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JP3901641B2 - Surface area measuring method, surface area measuring apparatus, and plating method - Google Patents
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JP3901641B2 - Surface area measuring method, surface area measuring apparatus, and plating method - Google Patents

Surface area measuring method, surface area measuring apparatus, and plating method Download PDF

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JP3901641B2
JP3901641B2 JP2003013478A JP2003013478A JP3901641B2 JP 3901641 B2 JP3901641 B2 JP 3901641B2 JP 2003013478 A JP2003013478 A JP 2003013478A JP 2003013478 A JP2003013478 A JP 2003013478A JP 3901641 B2 JP3901641 B2 JP 3901641B2
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surface area
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water tank
electrolyte solution
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JP2004226198A (en
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信彦 大貫
信幸 手塚
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Description

【0001】
【発明の属する技術分野】
本発明は、主として電気化学反応を利用した表面処理の前工程において被測定物の表面積を測定する方法およびその装置、並びに電気化学反応を利用した被処理物のメッキ方法に関する。
【0002】
【従来の技術】
メッキ、アルマイト、電解研磨など電気化学反応を利用した表面処理は、被処理物の表面における電流密度(A/dm2)を制御しながら行う必要があるが、直接これを測定することはできないため、該電流密度(A/dm2)に被処理物の表面積(dm2)を掛けた総電流(A)を測定することによって行っている。従って、このような表面処理において被処理物の表面積を正確に把握することは、表面処理の精度および品質を向上させる上で極めて重要な課題である。
【0003】
従来、被処理物(表面積測定においては、被測定物ともいう)の表面積を測定する方法としては、センサーやCCDカメラを用いて立体形状を計測してコンピューターで解析する方法や、或いはCAD図面のデータを利用してコンピューターで解析する方法などが提案されている。
しかしながら、斯かる方法ではセンサーやCCDカメラ、コンピューターといった高価な機器が多数必要となる上、さらに高度な測定技術や数学的知識などが要求されるため、メッキ処理等を行う作業現場には必ずしも適していない。
また、近年の多品種少量生産の要請によって同一形状の被処理物の処理数量が減る傾向にあるため、一個の被処理物について手間のかかる該測定方法では採算性が悪化することとなる。
【0004】
こうした事情から、形状の複雑な被処理物を処理する際には作業員が大雑把に表面積を推定し、メッキ処理の際に発生する気泡を目視により判断することによって電流の調整を行うことも多い。しかし、斯かる方法には高度な熟練を要する上、製品のメッキ層は極めてバラツキの大きなものとなる。
【0005】
このような問題を解決すべく、特許文献1に開示されているように、電解溶液中に浸漬した被処理物の表面積を電気化学的に測定する方法が提案されている。即ち、該方法は、面積が既知で互いに異なる面積を有する複数個の金属試験片を電解質溶液に浸漬し、所定の電解条件において一定の電圧を与え、その際の電流を測定することによって電流値と試験片面積との関係式を求めた後、面積未知の被測定物に対して同じ電解条件で同一の電圧を与えた際の電流値を前記関係式へあてはめることによって被測定物の面積を求めるものである。
【0006】
【特許文献1】
特開昭56−160608号公報
【0007】
【発明が解決しようとする課題】
しかしながら、該特許文献1のような圧延平銅版を被測定物とした場合には比較的正確な測定結果が得られやすいが、複雑な立体形状の被測定物については必ずしも正確な測定結果を得ることが出来ない。これは、被測定物と電極との距離が異なれば電解質溶液の抵抗値も異なることとなるため、表面の電流密度が一定とならないからである。
【0008】
尚、本発明者は、電極と被測定物との距離による影響を相殺すべく、図11(a)に示すような被測定物52の両側に電極51を配置する方法や、図11(b)に示すような被測定物52の周囲全体を電極51で囲むような方法についても検討した。しかしながら、いずれの場合にも被測定物の位置が中央からずれるに従って抵抗値が非直線的に大きく上昇することが確認された。
従って、複雑な立体形状の被処理物の場合には、被測定物の各部位と電極との距離が一定でないために表面積を正確に測定することはできない。即ち、斯かる装置を使用した場合であっても、基準として使用される試験平板と同程度の厚みの薄板、若しくは電極との距離に影響を与えないような厚みの薄板のみしか正確に測定することができないという問題がある。
【0009】
また、このような問題は、被測定物の表面において電流密度が均一にならないことが要因であるため、電気分解反応を利用したメッキ方法においても同様の現象が生じ、被処理物の表面に均一なメッキ層が形成されないという問題がある。
【0010】
そこで本発明は、このよう問題に鑑み、主として電気化学反応を利用した表面処理を行う被処理物を測定対象とし、その被測定物の表面積を正確に測定することを一の課題とする。
また、電気化学反応を利用して被処理物のメッキを行うに際し、被処理物の表面に均一なメッキ層を形成することを他の課題とする。
【0011】
【課題を解決するための手段】
本発明は、上記課題を解決すべくなされたものであり、電解質溶液に被測定物および電極を浸漬し、該電解質溶液中で被測定物と電極とに電圧を印加し、その際の通電状態から被測定物の表面積を測定する表面積測定方法において、水槽の四隅においてそれぞれ上下2箇所に前記電極を配置し、さらに該水槽の四隅において該電極を水槽中央部から遮蔽する4枚の邪魔板を配置し、該邪魔板の縁部と水槽との間に細長い流路を形成することによりイオンの通過に抵抗を与えた状態で電圧を印加することを特徴とする表面積測定方法を提供する。
【0013】
