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JP3793866B2 - Method for correcting defective pixels in liquid crystal display panel - Google Patents
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JP3793866B2 - Method for correcting defective pixels in liquid crystal display panel - Google Patents

Method for correcting defective pixels in liquid crystal display panel Download PDF

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Publication number
JP3793866B2
JP3793866B2 JP37581098A JP37581098A JP3793866B2 JP 3793866 B2 JP3793866 B2 JP 3793866B2 JP 37581098 A JP37581098 A JP 37581098A JP 37581098 A JP37581098 A JP 37581098A JP 3793866 B2 JP3793866 B2 JP 3793866B2
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Prior art keywords
irradiation
defective pixel
laser beam
liquid crystal
display panel
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JP37581098A
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JP2000180811A (en
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聖純 鹿内
喜久 加藤
英裕 森田
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Casio Computer Co Ltd
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Casio Computer Co Ltd
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Description

【0001】
【発明の属する技術分野】
この発明は液晶表示パネルの欠陥画素修正方法に関する。
【0002】
【従来の技術】
例えば、スイッチング素子として薄膜トランジスタを備えたアクティブマトリクス型の液晶表示パネルでは、薄膜トランジスタの製造欠陥等により、それに対応する画素電極に駆動電圧が印加されない場合、ノーマリホワイト方式であると、当該画素電極に対応する画素が常時輝点となり、画質が低下してしまう。そこで、従来では、このような欠陥画素を修正している。
【0003】
次に、従来の欠陥画素修正方法の一例について説明するに、まず、図8(A)を参照して、液晶表示パネルの構造について簡単に説明する。この液晶表示パネルは一対のガラス基板1、2を備えている。一方のガラス基板1の下面にはITOからなる画素電極3及び薄膜トランジスタ4がマトリクス状に設けられ、その下面には配向膜5が設けられている。他方のガラス基板2の上面にはブラックマスク6、カラーフィルタ7、ITOからなる共通電極8及び配向膜9が設けられている。そして、両ガラス基板1、2は図示しないシール材を介して互いに貼り合わされ、その間には液晶10が封入されている。
【0004】
さて、この液晶表示パネルのある薄膜トランジスタ4に製造欠陥がある場合には、図8(B)において矢印で示すように、それに対応する画素電極3の部分のほぼ中央部に第1のレーザビームを照射して、当該画素電極3の部分における液晶10中に気泡11を発生させ、次に、当該画素電極3の部分に第2のレーザビームを1箇所または複数箇所照射して、当該画素電極3及びその下の配向膜5を物理的に破壊する。これにより生じた破壊物は気泡11内に留められる。この後、気泡11は消滅する。そして、当該破壊領域における液晶10が常時垂直方向または水平方向に配向され、当該破壊領域における画素が常時黒表示となる。かくして、欠陥画素が修正される。
【0005】
【発明が解決しようとする課題】
