JP4058130B2 - Chemical switch valve and wafer cleaning device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a chemical liquid switching device and a wafer cleaning device, and more particularly to a wafer cleaning device used when cleaning a wafer in a manufacturing process of a semiconductor device and a chemical liquid switching valve provided therein.
[0002]
[Prior art]
Some wafer cleaning apparatuses used in the manufacturing process of a semiconductor device have a plurality of chemical liquid supply means connected to a cleaning processing chamber via a chemical liquid switching valve. According to such a wafer cleaning processing apparatus, each cleaning using a plurality of different chemical solutions can be performed in the cleaning processing chamber.
[0003]
FIG. 4 (1) is a side sectional view showing an example of the chemical switching valve provided in the wafer cleaning apparatus. FIG. 4 (2) is a plan sectional view of this chemical switching valve (ie, FIG. 4 (1)). AA ′ cross section in FIG.
As shown in these drawings, the chemical switching valve 4 is connected via a chemical solution introduction path 41, a plurality of on-off valves 42a, 42b ... connected to the side walls of the chemical solution introduction path 41, and the on-off valves 42a, 42b ... Are provided with chemical solution supply pipes 43a, 43b... Connected to the chemical solution introduction path 41.
[0004]
The said chemical | medical solution introduction path 41 is comprised by the supply part 411 to which each said on-off valve 42a, 42b ... is connected, and the connecting pipe 412 which connects between each supply part 411. As shown in FIG. One end of the chemical solution introduction path 41 is closed, and the other end is connected to the cleaning treatment chamber (not shown). The on-off valves 42a, 42b,... Are made of, for example, air cylinders. These on-off valves 42a, 42b, ... are disconnected from the chemical solution supply pipes 43a, 43b, ... and the chemical solution introduction passage 41 by the cylinder 421 that is pushed down by the introduction of air, and the introduction of air is stopped and pushed back. The chemical solution introduction path 41 and the chemical solution supply pipes 43a, 43b,...
[0005]
In the chemical liquid switching valve 4 having the above-described configuration, the desired liquid is supplied to the chemical liquid introduction path 41 by opening an on-off valve (for example, the on-off valve 42a) connected to a chemical liquid supply pipe (for example, the chemical liquid supply pipe 43a) that supplies a desired chemical liquid. Chemical solution is supplied. And this chemical | medical solution is introduce | transduced into the cleaning process chamber of a wafer cleaning apparatus.
[0006]
However, in the chemical liquid switching valve 4 having the above-described configuration, since the opening shapes of the supply section 411 and the connection pipe 412 that constitute the chemical liquid introduction path 41 are not necessarily the same, a dead water region is formed in the chemical liquid introduction path 41.
[0007]
Therefore, a chemical liquid switching valve having a configuration in which the chemical liquid introduction path is configured by a single pipe body having a uniform opening diameter and an open / close valve having a chemical liquid supply pipe connected to the side wall of the chemical liquid introduction path has been considered. In this chemical solution switching valve, the bottom surface of the cylinder and the side wall of the chemical solution supply pipe are arranged at the same height when the on-off valve is closed. In the chemical liquid switching valve having such a configuration, a dead water region is not formed in the chemical liquid introduction path.
[0008]
[Problems to be solved by the invention]
However, the switching valve configured as described above has a configuration in which one chemical solution introduction path is shared by a plurality of chemical solution supply pipes. For this reason, in the case of continuously performing the cleaning process using the first chemical solution and the second chemical solution that cannot be mixed in the wafer cleaning process using the wafer cleaning apparatus including the switching valve, It is necessary to perform the cleaning process using the second chemical solution after performing the replacement step of replacing the first chemical solution used in the previous cleaning step with the harmless third chemical solution. This replacement process becomes a factor of reducing the throughput of the entire wafer cleaning process.
[0009]
[Means for Solving the Problems]
The chemical switch valve of the present invention for solving the above-described problems is a straight pipe-shaped chemical solution introduction path, an on-off valve connected to the chemical solution introduction path, and a chemical solution supply connected to the chemical solution introduction path via the on-off valve. A chemical liquid switching valve including a pipe, wherein the chemical liquid introduction path is formed with a narrow opening diameter toward the downstream in the chemical liquid flow direction.
The wafer cleaning apparatus of the present invention is a wafer cleaning apparatus in which a chemical solution supply means is connected to the cleaning processing chamber via the chemical solution switching valve having the above-described configuration.
