JP4126484B2 - X-ray equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an X-ray apparatus used in an industrial field, a medical field, or the like, and more particularly to a technique for adjusting an optical axis of an electron beam in an X-ray tube used in an X-ray apparatus.
[0002]
[Prior art]
Conventionally, an X-ray apparatus used in the industrial field detects an open X-ray tube 100 as an X-ray tube and X-rays emitted from the open X-ray tube 100 as shown in FIG. There is an I / I tube (image intensifier) 200 for the purpose. The open X-ray tube 100 includes an electron gun 101 that generates an electron beam B, a target 103 that is opposed to the electron gun 101 and generates X-rays by the collision of the electron beam B from the electron gun 101, and an electron A deflector 105 that is disposed between the gun 101 and the target 103 and deflects the electron beam B, an anode 107 that is provided in the vicinity of the electron gun 101 and has an opening at the center, and a target 103 A focusing coil 109 for converging the electron beam B and an aperture 113 provided near the target 103 and having an aperture 111 for concentrating the electron beam B formed in the center are provided.
[0003]
Ideally, the electrons emitted from the electron gun 101 should be accelerated toward the target 103 and converged on the center of the target 103 by the converging coil 109. However, in practice, since the mechanical tolerance of each part is inevitable, the mechanical axis K (the axis that physically connects the center of the electron gun 101 and the center of the target 103) and the optical axis of the electron beam B (actually Unlike the axis from which electrons are emitted, the center of the electron beam B may not be able to reach the center of the target 103. In order to correct this, the deflector 105 is disposed between the electron gun 101 and the target 103 and the electron beam B is scanned to guide the center of the electron beam B to the center of the target 103. Specifically, the output of the deflector 105 is determined so that the X-ray output from the target 103 detected by the I / I tube is maximized by scanning the electron beam B with the deflector 105.
[0004]
[Problems to be solved by the invention]
However, the conventional example having such a configuration has the following problems.
That is, in the conventional X-ray apparatus, a plurality of (for example, two) apertures may be provided in the beam line BL. That is, as shown in FIG. 7, the converging coil 109 has two stages, and an aperture (hereinafter referred to as “first-stage aperture 115”) is also inserted in the vicinity of the first-stage converging coil 109 (the converging coil closer to the electron gun 101). Sometimes. The aperture provided on the side of the subsequent focusing coil 109 located in the vicinity of the target 103 is referred to as a subsequent aperture 113. In this case, it is necessary to adjust the optical axis so that the electron beam B passes through the center of the central aperture hole 117 of the first stage aperture 115 and also passes through the center of the central aperture hole 111 of the rear stage aperture 113. However, since each component has a mechanical tolerance as described above, the X-ray output from the target 103 detected by the I / I tube 200 when the electron beam B is scanned by the deflectors 105 and 105 ′ is maximum. Even if the output of the deflector 105 ′ is determined so that, the electron beam B does not necessarily pass through the center C (indicated by a two-dot chain line in FIG. 7) of the aperture hole 117 of the first stage aperture 115. Therefore, there is a problem that the X-ray output is not always adjusted to the maximum.
[0005]
This invention is made in view of such a situation, and it aims at providing the X-ray apparatus which can perform suitably the optical axis adjustment of the electron beam in an X-ray tube.
[0006]
[Means for Solving the Problems]
In order to achieve such an object, the present invention has the following configuration.
That is, the invention described in claim 1 includes: (a) an electron source that generates an electron beam; a target that is disposed opposite to the electron source and generates X-rays by collision of the electron beam from the electron source; An X-ray tube disposed between an electron source and the target and having a deflecting means for deflecting an electron beam; and (b) an X-ray emitted from the X-ray tube disposed opposite to the X-ray tube. An X-ray apparatus comprising: X-ray detection means for detecting; and (c) control means for controlling the deflection means based on X-ray detection data obtained by the X-ray detection means. A member that is located around the optical axis of the electron beam that connects the electron source and the target in the ray tube and has a specific part that is used to detect the position of the electron beam; Irradiate the site with an electron beam In this case, the deflection unit is controlled to scan, and the optical axis deflection amount of the electron beam of the deflection unit at this time and the X-ray dose or the X-ray image detected by the X-ray detection unit for the X-rays generated at the specific part of the member Based on the above, the optical axis of the electron beam is adjusted.
