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JP3899759B2 - Method for producing sulfur-containing acrylic compound - Google Patents
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JP3899759B2 - Method for producing sulfur-containing acrylic compound - Google Patents

Method for producing sulfur-containing acrylic compound Download PDF

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Publication number
JP3899759B2
JP3899759B2 JP36612399A JP36612399A JP3899759B2 JP 3899759 B2 JP3899759 B2 JP 3899759B2 JP 36612399 A JP36612399 A JP 36612399A JP 36612399 A JP36612399 A JP 36612399A JP 3899759 B2 JP3899759 B2 JP 3899759B2
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Prior art keywords
sulfur
containing acrylic
acrylic compound
solvent
weight
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JP2001181257A (en
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豊 田村
誠一郎 早川
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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Description

【0001】
【発明の属する技術分野】
本発明は、硫黄含有アクリル化合物の製造方法に関する。詳しくは、粗硫黄含有アクリル化合物のミクロフィルター処理を可能とする、微細固体粒子を含まない硫黄含有アクリル化合物を製造する方法に関する。
本発明により得られた硫黄含有アクリル化合物は微細固体粒子を含まないので、これを原料として用いることにより、光学用として高屈折であり、且つ微細固体粒子による光拡散の少ない樹脂が得られる。
【0002】
【従来の技術】
従来より硫黄含有アクリル化合物の重合体が高屈折率を持つ成形体となることが知られていることから、硫黄含有アクリル化合物及びそれらの製造方法に関する種々の技術が公開されている(特開昭60−26010号、同61−72748号、同62−195357号各公報等)。
これらの硫黄含有アクリル化合物を眼鏡レンズとして利用すれば、従来より利用されているジエチレングリコールビスアリルカーボネートより肉厚が薄くなるという利点があり、現在利用されつつある。
【0003】
一方、最近の光学機器は非球面レンズ等のより高度な成型加工を必要とする光学部品を組み込むことが多くなっており、ガラスでは成型加工が難しいため注型成型の出来る高屈折率プラスチックレンズが注目を浴びている。これらの光学機器に硫黄含有アクリル化合物を利用すれば、その高屈折率な特性からコンパクト化等が可能となるため、検討されている。
一般に、光学機器に用いられるプラスチックレンズ材料については、成型体中の微細固体粒子による光拡散を避けるために、予め1ミクロン程度のミクロフィルターにより材料中の微細固体粒子を除去して用いられる。
【0004】
【発明が解決しようとする課題】
しかしながら、硫黄含有アクリル化合物については、従来、ミクロフィルター処理ができず、仮に出来たとしても長時間を要し、効率が非常に悪いという問題がある。
本発明は、従来方法の問題点を克服し、高屈折率で、微細固体粒子を含まない硫黄含有アクリル化合物を提供することを目的とする。
【0005】
【課題を解決するための手段】
本発明者らは、かかる事情に鑑み鋭意検討した結果、粗硫黄含有アクリル化合物を特定の溶媒に溶解させ、析出した不純物の沈澱を除去し、次いで溶媒及び非溶媒を留去して得られた硫黄含有アクリル化合物については、迅速なミクロフィルター処理が可能であることを見い出し、本発明を完成するに至った。
【0006】
即ち、本発明の要旨は、下記一般式(1)で示される硫黄含有アクリル化合物の製造方法であって、その粗硫黄含有アクリル化合物を溶解してなる溶媒及び非溶媒の混合溶液から析出した不純物の沈澱を除去し、次いで溶媒及び非溶媒を留去した後、得られた硫黄含有アクリル化合物を濾過することを特徴とする硫黄含有アクリル化合物の製造方法、にある。