[0010]
The above-mentioned chemical switching valve has a narrower opening diameter toward the downstream side of the straight-pipe-shaped chemical solution introduction path, so that the flow rate of the chemical solution discharged from the chemical solution introduction path is increased and a dead water region is formed in the chemical solution introduction path. It is never done. For this reason, the chemical solution is efficiently replaced in the chemical solution introduction path, and the replacement speed is increased.
[0011]
Accordingly, in the wafer cleaning process by the wafer cleaning apparatus, the chemical solution replacement process in the chemical solution introduction path is shortened when performing wafer cleaning.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of a chemical switching valve and a wafer cleaning apparatus to which the present invention is applied will be described below with reference to the drawings. In the following embodiments, the same reference numerals are given to the same components as those in the conventional technique described above, and a duplicate description will be omitted.
[0013]
(First embodiment)
FIG. 1 (1) is a side sectional view of the chemical switching valve of the first embodiment, and FIG. 1 (2) is a plan sectional view of this chemical switching valve (that is, AA ′ cross section in FIG. 1 (1)). It is.
[0014]
The chemical liquid switching valve 1 shown in these drawings is characterized by the shape of the chemical liquid introduction path 11. That is, the chemical solution introduction path 11 is formed so that the opening diameter thereof becomes narrower toward the downstream in the distribution direction of the chemical solution. This chemical | medical solution introduction path 11 is formed in the straight pipe | tube shape which connected piping 11a, 11b ... from which an opening diameter differs in order of the magnitude | size of an opening diameter. The tube 11f having the largest opening diameter is closed at the end opposite to the connection end with the adjacent tube 11e.
[0015]
Further, chemical supply pipes 43a, 43b,... Are connected to the pipes 11a, 11b via on-off valves 42a, 42b,. And the opening diameter of the said chemical | medical solution introduction path 11 shall be a magnitude | size which is the extent which does not prevent discharge | emission of the chemical | medical solution from the chemical | medical solution introduction path 11 with respect to the diameter of this chemical | medical solution supply pipe 43a, 43b. The on-off valves 42a, 42b... Are made of, for example, an air cylinder.
[0016]
Next, the operation procedure of the chemical liquid switching valve 1 is the same as that of the chemical liquid switching valve shown in the prior art. That is, by opening an on-off valve (for example, the on-off valve 42a) connected to a chemical liquid supply pipe (for example, the chemical liquid supply pipe 43a) for supplying a desired chemical liquid, the other on-off valves 42b, 42c,. Only the desired chemical solution is supplied.
[0017]
Since the opening diameter of the chemical liquid switching valve 1 having the above configuration is narrower toward the downstream of the straight chemical liquid introduction path 11, the flow rate of the chemical liquid discharged from the chemical liquid introduction path 11 is increased, and the chemical liquid introduction path 11 is further increased. A dead water area is not formed inside. In the switching valve 1, the chemical liquid supplied from the chemical liquid supply pipes 43 a, 43 b... Is easily supplied to the upstream side of the chemical liquid introduction path 11. Therefore, when different chemical liquids are supplied into the chemical liquid introduction path 11 by switching the open / close state of the chemical liquid supply pipes 43a, 43b, ..., the chemical liquid is efficiently replaced in the chemical liquid introduction path 11 and the replacement speed is increased. be able to. The supplied chemical solution is easily circulated on the upstream side of the supply portion.
[0018]
FIG. 2 shows a configuration diagram of a wafer cleaning apparatus using this chemical solution switching valve. This wafer cleaning apparatus is an apparatus for cleaning the surface of a thin wafer such as a semiconductor substrate or a liquid crystal glass substrate. Hereinafter, the configuration of the wafer cleaning apparatus will be described with reference to FIG. 2 and FIG. The wafer cleaning apparatus 2 is formed by connecting a plurality of chemical solution supply means 21a, 21b,... And N ₂ supply means 21f to the cleaning processing chamber 22 via the chemical solution switching valve 1 having the above configuration.
[0019]
Of the chemical liquid supply means 21a, 21b, ..., the chemical liquid supply means 21a supplies the chemical liquid A, the chemical liquid supply means 21b supplies the chemical liquid B, the chemical liquid supply means 21c supplies the chemical liquid C, and the chemical liquid supply means 21d supplies the chemical liquid D. Further, the chemical solution supply means 21e is for supplying pure water. The chemical liquid supply means 21a, 21b,... Are configured by chemical liquid tanks 211a, 211b, a supply pump 212 connected thereto, and a filter 213 arranged on the downstream side of each supply pump 212. The chemical solution supply pipes (43a, 43b,...) Of the chemical solution switching valve 1 are sequentially supplied from the upstream side with an N ₂ supply unit 21f, a chemical solution supply unit 21d for supplying pure water, and a chemical solution supply unit 21c for supplying the chemical solution D. , Chemical solution supply means 21c for supplying the chemical solution C are connected.