[0007]
(Function / Effect) According to the invention described in claim 1, a member having a specific part used for detecting the position of the electron beam is positioned around the optical axis of the electron beam connecting the electron source and the target in the X-ray tube. The control means scans the deflection means so as to irradiate the singular part of the member with the electron beam, and the amount of deflection of the optical axis of the electron beam of the deflection means at this time and the X generated at the singular part of the member. Since the optical axis of the electron beam is adjusted based on the X-ray dose or X-ray image detected by the X-ray detection means, the position information of the electron beam can be acquired, and the electron beam is directed in the target direction. Setting, that is, the electron beam can be passed through a desired position, and the optical axis can be adjusted suitably.
[0008]
In addition, the invention according to claim 2 is the X-ray apparatus according to claim 1, wherein the member has an X-ray generation amount different from that of a portion other than the specific portion. It is a feature.
[0009]
(Function / Effect) According to the invention described in claim 2, since the specific part of the member is different in X-ray generation amount from the part other than the specific part, the specific part and the other part It is possible to make a difference in the amount of each X-ray generated when the electron beam collides with the electron beam, to acquire the position information of the electron beam with higher accuracy, and to pass the electron beam to a desired position with higher accuracy. Therefore, the optical axis adjustment can be performed more suitably.
[0010]
Further, the invention according to claim 3 is the X-ray apparatus according to claim 2, wherein the member is provided with four specific parts around the optical axis of the electron beam, and these special parts are provided. Are individually provided around the optical axis every 90 degrees.
[0011]
(Function / Effect) According to the invention described in claim 3, the member is provided with four specific parts around the optical axis of the electron beam, and these special parts are 90 degrees around the optical axis. Since each singular part is located at a predetermined distance on each axis from the intersection of two axes orthogonal to each other, when an electron beam collides with each singular part Based on each X-ray generation data, the position information of the electron beam can be acquired more accurately, the electron beam can be passed through the desired position more accurately, and the optical axis can be adjusted more suitably. it can.
[0012]
According to a fourth aspect of the present invention, in the X-ray apparatus according to the second or third aspect of the present invention, the member has a specific part whose material or thickness is different from a part other than the specific part. It is characterized by being.
[0013]
(Function / Effect) According to the invention described in claim 4, since the member has a specific part different in material or thickness compared to a part other than the specific part, the specific part and the other part It is possible to make a difference in the amount of X-rays generated when the electron beam collides with each other, to acquire the position information of the electron beam with high accuracy, and to pass the electron beam to a desired position with high accuracy. It is possible to adjust the optical axis suitably.
[0014]
The invention according to claim 5 is the X-ray apparatus according to any one of claims 1 to 4, wherein the member has an aperture hole for focusing an electron beam at the center thereof, and Aperture in which a through hole as the specific portion is formed around the throttle hole And the portion other than the specific portion is a member portion excluding the through hole and the throttle hole in the aperture. It is characterized by this.
[0015]
(Function / Effect) According to the invention described in claim 5, the member has a throttle hole for narrowing the electron beam in the center thereof, and a through-hole as a specific portion is formed around the throttle hole. Aperture The portion other than the specific portion is a member portion excluding the through hole and the throttle hole in the aperture. Therefore, there is no need to provide a member having a specific part separately from the aperture, and X-rays generated by causing an electron beam to collide with a through-hole as a specific part pass through the through-hole. It is possible to reach the detection means, that is, the absorption and attenuation by the aperture is reduced as much as possible, the position information of the electron beam can be obtained with high accuracy, and the electron beam is reduced to the aperture. It can be set in the direction passing through the center of the hole, that is, the electron beam can be passed through the center position of the aperture hole of the aperture, and the optical axis can be adjusted suitably.
[0016]
This specification also discloses the following X-ray tube optical axis adjustment method and electron beam apparatus.