【化3】

Figure 0003899759
(式中、R 1 は水素原子又はメチル基を表し、R 2 は炭素数1〜12の二価の炭化水素基を表し、Xは塩素原子又は臭素原子を表し、Yは−SO 2 −、−S−又は−CO−を表し、m及びnは1〜3の整数を表し、且つp及びqは0〜4の整数を表す)
【0007】
【発明の実施の形態】
以下、本発明を詳細に説明する。
(不純物の除去・濾過工程)
本発明の方法は、粗硫黄含有アクリル化合物を溶解してなる溶媒及び非溶媒の混合溶液から析出した不純物の沈澱を除去し、次いで溶媒及び非溶媒を留去した後、得られた硫黄含有アクリル化合物を濾過することを特徴とする。
本発明の対象となる硫黄含有アクリル化合物については、特に限定されるものではないが、例えば式(1)の化合物が好ましい。
【0008】
【化4】
Figure 0003899759
【0009】
(式中、R1 は水素原子又はメチル基を表し、R2 は炭素数1〜12の二価の炭化水素基を表し、Xは塩素原子又は臭素原子を表し、Yは−SO2 −、−S−又は−CO−を表し、m及びnは1〜3の整数を表し、且つp及びqは0〜4の整数を表す)
【0010】
式(1)において、R2 は炭素数1〜12、好ましくは1〜4の、二価の炭化水素基であり、直鎖状、分岐状、環状のいずれでもよく、その具体例としては、例えばメチレン基、エチレン基、トリメチレン基、プロピレン基、テトラメチレン基、等が挙げられる。これらの中、エチレン基、プロピレン基が好ましい。
【0011】
そして、このような式(1)の化合物の具体例としては、例えば、4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルスルホン、4,4′−ビス(β−アクリロイルオキシエチルチオ)ジフェニルスルホン、4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルケトン、4,4′−ビス(β−アクリロイルオキシエチルチオ)ジフェニルケトン、2,4−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルケトン、2,4−ビス(β−アクリロイルオキシエチルチオ)ジフェニルケトン、4,4′−ビス(β−メタクリロイルオキシエチルチオ)3,3′,5,5′−テトラブロムジフェニルケトン等を挙げることができる。
【0012】
本発明で用いられる溶媒としては、硫黄含有アクリル化合物を溶解するものであれば特に限定されるものではないが、その具体例としては、例えばアセトン、メチルエチルケトン、等のケトン類、ベンゼン、トルエン、等の芳香族炭化水素類、等が挙げられる。本発明においては、これらの中、アセトン、トルエンが好ましい。また、非溶媒についても、硫黄含有アクリル化合物を溶解しないものであれば特に限定はされないが、その具体例としては、例えばメタノール、エタノール、等のアルコール類、ヘプタン、シクロヘキサン、等の脂肪族炭化水素類、等が挙げられる。本発明においては、これらの中、メタノール、ヘプタンが好ましい。
【0013】
溶媒及び非溶媒の混合溶媒中の溶媒の割合は、通常20〜90重量%、好ましくは40〜80重量%である。混合溶媒中の溶媒の割合が90重量%を越えると、不純物の沈澱が析出せず、一方、混合溶液中の非溶媒の割合が80重量%を越えると、硫黄含有アクリル化合物自身が分離し、目的を果たせない。
混合溶媒の使用量は、粗硫黄含有アクリル化合物100重量部に対して、50〜500重量部、好ましくは100〜300重量部である。
【0014】
粗硫黄含有アクリル化合物を混合溶媒に溶解する操作については、特に限定はされない。例えば、該化合物を混合溶媒に溶解してもよいし、或いは、該化合物を予め溶媒に溶解しておき、この溶液に非溶媒を加えてもよい。この操作は静置して行ってもよいが、緩やかに攪拌しながら行うことが好ましい。温度は、通常、常温で行われるが、80℃以下の加熱下で行ってもよい。
【0015】
なお、不純物の沈澱の大半は直ちに析出するが、析出を十分に行うためには、その溶液を1〜10時間又は一晩放置するのが好ましい。
不純物の沈澱析出後、混合溶液を濾過材を用いて濾過し、この沈澱物を混合溶液から除く。濾過材としては、濾紙、フェルト、純絹羽二重のような濾布、石綿、グラスウール、ガラスフィルター、素焼濾過器、多孔性酸化アルミニウム濾過器、等を用いることができる。
【0016】
不純物の沈澱を除去した硫黄含有アクリル化合物の混合溶液については、ハイドロキノン、ハイドロキノンモノメチルエーテル、等の常用の重合禁止剤を硫黄含有アクリル化合物100重量部に対して、0.01〜0.5重量部添加し、溶媒及び非溶媒の混合溶媒を減圧下に留去する。
【0017】
