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JP3673981B2 - X-ray diffraction quantitative device - Google Patents
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JP3673981B2 - X-ray diffraction quantitative device - Google Patents

X-ray diffraction quantitative device Download PDF

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Publication number
JP3673981B2
JP3673981B2 JP03272597A JP3272597A JP3673981B2 JP 3673981 B2 JP3673981 B2 JP 3673981B2 JP 03272597 A JP03272597 A JP 03272597A JP 3272597 A JP3272597 A JP 3272597A JP 3673981 B2 JP3673981 B2 JP 3673981B2
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sample
ray
plate
ray diffraction
standard plate
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JPH10221275A (en
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明秀 土性
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Rigaku Corp
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Rigaku Corp
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Description

【0001】
【発明の属する技術分野】
本発明は、試料の後方に配置される基底標準板の回折X線強度の変化に基づいて補正を加えて、その試料に含まれる特定物質の重量を求めるX線回折定量装置に関する。
【0002】
【従来の技術】
特定物質及びそれ以外の不特定物質を含む試料に関して、その試料全体に対するその特定物質の重量や含有率を知りたい場合がある。例えば、多種類の粉塵が存在する作業現場において、それらの粉塵の中に有害物質が含まれる場合には、その有害物質の含有量を知ってそれを一定量以下に抑えなければならない。
【0003】
特定物質に関して回折X線強度を測定することにより、その特定物質の重量を検知できることは、従来より知られている。よって、原則的には、試料中に特定物質が含まれているとき、その試料の全体にX線を照射して、その特定物質からの回折X線の強度を測定すれば、その試料中に含まれる特定物質の重量を知ることができると考えられる。
【0004】
しかしながら、実際には、試料は特定物質以外に不特定物質を含み、そして特定物質の含有量が変化すればそれに対応して不特定物質が含まれる量も変化するので、試料の全体にX線を照射してその内部の特定物質からの回折X線の強度を測定するとき、測定される回折X線強度は試料のX線吸収率の影響を受けて特定物質の重量を正確には反映しない。従って、このままでは、試料中に含まれる特定物質の定量を正確に行うことはできない。
【0005】
そのような問題点に鑑み、試料によるX線の吸収の影響を補正して、特定物質の含有量の多少にかかわらず、X線回折測定に基づいて特定物質の含有量を正確に測定できるX線回折定量法として、基底標準吸収補正法を用いたX線回折定量法が従来より知られている。この基底標準吸収補正法は、簡単に説明すれば、入射X線の進行方向に関して試料の後ろ側に配置した基底標準板の回折X線強度の変化量、すなわち、試料の吸収係数の変化量に基づいて、試料中の特定物質からの回折X線強度を補正して、その補正後の回折X線強度に基づいて特定物質の重量を判定するというものである。
【0006】
この基底標準吸収補正法に基づくX線回折定量法では、試料によるX線吸収率を実測する必要があり、その実測にあたっては、試料が付着していないフィルタを基底標準板に接着した状態での基底標準板の回折X線強度と、試料が付着したフィルタを基底標準板に接着した状態での基底標準板の回折X線強度との両方を測定する必要がある。従来、これらの測定を行う場合には、例えば図7に示すように、試料が付着したフィルタ51又は試料が付着していないフィルタ52を透明テープ53等によって基底標準板54に貼着する。そして、試料付きフィルタ51及び試料なしフィルタ52のそれぞれについてX線R1を照射して、そのときに発生する回折X線R2をX線カウンタ56によって検出する。
【0007】
【発明が解決しようとする課題】
しかしながら従来のX線回折定量法では、基底標準板54の全体が基底標準物質、例えばZn(亜鉛)によって形成されていた。そのため、入射X線の照射領域が符号Aで示すように、フィルタ51,52の試料捕集部よりも広く設定されると、正しいX線吸収率を測定できないという問題があった。その理由は、本来であればフィルタ51,52上の試料が存在する領域だけからの回折X線情報が欲しいにもかかわらず、X線カウンタ56がそのフィルタ51,52から外れた部分の回折X線情報をも取り込んでしまうからである。
【0008】
本発明は、従来のX線回折定量法における上記の問題点に鑑みて成されたものであって、X線回折定量法において入射X線の照射領域に関して厳しい規制を加えなくても信頼性の高い正確な測定を行うことができるようにすることを目的とする。
【0009】