[0017]
(1) An electron source that generates an electron beam, a target that is disposed opposite to the electron source and generates X-rays by collision of an electron beam from the electron source, and is disposed between the electron source and the target. In the method of adjusting the optical axis of an X-ray tube having deflection means for deflecting an electron beam,
The deflecting means is adapted to irradiate a member having a specific part used for detecting the position of the electron beam, which is located around the optical axis of the electron beam connecting the electron source and the target in the X-ray tube. A beam scanning process for scanning control;
The amount of deflection of the optical axis of the electron beam of the deflecting means during the beam scanning process and the X-ray generated at the specific part of the member are arranged opposite to the X-ray tube and emitted from the X-ray tube. An optical axis adjustment process for adjusting the optical axis of the electron beam based on the X-ray dose or the X-ray image detected by the X-ray detection means for detecting
An optical axis adjustment method for an X-ray tube, comprising:
[0018]
According to the method for adjusting the optical axis of the X-ray tube described in (1) above, the beam scanning process is performed by detecting the position of the electron beam located around the optical axis of the electron beam connecting the electron source and the target in the X-ray tube. The deflection means is controlled so that the electron beam is irradiated onto a member having a specific part used for the optical axis, and the optical axis adjustment process is performed by adjusting the optical axis deflection amount of the electron beam of the deflection means during the beam scanning process Since the optical axis of the electron beam is adjusted based on the X-ray generated at the site based on the X-ray dose or the X-ray image detected by the X-ray detection means, the position information of the electron beam can be obtained, The target direction can be set, that is, the electron beam can be passed through a desired position, and the optical axis can be adjusted suitably.
[0019]
(2) An electron source that generates an electron beam, an emission port that is disposed opposite to the electron source and emits an electron beam from the electron source, and is disposed between the electron source and the emission port. An electron beam apparatus for irradiating an object with an electron beam from the main body,
(A) X-ray detection means arranged to face the main body portion and detect X-rays generated due to the electron beam from the electron source being irradiated to a predetermined location in the main body portion;
(B) control means for controlling the deflection means based on X-ray detection data obtained by the X-ray detection means;
(C) a member that is located around the optical axis of the electron beam that connects the electron source and the emission port in the main body, and that has a specific part used for detecting the position of the electron beam;
With
(D) The control means scans and controls the deflection means so as to irradiate the singular part of the member with an electron beam, and the amount of optical axis deflection of the electron beam of the deflection means and the singular part of the member at this time An electron beam apparatus for adjusting an optical axis of an electron beam based on an X-ray dose or an X-ray image obtained by detecting the generated X-ray with the X-ray detection means.
[0020]
According to the electron beam apparatus described in (2) above, a member having a specific portion used for detecting the position of the electron beam is positioned around the optical axis of the electron beam connecting the electron source and the emission port in the main body. The control means scans and controls the deflection means so as to irradiate the singular part of the member with the electron beam, and the optical axis deflection amount of the electron beam of the deflection means and the X-ray generated at the singular part of the member at this time are controlled. Since the optical axis of the electron beam is adjusted based on the X-ray dose or X-ray image detected by the X-ray detection means, the position information of the electron beam can be acquired, and the electron beam is set in a target direction. That is, the electron beam can be passed through a desired position, and the optical axis can be adjusted suitably.
[0021]
DETAILED DESCRIPTION OF THE INVENTION
An embodiment of the X-ray apparatus of the present invention will be described below. FIG. 1 is a schematic perspective view showing a main configuration of an X-ray apparatus according to the embodiment, and FIG. 2 is a schematic cross-sectional view showing a configuration of the X-ray apparatus of the embodiment. FIG. 3A is a schematic diagram for explaining that X-rays are generated by irradiating the through hole of the first stage aperture with an electron beam, and FIG. 3B is a cross-sectional view of the first stage aperture.
[0022]
As shown in FIGS. 1 and 2, the X-ray apparatus of the embodiment includes an open X-ray tube 1 that generates X-rays and an X-ray for detecting X-rays emitted from the open X-ray tube 1. A line detector, for example, an I / I tube (image intensifier) 2 is provided. In this X-ray apparatus, an object to be imaged (for example, an electronic component) is positioned between an open X-ray tube 1 and an I / I tube 2 that are arranged to face each other. An X-ray transmission image of the object is acquired by detecting the X-rays emitted and transmitted through the object by the I / I tube 2. Hereinafter, each part structure of an Example apparatus is demonstrated concretely.
