JP3811571B2 - Thermoplastic polyhydroxypolyether resin and insulating film molded therefrom - Google Patents
Thermoplastic polyhydroxypolyether resin and insulating film molded therefrom Download PDFInfo
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- JP3811571B2 JP3811571B2 JP12948398A JP12948398A JP3811571B2 JP 3811571 B2 JP3811571 B2 JP 3811571B2 JP 12948398 A JP12948398 A JP 12948398A JP 12948398 A JP12948398 A JP 12948398A JP 3811571 B2 JP3811571 B2 JP 3811571B2
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- 229920005989 resin Polymers 0.000 claims description 41
- 239000011347 resin Substances 0.000 claims description 41
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 25
- 229920000570 polyether Polymers 0.000 claims description 25
- 229920001169 thermoplastic Polymers 0.000 claims description 16
- 239000004416 thermosoftening plastic Substances 0.000 claims description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 30
- 239000011889 copper foil Substances 0.000 description 30
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 24
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 23
- 239000002966 varnish Substances 0.000 description 23
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 13
- 230000009477 glass transition Effects 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 229920003002 synthetic resin Polymers 0.000 description 12
- 239000000057 synthetic resin Substances 0.000 description 12
- 239000004593 Epoxy Substances 0.000 description 11
- 125000000687 hydroquinonyl group Chemical group C1(O)=C(C=C(O)C=C1)* 0.000 description 11
- 150000002989 phenols Chemical class 0.000 description 11
- YWFPGFJLYRKYJZ-UHFFFAOYSA-N 9,9-bis(4-hydroxyphenyl)fluorene Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 YWFPGFJLYRKYJZ-UHFFFAOYSA-N 0.000 description 10
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 10
- 239000003822 epoxy resin Substances 0.000 description 10
- 229920000647 polyepoxide Polymers 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 9
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 7
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 150000002367 halogens Chemical class 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- 229910001873 dinitrogen Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 5
- 238000007719 peel strength test Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XUMBMVFBXHLACL-UHFFFAOYSA-N Melanin Chemical compound O=C1C(=O)C(C2=CNC3=C(C(C(=O)C4=C32)=O)C)=C2C4=CNC2=C1C XUMBMVFBXHLACL-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000012855 volatile organic compound Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- JZODKRWQWUWGCD-UHFFFAOYSA-N 2,5-di-tert-butylbenzene-1,4-diol Chemical compound CC(C)(C)C1=CC(O)=C(C(C)(C)C)C=C1O JZODKRWQWUWGCD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- LNNIPFBETXOKIA-UHFFFAOYSA-N 4-[1-(4-hydroxyphenyl)-9h-fluoren-2-yl]phenol Chemical compound C1=CC(O)=CC=C1C1=CC=C(C=2C(=CC=CC=2)C2)C2=C1C1=CC=C(O)C=C1 LNNIPFBETXOKIA-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- -1 bromine compound Chemical class 0.000 description 1
- FRCHCYFLGZRELU-UHFFFAOYSA-N butan-2-one;cyclohexanone Chemical compound CCC(C)=O.O=C1CCCCC1 FRCHCYFLGZRELU-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-O triphenylphosphanium Chemical compound C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-O 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- Polyethers (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、電気用積層板、磁気テープバインダー、絶縁ワニス、自己融着エナメル電線ワニス等の電気・電子分野及び接着剤、絶縁塗料及びフィルム等として用いられる耐熱性、耐水性及び密着性に優れた熱可塑性ポリヒドロキシポリエーテル樹脂及びそれから成形した絶縁性フィルムに関する。
