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JP3748355B2 - Light emitting diode - Google Patents
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JP3748355B2 - Light emitting diode - Google Patents

Light emitting diode Download PDF

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Publication number
JP3748355B2
JP3748355B2 JP2000019354A JP2000019354A JP3748355B2 JP 3748355 B2 JP3748355 B2 JP 3748355B2 JP 2000019354 A JP2000019354 A JP 2000019354A JP 2000019354 A JP2000019354 A JP 2000019354A JP 3748355 B2 JP3748355 B2 JP 3748355B2
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Japan
Prior art keywords
phosphor
emitting diode
light emitting
wavelength
light
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Japanese (ja)
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JP2001210874A (en
Inventor
正明 加藤
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Sharp Corp
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Sharp Corp
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/015Manufacture or treatment of bond wires
    • H10W72/01515Forming coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07551Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
    • H10W72/07554Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting changes in dispositions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/547Dispositions of multiple bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires

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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Led Device Packages (AREA)
  • Led Devices (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、発光波長変換のために蛍光体と組み合わせた発光ダイオード(LED)チップおよび発光ダイオードに関する。
【0002】
【従来の技術】
430nm以下の短い波長で発光するLEDが開発されてから、そのLEDチップの表面に蛍光体を塗布することによって発光波長の変換を図り、白色の発光を可能としたLEDランプが開発されている。
【0003】
しかしながら、この蛍光体は、その比重が大きく、エポキシ樹脂等の樹脂と蛍光体を混合してLEDチップの表面に塗布した場合に、蛍光体のみが沈降してしまうため、多量の塗布を行う必要がある。
【0004】
さらに、LEDチップの表面に塗布された蛍光体による波長変換によって得られる2次発光波長は1種類のみであり、その2次発光波長と、励起前のLEDチップの発光波長との組み合わせ比率で表現できる色調のみを発光可能であった。
【0005】
【発明が解決しようとする課題】
上述した従来技術では、非常に高価な蛍光体を多量に使用する必要があり、製品コストが高くなるという問題があった。
【0006】
また、蛍光体の塗布量のバラツキによって、変換された波長のバランスが変わるため、発光する色調にバラツキが生じて、製造の歩留りが低下するという問題もあった。
【0007】
さらに、色座標で表される色調表現については、LED自体の発光波長と、その発光波長を蛍光体で励起して波長変換した発光波長とを結ぶ線上以外の色調表現が不可能であった。
【0008】
本発明はこのような従来技術の課題を解決するためになされたものであり、少量の蛍光体で効率良く発光波長変換を行うことが可能であり、製造の歩留りを向上させることができ、さらに、色調表現のバリエーションを増加させることができる発光ダイオードチップおよび発光ダイオードを提供することを目的とする。
【0010】
【課題を解決するための手段】
本発明の発光ダイオードは、基板上に、所定波長の光を発光する半導体積層構造が形成され、該基板の該半導体積層構造とは反対側の面に、前記半導体積層構造から発光される光の波長を変換させるための下部蛍光体層が1層または2層以上形成されている発光ダイオードチップが、前記下部蛍光体層とリードフレームとの間に設けられたダイボンド用接着剤によって該リードフレームにダイボンドされるとともに、前記半導体積層構造に設けられた一対の電極と前記リードフレームとがそれぞれワイヤーボンドされ、さらに、1種類または2種類以上の蛍光体が樹脂に混合された上部蛍光体層が、該発光ダイオードチップ表面に該表面および前記各電極を覆うように塗布されるとともに、前記下部蛍光体層とによって該発光ダイオードチップを完全に包み込むように、前記半導体積層構造の側面を覆って塗布されており、前記発光ダイオードチップが、前記リードフレームとともに樹脂にてモールドされていることを特徴とし、そのことにより上記目的が達成される。
