JP4075449B2 - Modified cyanate ester-based curable resin composition for laminate, prepreg and laminate using the same - Google Patents
Modified cyanate ester-based curable resin composition for laminate, prepreg and laminate using the same Download PDFInfo
- Publication number
- JP4075449B2 JP4075449B2 JP2002137415A JP2002137415A JP4075449B2 JP 4075449 B2 JP4075449 B2 JP 4075449B2 JP 2002137415 A JP2002137415 A JP 2002137415A JP 2002137415 A JP2002137415 A JP 2002137415A JP 4075449 B2 JP4075449 B2 JP 4075449B2
- Authority
- JP
- Japan
- Prior art keywords
- cyanate ester
- resin composition
- compound
- curable resin
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004643 cyanate ester Substances 0.000 title claims description 98
- 239000011342 resin composition Substances 0.000 title claims description 62
- 150000001913 cyanates Chemical class 0.000 title claims description 35
- 229920005989 resin Polymers 0.000 claims description 80
- 239000011347 resin Substances 0.000 claims description 80
- 150000001875 compounds Chemical class 0.000 claims description 47
- -1 monohydric phenol compound Chemical class 0.000 claims description 35
- 239000003063 flame retardant Substances 0.000 claims description 26
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 24
- 239000005062 Polybutadiene Substances 0.000 claims description 24
- 229920002857 polybutadiene Polymers 0.000 claims description 23
- 230000009257 reactivity Effects 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 239000002966 varnish Substances 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 15
- 239000007809 chemical reaction catalyst Substances 0.000 claims description 14
- QBDSZLJBMIMQRS-UHFFFAOYSA-N p-Cumylphenol Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=CC=C1 QBDSZLJBMIMQRS-UHFFFAOYSA-N 0.000 claims description 13
- 239000002904 solvent Substances 0.000 claims description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- DEIGXXQKDWULML-UHFFFAOYSA-N 1,2,5,6,9,10-hexabromocyclododecane Chemical compound BrC1CCC(Br)C(Br)CCC(Br)C(Br)CCC1Br DEIGXXQKDWULML-UHFFFAOYSA-N 0.000 claims description 5
- PQRRSJBLKOPVJV-UHFFFAOYSA-N 1,2-dibromo-4-(1,2-dibromoethyl)cyclohexane Chemical compound BrCC(Br)C1CCC(Br)C(Br)C1 PQRRSJBLKOPVJV-UHFFFAOYSA-N 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- IYDYVVVAQKFGBS-UHFFFAOYSA-N 2,4,6-triphenoxy-1,3,5-triazine Chemical class N=1C(OC=2C=CC=CC=2)=NC(OC=2C=CC=CC=2)=NC=1OC1=CC=CC=C1 IYDYVVVAQKFGBS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 4
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- SHZIWNPUGXLXDT-UHFFFAOYSA-N caproic acid ethyl ester Natural products CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 239000011888 foil Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 3
- 125000005609 naphthenate group Chemical group 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- 150000001334 alicyclic compounds Chemical class 0.000 claims 1
- 238000005470 impregnation Methods 0.000 claims 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 84
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 36
- 239000000243 solution Substances 0.000 description 23
- 238000002156 mixing Methods 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 20
- 238000003756 stirring Methods 0.000 description 19
- 229920001955 polyphenylene ether Polymers 0.000 description 15
- 239000000047 product Substances 0.000 description 14
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 239000000126 substance Substances 0.000 description 11
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate group Chemical group [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 8
- 239000003822 epoxy resin Substances 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- 238000010992 reflux Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000001294 propane Substances 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 4
- 229920003192 poly(bis maleimide) Polymers 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- JNCRKOQSRHDNIO-UHFFFAOYSA-N [4-[(4-cyanato-3,5-dimethylphenyl)methyl]-2,6-dimethylphenyl] cyanate Chemical compound CC1=C(OC#N)C(C)=CC(CC=2C=C(C)C(OC#N)=C(C)C=2)=C1 JNCRKOQSRHDNIO-UHFFFAOYSA-N 0.000 description 3
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- MIHINWMALJZIBX-UHFFFAOYSA-N cyclohexa-2,4-dien-1-ol Chemical class OC1CC=CC=C1 MIHINWMALJZIBX-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- SGGOJYZMTYGPCH-UHFFFAOYSA-L manganese(2+);naphthalene-2-carboxylate Chemical compound [Mn+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 SGGOJYZMTYGPCH-UHFFFAOYSA-L 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- OAODHPOFUUWKSI-UHFFFAOYSA-N (2,4,6-trimethylphenyl) cyanate Chemical compound CC1=CC(C)=C(OC#N)C(C)=C1 OAODHPOFUUWKSI-UHFFFAOYSA-N 0.000 description 2
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- INHGSGHLQLYYND-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(OC#N)C=C1 INHGSGHLQLYYND-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229940120693 copper naphthenate Drugs 0.000 description 2
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 2
- 125000001651 cyanato group Chemical group [*]OC#N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- DGZQEAKNZXNTNL-UHFFFAOYSA-N 1-bromo-4-butan-2-ylbenzene Chemical class CCC(C)C1=CC=C(Br)C=C1 DGZQEAKNZXNTNL-UHFFFAOYSA-N 0.000 description 1
- QBFHSEQNGHSFLZ-UHFFFAOYSA-N 2,4,6-tris(2,3,4-tribromophenoxy)-1,3,5-triazine Chemical compound BrC1=C(Br)C(Br)=CC=C1OC1=NC(OC=2C(=C(Br)C(Br)=CC=2)Br)=NC(OC=2C(=C(Br)C(Br)=CC=2)Br)=N1 QBFHSEQNGHSFLZ-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- SIZDMAYTWUINIG-UHFFFAOYSA-N [4-[1-(4-cyanatophenyl)ethyl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)C1=CC=C(OC#N)C=C1 SIZDMAYTWUINIG-UHFFFAOYSA-N 0.000 description 1
- MGURRWJWGJUVEM-UHFFFAOYSA-N [4-[2,6-di(propan-2-yl)phenyl]phenyl] cyanate Chemical compound CC(C)C1=CC=CC(C(C)C)=C1C1=CC=C(OC#N)C=C1 MGURRWJWGJUVEM-UHFFFAOYSA-N 0.000 description 1
