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JP3975862B2 - Power module substrate and manufacturing method thereof - Google Patents
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JP3975862B2 - Power module substrate and manufacturing method thereof - Google Patents

Power module substrate and manufacturing method thereof Download PDF

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Publication number
JP3975862B2
JP3975862B2 JP2002251149A JP2002251149A JP3975862B2 JP 3975862 B2 JP3975862 B2 JP 3975862B2 JP 2002251149 A JP2002251149 A JP 2002251149A JP 2002251149 A JP2002251149 A JP 2002251149A JP 3975862 B2 JP3975862 B2 JP 3975862B2
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Japan
Prior art keywords
substrate
heat sink
insulating substrate
power module
insulating
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JP2004095622A (en
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敏之 長瀬
和明 久保
義幸 長友
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Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Description

【0001】
【発明の属する技術分野】
本発明は、電気自動車や電気車両等、大電圧、大電流を制御する半導体装置に用いられるパワーモジュール用基板に関するものである。
【0002】
【従来の技術】
一般に、この種のパワーモジュール用基板は、基板と、放熱板とを備え、前記基板は、絶縁基板表面側及び裏面側に、回路層及び金属層をそれぞれ備えた構成となっている。ここで、放熱板は一般に、Al合金等により形成され、絶縁基板はAlN等により形成される。これら放熱板と基板とを積層し接合するには、放熱板と絶縁基板との間にはんだ層を形成し、リフロー工程を経て、このはんだ層を溶融硬化させることが一般的である。この際、放熱板と絶縁基板との熱膨張係数の差分及び、放熱板と絶縁基板との間に介装されたはんだ層が硬化する際の収縮挙動に起因して、放熱板に反りが発生し、これにより、絶縁基板が割れ、絶縁不良が発生する、更には、絶縁基板に形成された回路層が破断する問題があった。
【0003】
この問題を解決する手段として、特開平5−144969号公報に、絶縁基板表裏面にスリットを入れ、前記絶縁基板の表面のうちスリット非形成部に限定的に回路層を形成した半導体装置が開示されている。この場合、前述した放熱板に反りが発生して絶縁基板に割れが発生しても、この個所を前記スリットに限定して発生させることができるため、絶縁不良の発生及び回路層の破断発生を抑制することができるというものである。
【0004】
【発明が解決しようとする課題】
しかし、前記解決手段によるパワーモジュール用基板では、回路層が前記スリット非形成部に限定的に形成される構成となるため、絶縁基板表面に形成される回路層の大きさ、すなわち回路設計上の制約を受けることになる。この回路設計上の制約を回避するため、前記スリット付きの絶縁基板表面全体に回路層を形成した場合には、放熱板に反りが発生した際、絶縁基板の前記スリットに割れが発生することになるが、この割れ発生個所の直上面には、回路層を備えた構成となっているため、絶縁不良が発生する場合がある問題があった。さらに、放熱板の反り発生により絶縁基板と回路層との接触界面において剥離が発生する場合や、絶縁基板に割れが発生し、この割れが絶縁基板の水平方向に伸展する場合がある問題があった。
【0005】
本発明は、このような事情を考慮してなされたもので、放熱板の反り発生に起因した絶縁基板の割れ、絶縁不良及び回路層の破断発生を抑制することができるパワーモジュール用基板及びその製造方法を提供することを目的とする。
【0006】
【課題を解決するための手段】
上記課題を解決して、このような目的を達成するために、本発明は以下の手段を提案している。
本発明のパワーモジュール用基板は、放熱板と、該放熱板表面に設けられた基板とを備え、