[0023]
The open X-ray tube 1 includes an electron gun 11 that generates an electron beam B, a target 13 that is disposed opposite to the electron gun 11 and generates X-rays by the collision of the electron beam B from the electron gun 11, and an electron A plurality of (for example, four) deflectors 15 that are disposed between the gun 11 and the target 13 and deflect the electron beam B, and an anode (anode) provided in the vicinity of the electron gun 11 and having an opening at the center. 17, a first stage converging coil 19 for converging the electron beam B provided in the middle of the beam line BL, and a rear stage converging coil 21 provided near the target 13 for converging the electron beam B, A first-stage aperture 25 provided near the first-stage converging coil 19 and having an aperture hole 23 for confining the electron beam B formed in the center and a target 13 near the first-stage aperture 25 are provided. Throttle hole 27 and a rear stage aperture 29 formed in the center for.
[0024]
The first stage aperture 25 is individually provided with four through holes 31a to 31d in the circumferential direction. These four through holes 31 a to 31 d are individually provided around the throttle hole 23 every 90 degrees. As shown in FIG. 1, if the center of the aperture 23 is an intersection (origin) of two axes (x axis, y axis) orthogonal to each other, it penetrates to each position equidistant from the origin on the y axis. Holes 31a and 31c are formed, and through holes 31b and 31d are formed at respective positions equidistant from the origin on the x-axis. Here, for convenience, each of the through holes 31a to 31d is arranged at an equal distance from the origin, but it is not always necessary to have the same distance as long as the positional relationship is known.
[0025]
As shown in FIG. 3B, the four through holes 31 a to 31 d of the first stage aperture 25 are inclined holes formed so that the penetration direction is directed toward the center of the target 13. This inclination angle is set for the purpose of preventing the electron beam B from reaching the target 13 directly without colliding with the through holes 31a to 31d, and the distance from the first stage aperture 25 to the target 13; A suitable arbitrary value may be set according to the distance from the throttle hole 23 of the first stage aperture 25 to each of the through holes 31a to 31d. In this embodiment, the center line of the throttle hole 23 of the first stage aperture 25 (see FIG. 3 (b), for example, about 10 degrees.
[0026]
As shown in FIG. 1, the X-ray apparatus of this embodiment includes a control unit 41 that controls the deflector 15 based on X-ray transmission data from the I / I tube 2. The control unit 41 scans and controls the deflector 15 so that the through holes 31a to 31d of the first stage aperture 25 are irradiated with the electron beam B. At this time, the optical axis deflection amount of the electron beam B of the deflector 15 and the first stage aperture are controlled. The optical axis of the electron beam B is adjusted based on the X-ray dose or X-ray image detected by the I / I tube 2 for the X-rays generated in the 25 through holes 31a to 31d.
[0027]
The open X-ray tube 1 described above corresponds to the X-ray tube of the present invention, the I / I tube 2 described above corresponds to the X-ray detection means of the present invention, and the electron gun 11 described above corresponds to the electron of the present invention. The above-described deflector 15 corresponds to the deflecting unit of the present invention, the above-described control unit 41 corresponds to the control unit of the present invention, the above-described first stage aperture 25 corresponds to the member of the present invention, and Each through-hole 31a-31d corresponded to the specific site | part of this invention.
[0028]
Next, the optical axis adjustment of the electron beam B in the open X-ray tube 1 of the embodiment apparatus having the above-described configuration will be specifically described with reference to FIGS. FIGS. 4A to 4D are schematic views showing images obtained by detecting X-rays generated in each through-hole with an I / I tube. FIG. 5 is a schematic diagram showing the amount of deflection for positioning the optical axis of the electron beam at the center of the aperture.
[0029]
First, as illustrated in FIG. 1, the control unit 41 performs scanning control of the deflector 15 so that the through holes 31 a to 31 d of the first stage aperture 25 are irradiated with the electron beam B. That is, each of the through holes 31a to 31d is irradiated with the electron beam B in order.
