JP3919022B2 - Exposure method and mask holding method - Google Patents

Description

  The present invention provides an exposure for preventing a mask held by a suction holding mechanism on a mask holding body from dropping from the mask holding body when the suction holding mechanism fails in a proximity exposure apparatus. The present invention relates to a mask holding backup mechanism in an apparatus.

  There is an exposure process during the manufacturing process of a liquid crystal substrate, a printed circuit board and the like. Conventionally, as a proximity exposure apparatus used in this exposure step, for example, the one shown in FIG. 7 is known.

  This exposure apparatus can be moved on a base 501 by a drive mechanism (not shown) in a direction perpendicular to the paper surface of FIG. 7 via a pair of rails 508 and a plurality of sliders 509 that engage and slide on the rails 508. A mask 505 having a predetermined exposure pattern adsorbed and held on a frame-like mask holder 504 by a suction holding mechanism on a plate-like workpiece (baked substrate) 503 placed on a work table 502 The pattern is transferred and formed on the workpiece 503 by exposure printing with exposure light emitted from a light source (not shown) through the opening 504a of the holding body 504. In the exposure apparatus shown in FIG. 7, the work table 502 is uniaxially driven as described above. This is for the so-called step-and-repeat method, in which the exposure surface of the workpiece 503 and the pattern surface of the mask 505 are relatively opposed to each other and the exposure is sequentially performed. The work 503 is a rectangle having a long side in the direction orthogonal to the paper surface of FIG. 7, and the mask 505 has a side (short side) in a direction orthogonal to the paper surface of FIG. 7 shorter than the length of the long side of the work 503, Therefore, the exposure is performed sequentially in a plurality of areas. In this example, the short side of the work 503 is shorter than the long side of the mask 505.

  The mask holder 504 is configured to be able to adjust the alignment and gap with the workpiece 503 by a positioning mechanism (not shown).

  By the way, in the proximity exposure, it is necessary to bring the facing surface of the mask 505 having the exposure pattern and the workpiece 503 close within a minute distance of 0.1 mm or less. When the mask 505 is positioned on the upper side of the work 503, the mask 505 is held by being sucked to the lower surface of the mask holder 504 so as not to interfere with the work 503. Is lost, the mask 505 may fall and be damaged.

  For this reason, as shown in FIG. 7, a mask drop prevention means 506 is provided on the lower surface of the mask holder 504. The mask drop prevention means 506 is configured by fixing a member 507 having an L-shaped cross section for supporting the peripheral portion of the mask 505 to the lower surface of the mask holder 504.

  In this case, as described above, in the exposure apparatus, since the work table 502 is uniaxially driven and the short side of the work 503 is shorter than the long side of the mask 505, the peripheral edge of the work 503 is located inside the L-shaped member 507. Therefore, since the member 507 having an L-shaped cross section does not interfere with the work 503, there is no problem.

  On the other hand, in recent years, the size of display devices using a liquid crystal substrate or the like has been increasing, and accordingly, the exposure device for the exposure process needs to cope with the increase in size. However, it is technically difficult to perform exposure at a time using a large mask. Therefore, as described above, a mask smaller than a work is used, and the work is divided into a plurality of regions and sequentially exposed. The method of doing is adopted.

  Further, in a step-and-repeat proximity exposure apparatus, it is conceivable that the work table is configured to be two-dimensionally moved by two-axis driving using a smaller mask.

  Further, even if the work table is of a type that drives uniaxially, the long side and short side of the work 601 may be larger than the long side and short side of the mask 602 as shown in FIG. In FIG. 8, reference numeral 603 denotes a base, and reference numeral 604 denotes a pair of rails 606 on the base 603 and a plurality of sliders 607 that slide on the rails 606 in a direction orthogonal to the plane of FIG. A work table 605 that can be moved by a drive mechanism (not shown) is a frame-shaped mask holder that holds the mask 602 by suction.

  However, in the exposure apparatus as shown in FIG. 8 described above, when the mask drop prevention mechanism 506 having the configuration as shown in FIG. 7 is provided, the peripheral edge of the work 601 is located outside the member 507 having an L-shaped cross section. Therefore, the member 507 having an L-shaped cross section interferes with the workpiece 601.

  The present invention has been made in view of the above-described problems of the prior art described above, and an object of the present invention is to provide a proximity exposure apparatus in which the lengths of both sides of a mask are two sides of a workpiece. An object of the present invention is to provide a mask holding backup mechanism in an exposure apparatus that can reliably prevent a mask from dropping from a mask holding body without impairing workability even when the length is shorter than the above length.

