JP3968438B2 - Method for forming organic film by light treatment - Google Patents
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Description
本発明は、金属基体の表面改質方法及びその製品に関するものであり、更に詳しくは、金属基体上に形成する有機皮膜の密着性及び有機皮膜による防食性の向上と、有機分子が基体金属の酸化膜に結合するときの結合欠陥を極めて少なくすることにより有機皮膜の密着性及び防食性を著しく向上させることを可能とする新規金属皮膜の形成方法等に関するものである。
本発明は、例えば、鉄、鉄鋼、ステンレス鋼、ニッケル基合金、銅、アルミニウム、及びそれらの合金からなる金属基体に、有機皮膜を形成して表面改質を行い、その防食性を向上させる有機皮膜の形成方法及び表面改質方法の技術分野において、金属基体上の有機皮膜の密着性及び防食性を著しく向上させることが可能な新規有機皮膜の形成方法、表面改質方法及びその高防食性金属製品を提供するものとして有用である。
The present invention relates to a method for surface modification of a metal substrate and a product thereof. More specifically, the present invention relates to an improvement in adhesion of an organic film formed on a metal substrate and an anticorrosion property by the organic film, The present invention relates to a method for forming a novel metal film that can remarkably improve the adhesion and anticorrosion properties of an organic film by extremely reducing bond defects when bonded to an oxide film.
The present invention provides, for example, an organic film on a metal substrate made of iron, steel, stainless steel, nickel-base alloy, copper, aluminum, and alloys thereof to form an organic film to improve the corrosion resistance. In the technical fields of film formation methods and surface modification methods, novel organic film formation methods, surface modification methods and their high anticorrosion properties that can significantly improve the adhesion and corrosion resistance of organic coatings on metal substrates Useful for providing metal products.
これまで、例えば、クラックのない均質な金属酸化物薄膜を形成させる方法として、先行文献では、金属塩及び不飽和有機化合物溶媒を含む溶液から調製された金属酸化物を形成する際に、不飽和有機化合物溶媒を除去するために、紫外線が使われている(特許文献1)。また、他の文献では、良好な光触媒性親水性被膜を得るために、撥水性シリコンに起因する汚れを除去する際に、紫外線を照射することが提案されている(特許文献2)。また、他の文献では、半導体製造装置において、エッチングをしにくくする方法として、250nm以下の紫外線を照射する方法が提案されている(特許文献3)。しかし、これらの方法では、基体金属の酸化物と選択的に密着性の高い有機皮膜を形成することは全く考えられていない。 Up to now, for example, as a method of forming a homogeneous metal oxide thin film without cracks, in the prior literature, when forming a metal oxide prepared from a solution containing a metal salt and an unsaturated organic compound solvent, In order to remove the organic compound solvent, ultraviolet rays are used (Patent Document 1). In another document, in order to obtain a good photocatalytic hydrophilic coating, it has been proposed to irradiate ultraviolet rays when removing dirt caused by water-repellent silicon (Patent Document 2). In another document, a method of irradiating ultraviolet rays of 250 nm or less is proposed as a method for making etching difficult in a semiconductor manufacturing apparatus (Patent Document 3). However, in these methods, it is not considered at all to form an organic film having high adhesion selectively with the base metal oxide.
また、他の文献では、ケイ素、ゲルマニウム、スズ、チタン、ジルコニムの基体の表面改質方法及び有機薄膜の製造方法として、これらに紫外線を照射する方法が提案されている(特許文献4)。しかし、この方法では、例えば、鉄、鉄鋼、ステンレス鋼、ニッケル基合金、銅、アルミニウム、及びそれらの合金上にナノスケールの酸化皮膜が形成される際に、紫外線を照射して表面改質した後に、酸化物と選択的に錯形成するヒドロキサム酸基を含む有機薄膜を形成することについては何も想定されていない。 In other literatures, a method of irradiating these with ultraviolet rays has been proposed as a surface modification method for a substrate of silicon, germanium, tin, titanium, and zirconium and a method for producing an organic thin film (Patent Document 4). However, in this method, for example, when a nanoscale oxide film is formed on iron, steel, stainless steel, nickel-base alloy, copper, aluminum, and alloys thereof, the surface was modified by irradiation with ultraviolet rays. Nothing is envisaged later on to form organic thin films containing hydroxamic acid groups that selectively complex with oxides.
