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JP3602874B2 - Branch modulation type optical modulator - Google Patents
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JP3602874B2 - Branch modulation type optical modulator - Google Patents

Branch modulation type optical modulator Download PDF

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Publication number
JP3602874B2
JP3602874B2 JP23545094A JP23545094A JP3602874B2 JP 3602874 B2 JP3602874 B2 JP 3602874B2 JP 23545094 A JP23545094 A JP 23545094A JP 23545094 A JP23545094 A JP 23545094A JP 3602874 B2 JP3602874 B2 JP 3602874B2
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Prior art keywords
mode
optical modulator
waveguide
type optical
light
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JP23545094A
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JPH0894983A (en
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竜司 米田
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Kyocera Corp
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Kyocera Corp
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Description

【0001】
【産業上の利用分野】
本発明は分岐変調型光変調器(マッハツェンダー型光変調器)の改良に関するものである。
【0002】
【従来の技術】
近年のマッハツェンダー型光変調器においては、Ti熱拡散LiNbOチャンネル型導波路が、そのLiNbO自体の大きな電気光学定数ならびに駆動電圧が小さくできるという点で、提案されている。
【0003】
図7はこのマッハツェンダー型光変調器1であり、2はZカットニオブ酸リチウム板(LiNbOのZ板)から成る基板、3はこの基板2上に設けたSiOバッファ層、4は電気光学効果のある基板表層に設けられた導波路、5は電極、6は偏光板である。
【0004】
この光変調器1によれば、上記導波路4は、光入射部4aと、分波部4bと、位相変調部4cと、合波部4dと、光出射部4eとから成り、偏光板6を通して光入射部4aに入射した光は分波部4bにより分波し、次いで位相変調部4cを伝搬し、合波部4dを介して合成されて光出射部4eに到る。
【0005】
各位相変調部4c上には電極5を形成して、この電極5に印加すると非対称電界が発生し、この電界により各位相変調部4cの屈折率を変化させ、更にこの屈折率の変化に応じて、それぞれの光に位相差が生じる。そして、上記電界強度の大きさにより位相変調部4cの屈折率の変化量が決まるので、かかる位相差により合成後の出射光の強度制御ができる。
【0006】
このLiNbO結晶には、光学的に異方性があり、ZカットLiNbO基板の表層において、x方向に光が伝搬するように導波路を作製した場合では、光の偏光方向により屈折率が異なるので、TEモード光が常光線、TMモードが異常光となる。そこで、電界をz軸方向に印加したときの常光線および異常光の屈折率の変化はそれぞれ、
Δn=r13 /2
Δn=r33 /2
となって、r33がr13に比べて数倍程度の大きくなるので、TMモードの方がTEモードに比べ、電界の影響を大きく受けることになる。したがって、変調動作に用いるに際しては、TMモードの方が印加効率が大きい点で望ましいので、TMモード光のみを導波させるために、前記のように偏光板6を設けて、その偏光板6の偏光方向と結晶の光学軸(z軸)を一致させて、偏光板6を介して光の入射を行なっている。
【0007】
【従来技術の問題点】