The exposure method according to claim 1, wherein a mask having a predetermined pattern is exposed to a plate-like work placed on a work table in close proximity to each other, whereby the pattern is baked and transferred to the work. In the exposure method,
  Holding the mask against gravity by a mask holder;
  The engagement portion of the mask held by the mask holding body has a shape corresponding to the engagement portion, and a lower surface is engageable with a mask receiving portion disposed above the lowermost surface of the mask. And a step of making a state
  The mask is prevented from falling by receiving the engaging portion by the mask receiving portion.
According to a fourth aspect of the present invention, there is provided a mask holding method, wherein a mask having a predetermined pattern is exposed to a plate-shaped workpiece placed on a work table in close proximity to each other, thereby printing the pattern on the workpiece. In a proximity exposure apparatus for transferring and forming, a mask holding method for holding a mask,
  Holding the mask against gravity by a mask holder;
  The engagement portion of the mask held by the mask holding body has a shape corresponding to the engagement portion, and a lower surface is engageable with a mask receiving portion disposed above the lowermost surface of the mask. And a step of making a state
  The mask is prevented from falling by receiving the engaging portion by the mask receiving portion.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(First embodiment)
First, a first embodiment of the present invention will be described with reference to FIGS.

  FIG. 1 is a partially cutaway side view showing the main configuration of a step-and-repeat proximity exposure apparatus provided with a mask holding backup mechanism according to the present embodiment, and FIG. 2 is a view taken in the direction of arrows II-II in FIG. FIG. 3 is an enlarged view of part III of FIG.

  In each figure, reference numeral 101 denotes a frame-shaped mask holder, which has a plurality of vacuum suction grooves 101a. These vacuum suction grooves 101a are connected to a vacuum generator (not shown). The mask 102 having a predetermined pattern can be detachably sucked and held on the lower surface of the mask holder 101. A chamfered portion 102 a is provided on the upper and lower peripheral edges of the mask 102.

  At a position of the mask holder 101 facing through the mask 102 (in FIG. 1 and FIG. 2, a position facing in the left-right direction through the mask 102), the mask drop prevention means 103 which is the gist of the present invention. One set is provided. This mask fall prevention means 103 prevents the mask 102 from dropping from the mask holder 101.

  The left and right mask drop prevention means 103 have the same configuration and comprise a mask support 104 and a drive mechanism 105 as shown in FIG. The mask support body 104 has a mask receiving portion 104 a made of an inclined surface corresponding to an engaging portion 102 a made of an inclined surface provided on the outer peripheral edge of the mask 102 at the tip, and the lower surface is lower than the lowermost surface of the mask 102. It is arrange | positioned so that it may not be located in. The mask support 104 is positioned in a recess 101 b provided on the lower surface of the mask holder 101 and is guided by a guide member 106, and a mask receiving portion 104 a at the tip thereof is an engaging portion 102 a at the outer peripheral edge of the mask 102. It is mounted so as to be movable within a predetermined range so as to be able to contact and separate. The driving mechanism 105 drives the mask support body 104 so that the mask receiving portion 104a at the tip thereof can contact and separate from the engaging portion 102a at the outer peripheral edge of the mask 102. The drive mechanism 105 includes an air cylinder mechanism, and is disposed in a recess 101 b provided on the lower surface of the mask holder 101 so that the lower surface of the cylinder 105 a is not positioned below the lowermost surface of the mask 102. The rear end portion of the mask support body 104 is fixed to the front end portion of the piston rod 105b of the drive mechanism 105. As the piston rod 105b moves back and forth, the mask support 104 moves integrally therewith.

  In FIG. 1, reference numeral 107 denotes a work table, on which a work 108 on which an exposure pattern of the mask 102 is transferred and formed by printing is placed. The work table 107 can be moved in a direction perpendicular to the paper surface of FIG. 1 by a driving device (not shown).

  Next, the operation of the exposure apparatus provided with the mask holding backup mechanism according to the present embodiment having the above-described configuration will be described.

  After the mask 102 is sucked and held in a state where it is in contact with the lower surface of the mask holding body 101 by a loader (not shown), the driving mechanism 105 is operated to sandwich the mask 102 so as to sandwich the mask receiving portion of the pair of mask support bodies 104. 104a automatically contacts the engaging portion 102a of the mask 102 simultaneously. At this time, the mask receiving portion 104 a of the mask support body 104 is in a state of supporting the peripheral edge of the lower surface of the mask 102. Therefore, even if the suction force of the mask 102 to the mask holder 101 is released, the peripheral edge of the lower surface of the mask 102 is supported by the mask receiving portion 104a of the mask support 104, so that the mask 102 is masked. It does not fall from 101, and the troublesome work becomes unnecessary.

