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JP3606763B2 - Method for manufacturing flexible circuit board - Google Patents
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JP3606763B2 - Method for manufacturing flexible circuit board - Google Patents

Method for manufacturing flexible circuit board Download PDF

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Publication number
JP3606763B2
JP3606763B2 JP08820199A JP8820199A JP3606763B2 JP 3606763 B2 JP3606763 B2 JP 3606763B2 JP 08820199 A JP08820199 A JP 08820199A JP 8820199 A JP8820199 A JP 8820199A JP 3606763 B2 JP3606763 B2 JP 3606763B2
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JP
Japan
Prior art keywords
circuit board
wiring pattern
flexible circuit
pattern
mask pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP08820199A
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Japanese (ja)
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JP2000286530A (en
Inventor
祥司 高野
良一 豊島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mektron KK
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Nippon Mektron KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP08820199A priority Critical patent/JP3606763B2/en
Publication of JP2000286530A publication Critical patent/JP2000286530A/en
Application granted granted Critical
Publication of JP3606763B2 publication Critical patent/JP3606763B2/en
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Expired - Fee Related legal-status Critical Current

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  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、スパッタリング法又は蒸着法によるリフトオフ法を採用しながら電解メッキ手段等では形成できない金属で所要の配線パタ−ンを好適に形成可能な可撓性回路基板の製造法に関する。
【0002】
【従来の技術】
この種の可撓性回路基板を製作する従来の手法としては、サブトラクティブ法又はアディティブ法がある。サブトラクティブ法は、可撓性絶縁べ−ス材に銅箔等の導電層を積層したもの又は可撓性絶縁べ−ス材の少なくとも一方面に電解メッキ等の手段で導電層を一様に形成したものを用意し、その導電層の必要部分をフォトレジスト材等を用いてマスキング処理した後、露出している不要な導電層領域をエッチング手段で除去することによって所要の配線パタ−ンを形成するものである。
【0003】
また、アディティブ法によって可撓性回路基板を製作するには、適当な可撓性絶縁べ−ス材の表面にメッキリ−ドとなるシ−ド層を形成した後、所要の配線パタ−ンを形成できるパタ−ンでシ−ド層の表面にフォトレジスト材等を用いてマスクパタ−ンを形成し、次に、電解メッキ法によりシ−ド層の露出した領域に銅等の導電性部材を被着して配線パタ−ンを形成し、また、必要に応じてそれらの配線パタ−ンの表面には同じく電解メッキ法で金等の異種金属を用いて表面導電層を形成し、最後に、不要となったマスクパタ−ン及びその底部に位置するシ−ド層の領域を除去することにより、可撓性絶縁べ−ス材の上面にシ−ド層部分、配線パタ−ン及び表面導電層等から構成される所要の配線パタ−ンを形成するものである。
【0004】
【発明が解決しようとする課題】
上記従来の手法では、必要な配線パタ−ンの形成を電解メッキ手段で行うのが主体である為、配線パタ−ンの材質は電解メッキ法で形成可能な材質に限定されてしまう。従って、実装時に於ける電子部品との電気的接合性或いは配線パタ−ンの耐環境性等を高める為に、配線パタ−ンを電解メッキでは形成できないチタンなどの金属で形成することは不可能であった。
【0005】
このような不都合を解消する他の手法としてはリフトオフ法がある。このリフトオフ法は、可撓性絶縁べ−ス材の表面の不要領域部分にフォトレジスト材等を用いてマスキング処理を施した後、スパッタリング法又は蒸着法により所要の金属を被着させて導電層を形成し、次いで不要となったマスク部材を除去することにより所要の配線パタ−ンを形成するものである。
【0006】
しかし、可撓性絶縁べ−ス材は薄く剛性がない為に放熱板に密着しないことから、スパッタリング又は蒸着時にマスク部材の放熱が十分に行われない為、このマスク部材が熱による損傷を受けて適正な配線パタ−ンを形成することが不可能な場合がある。
【0007】
そこで、本発明では、スパッタリング法又は蒸着法によるリフトオフ法を採用した場合でも電解メッキ手段等では形成できない金属で所要の配線パタ−ンを好適に形成可能な可撓性回路基板の製造法を提供するものである。
【0008】
【課題を解決するための手段】
その為に、本発明に係る可撓性回路基板の製造法では、上面に所要の配線パタ−ンを形成できるパタ−ンでフォトレジスト材等のマスクパタ−ンを形成した可撓性絶縁べ−ス材を高真空下でもガスの発生しない耐熱性高真空用シリコングリス等からなる密着液を介して放熱板に密着させた状態で前記可撓性絶縁べ−ス材の上面にスパッタリング法又は蒸着法でチタン等の金属によって所要の配線パタ−ンを形成するものである。
【0009】
その場合、前記スパッタリング法又は蒸着法により前記所要の配線パタ−ンを形成する工程の前に、サブトラクティブ法又はアディティブ法で前記配線パタ−ンの下地を形成することもできる。
【0010】
【発明の実施の形態】
以下、図示の実施例を参照しながら本発明を更に詳述する。図1は、本発明の一実施例による可撓性回路基板の製造工程図である。
【0011】
先ず、図1(1)の如く、ポリイミドフィルム等の適当な可撓性絶縁べ−ス材1の表面に所要の配線パタ−ンを形成できるパタ−ンでフォトレジスト材等を用いてマスクパタ−ン2を形成する。
【0012】
上記のマスクパタ−ン2の膜厚は、形成すべき所要の配線パタ−ンの厚みより厚く形成し、また、そのマスクパタ−ン2の側面形状は垂直又は逆台形に形成することができる。
【0013】
次いで、同図(2)の如く、可撓性絶縁べ−ス材1の裏面に耐熱性であって高真空下でもガスの発生しない高真空用シリコングリス等からなる密着液6を一様に介在させて放熱板5を配置し、これにより可撓性絶縁べ−ス材1と放熱板5とを密着液6を介して均一に密着させて、マスクパタ−ン2の放熱性を確保しておく。
【0014】
そこで、矢印で示す如く、電解メッキ法では形成できないチタン等の金属をスパッタリング法又は蒸着法により被着して配線パタ−ン3を形成するが、その際にはマスクパタ−ン2の上面にも被着層4が形成される。
【0015】
斯かるリフトオフ法による配線パタ−ン3の形成時には、可撓性絶縁べ−ス材1と放熱板5とが密着液6を介して均一に密着して、マスクパタ−ン2の放熱性が確保されているので、スパッタリング又は蒸着時にマスクパタ−ン2の損傷が好適に防止され、これにより精度の良好な高品質の配線パタ−ン3を形成することができる。
【0016】
最後に、同図(3)のように、被着層4と共に不要となったマスクパタ−ン2を除去することにより、可撓性絶縁べ−ス材1の上面に電解メッキ法では形成できないチタン等の金属からなる所要の配線パタ−ン3を形成した可撓性回路基板を得ることができる。
【0017】
なお、上記のリフトオフ法による配線パタ−ン3の形成前に、サブトラクティブ法又はアディティブ法でその配線パタ−ンの下地を形成することもできる。
【0018】
【発明の効果】
本発明による可撓性回路基板の製造法によれば、リフトオフ法による配線パタ−ンの形成時に、可撓性絶縁べ−ス材と放熱板とが密着液を介して均一に密着して、マスクパタ−ンの放熱性が確保されているので、スパッタリング又は蒸着時にマスクパタ−ンの損傷が好適に防止され、従って、精度の良好な高品質の配線パタ−ンを形成することができる。
【0019】
上記手法の採用により、本発明によれば従来の電解メッキ手段では形成できないチタン等の金属をスパッタリング法又は蒸着法で被着して確実に所要の配線パタ−ンを形成することができる。
【0020】