【課題を解決するための手段】
上記の目的を達成するため、本発明に係るX線回折定量装置は、試料の後方に配置される基底標準板の回折X線強度の変化に基づいて補正を加えて、その試料に含まれる特定物質の重量を求めるX線回折定量装置において、前記試料を保持する試料保持体と、その試料保持体よりも面積の小さい基底標準板と、前記試料保持体を支持するための試料板とを有し、前記基底標準板は前記試料板に埋設され、前記試料板は前記基底標準板と異なるX線回折特性を有することを特徴とする。
【0010】
このX線回折定量装置によれば、基底標準板は入射X線に対して常に試料保持体の下に隠れることになるので、入射X線の照射幅の如何にかかわらず常に正確なX線吸収率を測定でき、従って、試料に含まれる特定物質に関して信頼性の高い重量測定を行うことができる。
【0011】
通常のX線回折装置では、試料をゴニオメータに装着し、そのゴニオメータの測角機能に基づいて試料に対する入射X線の入射角度を測角する。このX線回折装置では、ゴニオメータに備え付けの試料板によって試料保持体を支持することによって試料をゴニオメータに装着するのが一般的である。このような試料板を用いる場合には、その試料板を基底標準板と異なるX線回折特性を有する材料によって形成すると共に、基底標準板をその試料板に埋設することができる。なお、基底標準板を、例えば、Znによって形成するならば、それを取り囲む試料板は、例えば、Al(アルミニウム)によって形成できる。
【0012】
【発明の実施の形態】
図1は、本発明に係るX線回折定量装置の一実施形態を示している。このX線回折定量装置は、例えば、大気中に含まれる粉塵中に存在する特定の有害物質の含有量を測定するために用いられるものとする。このX線回折定量装置は、X線を発生するX線焦点Fと、ゴニオメータ1と、そしてX線カウンタ2とを有する。X線焦点Fは、例えば、電子を放出するフィラメントと、放出した電子が衝突したときにX線を発生するターゲットとを含んで構成される。また、X線焦点Fの近傍には、X線の発散角度を規制する発散規制スリット3が配設される。また、X線カウンタ2は、例えば、シンチレーションカウンタ(SC:Scintillation Counter)を用いて構成できる。
【0013】
ゴニオメータ1はθ回転台4及びそれと同軸な2θ回転台6を有し、その2θ回転台6から延びる検出器アーム7に上記X線カウンタ2が固定される。ゴニオメータ1の内部には、θ回転台4を試料軸線Xs を中心として回転、いわゆるθ回転させるθ回転駆動機構(図示せず)及び2θ回転台6を試料軸線Xs を中心として回転、いわゆる2θ回転させる2θ回転駆動機構(図示せず)が配設される。2θ回転はθ回転に比べて、回転方向が同じで角速度が2倍に設定される。
【0014】
θ回転台4には板バネ8、あるいは、その他の保持機構が設けられる。本実施形態の場合は、長方形状の試料板9が板バネ8に挿入され、そしてその板バネ8のバネ力によってその試料板9が所定位置に固定保持される。試料板9のうちX線焦点FからのX線が照射される部分には、基底標準板11が円形状に埋設される。この基底標準板11及び試料板9に関しては、図3に示すように、それらの表面が一様な平面になるように設定される。本実施形態の場合、基底標準板11はZnによって形成され、試料板9はその基底標準板11と異なる固有のX線回折角度を有する材料、例えば、Alによって形成される。
【0015】
試料板9に埋設された基底標準板11の上には、図2に示すように、測定対象である大気中の粉塵を保持させた試料保持用フィルタ12、すなわち試料保持体、が貼着されて透明テープその他の固定手段によって固定される。この試料保持用フィルタ12は、例えば、ガラスファイバによって形成される。本実施形態では、試料保持用フィルタ12が円形状に形成され、そして基底標準板11の面積が試料保持用フィルタ12の粉塵捕集部13の面積よりも小さくなるように設定されている。つまり、フィルタ12上の粉塵は基底標準板11を完全に覆った状態でその基底標準板11の上に装着される。
【0016】
以下、本実施形態の装置を用いて行われるX線回折定量測定について、図4に示す工程図を用いて説明する。まず、試料保持用フィルタ12の単体の重量Wf を測定する(ステップS1)。次いで、この試料保持用フィルタ12を基底標準板11に装着し、その状態で基底標準板11の回折X線強度Izn0 を測定する(ステップS2)。このとき、基底標準板11に対するX線の入射角度θznは、図1のゴニオメータ1によって、その基底標準板11の材料であるZnに固有のX線回折角度(2θ)の半分の値に測角される。
【0017】
次に、一旦、試料保持用フィルタ12を基底標準板11から取り外し、測定の対象となる大気をそのフィルタ12へ向けて吸引等することにより、そのフィルタ12に粉塵Gを付着させる(ステップS3)。その後、粉塵Gが付着したフィルタ12の重量Wm を測定する(ステップS4)。さらにその後、粉塵Gが付着したフィルタ12を再度、基底標準板11に装着し、この状態で、粉塵Gの中に含まれる特定物質の回折X線強度Im を測定する(ステップS5)。このときも、図1において、その特定物質に固有のX線入射角度をゴニオメータ1によって正確に測角する。
【0018】
その後、X線入射角度を基底標準板11に固有の回折角度に変更して測定を行い、粉塵Gを付着した状態の基底標準板11の回折X線強度Iznを測定する(ステップS6)。その後、ステップS7において、上記各種の実測値に基づいて以下のような演算を行う。すなわち、
It=K・Im
の式に基づいて、吸収補正後の特定物質の回折X線強度It を求める。
なお、
Im :実測された特定物質の回折X線強度
K :補正係数
である。
【0019】
また、補正係数Kは次式
K=−R・ln(ΔRi)/{1−(ΔRi)R
によって求められる。
但し、
R=sinθzn/sinθm
θzn:基底標準板11のX線回折角度
θm :特定物質のX線回折角度
