JP3944571B2

JP3944571B2 - Thin film unfolding structure, thin film unfolding method therefor, thin film unfolding unit and thin film unfolding system

Info

Publication number: JP3944571B2
Application number: JP2002302695A
Authority: JP
Inventors: 宏典佐原
Original assignee: Japan Aerospace Exploration Agency JAXA
Current assignee: Japan Aerospace Exploration Agency JAXA
Priority date: 2002-10-17
Filing date: 2002-10-17
Publication date: 2007-07-11
Anticipated expiration: 2022-10-17
Also published as: JP2004136759A

Description

【０００１】
【発明の属する技術分野】
本発明は、特に太陽光集光鏡や通信用アンテナ等の、宇宙での大型展開構造物への適用が可能な薄膜展開構造物、そうした薄膜展開構造物を得るための薄膜展開方法、並びに薄膜展開構造物を得るために利用される薄膜展開ユニット、及び薄膜展開ユニットを組み込んだ薄膜展開システムに関する。
【０００２】
【従来の技術】
従来、有害な電磁波や宇宙線に曝される宇宙環境下で使用される薄膜を用いた大型展開物として、例えば太陽光発電衛星における太陽光集光膜や、通信・データ衛星における電波受信用集束膜が開発されている。これらの大型展開物においては、微弱な光や電波を集束するために極めて大きな集束面積が要求されている。宇宙環境のような汚染環境下に置かれる薄膜は、紫外線や原子状酸素等に曝されることに起因して、時間経過と共に表面状態が劣化することが避け難い。こうした表面劣化を回避するため、薄膜の表面にコーティングを施して劣化を遅らせることが考えられる。
【０００３】
大集束面積を有する大型展開物については、使用開始前等の未使用時には、衛星内又は衛星外であっても付随した収容部に高収納率に格納する必要がある。そこで、ゴムのような弾性のある膜面に気体による圧力を加えて回転放物面を形成する気体膨脹式の集束膜が提案されている（例えば、非特許文献１）。しかしながら、この気体膨脹式の集束膜では、本来十分な精度で回転放物面を形成することができない。また、気体を密閉させるために反射面とは別に透明膜が必要であり、電磁波は、反射面に到達する前に１回、反射面で反射した後に１回の計２回、その透明膜を透過することになり、これら透過時での損失が少なくない。更に宇宙用の場合、宇宙デブリが衝突して密封用の透明膜に穴が開くと気体の漏出が起こり、印加圧力を維持できなくなり、ひいては回転放物面を維持できなくなるという虞がある。
【０００４】
そこで、気体膨脹式によらない方法として、別の形態を有する電磁波集束装置が本発明者らによって提案されている（特願２００１−１４７２０２、又は特願２００１−３２０５６３）。特願２００１−１４７２０２では、同一の放物線の断面形状を有する線焦点型の一次反射鏡と二次反射鏡からなる鏡群を備え、太陽光線を一点に集束させる。線焦点型の鏡を採用しているので、薄く軽量化が可能であり、小型に折り曲げ可能とした太陽光集光装置を提供している。特願２００１−３２０５６３では、母線に垂直な断面形状が放物線又はこれを模した曲線である線焦点型の反射鏡から成り、鏡の両端又はその近傍に曲げモーメント又は軸力を負荷させることで、断面形状を変更することによって、焦点距離を可変とした電磁波集束装置を提供している。
【０００５】
しかしながら、汚染環境下での反射面劣化は課題として残存しており、その反射面劣化に対処するには、反射面にコーティングを施すことによって劣化を遅らせる上記の対処が考えられている。反射面にコーティングを施すと反射面の反射率が低下し、集束効率を低下させることになって、その低下分を補うだけの面積を当初より用意する必要があり、余分な重量が増加し、コストが上昇する。また、表面劣化した薄膜については、新しい薄膜に交換することが求められる。その場合、宇宙環境のような状況では早急な人的対応が不可能であるので、取り換え用の薄膜を予め備えておく必要がある。しかしながら、現状では、超軽量で且つ柔軟性に富む薄膜を効率的に収納し、且つ劣化した薄膜を必要なときに迅速且つ効率良く新しい薄膜と交換することまでは実現されていない。交換用の薄膜を頻繁に輸送し人手にて交換するという手法に頼ることなく、薄膜を自律的・定期的に交換されることが望まれる。
【０００６】
【非特許文献１】
デヴィッド・リコジージュースキー（David Lichodziejewski)、コスタス・キャサパキス(Coatas Cassapakis) 、「膨張式パワーアンテナ技術(Inflatable Power Antenna Technology) 」、「第３７回アメリカ航空宇宙学会航空宇宙の科学会議と展示会／ネバダ州リノ）(37th AIAA Aerospace Sciences Meeting and Exhibit/ Reno,ＮＶ) 」論文集、アメリカ航空宇宙学会（ＡＩＡＡ［American Institute of Aeronautics and Astronautics]) 、１９９９年１月、９９−１０７４、（図１、図７、表１）
【０００７】
【発明が解決しようとする課題】
そこで、汚染環境下に曝されることがある暴露表面を持つ軽量且つ高品質な薄膜から構成される薄膜展開構造物について、交換用の薄膜を未使用時に不必要な面積又はスペースを占有することなく高収納率で収納した状態で用意しておき、必要なとき又は定期的に、自律的に定期交換可能にして、低コストで常時、暴露面を高品質状態に維持する点に解決すべき課題がある。また、その薄膜によって電磁波集束装置を実現する場合、暴露表面の形状を可変にすることが求められることがある。
【０００８】
この発明の目的は、これらの要求に応えるため、巻き取られた薄膜筒から宇宙環境下で電磁波反射膜又は電磁波収束膜として使用される展開用の薄膜を繰り出したり巻き取る際に、薄膜筒や展開薄膜の弛みを回避しつつ薄膜を保持可能とし、展開薄膜の姿勢を平坦状態や弛み状態に変更可能とし、また、展開薄膜を交換して、しかも電磁波反射装置や電磁波集束装置として適用可能な薄膜展開構造体、そのための薄膜展開方法、並びに薄膜展開ユニット及び薄膜展開システムを提供することである。
【０００９】
【課題を解決する為の手段】
上記課題を解決するため、この発明による薄膜展開方法は、宇宙環境下で電磁波反射膜又は電磁波収束膜として使用される薄膜の宇宙環境下での展開方法であって、繰出し側の巻取り部材と巻取り側の巻取り部材を設け、且つ前記各巻取り部材に巻き取られている薄膜の最外周部を押さえ具によって押圧可能とし、前記押さえ具による押圧の解放状態で前記繰出し側の巻取り部材と前記巻取り側の巻取り部材間で前記薄膜の巻取り又は巻戻しをし、前記押さえ具による前記薄膜の押圧状態で前記巻取り部材から延びている前記薄膜を繰出し側の巻取り部材と前記巻取り側の巻取り部材間で展開状態に保持し、前記押さえ具による前記押圧状態のまま前記巻取り部材と前記押さえ具とを前記巻取り部材の中心軸回りに同期して回転することにより、前記巻取り部材から延びる展開薄膜の角度を可変にすることから成っている。
【００１０】
この薄膜展開方法によれば、巻取り部材に巻き取られている薄膜から成る薄膜筒の最外周部を押さえ具によって押圧可能としておき、押さえ具による押圧を解放した状態で巻取り部材を回転することで薄膜の巻取り又は巻戻しをすることができる。このとき、巻取り又は巻戻し量を調節することにより、薄膜には、圧縮や引っ張りを負荷することができる。薄膜の巻戻し状態のときに押さえ具によって薄膜を押圧することで、薄膜筒から延びている展開薄膜の端部分が押さえ具によって薄膜筒の最外周部に押されて支持される状態となり、巻取り部材に巻き取られている薄膜や展開されている薄膜が弛むことなく安定保持することができる。また、押さえ具による押圧状態のまま巻取り部材と押さえ具とを巻取り部材の中心回りに同期して回動することにより、巻取り部材に巻き取られている薄膜筒から延びる展開薄膜の角度を変えることができ、薄膜の展開姿勢が可変になる。
【００１１】
この薄膜展開方法において、展開されている前記薄膜は、前記押さえ具による前記押圧状態において、前記巻取り部材と前記押さえ具との同期回転量に応じて、平坦状態又は撓み状態に展開することができる。
また、前記薄膜の両端側で、前記巻取り部材による前記薄膜の巻取り又は巻戻しと、前記押さえ具による前記薄膜の押圧と押圧の解放とを行い、一方の前記巻取り部材から延びている前記薄膜を他方の前記巻取り部材へ巻き取ることにより、前記両巻取り部材間で展開される前記薄膜の交換をすることができる。
更に、前記両巻取り部材を互いに接近・離間可能とし、互いに離間させることで前記薄膜を展開し、互いに接近するときに前記薄膜は少なくとも一方の前記巻取り部材に巻き取ることができる。
【００１２】
また、この発明による薄膜展開ユニットは、宇宙環境下で電磁波反射膜又は電磁波収束膜として使用される薄膜の展開ユニットであって、薄膜の巻取りと巻戻しとが可能な巻取り部材、及び前記巻取り部材に巻き取られている前記薄膜の最外周部を押圧可能な押さえ具を備え、前記薄膜の繰出し側と巻取り側に互いに離間設置して薄膜を展開させる薄膜展開構造物を構築するための薄膜展開ユニットであって、前記巻取り部材の最外周部から延びて繰出し側の巻取り部材と前記巻取り側の巻取り部材間で展開している前記薄膜の角度を可変にするため、前記押さえ具による前記薄膜の最外周部を押圧状態で前記巻取り部材と前記押さえ具とを前記巻取り部材の中心軸回りに同期して回転可能としたことから成っている。
【００１３】
この薄膜展開ユニットによれば、押さえ具は巻取り部材に巻き取られて形成されている薄膜筒の最外周部を押圧可能であり、巻取り部材は押さえ具による押圧を解放した状態で回転することで薄膜の巻取り又は巻戻しをすることができる。このとき、巻取り又は巻戻し量を調節することにより、薄膜には、圧縮や引っ張りを負荷することができる。薄膜の巻戻し状態のときに押さえ具が薄膜を押圧することで、巻取り部材から巻き戻されて延びている展開薄膜の端部分は押さえ具によって薄膜筒の最外周部に押されて支持される状態となり、巻取り部材に巻き取られている薄膜や展開されている薄膜は、押さえ具という簡単な構造で且つ弛むことなく展開状態に安定保持することができる。押さえ具による押圧状態のまま巻取り部材と押さえ具とを巻取り部材の中心回りに同期して回動することにより、巻取り部材に巻き取られた薄膜筒から延びる展開薄膜の角度を変えることができ、薄膜の展開姿勢を可変とすることができる。
【００１４】
この薄膜展開ユニットにおいて、前記巻取り部材に回転自在に係合する支持部材を設け、前記押さえ具を、前記支持部材に前記巻取り部材の径方向に進退可能に支持することで前記薄膜の最外周部を押圧可能とし、前記巻取り部材は、単独で又は前記支持部材の回動と同期して回転可能とすることができる。押さえ具については、巻取り部材と回転自在に係合する支持部材に巻取り部材の径方向に進退可能に支持させることができる。巻取り部材を単独で回転させることで、薄膜の巻取りと巻戻しとを行うことができる。巻取り部材を支持部材の回動と同期して回転させることで、薄膜筒から延びる展開薄膜の角度、即ち展開姿勢を変えることができる。
【００１５】
この薄膜展開ユニットにおいて、前記支持部材は前記巻取り部材を回転駆動する駆動軸に回転自在に嵌合されたスリーブとし、前記押さえ具は、前記スリーブ上に保持された直動体の直動運動を前記直動体に連結されたリンク機構を介して変換することにより、前記巻取り部材の径方向に進退させることができる。スリーブは巻取り部材を回転駆動する駆動軸の単独の回転を許容し、また、駆動軸と同期して回動することができる。スリーブとリンク機構とは、薄膜筒を軸方向に挟んで対に設けることができる。
【００１６】
この薄膜展開ユニットにおいて、前記巻取り部材を第１モータの駆動軸で回転駆動し、前記支持部材を前記駆動軸を回転自在に係合し且つ第２モータで駆動される筒体とし、前記押さえ具を、前記筒体に設けられたアクチュエータによって前記巻取り部材の径方向に進退させることができる。筒体は巻取り部材を回転駆動する第１モータの駆動軸の単独の回転を許容し、また、第２モータによって第１モータの駆動軸と同期して回動することができる。押さえ具が長尺である場合、アクチュエータは押さえ具に沿って複数個並べて配置することができる。
【００１７】
また、この発明による薄膜展開システムは、上記の薄膜展開ユニットが前記薄膜の繰出し側と巻取り側とに配設されており、前記薄膜の一部が常時少なくとも一方の前記薄膜展開ユニットに巻き取られており、前記薄膜の残る一部が前記両薄膜展開ユニット間において前記薄膜の移動に伴って交換可能に展開されていることから成っている。
【００１８】
この薄膜展開システムによれば、薄膜の繰出し側と巻取り側とに配設した二つの薄膜展開ユニットの少なくとも一方に、薄膜の一部を常時巻き取っておき、薄膜の残る一部を両薄膜展開ユニット間において展開される。一方の薄膜展開ユニットにおいて薄膜の巻取りをするときに、他方の薄膜展開ユニットにおいて薄膜の巻き戻しを行うことにより、巻取り又は巻戻し量を調節することで薄膜に圧縮や引っ張りを負荷することができ、また、両薄膜展開ユニット間に展開される薄膜の展開広さを変えたり、外部に曝される薄膜の交換をする等の、柔軟性を持って薄膜を取り扱うことができる。
【００１９】
この薄膜展開システムにおいて、少なくとも一方の前記薄膜展開ユニットは、前記押さえ具による前記薄膜の最外周部における押圧位置が変動するのを防止するため、前記薄膜の移動量に応じて前記巻取り部材の位置を調整可能とすることができる。
また、一方の薄膜展開ユニットから他方の薄膜展開ユニットへの薄膜の移動によって巻取り部材から見た薄膜筒の最外周部の位置は変動する。薄膜の移動量に応じて前記巻取り部材の位置を調整することにより、押さえ具による薄膜の最外周部における押圧位置を変えることがなく、薄膜の展開状態を一定に維持することができる。
更に、少なくとも一方の前記薄膜展開ユニットは他方の前記薄膜展開ユニットに対して接近・離間可能であり、前記両薄膜展開ユニットの接近状態では、前記薄膜は少なくとも一方の前記薄膜展開ユニットに巻取り可能とすることができる。
【００２０】
この薄膜展開システムにおいて、前記両薄膜展開ユニットに、別の前記薄膜展開システムの前記薄膜展開ユニットを対応させて巻取り軸線方向に順次、多段に接続することにより、展開面積を拡大化可能とすることができる。薄膜展開ユニットを巻取り軸線方向に順次、多段に接続することで、薄膜展開システムを巻取り軸線方向にも拡大し、展開面積を拡大化することができる。展開薄膜の暴露表面が電磁波反射性を備える場合には、より大きな面積で電磁波の反射や受信が可能となり、或いは複数の焦点距離を持つ多焦点型電磁波集束装置として機能させることができる。
【００２１】
更に、この発明による薄膜展開構造物は、宇宙環境下で電磁波反射膜又は電磁波収束膜として使用される薄膜の展開構造物であって、薄膜を巻取り又は巻戻し可能とする巻取り部材と、前記巻取り部材に巻き取られている前記薄膜の最外周部を押圧可能とする押さえ具を、前記薄膜の繰り出し側と巻取り側にそれぞれ設け、前記巻取り部材から延びる前記薄膜の一部から成り前記押さえ具による押圧状態で繰出し側の前記巻取り部材と巻取り側の前記巻取り部材間で展開状態に保持された展開薄膜部を備え、前記押さえ具による前記薄膜の押圧状態で、前記巻取り部材と前記押さえ具とを、巻き取られた前記薄膜と共に前記巻取り部材の中心軸回りに同期して回転することにより、前記展開薄膜部の展開角度が可変にされたことから成っている。
【００２２】
この薄膜展開構造物によれば、巻取り部材に巻き取られた薄膜筒から延びる薄膜の一部は、展開薄膜部として展開される。展開薄膜部は、端部が押さえ具によって薄膜筒の最外周部に押圧状態で保持されるので、巻取り部材に巻き取られている薄膜や展開されている薄膜は、押さえ具という簡単な構造で且つ弛むことなく展開状態に安定保持される。また、巻取り部材への薄膜の巻取り又は巻戻しによって、展開薄膜部の展開広さが可変であり、巻取り又は巻戻し量を調節することで薄膜に圧縮や引っ張りを負荷することもできる。更に、押さえ具による薄膜の押圧状態で、巻取り部材と押さえ具とを薄膜筒と共に巻取り部材の中心回りに同期して回動することにより、展開薄膜部の展開姿勢の変更が容易である。
【００２３】
この薄膜展開構造物において、前記展開薄膜部の両端を前記巻取り部材と前記押さえ具とによって支持し、前記両巻取り部材間で展開される前記展開薄膜部を、前記押さえ具による前記押圧状態において、前記巻取り部材と前記押さえ具との同期回転量に応じて、平坦状態又は撓み状態に展開することができる。
また、繰出し側の前記巻取り部材から前記薄膜を繰り出し、巻取り側の前記巻取り部材によって前記薄膜を巻き取ることにより、前記両巻取り部材間で展開される前記展開薄膜部を未使用の展開薄膜部に交換することできる。
【００２４】
この薄膜展開構造物において、前記薄膜の暴露表面を平坦な太陽光反射面又は電波反射面とした電磁波反射装置、或いは前記薄膜の暴露表面を断面放物線状曲面を持つ太陽光反射集光面又は電波反射集光面とした電磁波反射集束装置として適用されている。平坦にする場合、弛み無く張られた薄膜平面を実現することができる。暴露表面を電磁波反射面とすれば、この薄膜展開構造物は平面電磁波反射装置として機能する。暴露表面の両端に負荷をかけて撓ませることによって薄膜形状を放物線筒又はこれを模する曲線筒とすれば、線焦点型電磁波集束装置として機能させることもできる。
【００２５】
上記薄膜展開方法及び薄膜展開構造物においては、展開薄膜は、巻取り部材と押さえ具との同期回転量がゼロで押さえ具による展開薄膜への曲げ負荷がないときに平坦状態に展開されており、巻取り部材と押さえ具とを回転したときには、その同期回転量に応じて展開薄膜に曲げ負荷が生じ、例えば、断面放物線状曲面等の撓み状態に展開される。
【００２６】
この薄膜展開方法及び薄膜展開構造物においては、薄膜の両端側で、巻取り部材による薄膜の巻取り又は巻戻しと、押さえ具による薄膜の押圧と押圧の解放とを行うことで、展開された薄膜が例えば汚染環境下で劣化するような場合、劣化した使用済みの展開薄膜を巻取ると同時に、他方の巻取り部材上の薄膜筒から使用済みの展開薄膜に連続する未使用の薄膜を巻き戻して展開薄膜とすることにより、劣化した使用済み薄膜を未劣化の新しい薄膜と置き換えることで交換することができる。交換回数については、薄膜筒での収容量に応じて複数回の展開薄膜部の交換が可能である。
【００２７】
上記薄膜展開方法、薄膜展開システム及び薄膜展開構造物においては、少なくとも一方の巻取り部材又は薄膜展開ユニットを他方の巻取り部材又は薄膜展開ユニットに対して接近・離間可能とすることにより、巻取り部材に巻き付けられていた薄膜を巻き戻して、展開したり、展開薄膜の広さを任意に調節することができることができる。また、未使用時等の場合のように、両巻取り部材又は両薄膜展開ユニットを互いに接近させるときには、展開していた薄膜を少なくとも一方の巻取り部材に又は薄膜展開ユニットにおいて巻き取ることによって、薄膜の暴露面長さを可及的に短くし、薄膜の展開を閉じることができると共に、全体をコンパクトに畳むことができ、高収納率を実現することができる。従って、薄膜の展開前、閉じた後において、特に、宇宙用として積載荷物の一つとしてロケットで打ち上げるときに、収納や運搬において高い利便性を発揮することができる。
【００２８】
【発明の実施の形態】
この発明による薄膜展開構造物、薄膜展開方法、並びに薄膜展開ユニット及び薄膜展開システムの実施例を、図面を参照して説明する。図１はこの発明による薄膜展開方法及び薄膜展開ユニットの一実施例を示す概略断面図であり、（Ａ）は薄膜の支持状態を示す概略図、（Ｂ）は薄膜の姿勢変更の様子を示す概略図である。薄膜展開ユニット１は、図１（Ａ）に示すように、薄膜５を薄膜筒６として巻取り可能な巻取り部材３と、薄膜筒６の最外周部６ａを押さえることが可能な押さえ具４とを備えている。巻取り部材３は、この実施例では、巻取り軸の形態を有している。巻取り部材３の回りに筒状に巻き取られた薄膜５は、薄膜筒６の最外周部６ａから接線状に繰り出されて延びており、繰り出される直前の部分が押さえ具４によって薄膜筒６の最外周部６ａ上の一箇所で押さえられることで、薄膜５の支持状態が得られている。薄膜５の他端は、適宜の支持手段によって支持されている。押さえ具４によって薄膜５を薄膜筒６に押圧状態とすることによって、薄膜筒６の弛みや、展開されている薄膜（展開薄膜、以下同じ）２の弛みを防止している。展開薄膜２の表面は暴露表面２ａであり、目的に応じて使用される。
【００２９】
