JP3739554B2 - Substrate processing equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a technique for a substrate processing apparatus including a plurality of processing units, and more particularly to a technique for processing a substrate according to a series of processing conditions in which processing conditions in each processing unit are arbitrarily combined.
[0002]
[Prior art]
In a substrate processing apparatus for processing a substrate such as a semiconductor substrate, a glass substrate for a photomask, a glass substrate for a liquid crystal display device, a substrate for an optical disk, etc., a plurality of processing units for performing various processes are combined. Yes. For example, a semiconductor substrate processing apparatus used in a process of applying a photoresist to a semiconductor substrate is composed of a plurality of processing units such as a spin coater, a hot plate, and a cooling plate. Normally, the user sets unit processing conditions in each processing unit in advance for each unit. The user also sets in advance a flow processing condition indicating in which unit the substrate is processed and in what order the substrate is transferred to the unit. A series of processing is executed according to the unit processing conditions and the flow processing conditions set in this way.
[0003]
[Problems to be solved by the invention]
However, the conventional substrate processing apparatus has a problem that when there are many unit processing conditions for each unit, the unit processing conditions cannot be easily found when setting a specific flow processing condition. Similarly, when there are a large number of flow processing conditions, there is a problem that the target flow processing conditions cannot be easily found. Furthermore, there is a problem that when there are unit processing conditions and flow processing conditions that other people do not want to be changed or deleted, the management cannot be performed accurately.
[0004]
The present invention has been made to solve the above-described problems in the prior art, and provides a technique for easily finding a target processing condition when there are many processing conditions in a substrate processing apparatus. This is the first purpose. A second object is to provide a technique for enabling accurate management of processing conditions.
[0005]
[Means for solving the problems and their functions and effects]
In order to solve at least a part of the problems described above, a substrate processing apparatus of the present invention includes:
A plurality of processing units for processing a substrate;
Processing condition storage means for storing a processing recipe including unit processing conditions in the plurality of processing units and a flow processing condition indicating an order in which the substrate is sequentially transferred to some of the plurality of processing units.
The plurality of unit processing conditions are classified for each category indicating the type of processing in the processing unit, and the plurality of unit processing conditions for each category are further divided into a plurality of unit groups each including a plurality of unit processing conditions. It is divided,
The plurality of flow processing conditions are divided into a plurality of flow groups each including a plurality of flow processing conditions.
[0006]
In the substrate processing apparatus, since a plurality of processing conditions are stored for each group, even when there are a large number of processing conditions, it is possible to easily search for target processing data.
[0007]
In the substrate processing apparatus, further,
User group information storage means for storing user group information indicating a plurality of user groups handling the substrate processing apparatus;
Preferably, at least one unit group that can be used by each user group and at least one flow group that can be used by each user group are assigned to each user group.
[0008]
In this way, whether or not the unit group and the flow group can be used is determined according to the user group. Therefore, when there is a unit processing condition and a flow processing condition that other people do not want to change or delete, the management is appropriately performed. be able to.
[0009]
In the substrate processing apparatus, further,
It is preferable to provide setting means for setting the assignment of unit groups and flow groups to each user group.
[0010]
By using this setting means, it is possible to arbitrarily set and change the assignment of unit groups and flow groups to each user group.
[0011]
In the substrate processing apparatus, further,
An input means for a user handling the substrate processing apparatus to input his / her user group information;
Display means for displaying only unit groups and flow groups assigned to the user group indicated by the user group information according to the input user group information;
It is characterized by providing.
[0012]
In this way, useless flow groups and unit groups that cannot be used by users at a certain user level are not displayed, so that the target flow processing conditions and unit processing conditions can be found more easily.
[0013]
Other aspects of the invention
The present invention includes other aspects as follows. The first aspect is
A substrate processing method in a substrate processing apparatus comprising a plurality of processing units for processing a substrate,
A step of setting a processing recipe including unit processing conditions in the plurality of processing units and a flow processing condition indicating an order of sequentially transporting the substrate to some of the plurality of processing units;
The plurality of unit processing conditions are classified for each category indicating the type of processing in the processing unit, and the plurality of unit processing conditions for each category are further divided into a plurality of unit groups each including a plurality of unit processing conditions. It is divided,
The plurality of flow processing conditions are divided into a plurality of flow groups each including a plurality of flow processing conditions.