- SPLKBPHYWSCFMI-UHFFFAOYSA-N [4-[5-(4-cyanatophenyl)-2,4-di(propan-2-yl)phenyl]phenyl] cyanate Chemical compound O(C#N)C1=CC=C(C=C1)C1=CC(=C(C=C1C(C)C)C(C)C)C1=CC=C(C=C1)OC#N SPLKBPHYWSCFMI-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- QKIUAMUSENSFQQ-UHFFFAOYSA-N dimethylazanide Chemical compound C[N-]C QKIUAMUSENSFQQ-UHFFFAOYSA-N 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920013636 polyphenyl ether polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000005829 trimerization reaction Methods 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、高周波帯域において低損失性が求められる無線通信関連の端末機器やアンテナ、マイクロプロセッサの動作周波数が数百MHzを越えるような高速コンピュータなどに用いられる印刷配線板用の基板を製造するのに適した樹脂組成物並びにこれを用いた積層板用プリプレグ及び金属張り積層板に関するものである。即ち本発明は、高周波特性に優れる変性シアネートエステル系硬化性樹脂組成物並びにこれを用いた積層板用プリプレグ及び金属張り積層板に関する。
更に詳しくは、耐熱性が良好で、従来のエポキシ樹脂などの熱硬化性樹脂積層板と同様な成形性及び加工性を示し、かつ誘電特性、特に高周波帯域での誘電正接が低く低損失性に優れた高密度多層配線板製造が可能な硬化性樹脂脂組成物並びにこれを用いた積層板用プリプレグ及び金属張り積層板に関するものである。
【0002】
【従来の技術】
高度情報化社会では大量のデータを高速で処理する必要があり、コンピュータや情報機器端末などでは信号の高周波化が進んでいる。しかしながら、電気信号は周波数が高くなる程伝送損失が大きくなるという性質があり、高周波化に対応した低損失性の印刷配線板の開発が強く求められている。
印刷配線板での伝送損失は、配線(導体)の形状、表皮抵抗、特性インピーダンス等で決まる導体損と配線周りの絶縁層(誘電体)の誘電特性で決まる誘電体損とからなり、高周波回路では誘電体損による電力ロスの影響が大きい。したがって、高周波回路の伝送損失を低減するためにはプリント配線板用基板(特に絶縁樹脂)の低誘電率及び低誘電正接(tanδ)化が必要と考えられる。例えば、高周波信号を扱う移動体通信関連の機器では、信号の高周波化に伴い準マイクロ波帯(1〜3GHz)での伝送損失を少なくするため誘電正接の低い基板が強く望まれるようになっている。
【0003】
またコンピュータなどの電子情報機器では、大量の情報を短時間で処理するために動作周波数が200MHzを越える高速マイクロプロセッサの開発や信号の高周波化が進んでいる。このような高速パルス信号を扱う機器では印刷配線板上での遅延が問題になってきた。印刷配線板での信号遅延時間は配線まわりの絶縁物の比誘電率εrの平方根に比例して長くなるため、コンピュータなどに用いられる配線板では誘電率の低い基板用樹脂が要求されている。
【0004】
以上のような信号の高周波化に対応し印刷配線板の高周波特性を改善する樹脂組成物として、熱硬化性樹脂の中で最も誘電率が低いシアネートエステル樹脂による組成物として、特公昭46−41112号公報に示されているシアネートエステル/エポキシ樹脂組成物、特公昭52−31279号公報に示されているビスマレイミド/シアネートエステル/エポキシ樹脂組成物を用いる方法がある。
【0005】
また熱可塑性樹脂を用いて高周波特性を改善するものとして、特公平5-77705号公報に示されているポリフェニレンエーテル(PPO又はPPE)と架橋性ポリマ/モノマとの樹脂組成物及び特公平6-92533号公報に示されている特定の硬化性官能基を持つポリフェニレンエーテルと架橋性モノマとの樹脂組成物等のように耐熱性熱可塑性樹脂の中では誘電特性が良好なポリフェニレンエーテル系樹脂組成物を用いる方法がある。
【0006】
また誘電率が低いシアネートエステル樹脂と誘電特性が良好なポリフェニレンエーテルからなる樹脂組成物を用いて高周波特性を改善するものとして、特公昭63-33506号公報に示されているシアネートエステル/ビスマレイミドとポリフェニレンエーテルとの樹脂組成物、特開平5-311071号公報に示されているフェノール変性樹脂/シアネートエステル反応物とポリフェニレンエーテルとの樹脂組成物を用いる方法がある。更に高周波特性の良い耐熱性成形材料として、特公昭61-18937号公報に示されているようにポリフェニレンエーテルにシアネートエステル樹脂を混練した樹脂組成物がある。
【0007】
【発明が解決しようとする課題】
特公昭46-41112号公報や特公昭52-31279号公報に示される方法は、誘電率が若干低くなるもののシアネートエステル樹脂以外の他の熱硬化性樹脂を含有しているため高周波特性が不十分という問題点があった。
【0008】
特公平5-77705号公報や特公平6-92533号公報に示される方法は、誘電特性は改善されるものの、本来熱可塑性ポリマであるポリフェニレンエーテルを主体としているために樹脂組成物の溶融粘度が高く流動性が不足するという問題点があった。したがって、積層板をプレス成形する時に高温高圧が必要となったり、微細な回路パターン間の溝を埋める必要の有る多層印刷配線板を製造するには成形性が悪くて不適であった。
【0009】
特公昭63-33506号公報や特開平5-311071号公報に示される方法は、ポリフェニレンエーテルと併用する熱硬化性樹脂がビスマレイミド/シアネートエステル樹脂やフェノール変性樹脂/シアネートエステル反応物であるため、誘電特性が若干改善されるものの高周波特性は依然として不十分であるという問題点があった。なお、高周波特性を良くするためにポリフェニレンエーテルの配合量を増加すると前述のポリフェニレンエーテル系樹脂組成物と同様に樹脂組成物の溶融粘度が高くなって流動性が不足するため成形性が悪いという問題点があった。
【0010】
また特公昭61-18937号公報に示されるポリフェニレンエーテルにを混練した樹脂組成物は誘電特性が良好であり、かつシアネートエステル樹脂で変性すると溶融粘度が低くなるために樹脂組成物の成形性も比較的良好であるものの、硬化性成分としてシアネートエステルを単独で用いるとその樹脂硬化物の誘電特性は誘電正接が誘電率の値の割に高いという傾向にあり、高周波帯域の伝送損失を十分に低減できないという問題点があった。さらに、誘電正接を低くするためシアネートエステルの配合量を少なく(ポリフェニレンエーテルの配合量を増加)すると前述のポリフェニレンエーテル系樹脂組成物と同様に樹脂組成物の溶融粘度が高なって流動性が不足するため成形性が悪いという問題点があった。
【0011】
このような状況を鑑みて本発明者らは、先に特定のシアネートエステル樹脂を1価フェノール類化合物で変性した組成物をマトリックス樹脂の一部または全部に用いる方法(特願平9−80033号)を提案した。しかしながら、特定のシアネートエステル樹脂を1価フェノール類化合物で変性することによって高周波特性が良好な樹脂組成物を得ることができたが、使用している特定のシアネートエステル樹脂が特殊かつ高価であるという問題点があった。
【0012】
本発明は、耐熱性が良好で、従来のエポキシ樹脂などの熱硬化性樹脂積層板と同様な成形性及び加工性を具備し、かつ誘電特性、高周波帯域での誘電正接が低く低損失性に優れた高密度多層配線板製造が可能な硬化性樹脂組成物並びにこれを用いた積層板用プリプレグ及び金属張り積層板を提供するものである。
【0013】
【課題を解決するための手段】
本発明は次のものに関する。
(1) (A)式[1]で示されるシアネートエステル類化合物
【0014】
【化4】
と、(B)式[2]で示される1価フェノール類化合物
【0015】
【化5】
【0016】
(式中、R4及びはR5は、水素原子または低級アルキル基を表し、それぞれ同じであっても異なっていてもよい。またnは1〜2の正の整数)、(C)ポリブタジエン樹脂
(D)シアネートエステル類化合物と反応性を有しない難燃剤及び
(E)金属系反応触媒を必須成分として含有することを特徴とする積層板用変性シアネートエステル系硬化性樹脂組成物。
【0017】
(2) (A)シアネートエステル類化合物の100重量部に対して(B)1価フェノール類化合物を4〜30重量部配合することを特徴とする上記(1)記載の積層板用変性シアネートエステル系硬化性樹脂組成物。
【0018】
(3) (A)シアネートエステル類化合物と(B)1価フェノール類化合物の一部又は全部を反応させて得られる変性シアネートエステル樹脂と、(C)ポリブタジエン樹脂、(D)シアネートエステル類化合物と反応性を有しない難燃剤及び(E)金属系反応触媒を必須成分として含有することを特徴とする上記(1)又は(2)記載の積層板用変性シアネートエステル系硬化性樹脂組成物。
【0019】
(4) (A)シアネートエステル類化合物が、2,2−ビス(4−シアナトフェニル)プロパン及びビス(3,5−ジメチル−4−シアナトフェニル)メタンのいずれかの1種又は混合物である上記(1)乃至(3)のいずれかに記載の積層板用変性シアネートエステル系硬化性樹脂組成物。
【0020】
(5) (B)1価フェノール類化合物がp−(α−クミル)フェノールである上記(1)乃至(4)のいずれかに記載の積層板用変性シアネートエステル系硬化性樹脂組成物。
【0021】
(6) (D)シアネートエステル類化合物と反応性を有しない難燃剤が、1,2−ジブロモ−4−(1,2−ジブロモエチル)シクロヘキサン、テトラブロモシクロオクタン及びヘキサブロモシクロドデカンから選ばれる脂環式難燃剤の一種又はこれらの2種類以上の混合物である上記(1)乃至(5)のいずれかに記載の積層板用変性シアネートエステル系硬化性樹脂組成物。
【0022】
(7) (D)シアネートエステル類化合物と反応性を有しない難燃剤が、式[3]
【0023】
【化6】
【0024】
(式中、l、m、nは、1〜5の整数を表し、それぞれ同じ値であっても異なっていてもよい)で示される臭素化トリフェニルシアヌレート系難燃剤又はこれら少なくとも1種類以上とその他のシアネートエステル類化合物と反応性を有しない難燃剤との2種類以上の混合物である上記(1)乃至(6)のいずれかに記載の積層板用変性シアネートエステル系硬化性樹脂組成物。
【0025】
(8) (E)金属系反応触媒がマンガン、鉄、コバルト、ニッケル、銅及び亜鉛の2−エチルヘキサン酸塩、ナフテン酸塩及びアセチルアセトン錯体から選ばれる一種類又は二種類以上である上記(1)乃至(7)のいずれかに記載の積層板用変性シアネートエステル系硬化性樹脂組成物。
【0026】
(9) 上記(1)ないし(8)のいずれかに記載の積層板用変性シアネートエステル系硬化性樹脂組成物を溶剤に溶解又は分散してワニスとし、このワニスを基材に含浸後、80〜200℃で乾燥させて得られる積層板用プリプレグ。
【0027】
(10) 上記(9)記載の積層板用プリプレグを任意枚数重ね、さらにその上下面又は片面に金属箔を積層し、加熱加圧して得られる金属張り積層板。
【0028】
【発明の実施の形態】
本発明は、(A)式[1]で示されるシアネートエステル類化合物、(B)式[2]で示される一価フェノール類化合物、(C)ポリブタジエン樹脂、(D)シアネートエステル類化合物との反応性を有しない難燃剤及び(E)金属系反応触媒を必須成分としてなる高周波特性に優れる積層板用変性シアネートエステル系硬化性樹脂組成物並びにこれを用いた積層板用プリプレグ及び金属張り積層板である。
【0029】
また更に加えて本発明は、(A)式[1]で示されるシアネートエステル類化合物の100重量部に対して(B)式[2]で示される1価フェノール類化合物を4〜30重量部反応させて得られる変性シアネートエステル系樹脂を用いることを特徴とする、高周波帯域での誘電正接が低く低損失性に優れる積層板用変性シアネートエステル系硬化性樹脂組成物並びにこれを用いた積層板用プリプレグ及び金属張り積層板である。
【0030】
高分子材料など誘電特性は双極子の配向分極による影響が大きく、したがって分子内の極性基を少なくすることにより低誘電率化が図れ、また極性基の運動性を抑えることにより誘電正接を低くすることが可能である。シアネートエステル樹脂は、極性の強いシアナト基を有していながら硬化時には対称性かつ剛直なトリアジン構造を生成するので、熱硬化性樹脂としては最も低い誘電率及び誘電正接の硬化物が得られるという特徴がある。
【0031】
しかしながら、実際の硬化反応においては、シアネートエステル樹脂中のすべてのシアナト基が反応してトリアジン構造を生成するということは不可能であり、硬化反応の進行に伴って反応系が流動性を失い未反応のシアナト基として系内に残存することになる。その結果、これまでは本来の硬化物より誘電率や誘電正接の高い硬化物しか得られなかった。
【0032】
