JP3799181B2 - Scanning probe microscope - Google Patents
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- JP3799181B2 JP3799181B2 JP35679998A JP35679998A JP3799181B2 JP 3799181 B2 JP3799181 B2 JP 3799181B2 JP 35679998 A JP35679998 A JP 35679998A JP 35679998 A JP35679998 A JP 35679998A JP 3799181 B2 JP3799181 B2 JP 3799181B2
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Description
【0001】
【発明の属する技術分野】
本発明は凹凸像観察モードと磁気力像観察モードを備えた走査型プロープ顕微鏡に関するものである。
【0002】
【従来の技術】
走査型トンネル顕微鏡(STM)の誕生後、走査型プロープ顕微鏡(SPM)における技術的進展は目を見張るものがある。原子間力顕微鏡(AFM)の発明以来、試料表面での色々の力を測定する技術も確立してきている。この中で材料の表面磁界の分布を測定する磁気力顕微鏡(MFM)は色々な分野で注目されている。特に、材料開発においては磁性材料分野でも素材の薄膜化や微細化が進展しており、このような材料では表面の影響により、従来の素材とは異なる全く新しい材料の誕生も期待されている。試料表面の磁気分布を測定する方法としては、電子顕微鏡でのローレンツ顕微鏡等があるが、分解能等の点で限界があった。その点、MFMは数十nm程度の分解能まで測定可能であり、分解能の向上が期待されている。
【0003】
図5は現在行っているMFM像の測定方法を説明する図である。
MFMの技術はAFMの技術をそのまま利用したものであり、一般的にはカンチレバーの先端部にFe、Co、Ni等の強磁性材料をコーティングして、試料表面からの磁気モーメントを測定している。試料表面の極く近傍で磁気モーメントを測定した場合には、試料表面の凹凸の効果がMFM像に現れて、像の解釈に問題を起こす。そこで最近のMFM測定では、試料表面の凹凸の問題を最小化するために、まず、カンチレバー(図示せず)を試料1の表面に極く接近させて走査し、AFMにより試料表面の凹凸像2を観察しておき、次いで、カンチレバーを試料表面からZ方向に一定距離だけリフトアップして遠ざけ、次のラインでMFM像を観察する。こうして観察されるMFM像は図示するように凹凸像と磁気力像が加算されたリフト像3となり、凹凸像2を差し引くことによりMFM像を求めることができる。なお、測定方法としては、1ライン毎に凹凸像とMFM像を測定する方式のほか、各点毎に凹凸像とMFM像を測定する方式もある。
【0004】
【発明が解決しようとする課題】
しかしながら、これらの方法で測定した場合、行きの走査でMFM像を観察した後、帰りの走査時カンチレバーをリフトアップしたまま戻し、次いで、凹凸像を観察するためにカンチレバーを試料に近づけて行きの走査を行うため、カンチレバーをリフトダウンするとき試料に衝突してクラッシュを起こす問題や、ピエゾ素子からなるスキャナーのヒステリシスやクリープの問題が発生し、その影響が凹凸像に反映されるため、安定した凹凸像が得られず、結果としてMFM像も安定しない問題がある。また、この問題を避けるため、走査開始時に一定時間停止し、ヒステリシスがなくなってから走査を開始する方式も取られているが、普通でも走査速度が問題となるSPMではますます速度が遅くなって現実的ではなく、このことは、MFMでの分解能を一層向上させようとした場合にはさらに問題になるものと懸念される。
【0005】
本発明は上記課題を解決するためのもので、走査速度を落とさず、かつ安定した凹凸像とリフト像が得られるようにすることを目的とする。
【0006】
【課題を解決するための手段】
本発明は、カンチレバーを試料に接近させて走査し試料表面の凹凸像を観察する凹凸像観察モードと、カンチレバーをリフトアップして走査し試料表面の磁気モーメントを測定するリフト像観察モードの走査方式を有する走査型プロープ顕微鏡において、像観察後に走査方式を変更し、変更後の走査方式により像観察表示をしないで帰りの走査を行い、帰りの走査後に該変更した走査方式により次の観察を行うことを特徴とする。
また、本発明は、カンチレバーを試料に接近させて走査し試料表面の凹凸像を観察する凹凸像観察モードと、カンチレバーをリフトアップして走査し試料表面の磁気モーメントを測定するリフト像観察モードの走査方式を有する走査型プロープ顕微鏡において、リフト像観察後に走査方式を凹凸像観察モードに変更し、凹凸像観察モードの走査方式により像観察表示をしないで帰りの走査を行い、帰りの走査後に凹凸像観察モードの走査方式により次の観察を行うことを特徴とする。
【0007】
【発明の実施の形態】
以下、本発明の実施の形態について説明する。
本発明は、カンチレバー(図示せず)を試料に接近させて走査し凹凸像を観察するモードと、カンチレバーをリフトアップして走査するリフト像観察モードを有する走査型プローブ顕微鏡において、像観察表示をしない帰りの走査を利用してヒステリシスを最小化し、安定した像観察が行えるようにしたものである。