[0014]
A second aspect is a computer-readable recording medium on which a computer program for causing a computer to realize the functions of the steps and means of the invention described above is recorded.
[0015]
A third aspect is an aspect as a program supply apparatus that supplies a computer program that causes a computer to realize the functions of the respective steps or means of the present invention via a communication path. In such an embodiment, the functions of the above steps and means can be realized by placing the program on a server on the network, etc., downloading the necessary program to a computer via a communication path, and executing the program. it can.
[0016]
DETAILED DESCRIPTION OF THE INVENTION
A. Configuration of apparatus: Hereinafter, embodiments of the present invention will be described based on examples. FIG. 1 is an explanatory view showing the configuration of a semiconductor substrate processing apparatus as one embodiment of the present invention. The semiconductor substrate processing apparatus 10 includes two modules, a process module 100 and an indexer module 200. The process module 100 is a module used in a step of applying a photoresist on a semiconductor substrate (hereinafter referred to as a “substrate”). However, other process modules, For example, a process module used in the exposure pattern developing process can be connected to the process module 100.
[0017]
The process module 100 includes two spin coaters SC1, SC2, three hot plates HP1, HP2, HP3, three cooling plates CP1, CP2, CP3, and a substrate transfer unit 110. The two spin coaters SC1 and SC2 are processing units for applying a photoresist on a substrate. The three hot plates HP1, HP2, and HP3 are processing units that perform heat treatment of the substrate. The three cooling plates CP1, CP2, and CP3 are processing units that perform substrate cooling processing. The substrate transport unit 110 is a transport unit that transports a substrate from the indexer module to each processing unit or between processing units.
[0018]
The indexer module 200 includes four cassette stages 210, 212, 214, 216, an indexer arm 220, and a processing control station 230. The four cassette stages 210, 212, 214, and 216 are stages on which cassettes storing a plurality of substrates are installed. The indexer arm 220 takes out a predetermined substrate from the cassette provided in the cassette stage and delivers it to the substrate transport unit 110. Also, the indexer arm 220 receives the substrate processed by each processing unit from the substrate transport unit 110 and stores it in the cassette. Is a unit. The process control station 230 is a computer that controls all processes in the semiconductor substrate processing apparatus 10. The processing control station 230 will be described later.
[0019]
In this specification, “processing unit” refers to a unit that performs processing for the purpose of processing a substrate. Since the substrate transport unit 110 and the indexer arm 220 are units intended to transport the substrate, they do not correspond to the “processing unit” in this embodiment. Accordingly, among the units shown in FIG. 1, what can be called “processing units” are two spin coaters SC1, SC2 in the process module 100, three hot plates HP1, HP2, HP3, 3 Eight units of cooling plates CP1, CP2 and CP3 of the base.
[0020]
FIG. 2 is a block diagram showing an electrical configuration of the semiconductor substrate processing apparatus 10 of FIG. The semiconductor substrate processing apparatus 10 includes a processing control station 230, a transfer control unit 240, and a processing control unit 250. The transport control unit 240 has a function of controlling transport in the substrate transport unit 110 and the indexer arm 220 in FIG. The processing control unit 250 has a function of controlling processing in each processing unit (SC1, SC2, HP1, HP2, HP3, CP1, CP2, CP3) of FIG. The conveyance control unit 240 and the processing control unit 250 control each unit based on a command from the control unit 232.
[0021]
The processing control station 230 is a computer including a control unit 232, an external magnetic storage unit 234, an operation unit 236 such as a keyboard, a mouse, and a control panel, and a display unit 238 such as a liquid crystal display. The control unit 232 further includes a CPU and a main memory (not shown), and controls processing of the transport control unit 240 and the processing control unit 250 by executing a computer program stored in the main memory. The external magnetic storage unit 234 stores user group information and processing conditions. The contents of user group information and processing conditions will be described later. The external magnetic storage unit 234 corresponds to the user group information storage unit and the processing condition storage unit in the present invention.
