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JP3677571B2 - Plasma display panel and manufacturing method thereof - Google Patents
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JP3677571B2 - Plasma display panel and manufacturing method thereof - Google Patents

Plasma display panel and manufacturing method thereof Download PDF

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Publication number
JP3677571B2
JP3677571B2 JP32723695A JP32723695A JP3677571B2 JP 3677571 B2 JP3677571 B2 JP 3677571B2 JP 32723695 A JP32723695 A JP 32723695A JP 32723695 A JP32723695 A JP 32723695A JP 3677571 B2 JP3677571 B2 JP 3677571B2
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Japan
Prior art keywords
layer
mgo
crystal layer
display panel
plasma display
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JP32723695A
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JPH09167566A (en
Inventor
総一郎 日高
信博 岩瀬
進二 只木
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Fujitsu Ltd
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Fujitsu Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は、AC型プラズマディスプレイパネル(以下、PDPと略称する)の誘電体層の保護層の改良に関するものである。
【0002】
近年のPDPのカラー化に伴い、AC型PDPがテレビ受像機のフルカラー表示装置として用いられるようになり、特にハイビジョン映像用の大型フラットディスプレイとして注目されている。
【0003】
このような用途に用いるためには、PDPの大型化とともに高精細化、長寿命化が必要である。
以上のような状況から、大型且つ高精細、長寿命のPDPが要望されている。
【0004】
【従来の技術】
従来のPDPについて、図4により詳細に説明する。
図4は従来のPDPの主要部を示す図である。
【0005】
従来のPDPの主要部は図4に示すように、ソーダライムガラスからなる板厚3mmの前面ガラス基板11の表面には隣接して対となる平行な2本の表示用放電電極12の複数対と、この放電電極12を被覆する低融点ガラスからなる膜厚50μm の誘電体層13と、この誘電体層13の表面に保護膜となる膜厚10,000ÅのMgO層15が形成されている。
【0006】
このMgO層15の形成方法としては、一般的には蒸着法が用いられるが、その他の方法として、液体状の有機酸金属塩を用いるスプレー法或いは塗布法や、MgO微粉末を含むペーストを塗布する微粉末塗布法も用いられている。
【0007】
一方、ソーダライムガラスからなる板厚3mmの背面ガラス基板16の表面には、アドレス電極17と放電部を画定する帯状の隔壁(図示せず)とが互いに並行して形成されている。この前面ガラス基板11とは電極形成面を対向させて重ね合わされた後、その周囲が封止され、これら基板の間に形成された放電空間内を排気してから、99.9%のネオン(Ne)と0.1 %のキセノン(Xe)との混合ガスを放電用ガスとして封入している。
【0008】
【発明が解決しようとする課題】
以上説明した従来のAC型PDPにおいては、二次電子放出比γを大きくするように放電開始電圧を低下させることと、寿命を長くするように耐スパッタ性を向上させる必要から保護層が設けられ、この保護層として一般的にはMgO蒸着層が用いられている。蒸着法によりこの保護層を形成すると下地の誘電体膜が低融点ガラスであるため、まず、膜厚数千Åのアモルファス層が形成され、その後徐々に結晶層が形成される。しかしPDPの使用時間が長くなると、この結晶層がスパッタされて膜厚が薄くなり、スパッタがアモルファス層に到達すると、駆動電圧が急激に上昇して、設定されている駆動電圧よりも高くなり、PDPの寿命になるという問題点があった。
【0009】
蒸着法以外の液体状の有機酸金属塩を用いるスプレー法或いは塗布法においては、一工程では2,000〜3,000Å程度の膜厚の保護層しか形成することができず、また、MgO微粉末を含むペーストを塗布する微粉末塗布法においては、形成された保護層内に空隙が生じるという問題点があった。
【0010】
本発明は以上のような状況から、放電開始電圧を低下させ、耐スパッタ性を向上させることが可能となる誘電体層の保護層を具備するPDP及びその製造方法の提供を目的としたものである。
【0011】
【課題を解決するための手段】
本発明のPDPは、MgO結晶層とMgO蒸着層との積層体からなる保護層を具備するように構成する。
【0012】
本発明においては、蒸着によるMgO層の下層にMgO微粉末もしくは、MgOを含む有機酸金属塩を用いてMgO結晶層を形成するので、誘電体層の表面のMgO結晶層を厚くすることができ、結晶度も向上させることが可能となるので、耐スパッタ性の良好な、長寿命のPDPを供することが可能となる。
【0013】
【発明の実施の形態】
以下図1〜図3により本発明の実施例について詳細に説明する。
図1は本発明のPDPの主要部を示す図、図2は本発明のPDPの製造方法の実施例を工程順に示す図、図3は本発明のPDPの試験時間と放電電圧の変化量との関係を示す図である。
【0014】
