JP3660941B2 - Degradable polymer compound - Google Patents
Degradable polymer compound Download PDFInfo
- Publication number
- JP3660941B2 JP3660941B2 JP2000382827A JP2000382827A JP3660941B2 JP 3660941 B2 JP3660941 B2 JP 3660941B2 JP 2000382827 A JP2000382827 A JP 2000382827A JP 2000382827 A JP2000382827 A JP 2000382827A JP 3660941 B2 JP3660941 B2 JP 3660941B2
- Authority
- JP
- Japan
- Prior art keywords
- hydroxyl group
- polymer compound
- polysulfone
- phenolic hydroxyl
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000001875 compounds Chemical class 0.000 title claims description 30
- 229920006237 degradable polymer Polymers 0.000 title 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims description 32
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 32
- 229920000642 polymer Polymers 0.000 claims description 29
- 229920002492 poly(sulfone) Polymers 0.000 claims description 27
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 22
- 229920001577 copolymer Polymers 0.000 claims description 14
- 150000003440 styrenes Chemical class 0.000 claims description 14
- 239000003513 alkali Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- DFUGUNJHRTYQAY-AATRIKPKSA-N (e)-2-(4-hydroxyphenyl)ethenesulfinic acid Chemical compound OC1=CC=C(\C=C\S(O)=O)C=C1 DFUGUNJHRTYQAY-AATRIKPKSA-N 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 229920005603 alternating copolymer Polymers 0.000 claims description 6
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 29
- 238000000862 absorption spectrum Methods 0.000 description 13
- 238000000354 decomposition reaction Methods 0.000 description 13
- 239000000178 monomer Substances 0.000 description 13
- 239000007864 aqueous solution Substances 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- 238000005481 NMR spectroscopy Methods 0.000 description 11
- -1 electrical parts Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 9
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 238000010511 deprotection reaction Methods 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 5
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- NJCKCAMLRCAFID-AATRIKPKSA-N (e)-2-(4-hydroxyphenyl)ethenesulfonic acid Chemical compound OC1=CC=C(\C=C\S(O)(=O)=O)C=C1 NJCKCAMLRCAFID-AATRIKPKSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- SOSNAIPTFXTNRU-UHFFFAOYSA-N (4-ethenylphenoxy)-trimethylsilane Chemical compound C[Si](C)(C)OC1=CC=C(C=C)C=C1 SOSNAIPTFXTNRU-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-OUBTZVSYSA-N Carbon-13 Chemical compound [13C] OKTJSMMVPCPJKN-OUBTZVSYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003905 agrochemical Substances 0.000 description 2
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 2
- 239000001099 ammonium carbonate Substances 0.000 description 2
- OEERIBPGRSLGEK-UHFFFAOYSA-N carbon dioxide;methanol Chemical compound OC.O=C=O OEERIBPGRSLGEK-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000012259 ether extract Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000003317 industrial substance Substances 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 2