これに対して本発明の樹脂組成物では、(B)一価フェノール類化合物を適正量配合することで未反応として残るシアナト基をイミドカーボネート化してその極性を減じることにより硬化物の誘電率と誘電正接を低下させようとした物である。この目的で用いる材料としては、シアナト基との反応性が高く、また単官能で比較的低分子量でありかつシアネートエステル樹脂との相溶性が良い(分子構造に類似性があり)化合物が適していると考えられる。本発明の樹脂組成物で用いている一価のフェノール類化合物は、このような理由によって特定された化合物である。
【0033】
従来、シアネートエステルの三量化反応(トリアジン環の生成)の助触媒として、ノニルフェノール等のフェノール化合物はシアネートエステル100重量部に対して1〜2重量部程度用いられていた。しかし、配合量が触媒量であったため上記のような、未反応のシアナト基と反応し低極性化するという効果は認められなかった。しかるに本発明者らがフェノール化合物の配合量について検討した結果、フェノール化合物を従来よりも多量に配合することにより硬化物の誘電率と誘電正接が低下することを認め、かつ特定の一価フェノール類化合物を用いれば、配合量が増える事による耐熱性の低下も抑制できることを見出した。そのため本発明の方法によれば、これまでのシアネートエステル樹脂単独の硬化物や、従来のエポキシ樹脂や多価フェノール類(片方の水酸基が未反応基として残り易いため誘電特性をかえって悪化させる)及びビスマレイミド等を配合した樹脂の硬化物よりも誘電率と誘電正接の低い硬化物が得られるようになった。
【0034】
したがって本発明の樹脂組成物では、一価フェノール類化合物の配合量が重要である。すなわち、配合量が少ない場合は未反応として残存する全てのシアナト基と反応し低極性化することができず、配合量が必要量より多い場合はかえって自分自身が未反応として残存し、自身の水酸基の極性によって硬化物の誘電特性を悪化させてしまうことになるからである。
【0035】
さらに本発明の樹脂組成物では、誘電特性が良好な熱可塑性樹脂である(C)ポリブタジエン樹脂を上記の変性シアネートエステル樹脂に配合することにより誘電特性の向上を図っている。シアネートエステル樹脂とポリブタジエン樹脂とは、本来非相容系であり均一な樹脂を得ることが困難であるが、本発明者らが見出した手法によれば、(A)シアネートエステル類化合物と(B)一価フェノール類化合物の反応を、ポリブタジエン樹脂の溶媒溶液中で反応を行うと、いわゆる“セミIPN"化樹脂が生成し均一な樹脂溶液が得られることがわかった。
また本発明の樹脂組成物において用いられる難燃剤は、(A)シアネートエステル類化合物と(B)一価フェノール類化合物の反応を阻害しないようにシアネートエステル類化合物と反応性を有しないことが必須であり、炭化水素系の低極性化合物であるため硬化物の誘電特性を悪化させることが少ない。また、もう一種類の特定した難燃剤は炭化水素系以外の化合物であってもシアネートエステルの硬化物と同様なトリアジン構造をもっているためシアネートエステル樹脂硬化物に相容し易く、耐熱性や誘電特性を悪化させることなく耐燃性を付与することができる。
【0036】
本発明の樹脂組成物は、(A)式[1]で示されるシアネートエステル類化合物、(B)式[2]で示される1価フェノール類化合物、(C)ポリブタジエン樹脂、(D)シアネートエステル類化合物と反応性を有しない難燃剤及び(E)金属系反応触媒を必須成分とする。本発明における(A)シアネートエステル類化合物は、式[1]で示されように1分子中にシアナト基を2個有するシアネートエステル類化合物である。式[1]で示される化合物としては、例えば、ビス(4−シアナトフェニル)エタン、2,2−ビス(4−シアナトフェニル)プロパン、ビス(3,5−ジメチル−4−シアナトフェニル)メタン、2,2−ビス(4−シアナトフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン、α,α'−ビス(4−シアナトフェニル)−m−ジイソプロピルベンゼン、フェノール付加ポリスチレン重合体のシアネートエステル化物等が挙げられる。その中でも、2,2−ビス(4−シアナトフェニル)プロパン及びビス(3,5−ジメチル−4−シアナトフェニル)メタン等がより好ましい。また(A)シアネートエステル類化合物は、一種類を単独で用いてもよく、又は二種類以上を混合して用いてもよい。
【0037】
本発明における(B)1価フェノール類化合物は、式[2]で示される1価フェノール類であり、耐熱性の良好な化合物が好ましい。式[2]で示される化合物としては、例えば、p−(α−クミル)フェノールが挙げらる。なお、(B)一価フェノール類化合物は、一種類を単独で用いてもよく、又は二種類以上を混合して用いてもよい。
【0038】
本発明における(B)一価フェノール類化合物の配合量は、(A)シアネートエステル類化合物100重量部に対して4〜30重量部とするのが好ましく、5〜30重量部とすることがより好ましく、5〜25重量部とすることが特に好ましい。(B)一価フェノール類化合物の配合量が4重量部未満では十分な誘電特性が得られず、特に高周波帯域での誘電正接が十分に低くならない傾向がある。また30重量部を超えるとかえって誘電正接が高くなるという傾向があり望ましくない。したがって、本発明が提供する高周波帯において誘電正接の低いシアネートエステル系樹脂硬化物を得るためには、(A)シアネートエステル類化合物に対して適切な配合量の(B)一価フェノール類化合物を配合する必要がある。
【0039】
本発明における(A)シアネートエステル類化合物と(B)一価フェノール類化合物は、通常、それぞれを反応させて得られる変性シアネートエステル樹脂として用いられる。すなわち、(A)シアネートエステル類化合物のプレポリマ化とともに、(A)シアネートエステル類化合物に(B)一価フェノール類化合物を付加させたイミドカーボネート化変性樹脂として用いられる。
【0040】
(A)シアネートエステル類化合物と(B)一価フェノール類化合物を反応させる際には、(B)一価フェノール類化合物を反応初期から上記の適正配合量の全部を投入して反応させて変性シアネートエステル樹脂としても良いし、反応初期は上記の適正配合量の一部を反応させ、冷却後残りの(B)一価フェノール類化合物を投入して、Bステージ化時あるいは硬化時に反応させて変性シアネートエステル樹脂としても良い。
【0041】
本発明における(C)ポリブタジエン樹脂としては、数平均分子量が500から5,000以下のものが、相容性が良く、誘電特性も向上させるため好ましい。本発明における(C)ポリブタジエン樹脂の配合量は、(A)シアネートエステル類化合物100重量部に対して5〜300重量部とすることが好ましく、10〜200重量部とすることがより好ましく、15〜100重量部とすることが特に好ましい。(C)ポリブタジエン樹脂の配合量が5重量部未満では十分な誘電特性が得られなくなる傾向があり、300重量部を超えると樹脂の溶融粘度が高くなって流動性が不足するため成形性が悪くなり、また(A)シアネートエステル類の反応性も悪くなる傾向がある。
【0042】
本発明における(D)シアネートエステル類化合物と反応性を有しない難燃剤としては、例えば、1,2−ジブロモ−4−(1,2−ジブロモエチル)シクロヘキサン、テトラブロモシクロヘキサン、ヘキサブロモシクロドデカン、ポリブロモジフェニルエーテル、臭素化ポリスチレン、臭素化ポリカーボネート及び式[3]で示される臭素化トリフェニルシアネレート系難燃剤等が挙げられ、その中でも、1,2−ジブロモ−4−(1,2−ジブロモエチル)シクロヘキサン、テトラブロモシクロオクタン、ヘキサブロモシクロドデカン、2,4,6−トリス(トリブロモフェノキシ)−1,3,5−トリアジン等がより好ましい。
本発明における(D)シアネートエステル類化合物と反応性を有しない難燃剤の配合量は、(A)シアネートエステル類化合物、(B)一価フェノール類化合物及び(C)ポリブタジエン樹脂の総量100重量部に対して5〜30重量部とすることが好ましく、5〜20重量部とすることがより好ましく、10〜20重量部とすることが特に好ましい。(D)シアネートエステル類化合物と反応性を有しない難燃剤の配合量が5重量部未満では耐燃性が不十分となる傾向があり、30重量部を超えると樹脂の耐熱性が低下する傾向がある。
【0043】
本発明の(E)金属系反応触媒は、(A)シアネートエステル類化合物と(B)一価フェノール類化合物との反応を促進するものであり、変性シアネート系樹脂組成物を製造する際の反応触媒及び積層板を製造する際の硬化促進剤として用いられる。金属系反応触媒類としては、マンガン、鉄、コバルト、ニッケル、銅、亜鉛等の金属触媒類が用いられ、具体的には、2−エチルヘキサン酸塩やナフテン酸塩等の有機金属塩化合物及びアセチルアセトン錯体などの有機金属錯体として用いられる。変性シアネート系樹脂組成物を製造する際の反応促進剤と積層板を製造する際の硬化促進剤で同一の金属系反応触媒を単独で用いてもよく、又はそれぞれ別の二種類以上を用いてもよい。
【0044】
本発明における(E)金属系反応触媒の配合量は、(A)シアネートエステル類化合物に対して1〜300ppmとすることが好ましく、1〜200ppmとすることがより好ましく、2〜150ppmとすることが特に好ましい。(E)金属系反応触媒の配合量が1ppm未満では反応性及び硬化性が不十分となる傾向があり、300ppmを超えると反応の制御が難しくなったり、硬化が速くなりすぎて成形性が悪くなる傾向がある。また、本発明における(E)金属系反応触媒の配合時期は、変性シアネート系樹脂組成物を製造する際に反応促進剤及び硬化促進剤として必要な量を同時ににまとめて配合してもよいし、変性シアネート系樹脂組成物を製造する際に変性反応の促進に必要な量を用い、反応終了後残りの触媒、又は別の金属系触媒を硬化促進剤として添加混合してもよい。
【0045】
本発明の樹脂組成物には、上記必須成分以外に必要に応じて無機充填剤及びその他添加剤を配合することができる。充填剤としては、シリカ、アルミナ、水酸化アルミニウム、炭酸カルシウム、クレイ、タルク、窒化珪素、窒化ホウ素、酸化チタン、チタン酸バリウム、チタン酸鉛、チタン酸ストロンチウム等を使用することができる。この配合量としては、本発明の樹脂組成物の総量100重量部に対して、200重量部以下とすることが好ましい。
以上説明した本発明の樹脂組成物は、例えば、以下に示すようにして印刷配線板用プリプレグ又は積層板の製造に供せられる。すなわち本発明の樹脂組成物を溶剤に溶解してワニスとし、ガラス布などの基材に含浸し乾燥することによってまずプリプレグを作製する。ついでこのプリプレグを任意枚数重ねその上下面又は片面に金属箔を重ねて加熱加圧成形することにより両面又は片面の金属張り積層板とすることができる。
本発明の樹脂組成物をワニス化する場合に用いられる溶剤の具体例としては、ベンゼン、トルエン、キシレン等の芳香族炭化水素類、トリクロロエチレン、クロロベンゼン等のハロゲン化炭化水素類、N、N−ジメチルホルムアミド、N、N−ジメチルアセトアミド等のアミド系やN−メチルピロリドンなどの窒素系溶剤などが用いられる。特にベンゼン、トルエン、キシレン等の芳香族炭化水素類がより好ましい。これらの溶剤類は一種類単独で用いてもよく又は二種類以上を混合して用いてもよい。芳香族炭化水素系溶剤の配合量は、(C)ポリブタジエン樹脂
【0046】
100重量部に対して150〜500重量部が好ましく、150〜400重量部がより好ましく、150〜300重量部が特に好ましい。
さらにアセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類は、本発明の樹脂組成物に対する溶解度は低いが、上記の溶媒類と併用した場合は本発明の樹脂組成物の懸濁溶液を生成し、高濃度でかつ粘度の低い溶液が得られるという利点がある。この観点から、本発明の樹脂組成物をワニス化する場合に用いる溶剤としては、ベンゼン、トルエン、キシレン等の芳香族炭化水素類とアセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類との混合溶媒が特に好ましい。ケトン系溶剤の配合量は、芳香族炭化水素系溶剤100重量部に対して50〜500重量部用いるのが好ましく、50〜400重量部がより好ましく、50〜300重量部が特に好ましい。
【0047】
【実施例】
以下、実施例により本発明をより詳細に説明する。
表1に示す配合量に従い積層板用ワニスを製造した。
実施例1
温度計、冷却管、攪拌装置を備えた5リットルの4つ口セパラブルフラスコに、トルエン450gとポリブタジエン樹脂(R−45HT、出光石油化学製)210gを投入し、80℃に加熱し攪拌溶解した。次に2,2−ビス(4−シアネートフェニル)プロパン(ArocyB−10、旭チバ製)700g、p−(α−クミル)フェノール(サンテクノケミカル製)64g、臭素化トリフェニルシアヌレート(ピロガードSR−245、第一工業製薬製)135gを投入溶解後、ナフテン酸コバルト(Co含有量=8%、日本化学産業製)の10%トルエン溶液4gを添加し還流温度で1時間反応させた。ついで反応液を冷却し、内温が90℃になったらメチルエチルケトン(MEK)600gを攪拌しながら投入し懸濁化させた。さらに室温まで冷却した後、ナフテン酸亜鉛(Zn含有量=8%、日本化学産業製)の10%トルエン溶液1gを添加し攪拌溶解して印刷配線板用樹脂ワニス(固形分濃度=51%)を製造した。
【0048】
実施例2
