JP3966289B2 - Epoxy resin molding material for electronic component sealing and electronic component - Google Patents
Epoxy resin molding material for electronic component sealing and electronic component Download PDFInfo
- Publication number
- JP3966289B2 JP3966289B2 JP2004021388A JP2004021388A JP3966289B2 JP 3966289 B2 JP3966289 B2 JP 3966289B2 JP 2004021388 A JP2004021388 A JP 2004021388A JP 2004021388 A JP2004021388 A JP 2004021388A JP 3966289 B2 JP3966289 B2 JP 3966289B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- molding material
- component
- electronic component
- sealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 57
- 229920000647 polyepoxide Polymers 0.000 title claims description 57
- 239000012778 molding material Substances 0.000 title claims description 45
- 238000007789 sealing Methods 0.000 title claims description 27
- 229920005989 resin Polymers 0.000 claims description 20
- 239000011347 resin Substances 0.000 claims description 20
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 16
- -1 cyclic phosphazene compound Chemical class 0.000 claims description 15
- 239000011256 inorganic filler Substances 0.000 claims description 15
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 15
- 239000003063 flame retardant Substances 0.000 claims description 14
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 13
- 125000004464 hydroxyphenyl group Chemical group 0.000 claims description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 7
- 229920003986 novolac Polymers 0.000 claims description 7
- 150000002989 phenols Chemical class 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000003700 epoxy group Chemical group 0.000 claims description 6
- 239000000945 filler Substances 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 125000004437 phosphorous atom Chemical group 0.000 claims description 5
- HRSLYNJTMYIRHM-UHFFFAOYSA-N 2-[[4-[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]-2,6-dimethylphenoxy]methyl]oxirane Chemical group CC1=CC(C=2C=C(C)C(OCC3OC3)=C(C)C=2)=CC(C)=C1OCC1CO1 HRSLYNJTMYIRHM-UHFFFAOYSA-N 0.000 claims description 4
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 4
- 239000007822 coupling agent Substances 0.000 claims description 4
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 claims description 4
- 239000000347 magnesium hydroxide Substances 0.000 claims description 4
- 229910001862 magnesium hydroxide Inorganic materials 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 claims description 4
- BLBVJHVRECUXKP-UHFFFAOYSA-N 2,3-dimethoxy-1,4-dimethylbenzene Chemical group COC1=C(C)C=CC(C)=C1OC BLBVJHVRECUXKP-UHFFFAOYSA-N 0.000 claims description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 claims description 3
- 125000002723 alicyclic group Chemical group 0.000 claims description 3
- 239000004844 aliphatic epoxy resin Substances 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 3
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 3
- 150000004780 naphthols Chemical class 0.000 claims description 3
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 claims description 3
- 125000006839 xylylene group Chemical group 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims 2
- 238000000034 method Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000001299 aldehydes Chemical class 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000005350 fused silica glass Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000004898 kneading Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 150000001463 antimony compounds Chemical class 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 239000013638 trimer Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- 0 *c(cc1)ccc1O*=* Chemical compound *c(cc1)ccc1O*=* 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- YGYPMFPGZQPETF-UHFFFAOYSA-N 4-(4-hydroxy-3,5-dimethylphenyl)-2,6-dimethylphenol Chemical group CC1=C(O)C(C)=CC(C=2C=C(C)C(O)=C(C)C=2)=C1 YGYPMFPGZQPETF-UHFFFAOYSA-N 0.000 description 1
- NFVPEIKDMMISQO-UHFFFAOYSA-N 4-[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC=C(O)C=C1 NFVPEIKDMMISQO-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N COc(cc1)ccc1O Chemical compound COc(cc1)ccc1O NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
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- 239000000853 adhesive Substances 0.000 description 1
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- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
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- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
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- 150000001638 boron Chemical class 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
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- 238000007256 debromination reaction Methods 0.000 description 1
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- 238000005695 dehalogenation reaction Methods 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 150000002013 dioxins Chemical class 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
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- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
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- 230000001988 toxicity Effects 0.000 description 1
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- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
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- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
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- 229910052845 zircon Inorganic materials 0.000 description 1
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Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
本発明は、半導体封止用エポキシ樹脂成形材料、特に環境対応の観点から要求されるノンハロゲン系の電子部品封止用エポキシ樹脂成形材料で、耐湿性、耐リフロークラック性など厳しい信頼性を要求されるVLSIの封止用に好適な成形材料及びその成形材料で素子を封止した電子部品に関する。 The present invention is an epoxy resin molding material for semiconductor encapsulation, particularly an epoxy resin molding material for non-halogen electronic components that is required from the viewpoint of environmental friendliness, and is required to have strict reliability such as moisture resistance and reflow crack resistance. The present invention relates to a molding material suitable for sealing VLSI and an electronic component in which an element is sealed with the molding material.
従来から、トランジスタ、ICなどの電子部品用素子の封止の分野ではエポキシ樹脂成形材料が広く用いられている。この理由としては、エポキシ樹脂が電気特性、耐湿性、耐熱性、機械特性、インサート品との接着性などの諸特性にバランスがとれているためである。これらのエポキシ樹脂成形材料の難燃化は主にテトラブロモビスフェノールAのジグリシジルエーテル等のブロム化樹脂と酸化アンチモンの組合せにより行われている。 Conventionally, epoxy resin molding materials have been widely used in the field of sealing electronic device elements such as transistors and ICs. This is because epoxy resins are balanced in various properties such as electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesiveness with inserts. The flame retardant of these epoxy resin molding materials is mainly performed by a combination of a brominated resin such as dibromocidyl ether of tetrabromobisphenol A and antimony oxide.