また、好ましくは、被測定物の浸漬される領域内に於ける電流分布が±5%の範囲内となるように前記電解質溶液の流通を抑制する。尚、本発明における電流分布とは、被測定物が浸漬される領域内に平板電極を設置し、該平板電極と周囲に配置された電極との間に一定電圧を印加した際に流れる電流値であって、該領域内におけるバラツキを測定したものいう。また、±5%の範囲内とは、測定された電流値の最大値と最小値との差を、平板電極を水槽の中心に設置した場合に測定される電流値で除した場合のパーセントをいうものとする。
【0014】
また、本発明は、電解質溶液に浸漬された被測定物と電極とに電圧を印加することにより、その際の通電状態から被測定物の表面積を測定するために用いる表面積測定装置であって、電解質溶液を収容するための水槽と、該水槽の四隅においてそれぞれ上下2箇所に配置された電極と、該水槽の四隅において該電極を水槽中央部から遮蔽する4枚の邪魔板が備えられ、イオンの通過に抵抗を与えるべく該邪魔板の縁部と水槽との間に細長い流路が形成されていることを特徴とする表面積測定装置を提供する
【0015】
ましくは、水槽の底面に補助電極が備えられ、前記電極と該補助電極とは別々に電圧を調整し得るように構成されたものとする。
【0016】
また、好ましくは、被測定物の浸漬される領域内に於ける電流分布が±5%の範囲内となるように前記邪魔板が設けられる。
【0017】
さらに、本発明は、電解質溶液に被処理物および電極を浸漬し、電解質溶液中で被処理物と電極とに電圧を印加し、電解質溶液中の金属イオンを被処理物の表面に析出させるメッキ方法において、水槽の四隅においてそれぞれ上下2箇所に前記電極を配置し、さらに該水槽の四隅において該電極を水槽中央部から遮蔽する4枚の邪魔板を配置し、該邪魔板の縁部と水槽との間に細長い流路を形成することによりイオンの通過に抵抗を与えた状態で行うことを特徴とするメッキ方法を提供する。
【0018】
好ましくは、更に被処理物の下方に補助電極を配置し、前記電極と該補助電極の電圧を別々に調整する。
【0019】
【発明の実施の形態】
以下、本発明に係る表面積測定装置の一実施形態について図面を参照しつつ説明し、さらに該装置を用いた表面積測定方法の一態様について説明する。
【0020】
図1は、本発明に係る表面積測定装置の一実施形態を示した斜視図であり、図2は、該表面積測定装置の平面図、図3は図2のA−A線断面図である。
図1乃至図3に示す如く、該表面積測定装置1は、断面が正方形である水槽2と、水槽内の四隅においてそれぞれ上下2箇所に設けられた合計8個の電極3,3…と、同じく水槽の四隅において電極3を水槽中央部から遮蔽する4枚の邪魔板4,4…と、水槽2の底に載置された補助電極7とを備えている。さらに、被測定物(図示せず)を電解質溶液中で支持するためのラック5と、該ラック5を支持し且つ該ラック5を介して被測定物に通電するための給電棒6が備えられている。
そして、表面積の測定を行う際には、図1〜3に示す如く水槽2に所定の温度および濃度に設定された電解質溶液10が満たされることとなる。
【0021】
本実施形態では、流通抑制手段として邪魔板4が採用されている。具体的には、該邪魔板4は、被測定物に対して電極を直接対向させないように、電極3を被測定物から遮蔽するとともに、電解質溶液10を、電極側の領域(電極領域ともいう)20と、被測定物側の領域(被測定物領域ともいう)30とに区画し、さらにこれら2つの領域間の電解質溶液10の流通を抑制するように設けられている。
【0022】
本実施形態の邪魔板4は、図2に示す如く両端の縁部が屈折された略平板状のものであり、その両端の縁部と水槽2との間には、電解質溶液10の流通を抑制し得るような細長い流路11が形成されており、電極領域20と被測定物領域30とは、該流路11を介してのみ流通可能となっている。
【0023】
電極3の形状については特に限定されるものではないが、電気抵抗が過大とならない程度に面積の小さいものを使用することが好ましく、これによって電極と等距離において被測定物が平行移動する際に生じる、いわゆるワグナー長さ効果を低減できるものと考えられる。
【0024】
補助電極7は、電極3に対する被測定物の位置によって生じるワグナー長さ効果およびオームの法則による影響をさらに補正すべく設置されるものであり、形状については特に限定されるものではない。
【0025】
そして、電極3および補助電極7は、被測定物に対して所定の電圧が印加されるべく電源装置(図示せず)に接続されている。即ち、該電源装置と各電極又は補助電極との間にはそれぞれ可変抵抗器(図示せず)が介在され、電極3と補助電極7とに異なる電圧を印加し得るように、また、電極3についても上方に設置した電極3aと下方に設置した電極3bとに異なる電圧を印加し得るように構成されている。
【0026】
各電極に印加される電圧は、水槽の形状や大きさ、電極の大きさや配置、ラックの形状などの諸条件に応じて適宜調整されるべきものであるが、上方の電極3aに印加される電圧をV1、下方の電極3bに印加される電圧をV2、補助電極7に印加される電圧をV3とすると、V1:V2としては1:0.1〜1:1、V1:V3としては1:0〜1:1の範囲を好適な電圧比率として例示することができる。
【0027】
電源装置としては被測定物と電極とに所定の電圧を印加し得るものであれば特に限定されるものではない。
【0028】
また、電解質溶液10としても特に限定されるものではなく、例えば水酸化ナトリウム溶液、リン酸塩溶液等を使用し得る。該電解質溶液は、モニター電極(図示せず)と連動した水供給装置(図示せず)および電解液供給装置(図示せず)によって電解質濃度が一定に保たれ、さらに、温度計(図示せず)と連動したヒーター(図示せず)によって温度が一定に保たれる。
【0029】
斯かる表面積測定装置1によれば、邪魔板4によって電解質溶液10の流通が抑制されるため、水槽2内の電流分布が均一化されることとなる。
【0030】
次に、斯かる実施形態の表面積測定装置を用いた場合の表面積測定方法について説明する。
【0031】
まず、任意の被測定物を掛けたラック5を給電棒6に吊して電解質溶液10中に浸漬し、一定電圧を印加した状態で被測定物の高さ及び前後左右位置を変えた際の電流値を測定し、電流値の変動が微少となるように、上方の電極3a、下方の電極3bおよび補助電極7の電圧を調整しておく。
【0032】
次に、任意のラックを基準ラックとし、該基準ラックを給電棒6に吊して電解質溶液中に浸漬し、一定の電圧をかけて電流値を測定する。さらに、複数本の同一形状のラックを同様の手順で測定し、平均値を求めてこれを標準ラック電流値(Ls)とする。
表面積が既知である複数の基準測定物(例えば、0.5dm2/枚×20枚)を1枚ずつ順に基準ラックに掛け、ラックが同じ水深となるように浸漬した状態で電流値を測定し、電流と表面積の関係式(Fs)を求める。
関係式(Fs)は、例えば、As=f(x)+C(但し、Asは表面積、xは電流値、Cは標準ラック単体の面積)のように表される。
【0033】
そして、実際に使用するラック(複数ある場合はそれら全て)について電流値(Lv)を測定する。尚、異常な電流値が検出されたラックは、不良ラックとして排除する。前記基準となるラックの電流値(Ls)と使用するラックの電流値(Lv)との比(Lv/Ls)を前記関係式(Fs)の定数項に乗じることにより、基準ラックについての関係式(Fv)が実際に使用する個々のラックの大小や形状差に応じて補正されることとなる。
