JP3823914B2 - Evaporation source apparatus and vacuum arc deposition apparatus for vacuum arc deposition - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an evaporation source apparatus for vacuum arc deposition used in vacuum arc deposition for forming a thin film on an article, such as wear resistance, slidability, corrosion resistance, etc. for automobile parts, machine parts, tools, molds, etc. The present invention relates to an evaporation source apparatus for vacuum arc deposition that can be used to form a thin film for improving at least one of them, and a vacuum arc deposition apparatus equipped with such an evaporation source apparatus.
[0002]
[Prior art]
In vacuum arc deposition, a vacuum arc discharge is generated between an anode (anode) and a cathode (cathode) under a reduced pressure atmosphere, and the cathode material is evaporated by the arc discharge to generate plasma containing an ionized cathode material, This is a thin film forming method in which an ionized cathode material is made to fly to a film formation object to form a thin film on the object.
[0003]
In generating an arc discharge between the anode and the cathode, an arc discharge inducing trigger electrode is disposed opposite to the discharge surface of the cathode, a voltage is applied between the cathode and the trigger electrode, and the trigger electrode is It has been practiced to contact the discharge surface and subsequently separate to generate arc discharge, thereby inducing arc discharge between the anode and the cathode.
[0004]
In order to generate an arc discharge between the anode and the cathode, a ring-shaped trigger electrode is disposed around the cathode via an insulator, and a voltage is applied between the cathode and the trigger ring electrode to apply the voltage. A creeping discharge is also generated through the surface of the insulator, thereby inducing an arc discharge between the anode and the cathode.
[0005]
The portion including the cathode and the trigger electrode for inducing arc discharge that faces the cathode is generally called an evaporation source for vacuum arc deposition.
[0006]
In such an evaporation source device, the cathode is consumed over time. In an evaporation source apparatus of the type in which the trigger electrode for inducing arc discharge is disposed opposite to the discharge surface of the cathode, when the cathode constituent material is a metal such as titanium or chromium, the cathode discharge surface due to discharge between the trigger electrode and the cathode Consumption is almost equal to each part, but in the case of some materials, for example, when the cathode constituent material is carbon or a material containing carbon as a main component, as shown in FIG. The portion of the cathode discharge surface that contacts the electrode is locally consumed and becomes a recess.
[0007]
When such a cathode is employed, if the discharge by the trigger electrode is repeated, it becomes difficult or impossible to contact the trigger electrode with the cathode discharge surface, and vacuum arc discharge cannot be induced. In addition, such a condition occurs at an early stage due to local exhaustion of the cathode, so the life of the cathode is short. Therefore, in the manufacture of a thin film-coated article by vacuum arc deposition, the cathode must be frequently replaced, and the productivity of the article deteriorates accordingly, resulting in high manufacturing costs.
[0008]
In order to solve such a problem, Japanese Patent Application Laid-Open No. 5-17866 discloses that a cathode is formed in an elongated rod shape and its end surface is used as a discharge surface, and this is sent to the trigger electrode according to the degree of wear of the cathode. Propose that. Japanese Laid-Open Patent Publication No. 2002-206162 discloses that a plurality of trigger electrode portions are arranged on the cathode discharge surface, and the plurality of trigger electrode portions are selectively switched and used, for example. It proposes to suppress significant wear.
[0009]
Even in an evaporation source of a type in which a ring-shaped trigger electrode is arranged around the cathode via an insulator, if the cathode constituent material is, for example, carbon or a material mainly composed of carbon, the outer periphery of the cathode is caused by trigger discharge. Local wear occurs and the desired vacuum arc discharge between the anode and cathode cannot be induced.
[0010]
Therefore, Japanese Patent Application Laid-Open No. 11-329267 discloses that the cathode is formed in a hollow cylindrical shape and is sent out according to the consumption of the cathode, or the solid cathode is taken in and out according to the local consumption. is suggesting.