温度計、冷却管、攪拌装置を備えた5リットルの4つ口セパラブルフラスコに、トルエン300gとポリブタジエン樹脂(R−45HT、出光石油化学製)140gを投入し、80℃に加熱し攪拌溶解した。次に2,2−ビス(4−シアネートフェニル)プロパン(ArocyB−10、旭チバ製)700g、p−(α−クミル)フェノール(サンテクノケミカル製)10g、臭素化トリフェニルシアヌレート(ピロガードSR−245、第一工業製薬製)125gを投入溶解後、ナフテン酸マンガン(Mn含有量=8%、日本化学産業製)の10%トルエン溶液3gを添加し還流温度で1時間反応させた。ついで反応液を冷却し、内温が90℃になったらメチルエチルケトン(MEK)600gを攪拌しながら投入し懸濁化させた。さらに室温まで冷却した後、p−(α−クミル)フェノール75g、ナフテン酸亜鉛(Zn含有量=8%、日本化学産業製)の10%トルエン溶液1gを添加し攪拌溶解して印刷配線板用樹脂ワニス(固形分濃度=54%)を製造した。
【0049】
実施例3
温度計、冷却管、攪拌装置を備えた5リットルの4つ口セパラブルフラスコに、トルエン300gとポリブタジエン樹脂(R−45HT、出光石油化学製)80gを投入し、80℃に加熱し攪拌溶解した。次にα,α’−ビス(4−シアナトフェニル)−m−ジイソプロピルベンゼン(RTX−366、旭チバ製)800g、p−(α−クミル)フェノール(サンテクノケミカル製)10gを投入溶解後、ナフテン酸鉄(鉄含有量=5%、日本化学産業製)の10%トルエン溶液2gを添加し還流温度で1時間反応させ、ついで1,2−ジブロモ−4−(1,2−ジブロモエチル)シクロヘキサン(SaytexBCL−462、アルベマール製)110gを投入溶解させた。反応液を冷却し、内温が90℃になったらメチルエチルケトン(MEK)600gを攪拌しながら投入し懸濁化させた。さらに室温まで冷却した後、p−(α−クミル)フェノール75g、ナフテン酸銅(銅含有量=5%、日本化学産業製)の10%トルエン溶液2gを添加し攪拌溶解して印刷配線板用樹脂ワニス(固形分濃度=54%)を製造した。
【0050】
実施例4
温度計、冷却管、攪拌装置を備えた5リットルの4つ口セパラブルフラスコに、トルエン600gとポリブタジエン樹脂(R−45HT、出光石油化学製)300gを投入し、80℃に加熱し攪拌溶解した。次にビス(3,5−ジメチル−4−シアナトフェニル)メタン(ArocyM−10、旭チバ製)600g、p−(α−クミル)フェノール(サンテクノケミカル製)30gを投入溶解後、ナフテン酸コバルト(Co含有量=8%、日本化学産業製)の10%トルエン溶液4gを添加し還流温度で1時間反応させ、ついでヘキサブロモシクロドデカン(CD−75P、グレートレイクス製)150gを投入溶解させた。反応液を冷却し、内温が90℃になったらメチルエチルケトン(MEK)750gを攪拌しながら投入し懸濁化させた。さらに室温まで冷却した後、p−(α−クミル)フェノール120gを添加し攪拌溶解して印刷配線板用樹脂ワニス(固形分濃度=47%)を製造した。
【0051】
実施例5
温度計、冷却管、攪拌装置を備えた5リットルの4つ口セパラブルフラスコに、トルエン750gとポリブタジエン樹脂(R−45HT、出光石油化学製)400gを投入し、80℃に加熱し攪拌溶解した。次に2,2−ビス(4−シアナトフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン(ArocyF−10,旭チバ製)500g、p−(α−クミル)フェノール(サンテクノケミカル製)28gを投入溶解後、ナフテン酸銅(Cu含有量=5%、日本化学産業製)の10%トルエン溶液6gを添加し還流温度で1時間反応させ、ついでテトラブロモシクロオクタン(SaytexBC−48、アルベマール製)150gを投入溶解させた。ついで反応液を冷却し、内温が90℃になったらメチルエチルケトン(MEK)500gを攪拌しながら投入し懸濁化させた。室温まで冷却した後、ナフテン酸マンガン(Mn含有量=8%、日本化学産業製)の10%トルエン溶液1gを添加し攪拌溶解して印刷配線板用樹脂ワニス(固形分濃度=46%)を製造した。
【0052】
比較例1
実施例1において、トルエン1800gにポリブタジエン樹脂(R−45HT、出光石油化学製)210g、2,2−ビス(4−シアネートフェニル)プロパン(ArocyB−10、旭チバ製)700g及びp−(α−クミル)フェノールの替わりに2,2−ビス(4−ヒドロキシフェニル)プロパン(BPA;ビスフェノールA、三井東圧化学製)69gを投入し、攪拌溶解後ナフテン酸コバルト(Co含有量=8%、日本化学産業製)の10%トルエン希釈溶液3gを添加して還流温度で1時間反応させた。ついで、難燃剤としてシアネナト基と反応性を有する臭素化ビスフェノールA型エポキ樹脂(ESB400、住友化学工業製)200gを投入溶解し冷却した。しかし常温付近で樹脂溶液が固化(グリース状)したため、トルエン1200gをさらに添加して攪拌溶解し印刷配線板用樹脂ワニス(固形分濃度=28%)を製造した。
【0053】
比較例2
実施例1において、トルエン1800gにポリブタジエン樹脂(R−45HT、出光石油化学製)210g、2,2−ビス(4−シアネートフェニル)プロパン(ArocyB−10、旭チバ製)700g及びp−(α−クミル)フェノールの替わりにノニルフェノール(三井東圧化学製)11gを投入し、攪拌溶解後ナフテン酸コバルト(Co含有量=8%、日本化学産業製)の10%トルエン希釈溶液4gを添加して還流温度で1時間反応させた。ついで、難燃剤としてシアネナト基と反応性を有する臭素化ビスフェノールA型エポキ樹脂(ESB400、住友化学工業製)190gを投入溶解し冷却した。しかし常温付近で樹脂溶液が固化(グリース状)したため、トルエン900gをさらに添加して攪拌溶解し印刷配線板用樹脂ワニス(固形分濃度=29%)を製造した。
【0054】
比較例3
実施例1において、トルエン1500gにポリブタジエン樹脂(R−45HT、出光石油化学製)210gを投入し80℃に加熱して攪拌溶解し、次に2,2−ビス(4−シアネートフェニル)プロパン(ArocyB−10、旭チバ製)の替わりに2,2−ビス(4−シアネートフェニル)プロパンのオリゴマ(ArocyB−30、旭チバ製)700g、p−(α−クミル)フェノールの替わりにノニルフェノール67g及び難燃剤としてシアネナト基と反応性を有する臭素化ビスフェノールA型エポキ樹脂(ESB400、住友化学工業製)200gを投入して80℃で1時間加熱溶解した。ついで常温まで冷却し、ナフテン酸亜鉛(Zn含有量=8%、日本化学産業製)の10%トルエン溶液3gを添加して印刷配線板用樹脂ワニス(固形分濃度=44%)を製造した。しかし、この樹脂ワニスは2日後にポリブタジエン樹脂の凝集分離物が観察された。
【0055】
比較例4
実施例4において、トルエン1600gとポリブタジエン樹脂(R−45HT、出光石油化学製)300g、ビス(3,5−ジメチル−4−シアナトフェニル)メタン(ArocyM−10、旭チバ製)600g及びp−(α−クミル)フェノール(サンテクノケミカル製)の替わりにノニルフェノール9gを投入し、攪拌溶解後ナフテン酸マンガン(Mn含有量=8%、日本化学産業製)の10%トルエン溶液3gを添加して還流温度で1時間反応させた。ついで、難燃剤としてシアネナト基と反応性を有するテトラブロモビスフェノールA(ファイヤガードFG−2000、帝人化成製)150gを投入溶解し冷却した。しかし常温付近で樹脂溶液が固化(グリース状)したため、トルエン1200gをさらに添加して攪拌溶解し印刷配線板用樹脂ワニス(固形分濃度=27%)を製造した。
【0056】
【表1】
【0057】
<特性評価方法>
・比誘電率及び誘電正接/1GHz:トリプレート構造直線線路共振器法により測定。
・はんだ耐熱性:銅箔をエッチングした試験片をPCT(121℃、0.22MPa)中に保持した後、260℃の溶融はんだに20秒浸漬して、外観を調べた。表中のOKとは、ミーズリング及びふくれの発生が無いことを意味する。
・銅箔ピール強さ:JIS−C−6481に準拠して測定。
・耐燃性:UL−94垂直試験法に準拠して測定。
【0058】
【表2】
表2から明らかなように、実施例1〜5の樹脂組成物を用いた積層板は、何れも1GHzでの比誘電率、誘電正接が低く、吸湿時のはんだ耐熱性、銅箔ピール強さが良好である。これに対して比較例は、1GHzの比誘電率及び誘電正接が高くなり、耐熱性などに問題があった。
【0059】
【発明の効果】
以上のように本発明の変性シアネート系樹脂組成物は、高周波帯域での誘電率や誘電正接が低く、かつはんだ耐熱性、接着性及び耐燃性が良好であり、高周波信号を扱う機器の印刷配線板に用いる積層板用樹脂組成物として好適である。また本発明の積層板用プリプレグ及び金属張り積層板は、高周波帯域での誘電正接が低く低損失性に優れ、無線通信関連の端末機器やアンテナ、マイクロプロセッサの動作周波数が数百MHzを越えるような高速コンピュータなどに用いられる印刷配線板用の基板を製造に好適である。[0001]
BACKGROUND OF THE INVENTION
The present invention manufactures a substrate for a printed wiring board used in a high-speed computer or the like in which the operating frequency of a wireless communication-related terminal device, antenna, or microprocessor exceeding several hundred MHz is required to have low loss in a high frequency band. The present invention relates to a resin composition suitable for the above, a prepreg for a laminate and a metal-clad laminate using the same. That is, the present invention relates to a modified cyanate ester-based curable resin composition excellent in high-frequency characteristics, a prepreg for a laminate and a metal-clad laminate using the same.
More specifically, it has good heat resistance, shows the same moldability and workability as conventional thermosetting resin laminates such as epoxy resins, and has low dielectric loss characteristics, particularly low loss tangent in the high frequency band. The present invention relates to a curable resin composition capable of producing an excellent high-density multilayer wiring board, a prepreg for a laminate and a metal-clad laminate using the same.
[0002]
[Prior art]
In an advanced information society, it is necessary to process a large amount of data at high speed, and the frequency of signals is increasing in computers and information equipment terminals. However, electrical signals have the property that transmission loss increases as the frequency increases, and there is a strong demand for the development of a low-loss printed wiring board corresponding to higher frequencies.
Transmission loss in a printed wiring board consists of a conductor loss determined by the shape of the wiring (conductor), skin resistance, characteristic impedance, etc. and a dielectric loss determined by the dielectric characteristics of the insulating layer (dielectric) around the wiring. Then, the influence of power loss due to dielectric loss is large. Therefore, in order to reduce the transmission loss of the high frequency circuit, it is considered necessary to make the printed wiring board substrate (particularly insulating resin) have a low dielectric constant and a low dielectric loss tangent (tan δ). For example, in mobile communication-related equipment that handles high-frequency signals, a substrate having a low dielectric loss tangent is strongly desired to reduce transmission loss in the quasi-microwave band (1 to 3 GHz) as the signal becomes higher in frequency. Yes.
