JP4092722B2 - Quartz crucible manufacturing furnace - Google Patents
Quartz crucible manufacturing furnace Download PDFInfo
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- JP4092722B2 JP4092722B2 JP2002120414A JP2002120414A JP4092722B2 JP 4092722 B2 JP4092722 B2 JP 4092722B2 JP 2002120414 A JP2002120414 A JP 2002120414A JP 2002120414 A JP2002120414 A JP 2002120414A JP 4092722 B2 JP4092722 B2 JP 4092722B2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 30
- 239000010453 quartz Substances 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title description 11
- 238000010438 heat treatment Methods 0.000 claims description 116
- 239000000843 powder Substances 0.000 claims description 11
- 230000003749 cleanliness Effects 0.000 claims description 9
- 239000002245 particle Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 17
- 238000010891 electric arc Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000000155 melt Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- -1 silicon dioxide compound Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Discharge Heating (AREA)
- Glass Melting And Manufacturing (AREA)
- Vertical, Hearth, Or Arc Furnaces (AREA)
Description
【0001】
【発明の属する技術分野】
本発明は、シリコン単結晶の引き上げに用いる石英ガラスルツボを製造する装置に関する。より詳しくは、密閉度が高く、加熱室内の温度や環境を制御しやすいので汚染や異物の混入が極力防止され、高純度の石英ルツボを製造することができる石英ガラスルツボ製造用の加熱炉に関する。
【0002】
【従来の技術】
上記石英ガラスルツボを製造する技術として回転モールド法が知られている。この方法は、回転するボウル状のモールド内面に石英粉を堆積し、アーク加熱等によって石英粉を加熱溶融してガラス化し、冷却した後にモールドから抜き出す方法である。この方法に基づく従来の製造装置では、モールドを載置する回転台やアーク加熱の電極手段が開放した通常の室内に設けられてものが多く、クリーンルームを形成しているものは殆どない。このため、加熱溶融時に周囲の塵芥が溶融ガラスに混入しやすく、ルツボの純度を低下させると云う問題がある。また従来の製造装置では、アーク放電を周囲から遮蔽する扉等が設けられているものの電極の支持構造等はルツボの上方に剥き出しのまま形成されているので、ここからモールドに異物が混入して石英ガラスルツボを汚染する虞があり、あるいは上方に浮遊した二酸化珪素化合物が電極の支持構造に付着してメンテナンスに支障を招くなどの問題がある。
【0003】
【発明の解決課題】
本発明は、従来の製造装置における上記問題を解決したものであり、外部からの異物の混入および汚染を効果的に防止して高純度の石英ガラスルツボを製造することができる加熱炉を提供する。
【0004】
【課題を解決する手段】