【0011】
前記上部蛍光体層の蛍光体は、前記半導体積層構造から発光される光の波長を、前記下部蛍光体層とは異なる波長に変換させるものであってもよい。
前記半導体積層構造は、430nm以下の波長の光を発光するものであってもよい。
【0012】
以下、本発明の作用について説明する。
【0013】
本発明にあっては、LEDチップのサブストレート基板の下面(半導体積層構造とは反対側の面)に、蛍光体層を設けることによって、LEDからの発光波長を変換させることができる。この蛍光体層は、エポキシ樹脂等に蛍光体を混ぜたものを基板の下面に均一に塗布したり、またはエポキシ樹脂やガラス等の固体中に蛍光体を分散させたものを基板の下面に貼り付けること等により形成することができる。よって、従来のように、塗布量のバラツキが生じたり、蛍光体が樹脂に沈降して多量の蛍光体を必要とするという問題は生じない。
【0014】
また、本発明のLEDチップをリードフレームや導電性基板にダイボンドしてワイヤーボンドを行った後、LEDチップ表面に蛍光体を塗布することにより、この蛍光体塗布層と基板下面に設けた蛍光体層とで、LEDチップの発光層を完全に包み込むことが可能となる。上部は樹脂に混ぜた蛍光体を塗布し、下部は蛍光体を分散した樹脂を塗布したり、樹脂蛍光体を分散した固体を貼り付けること等により、必要な蛍光体の量を減らすことができ、少量の蛍光体で効率の良い波長変換が可能である。よって、従来技術のように、高価な蛍光体を多量に使用する必要がなく、製品コストが高くなるという問題が生じない。
【0015】
さらに、LEDチップ表面に塗布する蛍光体の種類を、基板の下面に設けた蛍光体層と発光波長が異なるものにすることにより、LED自体の発光波長と、下部蛍光体層で励起されて変換された発光波長と、上部蛍光体塗布層で励起されて変換された発光波長の3種類の波長を発光可能である。よって、従来よりも表現可能な色調のバリエーションが一気に増加する。
【0016】
基板下面に発光波長が異なる蛍光体層を2層以上設けたり、LEDチップ表面に蛍光体を2種類以上塗布することにより、さらに色調表現のバリエーションを増やすことができる。
【0017】
【発明の実施の形態】
以下に、本発明の実施形態について、図面を参照しながら説明する。
【0018】
図1は本発明の一実施形態におけるLEDチップの概略構成を示す断面図である。このLEDチップは、サファイア基板5上に、N−GaN層4、発光層3およびP−GaN層2からなる半導体積層構造が積層されている。発光層3およびP−GaN層2はその下のN−GaN層4が露出するようにその一部が除去され、そのN−GaN層4の露出部上およびP−GaN層2上に電極1が形成されている。
【0019】
さらに、サファイア基板5の下面には、LED自体からの発光波長(青色(例えば430nm)以下(青色以下の発光波長)を波長変換するために下部蛍光体層6が設けられている。
【0020】
例えば、ウェハーのダイシング前に、樹脂中に蛍光体を均一に分散させたものに蛍光体を混ぜたものをサファイア基板5の下面に均一に塗布し、1チップずつ分割することにより、下部蛍光体層6を形成することができる。または、ウェハーのダイシング前に、樹脂やガラス等の固体中に蛍光体を分散させたものをサファイア基板5の下面に貼り付け、1チップずつ分割することによっても、下部蛍光体層6を形成することができる。
【0021】
この樹脂としては、エポキシ樹脂やガラス等を用いることができ、蛍光体としてはCe(Y3Al512:Ce3+)、CaGa24:Ce3+、SrCa24:Ce3+、M2SiO5:Ce3+(但し、Mはカルシウム、ストロンチウムおよびバリウムのうちの少なくとも1つ以上の金属元素)、Y2SiO5:Ce3+等を用いることができる。
【0022】
このLEDチップを、図2に示すように、ダイボンド用接着剤10を用いてリードフレーム9にダイボンドする。そして、LEDチップ表面に存在する金属性の電極1のうち、アノード側およびカソード側の一方を、金またはアルミニウム等の細線8を用いて、ダイボンドされているフレームの端部にワイヤー接続し、他方の電極をダイボンドされているフレームとは離れた位置にある対極のフレームにワイヤー接続する。以上によりダイボンドおよびワイヤーボンド工程が完了する。
【0023】
このようにワイヤーボンドを完了したリードフレームは、通常、透明または着色したエポキシ樹脂で任意の形状にモールドされる。
【0024】
本実施形態では、ワイヤーボンド後に、LEDチップ表面に下部蛍光体層6とは異なる発光波長の蛍光体を混ぜた樹脂を塗布して、図2に示すような上部蛍光体塗布層7を形成する。この蛍光体としてはCe(Y3Al512:Ce3+)、CaGaS4:Ce、CaGa24:Ce3+等を用いることができる。その後、さらに樹脂で任意の形状にモールドする。
【0025】
このようにして得られる本実施形態のLEDの発光波長分布を図3に示す。この図に示すように、本実施形態のLEDからは、LEDチップ自体からの発光波長と、LEDチップ自体からの発光を下部蛍光体層で励起して得られる発光波長と、LEDチップ自体からの発光を上部蛍光体塗布層で励起して得られる発光波長との3種類の波長の光が得られる。そして、各々の波長光のピーク出力の高さをコントロールすることによって、任意の色調を表現することができる。上記LEDチップ自体からの発光波長は電流によりコントロールし、LEDチップ自体からの発光を下部蛍光体層で励起して得られる発光波長およびLEDチップ自体からの発光を上部蛍光体塗布層で励起して得られる発光波長は蛍光体濃度でコントロールすることができる。
【0026】
なお、図3においては、下部蛍光体層の発光波長よりも上部蛍光体塗布層の発光波長を大きくしてあるが、逆であってもよい。また、下部蛍光体層として異なる発光波長を有する2層以上の蛍光体層を形成してもよく、上部蛍光体塗布層として異なる発光波長を有する2種類以上の蛍光体を塗布してもよい。