【0002】
【従来の技術】
従来より熱可塑性ポリヒドロキシポリエーテル樹脂はフェノキシ樹脂として知られており、可撓性、耐衝撃性、密着性、機械的性質等が優れることから、電子分野では、磁気テープバインダーやモーター等の電気機械の絶縁ワニスや接着フィルム等の広範囲の用途で使用されてきた。しかしながら、従来の熱可塑性ポリヒドロキシポリエーテル樹脂は、耐熱性に劣り、さらに高温・高湿といった環境においては急激に物性が低下する、特に密着性が低下するという欠点があった。
【0003】
【発明が解決しようとする課題】
本発明は耐熱性、耐水性及び密着性に優れた熱可塑性ポリヒドロキシポリエーテル樹脂及び該樹脂から成形される絶縁性フィルムを提供することを目的とする。
【0004】
【課題を解決する為の手段】
本発明は、熱可塑性ポリヒドロキシポリエーテル樹脂中にフルオレン骨格とハイドロキノン骨格を導入することにより、耐熱性、耐水性に優れ、かつ高温域で密着性の保持率の高い熱可塑性ポリヒドロキシポリエーテル樹脂を得るものである。
【0005】
すなわち、請求項1の発明は、下記式化1で表され 、 重量平均分子量範囲が10,000〜200,000(ゲルパーミエーションクロマトグラフィー(GPC)で測定した標準ポリスチレン換算による重量平均分子量である。以下、分子量というのはこの測定法による重量平均分子量をいう)の熱可塑性ポリヒドロキシポリエーテル樹脂である。
【0006】
【化1】
【0007】
式化1中、Xは式化2、式化3及び式化4で表されるものであり、Xが式化2である割合が全XのAモル%、Xが式化3である割合が全XのBモル%、Xが式化4である割合が全XのCモル%とするとき、A>0、B≧8、100≧A+B≧70、0≦C<30、A+B+C=100であり、Zは水素原子または式化5のいずれかであり、nは21以上の値である。
【0008】
【化2】
【0009】
式化2中、R1、R2、R3、R4は水素原子、炭素数1〜5のアルキル基、またはハロゲン原子から選ばれるものであり、同一であってもよいし、異なっていてもよい。
【0010】
【化3】
【0011】
【化4】
【0012】
式化4中、R1、R2は水素原子、炭素数1〜5のアルキル基、またはハロゲン原子から選ばれるものであり、Yは−SO2−、−CH2−、−C(CH3)2−、または−O−のいずれかであり、mは0または1の値である。R1、R2は同一であってもよいし、異なっていてもよい。
【0013】
【化5】
【0014】
請求項2の発明は、上記式化1で表され 、重量平均分子量範囲が10,000〜200,000の熱可塑性ポリヒドロキシポリエーテル樹脂から成形された絶縁性フィルムである。
【0015】
熱可塑性ポリヒドロキシポリエーテル樹脂において、分子量が10,000未満では、溶融粘性が小さく自己造膜性を示さない。また分子量が200,000を超えると、溶剤で溶解しても、一般に工業的に利用されている溶媒濃度である70重量%から40重量%の濃度では、溶液粘度が高過ぎ、このために製膜使用可能な溶液粘度にするために溶剤を多量に加えなければならず、プロセス経済上好ましくない。また、地球環境に対してもVOC(揮発性有機化合物)を可能なかぎり低減する方向にある現状では好ましいとは言い難い。こうしたことから、分子量は好ましくは15,000〜100,000、より好ましくは20,000〜65,000である。
【0016】
本発明の熱可塑性ポリヒドロキシポリエーテル樹脂には、難燃性付与のためにハロゲンを導入しても良い。ハロゲン導入により難燃性を付与する場合、ハロゲン含有量が5重量%未満では十分な難燃性を付与できない。難燃性を付与するにはハロゲンを5重量%以上含有させればよいが、40重量%以上含有させても更なる難燃性の向上は認められないことから、実用上、ハロゲン含有量を5重量%から40重量%の範囲でハロゲンを導入するのが好ましい。本発明において、ハロゲン元素の種類はいずれのものでもよいが、商業生産の観点からは市販されている臭素化合物、塩素化合物、フッ素化合物の中から上記ハロゲン含有量の範囲のものを利用することになる。
【0017】
ポリヒドロキシポリエーテル樹脂の製造には、二価フェノール類とエピクロルヒドリンの直接反応による方法、二価フェノール類のジグリシジルエーテルと二価フェノール類の付加重合反応による方法が知られているが、本発明に用いられるポリヒドロキシポリエーテル樹脂はいずれの方法によるものであっても良い。
【0018】
二価フェノール類とエピクロルヒドリンとを直接反応させる場合を例にとり説明する。二価フェノール類として、9,9’−ビス(4−ヒドロキシフェニル)フルオレン、及び下記の一般式化6で表される、例えば、ハイドロキノン、2,5−ジ−t−ブチルハイドロキノン等が挙げられるが、特にこれらに限定されるわけではない。また、下記の一般式化7で表される、例えば、ビスフェノールA、ビスフェノールF、臭素化ビスフェノールA、4,4’−ビスヒドロキシビフェニル等が挙げられるが、特にこれらに限定されるわけではない。これら二価フェノール類は、単独で使用しても良いし、2種類以上を併用しても良い。この際、9,9’−ビス(4−ヒドロキシフェニル)フルオレンは、使用する全二価フェノールの8モル%以上含まれていることが必要である。即ち、8モル%未満では耐熱性の付与に関与するフルオレン骨格の導入効果が十分でなく、耐熱性が得られない。また、9,9’−ビス(4−ヒドロキシフェニル)フルオレンとハイドロキノン類の使用合計量は、使用する全二価フェノールの70モル%以上含まれていることが必須である。70モル%未満では、耐熱性の付与に関与するフルオレン骨格およびハイドロキノン骨格の導入効果が十分でなく、耐熱性が得られない。また、下記の式化7で表される二価フェノール類は、使用する全二価フェノールの0モル%以上30モル%未満の範囲で含有する。
【0019】
【化6】
【0020】
式化6中、R1、R2、R3、R4は水素原子、炭素数1〜5のアルキル基、またはハロゲン原子から選ばれるものであり、同一であってもよいし、異なっていてもよい。
【0021】
【化7】
【0022】
式化7中、R1、R2は水素原子、炭素数1〜5のアルキル基、またはハロゲン原子から選ばれるものであり、Yは−SO2−、−CH2−、−C(CH3)2−、または−O−のいずれかであり、mは0または1の値である。R1、R2は同一であってもよいし、異なっていてもよい。
【0023】
二価フェノール類1モルとエピクロルヒドリン0.985〜1.015モル、好ましくは0.99〜1.012モル、より好ましくは0.995〜1.01モルとをアルカリ金属水酸化物存在下、非反応性溶媒中でエピクロルヒドリンを2価フェノールと反応させ、分子量が10,000以上になるように縮合反応させることによりポリヒドロキシポリエーテル樹脂を得ることができる。
【0024】
非反応性溶媒としては、例えばトルエン、キシレン、メチルエチルケトン、メチルイソブチルケトン、ジオキサン、メチルセロソルブメチルエーテル、エチルセロソルブエチルエーテル、シクロヘキサノン等が挙げられるが、特にこれらに限定されるわけではなく、これらの溶剤は単独でも良いし、2種類以上を併用しても良い。また、反応温度は40℃〜150℃が好ましく、特に好ましくは60℃〜120℃である。反応圧力は通常、常圧である。また、反応熱の除去が必要な場合は、通常、反応熱による使用溶剤のフラッシュ蒸発・凝縮還流法、間接冷却法、またはこれらの併用により行われる。
【0025】
二価フェノール類のジグリシジルエーテルと二価フェノール類の付加重合反応による製法の場合、下記の一般式化8で表される二価フェノール類のジグリシジルエーテル、下記の式化9で表される二価フェノール類のジグリシジルエーテル、或いは下記の式化10で表される二価フェノール類のジグリシジルエーテル類をアミン系、イミダゾール系、トリフェニルフォスフォニウム、フォスフォニウム塩系等公知の触媒存在下に、9,9’−ビス(4−ヒドロキシフェニル)フルオレン、一般式化6、一般式化7で表される二価フェノール類とを、0.9:1〜1.1:1、好ましくは0.95:1〜1.05:1、最も好ましくは0.98:1〜1.02:1のフェノール性ヒドロキシル:エポキシ比を与える量で反応させることにより製造される。