前記基板は、絶縁基板の表面側及び裏面側に、回路層及び金属層をそれぞれ備えてなるパワーモジュール用基板であって、前記絶縁基板は複数に分割され、該分割された各絶縁基板同士の間に第1の間隙が設けられているとともに、前記回路層は、前記複数に分割された絶縁基板の表面側に連続して配されていることを特徴とする。
【0007】
このパワーモジュール用基板では、絶縁基板が複数に分割され、これら分割された各絶縁基板同士の間に、第1の間隙が設けられた構成となっているため、放熱板と基板とを積層接合するに際し、これらの間に介装されたはんだ層又はろう付け用箔が硬化する際の収縮挙動と、放熱板と絶縁基板との熱膨張係数の差分とにより発生する放熱板の反りに起因した回路層の破断発生を抑制することができる。すなわち、前述した要因により放熱板に反りが発生しても、これに伴う各絶縁基板の変形量を最小限に抑制し、絶縁基板の割れ発生を抑制することができるため、回路層の破断発生を抑制することができる。
【0008】
また、本発明のパワーモジュール用基板は、前記放熱板の表面には、前記第1の間隙の配設位置に対応して、溝部が形成されていることを特徴とする。
【0009】
このパワーモジュール用基板では、放熱板の表面に、前記第1の間隙の配設位置に対応して、溝部が形成されているため、回路層と放熱板との絶縁不良の発生を抑制することができる。すなわち、分割された各絶縁基板同士の間に、間隙が設けられ、これら絶縁基板の表面に回路層が一体に設けられた構成において、前記間隙上に配設された回路層と、放熱板との間には空間が配設されるのみで、絶縁材は配設されていない構成となっている。しかし、前記空間と相対する放熱板表面には、前記第1の間隙の配設位置と対応して溝部が形成されているため、回路層表面と放熱板表面との距離を、回路層と放熱板との絶縁性を確保できるに足りる構成にすることができる。これにより、前記絶縁性を確保できる回路層への許容付加電圧値の低下を最小限に抑え、前述した回路層破断発生抑制効果を奏することができる。
【0010】
また、本発明のパワーモジュール用基板は、前記絶縁基板はAlN、Siアルミナで形成され、前記金属層はAl又はAl合金で形成されていることを特徴とする。
【0011】
本発明のパワーモジュール用基板の製造方法は、放熱板と、該放熱板表面に設けられた基板とを備え、前記基板は、絶縁基板の表面側及び裏面側に、回路層及び金属層をそれぞれ備えてなるパワーモジュール用基板の製造方法であって、前記基板を、前記絶縁基板が複数に分割され、該分割された各絶縁基板同士の間に第1の間隙が設けられるように形成しておき、前記放熱板表面側に前記基板を載置し、これらを加熱接合するに際し、前記第1の間隙の幅、前記各絶縁基板の幅、及び前記加熱接合する際の接合温度が次式、
t≧w・(α1+α2)・T
但し、
t:第1の間隙の幅
w:絶縁基板の幅(但し、抗折強度が500MPa以下の場合は30mm以下、500MPaを超える場合は50mm以下)
α1:放熱板の熱膨張係数
α2:絶縁基板の熱膨張係数
T:接合温度を満たすとともに、前記回路層が、前記複数に分割された絶縁基板の表面側に連続して配されることを特徴とする。
【0012】
このパワーモジュール用基板の製造方法では、前記加熱接合するに際し、前記第1の間隙の幅、すなわち各絶縁基板同士の間隙の幅、これら各絶縁基板の幅、及び接合温度が、前記関係を満たすことになり、この場合、絶縁基板が加熱され、分割された各絶縁基板同士が伸張しても互いに干渉することを防止することができ、製造上の不具合発生を抑制することができる。更に、絶縁基板の幅wを前述のように設定しているので、絶縁基板と金属層との接触界面における剥離発生及び絶縁基板の割れ発生を確実に抑制することができる。
【0013】
【発明の実施の形態】
以下、本発明に係るパワーモジュール用基板及びその製造方法の一実施形態を、図1を参照しながら説明する。
【0014】
図1に示すように、パワーモジュール用基板1は、放熱板2と、放熱板2の表面に設けられた基板8とを備え、基板8は、絶縁基板3の表面に回路層4を、絶縁基板3の裏面に金属層5をそれぞれ、図示しないろう付け用箔、例えば、Al−Si系箔等を介して積層接着された構成となっている。この構成において、基板8は、金属層5を介して放熱板2表面に設けられている。ここで、放熱板2はAl等で形成され、熱膨張係数は約10.5×10−6/℃以上約25.0×10−6/℃以下であり、絶縁基板3はAlN又はSiで形成され、熱膨張係数は約2.8×10−6/℃以上約7.3×10−6/℃以下であり、回路層4及び金属層5はAl又はAl合金で形成されている。
【0015】
基板8が設けられる放熱板2表面には、2つの溝部11が並列して形成され、これら溝部11は、図2に示すように、幅方向に延在して形成されている。ここで、基板8を構成する金属層5は、図1に示すように、複数に分割され、これら分割された金属層5同士の間には第2の間隙Aが設けられている。これら各金属層5は、放熱板2の前記表面のうち溝部11非形成部に各別に、図示しないはんだ層を介して設けられた構成となっている。
【0016】