また、他の文献では、有機酸金属塩及び有機金属錯体を含む溶液を基板上に塗布した後に、紫外線照射を行って、金属酸化物薄膜を製造する方法が提案されている(特許文献5)。しかし、この方法では、金属地金上に金属酸化膜が形成される時、又は、酸化膜が形成して安定化する前又は結晶化する前をねらって、紫外線を照射し、効果的に表面改質してから防食性の向上を目的とする有機皮膜を形成することについては何も述べられていない。 In another document, a method of producing a metal oxide thin film by applying a solution containing an organic acid metal salt and an organic metal complex on a substrate and then irradiating with ultraviolet rays is proposed (Patent Document 5). . However, in this method, when the metal oxide film is formed on the metal ingot, or before the oxide film is formed and stabilized or before it is crystallized, the surface is effectively irradiated with ultraviolet rays. Nothing is said about forming an organic film for the purpose of improving anticorrosion properties after modification.
また、他の文献では、シリコンウェーハ表面を原子的レベルで平坦化し、酸化膜の絶縁破壊特性を向上する方法として、ふっ酸水溶液中で紫外線を照射する技術が提案されている(特許文献6)。しかし、この方法では、半導体とは全く異なる、例えば、鉄、鉄鋼、ステンレス鋼、ニッケル基合金、銅、アルミニウム、及びそれらの合金上に大気中で形成される酸化皮膜に有機分子が結合するときの結合欠陥を少なくすることについては何も想定されておらず、しかも、大気中で紫外線を照射することも全く想定されていない。 In another document, as a method for flattening the surface of a silicon wafer at an atomic level and improving the dielectric breakdown characteristics of an oxide film, a technique of irradiating ultraviolet rays in a hydrofluoric acid aqueous solution is proposed (Patent Document 6). . However, this method is completely different from semiconductors, for example, when organic molecules bind to oxide films formed in the atmosphere on iron, steel, stainless steel, nickel-base alloys, copper, aluminum, and their alloys. There is no assumption about reducing the bonding defects, and no irradiation with ultraviolet rays in the atmosphere is assumed.
更に、他の文献では、孔食の発生を抑制するために紫外線を照射するとき、8mW/cm2 以上の強い紫外線照射が有効で、1.4mW/cm2 以下ではあまり効果がないことが明らかにされている(非特許文献1)。しかし、ここでは、金属基体上に形成する有機皮膜の密着性等の向上に紫外線照射が有効であること、及び、例えば、1.1mW/cm2 の紫外線強度でも有機皮膜の防食性向上に非常に効果的であることについては何も想定されていない。
このような状況の中で、本発明者らは、上記従来技術に鑑みて、基体金属に有機皮膜を形成する際に、基体金属上の空気酸化膜や不動態皮膜への強い密着性と防食性を持つ有機皮膜を形成する技術を確立することを目標として鋭意研究を積み重ねた結果、金属地金上に金属酸化膜が形成される時、又は酸化膜が形成して安定化又は結晶化する前をねらって、紫外線を照射し、表面改質してから防食性向上を目的とするヒドロキサム酸基を含む有機皮膜を形成すると、その皮膜の密着性と防食性が著しく向上することを見出し、この知見に基づいて、本発明を完成するに至った。 Under such circumstances, in view of the above prior art, the present inventors, when forming an organic film on the base metal, have strong adhesion to the air oxide film or passive film on the base metal and anticorrosion. As a result of intensive research with the goal of establishing a technology for forming an organic film with the property, a metal oxide film is formed on a metal ingot, or an oxide film is formed and stabilized or crystallized. Aiming at the front, when forming an organic film containing hydroxamic acid groups for the purpose of improving the anticorrosion after irradiating with ultraviolet rays and surface modification, it has been found that the adhesion and anticorrosion of the film are significantly improved, Based on this finding, the present invention has been completed.