そして、得られた硫黄含有アクリル化合物については、濾過材を用いて濾過して微細固体粒子を除去する。濾過材としては、上記したような濾過材の他、ミクロフィルターを用いることができ、本発明においてはミクロフィルターが好適に用いられる。ミクロフィルターとしては、例えば東洋濾紙社製の1.0μのミクロフィルター、メンブランフィルター(商品名)を用いることができる。ミクロフィルター処理は、通常、常温で、圧力は5kg/cm2 以下の加圧下ないし減圧下で行われる。なお、該化合物が固体の場合には、加熱して液状としてミクロフィルター処理を行う。
かくして得られた微細固体粒子を含まない硫黄含有アクリル化合物については、光学用樹脂の原料として好適に用いられる。
【0018】
(反応・後処理工程)
本発明に用いられる硫黄含有アクリル化合物が式(1)の化合物である場合、式(1)の化合物の製造方法については特に限定されるものではないが、例えば式(2)のポリオールと(メタ)アクリル酸ハライド、(メタ)アクリル酸又は(メタ)アクリル酸エステルのようなアシル化剤と反応させることにより製造するのが好ましい。これらの中、アシル化剤が安価であり、且つ目的生成物の純度を低下させない方法として、式(2)のポリオールと(メタ)アクリル酸メチルとのエステル交換法により製造するのが好ましく、以下、このエステル交換反応及びその後処理について説明する。
この場合、原料ポリオールとしては、式(2)の硫黄含有ポリオールが用いられる。
【0019】
【化5】
Figure 0003899759
【0020】
(式中、R2 、X、Y、m、n、p及びqについては、式(1)と同義である)
【0021】
式(2)において、R2 は前記と同様炭素数1〜12、好ましくは1〜4の、二価の炭化水素基であり、直鎖状、分岐状、環状のいずれでもよく、その具体例としては、例えばメチレン基、エチレン基、トリメチレン基、プロピレン基、テトラメチレン基、等が挙げられる。これらの中、メチレン基、エチレン基が好ましい。
【0022】
そして、このようなポリオール化合物の具体例としては、例えば、4,4′−ビス(2−ヒドロキシエチルチオ)ジフェニルスルホン、4,4′−ビス(2−ヒドロキシエチルチオ)ジフェニルケトン、2,4−ビス(2−ヒドロキシエチルチオ)ジフェニルケトン、4,4′−ビス(2−ヒドロキシエチルチオ)3,3′,5,5′−テトラブロムジフェニルケトン等が挙げられる。
これらの中、4,4′−ビス(2−ヒドロキシエチルチオ)ジフェニルスルホン、4,4′−ビス(2−ヒドロキシエチルチオ)ジフェニルケトンが好ましい。
【0023】
なお、これらのポリオールは、例えばN.Kharasch,OrganicSulfur Compounds,第1巻,第97〜111頁、又は米国特許第3,824,293号明細書に記載の合成法に準拠して合成することができる。
(メタ)アクリル酸メチルについては、市販のものをそのまま使用することができる。なお、(メタ)アクリル酸メチルは、硫黄含有ポリオール1モルに対して、通常2〜20モル、好ましくは3〜10モル用いられる。
【0024】
エステル交換触媒については、特に限定されず、通常用いられているものを使用できるが、好ましい触媒として、例えばテトラブチルチタネート、テトライソプロピルチタネート、テトラ(2−エチルヘキシル)チタネート、カリウムブトキシド等の金属アルコキシド類を挙げることができる。
その使用量は、硫黄含有ポリオール1モルに対して、通常0.01〜0.1モルである。
重合禁止剤としては、ハイドロキノン、ハイドロキノンモノメチルエーテル等の公知の重合禁止剤が用いられる。その使用量は、硫黄含有ポリオール100重量部に対して、0.01〜10重量部、好ましくは0.1〜5重量部である。
【0025】
本エステル交換反応については、無溶媒で行うこともできるが、ベンゼン、トルエン、キシレン等の芳香族炭化水素、トリクロロエチレン、テトラクロロエチレン等のハロゲン化炭化水素、等の溶媒を用いるのが好ましい。溶媒の使用量は、硫黄含有ポリオール100重量部に対して、通常10〜500重量部、好ましくは100〜200重量部である。
【0026】
エステル交換反応については、例えば反応器に硫黄含有ポリオール、(メタ)アクリル酸メチル、溶媒、エステル交換触媒、重合禁止剤を仕込み、好ましくは攪拌下で、好ましくは窒素等の不活性ガス雰囲気下で、加熱下に生成するメタノールを系外に除去しながら行われる。反応温度は、通常60〜130℃、好ましくは80〜120℃、反応圧力は、通常常圧で、反応時間は、通常5〜30時間、好ましくは10〜20時間である。
【0027】
エステル交換反応終了後、反応溶液から過剰の(メタ)アクリル酸メチルを除去した後、反応溶液を5%塩酸水溶液のような酸水溶液で洗浄し、次いで5%苛性ソーダ水溶液のようなアルカリ水溶液で洗浄した後、中性になる迄水洗する。その後、前記の方法により溶媒を減圧留去して、不純物の除去・濾過処理すべき粗硫黄含有アクリル化合物を得る。
【0028】
【実施例】
以下に実施例及び比較例を挙げて本発明を更に具体的に説明するが、本発明はその要旨を越えない限り、これらの実施例に限定されるものではない。
【0029】
実施例1
(反応・後処理工程)