[0020]
The chemical solution introduction path 11 of the chemical solution switching valve 1 is connected to the chemical solution discharge block 221 of the cleaning processing chamber 22.
[0021]
An example of an operation procedure for cleaning a wafer using the wafer cleaning apparatus 2 having the above configuration will be described.
First, the cylinder 421 of the on-off valve 42a is raised to make the chemical solution supply pipe 43a and the chemical solution introduction path 11 communicate with each other. At this time, the cylinders 421 of the other on-off valves 42b, 42c,... Are lowered, and the chemical solution supply pipes 43b, 43c,. Then, the chemical solution A is introduced into the chemical solution introduction path 11 from the chemical solution supply pipe 43a. Thus, the chemical solution A is supplied into the cleaning processing chamber 22 and the wafer cleaning with the chemical solution A is performed. After the wafer cleaning is completed, the supply of the chemical solution from the chemical solution supply pipe 43a is stopped, and the cylinder 421 of the on-off valve 42a is lowered to close the chemical solution supply pipe 43a.
[0022]
Next, a wafer cleaning process with pure water (that is, a rinsing process) is performed. Here, it is assumed that the chemical solution A becomes a strong alkali when mixed with pure water and has a negative effect on the wafer. Therefore, before performing the rinsing step, a replacement step is performed in which the chemical solution A in the chemical solution introduction path 11 is replaced with a chemical solution B that is harmless even if mixed with the chemical solution A or pure water.
[0023]
At this time, first, the cylinder 421 of the on-off valve 42b is raised to cause the chemical solution supply pipe 43b and the chemical solution introduction path 11 to communicate with each other. Then, the chemical solution B is introduced into the chemical solution introduction path 11 from the chemical solution supply pipe 43b. As a result, the chemical solution A is replaced with the chemical solution B in the chemical solution introduction path 11, the cleaning treatment chamber 22, and the pipes connecting these.
[0024]
After the replacement step is completed, the supply of the chemical solution B from the chemical solution supply interval 43b is stopped, the cylinder 421 of the on-off valve 42b is lowered, and the chemical solution supply pipe 43b is closed. Next, the cylinder 421 of the on-off valve 42f is raised to connect the chemical solution supply pipe 43f and the chemical solution introduction path 11. Then, N ₂ is introduced into the chemical solution introduction path 11 from the chemical solution supply pipe 43f. Thereby, the chemical solution B in the chemical solution introduction path 11 is removed.
[0025]
Thereafter, the supply of N ₂ from the chemical liquid supply pipe 43f is stopped, the cylinder 421 of the on-off valve 42f is lowered, and the chemical liquid supply pipe 43f is closed. Next, the cylinder 421 of the on-off valve 42e is raised to connect the chemical solution supply pipe 43e and the chemical solution introduction path 11. Then, pure water is introduced into the chemical solution introduction path 11 from the chemical solution supply pipe 43e. Then, pure water is supplied into the cleaning processing chamber 22 to perform a wafer rinsing step.
[0026]
In the wafer cleaning apparatus 2, since the chemical solution switching valve 1 having the above-described configuration is provided, the chemical solution replacement speed in the chemical solution introduction path 11 can be increased. Therefore, the wafer cleaning process using the chemical solution A and pure water are performed. The process of replacing the chemical solution A with the chemical solution B performed during the wafer rinsing process using the process is shortened. Therefore, in the wafer cleaning process in which the cleaning process using a plurality of chemical solutions is continuously performed, the throughput can be improved.
[0027]
(Second Embodiment)
FIG. 3 (1) is a side sectional view of the chemical liquid switching valve of the second embodiment, and FIG. 3 (2) is a plan sectional view of this chemical liquid switching valve (that is, an AA ′ cross section in FIG. 3 (1)). It is.
[0028]
The difference between the chemical switching valve 1 shown in these drawings and the chemical switching valve (1) described in the first embodiment is that the chemical introduction path 31 is formed with a narrower opening diameter toward the downstream in the chemical flow direction. The other wall is in a tapered shape, and the other parts are the same as the above-described chemical liquid switching valve (1).