近年、環境保護の観点からダイオキシンの問題に端を発し、デカブロムをはじめハロゲン化樹脂についても規制の動きがある。同様にアンチモン化合物も毒性面から規制の動きがあり、電子部品封止用エポキシ樹脂成形材料についても脱ハロゲン化(脱ブロム化)、脱アンチモン化の要求が出てきている。また、プラスチック封止ICの高温放置特性にブロムイオンが悪影響を及ぼすことが知られており、この観点からもブロム化樹脂量の低減が望まれている。
本発明はかかる状況に鑑みなされたもので、高温保管特性の優れた電子部品封止用エポキシ樹脂材料を提供しようとするものである。
In recent years, the problem of dioxins originated from the viewpoint of environmental protection, and there is a movement of regulation for halogenated resins including decabromo. Similarly, antimony compounds are also being regulated from the viewpoint of toxicity, and there is a demand for dehalogenation (debromination) and deantimony formation for epoxy resin molding materials for electronic component sealing. In addition, it is known that bromo ions have an adverse effect on the high-temperature standing characteristics of plastic-encapsulated ICs, and from this viewpoint, it is desired to reduce the amount of brominated resin.
The present invention has been made in view of such circumstances, and an object of the present invention is to provide an epoxy resin material for encapsulating electronic components having excellent high-temperature storage characteristics.
発明者らは上記の課題を解決するために鋭意検討を重ねた結果、特定の難燃剤を配合することにより上記の目的を達成しうることを見いだし、本発明を完成するに至った。 As a result of intensive studies in order to solve the above problems, the inventors have found that the above object can be achieved by blending a specific flame retardant, and the present invention has been completed.
すなわち、本発明は、
(1)(A)1分子中に2個以上のエポキシ基を持つエポキシ樹脂、
(B)1分子中に2個以上のフェノール性水酸基を持つ化合物、
(C)次式(I)で示される環状ホスファゼン化合物、
(D)無機充填剤、
を必須成分とする成形材料であって、(C)成分の含有量は充填剤(D)を除く配合成分の合計量に対して燐原子の量が0.2〜3.0重量%となる量であり、(D)成分の含有量が成形材料全体に対して70重量%以上で、(D)無機充填剤に難燃効果のある無機充填剤を含む電子部品封止用エポキシ樹脂成形材料、
(2)(D)無機充填剤に水酸化アルミニウム、水酸化マグネシウム、硼酸亜鉛から選ばれる1種類以上を含む上記(1)記載の電子部品封止用エポキシ樹脂成形材料、
(3)(C)成分のn個のR及びn個のR’が全てフェニル基である上記(1)または(2)記載の電子部品封止用エポキシ樹脂成形材料、
(4)(C)成分のn個のRとn個のR’のうち2〜4個がヒドロキシフェニル基であり、他の全てがフェニル基である上記(1)または(2)記載の電子部品封止用エポキシ樹脂成形材料、
(5)(C)成分のn個のR及びn個のR’が全てヒドロキシフェニル基である上記(1)または(2)記載の電子部品封止用エポキシ樹脂成形材料、
(6)(A)成分のエポキシ樹脂が4,4’−ビス(2,3−エポキシプロポキシ)−3,3’,5,5’−テトラメチルビフェニル、
フェノール類とアルデヒド類のノボラック樹脂をエポキシ化したもの、
ビスフェノールA、ビスフェノールF、ビスフェノールS、アルキル置換ビフェノールのジグリシジルエーテル、
グリシジルアミン型エポキシ樹脂、
線状脂肪族エポキシ樹脂及び
脂環族エポキシ樹脂の何れかを少なくとも含む上記(1)〜(5)記載のいずれかの電子部品封止用エポキシ樹脂成形材料、
(7)(B)成分が、フェノール類又はナフトール類とアルデヒド類とを酸性触媒下で縮合又は共縮合させて得られる樹脂、
ポリパラビニルフェノール樹脂、
フェノール類とジメトキシパラキシレンから合成されるキシリレン基を有するフェノール・アラルキル樹脂
の何れかを少なくとも含む上記(1)〜(6)記載のいずれかの電子部品封止用エポキシ樹脂成形材料、
(8)更にカップリング剤を含む上記(1)〜(7)記載のいずれかの電子部品封止用エポキシ樹脂成形材料、
(9)(C)成分のnが3である上記(1)〜(8)記載のいずれかの電子部品封止用エポキシ樹脂成形材料、
(10)上記(1)〜(9)記載のいずれかの電子部品封止用エポキシ樹脂成形材料により素子を封止して得られる電子部品、
である。
That is, the present invention
(1) (A) an epoxy resin having two or more epoxy groups in one molecule;
(B) a compound having two or more phenolic hydroxyl groups in one molecule;
(C) a cyclic phosphazene compound represented by the following formula (I):
(D) inorganic filler,
In which the content of the component (C) is such that the amount of phosphorus atoms is 0.2 to 3.0% by weight with respect to the total amount of the blending components excluding the filler (D). An epoxy resin molding material for sealing electronic components, which contains an inorganic filler having a flame retardant effect in the inorganic filler, wherein the content of the component (D) is 70% by weight or more with respect to the whole molding material ,
(2) (D) The epoxy resin molding material for electronic component sealing according to (1), wherein the inorganic filler contains one or more selected from aluminum hydroxide, magnesium hydroxide, and zinc borate,
