JP3720593B2 - Stage apparatus, exposure apparatus, and exposure method - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an exposure apparatus for manufacturing a semiconductor element, a liquid crystal display element or the like by transferring a pattern of an original plate such as a reticle or photomask onto a photosensitive substrate such as a wafer. The present invention relates to a stage apparatus suitable for a scanning exposure apparatus. The present invention also relates to an exposure apparatus and a device manufacturing method using the same.
[0002]
[Prior art]
FIG. 8 shows a perspective view of a conventional scanning stage.
[0003]
The stage 103 on which the object is mounted is reciprocally movable in the scanning direction along a guide 102 having a U-shaped cross section fixed on the base 101. A linear motor movable element 107 is provided on both sides of the stage 103, and a linear motor stator 105 corresponding to the linear motor movable element 107 is fixed on the base along the scanning direction. The linear motor E can drive the stage in a non-contact manner along the scanning direction.
[0004]
The linear motor stator 105 includes a long loop-shaped yoke 105a disposed along substantially the entire length of the guide 102 and a long magnet 105b fixed to the inside thereof. The linear motor movable element 107 is a coil around which a copper wire is wound. It arrange | positions so that the yoke 105a and the magnet 105b of the linear motor stator 105 may pass through the coil 107 of a linear motor mover. When a drive current is supplied to the coil 107 from a power source (not shown), a thrust is generated along the magnet 105b, thereby driving the stage.
[0005]
[Problems to be solved by the invention]
With the above configuration, a large thrust is required for the linear motor E1 in order to shorten the time consumed for acceleration and deceleration when the stage 103 is driven. Therefore, the linear motor stator 105 is designed to generate a strong magnetic field, and the yoke 105a is made of a material having a high saturation magnetic flux density such as iron. However, since the magnetic flux of the strong magnetic field is concentrated on both end portions 105c (see FIG. 9) of the yoke 105a in the scanning direction, both end portions 105c of the yoke 105a have an extremely large cross-sectional area in order not to saturate the concentrated magnetic flux. I need. Since the yoke central portion has the same cross-sectional dimensions as both end portions, the weight of the entire yoke is increased. Further, in order to generate a strong magnetic field, the magnet 105b of the linear motor stator 105 needs to be thick, and an expensive rare earth magnet must be used as the material. Therefore, if the thrust of the linear motor is increased, the weight of the linear motor increases and the cost increases.
[0006]
Further, when the stage 103 is driven with a large thrust, the driving reaction force of the linear motor E1 also increases. The reaction force of the linear motor E1 is transmitted from the linear motor stator 105 to the base 101, and vibrates the apparatus. In particular, if the base 101 or the guide 102 serving as a reference for positioning the stage vibrates, it will cause a large disturbance in the positioning servo system of the stage, lowering the positioning accuracy of the stage, and lengthening the time for establishing the positioning of the stage. End up.
[0007]
Further, when the stage 103 is reciprocated along the scanning direction, the stage is accelerated and decelerated each time the stage 103 is reciprocated, and a drive current is supplied to the coil 107 each time, so that a large amount of energy is repeated. I need. Further, when an electric current is passed through the coil 107, heat is generated, and this heat causes thermal deformation of the stage mounting object and the stage apparatus constituent member. Furthermore, the surrounding air fluctuates due to the heat generated by the coil, the temperature environment around the optical path of the measurement light of the laser interferometer changes, and an error occurs in the detection value of the laser interferometer.
[0008]
In order to reduce such heat generation, when a spring that does not generate heat is used for acceleration / deceleration of the stage, a separate device for compressing the spring is required when accelerating the stage for the first time. Increase the cost and cost.
[0009]
[Means for Solving the Problems]
In order to solve the above problems, a stage apparatus of the present invention includes a stage movable along a traveling path having an acceleration / deceleration area and a constant speed scanning area, and the stage is accelerated / decelerated in the acceleration / deceleration area of the traveling path. And a second drive mechanism that controls the stage at a constant scanning speed in the constant speed scanning region of the travel path, and acceleration of the stage by the first drive mechanism; In a stage apparatus that repeatedly performs constant speed travel of the stage by the second drive mechanism and deceleration of the stage by the first drive mechanism, the stage is first moved from the state where the stage is stopped. Before the stage is accelerated to the scanning speed by the first driving mechanism, the stage is accelerated to the scanning speed by the second driving mechanism.