[0011]
[Patent Document 1]
JP-A-5-17866
[Patent Document 2]
JP 11-329267 A
[Patent Document 3]
JP 2002-206162 A
[0012]
[Problems to be solved by the invention]
Here, among conventional techniques for solving the difficulty of inducing vacuum arc discharge caused by local consumption of the cathode in an evaporation source apparatus of the type in which the trigger electrode for inducing arc discharge is arranged opposite to the discharge surface of the cathode, Japanese Patent Laid-Open No. Hei 5- As for the method disclosed in Japanese Patent No. 17866, a long and narrow bar-shaped cathode must be adopted, so that a space for arranging a long cathode is required, and it is difficult to adopt in a situation where such a space cannot be secured.
[0013]
Further, in the technique disclosed in Japanese Patent Laid-Open No. 2002-206162, since a plurality of trigger electrode portions must be prepared, even when one type of trigger electrode is used, the cathode can be replaced as much as possible. The advent of an evaporation source device that can be used for a long time is desired.
[0014]
Therefore, the present invention is an evaporation source apparatus for vacuum arc deposition of a type in which a trigger electrode is disposed opposite to a cathode discharge surface, and even when a cathode that easily contacts a trigger electrode is used as the cathode, Even if the cathode is not particularly long and thin, and even if a single type of trigger electrode is used, the life of the cathode is long, and the vacuum arc deposition process can be continued without frequent replacement of the cathode. It is an object of the present invention to provide an evaporation source apparatus for vacuum arc deposition that can provide thin film-coated articles by vapor deposition with good productivity and at low cost.
[0015]
The present invention also relates to a vacuum arc vapor deposition apparatus having an evaporation source apparatus for vacuum arc vapor deposition of a type in which a trigger electrode is disposed opposite to a cathode discharge surface, and a contact portion with the trigger electrode is locally consumed as the cathode. Even when using an easy cathode, even when the cathode is not particularly elongated, or when using a single type of trigger electrode, the life of the cathode is long, and vacuum arc deposition treatment can be performed without frequently replacing the cathode. It is an object of the present invention to provide a vacuum arc deposition apparatus that can continue, and thus can provide a thin film-coated article by vacuum arc deposition with good productivity and low cost.
[0016]
[Means for Solving the Problems]
As a result of repeated researches to solve the above problems, the present inventor has obtained the following knowledge.
[0017]
That is, in the case of an evaporation source device using a cathode where the discharge surface portion in contact with the trigger electrode tends to be locally consumed, the cathode discharge surface is consumed when a discharge is generated between the cathode and the trigger electrode opposed to the cathode. Is generated locally at the discharge surface portion where the trigger electrode contacts, but the consumption of the discharge surface portion around it is small. Therefore, even when only one trigger electrode is used, if only the locally consumed portion is moved to the position of the surrounding discharge surface portion according to the degree of consumption, the trigger electrode and the cathode are repeatedly used. A discharge can be generated, and the lifetime of the entire cathode is increased accordingly. In addition, by doing so, it is possible to arrange the cathode in a compact manner without requiring a long space required if the cathode is not formed into a particularly long and slender bar, in other words, if it is formed into a long and slender bar. The entire source device can also be made more compact.
[0018]
Further, in the case of an evaporation source device using a cathode whose discharge surface portion in contact with the trigger electrode is likely to be locally consumed, for example, a relatively fragile cathode (for example, a carbon cathode), between the cathode and the trigger electrode opposed to the cathode. When the contact pressure of the trigger electrode on the cathode discharge surface is high, the cathode is easily scraped off locally due to the contact, and the cathode discharge surface is consumed when the discharge pressure is generated. , Large local wear is suppressed, and the discharge surface is generally more shallow and easily consumed.