本発明の加熱炉は、(1)回転モールド法に基づき石英粉を加熱溶融して石英ルツボを製造する装置であって、モールドを載せる回転台、石英粉をアーク加熱する電極棒を備えた電極構造部、および加熱室を有し、加熱室の回転台に向かって電極棒が突設され、該電極棒の支持手段が加熱室の外部に設置されていることを特徴とする石英ルツボ製造用加熱炉である。このように、本発明の加熱炉は、加熱室内にモールド回転台と電極棒などの最小限の手段のみを収納し、これらの駆動機構などは室外に設けているので、溶融時に加熱室を密閉して外部からの異物の混入および汚染を効果的に防止することができる。従って、加熱室内の清浄度を高めることができ、従来の製造設備より格段に高い清浄環境を保つことができるので、高純度の石英ガラスルツボを得ることができる。なお、加熱室天井の上側に設けられる電極構造部とは電極の支持手段および必要に応じて付設される電極棒開閉手段、通電手段(これらを含めて支持手段と云う)を備えた部分である。
【0005】
本発明の加熱炉は、好ましくは、(2)加熱室が密閉可能であると共に清浄空気の吸気ダクトと排気ダクトが加熱室に設けられており、清浄空気を室内に導入して加熱室内を粒径0.5μm以上のパーティクルが10万個/cf以下の清浄度に維持する加熱炉である。このように、本発明の加熱炉は操業時に加熱室の扉を閉じて室内を密閉し、ここに吸気ダクトを通じて室内に清浄な空気を導入することによって加熱室内を高い清浄環境、具体的には粒径0.5μm以上のパーティクルが10万個/cf以下、好ましくは1万個/cf以下に維持することができる。なお、さらに好ましくは加熱室内を減圧する手段を設け、吸気ダクトにはエアフィルターを設けて清浄度を高めると良い。
【0006】
本発明の加熱炉は、好ましくは、(3)加熱室の下部に吸気ダクトを設けると共に加熱室上部に排気ダクトを設けることにより、加熱室内に上向きの空気流が形成される加熱炉、(4)加熱室の吸気口と排気口がそれぞれモールド回転軸に対して軸対称に設けられている加熱炉である。操業時にはアーク放電によってモールドの内側にはモールド内面に沿った上向きの空気流が生じるので、加熱室内にモールド回転軸に対して軸対称な上向きの空気流を形成することによってモールド周囲の排気を円滑に行うことができる。
【0007】
さらに本発明の加熱炉は、好ましくは、(5)加熱室の天井の一部と、該天井の一部に連なる側壁の一部とが一体に加熱室から分離して移動可能に形成されており、この移動自在な天井部分に電極構造部が装着されており、天井部分の移動によって電極棒が加熱室に対して出入自在であると共に電極棒が加熱室に収納された状態で加熱室の天井および側壁の開口部分が閉じられる加熱炉である。このような構造であれば、加熱室に対して電極棒を出入自在に形成することができ、かつ電極棒を加熱室内に収納した状態で加熱室の天井および側壁が外部から遮蔽されるので、出入口の扉を閉めることによって、加熱室内を容易に密閉することができる。
【0008】
さらに本発明の加熱炉は、好ましくは、(6)加熱室天井の外側に電極棒の支持手段が設けられており、複数の電極棒が天井を貫いて下向きに開閉自在に支持されている加熱炉、(7)加熱室天井の上側に設けた電極構造部に冷却手段が設けられている加熱炉である。このように、電極構造部を天井の外側に設け、天井を下向きに貫いて電極棒を開閉自在に設置することによって、電極構造部が加熱室から遮断されるので、この部分からの異物の混入を効果的に防止することができる。因みに、電極棒の支持手段等が従来の電極構造のようにルツボの上方に剥き出しの状態であると、アーク放電によって600℃程度の高温に曝されるので高温劣化するが、本発明のように電極構造部を室外に設けて輻射熱を遮断し、さらにこの電極構造部に冷却手段を付設することによってこのような高温劣化を防止することができる。また、電極棒の支持手段に設けた開閉機構によって電極棒をルツボの口径に対応して開閉し、最適なアークを形成することができる。
【0009】
さらに本発明の加熱炉は、好ましくは、(8)モールドを載せる回転台が加熱室内に突出自在に設置されており、加熱室の床下に設けた駆動手段によって回転台が回転および上下動される加熱炉である。このように、モールド回転台の駆動機構を室外に設けることによって、外部からの異物の混入および汚染を効果的に防止することができる。
【0010】
【発明の実施の形態】
以下、本発明を実施形態に基づいて具体的に説明する。
本発明の加熱炉の概略を図1に示す。本加熱炉は回転モールド法に基づく石英ルツボの製造装置であり、モールド内面に堆積した石英粉を加熱溶融し、または石英粉を加熱溶融してモールド内面に堆積させて石英ルツボを製造する。図示する加熱炉は、加熱室10を有し、この加熱室内にモールド11を載せる回転台12、石英粉をアーク加熱する電極棒14を備えた電極構造部13を備えており、この電極棒14の支持手段15が加熱室10の天井の外側に設けられている。好ましくは、加熱室10の天井壁ないし側壁の大部分は水冷ジャケットで覆われている。
【0011】