【0027】
さらに、本発明は、GaNからなるLEDチップに限られず、他の材料系を用いたLEDチップに適用することも可能であり、例えばZnSe系材料が挙げられる。
【0028】
【発明の効果】
以上詳述したように、本発明によれば、LEDチップのサブストレート基板の下面に、蛍光体を均一に分散させた蛍光体層を予め設けておき、さらに、リードフレームや導電性基板へのダイボンドやワイヤーボンドを行った後、LEDチップ表面に蛍光体を塗布することで、LEDチップの発光層を完全に包み込むことが可能となる。よって、少量の蛍光体によって効率良く波長変換を行うことができ、製造コストを下げることができる。
【0029】
また、基板の下面に設けた蛍光体層として、固体に蛍光体を分散させたものを用いることにより、その固体中の濃度を変化させたり、固体の厚みを変化させることで蛍光体量をコントロールしてバラツキを防ぐことができる。
【0030】
さらに、LEDチップ表面に塗布する蛍光体の種類を、基板の下面に設けた蛍光体層とは発光波長が異なるものにすることにより、LED自体の発光波長と、下部蛍光体層で励起されて変換された発光波長と、上部蛍光体塗布層で励起されて変換された発光波長の3種類の波長を発光可能な発光ダイオードが得られる。よって、従来よりも表現可能な色調のバリエーションを大幅に増加させることができる。
【図面の簡単な説明】
【図1】本発明の一実施形態であるLEDチップの構成を示す断面図である。
【図2】本発明の一実施形態であるLEDの構成を示す断面図である。
【図3】本発明の一実施形態であるLEDにおける発光波長分布を示すグラフである。
【符号の説明】
1 LEDチップの電極
2 P−GaN層
3 発光層
4 N−GaN層
5 サファイア基板
6 下部蛍光体層
7 上部蛍光体塗布層
8 金線またはアルミニウム等からなる細線
9 リードフレーム
10 ダイボンド用接着材
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a light emitting diode (LED) chip and a light emitting diode combined with a phosphor for light emission wavelength conversion.
[0002]
[Prior art]
Since LEDs that emit light at a short wavelength of 430 nm or less have been developed, LED lamps have been developed that can emit white light by converting the emission wavelength by applying a phosphor on the surface of the LED chip.
[0003]
However, this phosphor has a large specific gravity, and when a resin such as an epoxy resin and the phosphor are mixed and applied to the surface of the LED chip, only the phosphor is settled, so a large amount of application is required. There is.
[0004]
Furthermore, there is only one type of secondary emission wavelength obtained by wavelength conversion using the phosphor applied to the surface of the LED chip, and it is expressed by a combination ratio of the secondary emission wavelength and the emission wavelength of the LED chip before excitation. Only possible color tones could be emitted.
[0005]
[Problems to be solved by the invention]
In the above-described conventional technology, it is necessary to use a large amount of very expensive phosphors, and there is a problem that the product cost increases.
[0006]
In addition, since the balance of the converted wavelengths varies depending on the variation in the amount of phosphor applied, there is also a problem that variations in the color of emitted light occur and the manufacturing yield decreases.
[0007]
Furthermore, with respect to the color tone expression represented by the color coordinates, it is impossible to express the color tone other than on the line connecting the emission wavelength of the LED itself and the emission wavelength obtained by exciting the emission wavelength with a phosphor and converting the wavelength.
