JP4012845B2 - 70/30 brass with refined crystal grains and method for producing the same - Google Patents
70/30 brass with refined crystal grains and method for producing the same Download PDFInfo
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- JP4012845B2 JP4012845B2 JP2003085672A JP2003085672A JP4012845B2 JP 4012845 B2 JP4012845 B2 JP 4012845B2 JP 2003085672 A JP2003085672 A JP 2003085672A JP 2003085672 A JP2003085672 A JP 2003085672A JP 4012845 B2 JP4012845 B2 JP 4012845B2
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- 239000013078 crystal Substances 0.000 title claims description 69
- 229910001369 Brass Inorganic materials 0.000 title claims description 35
- 239000010951 brass Substances 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- 238000000137 annealing Methods 0.000 claims description 102
- 238000005097 cold rolling Methods 0.000 claims description 51
- 238000005482 strain hardening Methods 0.000 claims description 24
- 238000005480 shot peening Methods 0.000 claims description 20
- 238000009749 continuous casting Methods 0.000 claims description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 238000005096 rolling process Methods 0.000 claims description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- 238000000034 method Methods 0.000 description 33
- 239000000463 material Substances 0.000 description 18
- 238000005452 bending Methods 0.000 description 14
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 238000005266 casting Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 238000000635 electron micrograph Methods 0.000 description 4
- 238000005098 hot rolling Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 229910000906 Bronze Inorganic materials 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 239000010974 bronze Substances 0.000 description 3
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
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Description
【0001】
【発明の属する技術分野】
本発明は、端子、コネクタ、リレー、バネ等に用いられる結晶粒を微細化した70/30黄銅(JIS合金 C2600)とその製造方法に関する。
【0002】
【従来の技術】
端子、コネクタ、リレー、バネ等に用いられる金属材料としては、銅、黄銅、リン青銅等がある。
【0003】
銅は、導電性に優れているため、端子の場合、クローズドバレルの端子に使用されている。一方、リン青銅は、バネ性に優れているため、小型の端子、コネクタ、バネに使用されているが、導電率が低く、価格が高い等の問題点がある。
【0004】
これに対し、黄銅は、価格が銅およびリン青銅より安いという利点を有し、また、バネ用としても利用可能であり、導電率はやや低いが、機械的性質についての問題が少なく、加工性が良く、大量生産に向いている等の利点がある。
【0005】
黄銅の材質としては、70/30黄銅(JIS合金 C2600)が、主としてオープンバレルの端子用として、また最近では、連鎖状端子のような大量生産向けとして、使用されている。端子またはコネクタ用黄銅として要求される品質特性は、
1.表面が良好であること、
2.寸法および形状が、均一で安定していること、
3.引張強さ、伸び、硬度、耐力等の機械的性質が、均一で安定していること、
4.結晶粒度が、均一で、できるだけ微細な結晶組織であること、
5.端子またはコネクタ用として加工される場合、製品の形状が安定しており、かつ、組み付けの際の挿入力(かん合力)や、引抜力(離脱力)が安定しており、さらに、曲げ特性にも優れていること、等である。
【0006】
特に、オープンバレルの連鎖状端子で、めす型端子の場合、結晶粒度が均一で、かつ微細であれば、端子の形状が安定し、かつ、組み付けの際の挿入力(かん合力)が安定する傾向がある。また、結晶粒度がより微細になれば、同じ機械的性質を得るには、より低い冷間加工率で製造することが可能となり、結果として、材料の伸びが増加して、曲げ特性が向上することになる。
【0007】