[0019]
Therefore, by adjusting the contact pressure when the trigger electrode is in contact with the cathode discharge surface, even when only one trigger electrode is used, large local consumption of the cathode discharge surface is suppressed, and the trigger electrode and the cathode are Thus, the discharge of the cathode can be repeated, and the life of the entire cathode can be extended accordingly. Moreover, if it is formed in the shape of an elongated bar, the cathode can be arranged in a compact manner without requiring a long space, and as a result, the entire evaporation source device can be formed in a compact manner.
[0020]
Based on the above knowledge, the present invention provides the following two types of evaporation source apparatuses for vacuum arc deposition, and also provides a vacuum arc deposition apparatus employing at least one of them.
(1) The first type of evaporation source device for vacuum arc deposition
It includes a cathode that is an evaporation source and a trigger electrode for inducing arc discharge that opposes the discharge surface of the cathode, and the cathode is fitted into a cathode outer cylinder part so as to be movable toward the trigger electrode in the cathode outer cylinder part An evaporation source device for vacuum arc deposition, wherein the trigger electrode is disposed to face the discharge surface of the cathode core.
(2) Second type evaporation source device for vacuum arc deposition
For vacuum arc deposition comprising a cathode as an evaporation source and a trigger electrode for inducing arc discharge facing the discharge surface of the cathode, and having a device for adjusting the mutual contact pressure between the discharge surface of the cathode and the trigger electrode Evaporation source device.
[0021]
In the first type evaporation source device, in order to consume the discharge surface of the cathode core as uniformly as possible, the core can be rotated around an axis in the moving direction with respect to the cathode outer cylinder. It may be provided. For example, you may provide so that rotation is possible with the movement with respect to the cathode outer cylinder part of a cathode core part.
[0022]
Also in the first type evaporation source device, a device for adjusting the mutual contact pressure between the discharge surface of the cathode core and the trigger electrode may be provided.
[0023]
In both the first and second types of evaporation source devices, the trigger discharge surface is consumed as uniformly as possible in the cathode discharge surface (especially the discharge surface of the cathode core in the case of the first type device). The electrode may have a plurality of contact locations (in other words, trigger electrode portions) for contacting the cathode discharge surface.
[0024]
In any type of evaporation source apparatus, examples of the cathode include those made of carbon or a material mainly composed of carbon. By adopting such a cathode, a carbon film is formed on an article to be deposited, or a separate evaporation source device having a cathode made of a reactive gas that reacts with carbon or a material different from carbon is employed. A carbon compound film or the like can be formed.
[0025]
In any type of evaporation source device, a magnetic filter that controls deflection of the flight direction of the ionized cathode material generated from the cathode by vacuum arc discharge may be provided. By providing such a magnetic filter, it is possible to suppress the cathode material macro particles, which may be generated when the cathode evaporates, from flying to the article to be deposited, and to thereby form a good quality thin film.
[0026]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
[0027]
FIG. 1 shows a schematic configuration of an example of a vacuum arc vapor deposition apparatus employing one example of an evaporation source apparatus for vacuum arc vapor deposition.
[0028]
The vacuum arc vapor deposition apparatus shown in FIG. 1 includes a film forming container 1, and a holder 2 that supports a film forming article (here, in the form of a substrate) S is installed in the container 1. The holder 2 is connected to a power source PW1 that applies a bias voltage to the film-forming article S mounted on the holder during film formation.
[0029]
An exhaust device EX is connected to the container 1 so that the inside of the container 1 can be set to a desired reduced pressure state. Further, the container wall portion 11 is provided with an evaporation source device 3 for vacuum arc deposition.
[0030]
The evaporation source device 3 includes a tubular body 31 that is connected to the container 1 in a side view (as viewed from the side), and the tubular body 31 is connected to the container 1 on the one hand, toward the container holder 2. On the other hand, the cathode 32 described below is supported.
[0031]
A coil CL is wound around the tubular body 31, and a power source PW2 for energizing this to form a magnetic field is connected to the coil. The tubular body 31, the coil CL, and the power source PW2 constitute a magnetic filter F.