ΔRi(試料である粉塵によるX線透過率の実測値)=Izn/Izn0
である。
【0020】
以上により吸収補正後の特定対象物の回折X線強度It が求まると、例えば図5に示すような検量線Lを用いて、その特定物質の含有量mが求まる。なお、この検量線Lは、予め、複数の異なる既知量の特定物質を準備して、それらに図4に示した処理を繰り返して実行することによって得られたデータに基づいて作成したものである。
【0021】
以上により、特定物質の含有量mが求まると、その特定物質の含有率Q(%)を次式
Q=(m/W)×100
によって求める。但し、
W(採取粉塵量)=Wm −Wf
である。
【0022】
本実施形態では、図6に示すように、基底標準板11の面積を試料保持用フィルタ12の粉塵捕集部13の面積よりも小さくしたので、基底標準板11は完全に粉塵の下に隠れる。従って、X線の照射領域Aが広くてフィルタ12の外側に張り出す場合でも、その張出し部分には基底標準板11は存在せず、よって、不要な回折X線が発生することを防止できる。その結果、粉塵のX線透過率ΔRi をX線の照射幅の如何にかかわらず、常に、正確に測定でき、よって、信頼性の高い定量結果を得ることができる。
【0023】
以上、好ましい実施形態を挙げて本発明を説明したが、本発明はその実施形態に限定されるものではなく、請求の範囲に記載した発明の範囲内で種々に改変できる。
例えば、本発明のX線回折定量装置を用いて定量できるのは、粉塵中の特定有害物質に限定されるものではなく、あらゆる種類の物質の定量作業に適用できる。また、粉塵等といった試料を保持するための試料保持体は、図2に示したフィルタ12のような形状及び材質に限定されず、測定現場に対応した任意の形状及び材質とすることができる。また、基底標準板及びそれを取り囲む試料板は、回折角が異なりさえすれば、それぞれ、任意の材料を用いて形成できる。
【0024】
【発明の効果】
本発明に係るX線回折定量装置によれば、基底標準板は入射X線に対して常に試料保持体の下に隠れることになるので、入射X線の照射幅の如何にかかわらず常に正確なX線吸収を測定でき、従って、試料に含まれる特定物質に関して信頼性の高い重量測定を行うことができる。
【0025】
また、本発明に係るX線回折定量装置によれば、通常広く使用されている試料板に対して本発明を適用できる。
【0026】
本発明に係るX線回折定量装置において、試料板をアルミニウムで形成し、基底標準板を亜鉛で形成すれば、基底標準板及び試料板として特殊な材料を用いることなく、良好な定量結果を得ることができる。
【0027】
【図面の簡単な説明】
【図1】本発明に係るX線回折定量装置の一実施形態の要部を示す斜視図である。
【図2】試料保持体、基底標準板及び試料板のそれぞれの一実施形態を示す斜視図である。
【図3】図2に示す構造の断面図である。
【図4】図1に示す装置を用いて行われるX線回折定量測定の工程手順を示す工程図である。
【図5】図4の測定において使用する検量線の一例を示すグラフである。
【図6】試料保持体、基底標準板及びX線照射領域の相対的な位置関係を示す平面図である。
【図7】従来のX線回折定量装置の一例を模式的に示す平面図である。
【符号の説明】
1 ゴニオメータ
2 X線カウンタ
3 発散規制スリット
4 θ回転台
6 2θ回転台
7 検出器アーム
8 板バネ
9 試料板
11 基底標準板
12 試料保持用フィルタ(試料保持体)
13 フィルタの粉塵捕集部
A X線照射領域
F X線焦点
G 粉塵(試料)
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an X-ray diffraction quantification apparatus that performs correction based on a change in diffraction X-ray intensity of a basal standard plate arranged behind a sample and obtains the weight of a specific substance contained in the sample.
[0002]
[Prior art]
For a sample containing a specified substance and other unspecified substances, there are cases where it is desired to know the weight and content of the specified substance with respect to the entire sample. For example, in a work site where there are many types of dust, if a harmful substance is included in the dust, the content of the harmful substance must be known and suppressed to a certain level or less.
[0003]
It has been conventionally known that the weight of a specific substance can be detected by measuring the diffracted X-ray intensity of the specific substance. Therefore, in principle, when a specific substance is contained in a sample, if the entire sample is irradiated with X-rays and the intensity of diffracted X-rays from the specific substance is measured, It is thought that the weight of the specific substance contained can be known.