ところで、従来のこのような欠陥画素修正方法において、第2のレーザビームを照射しても欠陥の程度により黒表示になりきれず輝点として視認される場合ある。このため、第2のレーザビームの照射をビーム径を小さくして連続的に照射することにより修正の精度を向上する検討がなされている。この方法は、例えば、図9において矢印で示すように、欠陥画素12(ここでいう画素とは、1の画素電極3のうちブラックマスク6によって覆われていない部分によって構成される画素のことをいう。)に対して、まず、欠陥画素12の右下隅の白丸印で示す照射開始点から左方向に連続して照射し、次いで上側に所定のピッチずれた位置において左側から右方向に連続して照射し、次いで上側に所定のピッチずれた位置において右側から左方向に連続して照射し、以下このような照射を繰り返して、欠陥画素12の右上隅の黒丸印で示す照射終了点において照射を終了している。この欠陥画素修正方法では、欠陥画素12全体をほぼ満遍なく照射しているので、欠陥画素12の修正が十分であると思われるが、それでも十分でなく、光漏れがやや発生することが分かった。これは、後で説明する実験結果から、照射ラインが不連続であり、特に欠陥画素12の周辺部を十分に照射していないことに起因すると思われる。
この発明の課題は、光漏れをより一層減少することができるように、欠陥画素を修正することである。
【0006】
【課題を解決するための手段】
この発明は、一対の基板間に液晶が封入された液晶表示パネルの欠陥画素の部分にレーザビームを照射して前記欠陥画素の部分を物理的に破壊し、これにより前記欠陥画素を修正する液晶表示パネルの欠陥画素修正方法において、前記レーザビームの照射パターンは少なくとも前記欠陥画素のほぼ全体を走査しているものであり、かつ、各辺の周辺部に沿ってそのほぼ全長をライン状に連続して照射する第1の照射パターンとその内側を走査する第2の照射パターンとを含むようにしたものである。この発明によれば、レーザビームを少なくとも欠陥画素の各辺の周辺部に沿ってそのほぼ全長をライン状に連続して照射しているので、当該欠陥画素常時黒表示となり、光漏れをより一層減少することができる。
【0007】
【発明の実施の形態】
図1〜図6はそれぞれこの発明の液晶表示パネルの欠陥画素修正方法の第1〜第6の例における第2のレーザビームの照射パターンを示したものである。なお、いずれの例においても、欠陥画素12の部分における液晶中に気泡を発生されるための第1のレーザビームのビームサイズは10〜30μmφ(望ましくは20μmφ)とし、エネルギ密度は10〜30J/cm2(望ましくは20J/cm2 であり、欠陥画素12の部分における画素電極及び配向膜を物理的に破壊するための第2のレーザビームのビームサイズは1〜4μmφ(望ましくは2〜3μmφ)とし、エネルギ密度は70〜100J/cm2である。また、第2のレーザビームは、20Hzの矩形波とし、照射時の走査速度は、前回の照射領域と次の照射領域とが、僅かに重複する程度の速度、換言すれば、照射領域が丁度連続する程度の速度とした。
【0008】
さて、図1に示す第1の例における第2のレーザビームの照射パターンでは、まず、欠陥画素12の右下隅の白丸印で示す照射開始点から欠陥画素12の周辺部に沿って時計方向にほぼ一周連続して照射した。この場合の照射ラインaは欠陥画素12のエッジ部からt=7.5μm離れた位置とした。次に、欠陥画素12の右下隅から左方向に連続して照射し、次いで上側に所定のピッチずれた位置において左側から右方向に連続して照射し、次いで上側に所定のピッチずれた位置において右側から左方向に連続して照射し、以下このような照射を繰り返して、欠陥画素12の右上隅の黒丸印で示す照射終了点において照射を終了した。この場合のピッチPは20μmとした。
【0009】
次に、図2に示す第2の例における第2のレーザビームの照射パターンでは、図1に示す場合と逆とした。すなわち、まず、欠陥画素12の右上隅の白丸印で示す照射開始点から左方向に連続して照射し、次いで下側に所定のピッチずれた位置において左側から右方向に連続して照射し、次いで下側に所定のピッチずれた位置において右側から左方向に連続して照射し、以下このような照射を繰り返して、欠陥画素12の右下隅まで照射した。この場合のピッチPは20μmとした。次に、欠陥画素12の右下隅から欠陥画素12の周辺部に沿って反時計方向にほぼ一周連続して照射し、欠陥画素12の右下隅の黒丸印で示す照射終了点において照射を終了した。この場合の照射ラインaは欠陥画素12のエッジ部からt=7.5μm離れた位置とした。
【0010】
次に、図3に示す第3の例における第2のレーザビームの照射パターンでは、まず、図2に示す場合と同様の照射を行った。次に、欠陥画素12の右下隅から上方向に連続して照射し、次いで左側に所定のピッチずれた位置において上側から下方向に連続して照射し、次いで左側に所定のピッチずれた位置において下側から上方向に連続して照射し、以下このような照射を繰り返して、欠陥画素12の左上隅の黒丸印で示す照射終了点において照射を終了した。この場合のピッチPも20μmとした。
【0011】
次に、図4に示す第4の例における第2のレーザビームの照射パターンでは、欠陥画素12の右下隅の白丸印で示す照射開始点から欠陥画素12の中央部よりもやや下側の黒丸印で示す照射終了点まで、欠陥画素12の周辺部に沿うほぼ全周及びその内側の領域を時計方向で内側に向かって角渦巻状に連続して照射した。この場合の欠陥画素12の周辺部に沿う照射ラインaは欠陥画素12のエッジ部からt=7.5μm離れた位置とした。また、この照射ラインaの内側におけるピッチPは14μmとした。
【0012】