【0026】
この際、9,9’−ビス(4−ヒドロキシフェニル)フルオレン及び式化9で表される二価フェノール類のジグリシジルエーテル中のフルオレン成分の割合は、使用する二価フェノール類及び二価フェノール類のジグリシジルエーテル中の全フェノール成分に対して8モル%以上含有されていることが必要である。8モル%未満ではフルオレン骨格の導入効果が十分でなく、耐熱性のあるフィルムを得ることが極めて困難である。また、式化7で表される二価フェノール類及び式化10で表される二価フェノール類のジグリシジルエーテル中の二価フェノール成分の割合は、使用する二価フェノール類及び二価フェノール類のジグリシジルエーテル中の全二価フェノール成分に対して0モル%以上30モル%未満であることが必要である。即ち、式化6と下記の式化11で表される二価フェノール類及び式化8と式化9で表される二価フェノール類のジグリシジルエーテル中の二価フェノールの割合は、使用する二価フェノール類及び二価フェノール類のジグリシジルエーテル中の全二価フェノール成分に対して70モル%以上100モル%以下であることが必要である。この値が70モル%未満ではフルオレン骨格およびハイドロキノン骨格の導入効果が十分でなく、耐熱性を得ることが極めて困難である。反応温度は60℃〜200℃が好ましく、特に好ましくは90℃〜180℃である。反応圧力は通常、常圧であり、反応熱の除去が必要な場合は、使用する溶剤のフラッシュ蒸発・凝縮還流法、間接冷却法、またはこれらの併用法により行われる。
【0027】
【化8】
【0028】
式8中R1、R2、R3、R4は水素原子、炭素数1〜5のアルキル基、またはハロゲン原子から選ばれるものであり、lは0より大きい値である。R1、R2、R3、R4は同一であってもよいし、異なっていてもよい。
【0029】
【化9】
【0030】
式9中lは0より大きい値である。
【0031】
【化10】
【0032】
式10中R1、R2は水素原子、炭素数1〜5のアルキル基、またはハロゲン原子のいずれかであり、Yは−SO2−、−CH2−、−C(CH3)2−、または−O−のいずれかであり、mは0または1の値であり、lは0より大きい値である。R1、R2は同一であってもよいし、異なっていてもよい。
【0033】
【化11】
【0034】
この様にして合成された熱可塑性ポリヒドロキシポリエーテル樹脂は耐熱性、可撓性のある物質であり、単独で用いることもできるが、エポキシ樹脂、メラニン樹脂、イソシアネート樹脂、フェノール樹脂等を含有せしめることができる。また、耐熱性、難燃性の付与、低線膨張率化等のために、シリカ、炭酸カルシウム、タルク、水酸化アルミニウム、アルミナ、マイカ等を、また、接着力改善の為にエポキシシランカップリング剤や、ゴム成分等を熱可塑性ポリヒドロキシポリエーテル樹脂の物性を落とさない程度に加えても良い。
【0035】
【実施例】
以下、実施例に基づき本発明を具体的に説明する。以下の実施例及び比較例に於いて、「部」は「重量部」を示す。
【0036】
【実施例1】
ハイドロキノン骨格を有するエポキシ樹脂、具体的にはYDC−1312(東都化成製、エポキシ当量175.6g/eq、融点141℃)を201.2部、9,9’−ビス(4−ヒドロキシフェニル)フルオレン(アドケムコ製、水酸基当量175.2g/eq)を198.8部、シクロヘキサノンを171.4部、触媒として2エチル4メチルイミダゾール(四国化成製、以後2E4MZと略す)0.16部を、撹拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコに仕込み、常圧で、反応温度を160℃〜170℃に保ち10時間撹拌した後、シクロヘキサノン128.6部、メチルエチルケトン300.0部を加えて、エポキシ当量30,800g/eq、固形分濃度40.0%(以後NV.と略す)、溶液粘度2,800cps/25℃、重量平均分子量47,000のポリヒドロキシポリエーテル樹脂のシクロヘキサノン・メチルエチルケトン混合ワニスを993部得た。この樹脂を合成樹脂ワニスIとした。
【0037】
合成樹脂ワニスIを離型フィルム(PET)へ溶剤乾燥後の樹脂厚みが60μmになるようにローラーコーターにて塗布し、130℃〜150℃、5分〜15分間溶剤乾燥を行って絶縁性フィルムを得た。また、標準試験板(PM−3118M、日本テストパネル工業製)に絶縁性フィルムと35μm銅箔を重ねて、ドライラミネーターにより160℃でラミネートして、銅箔剥離強さ測定用試験板を得た。
【0038】
試験方法は次の通りである。
銅箔剥離強さ:25℃と150℃の雰囲気下で測定を行った。
ガラス転移温度:ラミネートせずに絶縁性フィルムのままでTMA測定を行った。
吸水率:ラミネートせずに絶縁性フィルムのまま、85℃、100%×100時間での吸水率の測定を行った。
【0039】
得られた絶縁性フィルムのガラス転移点は173℃、吸水率は1.4%で、銅箔剥離強さは25℃においては、2.1kgf/cm、150℃では、2.1kgf/cmであった。この実施例ではフルオレン骨格を49.7モル%、及びハイドロキノン骨格を50.3モル%含有するもので、従来のポリヒドロキシポリエーテル樹脂に比較し、ガラス転移点が高く、同時に吸水率が小さくなっている。ガラス転移点が高温側に移行したことにより、高温度における銅箔剥離強さの低下が小さいのが特徴である。即ち、室温近辺の25℃と150℃の高温度下における銅箔剥離強さが、同じ値で耐熱性が高いことを示している。
【0040】
【実施例2】
ハイドロキノン骨格を有するエポキシ樹脂、具体的にはYDC−1312(前述)を81.8部、ビスフェノールA型エポキシ樹脂、具体的にはYD−128(東都化成製、エポキシ当量186.5g/eq)を120.0部、9,9’−ビス(4−ヒドロキシフェニル)フルオレン(前述)を198.2部、シクロヘキサノンを171.7部、触媒として2E4MZ0.16部を、撹拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコに仕込み、大気圧下で、反応温度を160℃〜170℃に保ち10時間撹拌した後、シクロヘキサノン128.6部、メチルエチルケトン300.0部を加えて、フェノール性ヒドロキシ当量16,100g/eq、NV.40.0%、溶液粘度3,300cps/25℃、重量平均分子量40,800のポリヒドロキシポリエーテル樹脂のシクロヘキサノン・メチルエチルケトン混合ワニスを991部得た。この樹脂を合成樹脂ワニスIIとした。合成樹脂ワニスIIを使用した以外は実施例1と全く同様に絶縁性フィルム及び銅箔剥離強さ測定用試験板を得た。
【0041】
得られた絶縁性フィルムのガラス転移点は175℃、銅箔剥離強さは、25℃では、2.1kgf/cm、150℃では、1.9kgf/cmで、耐熱性が高いことと併せて、高温側での銅箔剥離強さの保持力が高いことを示している。
【0042】
【実施例3】
ハイドロキノン骨格を有するエポキシ樹脂、具体的にはYDC−1312(前述)を246.8部、9,9’−ビス(4−ヒドロキシフェニル)フルオレン(前述)を203.4部、テトラブロムビスフェノールA(デットシブロミド製、水酸基当量272.0g/eq、臭素含有量58.5%)を49.8部、メチルイソブチルケトンを214.3部、触媒としてトリフェニルフォスフィン(北興化学製)0.30部を、撹拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコに仕込み、大気圧下で、反応温度を115℃〜125℃に保ち10時間撹拌した後、メチルイソブチルケトン285.7部を加え、エポキシ当量8,100g/eq、NV.50.0%、溶液粘度3,310cps/25℃、重量平均分子量20,100のポリヒドロキシポリエーテル樹脂のメチルイソブチルケトンワニスを990部得た。この樹脂を合成樹脂ワニスIIIとした。合成樹脂ワニスIIIを使用した以外は実施例1と全く同様に絶縁性フィルム及び銅箔剥離強さ測定用試験板を得た。
【0043】
得られた絶縁性フィルムのガラス転移点は169℃、銅箔剥離強さは、25℃では、2.0kgf/cm、150℃では、1.9kgf/cmで、耐熱性が高いことと併せて、高温側での銅箔剥離強さの保持力が高いことを示している。
【0044】