本発明のPDPは図1に示すように、ソーダライムガラスからなる板厚3mmの前面ガラス基板1の表面には従来例と同様に放電電極2、低融点ガラスからなる膜厚50μm の誘電体層3が形成されている。
【0015】
この誘電体層3の表面には本発明の特徴に従って、スクリーン印刷法及び加熱焼成により形成した膜厚 2,000ÅのMgO結晶層4と、このMgO結晶層4の表面に蒸着法により形成した膜厚 5,000ÅのMgO蒸着層5とからなる二層構造の保護層が形成されている。
【0016】
一方、ソーダライムガラスからなる板厚3mmの背面ガラス基板6の表面には、アドレス電極7と放電部を画定する帯状の隔壁(図示せず)とが互いに並行して形成されている。この前面ガラス基板1には電極形成面を対向させて重ね合わされた後、その周囲が封止され、これら基板の間に形成された放電空間内を排気してから、99.9%のネオン(Ne)と0.1 %のキセノン(Xe)との混合ガスを放電用ガスとして封入している。
【0017】
このようなPDPの第1〜第5の製造方法を図2により工程順に詳細に説明する。
第1〜第5の製造方法は、MgO結晶層の形成工程は異なるが、他の製造工程は同一であるから、第1の製造方法について詳細に説明する。
【0018】
まず図2(a) に示すように、前面ガラス基板1の表面に放電電極2を形成し、この前面ガラス基板1と放電電極2とを被覆する膜厚50μmの誘電体層3を形成した後、この誘電体層3の表面に結晶化したMgO微粉末をスクリーン印刷法で塗布して乾燥した後、 500℃で焼成して膜厚 2,000ÅのMgO結晶層4を形成する。
【0019】
次に図2(b) に示すように、蒸着法によりこのMgO結晶層4の表面に膜厚が 8,000ÅのMgO蒸着層5を形成する。
その後、図1に示すようにアドレス電極7が形成されているソーダライムガラスからなる板厚3mmの背面ガラス基板6の周囲と、この前面ガラス基板1の周囲とを封止し、これらの前面ガラス基板1と背面ガラス基板6との間の放電空間内の空気を排気し、99.9%のネオン(Ne)と0.1 %のキセノン(Xe)との混合ガスを放電用ガスとして封入する。
【0020】
PDPの第2の製造方法においては、第1の製造方法において行う結晶化したMgO微粉末のスクリーン印刷法の代わりに、酢酸マグネシウムやプロピオン酸マグネシウム等の有機酸金属塩のペーストをスクリーン印刷法により塗布して乾燥した後 500℃で焼成して膜厚 2,000ÅのMgO結晶層4を形成する。
【0021】
PDPの第3の製造方法においては、第1の製造方法において行う結晶化したMgO微粉末のスクリーン印刷法の代わりに、酢酸マグネシウムやプロピオン酸マグネシウム等の有機酸金属塩と結晶化したMgO微粉末の混合ペーストをスクリーン印刷法により塗布して乾燥した後 500℃で焼成して膜厚 2,000ÅのMgO結晶層4を形成する。
【0022】
PDPの第4の製造方法においては、第1の製造方法において行う結晶化したMgO微粉末のスクリーン印刷法の代わりに、結晶化したMgO微粉末と低融点ガラスの混合ペーストをスクリーン印刷法により塗布して乾燥した後 500℃で焼成して膜厚 2,000ÅのMgO結晶層4を形成する。
【0023】
PDPの第5の製造方法においては、上記の第1の製造方法においてMgO結晶層4を形成し、蒸着前にイオンガンにて約5分間クリーニングを行っている。
これらの第1〜第5の製造方法により製造したPDPの試験時間と放電電圧の変化量との関係を図3に示す。
【0024】
図3に示すように、従来のPDPの放電電圧の変化量は、試験時間が 1,000時間位までは本発明の各実施例の放電電圧の変化量と殆ど変わらないが、 1,200時間位になると著しく大きくなり、本発明の効果が明白になる。
【0025】
本発明の各実施例を比較すると、実施例3の放電電圧の変化量が最も少なく、次に実施例1にイオンクリーニング工程を追加して行った実施例5の放電電圧の変化量が少なく、ついで実施例4、実施例1、実施例2の順に放電電圧の変化量が多くなっている。
【0026】
なお、本発明は上記の3電極面放電型ACPDPに限らず、2本の電極を有する面放電型或いは対向放電型のACPDPにも適用できるのはいうまでもない。
【0027】
【発明の効果】
以上の説明から明らかなように、本発明によれば誘電体層の表面のMgO結晶層を厚くすることができ、結晶度も向上させることが可能となり、また、耐スパッタ性を向上させることができるので、長寿命のPDPを製造することが可能となる利点があり、著しい経済的及び、信頼性向上の効果が期待できるPDP及びその製造方法の提供が可能である。
【図面の簡単な説明】
【図1】 本発明のPDPの主要部を示す図
【図2】 本発明のPDPの製造方法の実施例を工程順に示す図
【図3】 本発明のPDPの試験時間と放電電圧の変化量との関係を示す図
【図4】 従来のPDPの主要部を示す図
【符号の説明】
1 前面ガラス基板
2 放電電極
3 誘電体層
4 MgO結晶層
5 MgO蒸着層
6 背面ガラス基板
7 アドレス電極
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an improvement in a protective layer of a dielectric layer of an AC type plasma display panel (hereinafter abbreviated as PDP).
[0002]
Accompanying the recent colorization of PDPs, AC type PDPs have come to be used as full-color display devices for television receivers, and are particularly attracting attention as large flat displays for high-definition video.
[0003]
In order to use in such applications, it is necessary to increase the definition and extend the life of the PDP as well as an increase in size.
From the above situation, a large-sized, high-definition, long-life PDP is desired.