[0004]
However, in practice, the sample contains non-specific substances in addition to the specific substance, and if the content of the specific substance changes, the amount of the non-specific substance correspondingly changes accordingly. When measuring the intensity of diffracted X-rays from a specific substance inside it, the measured diffracted X-ray intensity is affected by the X-ray absorption rate of the sample and does not accurately reflect the weight of the specific substance. . Accordingly, the specific substance contained in the sample cannot be accurately quantified as it is.
[0005]
In view of such problems, the effect of X-ray absorption by the sample is corrected, and the content of the specific substance can be accurately measured based on the X-ray diffraction measurement regardless of the content of the specific substance. As an X-ray diffraction determination method, an X-ray diffraction determination method using a basal standard absorption correction method is conventionally known. This basic standard absorption correction method can be simply described as the amount of change in the diffracted X-ray intensity of the base standard plate placed behind the sample with respect to the traveling direction of the incident X-ray, that is, the amount of change in the absorption coefficient of the sample. Based on this, the diffraction X-ray intensity from the specific substance in the sample is corrected, and the weight of the specific substance is determined based on the corrected diffraction X-ray intensity.
[0006]
In the X-ray diffraction quantification method based on this basal standard absorption correction method, it is necessary to actually measure the X-ray absorption rate of the sample. In the actual measurement, a filter with no sample attached is adhered to the basal standard plate. It is necessary to measure both the diffracted X-ray intensity of the base standard plate and the diffracted X-ray intensity of the base standard plate in a state where the filter to which the sample is adhered is adhered to the base standard plate. Conventionally, when performing these measurements, for example, as shown in FIG. 7, a filter 51 with a sample attached thereto or a filter 52 without a sample attached thereto is attached to a base standard plate 54 with a transparent tape 53 or the like. Then, the X-ray R1 is applied to each of the filter 51 with sample and the filter 52 without sample, and the diffracted X-ray R2 generated at that time is detected by the X-ray counter 56.