[0003]
Further, in electronic information equipment such as computers, development of high-speed microprocessors having an operating frequency exceeding 200 MHz and higher frequency of signals are progressing in order to process a large amount of information in a short time. In devices that handle such high-speed pulse signals, delay on the printed wiring board has become a problem. Since the signal delay time in the printed wiring board becomes longer in proportion to the square root of the relative dielectric constant εr of the insulator around the wiring, a resin for a substrate having a low dielectric constant is required for a wiring board used in a computer or the like.
[0004]
As a resin composition for improving the high-frequency characteristics of a printed wiring board in response to the high frequency of signals as described above, as a composition of a cyanate ester resin having the lowest dielectric constant among thermosetting resins, JP-B-46-41112 There is a method using a cyanate ester / epoxy resin composition disclosed in Japanese Patent Publication No. JP-A No. 52-31279, and a bismaleimide / cyanate ester / epoxy resin composition disclosed in Japanese Patent Publication No. 52-31279.
[0005]
Further, as a material for improving high-frequency characteristics using a thermoplastic resin, a resin composition of polyphenylene ether (PPO or PPE) and a crosslinkable polymer / monomer disclosed in JP-B-5-77705 and JP-B-6- Polyphenylene ether-based resin composition having good dielectric properties among heat-resistant thermoplastic resins, such as a resin composition of polyphenylene ether having a specific curable functional group and a crosslinkable monomer disclosed in Japanese Patent No. 92533 There is a method of using.
[0006]
Further, as a resin composition comprising a cyanate ester resin having a low dielectric constant and polyphenylene ether having a good dielectric property, the cyanate ester / bismaleimide disclosed in JP-B-63-33506 There is a method using a resin composition with polyphenylene ether and a resin composition with a phenol-modified resin / cyanate ester reaction product and polyphenylene ether disclosed in JP-A-5-311071. Further, as a heat-resistant molding material having good high-frequency characteristics, there is a resin composition in which a cyanate ester resin is kneaded with polyphenylene ether as disclosed in Japanese Patent Publication No. 61-18937.
[0007]
[Problems to be solved by the invention]
The methods disclosed in Japanese Patent Publication Nos. 46-41112 and 52-31279 have insufficient high frequency characteristics because they contain a thermosetting resin other than cyanate ester resin, although the dielectric constant is slightly lower. There was a problem.
[0008]
Although the methods disclosed in Japanese Patent Publication No. 5-77705 and Japanese Patent Publication No. 6-92533 improve the dielectric properties, the resin composition has a melt viscosity of the resin composition because it is mainly composed of polyphenylene ether, which is essentially a thermoplastic polymer. There was a problem of high and insufficient fluidity. Therefore, when a laminated board is press-molded, high temperature and high pressure are required, and it is unsuitable for producing a multilayer printed wiring board that needs to fill a groove between fine circuit patterns.
[0009]
In the method disclosed in Japanese Patent Publication No. 63-33506 and Japanese Patent Application Laid-Open No. 5-311071, the thermosetting resin used in combination with polyphenylene ether is a bismaleimide / cyanate ester resin or a phenol-modified resin / cyanate ester reaction product. Although the dielectric characteristics are slightly improved, there is a problem that the high frequency characteristics are still insufficient. If the blending amount of polyphenylene ether is increased in order to improve the high frequency characteristics, the melt viscosity of the resin composition becomes high and the flowability is insufficient as in the case of the above-mentioned polyphenylene ether resin composition. There was a point.
[0010]
In addition, the resin composition kneaded with polyphenylene ether disclosed in Japanese Patent Publication No. 61-18937 has good dielectric properties, and when modified with cyanate ester resin, the melt viscosity becomes low, so the moldability of the resin composition is also compared. However, when cyanate ester is used alone as the curable component, the dielectric properties of the cured resin tend to be higher than the dielectric constant of the dielectric loss tangent, and sufficiently reduce transmission loss in the high frequency band. There was a problem that it was not possible. Furthermore, if the amount of cyanate ester is decreased to increase the dielectric loss tangent (the amount of polyphenylene ether is increased), the melt viscosity of the resin composition increases as in the case of the above-mentioned polyphenylene ether resin composition, and the fluidity is insufficient. Therefore, there was a problem that the moldability was poor.
[0011]
In view of such circumstances, the present inventors have used a method in which a composition obtained by modifying a specific cyanate ester resin with a monohydric phenol compound is used for a part or all of the matrix resin (Japanese Patent Application No. 9-80033). ) Was proposed. However, it was possible to obtain a resin composition with good high-frequency characteristics by modifying a specific cyanate ester resin with a monohydric phenol compound, but the specific cyanate ester resin used is special and expensive. There was a problem.