(3) The epoxy resin molding material for sealing an electronic component according to the above (1) or (2), wherein n R and n R ′ of the component (C) are all phenyl groups,
(4) The electron according to the above (1) or (2), wherein 2 to 4 of n R and n R ′ of the component (C) are hydroxyphenyl groups and all the others are phenyl groups Epoxy resin molding material for component sealing,
(5) The epoxy resin molding material for sealing electronic parts according to the above (1) or (2), wherein n R and n R ′ in the component (C) are all hydroxyphenyl groups,
(6) The epoxy resin of component (A) is 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5′-tetramethylbiphenyl,
Epoxidized phenol and aldehyde novolak resins,
Bisphenol A, bisphenol F, bisphenol S, diglycidyl ether of alkyl-substituted biphenol,
Glycidylamine type epoxy resin,
The epoxy resin molding material for sealing an electronic component according to any one of the above (1) to (5), comprising at least one of a linear aliphatic epoxy resin and an alicyclic epoxy resin,
(7) (B) component is a resin obtained by condensation or cocondensation of phenols or naphthols and aldehydes under an acidic catalyst,
Polyparavinylphenol resin,
An epoxy resin molding material for sealing an electronic component according to any one of (1) to (6) above, comprising at least one of a phenol / aralkyl resin having a xylylene group synthesized from phenols and dimethoxyparaxylene,
(8) The epoxy resin molding material for electronic component sealing according to any one of (1) to (7), further including a coupling agent,
(9) The epoxy resin molding material for sealing an electronic component according to any one of (1) to (8), wherein n of component (C) is 3.
(10) An electronic component obtained by sealing an element with the epoxy resin molding material for sealing an electronic component according to any one of (1) to (9) above,
It is.
本発明によって得られる電子部品封止用エポキシ樹脂成形材料はノンハロゲン、ノンアンチモンで難燃化を達成でき、これを用いてIC、LSIなどの電子部品を封止すれば成形性が良好であり、耐湿性、高温放置特性などの信頼性に優れた製品を得ることができ、その工業的価値は大である。 The epoxy resin molding material for sealing electronic parts obtained by the present invention can achieve flame retardancy with non-halogen and non-antimony, and if this is used to seal electronic parts such as IC, LSI, the moldability is good, Products with excellent reliability such as moisture resistance and high temperature storage properties can be obtained, and their industrial value is great.
本発明において用いられる(A)成分のエポキシ樹脂としては、電子部品封止用エポキシ樹脂成形材料で一般に使用されているもので特に限定はないが、たとえば、フェノールノボラック型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂をはじめとするフェノール類とアルデヒド類のノボラック樹脂をエポキシ化したもの、ビスフェノールA、ビスフェノールF、ビスフェノールS、アルキル置換ビフェノールなどのジグリシジルエーテル、ジアミノジフェニルメタン、イソシアヌル酸などのポリアミンとエピクロルヒドリンの反応により得られるグリシジルアミン型エポキシ樹脂、オレフィン結合を過酢酸などの過酸で酸化して得られる線状脂肪族エポキシ樹脂、及び脂環族エポキシ樹脂などがあり、これらを適宜何種類でも併用することができる。 The epoxy resin of the component (A) used in the present invention is not particularly limited as it is generally used in an epoxy resin molding material for encapsulating electronic parts. For example, phenol novolak type epoxy resin, orthocresol novolak type Reaction of epichlorhydrin with epoxidized novolak resin of phenols and aldehydes such as epoxy resin, diglycidyl ether such as bisphenol A, bisphenol F, bisphenol S, alkyl-substituted biphenol, diaminodiphenylmethane, isocyanuric acid and the like There are glycidylamine type epoxy resins obtained by oxidization, linear aliphatic epoxy resins obtained by oxidizing olefinic bonds with peracids such as peracetic acid, and alicyclic epoxy resins. It is possible to use.