巻取り部材３を回転することによって、薄膜５の支持状態、即ち、基準面７に対する傾斜角度を変えることができる。即ち、巻取り部材３、薄膜筒６及び押さえ具４は一体となって回転可能であり、図１（Ｂ）に示すように、薄膜５は押さえ具４によって薄膜筒６の最外周部６ａに押さえ付けられた押圧状態のまま巻取り部材３の中心回りに角度ψだけ回転することによって、基準面７に対する展開薄膜２の支持姿勢（傾斜角度ψ）が変更される。展開薄膜２の端部には曲げモーメントが作用し、薄膜５の暴露表面２ａを目的に応じて任意に傾斜・湾曲させることが可能となる。
【００３０】
図２は、図１に示す薄膜展開ユニットによる薄膜の繰出しを説明する概略図であり、（Ａ）は薄膜の繰出し前の支持状態を示す概略図、（Ｂ）は（Ａ）に示す状態から薄膜の繰出し状態を示す概略図である。図２（Ａ）は、図１（Ａ）と同様、薄膜展開ユニット１において押さえ具４による薄膜５の支持状態を示す図である。図２（Ｂ）に示すように、巻取り部材３の周囲に巻き取られていた薄膜筒６に薄膜５を押さえていた押さえ具４を最外周部６ａから離間することによって、巻取り部材３がフリーな状態で回転可能となり、薄膜筒６から未使用の薄膜５を巻き戻すことができる。このとき、押さえ具４は巻取り部材３と共には回転しない。既に使用されていた薄膜５の暴露表面２ａが外部汚染環境によって劣化してしまった場合、薄膜５の繰り出しによって、薄膜筒６から劣化していない新たな暴露表面２ａを持つ薄膜５が送り出され、展開薄膜２として使用に供される。繰り出しが終了すれば、押さえ具４は再び、図２（Ａ）に示すように薄膜筒６の最外周部６ａ上の一点を押さえて、薄膜５を支持する。
【００３１】
図３は、この発明による薄膜展開システムの一実施例を示しており、（Ａ）は薄膜展開システムの一例を示す概念図、（Ｂ）は展開薄膜を撓ませた状態の薄膜展開システムの一例を示す概念図、（Ｃ）は展開薄膜を非対称に置いた薄膜展開システムの一例を示す概念図である。図３（Ａ）に示す薄膜展開システム１０ａは、１組の薄膜展開ユニット１ａ，１ｂと、一方の薄膜展開ユニット（例えば、１ａ）から他方の薄膜展開ユニット（例えば、１ｂ）へと連続して掛け渡された展開薄膜２とを有している。薄膜展開ユニット１ａにおいては未使用の薄膜５が薄膜筒６として巻き取られており、薄膜展開ユニット１ｂにおいては使用済みの薄膜８が薄膜筒９として巻き取られている。図３に示す薄膜展開システム１０ａにおいて、左側を繰出し側の薄膜展開ユニット１ａとし、右側を巻取り側の薄膜展開ユニット１ｂと定義する。両者共、押さえ具４によって薄膜５を薄膜筒６，９の最外周部６ａ，９ａ上に押圧状態に保持することで、薄膜筒６，９や展開薄膜２の弛みの発生を防止することができる。巻取り部材３の位置及び回転角を適宜調節することで、両薄膜展開ユニット１ａ，１ｂ間に張り渡された展開薄膜２を緊張状態に置き、展開薄膜２は平坦状態に維持される。
【００３２】
図３（Ｂ）に示すように、両薄膜展開ユニット１ａ，１ｂにおいて、巻取り部材３の位置と回転角を適宜調節することで、展開薄膜２を撓ませることが可能である。一例として、巻取り部材３及び押さえ具４を互いに内向きに角度ψだけ回転させることで、暴露表面２ａの形状を両薄膜展開ユニット１ａ，１ｂ間で対称な放物線状の湾曲面又はこれを模する曲面とすることができる。同様に、巻取り部材３の位置と回転角を適宜調節することで、展開薄膜２の暴露表面２ａを非対称に撓ませることも可能である。一例として、図３（Ｃ）に示すように、巻取り側の薄膜展開ユニット１ｂを繰出し側の薄膜展開ユニット１ａに対して持ち上げ且つ薄膜展開ユニット１ａの巻取り部材３及び押さえ具４を薄膜８の押圧状態で内向きに角度ψで回転させることにより、展開薄膜２の暴露表面２の形状を非対称な放物線状の湾曲面又はこれを模した曲面とすることができる。
【００３３】
図３に示す薄膜展開システムは、電磁波反射機能がある薄膜を用いた電磁波反射装置に適用されている。図３（Ｂ）の場合は、対称型の線焦点型電磁波集束装置となり、準平行に入射して展開薄膜２の暴露表面２ａで反射された電磁波を、巻取り部材３間の中心の空間上のある地点で線集光させることができる。また、図３（Ｃ）は、非対称型の線焦点型電磁波集束装置となり、準平行に入射して薄膜暴露面２で反射された電磁波は、巻取り部材３間の中心以外の空間上のある地点で線集光される。図３に示す薄膜展開システムにおいては、展開薄膜２の両端側共に薄膜展開ユニット１ａ，１ｂを配置したが、薄膜展開ユニットの配置はこれに限るものではなく、展開薄膜２の一端側にのみ薄膜展開ユニット１を配置し、展開薄膜２の他端側は任意の支持機構で支持することもできる。
【００３４】
図４は、この発明による薄膜展開システムにおける暴露表面を交換する概念図であり、図４（Ａ）は暴露表面の交換前の状態を示す概略図、図４（Ｂ）は暴露表面の交換後を示す概略図である。図４に示す薄膜展開システム２０は、薄膜５の供給状態が異なる以外は、図３に示した薄膜展開システム１０ａ（１０ｂ，１０ｃ）と同じ構造を有しているので、同じ部材及び部位には同じ符号を付すことでその構造についての再度の説明を省略する。薄膜展開システム２０も、電磁波反射装置として適用されている。図４（Ａ）と図４（Ｂ）とにおいて薄膜５上の点Ａの移動に示すように、繰出し側の薄膜展開ユニット１ａによって繰り出された一部の薄膜５は、その表面において新しい暴露表面２ａを提供する。それに伴って古い薄膜は、使用済薄膜８として巻取り側の薄膜展開ユニット１ｂにおいて巻き取られる。従って、薄膜展開ユニット１ａにおける未使用の薄膜５の薄膜筒６の外径は減少し、薄膜展開ユニット１ｂにおける使用済の薄膜８の薄膜筒９の外径は増大する。このとき、暴露表面２ａを基準面７に対して一定の配置とするためには、両薄膜展開ユニット１ａ，１ｂの巻取り部材３ａ，３ｂの位置を調整する必要がある。位置調整の一例として、薄膜展開ユニット１ａの巻取り部材３ａの中心を通る基準面７ａに対して、薄膜展開ユニット１ｂの巻取り部材３ｂの中心を通る基準面７ｂの高さ位置を調整する方式がある。基準面７ａと基準面７ｂとの間隔Ｄは、使用済薄膜８の巻取り量に応じて変化する。
【００３５】
図５は、この発明による薄膜展開システムの格納状態と展開状態を示す概略図であり、図５（Ａ）は薄膜展開システムの格納状態を示す概略図、図５（Ｂ）は薄膜展開システムの展開中の状態を示す概略図である。図５に示す薄膜展開システム３０は、薄膜５の供給状態が異なる以外、図３に示した電磁波反射装置１０ａ（１０ｂ，１０ｃ）と同じ構造を有しているので、同じ部材及び部位には同じ符号を付すことで、その構造についての再度の説明を省略する。薄膜展開システム３０についても、電磁波反射装置として適用可能である。図５（Ａ）に示す薄膜展開システム３０の使用開始前の格納状態では、薄膜５は繰出し側の薄膜展開ユニット１ａにフルに巻取り状態にあり、巻取り側の薄膜展開ユニット１ｂには巻き取られていない。格納状態では、一組の薄膜展開ユニット１ａ，１ｂの巻取り部材３ａ，３ｂの間隔は最小とされるので、展開薄膜２の暴露表面２ａの暴露長さが最短となり、高い収納性を示している。
【００３６】
図５（Ｂ）に示すように、巻取り側の薄膜展開ユニット１ｂを繰出し側の薄膜展開ユニット１ａから遠ざかる方向に移動させて、両薄膜展開ユニット１ａ，１ｂの間隔を広げる。繰出し側の薄膜展開ユニット１ａの巻取り部材３ａに巻き取られている薄膜５は、図５（Ａ）と図５（Ｂ）とにおいて薄膜５上の点Ａが移動したのを示すように、巻取り側の薄膜展開ユニット１ｂの巻取り部材３ｂによる引っ張りによって引き出して、両薄膜展開ユニット１ａ，１ｂ間で掛け渡した展開薄膜２とすることができる。また、一旦展開された暴露表面２ａを目的に応じて再収納する場合には、展開薄膜２を、繰出し側の薄膜展開ユニット１ａと巻取り側の薄膜展開ユニット１ｂの一方又は両方で巻き取り、再び展開薄膜２の長さを最小として収納することも可能である。
【００３７】
図５に示す例において、展開薄膜２の両端側共に両薄膜展開ユニット１ａ，１ｂを配置したが、配置はこれに限るものではなく、展開薄膜２の一端（例えば、繰出し側）にのみ薄膜展開ユニット１ａを配置し、もう一端は任意の支持機構で支持しても良い。
【００３８】
図６は、この発明による大暴露表面を持つ薄膜展開システムの一例を概念的に示す斜視図である。図６に示す薄膜展開システム４０は、図３に示す薄膜展開システム１０ａ（１０ｂ，１０ｃ）を、薄膜５の幅方向（巻取り軸線方向）に複数接続して構成されている。薄膜展開システム１０を接続可能にするため、両薄膜展開ユニット１ａ，１ｂにおいて、巻取り部材４１は、一端側において接続用軸４２が設けられると共に他端側において接続用穴４３が形成されており、接続機能を持つ接続型巻取り部材として構成されている。両薄膜展開ユニット１ａ，１ｂにおいて、接続用軸４２を接続用穴４３に挿入することによって接続型巻取り部材４１が次々に長手方向に接続される。その結果、複数の薄膜展開システム１０が展開薄膜２の幅方向に並べられ、各展開薄膜２が並んで配置されることによって、大きな暴露表面４４を示す薄膜展開システム４０が得られる。薄膜展開システム４０は、他のシステムと同様に、電磁波反射装置に適用可能である。
【００３９】
図６において、薄膜展開ユニット１ａ同士及び１ｂ同士の接続に、接続用軸４２と接続用穴４３との嵌合い構造を持つ接続型支持部材４１を用いたが、接続機構はこの嵌合い構造に限るものではなく、薄膜展開ユニット１ａ，１ｂの他の部品に同様の機能を持たせたものでも良いし、或いは接続にのみ用いられる部品や機構を、薄膜展開ユニット１ａ，１ｂに取り付けたのでも良い。
【００４０】
図６に示す薄膜展開システム４０は、複数の薄膜展開システム１０の接続によって得られたより大きな面積の暴露表面４４を持つが、各薄膜展開システム１０が連動して同じ挙動を示し、同じ焦点距離を有する単焦点の線焦点型電磁波集束装置として機能することができる。あるいは、各薄膜展開システム１０が独立して異なった挙動を示し、異なる焦点距離を有する複焦点の線焦点型電磁波集束装置として機能してもよい。また、必ずしも全ての暴露表面２ａが電磁波反射面である必要は無く、目的に応じて多様な面特性を有するのでもよい。
【００４１】
図２〜図６に基づく説明では、この発明による薄膜展開システムとして説明したが、その手順に着目することにより薄膜展開方法としても、また得られた展開物に着目することにより薄膜展開構造物としても認識可能であることは明らかである。
【００４２】
図７は、この発明による薄膜展開ユニットの実施例を示す断面図である。図７（Ａ）は非同軸型の薄膜展開ユニットの断面図であり、（Ｂ）は同軸型の薄膜展開ユニットの断面図である。図７に示す薄膜展開ユニット５０ａ，５０ｂは、巻取り軸回転用の第１駆動軸５５と支持部材回転用の第２駆動軸５６とを備えている。第１駆動軸５５は、その周囲に巻き取られた薄膜筒６又は９の外周から押さえ具４が離れている場合に駆動されて、薄膜を巻き戻し又は巻き取るために用いられる。また、第２回転軸５５は、押さえ具４の回転角を変えるために用いられる。第１駆動軸５５と第２り駆動軸５６との中心が一致していない場合を図７（Ａ）に示す非同軸型、中心が一致している場合を図７（Ｂ）に示す同軸型と定義する。
【００４３】
図７（Ａ）に示す非同軸型の薄膜展開ユニット５０ａは電動機のような駆動装置５１によって駆動される。非同軸型の場合、駆動装置５１の出力は切替器５２によって、第１駆動軸５５と第２駆動軸５６とに選択して伝達される。第１駆動軸５５が駆動される場合には、薄膜筒６又は９が直接に駆動され、薄膜５又は８が繰り出され又は巻き取られる。第２駆動軸５６はその両端部において軸受５３，５３によって回転自在に支持されており、第２駆動軸５６に薄膜筒６又は９の両端から離れた位置において取り付けられている歯車５４，５４が、第１駆動軸５５に回転自在に嵌合されたスリーブ歯車５７に噛み合っている。駆動装置５１の出力が切替器５２によって第２駆動軸５６に伝達される場合、スリーブ歯車５７の回転に伴って、押さえ具４が第１駆動軸５５の回りに回動され、同時にスリーブ歯車５７に組み合わされた直動装置５８が第１駆動軸５５の軸線方向に平行に進退する。直動装置５８の進退する直線運動はリンク機構５９を介して押さえ具４に伝達され、押さえ具４を薄膜筒６又は９の径方向に駆動し、押さえ具４を薄膜筒６又は９の最外周部に対して接近・当接、又は離間させることができる。なお、このとき、第１駆動軸５５も、同じ回転角度だけ回転される。
【００４４】
図７（Ｂ）に示す同軸型の薄膜展開ユニット５０ｂにおいては、第１モータ６０の出力は第１駆動軸５５に直接に伝達されて巻取り部材を駆動し、薄膜を繰り出すか又は巻き取る。第１駆動軸５５は、第２駆動軸５６に対して軸受５３，５３によって相対回転自在である。第２モータ６１の出力は第２駆動軸５６に伝達され、支持部材である筒体６２を回転駆動する。筒体６２は第１駆動軸５５と相対回転自在であるが、各モータ６０，６１内の磁極の作用によって、盲動が防止されている。筒体６２にはアクチュエータの形式を取る複数個の直動装置６８が並べて取り付けられており、第１駆動軸５５に巻き取られている薄膜筒６又は９の外周の法線方向に駆動し、押さえ具４を薄膜筒６又は９の最外周部に対して接近・当接、又は離間させることができる。
【００４５】
【発明の効果】
この発明による薄膜展開方法によれば、巻取り部材に巻き取られている薄膜から成る薄膜筒の最外周部は押さえ具によって押圧可能であり、押さえ具による押圧を解放した状態で巻取り部材を回転することで薄膜の巻取り又は巻戻しをし、このとき、巻取り又は巻戻し量を調節することで、薄膜には、圧縮や引っ張りを負荷することができる。薄膜の巻戻し状態のときに押さえ具によって薄膜を押圧することで、薄膜筒から延びている展開薄膜の端部分が押さえ具によって薄膜筒の最外周部に押されて支持される状態となり、巻取り部材に巻き取られている薄膜や展開されている薄膜が弛むことなく安定保持することができる。また、押さえ具による押圧状態のまま巻取り部材と押さえ具とを巻取り部材の中心回りに同期して回動することにより、巻取り部材に巻き取られている薄膜筒から延びる展開薄膜の角度を変えることができ、薄膜の展開姿勢が可変になる。
【００４６】
この発明による薄膜展開ユニットによれば、薄膜の少なくとも一端側で薄膜を繰り出すか巻き取ることができ、巻き取られた薄膜筒を外方から押圧する押さえ具で薄膜筒や展開薄膜の弛みを防止することができ、更に巻取り部材と押さえ具とを共に回転することで、展開薄膜に負荷を与えて薄膜の展開姿勢を変更することができる。
【００４７】
この発明による薄膜展開システムによれば、薄膜の両端において薄膜展開ユニットを備え、薄膜展開ユニット間の距離、基準面からの高さ、巻取り部材と押さえ具との回転角度を変更することにより、使用開始前の収納状態から展開状態まで薄膜展開に関して幅広い柔軟なシステムを提供することができる。
【００４８】
この発明による薄膜展開構造物によれば、得られた構造物として、多様な電磁波反射装置や電磁波集束装置に適用可能である。しかも、薄膜等の物資の頻繁な補給や人的対応に頼ることなく、大面積の薄膜展開物を実現すること、薄膜展開物の薄膜を自主的・定期的に交換すること、そして薄膜展開物の機能や品質を低コストで常に維持することができる。また、薄膜展開物に負荷をかけることや、その負荷により薄膜展開物の展開形態を任意に変化し、制御することが可能となる。本薄膜展開構造物を複数接続することにより、上記機能を有した、より大面積の薄膜展開物を実現することもできる。更に、上記機能によって、太陽光発電衛星に要求される、極めて大きな面積を有する太陽光集光装置を、低コストで実現し、また運用することが可能となる。
【図面の簡単な説明】
【図１】この発明による薄膜展開方法及び薄膜展開ユニットの一実施例を示す概略断面図であり、（Ａ）は薄膜の支持状態を示す概略図、（Ｂ）は薄膜の姿勢変更の様子を示す概略図である。
【図２】図１に示す薄膜展開ユニットによる薄膜の繰出しを説明する概略図であり、（Ａ）は薄膜の繰出し前の支持状態を示す概略図、（Ｂ）は（Ａ）に示す状態から薄膜の繰出し状態を示す概略図である。
【図３】この発明による薄膜展開システムの一実施例を示す図であり、（Ａ）は薄膜展開システムの一例を示す概念図、（Ｂ）は展開薄膜を撓ませた状態の薄膜展開システムの一例を示す概念図、（Ｃ）は展開薄膜を非対称に置いた薄膜展開システムの一例を示す概念図である。
【図４】この発明による薄膜展開システムにおける暴露表面を交換する概念図であり、（Ａ）は暴露表面の交換前の状態を示す概略図、（Ｂ）は暴露表面の交換後を示す概略図である。
【図５】この発明による薄膜展開システムの格納状態と展開状態を示す概略図であり、（Ａ）は薄膜展開システムの格納状態を示す概略図、（Ｂ）は薄膜展開システムの展開中の状態を示す概略図である。
【図６】この発明による大暴露表面を持つ薄膜展開システムの一例を概念的に示す斜視図である。
【図７】この発明による薄膜展開ユニットの実施例を示す断面図であり、（Ａ）は非同軸型の薄膜展開ユニットの断面図であり、（Ｂ）は同軸型の薄膜展開ユニットの断面図である。
【符号の説明】
１，１ａ，１ｂ，５０ａ，５０ｂ薄膜展開ユニット
２展開薄膜
２ａ暴露表面
３巻取り部材
４押さえ具
５薄膜（未使用、交換用）
６，９薄膜筒
７基準面
８使用済薄膜
１０ａ，１０ｂ，１０ｃ，２０，３０，４０薄膜展開システム[0001]
BACKGROUND OF THE INVENTION
The present invention particularly relates to a thin-film development structure that can be applied to a large-scale deployment structure in space, such as a solar collector mirror and a communication antenna, a thin-film deployment method for obtaining such a thin-film deployment structure, and a thin film The present invention relates to a thin film development unit used for obtaining a development structure, and a thin film development system incorporating the thin film development unit.
[0002]
[Prior art]
Conventionally, as a large-scale deployment using a thin film used in a space environment exposed to harmful electromagnetic waves or cosmic rays, for example, a solar condensing film in a solar power generation satellite or a focusing for receiving radio waves in a communication / data satellite A membrane has been developed. In these large deployments, an extremely large focusing area is required in order to focus weak light and radio waves. A thin film placed in a polluted environment such as a space environment is unavoidably deteriorated in surface state with the passage of time due to exposure to ultraviolet rays or atomic oxygen. In order to avoid such surface deterioration, it is conceivable to coat the surface of the thin film to delay the deterioration.
[0003]