【実施例4】
ハイドロキノン(中央写真薬品製、水酸基当量55.0g/eq)を65.1部、9,9’−ビス(4−ヒドロキシフェニル)フルオレン(前述)を23.1部、エピクロルヒドリンを61.4部、トルエンを187.5部、触媒として48.4%水酸化ナトリウム水溶液60.0部を、撹拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコに仕込み、常圧で、反応温度を70℃〜75℃に保ち11時間撹拌した後、n−ブチルアルコールを93.0部、シュウ酸を4.1部、純水を35.7部を加え中和分液し、トルエンを312.0部、n−ブチルアルコールを156.0部加えた後、純水を117.0部加えて2回水洗分液した。その後還流脱水、溶媒回収して、エポキシ当量33,500g/eq、NV.40.0%、溶液粘度3,400cps/25℃、重量平均分子量49,500のポリヒドロキシポリエーテル樹脂のトルエン・n−ブチルアルコール混合ワニスを320部得た。この樹脂を合成樹脂ワニスIVとした。合成樹脂ワニスIVを使用した以外は実施例1と全く同様に絶縁性フィルム及び銅箔剥離強さ測定用試験板を得た。
【0045】
得られた絶縁性フィルムのガラス転移点は168℃、銅箔剥離強さは、25℃では、1.9kgf/cm、150℃では、1.8kgf/cmで、耐熱性が高いことと併せて、高温側での銅箔剥離強さの保持力が高いことを示している。
【0046】
【比較例1】
ビスフェノールA型エポキシ樹脂具体的にはYD−128(前述)を226.3部、9,9’−ビス(4−ヒドロキシフェニル)フルオレン(前述)を198.6部、メチルイソブチルケトンを182.1部、触媒としてトリフェニルフォスフィン(前述)0.25部を、撹拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコに仕込み、大気圧下で、反応温度を115℃〜125℃に保ち10時間撹拌した後、メチルイソブチルケトン165.5部を加え、エポキシ当量5,503g/eq、NV.55.0%、溶液粘度2,830cps/25℃、重量平均分子量14,600のポリヒドロキシポリエーテル樹脂のメチルイソブチルケトンワニスを833部得た。この樹脂を合成樹脂ワニスVとした。合成樹脂ワニスVを使用した以外は実施例1と全く同様に絶縁フィルム及び銅箔剥離強さ測定用試験板を得た。この比較例はフルオレン骨格のみを導入し、ハイドロキノン骨格を導入しないポリヒドロキシポリエーテル樹脂について実施したものの例である。得られた絶縁性フィルムのガラス転移点は、155℃であった。銅箔剥離強さは、25℃では、2.2kgf/cmであったが、150℃では、0.7kgf/cmとなり、高温側での銅箔剥離強さの低下が著しいことを示している。
【0047】
【比較例2】
ハイドロキノン骨格を有するエポキシ樹脂、具体的にはYDC−1312(前述)を67.3部、ビスフェノールA型エポキシ樹脂、具体的にはYD−128(前述)を161.4部、9,9’−ビス(4−ヒドロキシフェニル)フルオレン(前述)を151.6部、ハイドロキノン(前述)を19.7部、シクロヘキサノンを171.7部、触媒として2E4MZ0.16部を、撹拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコに仕込み、反応温度を160℃〜170℃に保ち10時間撹拌した後、シクロヘキサノン128.6部、メチルエチルケトン300.0部を加えて、エポキシ当量15,900g/eq、NV.40.0%、溶液粘度2,650cps/25℃、重量平均分子量32,000のポリヒドロキシポリエーテル樹脂のシクロヘキサノン・メチルエチルケトン混合ワニスを990部得た。この樹脂を合成樹脂ワニスVIとした。合成樹脂ワニスVIを使用した以外は実施例1と全く同様に絶縁フィルム及び銅箔剥離強さ測定用試験板を得た。この比較例はフルオレン骨格及びハイドロキノン骨格以外の骨格が35モル%含有されているポリヒドロキシポリエーテル樹脂について実施したものの例である。得られた絶縁性フィルムのガラス転移点は、158℃であった。銅箔剥離強さは、25℃では、2.1kgf/cmであったが、150℃では、0.8kgf/cmとなり、高温側での銅箔剥離強さの低下が著しいことを示している。
【0048】
【比較例3】
ビスフェノールAを基本構成成分とするエポキシ樹脂、YP−50SEK35(東都化成製、エポキシ当量35,300g/eq、重量平均分子量50,300、メチルエチルケトンワニス、NV.35%、ポリヒドロキシポリエーテル樹脂)を使用した以外は実施例1と全く同様に絶縁性フィルム及び銅箔剥離強さ測定用試験板を得た。この比較例は従来の技術に基づいて実施したものの例である。得られた絶縁性フィルムのガラス転移点は、85℃と低く、これに伴って銅箔剥離強さは、25℃では、1.1kgf/cm、が150℃では、0.2kgf/cmとなり、高温側での銅箔剥離強さの低下が著しいことを示している。また、吸水率も、2.7%と高くなっている。
【0049】
【比較例4】
ビスフェノールA及び臭素化ビスフェノールAを基本構成成分とするエポキシ樹脂、YPB−40AM40(東都化成製、エポキシ当量10,300g/eq、臭素含有量25.0%、重量平均分子量30,300、シクロヘキサノン・メチルエチルケトン混合ワニス、NV.40%、臭素化ポリヒドロキシポリエーテル樹脂)を使用した以外は実施例1と全く同様に絶縁性フィルム及び銅箔剥離強さ測定用試験板を得た。この比較例も従来の技術に基づいて実施したものの例である。得られた絶縁性フィルムのガラス転移点は、106℃と低く、これに伴って銅箔剥離強さは、25℃では、2.2kgf/cmであったが、150℃では、0.3kgf/cmとなり、高温側での銅箔剥離強さの低下が著しいことを示している。また、吸水率も、2.4%と高くなっている。
【0050】
以上の実施例及び比較例における絶縁性フィルムの特性値を表1にまとめて示した。フルオレン骨格及びハイドロキノン骨格の導入効果は、高温時の銅箔剥離強さに顕著に認められる。実施例の150℃における銅箔剥離強さは、比較例のそれに比較して、少なくとも1kgf/cmは大きくなっている。比較例では25℃における値が150℃において半分以下になっているのに対して、実施例では、25℃の銅箔剥離強さは、150℃においてもほとんど保持されている。また、実施例のガラス転移点は、比較例のそれに比較して、少なくとも10℃は高温側に移行している。更に、吸水性が低くなっていることが認められる。即ち、従来のビスフェノールタイプの樹脂では吸水率は2%台であるに対して、実施例では1.7%以下となっている。
【0051】
【表1】
【0052】
【発明の効果】
本発明による熱可塑性ポリヒドロキシポリエーテル樹脂を用いると、吸水性が小さく、密着性があり、かつガラス転移点が165℃を越えるフィルムが得られる。これは、耐熱性、耐水性に優れた特徴を有し、高温高湿環境においても物性が実質上低下しない絶縁性フィルムを提供するものであり、その技術上の意味は極めて大きなものがある。
【図面の簡単な説明】
【図1】実施例1で得られた熱可塑性ポリヒドロキシポリエーテル樹脂のGPCチャートである。
【図2】実施例1で得られた熱可塑性ポリヒドロキシポリエーテル樹脂のIRスペクトル図である。[0001]
BACKGROUND OF THE INVENTION
The present invention is excellent in heat resistance, water resistance and adhesion used in electrical and electronic fields such as electrical laminates, magnetic tape binders, insulating varnishes, self-bonding enameled wire varnishes, and adhesives, insulating paints and films. The present invention relates to a thermoplastic polyhydroxy polyether resin and an insulating film formed therefrom.