次に、図5に示す第5の例における第2のレーザビームの照射パターンでは、欠陥画素12の中心部よりもやや右下側の白丸印で示す照射開始点から欠陥画素12の中心部よりもやや左下側の黒丸印で示す照射終了点まで、欠陥画素12の周辺部に沿うほぼ全周及びその内側の領域を所謂一筆書き状に且つどこにおいても交差しないように満遍なく照射した。この場合の欠陥画素12の周辺部に沿う照射ラインaは欠陥画素12のエッジ部からt=7.5μm離れた位置とした。また、この照射ラインaの内側におけるピッチPは20μmとした。
【0013】
次に、図6に示す第6の例における第2のレーザビームの照射パターンでは、欠陥画素12の中央部よりもやや下側の白丸印で示す照射開始点から欠陥画素12の中心部の黒丸印で示す照射終了点まで、欠陥画素12の周辺部に沿うほぼ全周及びその内側の領域を所謂一筆書き状に且つ交差したり重合したりして満遍なく照射した。この場合の欠陥画素12の周辺部に沿う照射ラインaは欠陥画素12のエッジ部からt=10μm離れた位置とした。また、この照射ラインaの内側におけるピッチPは20μmとした。
【0014】
なお、図9に示す従来の第2のレーザビームの照射パターンの場合には、図1に示す第1の例における第2のレーザビームの照射パターンのうち、欠陥画素12の周辺部における照射ラインaを照射しない場合と同じ照射パターンである。以下、この図9に示す照射パターンを従来例における第2のレーザビームの照射パターンという。
【0015】
そして、第1〜第6の例及び従来例における第2のレーザビームの照射をそれぞれ複数回ずつ行い、各Y値を調べたところ、図7に示す結果が得られた。この図において、第5の例の変形例とは、図5に示す第5の例における第2のレーザビームの照射パターンのうち、黒丸印で示す照射終了点においてのみエネルギ密度を適宜に下げた場合の例である。白三角印は各例における平均値を示す。
【0016】
図7から明らかなように、従来例の場合には、Y値がすべて0.07以上でその平均値は0.09程度であり、光漏れがやや大きい。これに対し、第1の例、第3〜第6の例及び第5の例の変形例の場合には、Y値がすべて0.07以下である。第2の例の場合には、Y値が0.07よりもやや大きいものもあるが、その平均値は0.06よりも小さい。したがって、第1〜第6の例及び第5の例の変形例の共通点である、第2のレーザビームを欠陥画素12の各辺の周辺部に沿ってそのほぼ全長をライン状に連続して照射すると、光漏れをより一層減少することができる。
【0017】
ところで、第1〜第6の例のうち第5の例のY値の平均値が0.05程度で最も小さい。したがって、第1〜第6の例のうち第5の例が最も望ましい。そこで、第5の例を第1〜第4及び第6の例と比較してみると、第2のレーザビームの照射開始点及び照射終了点が欠陥画素12のほぼ中央部であること、第2のレーザビームの照射点が照射開始点から照射終了点までライン状に連続していること、第2のレーザビームの照射ラインがどこにおいても交差していないことが挙げられる。
【0018】
そこで、図1に示す第1の例の場合には、一部について説明すると、欠陥画素12の右下隅から左方向に連続して照射した後、上方向にピッチPの分だけ連続して照射するようにしてもよい。また、図2に示す第2の例の場合には、これも一部について説明すると、欠陥画素12の右上隅の白丸印で示す照射開始点からから左方向に連続して照射した後、下方向にピッチPの分だけ連続して照射するようにしてもよい。さらに、図3に示す第3の例の場合には、これも一部について説明すると、欠陥画素12の周辺部に沿って照射した後、連続して列方向の最も右側の照射ラインを照射し、次いで第1行目の照射ラインの一部を重合して照射するようにしてもよい。なお、ここで、第5の例の変形例の場合には、Y値の平均値が0.05よりも小さい。したがって、第5の例の変形例の場合には、第5の例よりも望ましい。
【0019】
なお、上記実施形態において、第2のレーザビームの照射速度は、前回の照射領域に対して、次の照射領域が半分程度重合する程度にしたり、前回の照射領域と次の照射領域とが離間する程度の速度としてもよい。また、1回のレーザ照射で欠陥画素の周辺部に沿ってそのほぼ全周に照射するようにしてもよい。
【0020】
【発明の効果】
以上説明したように、この発明によれば、レーザビームの照射パターンは少なくとも欠陥画素のほぼ全体を走査しているものであり、かつ、各辺の周辺部に沿ってそのほぼ全長をライン状に連続して照射する第1の照射パターンとその内側を走査する第2の照射パターンとを含んでいるので、当該欠陥画素常時黒表示となり、光漏れをより一層減少することができ、ひいては画質をより一層向上することができる。
【図面の簡単な説明】
【図1】この発明の液晶表示パネルの欠陥画素修正方法の第1の例における第2のレーザビームの照射パターンを示す図。
【図2】第2の例における第2のレーザビームの照射パターンを示す図。
【図3】第3の例における第2のレーザビームの照射パターンを示す図。
【図4】第4の例における第2のレーザビームの照射パターンを示す図。
【図5】第5の例における第2のレーザビームの照射パターンを示す図。
【図6】第6の例における第2のレーザビームの照射パターンを示す図。
【図7】第1〜第6の例、第5の例の変形例及び従来例における第2のレーザビームの照射とY値との関係を示す図。