図示する加熱炉では、さらに加熱室の天井の一部(天板)16と該天井の一部に連なる側壁の一部(側板)18とが一体に加熱室から分離して移動可能に形成されている。具体的には、ガイドレール17が加熱室10の天井から側方に向かって延設されており、天板16はこのガイドレール17に摺動自在に支持されている。該天板16には電極棒14の支持手段15が装着されている。この支持手段15には冷却手段(図示省略)が設けられている。また、天板16に連なる側壁の一部(側板)18が該天板16と一体に形成され、上記ガイドレール17に沿って側方に摺動するように形成されている。
【0012】
以上のように、摺動自在な天板上に電極構造部13が設けられていることによって、電極棒14が加熱室に対して出入自在に形成されている。天板16および側板18が加熱室10から離れた状態のときには、加熱室10の天井と側壁の一部は開口した状態になるが、天板16および側板18が一体にガイドレール17に沿って加熱室10に移動し、電極棒14が加熱室10に収納されると、天板16が加熱室天井を閉じ、側板18が加熱炉側壁を密閉した状態になる。従って、加熱室正面の出入口19を扉20によって閉じれば、容易に室内を実施的に密閉状態にすることができる。
【0013】
一方、加熱室10の内部には、モールド11を支持する回転台12が室内に突出自在に設置されており、床下に設けた駆動手段(図示省略)によって上記回転台が回転および上下動されるように形成されている。石英粉を入れたモールド11が外部の搬入手段によって回転台12に載置されると、床下の駆動手段によって回転台12が所定高さまで上昇し、同時に回転する。これに対応し、実質的に密閉状態の室内でアーク放電が開始し、モールド内面に堆積している石英粉を加熱溶融してガラス化する。
【0014】
さらに、図示する加熱炉には、清浄空気の吸気ダクト21と排気ダクト22が加熱室内に連通して設けられている。密閉した加熱室内に吸気ダクト21を通じて清浄空気を導入して室内を0.5μm以上のパーティクルが10万個/cf以下、好ましくは1万個/cf以下の清浄度に維持することができる。因みに、従来の石英ルツボ製造炉内の清浄度は0.5μm以上のパーティクルが50万〜100万個/cf程度であり、本発明の加熱炉は従来の加熱炉に比べて格段に高い炉内清浄度を達成することができる。なお、加熱室には室内を減圧する手段(図示省略)を設け、さらに吸気ダクト21にはエアフィルター(図示省略)を設けて清浄度をさらに高めると良い。
【0015】
吸気ダクト21は加熱室の下部に設けられており、排気ダクト22は加熱室上部に設けられている。さらに、吸気ダクト21の吸気口と排気ダクト22の排気口が複数設けられており、これらの吸気口21aと排気口22aとは図2に示すようにそれれぞれモールドの回転軸30に対して軸対称に設けられている。加熱室内にこのような上向きの空気流をモールド回転軸に対して軸対称に形成することによってモールド周囲の排気を円滑に行うことができる。
【0016】
【発明の効果】
本発明の密閉加熱炉は、上記構造を有するので、加熱室内の密閉度が高く、外部からの汚染や異物の混入を効果的に防止して室内の清浄度を高めることができる。従って、高純度の石英ガラスルツボを製造するのに適する。また、開放型の製造装置に比べて加熱室内の容積が小さいので炉内温度をコントロールしやすく高品質の石英ガラスルツボを得ることができる。
【図面の簡単な説明】
【図1】本発明の加熱炉の概略斜視図
【図2】本発明の加熱炉の吸排気口を示す説明図
10−加熱室、11−モールド、12−回転台、13−電極構造部、14−電極棒、15−支持手段、16−天板、17−ガイドレール、18−側板、19−出入口、20−扉、21−吸気ダクト、21a−吸気口、22−排気ダクト、22a−排気口。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an apparatus for producing a quartz glass crucible used for pulling a silicon single crystal. More specifically, the present invention relates to a heating furnace for manufacturing a quartz glass crucible that can manufacture a high-purity quartz crucible that has a high degree of sealing and is easy to control the temperature and environment in the heating chamber, and that prevents contamination and foreign matter from entering as much as possible. .