上記に示したエポキシ樹脂の中で、4,4’−ビス(2,3−エポキシプロポキシ)−3,3’,5,5’−テトラメチルビフェニルなどのアルキル置換ビフェノール型ジエポキシ樹脂を用いた場合、接着性、吸湿性が良好であり、これにより耐リフロークラック性及び耐湿性に優れた成形材料が得られる。このアルキル置換ビフェノール型ジエポキシ樹脂は、エポキシ樹脂全量に対し60重量%以上使用することが好ましい。60重量%未満では当該エポキシ樹脂の低吸湿性、高接着性の特長が発揮されず、本発明の目的である耐はんだ性に対して効果が小さい。当該エポキシ樹脂としては、4,4’−ビスヒドロキシ3,3’,5,5’−テトラメチルビフェニルをエピクロルヒドリンを用いてエポキシ化して得られるものなどが挙げられる。 Among the epoxy resins shown above, when an alkyl-substituted biphenol type diepoxy resin such as 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5′-tetramethylbiphenyl is used Adhesiveness and hygroscopicity are good, whereby a molding material having excellent reflow crack resistance and moisture resistance can be obtained. The alkyl-substituted biphenol type diepoxy resin is preferably used in an amount of 60% by weight or more based on the total amount of the epoxy resin. If it is less than 60% by weight, the low hygroscopicity and high adhesive properties of the epoxy resin are not exhibited, and the effect on the solder resistance which is the object of the present invention is small. Examples of the epoxy resin include those obtained by epoxidizing 4,4'-bishydroxy 3,3 ', 5,5'-tetramethylbiphenyl with epichlorohydrin.
本発明において用いられる(B)成分の1分子中に2個以上のフェノール性水酸基を有する化合物としては、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールFなどのフェノール類又はα−ナフトール、β−ナフトール、ジヒドロキシナフタレン等のナフトール類とホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、ベンズアルデヒド、サリチルアルデヒド等のアルデヒド類とを酸性触媒下で縮合又は共縮合させて得られる樹脂、ポリパラビニルフェノール樹脂、フェノール類とジメトキシパラキシレンから合成されるキシリレン基を有するフェノール・アラルキル樹脂などがあり、単独又は2種類以上併用してもよい。 As the compound having two or more phenolic hydroxyl groups in one molecule of the component (B) used in the present invention, phenols such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A, bisphenol F, or α-naphthol , Resins obtained by condensation or cocondensation of naphthols such as β-naphthol and dihydroxynaphthalene with aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde and salicylaldehyde under an acidic catalyst, polyparavinylphenol resin, phenol Phenol and aralkyl resins having a xylylene group synthesized from dimethoxyparaxylene, and may be used alone or in combination of two or more.
(A)成分のエポキシ樹脂と(B)成分のフェノール化合物の当量比((B)の水酸基数/(A)のエポキシ基数)は、特に限定はされないが、それぞれの未反応分を少なく抑えるために0.7〜1.3の範囲に設定することが好ましい。 The equivalent ratio of the (A) component epoxy resin and the (B) component phenolic compound (number of hydroxyl groups in (B) / number of epoxy groups in (A)) is not particularly limited, but to keep each unreacted component small. It is preferable to set in the range of 0.7 to 1.3.
また、エポキシ樹脂とフェノール樹脂の硬化反応を促進する硬化促進剤を必要に応じて使用することができる。この硬化促進剤としては、例えば、1,8−ジアザビシクロ(5,4,0)ウンデセン−7などのジアザビシクロアルケン及びその誘導体、トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノールなどの三級アミン類、2−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール、2−ヘプタデシルイミダゾールなどのイミダゾール類、トリブチルホスフィン、メチルジフェニルホスフィン、トリフェニルホスフィンなどの有機ホスフィン類、テトラフェニルホスホニウム・テトラフェニルボレートなどのテトラ置換ホスホニウム・テトラ置換ボレート、2−エチル−4−メチルイミダゾール・テトラフェニルボレート、N−メチルモルホリン・テトラフェニルボレートなどのテトラフェニルボロン塩などがある。 Moreover, the hardening accelerator which accelerates | stimulates hardening reaction of an epoxy resin and a phenol resin can be used as needed. Examples of the curing accelerator include diazabicycloalkenes such as 1,8-diazabicyclo (5,4,0) undecene-7 and derivatives thereof, triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris. Tertiary amines such as (dimethylaminomethyl) phenol, imidazoles such as 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole, tributylphosphine, methyldiphenylphosphine, tri Organic phosphines such as phenylphosphine, tetrasubstituted phosphonium / tetrasubstituted borates such as tetraphenylphosphonium / tetraphenylborate, 2-ethyl-4-methylimidazole / tetraphenylborate Over bets, and the like tetraphenyl boron salts such as N- methylmorpholine tetraphenylborate.
本発明において難燃剤として用いられる(C)成分の環状ホスファゼン化合物は、次式(I)
上記式(I)中のn個のR、R’は同じでも異なっていてもよい炭素数1〜4のアルキル基またはアリール基で、たとえばnが3の3量体6員環の場合にはR、R’は6個の置換基となり、これらは全て同じでも異なっていてもよい。エポキシ樹脂成形材料の耐熱性、耐湿性の観点からはアリール基が好ましい。特にフェニル基であることが好ましく、さらに好ましくはヒドロキシフェニル基である。ヒドロキシフェニル基を導入する場合には、n個のRとn個のR’が全てヒドロキシフェニル基でも良いが、2〜4個の導入が好ましい。ヒドロキシフェニル基の数が5個以上になるとエポキシ樹脂硬化物が脆くなりやすく、2個未満の場合にはエポキシ樹脂の架橋構造に取り込まれない成分がでてくるため、耐熱性が低下しやすい。 In the above formula (I), n R and R ′ may be the same or different and each is an alkyl group or aryl group having 1 to 4 carbon atoms. For example, when n is a trimeric 6-membered ring, R and R ′ are 6 substituents, which may all be the same or different. From the viewpoint of heat resistance and moisture resistance of the epoxy resin molding material, an aryl group is preferred. Particularly preferred is a phenyl group, and more preferred is a hydroxyphenyl group. When a hydroxyphenyl group is introduced, all of n R and n R ′ may be a hydroxyphenyl group, but 2 to 4 are preferably introduced. When the number of hydroxyphenyl groups is 5 or more, the cured epoxy resin is likely to be brittle, and when it is less than 2, a component that is not taken into the crosslinked structure of the epoxy resin appears, so that the heat resistance tends to decrease.