従来、この分野での関連技術や基礎技術としては、銅含有量が60〜65質量%であるが、特開2000−129376号公報に記載されているように、黄銅の強化方法が報告されている。
【0008】
しかし、従来の70/30黄銅の製造方法においては、実際の製造ラインでは、鋳造により得られた鋳塊から最終焼鈍までの圧下率や焼鈍条件を、適宜選択して製造されているが、結晶粒度を5μm以下まで微細化しようとすると、粒度が不均一となる傾向があるため、このような材料を安定して製造することは困難であった。また、得られる材料の結晶粒度も3μm程度が限界であり、最終焼鈍後の結晶が、α相単層で、結晶粒度が2μm以下の微細な結晶粒を有する材料を製造することは困難であった。
【0009】
【特許文献1】
特開2000−129376号公報
【0010】
【発明が解決しようとする課題】
本発明の目的は、これら従来技術の課題である70/30黄銅(JIS合金 C2600)における結晶粒微細化を実現することにより、強度および曲げ特性を向上させた黄銅およびその製造方法を提供することである。
【0015】
【課題を解決するための手段】
本発明の70/30黄銅を製造する第1の方法は、横型連続鋳造で鋳塊を作り、冷間加工率が80%以上の最初の冷間圧延を行い、その後、バッチ式の焼鈍炉による焼鈍温度が300〜350℃の焼鈍および冷間加工率が60%以上の冷間圧延を1回以上行い、さらに、最終焼鈍を行う工程を有することにより、銅68.5質量%〜71.5質量%、不可避不純物を除いて残部亜鉛からなり、結晶粒度が2μm以下のα単相からなる結晶組織で構成される70/30黄銅を得る。その後、最終冷間圧延を行い、結晶粒を微細化することが好ましいが、当該結晶組織は、最終焼鈍材と、該最終焼鈍材を最終冷間圧延した製品とで、実質的に変化がない。なお、2回目以降の冷間圧延における冷間加工率は80%以上とすることが好ましい。
【0016】
また、最初の冷間圧延の前、最初の焼鈍の前、および最初の焼鈍の後のいずれかにおいて、ショットピーニングを施すことが好ましい。
【0017】
最終の焼鈍を、バッチ式焼鈍炉により、焼鈍温度を280〜320℃とするか、最終の焼鈍を、連続焼鈍炉により、焼鈍温度を350〜600℃とすることが好ましい。
【0018】
さらに、前記方法により得られた結晶粒度が2μm以下のα単相の結晶粒である黄銅焼鈍材に、最終冷間圧延を行い、結晶粒をさらに微細化した製品とすることが好ましい。なお、最終冷間圧延は、前記方法により得られた黄銅を調質するためのものであり、その前後でその属性にあまり変化はなく、いずれでも銅68.5質量%〜71.5質量%、不可避不純物を除いて残部亜鉛からなり、結晶粒度が2μm以下のα単相からなる結晶組織で構成される70/30黄銅である。
【0019】
【発明の実施の形態】
本発明者等は、主として、端子、コネクタ用黄銅に用いられている70/30黄銅(JIS合金 C2600)の製造工程において、結晶粒微細化条件を、種々、検討した。
【0020】
結晶粒微細化条件には、初期粒径、冷間加工率、焼鈍温度、焼鈍時間の4つの重要因子があるが、本発明者等は、塩浴(ソルトバス)によって焼鈍した熱処理データをもとに、実験的最適化手法であるNAIS SYSTEM(ナイスシステム)を考案し、検討にあたって用いた。
【0021】
NAIS SYSTEMの概念図を、図1に示す。
【0022】
NAIS SYSTEMとは、これらの4つの因子を決めれば、再結晶粒の平均粒径の推定が可能であり、現在までに蓄積されている358組のデータを関数化し、X1:初期粒経(μm)と、X2:焼鈍温度(℃)、X3:焼鈍時間(s)、X4:冷間加工率(%)とにより、Z:焼鈍後の生成粒経(μm)を推定するシステムである。従って、図1には、初期粒径X1および冷間加工率X4を特定した場合を示している。
【0023】
このように、再結晶粒の平均粒径を予め予測し、実験を進めて、結晶粒度が2μm以下の微細粒を持つ黄銅の製造方法を完成するに至った。
【0024】
本発明の70/30黄銅は、最終冷間圧延を経た製品あるいはその前の最終焼鈍を経た中間品であり、銅68.5質量%〜71.5質量%、不可避不純物を除いて残部亜鉛からなり、結晶粒度が2μm以下のα単相からなる結晶組織で構成される。
【0041】
本発明の70/30黄銅を製造する第1の方法は、横型連続鋳造で鋳塊を作り、冷間加工率が60%以上の冷間圧延および焼鈍を1回以上行い、その後、冷間加工率が60%以上の冷間圧延を施し、最終焼鈍を行う工程を経ることで、結晶粒度が2μm以下のα単相の結晶粒の焼鈍材を得る。最初の冷間圧延の加工率は80%以上が好ましい。
【0042】
第1の製造方法では、鋳塊の製造法が横型連続鋳造法であり、縦型連続鋳造法とは異なる。横型連続鋳造法で製造した鋳塊の板厚は、14〜16mm程度で、比較的薄いため、鋳塊製造後は、冷間圧延から始めることができる。これに対し、縦型連続鋳造法で製造した鋳塊の板厚は、150〜200mmと厚いため、鋳塊製造後は熱間圧延が必要となる。しかし、両鋳造法により製造したそれぞれの鋳塊から、最終的にはいずれも結晶粒度が2μm以下の微細な結晶組織が得られたことから、いずれの鋳造法を採用しても問題はない。
【0043】
具体的には、横型連続鋳造法で14〜16mm程度の鋳塊を作り、冷間加工率が60%以上の冷間圧延を施した後、300〜350℃ 程度で焼鈍を行う。ここで、冷間加工率が60%未満であると、次回の焼鈍での再結晶粒成長が不均一となり、最終板厚での結晶粒を微細、かつ、均一な状態で得ることは難しい。また、冷間加工率を95%以上とすると、加工硬化が激しく、経済的でない。よって、中間段階での加工率は、60〜95%が好ましい。
【0044】
焼鈍温度および焼鈍条件は、使用する設備により適宜選定すればよいが、バッチ式の焼鈍炉を使用する場合は、300〜350℃で1時間程度の焼鈍で目的を達することができる。
【0045】
さらに、所望の板厚になるまで、前記冷間圧延および焼鈍を繰り返す。
【0046】
なお、最終焼鈍の条件は、バッチ式焼鈍の場合は、280〜320℃ 、1〜3時間程度、連続焼鈍の場合は、炉温を350〜550℃程度で数秒間とする。当然ながら、最終温度が前記温度範囲を超えたり、焼鈍時間が長くなりすぎると、結晶粒度が大きくなりすぎ、逆に、温度範囲に達しなかったり、焼鈍時間が短すぎると、再結晶が完全に行われず、加工組織が一部残留した結晶組織となり、本発明の目標を達し得ない。
【0047】
