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JP3753476B2 - heater - Google Patents
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JP3753476B2 - heater - Google Patents

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Publication number
JP3753476B2
JP3753476B2 JP24137696A JP24137696A JP3753476B2 JP 3753476 B2 JP3753476 B2 JP 3753476B2 JP 24137696 A JP24137696 A JP 24137696A JP 24137696 A JP24137696 A JP 24137696A JP 3753476 B2 JP3753476 B2 JP 3753476B2
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JP
Japan
Prior art keywords
shell
space
gas
heater
shells
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Expired - Lifetime
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JP24137696A
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Japanese (ja)
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JPH1064835A (en
Inventor
英樹 前田
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JTEKT Thermo Systems Corp
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Koyo Thermo Systems Co Ltd
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Priority to JP24137696A priority Critical patent/JP3753476B2/en
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Description

【0001】
【発明の属する技術分野】
本発明はヒータに関し、半導体デバイスや液晶ディスプレイ基板等の製造工程において、不純物の拡散や酸化膜の形成等を行う熱処理炉の加熱手段として利用できる。
【0002】
【従来の技術と発明が解決しようとする課題】
図7に示す従来のヒータ101は、例えば拡散炉や酸化炉等の熱処理炉に用いられるものであり、筒状の周壁102を有する断熱材と、その周壁102の内周側に設けられる発熱体103と、その周壁102の外周側を覆う単一の筒状シェル104とを備え、その断熱材により囲まれる加熱空間内で不純物の拡散や酸化膜の形成等が行われる。
【0003】
上記従来のヒータ101を用いる熱処理においては、ヒータ外部の熱的変化が内部温度に影響を与えることがある。今後は、半導体デバイスがより微細化し、より一層の均一性を要求されることが予想されるため、上記影響を極力抑える必要がある。
【0004】
そのような熱的外乱の影響は、断熱材を厚くする等して断熱効果を高め、ヒータ全体の熱容量を大きくすれば低減できる。しかし、それでは内部温度の変化速度が低下し、内部温度を所望温度まで変化させるのに長時間を要するため、内部温度を変更する際の応答性が悪くなってしまう。
【0005】
そのため、従来の熱処理炉においては、熱処理対象を保持するボートの回転駆動機構を設けることで、熱的外乱の影響を是正していた。しかし、そのような回転駆動機構は高価なものであり、構造も複雑化してしまう。
【0006】
本発明は、上記問題を解決することのできるヒータを提供することを目的とする。
【0007】
【課題を解決するための手段】
本発明のヒータは、筒形状の周壁を有する断熱材と、その周壁の内周側に設けられる発熱体と、その周壁の外周側を覆う筒形状の第1シェルと、その第1シェルの外周側を覆う筒形状の第2シェルとを備え、各シェルは互いに径方向の間隔をおいて配置されていることを特徴とする。
【0008】
本発明の構成によれば、第1シェルと第2シェルは互いに径方向の間隔をおいて配置されるので、両シェル間にヒータの外部よりも熱的に安定した空間を形成できる。これにより、従来のような単一のシェルにより覆われるヒータに比べ、断熱材を厚くして熱容量を大きくすることなく、断熱材に囲まれる内部空間における温度に対する熱的外乱の影響を小さくできる。
【0009】
本発明のヒータにおいて、両シェル間の空間においてガスを層流状態で軸方向に強制流動させる手段を備え、そのガス流速は調節可能とされ、両シェル間の空間に導入されたガスは、前記断熱材により覆われる加熱空間内に至ることなくその空間から排出される