[0012]
The present invention has good heat resistance, has moldability and workability similar to those of conventional thermosetting resin laminates such as epoxy resins, and has low dielectric loss and low loss tangent in the high frequency band. A curable resin composition capable of producing an excellent high-density multilayer wiring board, and a prepreg for a laminate and a metal-clad laminate using the same are provided.
[0013]
[Means for Solving the Problems]
The present invention relates to the following.
(1) (A) Cyanate ester compound represented by the formula [1]
[0014]
[Formula 4]
And (B) a monohydric phenol compound represented by the formula [2]
[0015]
[Chemical formula 5]
[0016]
(Wherein R4And R5Represents a hydrogen atom or a lower alkyl group, which may be the same or different. N is a positive integer of 1-2), (C) polybutadiene resin
(D) a flame retardant having no reactivity with a cyanate ester compound;
(E) Modified cyanate ester-based curable resin composition for laminates, comprising a metal-based reaction catalyst as an essential component.
[0017]
(2)(A) (B) monohydric phenol compound with respect to 100 parts by weight of cyanate ester compoundThe4-30 weight part is mix | blended, The modified cyanate ester type curable resin composition for laminated boards of the said (1) description characterized by the above-mentioned.
[0018]
(3) a modified cyanate ester resin obtained by reacting part or all of (A) a cyanate ester compound and (B) a monohydric phenol compound, (C) a polybutadiene resin, and (D) a cyanate ester compound. The above (1), comprising a flame retardant having no reactivity and (E) a metal-based reaction catalyst as essential componentsOr(2) The modified cyanate ester-based curable resin composition for laminates according to (2).
[0019]
(4) (A) the cyanate ester compound is 2,2-bis (4-cyanatophenyl) propane andBibi(1) to (3), which is any one or a mixture of bis (3,5-dimethyl-4-cyanatophenyl) methaneEitherThe modified cyanate ester-based curable resin composition for a laminate.
[0020]
(5) (B) The above (1) to (4), wherein the monohydric phenol compound is p- (α-cumyl) phenol.EitherThe modified cyanate ester-based curable resin composition for a laminate.
[0021]
(6) (D) The flame retardant having no reactivity with the cyanate ester compound is selected from 1,2-dibromo-4- (1,2-dibromoethyl) cyclohexane, tetrabromocyclooctane and hexabromocyclododecane The above (1) to (5), which is a kind of alicyclic flame retardant or a mixture of two or more of theseEitherThe modified cyanate ester-based curable resin composition for a laminate.
[0022]
(7) (D) A flame retardant having no reactivity with a cyanate ester compound is represented by formula [3].
[0023]
[Chemical 6]
[0024]
(Wherein, l, m, and n represent an integer of 1 to 5, each of which may be the same value or different), or a brominated triphenyl cyanurate flame retardant, or at least one of these (1) to (6), which are a mixture of two or more flame retardants having no reactivity with other cyanate ester compoundsEitherThe modified cyanate ester-based curable resin composition for a laminate.
[0025]
(8) The above (1) wherein the metal-based reaction catalyst is one or more selected from 2-ethylhexanoate, naphthenate and acetylacetone complex of manganese, iron, cobalt, nickel, copper and zinc ) To (7)EitherThe modified cyanate ester-based curable resin composition for a laminate.
[0026]
(9) Above (1) to (8)ofFor a laminated board obtained by dissolving or dispersing the modified cyanate ester-based curable resin composition for a laminated board in a solvent into a varnish, impregnating the varnish into a base material, and drying at 80 to 200 ° C. Prepreg.
[0027]
(10) A metal-clad laminate obtained by laminating an arbitrary number of the prepregs for laminate according to (9) above, further laminating metal foil on the upper and lower surfaces or one surface thereof, and heating and pressing.
[0028]
DETAILED DESCRIPTION OF THE INVENTION
The present invention relates to (A) a cyanate ester compound represented by formula [1], (B) a monohydric phenol compound represented by formula [2], (C) a polybutadiene resin, and (D) a cyanate ester compound. Modified cyanate ester-based curable resin composition for laminates, which has excellent high-frequency characteristics, comprising a flame retardant having no reactivity and (E) a metal-based reaction catalyst, and a prepreg for laminates and a metal-clad laminate using the same It is.
[0029]
In addition, the present invention provides (B) a monohydric phenol compound represented by the formula [2] with respect to 100 parts by weight of the cyanate ester compound represented by the formula [1].TheModified cyanate ester-based curable resin composition for laminates having a low dielectric loss tangent in a high frequency band and excellent in low loss, characterized by using a modified cyanate ester-based resin obtained by reacting 4 to 30 parts by weight, and the same A prepreg for a laminated board using metal and a metal-clad laminated board.
[0030]
Dielectric properties such as polymer materials are greatly affected by the orientational polarization of the dipole. Therefore, the dielectric constant can be lowered by reducing the polar groups in the molecule, and the dielectric loss tangent can be lowered by suppressing the mobility of the polar groups. It is possible. Cyanate ester resin has a highly polar cyanate group, but generates a symmetric and rigid triazine structure upon curing. Therefore, a cured product having the lowest dielectric constant and dielectric loss tangent is obtained as a thermosetting resin. There is.
[0031]
However, in an actual curing reaction, it is impossible for all cyanate groups in the cyanate ester resin to react to form a triazine structure, and as the curing reaction proceeds, the reaction system loses its fluidity and has not yet flowed. It remains in the system as a cyanato group for the reaction. As a result, only a cured product having a higher dielectric constant and dielectric loss tangent than the original cured product has been obtained so far.
[0032]
On the other hand, in the resin composition of the present invention, the dielectric constant of the cured product can be obtained by imidating the cyanate group remaining as unreacted by mixing an appropriate amount of (B) a monohydric phenol compound and reducing its polarity. It is an object that attempts to lower the dielectric loss tangent. As a material used for this purpose, a compound having high reactivity with a cyanate group, a monofunctional, relatively low molecular weight and good compatibility with a cyanate ester resin (similar in molecular structure) is suitable. It is thought that there is. The monovalent phenol compound used in the resin composition of the present invention is a compound specified for such reasons.
[0033]
Conventionally, phenol compounds such as nonylphenol have been used in an amount of about 1 to 2 parts by weight per 100 parts by weight of cyanate ester as a cocatalyst for the trimerization reaction of cyanate ester (generation of triazine ring). However, since the blending amount was a catalyst amount, the effect of reducing the polarity by reacting with the unreacted cyanato group as described above was not recognized. However, as a result of studying the blending amount of the phenolic compound by the present inventors, it was found that the dielectric constant and the dielectric loss tangent of the cured product were lowered by blending the phenolic compound in a larger amount than before, and specific monohydric phenols It has been found that if a compound is used, a decrease in heat resistance due to an increase in the blending amount can be suppressed. Therefore, according to the method of the present invention, a conventional cured product of a cyanate ester resin alone, a conventional epoxy resin or a polyhydric phenol (dielectric properties are deteriorated because one hydroxyl group tends to remain as an unreacted group) and A cured product having a lower dielectric constant and dielectric loss tangent than a cured product of a resin blended with bismaleimide or the like can be obtained.
[0034]
Therefore, in the resin composition of the present invention, the blending amount of the monohydric phenol compound is important. That is, when the blending amount is small, it cannot react with all cyanate groups remaining as unreacted and can be made less polar, and when the blending amount is larger than the required amount, it remains as unreacted itself, This is because the dielectric properties of the cured product are deteriorated by the polarity of the hydroxyl group.
[0035]
Furthermore, in the resin composition of the present invention, the dielectric properties are improved by blending (C) polybutadiene resin, which is a thermoplastic resin having good dielectric properties, with the modified cyanate ester resin. Although cyanate ester resin and polybutadiene resin are inherently incompatible and it is difficult to obtain a uniform resin, according to the technique found by the present inventors, (A) cyanate ester compounds and (B It was found that when the reaction of the monohydric phenol compound was carried out in a solvent solution of polybutadiene resin, a so-called “semi-IPN” resin was produced and a uniform resin solution was obtained.
In addition, the flame retardant used in the resin composition of the present invention must have no reactivity with the cyanate ester compound so as not to inhibit the reaction between the (A) cyanate ester compound and the (B) monohydric phenol compound. Since it is a hydrocarbon-based low-polarity compound, the dielectric properties of the cured product are rarely deteriorated. Another type of flame retardant, which is a non-hydrocarbon compound, has a triazine structure similar to that of cyanate ester cured products, so it is compatible with cyanate ester resin cured products, and has excellent heat resistance and dielectric properties. It is possible to impart flame resistance without deteriorating.
[0036]
The resin composition of the present invention comprises (A) a cyanate ester compound represented by formula [1], (B) a monohydric phenol compound represented by formula [2], (C) a polybutadiene resin, and (D) a cyanate ester. A flame retardant having no reactivity with a compound and (E) a metal-based reaction catalyst are essential components. The (A) cyanate ester compound in the present invention is a cyanate ester compound having two cyanate groups in one molecule as represented by the formula [1]. Examples of the compound represented by the formula [1] include bis (4-cyanatophenyl) ethane and 2,2-bis (4-cyanatophenyl) propane., Bi(3,5-dimethyl-4-cyanatophenyl) methane, 2,2-bis (4-cyanatophenyl) -1,1,1,3,3,3-hexafluoropropane, α, α′- Examples thereof include bis (4-cyanatophenyl) -m-diisopropylbenzene, a cyanate esterified product of a phenol addition polystyrene polymer, and the like. Among them, 2,2-bis (4-cyanatophenyl) propane andBibi(3,5-dimethyl-4-cyanatophenyl)methaneEtc. are more preferable. Moreover, (A) cyanate ester compounds may be used alone or in combination of two or more.
[0037]
The (B) monohydric phenol compound in the present invention is a monohydric phenol represented by the formula [2], and a compound having good heat resistance is preferable. Examples of the compound represented by the formula [2] include p- (α-cumyl) phenol. In addition, (B) monohydric phenol compounds may be used individually by 1 type, or may mix and use 2 or more types.