[0004]
[Prior art]
A conventional PDP will be described in detail with reference to FIG.
FIG. 4 shows the main part of a conventional PDP.
[0005]
As shown in FIG. 4, the main part of the conventional PDP is a plurality of pairs of two parallel display discharge electrodes 12 adjacent to each other on the surface of a 3 mm thick front glass substrate 11 made of soda lime glass. Then, a dielectric layer 13 made of low melting glass covering the discharge electrode 12 and having a film thickness of 50 μm, and a MgO layer 15 having a thickness of 10,000 μm serving as a protective film are formed on the surface of the dielectric layer 13.
[0006]
As a method for forming the MgO layer 15, a vapor deposition method is generally used, but as other methods, a spray method or a coating method using a liquid organic acid metal salt or a paste containing MgO fine powder is applied. A fine powder coating method is also used.
[0007]
On the other hand, address electrodes 17 and strip-shaped barrier ribs (not shown) for defining discharge portions are formed in parallel with each other on the surface of a rear glass substrate 16 made of soda lime glass and having a thickness of 3 mm. The front glass substrate 11 is overlapped with the electrode formation surface facing each other, and the periphery thereof is sealed, and the discharge space formed between these substrates is evacuated, and then 99.9% neon (Ne) And 0.1% xenon (Xe) mixed gas is enclosed as a discharge gas.
[0008]
[Problems to be solved by the invention]
In the conventional AC type PDP described above, a protective layer is provided because it is necessary to lower the discharge start voltage so as to increase the secondary electron emission ratio γ and to improve the sputtering resistance so as to extend the life. In general, a MgO vapor deposition layer is used as the protective layer. When this protective layer is formed by vapor deposition, the underlying dielectric film is a low-melting glass, so that an amorphous layer having a thickness of several thousand mm is first formed, and then a crystalline layer is gradually formed. However, when the usage time of the PDP becomes long, the crystal layer is sputtered to reduce the film thickness. When the sputter reaches the amorphous layer, the drive voltage rises rapidly and becomes higher than the set drive voltage. There was a problem that the life of the PDP was reached.
[0009]
In the spray method or coating method using a liquid organic acid metal salt other than the vapor deposition method, only a protective layer having a film thickness of about 2,000 to 3,000 mm can be formed in one step, and includes MgO fine powder. In the fine powder coating method in which the paste is applied, there is a problem that voids are generated in the formed protective layer.
