JP3604319B2 - Resin bond wire saw - Google Patents
Resin bond wire saw Download PDFInfo
- Publication number
- JP3604319B2 JP3604319B2 JP2000094816A JP2000094816A JP3604319B2 JP 3604319 B2 JP3604319 B2 JP 3604319B2 JP 2000094816 A JP2000094816 A JP 2000094816A JP 2000094816 A JP2000094816 A JP 2000094816A JP 3604319 B2 JP3604319 B2 JP 3604319B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- wire saw
- layer
- wire
- abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011347 resin Substances 0.000 title claims description 51
- 229920005989 resin Polymers 0.000 title claims description 51
- 239000011230 binding agent Substances 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 38
- 239000006061 abrasive grain Substances 0.000 description 26
- 238000012545 processing Methods 0.000 description 17
- 238000005520 cutting process Methods 0.000 description 16
- 239000002344 surface layer Substances 0.000 description 15
- 238000001723 curing Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 8
- 229910003460 diamond Inorganic materials 0.000 description 6
- 239000010432 diamond Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000006552 photochemical reaction Methods 0.000 description 3
- 239000004575 stone Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000010687 lubricating oil Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- -1 MgSO 4 Chemical class 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、レジンボンドによる固定砥粒タイプのワイヤソーに係り、特に加工初期から終期に至るまで良好な切れ味を維持することができるレジンボンドワイヤソーに関する。
【0002】
【従来の技術】
各種の半導体デバイスの製造分野では、配線パターンの微細化による性能向上が図られてきたが、配線パターンの微細化だけでは多機能化に追いつけず、近来ではチップ自身を大型化することで対応している。このようなチップの大型化に伴い、歩留り向上の点からシリコンウエハも大口径のものが使用されるようになり、その前工程であるシリコンインゴットからの切り出し法も従来の内周刃切断法から大口径化に対応しやすいワイヤソーカット法へ移行されつつある。
【0003】
ワイヤソーカット法のうち従来から主に行われていたものの一つとして、スラリーを用いた遊離砥粒方式がある。この遊離砥粒方式は、ピアノ線や超高強度合金線をシリコンインゴットに強く接触させた状態で走行させ、ピアノ線や超高強度合金線が接触している部分にWAやGCなどの遊離砥粒を含有した潤滑油を注入しながら切断するというものである。しかしながら、潤滑油の飛散による作業環境の劣化やワークの汚染を伴うほか、被加工材への砥粒の食い込み深さを一様に保てるように制御できないことから切断効率に限界があるとされている。
【0004】
これに対し近年になって、芯線の周面にWAやGCまたはダイヤモンド、CBNなどの砥粒を固着させたワイヤソーを使用する固定砥粒方式が提案された。この固定砥粒方式に用いるワイヤソーとしては、電着により砥粒を固着させる電着ワイヤソーや樹脂(レジン)を結合剤として砥粒を固着させるレジンボンドワイヤソーが知られている。これらの電着ワイヤソーやレジンボンドワイヤソーでも、遊離砥粒方式と同様に被加工材に強く接触させながら走行させることで砥粒による切断が可能である。