【0008】
図1は本発明の観察方法を説明する図、図2はカンチレバーの走査方法を説明する図である。
凹凸像観察モードにおける行きの走査時に凹凸像を観察し表示する(図2S1)。即ち、カンチレバーを試料1の表面の極く近傍に近ずけて走査し、AFMにより、図1(a)に示すように試料表面の凹凸像を観察する。
続く帰りの走査時はリフト像観察モードの走査方式に変更し、このときリフト像は表示しない(図2S2)。即ち、カンチレバーをリフトアップして帰りの走査を行い、このとき、図1(b)に示すように、リフト像(凹凸像+MFM像)が測定されるが、この像は表示しない。この像観察表示しない帰りの走査期間においてリフトアップにより生ずるヒステリシス等は減衰する。
【0009】
次いで、カンチレバーをリフトアップした状態のまま行きの走査を行い、リフト像を観察する(図2S3)。即ち、試料表面の凹凸の問題を最小化するためにカンチレバーを一定距離だけリフトアップしたまま試料表面の磁気モーメントを測定し、図1(c)に示すように、凹凸像と磁気力像が加えられたリフト像を観察して表示する。このリフト像の観察においては、直前の帰りの走査でヒステリシスが減衰しているのでその影響はない。
続く帰りの走査時は凹凸像観察モードの走査方式に変更し、このとき像は表示しない(図2S4)。即ち、カンチレバーをリフトダウンして試料1の表面の極く近傍に近ずけ、AFMにより、図1(d)に示すように、試料表面の凹凸像をトレースする形で帰りの走査を行い、このとき凹凸像は表示しない。
続いて、S1に戻り凹凸像を観察するが、このときカンチレバーのリフトダウンはないのでヒステリシスやクリープ、クラッシュの問題は発生しない。以後、このプロセスを繰り返して像観察が行われる。
【0010】
このように、凹凸像又はリフト像観察後の帰りの走査方式を変更して像を表示しないようにし、変更した走査方式により次の像観察を行うようにしたので、帰りの走査の過程でスキャナーのヒステリシスは減少あるいは消滅するので、続く行きの走査における像観察でヒステリシスがなくなるまで走査を停止させる必要がなく、また、クラッシュ等の問題も発生しない。
【0011】
図3は本発明の観察方法の他の例を説明する図、図4はカンチレバーの走査方法を説明する図である。
まず、行きの走査時に凹凸像を観察し表示する(図4S11)。即ち、カンチレバーを試料1の表面の極く近傍に近ずけて走査し、AFMにより、図3(a)に示すように試料表面の凹凸像を観察する。
続く、帰りの走査時は凹凸像を観察するモードで像自体は表示しない(図4S12)。即ち、カンチレバーは試料1の表面の極く近傍に近ずけたまま、AFMにより、図3(b)に示すように、試料表面の凹凸像をトレースする形で帰りの走査を行い、このとき凹凸像は表示しない。
【0012】
次いで、カンチレバーをリフトアップして行きの走査を行い、リフト像を観察する(図4S13)。即ち、試料表面の凹凸の問題を最小化するために、カンチレバーを一定距離だけリフトアップして試料表面の磁気モーメントを測定し、図3(c)に示すように、凹凸像と磁気力像が加えられたリフト像を観察して表示する。リフト像の観察においてはスキャナのヒステリシスの影響は凹凸像の観察に比して小さいので、それ程問題にならない。
【0013】
続く、帰りの走査時は凹凸像を観察するモードで像自体は表示しない(図4S14)。即ち、カンチレバーをリフトダウンして試料1の表面の極く近傍に近ずけて走査し、AFMにより、図3(d)に示すように、試料表面の凹凸像をトレースする形で帰りの走査を行い、このとき凹凸像は表示しない。
【0014】
続いて、S1に戻り凹凸像を観察するが、このときカンチレバーのリフトダウンはないのでヒステリシスやクリープ、クラッシュの問題は発生しない。
【0015】
このように、帰りの走査時カンチレバーをリフトダウンして凹凸像観察モードとして像を表示しないようにし、この帰りの走査の過程でスキャナーのヒステリシスを減少あるいは消滅するので、続く行きの走査での凹凸像観察でヒステリシスがなくなるまで走査を停止させる必要がなく、また、クラッシュの問題も発生しない。
【0016】
【発明の効果】
以上のように、本発明によれば像観察表示をしない帰りの走査を利用してヒステリシスを最小化するようにしたので、走査を停止することなく続く行きの走査で安定した凹凸像とリフト像を得ることが可能となり、また、凹凸像観察モード時のクラッシュの発生を防止することができる。
【図面の簡単な説明】
【図1】 本発明の観察方法を説明する図である。
【図2】 カンチレバーの走査方法を説明する図である。
【図3】 本発明の観察方法の他の例を説明する図である。
【図4】 カンチレバーの走査方法を説明する図である。
【図5】 従来のMFM像の測定方法を説明する図である。
【符号の説明】
1…試料、2…凹凸像、3…リフト像。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a scanning probe microscope having an uneven image observation mode and a magnetic force image observation mode.
[0002]
[Prior art]
