JP3909367B2 - Low dielectric constant porcelain composition and method for producing substrate for electronic circuit using the porcelain composition - Google Patents
Low dielectric constant porcelain composition and method for producing substrate for electronic circuit using the porcelain composition Download PDFInfo
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- 239000000203 mixture Substances 0.000 title claims description 53
- 229910052573 porcelain Inorganic materials 0.000 title claims description 25
- 239000000758 substrate Substances 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000919 ceramic Substances 0.000 claims description 16
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 13
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 11
- 239000000843 powder Substances 0.000 claims description 11
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 10
- 238000005245 sintering Methods 0.000 claims description 9
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 6
- 239000011230 binding agent Substances 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 2
- 238000007639 printing Methods 0.000 claims description 2
- 238000010304 firing Methods 0.000 description 21
- 238000009792 diffusion process Methods 0.000 description 15
- 239000004020 conductor Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- 238000013508 migration Methods 0.000 description 9
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- 230000007423 decrease Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000001354 calcination Methods 0.000 description 5
- 239000002241 glass-ceramic Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
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- 230000006866 deterioration Effects 0.000 description 1
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- 238000011161 development Methods 0.000 description 1
- ZOIVSVWBENBHNT-UHFFFAOYSA-N dizinc;silicate Chemical compound [Zn+2].[Zn+2].[O-][Si]([O-])([O-])[O-] ZOIVSVWBENBHNT-UHFFFAOYSA-N 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
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- 230000020169 heat generation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000009766 low-temperature sintering Methods 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
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- 238000007747 plating Methods 0.000 description 1
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- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
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- Inorganic Insulating Materials (AREA)
- Compositions Of Oxide Ceramics (AREA)