従って、実装時に於ける電子部品との電気的接合性或いは配線パタ−ンの耐環境性等を高めることの可能な可撓性回路基板を安定的に製作できる。
【図面の簡単な説明】
【図1】本発明の一実施例による可撓性回路基板の製造工程図。
【符号の説明】
1 可撓性絶縁べ−ス材
2 マスクパタ−ン
3 配線パタ−ン
4 被着層
5 放熱板
6 密着液
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for manufacturing a flexible circuit board in which a required wiring pattern can be suitably formed of a metal that cannot be formed by electrolytic plating means or the like while employing a lift-off method by sputtering or vapor deposition.
[0002]
[Prior art]
As a conventional method for manufacturing this type of flexible circuit board, there is a subtractive method or an additive method. In the subtractive method, a conductive layer such as copper foil is laminated on a flexible insulating base material, or the conductive layer is uniformly formed on at least one surface of the flexible insulating base material by means such as electrolytic plating. Prepare the formed one, mask the necessary part of the conductive layer with a photoresist material, etc., and then remove the unnecessary conductive layer area exposed by etching means to obtain the required wiring pattern. To form.
[0003]
In addition, in order to manufacture a flexible circuit board by the additive method, after forming a seed layer serving as a plating lead on the surface of a suitable flexible insulating base material, a required wiring pattern is formed. A mask pattern is formed on the surface of the seed layer with a pattern that can be formed using a photoresist material or the like, and then a conductive member such as copper is applied to the exposed area of the seed layer by electrolytic plating. A wiring pattern is formed by deposition, and if necessary, a surface conductive layer is formed on the surface of the wiring pattern using a different metal such as gold by the same electrolytic plating method. By removing the mask pattern that is no longer needed and the region of the seed layer located at the bottom, the seed layer portion, the wiring pattern, and the surface conductivity are formed on the upper surface of the flexible insulating base material. A required wiring pattern composed of layers and the like is formed.
[0004]
[Problems to be solved by the invention]
In the above conventional method, the formation of the necessary wiring pattern is mainly performed by the electrolytic plating means. Therefore, the material of the wiring pattern is limited to a material that can be formed by the electrolytic plating method. Therefore, it is impossible to form the wiring pattern with a metal such as titanium, which cannot be formed by electrolytic plating, in order to improve the electrical connection with the electronic parts during mounting or the environmental resistance of the wiring pattern. Met.
[0005]
There is a lift-off method as another method for solving such inconvenience. In this lift-off method, a conductive layer is formed by applying a required metal by sputtering or vapor deposition after performing a masking process using a photoresist material or the like on an unnecessary region on the surface of a flexible insulating base material. Then, a required wiring pattern is formed by removing unnecessary mask members.
[0006]
However, since the flexible insulating base material is thin and not rigid, it does not adhere to the heat radiating plate. Therefore, the mask member is not sufficiently radiated during sputtering or vapor deposition, so that the mask member is damaged by heat. In some cases, it is impossible to form an appropriate wiring pattern.
[0007]
Therefore, the present invention provides a method of manufacturing a flexible circuit board that can suitably form a required wiring pattern with a metal that cannot be formed by electrolytic plating means or the like even when a lift-off method by sputtering or vapor deposition is adopted. To do.
[0008]
[Means for Solving the Problems]
For this purpose, in the method for manufacturing a flexible circuit board according to the present invention, a flexible insulating board in which a mask pattern such as a photoresist material is formed with a pattern capable of forming a required wiring pattern on the upper surface. Sputtering or vapor deposition is performed on the upper surface of the flexible insulating base material in a state in which the glass material is in close contact with the heat sink through an adhesive liquid made of heat-resistant high vacuum silicon grease that does not generate gas even under high vacuum. In this method, a required wiring pattern is formed of a metal such as titanium.