[0008]
The present invention has been made to solve such problems of the prior art, and can efficiently perform emission wavelength conversion with a small amount of phosphor, and can improve the manufacturing yield. An object of the present invention is to provide a light emitting diode chip and a light emitting diode capable of increasing variations in color expression.
[0010]
[Means for Solving the Problems]
In the light emitting diode of the present invention, a semiconductor multilayer structure that emits light of a predetermined wavelength is formed on a substrate, and light emitted from the semiconductor multilayer structure is formed on a surface of the substrate opposite to the semiconductor multilayer structure. A light emitting diode chip in which one or more lower phosphor layers for wavelength conversion are formed is attached to the lead frame by a die-bonding adhesive provided between the lower phosphor layer and the lead frame. While being die- bonded, a pair of electrodes provided in the semiconductor laminated structure and the lead frame are each wire-bonded, and further, an upper phosphor layer in which one kind or two or more kinds of phosphors are mixed with a resin, Rutotomoni is applied so as to cover the surface and the respective electrode to the light emitting diode chip surface, the light emitting diode chip by said lower phosphor layer The so completely enveloping said being applied over a side surface of the semiconductor multilayer structure, the light emitting diode chip, wherein characterized in that it is molded by resin together with the lead frame, the object is achieved by the Is done.
[0011]
Phosphor of the upper phosphor layer, the wavelength of the light emitted from the semiconductor multilayer structure, may be one which is converted to a different wavelength from that of the lower phosphor layer.
The semiconductor multilayer structure may emit light having a wavelength of 430 nm or less.
[0012]
The operation of the present invention will be described below.
[0013]
In the present invention, the emission wavelength from the LED can be converted by providing the phosphor layer on the lower surface of the substrate substrate of the LED chip (the surface opposite to the semiconductor laminated structure). For this phosphor layer, an epoxy resin mixed with a phosphor is uniformly applied to the lower surface of the substrate, or a phosphor dispersed in a solid such as epoxy resin or glass is attached to the lower surface of the substrate. It can be formed by attaching. Therefore, unlike the conventional case, there is no problem that the coating amount varies or the phosphor settles on the resin and requires a large amount of phosphor.
[0014]
In addition, after the LED chip of the present invention is die-bonded to a lead frame or a conductive substrate to perform wire bonding, the phosphor is applied to the surface of the LED chip, whereby the phosphor provided on the lower surface of the phosphor coating layer and the substrate. With the layer, it becomes possible to completely envelop the light emitting layer of the LED chip. The upper part can be coated with a phosphor mixed with resin, and the lower part can be coated with a resin with dispersed phosphor, or a solid with dispersed resin phosphor can be attached to reduce the amount of phosphor required. Efficient wavelength conversion is possible with a small amount of phosphor. Therefore, unlike the prior art, it is not necessary to use a large amount of expensive phosphor, and there is no problem that the product cost increases.
[0015]
Furthermore, by making the type of phosphor applied to the LED chip surface different from that of the phosphor layer provided on the lower surface of the substrate, it is excited and converted by the emission wavelength of the LED itself and the lower phosphor layer. It is possible to emit three types of wavelengths: the emitted light wavelength and the light emission wavelength that is excited and converted by the upper phosphor coating layer. Therefore, variations in color tone that can be expressed more than before are increased at a stretch.
[0016]
By providing two or more phosphor layers having different emission wavelengths on the lower surface of the substrate, or by applying two or more types of phosphors on the surface of the LED chip, variations in color expression can be further increased.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
[0018]
FIG. 1 is a cross-sectional view showing a schematic configuration of an LED chip according to an embodiment of the present invention. In this LED chip, a semiconductor laminated structure including an N-GaN layer 4, a light emitting layer 3 and a P-GaN layer 2 is laminated on a sapphire substrate 5. The light emitting layer 3 and the P-GaN layer 2 are partially removed so that the underlying N-GaN layer 4 is exposed, and the electrode 1 is formed on the exposed portion of the N-GaN layer 4 and on the P-GaN layer 2. Is formed.
[0019]
Further, a lower phosphor layer 6 is provided on the lower surface of the sapphire substrate 5 in order to convert the wavelength of light emitted from the LED itself (blue (eg, 430 nm) or less (light emission wavelength of blue or less)).
[0020]
For example, before dicing a wafer, a phosphor in which a phosphor is uniformly dispersed in a resin and a mixture of the phosphor are uniformly applied to the lower surface of the sapphire substrate 5 and divided into chips, whereby the lower phosphor Layer 6 can be formed. Alternatively, before the wafer is diced, the lower phosphor layer 6 is also formed by attaching a phosphor dispersed in a solid such as resin or glass to the lower surface of the sapphire substrate 5 and dividing it one chip at a time. be able to.