  Further, since the lower surfaces of the mask support body 104 and the cylinder 105a are arranged so as not to be positioned below the lowermost surface of the mask 102, they do not interfere with the workpiece 503.

  Further, the drive mechanism 105 of the present embodiment includes an air cylinder mechanism and a guide member 106 that guides the mask support body 104, and the mask support body 104 is fixed to the piston rod 105b of the air cylinder mechanism. Even when the positioning of the mask 102 is relatively rough, the mask 102 can be reliably prevented from falling with a relatively simple configuration.

  Further, if the air source of the air cylinder mechanism and the air source for sucking and holding are made common, the configuration is simplified compared to the case where these air sources are provided individually.

  When an air cylinder mechanism is used as the drive mechanism 105, a spring or the like prevents the mask support body 104 from returning to the support release direction as a safety measure in the event that the air supplied to the air cylinder mechanism stops due to an accident. It may be configured to be blocked by the urging member.

  The drive mechanism 105 is not limited to the air cylinder mechanism, and the mask support 104 such as a hydraulic cylinder mechanism or an electric cylinder mechanism is connected to the engagement portion 102 a at the outer peripheral edge of the mask 102. Any structure can be applied as long as it can be separated.

(Second Embodiment)
Next, a second embodiment of the present invention will be described with reference to FIG.

  FIG. 4 is a view similar to FIG. 3 showing the configuration of the main part of a step-and-repeat proximity exposure apparatus having a mask holding backup mechanism according to the present embodiment. In FIG. Are given the same reference numerals.

  In the above-described first embodiment, the engaging portion 102a at the outer peripheral edge of the mask 102 is an inclined surface and the mask receiving portion 104a of the mask support 104 is an inclined surface corresponding to the engaging portion 102a. The present invention is not limited to this, and may be configured as shown in FIG. 4, for example.

  That is, in the present embodiment shown in FIG. 4, an engaging portion 102a made of a step portion is provided on the outer peripheral edge portion of the mask 102, and the mask receiving portion 104a of the mask support 104 is provided with a step portion corresponding to the engaging portion 102a. The lower surface of the engaging portion 102a is engaged with the upper surface of the mask receiving portion 104a.

  Other configurations and operations according to the present embodiment are the same as those of the first embodiment described above, and thus description thereof is omitted.

(Third embodiment)
Next, a third embodiment of the present invention will be described with reference to FIG.

  FIG. 5 is a view similar to FIG. 3 showing the configuration of the principal part of a step-and-repeat proximity exposure apparatus provided with a mask holding backup mechanism according to the present embodiment. In FIG. Are given the same reference numerals.

  In the first embodiment described above, the engaging portion 102a of the mask 102 and the mask receiving portion 104a of the mask support body 104 are inclined surfaces, and in the second embodiment described above, the engagement of the mask 102 is performed. Although the joint portion 102a and the mask receiving portion 104a of the mask support 104 are stepped portions, the present invention is not limited to these, and may be configured as shown in FIG. 5, for example.

  That is, in the present embodiment shown in FIG. 5, an engaging portion 102a formed of a concave portion is provided on the surface of the outer peripheral edge of the mask 102 facing the mask support 104, and the mask receiving portion 104a of the mask support 104 is engaged. A shape corresponding to the mating portion 102a is formed so that the mask receiving portion 104a is engaged in the engaging portion 102a.

  Other configurations and operations according to the present embodiment are the same as those of the first embodiment described above, and thus description thereof is omitted.

(Fourth embodiment)
Next, a fourth embodiment of the present invention will be described with reference to FIG.

  FIG. 6 is a view similar to FIG. 2 showing the configuration of the main part of the step-and-repeat proximity exposure apparatus provided with the mask holding backup mechanism according to the present embodiment. In FIG. Are given the same reference numerals.

  In the mask holding backup mechanism according to the present embodiment, as shown in FIG. 6, two sets of the fall prevention means 103 are provided on the left and right sides of the mask holding body 101 as described above in the first to third embodiments. The other configurations and operations are the same as those in the first to third embodiments.