また、絶縁基板3は複数に分割され、これら分割された絶縁基板3同士の間に第1の間隙Bが設けられ、これら各絶縁基板3は金属層5の各表面に、図示しないろう付け用箔を介して各別に設けられた構成となっている。さらに、これら各絶縁基板3表面に連続して回路層4が図示しないろう付け用箔を介して設けられ、この回路層4の表面に、はんだ層6を介して半導体チップ7が設けられている。以上の構成において、放熱板2の溝部11、金属層5の第2の間隙A及び絶縁基板3の第1の間隙Bの、パワーモジュール1表面に沿った配設位置は、略一致した構成となっている。
【0017】
以上のように構成されたパワーモジュール用基板1の製造方法について説明する。まず、複数に分割され各別に第1の間隙Bが設けられた絶縁基板3の表面及び裏面に、回路層4及び金属層5をそれぞれ、図示しないろう付け用箔を介して積層し、これらを加熱して前記ろう付け用箔を溶融硬化させ、絶縁基板3の表面側及び裏面側に、回路層4及び金属層5がそれぞれ貼着された基板8を形成する。この際、回路層4は各絶縁基板3表面側に連続して配し、金属層5は各絶縁基板3同士の間に設けられた第1の間隙Bに対応するように、各絶縁基板3裏面側に第2の間隙Aを配して設ける。
【0018】
ここで、放熱板2の一方の表面に溝部11を形成しておき、この放熱板2の前記一方の表面において、溝部11の非形成部にはんだ層を形成し、この各はんだ層表面に、基板8を構成する金属層5がそれぞれ配設されるように、放熱板2の前記一方の表面に基板8を載置する。そして、これらを加熱しはんだ層を溶融硬化させ、放熱板2と基板8とを積層接着し、積層基板9を形成する。
【0019】
ここで、放熱板2と基板8とを積層接着し積層基板9を形成するに際し、第1の間隙(各絶縁基板3同士の間隙)Bの幅t、各絶縁基板の幅w、及び前記加熱接合する際の接合温度Tを次式を満たすように設定する [製法の説明なのでこの表現の方が適切だと思います] 。
t≧w・(α1+α2)・T
例えば、第1の間隙Bの幅tを0.5mm、各絶縁基板の幅wを20mm、放熱板2の熱膨張係数α1を23.5×10−6/℃、絶縁基板3の熱膨張係数α2を4.6×10−6/℃、接合温度Tを600℃とする。ここで、絶縁基板の幅wは、抗折強度が500MPa以下の場合は30mm以下、500MPaを超える場合は50mm以下に設定する。
【0020】
そして、この積層基板9の回路層4にエッチング法により所定のパターンの回路に形成した後、積層基板9の回路層4にはんだ層6を介して半導体チップ7を貼着し、パワーモジュール用基板1を形成する。
【0021】
以上説明したように、本実施形態によるパワーモジュール用基板によれば、絶縁基板3が、複数に分割され、これら分割された各絶縁基板3同士の間に、第1の間隙Bが設けられた構成となっているため、放熱板2と基板8とを積層し接合するに際し、これらの間に介装されたはんだ層が硬化する際の収縮挙動と、放熱板2と絶縁基板3との熱膨張係数の差分とにより発生する放熱板2の反りに起因した回路層4の破断発生を抑制することができる。すなわち、前述した要因により放熱板2に反りが発生しても、絶縁基板3が分割して配設されているため、放熱板2の反りに伴う各絶縁基板3の変形量を最小限に抑制し、これにより、絶縁基板3の割れ発生を抑制することができ、回路層4の破断発生を抑制することができる。
【0022】
また、放熱板2の表面には、絶縁基板3に設けられた第1の間隙Bの配設位置に対応して、溝部11が形成され、金属層5はこれら溝部11の配設位置に対応して、複数に分割されるとともにこれら分割された金属層5同士の間に第2の間隙Aが設けられた構成となっているため、回路層4と放熱板2との絶縁不良の発生を抑制することができる。すなわち、分割された各絶縁基板3同士の間には、第1の間隙Bが設けられ、これら絶縁基板3の表面側に一体に設けられた回路層5のうち、第1の間隙B上に配設された部分は、空間が配設されるのみで、絶縁材は配設されていない構成となっている。しかし、前記空間と相対する放熱板2表面には、絶縁基板3に設けられた第1の間隙Bの配設位置と対応して溝部11が形成されているため、回路層4表面と放熱板2表面との距離を、回路層4と放熱板2の絶縁性を確保できるに足りる構成にすることができる。これにより、前記絶縁性を確保できる回路層4への許容付加電圧値の低下を最小限に抑え、前述の回路層4破断発生抑制効果を奏することができる。
【0023】
また、放熱板2と基板8とを積層接着し積層基板9を形成するに際し、第1の間隙(各絶縁基板3同士の間隙)Bの幅t、各絶縁基板の幅w、及び接合温度Tを前式を満たすように設定しているため、絶縁基板3が加熱され、分割された各絶縁基板3同士が伸張しても互いに干渉することを防止することができ、製造上の不具合発生を抑制することができる。更に、絶縁基板3の幅wを前述のように設定しているので、絶縁基板3と金属層5との接触界面における剥離発生及び絶縁基板3の割れ発生を確実に抑制することができる。
【0024】
なお、本発明の技術的範囲は上記実施の形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲において種々の変更を加えることが可能である。例えば、本実施の形態においては、基板8を形成した後、この基板8と放熱板2とをはんだ層を介して積層接着し、積層基板9を形成したが、放熱板2、ろう付け用箔、金属層5、ろう付け用箔、絶縁基板3、ろう付け用箔、回路層4を順次載置した状態で加熱して、これらを積層接着し積層基板9を形成してもよい。この際、前述した式を満たせば、前記効果が同様に得られることになる。