[0032]
A wall plate 33 for attaching a cathode or the like is attached to the free end portion of the tube body 31, and a cathode 32 is provided at the center of the wall plate. The wall plate 33 is grounded. The cathode 32 includes a short cylindrical outer cylindrical portion 321 and a solid cylindrical core portion 322 slidably fitted thereto. The outer cylinder part 321 and the core part 322 may be formed of a material selected according to the film to be formed, and both are made of carbon in this example.
[0033]
A hole 331 is formed in the center portion of the wall plate 33, and the cathode outer cylinder portion 321 is fixed to the hole surrounding area on the inner surface of the wall plate 33 via a cylindrical insulator 34.
[0034]
The cathode core part 322 is loosely fitted in the central hole 331 of the wall plate 33, penetrates and is slidably fitted to the cathode outer cylinder part 321, and can move in the direction of the central axis of the outer cylinder part.
[0035]
An insulating member 35 is attached to the outer surface of the wall plate 33, and an operation rod 36 is screwed to it. The rear end of the cathode core 322 is connected to the tip of the operation rod by, for example, screwing (screwing). Therefore, by rotating the operating rod 36 outside the wall plate 33, the cathode core portion 322 can be moved in the direction of the central axis with respect to the cathode outer cylinder portion 321, and the moving direction with respect to the outer cylinder portion 321 is also possible. Around the axis (here, around the central axis of the outer cylindrical portion 321) while being rotated.
[0036]
In the region inside the wall plate 33, a cylindrical anode 37 is provided around the cathode outer cylindrical portion 321, and in the anode 37, a rod-shaped trigger electrode 38 is the central portion of the end surface (discharge surface) of the cathode core portion 322. It faces. The anode 37 is grounded.
[0037]
The trigger electrode 38 extends to the outside of the anode through the opening of the anode 37 far from the cathode 32 and is supported by the support rod 381. The support rod 381 is connected to a reciprocating drive device 40 outside the wall plate 33 via a so-called feedthrough device 39 provided on the wall plate 33, which allows the rod 381 to reciprocate while airtightly blocking the inside and outside of the wall plate 33. ing. The reciprocating drive device 40 is a piston cylinder device in this example. The trigger electrode 38 can be brought into contact with and separated from the cathode core 322 by the device 40.
[0038]
Further, the drive shaft 401 of the drive device 40 is provided with an activation unit 51, and a pressure detector 52 that faces the path of the activation unit 51 and can contact the activation unit 51 is installed. As will be described later, when the vacuum arc discharge is induced, the trigger electrode 38 is once brought into contact with the discharge surface of the cathode core portion 322 and then separated from the discharge surface. Is detected by a detector 52. Therefore, the contact pressure of the trigger electrode 38 with respect to the cathode 32 can be adjusted based on the pressure detected by the detector. Here, the detected pressure information by the detector 52 is input to the control unit C1, and the control unit C1 compares the input value with a preset mutual contact pressure between the trigger electrode and the cathode, and the input value is set. The working fluid pressure adjusting unit 402 connected to the driving device 40 is controlled so as to become a pressure. Thereby, the mutual contact pressure between the trigger electrode and the cathode can be set to a predetermined pressure capable of suppressing the cathode shaving. The starter 51, the pressure detector 52, the controller C1, and the like constitute one example (device 5) of a device that adjusts the mutual contact pressure between the discharge surface of the cathode core and the trigger electrode. The set contact pressure of the trigger electrode 38 to the cathode 32 is such that the consumption of the cathode core portion 322 is as shallow as possible and does not hinder the induction of vacuum arc discharge between the anode 37 and the cathode 32.
[0039]
The evaporation source device 3 also includes an arc power supply PW3. The power supply PW3 can apply an arc discharge voltage between the cathode 32 and the anode 37, and induces an arc discharge between the cathode 32 and the anode 37. In order to achieve this, wiring is connected to the cathode 32 or the like so that a trigger voltage can be applied between the cathode 32 and the trigger electrode 38. The trigger electrode 38 is grounded via a resistor R so that no arc current flows.