Description
【0001】
【発明が属する技術分野】
本発明は、数GHzから数十GHzの高周波領域で使用する電子部品やモジュールに好適な誘電体の磁器組成物およびその磁器組成物を用いた電子回路用基板の製造方法に関する。
【0002】
【従来の技術】
近年、情報の高速大量伝達通信および移動体通信の発達にともない、集積回路においては、小型化、高密度化ばかりでなく、取り扱われる信号に数GHzさらにはそれ以上の帯域の周波数の利用が検討されており、部品や基板に用いられる誘電体の磁器組成物に対しても、このような高周波帯域に適合した材料が要望されている。この磁器組成物に要求される性能は、高周波帯域において比誘電率が低いこと、誘電損失tanδが小さいことすなわちQ値が高いことである。
【0003】
一般に、比誘電率が低いほど誘電体中の信号伝搬速度は速くなるので、高周波帯域の用途には比誘電率εrは低いことが望ましい。そして信号伝達の上で損失は少なければ少ないほどよく、Q値はできるだけ高くする必要がある。また、誘電体としての機能を例えばフィルタや共振器などに利用することがあるが、この場合温度変化に対して安定な作動をさせるために、共振周波数の温度係数τfの絶対値はできるだけ小さいこと、すなわち温度依存性の少ないことが重要になる。
【0004】
実装基板に内部導体や内部電極として利用される導電材料は、小型化、高密度化から細線化が要求されることもあって、比抵抗値が高ければそれだけ損失が増し、さらには発熱の原因となるので、できるだけ低抵抗であることが望ましい。このような低抵抗材料は、Ag、CuまたはAuなどであるが、これらの金属はいずれも融点が1000℃前後と低い。
【0005】
磁器組成物を基板とする集積回路は、グリーンシートにペースト状の導電体素材を用いて回路パターンを印刷し、これらのシートを積層して一体化焼成により、導電材料と磁器組成物とが同時に焼結され形成される。しかし、焼成温度が導体金属の融点近くさらには融点以上になると拡散や流動化が生じ、導体が細くなったり消失したりするおそれがある。
【0006】
このような低温での焼成が可能な磁器組成物として、いわゆるガラスセラミックスがある。これは、セラミックスの骨材をガラスに混在させたもので、ガラスの軟化により低温での焼成を可能にしており、骨材とガラスとの組み合わせで様々な改良が行われている。たとえば特開平10-297960号公報に開示された発明は、骨材としてオルト珪酸亜鉛(Zn2SiO4)およびクリストバライト(SiO2)、ガラスとしてSiO2−Li2O−ZnOを用い、焼成温度は800〜1000℃で損失が小さく比誘電率の低いセラミックスが得られるとしている。
【0007】
しかしながらガラスセラミックスはガラス組成が多く含まれるので、一般に比誘電率は低いがQ値も低く、したがって高周波帯域における損失が大きい。その上共振周波数の温度係数τfが大きいため、周波数帯域が高くなるとこれらによる性能低下が問題化してくる。また多くの場合、ガラス組成とセラミックス組成とを別々に作製し、これらを混合してグリ−ンシートとするので製造工程が繁雑である。
【0008】
【発明が解決しようとする課題】
本発明の目的は、低温焼結が可能で、とくにAgを内部電極に用いることに適し、比誘電率が低く高周波帯域での損失が小さく、かつ温度依存性の小さい誘電体の磁器組成物とその磁器組成物を用いた電子回路用基板の製造方法の提供にある。
【0009】
【課題を解決するための手段】
本発明者らは、2GHzないしはそれ以上の高周波帯域で電子回路用基板として使用される磁器組成物の性能を改善すべく種々検討をおこなった。その際に目標とした性能は次のとおりである。
【0010】
内部電極または内部導体にはAgを用いる。AgはCuやAuよりも比抵抗は小さいが、融点がこれらより低いので、焼成時の拡散などにより導体損耗が生じやすい。また、Agは金属イオンの移動、すなわちマイグレーションによる使用中の絶縁破壊が発生しやすい。これらAgの拡散、あるいはマイグレーションができるだけ少ない、磁器組成物でなければならない。
【0011】
拡散状態の調査から、焼成温度としては925℃以下とすればAgの拡散は大きく抑制されることがわかった。そこで、磁器組成物の具備すべき特性目標としては、誘電率εrは10以下で、Q(誘電正接tanδの逆数)と周波数f(GHzで表示)との積が3500以上、共振周波数の温度係数が−30〜+30ppm/℃であることとし、この特性が925℃以下の焼成温度で得られる組成を検討した。ここで比誘電率εr、誘電損失tanδおよび温度係数τfは、いずれも両端短絡形誘電体共振器法(ハッキ・コールマン法)を用いて測定する。
【0012】
Q値には周波数依存性があり周波数が高くなると低下の傾向を示すので、材料によりほぼ一定の値を示すとされるfQ値(fとQとの積の値)の大小で、損失の優劣を比較した。種々の磁器組成物にてその性能を比較検討した結果、在来材よりすぐれていると判断されたのは、上記のようにfQが3500以上の材料である。
【0013】
共振周波数の温度依存性は、両端短絡形誘電体共振器法にて共振周波数の温度係数τfとして計測される。このτfが−30〜+30ppm/℃、すなわちその絶対値が30ppm/℃以下であれば、在来材より改善できていると考えられる。
【0014】
ガラスまたはガラスセラミックスは、このような925℃以下の低温での焼結が可能である。しかし、前述のようにQ値が小さいため損失が大きく、温度依存性も大きい。また、ガラスセラミックスの場合、ガラス組成とセラミックス組成とを別々に作製しこれを混合焼成するため工程が多くなる。そこで、セラミックスの磁器組成物にて、上記の目標性能を実現する可能性を追求することとした。
【0015】
セラミックスを構成する主成分としてSiO2とZnOを用いた。これらは、比誘電率が低く高いQ値の高周波用誘電体を得るために、必須の含有成分であると考えられる。
【0016】