After the birth of the scanning tunneling microscope (STM), the technological progress in the scanning probe microscope (SPM) is striking. Since the invention of the atomic force microscope (AFM), techniques for measuring various forces on the sample surface have been established. Among them, a magnetic force microscope (MFM) that measures the distribution of the surface magnetic field of a material has attracted attention in various fields. In particular, in the field of material development, thinning and miniaturization of materials are progressing in the field of magnetic materials, and due to the influence of the surface of such materials, it is expected that completely new materials different from conventional materials will be born. As a method for measuring the magnetic distribution on the sample surface, there is a Lorentz microscope in an electron microscope, but there is a limit in terms of resolution and the like. In that respect, MFM can be measured to a resolution of about several tens of nanometers, and an improvement in resolution is expected.
[0003]
FIG. 5 is a diagram for explaining an MFM image measuring method currently being performed.
The MFM technology uses the AFM technology as it is. In general, the tip of the cantilever is coated with a ferromagnetic material such as Fe, Co, Ni, and the magnetic moment from the sample surface is measured. . When the magnetic moment is measured very close to the sample surface, the unevenness effect on the sample surface appears in the MFM image, causing a problem in image interpretation. Therefore, in recent MFM measurement, in order to minimize the problem of unevenness on the sample surface, first, the cantilever (not shown) is scanned very close to the surface of the sample 1, and the uneven image 2 on the sample surface is detected by AFM. Then, the cantilever is lifted away from the sample surface by a certain distance in the Z direction, and the MFM image is observed on the next line. The MFM image thus observed becomes a lift image 3 in which the concavo-convex image and the magnetic force image are added as shown in the figure, and the MFM image can be obtained by subtracting the concavo-convex image 2. As a measuring method, there is a method of measuring the concavo-convex image and the MFM image for each line, as well as a method of measuring the concavo-convex image and the MFM image for each point.