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- SWHAGWLVMRLFKO-UHFFFAOYSA-N (2-nitrophenyl)methyl carbamate Chemical compound NC(=O)OCC1=CC=CC=C1[N+]([O-])=O SWHAGWLVMRLFKO-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- STQQXKVBEVTXDO-UHFFFAOYSA-N 1-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C(=C)C1=CC=CC=C1 STQQXKVBEVTXDO-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001336 alkenes Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920006238 degradable plastic Polymers 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- HPTMZNZYFRTOKS-UHFFFAOYSA-N ethenesulfinic acid Chemical class OS(=O)C=C HPTMZNZYFRTOKS-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- NASFKTWZWDYFER-UHFFFAOYSA-N sodium;hydrate Chemical compound O.[Na] NASFKTWZWDYFER-UHFFFAOYSA-N 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 150000003457 sulfones Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/62—Plastics recycling; Rubber recycling
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、アルカリで分解させることができ、かつ分解物が再利用できる分解性プラスチックおよびその分解方法、並びに分解生成物に関するものである。
【0002】
【従来の技術】
高分子化合物としてのプラスチックは、種類によって異なるが、物理的強度と耐候性、耐熱性、耐化学薬品性等を備えていることから、機械構造材料、電気部品、建築材料などの工業材料としての用途や、容器やフィルム等に成形されて包装材料などに使用されるほか、塗料などにも使用され、多くの産業分野で利用されている。しかしながら、プラスチックの多くは、土中の微生物や自然環境下での光や熱によっては容易に分解されないため、使用後のプラスチック製品による環境汚染が問題となってきている。処理の方法として、一部は焼却処理されているが、焼却で生ずる煤煙や有害ガスの発生など二次汚染の問題が生じている。また、この方法では資源の再利用が図れないという欠点を有する。
そのため、効率良く低分子量化する高分子化合物は、地球環境への負荷を軽減し、資源の有効活用の観点から重要である。最近、こうした観点から分解生成物の再利用を意図した高分子化合物が開発されている(特開平11−92503号公報)。しかしながら、これらの高分子化合物の多くは、酸やアルカリにより加水分解するエステル、アミド等の化学結合を有するものであり、連鎖的に分解するものではない。
【0003】
【発明が解決しようとする課題】
本発明の第一の目的は、従来の加水分解とは異なり、連鎖的に分解して再利用し得る低分子化合物を分離することができるプラスチック(高分子化合物)及び該プラスチックの分解方法を提供することにあり、第二の目的は、該分解方法によって得られる水溶性に優れたスルフィン酸を提供することにある。
【0004】
【課題を解決するための手段】
本発明は、フェノール性水酸基を有するスチレン誘導体と二酸化硫黄との共重合体構造を分子中に含有することを特徴とする高分子化合物に関するものである。本発明の高分子化合物はアルカリで分解することができ、分解によって所望のパターンの形成や低分子化合物とすることができる。
さらに本発明は、該分解方法によって得られる水溶性に優れたスルフィン酸を提供するものである。
【0005】
【発明の実施の形態】
本発明のアルカリ分解性の高分子化合物は、2位または4位にフェノール性水酸基を有するスチレン誘導体と二酸化硫黄との共重合体構造を有するポリマーよりなるが、より具体的には下記一般式(I)で表されるフェノール性水酸基を有するスチレン誘導体と二酸化硫黄との共重合体構造を分子中に含有することを特徴とするものである。
【化2】
〔式中、X及びYは水素原子又は保護されていてもよい水酸基を表し、Xが水素原子のときYは前記水酸基を示し、Yが水素原子のときXは前記水酸基を示し、mは1〜4、nは5〜5000を示す。〕
【0006】
本発明の高分子化合物は、上記式(I)で示される共重合体構造のみからなる重合体であるポリスルホンであってもよく、また、上記式(I)で示される共重合体構造を含む重合体(IA):
【化3】
(式中、Aは共重合可能なモノマーを示し、a及びbは任意の整数を示す。)
であってもよい。a及びbは、使用するモノマーAによって異なり、また、得られる重合体に要求される分解度に応じて選択される。
上記において、共重合可能なモノマーとしては、スチレン、ジビニルベンゼン、(メタ)アクリル酸、(メタ)アクリル酸エステル、酢酸ビニル等のビニル系モノマーが好ましい。
一般式(I)において、mは好ましくは1〜2、より好ましくは1であり、nは好ましくは5〜2000、より好ましくは5〜1000である。
【0007】
以下に、本発明の高分子化合物(以下ポリスルホンという)の製法について説明する。
本発明のポリスルホンは、フェノール性水酸基を保護したスチレン誘導体を含むモノマーと、二酸化硫黄とのラジカル共重合により製造することができる。
重合開始剤は、通常この種の分野で使用されているものが使用できる。
フェノール性水酸基の保護は、常法にしたがって、トリメチルシリル(TMS)基、tert−ブトキシカルボニル基、アセチル基などの保護基で行うことができる。共重合体(コポリマー)の組成(スチレン誘導体ユニットとスルホンユニットとの割合)は、温度、濃度、モノマーの仕込み組成などに依存する。モノマーは、フェノール性水酸基を保護したスチレン誘導体単独でも、あるいは、フェノール性水酸基を保護したスチレン誘導体以外のモノマーとの混合物でも良い。共重合反応後、得られたコポリマーのフェノール性水酸基の保護を外して(脱保護して)、フェノール性水酸基を有するポリスルホンとする。