これら2成分に対し、焼結温度が低下でき、Agの拡散が抑止され、そして上記各性能を確保できることを目標に、種々の成分とその含有量を検討した。その結果、Bi2O3、Li2O、K2OおよびB2O3の4成分の複合添加が、Q値を劣化させることなく焼結温度の低下に有効であることが見出された。これらの各成分は、単独の添加で焼結温度を低下させようとすると多量の含有が必要になり、その結果Q値を大きく低下させてしまう。ところが、複合して添加すると、Q値の低下を少なくして焼結温度を低下させることができたのである。
【0017】
SiO2とZnOにこれら4成分を複合添加した組成物に、さらにTiO2とMgOとを併せて含有させることにより、Q値の低下や比誘電率の増大を少なくして共振周波数の温度係数τfを小さくすることができた。TiO2を含有させるとτfが小さくなる。ところが、それとともに比誘電率が高くなり、加えてQ値が大幅に低下する。これに対し、MgOを併せて含有させると、Q値の大幅低下なしにτfを小さくできることがわかった。MgOのみの添加ではτfを小さくする効果はなく、Q値が多少改善されるだけであった。TiO2に併せて添加することによりこのような効果が得られるが、その理由は明らかでない。
【0018】
このようにして得られた磁器組成物について、Agを内部電極とし同時焼成して作製し調査した結果、925℃までの焼成温度ではAgの拡散は認められなかった。多くの場合、B2O3などの低融点成分の含有はAgの拡散を生じさせる傾向があるが、温度を925℃以下に抑えたこと、およびBi2O3、Li2Oなどを複合含有させることにより単独に添加した場合より少なくできたことが、このような拡散を抑止したものと思われる。またこれらの磁器組成物の、湿潤雰囲気中使用を調査した結果、マイグレーションが生じないことも確認された。
【0019】
以上のような検討結果から、さらにそれぞれの成分含有の効果を有効に発揮できる限界を確認して本発明を完成させた。本発明の要旨は次のとおりである。
(1)酸化物組成比として質量%で、SiO2:26.0〜38.0%、ZnO:34.0〜49.0%、Bi2O3:1.0〜5.7%、MgO:1.0〜6.0%、TiO2:3.5〜15.0%、Li2O:2.0〜6.0%、K2O:2.0〜9.0%およびB2O3:0.5〜3.0%を含有することを特徴とする低誘電率磁器組成物。
(2)各酸化物の粉末原料を所要量配合しボールミルにて湿式混合して、乾燥後700〜900℃にて仮焼後粉砕整粒した後、バインダを添加して混練し、成形後、導電体等の印刷および積層をおこなってから、800〜925℃にて焼結することを特徴とする、酸化物組成比として質量%で、SiO 2 : 26.0 〜 38.0 %、ZnO: 34.0 〜 49.0 %、Bi 2 O 3 : 1.0 〜 5.7 %、MgO: 1.0 〜 6.0 %、TiO 2 : 3.5 〜 15.0 %、Li 2 O: 2.0 〜 6.0 %、K 2 O: 2.0 〜 9.0 %およびB 2 O 3 : 0.5 〜 3.0 %を含有する磁器組成物を用いた電子回路用基板の製造方法。
【0020】
【発明の実施の形態】
本発明の磁器組成物は、成分組成範囲を以下のとおりに限定する。ここで含有組成は酸化物の形で表した質量%である。
【0021】
SiO2の含有範囲は26.0〜38.0%とする。これは含有量が26.0%未満では共振周波数の温度係数τfが−30ppm/℃より低、すなわち温度係数の絶対値が30ppm/℃を超え、温度依存性が大きくなってしまうからである。一方、38.0%を超える量含まれると、高周波域でのQ値が低下する。望ましいのは31.1〜34.1%の範囲である。
【0022】
ZnOは34.0〜49.0%とする。ZnOはSiO2と共に本発明の磁器組成物の基本成分であるが、34.0%を下回るかまたは49.0%を超えるいずれの場合も、τfが−30〜+30ppm/℃の範囲を超えてしまい、温度依存性が大きくなる。好ましいのは42.0〜45.6%の含有範囲とすることである。
【0023】
Bi2O3は1.0〜5.7%、K2Oは2.0〜9.0%、Li2Oは2.0〜6.0%、B2O3は0.5〜3.0%をそれぞれ含有させる。これらの成分を同時に含有させた組成とすることにより、焼成温度は925℃以下で緻密な磁器組成物に焼結することができる。それぞれの成分はいずれも上記の下限量を下回ると焼結温度低下の効果が十分でなくなり、緻密な磁器組成物が得られない。しかしいずれも上記の上限値を超えて含有させると、Q値が低下し損失が増加する。とくにBi2O3は多くしすぎると焼成時にAgの拡散を生じてしまう。より好ましい含有範囲は、それぞれBi2O3は2.4〜2.6%、K2Oは2.2〜8.8%、Li2Oは3.3〜4.1%、そしてB2O3は0.6〜2.7%である。
【0024】
TiO2は3.5〜15.0%、MgOは1.0〜6.0%を併せて含有させる。TiO2は共振周波数の温度係数を小さくするために含有させるが、この効果を得るには3.5%以上の含有が必要である。しかし比誘電率が高くなり、Q値が低下してくるのでTiO2の含有量は15.0%以下にしなければならない。MgOはこのTiO2含有による比誘電率の増大およびQ値の低下を抑止する作用があり、その効果を得るために少なくとも1.0%以上含有させる。ただしMgOは焼結性を悪くするので、多くても6.0%までとする。好ましい含有範囲はTiO2が7.2〜8.9%、MgOが1.9〜2.3%である。
【0025】
上記以外の成分としては、原料に混入してくる種々の不純物があるが、得られた磁器組成物の特性に悪影響をおよぼさない範囲のものであれば、とくには限定しない。
【0026】
本発明の磁器組成物の製造は、通常のセラミック系のものを焼成する方法に準じておこなう。まず原料となる各成分のそれぞれの酸化物粉末を所要量用意し、ボールミルにて十分に混合する。酸化物粉末は、K2Oのように酸化物そのものが吸湿性のある不安定な材料では、炭酸塩や炭酸水素塩など他の形のものを用いてもよく、その場合は焼結後の酸化物量に相当するモル分量の粉末を配合する。混合後仮焼して、セラミックの形成反応がおこなわれていることを確認してから粉砕整粒する。仮焼は最終焼成にて十分に焼結させるためには高くない温度でおこなうことが望ましいが、低すぎるとセラミックの形成反応が生じないので、700〜900℃とするのがよい。