本発明において用いられる(C)成分の環状ホスファゼン化合物の好ましい構造として、たとえば、次の式(II)〜(IV)
(R1〜R6のうち2〜4個は水酸基で、他の4〜2個は水素を示す。)などがあげられる。
Preferred structures of the cyclic phosphazene compound of component (C) used in the present invention include, for example, the following formulas (II) to (IV)
(2 to 4 of R 1 to R 6 are hydroxyl groups, and the other 4 to 2 represent hydrogen).
これらの環状ホスファゼン化合物の添加量は、燐原子の量が充填剤を除く他の全配合成分に対して、0.2〜3.0重量%の範囲内であることが必要である。0.2重量%より少ない場合は難燃効果が発揮されず、3.0重量%を超えた場合は耐湿性の低下を引き起こす。 The addition amount of these cyclic phosphazene compounds needs to be within the range of 0.2 to 3.0% by weight of the phosphorus atom with respect to all other ingredients except the filler. If it is less than 0.2% by weight, the flame retardant effect is not exhibited, and if it exceeds 3.0% by weight, the moisture resistance is lowered.
本発明においては、(C)成分の特定の環状ホスファゼン化合物を用いることで信頼性、成形性の優れたノンハロゲン、ノンアンチモンの難燃性電子部品封止用エポキシ樹脂成形材料を提供するものである。燐化合物と窒素化合物の併用が難燃化に良いことは一般的に知られているが、本発明は優れた信頼性を発揮できる半導体封止用エポキシ樹脂成形材料の難燃剤成分として、燐原子と窒素原子の双方を構造中に含む化合物を提供するものである。 In the present invention, by using a specific cyclic phosphazene compound as the component (C), a non-halogen, non-antimony epoxy resin molding material for sealing flame-retardant electronic components having excellent reliability and moldability is provided. . Although it is generally known that the combined use of a phosphorus compound and a nitrogen compound is good for flame retardancy, the present invention provides a phosphorus atom as a flame retardant component of an epoxy resin molding material for semiconductor encapsulation that can exhibit excellent reliability. And a compound containing both nitrogen atoms in the structure.
また、充填剤としては吸湿性低減及び強度向上の観点から無機充填剤を用いることが必要である。本発明における(D)成分の無機充填剤としては、溶融シリカ、結晶シリカ、アルミナ、ジルコン、珪酸カルシウム、炭酸カルシウム、炭化珪素、窒化ホウ素、ベリリア、ジルコニア、などの粉体、又はこれらを球形化したビーズ、チタン酸カリウム、炭化珪素、窒化珪素、アルミナなどの単結晶繊維、ガラス繊維などを1種類以上配合して用いることができる。さらに、難燃効果のある無機充填剤としては水酸化アルミニウム、水酸化マグネシウム、硼酸亜鉛などが挙げられ、これらを単独または併用して用いることもできる。無機充填剤の配合量としては、吸湿性、線膨張係数の低減及び強度向上の観点から70重量%以上が好ましい。上記の無機充填剤の中で、線膨張係数低減の観点からは溶融シリカが、高熱伝導性の観点からはアルミナが好ましく、充填剤形状は成形時の流動性及び金型摩耗性の点から球形が好ましい。 Moreover, as a filler, it is necessary to use an inorganic filler from a viewpoint of hygroscopic reduction and strength improvement. As the inorganic filler of the component (D) in the present invention, powders such as fused silica, crystalline silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, boron nitride, beryllia, zirconia, or spheres thereof are used. One or more kinds of single crystal fibers such as beads, potassium titanate, silicon carbide, silicon nitride, and alumina, and glass fibers can be blended and used. Furthermore, examples of the inorganic filler having a flame retardant effect include aluminum hydroxide, magnesium hydroxide, zinc borate and the like, and these can be used alone or in combination. The blending amount of the inorganic filler is preferably 70% by weight or more from the viewpoints of hygroscopicity, reduction of linear expansion coefficient, and improvement of strength. Among the above inorganic fillers, fused silica is preferable from the viewpoint of reducing the linear expansion coefficient, and alumina is preferable from the viewpoint of high thermal conductivity, and the filler shape is spherical from the viewpoint of fluidity during molding and mold wear. Is preferred.
その他の添加剤として高級脂肪酸、高級脂肪酸金属塩、エステル系ワックス、ポリオレフィン系ワックスなどの離型剤、カーボンブラックなどの着色剤、エポキシシラン、アミノシラン、ウレイドシラン、ビニルシラン、アルキルシラン、有機チタネート、アルミニウムアルコレートなどのカップリング剤などを用いることができる。 Other additives include higher fatty acids, higher fatty acid metal salts, release agents such as ester wax and polyolefin wax, colorants such as carbon black, epoxy silane, amino silane, ureido silane, vinyl silane, alkyl silane, organic titanate, aluminum A coupling agent such as alcoholate can be used.