For a large deployment having a large focusing area, it is necessary to store in a high accommodation rate in an associated accommodation portion even when inside or outside the satellite when not in use, such as before the start of use. In view of this, a gas expansion type focusing film that forms a rotating paraboloid by applying a gas pressure to an elastic film surface such as rubber has been proposed (for example, Non-Patent Document 1). However, with this gas expansion type focusing film, a paraboloid of revolution cannot be formed with sufficient accuracy. In addition, a transparent film is required separately from the reflecting surface in order to seal the gas. Electromagnetic waves are applied once before reaching the reflecting surface and once after being reflected by the reflecting surface, twice in total. There will be a lot of loss during transmission. Further, in the case of space use, if space debris collides and a hole is opened in the sealing transparent film, gas leaks, and it becomes impossible to maintain the applied pressure, and consequently the paraboloid cannot be maintained.
[0004]
Therefore, the present inventors have proposed an electromagnetic wave focusing device having another form as a method not based on the gas expansion method (Japanese Patent Application No. 2001-147202 or Japanese Patent Application No. 2001-320563). Japanese Patent Application No. 2001-147202 includes a group of mirrors composed of a linear focus type primary reflecting mirror and a secondary reflecting mirror having the same parabolic cross-sectional shape, and focuses sunlight rays on one point. Since a line-focusing type mirror is used, a solar concentrator that can be thinned and reduced in weight and can be bent in a small size is provided. In Japanese Patent Application No. 2001-320563, a cross-sectional shape perpendicular to the generatrix is composed of a parabolic reflector or a line focus type reflecting mirror that is a curve imitating the parabola, By changing the cross-sectional shape, an electromagnetic wave focusing device having a variable focal length is provided.
[0005]
However, reflection surface deterioration in a contaminated environment remains as a problem, and in order to deal with the reflection surface deterioration, the above-described countermeasures for delaying the deterioration by coating the reflection surface are considered. If the reflective surface is coated, the reflectivity of the reflective surface will decrease and the focusing efficiency will be reduced, so it is necessary to prepare an area from the beginning to compensate for the decrease, increasing the extra weight, Cost increases. Moreover, about the thin film which surface deteriorated, it is calculated | required to exchange for a new thin film. In that case, it is necessary to prepare a thin film for replacement in advance because it is impossible to respond quickly in a situation such as a space environment. However, at present, it has not been realized to efficiently store an ultralight and flexible thin film and to replace a deteriorated thin film with a new thin film quickly and efficiently when necessary. It is desired that the thin film be replaced autonomously and regularly without relying on a method of frequently transporting the replacement thin film and manually replacing it.
[0006]
[Non-Patent Document 1]
David Lichodziejewski, Coatas Cassapakis, "Inflatable Power Antenna Technology", "37th American Aerospace Society Aerospace Science Conference and Exhibition / Reno, NV (37th AIAA Aerospace Sciences Meeting and Exhibit / Reno, NV), Proceedings of the American Academy of Aeronautics and Astronautics (AIAA), January 1999, 99-1074, (FIG. 1, (Figure 7, Table 1)
[0007]
[Problems to be solved by the invention]
Therefore, for thin-film development structures composed of light-weight and high-quality thin films that have exposed surfaces that may be exposed to a contaminated environment, occupy unnecessary area or space when the replacement thin film is not used. It should be prepared in a state of being stored at a high storage rate, and can be automatically replaced periodically when necessary or periodically, and the exposed surface should always be maintained at a high quality at a low cost. There are challenges. Further, when an electromagnetic wave focusing device is realized by the thin film, it may be required to change the shape of the exposed surface.
[0008]
The object of the present invention is to meet these demands from a wound thin film cylinder. Used as electromagnetic wave reflection film or electromagnetic wave convergence film in space environment When unfolding and winding the thin film for deployment, it is possible to hold the thin film while avoiding slack in the thin film cylinder and the deployment thin film, and to change the orientation of the deployment thin film to a flat state or a slack state. And it is providing the thin film expansion | deployment structure applicable as an electromagnetic wave reflection apparatus or an electromagnetic wave focusing apparatus, the thin film expansion | deployment method therefor, a thin film expansion | deployment unit, and a thin film expansion | deployment system.
[0009]
[Means for solving the problems]
In order to solve the above problems, a thin film developing method according to the present invention is as follows. A deployment method in a space environment of a thin film used as an electromagnetic wave reflection film or an electromagnetic wave convergence film in a space environment, A winding member on the feeding side and a winding member on the winding side are provided, and the outermost peripheral portion of the thin film wound around each winding member can be pressed by a pressing tool, and the pressing state by the pressing tool is released. The thin film is wound or unwound between the winding member on the feeding side and the winding member on the winding side, and the thin film extending from the winding member in a pressed state of the thin film by the presser The unwinding side winding member and the winding side winding member are held in an unfolded state, and the winding member and the pressing tool are rotated around the central axis of the winding member while being pressed by the pressing tool. The angle of the developed thin film extending from the winding member can be varied by rotating in synchronization with the winding member.
[0010]
According to this thin film unfolding method, the outermost peripheral portion of the thin film cylinder formed of the thin film wound around the winding member can be pressed by the pressing tool, and the winding member is rotated in a state where the pressing by the pressing tool is released. Thus, the thin film can be wound or unwound. At this time, compression or tension can be applied to the thin film by adjusting the amount of winding or rewinding. By pressing the thin film with the pressing tool when the thin film is unwound, the end portion of the developed thin film extending from the thin film cylinder is pressed against and supported by the outermost peripheral portion of the thin film cylinder with the pressing tool. The thin film wound around the take-up member or the developed thin film can be stably held without sagging. In addition, the angle of the unfolded thin film extending from the thin film cylinder wound around the take-up member by rotating the take-up member and the pusher synchronously around the center of the take-up member while being pressed by the presser , And the deployment posture of the thin film becomes variable.
[0011]
In this thin film unfolding method, the unfolded thin film is unfolded in a flat state or a bent state depending on the amount of synchronous rotation between the winding member and the retainer in the pressed state by the retainer. it can.
Further, at both ends of the thin film, the thin film is wound or unwound by the winding member, and the thin film is pressed and released by the presser, and extends from one of the winding members. By winding the thin film on the other winding member, the thin film developed between the two winding members can be exchanged.
Further, the winding members can be moved toward and away from each other, and the thin film can be developed by separating the winding members from each other. When approaching each other, the thin film can be wound around at least one of the winding members.
[0012]
Moreover, the thin film unfolding unit according to the present invention is A thin film deployment unit used as an electromagnetic wave reflection film or an electromagnetic wave convergence film in a space environment, A winding member capable of winding and rewinding the thin film, and a pressing member capable of pressing the outermost peripheral portion of the thin film wound around the winding member, the feeding side and the winding side of the thin film A thin film unfolding unit for constructing a thin film unfolding structure in which the thin film is unfolded by being spaced apart from each other, and extends from the outermost peripheral portion of the winding member, and the winding member on the feeding side and the winding on the winding side In order to make the angle of the thin film developed between the winding members variable, the winding member and the pressing tool are rotated around the central axis of the winding member while pressing the outermost peripheral portion of the thin film by the pressing tool. It can be rotated in synchronization with
[0013]