【0034】
こうして、実際に使用する個々のラックに対して、基準となるラックの関係式(Fs)がそれぞれ補正されたこととなるため、該ラックに面積が未知の被測定物を吊るした状態で電流値(Lv)を測定することにより、前記関係式(Fs)に基づいて被測定物の表面積を正確に算出することができる。尚、ラックの材質等その他補正すべき要因がある場合についても、必要に応じて適宜設定又は補正を行うものとする。
【0035】
斯かる表面積測定装置および測定方法によれば、水槽内の電流分布の均一化が図られることとなり、被測定物の各部位における電流密度が略一定となって複雑な立体形状の被測定物についても正確に表面積を測定することが可能となる。
これは、邪魔板4によって電解質溶液の流通が抑制されることにより、電極と被測定物との距離が見かけ上遠距離にあるように作用したり、電極との距離に反比例して増大する抵抗成分が発生するためであると推測される。そして、斯かる作用に加えて電極3が水槽2内に略均一に配置されていることにより、電流分布の均一化が図られているものと推測される。
【0036】
また、水槽内の電流分布が均一化されるため、水槽内における被測定物の位置が変化した場合であっても表面積を正確に測定することができるという効果がある。
【0037】
尚、上記実施形態では、流通抑制手段として邪魔板4を使用した場合について説明したが、本発明はこれに限定されるものではない。
従って、他の流通抑制手段としては、例えば図4に示す如く、電極を収容し得るような筒体41と、該筒体41の両端に備えられた蓋体42とからなり、筒体41と蓋体42との隙間が所定幅の流路11を形成するように離間して構成されたものを使用することもできる。斯かる構成の流通抑制手段によれば、水槽内に大きな邪魔板を設置する必要がなく、しかも水槽内を広く使用することができるという利点がある。
【0038】
また、流通抑制手段の他の形態としては、幅をやや狭くすることに加えて電極領域と被測定物領域との間の流通距離が長くなるような形状の流路としてもよい。流通距離を長くすると電極と被測定物との距離が長くなってオームの法則による影響を緩和でき、しかも幅の狭い流路とすることによってその作用をより顕著に発揮させることができる。
【0039】
また、電極3の形状についても特に限定されるものではなく、流通抑制手段として図4に示したような筒体41と蓋体42とを使用する場合には、該筒体41の内部に収容しやすい筒状の電極31としてもよい。
【0040】
さらに、電極を設ける位置および数量は、水槽内をできるだけ均等となる位置に配置することが好ましい。上記実施形態では合計8個の電極を水槽内に均等に配置したが、電極の数をそれ未満としてもよく、又はそれ以上としてもよい。
また、水槽の形状についても特に限定されず、円筒形状やその他任意の多面体形状とすることができる。
【0041】
また、上記表面積測定方法の実施形態では、基準となるラックの電流値(Ls)と使用するラックの電流値(Lv)との比(Lv/Ls)を前記関係式(Fs)に乗じることにより、標準ラックについての関係式(Fs)を実際に使用する個々のラックに対して補正したが、使用する個々のラックに複数の基準測定物を順に掛けて電流値を測定し、直接的に電流と表面積の関係式(Fv)を求めてもよい。
【0042】
さらに、上記実施形態では、電圧を一定として電流値を測定することによって表面積を算出したが、本発明はこれに限定されるものではなく、電流を一定として電圧を測定することによって被測定物の表面積を算出してもよい。
【0043】
また、上記実施形態ではメッキ処理を行うべき被処理物を測定対象とする場合に好適であるが、本発明はこれらの電気化学的反応を利用した表面処理の対象となる被処理物を測定対象として限定するものではなく、表面積測定の困難なあらゆるものを測定対象とすることができる。
【0044】
本発明は、前記実施形態のように導電性の測定対象物について例えば電流値を測定することによって表面積を測定することができるが、このような導電性の測定対象物のみを測定対象として限定するものではない。即ち、本発明は、絶縁性の物質をも測定対象物とすることができ、具体的には、同様の方法によって電圧を印加した状態での静電容量を測定し、その静電容量を誘電率で除することにより、測定対象物の表面積を測定することができる。
【0045】
ここで、邪魔板を流通抑制手段として設置した場合に水槽内の電流分布が均一化されることを実証すべく、図5に示す如き試験装置を用いて水槽内の電流分布を測定した。
図5は、試験装置の概略を示した斜視図であり、該試験装置は、水槽2と、該水槽2の中央に配された平板電極(カソード)15と、該平板電極15を囲むような四角い枠型の電極(アノード)3と、該カソード15と該アノード3との間に配された四角い枠型の邪魔板4とから構成されている。邪魔板4の上端は液面よりも上に出ており、邪魔板4の下端は水槽2の底と所定の隙間を隔てて設置されており、この邪魔板4と水槽2との隙間が電解質溶液の流通を抑制するように構成されている。
【0046】
斯かる試験装置を用い、邪魔板4と水槽2との隙間が20mmである場合と1mmである場合と、邪魔板4を設置しない場合について、図6に示す如く、中心に配した平板電極(カソード)15を水槽2の一方向(図6において右方向)へ移動させた際の電流分布を測定した。
尚、電極間に印加する電圧は約6V、電解質溶液は0.5%の水酸化ナトリウム溶液とし、平板電極15は、面積が1dm2と0.5dm2の2種類を用いた。また、平板電極15の移動距離は、実際に移動させた距離を移動前の電極間の距離で除した相対値で表した。
電流分布の測定結果を図7に示す。
【0047】
図7に示す如く、邪魔板4を設置しない場合には、面積が1dm2(図中▲1▼で示す)と0.5dm2(図中▲2▼で示す)の何れの場合にも平板電極15を水槽2の一端へ向かって移動させるにつれて、電流値が大きく上昇していることがわかる。
これに対し、邪魔板4を設置すると、隙間が1mm又は20mmの何れの場合であっても平板電極15を移動させた際の電流値が略一定となっており、水槽内の電流分布が均一となっていることがわかる。
【0048】
このように、オームの法則に反して電流分布が一定となる理由については定かではないが、邪魔板等の流通抑制手段を設けたことによってイオンの通過にも何らかの抵抗が生じ、電極間距離が近づいてイオンの通過量が多くなった場合には大きな抵抗となり、電極間距離が遠くなってイオンの通過量が少なくなった場合には小さな抵抗となるように作用しているものと推測される。
【0049】
次に、図8に示す如き立体形状を有し且つ表面積の等しい試験片A〜Iを前記試験装置の中央にカソードとして設置し、個々の試験片について電流値を測定した。邪魔板4を設置しない場合の電流値の測定結果を図9に、水槽との隙間が20mmとなるように邪魔板4を設置した場合の電流値の測定結果を図10に示す。
【0050】
邪魔板を設置しない場合(図9のグラフ)には、電流値のバラツキ、即ち(最大値−最小値)/平均値は、約23%であるのに対し、邪魔板を設置した場合(図10のグラフ)には、電流値のバラツキは約16%にまで低減されていることがわかる。
【0051】
このように、例えば邪魔板のような流通抑制手段をカソードとアノードの間に設置することにより水槽内の電流分布が均一化され、その結果、被測定物の立体形状に起因する電流値の変動が大きく低減されることとなる。