【図8】(A)は液晶表示パネルの一例の一部の断面図、(B)は第1のレーザビームの照射により液晶中に気泡を発生させた状態を示す(A)同様の断面図。
【図9】従来の第2のレーザビームの照射パターンを示す図。
【符号の説明】
12 欠陥画素
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a defective pixel correction method for a liquid crystal display panel.
[0002]
[Prior art]
For example, in an active matrix liquid crystal display panel including a thin film transistor as a switching element, when a driving voltage is not applied to the corresponding pixel electrode due to a manufacturing defect of the thin film transistor, the normally white method The corresponding pixel always becomes a bright spot, and the image quality deteriorates. Therefore, conventionally, such defective pixels are corrected.
[0003]
Next, an example of a conventional defective pixel correction method will be described. First, the structure of the liquid crystal display panel will be briefly described with reference to FIG. This liquid crystal display panel includes a pair of glass substrates 1 and 2. A pixel electrode 3 made of ITO and a thin film transistor 4 are provided in a matrix on the lower surface of one glass substrate 1, and an alignment film 5 is provided on the lower surface thereof. On the upper surface of the other glass substrate 2, a black mask 6, a color filter 7, a common electrode 8 made of ITO and an alignment film 9 are provided. The glass substrates 1 and 2 are bonded to each other via a sealing material (not shown), and a liquid crystal 10 is sealed between them.
[0004]
If the thin film transistor 4 provided with the liquid crystal display panel has a manufacturing defect, as shown by an arrow in FIG. 8B, the first laser beam is applied to the substantially central portion of the pixel electrode 3 corresponding thereto. Irradiate to generate bubbles 11 in the liquid crystal 10 at the pixel electrode 3, and then irradiate the pixel electrode 3 with a second laser beam at one or a plurality of locations. And the alignment film 5 underneath is physically destroyed. The destructive material generated thereby is retained in the bubbles 11. After this, the bubbles 11 disappear. Then, the liquid crystal 10 in the destruction area is always aligned in the vertical direction or the horizontal direction, and the pixels in the destruction area are always displayed in black. Thus, the defective pixel is corrected.