攪拌器、温度計、冷却管及び分離器を備え付けた1リットルの四ツ口フラスコに、4,4′−ビス(2−ヒドロキシエチルチオ)ジフェニルスルホン100重量部、メタクリル酸メチル270重量部、ハイドロキノンモノメチルエーテル0.135重量部及びトルエン200重量部を仕込み、攪拌しながら80℃まで昇温したところへ、テトラブチルチタネート2.8重量部を加えた。その後更に昇温し、100〜120℃で20時間、メタノールを留去させながら反応を行った。反応後、過剰のメタクリル酸メチルを除去し、その後、反応溶液を室温まで冷却した。この溶液にトルエン100重量部を加え、5%塩酸水溶液100重量部、続いて5%水酸化ナトリウム水溶液100重量部で洗浄し、更に中性になるまで100重量部で2回水洗浄した。この溶液にハイドロキノンモノメチルエーテル0.135重量部を加え、減圧下でトルエンを留去し、130重量部の4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルスルホンを得た。
【0030】
(不純物の除去・濾過工程)
前工程で得られた4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルスルホンに、210重量部のトルエンと、90重量部のヘプタンを加え、室温で2時間攪拌を続けたところ、不純物が沈澱した。この沈澱を除去し、減圧下で溶剤と非溶剤を留去して不純物を除去した4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルスルホンを得た。これを1ミクロンのフィルター(東洋濾紙社製、メンブランフィルター(商品名))で濾過し、微細固体粒子を含まない4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルスルホンを得た。
【0031】
実施例2
不純物の除去・濾過工程に用いるトルエン210重量部を140重量部に、ヘプタン90重量部をメタノール60重量部に代えた以外は、実施例1と同様に行い、微細固体粒子を含まない4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルスルホンを得た。
【0032】
実施例3
不純物の除去・濾過工程に用いるトルエン210重量部をアセトン150重量部に、ヘプタン90重量部をメタノール50重量部に代えた以外は、実施例1と同様に行い、微細固体粒子を含まない4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルスルホンを得た。
【0033】
比較例1
不純物の除去・濾過工程を行わない以外は、実施例1と同様に行った。得られた4,4′−ビス(β−メタクリロイルオキシエチルチオ)ジフェニルスルホンは、1ミクロンのフィルターで濾過出来ず、微細固体粒子を除去出来なかった。
【0034】
【発明の効果】
本発明の方法によれば、微細固体粒子を含まない硫黄含有アクリル化合物を製造することが出来る。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for producing a sulfur-containing acrylic compound. Specifically, the present invention relates to a method for producing a sulfur-containing acrylic compound that does not contain fine solid particles and enables microfiltering of a crude sulfur-containing acrylic compound.
Since the sulfur-containing acrylic compound obtained by the present invention does not contain fine solid particles, by using this as a raw material, a resin having high refraction for optics and less light diffusion due to fine solid particles can be obtained.
[0002]
[Prior art]
Since it has been conventionally known that a polymer of a sulfur-containing acrylic compound becomes a molded article having a high refractive index, various techniques relating to the sulfur-containing acrylic compound and a method for producing them have been disclosed (Japanese Patent Laid-Open No. Sho). 60-26010, 61-72748, 62-195357, etc.).