[0010]
Preferably, the first drive mechanism stores the kinetic energy of the stage in another form, converts the stored energy into the kinetic energy of the stage again, and performs acceleration / deceleration of the stage. It is preferable to have a mechanism for converting kinetic energy into elastic energy. More specifically, the first drive mechanism preferably has a spring.
[0011]
The second drive mechanism is preferably a linear motor.
[0012]
Further, it is desirable that the second drive mechanism compensates for energy loss during the travel of the stage. In order to stop the stage, it is desirable to perform deceleration using the second drive mechanism.
[0013]
Further, it is desirable that the first base that supports the stage so as to be movable along the traveling path is independent of the second base that supports the first drive mechanism.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
<Embodiment 1>
FIG. 1 is a perspective view showing a stage apparatus according to a first embodiment of the present invention.
[0015]
Reference numeral 1 denotes an anti-vibration base, and vibrations from the floor or the like are isolated by a vibration isolator (not shown). Reference numeral 2 denotes a thrust support base, which is vibrationally independent from the vibration isolation base 1.
[0016]
The scanning stage 23 on which the object is mounted is guided by a guide 22 having a pair of guide rails 22a and 22b fixed on a vibration isolation base, and can reciprocate in the scanning direction (predetermined direction). The scanning stage 23 can reciprocate in a predetermined direction along the guide 22. Thrust generators C1 and C2 using a pair of springs as a first drive mechanism are fixed on the thrust support base 2 and are positioned at both ends of the traveling path of the scanning stage 23. Further, small sub-linear motors B1 and B2 which are second drive mechanisms are provided on both sides of the scanning stage 23 along the traveling path. The scanning stage 23 is supported in a non-contact manner from the vibration isolation base 1 and the guide 22 by a hydrostatic bearing pad (not shown) or the like.
[0017]
The thrust generators C1 and C2 have coil springs 24 and 25, spring bases 24a and 25a, spring base guides 26b and 27b, and motors 26d and 27d, respectively. One end of each of the coil springs 24 and 25 can be brought into contact with both end faces 23c and 23d of the scanning stage 23, and the other end is held by the spring bases 24a and 25a. The spring base guides 26b and 27b have guide surfaces 26a and 27a and incorporate clamps (not shown) that can freely fix the spring bases 24a and 25a at arbitrary positions along the guide surfaces 26a and 27a. . The motors 26d and 27d rotate the screws 26c and 27c to move the spring bases 24a and 25a along the guide surfaces 26a and 27a of the spring base guides 26b and 27b. The position of the coil springs 24 and 25 can be adjusted by the operation of the motors 26d and 27d. When the scanning range of the scanning stage 23 is narrow, the spring is moved to the center, and conversely when the scanning range of the scanning stage 23 is wide. Can move the spring to the outside and change the point at which the spring reciprocates, that is, the acceleration / deceleration start position of the scanning stage 23. The force applied by the spring to the scanning stage 23 functions to accelerate when the scanning stage 23 travels toward the center of the traveling path and to decelerate when traveling in the opposite direction. Since the thrust generator is supported by the thrust support base, the reaction force and vibration generated when the scanning stage 23 is accelerated / decelerated by the spring are not transmitted to the vibration isolation base 1 that supports the scanning stage 23. .
[0018]
A partially enlarged view of the sub linear motor is shown in FIG.
[0019]
The sub linear motors B1 and B2 are partially located inside the loop of the sub linear motor stator, and the sub linear motor stator 8 having a small loop-shaped sub yoke 8a and a sub magnet 8b fixed inside thereof. It is comprised by the sub linear motor mover 9 which has a coil. The sub linear motor stator 8 is fixed to the vibration isolation base 1 and fixed to the side surfaces of the sub linear motor movable element 9 and the scanning stage 23. The sub linear motors B1 and B2 can apply a thrust to the scanning stage 23 at the center of the scanning range of the stage. The sub linear motors B1 and B2 perform an operation mainly to keep the scanning stage 23 accelerated to a predetermined speed by the thrust generators C1 and C2 at a constant speed, so that they are as large as the thrust generators C1 and C2. There is no need to generate thrust. Therefore, the sub linear motors B1 and B2 may be small and light.
[0020]
Next, a method for driving the scanning stage will be described.