[0009]
In that case, the base of the wiring pattern can be formed by the subtractive method or the additive method before the step of forming the required wiring pattern by the sputtering method or the vapor deposition method.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described in more detail with reference to the illustrated embodiments. FIG. 1 is a manufacturing process diagram of a flexible circuit board according to an embodiment of the present invention.
[0011]
First, as shown in FIG. 1A, a mask pattern using a photoresist material or the like with a pattern capable of forming a required wiring pattern on the surface of an appropriate flexible insulating base material 1 such as a polyimide film. 2 is formed.
[0012]
The film thickness of the mask pattern 2 is larger than the required wiring pattern to be formed, and the side surface of the mask pattern 2 can be formed in a vertical or inverted trapezoidal shape.
[0013]
Next, as shown in FIG. 2 (2), the back surface of the flexible insulating base material 1 is uniformly coated with an adhesion liquid 6 made of high vacuum silicon grease or the like which is heat resistant and does not generate gas even under high vacuum. The heat radiating plate 5 is disposed so that the flexible insulating base material 1 and the heat radiating plate 5 are uniformly brought into close contact with each other through the contact liquid 6 to ensure the heat radiation of the mask pattern 2. deep.
[0014]
Therefore, as shown by the arrows, a wiring pattern 3 is formed by depositing a metal such as titanium, which cannot be formed by electrolytic plating, by sputtering or vapor deposition. In this case, the wiring pattern 3 is also formed on the upper surface of the mask pattern 2. The deposition layer 4 is formed.
[0015]
When the wiring pattern 3 is formed by such lift-off method, the flexible insulating base material 1 and the heat radiating plate 5 are in close contact with each other through the contact liquid 6 to ensure the heat radiation of the mask pattern 2. Therefore, the mask pattern 2 is preferably prevented from being damaged during sputtering or vapor deposition, whereby a high-quality wiring pattern 3 with good accuracy can be formed.
[0016]
Finally, as shown in FIG. 3 (3), the unnecessary mask pattern 2 together with the deposition layer 4 is removed, so that titanium that cannot be formed on the upper surface of the flexible insulating base material 1 by electrolytic plating is used. A flexible circuit board on which a required wiring pattern 3 made of a metal such as is formed can be obtained.
[0017]
Note that the base of the wiring pattern can be formed by the subtractive method or the additive method before the formation of the wiring pattern 3 by the lift-off method.
[0018]
【The invention's effect】
According to the method for manufacturing a flexible circuit board according to the present invention, when forming a wiring pattern by a lift-off method, the flexible insulating base material and the heat radiating plate are in close contact with each other through an adhesion liquid, Since the heat dissipation of the mask pattern is ensured, damage to the mask pattern is suitably prevented during sputtering or vapor deposition, and therefore a high-quality wiring pattern with good accuracy can be formed.
[0019]
By adopting the above method, according to the present invention, it is possible to reliably form a required wiring pattern by depositing a metal such as titanium, which cannot be formed by conventional electrolytic plating means, by sputtering or vapor deposition.
[0020]
Therefore, it is possible to stably manufacture a flexible circuit board capable of improving the electrical bondability with an electronic component during mounting or the environment resistance of a wiring pattern.
[Brief description of the drawings]
FIG. 1 is a manufacturing process diagram of a flexible circuit board according to an embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Flexible insulating base material 2 Mask pattern 3 Wiring pattern 4 Adhering layer 5 Heat sink 6 Adhesive liquid