以上、本発明の方法により、結晶粒度が2μm以下のα単相の結晶組織の焼鈍材を得ることができる。
【0048】
本発明の70/30黄銅を製造する第2の方法は、横型連続鋳造で鋳塊を作り、冷間加工率が80%以上の冷間圧延および焼鈍を1回以上行い、その後、冷間加工率が80%以上の冷間圧延を施し、最終焼鈍を行う工程を経ることで、結晶粒度が2μm以下のα単相の結晶粒を得る工程で、最初の冷間圧延の前、最初の焼鈍の前、および最初の焼鈍の後のいずれかにおいて、ショットピーニングを施す。
【0049】
ショットピーニングの条件は、直径0.8mmの鋼球(HRc 62)を、80m/分の速度で10分間投射する。ショットピーニングの目的は、材料表面に大歪加工を与えて、結晶粒の微細化を狙うことにある。
【0050】
具体的には、前記第1の製造方法と同様、横型連続鋳造法で板厚14〜16mm程度の鋳塊を作り、その後、冷間加工率が80%以上の冷間圧延を施した後、300〜350℃程度で焼鈍を行う。ここで、冷間加工率が80%未満であると、次回の焼鈍での再結晶粒成長が不均一となり、最終板厚での結晶粒を微細かつ均一な状態で得ることは難しい。ショットピーニングは、最初の冷間圧延の前、最初の焼鈍の前、および最初の焼鈍の後のいずれかで、施すことが必要である。
【0051】
焼鈍温度および焼鈍条件は、使用する設備により適宜、選定すればよいが、バッチ式の焼鈍炉を使用する場合は、300〜350℃で1時間程度の焼鈍で目的を達することができる。
【0052】
さらに、前記第1の製造方法と同様に、所望の板厚になるまで、前記冷間圧延および焼鈍を繰り返す。ここで、冷間加工率が60%未満であると、次回の焼鈍での再結晶粒成長が不均一となり、最終板厚での結晶粒を微細かつ均一な状態で得ることは難しい。この点で、冷間加工率は、80%以上がさらに好ましい。その後、さらに、ショットピーニングを付与し、最終の焼鈍を行う。最終の焼鈍は、前述の条件で行う。
【0053】
以上、本発明の方法により、結晶粒度が2μm以下のα単相の結晶組織を得ることができる。
【0054】
さらに、前述のいずれかの方法により得られた結晶粒度が2μm以下のα単相の結晶粒である黄銅に、その用途に応じて、さらに圧下率10〜40%程度で、最終冷間圧延を施し、調質すれば、結晶粒を微細であり、黄銅の強度および曲げ特性を向上させることができる。
【0055】
【実施例】
(参考例1)
以下、実施例に基づき本発明を具体的に説明する。まず、参考例として、縦型連続鋳造で鋳塊を作る場合について言及する。
【0056】
銅68.5質量%〜71.5質量%、不可避不純物を除いて残部亜鉛からなる70/30黄銅(JIS合金 C2600)を、低周波誘導炉で溶解し、その後、厚さ200mmの鋳型に縦型連続鋳造法で鋳込み、鋳塊を作成した。その後、17.5mmまで熱間圧延を行った。その後、冷間加工率91%の冷間圧延を行い、1.5mmとし、さらに、焼鈍を温度300℃で実施した。その後、冷間加工率を78%かけ、0.325mmまで、冷間圧延を行った。さらに、最終の焼鈍を、温度を300℃で実施した。
【0057】
最終焼鈍後、結晶粒度を測定した。結晶粒度の測定にあたっては、電子顕微鏡を使用し、倍率10000倍とし、切断法で行った。その結果、0.83μmの微細結晶粒を得た。測定結果を図2に示す。
【0058】
この後、冷間加工率を23%かけ、0.25mmまで、最終の冷間圧延を行った。0.25mmの圧延前後の機械的性質は、表1のようになり、高強度材が得られた。
【0059】
また、0.25mmに圧延後の曲げ特性を調査した。曲げ方法は、試料を圧延方向と90°の方向に、180°曲げ(曲げ半径=0:密着)し、曲げ部外側を、倍率100倍の光学顕微鏡で観察した。その結果、過酷な曲げ試験であるにもかわらず、曲げ部にしわは認められたものの、割れは観察されず、曲げ特性に優れていることが確認できた。曲げ試験の結果を、図3に示す。
【0060】
【表1】
【0061】
(参考例2)
最終の焼鈍を、長さ20mの連続焼鈍炉を用い、焼鈍炉の設定温度を530℃ 、通板速度55m/分で連続的に焼鈍した以外は、参考例1と同様に焼鈍材を製造した。
【0062】
最終焼鈍後、結晶粒度を測定した。結晶粒度の測定にあたっては、電子顕微鏡を使用し、倍率10000倍とし、切断法で行った。その結果、1.8μmのα相単層の微細結晶粒を得た。
【0063】
この後、冷間加工率を23%かけ、0.25mmまで、最終の冷間圧延を行い、参考例1と同様の曲げ試験を実施した。
【0064】
その結果、過酷な曲げ試験であるにもかわらず、曲げ部にしわは認められたものの、割れは観察されず、曲げ特性に優れていることが確認できた。
【0065】
(参考例3)
17.5mmの熱間圧延までの工程は、参考例1と同様に行った。
【0066】
その後、冷間加工率71%の冷間圧延を行い、5.0mmとし、さらに、焼鈍を400℃で実施した。その後、冷間加工率を70%かけ、1.5mmまで冷間圧延を行った。さらに、焼鈍を350℃で実施した。その後、冷間加工率を78%かけ、0.325mmまで冷間圧延を行った。その後、最終の焼鈍を300℃で実施した。
【0067】
最終の焼鈍後、参考例1と同様の方法で結晶粒度を測定した。その結果、0.91μmの微細結晶粒を得た。測定結果を図4 に示す。
【0068】
なお、比較例として、最終焼鈍を270℃及び330℃で実施したテスト材の結晶粒度を測定した結果、270℃焼鈍材は、再結晶が完全に行われず、加工組織が一部残留した結晶組織となった。一方、330℃焼鈍材の結晶粒度は、3μmであった。
【0069】
(参考例3 ’)
参考例3 ’の工程は、17 .5mmまでの工程は、参考例1と同様である。その後加工率86%の冷間圧延を行い2.5mmとし、さらに焼鈍を400 ℃で実施した。
【0070】
その後加工率を72%かけ、0.7mmまで冷間圧延を行った。さらに焼鈍を350℃で実施した。その後加工率を54%かけ、0.325mmまで冷間圧延を行った。
【0071】
その後、最終の焼鈍を300℃で実施した。最終焼鈍後、参考例1と同様の方法で結晶粒度を測定した。その結果、4.0μmの結晶粒度であったが、均一な組織は得られなかった。
【0072】
(参考例3”)
参考例3”の工程は、17.5mmまでの工程は、参考例1と同様である。その後、加工率86%の冷間圧延を行い2.5mmとし、さらに、焼鈍を400℃ で実施した
【0073】
その後加工率を52%かけ、1.2mmまで冷間圧延を行った。さらに焼鈍を350℃で実施した。その後加工率を73%かけ、0.325mmまで冷間圧延を行った。