【0027】
整粒粉にバインダ等を添加して混練し成形して、必要により導電回路の印刷、積層、最終形状への加工等をおこなって、800〜925℃で焼成し磁器組成物とする。焼成温度は800℃未満では焼結が十分おこなわれず、緻密性に欠け所要特性が十分得られないことがある。また、Agの内部導体の拡散あるいはそれによるマイグレーションを引き起こすことがあるので、焼成温度は925℃までとするのがよい。
【0028】
【実施例】
〔実施例1〕
95%以上の高純度のSiO2、ZnO、Bi2O3、MgO、TiO2、と純度90%以上のK2O(KHCO3として)およびLi2O(Li2CO3として)の粉末原料にて表1の組成の配合とし、磁器組成物を作製した。
【0029】
【表1】
【0030】
所定の組成に配合した原料粉末を、ジルコニア製ボールを用いたボールミルにて純水を加えて24時間湿式混合し、乾燥後ライカイ機にて攪拌した後、約750℃で2時間仮焼した。仮焼後X線回折により、焼結反応がおこなわれたことを確認し、さらにジルコニア製ボールのボールミルにて純水を加えて24時間粉砕して、乾燥後粒径1〜4μmの粉末とした。10%PVA水溶液のバインダーを加えて造粒し、金型を用い1t/cm2の圧力にて直径15mm、高さ8mmの円柱状試片に成形後、大気中で焼成をおこなった。
【0031】
その場合、各試料は一部の試片を用いてあらかじめ840〜980℃の温度で試験的に焼成して、十分な緻密化に必要な温度を見出し、その温度を焼成温度として該当試料全試片の焼成をおこなった。焼成時間はいずれも2時間である。
【0032】
焼成後の焼結磁器組成物試片は、底面を研磨し平滑にしてから両端短絡形誘電体共振器法により比誘電率εrおよび誘電損失tanδ(またはQ=1/tanδ)を求めた。誘電損失は測定共振周波数fにより変化するので、周波数に影響されず被測定材で一定の値になるとされるfとQとの積のfQ値で損失の大小を評価した。共振周波数の温度係数τfは、25℃から85℃までの温度範囲で共振周波数を測定し、25℃における共振周波数f0を基準としてその変化率から求めた。これらの測定結果を併せて表2に示す。
【0033】
【表2】
【0034】
Agの拡散およびマイグレーションの評価については、以下のようにしておこなった。上記の仮焼後の粉末に、バインダとして粉末量の約10質量%のPVBと少量の可塑剤を添加したキシレン、トルエンおよびブタノールからなる溶剤を加え、十分に混合してスラリーとし、このスラリーによりテープ成型機を用いて、焼成後の厚さ目標100μmのグリーンシートとした。グリーンシート上に厚さ20μmの内層電極用Agペーストをスクリーン印刷し、120℃に予熱し150kgf/cm2で加圧圧着後切断して、誘電率やQ値を測定した試片と同じ温度にて同様に2時間の焼成をおこない、4225サイズの電極層数9層のコンデンサ用積層体を作製した。
【0035】
なお、誘電率やQ値の測定の際に、必要な焼成温度が940℃以上であった試番16、22、24、29および36については,Ag電極使用には不適当であるので、コンデンサ用積層体の作製はおこなわなかった。
【0036】
Ag拡散の有無の調査は、積層方向に垂直な断面を研磨して内部電極が観察できるようにし、磁器組成物部分のSEM観察およびEDS分析をおこなった。マイグレーションについては、上記焼成後のコンデンサ用積層体の電極端面部にAgペーストを塗布して700℃にて焼き付け、Ni/Snのバレルめっきをおこなって外部端子として、130℃、90%RH、DC25V、9時間のPCT(Pressure Cooker Test)を施した後、絶縁抵抗を測定した。結果を表2に併記する。
【0037】
Agの拡散はBi2O3を多く含む試番26以外は、いずれも認められなかった。またPCT後の絶縁抵抗は、測定した試料のいずれもが109Ω超の値を示しており、マイグレーションは生じていないと判断された。
【0038】
高周波特性については、表2の結果からわかるように、各酸化物成分の含有量が本発明にて定める範囲内である場合は、いずれも当初目標とした比誘電率εrが10以下で、Qf値が3500以上、共振周波数の温度係数τfが−30〜+30ppm/℃で、しかも基板作製のための焼成温度すなわち焼結可能温度は、Ag導体の適用可能限界である925℃またはそれ以下のものが得られている。
【0039】
これに対し、組成が本発明で規定した範囲を外れると、必要な焼成温度が高すぎたり、低fQ値や温度依存性が多きいなど、目標特性が満足できていない結果となっている。
【0040】
このように、本発明の磁器組成物は、比誘電率が低く高周波帯域における損失が低く、温度依存性が小さいもので、電極とするAgの拡散およびマイグレーションもなく、しかも低い焼成温度でそのすぐれた特性を得ることができる。
【0041】
【発明の効果】
本発明の誘電体磁器組成物は、比誘電率が低く高周波帯域における損失が低く、温度依存性が小さいものであり、しかも低い焼成温度でその特性を得ることができる。したがって、内部導体や電極として比抵抗の低いAgを使用することができ、すぐれた高周波性能と相俟って、電子回路の高周波化、小型化、高密度化のための基板用等の用途に好適である。[0001]
[Technical field to which the invention belongs]
The present invention relates to a dielectric porcelain composition suitable for an electronic component or module used in a high frequency region of several GHz to several tens of GHz, and a method for manufacturing an electronic circuit board using the porcelain composition .