[0002]
[Prior art]
Thermoplastic polyhydroxypolyether resins have been known as phenoxy resins and have excellent flexibility, impact resistance, adhesion, mechanical properties, etc., so in the electronic field, electrical tapes such as magnetic tape binders and motors can be used. It has been used in a wide range of applications such as mechanical insulating varnishes and adhesive films. However, the conventional thermoplastic polyhydroxypolyether resins have poor heat resistance, and further have the drawbacks that the physical properties are drastically lowered in an environment of high temperature and high humidity, in particular, the adhesion is lowered.
[0003]
[Problems to be solved by the invention]
An object of this invention is to provide the thermoplastic polyhydroxy polyether resin excellent in heat resistance, water resistance, and adhesiveness, and the insulating film shape | molded from this resin.
[0004]
[Means for solving the problems]
The present invention introduces a fluorene skeleton and a hydroquinone skeleton into a thermoplastic polyhydroxypolyether resin, thereby providing excellent heat resistance, water resistance, and high adhesiveness retention in a high temperature range. Is what you get.
[0005]
That is, the invention of claim 1 is represented by the following formula 1 and has a weight average molecular weight range of 10,000 to 200,000 (weight average molecular weight in terms of standard polystyrene measured by gel permeation chromatography (GPC)). Hereinafter, the molecular weight is a thermoplastic polyhydroxy polyether resin having a weight average molecular weight by this measuring method).
[0006]
[Chemical 1]
[0007]
In Formula 1, X is represented by Formula 2, Formula 3 and Formula 4, the ratio of X being Formula 2 is A mol% of all X, and the ratio of X being Formula 3 Is B mol% of all X, and the ratio of X is Formula 4 is C mol% of all X, A> 0 , B ≧ 8 , 100 ≧ A + B ≧ 70, 0 ≦ C <30, A + B + C = 100 Z is either a hydrogen atom or Formula 5 and n is a value of 21 or greater.
[0008]
[Chemical 2]
[0009]
In Formula 2, R 1 , R 2 , R 3 and R 4 are selected from a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogen atom, and may be the same or different. Also good.
[0010]
[Chemical 3]
[0011]
[Formula 4]
[0012]
In Formula 4, R 1 and R 2 are selected from a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogen atom, and Y is —SO 2 —, —CH 2 —, —C (CH 3 ) 2- or -O-, and m is a value of 0 or 1. R 1 and R 2 may be the same or different.
[0013]
[Chemical formula 5]
[0014]
The invention of claim 2 is an insulating film formed from a thermoplastic polyhydroxy polyether resin represented by the above formula 1 and having a weight average molecular weight range of 10,000 to 200,000.
[0015]
In the thermoplastic polyhydroxy polyether resin, when the molecular weight is less than 10,000, the melt viscosity is small and the film forming property is not exhibited. On the other hand, when the molecular weight exceeds 200,000, the solution viscosity is too high at a concentration of 70% to 40% by weight, which is a solvent concentration generally used industrially, even if dissolved in a solvent. A large amount of solvent must be added to make the solution viscosity usable for the membrane, which is not preferable in terms of process economy. Moreover, it is difficult to say that it is preferable in the present situation that the VOC (volatile organic compound) is reduced as much as possible to the global environment. Therefore, the molecular weight is preferably 15,000 to 100,000, more preferably 20,000 to 65,000.
[0016]
A halogen may be introduced into the thermoplastic polyhydroxy polyether resin of the present invention to impart flame retardancy. When flame retardancy is imparted by introducing halogen, sufficient flame retardancy cannot be imparted if the halogen content is less than 5% by weight. In order to impart flame retardancy, the halogen may be contained in an amount of 5% by weight or more, but even if it is contained in an amount of 40% by weight or more, no further improvement in flame retardancy is observed. It is preferable to introduce halogen in the range of 5 to 40% by weight. In the present invention, any kind of halogen element may be used, but from the viewpoint of commercial production, a commercially available bromine compound, chlorine compound, or fluorine compound having a halogen content in the above range is used. Become.
[0017]
For the production of polyhydroxy polyether resins, a method by a direct reaction of dihydric phenols and epichlorohydrin and a method by an addition polymerization reaction of dihydridyl ethers of dihydric phenols and dihydric phenols are known. The polyhydroxy polyether resin used in the method may be any method.
[0018]
The case where a dihydric phenol and epichlorohydrin are reacted directly will be described as an example. Examples of the dihydric phenols include 9,9′-bis (4-hydroxyphenyl) fluorene and the following general formula 6 such as hydroquinone and 2,5-di-t-butylhydroquinone. However, it is not necessarily limited to these. Moreover, although represented by the following general formula 7, for example, bisphenol A, bisphenol F, brominated bisphenol A, 4,4′-bishydroxybiphenyl and the like can be mentioned, but are not particularly limited thereto. These dihydric phenols may be used alone or in combination of two or more. At this time, 9,9′-bis (4-hydroxyphenyl) fluorene needs to be contained in an amount of 8 mol% or more of the total dihydric phenol used. That is, if it is less than 8 mol%, the effect of introducing a fluorene skeleton involved in imparting heat resistance is not sufficient, and heat resistance cannot be obtained. Moreover, it is essential that the total use amount of 9,9′-bis (4-hydroxyphenyl) fluorene and hydroquinones is 70 mol% or more of the total dihydric phenol used. If it is less than 70 mol%, the effect of introducing the fluorene skeleton and hydroquinone skeleton involved in imparting heat resistance is not sufficient, and heat resistance cannot be obtained. Further, the dihydric phenols represented by the following formula 7 are contained in the range of 0 mol% or more and less than 30 mol% of the total dihydric phenol used.
[0019]
[Chemical 6]
[0020]
In Formula 6, R 1 , R 2 , R 3 and R 4 are selected from a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogen atom, and may be the same or different. Also good.
[0021]
[Chemical 7]
[0022]
In Formula 7, R 1 and R 2 are selected from a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogen atom, and Y is —SO 2 —, —CH 2 —, —C (CH 3 ) 2- or -O-, and m is a value of 0 or 1. R 1 and R 2 may be the same or different.
[0023]
1 mol of dihydric phenol and 0.985 to 1.015 mol of epichlorohydrin, preferably 0.99 to 1.012 mol, more preferably 0.995 to 1.01 mol in the presence of alkali metal hydroxide, A polyhydroxy polyether resin can be obtained by reacting epichlorohydrin with a dihydric phenol in a reactive solvent and performing a condensation reaction so that the molecular weight is 10,000 or more.