【0074】
その後、最終の焼鈍を300℃で実施した。最終焼鈍後、参考例1と同様の方法で結晶粒度を測定した。その結果、3.5μmの結晶粒度であったが、均一な組織は得られなかった。
【0075】
(参考例4)
17.5mmの熱間圧延までの工程は、参考例1と同様に行った。
【0076】
その後、冷間加工率86%の冷間圧延を行い、2.5mmとし、さらに、焼鈍を400℃で実施した。その後、冷間加工率を68%かけ、0.8mmまで冷間圧延を行った。さらに、焼鈍を350℃で実施した。その後、冷間加工率を59%かけ、0.325mmまで冷間圧延を行った。その後、最終の焼鈍を300℃で実施した。
【0077】
最終の焼鈍後、参考例1と同様の方法で結晶粒度を測定した。その結果、1.25μmの微細結晶粒を得た。測定結果を図5に示す。
【0078】
(実施例1)
銅68.5質量%〜71.5質量%、不可避不純物を除いて残部亜鉛からなる70/30黄銅(JIS合金 C2600R)を、低周波誘導炉で溶解し、その後、厚さ14mmの鋳型に横型連続鋳造法で鋳込み、鋳塊を作成した。その後、冷間加工率82%の冷間圧延を行い、2.5mmとし、さらに、焼鈍を温度350℃で実施した。その後、冷間加工率を64%かけ、0.9mmまで冷間圧延を行った。さらに、焼鈍を350℃で実施した。その後、冷間加工率を64%かけ、0.325mmまで冷間圧延を行った。その後、最終の焼鈍を300℃で実施した。
【0079】
最終の焼鈍後、結晶粒度を測定した。結晶粒度の測定にあたっては、電子顕微鏡を使用し、倍率10000倍とし、切断法で行った。その結果、0.83μmの微細結晶粒を得た。測定結果を図6に示す。
【0080】
(実施例2)
加工率82%の冷間圧延を行い、2.5mmとする工程までは、実施例1と同様に行った。さらに、2 .5mmの冷間圧延材の表面に、ショットピーニングを施した。ショットピーニング条件は、0 .8mm直径の鋼球(HRc 62)を、80m/分の速度で、10分間投射とした。なお、ショットピーニングの目的は、材料表面に大歪加工を与えて、結晶粒微細化の促進を狙うことにある。
【0081】
ショットピーニング後、焼鈍を300℃で行った後、さらに、冷間加工率を87%かけ、0.325mmまで冷間圧延を行った。その後、最終の焼鈍を300℃で実施した。
【0082】
最終の焼鈍後、実施例1と同様の方法で結晶粒度を測定した。その結果、1.8μmの微細結晶粒を得た。
【0083】
(実施例3)
厚さ14mmの鋳型に横型連続鋳造法で鋳込み、鋳塊を作成する工程までは、実施例1と同様に行った。さらに、14mmの鋳塊表面に、ショットピーニングを施した。ショットピーニング条件は、実施例2と同様である。ショットピーニング後、冷間加工率82%の冷間圧延を行い、2.5mmとし、さらに、焼鈍を300℃で実施した。さらに、冷間加工率を87%かけ、0.325mmまで冷間圧延を行った。その後、最終の焼鈍を300℃で実施した。
【0084】
最終の焼鈍後、実施例1と同様の方法で結晶粒度を測定した。その結果、1.6μmの微細結晶粒を得た。
【0085】
(実施例4)
厚さ14mmの鋳塊表面に、ショットピーニングを施すまでは、実施例3と同様に行った。また、ショットピーニング条件は、実施例2と同様である。ショットピーニング後、焼鈍を300℃で実施した。その後、冷間加工率82%の冷間圧延を行い、2.5mmとし、さらに焼鈍を300℃で実施した。この後、再度ショットピーニングを実施した。ショットピーニング条件は、実施例1と同様である。
【0086】
このショットピーニング後、再度焼鈍を300℃で実施した。さらに、冷間加工率を87%かけ、0.325mmまで冷間圧延を行った。その後、最終の焼鈍を300℃で実施した。
【0087】
最終の焼鈍後、実施例1と同様の方法で結晶粒度を測定した。その結果、1.5μmの微細結晶粒を得た。
【0088】
【発明の効果】
本発明により、主として端子およびコネクタ用に供される70/30黄銅(JIS合金 C2600)において、結晶粒度を2μm以下の微細組織にすることが可能であり、強度および曲げ特性を向上させた70/30黄銅およびその製造方法を提供することができる。従って、本発明により、端子、コネクタ、リレー、およびバネ等が、より小型化、軽量化されるという顕著な効果を得ることができる。
【図面の簡単な説明】
【図1】本発明の検討にあたって使用したNAIS SYSTEMを示す概念図である。
【図2】参考例1で得られた試料の結晶組織の10000倍電子顕微鏡写真である。
【図3】参考例1で得られた試料の曲げ試験の曲げ部の100倍表面拡大写真である。
【図4】参考例3で得られた試料の結晶組織の10000倍電子顕微鏡写真である。
【図5】参考例4で得られた試料の結晶組織の10000倍電子顕微鏡写真である。
【図6】実施例1で得られた試料の結晶組織の10000倍電子顕微鏡写真である。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to 70/30 brass (JIS alloy C2600) in which crystal grains used for terminals, connectors, relays, springs and the like are refined, and a method for manufacturing the same.
[0002]
[Prior art]
Examples of metal materials used for terminals, connectors, relays, springs, and the like include copper, brass, and phosphor bronze.
[0003]
Since copper is excellent in conductivity, in the case of a terminal, it is used for a terminal of a closed barrel. On the other hand, phosphor bronze is excellent in springiness and is used for small terminals, connectors, and springs, but has problems such as low conductivity and high price.