[0002]
[Prior art]
In recent years, with the development of high-speed mass communication and mobile communication of information, in integrated circuits, not only miniaturization and densification, but also the use of frequencies in the range of several GHz and beyond are considered for the signals handled. Therefore, a material suitable for such a high frequency band is also required for dielectric ceramic compositions used for components and substrates. The performance required for this porcelain composition is that the relative permittivity is low in the high frequency band, the dielectric loss tan δ is small, that is, the Q value is high.
[0003]
In general, the lower the relative permittivity, the faster the signal propagation speed in the dielectric, so it is desirable that the relative permittivity ε r be low for high frequency band applications. The smaller the loss in signal transmission, the better. The Q value should be as high as possible. In addition, the function as a dielectric may be used for, for example, a filter or a resonator. In this case, the absolute value of the temperature coefficient τ f of the resonance frequency is as small as possible in order to perform a stable operation against a temperature change. That is, it is important that the temperature dependency is small.
[0004]
Conductive materials used as internal conductors and internal electrodes on the mounting substrate may be required to be thinned due to miniaturization and high density, so the higher the specific resistance value, the more the loss increases and the cause of heat generation Therefore, it is desirable that the resistance is as low as possible. Such a low resistance material is Ag, Cu, Au, or the like, but these metals all have a melting point as low as about 1000 ° C.
[0005]
An integrated circuit using a porcelain composition as a substrate prints a circuit pattern using a paste-like conductor material on a green sheet, and laminates these sheets and fires them together so that the conductive material and the porcelain composition are simultaneously formed. Sintered and formed. However, when the firing temperature is close to the melting point of the conductor metal or more than the melting point, diffusion or fluidization occurs, and the conductor may be thinned or lost.
[0006]
As such a porcelain composition that can be fired at a low temperature, there is a so-called glass ceramic. This is a mixture of ceramic aggregates in glass, which makes it possible to fire at low temperatures by softening the glass, and various improvements have been made by combining aggregates and glass. For example, in the invention disclosed in Japanese Patent Laid-Open No. 10-297960, zinc orthosilicate (Zn 2 SiO 4 ) and cristobalite (SiO 2 ) are used as aggregates, and SiO 2 —Li 2 O—ZnO is used as glass. It is said that ceramics with low loss and low dielectric constant can be obtained at 800-1000 ° C.
[0007]
However, since glass ceramics contain a lot of glass composition, the dielectric constant is generally low but the Q value is also low, so that the loss in the high frequency band is large. In addition, since the temperature coefficient τ f of the resonance frequency is large, deterioration in performance due to these becomes a problem when the frequency band is increased. In many cases, the glass composition and the ceramic composition are prepared separately and mixed to obtain a green sheet, which makes the manufacturing process complicated.
[0008]
[Problems to be solved by the invention]
An object of the present invention is a dielectric ceramic composition which is capable of low-temperature sintering, particularly suitable for using Ag as an internal electrode, has a low relative dielectric constant, a low loss in a high frequency band, and a low temperature dependency. An object of the present invention is to provide a method for producing an electronic circuit board using the porcelain composition .
[0009]
[Means for Solving the Problems]
The present inventors have conducted various studies to improve the performance of a porcelain composition used as an electronic circuit substrate in a high frequency band of 2 GHz or higher. The target performance at that time is as follows.
[0010]
Ag is used for the internal electrode or the internal conductor. Ag has a smaller specific resistance than Cu and Au, but has a melting point lower than these, and therefore conductor wear is likely to occur due to diffusion during firing. Further, Ag tends to cause dielectric breakdown during use due to migration of metal ions, that is, migration. Diffusion of Ag, or less as possible migration Ngade must be ceramic composition.