両シェル間の空間においては内外温度差に基づき自然対流が生じるが、その空間においてガスを層流状態でシェルの軸方向に強制流動させ、そのガス流速を自然対流の影響を受けることのない充分な大きさにすることで、その空間を自然対流の影響を受けることのないよう熱的に安定した空間にすることができる。
【0010】
本発明のヒータにおける各シェルの内外周は同心の円筒面上に配置され、その円筒と同心の円環形状の分散部材が両シェル間に配置され、その分散部材に複数のガス流通孔が均一に分布するように形成され、それらガス流通孔を介して両シェル間の空間に前記ガスが送り込まれるのが好ましい。
これにより、両シェル間の空間におけるガス流を均一化でき、その空間を熱的により均一化することができる。
【0011】
【発明の実施の形態】
以下、図面を参照して本発明の第1実施形態を説明する。
図1に示す熱処理炉1は、ヒータ2と、このヒータ2により覆われる加熱空間内に配置される炉芯管3と、その炉芯管3内において半導体基板等の処理対象物4を保持するボート5と、そのボート5の炉内への出し入れを行う昇降装置6とを備える。
【0012】
そのヒータ2は、断熱材11、発熱体12、第1シェル13、および第2シェル14を備える。その断熱材11は、縦軸心の円筒形状を有する周壁21と、この周壁21の上部を覆う上壁22とにより構成され、その周壁21の内方が上記加熱空間とされる。その周壁21の下端と炉芯管3との間は環状ヒータ支持ベース23により閉鎖され、その炉心管3の下方は昇降装置6により閉鎖される。
【0013】
その発熱体12は、その周壁21の内周側に設けられる複数の抵抗発熱線12aにより構成される。すなわち、図2に示すように、その周壁21の内周に上下方向に沿う溝21aが周方向に一定間隔をおいて複数形成される。各抵抗発熱線12aは、線材を蛇行状に曲げることで、上下に並列する直線部と湾曲部とを有する形状とされる。各溝21a内の上部、下部、および上下中間部それぞれにおいて、その抵抗発熱線12aは直線部が露出すると共に湾曲部が断熱材11に埋め込まれる。なお、各抵抗発熱線12aは独立して発熱制御可能とされる。
【0014】
その第1シェル13と第2シェル14とは金属製で縦軸心の円筒形状を有し、その第1シェル13により上記周壁21の外周側が覆われ、その第2シェル14により第1シェル13の外周側が覆われる。すなわち、その第1シェル13の外径は第2シェル14の内径よりも小さくされ、各シェル13、14の内外周は同心の円筒面上に配置されることで、各シェル13、14は互いに径方向の間隔をおいて配置される。その第1シェル13は、内径が周壁21の外径と略等しくされ、その周壁21に固定される。各シェル13、14の下端部は円環形状の金属製下部カバー24に固定され、上端部は円環形状の金属製上部カバー25に固定される。これにより、ヒータ2は2重シェル構造とされている。
【0015】
その第1シェル13と第2シェル14との間の空間31において、ガスを層流状態でシェル13、14の軸方向に強制流動させる手段を備える。すなわち、その下部カバー24に形成されるガス導入口24aに接続される給気用配管32を介して、その空間31内にガス供給源(図示省略)からの高圧ガスが導入され、その上部カバー25に形成されるガス排出口25aに接続される排気用配管33を介して導入されたガスが排出される。そのガスとしては、例えば窒素ガス等の不活性ガスや空気等を用いることができる。その給気用配管32の途中に流量計35が設けられ、その排気用配管33の途中に排気圧コントロールバルブ36が設けられ、その排気圧を制御することで空間31におけるガス流速は調節可能とされている。その流量計35の下流側と排気圧コントロールバルブ36の上流側とに開閉バルブ38、39が設けられ、そのガスの流動を停止させることができる。なお、そのガス導入口24aおよびガス排出口25aの数は特に限定されない。
【0016】
そのガス流速の調節により、そのガスを空間31において層流状態で軸方向に沿って下方から上方に強制流動させ、また、そのガス流速を自然対流の影響を受けることのない充分な大きさにすることができる。
なお、そのガス流速の具体的な値は、理論計算を参考にして設定することができる。例えば、その第1シェル13の外周面と第2シェル14の内周面とを平板と仮定し、その空間31の下端における第1シェル13の外周面から上方へy座標、径方向外方へx座標をとり、第1シェル13の外周面温度をTw、第2シェル14の内周面温度をT∞、その流体のプラントル数をPr、そのx座標でのグラスホフ数をGrx、重力加速度をgとした場合、その空間31におけるxy座標での自然対流によるガス流速Vxは、ポールハウゼンによってPrに応じて求められた(y/x)×(Grx/4)1/4 と〔Vx/{2×(g×x)1/2 }〕×{T∞/(Tw−T∞)}1/2 との関係から求められる。その求めた自然対流によるガス流速Vxに対して、強制流動によるガス流速を層流を維持できる速度の範囲内で充分に大きな値(例えば20倍程度以上)に設定する。ここで、その第1シェル13の外径を0.5m、第2シェル14の内径を0.6m、空間31の軸方向長さを0.7m、Twを670°K、T∞を418°K、x=0.025m、y=0.35m、流体を窒素とした場合、その理論計算によれば自然対流によるガス流速Vxは約0.0098m/secとなる。また、層流を維持できる上限のガス流速は0.76m/secであり、この場合のガス流量は4100リットル/minである。よって、ガス流量を100リットル/minとすれば、ガス流速を約0.019m/secとして自然対流の影響を受けることのない充分な大きさにすることができる。