従って、複雑な立体形状を有する被測定物の表面積を測定する場合、本発明の方法および装置は、従来の方法と比べて非常に高精度に表面積を測定することが可能となる。
【0052】
次に、本発明に係るメッキ方法の一実施形態について説明する。
本発明のメッキ方法に使用する装置は、前記表面積測定装置1と略同様にして構成されたものである。但し、電解質溶液として所定の金属イオンを含むメッキ浴を用い、被処理物をアノード、電極をカソードとする。電極として、メッキ金属と同一の金属を用いて行うことも可能である。
【0053】
メッキ方法の具体的手順は、予め表面積を測定した被処理物をメッキ浴中に浸漬し、所望の電流密度となるように電流値を調整し、所望の時間通電することによってメッキ層を析出させる。
被処理物の表面積測定には上述の表面積測定方法を好適に採用でき、表面積の計測を終えた被処理物をラック5に吊るしたまま洗浄槽に浸漬して洗浄した後に該ラック5に吊るしたままメッキ浴に浸漬すればよい。
【0054】
斯かるメッキ方法によれば、メッキ浴中の電流分布が均一化されることになって被処理物の表面における電流密度が略一定となるため、複雑な立体形状の被処理物であっても均一な厚みのメッキ層を形成できるという効果がある。
【0055】
【発明の効果】
以上のように、本発明に係る表面積測定方法および表面積測定装置によれば、被処理物の表面積を正確に測定することが可能となる。
また、本発明のメッキ方法によれば、被処理物の表面に均一なメッキ層を形成することができる。
【図面の簡単な説明】
【図1】本発明に係る表面積測定装置の一実施形態を示した斜視図。
【図2】本発明に係る表面積測定装置の一実施形態を示した平面図。
【図3】図2のA−A線断面図。
【図4】流通抑制手段と電極の他の実施形態を示した一部切り欠きの斜視図。
【図5】邪魔板の効果を確認するために用いた試験装置の斜視図。
【図6】図5のB−B線断面図。
【図7】電流分布の測定結果を示したグラフ。
【図8】被測定物として用いた試験片の形状を示した図。
【図9】邪魔板を設置しない場合の電流値の測定結果を示したグラフ。
【図10】邪魔板を設置した場合の測定結果を示したグラフ。
【図11】従来の測定方法の改良案として、本発明者らが検討した電極の配置例。
【符号の説明】
1 表面積測定装置
2 水槽
3 電極
4 邪魔板
5 ラック
7 補助電極
10 電解質溶液
15 平板電極
[0001]
BACKGROUND OF THE INVENTION
The present invention mainly relates to a method and apparatus for measuring the surface area of an object to be measured in a pre-process of surface treatment using an electrochemical reaction, and a method for plating an object to be processed using an electrochemical reaction.
[0002]
[Prior art]
Surface treatment using an electrochemical reaction such as plating, alumite, electropolishing, etc. must be performed while controlling the current density (A / dm 2 ) on the surface of the object to be treated, but this cannot be measured directly. The total current (A) obtained by multiplying the current density (A / dm 2 ) by the surface area (dm 2 ) of the object to be processed is measured. Therefore, accurately grasping the surface area of the workpiece in such surface treatment is a very important issue in improving the accuracy and quality of the surface treatment.
[0003]
Conventionally, as a method of measuring the surface area of an object to be processed (also referred to as an object to be measured in surface area measurement), a method of measuring a three-dimensional shape using a sensor or a CCD camera and analyzing it by a computer, or a CAD drawing A method for analyzing data using a computer has been proposed.
However, this method requires many expensive devices such as sensors, CCD cameras, and computers, and requires more advanced measurement techniques and mathematical knowledge, so it is not always suitable for work sites where plating is performed. Not.
In addition, since the number of processed objects having the same shape tends to be reduced due to the recent demand for high-mix low-volume production, the measurement method that requires time for one processed object deteriorates the profitability.
[0004]
For these reasons, when processing a workpiece having a complicated shape, the worker roughly estimates the surface area and often adjusts the current by visually determining the bubbles generated during the plating process. . However, such a method requires a high degree of skill and the plating layer of the product is extremely varied.