According to this thin film unfolding unit, the pressing member can press the outermost peripheral portion of the thin film cylinder formed by being wound around the winding member, and the winding member rotates in a state where the pressing by the pressing member is released. Thus, the thin film can be wound or unwound. At this time, compression or tension can be applied to the thin film by adjusting the amount of winding or rewinding. When the thin film is unwound, the pressing tool presses the thin film, so that the end portion of the unfolded thin film that has been unwound from the winding member is pushed and supported by the pressing tool on the outermost peripheral portion of the thin film cylinder. The thin film being wound around the winding member and the thin film being unfolded can be stably held in the unfolded state with a simple structure called a presser and without being loosened. Changing the angle of the unfolded thin film extending from the thin film cylinder wound around the winding member by rotating the winding member and the pressing member in synchronism with the center of the winding member while being pressed by the pressing member. And the deployment posture of the thin film can be made variable.
[0014]
In this thin film unfolding unit, a support member that is rotatably engaged with the winding member is provided, and the pressing member is supported by the support member so as to be able to advance and retract in the radial direction of the winding member. The outer peripheral portion can be pressed, and the winding member can be rotated independently or in synchronization with the rotation of the support member. The presser can be supported by a support member that is rotatably engaged with the winding member so as to advance and retract in the radial direction of the winding member. The thin film can be wound and rewound by rotating the winding member alone. By rotating the winding member in synchronization with the rotation of the support member, the angle of the developed thin film extending from the thin film cylinder, that is, the deployed posture can be changed.
[0015]
In this thin film unfolding unit, the support member is a sleeve that is rotatably fitted to a drive shaft that rotationally drives the take-up member, and the pressing member performs a linear motion of a linear motion body held on the sleeve. By converting through the link mechanism connected to the linear motion body, the winding member can be advanced and retracted in the radial direction. The sleeve allows a single rotation of the drive shaft that rotationally drives the winding member, and can rotate in synchronization with the drive shaft. The sleeve and the link mechanism can be provided in pairs with the thin film cylinder sandwiched in the axial direction.
[0016]
In this thin film unfolding unit, the winding member is rotationally driven by a drive shaft of a first motor, and the support member is a cylindrical body that rotatably engages the drive shaft and is driven by a second motor, and The tool can be advanced and retracted in the radial direction of the winding member by an actuator provided on the cylindrical body. The cylindrical body allows a single rotation of the drive shaft of the first motor that rotationally drives the winding member, and can be rotated in synchronization with the drive shaft of the first motor by the second motor. When the pressing tool is long, a plurality of actuators can be arranged side by side along the pressing tool.
[0017]
In the thin film unfolding system according to the present invention, the thin film unfolding unit is disposed on the feeding side and the winding side of the thin film, and a part of the thin film is always wound on at least one of the thin film unfolding units. The remaining part of the thin film is developed so as to be exchangeable between the thin film development units as the thin film moves.
[0018]
According to this thin film unfolding system, a part of the thin film is always wound around at least one of the two thin film unfolding units disposed on the feeding side and the winding side of the thin film, and the remaining part of the thin film is disposed on both thin film unfolding units. Unfold between. When a thin film is wound in one thin film unfolding unit, the thin film is rewound in the other thin film unfolding unit, and the film is subjected to compression or tension by adjusting the winding or unwinding amount. In addition, it is possible to handle the thin film with flexibility, such as changing the spread area of the thin film developed between the two thin film developing units or replacing the thin film exposed to the outside.
[0019]
In this thin film deployment system, at least one of the thin film deployment units is configured to prevent the pressing position on the outermost peripheral portion of the thin film from being changed by the presser. The position can be adjustable.
Further, the position of the outermost peripheral portion of the thin-film cylinder as viewed from the winding member varies due to the movement of the thin film from one thin-film development unit to the other thin-film development unit. By adjusting the position of the winding member according to the amount of movement of the thin film, the pressed position of the outermost peripheral portion of the thin film by the pressing tool is not changed, and the developed state of the thin film can be maintained constant.
Furthermore, at least one of the thin film development units can be moved toward and away from the other thin film development unit, and the thin film can be wound around at least one of the thin film development units when the two thin film development units are in close proximity. It can be.
[0020]
In this thin film development system, the development area can be enlarged by connecting the thin film development units of another thin film development system to the two thin film development units in a multi-stage sequentially in the winding axis direction. be able to. By sequentially connecting the thin film unfolding units in multiple stages in the winding axis direction, the thin film unfolding system can be expanded in the winding axis direction, and the unfolding area can be expanded. When the exposed surface of the developed thin film has electromagnetic wave reflectivity, the electromagnetic wave can be reflected and received in a larger area, or it can function as a multifocal electromagnetic wave focusing device having a plurality of focal lengths.
[0021]
Furthermore, the thin film development structure according to the present invention is: A thin-film development structure used as an electromagnetic wave reflection film or an electromagnetic wave convergence film in a space environment, A winding member capable of winding or unwinding the thin film, and a pressing tool capable of pressing the outermost peripheral portion of the thin film wound around the winding member are provided on the feeding side and the winding side of the thin film. An unfolded thin film portion that is provided between each of the thin films extending from the winding member and is held in an unfolded state between the winding member on the feeding side and the winding member on the winding side in a pressed state by the presser And rotating the winding member and the pressing tool together with the wound thin film around the central axis of the winding member in a pressed state of the thin film by the pressing tool, This is because the development angle of the development thin film portion is made variable.
[0022]
According to this thin film development structure, a part of the thin film extending from the thin film cylinder wound around the winding member is developed as a developed thin film portion. Since the developed thin film portion is held in a pressed state at the outermost peripheral portion of the thin film cylinder by the presser, the thin film wound around the winding member or the developed thin film is a simple structure called a presser. And is stably held in the unfolded state without sagging. Further, the unfolding width of the unfolded thin film portion is variable by winding or unwinding the thin film on the winding member, and compression or tension can be applied to the thin film by adjusting the winding or unwinding amount. . Furthermore, by rotating the winding member and the pressing tool together with the thin film cylinder around the center of the winding member in a pressed state of the thin film by the pressing tool, it is easy to change the deployed posture of the deployed thin film portion. .
[0023]
In this thin film deployment structure, both ends of the developed thin film portion are supported by the winding member and the pressing tool, and the developed thin film portion deployed between the winding members is pressed by the pressing tool. , In accordance with the amount of synchronous rotation between the winding member and the presser, it can be developed into a flat state or a bent state.
Further, the unrolled thin film portion developed between the two winding members is unused by unwinding the thin film from the winding member on the unwinding side and winding the thin film on the winding member on the winding side. It can be replaced with a developed thin film part.
[0024]