[0004]
On the other hand, brass has the advantage that it is cheaper than copper and phosphor bronze, and can also be used for springs. The conductivity is somewhat low, but there are few problems with mechanical properties and workability is low. There are advantages such as being suitable for mass production.
[0005]
As a material of brass, 70/30 brass (JIS alloy C2600) is mainly used for an open barrel terminal, and recently, for mass production such as a chain terminal. Quality characteristics required for brass for terminals or connectors are:
1. The surface is good,
2. The dimensions and shape are uniform and stable,
3. The mechanical properties such as tensile strength, elongation, hardness, proof stress are uniform and stable,
4). The crystal grain size is uniform and the crystal structure is as fine as possible.
5). When processed for terminals or connectors, the product shape is stable, and the insertion force (engagement force) and pull-out force (detachment force) during assembly are stable. Is also excellent.
[0006]
In particular, in the case of a female terminal with an open barrel chain terminal, if the crystal grain size is uniform and fine, the terminal shape is stable and the insertion force (mating force) during assembly is stable. Tend. Also, if the crystal grain size becomes finer, to obtain the same mechanical properties, it becomes possible to manufacture at a lower cold working rate, resulting in increased material elongation and improved bending properties. It will be.
[0007]
Conventionally, as related technology and basic technology in this field, the copper content is 60 to 65% by mass, but as described in JP 2000-129376 A, a method for strengthening brass has been reported. Yes.
[0008]
However, in the conventional method for producing 70/30 brass, the actual production line is manufactured by appropriately selecting the rolling reduction and annealing conditions from the ingot obtained by casting to the final annealing. When trying to reduce the particle size to 5 μm or less, the particle size tends to be non-uniform, and it has been difficult to stably manufacture such a material. In addition, the crystal grain size of the obtained material is limited to about 3 μm, and it is difficult to produce a material having fine crystal grains with a crystal grain size of 2 μm or less in the α-phase single layer after the final annealing. It was.
[0009]
[Patent Document 1]
Japanese Patent Laid-Open No. 2000-129376
[Problems to be solved by the invention]
An object of the present invention is to provide brass having improved strength and bending characteristics by realizing grain refinement in 70/30 brass (JIS alloy C2600), which is a problem of these conventional techniques, and a method for producing the same. It is.
[0015]
[Means for Solving the Problems]
The first method for producing the 70/30 brass of the present invention is to make an ingot by horizontal continuous casting, perform the first cold rolling with a cold working rate of 80 % or more, and then use a batch annealing furnace. By carrying out annealing at an annealing temperature of 300 to 350 ° C. and cold rolling at a cold work rate of 60% or more once and further performing a final annealing, 68.5 mass% to 71.5 copper. A 70/30 brass composed of a crystal structure composed of an α single phase having a crystal grain size of 2 μm or less, which is composed of the remaining zinc excluding mass% and inevitable impurities, is obtained . Thereafter, final cold rolling is preferably performed to refine the crystal grains, but the crystal structure is substantially unchanged between the final annealed material and the product obtained by final cold rolling the final annealed material. . The cold work rate in the second and subsequent cold rolling is preferably 80% or more.
[0016]
Moreover, it is preferable to perform shot peening before the first cold rolling, before the first annealing, and after the first annealing.
[0017]
It is preferable that the final annealing is performed by a batch annealing furnace at an annealing temperature of 280 to 320 ° C., or the final annealing is performed by a continuous annealing furnace at an annealing temperature of 350 to 600 ° C.
[0018]
Furthermore, it is preferable that the brass annealed material which is an α single-phase crystal grain having a crystal grain size of 2 μm or less obtained by the above-described method is subjected to final cold rolling to obtain a product in which the crystal grain is further refined. The final cold rolling is for tempering the brass obtained by the above method, and there is not much change in its attributes before and after that, in any case 68.5 mass% to 71.5 mass% copper. The 70/30 brass is composed of the remaining zinc, excluding inevitable impurities, and a crystal structure composed of an α single phase having a crystal grain size of 2 μm or less.
[0019]
DETAILED DESCRIPTION OF THE INVENTION
The inventors of the present invention mainly examined various crystal grain refining conditions in the manufacturing process of 70/30 brass (JIS alloy C2600) used for brass for terminals and connectors.
[0020]
There are four important factors in the grain refinement conditions: initial grain size, cold work rate, annealing temperature, and annealing time. The present inventors also have heat treatment data annealed in a salt bath. In addition, NAIS SYSTEM (Nice System), an experimental optimization method, was devised and used in the study.
[0021]
A conceptual diagram of NAIS SYSTEM is shown in FIG.
[0022]
With NAIS SYSTEM, if these four factors are determined, it is possible to estimate the average grain size of the recrystallized grains, and functionalize 358 sets of data accumulated so far. X1: Initial grain size (μm ), X2: annealing temperature (° C.), X3: annealing time (s), X4: cold work rate (%), and Z: a system grain size (μm) after annealing. Therefore, FIG. 1 shows a case where the initial particle size X1 and the cold working rate X4 are specified.
[0023]
Thus, the average grain size of the recrystallized grains was predicted in advance, and the experiment was advanced to complete a method for producing brass having fine grains having a crystal grain size of 2 μm or less.
[0024]
The 70/30 brass of the present invention is a product that has undergone the final cold rolling or an intermediate product that has undergone the final annealing before that, from 68.5% by mass to 71.5% by mass of copper, from the remaining zinc except for inevitable impurities. becomes, Ru is composed of crystal structure grain size is made from the following α single phase 2 [mu] m.
[0041]
The first method for producing the 70/30 brass of the present invention is to produce an ingot by horizontal continuous casting, perform cold rolling and annealing at a cold working rate of 60% or more once or more, and then perform cold working. An annealed material of α single phase crystal grains having a crystal grain size of 2 μm or less is obtained by performing a cold rolling with a rate of 60% or more and a final annealing. The processing rate of the first cold rolling is preferably 80% or more.