[0010]
In view of the above situation, the present invention aims to provide a PDP having a protective layer for a dielectric layer that can lower the discharge start voltage and improve the sputtering resistance, and a method for manufacturing the PDP. is there.
[0011]
[Means for Solving the Problems]
The PDP of the present invention is configured to include a protective layer composed of a laminate of an MgO crystal layer and an MgO vapor deposition layer.
[0012]
In the present invention, the MgO crystal layer is formed using MgO fine powder or an organic acid metal salt containing MgO in the lower layer of the MgO layer by vapor deposition, so that the MgO crystal layer on the surface of the dielectric layer can be thickened. Since the crystallinity can also be improved, it is possible to provide a long-life PDP having good sputtering resistance.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to FIGS.
FIG. 1 is a diagram showing the main part of the PDP of the present invention, FIG. 2 is a diagram showing an embodiment of the PDP manufacturing method of the present invention in the order of steps, and FIG. 3 is a graph showing the test time of the PDP of the present invention It is a figure which shows the relationship.
[0014]
As shown in FIG. 1, the PDP of the present invention has a surface of a front glass substrate 1 made of soda lime glass having a thickness of 3 mm and a dielectric layer having a thickness of 50 μm made of a discharge electrode 2 and a low melting point glass as in the conventional example. 3 is formed.
[0015]
According to the characteristics of the present invention, the surface of this dielectric layer 3 has a thickness of 2,000 mm MgO crystal layer 4 formed by screen printing and heating and firing , and the thickness of this MgO crystal layer 4 formed by vapor deposition. A protective layer having a two-layer structure composed of a 5,000 mm MgO vapor deposition layer 5 is formed.
[0016]
On the other hand, on the surface of a back glass substrate 6 made of soda lime glass and having a thickness of 3 mm, address electrodes 7 and strip-shaped partition walls (not shown) for defining discharge portions are formed in parallel to each other. The front glass substrate 1 is overlapped with the electrode forming surfaces facing each other, and the periphery is sealed. After the discharge space formed between the substrates is exhausted, 99.9% of neon (Ne) And 0.1% xenon (Xe) mixed gas is enclosed as a discharge gas.
[0017]
The first to fifth manufacturing methods of such a PDP will be described in detail in the order of steps with reference to FIG.
Although the first to fifth manufacturing methods are different in the formation process of the MgO crystal layer, the other manufacturing processes are the same, and therefore the first manufacturing method will be described in detail.
[0018]
First, as shown in FIG. 2 (a), the discharge electrode 2 is formed on the surface of the front glass substrate 1, and the dielectric layer 3 having a thickness of 50 μm covering the front glass substrate 1 and the discharge electrode 2 is formed. The MgO fine powder crystallized on the surface of the dielectric layer 3 is applied by screen printing and dried, and then fired at 500 ° C. to form a MgO crystal layer 4 having a thickness of 2,000 mm.
[0019]
Next, as shown in FIG. 2B, an MgO vapor deposition layer 5 having a thickness of 8,000 mm is formed on the surface of the MgO crystal layer 4 by vapor deposition.
Thereafter, as shown in FIG. 1, the periphery of the rear glass substrate 6 having a thickness of 3 mm made of soda lime glass on which the address electrodes 7 are formed and the periphery of the front glass substrate 1 are sealed, and these front glasses are sealed. Air in the discharge space between the substrate 1 and the rear glass substrate 6 is exhausted, and a mixed gas of 99.9% neon (Ne) and 0.1% xenon (Xe) is sealed as a discharge gas.
[0020]
In the second manufacturing method of PDP, instead of the screen printing method of crystallized MgO fine powder performed in the first manufacturing method, a paste of organic acid metal salt such as magnesium acetate or magnesium propionate is applied by screen printing method. After coating and drying, the MgO crystal layer 4 having a film thickness of 2,000 mm is formed by firing at 500 ° C.
[0021]
In the third production method of PDP, instead of the screen printing method of crystallized MgO fine powder performed in the first production method, MgO fine powder crystallized with an organic acid metal salt such as magnesium acetate or magnesium propionate. The mixed paste is applied by screen printing and dried, and then fired at 500 ° C. to form a MgO crystal layer 4 having a thickness of 2,000 mm.
[0022]
In the fourth manufacturing method of PDP, instead of the screen printing method of crystallized MgO fine powder performed in the first manufacturing method, a mixed paste of crystallized MgO fine powder and low melting glass is applied by screen printing method. After drying, firing is performed at 500 ° C. to form a MgO crystal layer 4 having a thickness of 2,000 mm.