[0024]
Examples of the non-reactive solvent include toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, dioxane, methyl cellosolve methyl ether, ethyl cellosolve ethyl ether, cyclohexanone and the like, but are not particularly limited to these solvents. May be used alone or in combination of two or more. The reaction temperature is preferably 40 ° C to 150 ° C, particularly preferably 60 ° C to 120 ° C. The reaction pressure is usually atmospheric pressure. When it is necessary to remove reaction heat, it is usually carried out by flash evaporation / condensation reflux method of the solvent used by reaction heat, indirect cooling method, or a combination thereof.
[0025]
In the case of the production method by addition polymerization reaction of diglycidyl ether of dihydric phenol and dihydric phenol, diglycidyl ether of dihydric phenol represented by the following general formula 8 is represented by the following formula 9. Diglycidyl ethers of dihydric phenols or diglycidyl ethers of dihydric phenols represented by the following formula 10 are known catalysts such as amine-based, imidazole-based, triphenylphosphonium, and phosphonium salt-based catalysts. In the presence of 9,9′-bis (4-hydroxyphenyl) fluorene, dihydric phenols represented by general formula 6 and general formula 7, 0.9: 1 to 1.1: 1, Preferably by reacting in an amount to give a phenolic hydroxyl: epoxy ratio of 0.95: 1 to 1.05: 1, most preferably 0.98: 1 to 1.02: 1. Is done.
[0026]
Under the present circumstances, the ratio of the fluorene component in the diglycidyl ether of 9,9'-bis (4-hydroxyphenyl) fluorene and the dihydric phenol represented by Formula 9 is the dihydric phenol and dihydric phenol to be used. It is necessary that it is contained in an amount of 8 mol% or more based on the total phenol component in the diglycidyl ether. If it is less than 8 mol%, the effect of introducing a fluorene skeleton is not sufficient, and it is extremely difficult to obtain a heat resistant film. Moreover, the ratio of the dihydric phenol component in the diglycidyl ether of the dihydric phenol represented by Formula 7 and the dihydric phenol represented by Formula 10 is the dihydric phenol and dihydric phenol used. It is necessary that the content of the diglycidyl ether is 0 mol% or more and less than 30 mol% with respect to all dihydric phenol components. That is, the ratio of the dihydric phenol in the diglycidyl ether of the dihydric phenol represented by Formula 6 and the following Formula 11 and the dihydric phenol represented by Formula 8 and Formula 9 is used. It is necessary that it is 70 mol% or more and 100 mol% or less with respect to the total dihydric phenol component in the diglycidyl ether of dihydric phenols and dihydric phenols. If this value is less than 70 mol%, the effect of introducing the fluorene skeleton and hydroquinone skeleton is not sufficient, and it is extremely difficult to obtain heat resistance. The reaction temperature is preferably 60 ° C to 200 ° C, particularly preferably 90 ° C to 180 ° C. The reaction pressure is usually normal pressure, and when it is necessary to remove the heat of reaction, it is carried out by a flash evaporation / condensation reflux method of the solvent used, an indirect cooling method, or a combination thereof.
[0027]
[Chemical 8]
[0028]
In Formula 8, R 1 , R 2 , R 3 and R 4 are selected from a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogen atom, and l is a value greater than 0. R 1 , R 2 , R 3 and R 4 may be the same or different.
[0029]
[Chemical 9]
[0030]
In Equation 9, l is a value greater than 0.
[0031]
[Chemical Formula 10]
[0032]
In Formula 10, R 1 and R 2 are any one of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a halogen atom, and Y is —SO 2 —, —CH 2 —, —C (CH 3 ) 2 —. Or -O-, m is a value of 0 or 1, and l is a value greater than 0. R 1 and R 2 may be the same or different.
[0033]
Embedded image
[0034]
The thermoplastic polyhydroxy polyether resin synthesized in this way is a heat-resistant and flexible substance and can be used alone, but it contains an epoxy resin, a melanin resin, an isocyanate resin, a phenol resin, and the like. be able to. In addition, silica, calcium carbonate, talc, aluminum hydroxide, alumina, mica, etc. are used for heat resistance, flame retardancy, low linear expansion, etc., and epoxy silane coupling is used to improve adhesion. You may add an agent, a rubber component, etc. to such an extent that the physical property of thermoplastic polyhydroxy polyether resin is not dropped.
[0035]
【Example】
Hereinafter, the present invention will be specifically described based on examples. In the following Examples and Comparative Examples, “part” means “part by weight”.
[0036]
[Example 1]
201.2 parts of an epoxy resin having a hydroquinone skeleton, specifically YDC-1312 (manufactured by Tohto Kasei, epoxy equivalent 175.6 g / eq, melting point 141 ° C.), 9,9′-bis (4-hydroxyphenyl) fluorene (Adchemco, hydroxyl equivalent 175.2 g / eq) 198.8 parts, cyclohexanone 171.4 parts, 2ethyl 4-methylimidazole (manufactured by Shikoku Chemicals, hereinafter abbreviated as 2E4MZ) 0.16 parts as a catalyst, , Charged in a four-necked glass separable flask equipped with a thermometer, a condenser, and a nitrogen gas introducing device, stirred at normal pressure for 10 hours while maintaining the reaction temperature at 160 ° C. to 170 ° C., and then cyclohexanone 128.6. Part, 300.0 parts of methyl ethyl ketone, epoxy equivalent 30,800 g / eq, solid content concentration 40.0% (hereinafter referred to as NV. 993 parts of a cyclohexanone / methyl ethyl ketone mixed varnish of a polyhydroxy polyether resin having a solution viscosity of 2,800 cps / 25 ° C. and a weight average molecular weight of 47,000 was obtained. This resin was named synthetic resin varnish I.
[0037]
Synthetic resin varnish I is applied to a release film (PET) with a roller coater so that the resin thickness after solvent drying is 60 μm, and the film is dried at 130 ° C. to 150 ° C. for 5 minutes to 15 minutes for insulating film. Got. In addition, an insulating film and a 35 μm copper foil were layered on a standard test plate (PM-3118M, manufactured by Nippon Test Panel Industry) and laminated at 160 ° C. with a dry laminator to obtain a test plate for measuring copper foil peel strength. .
[0038]
The test method is as follows.
Copper foil peel strength: Measurement was performed in an atmosphere of 25 ° C. and 150 ° C.
Glass transition temperature: TMA measurement was performed with the insulating film kept without being laminated.
Water absorption rate: The water absorption rate at 85 ° C. and 100% × 100 hours was measured with the insulating film kept without being laminated.
[0039]
The obtained insulating film has a glass transition point of 173 ° C., a water absorption of 1.4%, a copper foil peel strength of 2.1 kgf / cm at 25 ° C., and 2.1 kgf / cm at 150 ° C. there were. This example contains 49.7 mol% of fluorene skeleton and 50.3 mol% of hydroquinone skeleton, and has a higher glass transition point and lower water absorption at the same time as conventional polyhydroxypolyether resins. ing. Since the glass transition point has shifted to the high temperature side, the decrease in copper foil peel strength at high temperatures is small. That is, it shows that the copper foil peel strength at high temperatures of 25 ° C. and 150 ° C. near room temperature is the same value and heat resistance is high.