[0042]
In the first manufacturing method, the ingot manufacturing method is a horizontal continuous casting method, which is different from the vertical continuous casting method. The thickness of the ingot manufactured by the horizontal continuous casting method is about 14 to 16 mm and is relatively thin. Therefore, after the ingot is manufactured, cold rolling can be started. On the other hand, since the thickness of the ingot manufactured by the vertical continuous casting method is as thick as 150 to 200 mm, hot rolling is required after the ingot is manufactured. However, since each of the ingots manufactured by the both casting methods finally has a fine crystal structure having a crystal grain size of 2 μm or less, there is no problem even if any casting method is adopted.
[0043]
Specifically, an ingot of about 14 to 16 mm is formed by a horizontal continuous casting method, and after cold rolling with a cold work rate of 60% or more, annealing is performed at about 300 to 350 ° C. Here, the cold working ratio is less than 60%, the recrystallization grain growth nonuniform in the next annealing, the crystal grains at the final thickness fine, and it is difficult to obtain a uniform state. On the other hand, when the cold working rate is 95% or more, work hardening is severe and not economical. Therefore , the processing rate at the intermediate stage is preferably 60 to 95%.
[0044]
The annealing temperature and annealing conditions may be appropriately selected depending on the equipment to be used, but when a batch type annealing furnace is used, the purpose can be achieved by annealing at 300 to 350 ° C. for about 1 hour.
[0045]
Further, the cold rolling and annealing are repeated until a desired thickness is obtained.
[0046]
The final annealing conditions are 280 to 320 ° C. in the case of batch annealing. In the case of continuous annealing for about 1 to 3 hours, the furnace temperature is about 350 to 550 ° C. for several seconds. Of course, if the final temperature exceeds the above temperature range, or if the annealing time is too long, the crystal grain size becomes too large, and conversely, if the temperature range is not reached or the annealing time is too short, the recrystallization is completely completed. This is not performed, and a crystallized structure in which a part of the processed structure remains is not achieved.
[0047]
As described above, by the method of the present invention, an annealed material having an α single-phase crystal structure with a crystal grain size of 2 μm or less can be obtained.
[0048]
The second method for producing the 70/30 brass of the present invention is to produce an ingot by horizontal continuous casting, perform cold rolling and annealing at a cold working rate of 80% or more once and then cold work. The first annealing process is performed before the first cold rolling in the process of obtaining α single-phase crystal grains with a grain size of 2 μm or less by performing a cold rolling with a rate of 80% or more and performing a final annealing. either before, and after the first annealing, to facilities the shot peening.
[0049]
The shot peening is performed by projecting a steel ball having a diameter of 0.8 mm (HRc 62) at a speed of 80 m / min for 10 minutes. The purpose of shot peening is to give a large strain to the surface of the material and aim to refine crystal grains.
[0050]
Specifically, as in the first manufacturing method, an ingot having a thickness of about 14 to 16 mm is formed by a horizontal continuous casting method, and then cold rolling with a cold work rate of 80% or more is performed. Annealing is performed at about 300 to 350 ° C. Here, when the cold working rate is less than 80%, the recrystallized grain growth in the next annealing becomes non-uniform, and it is difficult to obtain crystal grains in the final plate thickness in a fine and uniform state. Shot peening needs to be applied either before the first cold rolling, before the first annealing, and after the first annealing.
[0051]
The annealing temperature and annealing conditions may be appropriately selected depending on the equipment to be used, but when a batch type annealing furnace is used, the purpose can be achieved by annealing at 300 to 350 ° C. for about 1 hour.
[0052]
Further, similar to the first manufacturing method, the cold rolling and annealing are repeated until a desired plate thickness is obtained. Here, when the cold working rate is less than 60%, the recrystallized grain growth in the next annealing becomes non-uniform, and it is difficult to obtain crystal grains in the final plate thickness in a fine and uniform state. In this respect, the cold working rate is more preferably 80% or more. Thereafter, shot peening is further applied and final annealing is performed. The final annealing is performed under the conditions described above.
[0053]
As described above, by the method of the present invention, an α single-phase crystal structure having a crystal grain size of 2 μm or less can be obtained.
[0054]
Furthermore, the final cold rolling is performed on brass, which is an α single-phase crystal grain having a grain size of 2 μm or less obtained by any of the above-described methods, at a rolling reduction of about 10 to 40%, depending on the application. When applied and tempered, the crystal grains are fine, and the strength and bending characteristics of brass can be improved.
[0055]
【Example】
( Reference Example 1 )
Hereinafter, the present invention will be specifically described based on examples. First, as a reference example, a case where an ingot is made by vertical continuous casting will be described .
[0056]
70/30 brass (JIS alloy C2600) consisting of 68.5 mass% to 71.5 mass% of copper and the remainder zinc excluding inevitable impurities was melted in a low frequency induction furnace, and then vertically cast into a 200 mm thick mold. An ingot was made by casting using a continuous mold casting method. Thereafter, hot rolling was performed up to 17.5 mm. Thereafter, cold rolling with a cold working rate of 91% was performed to 1.5 mm, and annealing was further performed at a temperature of 300 ° C. Thereafter, cold rolling was performed to 78% and cold rolling was performed to 0.325 mm. Furthermore, the final annealing was performed at a temperature of 300 ° C.
[0057]
After final annealing, the crystal grain size was measured. In measuring the crystal grain size, an electron microscope was used and the magnification was 10,000 times, and the cutting method was used. As a result, 0.83 μm fine crystal grains were obtained. The measurement results are shown in FIG.
[0058]
Thereafter, the final cold rolling was performed up to 0.25 mm by applying a cold work rate of 23%. The mechanical properties before and after the rolling of 0.25 mm were as shown in Table 1, and a high-strength material was obtained.