[0005]
In order to solve such a problem, as disclosed in Patent Document 1, a method for electrochemically measuring the surface area of an object to be processed immersed in an electrolytic solution has been proposed. That is, in this method, a current value is obtained by immersing a plurality of metal test pieces having known areas and different areas in an electrolyte solution, applying a constant voltage under predetermined electrolysis conditions, and measuring the current at that time. And the area of the object to be measured by applying the current value when the same voltage is applied to the object to be measured of the unknown area under the same electrolysis conditions to the relational expression. It is what you want.
[0006]
[Patent Document 1]
Japanese Patent Laid-Open No. 56-160608
[Problems to be solved by the invention]
However, when a rolled flat copper plate as in Patent Document 1 is used as an object to be measured, a relatively accurate measurement result is easily obtained, but an accurate measurement result is not necessarily obtained for an object having a complicated three-dimensional shape. I can't. This is because if the distance between the object to be measured and the electrode is different, the resistance value of the electrolyte solution is also different, so that the surface current density is not constant.
[0008]
Note that the present inventor has proposed a method of arranging the electrodes 51 on both sides of the object to be measured 52 as shown in FIG. 11A in order to offset the influence of the distance between the electrode and the object to be measured, or FIG. The method of surrounding the entire object 52 to be measured with the electrode 51 as shown in FIG. However, in any case, it has been confirmed that the resistance value greatly increases nonlinearly as the position of the object to be measured is shifted from the center.
Therefore, in the case of an object having a complicated three-dimensional shape, the surface area cannot be accurately measured because the distance between each part of the object to be measured and the electrode is not constant. That is, even when such an apparatus is used, only a thin plate having the same thickness as that of the test flat plate used as a reference or a thin plate having a thickness that does not affect the distance from the electrode is accurately measured. There is a problem that can not be.
[0009]
In addition, since such a problem is caused by the fact that the current density is not uniform on the surface of the object to be measured, the same phenomenon occurs in the plating method using the electrolysis reaction, and the surface of the object to be processed is uniform. There is a problem that a thick plating layer is not formed.
[0010]
In view of the above problems, an object of the present invention is to accurately measure the surface area of an object to be measured which is mainly subjected to surface treatment using an electrochemical reaction.
Another object of the present invention is to form a uniform plating layer on the surface of an object to be processed when an object to be processed is plated using an electrochemical reaction.
[0011]
[Means for Solving the Problems]
The present invention has been made in order to solve the above-mentioned problems, and the object to be measured and the electrode are immersed in the electrolyte solution, and a voltage is applied to the object to be measured and the electrode in the electrolyte solution, and the energized state at that time In the surface area measuring method for measuring the surface area of the object to be measured, the electrodes are arranged at two upper and lower positions at each of the four corners of the water tank, and four baffle plates that shield the electrodes from the center of the water tank at the four corners of the water tank. A surface area measuring method is provided, characterized in that a voltage is applied in a state where resistance is provided to the passage of ions by forming an elongated channel between an edge of the baffle plate and a water tank .
[0013]
Preferably, the flow of the electrolyte solution is suppressed so that the current distribution in the region where the object to be measured is immersed is within a range of ± 5%. The current distribution in the present invention refers to a current value that flows when a flat plate electrode is installed in a region where the object to be measured is immersed, and a constant voltage is applied between the flat plate electrode and the surrounding electrode. In this case, the variation in the region is measured. Moreover, the range of ± 5% means the percentage when the difference between the maximum value and the minimum value of the measured current value is divided by the current value measured when the plate electrode is installed at the center of the water tank. It shall be said.
[0014]
Further, the present invention is a surface area measuring device used for measuring the surface area of a measured object from an energized state by applying a voltage to the measured object and an electrode immersed in an electrolyte solution, There are provided a water tank for containing the electrolyte solution, electrodes arranged at two upper and lower positions at the four corners of the water tank, and four baffle plates that shield the electrodes from the center of the water tank at the four corners of the water tank, A surface area measuring device is provided in which an elongate flow path is formed between the edge of the baffle plate and the water tank so as to provide resistance to passage of water .
[0015]
Good Mashiku is provided with an auxiliary electrode on the bottom of the tank, said the electrode and the auxiliary electrode and that is configured to be capable of adjusting the voltage separately.
[0016]
Preferably, the baffle plate is provided so that a current distribution in a region where the measurement object is immersed is within a range of ± 5%.
[0017]
Furthermore, the present invention is a plating method in which a workpiece and an electrode are immersed in an electrolyte solution, a voltage is applied to the workpiece and the electrode in the electrolyte solution, and metal ions in the electrolyte solution are deposited on the surface of the workpiece. In the method, the electrodes are arranged at two upper and lower positions in each of the four corners of the water tank, and further, four baffle plates that shield the electrodes from the central part of the water tank are arranged in the four corners of the water tank, and the edge of the baffle plate and the water tank A plating method is provided, which is performed in a state where resistance is given to the passage of ions by forming a long and narrow channel between the two.
[0018]
Preferably, an auxiliary electrode is further disposed below the workpiece, and the voltage of the electrode and the auxiliary electrode is adjusted separately.
[0019]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an embodiment of a surface area measuring apparatus according to the present invention will be described with reference to the drawings, and an aspect of a surface area measuring method using the apparatus will be described.
[0020]
FIG. 1 is a perspective view showing an embodiment of a surface area measuring apparatus according to the present invention, FIG. 2 is a plan view of the surface area measuring apparatus, and FIG. 3 is a cross-sectional view taken along line AA of FIG.
As shown in FIGS. 1 to 3, the surface area measuring device 1 includes a water tank 2 having a square cross section, and a total of eight electrodes 3, 3. Four baffle plates 4, 4... For shielding the electrode 3 from the center of the water tank at the four corners of the water tank, and an auxiliary electrode 7 placed on the bottom of the water tank 2 are provided. Furthermore, a rack 5 for supporting the object to be measured (not shown) in the electrolyte solution, and a power supply rod 6 for supporting the rack 5 and for energizing the object to be measured through the rack 5 are provided. ing.
And when measuring a surface area, as shown to FIGS. 1-3, the electrolyte solution 10 set to the predetermined temperature and density | concentration will be satisfy | filled to the water tank 2. As shown in FIG.