【0005】
ところで、電着ワイヤソーは砥粒を電着するメッキ処理の工程に時間を費やすほか長尺化が困難であるという製造上の問題と、破断ねじり強度や曲げ強度が低いため加工時に断線しやすいという使用上の問題が以前から指摘されていた。そこで、このような電着ワイヤソーの欠点を改善したものとして、レジンボンドワイヤソーが開発されたという経緯がある。
【0006】
このようなレジンボンドワイヤソーとしては、たとえば特開平10−138114号公報に記載されたものがある。この公報に記載のレジンボンドワイヤソーは、高抗張力金属を芯線として用い、ポリアミドイミド樹脂を結合剤としてこれに砥粒を分散含有させたもので芯線を被覆するという構成としたものである。
【0007】
【発明が解決しようとする課題】
このようなレジンボンドワイヤソーによれば、電着ワイヤソーの問題点を解決できるが、一方において、砥粒全体が樹脂で被覆されているため砥粒突き出し量が少なく、切断初期の切れ味不良が問題になっている。この問題を解決する手法の一つとして、一般の砥石の場合と同様に、ドレッシングによる目立てを行うことが考えられる。しかし、ワイヤソーの砥粒層は厚さ数十μm程度しかないので、目立て操作は容易ではない。
【0008】
これに対して、特開平11−28654号公報に記載のように、ワイヤソーをグルーブローラに巻き掛けてシリコンウエハを切断する際に、ドレッシングストーンをグルーブローラ間のワイヤソーに押し当ててワイヤソーをドレッシングする方法が提案されている。しかしながら、このようなドレッシングストーンを押し当ててワイヤソーをドレッシングする方法は、目立て効果により目詰まりはある程度低減されるものの、ドレッシングの際にワイヤに負荷がかかり、傷の要因にもなるため、ワイヤが断線するおそれがある。
【0009】
本発明は、ドレッシングを行わずとも切断初期の切れ味を向上させ、それを長期にわたって維持し、かつ断線のおそれのないレジンボンドワイヤソーを提供することを目的とする。
【0010】
【課題を解決するための手段】
本発明は、ワイヤの表面に樹脂を結合剤として砥粒を固着させたレジンボンドワイヤソーにおいて、前記樹脂として光硬化型の樹脂を用い、砥粒層の表層部に低硬度の未硬化層を形成したことを特徴とする。
【0011】
砥粒層の表層部に低硬度の未硬化層を形成することにより、加工初期の抵抗によって低硬度の未硬化層部が削除され、砥粒先端が数μm程度突出した砥粒層面となる。これによって、ワイヤソーは加工初期の切れ味が向上し、さらに砥粒層下部の高硬度な樹脂層によって砥粒を保持することで、その良好な切れ味を加工終期まで維持することが可能となる。また、目立てのためにドレッシングストーンを使用する従来の方法のような、ワイヤの断線や砥粒層の傷に起因する砥粒層の剥離のおそれはなくなる。
【0012】
砥粒層の表層部に低硬度の未硬化層を形成するには、光硬化型樹脂の硬化における特性を利用する。光硬化型樹脂は大気中で使用するのが一般的であるが、光照射による硬化反応を行う場合、大気と接触している樹脂層の硬化反応は進行しにくい特性をもっており、完全に硬化させるにはより高いエネルギーが必要となる。大気と接触している樹脂表層の硬化反応が進行しにくい要因は、光重合開始剤より発生したラジカルが大気中の酸素と反応する硬化反応阻害を受けているためだと考えられており、この反応阻害を打ち破る量のラジカルを発生させるために、より高いエネルギーを必要とする。そこで光照射による硬化時に、樹脂の内部は完全に硬化するが表層部は完全に硬化しない程度の光エネルギーを用いて硬化反応を行うことにより、樹脂層に未硬化の低硬度層を形成することができる。
【0013】
光硬化樹脂としては、光重合開始剤にて励起される官能基を有し、光化学反応にて重合する感光性樹脂を用いることができる。このような樹脂には、たとえばC=Cなどのπ結合を有するもの、エポキシを有するものなどがあり、これら樹脂と光ラジカル発生剤などの光重合開始剤を主成分に含有することで光硬化性を持つ樹脂となる。また、この光硬化性を持つ樹脂の副添加物には、酸素の遮断により重合反応を促進する嫌気硬化剤や熱により前記と同様の効果を発現させる熱硬化剤などの硬化促進剤、さらには硬化前の樹脂物性を安定化させる安定剤や光化学反応を阻害しない高分子および共重合性モノマーを使用することができ、また、光化学反応を阻害しないものであれば、硬化物の物性を変化させる目的でCu,Ni,Co,Feなどの金属粉末やC,SiO2などの非金属系粉末、及びMgSO4等の無機塩類、更にはGC,WAなどの一般砥粒をフィラ材として添加することも可能である。
【0014】
光照射による硬化時に、樹脂の表層部が完全には硬化しない程度の光照射量は、使用する樹脂の種類やワイヤソーのサイズなどにより異なるので、それぞれのケースについてあらかじめ実験により作業条件、たとえば光源の種類、照度、距離、ワイヤソー芯線の送り速度などを求めておくことが望ましい。
【0015】