[0040]
According to the vacuum arc vapor deposition apparatus described above, the carbon thin film can be formed on the film-formed article S as follows.
[0041]
First, in the evaporation source device 3, as shown in FIG. 2A, the discharge surface 321a of the outer cylinder portion 321 and the discharge surface 322a of the core portion 322 in the cathode 32 are arranged at the same surface position. The film formation article S is placed on the holder 2. Next, the exhaust device EX is operated to exhaust from the container 1 and the tube 31 connected thereto, and the pressure is reduced to the film forming pressure.
[0042]
In addition, a bias voltage for attracting film-forming ions from the power source PW1 is started to be applied to the film-forming article S on the holder 2, and the coil CL of the magnetic filter F in the evaporation source device 3 is energized from the power source PW2, A magnetic field is formed in the body 31. Further, application of a voltage from the power source PW3 to the cathode 32 is started.
[0043]
In this state, the trigger electrode 38 is brought into contact with the cathode core portion 322 and subsequently pulled away. As a result, a spark is generated between the electrode 38 and the cathode 32, which triggers a vacuum arc discharge between the anode 37 and the cathode 32. The carbon cathode 32 is heated by this arc discharge, carbon is evaporated from the cathode, and plasma containing ionized carbon is formed in front of the cathode 32. The carbon ions formed in this way are deflected by the magnetic filter F toward the film-forming article S on the holder 2 and fly to the article S to which a bias voltage is applied, thereby forming a carbon thin film on the article. Thus, a carbon thin film coated article is obtained. It is not always necessary to apply a bias voltage to the article.
[0044]
Although the magnetic filter F is not necessarily provided, by providing the magnetic filter F, carbon macroparticles that may be generated when the cathode 32 evaporates fly to the film-forming article S. It is possible to suppress the formation of a good quality carbon thin film.
[0045]
The tube 31 constituting the filter F may be installed in an insulated state with respect to the container 1, the wall plate 33, etc., and a positive potential may be applied to the tube 31 to remove negatively charged particles. .
[0046]
In general, in the formation of a thin film by vacuum arc deposition, the discharge surface of the cathode is locally consumed when an arc discharge is induced by a trigger electrode in the evaporation source device. When a carbon film is successively formed on a new article to be deposited, vacuum arc discharge is repeatedly induced using a trigger electrode, and the arc discharge current decreases for some reason even during film formation on one article. The triggering electrode must be used again to induce a vacuum arc discharge. As a result, the degree of local consumption of the cathode gradually increases, and the desired vacuum arc discharge does not occur because the trigger electrode can no longer come into contact with the cathode at an early stage after the start of use of the cathode.
[0047]
In this regard, in the vacuum arc vapor deposition apparatus, as shown in FIG. 2B, the cathode core portion 322 in contact with the trigger electrode 38 is particularly consumed, while the outer cylinder portion 321 is less consumed. Therefore, the operating rod 36 is rotated according to the degree of consumption of the cathode core portion 322, and the cathode core portion 32 is sent to the outer cylinder portion 321 in the axial direction as shown in FIG. The discharge surface 322a of the cathode core portion is arranged close to the position of the discharge surface 321a of the outer cylinder portion while rotating around. Thereby, the arc discharge induction by the trigger electrode 38 can be continuously performed. Thus, it is possible to use the cathode 32 for a long time without exchanging the cathode 32. As a result, the carbon film-coated article can be manufactured with high productivity and low cost.
[0048]
In this example, the cathode core 322 is rotated at the same time as it is delivered, but this is not necessarily so. However, by rotating in such a manner, the cathode core discharge surface 322a can be consumed as uniformly as possible throughout the entire surface, and the same cathode can be used for a longer period of time than when only local wear occurs. it can. The outer cylinder portion 321 may also be rotated in the same manner.