本発明における成形材料は、各種原材料を均一に分散混合できるのであれば、いかなる手法を用いても調製できるが、一般的な手法として、所定の配合量の原材料をミキサー等によって十分混合した後、ミキシングロール、押出機等によって溶融混練した後、冷却、粉砕する方法を挙げることができる。 The molding material in the present invention can be prepared by any method as long as various raw materials can be uniformly dispersed and mixed, but as a general method, after sufficiently mixing raw materials of a predetermined blending amount with a mixer or the like, A method of cooling and pulverizing after melt-kneading with a mixing roll, an extruder or the like can be mentioned.
リードフレーム、配線済みのテープキャリア、配線板、ガラス、シリコンウエハなどの支持部材に、半導体チップ、トランジスタ、ダイオード、サイリスタなどの能動素子、コンデンサ、抵抗体、コイルなどの受動素子等の素子を搭載し、必要な部分を本発明の封止用成形材料で封止して、電子部品を製造することができる。このような電子部品としては、たとえば、テープキャリアにバンプで接続した半導体チップを、本発明の成形材料で封止したTCPを挙げることができる。また、配線板やガラス上に形成した配線に、ワイヤーボンディング、フリップチップボンディング、はんだなどで接続した半導体チップ、トランジスタ、ダイオード、サイリスタなどの能動素子及び/又はコンデンサ、抵抗体、コイルなどの受動素子を、本発明の成形材料で封止したCOBモジュール、ハイブリッドIC、マルチチップモジュールなどを挙げることができる。
電子部品を封止する方法としては、低圧トランスファ成形法が最も一般的であるが、インジェクション成形法、圧縮成形法等を用いてもよい。
Mounting elements such as semiconductor chips, transistors, diodes, thyristors and other active elements, capacitors, resistors, passive elements such as coils, etc. on support members such as lead frames, wired tape carriers, wiring boards, glass and silicon wafers And an electronic component can be manufactured by sealing a necessary part with the molding material for sealing of the present invention. As such an electronic component, for example, a TCP in which a semiconductor chip connected to a tape carrier by a bump is sealed with the molding material of the present invention can be cited. Also, active elements such as semiconductor chips, transistors, diodes, thyristors and / or passive elements such as capacitors, resistors, coils, etc. connected to wiring formed on wiring boards or glass by wire bonding, flip chip bonding, solder, etc. Can be mentioned COB modules, hybrid ICs, multichip modules and the like sealed with the molding material of the present invention.
As the method for sealing the electronic component, the low pressure transfer molding method is the most common, but an injection molding method, a compression molding method, or the like may be used.
次に実施例により本発明を説明するが、本発明の範囲はこれらの実施例に限定されるものではない。 EXAMPLES Next, although an Example demonstrates this invention, the scope of the present invention is not limited to these Examples.
実施例1〜6
エポキシ当量200、軟化点67℃のクレゾールノボラック型エポキシ樹脂、エポキシ当量188、融点106℃のビフェニル骨格型エポキシ樹脂(4,4’−ビス(2,3−エポキシプロポキシ)−3,3’,5,5’−テトラメチルビフェニル)、水酸基当量106、軟化点83℃のフェノールノボラック樹脂、水酸基当量167、軟化点70℃のフェノール・アラルキル樹脂(三井東圧製;ミレックスXL−225)、トリフェニルホスフィン、カルナバワックス、カーボンブラック、カップリング剤としてγ−グリシドキシプロピルトリメトキシシラン、溶融シリカ、及び難燃剤として、本発明の(C)成分であり次の構造式で示される化合物1〜化合物3
Cresol novolak type epoxy resin having an epoxy equivalent of 200 and a softening point of 67 ° C., biphenyl skeleton type epoxy resin having an epoxy equivalent of 188 and a melting point of 106 ° C. (4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5 , 5′-tetramethylbiphenyl), a phenol novolak resin having a hydroxyl group equivalent of 106 and a softening point of 83 ° C., a phenol aralkyl resin having a hydroxyl group equivalent of 167 and a softening point of 70 ° C. (Mitsui Toatsu; Millex XL-225), triphenylphosphine , Carnauba wax, carbon black, γ-glycidoxypropyltrimethoxysilane as a coupling agent, fused silica, and flame retardant as component (C) of the present invention, which are represented by the following structural formulas 1 to 3
比較例1、2
難燃剤としてエポキシ当量375、軟化点80℃、臭素含量48重量%のブロム化ビスフェノールA型エポキシ樹脂及び三酸化アンチモンを使用した以外は実施例と同様に、表1に示す配合で比較例1、2の成形材料を作製した。
Comparative Examples 1 and 2
Comparative Example 1 with the formulation shown in Table 1 as in Example, except that brominated bisphenol A type epoxy resin and antimony trioxide having an epoxy equivalent of 375, a softening point of 80 ° C. and a bromine content of 48% by weight were used as flame retardants. 2 molding materials were produced.