本発明は、大きい装置、高価な装置又は真空など特殊な環境を必要とせず、大気中において、簡単に、しかも、例えば、1.1mW/cm2 と従来よりも弱くて経済的な紫外線ランプを用いて有機皮膜に極めて高い防食性を付与することを可能とする新規有機皮膜形成技術を提供することを目的とするものである。 The present invention does not require a special environment such as a large device, an expensive device, or a vacuum, and can easily and in an atmosphere, for example, an ultraviolet lamp of 1.1 mW / cm 2 , which is weaker and more economical than the conventional one. It is an object of the present invention to provide a novel organic film forming technique that can be used to impart extremely high corrosion resistance to an organic film.
上記課題を解決するための本発明は、以下の技術的手段から構成される。
(1)金属基体上に形成する有機皮膜の密着性及び防食性を向上させる有機皮膜の形成方法であって、1)金属基体上の空気酸化膜や水酸化物を除去して金属地金を露出させ、2)その後、金属酸化膜及び/又は水酸化膜が自然に形成される時、あるいは水溶液中で不動態皮膜を形成させ、空気中において安定化又は結晶化する前に、これに紫外線を照射することにより表面改質を行い、3)次いで、金属基体にヒドロキサム酸基を有する有機皮膜を形成することにより、有機皮膜の密着性及び防食性を向上させる、ことを特徴とする、有機皮膜の形成方法。
(2)カソード還元又は機械研磨により、金属基板上の空気酸化膜や水酸化物を除去して金属地金を露出させる、前記(1)記載の方法。
(3)金属地金を露出させ、その後に、酸化膜及び/又は水酸化膜が自然に形成される時、紫外線を照射する、前記(1)記載の方法。
(4)金属製造時の溶融金属が空冷又は水冷により凝固する過程で、紫外線を照射することにより形成される自然酸化膜で表面改質を行う、前記(1)記載の方法。
(5)金属を不動態化処理して原子レベルで平坦な表面が形成されつつあり、その表面が完全に結晶化する前に、紫外線を照射する、前記(1)記載の方法。
(6)金属基体を、ヒドロキサム酸基を有する有機分子を含む有機溶媒に浸漬して、自己組織化皮膜を形成する、前記(1)記載の方法。
(7)金属地金の表面に、波長150〜400nmの紫外線を、0.5〜50mW/cm2の紫外線強度となるように照射する、前記(1)記載の方法。
(8)末端基として疎水性基を、基板との結合基としてヒドロキサム酸を含む有機皮膜を形成する、前記(1)記載の方法。
(9)前記(1)から(8)のいずれかに記載の方法で金属を不動態化処理して原子レベルで平坦な表面を有する金属基体上にヒドロキサム酸基を有する有機皮膜を形成して、有機皮膜の密着性及び防食性を向上させたことを特徴とする防食用金属製品。
(10)有機皮膜が、長鎖アルキル基をもう一方の末端基として有する、前記(9)記載の金属製品。
(11)有機皮膜が、金属基体上の酸化膜又は不動態膜と、該有機皮膜の有する金属基体との結合基であるヒドロキサム酸基により選択的に錯形成して結合した構造を有する、前記(10)記載の金属製品。
The present invention for solving the above-described problems comprises the following technical means.
(1) A method for forming an organic film that improves the adhesion and anticorrosion properties of an organic film formed on a metal substrate, and 1) removes an air oxide film or hydroxide on the metal substrate to form a metal ingot. 2) After that, when the metal oxide film and / or hydroxide film is spontaneously formed, or before a passive film is formed in an aqueous solution and stabilized or crystallized in air, it is exposed to ultraviolet light. 3) Next, the adhesion and corrosion resistance of the organic film are improved by forming an organic film having a hydroxamic acid group on the metal substrate. Method for forming a film.
(2) The method according to (1), wherein the metal ingot is exposed by removing the air oxide film or hydroxide on the metal substrate by cathode reduction or mechanical polishing.
(3) The method according to (1) above, wherein the metal ingot is exposed, and thereafter, when an oxide film and / or a hydroxide film is naturally formed, ultraviolet irradiation is performed.
(4) The method according to (1) above, wherein the surface modification is performed with a natural oxide film formed by irradiating with ultraviolet rays in the process of solidifying the molten metal by air cooling or water cooling during metal production.
(5) The method according to (1), wherein a metal is passivated to form a flat surface at an atomic level, and the surface is irradiated with ultraviolet rays before the surface is completely crystallized.