[0049]
In general, in the formation of a thin film by vacuum arc deposition, the discharge surface of the cathode is locally consumed when an arc discharge is induced by the trigger electrode in the evaporation source apparatus. It depends on the contact pressure when contacting the surface. That is, as shown in FIG. 3 (A), if the contact pressure is too high, the cathode discharge surface is locally deeply shaved and consumed, and if this is repeated, the trigger electrode will also induce vacuum arc discharge at an early stage. Will be disturbed. On the other hand, when the contact pressure is lowered, as shown in FIG. However, if the contact pressure is too low, vacuum arc discharge between the anode and the cathode cannot be induced smoothly, so the contact pressure must be moderate.
[0050]
In this regard, in the vacuum arc vapor deposition apparatus, the contact pressure adjusting device 5 reduces the contact pressure on the discharge surface 322a of the cathode core portion 322 of the trigger electrode 38 so that the consumption of the cathode core portion 322 is as shallow as possible. In addition, it can be adjusted so as not to hinder the induction of vacuum arc discharge between the anode 37 and the cathode 32. Thus, it can be used for a long time without replacing the cathode 32, and as a result, the carbon film-coated article can be produced with high productivity and low cost.
[0051]
(1) Since the cathode is composed of an outer cylinder portion and a core portion, and (2) the contact pressure of the trigger electrode to the cathode discharge surface is adjusted accordingly, the life of the cathode is extended accordingly. Either one of these may be employed, but the lifetime of the cathode is further increased by employing both (1) and (2).
[0052]
In the above description, an example in which a carbon thin film is formed on the article to be deposited S has been shown. However, it is possible to form a thin film other than a carbon film by using a constituent material of the cathode 32 as a material other than carbon. Even if another cathode is used, a reactive gas that reacts with the ionized cathode constituent material is introduced into the container 1 or a separate evaporation having a cathode made of a material different from the cathode 32 is used. Various thin films can be formed by installing the source device in the container 1 or the like.
[0053]
Further, in the evaporation source device 3 described above, the trigger electrode has a single rod shape, but a plurality of trigger electrode portions, for example, a rod shape or a protrusion shape that is uniformly distributed with respect to the discharge surface 322a of the cathode core portion 322. In addition, a trigger electrode having a trigger electrode portion such as a dot shape may be employed. FIG. 4 shows an example 380 of trigger electrodes in which a plurality of trigger electrode portions are equally arranged. The trigger electrode portion 381 is protruded from the ring-shaped base 382. By adopting such a trigger electrode, the discharge surface of the cathode 32 can be consumed uniformly, and the life of the cathode is further increased.
[0054]
【The invention's effect】
As described above, according to the present invention, it is an evaporation source device for vacuum arc vapor deposition of a type in which a trigger electrode is disposed opposite to a cathode discharge surface, and the contact portion with the trigger electrode as the cathode is likely to be locally consumed. Even when using a cathode, even if the cathode is not particularly long, or when using a single type of trigger electrode, the life of the cathode is long and the vacuum arc deposition process can be continued without frequently replacing the cathode. Thus, it is possible to provide an evaporation source apparatus for vacuum arc deposition that can provide a thin film-coated article by vacuum arc deposition with good productivity and low cost.
[0055]
Further, according to the present invention, there is provided a vacuum arc vapor deposition apparatus having an evaporation source apparatus for vacuum arc vapor deposition of a type in which a trigger electrode is disposed opposite to a cathode discharge surface, and a contact portion with the trigger electrode is locally provided as the cathode. Whether you use a cathode that is easy to wear, or if you don't have a particularly long and thin cathode, or if you use a single trigger electrode, the life of the cathode is long, and vacuum arc deposition is possible without having to replace the cathode frequently. It is possible to provide a vacuum arc deposition apparatus that can continue the processing, and thus can provide a thin film-coated article by vacuum arc deposition with good productivity and low cost.
[Brief description of the drawings]
FIG. 1 is a diagram showing a schematic configuration of an example of a vacuum arc vapor deposition apparatus adopting an example of an evaporation source apparatus for vacuum arc vapor deposition.