[0002]
[Prior art]
As a technique for producing the quartz glass crucible, a rotary mold method is known. In this method, quartz powder is deposited on the inner surface of a rotating bowl-shaped mold, and the quartz powder is heated and melted by virtue of arc heating or the like to be vitrified, cooled, and then extracted from the mold. In the conventional manufacturing apparatus based on this method, the turntable on which the mold is placed and the electrode means for arc heating are often provided in a normal room that is open, and few of them form a clean room. For this reason, there exists a problem that the surrounding dust tends to mix in molten glass at the time of heat-melting, and the purity of a crucible falls. Moreover, in the conventional manufacturing apparatus, although the door etc. which shield arc discharge from the circumference | surroundings are provided, since the support structure of the electrode etc. is formed as it is exposed above the crucible, foreign matter enters the mold from here. There is a possibility that the quartz glass crucible may be contaminated, or there is a problem that the silicon dioxide compound floating above adheres to the support structure of the electrode and causes trouble in maintenance.
[0003]
[Problem to be Solved by the Invention]
The present invention solves the above-mentioned problems in the conventional manufacturing apparatus, and provides a heating furnace capable of manufacturing a high-purity quartz glass crucible while effectively preventing the introduction and contamination of foreign substances from the outside. .
[0004]
[Means for solving the problems]
The heating furnace of the present invention is (1) an apparatus for producing a quartz crucible by heating and melting quartz powder based on a rotating mold method, and an electrode provided with a rotating table on which a mold is placed and an electrode rod for arc heating the quartz powder. A quartz crucible for producing a quartz crucible, comprising a structure portion and a heating chamber, wherein an electrode rod projects toward a turntable of the heating chamber, and a support means for the electrode rod is installed outside the heating chamber It is a heating furnace. As described above, the heating furnace of the present invention accommodates only minimum means such as a mold turntable and an electrode rod in the heating chamber, and these drive mechanisms are provided outside the chamber, so that the heating chamber is hermetically sealed during melting. Thus, it is possible to effectively prevent foreign matters from being mixed in and contaminated. Therefore, the cleanliness in the heating chamber can be increased and a clean environment much higher than that of conventional manufacturing equipment can be maintained, so that a high-purity quartz glass crucible can be obtained. The electrode structure provided on the upper side of the heating chamber ceiling is a portion provided with electrode support means, electrode bar opening / closing means attached as necessary, and energization means (including these support means). .
[0005]
In the heating furnace of the present invention, preferably, (2) the heating chamber can be sealed and an intake duct and an exhaust duct for clean air are provided in the heating chamber. This is a heating furnace in which particles having a diameter of 0.5 μm or more are maintained at a cleanliness of 100,000 pieces / cf or less. As described above, the heating furnace of the present invention closes the heating chamber door during operation and seals the inside of the heating chamber, and introduces clean air into the room through the intake duct. Particles having a particle size of 0.5 μm or more can be maintained at 100,000 / cf or less, preferably 10,000 / cf or less. More preferably, a means for reducing the pressure in the heating chamber is provided, and an air filter is provided in the intake duct to increase the cleanliness.
[0006]
The heating furnace of the present invention is preferably (3) a heating furnace in which an upward air flow is formed in the heating chamber by providing an intake duct in the lower portion of the heating chamber and an exhaust duct in the upper portion of the heating chamber, (4 ) A heating furnace in which the inlet and outlet of the heating chamber are provided symmetrically with respect to the mold rotation axis. During operation, an upward air flow along the inner surface of the mold is generated inside the mold due to arc discharge. Therefore, an upward air flow that is axially symmetric with respect to the mold rotation axis is formed in the heating chamber to smoothly exhaust the air around the mold. Can be done.