[0030]
Specifically, when the electron beam B is applied to the through hole 31a of the first stage aperture 25, a plurality of electrons constituting the electron beam B are transmitted through the through hole 31a of the first stage aperture 25 as shown in FIG. X-rays are generated by colliding around. Some of the generated X-rays are absorbed by traveling through the first stage aperture 25, but the remaining X-rays are directed toward the target 13 through the through hole 31a and pass through the target 13 and the like. As a result, a part thereof attenuates and reaches the I / I tube 2 (see FIG. 1). At this time, in the I / I tube 2, the generated X-ray passes through the aperture hole 27 of the rear aperture 29 and an image G 1 as shown in FIG. 4A is detected by the principle of the pinhole camera. That is, X-rays generated in the through hole 31a of the first stage aperture 25 are detected. The control unit 41 stores the deflection amount of the deflector 15 when the electron beam B is applied to the through hole 31a of the first stage aperture 25 based on the X-ray dose or the X-ray image detected by the I / I tube 2. That is, the control unit 41 stores the deflection amount (x1, y1) of the deflector 15 when the X-ray dose detected by the I / I tube 2 is maximized or when the X-ray image is optimally obtained.
[0031]
Next, when the electron beam B is irradiated to the through hole 31d of the first stage aperture 25, X-rays are generated by the electron beam B colliding with the vicinity of the through hole 31d of the first stage aperture 25, as described above. A part of the X-rays reaches the I / I tube 2. At this time, the I / I tube 2 detects an image G2 as shown in FIG. That is, X-rays generated in the through hole 31d of the first stage aperture 25 are detected. The control unit 41 stores the deflection amount of the deflector 15 when the electron beam B is applied to the through hole 31d of the first stage aperture 25 based on the X-ray dose or the X-ray image detected by the I / I tube 2. That is, the control unit 41 stores the deflection amount (x2, y2) of the deflector 15 when the X-ray dose detected by the I / I tube 2 is maximized or when the X-ray image is optimally obtained.
[0032]
Next, when the electron beam B is applied to the through hole 31b of the first stage aperture 25, X-rays are generated due to the electron beam B colliding with the vicinity of the through hole 31b of the first stage aperture 25, as described above. A part of the X-rays reaches the I / I tube 2. At this time, the I / I tube 2 detects an image G3 as shown in FIG. That is, X-rays generated in the through hole 31b of the first stage aperture 25 are detected. Based on the X-ray dose or X-ray image detected by the I / I tube 2, the control unit 41 stores the deflection amount of the deflector 15 when the electron beam B is applied to the through-hole 31 b of the first-stage aperture 25. That is, the control unit 41 stores the deflection amount (x3, y3) of the deflector 15 when the X-ray dose detected by the I / I tube 2 is maximized or when the X-ray image is optimally obtained.
[0033]
Next, when the electron beam B is applied to the through hole 31c of the first stage aperture 25, X-rays are generated by the electron beam B colliding with the vicinity of the through hole 31c of the first stage aperture 25, as described above. A part of the X-rays reaches the I / I tube 2. At this time, the I / I tube 2 detects an image G4 as shown in FIG. That is, X-rays generated in the through hole 31c of the first stage aperture 25 are detected. Based on the X-ray dose or X-ray image detected by the I / I tube 2, the control unit 41 stores the deflection amount of the deflector 15 when the electron beam B is applied to the through hole 31 c of the first stage aperture 25. That is, the control unit 41 stores the deflection amount (x4, y4) of the deflector 15 when the X-ray dose detected by the I / I tube 2 is maximized or when the X-ray image is optimally obtained.
[0034]
Then, as shown in FIG. 5, the control unit 41 causes the electron beam B to pass through the aperture of the first stage aperture 25 based on the deflection amounts (x1, y1) to (x4, y4) in the above-described images G1 to G4. The deflection amount (x0, y0) located at the center of 23 is obtained. By applying this deflection amount (x0, y0) to the deflector 15, the electron beam B is positioned at the center of the aperture hole 23 of the first stage aperture 25.
[0035]
As described above, the process of performing scanning control of the deflector 15 so that the through holes 31a to 31d of the first stage aperture 25 are irradiated with the electron beam B corresponds to the beam scanning process of the present invention. The amount of deflection of the optical axis B of the electron beam B of the deflector 15 and the X-rays generated in the through holes 31a to 31d of the first stage aperture 25 based on the X-ray dose or X-ray image detected by the I / I tube 2 Thus, the process of adjusting the optical axis of the electron beam B corresponds to the optical axis adjustment process in the present invention.