(6) The method according to (1) above, wherein the metal substrate is immersed in an organic solvent containing an organic molecule having a hydroxamic acid group to form a self-assembled film.
(7) The method according to (1) above, wherein the surface of the metal ingot is irradiated with ultraviolet light having a wavelength of 150 to 400 nm so as to have an ultraviolet intensity of 0.5 to 50 mW / cm 2 .
(8) The method according to (1) above, wherein an organic film containing a hydrophobic group as a terminal group and hydroxamic acid as a bonding group with a substrate is formed.
(9) A metal is passivated by the method according to any one of (1) to (8) to form an organic film having a hydroxamic acid group on a metal substrate having a flat surface at an atomic level. A metal product for anticorrosion characterized by improving the adhesion and anticorrosion properties of the organic film.
(10) The metal product according to (9), wherein the organic film has a long-chain alkyl group as the other terminal group.
(11) The organic film has a structure in which an oxide film or a passive film on a metal substrate and a hydroxamic acid group, which is a bonding group between the metal substrate of the organic film, are selectively complexed and bonded. (10) Metal product as described.
次に、本発明について更に詳細に説明する。
本発明の有機皮膜形成方法は、(1)金属基体上の空気酸化膜や水酸化物を除去して金属地金を露出させる、(2)その後、これに紫外線を照射することにより表面改質を行う、(3)次いで、金属基体に有機皮膜を形成する、(4)上記(1)〜(3)により、有機皮膜の密着性及び防食性を向上させる、ことを特徴とするものである。
本発明では、酸性水溶液又は中性水溶液中でのカソード還元又は機械的研磨などにより、通常、金属表面に存在する空気酸化膜や水酸化物を除去し、金属地金を露出させる。その後に、金属酸化膜及び/又は水酸化膜が自然に形成される時、あるいは水溶液中で不動態皮膜を形成させ、空気中において安定化又は結晶化する前、すなわち、皮膜形成後24時間以内、好ましくは1時間以内をねらって、紫外線を照射する。この場合、照射する紫外線としては、例えば、254nm、1.1mW/cm2 という、従来、効果がないとされていた、紫外線強度が極めて弱い紫外線を用いることが可能であり、それでも効果的な表面改質が行われる。次いで、その改質された金属表面を、防食性有機分子、好適には、例えば、ヒドロキサム酸基を有する防食性有機分子を含む有機溶媒に浸漬して1時間から24時間放置する。この浸漬中に、ヒドロキサム酸基が錯形成により金属酸化物又は水酸化物と選択的に結合して自己組織化皮膜が形成される。
Next, the present invention will be described in more detail.
The organic film forming method of the present invention includes (1) removing the air oxide film and hydroxide on the metal substrate to expose the metal ingot, and (2) then surface-modifying by irradiating it with ultraviolet rays. (3) Next, an organic film is formed on the metal substrate. (4) The adhesion and corrosion resistance of the organic film are improved by the above (1) to (3). .
In the present invention, the metal oxide is exposed by removing the air oxide film or hydroxide usually present on the metal surface by cathodic reduction or mechanical polishing in an acidic aqueous solution or neutral aqueous solution. Thereafter, when the metal oxide film and / or hydroxide film is naturally formed, or before a passive film is formed in an aqueous solution and stabilized or crystallized in air, that is, within 24 hours after film formation. The irradiation with ultraviolet rays is preferably performed within one hour. In this case, as the ultraviolet ray to irradiate, for example, 254 nm, 1.1 mW / cm 2 , which has hitherto been considered to be ineffective, can be used. Modification is performed. Then, the modified metal surface is immersed in an anticorrosive organic molecule, preferably, for example, an organic solvent containing an anticorrosive organic molecule having a hydroxamic acid group, and left for 1 to 24 hours. During this immersion, hydroxamic acid groups are selectively combined with metal oxides or hydroxides by complex formation to form a self-assembled film.