[0005]
[Problems to be solved by the invention]
By the way, in such a conventional defective pixel correction method, even if the second laser beam is irradiated, black display may not be achieved depending on the degree of the defect, and it may be visually recognized as a bright spot. For this reason, studies have been made to improve the correction accuracy by continuously irradiating the second laser beam with a reduced beam diameter. In this method, for example, as indicated by an arrow in FIG. 9, a defective pixel 12 (a pixel here is a pixel constituted by a portion of one pixel electrode 3 that is not covered by the black mask 6. First, the irradiation is continuously performed in the left direction from the irradiation start point indicated by the white circle in the lower right corner of the defective pixel 12, and then continuously from the left to the right at a position shifted by a predetermined pitch upward. Next, irradiation is continuously performed from the right side to the left side at a position shifted by a predetermined pitch on the upper side. Thereafter, such irradiation is repeated, and irradiation is performed at an irradiation end point indicated by a black circle in the upper right corner of the defective pixel 12. Has ended. In this defective pixel correction method, since the entire defective pixel 12 is irradiated almost uniformly, it seems that the defective pixel 12 is sufficiently corrected, but it is still not sufficient, and it has been found that light leakage slightly occurs. This is considered to be due to the fact that the irradiation line is discontinuous, and in particular, the peripheral portion of the defective pixel 12 is not sufficiently irradiated from the experimental results described later.
An object of the present invention is to correct a defective pixel so that light leakage can be further reduced.
[0006]
[Means for Solving the Problems]
According to the present invention, a liquid crystal display panel in which liquid crystal is sealed between a pair of substrates is irradiated with a laser beam to physically destroy the defective pixel portion, thereby correcting the defective pixel. In the method for correcting defective pixels of a display panel, the irradiation pattern of the laser beam scans at least substantially the whole of the defective pixels, and the entire length is continuously formed in a line along the peripheral portion of each side. to those who to include the first irradiation pattern for irradiating a second irradiation pattern for scanning the inside. According to the present invention, since the irradiating continuously the entire length in a line form along the periphery of each side of at least the defective pixel with a laser beam, the defective pixel becomes always black display, light leakage It can be further reduced.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
1 to 6 show the second laser beam irradiation patterns in the first to sixth examples of the defective pixel correcting method of the liquid crystal display panel according to the present invention, respectively. In any example, the beam size of the first laser beam for generating bubbles in the liquid crystal at the defective pixel 12 is 10 to 30 μm (preferably 20 μm), and the energy density is 10 to 30 J /. cm 2 (preferably 20 J / cm 2 ) , and the beam size of the second laser beam for physically destroying the pixel electrode and the alignment film in the defective pixel 12 is 1 to 4 μmφ (preferably 2 to 3 μmφ). ) And the energy density is 70 to 100 J / cm 2 . The second laser beam is a rectangular wave of 20 Hz, and the scanning speed during irradiation is such that the previous irradiation area and the next irradiation area slightly overlap, in other words, the irradiation area is exactly the same. The speed was continuous.
[0008]
In the second laser beam irradiation pattern in the first example shown in FIG. 1, first, from the irradiation start point indicated by the white circle at the lower right corner of the defective pixel 12, clockwise along the periphery of the defective pixel 12. Irradiated almost continuously for one round. In this case, the irradiation line a was set at a position t = 7.5 μm away from the edge portion of the defective pixel 12. Next, irradiation is continuously performed in the left direction from the lower right corner of the defective pixel 12, and then irradiation is performed continuously in the right direction from the left side at a position shifted by a predetermined pitch on the upper side, and then at a position shifted by a predetermined pitch on the upper side. Irradiation was continuously performed from the right side to the left direction, and such irradiation was repeated, and the irradiation was terminated at the irradiation end point indicated by a black circle in the upper right corner of the defective pixel 12. In this case, the pitch P was 20 μm.