【0025】
【発明の効果】
以上の説明から明らかなように、本発明に係るパワーモジュール用基板及びその製造方法によれば、放熱板と基板とを積層し接合するに際し、これらの間に介装されたはんだ層が硬化する際の収縮挙動と、放熱板と絶縁基板との熱膨張係数の差分とにより、放熱板に反りが発生しても、絶縁基板が分割して配設されているため、放熱板の反りに伴う各絶縁基板の変形量を最小限に抑制することができる。これにより、絶縁基板の割れ発生を抑制することができ、回路層の破断発生を抑制することができる。
【図面の簡単な説明】
【図1】 本発明の一実施形態として示したパワーモジュール用基板を示す側面断面図である。
【図2】 図1に示すパワーモジュール用基板のX1−X1線矢視断面図である。
【符号の説明】
1 パワーモジュール用基板
2 放熱板
3 絶縁基板
4 回路層
5 金属層
8 基板
11 溝部
A 第2の間隙
B 第1の間隙
t 絶縁基板同士の間隙の幅(第1の間隙の幅)
w 絶縁基板の幅
T 接合温度
α1 放熱板の熱膨張係数
α2 絶縁基板の熱膨張係数
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a power module substrate used in a semiconductor device that controls a large voltage and a large current, such as an electric vehicle and an electric vehicle.
[0002]
[Prior art]
In general, this type of power module substrate includes a substrate and a heat sink, and the substrate includes a circuit layer and a metal layer on the front surface side and the back surface side, respectively. Here, the heat sink is generally formed of an Al alloy or the like, and the insulating substrate is formed of AlN or the like. In order to laminate and bond the heat sink and the substrate, it is common to form a solder layer between the heat sink and the insulating substrate, and to melt and cure the solder layer through a reflow process. At this time, the heat sink is warped due to the difference in thermal expansion coefficient between the heat sink and the insulating substrate and the shrinkage behavior when the solder layer interposed between the heat sink and the insulating substrate is cured. As a result, the insulating substrate is cracked, resulting in poor insulation, and the circuit layer formed on the insulating substrate is broken.
[0003]
As means for solving this problem, Japanese Patent Application Laid-Open No. 5-144969 discloses a semiconductor device in which a slit is formed on the front and back surfaces of an insulating substrate, and a circuit layer is formed only on a non-slit portion of the surface of the insulating substrate. Has been. In this case, even if the heat sink described above is warped and the insulating substrate is cracked, this portion can be limited to the slit, so that an insulation failure and a circuit layer breakage can occur. It can be suppressed.