しかしながら、上記構成のマッハツェンダー型光変調器1においては、導波路4の作製条件(Ti拡散前のTi拡散源の幅、膜厚、拡散時間、拡散温度等)、並びに導波路4と電極5との配置関係を、駆動電圧が最小化するとともに、TM最低次モードがカットオフにならない範囲内で、最適設計しているが、偏光板6の偏光方向を基板2の結晶軸に対して正確に設定することが難しく、よって入射した光は、TMモードのみならず、TEモードが励起される場合があり、これにより、そのTEモードも電界により変調を受け、その結果、これらTM、TEの両モードの重ね合わせによって図3の消光比特性図が示す通り、各ピークにおいて消光比にばらつきが生じるという問題があった。
【0008】
この問題点を解決するためには、入射光の偏光方向と結晶の光学軸を精度よく一致させることが重要であるが、実際上その精度を高めることは難しく、熟練した技術が要する。
【0009】
しかも、その光変調器1の構成が複雑になり、コストの増大を招いていた。
【0010】
更にTMモードのみを励起させ、TEモード成分をカットオフする導波路の条件を選択すると、駆動電圧を下げるための最適化の設定が難しくなるという問題点があった。
【0011】
したがって、本発明の目的は構成が複雑にならないようにして、駆動電圧の特性を損なわず、しかも、消光比特性の良好な分岐変調型光変調器(マッハツェンダー型光変調器)を提供することにある。
【0012】
【課題を解決するための手段】
本発明の分岐変調型光変調器は、Zカットのニオブ酸リチウムから成る基板の−C面の表層に所定濃度のTi原子を含有させて、光入射部と、分波部と、位相変調部と、合波部と、光出射部とを備えた導波路を形成するとともに、前記光入射部もしくは前記光出射部に、TMモードを励起してTEモードをカットオフ状態とする、Ti原子濃度の小さい領域を形成したことを特徴とする。
【0013】
【作用】
上記構成の分岐変調型光変調器によれば、前記光入射部もしくは光出射部において、TMモードが励起されTEモードをカットオフの状態となる屈折率分布とすることができ、これにより、出射光においてTEモード成分が混在しないか、もしくはその成分を相当程度にまで減少でき、その結果、偏光板を配置しなくても、消光比特性の良好な分岐変調型光変調器が得られる。
【0014】
また、上記構成のように導波路のうち光入射部もしくは光出射部にTi原子濃度の小さい領域を設けるのであれば、その導波路をTi熱拡散法により作製する場合に、そのフォトリソ技術において所定のマスク形状にするだけで容易に形成することができる。したがって、その製造コストが低減し、低コストな分岐変調型光変調器が得られる。
【0015】
【実施例】
図1は実施例のマッハツェンダー型光変調器7である。なお、図7と同一箇所には同一符号を付す。2aはzカットニオブ酸リチウム板(LiNbOのZ板)から成る基板であり、この基板2aに幅5μm程度の導波路8をTi熱拡散法により作製した。このTi熱拡散法は1000℃もしくはそれよりも僅かに高い温度でTi熱拡散を行なって、Ti原子をドープした。そのドープの際には、フォトリソ技術により所定形状のマスクを用いて、レジストパターンを形成し、リフトオフ法によりTiパターンを作製した後、Ti熱拡散を行なった。
【0016】
そして、このTi熱拡散法は非常に高温で行なうので、基板2aの+C面のTi拡散した領域では分極反転が生じる場合があり、このような影響を避けるために、この導波路8を−C面の表層9に作製した。
【0017】
この導波路8上に設けた電極5については、図1に示すようなCPS構造の他に、CPW構造であってもよい。
【0018】
また、この電極5を導波路8上に設けると、導波光の伝搬損失が生じ易くなり、特にTMモード光にその現象が顕著である。そこで、この伝搬損失を低減するために基板2a上にSiOバッファ層3を設けている。
【0019】
この導波路8についても、光入射部8aと、分波部8bと、位相変調部8cと、合波部8dと、光出射部8eとから成り、そして、光入射部8aに入射した光は分波部8bにより分波し、次いで位相変調部8cを伝搬し、合波部8dを介して合成されて光出射部8eに到り、出射する構成であり、この構成によれば、各位相変調部8c上に形成した両電極5の間に高周波電力を印加すると電界が発生し、この電界により各位相変調部8cの屈折率が変化し、更にこの屈折率の変化に応じて、それぞれの光に位相差が生じ、そして、上記電界強度の大きさにより位相変調部8cの屈折率の程度が決まるので、かかる位相差により合成後の出射光の強度制御ができた。
【0020】
次に導波路8に設けたTi原子濃度の小さい領域を説明する。本実施例においては、この導波路8を作製するに当たって、光入射部8aもしくは光出射部8eに、Ti原子濃度の小さい領域を設けている。以下、この領域はTEモードをカットオフの状態となるように設定するためのものであるので、TEモードカットオフ領域10を称する。
【0021】
このTEモードカットオフ領域10を図2〜図5に示す。なお、これらの図中、矢印は光の伝搬方向である。図2のTEモードカットオフ領域10aでは、拡散前のTi幅を導波路8における拡散前のTi幅に比べて20〜50%程度にまで小さくし、そして、その領域10aの厚み(深度)が導波路8と同じになるように設けた。