[0059]
Moreover, the bending characteristic after rolling to 0.25 mm was investigated. As a bending method, the sample was bent 180 ° in the direction of 90 ° with the rolling direction (bending radius = 0: adhesion), and the outside of the bent portion was observed with an optical microscope with a magnification of 100 times. As a result, although it was a severe bending test, although wrinkles were observed in the bent portion, no cracks were observed and it was confirmed that the bending properties were excellent. The result of the bending test is shown in FIG.
[0060]
[Table 1]
[0061]
( Reference Example 2 )
An annealing material was produced in the same manner as in Reference Example 1 except that the final annealing was performed continuously using a continuous annealing furnace having a length of 20 m, and the annealing furnace was set at a set temperature of 530 ° C. and a sheeting speed of 55 m / min. .
[0062]
After final annealing, the crystal grain size was measured. In measuring the crystal grain size, an electron microscope was used and the magnification was 10,000 times, and the cutting method was used. As a result, 1.8 μm α-phase single layer fine crystal grains were obtained.
[0063]
Thereafter, the cold working rate was increased by 23%, the final cold rolling was performed up to 0.25 mm, and the same bending test as in Reference Example 1 was performed.
[0064]
As a result, although it was a severe bending test, although wrinkles were observed in the bent portion, no cracks were observed and it was confirmed that the bending properties were excellent.
[0065]
( Reference Example 3 )
The steps up to 17.5 mm hot rolling were performed in the same manner as in Reference Example 1 .
[0066]
Thereafter, cold rolling with a cold working rate of 71% was performed to 5.0 mm, and annealing was performed at 400 ° C. Thereafter, cold rolling was applied to 70%, and cold rolling was performed to 1.5 mm. Further, annealing was performed at 350 ° C. Then, it cold-rolled to 0.325 mm by applying a cold work rate of 78%. Thereafter, the final annealing was performed at 300 ° C.
[0067]
After the final annealing, the crystal grain size was measured by the same method as in Reference Example 1 . As a result, fine crystal grains of 0.91 μm were obtained. The measurement results are shown in FIG.
[0068]
As a comparative example, as a result of measuring the crystal grain size of a test material subjected to final annealing at 270 ° C. and 330 ° C., the 270 ° C. annealed material was not completely recrystallized, and a crystal structure in which a part of the processed structure remained. It became. On the other hand, the crystal grain size of the 330 ° C. annealed material was 3 μm.
[0069]
( Reference Example 3 ' )
Reference example 3 The process of 'is 17. The process up to 5 mm is the same as in Reference Example 1 . Thereafter, cold rolling with a processing rate of 86% was performed to 2.5 mm, and annealing was further performed at 400 ° C.
[0070]
Thereafter, the rolling rate was 72%, and cold rolling was performed to 0.7 mm. Furthermore, annealing was performed at 350 ° C. Thereafter, the rolling rate was increased to 54% and cold rolling was performed to 0.325 mm.
[0071]
Thereafter , the final annealing was performed at 300 ° C. After the final annealing, the crystal grain size was measured by the same method as in Reference Example 1 . As a result, the crystal grain size was 4.0 μm, but a uniform structure was not obtained.
[0072]
( Reference Example 3 ” )
Step of Reference Example 3 ", the step up to 17.5mm is the same as in Reference Example 1. Thereafter, a 2.5mm perform rolling working ratio of 86% cold, was further carried out annealing at 400 ° C. [0073]
Thereafter, it was cold rolled to 1.2 mm at a processing rate of 52%. Furthermore, annealing was performed at 350 ° C. Thereafter, the rolling rate was 73%, and cold rolling was performed to 0.325 mm.
[0074]
Thereafter , the final annealing was performed at 300 ° C. After the final annealing, the crystal grain size was measured by the same method as in Reference Example 1 . As a result, the crystal grain size was 3.5 μm, but a uniform structure was not obtained.
[0075]
( Reference Example 4 )
The steps up to 17.5 mm hot rolling were performed in the same manner as in Reference Example 1 .
[0076]
Then, cold rolling with a cold work rate of 86% was performed to 2.5 mm, and annealing was performed at 400 ° C. Then, the cold working rate was applied to 68% and cold rolling was performed to 0.8 mm. Further, annealing was performed at 350 ° C. Thereafter, cold rolling was applied to 59% and cold rolling was performed to 0.325 mm. Thereafter, the final annealing was performed at 300 ° C.
[0077]
After the final annealing, the crystal grain size was measured by the same method as in Reference Example 1 . As a result, fine crystal grains of 1.25 μm were obtained. The measurement results are shown in FIG.
[0078]
( Example 1 )
70/30 brass (JIS alloy C2600R) consisting of 68.5% to 71.5% by mass of copper and remaining zinc except for unavoidable impurities is melted in a low frequency induction furnace, and then laterally cast into a 14 mm thick mold. Casting was performed by continuous casting to create an ingot. Then, cold rolling with a cold work rate of 82% was performed to 2.5 mm, and annealing was further performed at a temperature of 350 ° C. Then, cold rolling was applied to 64% and cold rolling was performed to 0.9 mm. Further, annealing was performed at 350 ° C. Thereafter, cold rolling was applied to 64%, and cold rolling was performed to 0.325 mm. Thereafter, the final annealing was performed at 300 ° C.
[0079]
After the final annealing, to measure the binding Akiratsubudo. In measuring the crystal grain size, an electron microscope was used and the magnification was 10,000 times, and the cutting method was used. As a result, 0.83 μm fine crystal grains were obtained. The measurement results are shown in FIG.
[0080]
( Example 2 )
Cold rolling with a processing rate of 82% was performed and the process up to 2.5 mm was performed in the same manner as in Example 1 . Further, 2. Shot peening was applied to the surface of a 5 mm cold rolled material. Shot peening conditions are 0. An 8 mm diameter steel ball (HRc 62) was projected for 10 minutes at a speed of 80 m / min. The object of the shot peening, gives Daiibitsu processed material surface is to aim to promote grain refinement.