本発明になるレジンボンドワイヤソーの製造方法は、前記した光照射量の調節以外は、基本的には従来のレジンボンドワイヤソーの製造方法と同じであり、黄銅メッキを施したピアノ線や特殊合金鋼線、超高強度合金線などの芯線を一定のピッチで送りながら、液状の光硬化型樹脂とダイヤモンド砥粒やCBN砥粒などの砥粒の混合物を貯留した被覆槽を通過させて芯線に液状樹脂と砥粒の混合物を被覆し、ついで紫外線照射装置などの樹脂硬化装置を通過させ液状樹脂を硬化させて芯線に砥粒を固着させることにより、レジンボンドワイヤソーを製造する。
【0016】
【発明の実施の形態】
図1は本発明の実施形態におけるワイヤソーの部分正面図、図2は図1のA−A線矢視による縦断面図である。
【0017】
本実施形態のワイヤソーは、線径0.16mmのピアノ線の芯線1とこの芯線1に仕上がり外径が0.22mmとなるように、光ラジカル発生剤を添加したアクリレート樹脂にフィラ材を混合したボンド層3により平均粒径30μmのダイヤモンド砥粒4を固着させて砥粒層2としたものである。
【0018】
本実施形態において使用したアクリレート樹脂は、150mW/cm2のエネルギーで15秒間反応させると表層まで完全硬化するが、100mW/cm2のエネルギーで20秒間反応させた場合、30μm厚みの砥粒層中、表層から最大で5μm程度まで未硬化層を形成することができる。ここで未硬化層とは、硬化反応が進行しきらず高分子化しなかった液状またはゲル状の樹脂層をさす。
【0019】
図2に示すように、製造後(使用前)における砥粒層2では、ダイヤモンド砥粒4はそのほとんどがボンド層3内に埋没しており、ボンド層3から突出した砥粒はごくわずかである。従来のワイヤソーでは、このような突出した砥粒の少ない状態では切断加工時の切れ味が安定せず、安定化させるには加工初期からドレッシングが必要となるが、本実施形態のワイヤソーでは、ボンド層3の樹脂として光ラジカル発生剤を添加した光硬化型の樹脂を用い、硬化反応時にボンド層3の表層部3aが完全には硬化しない条件で紫外線を照射することにより、表層部3aは内層部3bに比して硬度が低く形成されているので、使用前に図2に示すようなボンド層3は、被加工材に接触すると同時に硬度の低い表層部3aのボンドが機械的に削除されて、図3に示すようにダイヤモンド砥粒4の先端が突出する。これによって、ワイヤソーは加工初期から良好な切れ味を発揮し、また加工の都度、表層部の樹脂の削除が繰り返されることにより実質的な目立て操作が行われ、加工終期に至るまでドレッシングを行うことなく、良好な切れ味を維持することができる。
【0020】
このように本実施形態のワイヤソーは、加工初期から終期に至るまでドレッシングを行う必要がないことから、芯線1に傷がつくことで生じる断線のおそれがなく、ボンド層3にクラックが発生することもないので砥粒保持力が低下することもない。
【0021】
本発明の効果を確認するために、上記実施形態のワイヤソー(発明品)と、ボンド層の表層部まで完全に硬化させたワイヤソー(比較品)、樹脂としてフェノール樹脂を用いた従来のワイヤソー(従来品)を使用して切断試験を行った。
〔試験条件〕
切断装置:単線切断装置
ワイヤ速度:平均400m/min
ワイヤテンション:19.6N
被加工物:シリコンインゴット
【0022】
図4に試験結果を示す。図4は総加工量と切れ味の関係を示す図で、縦軸に切り込み速度(指数)を、横軸に積算削除量をインゴットの切り出し枚数で表している。同図からわかるように、加工初期は、発明品が従来品より約2倍良好な切れ味を示し、さらに加工量が増加するとその差は顕著に表れ、100枚加工した時点で約4倍の差がみられた。この結果から、発明品は従来品に比べ加工初期から良好な切れ味を有し、かつその切れ味を長期にわたり維持できることが確認された。比較品は従来品と大差ない切れ味であった。
【0023】
【発明の効果】
(1)結合剤として光硬化型の樹脂を用い、砥粒層の表層部に低硬度の未硬化層を形成することにより、加工初期の抵抗により低硬度の未硬化層が削除され、砥粒の先端が突出して実質的な目立て操作が行われ、加工終期に至るまでドレッシングを行うことなく、良好な切れ味を維持することができる。
【0024】
(2)加工初期から終期に至るまでドレッシングを行う必要がないことから、芯線に傷がつくことで生じる断線のおそれがなく、砥粒層にクラックが発生することもないので砥粒保持力が低下することもない。
【図面の簡単な説明】
【図1】本発明の実施形態におけるワイヤソーの部分正面図である。
【図2】図1のA−A線矢視による縦断面図である。
【図3】切断加工時におけるワイヤソーの断面を示す図である。
【図4】切断試験結果を示す図である。
【符号の説明】
1 芯線
2 砥粒層
3 ボンド層
3a 表層部
3b 内層部
4 ダイヤモンド砥粒[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a fixed abrasive type wire saw using a resin bond, and more particularly to a resin bond wire saw capable of maintaining good sharpness from the beginning to the end of processing.