(Other embodiments)
The shapes of the engaging portion 102a of the mask 102 and the mask receiving portion 104a of the mask support 104 are not limited to the shapes according to the first to third embodiments described above, but the engaging portion 102a of the mask 102. The combination of the shape of the mask and the shape of the mask receiving portion 104a of the mask support body 104 reliably prevents the mask 102 from falling while the tip portions of the pair of mask support bodies 104 are in contact with the mask 102 from both sides. It is only necessary that the lower surface of the mask drop prevention means does not interfere with the upper surface of the workpiece 108.

  That is, the combination of the shape of the engaging portion 102a of the mask 102 and the shape of the mask receiving portion 104a of the mask support 104 is such that the tip of the mask support 104 is positioned inward from the outer peripheral edge of the mask 102. As long as the mask 102 is received from the lower side and the lower surface of the mask support 104 is not positioned below the lowermost surface of the mask 102, any mask may be used.

Further, the engaging portion 102a at the outer peripheral edge portion of the mask 102 does not need to be formed over the entire circumference, and may be formed at least in a partial region including a portion with which the mask support 104 abuts.

  Further, in each of the above-described embodiments, exposure is performed by changing the facing position of the mask 102 and the workpiece 108 in one direction by uniaxial driving for step-and-repeat exposure (division sequential exposure). However, the present invention is not limited to this, and can also handle two-dimensional movement by two-axis driving.

  Further, the present invention can be applied to a case where there is a possibility of interference between the mask and the workpiece, such as when the size of the workpiece is larger than the size of the mask, instead of the step-and-repeat method.

  Furthermore, a necessary number of sets of fall prevention means 103 may be provided on the front, rear, left and right of the mask holder 101.

  As described above in detail, according to the mask holding backup mechanism in the exposure apparatus of the present invention, even if a workpiece having a size larger than the mask is brought close to the mask, the mask drop prevention means does not interfere with the workpiece and the mask should be avoided. Even if the suction holding force of the mask with respect to the holding body is lost, the mask can be reliably prevented from falling.

1 is a partially cutaway side view showing a main part configuration of an exposure apparatus including a mask holding backup mechanism according to a first embodiment of the present invention. It is an II-II arrow line view of FIG. It is the III section enlarged view of FIG. It is the same figure as FIG. 3 which concerns on the 2nd Embodiment of this invention. It is the same figure as FIG. 3 which concerns on the 3rd Embodiment of this invention. It is the same figure as FIG. 2 which concerns on the 4th Embodiment of this invention. FIG. 10 is a partially cutaway side view showing a main configuration of an exposure apparatus provided with a conventional mask holding backup mechanism. FIG. 8 is a partially cutaway side view showing a main part configuration of a conventional exposure apparatus different from FIG. 7.

Explanation of symbols

DESCRIPTION OF SYMBOLS 101 Mask holding body 101a Vacuum suction groove 101b Recessed part 102 Mask 102a Engagement part 103 Mask fall prevention means 104 Mask support body 104a Mask receiving part 105 Drive mechanism 105a Cylinder 105b Piston rod 106 Guide member 107 Work table 108 Workpiece

Claims (6)

In an exposure method of printing and transferring the pattern onto the work by exposing the mask having a predetermined pattern to the plate-like work placed on the work table in close proximity to each other.
Holding the mask against gravity by a mask holder;
The engagement portion of the mask held by the mask holding body has a shape corresponding to the engagement portion, and a lower surface is engageable with a mask receiving portion disposed above the lowermost surface of the mask. And a step of making a state
An exposure method , wherein the mask is prevented from falling by receiving the engaging portion by the mask receiving portion. The exposure method according to claim 1 , wherein the engagement portion of the mask is formed of an inclined surface corresponding to the inclined surface of the mask receiving portion . The exposure method according to claim 1, wherein a chamfered portion is formed at a peripheral edge of the upper surface of the mask. A mask for holding a mask in a proximity exposure apparatus that prints and transfers a pattern having a predetermined pattern to a plate-like workpiece placed on a work table by making the mask having a predetermined pattern approach each other and exposing the plate. Holding method,
  Holding the mask against gravity by a mask holder;
  The engagement portion of the mask held by the mask holding body has a shape corresponding to the engagement portion, and a lower surface is engageable with a mask receiving portion disposed above the lowermost surface of the mask. And a step of making a state
  A mask holding method, wherein the mask is prevented from falling by receiving the engaging portion by the mask receiving portion. The mask holding method according to claim 4, wherein the engagement portion of the mask is an inclined surface corresponding to the inclined surface of the mask receiving portion. 6. The method for holding a mask according to claim 4, wherein a chamfered portion is formed on a peripheral edge of the upper surface of the mask.

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