[0011]
From the investigation of the diffusion state, it was found that if the firing temperature is 925 ° C. or less, the diffusion of Ag is greatly suppressed. Therefore, as a characteristic target to be possessed by the porcelain composition, the dielectric constant ε r is 10 or less, the product of Q (reciprocal of dielectric loss tangent tan δ) and frequency f ( expressed in GHz) is 3500 or more, and the temperature of the resonance frequency. The coefficient was −30 to +30 ppm / ° C., and a composition in which this characteristic was obtained at a firing temperature of 925 ° C. or less was examined. Here, the relative permittivity ε r , the dielectric loss tan δ, and the temperature coefficient τ f are all measured using the double-end short-circuited dielectric resonator method (Hack-Coleman method).
[0012]
Since the Q value has frequency dependency and tends to decrease as the frequency increases, the fQ value (the value of the product of f and Q), which is assumed to show a substantially constant value depending on the material, is superior or inferior in loss. Compared. As a result of comparing and examining the performance of various porcelain compositions, it was determined that the material having fQ of 3500 or more was judged to be superior to conventional materials.
[0013]
The temperature dependence of the resonance frequency is measured as the temperature coefficient τ f of the resonance frequency by the double-shorted dielectric resonator method. The tau f is -30 to + 30 ppm / ° C., that is, if the absolute value is 30 ppm / ° C. or less, it is considered that can be improved from the conventional material.
[0014]
Glass or glass ceramics can be sintered at such a low temperature of 925 ° C. or lower. However, since the Q value is small as described above, the loss is large and the temperature dependency is large. In the case of glass ceramics, the glass composition and the ceramic composition are separately produced and mixed and fired to increase the number of processes. Therefore, it was decided to pursue the possibility of realizing the above target performance with ceramic ceramic compositions.
[0015]
SiO 2 and ZnO were used as the main components constituting the ceramic. These are considered to be essential components for obtaining a high-frequency dielectric having a low relative dielectric constant and a high Q value.
[0016]
With respect to these two components, various components and their contents were examined with the aim of reducing the sintering temperature, suppressing the diffusion of Ag, and ensuring the above-mentioned performances. As a result, it was found that the combined addition of four components of Bi 2 O 3 , Li 2 O, K 2 O and B 2 O 3 is effective for lowering the sintering temperature without deteriorating the Q value. . Each of these components needs to be contained in a large amount if the sintering temperature is lowered by adding them alone, and as a result, the Q value is greatly lowered. However, when added in combination, it was possible to reduce the decrease in the Q value and lower the sintering temperature.
[0017]
By adding a combination of TiO 2 and MgO to a composition in which these four components are added in combination with SiO 2 and ZnO, the temperature coefficient τ of the resonance frequency is reduced by reducing the decrease in the Q value and the increase in the dielectric constant. f could be reduced. When TiO 2 is contained, τ f becomes small. However, the relative dielectric constant increases with this, and in addition, the Q value significantly decreases. On the other hand, when MgO was contained together, it turned out that (tau) f can be made small without the Q value fall significantly. No effect of reducing the tau f in the addition of MgO only, Q value was only slightly improved. Such an effect can be obtained by adding it together with TiO 2 , but the reason is not clear.
[0018]
The porcelain composition obtained as described above was prepared by conducting simultaneous firing with Ag as an internal electrode, and as a result, no diffusion of Ag was observed at firing temperatures up to 925 ° C. In many cases, inclusion of a low melting point component such as B 2 O 3 tends to cause diffusion of Ag, but the temperature is suppressed to 925 ° C. or less, and Bi 2 O 3 , Li 2 O, and the like are contained in a composite manner. It is thought that such a diffusion was suppressed by making it possible to be less than when it was added alone. Moreover, as a result of investigating the use of these porcelain compositions in a humid atmosphere, it was confirmed that no migration occurred.
[0019]
Based on the above examination results, the present invention was completed by confirming the limit of effectively exhibiting the effect of each component. The gist of the present invention is as follows.
(1) in mass% as the oxide composition ratio, SiO 2: 26.0~38.0%, ZnO : 34.0~49.0%, Bi 2 O 3: 1.0~5.7%, MgO: 1.0~6.0%, TiO 2: 3.5~15.0 %, Li 2 O: 2.0 to 6.0%, K 2 O: 2.0 to 9.0%, and B 2 O 3 : 0.5 to 3.0%.