[0021]
In order for the thrust generators C1 and C2 to accelerate the scanning stage, it is necessary to apply an initial strain to the spring because the elastic force of the spring is required. However, the structure of the present invention is not provided with a mechanism for applying an initial strain to the spring. Therefore, in order to apply initial strain to the springs of the thrust generators C1 and C2, the scanning stage 23 is first accelerated to the required speed using the sub linear motors B1 and B2. As described above, since the thrust generated by the sub linear motors B1 and B2 is small, the acceleration of the scanning stage 23 is small. However, the sub linear motors B1 and B2 can apply thrust over almost the entire scanning range of the scanning stage 23. Therefore, the scanning stage is made to reach a predetermined speed by using the long stroke. The acceleration of the first scanning stage by the sub linear motors B1 and B2 requires a lot of time until the predetermined speed is reached, but it is sufficient that the required speed is reached before the exposure operation is started.
[0022]
In a state where the predetermined speed is reached by the sub linear motors B1 and B2, the scanning stage 23 contacts the coil spring of the thrust generator. The spring is compressed, the scanning stage 23 decelerates, and eventually stops. Next, the compressed spring repels to return to the natural length of the dimension before compression, and the scanning stage 23 changes its moving direction and starts accelerating with the stored elastic energy. When the spring returns to the previous dimension, the speed of the scanning stage 23 is accelerated to a predetermined speed before contacting the coil spring. After the scanning stage 23 is accelerated to a predetermined speed by the thrust generator, the sub linear motors B1 and B2 perform scanning speed control of the scanning stage 23. After finishing the scanning speed control, the scanning stage 23 comes into contact with the coil spring of the thrust generating apparatus on the opposite side to the above-described thrust generating apparatus at a predetermined speed. The spring is compressed, the scanning stage 23 decelerates, and eventually stops, and the same operation as before is repeated. Thereafter, the scanning stage 23 reciprocates between the two coil springs 24 and 25 of the thrust generator.
[0023]
When the stage is stopped, the sub linear motors B1 and B2 are used again. The deceleration method is the reverse of the method in which the stopped scanning stage 23 is accelerated to the predetermined speed for the first time, and the scanning stage 23 is decelerated using the sub linear motors B1 and B2 using a long stroke and stopped. Let
[0024]
The acceleration of the scanning stage 23 is accelerated using the operable region of the sub linear motors B1 and B2. However, when the stroke is narrow, the scanning stage 23 may come into contact with the coil spring before reaching the required predetermined speed. Conceivable. In this case, the scanning stage 23 is decelerated, redirected, and accelerated by the coil spring of the thrust generating means that has come into contact, and returned to the speed immediately before contacting the coil spring, and the acceleration of the scanning stage by the sub linear motors B1 and B2 is resumed. It is sufficient to reach a predetermined speed. The number of reciprocating motions of the scanning stage 23 until reaching a predetermined speed is determined by the thrust, stroke, and arrival speed of the sub linear motors B1 and B2. When the thrust of the sub linear motors B1 and B2 is extremely small, the number of reciprocating motions until the scanning stage 23 reaches a predetermined speed increases, and it takes time until the desired scanning motion is started. It is necessary to consider this. Further, when the traveling scanning stage 23 is stopped, the scanning stage 23 reciprocating may be repeatedly decelerated by the sub linear motors B1 and B2 by the reverse operation.
[0025]
Further, since the coil spring of the thrust generator is not an ideal system, in reality, the speed of the scanning stage 23 just before contacting the coil spring and the speed of the scanning stage 23 when leaving the coil spring do not exactly match. However, the loss of kinetic energy due to friction generated by the reciprocating motion of the scanning stage 23 can be supplemented by the sub linear motors B1 and B2, and the scanning stage 23 can be returned to a predetermined speed.
[0026]
According to this embodiment, since the acceleration / deceleration of the stage is repeatedly performed using the spring, almost no heat is generated during the acceleration / deceleration, and the weight of the apparatus can be reduced and the cost can be reduced.
[0027]
Furthermore, the sub linear motor only needs to be able to generate thrust enough to control the scanning speed of the accelerated scanning stage and to compensate for energy loss, so the entire sub linear motor should be designed to be small. Can do. As a result, the apparatus can be reduced in size and weight, and the material cost can be greatly reduced when an expensive rare earth magnet is used for the linear motor.