【0017】
その第1シェル13と第2シェル14との間の下部に、各シェル13、14の内外周と同心の円環形状を有する分散部材41が配置される。図3に示すように、その分散部材41には、ガス導入口24aよりも多数かつ小径のガス流通孔41aが均一に分布するように形成され、それらガス流通孔41aを介して空間31に上記ガスが送り込まれる。
【0018】
上記ヒータ2によれば、第1シェル13と第2シェル14は互いに径方向の間隔をおいて配置されるので、両シェル13、14の間にヒータ2の外部よりも熱的に安定した空間31を形成できる。これにより、従来のような単一のシェルにより覆われるヒータに比べ、断熱材を厚くして熱容量を大きくすることなく、断熱材11に囲まれる内部空間における温度に対する熱的外乱の影響を小さくできる。
また、両シェル13、14間の空間31においては内外温度差に基づき自然対流が生じるが、その空間31においてガスを層流状態で軸方向に強制流動させ、そのガス流速を自然対流の影響を受けることのない充分な大きさにすることで、その空間31を自然対流の影響を受けることのないより熱的に安定した空間にすることができる。
さらに、そのガスは分散部材41における均一に分布するガス流通孔41aを介して空間31内に送り込まれるので、その空間31におけるガス流を均一化でき、その空間31を熱的により均一化することができる。
これにより、例えば熱処理炉1において処理対象面に形成される酸化膜の膜厚分布の均一化を図ることができる、しかも、ヒータ2の内部温度を変更する際の応答性を低下させることはない。
【0019】
図4は本発明の第2実施形態を示す。第1実施形態との相違は、分散部材41を第1シェル13と第2シェル14との間の空間31の上部に配置し、上部カバー25にガス導入口25bを形成し、下部カバー24にガス排出口24bを形成し、両シェル13、14間の空間31にガスを上方側から導入して下方側から排気する点にある。他は第1実施形態と同様で、同一部分は同一符号で示す。
図5は本発明の第3実施形態を示す。第1実施形態との相違は、分散部材41を第1シェル13と第2シェル14との間の空間31の上部に配置し、上部カバー25にガス導入口25bを形成し、上部カバー25と分散部材41とに排気用配管33の挿通口25c、41bを形成し、その排気用配管33の端部開口を空間31の下部に配置してガス排出口33aとし、ガスを空間31に上方側から導入して上方側から排気する点にある。他は第1実施形態と同様で、同一部分は同一符号で示す。
図6は本発明の第4実施形態を示す。第1実施形態との相違は、下部カバー24と分散部材41とに排気用配管33の挿通口24c、41bを形成し、その排気用配管33の端部開口を空間31の上部に配置してガス排出口33aとし、ガスを空間31に下方側から導入して下方側から排気する点にある。他は第1実施形態と同様で、同一部分は同一符号で示す。
【0020】
なお、本発明は上記実施形態に限定されない。例えば、第2シェルの外周側を覆う別のシェルを設けて3重以上のシェル構造としてもよい。また、上記実施形態では第1シェルにより断熱材の外周側を直接に覆ったが、第1シェルと断熱材との間に介在する別のシェルを設けることで3重以上のシェル構造としてもよい。要は、断熱材の外周側を覆う第1シェルと、この第1シェルの外周側を径方向の間隔をおいて覆う第2シェルとを備えていればよい。また、発熱体の構造は特に限定されず、例えば断熱材の内周に螺旋状に設けられるものでもよい。
【0021】
【発明の効果】
本発明によれば、断熱材に囲まれる空間における温度を安定させ、且つ、その温度を変更する際の応答性を低下させることのないヒータを提供できる。
【図面の簡単な説明】
【図1】本発明の第1実施形態のヒータを備える熱処理炉の縦断面図
【図2】本発明の第1実施形態のヒータの部分斜視図
【図3】本発明の第1実施形態のヒータの平断面図
【図4】本発明の第2実施形態のヒータを備える熱処理炉の構成説明図
【図5】本発明の第3実施形態のヒータを備える熱処理炉の構成説明図
【図6】本発明の第4実施形態のヒータを備える熱処理炉の構成説明図
【図7】従来のヒータを備える熱処理炉の断面図
【符号の説明】
11 断熱材
12 発熱体
13、14 シェル
21 周壁
31 空間
32 給気用配管
33 排気用配管
41 分散部材
41a ガス流通孔
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a heater, and can be used as a heating means for a heat treatment furnace that performs diffusion of impurities, formation of an oxide film, and the like in a manufacturing process of a semiconductor device, a liquid crystal display substrate, and the like.