【0022】
また、図3のTEモードカットオフ領域10bのように、Ti幅の変化による拡散Ti原子濃度の調節を行なうのと同様な効果を得るために、導波路8aもしくは8eの内部にTiの未ドープ領域を設けたり、図4のTEモードカットオフ領域10cのように、ドット状に形成してもよい。
【0023】
あるいは、上記のようなTi厚みを変えない各TEモードカットオフ領域10a、10b、10c以外に、図5に示すように2層構成の導波路8の一部に1層構成にしたTEモードカットオフ領域10dを設けて、Ti厚みをその領域で小さくしてもよい。
【0024】
かくして上記各構成のTEモードカットオフ領域10(10a、10b、10c、10d)を設けたことにより、各領域10の屈折率の分布が、導波路8のものと比べて異なり、これにより、TMモードを励起してTEモードをカットオフの状態に設定することができ、その結果、図6に示す通りの消光比特性図が得られた。同図によれば、横軸が電極5に印加する電圧であり、出射光の強弱が理想的に形態となって、各ピークにおける消光比が一定となった。
【0025】
なお、本発明は上記実施例に限定されるものではなく、本発明の要旨を逸脱しない範囲内で種々の変更や改良等は何ら差し支えない。たとえば、TEモードカットオフ領域10については実施例の他に各種形状や構造を採用することができ、TEモードカットオフ領域10cにおいては、その球状のドットの他に、任意形状のドット状点源であってもよい。
【0026】
【発明の効果】
以上の通り、本発明によれば、Zカットのニオブ酸リチウムから成る基板の−C面の表層に所定濃度のTi原子を含有させて、光入射部と、分波部と、位相変調部と、合波部と、光出射部とを備えた導波路を形成するとともに、前記光入射部もしく前記光出射部に、TMモードを励起してTEモードをカットオフとする、Ti原子濃度の小さい領域を形成したので、出射光においてTEモード成分が混在しないか、もしくはその成分を相当程度にまで減少でき、その結果、偏光板を配置しなくても、駆動電圧の特性を損なわず、消光比特性の良好な分岐変調型光変調器が得られた。
【0027】
また、本発明によれば、導波路をTi熱拡散法により作製する場合に、そのフォトリソ技術において所定のマスク形状にするだけでTi原子濃度の小さい領域を容易に形成することができ、これにより、製造コストが低減し、低コストな分岐変調型光変調器を得られた。
【図面の簡単な説明】
【図1】実施例の分岐変調型光変調器の斜視図である。
【図2】実施例の分岐変調型光変調器における導波路の要部を示す概略図である。
【図3】実施例の分岐変調型光変調器における導波路の要部を示す概略図である。
【図4】実施例の分岐変調型光変調器における導波路の要部を示す概略図である。
【図5】実施例の分岐変調型光変調器における導波路の要部を示す概略図である。
【図6】実施例の分岐変調型光変調器の消光比特性を示す線図である。
【図7】従来の分岐変調型光変調器の斜視図である。
【図8】従来の分岐変調型光変調器のの消光比特性を示す線図である。
【符号の説明】
7:マッハツェンダー型光変調器
2a:Zカットニオブ酸リチウム(LiNbO)基板
8:導波路
5:電極
3: SiOバッファ層
8a:光入射部
8b:分波部
8c:位相変調部
8d:合波部
8e:出射部
10:TEモードカットオフ領域
[0001]
[Industrial applications]
The present invention relates to an improvement of a branch modulation type optical modulator (Mach-Zehnder type optical modulator).
[0002]
[Prior art]
In recent Mach-Zehnder type optical modulators, a Ti heat diffusion LiNbO 3 channel type waveguide has been proposed in that the electro-optic constant of LiNbO 3 itself and the driving voltage can be reduced.
[0003]
FIG. 7 shows this Mach-Zehnder type optical modulator 1, 2 a substrate made of a Z-cut lithium niobate plate (Z plate of LiNbO 3 ), 3 a SiO 2 buffer layer provided on this substrate 2, and 4 an electric A waveguide provided on the surface layer of the substrate having an optical effect, 5 is an electrode, and 6 is a polarizing plate.