[0022]
1 is provided in a form recorded on a computer-readable recording medium such as a flexible disk or CD-ROM. Each computer reads a computer program from the recording medium and transfers it to an internal storage device or an external storage device. Or you may make it supply a computer program to a computer via a communication path. When realizing each function of the computer program, the computer program stored in the internal storage device is executed by the microprocessor of the computer. Further, the computer program recorded on the recording medium may be read by the computer and directly executed.
[0023]
In this specification, the computer is a concept including a hardware device and an operation system, and means a hardware device that operates under the control of the operation system. Further, when an operation system is unnecessary and a hardware device is operated by an application program alone, the hardware device itself corresponds to a computer. The hardware device includes at least a microprocessor such as a CPU and means for reading a computer program recorded on a recording medium. The computer program includes program code for causing such a computer to realize the functions of the above-described means. Note that some of the functions described above may be realized by an operation system instead of an application program.
[0024]
The “recording medium” in the present invention includes a flexible disk, a CD-ROM, a magneto-optical disk, an IC card, a ROM cartridge, a punch card, a printed matter on which a code such as a bar code is printed, an internal storage device (RAM) of a computer. And various media that can be read by a computer such as an external storage device.
[0025]
B. Processing contents in the embodiment:
FIG. 3 is an explanatory diagram showing the contents of the flow processing data and unit processing data stored in the external magnetic storage unit 234 of FIG. A processing recipe including flow processing data 300 and unit processing data 350 is stored in the external magnetic storage unit 234. The unit processing data 350 is classified for each category indicating the type of processing in the processing unit. The unit processing data 310 for the spin coater, the unit processing data 320 for the hot plate, the unit processing data 330 for the cooling plate, Are classified into three types of processing data. The flow processing data 300 is composed of 10 groups of flow groups “A” to “J”. Each flow group, for example, the flow group “A” 302 shown in FIG. It consists of 99 flow processing conditions. Therefore, there are 990 flow processing conditions in the flow processing data 300. Further, the unit processing data 310 for spin coater is composed of 10 groups of unit groups “A” to “J”. Each unit group, for example, the unit group “A” for spin coater shown in FIG. The reference numeral 312 further includes 99 unit processing conditions from 1 to 99. Therefore, there are 990 unit processing conditions in the unit processing data 310. Similarly, the unit processing data 320 for the hot plate and the unit processing data 330 for the cooling plate are each composed of 990 unit processing conditions. The hatched portion in FIG. 3 will be described later.
[0026]
Here, the “unit processing condition” is data indicating processing contents in each processing unit. For example, the unit processing conditions of the spin coater include the timing at which the photoresist is applied to the substrate, the rotation speed of the spinner with respect to the elapsed time from the start of processing, and the like. The unit processing conditions for the hot plate include the set temperature of the heating plate. The unit processing conditions for the cooling plate also include the set temperature of the cooling plate.
[0027]
The “flow processing condition” is data indicating the contents of a series of processes in which unit processing conditions indicating the processing contents in each processing unit are arbitrarily combined. FIG. 4 is an explanatory diagram showing a specific example of flow processing conditions in the semiconductor substrate processing apparatus 10. FIG. 4 shows the second flow processing condition 400 of the flow group “A” 302 in the flow processing data 300 (FIG. 3). The flow processing conditions include a transport order, processing unit identification information, and unit processing conditions. The transport order indicates the order of transport of the substrates in the substrate processing apparatus. The processing unit identification information includes the unit number of the processing unit of the substrate transfer destination and the processing category of the processing unit. The unit processing condition is data indicating the processing contents in each processing unit. In the processing category column, “ID” means an indexer module, “SC” means a spin coater, “HP” means a hot plate, and “CP” means a cooling plate. “SCB.01” in the column of unit processing conditions indicates the first unit processing condition “01” included in the unit group “B” 420 for spin coater. It has been decided.