[0040]
[Example 2]
Epoxy resin having a hydroquinone skeleton, specifically 81.8 parts of YDC-1312 (described above), bisphenol A type epoxy resin, specifically YD-128 (manufactured by Tohto Kasei, epoxy equivalent 186.5 g / eq) 120.0 parts, 9,9'-bis (4-hydroxyphenyl) fluorene (as described above) 198.2 parts, cyclohexanone 171.7 parts, 2E4MZ 0.16 parts as a catalyst, stirrer, thermometer, condenser The mixture was charged into a four-necked glass separable flask equipped with a nitrogen gas introducing device, and the reaction temperature was maintained at 160 ° C. to 170 ° C. under atmospheric pressure, followed by stirring for 10 hours, and then 128.6 parts of cyclohexanone, 300 ml of methyl ethyl ketone. 0 parts was added, phenolic hydroxy equivalent 16,100 g / eq, NV. 991 parts of a cyclohexanone / methyl ethyl ketone mixed varnish of a polyhydroxy polyether resin having 40.0%, a solution viscosity of 3,300 cps / 25 ° C., and a weight average molecular weight of 40,800 were obtained. This resin was designated as synthetic resin varnish II. An insulating film and a copper foil peel strength test plate were obtained in the same manner as in Example 1 except that the synthetic resin varnish II was used.
[0041]
The obtained insulating film has a glass transition point of 175 ° C. and a copper foil peel strength of 2.1 kgf / cm at 25 ° C. and 1.9 kgf / cm at 150 ° C., together with high heat resistance. It shows that the holding power of the copper foil peeling strength on the high temperature side is high.
[0042]
[Example 3]
Epoxy resin having a hydroquinone skeleton, specifically, YDC-1312 (described above) 246.8 parts, 9,9'-bis (4-hydroxyphenyl) fluorene (described above) 203.4 parts, tetrabromobisphenol A ( 49.8 parts of hydroxyl group equivalent 272.0 g / eq, bromine content 58.5%), methyl isobutyl ketone 214.3 parts, triphenylphosphine (made by Hokuko Chemical) 0.30 as a catalyst Was charged into a four-necked glass separable flask equipped with a stirrer, thermometer, condenser, and nitrogen gas introducing device, and the reaction temperature was maintained at 115 ° C. to 125 ° C. under atmospheric pressure for 10 hours. Thereafter, 285.7 parts of methyl isobutyl ketone was added, and an epoxy equivalent of 8,100 g / eq, NV. 990 parts of methyl isobutyl ketone varnish of polyhydroxy polyether resin having 50.0%, solution viscosity of 3,310 cps / 25 ° C., and weight average molecular weight of 20,100 were obtained. This resin was designated as synthetic resin varnish III. An insulating film and a copper foil peel strength test plate were obtained in the same manner as in Example 1 except that the synthetic resin varnish III was used.
[0043]
The obtained insulating film has a glass transition point of 169 ° C., and a copper foil peel strength of 2.0 kgf / cm at 25 ° C. and 1.9 kgf / cm at 150 ° C., together with high heat resistance. It shows that the holding power of the copper foil peeling strength on the high temperature side is high.
[0044]
[Example 4]
65.1 parts hydroquinone (manufactured by Chuo Photochemicals, hydroxyl equivalent 55.0 g / eq), 23.1 parts 9,9'-bis (4-hydroxyphenyl) fluorene (described above), 61.4 parts epichlorohydrin, Charge 187.5 parts of toluene and 60.0 parts of 48.4% sodium hydroxide aqueous solution as a catalyst into a four-necked glass separable flask equipped with a stirrer, thermometer, condenser, and nitrogen gas introduction device. After stirring for 11 hours while maintaining the reaction temperature at 70 ° C. to 75 ° C. at normal pressure, neutralize by adding 93.0 parts of n-butyl alcohol, 4.1 parts of oxalic acid, and 35.7 parts of pure water. After liquid separation, 312.0 parts of toluene and 156.0 parts of n-butyl alcohol were added, and 117.0 parts of pure water was added, followed by separation with water twice. Thereafter, reflux dehydration and solvent recovery were carried out to obtain an epoxy equivalent of 33,500 g / eq, NV. 320 parts of a toluene / n-butyl alcohol mixed varnish of a polyhydroxy polyether resin having 40.0%, a solution viscosity of 3,400 cps / 25 ° C., and a weight average molecular weight of 49,500 was obtained. This resin was designated as synthetic resin varnish IV. An insulating film and a copper foil peel strength test plate were obtained in exactly the same manner as in Example 1 except that the synthetic resin varnish IV was used.
[0045]
The obtained insulating film has a glass transition point of 168 ° C., a copper foil peel strength of 1.9 kgf / cm at 25 ° C., and 1.8 kgf / cm at 150 ° C., together with high heat resistance. It shows that the holding power of the copper foil peeling strength on the high temperature side is high.
[0046]
[Comparative Example 1]
Bisphenol A type epoxy resin Specifically, 226.3 parts of YD-128 (previously described), 198.6 parts of 9,9′-bis (4-hydroxyphenyl) fluorene (previously described), 182.1 parts of methyl isobutyl ketone 0.25 parts of triphenylphosphine (described above) as a catalyst was charged into a four-necked glass separable flask equipped with a stirrer, thermometer, condenser, and nitrogen gas introducing device, and under atmospheric pressure, After maintaining the reaction temperature at 115 ° C. to 125 ° C. and stirring for 10 hours, 165.5 parts of methyl isobutyl ketone was added, and an epoxy equivalent of 5,503 g / eq, NV. As a result, 833 parts of methyl isobutyl ketone varnish, a polyhydroxy polyether resin having 55.0%, a solution viscosity of 2,830 cps / 25 ° C., and a weight average molecular weight of 14,600 were obtained. This resin was designated as synthetic resin varnish V. Except that the synthetic resin varnish V was used, an insulating film and a copper foil peel strength test plate were obtained in exactly the same manner as in Example 1. This comparative example is an example of a polyhydroxy polyether resin in which only a fluorene skeleton is introduced and a hydroquinone skeleton is not introduced. The glass transition point of the obtained insulating film was 155 degreeC. Although the copper foil peel strength was 2.2 kgf / cm at 25 ° C., it was 0.7 kgf / cm at 150 ° C., indicating a significant decrease in copper foil peel strength on the high temperature side. .