[0028]
In addition, since the thrust generator for repeatedly accelerating and decelerating the scanning stage is provided on the thrust support base that is vibrationally independent from the anti-vibration base that supports the stage and guide, the reaction that occurs when the stage is accelerated or decelerated is provided. The force is not transmitted to the anti-vibration base, and vibration or deformation of the anti-vibration base does not occur, so that highly accurate stage control can be realized. In this embodiment, the sub linear motor stator is provided on the vibration isolation base. However, the stator is not limited to this and may be provided on the thrust support base.
[0029]
In addition, since the initial necessary strain of the spring is initially caused by the sub linear motor, it is not necessary to provide a special mechanism for compressing the spring, so that the apparatus can be simplified, downsized, and cost can be reduced. it can.
[0030]
In this embodiment, the stage is accelerated / decelerated using a coil spring. However, the present invention is not limited to this, and a plate spring, an air spring, or the like may be used. Moreover, it is not restricted to what stores elastic energy like a spring, The thing which stores potential energy may be used.
[0031]
<Embodiment 2>
FIG. 3 shows a schematic view of a scanning type exposure apparatus using the above-described scanning stage apparatus as a second embodiment of the present invention.
[0032]
A scanning stage 53 is supported on the image stabilization base 51 so as to be movable in the scanning direction. A thrust generator and a sub linear motor for driving the scanning stage 53 are not shown, but have substantially the same configuration as that of the above-described embodiment.
[0033]
When the stage is stopped before the exposure operation starts, the scanning stage is driven to a predetermined scanning speed as described in the above-described embodiment, and the scanning stage 53 travels at the scanning speed in the center of the traveling path. During this time, the strip-shaped exposure light from the light source is irradiated onto the reticle L2 supported on the scanning stage 53, and the circuit pattern formed on the reticle is applied to the wafer W2 supported on the scanning stage by the equal magnification imaging optical system. An image is formed and scanned and exposed. By scanning both the wafer and the reticle, the entire reticle pattern is transferred to a predetermined shot on the wafer. The scanning stage is reciprocated to repeatedly scan and expose each shot on the wafer. When the wafer is exchanged after the exposure of the wafer is completed, the scanning stage is stopped and the wafer is exchanged as described in the above embodiment. When it is necessary to move the stage to a predetermined position for exchanging wafers or automatically correcting the apparatus, a sub-linear motor may be used. When the exposure starts again after exchanging the wafer, the above operation is resumed.
[0034]
A mirror 53a is provided integrally with the scanning stage 53, and the position of the scanning stage 53 can be measured by a laser interference system 54 that receives the reflected light.
[0035]
According to this embodiment, since there is almost no heat generation at the time of acceleration / deceleration of the stage, the reticle, the wafer, or the constituent members of the exposure apparatus does not undergo thermal deformation, etc., so that highly accurate exposure can be performed. Further, since there is almost no air fluctuation due to heat generation, position measurement by the laser interference system can be performed accurately.
[0036]
Further, as the thrust generating device for driving the stage and the sub linear motor are reduced in size, the exposure apparatus can be reduced in size, weight, and cost.
[0037]
In addition, since the thrust generating device for accelerating and decelerating the scanning stage is provided on the thrust supporting base independent of the anti-vibration base, the reaction force accompanying the acceleration and deceleration of the scanning stage is not transmitted to the anti-vibration base and guide. Highly accurate exposure can be performed. Further, it is desirable that the imaging optical system is also independent of the thrust support base that supports the thrust generator.
[0038]
<Embodiment 3>
FIG. 4 shows a schematic view of another type of scanning exposure apparatus according to the third embodiment of the present invention.
[0039]
In the scanning exposure apparatus described above, the reticle and wafer are held on the same scanning stage, and scanning exposure is performed using the equal magnification imaging optical system. In the present embodiment, the reticle and wafer are separated into different scanning stages. It is different to be held in.
[0040]
Wafer W3 is held on wafer stage 61, which is a scanning stage supported by first anti-vibration base 61a, and reticle R3 is placed on reticle stage 62, which is a scanning stage supported by second anti-vibration base 62a. And the wafer stage 61 and the reticle stage 62 can be driven individually. The wafer stage 61 has a first thrust generation means (not shown) and a first sub-linear motor, and the reticle stage 62 has a second thrust generation means (not shown) and a second sub-linear motor. Thus, each of them travels at an arbitrary scanning speed by a driving method almost the same as the scanning stage of the above-described embodiment.