FIG. 2 (A) is a diagram showing a state in which the discharge surface of the cathode outer cylinder portion and the discharge surface of the cathode core portion are arranged at the same surface position, and FIG. 2 (B) is a diagram in FIG. 2 (A). FIG. 2C is a diagram showing a state in which the cathode core is fed from the state shown in FIG. 2B.
FIG. 3 (A) is a diagram showing a discharge surface consumption state when the contact pressure of the trigger electrode to the cathode discharge surface is high, and FIG. 3 (B) is a discharge surface consumption when the contact pressure is low. It is a figure which shows a state.
FIG. 4 is a diagram illustrating an example of a trigger electrode having a plurality of trigger electrode portions.
FIG. 5 is a diagram showing a conventional cathode consumption state.
[Explanation of symbols]
1 Deposition container
S Deposition article
2 Holder
PW1 Bias power supply
EX exhaust system
3 Evaporation source device
31 tube
32 cathode
321 Cathode outer cylinder
321a Discharge surface
322 Cathode core
322a Discharge surface
CL coil
PW2 Power source for magnetic field formation
F Magnetic filter
33 Wall board
331 wall plate hole
34 Insulator
35 Female thread member
36 Operating rod with male thread
37 Anode
38 Trigger electrode
381 Support rod
R resistance
39 Feedthrough device
40 reciprocating drive
401 Drive shaft
402 Working fluid pressure adjustment unit
5 Trigger electrode contact pressure adjustment device
51 Detector starter
52 Pressure detector
C1 control unit
PW3 arc power supply
380 Other examples of trigger electrodes
381 Trigger electrode
382 Trigger electrode base

Claims (8)

It includes a cathode that is an evaporation source and a trigger electrode for inducing arc discharge that opposes the discharge surface of the cathode, and the cathode is fitted into a cathode outer cylinder part so as to be movable toward the trigger electrode in the cathode outer cylinder part An evaporation source apparatus for vacuum arc deposition, wherein the trigger electrode is disposed to face the discharge surface of the cathode core. 2. The evaporation source apparatus for vacuum arc deposition according to claim 1, wherein the cathode core portion is rotatable around an axis in a moving direction with respect to the cathode outer cylinder portion. The evaporation source device for vacuum arc deposition according to claim 1 or 2, further comprising a device for adjusting a mutual contact pressure between the discharge surface of the cathode core and the trigger electrode. A cathode that is an evaporation source and a trigger electrode for inducing arc discharge facing the discharge surface of the cathode, and a device for adjusting the mutual contact pressure between the discharge surface of the cathode and the trigger electrode . An apparatus for adjusting the mutual contact pressure between the discharge surface and the trigger electrode is provided with an activation portion that moves in conjunction with the movement of the trigger electrode for inducing arc discharge toward the cathode discharge surface, and the orbit of the activation portion. The pressure contact with the cathode discharge surface and the trigger electrode detected by the pressure detector is suppressed by the contact of the track with the pressure detector. The cathode discharge surface and the trigger electrode are detected by the pressure detector so that the pressure of the cathode discharge surface and the trigger electrode are in contact with each other so as to obtain a predetermined set pressure. Evaporation source apparatus for vacuum arc evaporation and adjusting based on each other contact pressure. The evaporation source device for vacuum arc deposition according to any one of claims 1 to 4, wherein the trigger electrode has a plurality of trigger electrode portions for contacting the cathode discharge surface. 6. The evaporation source apparatus for vacuum arc deposition according to claim 1, wherein the cathode is made of carbon or a material mainly composed of carbon. The evaporation source apparatus for vacuum arc deposition according to any one of claims 1 to 6, further comprising a magnetic filter for deflecting and controlling a flight direction of ionized cathode material generated from the cathode by vacuum arc discharge. A vacuum arc vapor deposition apparatus comprising the evaporation source apparatus according to claim 1.

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