水酸基の脱保護は、得られたコポリマーのアルカリ水溶液による分解性を得るために行われる。したがって、コポリマーからの水酸基の脱保護は、必要に応じて一部行うか又はまったく行わないで、その後の用途に用いることもできる。
保護基の異なるスチレン誘導体を選択して用いることによって、脱保護度の異なるポリスルホンを得ることができる。
【0008】
脱保護したポリスルホンはアルカリ水溶液と接触させると、溶解と同時に分解する。水溶液として用いるアルカリは、水酸化ナトリウム、水酸化カリウム、水酸化アンモニウム、炭酸ナトリウム、炭酸水素ナトリウム、メタケイ酸ナトリウム、リン酸3ナトリウム、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシドなどが挙げられる。分解に必要なアルカリの量は、分解するポリスルホンの量に比例する。
【0009】
本発明のポリスルホンがアルカリにより分解するのは、主鎖のスルホニル基と側鎖のフェノール性水酸基の働きによるものと推測される。すなわち、側鎖のフェノール性水酸基により、ポリスルホンはアルカリ水溶液に溶解する。溶解したポリスルホンにおいて、主鎖のスルホニル基に対してアンチ位にあるメチレンプロトンがアルカリにより引き抜かれ、プロトン引抜きによるカルバニオン生成と同時に、主鎖の炭素−硫黄結合が開裂してポリスルホンが分解する。
したがって、式(I)で示される重合体構造をポリマーの分子鎖中の任意の位置に介在させることによって、所望の位置で分解した低分子化合物を得ることができる。式(I)で示されるポリスルホン構造体は、モノマーからの重合のほか、グラフト重合、ブロック重合等の方法でポリマー中に組み込んでも良い。
【0010】
上記ポリスルホンの分解において、4−ヒドロキシスチレンと二酸化硫黄との1:1交互共重合体であるポリスルホンをアルカリ水溶液中で分解すると、均一透明な溶液が得られ、この水溶液を酸で中和後エーテル抽出し、抽出後の水溶液を濃縮すると白色固体が得られる。さらに、白色固体生成物を2−メチル−2−プロパノールで抽出後、抽出溶媒を留去するとtrans−2−(4−ヒドロキシフェニル)エテンスルフィン酸を得ることができる。
このエテンスルフィン酸は文献未記載の新規化合物で、次式(II):
【化4】
で示される水溶性に優れた化合物であり、写真薬品、めっき薬品等の種々の工業薬品、医薬及び農薬の製造原料又は中間体としての用途が見込まれる。
【0011】
【実施例】
以下実施例をあげて本発明を具体的に説明するが、本発明はこれらの例に限定されるものではない。
【0012】
実施例1 4−ヒドロキシスチレンと二酸化硫黄との1:1交互共重合体の合成
ポリマー・プレプリント・ジャパン(Polym.Prepr.,Jpn.)1988年(第37巻)3438頁に記載されている方法に準拠して行った。この低温ラジカル共重合反応の条件(−50〜−80℃)で、スチレン誘導体と二酸化硫黄との1:1交互共重合体が得られる。
【0013】
二酸化硫黄はボンベよりドライアイス−メタノール(−80℃)で冷却して液化し、五酸化二リンで乾燥した。フェノール性水酸基をトリメチルシリル基で保護したモノマーである4−トリメチルシリルオキシスチレン0.91gを丸底フラスコに入れ、ドライアイス−メタノールで冷却した。乾燥した二酸化硫黄0.65mLを前記丸底フラスコに再蒸留し、4−トリメチルシリルオキシスチレンを溶解させた。重合開始剤としてtert−ブチルヒドロペルオキシドの3.0M2,2,4−トリメチルペンタン溶液20mgを添加した後、−80℃の低温槽に68時間放置した。その後、反応容器(丸底フラスコ)を液体窒素(−196℃)で冷却して重合を停止させ、排気しながら室温に戻した。そのまま2時間排気を続けた後、生成物をジメチルスルホキシド(DMSO)に溶解し、1,4−ジオキサン中に投入して精製し、白色樹脂0.67gを得た。
【0014】
得られた白色樹脂のプロトン核磁気共鳴吸収スペクトルを図1に示した。図からわかるように、0ppm付近の高磁場に出現するはずのトリメチルシリル基に基づく吸収は観測されず、代わりに9.7ppmに重水の添加によって消失するフェノール性水酸基のプロトン(a)の吸収が観測された。
また、図2に示す炭素13核磁気共鳴吸収スペクトルでは、ポリマー鎖に対してオルト位(C−2及びC−6)及びパラ位(C−4)の芳香環炭素が、それぞれ131.2、158.3ppmに、いずれもシングレットで観測された。さらに、赤外線吸収スペクトルには、1124及び1311cm-1にスルホニル基の伸縮振動に基づく強い吸収が存在した。
これらのスペクトルデータから、得られた白色樹脂は、トリメチルシリル基が空気中の水分により加水分解して脱離した、4−ヒドロキシスチレンと二酸化硫黄との1:1交互共重合体であるポリ(4−ヒドロキシスチレン スルホン)であると認められた。収率は77%。このポリスルホンの分子量及び分子量分布はGPC(ゲル浸透クロマトグラフィー)測定により、それぞれMw=76800、Mw/Mn=2.84と決定された。
【0015】
実施例2 ポリスルホンのアルカリ水溶液による分解
実施例1で得られたポリ(4−ヒドロキシスチレン スルホン)25mgを、濃度1.2〜11.8w/v%(重量/容量%)の重水酸化ナトリウム重水溶液0.56mLと共に振盪すると、速やかに溶解して分解し、trans−2−(4−ヒドロキシフェニル)エテンスルフィン酸及び4−ヒドロキシスチレンが2:3のモル比で得られた。
図3に示すごとく、このポリスルホンの分解は定量的に進行し、どちらの生成物も、生成量はアルカリ濃度に依存しなかった。なお、図3の定量はプロトン核磁気共鳴吸収スペクトルの積分によって行い、縦軸のモル比は、原料に用いたポリ(4−ヒドロキシスチレン スルホン)のモノマー単位のモル数に対する生成物のモル数の比を表す。
【0016】
以下に生成物の単離について記載する。
均一透明になった前記のポリ(4−ヒドロキシスチレン スルホン)のアルカリ水溶液を、重塩酸で中和後エーテルで抽出し、エーテル抽出液とアルカリ水溶液とに分離して、エーテル可溶の生成物と水溶性の生成物に分離した。エーテル可溶の生成物 4−ヒドロキシスチレンは、エーテル抽出液を濃縮すると白色固体として得られた。収率55%。得られた白色固体(4−ヒドロキシスチレン)のプロトン核磁気共鳴吸収スペクトルを図4に示す。
4−ヒドロキシスチレンは既に知られた化合物で、図4のスペクトルは公知の4−ヒドロキシスチレンのスペクトルと一致した。
【0017】
次に、水溶性の生成物trans−2−(4−ヒドロキシフェニル)エテンスルフィン酸は、エーテル抽出後の重水溶液を乾涸させ、2−メチル−2−プロパノールで抽出後、抽出液を濃縮すると白色固体として得られた。収率35%。trans−2−(4−ヒドロキシフェニル)エテンスルフィン酸は重水に容易に溶解し、図5のaに示すプロトン核磁気共鳴吸収スペクトルを与えた。