[0041]
Between the reticle R3 and the wafer W3, a reduction imaging optical system 63 as an exposure unit is disposed. The exposure light emitted from the light source passes through the reticle R3 on which the pattern circuit is formed, is reduced to a predetermined reduction magnification N by the reduction imaging optical system, and is irradiated onto the wafer W3.
[0042]
Similar to the above-described scanning type exposure apparatus, the wafer W3 is exposed when the wafer stage 61 and the reticle stage 62 travel along the central portion of the travel path. In this embodiment, the reduction is performed using a reduction imaging optical system. In order to perform exposure, the scanning speed V1 of the reticle stage 62 and the scanning speed V2 of the wafer stage 61 are:
V2 / V1 = N
The respective scanning speeds are controlled so that the above relationship is established.
[0043]
Each stage is provided with a mirror integrally, and the position of each stage can be measured by a laser interference system that receives the reflected light.
[0044]
FIG. 5 shows a schematic diagram of the overall configuration of the scanning exposure apparatus of the present embodiment.
[0045]
A reticle stage base 71a, which is a second vibration-proof base that supports the reticle stage 73, is integrated with a frame 94 that is erected on the wafer stage base 92 that supports the wafer stage 93. The reticle stage 73 is accelerated and decelerated. The thrust support base 71b that supports the second thrust generating device 75 that performs the above is supported by a support frame 90 that is fixed directly to the floor surface F, separately from the wafer stage base 92.
[0046]
Further, exposure light is irradiated to a reticle (not shown) from a light source device 95 indicated by a broken line.
[0047]
Since the thrust generating device 75 for accelerating / decelerating the reticle stage 73 is supported separately from the reticle stage base 71a, the reaction force of the driving force (thrust) of the thrust generating device generated when accelerating / decelerating the reticle stage 73 is Since it is transmitted from the thrust support base 71b to the floor surface F via the support frame 90, no vibration is generated in the frame 94, the reticle stage base 71a, etc. of the exposure apparatus. Further, since the laser interferometers 97 and 98 for measuring the position of the stage are provided on the frame and the reticle stage base, there is almost no position measurement error due to the influence of vibration caused by the driving reaction force of the stage. Thereby, the scanning start position of the reticle and the wafer can be accurately synchronized, and the scanning speed of the constant speed scanning region can be controlled with high accuracy. Further, by reducing the influence of the driving reaction force, the waiting time until the next exposure cycle is started and the time until the scanning speed is settled can be shortened, and the throughput of the exposure apparatus can be improved.
[0048]
Although a sub-linear motor for controlling the scanning speed of the reticle stage 73 is not shown, as described above, the thrust generated by the sub-linear motor is very small and there is almost no influence of vibration or heat generation. Therefore, a sub-linear motor stator may be provided on the reticle stage base 71a. When the disturbance due to wiring or piping resistance acting on the reticle stage 73 is large, or when the required drive amount of the sub linear motor is relatively large, the sub linear motor stator is fixed to the reticle stage base 71a. It is desirable that the reticle stage base is fixed to the thrust support base 71b so as not to receive disturbances and reaction forces generated from the sub linear motor.
[0049]
Although the first thrust generator and the first sub-linear motor for driving the wafer stage are not shown, the thrust generator and the sub-linear motor are driven on the wafer stage base 92 as in the case of the reticle stage. What is necessary is just to comprise so that it may not be influenced by the reaction force of force.
[0050]
If the thrust of the first and second sub-linear motors (not shown) of the wafer stage 93 and the reticle stage 73 is extremely small, the time until the scanning speed is reached after the stage is stopped is delayed, and the productivity of the exposure apparatus Therefore, the sub-linear motor requires an acceleration force (thrust) that is completed during the first shot exposure after the wafer alignment is completed.
[0051]
According to the present embodiment, it is possible to obtain substantially the same effect as the above-described embodiment.
[0052]
Further, when exchanging wafers to perform exposure on a plurality of wafers using the same reticle, only the wafer stage may be stopped according to the above-described embodiment while the reticle stage continues to reciprocate. In this way, since the acceleration / deceleration operation of the reticle stage using the sub linear motor does not have to be performed at the time of wafer replacement, heat generation can be reduced and throughput can be improved.