[0009]
Next, the irradiation pattern of the second laser beam in the second example shown in FIG. 2 is opposite to that shown in FIG. That is, first, irradiation is continuously performed in the left direction from the irradiation start point indicated by a white circle in the upper right corner of the defective pixel 12, and then irradiation is continuously performed in the right direction from the left side at a position shifted by a predetermined pitch downward. Next, irradiation was continuously performed from the right side to the left direction at a position shifted by a predetermined pitch downward, and such irradiation was repeated until the lower right corner of the defective pixel 12 was irradiated. In this case, the pitch P was 20 μm. Next, irradiation was performed almost continuously in the counterclockwise direction along the periphery of the defective pixel 12 from the lower right corner of the defective pixel 12, and the irradiation was terminated at the irradiation end point indicated by the black circle in the lower right corner of the defective pixel 12. . In this case, the irradiation line a was set at a position t = 7.5 μm away from the edge portion of the defective pixel 12.
[0010]
Next, in the irradiation pattern of the second laser beam in the third example shown in FIG. 3, first, the same irradiation as in the case shown in FIG. 2 was performed. Next, irradiation is continuously performed upward from the lower right corner of the defective pixel 12, and then irradiation is continuously performed downward from the upper side at a position shifted by a predetermined pitch on the left side, and then at a position shifted by a predetermined pitch on the left side. Irradiation was continuously performed from the lower side to the upper direction, and such irradiation was repeated, and irradiation was terminated at the irradiation end point indicated by a black circle in the upper left corner of the defective pixel 12. The pitch P in this case was also 20 μm.
[0011]
Next, in the second laser beam irradiation pattern in the fourth example shown in FIG. 4, a black circle slightly below the center of the defective pixel 12 from the irradiation start point indicated by a white circle in the lower right corner of the defective pixel 12. Until the irradiation end point indicated by the mark, substantially the entire circumference along the periphery of the defective pixel 12 and the inner region were continuously irradiated in the form of an angular spiral in the clockwise direction. In this case, the irradiation line a along the peripheral portion of the defective pixel 12 was set at a position t = 7.5 μm away from the edge portion of the defective pixel 12. The pitch P inside the irradiation line a was 14 μm.
[0012]
Next, in the second laser beam irradiation pattern in the fifth example shown in FIG. 5, from the irradiation start point indicated by the white circle on the lower right side slightly from the center of the defective pixel 12, from the center of the defective pixel 12. The irradiation was performed evenly so that the entire circumference along the periphery of the defective pixel 12 and the area inside it were in a so-called one-stroke pattern and did not intersect anywhere until the irradiation end point indicated by the black circle on the lower left side. In this case, the irradiation line a along the peripheral portion of the defective pixel 12 was set at a position t = 7.5 μm away from the edge portion of the defective pixel 12. The pitch P inside the irradiation line a was 20 μm.
[0013]
Next, in the second laser beam irradiation pattern in the sixth example shown in FIG. 6, the black circle at the center of the defective pixel 12 from the irradiation start point indicated by a white circle slightly below the center of the defective pixel 12. Until the irradiation end point indicated by the mark, the entire periphery along the periphery of the defective pixel 12 and the region inside it were irradiated in a so-called one-stroke pattern, intersecting or overlapping, and evenly irradiated. In this case, the irradiation line a along the peripheral portion of the defective pixel 12 was set at a position t = 10 μm away from the edge portion of the defective pixel 12. The pitch P inside the irradiation line a was 20 μm.
[0014]
In the case of the conventional second laser beam irradiation pattern shown in FIG. 9, the irradiation line in the peripheral portion of the defective pixel 12 in the second laser beam irradiation pattern in the first example shown in FIG. This is the same irradiation pattern as when a is not irradiated. Hereinafter, the irradiation pattern shown in FIG. 9 is referred to as a second laser beam irradiation pattern in the conventional example.