【0018】
trans−2−(4−ヒドロキシフェニル)エテンスルフィン酸は、次亜塩素酸ナトリウム水溶液で酸化するとtrans−2−(4−ヒドロキシフェニル)エテンスルホン酸に変化した。trans−2−(4−ヒドロキシフェニル)エテンスルホン酸のプロトン核磁気共鳴吸収スペクトルを図5のbに示した。
trans−2−(4−ヒドロキシフェニル)エテンスルホン酸の赤外線吸収スペクトルでは、1041、1174、及び1211cm-1にスルホン酸に基づく強い吸収が認められた。
スルフィン酸とスルホン酸は、2個のオレフィンプロトン(G2、G3)と4個の芳香環プロトン(G1)を有しており、図5のa、bのスペクトルにおいて芳香環のプロトン(G1)はそれぞれ結合定数8.3Hzのダブレットが充分離れて対になっていることからパラ置換ベンゼンに基づく吸収と認められ、スルフィン酸(スペクトルa)ではオレフィンプロトン(G3)の結合定数16.1Hzからトランス(trans)の立体配置を持つ1,2−ジ置換オレフィン化合物と認められた。スペクトルbの2個の結合定数15.6Hzはスルホン酸の2個のオレフィンプロトン(G3)を示す。
【0019】
実施例3
実施例1で得られたポリ(4−ヒドロキシスチレン スルホン)25mg及び重水0.56mLの不均一溶液に、濃度24w/v%の重水酸化ナトリウム重水溶液を10μL添加した。その結果、重水酸化ナトリウムの添加量に対してモル比で0.64のモノマー単位を有するポリスルホンが分解した。生成したtrans−2−(4−ヒドロキシフェニル)エテンスルフィン酸と4−ヒドロキシスチレンのモル比は0.78:1であった。
【0020】
実施例4
実施例3と同様に、実施例1で得られたポリ(4−ヒドロキシスチレン スルホン)25mg及び重水0.56mLの不均一溶液に、濃度26w/v%の重水酸化アンモニウム重水溶液を10μL添加した。その結果、重水酸化アンモニウムの添加量に対してモル比で0.51のモノマー単位を有するポリスルホンが分解した。生成したtrans−2−(4−ヒドロキシフェニル)エテンスルフィン酸と4−ヒドロキシスチレンのモル比は0.77:1であった。
【0021】
【発明の効果】
以上説明したように、本発明によれば、アルカリによる分解が可能なポリスルホンを得ることができる。本発明のポリスルホンは、主鎖にスルホニル基を有し、側鎖にフェノール性水酸基を有する化学構造を持つため、塩基の存在によって容易に分解する。この易分解性はフェノール性水酸基を有するスチレン誘導体と二酸化硫黄との共重合体構造によって得られるため、該重合体構造をポリマーの分子中に任意の箇所に任意の数で介在させることによって、所望の低分子量化合物で分解することができ、地球環境への負荷を軽減できる易分解性の高分子化合物を得ることができる。さらに、該ポリスルホンに、例えば、o−ニトロベンジルカーバメートのような光塩基発生剤を共存させることによって、光照射によりポリスルホンを分解しパターンを形成する、フォトレジストへの応用が可能となる。なお、該ポリスルホンは、スルホニル基及びフェノール性水酸基の極性構造を有するため、接着性や溶解性等に優れている。
【0022】
さらに、本発明によって、新規化合物であるtrans−2−(4−ヒドロキシフェニル)エテンスルフィン酸を得ることができる。この化合物は、フェノール性水酸基を有するスルフィン酸であり、水溶性に優れていることから、酸として使用できるほか、各種工業薬品、医薬、農薬等の合成材料として利用できる。より具体的には、写真薬品、めっき薬品等として有用である。
【図面の簡単な説明】
【図1】ポリ(4−ヒドロキシスチレン スルホン)のプロトン核磁気共鳴吸収スペクトルである。
【図2】ポリ(4−ヒドロキシスチレン スルホン)の炭素13核磁気共鳴吸収スペクトルである。
【図3】分解生成物に及ぼすアルカリ水溶液の濃度依存性を示すグラフである。
【図4】4−ヒドロキシスチレンのプロトン核磁気共鳴吸収スペクトルである。
【図5】プロトン核磁気共鳴吸収スペクトルで、aはtrans−2−(4−ヒドロキシフェニル)エテンスルフィン酸、bはその次亜塩素酸ナトリウム水溶液による酸化物であるtrans−2−(4−ヒドロキシフェニル)エテンスルホン酸のプロトン核磁気共鳴吸収スペクトルである。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a degradable plastic that can be decomposed with an alkali and that can be reused, a decomposition method thereof, and a decomposition product.
[0002]
[Prior art]
Plastics as polymer compounds differ depending on the type, but they have physical strength, weather resistance, heat resistance, chemical resistance, etc., so they are used as industrial materials such as mechanical structural materials, electrical parts, and building materials. In addition to being used for packaging materials etc. after being molded into containers and films, it is also used in paints and is used in many industrial fields. However, many plastics are not easily decomposed by microorganisms in the soil or light and heat in the natural environment, and environmental pollution due to plastic products after use has become a problem. Although some are incinerated as a treatment method, there are problems of secondary contamination such as generation of soot and harmful gas generated by incineration. In addition, this method has a drawback that resources cannot be reused.