この皮膜を、ホウ酸水溶液など中性溶液中で防食性又は電位変動に対する密着性を評価する。皮膜を、例えば、1mM有機溶媒中で形成すると、紫外線処理をしない表面に皮膜形成した場合には、数回の電位走査でほとんどの有機分子が表面から離脱してしまい、全く防食性を失ってしまうが、弱い紫外線を1時間照射するだけで、6倍以上高い防食性を示し、20回以上電位走査しても2倍以上の防食性を維持し続ける、という従来にない高い防食性と密着性をもたらす。これらは、特に大きな装置、高価な装置、真空などの特殊な環境を使わずに、大気中で、廉価な紫外線ランプを用いるだけで容易に得られるものである。 This film is evaluated for corrosion resistance or adhesion to potential fluctuations in a neutral solution such as an aqueous boric acid solution. For example, when the film is formed in a 1 mM organic solvent, when the film is formed on the surface not subjected to ultraviolet treatment, most of the organic molecules are detached from the surface by several potential scans, and the anticorrosion property is completely lost. However, it has an unprecedented high anticorrosion property that shows 6 times higher anticorrosion property by irradiating weak UV light for 1 hour, and maintains 2 times higher anticorrosion property even if it is scanned more than 20 times. Bring sex. These can be easily obtained by using an inexpensive ultraviolet lamp in the atmosphere without using a special environment such as a particularly large apparatus, expensive apparatus or vacuum.
本発明で使用する基体としては、例えば、鉄、鉄鋼、ステンレス鋼、ニッケル基合金、銅、アルミニウム及びそれらの合金が例示されるが、これらに制限されない。本発明は、金属地金に自然に形成される空気酸化膜や化学的又は電気化学的に形成される不動態皮膜に適用可能であり、特に金属や合金を限定しない。また、本発明において、金属基体とは、有機皮膜を形成する被皮膜形成金属基材を意味し、その形態等は特に制限されない。また、本発明では、紫外線としては、例えば、波長254nm、強度1.1mW/cm2 の弱い紫外線ランプでも有機防食剤の防食性を顕著に向上させるが、その範囲は、好適には、例えば、紫外線波長150〜400nm、光源からの50mmにおける紫外線強度0.5〜50mW/cm2 である。 Examples of the substrate used in the present invention include, but are not limited to, iron, steel, stainless steel, nickel-base alloy, copper, aluminum, and alloys thereof. The present invention can be applied to an air oxide film naturally formed on a metal metal or a passive film formed chemically or electrochemically, and is not particularly limited to metals and alloys. Moreover, in this invention, a metal base means the to-be-coated metal base material which forms an organic membrane, The form etc. are not restrict | limited in particular. In the present invention, as the ultraviolet rays, for example, even a weak ultraviolet lamp having a wavelength of 254 nm and an intensity of 1.1 mW / cm 2 significantly improves the anticorrosive property of the organic anticorrosive, but the range is preferably, for example, It has an ultraviolet wavelength of 150 to 400 nm and an ultraviolet intensity of 0.5 to 50 mW / cm 2 at 50 mm from the light source.
また、有機分子としては、酸化物と選択的に錯形成するヒドロキサンム酸基、好適には、例えば、末端基として長鎖アルキル基等の疎水性基を含み、基体との結合基としてヒドロキサム酸を含む有機分子が例示されるが、これに制限されるものではなく、酸化物又は水酸化物と強固な化学結合する官能基を含む物質であれば、同様に使用することができる。すなわち、本発明で使用する有機防食剤としては、基体金属上の酸化物及び/又は水酸化物と選択的に錯形成するヒドロキサム酸基を基体との結合基の一つとするとともに、長鎖のアルキル基など疎水性基をもう一方の末端基とするものが好ましいが、特にこれらに限定されるものではなく、同効の有機防食剤であれば同様に使用することができる。本発明では、表面改質された金属表面を防食性有機分子を含む有機溶媒に浸漬することにより、密着性及び防食性の向上した有機皮膜が形成される。 The organic molecule includes a hydroxamic acid group that selectively forms a complex with an oxide, preferably a hydrophobic group such as a long-chain alkyl group as a terminal group, and a hydroxamic acid as a bonding group with a substrate. Examples of the organic molecules include, but are not limited to, organic substances that can be used in the same manner as long as the substance contains a functional group that is firmly bonded to an oxide or hydroxide. That is, as the organic anticorrosive used in the present invention, a hydroxamic acid group that selectively forms a complex with an oxide and / or hydroxide on a base metal is one of the bonding groups to the base, Those having a hydrophobic group such as an alkyl group as the other terminal group are preferred, but are not particularly limited thereto, and any organic anticorrosive having the same effect can be used in the same manner. In the present invention, an organic film having improved adhesion and anticorrosion properties is formed by immersing the surface-modified metal surface in an organic solvent containing anticorrosive organic molecules.