In this thin-film development structure, an electromagnetic wave reflecting device in which the exposed surface of the thin film is a flat sunlight reflecting surface or a radio wave reflecting surface, or a sunlight reflecting condensing surface or a radio wave having a parabolic curved cross section as the exposed surface of the thin film. It is applied as an electromagnetic wave reflection focusing device having a reflective condensing surface. In the case of flattening, a thin film plane stretched without slack can be realized. If the exposed surface is an electromagnetic wave reflecting surface, this thin-film development structure functions as a planar electromagnetic wave reflecting device. If the shape of the thin film is changed to a parabolic tube or a curved tube simulating it by applying a load to both ends of the exposed surface, the film can be made to function as a line focus type electromagnetic wave focusing device.
[0025]
In the above-described thin film unfolding method and thin film unfolding structure, the unfolding thin film is unfolded in a flat state when the amount of synchronous rotation between the winding member and the pressing member is zero and there is no bending load on the unfolding thin film by the pressing member. When the take-up member and the pressing tool are rotated, a bending load is generated on the developed thin film according to the amount of synchronous rotation, for example, it is developed in a bent state such as a parabolic curved surface.
[0026]
In this thin film development method and thin film development structure, the thin film was unwound or unwound by the winding member on both ends of the thin film, and the thin film was pressed and released by the pressing tool. When the thin film deteriorates in a contaminated environment, for example, the deteriorated used developed thin film is wound, and at the same time, the unused thin film continuous with the used developed thin film is wound from the thin film cylinder on the other winding member. By returning to a developed thin film, it is possible to replace the deteriorated used thin film with a new undegraded thin film. Regarding the number of exchanges, the developed thin film portion can be exchanged a plurality of times depending on the amount of accommodation in the thin film cylinder.
[0027]
In the above-described thin film development method, thin film development system, and thin film development structure, at least one winding member or thin film development unit is allowed to approach or separate from the other winding member or thin film development unit. The thin film wound around the member can be unwound and developed, or the width of the developed thin film can be arbitrarily adjusted. Also, when both winding members or both thin film deployment units are brought close to each other, such as when not in use, etc., by winding the developed thin film on at least one winding member or in the thin film deployment unit, The exposed surface length of the thin film can be shortened as much as possible, the development of the thin film can be closed, the whole can be folded compactly, and a high storage rate can be realized. Therefore, it is possible to exhibit high convenience in storage and transportation, particularly when the rocket is launched as one of the loaded loads for space use before and after the thin film is deployed.
[0028]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of a thin film development structure, a thin film development method, a thin film development unit, and a thin film development system according to the present invention will be described with reference to the drawings. FIG. 1 is a schematic cross-sectional view showing an embodiment of a thin film development method and a thin film development unit according to the present invention, (A) is a schematic view showing a support state of the thin film, and (B) shows a state of changing the posture of the thin film. FIG. As shown in FIG. 1A, the thin film unfolding unit 1 includes a winding member 3 capable of winding the thin film 5 as a thin film cylinder 6, and a presser 4 capable of pressing the outermost peripheral portion 6a of the thin film cylinder 6. And. In this embodiment, the winding member 3 has a form of a winding shaft. The thin film 5 wound in a cylindrical shape around the winding member 3 extends tangentially from the outermost peripheral portion 6 a of the thin film cylinder 6, and a portion immediately before the thin film 5 is extended by the pressing tool 4 to the thin film cylinder 6. The thin film 5 is supported by being pressed at one place on the outermost peripheral portion 6a. The other end of the thin film 5 is supported by appropriate support means. By pressing the thin film 5 against the thin film cylinder 6 by the presser 4, loosening of the thin film cylinder 6 and unfolded thin film (deployed thin film, the same applies hereinafter) 2 are prevented. The surface of the developed thin film 2 is an exposed surface 2a, which is used depending on the purpose.
[0029]
By rotating the winding member 3, the supporting state of the thin film 5, that is, the inclination angle with respect to the reference surface 7 can be changed. That is, the winding member 3, the thin film cylinder 6, and the presser 4 can rotate together, and the thin film 5 is moved to the outermost peripheral portion 6 a of the thin film cylinder 6 by the presser 4 as shown in FIG. The support posture (inclination angle ψ) of the developed thin film 2 with respect to the reference plane 7 is changed by rotating around the center of the winding member 3 by an angle ψ while being pressed. A bending moment acts on the end of the developed thin film 2, and the exposed surface 2a of the thin film 5 can be arbitrarily tilted and curved according to the purpose.
[0030]
FIG. 2 is a schematic diagram for explaining the feeding of the thin film by the thin film unfolding unit shown in FIG. 1, (A) is a schematic diagram showing a support state before feeding the thin film, and (B) is from the state shown in (A). It is the schematic which shows the delivery state of a thin film. FIG. 2A is a view showing a state in which the thin film 5 is supported by the presser 4 in the thin film unfolding unit 1 as in FIG. 1A. As shown in FIG. 2 (B), the winding member 3 is separated from the outermost peripheral portion 6 a by separating the presser 4 that holds the thin film 5 on the thin film cylinder 6 wound around the winding member 3. Can be rotated in a free state, and the unused thin film 5 can be rewound from the thin film cylinder 6. At this time, the presser 4 does not rotate together with the winding member 3. When the exposed surface 2a of the thin film 5 that has already been used has deteriorated due to the external contamination environment, the thin film 5 having a new exposed surface 2a that has not deteriorated is sent out from the thin film cylinder 6 by feeding the thin film 5, It is used for use as the development thin film 2. When the feeding is completed, the pressing tool 4 supports the thin film 5 by pressing one point on the outermost peripheral portion 6a of the thin film cylinder 6 again as shown in FIG.
[0031]
FIG. 3 shows an embodiment of a thin film deployment system according to the present invention, where (A) is a conceptual diagram showing an example of a thin film deployment system, and (B) is an example of a thin film deployment system in a state where the developed thin film is bent. (C) is a conceptual diagram which shows an example of the thin film expansion | deployment system which set | placed the expansion | deployment thin film asymmetrically. The thin film development system 10a shown in FIG. 3A is a series of thin film development units 1a and 1b and one thin film development unit (eg, 1a) to the other thin film development unit (eg, 1b). It has the spread | deployed thin film 2 spanned. In the thin film unfolding unit 1a, an unused thin film 5 is wound as a thin film cylinder 6, and in the thin film unfolding unit 1b, a used thin film 8 is wound as a thin film cylinder 9. In the thin film development system 10a shown in FIG. 3, the left side is defined as a feeding-side thin film development unit 1a, and the right side is defined as a winding-side thin film development unit 1b. In both cases, by holding the thin film 5 on the outermost peripheral portions 6a and 9a of the thin film cylinders 6 and 9 by the presser 4, it is possible to prevent the thin film cylinders 6 and 9 and the unfolded thin film 2 from being loosened. it can. By appropriately adjusting the position and rotation angle of the winding member 3, the unfolded thin film 2 stretched between the thin film unfolding units 1a and 1b is placed in a tension state, and the unfolded thin film 2 is maintained in a flat state.
[0032]