[0021]
In this embodiment, the baffle plate 4 is employ | adopted as a distribution suppression means. Specifically, the baffle plate 4 shields the electrode 3 from the object to be measured so that the electrode does not directly face the object to be measured, and allows the electrolyte solution 10 to pass through the electrode side region (also referred to as an electrode region). ) 20 and a region to be measured (also referred to as a region to be measured) 30, and further provided to suppress the flow of the electrolyte solution 10 between these two regions.
[0022]
As shown in FIG. 2, the baffle plate 4 of the present embodiment is a substantially flat plate with bent edges at both ends, and the electrolyte solution 10 flows between the edges at both ends and the water tank 2. An elongate flow path 11 that can be suppressed is formed, and the electrode region 20 and the measured object region 30 can only flow through the flow path 11.
[0023]
The shape of the electrode 3 is not particularly limited, but it is preferable to use an electrode having a small area so that the electric resistance does not become excessive, and this allows the object to be measured to move in parallel at an equal distance from the electrode. It is believed that the so-called Wagner length effect that occurs can be reduced.
[0024]
The auxiliary electrode 7 is installed to further correct the Wagner length effect caused by the position of the object to be measured with respect to the electrode 3 and the influence of Ohm's law, and the shape is not particularly limited.
[0025]
The electrode 3 and the auxiliary electrode 7 are connected to a power supply device (not shown) so that a predetermined voltage is applied to the object to be measured. That is, a variable resistor (not shown) is interposed between the power supply device and each electrode or auxiliary electrode, so that different voltages can be applied to the electrode 3 and the auxiliary electrode 7, and the electrode 3 Also, a different voltage can be applied to the upper electrode 3a and the lower electrode 3b.
[0026]
The voltage applied to each electrode should be appropriately adjusted according to various conditions such as the shape and size of the water tank, the size and arrangement of the electrodes, and the shape of the rack, but is applied to the upper electrode 3a. Assuming that the voltage is V1, the voltage applied to the lower electrode 3b is V2, and the voltage applied to the auxiliary electrode 7 is V3, V1: V2 is 1: 0.1 to 1: 1, and V1: V3 is 1 A range of 0 to 1: 1 can be exemplified as a suitable voltage ratio.
[0027]
The power supply device is not particularly limited as long as a predetermined voltage can be applied to the object to be measured and the electrode.
[0028]
Moreover, it does not specifically limit as the electrolyte solution 10, For example, a sodium hydroxide solution, a phosphate solution, etc. can be used. The electrolyte solution is maintained at a constant electrolyte concentration by a water supply device (not shown) and an electrolyte solution supply device (not shown) linked with a monitor electrode (not shown), and a thermometer (not shown). The temperature is kept constant by a heater (not shown) in conjunction with).
[0029]
According to such a surface area measuring device 1, since the flow of the electrolyte solution 10 is suppressed by the baffle plate 4, the current distribution in the water tank 2 is made uniform.
[0030]
Next, a surface area measuring method using the surface area measuring device of such an embodiment will be described.
[0031]
First, a rack 5 on which an arbitrary object to be measured is hung is hung on a power supply rod 6 and immersed in an electrolyte solution 10, and the height and front / rear / left / right positions of the object to be measured are changed with a constant voltage applied. The current value is measured, and the voltages of the upper electrode 3a, the lower electrode 3b, and the auxiliary electrode 7 are adjusted so that the fluctuation of the current value becomes small.
[0032]
Next, an arbitrary rack is used as a reference rack, the reference rack is hung on the power supply rod 6 and immersed in the electrolyte solution, and a current value is measured by applying a certain voltage. Further, a plurality of racks having the same shape are measured in the same procedure, and an average value is obtained and set as a standard rack current value (Ls).
A plurality of reference measurement objects with known surface areas (for example, 0.5 dm 2 / sheet × 20 sheets) are sequentially placed on the reference rack one by one, and the current value is measured with the rack immersed in the same water depth. Then, a relational expression (Fs) between current and surface area is obtained.
The relational expression (Fs) is expressed as, for example, As = f (x) + C (where As is the surface area, x is the current value, and C is the area of the standard rack alone).
[0033]
Then, the current value (Lv) is measured for the racks that are actually used (if there are a plurality of racks). A rack in which an abnormal current value is detected is excluded as a defective rack. The relational expression for the reference rack is obtained by multiplying the constant term of the relational expression (Fs) by the ratio (Lv / Ls) between the current value (Ls) of the reference rack and the current value (Lv) of the rack to be used. (Fv) is corrected according to the size and shape difference of each rack actually used.
[0034]
In this way, since the relational expression (Fs) of the reference rack is corrected for each rack actually used, the current value is obtained in a state in which an object to be measured whose area is unknown is suspended from the rack. By measuring (Lv), the surface area of the object to be measured can be accurately calculated based on the relational expression (Fs). Even when there are other factors to be corrected, such as the material of the rack, they are set or corrected as necessary.
[0035]
According to such a surface area measuring apparatus and measuring method, the current distribution in the water tank is made uniform, and the current density in each part of the object to be measured is substantially constant, and the object to be measured has a complicated three-dimensional shape. It is possible to accurately measure the surface area.
This is because the flow of the electrolyte solution is suppressed by the baffle plate 4 so that the distance between the electrode and the object to be measured is apparently a long distance, or the resistance increases in inverse proportion to the distance from the electrode. This is presumed to be due to the generation of components. And in addition to such an effect | action, when the electrode 3 is arrange | positioned substantially uniformly in the water tank 2, it is estimated that the current distribution is made uniform.
[0036]
In addition, since the current distribution in the water tank is made uniform, the surface area can be accurately measured even when the position of the object to be measured in the water tank changes.
[0037]
In addition, although the said embodiment demonstrated the case where the baffle plate 4 was used as a distribution suppression means, this invention is not limited to this.
Accordingly, as another distribution restraining means, for example, as shown in FIG. 4, a cylindrical body 41 that can accommodate an electrode, and lid bodies 42 provided at both ends of the cylindrical body 41. It is also possible to use a configuration in which the gap with the lid 42 is separated so as to form the flow path 11 having a predetermined width. According to the distribution restraining means having such a configuration, there is an advantage that it is not necessary to install a large baffle plate in the water tank, and the inside of the water tank can be widely used.