[0004]
[Problems to be solved by the invention]
However, when measured by these methods, after observing the MFM image on the outbound scan, the cantilever is lifted back on the return scan, and then the cantilever is moved closer to the sample to observe the concavo-convex image. When scanning the cantilever, there is a problem of colliding with the sample and causing a crash, and a problem with the hysteresis and creep of the scanner consisting of the piezo element. There is a problem that an uneven image cannot be obtained, and as a result, the MFM image is not stable. In order to avoid this problem, a method of stopping for a certain period of time at the start of scanning and starting scanning after hysteresis disappears is used. However, even in normal SPM, where scanning speed is a problem, the speed becomes increasingly slower. This is not practical, and this may be a problem when trying to further improve the resolution in MFM.
[0005]
An object of the present invention is to solve the above-described problems, and an object of the present invention is to obtain a stable uneven image and lift image without reducing the scanning speed.
[0006]
[Means for Solving the Problems]
The present invention provides a scanning method of a concavo-convex image observation mode in which a cantilever is moved close to a sample to observe a concavo-convex image on the sample surface and a lift image observation mode in which the cantilever is lifted up and scanned to measure a magnetic moment on the sample surface. In the scanning probe microscope having the above, the scanning method is changed after the image observation, the return scanning is performed without the image observation display by the changed scanning method, and the next observation is performed by the changed scanning method after the return scanning. It is characterized by that.
In addition, the present invention provides a concavo-convex image observation mode in which a cantilever is moved close to a sample to scan and observe a concavo-convex image on the sample surface, and a lift image observation mode in which the cantilever is lifted up and scanned to measure the magnetic moment on the sample surface. In a scanning probe microscope having a scanning method, after the lift image is observed, the scanning method is changed to the concavo-convex image observation mode, and the scanning is performed in the concavo-convex image observation mode without performing image observation display, and the concavo-convex after the return scanning. The following observation is performed by a scanning method in an image observation mode.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below.
The present invention provides an image observation display in a scanning probe microscope having a mode in which a cantilever (not shown) is moved close to a sample to scan and observe an uneven image, and a lift image observation mode in which the cantilever is lifted up and scanned. The return scan is not used to minimize the hysteresis so that stable image observation can be performed.
[0008]
FIG. 1 is a diagram for explaining an observation method of the present invention, and FIG. 2 is a diagram for explaining a cantilever scanning method.
The concave / convex image is observed and displayed during the forward scanning in the concave / convex image observation mode (S1 in FIG. 2). That is, the cantilever is scanned close to the vicinity of the surface of the sample 1, and an uneven image on the surface of the sample is observed by AFM as shown in FIG.
At the time of the subsequent return scanning, the scanning mode is changed to the lift image observation mode, and at this time, the lift image is not displayed (S2 in FIG. 2). In other words, the cantilever is lifted up to perform a return scan. At this time, as shown in FIG. 1B, a lift image (uneven image + MFM image) is measured, but this image is not displayed. Hysteresis and the like caused by lift-up are attenuated during the return scanning period when the image observation display is not performed.
[0009]
Next, the scanning is performed while the cantilever is lifted up, and the lift image is observed (S3 in FIG. 2). That is, in order to minimize the problem of unevenness on the sample surface, the magnetic moment of the sample surface is measured while the cantilever is lifted up by a certain distance, and an uneven image and a magnetic force image are added as shown in FIG. Observe and display the lift image. In the observation of the lift image, there is no influence because the hysteresis is attenuated in the immediately preceding scan.
At the time of the subsequent return scanning, the scanning method is changed to the concavo-convex image observation mode, and the image is not displayed at this time (S4 in FIG. 2). In other words, the cantilever is lifted down so that it is very close to the surface of the sample 1 and, as shown in FIG. At this time, the uneven image is not displayed.
Subsequently, the process returns to S1 to observe the concavo-convex image. At this time, since the cantilever is not lifted down, the problems of hysteresis, creep, and crash do not occur. Thereafter, the image observation is performed by repeating this process.