[0007]
In the heating furnace of the present invention, preferably, (5) a part of the ceiling of the heating chamber and a part of the side wall connected to a part of the ceiling are integrally separated from the heating chamber so as to be movable. The electrode structure is mounted on the movable ceiling part, and the electrode bar can be moved in and out of the heating chamber by the movement of the ceiling part and the electrode bar is housed in the heating chamber. It is a heating furnace in which the opening portions of the ceiling and side walls are closed. With such a structure, the electrode rod can be formed in and out of the heating chamber so that the ceiling and side walls of the heating chamber are shielded from the outside while the electrode rod is housed in the heating chamber. By closing the door of the entrance / exit, the heating chamber can be easily sealed.
[0008]
In the heating furnace of the present invention, preferably, (6) heating means in which electrode rod support means are provided outside the heating chamber ceiling, and a plurality of electrode rods are supported through the ceiling so as to be opened and closed downward. Furnace, (7) A heating furnace in which cooling means are provided in the electrode structure provided on the upper side of the heating chamber ceiling. In this way, the electrode structure is provided outside the ceiling, and the electrode rod is opened and closed by penetrating the ceiling downward, so that the electrode structure is cut off from the heating chamber. Can be effectively prevented. Incidentally, when the electrode rod support means is exposed above the crucible as in the conventional electrode structure, it is exposed to a high temperature of about 600 ° C. due to arc discharge, but it deteriorates at a high temperature. Such high temperature deterioration can be prevented by providing an electrode structure portion outside the room to block radiant heat and further providing a cooling means to the electrode structure portion. Further, the electrode rod can be opened and closed in accordance with the diameter of the crucible by an opening and closing mechanism provided in the electrode rod support means, and an optimum arc can be formed.
[0009]
Further, in the heating furnace of the present invention, preferably, (8) a turntable on which a mold is placed is disposed so as to protrude into the heating chamber, and the turntable is rotated and moved up and down by a driving means provided under the floor of the heating chamber. It is a heating furnace. Thus, by providing the drive mechanism of the mold turntable outside the room, it is possible to effectively prevent foreign matters from being mixed in and contaminated from the outside.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the present invention will be specifically described based on embodiments.
An outline of the heating furnace of the present invention is shown in FIG. This heating furnace is a quartz crucible manufacturing apparatus based on the rotary mold method, and heats and melts quartz powder deposited on the inner surface of the mold, or heats and melts quartz powder and deposits it on the inner surface of the mold to produce a quartz crucible. The illustrated heating furnace includes a heating chamber 10, and includes a rotating table 12 on which a mold 11 is placed and an
[0011]
In the illustrated heating furnace, a part of the ceiling (top plate) 16 of the heating chamber and a part of the side wall (side plate) 18 connected to a part of the ceiling are integrally separated from the heating chamber so as to be movable. ing. Specifically, the
[0012]
As described above, since the
[0013]
On the other hand, a
[0014]
Further, in the illustrated heating furnace, an
[0015]
The
[0016]
【The invention's effect】
Since the hermetic heating furnace of the present invention has the above-described structure, the hermetic degree in the heating chamber is high, and the indoor cleanliness can be improved by effectively preventing contamination from outside and mixing of foreign substances. Therefore, it is suitable for producing a high-purity quartz glass crucible. In addition, since the volume in the heating chamber is smaller than that of an open-type manufacturing apparatus, it is easy to control the furnace temperature, and a high-quality quartz glass crucible can be obtained.
[Brief description of the drawings]
FIG. 1 is a schematic perspective view of a heating furnace of the present invention. FIG. 2 is an explanatory view showing intake and exhaust ports of the heating furnace of the present invention. 10—heating chamber, 11-mold, 12-rotary table, 13-electrode structure, 14-electrode rod, 15-support means, 16-top plate, 17-guide rail, 18-side plate, 19-entrance / exit, 20-door, 21-intake duct, 21a-intake port, 22-exhaust duct, 22a-exhaust mouth.