[0004]
[Problems to be solved by the invention]
However, in the power module substrate according to the above solution, since the circuit layer is limitedly formed in the slit non-forming portion, the size of the circuit layer formed on the surface of the insulating substrate, that is, in circuit design. You will be restricted. In order to avoid this restriction on circuit design, when a circuit layer is formed on the entire surface of the insulating substrate with slits, when the heat sink is warped, the slits of the insulating substrate are cracked. However, there is a problem in that an insulation failure may occur because the circuit layer is provided on the top surface of the cracked portion. In addition, there is a problem that peeling may occur at the contact interface between the insulating substrate and the circuit layer due to warpage of the heat sink, or a crack may occur in the insulating substrate and the crack may extend in the horizontal direction of the insulating substrate. It was.
[0005]
The present invention has been made in consideration of such circumstances, and a substrate for a power module capable of suppressing the occurrence of cracking, insulation failure, and circuit layer breakage due to warpage of a heat sink and its circuit layer. An object is to provide a manufacturing method.
[0006]
[Means for Solving the Problems]
In order to solve the above problems and achieve such an object, the present invention proposes the following means.
The power module substrate of the present invention comprises a heat sink and a substrate provided on the surface of the heat sink,
The substrate is a power module substrate having a circuit layer and a metal layer on the front surface side and the back surface side of the insulating substrate, respectively, and the insulating substrate is divided into a plurality of parts, and the divided insulating substrates are separated from each other. A first gap is provided therebetween, and the circuit layer is continuously arranged on the surface side of the plurality of divided insulating substrates .
[0007]
In this power module substrate, the insulating substrate is divided into a plurality of parts, and the first gap is provided between the divided insulating substrates. In doing so, the solder layer or the brazing foil interposed between them is caused by the shrinkage behavior when the brazing foil is cured and the warpage of the heat sink caused by the difference in the thermal expansion coefficient between the heat sink and the insulating substrate. Breakage of the circuit layer can be suppressed. That is, even if the heat sink is warped due to the above-mentioned factors, the amount of deformation of each insulating substrate accompanying this can be suppressed to the minimum, and the occurrence of cracking of the insulating substrate can be suppressed. Can be suppressed.
[0008]
Further, the power module substrate of the present invention is characterized in that a groove portion is formed on the surface of the heat radiating plate corresponding to the position of the first gap.
[0009]
In this power module substrate, since a groove portion is formed on the surface of the heat radiating plate corresponding to the position of the first gap, the occurrence of poor insulation between the circuit layer and the heat radiating plate is suppressed. Can do. That is, in a configuration in which a gap is provided between each of the divided insulating substrates, and a circuit layer is integrally provided on the surface of these insulating substrates, a circuit layer disposed on the gap, a heat sink, Only a space is provided between them, and no insulating material is provided. However, since a groove is formed on the surface of the heat radiating plate facing the space, corresponding to the position of the first gap, the distance between the circuit layer surface and the surface of the heat radiating plate is set to the distance between the circuit layer and the heat radiating plate. It can be set as the structure which can ensure insulation with a board. Thereby, the fall of the allowable additional voltage value to the circuit layer which can ensure the said insulation can be suppressed to the minimum, and there can exist the above-mentioned circuit layer fracture | rupture generation | occurrence | production suppression suppression effect.
[0010]
In the power module substrate of the present invention, the insulating substrate is made of AlN or Si 3 N 4 alumina, and the metal layer is made of Al or an Al alloy.
[0011]
The method for manufacturing a power module substrate of the present invention includes a heat sink and a substrate provided on the surface of the heat sink, and the substrate includes a circuit layer and a metal layer on the front surface side and the back surface side of the insulating substrate, respectively. A power module substrate manufacturing method comprising: forming the substrate so that the insulating substrate is divided into a plurality of portions, and a first gap is provided between the divided insulating substrates. When placing the substrate on the surface side of the heat sink and heat-bonding them, the width of the first gap, the width of each insulating substrate, and the bonding temperature at the time of heat-bonding are expressed by the following equation:
t ≧ w ・ (α1 + α2) ・ T
However,
t: width of the first gap w: width of the insulating substrate (however, when the bending strength is 500 MPa or less, 30 mm or less, and when it exceeds 500 MPa, 50 mm or less)
α1: Thermal expansion coefficient of the heat sink α2: Thermal expansion coefficient of the insulating substrate T: Joining temperature is satisfied , and the circuit layer is continuously arranged on the surface side of the divided insulating substrate. And
[0012]
In the method for manufacturing a power module substrate, when the heat bonding is performed, the width of the first gap, that is, the width of the gap between the insulating substrates, the width of the insulating substrates, and the bonding temperature satisfy the relationship. In this case, even if the insulating substrate is heated and the divided insulating substrates are stretched, they can be prevented from interfering with each other, and the occurrence of problems in manufacturing can be suppressed. Furthermore, since the width w of the insulating substrate is set as described above, it is possible to reliably suppress the occurrence of peeling and the cracking of the insulating substrate at the contact interface between the insulating substrate and the metal layer.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an embodiment of a power module substrate and a manufacturing method thereof according to the present invention will be described with reference to FIG.