When these sulfur-containing acrylic compounds are used as spectacle lenses, there is an advantage that the wall thickness is thinner than that of diethylene glycol bisallyl carbonate which has been conventionally used, and it is currently being used.
[0003]
On the other hand, recent optical instruments are often incorporating optical components that require more sophisticated molding processes such as aspherical lenses. Since glass is difficult to mold, high refractive index plastic lenses that can be cast are produced. Has attracted attention. If a sulfur-containing acrylic compound is used in these optical devices, it is being studied because it can be made compact due to its high refractive index characteristics.
In general, a plastic lens material used in an optical apparatus is used by removing fine solid particles in the material in advance with a microfilter of about 1 micron in order to avoid light diffusion due to the fine solid particles in the molded body.
[0004]
[Problems to be solved by the invention]
However, the sulfur-containing acrylic compound has a conventional problem that it cannot be microfiltered, takes a long time even if it can be made, and is very inefficient.
It is an object of the present invention to provide a sulfur-containing acrylic compound that overcomes the problems of conventional methods and has a high refractive index and does not contain fine solid particles.
[0005]
[Means for Solving the Problems]
As a result of intensive studies in view of such circumstances, the present inventors have obtained a crude sulfur-containing acrylic compound dissolved in a specific solvent, removed the precipitated impurities, and then distilled off the solvent and non-solvent. With respect to the sulfur-containing acrylic compound, it has been found that a rapid microfilter treatment is possible, and the present invention has been completed.
[0006]
That is, the gist of the present invention is a method for producing a sulfur-containing acrylic compound represented by the following general formula (1), wherein impurities precipitated from a mixed solution of a solvent and a non-solvent obtained by dissolving the crude sulfur-containing acrylic compound And then removing the solvent and the non-solvent, and then filtering the obtained sulfur-containing acrylic compound.
[Chemical 3]
Figure 0003899759
(Wherein R 1 represents a hydrogen atom or a methyl group, R 2 represents a divalent hydrocarbon group having 1 to 12 carbon atoms, X represents a chlorine atom or a bromine atom, Y represents —SO 2 —, -S- or -CO- is represented, m and n represent an integer of 1 to 3, and p and q represent an integer of 0 to 4)
[0007]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be described in detail.
(Impurity removal / filtration process)
The method of the present invention removes the precipitate of impurities deposited from a mixed solution of a solvent and a non-solvent obtained by dissolving the crude sulfur-containing acrylic compound, and then distills off the solvent and the non-solvent, and then the obtained sulfur-containing acrylic The compound is filtered.
Although it does not specifically limit about the sulfur containing acrylic compound used as the object of this invention, For example, the compound of Formula (1) is preferable.
[0008]
[Formula 4]
Figure 0003899759
[0009]
(Wherein R 1 represents a hydrogen atom or a methyl group, R 2 represents a divalent hydrocarbon group having 1 to 12 carbon atoms, X represents a chlorine atom or a bromine atom, Y represents —SO 2 —, -S- or -CO- is represented, m and n represent an integer of 1 to 3, and p and q represent an integer of 0 to 4)
[0010]
In the formula (1), R 2 is a divalent hydrocarbon group having 1 to 12 carbon atoms, preferably 1 to 4 carbon atoms, which may be linear, branched or cyclic, and specific examples thereof include: For example, a methylene group, an ethylene group, a trimethylene group, a propylene group, a tetramethylene group, etc. are mentioned. Among these, an ethylene group and a propylene group are preferable.
[0011]
Specific examples of such a compound of formula (1) include, for example, 4,4′-bis (β-methacryloyloxyethylthio) diphenylsulfone, 4,4′-bis (β-acryloyloxyethylthio). Diphenyl sulfone, 4,4′-bis (β-methacryloyloxyethylthio) diphenyl ketone, 4,4′-bis (β-acryloyloxyethylthio) diphenyl ketone, 2,4-bis (β-methacryloyloxyethylthio) Diphenyl ketone, 2,4-bis (β-acryloyloxyethylthio) diphenyl ketone, 4,4′-bis (β-methacryloyloxyethylthio) 3,3 ′, 5,5′-tetrabromodiphenyl ketone, etc. be able to.