(2) Each oxide powder raw material is blended in a required amount and wet-mixed in a ball mill, dried, calcined at 700 to 900 ° C. and then pulverized and sized, then kneaded by adding a binder, after molding, After printing and laminating conductors and the like, sintering is performed at 800 to 925 ° C. , and the oxide composition ratio is mass%, SiO 2 : 26.0 to 38.0 %, ZnO: 34.0 to 49.0 % , Bi 2 O 3: 1.0 ~ 5.7%, MgO: 1.0 ~ 6.0%, TiO 2: 3.5 ~ 15.0%, Li 2 O: 2.0 ~ 6.0%, K 2 O: 2.0 ~ 9.0% and B 2 O 3: 0.5 The manufacturing method of the board | substrate for electronic circuits using the porcelain composition containing ~ 3.0 % .
[0020]
DETAILED DESCRIPTION OF THE INVENTION
The porcelain composition of the present invention limits the component composition range as follows. Here, the content composition is mass% expressed in the form of an oxide.
[0021]
The content range of SiO 2 is 26.0 to 38.0%. This is because if the content is less than 26.0%, the temperature coefficient τ f of the resonance frequency is lower than −30 ppm / ° C., that is, the absolute value of the temperature coefficient exceeds 30 ppm / ° C., and the temperature dependency becomes large. On the other hand, if the amount exceeds 38.0%, the Q value in the high frequency range is lowered. The range of 31.1 to 34.1% is desirable.
[0022]
ZnO is 34.0 to 49.0%. ZnO is a basic component of the porcelain composition of the present invention together with SiO 2 , but in either case of less than 34.0% or more than 49.0%, τ f exceeds the range of −30 to +30 ppm / ° C., and the temperature Dependency increases. The content is preferably 42.0 to 45.6%.
[0023]
Bi 2 O 3 contains 1.0 to 5.7%, K 2 O contains 2.0 to 9.0%, Li 2 O contains 2.0 to 6.0%, and B 2 O 3 contains 0.5 to 3.0%. By using a composition containing these components at the same time, it can be sintered into a dense porcelain composition at a firing temperature of 925 ° C. or lower. If each component is less than the above lower limit, the effect of lowering the sintering temperature is not sufficient, and a dense porcelain composition cannot be obtained. However, if both are included exceeding the above upper limit value, the Q value decreases and the loss increases. In particular, if too much Bi 2 O 3 is used, Ag diffusion occurs during firing. More preferable content range is, Bi 2 O 3 is 2.4 to 2.6%, respectively, K 2 O is 2.2-8.8% Li 2 O is from 3.3 to 4.1%, and B 2 O 3 is 0.6 to 2.7%.
[0024]
TiO 2 contains 3.5 to 15.0% and MgO contains 1.0 to 6.0%. TiO 2 is contained in order to reduce the temperature coefficient of the resonance frequency, but to obtain this effect, it is necessary to contain 3.5% or more. However, since the dielectric constant increases and the Q value decreases, the content of TiO 2 must be 15.0% or less. MgO has an action of suppressing the increase of the relative dielectric constant and the decrease of the Q value due to the inclusion of TiO 2, and is contained at least 1.0% in order to obtain the effect. However, since MgO deteriorates sinterability, it is limited to 6.0% at most. Preferred range of content TiO 2 is 7.2 to 8.9%, MgO is 1.9 to 2.3%.
[0025]
The components other than the above are various impurities mixed into the raw material, but are not particularly limited as long as they do not adversely affect the characteristics of the obtained ceramic composition.
[0026]
The production of the porcelain composition of the present invention is carried out according to a method of firing a normal ceramic material. First, a required amount of each oxide powder of each component as a raw material is prepared and sufficiently mixed with a ball mill. Oxide powder may be used in other forms such as carbonates and hydrogen carbonates in the case of unstable materials in which the oxide itself is hygroscopic, such as K 2 O. A molar amount of powder corresponding to the amount of oxide is blended. After mixing, the mixture is calcined, and after confirming that the ceramic formation reaction has been performed, pulverization and sizing. The calcination is desirably performed at a temperature that is not high in order to be sufficiently sintered in the final calcination, but if it is too low, a ceramic formation reaction does not occur.
[0027]
A binder or the like is added to the sized powder and kneaded and molded. If necessary, the conductive circuit is printed, laminated, processed into a final shape, etc., and fired at 800 to 925 ° C. to obtain a porcelain composition. If the firing temperature is less than 800 ° C., the sintering is not sufficiently performed, and the required characteristics may not be sufficiently obtained due to lack of denseness. In addition, the firing temperature is preferably up to 925 ° C., because it may cause the diffusion of the inner conductor of Ag or the migration due to it.
[0028]
【Example】
[Example 1]
Powder raw materials of high-purity SiO 2 , ZnO, Bi 2 O 3 , MgO, TiO 2 with a purity of 95% or higher, and K 2 O (as KHCO 3 ) and Li 2 O (as Li 2 CO 3 ) with a purity of 90% or higher A porcelain composition was prepared using the composition shown in Table 1.