Therefore, a polymer compound that can efficiently lower the molecular weight is important from the viewpoint of reducing the burden on the global environment and effectively utilizing resources. Recently, a polymer compound intended to reuse a decomposition product from such a viewpoint has been developed (Japanese Patent Laid-Open No. 11-92503). However, many of these polymer compounds have chemical bonds such as esters and amides that hydrolyze with acids and alkalis, and do not decompose in a chain manner.
[0003]
[Problems to be solved by the invention]
The first object of the present invention is to provide a plastic (polymer compound) capable of separating low-molecular compounds that can be reused by chain decomposition unlike conventional hydrolysis, and a method for decomposing the plastic The second object is to provide a sulfinic acid excellent in water solubility obtained by the decomposition method.
[0004]
[Means for Solving the Problems]
The present invention relates to a polymer compound comprising a copolymer structure of a styrene derivative having a phenolic hydroxyl group and sulfur dioxide in the molecule. The high molecular compound of the present invention can be decomposed with an alkali, and can be formed into a desired pattern or a low molecular compound by decomposition.
Furthermore, this invention provides the sulfinic acid excellent in the water solubility obtained by this decomposition method.
[0005]
DETAILED DESCRIPTION OF THE INVENTION
The alkali-decomposable polymer compound of the present invention comprises a polymer having a copolymer structure of a styrene derivative having a phenolic hydroxyl group at the 2-position or 4-position and sulfur dioxide. More specifically, the following general formula ( It is characterized in that it contains a copolymer structure of a styrene derivative having a phenolic hydroxyl group represented by I) and sulfur dioxide in the molecule.
[Chemical formula 2]
[Wherein, X and Y represent a hydrogen atom or an optionally protected hydroxyl group; when X is a hydrogen atom, Y represents the hydroxyl group; when Y is a hydrogen atom, X represents the hydroxyl group; -4, n represents 5-5000. ]
[0006]
The polymer compound of the present invention may be polysulfone, which is a polymer composed only of the copolymer structure represented by the above formula (I), and includes a copolymer structure represented by the above formula (I). Polymer (IA):
[Chemical 3]
(In the formula, A represents a copolymerizable monomer, and a and b represent arbitrary integers.)
It may be. a and b vary depending on the monomer A used, and are selected according to the degree of decomposition required for the polymer obtained.
In the above, as the copolymerizable monomer, vinyl monomers such as styrene, divinylbenzene, (meth) acrylic acid, (meth) acrylic acid ester, and vinyl acetate are preferable.
In general formula (I), m is preferably 1-2, more preferably 1, and n is preferably 5-2000, more preferably 5-1000.
[0007]
Below, the manufacturing method of the high molecular compound (henceforth polysulfone) of this invention is demonstrated.
The polysulfone of the present invention can be produced by radical copolymerization of a monomer containing a styrene derivative with a phenolic hydroxyl group protected and sulfur dioxide.
As the polymerization initiator, those usually used in this kind of field can be used.
The phenolic hydroxyl group can be protected with a protecting group such as a trimethylsilyl (TMS) group, a tert-butoxycarbonyl group, or an acetyl group according to a conventional method. The composition of the copolymer (copolymer) (the ratio of the styrene derivative unit and the sulfone unit) depends on the temperature, concentration, monomer charge composition, and the like. The monomer may be a styrene derivative alone with a phenolic hydroxyl group protected or a mixture with a monomer other than a styrene derivative with a phenolic hydroxyl group protected. After the copolymerization reaction, protection of the phenolic hydroxyl group of the obtained copolymer is removed (deprotection) to obtain a polysulfone having a phenolic hydroxyl group.
The deprotection of the hydroxyl group is performed in order to obtain the decomposability of the obtained copolymer with an alkaline aqueous solution. Thus, hydroxyl group deprotection from the copolymer can be used in subsequent applications with partial or no deprotection as required.
By selecting and using styrene derivatives having different protecting groups, polysulfones having different degrees of deprotection can be obtained.
[0008]
When deprotected polysulfone is brought into contact with an alkaline aqueous solution, it decomposes simultaneously with dissolution. Examples of the alkali used as the aqueous solution include sodium hydroxide, potassium hydroxide, ammonium hydroxide, sodium carbonate, sodium hydrogen carbonate, sodium metasilicate, trisodium phosphate, tetramethylammonium hydroxide, and tetraethylammonium hydroxide. The amount of alkali required for decomposition is proportional to the amount of polysulfone that decomposes.
[0009]
The degradation of the polysulfone of the present invention by alkali is presumed to be due to the action of the sulfonyl group in the main chain and the phenolic hydroxyl group in the side chain. That is, the polysulfone is dissolved in the alkaline aqueous solution by the phenolic hydroxyl group in the side chain. In the dissolved polysulfone, methylene protons in the anti-position with respect to the sulfonyl group of the main chain are extracted by alkali, and simultaneously with the generation of carbanion by proton extraction, the carbon-sulfur bond of the main chain is cleaved and the polysulfone is decomposed.