[0012]
The solvent used in the present invention is not particularly limited as long as it dissolves a sulfur-containing acrylic compound. Specific examples thereof include ketones such as acetone and methyl ethyl ketone, benzene, toluene, and the like. Aromatic hydrocarbons, and the like. In these, acetone and toluene are preferable among these. Further, the non-solvent is not particularly limited as long as it does not dissolve the sulfur-containing acrylic compound. Specific examples thereof include alcohols such as methanol and ethanol, and aliphatic hydrocarbons such as heptane and cyclohexane. And the like. Of these, methanol and heptane are preferred in the present invention.
[0013]
The ratio of the solvent in the mixed solvent of the solvent and the non-solvent is usually 20 to 90% by weight, preferably 40 to 80% by weight. When the proportion of the solvent in the mixed solvent exceeds 90% by weight, precipitation of impurities does not precipitate, whereas when the proportion of the non-solvent in the mixed solution exceeds 80% by weight, the sulfur-containing acrylic compound itself is separated, Can't serve the purpose.
The usage-amount of a mixed solvent is 50-500 weight part with respect to 100 weight part of crude sulfur containing acrylic compounds, Preferably it is 100-300 weight part.
[0014]
The operation for dissolving the crude sulfur-containing acrylic compound in the mixed solvent is not particularly limited. For example, the compound may be dissolved in a mixed solvent, or the compound may be previously dissolved in a solvent and a non-solvent may be added to the solution. Although this operation may be performed by standing, it is preferably performed with gentle stirring. The temperature is usually performed at room temperature, but may be performed under heating at 80 ° C. or lower.
[0015]
Most of the impurities precipitate immediately, but in order to sufficiently precipitate the solution, it is preferable to leave the solution for 1 to 10 hours or overnight.
After precipitation of impurities, the mixed solution is filtered using a filter medium, and the precipitate is removed from the mixed solution. As the filter medium, filter paper, felt, filter cloth such as double pure silk feathers, asbestos, glass wool, glass filter, unglazed filter, porous aluminum oxide filter, and the like can be used.
[0016]
About the mixed solution of the sulfur-containing acrylic compound from which precipitation of impurities has been removed, 0.01 to 0.5 parts by weight of a conventional polymerization inhibitor such as hydroquinone and hydroquinone monomethyl ether with respect to 100 parts by weight of the sulfur-containing acrylic compound The solvent and the non-solvent mixed solvent are distilled off under reduced pressure.
[0017]
And about the obtained sulfur containing acrylic compound, it filters using a filter medium and removes a fine solid particle. As the filter medium, a microfilter can be used in addition to the filter medium as described above, and the microfilter is preferably used in the present invention. As the micro filter, for example, a 1.0 μ micro filter and a membrane filter (trade name) manufactured by Toyo Roshi Kaisha, Ltd. can be used. The microfilter treatment is usually performed at room temperature and under a pressure of 5 kg / cm 2 or less or under reduced pressure. In addition, when this compound is solid, it heats and performs a micro filter process as a liquid state.
The sulfur-containing acrylic compound not containing fine solid particles thus obtained is suitably used as a raw material for optical resins.
[0018]
(Reaction and post-treatment process)
When the sulfur-containing acrylic compound used in the present invention is a compound of the formula (1), the production method of the compound of the formula (1) is not particularly limited, but for example, a polyol of the formula (2) and (meta It is preferably produced by reacting with an acylating agent such as acrylic acid halide, (meth) acrylic acid or (meth) acrylic acid ester. Among these, the acylating agent is inexpensive and is preferably produced by a transesterification method between the polyol of formula (2) and methyl (meth) acrylate as a method that does not reduce the purity of the target product. The transesterification reaction and the subsequent treatment will be described.
In this case, a sulfur-containing polyol of the formula (2) is used as the raw material polyol.
[0019]
[Chemical formula 5]
Figure 0003899759
[0020]
(In the formula, R 2 , X, Y, m, n, p and q have the same meanings as in formula (1)).
[0021]
In formula (2), R 2 is a divalent hydrocarbon group having 1 to 12 carbon atoms, preferably 1 to 4 carbon atoms as described above, and may be linear, branched or cyclic, and specific examples thereof. Examples thereof include a methylene group, an ethylene group, a trimethylene group, a propylene group, and a tetramethylene group. Among these, a methylene group and an ethylene group are preferable.