[0002]
[Prior art and problems to be solved by the invention]
A conventional heater 101 shown in FIG. 7 is used in a heat treatment furnace such as a diffusion furnace or an oxidation furnace, and includes a heat insulating material having a cylindrical peripheral wall 102 and a heating element provided on the inner peripheral side of the peripheral wall 102. 103 and a single cylindrical shell 104 covering the outer peripheral side of the peripheral wall 102, diffusion of impurities, formation of an oxide film, and the like are performed in a heating space surrounded by the heat insulating material.
[0003]
In the heat treatment using the conventional heater 101, a thermal change outside the heater may affect the internal temperature. In the future, it is expected that semiconductor devices will be made finer and more uniform, and it is necessary to suppress the above effects as much as possible.
[0004]
The influence of such a thermal disturbance can be reduced by increasing the heat capacity of the entire heater by increasing the heat insulating effect by increasing the thickness of the heat insulating material. However, the rate of change of the internal temperature is reduced, and it takes a long time to change the internal temperature to the desired temperature, so that the responsiveness when changing the internal temperature is deteriorated.
[0005]
Therefore, in the conventional heat treatment furnace, the influence of the thermal disturbance has been corrected by providing a boat rotation drive mechanism for holding the heat treatment object. However, such a rotational drive mechanism is expensive and the structure is complicated.
[0006]
An object of this invention is to provide the heater which can solve the said problem.
[0007]
[Means for Solving the Problems]
The heater of the present invention includes a heat insulating material having a cylindrical peripheral wall, a heating element provided on the inner peripheral side of the peripheral wall, a cylindrical first shell covering the outer peripheral side of the peripheral wall, and an outer periphery of the first shell And a second shell having a cylindrical shape covering the side, and the shells are arranged with a radial interval therebetween.
[0008]
According to the configuration of the present invention, since the first shell and the second shell are arranged at a radial interval from each other, a thermally stable space can be formed between both shells as compared with the outside of the heater. Thereby, the influence of the thermal disturbance with respect to the temperature in the internal space surrounded by a heat insulating material can be made small, without thickening a heat insulating material and enlarging a heat capacity compared with the heater covered with the conventional single shell.
[0009]
In the heater of the present invention, it is provided with means for forcibly flowing the gas in the axial direction in a laminar flow state in the space between both shells, the gas flow rate can be adjusted, and the gas introduced into the space between both shells is It is discharged from the space without reaching the heating space covered with the heat insulating material .
Natural convection occurs in the space between the two shells based on the internal and external temperature differences, but the gas is forced to flow in the axial direction of the shell in a laminar flow state, and the gas flow rate is not affected by natural convection. By making it large, the space can be made into a thermally stable space so as not to be affected by natural convection.
[0010]
In the heater of the present invention, the inner and outer circumferences of each shell are arranged on a concentric cylindrical surface, an annular dispersion member concentric with the cylinder is arranged between both shells, and a plurality of gas flow holes are uniformly formed in the dispersion member. Preferably, the gas is fed into the space between the shells through the gas flow holes.
Thereby, the gas flow in the space between both shells can be made uniform, and the space can be made more uniform thermally.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a first embodiment of the present invention will be described with reference to the drawings.
A heat treatment furnace 1 shown in FIG. 1 holds a heater 2, a furnace core tube 3 arranged in a heating space covered by the heater 2, and a processing object 4 such as a semiconductor substrate in the furnace core pipe 3. A boat 5 and an elevating device 6 for taking the boat 5 into and out of the furnace are provided.