[0015]
Then, the second laser beam irradiation in each of the first to sixth examples and the conventional example was performed a plurality of times, and each Y value was examined. The result shown in FIG. 7 was obtained. In this figure, the modification of the fifth example is that the energy density is appropriately lowered only at the irradiation end point indicated by the black circle in the irradiation pattern of the second laser beam in the fifth example shown in FIG. This is an example. White triangle marks indicate average values in each example.
[0016]
As is apparent from FIG. 7, in the case of the conventional example, all the Y values are 0.07 or more, the average value is about 0.09, and the light leakage is slightly large. On the other hand, in the modified examples of the first example, the third to sixth examples, and the fifth example, all the Y values are 0.07 or less. In the case of the second example, the Y value is slightly larger than 0.07, but the average value is smaller than 0.06. Therefore, the second laser beam, which is a common point between the first to sixth examples and the modified example of the fifth example, is continuously provided in a line along the peripheral portion of each side of the defective pixel 12 in a line shape. Upon irradiation Te, it is possible to further reduce light leakage.
[0017]
By the way, among the first to sixth examples, the average value of the Y values of the fifth example is about 0.05, which is the smallest. Therefore, the fifth example is the most desirable among the first to sixth examples. Therefore, comparing the fifth example with the first to fourth and sixth examples, the irradiation start point and the irradiation end point of the second laser beam are substantially in the center of the defective pixel 12, The laser beam irradiation points of 2 are continuous in a line from the irradiation start point to the irradiation end point, and the second laser beam irradiation points do not intersect anywhere.
[0018]
Therefore, in the case of the first example shown in FIG. 1, a part of the description will be given. After irradiating continuously from the lower right corner of the defective pixel 12 in the left direction, it is continuously irradiated in the upward direction by the pitch P. You may make it do. In the case of the second example shown in FIG. 2, a part of this will also be described. After irradiation continuously from the irradiation start point indicated by a white circle in the upper right corner of the defective pixel 12 in the left direction, You may make it irradiate continuously only the part of the pitch P to a direction. Furthermore, in the case of the third example shown in FIG. 3 as well, a part of this will be described. After irradiation along the periphery of the defective pixel 12, the rightmost irradiation line in the column direction is continuously irradiated. Then, a part of the irradiation line in the first row may be polymerized and irradiated. Here, in the modified example of the fifth example, the average value of the Y values is smaller than 0.05. Therefore, the modification of the fifth example is more desirable than the fifth example.
[0019]
In the above-described embodiment, the irradiation speed of the second laser beam is set such that the next irradiation area is approximately half of the previous irradiation area, or the previous irradiation area and the next irradiation area are separated from each other. It is good also as the speed of the grade. Further, it is possible to irradiate almost the entire circumference along the peripheral portion of the defective pixel by one laser irradiation.
[0020]
【The invention's effect】
As described above, according to the present invention, the irradiation pattern of the laser beam scans at least substantially the entire defective pixel, and the entire length of each pattern along the periphery of each side is linear. because it contains a first irradiation pattern which continuously irradiated with the second illumination pattern for scanning the inside, the defective pixel becomes always black display, it is possible to further reduce light leakage, thus The image quality can be further improved.
[Brief description of the drawings]
FIG. 1 is a diagram showing a second laser beam irradiation pattern in a first example of a defective pixel correction method for a liquid crystal display panel according to the present invention;
FIG. 2 is a diagram showing an irradiation pattern of a second laser beam in a second example.
FIG. 3 is a diagram showing an irradiation pattern of a second laser beam in a third example.
FIG. 4 is a diagram showing an irradiation pattern of a second laser beam in a fourth example.
FIG. 5 is a diagram showing an irradiation pattern of a second laser beam in a fifth example.
FIG. 6 is a diagram showing an irradiation pattern of a second laser beam in a sixth example.