実施例及び比較例で得られた成形材料の特性を、次に示す方法で評価した。
(1)熱時硬度
直径100mm、厚さ3mmの円板を成形する金型を使用し、トランスファプレスにて180±3℃、6.9±0.17MPa、90秒の条件で成形材料を成形し、成形直後の成形品の熱時硬度をショア硬度計(Dタイプ)により求めた。
なお、熱時硬度の値は数値が高いほど良いと評価する。
(2)吸水率
JIS−K−6911に準拠した、直径50mm厚さ3mmの円板を作製し、85℃、85%RHの条件で加湿を行い、所定時間後の重量変化から求めた。
(3)接着性
30μmのアルミ箔上に成形材料をトランスファプレスにて180±3℃、6.9±0.17MPa、90秒の条件で成形し、その後、アルミ箔の90度方向へのピール強度を測定した。
(4)難燃性
厚さ1/16インチの試験片を成形する金型を使用し、トランスファプレスにて180±3℃、6.9±0.17MPa、90秒の条件で成形材料を成形し、その後180±5℃、5時間後硬化を行った。評価はUL94−V0試験法に従った。
(5)高温放置特性
外形サイズ5×9(mm)で5μmの酸化膜を有するシリコンサブストレート上にライン/スペースが10μmのアルミ配線を形成したテスト素子を使用して、部分銀メッキを施した42アロイのリードフレームに銀ペーストで接続し、サーモソニック型ワイヤボンダにより200℃で素子のボンディングパッドとインナリードをAu線にて接続した。その後、トランスファ成形により16ピン型DIP(Dual Inline Package)を作製し、得られた試験用ICを200℃の高温槽に保管し、所定時間毎に取り出して導通試験を行い、不良数を調べた。
なお、評価用ICパッケージの成形はトランスファプレスにて180±3℃、6.9±0.17MPa、90秒の条件で成形材料を成形し、その後180±5℃、5時間後硬化を行った。
The properties of the molding materials obtained in Examples and Comparative Examples were evaluated by the following methods.
(1) Hardness when heated Using a mold that molds a disc with a diameter of 100 mm and a thickness of 3 mm, the molding material is molded under conditions of 180 ± 3 ° C, 6.9 ± 0.17 MPa, 90 seconds by transfer press. The hot hardness of the molded product immediately after molding was determined using a Shore hardness meter (D type).
In addition, it is evaluated that the higher the numerical value of the hot hardness, the better.
(2) Water absorption rate A disc having a diameter of 50 mm and a thickness of 3 mm in accordance with JIS-K-6911 was prepared, humidified under conditions of 85 ° C. and 85% RH, and obtained from a change in weight after a predetermined time.
(3) Adhesive The molding material was molded on a 30 μm aluminum foil with a transfer press at 180 ± 3 ° C., 6.9 ± 0.17 MPa for 90 seconds, and then the aluminum foil peeled in the 90 ° direction. The strength was measured.
(4) Flame retardance Using a mold that molds a 1/16 inch thick test piece, the molding material is molded by transfer press under conditions of 180 ± 3 ° C, 6.9 ± 0.17 MPa, 90 seconds. Then, post-curing was performed at 180 ± 5 ° C. for 5 hours. Evaluation followed the UL94-V0 test method.
(5) High temperature storage characteristics Partial silver plating was performed using a test element in which an aluminum wiring with a line / space of 10 μm was formed on a silicon substrate having an outer size of 5 × 9 (mm) and a 5 μm oxide film. A 42 alloy lead frame was connected with silver paste, and a bonding pad and an inner lead of the element were connected with Au wire at 200 ° C. using a thermosonic wire bonder. Thereafter, a 16-pin DIP (Dual Inline Package) was produced by transfer molding, the obtained test IC was stored in a high-temperature bath at 200 ° C., taken out every predetermined time, a continuity test was performed, and the number of defects was examined. .
The evaluation IC package was molded by molding a molding material at 180 ± 3 ° C., 6.9 ± 0.17 MPa, 90 seconds using a transfer press, and then post-cured at 180 ± 5 ° C. for 5 hours. .
得られた評価結果を表2に示す。
本発明の実施例1〜6は、ブロム化樹脂及びアンチモン化合物を含む比較例1、2と較べ高温放置特性が格段に向上している。特に、実施例4〜6はビフェニル骨格型エポキシ樹脂を使用しているため接着性も良好である。本発明の難燃剤を用いた実施例はいずれも高温放置特性が良好で、難燃性にも優れているが、化合物1はエポキシ基と反応可能な官能基を持たないため、これを難燃剤として用いた場合は実施例1及び4に示すように熱時硬度がやや低下する。また、化合物2は6個の置換基が全てエポキシ基と反応可能なヒドロキシフェニル基であるため、これを用いた実施例2及び5は硬化性は良好であるが、接着性がやや低下する。置換基のうち3個がヒドロキシフェニル基である化合物3を使用した実施例3及び6は熱時硬度と接着性のバランスに特に優れる。 Examples 1 to 6 of the present invention have markedly improved high-temperature storage characteristics as compared with Comparative Examples 1 and 2 containing a brominated resin and an antimony compound. In particular, since Examples 4 to 6 use a biphenyl skeleton type epoxy resin, the adhesiveness is also good. Although all the examples using the flame retardant of the present invention have good high-temperature storage characteristics and excellent flame retardancy, since Compound 1 does not have a functional group capable of reacting with an epoxy group, this is used as a flame retardant. As shown in Examples 1 and 4, the hot hardness is slightly reduced. Moreover, since all the 6 substituents are hydroxyphenyl groups which can react with an epoxy group in the compound 2, Examples 2 and 5 using this have good curability, but the adhesiveness is slightly lowered. Examples 3 and 6 using Compound 3 in which three of the substituents are hydroxyphenyl groups are particularly excellent in the balance between hot hardness and adhesiveness.