[0002]
[Prior art]
In the field of manufacturing various semiconductor devices, performance has been improved by miniaturization of wiring patterns.However, miniaturization of wiring patterns alone cannot keep up with multi-functionality. ing. With the increase in the size of such chips, silicon wafers with large diameters have been used from the viewpoint of improving the yield, and the cutting method from the silicon ingot, which is the preceding process, has also been changed from the conventional inner peripheral blade cutting method. The transition to the wire saw cut method, which can easily accommodate large diameters, is being made.
[0003]
One of the wire saw cutting methods that has been mainly performed in the past is a loose abrasive method using a slurry. In this loose abrasive method, a piano wire or ultra-high strength alloy wire is run in strong contact with the silicon ingot, and the free wire such as WA or GC is applied to the portion where the piano wire or ultra-high strength alloy wire is in contact. Cutting is performed while pouring lubricating oil containing particles. However, it is said that there is a limit to the cutting efficiency due to the deterioration of the working environment and the contamination of the work due to the scattering of the lubricating oil, and the inability to control the depth of penetration of the abrasive grains into the work material to be uniform. I have.
[0004]
On the other hand, in recent years, a fixed abrasive method using a wire saw in which abrasive grains such as WA, GC, diamond, and CBN are fixed to the peripheral surface of a core wire has been proposed. As a wire saw used in the fixed abrasive method, an electrodeposited wire saw for fixing the abrasive grains by electrodeposition and a resin bond wire saw for fixing the abrasive grains using a resin (resin) as a binder are known. Even with these electrodeposited wire saws and resin bond wire saws, cutting by abrasive grains is possible by running while strongly contacting the workpiece similarly to the loose abrasive method.
[0005]
By the way, an electrodeposited wire saw spends much time in the plating process of electrodepositing abrasive grains and it is difficult to make it longer, and it has a low breaking torsional strength and a low bending strength, so it is easy to break during processing. Usage problems have long been pointed out. Thus, there is a history that a resin bond wire saw has been developed as an improvement over such a drawback of the electrodeposited wire saw.
[0006]
As such a resin bond wire saw, for example, there is a resin bond wire saw described in JP-A-10-138114. The resin bond wire saw described in this publication has a configuration in which a high tensile strength metal is used as a core wire, and a polyamideimide resin is used as a binder and abrasive grains are dispersed and contained in the core wire to coat the core wire.
[0007]
[Problems to be solved by the invention]
According to such a resin bond wire saw, the problem of the electrodeposited wire saw can be solved, but on the other hand, since the entire abrasive grains are covered with the resin, the amount of the abrasive grains protruding is small, and poor sharpness in the initial stage of cutting becomes a problem. Has become. As one of the methods for solving this problem, dressing by dressing can be considered as in the case of a general grindstone. However, since the abrasive layer of the wire saw has a thickness of only about several tens of μm, the dressing operation is not easy.