[0029]
[Table 1]
[0030]
The raw material powder blended in a predetermined composition was added with pure water in a ball mill using zirconia balls and wet-mixed for 24 hours. After drying, the mixture was stirred in a laika machine and calcined at about 750 ° C. for 2 hours. After calcination, it was confirmed by X-ray diffraction that a sintering reaction was performed, and further, pure water was added in a ball mill made of zirconia balls and pulverized for 24 hours to obtain a powder having a particle size of 1 to 4 μm after drying. . A 10% PVA aqueous solution binder was added and granulated, and after molding into a cylindrical specimen having a diameter of 15 mm and a height of 8 mm at a pressure of 1 t / cm 2 using a mold, firing was performed in air.
[0031]
In that case, each sample is preliminarily baked experimentally at a temperature of 840 to 980 ° C using a part of the specimen, and the temperature necessary for sufficient densification is found, and that temperature is used as the calcination temperature for all the corresponding samples. The piece was fired. Both firing times are 2 hours.
[0032]
The sintered ceramic composition specimen after firing was smoothed by polishing the bottom surface, and then the relative dielectric constant ε r and dielectric loss tan δ (or Q = 1 / tan δ) were determined by the double-end short-circuited dielectric resonator method. Since the dielectric loss varies depending on the measurement resonance frequency f, the magnitude of the loss was evaluated by the fQ value of the product of f and Q, which is assumed to be a constant value in the measured material without being influenced by the frequency. The temperature coefficient τ f of the resonance frequency was obtained from the rate of change with the resonance frequency f 0 at 25 ° C. as a reference by measuring the resonance frequency in the temperature range from 25 ° C. to 85 ° C. These measurement results are shown together in Table 2.
[0033]
[Table 2]
[0034]
Ag diffusion and migration were evaluated as follows. To the powder after calcination, a solvent consisting of xylene, toluene and butanol to which PVB of about 10% by mass of the powder amount and a small amount of plasticizer are added as a binder is mixed sufficiently to form a slurry. A green sheet having a target thickness of 100 μm after firing was obtained using a tape molding machine. Screen-printed 20μm thick Ag paste for inner layer electrode on green sheet, preheated to 120 ° C, pressed after pressing with 150kgf / cm 2 and cut to the same temperature as the specimen whose dielectric constant and Q value were measured. In the same manner, firing was performed for 2 hours to prepare a capacitor laminate having 9 electrode layers of 4225 size.
[0035]
Note that the test numbers 16, 22, 24, 29, and 36, which required a firing temperature of 940 ° C or higher when measuring the dielectric constant and Q value, are inappropriate for the use of Ag electrodes. No laminate was produced.
[0036]
In order to investigate the presence or absence of Ag diffusion, the cross section perpendicular to the stacking direction was polished so that the internal electrodes could be observed, and SEM observation and EDS analysis of the porcelain composition portion were performed. For migration, Ag paste was applied to the electrode end face of the fired capacitor laminate, baked at 700 ° C, Ni / Sn barrel plating was performed, and 130 ° C, 90% RH, DC25V as external terminals. After 9 hours of PCT (Pressure Cooker Test), the insulation resistance was measured. The results are also shown in Table 2.
[0037]
No diffusion of Ag was observed except for trial number 26 containing a large amount of Bi 2 O 3 . Moreover, the insulation resistance after PCT showed that all the measured samples showed a value exceeding 10 9 Ω, and it was judged that no migration occurred.
[0038]
As for the high frequency characteristics, as can be seen from the results of Table 2, when the content of each oxide component is within the range defined in the present invention, the relative dielectric constant ε r initially targeted is 10 or less, The Qf value is 3500 or more, the temperature coefficient τ f of the resonance frequency is −30 to +30 ppm / ° C., and the firing temperature for substrate production, that is, the sinterable temperature is 925 ° C. or lower, which is the applicable limit of Ag conductors Things have been obtained.
[0039]
On the other hand, if the composition is out of the range defined in the present invention, the required characteristics are not satisfied, such as the necessary firing temperature being too high, the low fQ value and the large temperature dependence.
[0040]
As described above, the porcelain composition of the present invention has a low relative dielectric constant, a low loss in a high frequency band, and a small temperature dependency, and there is no diffusion and migration of Ag used as an electrode, and it is excellent at a low firing temperature. Characteristics can be obtained.
[0041]
【The invention's effect】
The dielectric ceramic composition of the present invention has a low relative dielectric constant, a low loss in a high frequency band, a small temperature dependency, and can obtain its characteristics at a low firing temperature. Therefore, Ag having a low specific resistance can be used as an internal conductor or electrode, and combined with excellent high frequency performance, it can be used for applications such as substrates for higher frequency, smaller size, and higher density of electronic circuits. Is preferred.
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