And the operation | movement procedure of this chemical | medical solution switching valve 3 is the same as that of the said chemical | medical solution switching valve (1).
[0029]
Even with the chemical liquid switching valve 3 configured as described above, the same effect as the chemical liquid switching valve (1) can be obtained. In the chemical liquid switching valve 3, since the inner peripheral wall of the chemical liquid introduction path 31 is tapered, the chemical liquid replacement is performed more efficiently than the chemical liquid switching valve (1) of the first embodiment. And the structure of the wafer cleaning apparatus using the said chemical | medical solution switching valve 3 is the same as that of the wafer cleaning apparatus shown in the block diagram of FIG. Even with the wafer cleaning apparatus 2 ′ using the chemical switching valve 1, the same effect as the wafer cleaning apparatus (2) can be obtained.
[0030]
In addition, each said chemical | medical solution switching valve demonstrated by said each embodiment may be comprised by connecting the unit which connects a chemical | medical solution supply pipe to piping via an on-off valve. Each on-off valve is not limited to an air cylinder, and may be another on-off valve such as an electromagnetic valve.
[0031]
【The invention's effect】
As described above, according to the chemical switching valve of the present invention, the diameter of the straight-pipe-shaped chemical liquid introduction path connected to the chemical liquid supply pipe via the on-off valve is narrowed toward the downstream, thereby reducing the chemical liquid introduction path. It is possible to improve the replacement efficiency of the chemical solution in and to shorten the replacement step accompanying the switching of the chemical solution.
According to the wafer cleaning apparatus of the present invention, by providing the chemical switching valve, the chemical replacement process is shortened when cleaning with different chemicals is continuously performed, and the throughput of the wafer cleaning process is increased. It becomes possible to improve.
[Brief description of the drawings]
FIG. 1 is a configuration diagram of a chemical switching valve according to a first embodiment to which the present invention is applied.
FIG. 2 is a configuration diagram of a wafer cleaning apparatus of the present invention.
FIG. 3 is a configuration diagram of a chemical liquid switching valve according to a second embodiment to which the present invention is applied.
FIG. 4 is a configuration diagram of a conventional chemical switching valve.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1,3 Chemical solution switching valve 2 Wafer cleaning apparatus 11,31 Chemical solution introduction pipe | tube 21a, 21b ... Chemical solution supply means 22 Cleaning process chamber 42a, 42b ... On-off valve 43a, 43b ... Chemical solution supply pipe

Claims (6)

A tubular chemical solution introduction path having one end opened and the other end closed, a plurality of on- off valves arranged along the chemical solution introduction path and connected to a side wall of the chemical solution introduction path , In the chemical liquid switching valve provided with a chemical liquid supply pipe connected to the chemical liquid introduction path through the valve,
The drug solution switching valve is characterized in that an inner diameter of the drug solution introduction path is narrowed from the closed end side toward the end side opened . The chemical switch valve according to claim 1,
  The chemical solution introduction path is formed by connecting tubes having different opening diameters in the order of the opening diameter, and the end of the tube having the largest opening diameter on the side opposite to the connection end with the adjacent tube is blocked. Is
  This is a chemical switching valve. The chemical switch valve according to claim 1,
An inner wall of the chemical solution introduction path is formed in a taper shape in a direction in which an inner diameter is narrowly formed . In a wafer cleaning apparatus in which a chemical solution supply means is connected to a cleaning processing chamber via a chemical solution switching valve,
The medicinal solution switching valve has a tubular medicinal solution introduction path that is open at one end and closed at the other end, and a plurality of open / close ports that are arranged along the medicinal solution introduction path and connected to a side wall of the medicinal solution introduction path A chemical solution supply pipe connected to the chemical solution introduction path through the valve and each on-off valve,
The wafer cleaning apparatus, wherein the chemical solution introduction path has a narrow inner diameter from the closed end side toward the open end side . The wafer cleaning apparatus according to claim 4, wherein
  The chemical solution introduction path is formed by connecting tubes having different opening diameters in the order of the opening diameter, and the end of the tube having the largest opening diameter on the side opposite to the connection end with the adjacent tube is blocked. Is
  A wafer cleaning apparatus. The wafer cleaning apparatus according to claim 4, wherein
The wafer cleaning apparatus, wherein an inner wall of the chemical solution introduction path is tapered in a direction in which an inner diameter is narrowly formed .

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