As shown in FIG. 3B, in both thin film development units 1a and 1b, the development thin film 2 can be bent by appropriately adjusting the position and rotation angle of the winding member 3. As an example, by rotating the winding member 3 and the presser 4 inward from each other by an angle ψ, the shape of the exposed surface 2a is a parabolic curved surface that is symmetric between the two thin-film development units 1a and 1b or the like. Can be a curved surface. Similarly, the exposed surface 2a of the developed thin film 2 can be bent asymmetrically by appropriately adjusting the position and rotation angle of the winding member 3. As an example, as shown in FIG. 3 (C), the winding-side thin-film developing unit 1b is lifted with respect to the feeding-side thin-film developing unit 1a, and the winding member 3 and the pressing member 4 of the thin-film developing unit 1a are By rotating inwardly at an angle ψ in the pressed state, the shape of the exposed surface 2 of the developed thin film 2 can be an asymmetric parabolic curved surface or a curved surface simulating this.
[0033]
The thin film deployment system shown in FIG. 3 is applied to an electromagnetic wave reflection device using a thin film having an electromagnetic wave reflection function. In the case of FIG. 3B, a symmetric line-focusing electromagnetic wave focusing device is formed, and the electromagnetic wave incident quasi-parallelly and reflected by the exposed surface 2a of the developing thin film 2 is reflected on the central space between the winding members 3. The line can be collected at a certain point. FIG. 3C shows an asymmetrical line-focusing electromagnetic wave focusing device, and the electromagnetic wave incident quasi-parallelly and reflected by the thin film exposed surface 2 is in a space other than the center between the winding members 3. The line is focused at the point. In the thin film unfolding system shown in FIG. 3, the thin film unfolding units 1a and 1b are arranged on both ends of the unfolded thin film 2. However, the arrangement of the thin film unfolding units is not limited to this, The development unit 1 can be arranged, and the other end side of the development thin film 2 can be supported by an arbitrary support mechanism.
[0034]
FIG. 4 is a conceptual diagram of exchanging the exposed surface in the thin film deployment system according to the present invention. FIG. 4 (A) is a schematic diagram showing the state before exchanging the exposed surface, and FIG. 4 (B) is after exchanging the exposed surface. FIG. The thin film development system 20 shown in FIG. 4 has the same structure as the thin film development system 10a (10b, 10c) shown in FIG. 3 except that the supply state of the thin film 5 is different. The same reference numerals are used to omit re-explanation of the structure. The thin film deployment system 20 is also applied as an electromagnetic wave reflection device. As shown in the movement of the point A on the thin film 5 in FIG. 4 (A) and FIG. 4 (B), a part of the thin film 5 drawn out by the thin film unfolding unit 1a on the feeding side has a new exposed surface. 2a is provided. Along with this, the old thin film is wound up as a used thin film 8 in the thin film unfolding unit 1b on the winding side. Therefore, the outer diameter of the thin film cylinder 6 of the unused thin film 5 in the thin film development unit 1a is reduced, and the outer diameter of the thin film cylinder 9 of the used thin film 8 in the thin film development unit 1b is increased. At this time, in order to arrange the exposed surface 2a with respect to the reference plane 7, it is necessary to adjust the positions of the winding members 3a and 3b of both the thin film development units 1a and 1b. As an example of the position adjustment, the height position of the reference surface 7b passing through the center of the winding member 3b of the thin film development unit 1b is adjusted with respect to the reference surface 7a passing through the center of the winding member 3a of the thin film development unit 1a. There is. The distance D between the reference surface 7a and the reference surface 7b changes according to the amount of winding of the used thin film 8.
[0035]
FIG. 5 is a schematic diagram showing a storage state and a deployment state of the thin film deployment system according to the present invention, FIG. 5 (A) is a schematic diagram showing a storage state of the thin film deployment system, and FIG. 5 (B) is a diagram of the thin film deployment system. It is the schematic which shows the state under expansion | deployment. The thin film deployment system 30 shown in FIG. 5 has the same structure as the electromagnetic wave reflection device 10a (10b, 10c) shown in FIG. 3 except that the supply state of the thin film 5 is different. A description of the structure is omitted by attaching a reference numeral. The thin film deployment system 30 can also be applied as an electromagnetic wave reflection device. In the retracted state before the use of the thin film unfolding system 30 shown in FIG. 5A, the thin film 5 is fully wound on the unwinding side thin film unfolding unit 1a and is wound around the unwinding side thin film unfolding unit 1b. Not taken. In the retracted state, the distance between the winding members 3a and 3b of the pair of thin film unfolding units 1a and 1b is minimized, so that the exposed length of the exposed surface 2a of the unfolded thin film 2 is the shortest and high storage properties are exhibited. Yes.
[0036]
As shown in FIG. 5B, the thin film unfolding unit 1b on the take-up side is moved away from the unwinding side thin film unfolding unit 1a to widen the distance between the two thin film unfolding units 1a and 1b. As shown in FIG. 5 (A) and FIG. 5 (B), the thin film 5 wound on the winding member 3a of the feeding-side thin film development unit 1a has moved the point A on the thin film 5, The unfolded thin film 2 drawn between the thin film unfolding units 1a and 1b by being pulled by the winding member 3b of the thin film unfolding unit 1b on the winding side can be obtained. When the exposed surface 2a once developed is re-accommodated according to the purpose, the developing thin film 2 is wound up by one or both of the feeding-side thin film developing unit 1a and the winding-side thin film developing unit 1b, It is also possible to store the unfolded thin film 2 again with the minimum length.
[0037]
In the example shown in FIG. 5, both thin film development units 1a and 1b are arranged on both ends of the developed thin film 2. However, the arrangement is not limited to this, and the thin film is developed only at one end (for example, the feeding side) of the developed thin film 2. The unit 1a may be disposed, and the other end may be supported by an arbitrary support mechanism.
[0038]
FIG. 6 is a perspective view conceptually showing an example of a thin film deployment system having a large exposed surface according to the present invention. A thin film development system 40 shown in FIG. 6 is configured by connecting a plurality of thin film development systems 10 a (10 b, 10 c) shown in FIG. 3 in the width direction (winding axis direction) of the thin film 5. In order to enable connection of the thin film development system 10, in both thin film development units 1 a and 1 b, the winding member 41 is provided with a connection shaft 42 on one end side and a connection hole 43 on the other end side. It is configured as a connection type winding member having a connection function. In both the thin film development units 1a and 1b, the connection type winding members 41 are successively connected in the longitudinal direction by inserting the connection shaft 42 into the connection hole 43. As a result, a plurality of thin film development systems 10 are arranged in the width direction of the development thin film 2, and each development thin film 2 is arranged side by side, whereby a thin film development system 40 showing a large exposed surface 44 is obtained. The thin film unfolding system 40 can be applied to an electromagnetic wave reflection device as in other systems.
[0039]
In FIG. 6, the connection type support member 41 having a fitting structure of the connecting shaft 42 and the connecting hole 43 is used for the connection between the thin film development units 1 a and 1 b, but the connection mechanism has this fitting structure. It is not limited, and other parts of the thin film development units 1a and 1b may have the same function, or parts or mechanisms used only for connection may be attached to the thin film development units 1a and 1b. good.
[0040]
The thin film deployment system 40 shown in FIG. 6 has an exposed surface 44 having a larger area obtained by connecting a plurality of thin film deployment systems 10, but each thin film deployment system 10 works in conjunction to exhibit the same focal length. It can function as a single-focus line-focusing electromagnetic wave focusing device. Or each thin film expansion | deployment system 10 may show a different behavior independently, and may function as a multifocal line focus type electromagnetic wave focusing device which has a different focal distance. Further, not all exposed surfaces 2a need to be electromagnetic wave reflecting surfaces, and may have various surface characteristics depending on purposes.
[0041]
In the description based on FIGS. 2 to 6, the thin film unfolding system according to the present invention has been described. However, as a thin film unfolding method by focusing on the procedure, and as a thin film unfolding structure by focusing on the obtained unfolded structure. Is clearly recognizable.