[0004]
According to the optical modulator 1, the waveguide 4 includes the light incident part 4a, the demultiplexing part 4b, the phase modulating part 4c, the multiplexing part 4d, and the light emitting part 4e. The light incident on the light incident part 4a through the optical path is demultiplexed by the demultiplexing part 4b, then propagates through the phase modulation part 4c, is combined via the multiplexing part 4d, and reaches the light emission part 4e.
[0005]
An electrode 5 is formed on each phase modulator 4c, and when applied to this electrode 5, an asymmetric electric field is generated, and the electric field changes the refractive index of each phase modulator 4c. Thus, a phase difference occurs between the respective lights. Then, the amount of change in the refractive index of the phase modulation section 4c is determined by the magnitude of the electric field intensity, so that the intensity of emitted light after synthesis can be controlled by such a phase difference.
[0006]
This LiNbO 3 crystal is optically anisotropic, and when a waveguide is formed on the surface layer of a Z-cut LiNbO 3 substrate so that light propagates in the x direction, the refractive index depends on the polarization direction of the light. Since they are different, the TE mode light is an ordinary ray and the TM mode is an extraordinary light. Then, when the electric field is applied in the z-axis direction, the changes in the refractive indexes of the ordinary ray and the extraordinary ray are respectively
Δn O = r 13 n O 3 EZ / 2
Δn e = r 33 n e 3 E Z / 2
It becomes, since r 33 is increased on the order of several times that of the r 13, towards the TM mode than in the TE mode, will be greatly affected by the electric field. Therefore, when used for the modulation operation, the TM mode is preferable in that the application efficiency is higher. Therefore, in order to guide only the TM mode light, the polarizing plate 6 is provided as described above, and the Light is incident through the polarizing plate 6 so that the polarization direction and the optical axis (z-axis) of the crystal coincide.
[0007]
[Problems of the prior art]
However, in the Mach-Zehnder optical modulator 1 having the above configuration, the manufacturing conditions of the waveguide 4 (width, thickness, diffusion time, diffusion temperature, etc. of the Ti diffusion source before Ti diffusion), the waveguide 4 and the electrode 5 Is optimally designed so that the driving voltage is minimized and the TM lowest-order mode is not cut off, but the polarization direction of the polarizing plate 6 is accurately adjusted with respect to the crystal axis of the substrate 2. Is difficult to set, and therefore, the incident light may be excited not only in the TM mode but also in the TE mode, whereby the TE mode is also modulated by the electric field, and as a result, these TM and TE As shown in the extinction ratio characteristic diagram of FIG. 3 due to the superposition of both modes, there is a problem that the extinction ratio varies at each peak.
[0008]
In order to solve this problem, it is important to accurately match the polarization direction of the incident light with the optical axis of the crystal, but it is practically difficult to increase the accuracy, and a skilled technique is required.
[0009]
In addition, the configuration of the optical modulator 1 becomes complicated, resulting in an increase in cost.
[0010]
Further, when only the TM mode is excited and the condition of the waveguide for cutting off the TE mode component is selected, there is a problem that it is difficult to set the optimization for lowering the driving voltage.
[0011]
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a branch modulation optical modulator (Mach-Zehnder optical modulator) which does not impair the drive voltage characteristics and has good extinction ratio characteristics without complicating the configuration. It is in.
[0012]
[Means for Solving the Problems]
The branch modulation type optical modulator according to the present invention includes a substrate made of Z-cut lithium niobate, which contains a predetermined concentration of Ti atoms in a surface layer of a −C plane to form a light incident part, a demultiplexing part, and a phase modulation part. Forming a waveguide including a multiplexing part and a light emitting part, and exciting a TM mode to a TE mode cutoff state in the light incident part or the light emitting part. Characterized in that a region having a small value is formed.
[0013]
[Action]
According to the branching modulation type optical modulator having the above-described configuration, in the light incidence portion or the light emission portion, the TM mode can be excited and the TE mode can have a refractive index distribution in which the cutoff state is obtained. TE mode components are not mixed in the emitted light, or the components can be reduced to a considerable extent. As a result, a branch modulation type optical modulator having good extinction ratio characteristics can be obtained without disposing a polarizing plate.