Therefore, a low molecular compound decomposed at a desired position can be obtained by interposing the polymer structure represented by the formula (I) at an arbitrary position in the molecular chain of the polymer. The polysulfone structure represented by the formula (I) may be incorporated into a polymer by a method such as graft polymerization or block polymerization in addition to polymerization from a monomer.
[0010]
When the polysulfone, which is a 1: 1 alternating copolymer of 4-hydroxystyrene and sulfur dioxide, is decomposed in an alkaline aqueous solution in the decomposition of the polysulfone, a uniform transparent solution is obtained. Extraction and concentration of the aqueous solution after extraction yields a white solid. Furthermore, after extracting a white solid product with 2-methyl-2-propanol, trans-2- (4-hydroxyphenyl) ethenesulfinic acid can be obtained by evaporating the extraction solvent.
This ethene sulfinic acid is a novel compound not described in the literature, and has the following formula (II):
[Formula 4]
It is expected to be used as a production raw material or intermediate for various industrial chemicals such as photographic chemicals and plating chemicals, pharmaceuticals and agricultural chemicals.
[0011]
【Example】
EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited to these examples.
[0012]
Example 1 Synthesis of 1: 1 Alternating Copolymer of 4-Hydroxystyrene and Sulfur Dioxide Polymer Preprint Japan (Polym. Prepr., Jpn.) 1988 (Vol. 37), page 3438 Performed according to the method. Under this low temperature radical copolymerization reaction condition (-50 to -80 ° C), a 1: 1 alternating copolymer of a styrene derivative and sulfur dioxide can be obtained.
[0013]
The sulfur dioxide was liquefied by cooling with a dry ice-methanol (−80 ° C.) from a cylinder and dried with diphosphorus pentoxide. 0.91 g of 4-trimethylsilyloxystyrene, which is a monomer having a phenolic hydroxyl group protected with a trimethylsilyl group, was placed in a round bottom flask and cooled with dry ice-methanol. 0.65 mL of dried sulfur dioxide was redistilled in the round bottom flask to dissolve 4-trimethylsilyloxystyrene. After adding 20 mg of a 3.0
[0014]
The proton nuclear magnetic resonance absorption spectrum of the obtained white resin is shown in FIG. As can be seen from the figure, no absorption based on the trimethylsilyl group, which should appear in a high magnetic field near 0 ppm, is observed, but instead the absorption of proton (a) of the phenolic hydroxyl group that disappears by adding heavy water to 9.7 ppm is observed. It was done.
Further, in the carbon 13 nuclear magnetic resonance absorption spectrum shown in FIG. 2, the aromatic ring carbons at the ortho position (C-2 and C-6) and the para position (C-4) with respect to the polymer chain are respectively 131.2, All were observed with a singlet at 158.3 ppm. Furthermore, in the infrared absorption spectrum, strong absorption based on the stretching vibration of the sulfonyl group was present at 1124 and 1311 cm −1 .
From these spectral data, the obtained white resin is a poly (4) which is a 1: 1 alternating copolymer of 4-hydroxystyrene and sulfur dioxide in which trimethylsilyl groups are hydrolyzed and eliminated by moisture in the air. -Hydroxystyrene sulfone). Yield 77%. The molecular weight and molecular weight distribution of this polysulfone were determined to be Mw = 76800 and Mw / Mn = 2.84, respectively, by GPC (gel permeation chromatography) measurement.
[0015]
Example 2 Decomposition of Polysulfone with Alkaline Aqueous Solution 25 mg of the poly (4-hydroxystyrene sulfone) obtained in Example 1 was dissolved in a sodium hydrogen hydroxide heavy aqueous solution having a concentration of 1.2 to 11.8 w / v% (weight / volume%). When shaken with 0.56 mL, it quickly dissolved and decomposed, and trans-2- (4-hydroxyphenyl) ethenesulfinic acid and 4-hydroxystyrene were obtained in a molar ratio of 2: 3.
As shown in FIG. 3, the decomposition of the polysulfone proceeded quantitatively, and the amount of production of both products did not depend on the alkali concentration. The quantification in FIG. 3 is performed by integrating the proton nuclear magnetic resonance absorption spectrum, and the molar ratio of the vertical axis is the number of moles of product relative to the number of moles of monomer units of poly (4-hydroxystyrene sulfone) used as a raw material. Represents the ratio.
[0016]
The product isolation is described below.
The alkali aqueous solution of the poly (4-hydroxystyrene sulfone) that became uniform and transparent was neutralized with deuterated hydrochloric acid, extracted with ether, separated into an ether extract and an aqueous alkali solution, and an ether-soluble product and Separated into water soluble product. Ether-soluble product 4-hydroxystyrene was obtained as a white solid upon concentration of the ether extract. Yield 55%. FIG. 4 shows a proton nuclear magnetic resonance absorption spectrum of the obtained white solid (4-hydroxystyrene).
4-Hydroxystyrene is a known compound, and the spectrum of FIG. 4 coincided with the spectrum of known 4-hydroxystyrene.
[0017]
Next, the water-soluble product trans-2- (4-hydroxyphenyl) ethenesulfinic acid is obtained by drying the heavy aqueous solution after ether extraction, extracting with 2-methyl-2-propanol, and then concentrating the extract. Obtained as a solid. Yield 35%. trans-2- (4-Hydroxyphenyl) ethenesulfinic acid readily dissolved in heavy water and gave a proton nuclear magnetic resonance absorption spectrum shown in FIG.