[0028]
When processing according to the flow processing condition 400 (FIG. 4), the substrate is transported and processed in the order of the indexer ID, the spin coater SC, the hot plate HP, the cooling plate CP, and the indexer ID. The unit number in the third transport order (third transport destination unit) is “# 3”, which means hot plate HP1 (FIG. 1). The unit number in the fourth transport order is “# 4”, which means the cooling plate CP1 (FIG. 1).
[0029]
In this way, the processing unit identification information defines the substrate transport order with a unit number that is unique to each processing unit, so the substrate transport order to a plurality of processing units can be set to any order. It is. Note that the processing unit identification information only needs to be able to identify each processing unit. Therefore, it is sufficient that the processing unit identification information includes at least the unit number and does not need to include the processing category.
[0030]
FIG. 5 is a flowchart showing the overall procedure of processing in this embodiment. In step S <b> 1, user levels are set for various operations in the semiconductor substrate processing apparatus 10. The user level is used to set an access right that determines whether various operations are possible. Here, the “various operations” include operations for using and changing flow groups and unit groups, and operations for performing basic functions of the apparatus, such as parameter setting and unit number setting for each processing unit. . In this embodiment, only the person in charge of management can make the above setting. Thereby, management of the process recipe of this apparatus can be performed exactly.
[0031]
FIG. 6 is a flowchart showing details of the process in step S1 of FIG. In step S1a, the person in charge of management performs a predetermined operation on the operation unit 236 (FIG. 2) to display a user level registration screen on the display unit 238 (FIG. 2) of the semiconductor substrate processing apparatus 10.
[0032]
FIG. 7 is an explanatory diagram showing an example of a user level registration screen displayed in step S1 of FIG. The user level registration screen of FIG. 7 includes a user level number field 500, a user level name field 510, an end button 520, and a setting save button 530.
[0033]
In step S1b of FIG. 6, the number of user levels to be registered is input to the user level number field 500 (FIG. 7). In this embodiment, the number of user levels can be set up to five, and “4” is input as the number of user levels here.
[0034]
In step S1c, the user level name to be registered and its password are entered in the user level name field 510 (FIG. 7). The user level name is a generic name of a user group composed of at least one user in charge of a certain work. In this embodiment, the user level 1 is an administrator, the user level 2 is an experimenter, and the user level 3 is The person in charge of work and user level 4 are set as persons in charge of equipment. In addition, by setting a password for each user level, it is possible to easily manage whether or not operations corresponding to the user level can be performed for various operations in the semiconductor substrate processing apparatus 10.
[0035]
When the setting save button 530 in FIG. 7 is selected in step S1d, the input user group information is registered in the external magnetic storage unit 234 (FIG. 2) in step S1e. If the end button 520 is selected in step S1d, the user level registration ends.
[0036]
In step S2 of FIG. 5, the flow groups and units that can be used for each user level for the plurality of flow groups and the plurality of unit groups included in the flow processing data 300 and the unit processing data 310, 320, 330 of FIG. Assign a group. Note that a program for realizing this allocation function corresponds to the setting means in the present invention.
[0037]
FIG. 8 is a flowchart showing details of the process in step S2 of FIG. In step S2a, the user performs a predetermined operation on the operation unit 236 (FIG. 2) to display a processing data setting screen on the display unit 238 (FIG. 2) of the semiconductor substrate processing apparatus 10, and sets the processing data to be set. select.
[0038]
FIG. 9 is an explanatory diagram showing an example of the processing data setting screen displayed in step S2 of FIG. The processing data setting screen of FIG. 9 includes a processing data selection button field 600, a group selection field 610, a user level selection button field 620, an end button 630, and a setting save button 640. In the user level selection button field 620, the user level registered on the user level registration screen of FIG. 7 is displayed.
[0039]
In step S2a of FIG. 8, the processing data to be set is selected from the processing data selection button field 600 (FIG. 9). In FIG. 9, “Flow” with a diagonal line is selected, and at this time, the flow selection groups “A” to “J” are displayed in the group selection field 610.