[0021]
As this resin, an epoxy resin, glass or the like can be used, and as the phosphor, Ce (Y 3 Al 5 O 12 : Ce 3+ ), CaGa 2 S 4 : Ce 3+ , SrCa 2 S 4 : Ce 3 + , M 2 SiO 5 : Ce 3+ (where M is at least one metal element of calcium, strontium, and barium), Y 2 SiO 5 : Ce 3+, and the like can be used.
[0022]
This LED chip is die-bonded to the lead frame 9 using a die-bonding adhesive 10 as shown in FIG. Then, among the metallic electrodes 1 existing on the LED chip surface, one of the anode side and the cathode side is wire-connected to the end of the die-bonded frame using a thin wire 8 such as gold or aluminum, and the other These electrodes are wire-connected to a counter electrode frame which is located away from the die-bonded frame. Thus, the die bonding and wire bonding steps are completed.
[0023]
The lead frame thus completed with wire bonding is usually molded into an arbitrary shape with a transparent or colored epoxy resin.
[0024]
In the present embodiment, after wire bonding, a resin mixed with a phosphor having a light emission wavelength different from that of the lower phosphor layer 6 is applied to the surface of the LED chip to form the upper phosphor coating layer 7 as shown in FIG. . As this phosphor, Ce (Y 3 Al 5 O 12 : Ce 3+ ), CaGaS 4 : Ce, CaGa 2 S 4 : Ce 3+ or the like can be used. Thereafter, it is further molded into an arbitrary shape with a resin.
[0025]
The emission wavelength distribution of the LED of this embodiment obtained in this way is shown in FIG. As shown in this figure, from the LED of this embodiment, the emission wavelength from the LED chip itself, the emission wavelength obtained by exciting the light emission from the LED chip itself with the lower phosphor layer, and the emission from the LED chip itself Light having three types of wavelengths, that is, an emission wavelength obtained by exciting light emission with the upper phosphor coating layer, is obtained. An arbitrary color tone can be expressed by controlling the height of the peak output of each wavelength light. The emission wavelength from the LED chip itself is controlled by current, and the emission wavelength obtained by exciting the light emission from the LED chip itself with the lower phosphor layer and the emission light from the LED chip itself are excited by the upper phosphor coating layer. The obtained emission wavelength can be controlled by the phosphor concentration.
[0026]
In FIG. 3, the light emission wavelength of the upper phosphor coating layer is set larger than the light emission wavelength of the lower phosphor layer, but the reverse is also possible. Further, two or more phosphor layers having different emission wavelengths may be formed as the lower phosphor layer, and two or more kinds of phosphors having different emission wavelengths may be applied as the upper phosphor coating layer.
[0027]
Furthermore, the present invention is not limited to LED chips made of GaN, but can also be applied to LED chips using other material systems, for example, ZnSe-based materials.
[0028]
【The invention's effect】
As described above in detail, according to the present invention, a phosphor layer in which phosphors are uniformly dispersed is provided in advance on the lower surface of the substrate substrate of the LED chip, and further, a lead frame or a conductive substrate is provided. After performing die bonding or wire bonding, it is possible to completely enclose the light emitting layer of the LED chip by applying a phosphor on the surface of the LED chip. Therefore, wavelength conversion can be performed efficiently with a small amount of phosphor, and the manufacturing cost can be reduced.
[0029]
In addition, the phosphor layer provided on the lower surface of the substrate uses a phosphor dispersed in a solid, thereby controlling the amount of phosphor by changing the concentration in the solid or changing the thickness of the solid. And variations can be prevented.
[0030]
Furthermore, by making the type of phosphor applied to the LED chip surface different from that of the phosphor layer provided on the lower surface of the substrate, it is excited by the emission wavelength of the LED itself and the lower phosphor layer. A light-emitting diode capable of emitting three types of wavelengths, the converted emission wavelength and the emission wavelength excited and converted by the upper phosphor coating layer, is obtained. Therefore, the color tone variations that can be expressed more than before can be greatly increased.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing a configuration of an LED chip according to an embodiment of the present invention.
FIG. 2 is a cross-sectional view showing a configuration of an LED according to an embodiment of the present invention.