[0018]
When trans-2- (4-hydroxyphenyl) ethenesulfinic acid was oxidized with an aqueous sodium hypochlorite solution, it was converted to trans-2- (4-hydroxyphenyl) ethenesulfonic acid. The proton nuclear magnetic resonance absorption spectrum of trans-2- (4-hydroxyphenyl) ethenesulfonic acid is shown in FIG.
In the infrared absorption spectrum of trans-2- (4-hydroxyphenyl) ethenesulfonic acid, strong absorption based on sulfonic acid was observed at 1041, 1174, and 1211 cm −1 .
Sulfinic acid and sulfonic acid have two olefinic protons (G2 and G3) and four aromatic ring protons (G1). In the spectra of FIGS. 5a and 5b, the aromatic ring proton (G1) is Since the doublets having a coupling constant of 8.3 Hz are paired sufficiently apart from each other, absorption based on para-substituted benzene is recognized, and in the sulfinic acid (spectrum a), the coupling constant of the olefin proton (G3) is changed from 16.1 Hz to trans ( trans)), a 1,2-disubstituted olefin compound having a configuration of (trans). Two binding constants of 15.6 Hz in spectrum b represent the two olefinic protons (G3) of the sulfonic acid.
[0019]
Example 3
To a heterogeneous solution of 25 mg of poly (4-hydroxystyrene sulfone) obtained in Example 1 and 0.56 mL of heavy water, 10 μL of a sodium bicarbonate aqueous solution having a concentration of 24 w / v% was added. As a result, polysulfone having a monomer unit of 0.64 in terms of molar ratio with respect to the added amount of sodium bicarbonate was decomposed. The molar ratio of produced trans-2- (4-hydroxyphenyl) ethenesulfinic acid and 4-hydroxystyrene was 0.78: 1.
[0020]
Example 4
In the same manner as in Example 3, 10 μL of 26 wt / v% aqueous ammonium bicarbonate was added to the heterogeneous solution of 25 mg of poly (4-hydroxystyrene sulfone) obtained in Example 1 and 0.56 mL of heavy water. As a result, polysulfone having a monomer unit of 0.51 in terms of molar ratio with respect to the amount of ammonium bicarbonate was decomposed. The molar ratio of produced trans-2- (4-hydroxyphenyl) ethenesulfinic acid and 4-hydroxystyrene was 0.77: 1.
[0021]
【The invention's effect】
As described above, according to the present invention, polysulfone that can be decomposed by alkali can be obtained. Since the polysulfone of the present invention has a chemical structure having a sulfonyl group in the main chain and a phenolic hydroxyl group in the side chain, it is easily decomposed by the presence of a base. This easy degradability is obtained by a copolymer structure of a styrene derivative having a phenolic hydroxyl group and sulfur dioxide. Therefore, by interposing the polymer structure in an arbitrary number in an arbitrary position in the polymer molecule, the desired structure can be obtained. It is possible to obtain an easily decomposable polymer compound that can be decomposed with a low molecular weight compound and can reduce the burden on the global environment. Further, by allowing a photobase generator such as o-nitrobenzyl carbamate to coexist with the polysulfone, it is possible to apply to a photoresist in which the polysulfone is decomposed by light irradiation to form a pattern. In addition, since this polysulfone has the polar structure of a sulfonyl group and a phenolic hydroxyl group, it is excellent in adhesiveness, solubility, etc.
[0022]
Furthermore, according to the present invention, a novel compound trans-2- (4-hydroxyphenyl) ethenesulfinic acid can be obtained. This compound is a sulfinic acid having a phenolic hydroxyl group and is excellent in water solubility, so that it can be used as an acid, and can also be used as a synthetic material for various industrial chemicals, pharmaceuticals, agricultural chemicals and the like. More specifically, it is useful as a photographic chemical, a plating chemical or the like.
[Brief description of the drawings]
FIG. 1 is a proton nuclear magnetic resonance absorption spectrum of poly (4-hydroxystyrene sulfone).
FIG. 2 is a carbon-13 nuclear magnetic resonance absorption spectrum of poly (4-hydroxystyrene sulfone).
FIG. 3 is a graph showing the concentration dependence of an aqueous alkali solution on the decomposition product.
FIG. 4 is a proton nuclear magnetic resonance absorption spectrum of 4-hydroxystyrene.
FIG. 5 is a proton nuclear magnetic resonance absorption spectrum, in which a is trans-2- (4-hydroxyphenyl) ethenesulfinic acid, and b is trans-2- (4-hydroxy) which is an oxide of sodium hypochlorite aqueous solution. It is a proton nuclear magnetic resonance absorption spectrum of (phenyl) ethenesulfonic acid.
Claims (6)
で表されるフェノール性水酸基を有するスチレン誘導体と二酸化硫黄との共重合体構造を分子中に含有する化合物である請求項1記載の高分子化合物の分解方法。 The polymer compound has the following formula (I):
The method for decomposing a polymer compound according to claim 1, which is a compound containing in its molecule a copolymer structure of a styrene derivative having a phenolic hydroxyl group represented by formula ( II) and sulfur dioxide .