[0042]
FIG. 7 is a sectional view showing an embodiment of the thin film development unit according to the present invention. FIG. 7A is a cross-sectional view of a non-coaxial thin film development unit, and FIG. 7B is a cross-sectional view of a coaxial thin film development unit. 7 includes a first drive shaft 55 for rotating the winding shaft and a second drive shaft 56 for rotating the support member. The first drive shaft 55 is driven when the presser 4 is separated from the outer periphery of the thin film cylinder 6 or 9 wound around the first drive shaft 55, and is used for rewinding or winding the thin film. The second rotation shaft 55 is used for changing the rotation angle of the presser 4. The case where the centers of the first drive shaft 55 and the second drive shaft 56 do not coincide with each other is the non-coaxial type shown in FIG. 7A, and the case where the centers coincide with each other is the coaxial type shown in FIG. 7B. It is defined as
[0043]
The non-coaxial thin film unfolding unit 50a shown in FIG. 7A is driven by a driving device 51 such as an electric motor. In the case of the non-coaxial type, the output of the drive device 51 is selectively transmitted to the first drive shaft 55 and the second drive shaft 56 by the switch 52. When the first drive shaft 55 is driven, the thin film cylinder 6 or 9 is directly driven, and the thin film 5 or 8 is drawn out or wound up. The second drive shaft 56 is rotatably supported by bearings 53, 53 at both ends thereof, and gears 54, 54 attached to the second drive shaft 56 at positions away from both ends of the thin film cylinder 6 or 9. , Meshed with a sleeve gear 57 that is rotatably fitted to the first drive shaft 55. When the output of the drive device 51 is transmitted to the second drive shaft 56 by the switch 52, the presser 4 is rotated around the first drive shaft 55 as the sleeve gear 57 rotates, and at the same time, the sleeve gear 57. The linear motion device 58 combined with the forward / backward movement advances and retreats in parallel with the axial direction of the first drive shaft 55. The linear motion of the linear motion device 58 moving forward and backward is transmitted to the presser 4 via the link mechanism 59, and the presser 4 is driven in the radial direction of the thin film cylinder 6 or 9, so It can approach, abut, or be separated from the outer periphery. At this time, the first drive shaft 55 is also rotated by the same rotation angle.
[0044]
In the coaxial thin film unfolding unit 50b shown in FIG. 7B, the output of the first motor 60 is directly transmitted to the first drive shaft 55 to drive the winding member, and the thin film is fed out or wound up. The first drive shaft 55 is rotatable relative to the second drive shaft 56 by bearings 53 and 53. The output of the second motor 61 is transmitted to the second drive shaft 56 and rotationally drives the cylindrical body 62 that is a support member. Although the cylindrical body 62 is rotatable relative to the first drive shaft 55, blind motion is prevented by the action of the magnetic poles in the motors 60 and 61. A plurality of linear motion devices 68 in the form of actuators are mounted side by side on the cylindrical body 62 and driven in the normal direction of the outer periphery of the thin film cylinder 6 or 9 wound around the first drive shaft 55. The presser 4 can be approached, abutted, or separated from the outermost peripheral portion of the thin film cylinder 6 or 9.
[0045]
【The invention's effect】
According to the thin film unfolding method of the present invention, the outermost peripheral portion of the thin film cylinder formed of the thin film wound on the winding member can be pressed by the pressing tool, and the winding member is released in the state where the pressing by the pressing tool is released. The thin film can be wound or rewound by rotating, and at this time, the thin film can be compressed or pulled by adjusting the amount of winding or rewinding. By pressing the thin film with the pressing tool when the thin film is unwound, the end portion of the developed thin film extending from the thin film cylinder is pressed against and supported by the outermost peripheral portion of the thin film cylinder with the pressing tool. The thin film wound around the take-up member or the developed thin film can be stably held without sagging. In addition, the angle of the unfolded thin film extending from the thin film cylinder wound around the take-up member by rotating the take-up member and the pusher synchronously around the center of the take-up member while being pressed by the presser , And the deployment posture of the thin film becomes variable.
[0046]
According to the thin film unfolding unit of the present invention, the thin film can be unwound or wound on at least one end side of the thin film, and the thin film tube and the unfolded thin film are prevented from being loosened by a pressing tool that presses the wound thin film tube from the outside. Furthermore, by rotating the winding member and the pressing member together, it is possible to apply a load to the developed thin film and change the deployed posture of the thin film.
[0047]
According to the thin film development system according to the present invention, the thin film development unit is provided at both ends of the thin film, by changing the distance between the thin film development units, the height from the reference surface, and the rotation angle between the winding member and the pressing tool, A wide range of flexible systems can be provided for thin film deployment from the storage state before use to the deployed state.
[0048]
According to the thin film development structure according to the present invention, the obtained structure can be applied to various electromagnetic wave reflection devices and electromagnetic wave focusing devices. Moreover, it is possible to realize a large-area thin-film development without depending on frequent replenishment of materials such as thin-film and human response, voluntary and periodic replacement of thin-film development, and thin-film development. Function and quality can always be maintained at low cost. Further, it is possible to apply a load to the thin film development, and arbitrarily change and control the development form of the thin film development by the load. By connecting a plurality of the thin film development structures, it is possible to realize a thin film development having a larger area and having the above function. Furthermore, the above function makes it possible to realize and operate a solar concentrator having an extremely large area required for a photovoltaic power generation satellite at low cost.
[Brief description of the drawings]
BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a schematic cross-sectional view showing an embodiment of a thin film development method and a thin film development unit according to the present invention, (A) is a schematic view showing a support state of the thin film, and (B) is a state of attitude change of the thin film. FIG.
2A and 2B are schematic diagrams for explaining feeding of a thin film by the thin film unfolding unit shown in FIG. 1, wherein FIG. 2A is a schematic diagram showing a support state before feeding of the thin film, and FIG. 2B is a view from the state shown in FIG. It is the schematic which shows the delivery state of a thin film.
FIGS. 3A and 3B are diagrams showing an embodiment of a thin film development system according to the present invention, FIG. 3A is a conceptual diagram showing an example of a thin film development system, and FIG. 3B is a thin film development system in a state where the developed thin film is bent; The conceptual diagram which shows an example, (C) is a conceptual diagram which shows an example of the thin film expansion | deployment system which has arrange | positioned the expansion | deployment thin film asymmetrically.
FIGS. 4A and 4B are conceptual diagrams of exchanging the exposed surface in the thin film deployment system according to the present invention, wherein FIG. 4A is a schematic diagram illustrating a state before the exposed surface is replaced, and FIG. It is.
FIGS. 5A and 5B are schematic diagrams showing a storage state and a deployment state of the thin film deployment system according to the present invention. FIG. 5A is a schematic diagram showing a storage state of the thin film deployment system, and FIG. FIG.
FIG. 6 is a perspective view conceptually showing an example of a thin film development system having a large exposed surface according to the present invention.
7A and 7B are cross-sectional views showing an embodiment of a thin film unfolding unit according to the present invention, FIG. 7A is a cross-sectional view of a non-coaxial thin film unfolding unit, and FIG. 7B is a cross-sectional view of a coaxial thin film unfolding unit. It is.
[Explanation of symbols]
1, 1a, 1b, 50a, 50b Thin film unfolding unit
2 Thin film
2a Exposed surface
3 Winding member
4 Presser
5 Thin film (unused, replacement)
6,9 Thin film cylinder
7 Reference plane
8 Used thin film
10a, 10b, 10c, 20, 30, 40 Thin film deployment system