Claims (5)

上面に所要の配線パタ−ンを形成できるパタ−ンでマスクパタ−ンを形成した可撓性絶縁べ−ス材を密着液を介して放熱板に密着させた状態で、前記マスクパタ−ン開口部の前記可撓性絶縁べ−ス材上および前記マスクパタ−ン上に、スパッタリング法または蒸着法で導電膜を形成し、前記マスクパタ−ンを該マスクパタ−ン上の導電膜と共に除去することにより、配線パタ−ンを形成することを特徴とする可撓性回路基板の製造法。Required wiring on the upper surface pattern - down can form patterns - emissions at mask pattern - forming the flexible insulating base to down - the scan material contact liquid while being in close contact with the heat radiating plate via the mask pattern - down opening Forming a conductive film on the flexible insulating base material and the mask pattern by sputtering or vapor deposition , and removing the mask pattern together with the conductive film on the mask pattern; A method of manufacturing a flexible circuit board, comprising forming a wiring pattern. 前記密着液が高真空下でもガスの発生しない耐熱性高真空用シリコングリスである請求項1の可撓性回路基板の製造法。2. The method of manufacturing a flexible circuit board according to claim 1, wherein the contact liquid is heat-resistant high vacuum silicon grease that does not generate gas even under high vacuum. 前記マスクパタ−ンがフォトレジスト材を使用して形成された請求項1又は2の可撓性回路基板の製造法。3. The method of manufacturing a flexible circuit board according to claim 1, wherein the mask pattern is formed using a photoresist material. 前記スパッタリング法又は蒸着法で形成される配線パタ−ンの材質がチタンである請求項1〜3のいずれかの可撓性回路基板の製造法。4. The method of manufacturing a flexible circuit board according to claim 1, wherein a material of a wiring pattern formed by the sputtering method or the vapor deposition method is titanium. 前記スパッタリング法又は蒸着法により前記所要の配線パタ−ンを形成する工程の前に、サブトラクティブ法又はアディティブ法で前記配線パタ−ンの下地を形成することを特徴とする請求項1〜4のいずれかの可撓性回路基板の製造法。5. The base of the wiring pattern is formed by a subtractive method or an additive method before the step of forming the required wiring pattern by the sputtering method or the vapor deposition method. A method of manufacturing any flexible circuit board.
JP08820199A 1999-03-30 1999-03-30 Method for manufacturing flexible circuit board Expired - Fee Related JP3606763B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP08820199A JP3606763B2 (en) 1999-03-30 1999-03-30 Method for manufacturing flexible circuit board

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JP2000286530A JP2000286530A (en) 2000-10-13
JP3606763B2 true JP3606763B2 (en) 2005-01-05

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4713131B2 (en) 2004-11-19 2011-06-29 株式会社マルチ Printed wiring board and method for manufacturing the printed wiring board
US10136945B2 (en) * 2015-12-09 2018-11-27 Biosense Webster (Israel) Ltd. Ablation catheter with light-based contact sensors

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