本発明により、1)金属基体に有機皮膜を形成する際に、従来効果がないとされていた1.1mW/cm2 という弱い紫外線を照射することで著しい有機皮膜の防食性の向上をもたらすことができる、2)紫外線未照射の試料表面に比べて簡単に6倍以上の防食性が向上できる、3)例えば、紫外線未照射では防食性がすぐ失われる1mMの低濃度ヒドロキサム酸防食剤−エタノール溶液中においても、強い防食性皮膜を形成させることができる、4)低濃度の防食剤溶液中で皮膜形成しても、防食効果を強く発現させることができ、それにより、防食剤の消費を2倍以上抑制できる、という格別の効果が奏される。 According to the present invention, 1) When an organic film is formed on a metal substrate, it is possible to significantly improve the corrosion resistance of the organic film by irradiating a weak ultraviolet ray of 1.1 mW / cm 2, which has not been effective in the past. 2) Corrosion protection can easily be improved by 6 times or more compared to the surface of the sample not irradiated with ultraviolet rays. 3) For example, 1 mM low concentration hydroxamic acid anticorrosive agent-ethanol which immediately loses its anticorrosive properties when not irradiated with ultraviolet rays. A strong anticorrosive film can be formed even in a solution. 4) Even if a film is formed in a low concentration anticorrosive solution, the anticorrosive effect can be strongly expressed, thereby reducing the consumption of the anticorrosive. The special effect of being able to suppress more than 2 times is produced.
次に、実施例及び比較例により本発明を具体的に説明するが、本発明は、これらの例によって何ら限定されるものではない。 Next, although an example and a comparative example explain the present invention concretely, the present invention is not limited at all by these examples.
鉄試料を0.1Mホウ酸緩衝水溶液中で30分間電気化学的にカソード還元して空気酸化膜を除去した後、この鉄試料を空気中に取り出して、直ちに紫外線ランプから5cm離して254nmの紫外線を1時間照射した。このときの試料上での紫外線強度は1.1mW/cm2 であった。その試料を、1.0mM(n)−ドデカンヒドロキサム酸−エタノール溶液中に1日間浸漬した。次に、(n)−ドデカンヒドロキサム酸の防食皮膜を形成した試料を、0.1Mホウ酸緩衝水溶液中で−1050〜150mV(SCE)間で電位循環させ(サイクリックボルタモグラム、CV)、サイクル数と各サイクル中における最大電流密度を計測し、図1(d)を得た。空気中に長期間放置されていたままの未処理の試料についても、サイクリックボルタモグラムを計測し、図1(a)を得た。図1に示されるように、この紫外線照射もせず、防食皮膜もない未処理の試料に比べて、紫外線を1時間照射した試料では、サイクル数が1回目では約1/10の電流密度を示し、20回目でも1/2の電流密度となっており、高い防食性と密着性が確認できた。 After the iron sample was electrochemically cathode reduced in 0.1 M borate buffer aqueous solution for 30 minutes to remove the air oxide film, the iron sample was taken out into the air and immediately separated from the ultraviolet lamp by 5 cm, and an ultraviolet ray of 254 nm was obtained. Was irradiated for 1 hour. The ultraviolet intensity on the sample at this time was 1.1 mW / cm 2 . The sample was immersed in a 1.0 mM (n) -dodecane hydroxamic acid-ethanol solution for 1 day. Next, the sample on which the anticorrosive film of (n) -dodecane hydroxamic acid was formed was subjected to potential circulation (cyclic voltammogram, CV) between −1050 to 150 mV (SCE) in a 0.1 M borate buffer aqueous solution, and the number of cycles. And the maximum current density in each cycle was measured, and Fig. 1 (d) was obtained. A cyclic voltammogram was also measured for an untreated sample that had been left in the air for a long time, and FIG. 1A was obtained. As shown in FIG. 1, the sample irradiated with ultraviolet light for 1 hour shows a current density of about 1/10 at the first cycle number, compared to the untreated sample without the ultraviolet irradiation and without the anticorrosion film. The current density was ½ even at the 20th time, and high corrosion resistance and adhesion could be confirmed.