[0014]
If a region having a low concentration of Ti atoms is provided in the light incident portion or the light emitting portion of the waveguide as in the above configuration, when the waveguide is manufactured by the Ti thermal diffusion method, a predetermined photolithography technique is used. It can be easily formed simply by forming the mask shape of the above. Therefore, the manufacturing cost is reduced, and a low-cost branch modulation type optical modulator can be obtained.
[0015]
【Example】
FIG. 1 shows a Mach-Zehnder type optical modulator 7 according to the embodiment. The same parts as those in FIG. 7 are denoted by the same reference numerals. Reference numeral 2a denotes a substrate made of a z-cut lithium niobate plate (LiNbO 3 Z plate), and a waveguide 8 having a width of about 5 μm was formed on the substrate 2a by a Ti thermal diffusion method. In the Ti thermal diffusion method, Ti atoms were doped at a temperature of 1000 ° C. or slightly higher. At the time of the doping, a resist pattern was formed using a mask having a predetermined shape by a photolithography technique, a Ti pattern was formed by a lift-off method, and then Ti thermal diffusion was performed.
[0016]
Since this Ti thermal diffusion method is performed at a very high temperature, polarization inversion may occur in the Ti-diffused region on the + C face of the substrate 2a. It was produced on the surface layer 9 of the surface.
[0017]
The electrode 5 provided on the waveguide 8 may have a CPW structure other than the CPS structure as shown in FIG.
[0018]
Further, when the electrode 5 is provided on the waveguide 8, the propagation loss of the guided light is apt to occur, and the phenomenon is particularly remarkable in the TM mode light. Therefore, in order to reduce the propagation loss, the SiO 2 buffer layer 3 is provided on the substrate 2a.
[0019]
This waveguide 8 also includes a light incident portion 8a, a demultiplexing portion 8b, a phase modulation portion 8c, a multiplexing portion 8d, and a light emitting portion 8e, and the light incident on the light incident portion 8a The light is split by the splitter 8b, then propagates through the phase modulator 8c, is combined via the multiplexing unit 8d, reaches the light emitting unit 8e, and emits the light. When high-frequency power is applied between the two electrodes 5 formed on the modulation section 8c, an electric field is generated, and the electric field changes the refractive index of each phase modulation section 8c. A phase difference occurs in the light, and the degree of the refractive index of the phase modulator 8c is determined by the magnitude of the electric field intensity. Therefore, the intensity of the output light after the synthesis can be controlled by the phase difference.
[0020]
Next, a region provided in the waveguide 8 and having a low concentration of Ti atoms will be described. In this embodiment, when manufacturing the waveguide 8, a region having a low Ti atom concentration is provided in the light incident portion 8a or the light emitting portion 8e. Hereinafter, since this area is for setting the TE mode so as to be in the cutoff state, the TE mode cutoff area 10 is referred to.
[0021]
This TE mode cutoff region 10 is shown in FIGS. In these figures, the arrows indicate the direction of light propagation. In the TE mode cutoff region 10a of FIG. 2, the Ti width before diffusion is reduced to about 20 to 50% compared to the Ti width in the waveguide 8 before diffusion, and the thickness (depth) of the region 10a is reduced. It was provided so as to be the same as the waveguide 8.
[0022]
In order to obtain the same effect as adjusting the diffusion Ti atom concentration by changing the Ti width as in the TE mode cutoff region 10b in FIG. 3, the undoped Ti is not provided inside the waveguide 8a or 8e. An area may be provided, or a dot shape may be formed as in the TE mode cutoff area 10c in FIG.
[0023]
Alternatively, in addition to the TE mode cutoff regions 10a, 10b, and 10c that do not change the Ti thickness as described above, a TE mode cut having a single-layer structure is formed in a part of the waveguide 8 having a two-layer structure as shown in FIG. An off region 10d may be provided to reduce the Ti thickness in that region.
[0024]
Thus, the provision of the TE mode cut-off regions 10 (10a, 10b, 10c, 10d) of the above-described respective structures makes the distribution of the refractive index of each region 10 different from that of the waveguide 8, thereby providing the TM. The mode was excited to set the TE mode to the cutoff state. As a result, an extinction ratio characteristic diagram as shown in FIG. 6 was obtained. According to the figure, the horizontal axis is the voltage applied to the electrode 5, the intensity of the emitted light is ideally formed, and the extinction ratio at each peak is constant.