[0047]
[Comparative Example 2]
Epoxy resin having hydroquinone skeleton, specifically YDC-1312 (previously described) 67.3 parts, bisphenol A type epoxy resin, specifically YD-128 (previously described) 161.4 parts, 9,9′- 151.6 parts of bis (4-hydroxyphenyl) fluorene (previously described), 19.7 parts of hydroquinone (previously described), 171.7 parts of cyclohexanone, 0.16 part of 2E4MZ as a catalyst, a stirrer, a thermometer, a cooling tube The mixture was charged into a four-necked glass separable flask equipped with a nitrogen gas introducing device, and the reaction temperature was kept at 160 ° C. to 170 ° C. and stirred for 10 hours. Then, 128.6 parts of cyclohexanone and 300.0 parts of methyl ethyl ketone were added. , Epoxy equivalent 15,900 g / eq, NV. 990 parts of a cyclohexanone / methyl ethyl ketone mixed varnish of a polyhydroxy polyether resin having 40.0%, a solution viscosity of 2,650 cps / 25 ° C., and a weight average molecular weight of 32,000 were obtained. This resin was designated as synthetic resin varnish VI. A test plate for measuring an insulating film and a copper foil peel strength was obtained in exactly the same manner as in Example 1 except that the synthetic resin varnish VI was used. This comparative example is an example of a polyhydroxy polyether resin containing 35 mol% of a skeleton other than a fluorene skeleton and a hydroquinone skeleton. The glass transition point of the obtained insulating film was 158 degreeC. Although the copper foil peel strength was 2.1 kgf / cm at 25 ° C., it was 0.8 kgf / cm at 150 ° C., indicating a significant decrease in copper foil peel strength on the high temperature side. .
[0048]
[Comparative Example 3]
Uses epoxy resin with bisphenol A as a basic component, YP-50SEK35 (manufactured by Tohto Kasei, epoxy equivalent 35,300 g / eq, weight average molecular weight 50,300, methyl ethyl ketone varnish, NV. 35%, polyhydroxy polyether resin) A test plate for measuring an insulating film and a copper foil peel strength was obtained in exactly the same manner as in Example 1 except that. This comparative example is an example implemented based on the prior art. The glass transition point of the obtained insulating film is as low as 85 ° C., and accordingly, the copper foil peel strength is 1.1 kgf / cm at 25 ° C. and 0.2 kgf / cm at 150 ° C., It shows that the decrease in copper foil peel strength on the high temperature side is remarkable. Also, the water absorption rate is as high as 2.7%.
[0049]
[Comparative Example 4]
Epoxy resin comprising bisphenol A and brominated bisphenol A as basic constituents, YPB-40AM40 (manufactured by Tohto Kasei, epoxy equivalent 10,300 g / eq, bromine content 25.0%, weight average molecular weight 30,300, cyclohexanone methyl ethyl ketone An insulating film and a test plate for measuring peel strength of copper foil were obtained in the same manner as in Example 1 except that mixed varnish, NV.40%, brominated polyhydroxypolyether resin) was used. This comparative example is also an example implemented based on the prior art. The glass transition point of the obtained insulating film was as low as 106 ° C., and accompanying this, the copper foil peel strength was 2.2 kgf / cm at 25 ° C., but 0.3 kgf / cm at 150 ° C. cm, indicating that the copper foil peel strength is significantly reduced on the high temperature side. Moreover, the water absorption rate is as high as 2.4%.
[0050]
Table 1 summarizes the characteristic values of the insulating films in the above Examples and Comparative Examples. The effect of introducing the fluorene skeleton and the hydroquinone skeleton is remarkably recognized in the copper foil peel strength at high temperatures. The copper foil peel strength at 150 ° C. of the example is at least 1 kgf / cm larger than that of the comparative example. In the comparative example, the value at 25 ° C. is less than half at 150 ° C., whereas in the example, the copper foil peel strength at 25 ° C. is almost maintained even at 150 ° C. Moreover, the glass transition point of an Example has shifted | transferred to the high temperature side at least 10 degreeC compared with that of a comparative example. Furthermore, it is recognized that the water absorption is low. That is, in the conventional bisphenol type resin, the water absorption is in the range of 2%, whereas in the examples, it is 1.7% or less.
[0051]
[Table 1]
[0052]
【The invention's effect】
When the thermoplastic polyhydroxy polyether resin according to the present invention is used, a film having low water absorption, adhesion, and a glass transition point exceeding 165 ° C. can be obtained. This is to provide an insulating film having characteristics excellent in heat resistance and water resistance, and in which physical properties are not substantially lowered even in a high-temperature and high-humidity environment, and its technical meaning is extremely large.
[Brief description of the drawings]
1 is a GPC chart of a thermoplastic polyhydroxy polyether resin obtained in Example 1. FIG.
2 is an IR spectrum diagram of the thermoplastic polyhydroxy polyether resin obtained in Example 1. FIG.
Claims (2)
A>0
B≧8
100≧A+B≧70
0≦C<30
A+B+C=100であり、
Zは水素原子または式化5のいずれかであり、nは21以上の値である。
A> 0
B ≧ 8
100 ≧ A + B ≧ 70
0 ≦ C <30
A + B + C = 100,
Z is either a hydrogen atom or Formula 5 and n is a value of 21 or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12948398A JP3811571B2 (en) | 1998-04-22 | 1998-04-22 | Thermoplastic polyhydroxypolyether resin and insulating film molded therefrom |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12948398A JP3811571B2 (en) | 1998-04-22 | 1998-04-22 | Thermoplastic polyhydroxypolyether resin and insulating film molded therefrom |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11302373A JPH11302373A (en) | 1999-11-02 |
| JP3811571B2 true JP3811571B2 (en) | 2006-08-23 |
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|---|---|---|---|
| JP12948398A Expired - Lifetime JP3811571B2 (en) | 1998-04-22 | 1998-04-22 | Thermoplastic polyhydroxypolyether resin and insulating film molded therefrom |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP4434427B2 (en) * | 2000-04-27 | 2010-03-17 | 東都化成株式会社 | Thermoplastic polyhydroxypolyether resin and insulating film molded therefrom |
| JP4852785B2 (en) * | 2000-11-29 | 2012-01-11 | 日立化成工業株式会社 | Film adhesive for circuit connection, circuit terminal connection structure, and circuit terminal connection method |
| JP4027066B2 (en) * | 2001-10-09 | 2007-12-26 | 東都化成株式会社 | Polyhydroxy polyether resin composition, curable resin composition containing the polyhydroxy polyether resin, metal foil with resin, resin film |
| WO2003088282A1 (en) * | 2002-04-12 | 2003-10-23 | Jongo Yoon | Enameled wire having magnetic reluctance properties and preparation method thereof, and coil using the same and preparation method thereof |
| KR101367583B1 (en) | 2004-10-07 | 2014-02-25 | 히타치가세이가부시끼가이샤 | Resin composition for optical material, resin film for optical material and optical waveguide using same |
| JP5266598B2 (en) * | 2008-11-28 | 2013-08-21 | ナガセケムテックス株式会社 | Phenoxy resin containing a condensed ring structure |
| JP6094353B2 (en) * | 2013-04-17 | 2017-03-15 | Jsr株式会社 | Protective film forming composition, protective film forming method, protective film and protective film removing method |
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1998
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