[0036]
As described above, according to the apparatus of the present embodiment, the singular part used for detecting the position of the electron beam B around the optical axis of the electron beam B connecting the electron gun 11 and the target 13 in the open X-ray tube 1 is used. The first stage aperture 25 having the through holes 31a to 31d is positioned, and the control unit 41 scans and controls the deflector 15 so that the through holes 31a to 31d of the first stage aperture 25 are irradiated with the electron beam B. The electron beam B of the deflector 15 at that time and the X-ray generated in the through-holes 31a to 31d of the first stage aperture 25 are detected based on the X-ray dose or X-ray image detected by the I / I tube 2. Since the optical axis of the beam B is adjusted, the position information of the electron beam B can be acquired, the electron beam B can be set in a target direction, that is, the electron beam B can be passed through a desired position, It is possible to perform axial adjustment suitably.
[0037]
Further, since the first stage aperture 25 has through-holes 31a to 31d that generate X-rays differently from places other than the through-holes 31a to 31d, an electron beam is passed through the through-holes 31a to 31d and other places. It is possible to make a difference in the amount of each X-ray generated when B is collided, to acquire position information of the electron beam B with higher accuracy, and to pass the electron beam B to a desired position with higher accuracy. Therefore, the optical axis adjustment can be performed more suitably.
[0038]
Further, the first stage aperture 25 has through holes 31a to 31d provided at four locations around the optical axis of the electron beam B, and these through holes 31a to 31d are provided individually every 90 degrees around the optical axis. In other words, each through hole 31a to 31d is located at a predetermined distance on each axis from the intersection (origin) of two axes (x axis, y axis) orthogonal to each other. Based on each X-ray generation data when the electron beam B collides with 31a to 31d, the position information of the electron beam B can be acquired more accurately, and the electron beam B is passed more accurately to a desired position. Therefore, the optical axis adjustment can be performed more suitably.
[0039]
In addition, since the first stage aperture 25 has a diaphragm hole 23 for confining the electron beam B in the center and through holes 31a to 31d are formed around the diaphragm hole 23 as unique parts, It is not necessary to separately provide a member having the first stage aperture 25, and X-rays generated by colliding the electron beam B around the through holes 31a to 31d are passed through the through holes 31a to 31d to pass through the I / I tube. 2, that is, the attenuation by being absorbed by the first stage aperture 25 is reduced as much as possible, and the position information of the electron beam B can be obtained with high accuracy. It can be set in a direction passing through the center of the aperture hole 23 of the first stage aperture 25, that is, the electron beam B can pass through the center position of the aperture hole 23 of the first stage aperture 25, and light Adjustment can be suitably performed.
[0040]
The present invention is not limited to the above embodiment, and can be modified as follows.
[0041]
(1) In the embodiment apparatus, as shown in FIG. 1, the first stage aperture 25 is provided with through holes 31a to 31d as specific parts, but the specific part of the first stage aperture 25 is different from the parts other than the special part. It is good also as a thing from which a material or thickness differs.
[0042]
(2) In the embodiment apparatus, as shown in FIG. 1, the through holes 31 a to 31 d of the first stage aperture 25 are used as unique parts, but members other than the target 13 (first stage aperture 25) provided in the beam line BL. Any part (for example, a threaded part at the outer end) may be adopted as the specific part. In this case, it is needless to say that the X-rays generated by the irradiation of the electron beam can be detected by the I / I tube 2 and can be used for detecting the position of the electron beam B. . For example, X-rays are generated by irradiating a screw portion or the like at the outer end of a member other than the target 13 to generate X-rays, and the X-rays are detected by the I / I tube 2 to obtain position information of the electron beam B. You may make it obtain.
[0043]
(3) In the embodiment apparatus, four unique portions (through holes 31a to 31d) are provided in the first stage aperture 25, but three unique portions (through holes and the like) are provided around the throttle hole 23 of the first stage aperture 25. The position information of the electron beam B may be acquired as provided. Conversely, the number of specific sites may be increased from four, for example, eight.
[0044]
(4) In the embodiment apparatus, the I / I tube 2 is employed as the X-ray detection means, but a flat panel X-ray detector, an X-ray CCD camera, an imaging plate, or the like may be employed.