[0081]
After shot peening, annealing was performed at 300 ° C., and then cold rolling was performed to a cold working rate of 87% to 0.325 mm. Thereafter, the final annealing was performed at 300 ° C.
[0082]
After the final annealing, the crystal grain size was measured in the same manner as in Example 1. As a result, 1.8 μm fine crystal grains were obtained.
[0083]
( Example 3 )
The same process as in Example 1 was performed until the step of casting into a 14 mm thick mold by the horizontal continuous casting method to create an ingot. Further, shot peening was performed on the surface of a 14 mm ingot. The shot peening conditions are the same as in Example 2 . After shot peening, cold rolling with a cold working rate of 82% was performed to 2.5 mm, and annealing was performed at 300 ° C. Further, it was subjected to a cold working rate of 87% and cold rolled to 0.325 mm. Thereafter, the final annealing was performed at 300 ° C.
[0084]
After the final annealing, the crystal grain size was measured in the same manner as in Example 1. As a result, 1.6 μm fine crystal grains were obtained.
[0085]
( Example 4 )
The same process as in Example 3 was performed until shot peening was performed on the ingot surface having a thickness of 14 mm. The shot peening conditions are the same as in the second embodiment . After shot peening, annealing was performed at 300 ° C. Then, cold rolling with a cold working rate of 82% was performed to 2.5 mm, and annealing was performed at 300 ° C. Thereafter, shot peening was performed again. The shot peening conditions are the same as in the first embodiment .
[0086]
After this shot peening, annealing was again performed at 300 ° C. Further, it was subjected to a cold working rate of 87% and cold rolled to 0.325 mm. Thereafter, the final annealing was performed at 300 ° C.
[0087]
After the final annealing, the crystal grain size was measured in the same manner as in Example 1. As a result, 1.5 μm fine crystal grains were obtained.
[0088]
【The invention's effect】
According to the present invention, in 70/30 brass (JIS alloy C2600) mainly used for terminals and connectors, the crystal grain size can be reduced to a fine structure of 2 μm or less, and the strength and bending characteristics are improved. 30 brass and its manufacturing method can be provided. Therefore, according to the present invention, it is possible to obtain a remarkable effect that the terminals, connectors, relays, springs, and the like are further reduced in size and weight.
[Brief description of the drawings]
FIG. 1 is a conceptual diagram showing a NAIS SYSTEM used in the examination of the present invention.
2 is a 10,000 times electron micrograph of the crystal structure of the sample obtained in Reference Example 1. FIG.
3 is a 100 times magnified photograph of a bent portion of a bending test of the sample obtained in Reference Example 1. FIG.
4 is a 10,000 times electron micrograph of the crystal structure of the sample obtained in Reference Example 3. FIG.
5 is a 10,000 times electron micrograph of the crystal structure of the sample obtained in Reference Example 4. FIG.
6 is a 10,000 times electron micrograph of the crystal structure of the sample obtained in Example 1. FIG.
Claims (6)
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| JP2003085672A JP4012845B2 (en) | 2003-03-26 | 2003-03-26 | 70/30 brass with refined crystal grains and method for producing the same |
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| JP2003085672A JP4012845B2 (en) | 2003-03-26 | 2003-03-26 | 70/30 brass with refined crystal grains and method for producing the same |
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| JP2004292875A JP2004292875A (en) | 2004-10-21 |
| JP4012845B2 true JP4012845B2 (en) | 2007-11-21 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP4831969B2 (en) * | 2005-01-04 | 2011-12-07 | Dowaホールディングス株式会社 | Brass material manufacturing method and brass material |
| JP4718273B2 (en) * | 2005-02-04 | 2011-07-06 | 三井住友金属鉱山伸銅株式会社 | Reinforced α brass and method for producing the same |
| JP5032011B2 (en) * | 2005-08-09 | 2012-09-26 | 三井住友金属鉱山伸銅株式会社 | Hard α brass and method for producing the hard α brass |
| JP4550791B2 (en) * | 2005-11-24 | 2010-09-22 | 古河電気工業株式会社 | Aluminum stranded wire crimp terminal and aluminum stranded wire terminal structure to which the crimp terminal is connected |
| JP5192648B2 (en) * | 2006-02-03 | 2013-05-08 | 三井住友金属鉱山伸銅株式会社 | Hard α brass with excellent moldability and method for producing the same |
| JP5247010B2 (en) * | 2006-06-30 | 2013-07-24 | Jx日鉱日石金属株式会社 | Cu-Zn alloy with high strength and excellent bending workability |
| JPWO2013146762A1 (en) * | 2012-03-29 | 2015-12-14 | 大電株式会社 | Microcrystalline metal conductor and method for producing the same |
| JP6203486B2 (en) * | 2012-10-15 | 2017-09-27 | 矢崎総業株式会社 | Manufacturing method of alloy material for manufacturing terminal and manufacturing method of terminal |
| JP6136069B2 (en) * | 2013-05-08 | 2017-05-31 | 住友電気工業株式会社 | Lead conductor and power storage device |
| CN105780066B (en) * | 2015-12-27 | 2019-06-04 | 深圳百嘉达新能源材料有限公司 | A kind of high-performance copper foil and preparation method thereof |
| CN105780052B (en) * | 2015-12-27 | 2019-03-01 | 上海合富新材料科技股份有限公司 | It is a kind of to have both the high-intensitive pure metal material and preparation method thereof with high-ductility |
| CN105780065B (en) * | 2015-12-27 | 2019-04-30 | 新昌县晋通机械有限公司 | A kind of electrolytic copper foil and preparation method thereof |
| CN105780064B (en) * | 2015-12-27 | 2018-12-21 | 惠州市海博晖科技有限公司 | A kind of copper foil and preparation method thereof for wiring board |
| CN113774229B (en) * | 2021-09-08 | 2023-11-28 | 虹华科技股份有限公司 | Processing technology of high-strength high-conductivity high-purity copper wire |
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