Claims

A deployment method in a space environment of a thin film used as an electromagnetic wave reflecting film or an electromagnetic wave converging film in a space environment, comprising a winding member on a feeding side and a winding member on a winding side, and each winding member The outermost peripheral portion of the thin film wound on the sheet can be pressed by a pressing tool, and the thin film is wound between the winding member on the feeding side and the winding member on the winding side in a released state of pressing by the pressing tool. The thin film extending from the winding member in a pressed state of the thin film by the presser is held in an unfolded state between the winding member on the feeding side and the winding member on the winding side. By rotating the winding member and the pressing tool around the central axis of the winding member in the pressed state by the pressing tool, the angle of the developed thin film extending from the winding member can be varied. Do Thin film deployment method consisting of.

The thin film that is unfolded is developed in a flat state or a bent state in accordance with the amount of synchronous rotation between the winding member and the retainer in the pressed state by the retainer. The thin film development method described.

The thin film extending from one of the winding members by performing winding or unwinding of the thin film by the winding member and pressing and releasing of the thin film by the presser at both ends of the thin film. 2. The thin film unfolding method according to claim 1, further comprising exchanging the thin film unfolded between the two winding members by winding the wire around the other winding member.

4. The winding member according to claim 3, wherein the two winding members can be moved toward and away from each other, and the thin film is developed by being separated from each other, and the thin film is wound around at least one of the winding members when approaching each other. Thin film deployment method.

A thin film unfolding unit used as an electromagnetic wave reflecting film or an electromagnetic wave converging film in a space environment, a winding member capable of winding and unwinding a thin film, and the winding member wound around the winding member A thin film unfolding unit for constructing a thin film unfolding structure, comprising a pressing tool capable of pressing the outermost peripheral portion of the thin film, and deploying the thin film to be spaced apart from each other on the feeding side and the winding side of the thin film, In order to make the angle of the thin film extending from the outermost peripheral part of the winding member extended between the winding member on the feeding side and the winding member on the winding side variable, the outermost circumference of the thin film by the pressing tool A thin film unfolding unit, wherein the winding member and the presser can be rotated in synchronization with the periphery of the central axis of the winding member while pressing the portion.

A support member that is rotatably engaged with the winding member is provided, and the pressing member is supported by the support member so as to advance and retreat in the radial direction of the winding member, whereby the outermost peripheral portion of the thin film The thin film deployment unit according to claim 5, wherein the winding member can be rotated independently or in synchronization with the rotation of the support member.

The support member is a sleeve rotatably fitted to a drive shaft that rotationally drives the winding member, and the pressing member is connected to the linear motion of the linear motion held on the sleeve. The thin film development unit according to claim 6, wherein the thin film unfolding unit is moved forward and backward in a radial direction of the winding member by being converted through a linked mechanism.

The winding member is rotationally driven by a drive shaft of a first motor, the support member is a cylindrical body that rotatably supports the drive shaft and is driven by a second motor, and the pressing member is the cylindrical body The thin film unfolding unit according to claim 6, wherein the winding member is advanced and retracted in the radial direction by an actuator provided on the surface.

What deployment system der of the thin film under a space environment is used as an electromagnetic wave reflection film or an electromagnetic wave converging film feeding side and the winding side of the film development unit said thin film according to any one of claims 5-8 A part of the thin film is always wound around at least one of the thin film development units, and the remaining part of the thin film is moved between the thin film development units as the thin film moves. A thin film deployment system consisting of being deployed interchangeably.

At least one of the thin film development units can adjust the position of the winding member in accordance with the amount of movement of the thin film in order to prevent the pressing position on the outermost peripheral portion of the thin film by the pressing tool from fluctuating. The thin film deployment system according to claim 9, comprising:

At least one of the thin film development units can be approached / separated from the other thin film development unit, and the thin film can be wound around at least one of the thin film development units when both the thin film development units are in proximity. The thin film deployment system according to claim 9, comprising:

The development area can be enlarged by making the thin film development units of another thin film development system correspond to the two thin film development units and connecting them in multiple stages sequentially in the winding axis direction. The thin film deployment system described in 1.

A development structure of a thin film used as an electromagnetic wave reflecting film or an electromagnetic wave converging film in a space environment , the winding member capable of winding or unwinding the thin film, and the winding member wound around the winding member A pressing tool capable of pressing the outermost peripheral portion of the thin film is provided on each of the feeding side and the winding side of the thin film, and includes a part of the thin film extending from the winding member. A deployment thin film portion that is held in a deployed state between the winding member and the winding member on the winding side is provided, and the winding member and the pressing tool are wound in a pressed state of the thin film by the pressing tool. A thin film unfolding structure comprising: the unfolding angle of the unfolding thin film portion being made variable by rotating in synchronism with the thin film taken around the central axis of the winding member.

Both ends of the unfolded thin film portion are supported by the winding member and the presser, and the unfolded thin film portion developed between the two windup members is in the pressed state by the presser and the winding member. The thin film development structure according to claim 13, wherein the thin film development structure is developed in a flat state or a bent state in accordance with an amount of synchronous rotation with the pressing tool.

The unfolded unfolded thin film portion unfolded between the winding members is unwound by unwinding the thin film from the unwinding member on the unwinding side and winding the thin film by the unwinding member on the unwinding side. 15. The thin-film development structure according to claim 14, wherein the thin-film development structure is replaceable.

15. The thin film development according to claim 14, wherein the two winding members can be moved toward and away from each other, and the thin film is wound around at least one of the winding members in a close state, thereby realizing a high storage ratio. Structure.

An electromagnetic wave reflection device having an exposed surface of the thin film as a flat sunlight reflecting surface or a radio wave reflecting surface, or an electromagnetic wave having an exposed surface of the thin film as a sunlight reflecting condensing surface or a radio wave reflecting condensing surface having a parabolic curved section. The thin-film development structure according to claim 14, wherein the thin-film development structure is applied as a reflection focusing device.