[0008]
On the other hand, as described in JP-A-11-28654, when a wire saw is wound around a groove roller to cut a silicon wafer, a dressing stone is pressed against the wire saw between the groove rollers to dress the wire saw. A method has been proposed. However, in the method of dressing a wire saw by pressing such dressing stones, although clogging is reduced to some extent due to the sharpening effect, a load is applied to the wire at the time of dressing, and the wire may be damaged. There is a risk of disconnection.
[0009]
An object of the present invention is to provide a resin bond wire saw that improves sharpness at the beginning of cutting without performing dressing, maintains the sharpness over a long period of time, and is free from a risk of disconnection.
[0010]
[Means for Solving the Problems]
The present invention provides a resin bond wire saw in which abrasive particles are fixed to a surface of a wire with a resin as a binder, using a photocurable resin as the resin, and forming a low-hardness uncured layer on the surface layer of the abrasive layer. It is characterized by having done.
[0011]
By forming the low-hardness unhardened layer on the surface layer of the abrasive layer, the low-hardness unhardened layer is deleted due to the resistance in the initial stage of processing, and the abrasive grain tip becomes a surface of the abrasive layer protruding by about several μm. As a result, the sharpness of the wire saw at the initial stage of processing is improved, and further, by holding the abrasive grains by the high-hardness resin layer below the abrasive layer, it is possible to maintain the excellent sharpness until the end of processing. Further, unlike the conventional method using dressing stones for dressing, there is no fear of peeling of the abrasive grain layer due to wire breakage or scratch of the abrasive grain layer.
[0012]
In order to form a low-hardness uncured layer on the surface layer of the abrasive layer, the properties of the photocurable resin in curing are used. The photo-curable resin is generally used in the atmosphere, but when the curing reaction is performed by light irradiation, the curing reaction of the resin layer in contact with the atmosphere has a property that does not easily proceed, and is completely cured. Requires higher energy. The reason that the curing reaction of the resin surface layer that is in contact with the atmosphere is difficult to proceed is considered to be that the radical generated from the photopolymerization initiator is inhibited by the curing reaction that reacts with oxygen in the atmosphere. Higher energy is required to generate an amount of radicals that breaks reaction inhibition. Therefore, when curing by light irradiation, an uncured low-hardness layer is formed on the resin layer by performing a curing reaction using light energy such that the inside of the resin is completely cured but the surface layer is not completely cured. Can be.
[0013]
As the photocurable resin, a photosensitive resin having a functional group excited by a photopolymerization initiator and polymerizing by a photochemical reaction can be used. Such resins include, for example, those having a π bond such as C = C, those having an epoxy, and the like. It becomes a resin having properties. In addition, the photo-curable resin auxiliary additive includes a curing accelerator such as an anaerobic curing agent that promotes a polymerization reaction by blocking oxygen or a heat curing agent that exhibits the same effect as described above by heat, and Stabilizers that stabilize resin properties before curing and polymers and copolymerizable monomers that do not inhibit photochemical reactions can be used.If they do not inhibit photochemical reactions, they change the properties of the cured product. For the purpose, metal powders such as Cu, Ni, Co and Fe, non-metallic powders such as C and SiO 2 , inorganic salts such as MgSO 4 , and general abrasive grains such as GC and WA are added as filler material. Is also possible.
[0014]
The amount of light irradiation that does not completely cure the surface layer of the resin during curing by light irradiation varies depending on the type of resin used, the size of the wire saw, and the like. It is desirable to obtain the type, illuminance, distance, feed speed of the wire saw core wire, and the like.
[0015]
The method of manufacturing a resin bond wire saw according to the present invention is basically the same as the conventional method of manufacturing a resin bond wire saw except for the adjustment of the light irradiation amount, and includes a brass-plated piano wire or a special alloy steel. While sending core wire such as wire and ultra-high-strength alloy wire at a fixed pitch, it is passed through a coating tank containing a mixture of liquid photo-curable resin and abrasive grains such as diamond abrasive grains and CBN abrasive grains, and then liquid is applied to the core wire. A resin-bonded wire saw is manufactured by coating a mixture of resin and abrasive grains and then passing the mixture through a resin curing device such as an ultraviolet irradiation device to cure the liquid resin and fix the abrasive particles to the core wire.