[0012]
The heater 2 includes a heat insulating material 11, a heating element 12, a first shell 13, and a second shell 14. The heat insulating material 11 is constituted by a peripheral wall 21 having a cylindrical shape with a vertical axis and an upper wall 22 covering the upper portion of the peripheral wall 21, and the inside of the peripheral wall 21 is the heating space. The lower end of the peripheral wall 21 and the furnace core tube 3 are closed by an annular heater support base 23, and the lower part of the furnace core tube 3 is closed by an elevating device 6.
[0013]
The heating element 12 includes a plurality of resistance heating wires 12 a provided on the inner peripheral side of the peripheral wall 21. That is, as shown in FIG. 2, a plurality of grooves 21a extending in the vertical direction are formed on the inner periphery of the peripheral wall 21 at regular intervals in the circumferential direction. Each resistance heating wire 12a is formed into a shape having a straight portion and a curved portion arranged in parallel vertically by bending the wire in a meandering manner. In each of the upper portion, the lower portion, and the upper and lower intermediate portions in each groove 21a, the resistance heating wire 12a has a straight portion exposed and a curved portion embedded in the heat insulating material 11. Each resistance heating wire 12a can be controlled to generate heat independently.
[0014]
The first shell 13 and the second shell 14 are made of metal and have a cylindrical shape with a longitudinal axis. The outer peripheral side of the peripheral wall 21 is covered by the first shell 13, and the first shell 13 is covered by the second shell 14. The outer peripheral side of is covered. That is, the outer diameter of the first shell 13 is made smaller than the inner diameter of the second shell 14, and the inner and outer peripheries of the shells 13 and 14 are arranged on a concentric cylindrical surface so that the shells 13 and 14 are mutually connected. Arranged at intervals in the radial direction. The first shell 13 has an inner diameter substantially equal to the outer diameter of the peripheral wall 21 and is fixed to the peripheral wall 21. The lower ends of the shells 13 and 14 are fixed to an annular metal lower cover 24, and the upper ends are fixed to an annular metal upper cover 25. Thereby, the heater 2 has a double shell structure.
[0015]
In the space 31 between the first shell 13 and the second shell 14, there is provided means for forcibly flowing the gas in the axial direction of the shells 13 and 14 in a laminar flow state. That is, a high-pressure gas from a gas supply source (not shown) is introduced into the space 31 through an air supply pipe 32 connected to a gas introduction port 24a formed in the lower cover 24, and the upper cover The gas introduced through the exhaust pipe 33 connected to the gas discharge port 25a formed in 25 is discharged. As the gas, for example, an inert gas such as nitrogen gas or air can be used. A flow meter 35 is provided in the middle of the air supply pipe 32, and an exhaust pressure control valve 36 is provided in the middle of the exhaust pipe 33. By controlling the exhaust pressure, the gas flow rate in the space 31 can be adjusted. Has been. Opening / closing valves 38 and 39 are provided on the downstream side of the flow meter 35 and the upstream side of the exhaust pressure control valve 36 to stop the gas flow. The number of gas inlets 24a and gas outlets 25a is not particularly limited.
[0016]
By adjusting the gas flow rate, the gas is forced to flow from the lower side to the upper side in the axial direction in the laminar state in the space 31, and the gas flow rate is made sufficiently large so as not to be affected by natural convection. can do.
In addition, the specific value of the gas flow rate can be set with reference to theoretical calculation. For example, assuming that the outer peripheral surface of the first shell 13 and the inner peripheral surface of the second shell 14 are flat plates, the y coordinate and the radial outward direction are upward from the outer peripheral surface of the first shell 13 at the lower end of the space 31. Taking the x coordinate, the outer peripheral surface temperature of the first shell 13 is Tw, the inner peripheral surface temperature of the second shell 14 is T∞, the Prandtl number of the fluid is Pr, the Grashof number at the x coordinate is Grx, and the gravitational acceleration is In the case of g, the gas flow velocity Vx due to natural convection in the xy coordinates in the space 31 is (y / x) × (Grx / 4) 1/4 and [Vx / { 2 × (g × x) 1/2 }] × {T∞ / (Tw−T∞)} 1/2 . The gas flow rate by forced flow is set to a sufficiently large value (for example, about 20 times or more) within the range where the laminar flow can be maintained with respect to the gas flow rate Vx by natural convection. Here, the outer diameter of the first shell 13 is 0.5 m, the inner diameter of the second shell 14 is 0.6 m, the axial length of the space 31 is 0.7 m, Tw is 670 ° K, and T∞ is 418 °. When K, x = 0.025 m, y = 0.35 m, and the fluid is nitrogen, according to the theoretical calculation, the gas flow velocity Vx by natural convection is about 0.0098 m / sec. Moreover, the upper limit gas flow rate which can maintain a laminar flow is 0.76 m / sec, and the gas flow rate in this case is 4100 liters / min. Therefore, if the gas flow rate is 100 liters / min, the gas flow rate can be set to a sufficient size without being influenced by natural convection by about 0.019 m / sec.