[0014]
As shown in FIG. 1, the power module substrate 1 includes a heat sink 2 and a substrate 8 provided on the surface of the heat sink 2. The substrate 8 insulates the circuit layer 4 on the surface of the insulating substrate 3. Each of the metal layers 5 is laminated and bonded to the back surface of the substrate 3 via a brazing foil (not shown) such as an Al-Si foil. In this configuration, the substrate 8 is provided on the surface of the heat sink 2 via the metal layer 5. Here, the heat sink 2 is made of Al or the like, and has a thermal expansion coefficient of about 10.5 × 10 −6 / ° C. or more and about 25.0 × 10 −6 / ° C. or less, and the insulating substrate 3 is made of AlN or Si 3. N 4 , the thermal expansion coefficient is about 2.8 × 10 −6 / ° C. or more and about 7.3 × 10 −6 / ° C. or less, and the circuit layer 4 and the metal layer 5 are made of Al or Al alloy. ing.
[0015]
Two grooves 11 are formed in parallel on the surface of the heat sink 2 on which the substrate 8 is provided, and these grooves 11 are formed to extend in the width direction as shown in FIG. Here, as shown in FIG. 1, the metal layer 5 constituting the substrate 8 is divided into a plurality of portions, and a second gap A is provided between the divided metal layers 5. Each of these metal layers 5 has a configuration in which the groove 11 is not formed on the surface of the heat radiating plate 2 via a solder layer (not shown).
[0016]
Further, the insulating substrate 3 is divided into a plurality of parts, and a first gap B is provided between the divided insulating substrates 3, and each of these insulating substrates 3 is for brazing (not shown) on each surface of the metal layer 5. It is the structure provided separately through foil. Further, a circuit layer 4 is continuously provided on the surface of each of the insulating substrates 3 via a brazing foil (not shown), and a semiconductor chip 7 is provided on the surface of the circuit layer 4 via a solder layer 6. . In the above configuration, the arrangement positions along the surface of the power module 1 of the groove 11 of the heat sink 2, the second gap A of the metal layer 5, and the first gap B of the insulating substrate 3 are substantially the same. It has become.
[0017]
A method for manufacturing the power module substrate 1 configured as described above will be described. First, a circuit layer 4 and a metal layer 5 are laminated on a front surface and a back surface of an insulating substrate 3 divided into a plurality of portions and provided with a first gap B, respectively, via brazing foils (not shown), By heating, the brazing foil is melt-cured to form a substrate 8 on which the circuit layer 4 and the metal layer 5 are bonded to the front and back sides of the insulating substrate 3, respectively. At this time, the circuit layer 4 is continuously arranged on the surface side of each insulating substrate 3, and the metal layer 5 corresponds to the first gap B provided between the insulating substrates 3. A second gap A is provided on the back side.
[0018]
Here, the groove portion 11 is formed on one surface of the heat radiating plate 2, and a solder layer is formed on the non-formed portion of the groove portion 11 on the one surface of the heat radiating plate 2. The substrate 8 is placed on the one surface of the heat sink 2 such that the metal layers 5 constituting the substrate 8 are respectively disposed. And these are heated, a solder layer is melt-hardened, the heat sink 2 and the board | substrate 8 are laminated | stacked, and the laminated substrate 9 is formed.
[0019]
Here, when the heat sink 2 and the substrate 8 are laminated and bonded to form the laminated substrate 9, the width t of the first gap (the gap between the insulating substrates 3) B, the width w of each insulating substrate, and the heating Set the joining temperature T when joining so as to satisfy the following formula [I think this expression is more appropriate because it explains the manufacturing method].
t ≧ w ・ (α1 + α2) ・ T
For example, the width t of the first gap B is 0.5 mm, the width w of each insulating substrate is 20 mm, the thermal expansion coefficient α1 of the heat sink 2 is 23.5 × 10 −6 / ° C., and the thermal expansion coefficient of the insulating substrate 3. α2 is 4.6 × 10 −6 / ° C., and the junction temperature T is 600 ° C. Here, the width w of the insulating substrate is set to 30 mm or less when the bending strength is 500 MPa or less, and to 50 mm or less when the bending strength exceeds 500 MPa.