[0040]
In step S2b, the user level to which the flow processing data is to be set is designated in the user level selection button field 620 (FIG. 9). In this embodiment, the person in charge of the experiment is designated.
[0041]
Furthermore, in step S2c, at least one flow group that gives permission for use to the designated user level is selected from the flow groups “A” to “J” of the flow processing data 300 (FIG. 3). Select in 9). Here, only the flow group “A” is selected.
[0042]
When the setting save button 640 is selected in step S2d, the input flow process data information is registered in the external magnetic storage unit 234 (FIG. 2) in step S2e. By this registration, the access right of the selected flow group is set for the specified user level. Note that when the end button 630 is selected in step S2d, the setting of the flow process data ends.
[0043]
Next, when “unit SC” in the processing data selection button field 600 (FIG. 9) is selected in step S2a of FIG. 8, the unit selection data 610 includes a unit for spin coater in the unit processing data 310 (FIG. 3). Groups “A” through “J” are displayed. In step S2f, the user level to be set for the unit processing data for the spin coater is designated in the user level selection button field 620. Further, in step S2g, at least one unit group that gives permission for use to the designated user level is selected from the unit groups “A” to “J” in the group selection field 610 (FIG. 9). When the setting save button 640 is selected in step S2h, the input unit processing data information is registered in the external magnetic storage unit 234 (FIG. 2) in step S2i. By this registration, the access right of the selected unit group for the spin coater is set for the designated user level. Note that when the end button 630 is selected in step S2h, the setting of the unit processing data ends.
[0044]
In addition, when “unit HP” and “unit CP” in the processing data selection button field 600 (FIG. 9) are selected in step S2a, the unit processing data 320 for the hot plate and the unit processing data 330 for the cooling plate are also displayed. Similarly to the unit processing data 310 for the spin coater, the access right can be set for the designated user level. In this embodiment, the user who can perform the operation in Step 2 (FIG. 5) is limited to the person in charge of management of this apparatus.
[0045]
With the above operation, access rights are set for each user level for a plurality of flow groups and a plurality of unit groups included in each processing data. In this embodiment, the flow group and unit group for which the access right is set for the person in charge of the experiment are shown in the hatched portion in FIG. In FIG. 3, the access right is set for the person in charge of the experiment for the flow processing data 300 only in the flow group “A”. Similarly, the unit groups “A”, “B”, “C” in the unit processing data 310 for the spin coater, the unit group “J” in the unit processing data 320 for the hot plate, and the cooling plate Access rights are set for the unit groups “B” and “D” in the unit processing data 330. The person in charge of the experiment can freely use and change only the flow processing conditions of the flow group to which access rights are set and the unit processing conditions of the unit group. The unit processing conditions of a unit group cannot be used or changed. Therefore, for example, when the flow processing conditions of the flow group “A” are configured by combining the unit processing conditions of the unit group “D” for the spin coater, the access right is given to the unit group “D” for the spin coater. Since it is not set, processing cannot be performed according to the flow processing conditions.
[0046]
In addition, by setting an access right for each user level for the flow group and the unit group of each processing unit, when a user at a certain user level uses the semiconductor substrate processing apparatus 10, the flow for which the access right is set Only the group and the unit group may be displayed on the display unit 238 (FIG. 2). In this way, useless flow groups and unit groups that cannot be used by users at a certain user level are not displayed, so that the target flow processing conditions and unit processing conditions can be easily found.
[0047]
When processing is actually performed according to the flow processing conditions, first, the user inputs the user level to which the user belongs in the operation unit 236 of the processing control station 230 (FIG. 2). Normally, since a password is set, enter the password. As a result, the semiconductor substrate processing apparatus 10 can be operated within the range in which the access right is set. The user inputs a flow group and flow processing conditions on the control panel of the operation unit 236, and performs processing in this apparatus.