[0025]
It should be noted that the present invention is not limited to the above-described embodiment, and various changes and improvements may be made without departing from the scope of the present invention. For example, the TE mode cutoff region 10 can adopt various shapes and structures in addition to the embodiment. In the TE mode cutoff region 10c, in addition to the spherical dots, a dot-shaped point source having an arbitrary shape can be used. It may be.
[0026]
【The invention's effect】
As described above, according to the present invention, a predetermined concentration of Ti atoms is contained in the surface layer of the −C plane of the substrate made of Z-cut lithium niobate, and the light incident portion, the demultiplexing portion, the phase modulation portion, Forming a waveguide having a multiplexing part and a light emitting part, and exciting the TM mode to cut off the TE mode in the light incident part or the light emitting part to cut off the TE mode. Since the small area is formed, the TE mode component is not mixed in the emitted light, or the component can be reduced to a considerable extent. As a result, even if the polarizing plate is not provided, the driving voltage characteristics are not impaired, and the extinction is prevented. A branch modulation type optical modulator having good ratio characteristics was obtained.
[0027]
Further, according to the present invention, when a waveguide is manufactured by a Ti thermal diffusion method, a region having a low Ti atom concentration can be easily formed only by forming a predetermined mask shape in the photolithography technique, Thus, the manufacturing cost was reduced, and a low-cost branch modulation type optical modulator was obtained.
[Brief description of the drawings]
FIG. 1 is a perspective view of a branch modulation type optical modulator according to an embodiment.
FIG. 2 is a schematic diagram illustrating a main part of a waveguide in a branch modulation type optical modulator according to an embodiment.
FIG. 3 is a schematic diagram illustrating a main part of a waveguide in a branching modulation type optical modulator according to an embodiment.
FIG. 4 is a schematic diagram showing a main part of a waveguide in a branch modulation type optical modulator according to an embodiment.
FIG. 5 is a schematic view showing a main part of a waveguide in a branch modulation type optical modulator according to an embodiment.
FIG. 6 is a diagram illustrating the extinction ratio characteristics of the branch modulation type optical modulator according to the embodiment.
FIG. 7 is a perspective view of a conventional branch modulation type optical modulator.
FIG. 8 is a diagram showing an extinction ratio characteristic of a conventional branch modulation type optical modulator.
[Explanation of symbols]
7: Mach-Zehnder type optical modulator 2a: Z-cut lithium niobate (LiNbO 3 ) substrate 8: waveguide 5: electrode 3: SiO 2 buffer layer 8a: light incident portion 8b: demultiplexing portion 8c: phase modulation portion 8d: Combining section 8e: emitting section 10: TE mode cut-off region

Claims (1)

Zカットのニオブ酸リチウムから成る基板の−C面の表層に所定濃度のTi原子を含有させて光入射部と、分波部と、位相変調部と、合波部と、光出射部とを備えた導波路を形成するとともに、前記光入射部もしくは前記光出射部に、TMモードを励起してTEモードをカットオフ状態とする、Ti原子濃度の小さい領域を形成したことを特徴とする分岐変調型光変調器。The surface layer of the substrate made of Z-cut lithium niobate contains a predetermined concentration of Ti atoms in the surface layer of the -C plane , and a light incident portion, a branching portion, a phase modulation portion, a multiplexing portion, and a light emitting portion are formed. to form a waveguide having a, the light incident portion or the light emitting portion, the TE mode cutoff state to excite the TM mode, is characterized in that the formation of the small region of Ti atom concentration Branch modulation type optical modulator.
JP23545094A 1994-09-29 1994-09-29 Branch modulation type optical modulator Expired - Fee Related JP3602874B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23545094A JP3602874B2 (en) 1994-09-29 1994-09-29 Branch modulation type optical modulator

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Application Number Priority Date Filing Date Title
JP23545094A JP3602874B2 (en) 1994-09-29 1994-09-29 Branch modulation type optical modulator

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JPH0894983A JPH0894983A (en) 1996-04-12
JP3602874B2 true JP3602874B2 (en) 2004-12-15

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