[0007]
[Problems to be solved by the invention]
However, in the conventional X-ray diffraction quantitative method, the entire basal standard plate 54 is formed of a basal standard substance, for example, Zn (zinc). Therefore, when the irradiation region of incident X-rays is set wider than the sample collection part of the filters 51 and 52 as indicated by the symbol A, there is a problem that a correct X-ray absorption rate cannot be measured. The reason for this is that although the X-ray counter 56 deviates from the filters 51 and 52, the diffraction X-ray information from only the region where the sample on the filters 51 and 52 is originally desired is desired. This is because the line information is also taken in.
[0008]
The present invention has been made in view of the above-mentioned problems in the conventional X-ray diffraction quantification method, and is reliable even without applying strict regulations on the irradiation region of incident X-rays in the X-ray diffraction quantification method. The purpose is to enable highly accurate measurement.
[0009]
[Means for Solving the Problems]
In order to achieve the above object, the X-ray diffraction quantification apparatus according to the present invention adds a correction based on a change in the diffracted X-ray intensity of a basal standard plate arranged behind the sample, and specifies the specific contained in the sample. Yes in X-ray diffraction apparatus for determining for determining the weight of material, a sample holder for holding the sample, and a small base standard plate area than the sample holder and a sample plate for supporting the sample holder The base standard plate is embedded in the sample plate, and the sample plate has X-ray diffraction characteristics different from the base standard plate .
[0010]
According to this X-ray diffraction quantification apparatus, the basal standard plate is always hidden under the sample holder with respect to the incident X-ray, so that the X-ray absorption is always accurate regardless of the irradiation width of the incident X-ray. The rate can be measured, and therefore, a reliable weight measurement can be performed on the specific substance contained in the sample.
[0011]
In a normal X-ray diffractometer, a sample is mounted on a goniometer, and the incident angle of incident X-rays with respect to the sample is measured based on the angle measuring function of the goniometer. In this X-ray diffractometer, a sample is generally mounted on the goniometer by supporting a sample holder with a sample plate provided in the goniometer. When such a sample plate is used, the sample plate can be formed of a material having X-ray diffraction characteristics different from that of the base standard plate, and the base standard plate can be embedded in the sample plate. If the base standard plate is made of, for example, Zn, the sample plate surrounding it can be made of, for example, Al (aluminum).
[0012]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 shows an embodiment of an X-ray diffraction quantitative apparatus according to the present invention. This X-ray diffraction quantification apparatus is used, for example, for measuring the content of specific harmful substances present in dust contained in the atmosphere. This X-ray diffraction quantitative apparatus has an X-ray focal point F that generates X-rays, a goniometer 1, and an X-ray counter 2. The X-ray focal point F includes, for example, a filament that emits electrons and a target that generates X-rays when the emitted electrons collide. Further, in the vicinity of the X-ray focal point F, a divergence regulation slit 3 for regulating the divergence angle of the X-ray is provided. The X-ray counter 2 can be configured using, for example, a scintillation counter (SC).
[0013]
The goniometer 1 has a θ rotation table 4 and a 2θ rotation table 6 coaxial with the θ rotation table 4, and the X-ray counter 2 is fixed to a detector arm 7 extending from the 2θ rotation table 6. Inside the goniometer 1, a θ rotation drive mechanism (not shown) for rotating the θ rotation table 4 around the sample axis Xs, so-called θ rotation, and the 2θ rotation table 6 about the sample axis Xs, so-called 2θ rotation A 2θ rotation drive mechanism (not shown) is provided. The 2θ rotation has the same rotation direction and the angular velocity is set to twice that of the θ rotation.
[0014]
The θ turntable 4 is provided with a leaf spring 8 or other holding mechanism. In the case of this embodiment, a rectangular sample plate 9 is inserted into the plate spring 8, and the sample plate 9 is fixed and held at a predetermined position by the spring force of the plate spring 8. A base standard plate 11 is embedded in a circular shape in a portion of the sample plate 9 irradiated with X-rays from the X-ray focal point F. As shown in FIG. 3, the base standard plate 11 and the sample plate 9 are set so that their surfaces are a uniform plane. In this embodiment, the base standard plate 11 is made of Zn, and the sample plate 9 is made of a material having a unique X-ray diffraction angle different from that of the base standard plate 11, for example, Al.