[0020]
Then, after a circuit having a predetermined pattern is formed on the circuit layer 4 of the multilayer substrate 9 by an etching method, a semiconductor chip 7 is adhered to the circuit layer 4 of the multilayer substrate 9 via the solder layer 6, and a power module substrate. 1 is formed.
[0021]
As described above, according to the power module substrate according to the present embodiment, the insulating substrate 3 is divided into a plurality of portions, and the first gap B is provided between the divided insulating substrates 3. Therefore, when the heat sink 2 and the substrate 8 are laminated and bonded, the shrinkage behavior when the solder layer interposed between them is cured and the heat of the heat sink 2 and the insulating substrate 3 are obtained. The occurrence of breakage of the circuit layer 4 due to the warp of the heat sink 2 caused by the difference in expansion coefficient can be suppressed. That is, even if the heat sink 2 is warped due to the above-described factors, the insulating substrate 3 is divided and disposed, so that the deformation amount of each insulating substrate 3 due to the warp of the heat sink 2 is minimized. Thus, the occurrence of cracks in the insulating substrate 3 can be suppressed, and the occurrence of breakage in the circuit layer 4 can be suppressed.
[0022]
Further, on the surface of the heat sink 2, grooves 11 are formed corresponding to the positions of the first gaps B provided on the insulating substrate 3, and the metal layer 5 corresponds to the positions of these grooves 11. In addition, since the second gap A is provided between the divided metal layers 5, the insulation failure between the circuit layer 4 and the heat sink 2 is caused. Can be suppressed. That is, a first gap B is provided between the divided insulating substrates 3, and the circuit layer 5 integrally provided on the surface side of these insulating substrates 3 is on the first gap B. The disposed portion is configured such that only a space is disposed and no insulating material is disposed. However, since the groove 11 is formed on the surface of the heat radiating plate 2 facing the space corresponding to the position of the first gap B provided in the insulating substrate 3, the surface of the circuit layer 4 and the heat radiating plate are formed. The distance between the two surfaces can be configured to be sufficient to ensure the insulation between the circuit layer 4 and the heat sink 2. Thereby, the fall of the allowable additional voltage value to the circuit layer 4 which can ensure the said insulation can be suppressed to the minimum, and there can exist the above-mentioned circuit layer 4 fracture | rupture generation | occurrence | production suppression effect.
[0023]
Further, when the heat sink 2 and the substrate 8 are laminated and bonded to form the laminated substrate 9, the width t of the first gap (gap between the insulating substrates 3) B, the width w of each insulating substrate, and the bonding temperature T Is set so as to satisfy the previous equation, it is possible to prevent the insulating substrates 3 from being heated and interfering with each other even if the divided insulating substrates 3 are stretched. Can be suppressed. Furthermore, since the width w of the insulating substrate 3 is set as described above, it is possible to reliably suppress the occurrence of peeling and the cracking of the insulating substrate 3 at the contact interface between the insulating substrate 3 and the metal layer 5.
[0024]
The technical scope of the present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention. For example, in the present embodiment, after the substrate 8 is formed, the substrate 8 and the radiator plate 2 are laminated and bonded via a solder layer to form the laminated substrate 9, but the radiator plate 2, the brazing foil Alternatively, the metal layer 5, the brazing foil, the insulating substrate 3, the brazing foil, and the circuit layer 4 may be heated in a state of being sequentially placed, and these may be laminated and bonded to form the laminated substrate 9. At this time, if the above-described equation is satisfied, the above-described effect can be obtained similarly.
[0025]
【The invention's effect】
As is clear from the above description, according to the power module substrate and the manufacturing method thereof according to the present invention, when the heat sink and the substrate are laminated and bonded, the solder layer interposed therebetween is cured. Even if the heat sink is warped due to the shrinkage behavior at the time and the difference in thermal expansion coefficient between the heat sink and the insulating substrate, the insulating substrate is divided so that the heat sink is warped. The amount of deformation of each insulating substrate can be minimized. Thereby, generation | occurrence | production of the crack of an insulated substrate can be suppressed and generation | occurrence | production of the fracture | rupture of a circuit layer can be suppressed.