[0017]
A dispersion member 41 having an annular shape concentric with the inner and outer peripheries of the shells 13 and 14 is disposed at a lower portion between the first shell 13 and the second shell 14. As shown in FIG. 3, the dispersion member 41 is formed so that a large number of gas flow holes 41a having a smaller diameter than the gas introduction ports 24a are uniformly distributed, and the above-described space 31 is introduced into the space 31 through the gas flow holes 41a. Gas is sent in.
[0018]
According to the heater 2, since the first shell 13 and the second shell 14 are arranged at a radial interval from each other, a space that is more thermally stable than the outside of the heater 2 between the shells 13 and 14. 31 can be formed. Thereby, compared with the heater covered with the single shell like the past, the influence of the thermal disturbance with respect to the temperature in the internal space enclosed by the heat insulating material 11 can be made small, without thickening a heat insulating material and enlarging a heat capacity. .
In addition, natural convection occurs in the space 31 between the shells 13 and 14 based on the internal and external temperature difference. In the space 31, gas is forced to flow in the axial direction in a laminar flow state, and the gas flow velocity is influenced by the natural convection. By making it large enough not to be received, the space 31 can be made a more thermally stable space that is not affected by natural convection.
Furthermore, since the gas is fed into the space 31 through the gas distribution holes 41a that are uniformly distributed in the dispersion member 41, the gas flow in the space 31 can be made uniform, and the space 31 can be made more uniform thermally. Can do.
Thereby, for example, the film thickness distribution of the oxide film formed on the surface to be processed in the heat treatment furnace 1 can be made uniform, and the responsiveness when changing the internal temperature of the heater 2 is not lowered. .
[0019]
FIG. 4 shows a second embodiment of the present invention. The difference from the first embodiment is that the dispersion member 41 is arranged in the upper part of the space 31 between the first shell 13 and the second shell 14, the gas inlet 25 b is formed in the upper cover 25, and the lower cover 24 is A gas discharge port 24b is formed, and the gas is introduced into the space 31 between the shells 13 and 14 from the upper side and exhausted from the lower side. Others are the same as in the first embodiment, and the same parts are denoted by the same reference numerals.
FIG. 5 shows a third embodiment of the present invention. The difference from the first embodiment is that the dispersion member 41 is arranged in the upper part of the space 31 between the first shell 13 and the second shell 14, the gas inlet 25 b is formed in the upper cover 25, and the upper cover 25 Insertion ports 25 c and 41 b of the exhaust pipe 33 are formed in the dispersion member 41, and an end opening of the exhaust pipe 33 is arranged in the lower part of the space 31 to serve as a gas exhaust port 33 a, and the gas flows upward into the space 31. It is in the point which introduce | transduces from above and exhausts from the upper side. Others are the same as in the first embodiment, and the same parts are denoted by the same reference numerals.
FIG. 6 shows a fourth embodiment of the present invention. The difference from the first embodiment is that the insertion holes 24 c and 41 b of the exhaust pipe 33 are formed in the lower cover 24 and the dispersion member 41, and the end opening of the exhaust pipe 33 is arranged in the upper part of the space 31. The gas discharge port 33a is used to introduce gas into the space 31 from the lower side and exhaust from the lower side. Others are the same as in the first embodiment, and the same parts are denoted by the same reference numerals.
[0020]
In addition, this invention is not limited to the said embodiment. For example, another shell that covers the outer peripheral side of the second shell may be provided to form a triple or more shell structure. Moreover, in the said embodiment, although the outer peripheral side of the heat insulating material was directly covered with the 1st shell, it is good also as a shell structure more than triple by providing another shell interposed between a 1st shell and a heat insulating material. . In short, it is only necessary to include a first shell that covers the outer peripheral side of the heat insulating material and a second shell that covers the outer peripheral side of the first shell with a radial interval. Moreover, the structure of a heat generating body is not specifically limited, For example, what is provided helically in the inner periphery of a heat insulating material may be used.