で表されるフェノール性水酸基を有するスチレン誘導体と二酸化硫黄との1:1交互共重合体であるポリスルホンからなるアルカリ分解性高分子化合物。 Formula (Ia):
An alkali-decomposable polymer compound comprising polysulfone, which is a 1: 1 alternating copolymer of a styrene derivative having a phenolic hydroxyl group and sulfur dioxide represented by :
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000382827A JP3660941B2 (en) | 2000-12-15 | 2000-12-15 | Degradable polymer compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000382827A JP3660941B2 (en) | 2000-12-15 | 2000-12-15 | Degradable polymer compound |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002179793A JP2002179793A (en) | 2002-06-26 |
| JP3660941B2 true JP3660941B2 (en) | 2005-06-15 |
Family
ID=18850577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000382827A Expired - Fee Related JP3660941B2 (en) | 2000-12-15 | 2000-12-15 | Degradable polymer compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3660941B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7550249B2 (en) | 2006-03-10 | 2009-06-23 | Az Electronic Materials Usa Corp. | Base soluble polymers for photoresist compositions |
| US7704670B2 (en) | 2006-06-22 | 2010-04-27 | Az Electronic Materials Usa Corp. | High silicon-content thin film thermosets |
| US7759046B2 (en) | 2006-12-20 | 2010-07-20 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
| KR101523393B1 (en) | 2007-02-27 | 2015-05-27 | 이엠디 퍼포먼스 머티리얼스 코프. | An antireflective coating composition comprising silicon as a main component |
| JP6048303B2 (en) * | 2013-04-25 | 2016-12-21 | 株式会社デンソー | Method for manufacturing organic semiconductor device |
| WO2024166919A1 (en) * | 2023-02-07 | 2024-08-15 | 国立研究開発法人産業技術総合研究所 | Method for decomposing compound |
-
2000
- 2000-12-15 JP JP2000382827A patent/JP3660941B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002179793A (en) | 2002-06-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Kaitz et al. | Depolymerizable polymers: preparation, applications, and future outlook | |
| Wang et al. | Polyphthalaldehyde: synthesis, derivatives, and applications | |
| ES2151558T3 (en) | MODIFICATION OF POLYMERS. | |
| JP3660941B2 (en) | Degradable polymer compound | |
| Yagci | Photoinitiated cationic polymerization of unconventional monomers | |
| CN1153775A (en) | Novel N-vinyllactam derivatives and polymers thereof | |
| Kubota et al. | Positive Photoreactive Polyimides. II. Preparation and Characterization of Polyimide Precursors Containing α-(2-Nitrophenyl) ethyl Ester Side Chains | |
| SE8106138L (en) | PROCEDURE FOR MANUFACTURING A THERAPEUTIC PRODUCT | |
| KR100201375B1 (en) | Process for preparing low optical density polymers and copolymers for photoresist and optical applications | |
| JP4756501B2 (en) | Method for producing photodegradable polymer compound | |
| Sawada et al. | Synthesis and surfactant properties of novel acrylic acid oligomers containing perfluoro-oxa-alkylene units: an approach to anti-human immunodeficiency virus type-1 agents | |
| KR102923428B1 (en) | Method for producing a dethiocarbonylthio-oxidized polymer | |
| Park et al. | A Novel Photoresist Based on Polymeric Acid Amplifiers. | |
| Hayakawa et al. | Switching surface polarity: synthesis and characterization of a fluorinated block copolymer with surface‐active tert‐butoxycarbonyl groups | |
| Guo et al. | Synthesis of linear and cyclic discrete oligomers with defined sequences via efficient anionic coupling reaction | |
| BR0015848A (en) | Process for the preparation of water-soluble polymers from esters of carboxylic acids and ethylene unsaturated polyalkylene glycols by azeotropic esterification | |
| ATE313574T1 (en) | ALKENYLPHENOL COPOLYMER AND METHOD FOR THE PRODUCTION THEREOF | |
| JPH05506682A (en) | Direct acid addition method to polymers | |
| MX3283E (en) | IMPROVED PROCEDURE FOR OBTAINING POLY MIXTURES OF HIGH IMPACT POLY STYRENE | |
| Iván et al. | Cyclopentadienylation of PVC | |
| Crawshaw et al. | The Synthesis and Cyclopolymerization of the N, N-Diallyl-and N, N-Dimethallyl-Derivatives of Methanesulfonamide and Ethanesulfonamide | |
| Park et al. | Synthesis of a Novel Polymer with Acid Amplifier Unit in the Side Chain and Application for Photoresist Materials | |
| JP2000344814A (en) | Cationic polymerization process and catalyst used therefor | |
| JPS6357644A (en) | Production of dimethylsiloxane block copolymer | |
| JP2707687B2 (en) | Polysilane block copolymer compound |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20040511 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040707 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20041102 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20041129 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
| R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
| R370 | Written measure of declining of transfer procedure |
Free format text: JAPANESE INTERMEDIATE CODE: R370 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090401 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100401 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100401 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110401 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110401 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120401 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120401 Year of fee payment: 7 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120401 Year of fee payment: 7 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130401 Year of fee payment: 8 |
|
| LAPS | Cancellation because of no payment of annual fees |