[0053]
【The invention's effect】
According to the stage apparatus of the first aspect of the present invention, since the second drive mechanism accelerates the stage until the first drive mechanism can accelerate the stage, simplification of the apparatus, space saving, Cost reduction can be achieved.
[0054]
According to the stage device of the second aspect, since the first drive mechanism stores energy, heat generation during acceleration / deceleration of the stage can be reduced. According to the stage device of the fourth aspect, since the stage is accelerated / decelerated using the elastic force of the spring, the heat generated during the acceleration / deceleration of the stage can be reduced.
[0055]
According to the stage device of the seventh aspect, the stage scanning speed can be returned to a predetermined speed by complementing the energy loss due to friction or the like during the reciprocating motion of the stage with the second drive mechanism. .
[0056]
Further, according to the stage apparatus of the eighth aspect, by performing the stage stop operation using the second drive mechanism, it is possible to simplify the apparatus, save space, and reduce the cost.
[0057]
According to the stage apparatus of the ninth aspect, the vibration and deformation of the constituent members due to the driving reaction force of the stage are reduced, so that the stage can be controlled with high speed and high accuracy.
[Brief description of the drawings]
FIG. 1 is a perspective view showing a scanning stage of a first embodiment. FIG. 2 is a partially enlarged perspective view of a portion surrounded by a circle T in FIG. 1. FIG. 3 is a schematic view showing a scanning exposure apparatus of a second embodiment. 4 is a schematic view showing a scanning exposure apparatus according to a third embodiment. FIG. 5 is an overall schematic view showing the scanning exposure apparatus according to the third embodiment. FIG. 6 is a production flow diagram of a semiconductor device. FIG. 8 is a perspective view showing a conventional scanning stage. FIG. 9 is an explanatory diagram of a magnetic field of a stator of a linear motor used in the scanning stage apparatus of FIG.
DESCRIPTION OF SYMBOLS 1 Anti-vibration base 2 Thrust support base 22 Guide 23 Scan stage 24, 25 Coil spring B1, B2 Sub linear motor C1, C2 Thrust generator

Claims (14)

A stage movable along a traveling path having an acceleration / deceleration area and a constant speed scanning area, a first drive mechanism for accelerating / decelerating the stage in the acceleration / deceleration area of the traveling path, and the constant speed of the traveling path A second drive mechanism for controlling the stage at a constant scanning speed in the scanning region,
In a stage device that repeatedly performs acceleration of the stage by the first drive mechanism, constant speed travel of the stage by the second drive mechanism, and deceleration of the stage by the first drive mechanism,
Before the stage is first accelerated to the scanning speed by the first driving mechanism from the state where the stage is stopped, the stage is accelerated to the scanning speed by the second driving mechanism. A featured stage device. 2. The first drive mechanism stores the kinetic energy of the stage in another form, converts the stored energy into the kinetic energy of the stage again, and performs acceleration / deceleration of the stage. The stage apparatus as described. 3. The stage apparatus according to claim 2, wherein the first drive mechanism has a mechanism for converting kinetic energy of the stage into elastic energy. The stage apparatus according to claim 3, wherein the first driving mechanism includes a spring. The stage apparatus according to claim 4, further comprising a mechanism for adjusting a position of a spring of the first drive mechanism. The stage device according to claim 1, wherein the second drive mechanism is a linear motor. The stage device according to any one of claims 1 to 6, wherein the second driving mechanism compensates for energy loss during travel of the stage. The stage apparatus according to claim 1, wherein when the stage is stopped, deceleration is performed using the second drive mechanism. The first base that supports the stage so as to be movable along a traveling path is independent of the second base that supports the first drive mechanism. Stage equipment. An exposure apparatus comprising the stage apparatus according to claim 1. The stage device is used for at least one of the reticle stage and the wafer stage, and the wafer mounted on the wafer stage and the reticle mounted on the reticle stage are relatively scanned and moved to perform exposure while moving the reticle. The exposure apparatus according to claim 10, wherein the pattern is transferred to a wafer. 12. The exposure apparatus according to claim 11, wherein the apparatus is on standby while reciprocating the reticle stage while exposure is not being performed. 13. An exposure method comprising: a step of preparing an exposure apparatus according to claim 10; and a step of transferring a reticle pattern onto a wafer using the exposure apparatus. 14. The exposure method according to claim 13, wherein a step of applying a photosensitive material on the wafer and developing a portion exposed on the wafer.

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