[0048]
FIG. 10 is an explanatory diagram showing an example of a control panel for selecting and executing a flow processing condition. 10 includes a flow processing condition display field 700, a flow group selection button 710, a flow processing condition selection button 720, a start button 730, a stop button 740, a cancel button 750, and a pause button 760. , Including. The flow group selection button 710 and the flow processing condition selection button 720 are buttons for selecting a flow processing condition, and a code indicating the selected flow processing condition is displayed in the flow processing condition display field 700. The start button 730 is a button for executing the selected flow processing condition. The stop button 740 is a button for forcibly stopping the process being executed. A cancel button 750 is a button for canceling the setting of the selected flow processing condition. The pause button 760 is a button for temporarily interrupting the process being executed.
[0049]
When the target flow processing condition is the flow processing condition 400 shown in FIG. 4, the user selects the flow group “A” with the flow group selection button 710 on the control panel of FIG. The second flow processing condition of the flow group “A” is selected. At this time, “A.02” is displayed in the flow processing condition display field 700. When the start button 730 is pressed, each processing unit (SC1, SC2, SC2) of the semiconductor substrate processing apparatus 10 (FIG. 1) is executed according to the selected “A.02” flow processing condition, that is, the flow processing condition 400 (FIG. 4). The processing in HP1, HP2, HP3, CP1, CP2, CP3) is started.
[0050]
The flow processing conditions 400 in FIG. 4 are configured by processing associated with a five-stage transport sequence. In the first stage, the indexer arm 220 of FIG. 1 takes out a predetermined substrate from the cassette stage 210 (or 212, 214, 216), and the substrate transport unit 110 has the indexer module 200 with the unit number “# 0”. The substrate is received from the indexer arm 220. In the second stage, the substrate transport unit 110 transports the substrate to the spin coater SC1 having the unit number “# 1” and delivers it to the spin coater SC1. The spin coater SC1 performs processing according to the first unit processing condition of the unit group “B” 420 for spin coater. In the third stage, the substrate transport unit 110 receives the substrate that has been processed in the spin coater SC1, transports it to the hot plate HP1 having the unit number “# 3”, and delivers it. The hot plate HP1 performs processing in accordance with the second unit processing condition of the unit group “J” 430 for hot plate. In the fourth stage, the substrate transport unit 110 receives the substrate that has been processed in the hot plate HP1, transports it to the cooling plate CP1 having the unit number “# 4”, and delivers it. The cooling plate CP1 performs processing according to the 99th unit processing condition of the unit group “D” 440 for the cooling plate. In the fifth stage, the substrate transport unit 110 receives the substrate for which the processing on the cooling plate CP1 has been completed, and transfers it to the indexer arm 220 in the indexer module 200 having the unit number “# 0”. The indexer arm 220 stores the substrate received from the substrate transport unit 110 in a predetermined location of the cassette stage 210, and the processing of the flow processing condition 400 is completed.
[0051]
As described above, in the above embodiment, the plurality of unit processing conditions are divided into a plurality of unit groups for each processing unit, and the plurality of flow processing conditions are also divided into a plurality of flow groups. Therefore, whether or not the use can be set can be set for each unit group and for each flow group according to the user level. As a result, it becomes possible to accurately manage the processing recipe of the semiconductor substrate processing apparatus.
[0052]
The present invention is not limited to the above-described examples and embodiments, and can be implemented in various modes without departing from the gist thereof. For example, the following modifications are possible.
[0053]
(1) In the above embodiment, the number of registrations at the user level is limited to 5. However, more user levels may be registered. In this way, the user group can be registered as a further subdivided group, and registration for each user is also possible.
(2) In the above embodiment, each processing data is divided into 10 flow groups or 10 unit groups for each processing unit. However, the processing data may be divided into a larger number or a smaller number of groups. Good. Further, the number of processing conditions that can be stored per group may be arbitrarily set for each group. This makes it possible to set a more appropriate access right for this apparatus. (3) In the above embodiment, the processing control station 230 of the semiconductor substrate processing apparatus 10 performs setting of a user level, execution of flow processing conditions, and the like. The above operation may be performed by executing a client program in the other computer. Also in this case, there are the same effects as the above-described embodiment, and further, there is an advantage that remote control can be performed.