[0038]
As another form of the flow suppressing means, the flow path may have a shape that increases the flow distance between the electrode region and the measured object region in addition to slightly narrowing the width. When the flow distance is increased, the distance between the electrode and the object to be measured is increased and the influence of Ohm's law can be alleviated, and the effect can be exhibited more remarkably by using a narrow flow path.
[0039]
Further, the shape of the electrode 3 is not particularly limited, and when the cylindrical body 41 and the lid body 42 as shown in FIG. It is good also as the cylindrical electrode 31 which is easy to do.
[0040]
Furthermore, it is preferable to arrange | position the position and quantity which provide an electrode in the position where the inside of a water tank becomes as uniform as possible. In the above embodiment, a total of eight electrodes are evenly arranged in the water tank, but the number of electrodes may be less than that or more.
Moreover, it does not specifically limit about the shape of a water tank, It can be set as a cylindrical shape and other arbitrary polyhedral shapes.
[0041]
In the embodiment of the surface area measuring method, the relational expression (Fs) is multiplied by the ratio (Lv / Ls) between the current value (Ls) of the reference rack and the current value (Lv) of the rack to be used. The relational expression (Fs) for the standard rack was corrected for each rack actually used. However, the current value was measured by multiplying each rack used by a plurality of reference measurement objects in order, and the current was directly measured. And the relational expression (Fv) of the surface area.
[0042]
Further, in the above embodiment, the surface area is calculated by measuring the current value with a constant voltage, but the present invention is not limited to this, and the voltage of the object to be measured is measured by measuring the voltage with a constant current. The surface area may be calculated.
[0043]
Further, in the above embodiment, it is suitable when the object to be plated is a measurement object, but the present invention is to measure the object to be surface-treated using these electrochemical reactions. However, the measurement object can be any object whose surface area is difficult to measure.
[0044]
In the present invention, the surface area can be measured by measuring, for example, the current value of the conductive measurement object as in the above embodiment, but only such a conductive measurement object is limited as the measurement object. It is not a thing. That is, according to the present invention, an insulating substance can be used as an object to be measured. Specifically, the electrostatic capacity in a state where a voltage is applied is measured by the same method, and the electrostatic capacity is determined as a dielectric. By dividing by the rate, the surface area of the measurement object can be measured.
[0045]
Here, the current distribution in the water tank was measured using a test apparatus as shown in FIG. 5 in order to verify that the current distribution in the water tank was made uniform when the baffle plate was installed as a flow suppressing means.
FIG. 5 is a perspective view showing an outline of the test apparatus. The test apparatus surrounds the water tank 2, a plate electrode (cathode) 15 disposed in the center of the water tank 2, and the plate electrode 15. A rectangular frame type electrode (anode) 3 and a square frame type baffle plate 4 arranged between the cathode 15 and the anode 3 are formed. The upper end of the baffle plate 4 protrudes above the liquid level, and the lower end of the baffle plate 4 is installed with a predetermined gap from the bottom of the water tank 2, and the gap between the baffle plate 4 and the water tank 2 is the electrolyte. It is comprised so that the distribution | circulation of a solution may be suppressed.
[0046]
Using such a test apparatus, as shown in FIG. 6, a flat plate electrode (in the center) (when the gap between the baffle plate 4 and the water tank 2 is 20 mm, 1 mm, and when the baffle plate 4 is not installed) The current distribution was measured when the cathode 15 was moved in one direction of the water tank 2 (right direction in FIG. 6).
The voltage applied between the electrodes of about 6V, the electrolyte solution was a 0.5% sodium hydroxide solution, the plate electrode 15, area using two kinds of 1 dm 2 and 0.5 dm 2. Further, the moving distance of the plate electrode 15 is represented by a relative value obtained by dividing the actually moved distance by the distance between the electrodes before the movement.
The measurement result of the current distribution is shown in FIG.
[0047]
As shown in FIG. 7, when the baffle plate 4 is not installed, the flat plate is used in both cases where the area is 1 dm 2 (indicated by (1) in the figure) and 0.5 dm 2 (indicated by ( 2 ) in the figure). It can be seen that as the electrode 15 is moved toward one end of the water tank 2, the current value increases greatly.
On the other hand, when the baffle plate 4 is installed, the current value when the plate electrode 15 is moved is substantially constant regardless of whether the gap is 1 mm or 20 mm, and the current distribution in the water tank is uniform. It turns out that it is.
[0048]
Thus, although the reason why the current distribution is constant against Ohm's law is not clear, the provision of flow control means such as a baffle plate also causes some resistance to the passage of ions, and the distance between the electrodes is It is presumed that the resistance acts as a large resistance when the amount of ion passage increases and approaches a small resistance when the distance between the electrodes increases and the passage amount of ions decreases. .
[0049]
Next, test pieces A to I having a three-dimensional shape and an equal surface area as shown in FIG. 8 were installed as cathodes in the center of the test apparatus, and current values were measured for the individual test pieces. The measurement result of the current value when the baffle plate 4 is not installed is shown in FIG. 9, and the measurement result of the current value when the baffle plate 4 is installed so that the gap with the water tank is 20 mm is shown in FIG.
[0050]
When the baffle plate is not installed (graph of FIG. 9), the variation in the current value, that is, (maximum value−minimum value) / average value is about 23%, whereas when the baffle plate is installed (FIG. 9). In the graph (10), it can be seen that the variation in the current value is reduced to about 16%.
[0051]
In this way, the current distribution in the water tank is made uniform by installing a flow restricting means such as a baffle plate between the cathode and the anode, and as a result, fluctuations in the current value due to the three-dimensional shape of the object to be measured. Is greatly reduced.
Therefore, when measuring the surface area of an object to be measured having a complicated three-dimensional shape, the method and apparatus of the present invention can measure the surface area with very high accuracy compared to the conventional method.
[0052]
Next, an embodiment of the plating method according to the present invention will be described.