[0015]
On the base standard plate 11 embedded in the sample plate 9, as shown in FIG. 2, a sample holding filter 12, that is, a sample holding body holding dust in the air as a measurement target is attached. It is fixed by transparent tape or other fixing means. The sample holding filter 12 is formed of, for example, a glass fiber. In the present embodiment, the sample holding filter 12 is formed in a circular shape, and the area of the base standard plate 11 is set to be smaller than the area of the dust collecting portion 13 of the sample holding filter 12. That is, the dust on the filter 12 is mounted on the base standard plate 11 with the base standard plate 11 completely covered.
[0016]
Hereinafter, the X-ray diffraction quantitative measurement performed using the apparatus of the present embodiment will be described with reference to the process chart shown in FIG. First, the weight Wf of the single sample holding filter 12 is measured (step S1). Next, the sample holding filter 12 is attached to the base standard plate 11, and the diffracted X-ray intensity Izn0 of the base standard plate 11 is measured in this state (step S2). At this time, the incident angle θzn of the X-ray with respect to the base standard plate 11 is measured by the goniometer 1 in FIG. 1 to a value half the X-ray diffraction angle (2θ) specific to Zn which is the material of the base standard plate 11. Is done.
[0017]
Next, the sample holding filter 12 is once removed from the base standard plate 11, and the air to be measured is sucked toward the filter 12 to attach dust G to the filter 12 (step S3). . Thereafter, the weight Wm of the filter 12 to which the dust G is adhered is measured (step S4). Thereafter, the filter 12 to which the dust G is attached is again attached to the base standard plate 11, and in this state, the diffraction X-ray intensity Im of the specific substance contained in the dust G is measured (step S5). Also at this time, in FIG. 1, the X-ray incident angle specific to the specific substance is accurately measured by the goniometer 1.
[0018]
Thereafter, the X-ray incident angle is changed to a diffraction angle unique to the base standard plate 11 and measurement is performed, and the diffraction X-ray intensity Izn of the base standard plate 11 with the dust G attached is measured (step S6). Thereafter, in step S7, the following calculation is performed based on the above various measured values. That is,
It = K ・ Im
Based on the above formula, the diffraction X-ray intensity It of the specific substance after absorption correction is obtained.
In addition,
Im: diffracted X-ray intensity K of the specific substance actually measured K: correction coefficient.
[0019]
Further, the correction coefficient K is given by the following equation: K = −R · ln (ΔRi) / {1− (ΔRi) R }
Sought by.
However,
R = sin θzn / sin θm
θzn: X-ray diffraction angle θm of the base standard plate 11: X-ray diffraction angle ΔRi of the specific substance (actual measurement value of X-ray transmittance by dust as sample) = Izn / Izn0
It is.
[0020]
When the diffraction X-ray intensity It of the specific object after absorption correction is obtained as described above, the content m of the specific substance is obtained using a calibration curve L as shown in FIG. 5, for example. The calibration curve L is prepared based on data obtained by preparing a plurality of different known amounts of specific substances in advance and repeatedly executing the processing shown in FIG. .
[0021]
As described above, when the content m of the specific substance is obtained, the content Q (%) of the specific substance is expressed by the following formula Q = (m / W) × 100
Ask for. However,
W (amount of collected dust) = Wm -Wf
It is.
[0022]
In the present embodiment, as shown in FIG. 6, since the area of the base standard plate 11 is made smaller than the area of the dust collecting part 13 of the sample holding filter 12, the base standard plate 11 is completely hidden under the dust. . Accordingly, even when the X-ray irradiation area A is wide and projects outside the filter 12, the base standard plate 11 does not exist in the projecting portion, and therefore it is possible to prevent unnecessary diffraction X-rays from being generated. As a result, the X-ray transmittance ΔRi of the dust can always be accurately measured regardless of the X-ray irradiation width, and a highly reliable quantitative result can be obtained.
[0023]
The present invention has been described with reference to the preferred embodiments. However, the present invention is not limited to the embodiments, and various modifications can be made within the scope of the invention described in the claims.
For example, what can be quantified using the X-ray diffraction quantification apparatus of the present invention is not limited to specific harmful substances in dust, but can be applied to quantification work of all kinds of substances. Further, the sample holder for holding a sample such as dust is not limited to the shape and material of the filter 12 shown in FIG. 2, and can be any shape and material corresponding to the measurement site. In addition, the base standard plate and the sample plate surrounding the base standard plate can be formed using any material as long as the diffraction angles are different.
