濁重合を行なう。
懸濁重合
こうして得られた架橋性モノマー(B)(又は架橋性モノマー(B)と前記単官能性モノマー(B’)との混合物)、開始剤(C)及び前記溶媒(D)の均一混合物が分散された分散安定剤(A)の水溶液を、懸濁重合に供するには、該水溶液を撹拌しながら加熱すればよい。
本発明の中空高分子微粒子
本発明の方法により得られる中空高分子微粒子は、既述のように、そのシェルが、実質上架橋性モノマー(B)の重合体(又は架橋性モノマー(B)と前記単官能性モノマー(B’)との共重合体)からなる単層構造であり、この点において、前記従来法により得られる3層構造又は2層構造の中空高分子微粒子とは大きく異なっている。
また、本発明の中空高分子微粒子の粒子径は、前記液滴の大きさを変化させることにより調節することが出来るが、一般には、本発明の中空高分子微粒子の平均粒子径は、0.1〜30μm、特に0.5〜10μmの範囲にあるのが好ましい。この場合の中空高分子微粒子の粒子径は、電子顕微鏡あるいは光学顕微鏡により測定した場合の粒子径である。
実施例
つぎに、実施例及び比較例を掲げて本発明をより詳しく説明する。これら実施例は本発明の理解を容易にするためのものであって、本発明を限定するものではなく、種々の変更が可能である。
Claims (6)
- シェル及び中空部からなる中空高分子微粒子であって、シェルが架橋性モノマーの重合体もしくは2種以上の架橋性モノマーの共重合体からなる単層構造を有することを特徴とする中空高分子微粒子。
- シェルの厚さが0.01〜4μm、以下の式で示される空隙率が50〜80%であり、平均粒子径が0.1〜30μmである請求項1に記載の中空高分子微粒子。
空隙率(%)=(rh/rp)3×100
(式中、rhは、中空部分の半径(シェルの内径の1/2)であり、rpは、中空粒子の半径(シェルの外径の1/2)である。) - 架橋性モノマーが、ジビニルベンゼン、ジビニルビフェニル、ジビニルナフタレン、ジアリルフタレート、トリアリルシアヌレート、エチレングリコールジメタクリレート及びテトラエチレングリコールジメタクリレートからなる群から選ばれる少なくとも1種である請求項1又は2に記載の中空高分子微粒子。
- 分散安定剤(A)の水溶液中で、(i)少なくとも1種の架橋性モノマー(B)、(ii)開始剤(C)、及び(iii) 少なくとも1種の架橋性モノマー(B)から得られる重合体もしくは共重合体に対して相溶性の低い水難溶性の溶媒(D)からなる混合物を分散させ、懸濁重合を行うことを特徴とする請求項1に記載の中空高分子微粒子の製造方法。
- 溶媒(D)が、少なくとも1種の架橋性モノマー(B)の重合体若しくは共重合体に対して相溶性が低い性質を有し、かつ、溶媒(D)と水間の界面張力(γX)と、本発明製造方法の条件下で架橋性モノマー(B)を溶媒(D)に溶解してなる溶液を懸濁重合に供して得られるポリマー吸着表面と水間の界面張力(γP)(mN/m)との関係において、γX≧γPのような条件が成立する溶媒である請求項4に記載の方法。
- 架橋性モノマーが、ジビニルベンゼン、ジビニルビフェニル、ジビニルナフタレン、ジアリルフタレート、トリアリルシアヌレート、エチレングリコールジメタクリレート及びテトラエチレングリコールジメタクリレートからなる群から選ばれる少なくとも1種である請求項4又は5に記載の方法。
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| JP4939251B2 (ja) * | 2007-02-14 | 2012-05-23 | 電気化学工業株式会社 | 有機塩素重合体粒子及びその製造方法 |
| JP5481807B2 (ja) * | 2008-07-30 | 2014-04-23 | Jsr株式会社 | 顔料複合化中空粒子の製造方法 |
| JP5559585B2 (ja) * | 2009-10-14 | 2014-07-23 | 積水化学工業株式会社 | 塩化ビニル系中空粒子、その製造方法、塩化ビニル系樹脂組成物及び塩化ビニル系成形体 |
| JP5858451B2 (ja) * | 2010-06-29 | 2016-02-10 | 国立大学法人 岡山大学 | ヒドロゲルカプセルの製造方法 |
| CN108130742B (zh) * | 2016-12-01 | 2020-07-10 | 广州蓝月亮实业有限公司 | 一种护理组合物、护理剂及其制备方法和应用 |
| CN115785516B (zh) | 2017-08-01 | 2025-04-11 | 日本瑞翁株式会社 | 中空树脂颗粒的制造方法 |
| JP7352804B2 (ja) | 2019-05-09 | 2023-09-29 | ダイキン工業株式会社 | 中空微粒子の製造方法及び中空微粒子 |
| JP2023022336A (ja) * | 2019-12-26 | 2023-02-15 | 富士フイルム株式会社 | 中空粒子、組成物、部材、中空粒子の製造方法 |
| US20230383021A1 (en) | 2020-10-30 | 2023-11-30 | Zeon Corporation | Method for producing hollow particles and hollow particles |
| CN116745027B (zh) * | 2021-01-29 | 2026-03-13 | 日本瑞翁株式会社 | 中空颗粒 |
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