[0022]
Specific examples of such a polyol compound include, for example, 4,4′-bis (2-hydroxyethylthio) diphenyl sulfone, 4,4′-bis (2-hydroxyethylthio) diphenyl ketone, 2,4 -Bis (2-hydroxyethylthio) diphenyl ketone, 4,4'-bis (2-hydroxyethylthio) 3,3 ', 5,5'-tetrabromodiphenyl ketone and the like.
Among these, 4,4′-bis (2-hydroxyethylthio) diphenyl sulfone and 4,4′-bis (2-hydroxyethylthio) diphenyl ketone are preferable.
[0023]
These polyols are exemplified by N.I. It can be synthesized according to the synthesis method described in Kharasch, Organic Sulfur Compounds, Volume 1, pages 97-111, or US Pat. No. 3,824,293.
About methyl (meth) acrylate, a commercially available thing can be used as it is. The methyl (meth) acrylate is usually used in an amount of 2 to 20 mol, preferably 3 to 10 mol, per 1 mol of the sulfur-containing polyol.
[0024]
Although it does not specifically limit about a transesterification catalyst, Although what is used normally can be used, For example, as a preferable catalyst, metal alkoxides, such as tetrabutyl titanate, tetraisopropyl titanate, tetra (2-ethylhexyl) titanate, potassium butoxide, etc. Can be mentioned.
The usage-amount is 0.01-0.1 mol normally with respect to 1 mol of sulfur containing polyols.
As the polymerization inhibitor, known polymerization inhibitors such as hydroquinone and hydroquinone monomethyl ether are used. The usage-amount is 0.01-10 weight part with respect to 100 weight part of sulfur containing polyols, Preferably it is 0.1-5 weight part.
[0025]
Although this transesterification reaction can be carried out without a solvent, it is preferable to use a solvent such as an aromatic hydrocarbon such as benzene, toluene or xylene, or a halogenated hydrocarbon such as trichloroethylene or tetrachloroethylene. The usage-amount of a solvent is 10-500 weight part normally with respect to 100 weight part of sulfur containing polyols, Preferably it is 100-200 weight part.
[0026]
For the transesterification reaction, for example, a reactor is charged with a sulfur-containing polyol, methyl (meth) acrylate, a solvent, a transesterification catalyst, and a polymerization inhibitor, preferably under stirring, preferably under an inert gas atmosphere such as nitrogen. , While removing methanol produced under heating out of the system. The reaction temperature is usually 60 to 130 ° C., preferably 80 to 120 ° C., the reaction pressure is usually atmospheric pressure, and the reaction time is usually 5 to 30 hours, preferably 10 to 20 hours.
[0027]
After the transesterification reaction, excess methyl (meth) acrylate is removed from the reaction solution, and then the reaction solution is washed with an acid aqueous solution such as a 5% aqueous hydrochloric acid solution, and then washed with an alkaline aqueous solution such as a 5% aqueous sodium hydroxide solution. Then wash with water until neutral. Thereafter, the solvent is distilled off under reduced pressure by the above-described method to obtain a crude sulfur-containing acrylic compound to be subjected to impurity removal and filtration.
[0028]
【Example】
EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples. However, the present invention is not limited to these examples unless it exceeds the gist.
[0029]
Example 1
(Reaction and post-treatment process)
In a 1 liter four-necked flask equipped with a stirrer, thermometer, condenser and separator, 100 parts by weight of 4,4′-bis (2-hydroxyethylthio) diphenylsulfone, 270 parts by weight of methyl methacrylate, hydroquinone 0.135 parts by weight of monomethyl ether and 200 parts by weight of toluene were charged, and 2.8 parts by weight of tetrabutyl titanate was added to the mixture where the temperature was raised to 80 ° C. with stirring. Thereafter, the temperature was further raised, and the reaction was carried out while distilling off methanol at 100 to 120 ° C. for 20 hours. After the reaction, excess methyl methacrylate was removed, and then the reaction solution was cooled to room temperature. To this solution, 100 parts by weight of toluene was added and washed with 100 parts by weight of a 5% aqueous hydrochloric acid solution, followed by 100 parts by weight of a 5% aqueous sodium hydroxide solution, and then washed twice with 100 parts by weight until neutrality. To this solution was added 0.135 parts by weight of hydroquinone monomethyl ether, and toluene was distilled off under reduced pressure to obtain 130 parts by weight of 4,4′-bis (β-methacryloyloxyethylthio) diphenylsulfone.