The apparatus used for the plating method of the present invention is configured in substantially the same manner as the surface area measuring apparatus 1. However, a plating bath containing a predetermined metal ion is used as the electrolyte solution, and an object to be processed is an anode and an electrode is a cathode. It is also possible to use the same metal as the plating metal as the electrode.
[0053]
The specific procedure of the plating method is to immerse a workpiece whose surface area has been measured in advance in a plating bath, adjust the current value so as to obtain a desired current density, and deposit a plating layer by energizing for a desired time. .
The surface area measurement method described above can be suitably used for measuring the surface area of the object to be processed, and the object to be processed whose surface area has been measured is suspended in the rack 5 and immersed in a cleaning tank for cleaning, and then suspended in the rack 5. What is necessary is just to immerse in a plating bath as it is.
[0054]
According to such a plating method, since the current distribution in the plating bath is made uniform and the current density on the surface of the object to be processed becomes substantially constant, even if the object to be processed has a complicated three-dimensional shape. There is an effect that a plating layer having a uniform thickness can be formed.
[0055]
【The invention's effect】
As described above, according to the surface area measuring method and the surface area measuring device according to the present invention, it is possible to accurately measure the surface area of the workpiece.
Moreover, according to the plating method of this invention, a uniform plating layer can be formed on the surface of a to-be-processed object.
[Brief description of the drawings]
FIG. 1 is a perspective view showing an embodiment of a surface area measuring apparatus according to the present invention.
FIG. 2 is a plan view showing one embodiment of a surface area measuring device according to the present invention.
3 is a cross-sectional view taken along line AA in FIG.
FIG. 4 is a partially cutaway perspective view showing another embodiment of the flow restricting means and the electrode.
FIG. 5 is a perspective view of a test apparatus used for confirming the effect of a baffle plate.
6 is a cross-sectional view taken along line BB in FIG.
FIG. 7 is a graph showing measurement results of current distribution.
FIG. 8 is a view showing the shape of a test piece used as an object to be measured.
FIG. 9 is a graph showing measurement results of current values when no baffle plate is installed.
FIG. 10 is a graph showing measurement results when a baffle plate is installed.
FIG. 11 shows an arrangement example of electrodes studied by the present inventors as an improvement plan of a conventional measuring method.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Surface area measuring device 2 Water tank 3 Electrode 4 Baffle plate 5 Rack 7 Auxiliary electrode 10 Electrolyte solution 15 Plate electrode

Claims (5)

電解質溶液に被測定物および電極を浸漬し、該電解質溶液中で被測定物と電極とに電圧を印加し、その際の通電状態から被測定物の表面積を測定する表面積測定方法において、水槽の四隅においてそれぞれ上下2箇所に前記電極を配置し、さらに該水槽の四隅において該電極を水槽中央部から遮蔽する4枚の邪魔板を配置し、該邪魔板の縁部と水槽との間に細長い流路を形成することによりイオンの通過に抵抗を与えた状態で電圧を印加することを特徴とする表面積測定方法。  In the surface area measurement method of immersing the object to be measured and the electrode in the electrolyte solution, applying a voltage to the object to be measured and the electrode in the electrolyte solution, and measuring the surface area of the object to be measured from the energized state at that time, In the four corners, the electrodes are arranged at two upper and lower positions, respectively, and in the four corners of the water tank, four baffle plates that shield the electrodes from the center of the water tank are arranged, and are elongated between the edge of the baffle plate and the water tank. A method for measuring a surface area, wherein a voltage is applied in a state where resistance is given to the passage of ions by forming a flow path. 被測定物の浸漬される領域内に於ける電流分布が±5%の範囲内となるように前記邪魔板を配置することを特徴とする請求項に記載の表面積測定方法。Surface area measurement method according to claim 1, characterized by arranging the baffle plate as in current distribution immersed the region of the object to be measured is in the range of ± 5%. 電解質溶液に浸漬された被測定物と電極とに電圧を印加することにより、その際の通電状態から被測定物の表面積を測定するために用いる表面積測定装置であって、電解質溶液を収容するための水槽と、該水槽の四隅においてそれぞれ上下2箇所に配置された電極と、該水槽の四隅において該電極を水槽中央部から遮蔽する4枚の邪魔板が備えられ、イオンの通過に抵抗を与えるべく該邪魔板の縁部と水槽との間に細長い流路が形成されていることを特徴とする表面積測定装置。  A surface area measuring device used for measuring the surface area of an object to be measured from an energized state by applying a voltage to the object to be measured and an electrode immersed in the electrolyte solution, and for accommodating the electrolyte solution And four baffle plates that shield the electrodes from the center of the water tank at the four corners of the water tank, and provide resistance to the passage of ions. Thus, a surface area measuring apparatus characterized in that an elongated channel is formed between the edge of the baffle plate and the water tank. 被測定物の浸漬される領域内に於ける電流分布が±5%の範囲内となるように前記邪魔板が設けられたことを特徴とする請求項に記載の表面積測定装置。4. The surface area measuring apparatus according to claim 3 , wherein the baffle plate is provided so that a current distribution in a region where the measurement object is immersed is within a range of ± 5%. 電解質溶液に被処理物および電極を浸漬し、該電解質溶液中で被処理物と電極とに電圧を印加し、電解質溶液中の金属イオンを被処理物の表面に析出させるメッキ方法において、水槽の四隅においてそれぞれ上下2箇所に前記電極を配置し、さらに該水槽の四隅において該電極を水槽中央部から遮蔽する4枚の邪魔板を配置し、該邪魔板の縁部と水槽との間に細長い流路を形成することによりイオンの通過に抵抗を与えた状態で行うことを特徴とするメッキ方法。  In a plating method in which an object to be processed and an electrode are immersed in an electrolyte solution, a voltage is applied to the object to be processed and the electrode in the electrolyte solution, and metal ions in the electrolyte solution are deposited on the surface of the object to be processed. In the four corners, the electrodes are arranged at two upper and lower positions, respectively, and in the four corners of the water tank, four baffle plates that shield the electrodes from the center of the water tank are arranged, and are elongated between the edge of the baffle plate and the water tank. A plating method characterized in that it is performed in a state where resistance is given to the passage of ions by forming a flow path.
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