FIG. 7 is a diagram showing the relationship between the second laser beam irradiation and the Y value in the first to sixth examples, the modified example of the fifth example, and the conventional example.
8A is a partial cross-sectional view of an example of a liquid crystal display panel, and FIG. 8B is a cross-sectional view similar to FIG. 8A showing a state in which bubbles are generated in the liquid crystal by irradiation with a first laser beam. .
FIG. 9 is a diagram showing an irradiation pattern of a conventional second laser beam.
[Explanation of symbols]
12 defective pixels

Claims (6)

一対の基板間に液晶が封入された液晶表示パネルの欠陥画素の部分にレーザビームを照射して前記欠陥画素の部分を物理的に破壊し、これにより前記欠陥画素を修正する液晶表示パネルの欠陥画素修正方法において、前記レーザビームの照射パターンは少なくとも前記欠陥画素のほぼ全体を走査しているものであり、かつ、各辺の周辺部に沿ってそのほぼ全長をライン状に連続して照射する第1の照射パターンとその内側を走査する第2の照射パターンとを含むことを特徴とする液晶表示パネルの欠陥画素修正方法。A defect in a liquid crystal display panel in which a defective pixel portion of a liquid crystal display panel in which liquid crystal is sealed between a pair of substrates is irradiated with a laser beam to physically destroy the defective pixel portion, thereby correcting the defective pixel. In the pixel correction method, the irradiation pattern of the laser beam scans at least substantially the whole of the defective pixel, and the entire length is continuously irradiated in a line along the peripheral portion of each side. A defective pixel correction method for a liquid crystal display panel, comprising: a first irradiation pattern; and a second irradiation pattern for scanning the inside thereof . 請求項1記載の発明において、前記レーザビームは、前記欠陥画素の部分に気泡を発生させる第1の照射工程と、照射点を変えながら前記欠陥画素の周辺部に沿って照射する第2の照射工程とを有することを特徴とする液晶表示パネルの欠陥画素修正方法。The laser beam according to claim 1, wherein the laser beam is irradiated along a peripheral portion of the defective pixel while changing an irradiation point in a first irradiation step for generating bubbles in the defective pixel portion. A defective pixel correction method for a liquid crystal display panel. 請求項2記載の発明において、前記第2の照射工程における前記レーザビームの照射開始点及び照射終了点が前記欠陥画素の部分のほぼ中央部であることを特徴とする液晶表示パネルの欠陥画素修正方法。In the invention of claim 2, wherein substantially a defective pixel correction of the liquid crystal display panel, which is a central portion of the second the laser beam irradiation starting point and part of the irradiation end point the defective pixel of the irradiation step Method. 請求項3記載の発明において、前記第2の照射工程における前記レーザビームの照射点が前記照射開始点から前記照射終了点までライン状に連続していることを特徴とする液晶表示パネルの欠陥画素修正方法。In the invention of claim 3, wherein, the defective pixel of the liquid crystal display panel, wherein the irradiation point of the laser beam at the second irradiation step is continuous to the irradiation end point to a line shape from the irradiation start point How to fix. 請求項4記載の発明において、前記第2の照射工程における前記レーザビームのエネルギ密度が前記照射終了点においてのみ低いことを特徴とする液晶表示パネルの欠陥画素修正方法。5. The defective pixel correction method for a liquid crystal display panel according to claim 4, wherein the energy density of the laser beam in the second irradiation step is low only at the irradiation end point. 請求項4記載の発明において、前記第2の照射工程における前記レーザビームの照射ラインがどこにおいても交差していないことを特徴とする液晶表示パネルの欠陥画素修正方法。In the invention of claim 4, wherein defective pixel repairing method of a liquid crystal display panel, wherein the irradiation line of the laser beam at the second irradiation step is not even intersect anywhere.
JP37581098A 1998-12-18 1998-12-18 Method for correcting defective pixels in liquid crystal display panel Expired - Fee Related JP3793866B2 (en)

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