[0030]
(Impurity removal / filtration process)
When 210 parts by weight of toluene and 90 parts by weight of heptane were added to 4,4′-bis (β-methacryloyloxyethylthio) diphenylsulfone obtained in the previous step and stirring was continued for 2 hours at room temperature, impurities were Precipitated. The precipitate was removed, and 4,4'-bis (β-methacryloyloxyethylthio) diphenylsulfone from which impurities were removed by distilling off the solvent and non-solvent under reduced pressure was obtained. This was filtered with a 1 micron filter (Membrane filter (trade name) manufactured by Toyo Roshi Kaisha, Ltd.) to obtain 4,4′-bis (β-methacryloyloxyethylthio) diphenylsulfone containing no fine solid particles.
[0031]
Example 2
The same procedure as in Example 1 was carried out except that 210 parts by weight of toluene used in the impurity removal and filtration step was replaced with 140 parts by weight and 90 parts by weight of heptane was replaced with 60 parts by weight of methanol. '-Bis (β-methacryloyloxyethylthio) diphenyl sulfone was obtained.
[0032]
Example 3
The same procedure as in Example 1 was performed except that 210 parts by weight of toluene used in the impurity removal and filtration step was replaced with 150 parts by weight of acetone and 90 parts by weight of heptane was replaced with 50 parts by weight of methanol. 4'-bis (β-methacryloyloxyethylthio) diphenyl sulfone was obtained.
[0033]
Comparative Example 1
The same procedure as in Example 1 was performed except that the impurity removal / filtration step was not performed. The obtained 4,4′-bis (β-methacryloyloxyethylthio) diphenylsulfone could not be filtered with a 1 micron filter, and fine solid particles could not be removed.
[0034]
【The invention's effect】
According to the method of the present invention, it is possible to produce a sulfur-containing acrylic compound that does not contain fine solid particles.

Claims (2)

下記一般式(1)で示される硫黄含有アクリル化合物の製造方法であって、その粗硫黄含有アクリル化合物を溶解してなる溶媒及び非溶媒の混合溶液から析出した不純物の沈澱を除去し、次いで溶媒及び非溶媒を留去した後、得られた硫黄含有アクリル化合物を濾過することを特徴とする硫黄含有アクリル化合物の製造方法。
Figure 0003899759
(式中、R 1 は水素原子又はメチル基を表し、R 2 は炭素数1〜12の二価の炭化水素基を表し、Xは塩素原子又は臭素原子を表し、Yは−SO 2 −、−S−又は−CO−を表し、m及びnは1〜3の整数を表し、且つp及びqは0〜4の整数を表す)
A method for producing a sulfur-containing acrylic compound represented by the following general formula (1), wherein the precipitation of impurities precipitated from a mixed solution of a solvent and a non-solvent obtained by dissolving the crude sulfur-containing acrylic compound is removed, and then the solvent And after distilling off a non-solvent, the obtained sulfur containing acrylic compound is filtered, The manufacturing method of the sulfur containing acrylic compound characterized by the above-mentioned.
Figure 0003899759
(Wherein R 1 represents a hydrogen atom or a methyl group, R 2 represents a divalent hydrocarbon group having 1 to 12 carbon atoms, X represents a chlorine atom or a bromine atom, Y represents —SO 2 —, -S- or -CO- is represented, m and n represent an integer of 1 to 3, and p and q represent an integer of 0 to 4)
式(1)の硫黄含有アクリル化合物が下記一般式(2)で示される硫黄含有ポリオールと(メタ)アクリル酸ハライド、(メタ)アクリル酸又は(メタ)アクリル酸エステルとを反応させて得られたものである請求項に記載の硫黄含有アクリル化合物の製造方法。
Figure 0003899759
(式中、R2 、X、Y、m、n、p及びqについては、式(1)と同義である)
A sulfur-containing acrylic compound of formula (1) was obtained by reacting a sulfur-containing polyol represented by the following general formula (2) with (meth) acrylic acid halide, (meth) acrylic acid or (meth) acrylic acid ester. The method for producing a sulfur-containing acrylic compound according to claim 1 .
Figure 0003899759
(In the formula, R 2 , X, Y, m, n, p and q have the same meanings as in formula (1)).
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