FIG. 3 is a graph showing an emission wavelength distribution in an LED according to an embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 LED chip electrode 2 P-GaN layer 3 Light emitting layer 4 N-GaN layer 5 Sapphire substrate 6 Lower fluorescent substance layer 7 Upper fluorescent substance coating layer 8 Fine wire 9 which consists of gold wire or aluminum 9 Lead frame 10 Adhesive for die bonding

Claims (3)

基板上に、所定波長の光を発光する半導体積層構造が形成され、該基板の該半導体積層構造とは反対側の面に、前記半導体積層構造から発光される光の波長を変換させるための下部蛍光体層が1層または2層以上形成されている発光ダイオードチップが、前記下部蛍光体層とリードフレームとの間に設けられたダイボンド用接着剤によって該リードフレームにダイボンドされるとともに、前記半導体積層構造に設けられた一対の電極と前記リードフレームとがそれぞれワイヤーボンドされ、さらに、1種類または2種類以上の蛍光体が樹脂に混合された上部蛍光体層が、該発光ダイオードチップ表面に該表面および前記各電極を覆うように塗布されるとともに、前記下部蛍光体層とによって該発光ダイオードチップを完全に包み込むように、前記半導体積層構造の側面を覆って塗布されており、前記発光ダイオードチップが、前記リードフレームとともに樹脂にてモールドされていることを特徴とする発光ダイオード。 A semiconductor multilayer structure that emits light of a predetermined wavelength is formed on a substrate, and a lower surface for converting the wavelength of light emitted from the semiconductor multilayer structure on a surface opposite to the semiconductor multilayer structure of the substrate A light emitting diode chip in which one or more phosphor layers are formed is die-bonded to the lead frame by a die-bonding adhesive provided between the lower phosphor layer and the lead frame, and the semiconductor a pair of electrodes provided in the multilayer structure and the lead frame are wire-bonded, respectively, further, one or more kinds of phosphors upper phosphor layer are mixed resin, said to the light emitting diode chip surface surface and the coated so as to cover the electrodes Rutotomoni, so as to enclose the complete light emitting diode chip by said lower phosphor layer, Serial are applied over a side surface of the semiconductor laminated structure, a light emitting diode the light emitting diode chip, characterized in that it is molded by resin together with the lead frame. 前記上部蛍光体層の蛍光体は、前記半導体積層構造から発光される光の波長を、前記下部蛍光体層とは異なる波長に変換させるものである請求項1に記載の発光ダイオード。The phosphor of the upper phosphor layer, light-emitting diode according to the wavelength of the light emitted from the semiconductor stacked structure, in claim 1 is intended to be converted to a different wavelength from that of the lower phosphor layer. 前記半導体積層構造は、430nm以下の波長の光を発光する請求項1に記載の発光ダイオード。  The light emitting diode according to claim 1, wherein the semiconductor multilayer structure emits light having a wavelength of 430 nm or less.
JP2000019354A 2000-01-27 2000-01-27 Light emitting diode Expired - Fee Related JP3748355B2 (en)

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JP3407730B2 (en) 2000-11-02 2003-05-19 サンケン電気株式会社 Manufacturing method of semiconductor light emitting device
JP4191937B2 (en) * 2002-02-15 2008-12-03 株式会社日立製作所 White light source and image display apparatus using the same
US7576365B2 (en) 2004-03-12 2009-08-18 Showa Denko K.K. Group III nitride semiconductor light-emitting device, forming method thereof, lamp and light source using same
JP4667803B2 (en) * 2004-09-14 2011-04-13 日亜化学工業株式会社 Light emitting device
EP1914810B1 (en) * 2005-08-10 2017-10-04 Ube Industries, Ltd. Substrate for light emitting diode and light emitting diode
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KR100901369B1 (en) * 2007-11-19 2009-06-05 일진반도체 주식회사 White light emitting diode chip and its manufacturing method
TWI404189B (en) 2009-02-06 2013-08-01 億光電子工業股份有限公司 Multi-crystal light-emitting diode element and method of manufacturing same
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JP5050045B2 (en) 2009-12-22 2012-10-17 株式会社東芝 Light emitting device
JP5414627B2 (en) 2010-06-07 2014-02-12 株式会社東芝 Semiconductor light emitting device and manufacturing method thereof
JP5398644B2 (en) 2010-06-07 2014-01-29 株式会社東芝 Light source device using semiconductor light emitting device
TWI552391B (en) * 2014-03-06 2016-10-01 隆達電子股份有限公司 Full-circumferential light-emitting diode component and lighting module
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