[0023]
In the fifth manufacturing method of the PDP, the MgO crystal layer 4 is formed in the first manufacturing method described above, and cleaning is performed with an ion gun for about 5 minutes before vapor deposition.
FIG. 3 shows the relationship between the test time of the PDP manufactured by these first to fifth manufacturing methods and the amount of change in the discharge voltage.
[0024]
As shown in FIG. 3, the amount of change in the discharge voltage of the conventional PDP is almost the same as the amount of change in the discharge voltage of each example of the present invention until the test time is about 1,000 hours, but is remarkably high when it is about 1,200 hours. The effect of the present invention becomes clear.
[0025]
When each example of the present invention is compared, the change amount of the discharge voltage of Example 3 is the smallest, and the change amount of the discharge voltage of Example 5 performed by adding an ion cleaning process to Example 1 is small, Next, the amount of change in the discharge voltage increases in the order of Example 4, Example 1, and Example 2.
[0026]
Needless to say, the present invention is not limited to the above-described three-electrode surface discharge type ACPDP but also a surface discharge type or counter discharge type ACPDP having two electrodes.
[0027]
【The invention's effect】
As is clear from the above description, according to the present invention, the MgO crystal layer on the surface of the dielectric layer can be thickened, the crystallinity can be improved, and the sputtering resistance can be improved. Therefore, there is an advantage that it is possible to manufacture a PDP having a long life, and it is possible to provide a PDP and a method for manufacturing the PDP that can be expected to have a significant economic and reliability improvement effect.
[Brief description of the drawings]
FIG. 1 is a diagram showing a main part of a PDP of the present invention. FIG. 2 is a diagram showing an example of a manufacturing method of the PDP of the present invention in the order of steps. [Fig. 4] A diagram showing the main part of a conventional PDP [Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Front glass substrate 2 Discharge electrode 3 Dielectric layer 4 MgO crystal layer 5 MgO vapor deposition layer 6 Back glass substrate 7 Address electrode

Claims (4)

基板上に形成した放電電極を誘電体層で被覆し、該誘電体層上に保護層を備えたプラズマディスプレイパネルにおいて、
前記保護層が、MgO結晶層とMgO蒸着層の積層構造体からなることを特徴とするプラズマディスプレイパネル。
In a plasma display panel in which a discharge electrode formed on a substrate is covered with a dielectric layer, and a protective layer is provided on the dielectric layer,
The plasma display panel, wherein the protective layer comprises a laminated structure of an MgO crystal layer and an MgO vapor deposition layer.
前記MgO結晶層結晶化したMgO微粉末、マグネシウムの有機酸金属塩、或いはこれら部材の混合ペーストを塗布し、乾燥後、焼成して形成された膜からなることを特徴とする請求項1記載のプラズマディスプレイパネル。2. The MgO crystal layer is formed of a film formed by applying crystallized MgO fine powder, magnesium organic acid metal salt, or a mixed paste of these members , drying and firing. The plasma display panel as described. 請求項2記載のMgO結晶層がさらに低融点ガラスを含むことを特徴とするプラズマディスプレイパネル。3. The plasma display panel according to claim 2, wherein the MgO crystal layer further contains a low melting point glass. 請求項1記載の保護層を形成するに際し、前記誘電体層の表面にMgO結晶層を形成した後、該MgO結晶層の表面をイオンクリーニングしてから当該MgO結晶層表面にMgO蒸着層を形成する工程を含むことを特徴とするプラズマディスプレイパネルの製造方法。2. When forming the protective layer according to claim 1, after forming an MgO crystal layer on the surface of the dielectric layer, ion-cleaning the surface of the MgO crystal layer and then forming an MgO deposited layer on the surface of the MgO crystal layer The manufacturing method of the plasma display panel characterized by including the process to do.
JP32723695A 1995-12-15 1995-12-15 Plasma display panel and manufacturing method thereof Expired - Fee Related JP3677571B2 (en)

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US7348729B2 (en) 2000-08-29 2008-03-25 Matsushita Electric Industrial Co., Ltd. Plasma display panel and production method thereof and plasma display panel display unit
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KR101067578B1 (en) 2002-11-22 2011-09-27 파나소닉 주식회사 Plasma Display Panel And Method Of Manufacturing The Same
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