[0045]
(5) In the embodiment apparatus, the number of apertures is two (two of the first-stage aperture 25 and the second-stage aperture 29) and the number of the deflectors 15 is four, but these may be any number.
[0046]
(6) Although the embodiment apparatus has been described by taking an X-ray apparatus as an example, the present invention is not limited to the X-ray apparatus. For example, an X-ray microanalyzer (EPMA: Electron Probe Micro-Analysis) The present invention can also be applied to electron beam optical axis adjustment in various electron beam apparatuses such as a scanning electron microscope (SEM).
[0047]
【The invention's effect】
As is apparent from the above description, according to the X-ray apparatus of the present invention, the X-ray apparatus has a singular part used for detecting the position of the electron beam around the optical axis of the electron beam connecting the electron source and the target in the X-ray tube. The member is located, and the control means scans and controls the deflection means so as to irradiate the singular part of the member with the electron beam. At this time, the amount of deflection of the electron beam of the deflection unit and the singular part of the member are controlled. Since the optical axis of the electron beam is adjusted based on the generated X-ray or the X-ray dose or X-ray image detected by the X-ray detection means, the position information of the electron beam can be acquired. In other words, the electron beam can be passed through a desired position, and the optical axis can be adjusted suitably.
[Brief description of the drawings]
FIG. 1 is a schematic perspective view showing a main configuration of an X-ray apparatus according to an embodiment.
FIG. 2 is a schematic sectional view showing a configuration of an X-ray apparatus according to an embodiment.
3A is a schematic diagram for explaining that X-rays are generated by irradiating an electron beam to a through hole of a first stage aperture, and FIG. 3B is a cross-sectional view of the first stage aperture.
FIGS. 4A to 4D are schematic views showing images obtained by detecting X-rays generated in each through-hole with an I / I tube. FIGS.
FIG. 5 is a schematic diagram showing how to obtain a deflection amount for positioning the optical axis of the electron beam at the center of the aperture hole.
FIG. 6 is a schematic cross-sectional view showing a configuration of a conventional X-ray apparatus.
FIG. 7 is a schematic cross-sectional view showing a configuration when a conventional X-ray apparatus includes two apertures.
[Explanation of symbols]
1 ... Open X-ray tube (X-ray tube)
2 ... I / I tube (X-ray detection means)
11 ... Electron gun (electron source)
15: Deflector (deflection means)
25 ... First stage aperture (member)
31a-31d ... Through-hole (specific part)
41 ... Control (control means)

Claims (5)

(A) An electron source that generates an electron beam; a target that is disposed opposite to the electron source and generates X-rays by collision of an electron beam from the electron source; and is disposed between the electron source and the target. An X-ray tube having deflection means for deflecting the electron beam;
(B) X-ray detection means arranged to face the X-ray tube and detect X-rays emitted from the X-ray tube;
(C) In an X-ray apparatus having control means for controlling the deflection means based on X-ray detection data obtained by the X-ray detection means,
(D) a member that is located around the optical axis of the electron beam connecting the electron source and the target in the X-ray tube and has a specific part used for detecting the position of the electron beam;
(E) The control means scans and controls the deflection means so that the singular part of the member is irradiated with an electron beam. At this time, the amount of optical axis deflection of the electron beam of the deflection means and the singular part of the member are controlled. An X-ray apparatus characterized in that an optical axis of an electron beam is adjusted based on an X-ray dose or an X-ray image of the generated X-rays detected by the X-ray detection means.   2. The X-ray apparatus according to claim 1, wherein the specific part of the member has an X-ray generation amount different from that of a part other than the specific part.   3. The X-ray apparatus according to claim 2, wherein the member is provided with four specific portions around the optical axis of the electron beam, and the specific portions are individually provided every 90 degrees around the optical axis. An X-ray apparatus characterized by being provided.   4. The X-ray apparatus according to claim 2, wherein the specific part of the member has a different material or thickness as compared to a part other than the specific part. 5. 5. The X-ray apparatus according to claim 1, wherein the member has a diaphragm hole for confining an electron beam at a center thereof, and the member serves as the specific portion around the diaphragm hole. An aperture with a through hole ,
The X-ray apparatus according to claim 1, wherein the portion other than the specific portion is a member portion of the aperture excluding the through hole and the aperture hole .

Images