Claims (7)
(B)1分子中に2個以上のフェノール性水酸基を持つ化合物、
(C)次式(I)で示される環状ホスファゼン化合物、
(D)無機充填剤、
を必須成分とする成形材料であって、(C)成分の含有量は充填剤(D)を除く配合成分の合計量に対して燐原子の量が0.2〜3.0重量%となる量であり、(C)成分のn個のRとn個のR’のうち2〜4個がヒドロキシフェニル基であり、他の全てがフェニル基であり、(D)成分の含有量が成形材料全体に対して70重量%以上で、(D)無機充填剤に難燃効果のある無機充填剤として水酸化アルミニウム、水酸化マグネシウム、硼酸亜鉛から選ばれる1種類以上を含むことを特徴とする電子部品封止用エポキシ樹脂成形材料。 (A) an epoxy resin having two or more epoxy groups in one molecule;
(B) a compound having two or more phenolic hydroxyl groups in one molecule;
(C) a cyclic phosphazene compound represented by the following formula (I):
(D) inorganic filler,
In which the content of the component (C) is such that the amount of phosphorus atoms is 0.2 to 3.0% by weight with respect to the total amount of the blending components excluding the filler (D). (C) 2 to 4 of n R and n R ′ of component (C) are hydroxyphenyl groups, all others are phenyl groups, (D) component content is molded 70% by weight or more based on the whole material, and (D) the inorganic filler contains one or more selected from aluminum hydroxide, magnesium hydroxide and zinc borate as an inorganic filler having a flame-retardant effect. Epoxy resin molding material for sealing electronic parts.
(B)1分子中に2個以上のフェノール性水酸基を持つ化合物、
(C)次式(I)で示される環状ホスファゼン化合物、
(D)無機充填剤、
を必須成分とする成形材料であって、(C)成分の含有量は充填剤(D)を除く配合成分の合計量に対して燐原子の量が0.2〜3.0重量%となる量であり、(C)成分のn個のR及びn個のR’が全てヒドロキシフェニル基であり、(D)成分の含有量が成形材料全体に対して70重量%以上で、(D)無機充填剤に難燃効果のある無機充填剤として水酸化アルミニウム、水酸化マグネシウム、硼酸亜鉛から選ばれる1種類以上を含むことを特徴とする電子部品封止用エポキシ樹脂成形材料。 (A) an epoxy resin having two or more epoxy groups in one molecule;
(B) a compound having two or more phenolic hydroxyl groups in one molecule;
(C) a cyclic phosphazene compound represented by the following formula (I):
(D) inorganic filler,
In which the content of the component (C) is such that the amount of phosphorus atoms is 0.2 to 3.0% by weight with respect to the total amount of the blending components excluding the filler (D). an amount, (C) an n-number of R and n number of R 'are all hydroxyphenyl groups of component, (D) in a content of components 70% by weight or more relative to the entire molding material, (D) An epoxy resin molding material for encapsulating electronic parts, comprising at least one selected from aluminum hydroxide, magnesium hydroxide and zinc borate as an inorganic filler having a flame-retardant effect in the inorganic filler.
フェノール類とアルデヒド類のノボラック樹脂をエポキシ化したもの、
ビスフェノールA、ビスフェノールF、ビスフェノールS、アルキル置換ビフェノールのジグリシジルエーテル、
グリシジルアミン型エポキシ樹脂、
線状脂肪族エポキシ樹脂及び
脂環族エポキシ樹脂の何れかを少なくとも含む請求項1〜2各項記載のいずれかの電子部品封止用エポキシ樹脂成形材料。 The epoxy resin as component (A) is 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5′-tetramethylbiphenyl,
Epoxidized phenol and aldehyde novolak resins,
Bisphenol A, bisphenol F, bisphenol S, diglycidyl ether of alkyl-substituted biphenol,
Glycidylamine type epoxy resin,
The epoxy resin molding material for electronic component sealing according to any one of claims 1 to 2, comprising at least one of a linear aliphatic epoxy resin and an alicyclic epoxy resin.
ポリパラビニルフェノール樹脂、
フェノール類とジメトキシパラキシレンから合成されるキシリレン基を有するフェノール・アラルキル樹脂
の何れかを少なくとも含む請求項1〜3各項記載のいずれかの電子部品封止用エポキシ樹脂成形材料。 (B) resin obtained by condensing or co-condensing phenols or naphthols and aldehydes under an acidic catalyst,
Polyparavinylphenol resin,
The epoxy resin molding material for electronic component sealing according to any one of claims 1 to 3, comprising at least one of a phenol-aralkyl resin having a xylylene group synthesized from phenols and dimethoxyparaxylene.
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