[Brief description of the drawings]
FIG. 1 is a side cross-sectional view showing a power module substrate shown as an embodiment of the present invention.
2 is a cross-sectional view taken along line X1-X1 of the power module substrate shown in FIG. 1;
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Power module substrate 2 Heat sink 3 Insulating substrate 4 Circuit layer 5 Metal layer 8 Substrate 11 Groove A Second gap B First gap t Width of gap between insulating substrates (width of first gap)
w Width of insulating substrate T Junction temperature α1 Thermal expansion coefficient of heat sink α2 Thermal expansion coefficient of insulating substrate

Claims (4)

放熱板と、該放熱板表面に設けられた基板とを備え、
前記基板は、絶縁基板の表面側及び裏面側に、回路層及び金属層をそれぞれ備えてなるパワーモジュール用基板であって、
前記絶縁基板は複数に分割され、該分割された各絶縁基板同士の間に第1の間隙が設けられているとともに、前記回路層は、前記複数に分割された絶縁基板の表面側に連続して配されていることを特徴とするパワーモジュール用基板。
A heat sink, and a substrate provided on the surface of the heat sink,
The substrate is a power module substrate comprising a circuit layer and a metal layer on the front surface side and the back surface side of the insulating substrate, respectively.
The insulating substrate is divided into a plurality of portions, a first gap is provided between the divided insulating substrates, and the circuit layer is continuous with the surface side of the divided insulating substrate. Power module substrate characterized by being arranged .
請求項1記載のパワーモジュール用基板において、
前記放熱板の表面には、前記第1の間隙の配設位置に対応して、溝部が形成されていることを特徴とするパワーモジュール用基板。
The power module substrate according to claim 1,
A substrate for a power module, wherein a groove is formed on the surface of the heat radiating plate corresponding to the position of the first gap.
請求項1記載のパワーモジュール用基板において、
前記絶縁基板はAlN又はSiで形成され、前記金属層はAl又はAl合金で形成されていることを特徴とするパワーモジュール用基板。
The power module substrate according to claim 1,
The power module substrate, wherein the insulating substrate is made of AlN or Si 3 N 4 , and the metal layer is made of Al or an Al alloy.
放熱板と、該放熱板表面に設けられた基板とを備え、
前記基板は、絶縁基板の表面側及び裏面側に、回路層及び金属層をそれぞれ備えてなるパワーモジュール用基板の製造方法であって、
前記基板を、前記絶縁基板が複数に分割され、該分割された各絶縁基板同士の間に第1の間隙が設けられるように形成しておき、
前記放熱板表面側に前記基板を載置し、これらを加熱接合するに際し、前記第1の間隙の幅、前記各絶縁基板の幅、及び前記加熱接合する際の接合温度が次式、t≧w・(α1+α2)・T但し、t:第1の間隙の幅w:絶縁基板の幅(但し、抗折強度が500MPa以下の場合は30mm以下、500MPaを超える場合は50mm以下)α1:放熱板の熱膨張係数α2:絶縁基板の熱膨張係数T:接合温度を満たすとともに、
前記回路層が、前記複数に分割された絶縁基板の表面側に連続して配されることを特徴とするパワーモジュール用基板の製造方法。
A heat sink, and a substrate provided on the surface of the heat sink,
The substrate is a method for manufacturing a power module substrate comprising a circuit layer and a metal layer on the front side and the back side of an insulating substrate, respectively.
The substrate is formed such that the insulating substrate is divided into a plurality, and a first gap is provided between the divided insulating substrates,
When the substrates are placed on the surface side of the heat sink and are heat-bonded, the width of the first gap, the width of each insulating substrate, and the bonding temperature at the time of heat-bonding are expressed by the following equation: t ≧ w · (α1 + α2) · T where t: width of the first gap w: width of the insulating substrate (however, if the bending strength is 500 MPa or less, 30 mm or less, if it exceeds 500 MPa, 50 mm or less) α1: Thermal expansion coefficient α2 of the heat sink: Thermal expansion coefficient T of the insulating substrate T: While satisfying the junction temperature ,
The method for manufacturing a power module substrate, wherein the circuit layer is continuously arranged on a surface side of the plurality of divided insulating substrates .
JP2002251149A 2002-08-29 2002-08-29 Power module substrate and manufacturing method thereof Expired - Fee Related JP3975862B2 (en)

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