[0021]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to this invention, the temperature in the space enclosed with a heat insulating material can be stabilized, and the heater which does not reduce the responsiveness at the time of changing the temperature can be provided.
[Brief description of the drawings]
FIG. 1 is a longitudinal sectional view of a heat treatment furnace equipped with a heater according to the first embodiment of the present invention. FIG. 2 is a partial perspective view of the heater according to the first embodiment of the present invention. Fig. 4 is a plan sectional view of the heater. Fig. 4 is a diagram illustrating the configuration of a heat treatment furnace including the heater according to the second embodiment of the present invention. Fig. 5 is a diagram illustrating the configuration of a heat treatment furnace including the heater according to the third embodiment of the present invention. FIG. 7 is a structural explanatory view of a heat treatment furnace equipped with a heater according to a fourth embodiment of the present invention. FIG. 7 is a cross-sectional view of a heat treatment furnace equipped with a conventional heater.
DESCRIPTION OF SYMBOLS 11 Heat insulating material 12 Heat generating body 13 and 14 Shell 21 Perimeter wall 31 Space 32 Supply pipe 33 Exhaust pipe 41 Dispersing member 41a Gas distribution hole

Claims (2)

筒形状の周壁を有する断熱材と、
その周壁の内周側に設けられる発熱体と、
その周壁の外周側を覆う筒形状の第1シェルと、
その第1シェルの外周側を覆う筒形状の第2シェルとを備え、
各シェルは互いに径方向の間隔をおいて配置され
両シェル間の空間においてガスを層流状態で軸方向に強制流動させる手段を備え、そのガス流速は調節可能とされ、
両シェル間の空間に導入されたガスは、前記断熱材により覆われる加熱空間内に至ることなくその空間から排出されるヒータ。
A heat insulating material having a cylindrical peripheral wall;
A heating element provided on the inner peripheral side of the peripheral wall;
A cylindrical first shell covering the outer peripheral side of the peripheral wall;
A cylindrical second shell covering the outer peripheral side of the first shell,
Each shell is arranged at a radial distance from each other ,
A means for forcibly flowing the gas in the axial direction in a laminar flow state in the space between both shells, the gas flow rate is adjustable,
A heater in which the gas introduced into the space between the two shells is discharged from the space without reaching the heating space covered with the heat insulating material .
各シェルの内外周は同心の円筒面上に配置され、その円筒面と同心の円環形状の分散部材が両シェル間に配置され、その分散部材に複数のガス流通孔が均一に分布するように形成され、それらガス流通孔を介して両シェル間の空間に前記ガスが送り込まれる請求項1に記載のヒータ。 The inner and outer peripheries of each shell are arranged on a concentric cylindrical surface, and an annular dispersion member concentric with the cylindrical surface is arranged between both shells so that a plurality of gas flow holes are uniformly distributed in the dispersion member. The heater according to claim 1 , wherein the gas is fed into a space between both shells through the gas flow holes .
JP24137696A 1996-08-22 1996-08-22 heater Expired - Lifetime JP3753476B2 (en)

Priority Applications (1)

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JP24137696A JP3753476B2 (en) 1996-08-22 1996-08-22 heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24137696A JP3753476B2 (en) 1996-08-22 1996-08-22 heater

Publications (2)

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JPH1064835A JPH1064835A (en) 1998-03-06
JP3753476B2 true JP3753476B2 (en) 2006-03-08

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Publication number Priority date Publication date Assignee Title
JP4669465B2 (en) * 2006-11-08 2011-04-13 株式会社日立国際電気 Substrate processing apparatus, semiconductor device manufacturing method, heating apparatus, and heat insulating material
JP5139734B2 (en) * 2007-06-25 2013-02-06 株式会社日立国際電気 Substrate processing apparatus and heating apparatus used therefor
JP4435221B2 (en) * 2007-09-07 2010-03-17 株式会社日立国際電気 Empty baking method for heat treatment equipment
JP2011103469A (en) * 2010-12-02 2011-05-26 Hitachi Kokusai Electric Inc Substrate processing apparatus, method of manufacturing semiconductor device, heating device, and heat insulating material

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