比較例1
空気中に長期間放置されていたままの試料を、1.0mM(n)−ドデカンヒドロキサム酸−エタノール溶液中に1日間浸漬した。次に、(n)−ドデカンヒドロキサム酸の防食皮膜を形成した試料を0.1Mホウ酸緩衝水溶液中で−1050〜150mV(SCE)間で電位循環させ、各サイクルにおける最大電流を計測し、図1(b)を得た。この場合、サイクル数が1回目では試料の電流密度は未処理の試料(図1(a))に比べて若干小さいが、5回目以降では大差なく、防食性はほぼ完全に消失した。この比較例から、1時間の紫外線照射が密着性と防食性の向上に極めて効果的であることが分かる。
Comparative Example 1
The sample that had been left in the air for a long time was immersed in a 1.0 mM (n) -dodecane hydroxamic acid-ethanol solution for 1 day. Next, the sample on which the anticorrosive film of (n) -dodecane hydroxamic acid was formed was potential-circulated in a 0.1 M borate buffer aqueous solution between −1050 and 150 mV (SCE), and the maximum current in each cycle was measured. 1 (b) was obtained. In this case, the current density of the sample at the first cycle was slightly smaller than that of the untreated sample (FIG. 1 (a)), but the corrosion resistance was almost completely lost after the fifth cycle. From this comparative example, it can be seen that 1 hour of ultraviolet irradiation is extremely effective in improving adhesion and corrosion resistance.
鉄試料を0.1Mホウ酸緩衝水溶液中で30分間電気化学的にカソード還元して空気酸化膜を除去した後、この鉄試料を空気中に取り出して、直ちに紫外線ランプから5cm離して254nmの紫外線を4時間照射した。このときの試料上での紫外線強度は1.1mW/cm2 であった。その試料を、1.0mM(n)−ドデカンヒドロキサム酸−エタノール溶液中に1日間浸漬した。次に、(n)−ドデカンヒドロキサム酸の防食皮膜を形成した試料を、0.1Mホウ酸緩衝水溶液中で−1050〜150mV(SCE)間で電位循環させ、各サイクルにおける最大電流密度を計測し、図1(c)を得た。この試料では、紫外線を照射しない場合に比べて、1サイクル目では6倍以上の防食性が認められる。また、この試料は、20サイクル目でも防食皮膜は消失せず、2倍以上の防食性を維持しており、密着性が良いことが分かった。 After the iron sample was electrochemically cathode reduced in 0.1 M borate buffer aqueous solution for 30 minutes to remove the air oxide film, the iron sample was taken out into the air and immediately separated from the ultraviolet lamp by 5 cm, and an ultraviolet ray of 254 nm was obtained. Was irradiated for 4 hours. The ultraviolet intensity on the sample at this time was 1.1 mW / cm 2 . The sample was immersed in a 1.0 mM (n) -dodecane hydroxamic acid-ethanol solution for 1 day. Next, the sample on which the anticorrosive film of (n) -dodecane hydroxamic acid was formed was potential-circulated between −1050 and 150 mV (SCE) in a 0.1 M borate buffer aqueous solution, and the maximum current density in each cycle was measured. 1 (c) was obtained. In this sample, the anticorrosive property of 6 times or more is recognized in the first cycle as compared with the case of not irradiating ultraviolet rays. In addition, it was found that this sample did not lose the anticorrosion film even at the 20th cycle, maintained at least twice the anticorrosion property, and had good adhesion.