[0016]
BEST MODE FOR CARRYING OUT THE INVENTION
FIG. 1 is a partial front view of a wire saw according to an embodiment of the present invention, and FIG. 2 is a longitudinal sectional view taken along line AA of FIG.
[0017]
The wire saw according to the present embodiment is obtained by mixing a filler wire with an acrylate resin to which a photoradical generator is added so that the
[0018]
The acrylate resin used in the present embodiment completely cures to the surface layer when reacted with energy of 150 mW / cm 2 for 15 seconds. However, when reacted with energy of 100 mW / cm 2 for 20 seconds, the abrasive layer having a thickness of 30 μm is formed. The uncured layer can be formed up to about 5 μm from the surface layer. Here, the uncured layer refers to a liquid or gel resin layer in which the curing reaction has not progressed and has not been polymerized.
[0019]
As shown in FIG. 2, in the
[0020]
As described above, since the wire saw of the present embodiment does not need to be dressed from the beginning to the end of processing, there is no risk of disconnection caused by scratching the
[0021]
In order to confirm the effects of the present invention, the wire saw of the above embodiment (inventive product), a wire saw completely cured to the surface layer of the bond layer (comparative product), and a conventional wire saw using a phenol resin as a resin (conventional product) ) Was used for a cutting test.
〔Test condition〕
Cutting device: Single wire cutting device Wire speed: 400m / min on average
Wire tension: 19.6N
Workpiece: Silicon ingot [0022]
FIG. 4 shows the test results. FIG. 4 is a diagram showing the relationship between the total processing amount and the sharpness. The vertical axis represents the cutting speed (index), and the horizontal axis represents the integrated deletion amount in terms of the number of cut ingots. As can be seen from the figure, in the initial stage of processing, the invention product shows about twice as good sharpness as the conventional product, and the difference becomes remarkable when the processing amount is further increased, and when the 100 pieces are processed, the difference is about 4 times. Was seen. From these results, it was confirmed that the inventive product had better sharpness from the beginning of processing than the conventional product, and that the sharpness could be maintained for a long time. The comparative product had sharpness not much different from the conventional product.
[0023]
【The invention's effect】
(1) By using a photocurable resin as a binder and forming a low-hardness uncured layer on the surface layer of the abrasive layer, the low-hardness uncured layer is removed due to the resistance at the initial stage of processing, and the abrasive grains are removed. The tip is projected and a substantial sharpening operation is performed, so that good sharpness can be maintained without dressing until the end of processing.
[0024]
(2) Since there is no need to perform dressing from the beginning to the end of processing, there is no risk of disconnection caused by damage to the core wire, and no cracks are generated in the abrasive layer, so that the abrasive holding force is low. It does not drop.
[Brief description of the drawings]
FIG. 1 is a partial front view of a wire saw according to an embodiment of the present invention.
FIG. 2 is a longitudinal sectional view taken along line AA of FIG.
FIG. 3 is a diagram showing a cross section of the wire saw at the time of cutting.
FIG. 4 is a diagram showing a cutting test result.