[0010]
In this way, the return scanning method after observation of the concavo-convex image or lift image is changed so that the image is not displayed, and the next image observation is performed by the changed scanning method. Since the hysteresis decreases or disappears, it is not necessary to stop the scanning until the hysteresis disappears in the image observation in the subsequent scanning, and a problem such as a crash does not occur.
[0011]
FIG. 3 is a diagram for explaining another example of the observation method of the present invention, and FIG. 4 is a diagram for explaining a cantilever scanning method.
First, the concave-convex image is observed and displayed during the outgoing scan (S11 in FIG. 4). That is, the cantilever is scanned close to the vicinity of the surface of the sample 1, and an uneven image on the surface of the sample is observed by AFM as shown in FIG.
In the subsequent return scan, the image itself is not displayed in the mode of observing the concavo-convex image (S12 in FIG. 4). That is, while the cantilever is very close to the surface of the sample 1, the AFM scans the back of the sample surface by tracing the uneven image on the sample surface as shown in FIG. The image is not displayed.
[0012]
Next, the cantilever is lifted up to perform a forward scan, and a lift image is observed (S13 in FIG. 4). In other words, in order to minimize the problem of unevenness on the sample surface, the magnetic moment on the sample surface is measured by lifting the cantilever by a certain distance, and as shown in FIG. The added lift image is observed and displayed. In the observation of the lift image, the influence of the hysteresis of the scanner is smaller than that in the observation of the concavo-convex image, so that the problem is not so much.
[0013]
At the time of returning scanning, the image itself is not displayed in the mode for observing the uneven image (S14 in FIG. 4). That is, the cantilever is lifted down and scanned close to the surface of the surface of the sample 1, and the return scanning is performed by tracing the concavo-convex image on the surface of the sample by AFM as shown in FIG. At this time, the uneven image is not displayed.
[0014]
Subsequently, the process returns to S1 to observe the concavo-convex image. At this time, since the cantilever is not lifted down, the problems of hysteresis, creep, and crash do not occur.
[0015]
In this way, the cantilever is lifted down during the return scan so that the image is not displayed as the concavo-convex image observation mode, and the hysteresis of the scanner is reduced or eliminated during the return scan process. It is not necessary to stop scanning until the hysteresis disappears in image observation, and the problem of crash does not occur.
[0016]
【The invention's effect】
As described above, according to the present invention, since the hysteresis is minimized by using the return scanning without image observation display, the concavo-convex image and the lift image that are stable in the subsequent scanning without stopping the scanning. And the occurrence of a crash in the concavo-convex image observation mode can be prevented.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating an observation method of the present invention.
FIG. 2 is a diagram illustrating a cantilever scanning method.
FIG. 3 is a diagram for explaining another example of the observation method of the present invention.
FIG. 4 is a diagram illustrating a cantilever scanning method.
FIG. 5 is a diagram illustrating a conventional method for measuring an MFM image.
[Explanation of symbols]
1 ... Sample, 2 ... Uneven image, 3 ... Lift image.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35679998A JP3799181B2 (en) | 1998-12-15 | 1998-12-15 | Scanning probe microscope |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35679998A JP3799181B2 (en) | 1998-12-15 | 1998-12-15 | Scanning probe microscope |
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| JP2000180457A JP2000180457A (en) | 2000-06-30 |
| JP3799181B2 true JP3799181B2 (en) | 2006-07-19 |
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| JP3989704B2 (en) * | 2001-10-03 | 2007-10-10 | エスアイアイ・ナノテクノロジー株式会社 | Scanning probe microscope |
| JP5045902B2 (en) * | 2007-05-25 | 2012-10-10 | 独立行政法人物質・材料研究機構 | Scanning method and high magnetic field scanning probe microscope apparatus in scanning probe microscope |
| JP2009074987A (en) * | 2007-09-21 | 2009-04-09 | Sii Nanotechnology Inc | Scanning probe microscope and surface information measuring method |
| JP2009109377A (en) * | 2007-10-31 | 2009-05-21 | Jeol Ltd | Scanning probe microscope |
| JP5071901B2 (en) * | 2008-03-03 | 2012-11-14 | 国立大学法人横浜国立大学 | Atomic force microscope |
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