鉄を0.1Mホウ酸緩衝水溶液中で30分間電気化学的にカソード還元して空気酸化膜を除去した後、この鉄試料を空気中に取り出して、直ちに紫外線ランプから5cm離して254nmの紫外線を1時間照射した。このときの試料上での紫外線強度は1.1mW/cm2 であった。その試料を、1.2mM(n)−ドデカンヒドロキサム酸−メタノール溶液中に10時間間浸漬した。次に、(n)−ドデカンヒドロキサム酸の防食皮膜を形成した試料を、0.1Mホウ酸緩衝水溶液中で−1050〜150mV(SCE)間で電位循環させ、各サイクルにおける最大電流密度を計測し、図2(c)を得た。この試料は、紫外線照射もせず、防食皮膜もない未処理の試料に比べて、サイクル数が1回目では約1/7以下の電流密度を示し、20回目でも40%以下の電流密度を保ち、高い防食性と密着性を有することが確認できた。 After iron is electrochemically cathodic reduced in 0.1M borate buffer solution for 30 minutes to remove the air oxide film, this iron sample is taken out into the air and immediately separated from the ultraviolet lamp by 5 cm to 254 nm ultraviolet light. Irradiated for 1 hour. The ultraviolet intensity on the sample at this time was 1.1 mW / cm 2 . The sample was immersed in a 1.2 mM (n) -dodecane hydroxamic acid-methanol solution for 10 hours. Next, the sample on which the anticorrosive film of (n) -dodecane hydroxamic acid was formed was potential-circulated between −1050 and 150 mV (SCE) in a 0.1 M borate buffer aqueous solution, and the maximum current density in each cycle was measured. FIG. 2C was obtained. This sample shows a current density of about 1/7 or less at the first cycle number compared to an untreated sample without ultraviolet irradiation and no anticorrosion film, and maintains a current density of 40% or less even at the 20th cycle. It was confirmed that it has high anticorrosion and adhesion.
比較例2
空気中に長期間放置されていたままの試料を、1.2mM(n)−ドデカンヒドロキサム酸−メタノール溶液中に10時間浸漬した。次に、(n)−ドデカンヒドロキサム酸の防食皮膜を形成した試料を、0.1Mホウ酸緩衝水溶液中で−1050〜150mV(SCE)間で電位循環させ、各サイクルにおける最大電流密度を計測し、図2(b)を得た。この場合、サイクル数が1回目では試料は1時間紫外線照射した試料の場合(図2(c))と同等の電流密度を示すものの、それ以降、サイクル数の増加と共に電流密度が急上昇し、3回目では3倍以上高い電流密度に達し、著しく防食性及び密着性が失われた。
Comparative Example 2
The sample that had been left in the air for a long time was immersed in a 1.2 mM (n) -dodecane hydroxamic acid-methanol solution for 10 hours. Next, the sample on which the anticorrosive film of (n) -dodecane hydroxamic acid was formed was potential-circulated between −1050 and 150 mV (SCE) in a 0.1 M borate buffer aqueous solution, and the maximum current density in each cycle was measured. FIG. 2 (b) was obtained. In this case, at the first cycle number, the sample shows the same current density as that of the sample irradiated with ultraviolet rays for 1 hour (FIG. 2 (c)). In the second round, the current density reached 3 times higher, and the corrosion resistance and adhesion were remarkably lost.
以上詳述したように、本発明は、金属基体の防食性を向上させる有機皮膜形成方法に係るものであり、本発明により、極めて簡単に有機皮膜の密着性や防食性を著しく向上させる方法を提供できる。本発明によれば、従来効果がないとされていた1.1mW/cm2 という弱い紫外線でも著しい防食性の向上をもたらすことができる。紫外線未照射の試料表面に比べて簡単に6倍以上の防食性が向上できる。例えば、紫外線未照射では防食性がすぐ失われる1mMの低濃度ヒドロキサム酸防食剤−エタノール溶液中においても、強い防食性皮膜を形成させることができる。低濃度の防食剤溶液中で皮膜形成しても防食効果を強く発現させることができる、それにより、防食剤の消費を2倍以上抑制できる。 As described above in detail, the present invention relates to an organic film forming method for improving the corrosion resistance of a metal substrate. According to the present invention, a method for significantly improving the adhesion and corrosion resistance of an organic film is extremely simple. Can be provided. According to the present invention, even a weak ultraviolet ray of 1.1 mW / cm 2, which has been considered to be ineffective in the past, can bring about a significant improvement in corrosion resistance. The anticorrosion property can be easily improved by 6 times or more compared with the sample surface not irradiated with ultraviolet rays. For example, a strong anticorrosive film can be formed even in a 1 mM low-concentration hydroxamic acid anticorrosive-ethanol solution, which immediately loses anticorrosive properties when not irradiated with ultraviolet rays. Even if a film is formed in a low-concentration anticorrosive solution, the anticorrosive effect can be strongly expressed, thereby suppressing the consumption of the anticorrosive more than twice.
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