[0024]
【The invention's effect】
According to the X-ray diffraction quantification apparatus of the present invention , the basal standard plate is always hidden under the sample holder with respect to the incident X-ray, so that it is always accurate regardless of the irradiation width of the incident X-ray. X-ray absorption can be measured, and therefore, a reliable weight measurement can be performed on a specific substance contained in a sample.
[0025]
Moreover, according to the X-ray diffraction quantification apparatus according to the present invention, the present invention can be applied to a sample plate that is ordinarily widely used.
[0026]
In the X-ray diffraction quantitative apparatus according to the present invention , if the sample plate is made of aluminum and the base standard plate is made of zinc , good quantitative results can be obtained without using special materials as the base standard plate and the sample plate. be able to.
[0027]
[Brief description of the drawings]
FIG. 1 is a perspective view showing a main part of an embodiment of an X-ray diffraction quantitative apparatus according to the present invention.
FIG. 2 is a perspective view showing an embodiment of each of a sample holder, a base standard plate, and a sample plate.
3 is a cross-sectional view of the structure shown in FIG.
FIG. 4 is a process diagram showing a process procedure of X-ray diffraction quantitative measurement performed using the apparatus shown in FIG. 1;
5 is a graph showing an example of a calibration curve used in the measurement of FIG.
FIG. 6 is a plan view showing a relative positional relationship between a sample holder, a base standard plate, and an X-ray irradiation region.
FIG. 7 is a plan view schematically showing an example of a conventional X-ray diffraction quantitative apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Goniometer 2 X-ray counter 3 Divergence control slit 4 (theta) turntable 6 2theta turntable 7 Detector arm 8 Leaf spring 9 Sample plate 11 Base standard plate 12 Sample holding filter (sample holding body)
13 Filter dust collection part A X-ray irradiation area F X-ray focal point G Dust (sample)

Claims (2)

試料の後方に配置される基底標準板の回折X線強度の変化に基づいて補正を加えて、その試料に含まれる特定物質の重量を求めるX線回折定量装置において、
前記試料を保持する試料保持体と、
その試料保持体よりも面積の小さい基底標準板と、
前記試料保持体を支持するための試料板とを有し、
前記基底標準板は前記試料板に埋設され、
前記試料板は前記基底標準板と異なるX線回折特性を有する
ことを特徴とするX線回折定量装置。
In the X-ray diffraction quantification apparatus for correcting the weight based on the change in the diffracted X-ray intensity of the basal standard plate arranged behind the sample and obtaining the weight of the specific substance contained in the sample,
A sample holder for holding the sample,
A basal standard plate having a smaller area than the sample holder,
A sample plate for supporting the sample holder,
The base standard plate is embedded in the sample plate,
The X-ray diffraction quantification apparatus, wherein the sample plate has X-ray diffraction characteristics different from those of the basal standard plate .
請求項1記載のX線回折定量装置において、前記試料板をアルミニウムで形成し、前記基底標準板を亜鉛で形成したことを特徴とするX線回折定量装置。In X-ray diffraction quantification apparatus according to claim 1, the sample plate is made of aluminum, X-ray diffraction apparatus for determining, characterized in that the formation of the base standard plate with zinc.
JP03272597A 1997-01-31 1997-01-31 X-ray diffraction quantitative device Expired - Fee Related JP3673981B2 (en)

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Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
JP03272597A JP3673981B2 (en) 1997-01-31 1997-01-31 X-ray diffraction quantitative device

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JP3673981B2 true JP3673981B2 (en) 2005-07-20

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008014958A (en) * 2005-08-30 2008-01-24 Rigaku Corp X-ray diffraction quantitative device
JP2009150911A (en) * 2005-08-30 2009-07-09 Rigaku Corp X-ray diffraction quantitative device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008014958A (en) * 2005-08-30 2008-01-24 Rigaku Corp X-ray diffraction quantitative device
JP2009150911A (en) * 2005-08-30 2009-07-09 Rigaku Corp X-ray diffraction quantitative device

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Publication number Publication date
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