(4) In the above embodiment, a part of the configuration realized by hardware may be replaced with software, and conversely, a part of the configuration realized by software may be replaced with hardware. Also good.
[Brief description of the drawings]
FIG. 1 is an explanatory diagram showing a configuration of a semiconductor substrate processing apparatus as an embodiment of the present invention.
2 is a block diagram showing an electrical configuration of the semiconductor substrate processing apparatus 10 of FIG. 1;
FIG. 3 is an explanatory diagram showing the contents of flow processing data and unit processing data stored in the external magnetic storage unit 234 of FIG. 2;
4 is an explanatory view showing a specific example of flow processing conditions in the semiconductor substrate processing apparatus 10. FIG.
FIG. 5 is a flowchart showing an overall procedure of processing in this embodiment.
6 is a flowchart showing details of processing in step S1 of FIG. 5;
7 is an explanatory diagram showing an example of a user level registration screen displayed in step S1 of FIG.
FIG. 8 is a flowchart showing details of the process in step S2 of FIG.
FIG. 9 is an explanatory diagram showing an example of a processing data setting screen displayed in step S2 of FIG.
FIG. 10 is an explanatory diagram showing an example of a control panel for selecting and executing a flow processing condition
[Explanation of symbols]
10 ... Semiconductor substrate processing apparatus
100 ... Process module
110: Substrate transport unit
200 ... Indexer module
210, 212, 214, 216 ... cassette stage
220 ... Indexer arm
230 ... Processing control station
232: Control unit
234 ... External magnetic storage unit
236 ... operation unit
238 ... display section
240 ... transport control unit
250 ... Processing control unit
300: Flow processing data
302 ... Flow group A
310: Unit processing data for spin coater
312 ... Unit group A for spin coater
320 ... Unit processing data for hot plate
330 ... Unit processing data for cooling plate
350: Unit processing data
400: Flow processing conditions
420 ... Unit group B (spin coater)
430 ... Unit group J (hot plate)
440 ... Unit group D (cooling plate)
500 ... User level number field
510 ... User level name field
520 ... End button
530 ... Setting save button
600 ... Process data selection button field
610 ... Group selection field
620 ... User level selection button field
630 ... End button
640 ... Setting save button
700 ... Flow processing condition display field
710 ... Flow group selection button
720 ... Flow processing condition selection button
730 ... Start button
740 ... Stop button
750 ... Cancel button
760 ... Pause button
SC1, SC2 ... Spin coater
HP1, HP2, HP3 ... Hot plate
CP1, CP2, CP3 ... Cooling plate

Claims (4)

A substrate processing apparatus for processing a substrate,
A plurality of processing units for processing a substrate;
Storing a plurality of units processing conditions that put the plurality of processing units, a flow process conditions order to indicate to a plurality of the slide into successively transported to some of the plurality of processing units to the substrate, the process recipe including Processing condition storage means for performing,
Wherein the plurality of unit process conditions, with are classified into categories indicating the type of processing in the processing unit, the unit processing conditions multiple included in each category, further their respective two or more units processing conditions the a including a plurality of unit groups, wherein are divided into the multiple unit group smaller than the number of said plurality of units processing conditions included in each category,
Wherein the plurality of flow processing conditions, their respective is a including a plurality of flow group two or more flow processing conditions, divided into the multiple flow group smaller than the number of said plurality of flow processing conditions A substrate processing apparatus. The substrate processing apparatus according to claim 1, further comprising:
User group information storage means for storing user group information indicating a plurality of user groups handling the substrate processing apparatus;
A substrate processing apparatus, wherein at least one unit group that can be used by each user group and at least one flow group that can be used by each user group are assigned to each user group. The substrate processing apparatus according to claim 2, further comprising:
A substrate processing apparatus comprising: setting means for setting an assignment between a unit group and a flow group for each user group. The substrate processing apparatus according to claim 3, further comprising:
An input means for a user handling the substrate processing apparatus to input his / her user group information;
Display means for displaying only unit groups and flow groups assigned to the user group indicated by the user group information according to the input user group information;
A substrate processing apparatus comprising:

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