Claims (8)
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| JP2002120414A JP4092722B2 (en) | 2002-04-23 | 2002-04-23 | Quartz crucible manufacturing furnace |
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| JP2002120414A JP4092722B2 (en) | 2002-04-23 | 2002-04-23 | Quartz crucible manufacturing furnace |
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| JP2003313035A JP2003313035A (en) | 2003-11-06 |
| JP4092722B2 true JP4092722B2 (en) | 2008-05-28 |
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| JP2002120414A Expired - Fee Related JP4092722B2 (en) | 2002-04-23 | 2002-04-23 | Quartz crucible manufacturing furnace |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH058117A (en) * | 1991-06-28 | 1993-01-19 | Nippon Daiyamondo Kk | Connecting method and connection construction of wire saw ends |
| CN102531351A (en) * | 2012-03-10 | 2012-07-04 | 锦州聚泰石英玻璃有限公司 | Anti-softening silicon nitride gradient-doped quartz crucible preparation method |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101312999B1 (en) * | 2007-07-28 | 2013-10-01 | 쟈판 스파 쿼츠 가부시키가이샤 | Method and apparatus for manufacturing vitreous silica crucible |
| US8272234B2 (en) | 2008-12-19 | 2012-09-25 | Heraeus Shin-Etsu America, Inc. | Silica crucible with pure and bubble free inner crucible layer and method of making the same |
| KR101154931B1 (en) * | 2009-01-08 | 2012-06-13 | 쟈판 스파 쿼츠 가부시키가이샤 | Vitreous silica crucible manufacturing apparatus |
| JP5500672B2 (en) * | 2009-11-02 | 2014-05-21 | 株式会社Sumco | Quartz glass crucible manufacturing apparatus and quartz glass crucible manufacturing method |
| US9003832B2 (en) | 2009-11-20 | 2015-04-14 | Heraeus Shin-Etsu America, Inc. | Method of making a silica crucible in a controlled atmosphere |
| JP5605903B2 (en) * | 2010-12-02 | 2014-10-15 | 株式会社Sumco | Silica glass crucible manufacturing equipment |
| KR101293501B1 (en) | 2011-01-28 | 2013-08-06 | 쟈판 스파 쿼츠 가부시키가이샤 | Apparatus and method for manufacturing vitreous silica crucible |
| US9221709B2 (en) * | 2011-03-31 | 2015-12-29 | Raytheon Company | Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same |
| US8281620B1 (en) | 2011-04-27 | 2012-10-09 | Japan Super Quartz Corporation | Apparatus for manufacturing vitreous silica crucible |
| CN102603166A (en) * | 2012-03-10 | 2012-07-25 | 锦州新世纪石英(集团)有限公司 | Quartz flange pipe machining method and forming furnace |
| CN103951170A (en) * | 2014-04-24 | 2014-07-30 | 宁波宝斯达坩埚保温制品有限公司 | Electricity-saving method and electricity-saving device for manufacturing quartz crucible |
| CN105502895A (en) * | 2015-12-14 | 2016-04-20 | 湖南顶立科技有限公司 | Quartz glass cast ingot production device |
| KR102129454B1 (en) * | 2018-01-18 | 2020-07-02 | 이석연 | Heat treatment apparatus of an ingot crucible |
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2002
- 2002-04-23 JP JP2002120414A patent/JP4092722B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH058117A (en) * | 1991-06-28 | 1993-01-19 | Nippon Daiyamondo Kk | Connecting method and connection construction of wire saw ends |
| CN102531351A (en) * | 2012-03-10 | 2012-07-04 | 锦州聚泰石英玻璃有限公司 | Anti-softening silicon nitride gradient-doped quartz crucible preparation method |
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| Publication number | Publication date |
|---|---|
| JP2003313035A (en) | 2003-11-06 |
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