[0038]
The blending amount of the (B) monohydric phenol compound in the present invention is preferably 4 to 30 parts by weight and more preferably 5 to 30 parts by weight with respect to 100 parts by weight of the (A) cyanate ester compound. Preferably, the amount is 5 to 25 parts by weight. (B) If the blending amount of the monohydric phenol compound is less than 4 parts by weight, sufficient dielectric properties cannot be obtained, and the dielectric loss tangent in the high frequency band does not tend to be sufficiently low. On the other hand, if it exceeds 30 parts by weight, the dielectric loss tangent tends to increase, which is not desirable. Therefore, in order to obtain a cyanate ester resin cured product having a low dielectric loss tangent in the high frequency band provided by the present invention, (B) a monohydric phenol compound having an appropriate blending amount with respect to (A) the cyanate ester compound. It is necessary to mix.
[0039]
The (A) cyanate ester compound and (B) monohydric phenol compound in the present invention are usually used as a modified cyanate ester resin obtained by reacting each. That is, it is used as an imidocarbonate-modified resin obtained by adding (B) a monohydric phenol compound to (A) a cyanate ester compound, together with prepolymerization of (A) a cyanate ester compound.
[0040]
When (A) the cyanate ester compound and (B) the monohydric phenol compound are reacted, the (B) monohydric phenol compound is reacted by adding all of the above appropriate blending amounts from the initial stage of the reaction to modify. Cyanate ester resin may be used, and at the initial stage of the reaction, a part of the above-mentioned appropriate blending amount is reacted, and after cooling, the remaining (B) monohydric phenol compound is added and reacted at the stage of B-stage or curing. A modified cyanate ester resin may be used.
[0041]
As the (C) polybutadiene resin in the present invention, the number average molecular weight is 500 to 5,000 or less.ofIt is preferable because it has good compatibility and improves dielectric properties. The blending amount of the (C) polybutadiene resin in the present invention is preferably 5 to 300 parts by weight, more preferably 10 to 200 parts by weight with respect to 100 parts by weight of the (A) cyanate ester compound. It is especially preferable to set it as -100 weight part. (C) When the blending amount of the polybutadiene resin is less than 5 parts by weight, there is a tendency that sufficient dielectric properties cannot be obtained, and when it exceeds 300 parts by weight, the melt viscosity of the resin becomes high and the flowability is insufficient, so the moldability is poor. Also, the reactivity of (A) cyanate esters tends to deteriorate.
[0042]
Examples of the flame retardant having no reactivity with the (D) cyanate ester compound in the present invention include 1,2-dibromo-4- (1,2-dibromoethyl) cyclohexane, tetrabromocyclohexane, hexabromocyclododecane, Examples include polybromodiphenyl ether, brominated polystyrene, brominated polycarbonate, and brominated triphenyl cyanate flame retardant represented by the formula [3]. Among them, 1,2-dibromo-4- (1,2- Dibromoethyl) cyclohexane, tetrabromocyclooctane, hexabromocyclododecane, 2,4,6-tris (tribromophenoxy) -1,3,5-triazine and the like are more preferable.
The blending amount of the flame retardant having no reactivity with the (D) cyanate ester compound in the present invention is 100 parts by weight of the total amount of the (A) cyanate ester compound, (B) monohydric phenol compound and (C) polybutadiene resin. The amount is preferably 5 to 30 parts by weight, more preferably 5 to 20 parts by weight, and particularly preferably 10 to 20 parts by weight. (D) If the amount of the flame retardant having no reactivity with the cyanate ester compound is less than 5 parts by weight, the flame resistance tends to be insufficient, and if it exceeds 30 parts by weight, the heat resistance of the resin tends to decrease. is there.
[0043]
The (E) metal-based reaction catalyst of the present invention promotes the reaction between (A) a cyanate ester compound and (B) a monohydric phenol compound, and is a reaction for producing a modified cyanate-based resin composition. It is used as a curing accelerator when producing a catalyst and a laminate. As the metal-based reaction catalyst, metal catalysts such as manganese, iron, cobalt, nickel, copper, and zinc are used. Specifically, organometallic salt compounds such as 2-ethylhexanoate and naphthenate and Used as an organometallic complex such as an acetylacetone complex. The same metal-based reaction catalyst may be used alone in the reaction accelerator for producing the modified cyanate-based resin composition and the curing accelerator in producing the laminate, or two or more different types are used respectively. Also good.
[0044]
The blending amount of the (E) metal-based reaction catalyst in the present invention is preferably 1 to 300 ppm, more preferably 1 to 200 ppm, and more preferably 2 to 150 ppm with respect to the (A) cyanate ester compound. Is particularly preferred. (E) If the compounding amount of the metal-based reaction catalyst is less than 1 ppm, the reactivity and curability tend to be insufficient, and if it exceeds 300 ppm, it becomes difficult to control the reaction or the curing becomes too fast and the moldability is poor. Tend to be. In addition, the blending time of the (E) metal-based reaction catalyst in the present invention may be blended together in amounts necessary as a reaction accelerator and a curing accelerator when producing a modified cyanate resin composition. When the modified cyanate resin composition is produced, an amount necessary for promoting the modification reaction may be used, and the remaining catalyst or another metal catalyst may be added and mixed as a curing accelerator after completion of the reaction.
[0045]
In addition to the above essential components, the resin composition of the present invention may contain an inorganic filler and other additives as necessary. As the filler, silica, alumina, aluminum hydroxide, calcium carbonate, clay, talc, silicon nitride, boron nitride, titanium oxide, barium titanate, lead titanate, strontium titanate, or the like can be used. The blending amount is preferably 200 parts by weight or less with respect to 100 parts by weight of the total amount of the resin composition of the present invention.
The resin composition of this invention demonstrated above is used for manufacture of the prepreg for printed wiring boards, or a laminated board as shown below, for example. That is, first, a prepreg is prepared by dissolving the resin composition of the present invention in a solvent to obtain a varnish, impregnating a substrate such as a glass cloth and drying. Then, an arbitrary number of the prepregs are stacked and a metal foil is stacked on the upper and lower surfaces or one surface of the prepreg and heated and pressed to form a double-sided or single-sided metal-clad laminate.
Specific examples of the solvent used when varnishing the resin composition of the present invention include aromatic hydrocarbons such as benzene, toluene and xylene, halogenated hydrocarbons such as trichloroethylene and chlorobenzene, N, N-dimethyl Amide type such as formamide and N, N-dimethylacetamide, nitrogen type solvent such as N-methylpyrrolidone and the like are used. In particular, aromatic hydrocarbons such as benzene, toluene and xylene are more preferable. These solvents may be used alone or in combination of two or more. The compounding amount of the aromatic hydrocarbon solvent is (C) polybutadiene resin
[0046]
150-500 weight part is preferable with respect to 100 weight part, 150-400 weight part is more preferable, 150-300 weight part is especially preferable.
Furthermore, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone have low solubility in the resin composition of the present invention, but when used in combination with the above solvents, a suspension of the resin composition of the present invention is formed. There is an advantage that a solution having a high concentration and a low viscosity can be obtained. From this viewpoint, the solvent used for varnishing the resin composition of the present invention is a mixture of aromatic hydrocarbons such as benzene, toluene and xylene and ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone. A solvent is particularly preferred. The blending amount of the ketone solvent is preferably 50 to 500 parts by weight, more preferably 50 to 400 parts by weight, and particularly preferably 50 to 300 parts by weight with respect to 100 parts by weight of the aromatic hydrocarbon solvent.
[0047]
【Example】
Hereinafter, the present invention will be described in more detail with reference to examples.
The varnish for laminated sheets was manufactured according to the compounding quantity shown in Table 1.
Example 1
450 g of toluene and 210 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical Co., Ltd.) were put into a 5 liter four-necked separable flask equipped with a thermometer, a condenser, and a stirrer, and heated to 80 ° C. to dissolve with stirring. . Next, 700 g of 2,2-bis (4-cyanatephenyl) propane (Arocy B-10, manufactured by Asahi Ciba), 64 g of p- (α-cumyl) phenol (manufactured by Sun Techno Chemical), brominated triphenyl cyanurate (Pyroguard SR-) 245, manufactured by Daiichi Kogyo Seiyaku Co., Ltd. was charged and dissolved, 4 g of a 10% toluene solution of cobalt naphthenate (Co content = 8%, manufactured by Nippon Kagaku Sangyo Co., Ltd.) was added and reacted at reflux temperature for 1 hour. Next, the reaction solution was cooled, and when the internal temperature reached 90 ° C., 600 g of methyl ethyl ketone (MEK) was added with stirring to suspend it. After further cooling to room temperature, 1 g of a 10% toluene solution of zinc naphthenate (Zn content = 8%, manufactured by Nippon Kagaku Sangyo Co., Ltd.) was added and dissolved by stirring to obtain a resin varnish for a printed wiring board (solid content concentration = 51%). Manufactured.
[0048]
Example 2
300 g of toluene and 140 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical Co., Ltd.) were charged into a 5-liter four-necked separable flask equipped with a thermometer, a condenser, and a stirrer, and heated to 80 ° C. to dissolve with stirring. . Next, 700 g of 2,2-bis (4-cyanatephenyl) propane (Arocy B-10, manufactured by Asahi Ciba), 10 g of p- (α-cumyl) phenol (manufactured by Sun Techno Chemical), brominated triphenyl cyanurate (Pyroguard SR-) 245, manufactured by Daiichi Kogyo Seiyaku Co., Ltd. was charged and dissolved, and then 3 g of a 10% toluene solution of manganese naphthenate (Mn content = 8%, manufactured by Nippon Kagaku Sangyo) was added and reacted at reflux temperature for 1 hour. Next, the reaction solution was cooled, and when the internal temperature reached 90 ° C., 600 g of methyl ethyl ketone (MEK) was added with stirring to suspend it. Further, after cooling to room temperature, 75 g of p- (α-cumyl) phenol and 1 g of a 10% toluene solution of zinc naphthenate (Zn content = 8%, manufactured by Nippon Kagaku Sangyo Co., Ltd.) were stirred and dissolved to obtain a printed wiring board. A resin varnish (solid concentration = 54%) was produced.
[0049]
Example 3
300 g of toluene and 80 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical Co., Ltd.) were charged into a 5-liter four-necked separable flask equipped with a thermometer, a condenser, and a stirrer, and heated to 80 ° C. to dissolve with stirring. . Next, α, α′-bis (4-cyanatophenyl) -m-diisopropylbenzene (RTX-366, manufactured by Asahi Ciba) 800 g and p- (α-cumyl) phenol (manufactured by Sun Techno Chemical) 10 g were added and dissolved. 2 g of a 10% toluene solution of iron naphthenate (iron content = 5%, manufactured by Nippon Kagaku Sangyo) was added and reacted at reflux temperature for 1 hour, and then 1,2-dibromo-4- (1,2-dibromoethyl) 110 g of cyclohexane (Saytex BCL-462, manufactured by Albemarle) was charged and dissolved. The reaction liquid was cooled, and when the internal temperature reached 90 ° C., 600 g of methyl ethyl ketone (MEK) was added with stirring to suspend it. Further, after cooling to room temperature, 75 g of p- (α-cumyl) phenol and 2 g of a 10% toluene solution of copper naphthenate (copper content = 5%, manufactured by Nippon Kagaku Sangyo Co., Ltd.) are stirred and dissolved for printed wiring boards. A resin varnish (solid concentration = 54%) was produced.
[0050]
Example 4
600 g of toluene and 300 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical Co., Ltd.) were charged into a 5-liter four-necked separable flask equipped with a thermometer, a condenser tube, and a stirrer, and heated to 80 ° C. to dissolve with stirring. . Next, 600 g of bis (3,5-dimethyl-4-cyanatophenyl) methane (ArocyM-10, manufactured by Asahi Ciba) and 30 g of p- (α-cumyl) phenol (manufactured by Sun Techno Chemical) were added and dissolved, and then cobalt naphthenate. 4 g of a 10% toluene solution (Co content = 8%, manufactured by Nippon Chemical Industry Co., Ltd.) was added and reacted at reflux temperature for 1 hour, and then 150 g of hexabromocyclododecane (CD-75P, manufactured by Great Lakes) was added and dissolved. . The reaction solution was cooled, and when the internal temperature reached 90 ° C., 750 g of methyl ethyl ketone (MEK) was added with stirring to suspend it. After further cooling to room temperature, 120 g of p- (α-cumyl) phenol was added and dissolved by stirring to produce a resin varnish for a printed wiring board (solid content concentration = 47%).
[0051]
Example 5
750 g of toluene and 400 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical Co., Ltd.) were charged into a 5-liter four-necked separable flask equipped with a thermometer, a condenser tube, and a stirrer, heated to 80 ° C. and dissolved by stirring. . Next, 500 g of 2,2-bis (4-cyanatophenyl) -1,1,1,3,3,3-hexafluoropropane (Arocy F-10, manufactured by Asahi Ciba), p- (α-cumyl) phenol ( After 28 g of Sun Techno Chemical) was added and dissolved, 6 g of a 10% toluene solution of copper naphthenate (Cu content = 5%, manufactured by Nippon Kagaku Sangyo) was added and reacted at reflux temperature for 1 hour, and then tetrabromocyclooctane (Saytex BC). -48, manufactured by Albemarle) was added and dissolved. Next, the reaction solution was cooled, and when the internal temperature reached 90 ° C., 500 g of methyl ethyl ketone (MEK) was added with stirring to suspend it. After cooling to room temperature, 1 g of a 10% toluene solution of manganese naphthenate (Mn content = 8%, manufactured by Nippon Kagaku Sangyo Co., Ltd.) is added and dissolved by stirring to obtain a resin varnish for printed wiring boards (solid content concentration = 46%). Manufactured.
[0052]
Comparative Example 1
In Example 1, 1800 g of toluene, 210 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical Co., Ltd.), 700 g of 2,2-bis (4-cyanatephenyl) propane (Arocy B-10, manufactured by Asahi Ciba) and p- (α- Cumyl) Instead of phenol, 69 g of 2,2-bis (4-hydroxyphenyl) propane (BPA; bisphenol A, manufactured by Mitsui Toatsu Chemicals) was added, and after stirring and dissolution, cobalt naphthenate (Co content = 8%, Japan) 3 g of a 10% toluene diluted solution (manufactured by Chemical Industry) was added and reacted at reflux temperature for 1 hour. Next, 200 g of a brominated bisphenol A type epoxy resin (ESB400, manufactured by Sumitomo Chemical Co., Ltd.) having reactivity with cyananeto groups as a flame retardant was charged, dissolved, and cooled. However, since the resin solution was solidified (grease-like) near normal temperature, 1200 g of toluene was further added and stirred and dissolved to produce a resin varnish for printed wiring boards (solid content concentration = 28%).
[0053]
Comparative Example 2
In Example 1, 1800 g of toluene, 210 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical Co., Ltd.), 700 g of 2,2-bis (4-cyanatephenyl) propane (Arocy B-10, manufactured by Asahi Ciba) and p- (α- Cumyl) 11g of nonylphenol (Mitsui Toatsu Chemicals) was added instead of phenol, and after stirring and dissolving, 4g of 10% toluene diluted solution of cobalt naphthenate (Co content = 8%, manufactured by Nippon Kagaku Sangyo) was added to reflux. The reaction was carried out at temperature for 1 hour. Subsequently, 190 g of brominated bisphenol A type epoxy resin (ESB400, manufactured by Sumitomo Chemical Co., Ltd.) having reactivity with cyananeto group as a flame retardant was charged, dissolved, and cooled. However, since the resin solution was solidified (grease-like) at around room temperature, 900 g of toluene was further added and dissolved by stirring to produce a resin varnish for printed wiring boards (solid content concentration = 29%).
[0054]
Comparative Example 3
In Example 1, 210 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical Co., Ltd.) was added to 1500 g of toluene, heated to 80 ° C. with stirring and dissolved, and then 2,2-bis (4-cyanatephenyl) propane (ArocyB). -10, manufactured by Asahi Ciba), 2,2-bis (4-cyanatephenyl) propane oligomer (Arocy B-30, manufactured by Asahi Ciba) 700 g, p- (α-cumyl) phenol 67 g instead of p- (α-cumyl) phenol and difficulty 200 g of brominated bisphenol A type epoxy resin (ESB400, manufactured by Sumitomo Chemical Co., Ltd.) having reactivity with cyanenate groups was added as a flame retardant and dissolved by heating at 80 ° C. for 1 hour. Next, the mixture was cooled to room temperature, and 3 g of a 10% toluene solution of zinc naphthenate (Zn content = 8%, manufactured by Nippon Kagaku Sangyo) was added to produce a resin varnish for a printed wiring board (solid content concentration = 44%). However, this resin varnishPolybutadieneAgglomerated separation of the resin was observed.
[0055]
Comparative Example 4
In Example 4, 1600 g of toluene, 300 g of polybutadiene resin (R-45HT, manufactured by Idemitsu Petrochemical), 600 g of bis (3,5-dimethyl-4-cyanatophenyl) methane (ArocyM-10, manufactured by Asahi Ciba) and p- 9 g of nonylphenol was added instead of (α-cumyl) phenol (manufactured by Suntechnochemical), and after stirring and dissolving, 3 g of a 10% toluene solution of manganese naphthenate (Mn content = 8%, manufactured by Nippon Kagaku Sangyo) was added and refluxed. The reaction was carried out at temperature for 1 hour. Next, 150 g of tetrabromobisphenol A (Fireguard FG-2000, manufactured by Teijin Kasei) having reactivity with a cyanenate group as a flame retardant was charged, dissolved, and cooled. However, since the resin solution was solidified (grease-like) at around room temperature, 1200 g of toluene was further added and dissolved by stirring to produce a printed wiring board resin varnish (solid content concentration = 27%).
[0056]
[Table 1]
[0057]
<Characteristic evaluation method>
Relative permittivity and dielectric loss tangent / 1 GHz: Measured by the triplate structure linear line resonator method.
-Solder heat resistance: After holding the test piece which etched the copper foil in PCT (121 degreeC, 0.22 MPa), it immersed in the molten solder of 260 degreeC for 20 second, and examined the external appearance. “OK” in the table means that there is no occurrence of measling and blistering.
Copper foil peel strength: measured in accordance with JIS-C-6481.
-Flame resistance: Measured according to UL-94 vertical test method.
[0058]
[Table 2]
As is clear from Table 2, all the laminates using the resin compositions of Examples 1 to 5 have a low relative dielectric constant and dielectric loss tangent at 1 GHz, solder heat resistance during moisture absorption, and copper foil peel strength. Is good. On the other hand, the comparative example has a high dielectric constant and dielectric loss tangent of 1 GHz and has a problem in heat resistance.
[0059]
【The invention's effect】
As described above, the modified cyanate of the present inventionsystemThe resin composition has a low dielectric constant and dielectric loss tangent in a high frequency band, and has good solder heat resistance, adhesion and flame resistance, and is a resin composition for laminated boards used for printed wiring boards of equipment that handles high frequency signals. Is preferred. In addition, the prepreg for a laminate and the metal-clad laminate of the present invention have a low dielectric loss tangent in a high frequency band and an excellent low-loss property, and the operating frequency of wireless communication-related terminal devices, antennas, and microprocessors exceeds several hundred MHz. It is suitable for manufacturing a substrate for a printed wiring board used in a high-speed computer.
Claims (10)
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