[Explanation of symbols]
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000094816A JP3604319B2 (en) | 2000-03-30 | 2000-03-30 | Resin bond wire saw |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000094816A JP3604319B2 (en) | 2000-03-30 | 2000-03-30 | Resin bond wire saw |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001277092A JP2001277092A (en) | 2001-10-09 |
| JP3604319B2 true JP3604319B2 (en) | 2004-12-22 |
Family
ID=18609799
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000094816A Expired - Fee Related JP3604319B2 (en) | 2000-03-30 | 2000-03-30 | Resin bond wire saw |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3604319B2 (en) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4080141B2 (en) * | 2000-05-22 | 2008-04-23 | 株式会社リコー | Manufacturing method of wire tool |
| JP2009066689A (en) * | 2007-09-12 | 2009-04-02 | Read Co Ltd | Fixed abrasive grain wire saw |
| JP2009285791A (en) * | 2008-05-29 | 2009-12-10 | Sumitomo Electric Ind Ltd | Wire saw and manufacturing method of the same |
| WO2011020109A2 (en) | 2009-08-14 | 2011-02-17 | Saint-Gobain Abrasives, Inc. | Abrasive articles including abrasive particles bonded to an elongated body, and methods of forming thereof |
| RU2569254C2 (en) | 2009-08-14 | 2015-11-20 | Сэнт-Гобэн Эбрейзивс, Инк. | Abrasive article |
| TWI466990B (en) | 2010-12-30 | 2015-01-01 | 聖高拜磨料有限公司 | Abrasive article and forming method |
| KR101618040B1 (en) | 2011-09-16 | 2016-05-04 | 생-고뱅 어브레이시브즈, 인코포레이티드 | Abrasive article and method of forming |
| JP5869680B2 (en) | 2011-09-29 | 2016-02-24 | サンーゴバン アブレイシブズ,インコーポレイティド | Abrasive article comprising abrasive particles bonded to an elongated substrate body having a barrier layer and method of forming the same |
| KR101563456B1 (en) * | 2012-06-01 | 2015-10-26 | 가부시키가이샤 티케이엑스 | Adhesive composition for resin-bonded wire saw and method for producing resin-bonded wire saw |
| TWI477343B (en) | 2012-06-29 | 2015-03-21 | Saint Gobain Abrasives Inc | Abrasive article and method of forming |
| TW201404527A (en) | 2012-06-29 | 2014-02-01 | 聖高拜磨料有限公司 | Abrasive article and forming method |
| TW201402274A (en) | 2012-06-29 | 2014-01-16 | 聖高拜磨料有限公司 | Abrasive article and forming method |
| TWI474889B (en) | 2012-06-29 | 2015-03-01 | 聖高拜磨料有限公司 | Abrasive article and forming method |
| TW201441355A (en) | 2013-04-19 | 2014-11-01 | 聖高拜磨料有限公司 | Abrasive article and method of forming same |
| TWI664057B (en) | 2015-06-29 | 2019-07-01 | 美商聖高拜磨料有限公司 | Abrasive article and method of forming |
-
2000
- 2000-03-30 JP JP2000094816A patent/JP3604319B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001277092A (en) | 2001-10-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3604319B2 (en) | Resin bond wire saw | |
| DE60022921T2 (en) | Wire saw with abrasive saw wire and process for its production | |
| JP5639153B2 (en) | A saw wire in which abrasive grains are partially embedded in a metal wire and partially held by an organic binder | |
| JP3604351B2 (en) | Resin bond wire saw | |
| CN1070754C (en) | Abrasive article, a process for its manufacture, and a method of using it to reduce a workpiece surface | |
| JP3314921B2 (en) | Cutting and processing methods for semiconductor materials | |
| JP3471328B2 (en) | Resin bond wire saw and method of manufacturing the same | |
| JP4083177B2 (en) | Wire saw | |
| JPH08243914A (en) | Preconditioner for a polishing pad and method of using the same | |
| JP2010284754A (en) | Saw wire with fixed abrasive grain | |
| CN108381797A (en) | Annular diamond fretsaw and its manufacturing method | |
| JP2001259993A (en) | Resin bond wire saw | |
| JP2000271872A (en) | Super abrasive grain resin bond wire saw | |
| JP2003291057A (en) | Resin bond diamond wire saw and its manufacturing method | |
| JP2006007387A (en) | Super abrasive wire saw | |
| JP4072512B2 (en) | Calculation method of superabrasive ratio of superabrasive wire saw | |
| JP2001054850A (en) | Hard brittle material cutting method by means of fixed abrasive grain wire saw | |
| JP4266969B2 (en) | Resin bond wire saw and method for manufacturing resin bond wire saw | |
| JP2002273663A (en) | Resin bond wire saw | |
| JP2008006584A (en) | Cutting method using superabrasive wire saw | |
| JP3526781B2 (en) | Resin bond wire saw | |
| CN1316315A (en) | Method for moulding product by knurling tool and made of product | |
| JP4386814B2 (en) | Resin bond wire saw | |
| JP2004322290A (en) | Wire saw | |
| JPH11245154A (en) | Manufacturing method of wire saw |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20040921 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20040928 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071008 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081008 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081008 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091008 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091008 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101008 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101008 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111008 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111008 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121008 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131008 Year of fee payment: 9 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |