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JP4148451B2 - Single domain method for ferroelectric single crystals - Google Patents
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JP4148451B2 - Single domain method for ferroelectric single crystals - Google Patents

Single domain method for ferroelectric single crystals Download PDF

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JP4148451B2
JP4148451B2 JP2002138385A JP2002138385A JP4148451B2 JP 4148451 B2 JP4148451 B2 JP 4148451B2 JP 2002138385 A JP2002138385 A JP 2002138385A JP 2002138385 A JP2002138385 A JP 2002138385A JP 4148451 B2 JP4148451 B2 JP 4148451B2
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temperature
single crystal
electric field
crystal
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JP2003327500A (en
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大成 松本
健二 北村
優 中村
俊二 竹川
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National Institute for Materials Science
Proterial Ltd
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Hitachi Metals Ltd
National Institute for Materials Science
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Description

【0001】
【発明の属する技術分野】
本発明は、強誘電体単結晶の自発分極の向きを一方向に揃える単分域化の方法、特にモル比Li2O/(Li2O+Nb2O5)が0.495〜0.500であるLiNbO3単結晶の単分域化方法に関する。
【0002】
【従来の技術】
LiNbO3単結晶は電気光学効果や非線形光学効果が大きく、光変調器や光波長変換器などへの研究、開発が活発であり、その一部は製品化されている。従来、LiNbO3(以下LNと略す)単結晶はチョクラルスキー法で育成され、モル比がLi2O/(Li2O+Nb2O5)=0.485付近の融液と結晶組成が一致する一致溶融組成、いわゆるコングルエント組成のLiNbO3(以下CLNと略す)単結晶が育成されてきた。育成されたアズグロウンのCLN単結晶は多分域状態になっている。CLN単結晶が多分域になっていると、ウェハー加工時にクラックが発生するなどの問題があり、また、光変調器などの素子を製造するときに半波電圧が変化するなど素子の特性に影響するため、育成されたCLN単結晶は単分域化を行う必要がある。
【0003】
近年、例えば特許第3049308号にあるようにLi2O/(Li2O+Nb2O5)=0.50の定比組成(ストイキオメトリ組成)近傍のLiNbO3(以下SLNと略す)単結晶が二重坩堝法を用いて育成されている。特許第3049308号では、アズグロウンで単分域化しているとあるが、実際には図7(a)に示したように、単結晶表面近傍や内部の微少領域に反対向きの分極が存在する。またX軸方向やY軸方向で育成した場合には、図7(b)に示したように分極の向きが二つに分かれた多分域状態になっている。そのためSLN単結晶でも単分域化が必要となる。
【0004】
単分域化の方法としては、電界冷却法がある。図8に従来の単分域化の単結晶のセット図を示す。例として、ここにはZ軸方向に育成したCLN単結晶の単分域化について示した。CLN単結晶31は、耐火物33中に入れたLNの粉末32(LiNbO3粉末)の中に埋め込む。LNの粉末32の上部と底部には白金電極34および35がセットされている。これら単結晶や白金電極をセットした耐火物33を単分域化処理炉にセットする。単結晶のトップ側に配置された白金電極34は負電極、ボトム側に配置された白金電極35は正電極となるように直流電源に接続する。
【0005】
図9に単分域化処理炉の温度プログラム36と電界印加プログラム37を示す。温度プログラムは単分域化処理で制御した温度と時間のグラフに相当し、電界印加プログラムは単分域化処理で制御した電界の大きさと時間のグラフに相当する。CLN単結晶31は、50〜100℃/hrで1170〜1200℃の単分域化処理温度T1まで昇温し、2〜10時間保持する。T1での保持が始まって30分〜1時間後に1〜3V/cmの電界を印加し、電界を印加した状態で1000℃までは25〜50℃/hr、その後は50〜100℃/hrで室温まで降温することで単分域化を行う。通常、単分域化を行うときは単結晶のキュリー点よりも20℃〜50℃高い温度に昇温、保持して電界を印加する。単位℃/hrは、1時間当たりの温度変化を表わす。
【0006】
【発明が解決しようとする課題】
図10にLN結晶のモル比Li2O/(Li2O+Nb2O5)に対するキュリー点と融点との関係を示す。モル比Li2O/(Li2O+Nb2O5)が0.50に近づくほどキュリー点は高くなるが、融点は低くなる。モル比Li2O/(Li2O+Nb2O5)が0.495よりも大きくなると、融点とキュリー点の温度差が小さいため、上述の従来の方法のように数10℃高い温度で保持すると結晶が溶解してしまう。さらに、これらの結晶にMgOやZnOなどをドープした結晶は、ノンドープの結晶と比較してキュリー点が数℃〜10数℃高くなる。
【0007】
また、従来の方法では単分域化処理温度で数時間保持するが、モル比Li2O/(Li2O+Nb2O5)が0.495よりも大きいLiNbO3単結晶では融点に近い温度で長時間保持しなくてはならない。そのため、結晶にクラックが発生しやすくなり、歩留まりが悪くなる。
【0008】
また、キュリー点よりも低い温度での単分域化処理は、自発分極が残っているために、より大きな電界を印加する必要がある。しかし、大きな電界を印加すると単結晶により大きな電流が流れてしまうため、クラックを発生して歩留まりが悪くなる。
【0009】
これらを考えると、キュリー点よりもわずかに高い温度、例えば、キュリー点よりも2〜10℃高い温度での単分域化処理が必要となる。
【0010】
しかし、単分域化処理を行う炉内には温度分布があり、結晶の大きさやセットのしかたによって結晶の温度が変化するため、設定温度をキュリー点よりも2℃程度高い温度に設定しても、必ずしも結晶の温度がキュリー点よりも高くなっているとは限らない。また、LiNbO3単結晶のキュリー点は、モル比Li2O/(Li2O+Nb2O5)のわずかな違いによって大きく変化するため、単結晶のロット毎のわずかな組成の違いによって設定温度よりもキュリー点の方が高くなることがある。そのため、単分域化処理が完全にできていないことがある。
【0011】
LiNbO3単結晶の場合、単分域化が完全にできているか否かを判断するためには、結晶をカット・研磨してその研磨品をエッチングするなどの工程が必要であり、単分域化処理の良否を判定するのに時間がかかる。また、単分域化処理が不完全であった場合には、再度単分域化処理を行わなくてはならず、それによってまた融点近くまで単結晶を昇温するため、クラックが発生する可能性がある。
【0012】
本発明は上述のような事情に鑑みてなされたものであり、例えばモル比Li2O/(Li2O+Nb2O3)が0.495以上のLiNbO3単結晶のように、キュリー点と融点が近い単結晶を単分域化する際に、クラックなどの歩留まり低下を引き起こすことなく、かつ、確実に単分域化を行うための方法を提供することを目的とするものである。
【0013】
[課題を解決するための手段]
本発明による単分域化方法は、強誘電体単結晶のキュリー点よりも低い温度T2で前記強誘電体単結晶を保持して電界を印加し、前記強誘電体単結晶に前記電界を印加した状態で前記キュリー点よりも高い温度である単分域化処理温度T1まで昇温、保持した後、前記強誘電体単結晶に電界を印加した状態で室温まで冷却し、前記温度 T2 は前記単分域化処理温度 T1 よりも 10 30 ℃低い温度であり、前記温度 T2 の保持時間は 1 3 時間である。
【0015】
また、電界を印加しているときに、単結晶中を流れる電流値を監視することによって、単分域化処理温度T1が前記強誘電体単結晶のキュリー点よりも高温になることを確認することができる。より詳しくは、本発明に係る単分域化方法において、前記強誘電体単結晶に電界を印加し、前記温度 T2 から前記単分域化処理温度 T1 まで昇温するときに前記強誘電体単結晶に流れる電流値が減少する温度をもって前記キュリー点とする。温度T2での保持が終わって単分域化処理温度T1まで昇温するときに、電界の大きさは変えないため、昇温するに従い単結晶中を流れる電流値も大きくなる。しかし、単結晶の温度がキュリー点を通過するときに、電界の大きさを一定としているにもかかわらず、単結晶中を流れる電流値が小さくなる。さらに昇温を続けると、単結晶中を流れる電流値は再度大きくなり、温度T1で保持すると電流値はほぼ変化しなくなる。
【0016】
本発明に係る単分域化方法において、前記温度T2は前記単分域化処理温度T1よりも10℃〜30℃低い温度であることが望ましい。温度T2を単分域化処理温度T1よりも10℃〜30℃低い温度に設定するのは、温度T2からT1に昇温するときに、電界の大きさを変化させなくても、単結晶中を流れる電流値は15%以下の上昇にとどまり、単結晶中に大電流が流れて結晶にクラックが発生することを防ぐことができる為である。なお、特許請求の範囲や発明の詳細な説明において、“10〜30℃”とは、“10℃以上且つ30℃以下の範囲内にある”ということと同義であるものとして表現する。“15分〜1時間”についても、“15分以上且つ1時間以内の範囲”と同義である。
【0017】
炉内温度分布や単結晶のわずかな組成ずれによって、単分域化処理温度T1がキュリー点よりも低いときには、上述のように電流値が小さくなることがない。その場合は、単分域化処理温度T1を数℃高い温度T1’に設定し直し、T1’まで昇温する。それによって電流値が小さくなる現象が確認され、確実に単分域化が行える。
【0018】
このときの単分域化処理温度T1は、強誘電体単結晶のキュリー点よりも2℃〜10℃高い温度であることが望ましい。これによって、いたずらに強誘電体単結晶の温度が上がりすぎて融点よりも高くなり、単結晶が融解することを防ぐことができる。
【0019】
また、単分域化処理温度T1での保持時間は、15分〜1時間が望ましい。炉内の温度がT1になっても、単結晶の温度がT1に達するまでには5〜15分の時間差があり、保持時間が1時間を越えると、単結晶にクラックが発生する確率が高くなる。単分域化処理温度T1での保持時間を15分〜1時間に設定することで、単結晶自体の温度をT1に保持することができて確実に単分域化が行え、かつ単結晶にクラックが発生することによる歩留まり低下を小さくすることができる。
【0020】
上述の単分域化方法は、強誘電体単結晶がLiNbO3単結晶であり、そのモル比Li2O/(Li2O+Nb2O5)が0.495〜0.500であるときに、特に有効である。これらの結晶はキュリー点と融点の差が50℃以下である。また、上記のLiNbO3単結晶にMgO、ZnO、In2O3、Sc2O3のうち少なくとも1種類がドープされている単結晶は、そのキュリー点がノンドープのものよりも高くなるので、キュリー点と融点の差はさらに小さくなる。上述の方法では、確実に単結晶のキュリー点よりもわずかに高い温度で単分域化処理が行えるので、単分域化に失敗することがなく、また、融点よりもできるだけ低い温度で処理できるので、クラックの発生による歩留まり低下を小さくすることができる。
【0021】
【発明の実施の形態】
以下、本発明の実施例について説明する。なお、本発明はこれら実施例に限定されるものではない。
(実施例1)
以下、図面に示す実施例に基づいて本発明を詳細に説明する。図1および図2は、本発明の一実施例による単分域化のセット方法および温度プログラムと電界印加プログラムを示している。図1中、強誘電体単結晶1にはZ軸方向に育成したLiNbO3単結晶を用いている。図1に示したように、LN単結晶1は、耐火物3中に入れたLiTaO3の粉末2の中に埋め込んだ。LiTaO3粉末2の上部と底部には白金電極4および5をセットした。また、白金電極4の直上に熱電対7をセットした。これは単分域化処理中のLN単結晶1の温度を測定するためである。これら単結晶や白金電極をセットした耐火物3を単分域化処理炉にセットする。単結晶のトップ側に配置された白金電極4は負電極、ボトム側に配置された白金電極5は正電極となるように直流電源に接続する。また、電流計6で単分域化処理中のLN単結晶1に流れる電流値を監視する。
【0022】
単分域処理炉にセットされたLN単結晶は、図2に示した温度プログラム8においてT1を1202℃、T2を1182℃として、50℃/hrで1182℃まで昇温した。また、図2の電界印加プログラムに示すように、1182℃の保持に入ってから1時間後に1V/cmの電界を印加した。1182℃で3時間保持した後、印加した電界の大きさは維持したまま50℃/hrで1202℃まで昇温し、1202℃で1時間保持した後、電界印加の状態を維持したまま1000℃までは30℃/hr、その後は50℃/hrで降温した。
【0023】
図3には上記単分域化処理を行ったときのLN単結晶1に流れた電流値および単分域化処理炉の温度プログラム8と結晶近傍にセットした熱電対7により測定した温度10を示す。温度プログラム8で1182℃での保持が終わり、1202℃までの昇温が開始すると、それに少し遅れてLN単結晶1の温度10が上昇する。LN単結晶1の温度上昇に伴い、LN単結晶1に流れる電流値11も大きくなるが、LN単結晶1の温度が1199℃に達したときに電流値11が減少し、1200℃で電流値が再度大きくなり、1202℃になってからはほぼ一定の電流値を示した。
【0024】
単分域化処理の終わったLN単結晶にクラックはなかった。このLN単結晶をZ面でカット・研磨し、エッチングを行って分極状態を調べたところ、反対向きの分極はなく、良好に単分域化されていた。また、このLN結晶のキュリー点と結晶の組成を調べたところ、キュリー点は1199℃であり、モル比Li2O/(Li2O+Nb2O5)は0.497であった。
【0025】
(実施例2)
同様にして他の実施例を図1、図2および図4を用いて説明する。強誘電体単結晶にはMgOを2mol%ドープしたLiNbO3単結晶(以下Mg-LNと略す)を用いた。育成した結晶の方位はZ軸方向である。実施例1と同様に図1のようにMg-LN単結晶1をセットした。図2の温度プログラム8でT1を1223℃、T2を1203℃として、50℃/hrで1203℃まで昇温し、1203℃の保持開始から1時間後に1V/cmの電界を印加した。1203℃で3時間保持した後、印加した電界の大きさは維持したまま50℃/hrで1223℃まで昇温し、1223℃で1時間保持した後、電界印加の状態を維持したまま1000℃までは30℃/hr、その後は50℃/hrで降温した。なお、実施例の説明において、類似の構成を同じ符号で表わしたが、同一を意味するものではない。
【0026】
図4には上記単分域化処理を行ったときのMg-LN単結晶1に流れた電流値および単分域化処理炉の温度プログラムと結晶近傍にセットした熱電対7により測定した温度を示す。1203℃での保持が終わり、1223℃までの昇温が開始すると、それに少し遅れてMg-LN単結晶1の温度10が上昇する。Mg-LN単結晶1の温度上昇に伴い、Mg-LN単結晶1に流れる電流値11も大きくなるが、Mg-LN単結晶1の温度が1221℃に達したときに電流値が減少し、1222℃で電流値が再度大きくなり、1223℃になってからはほぼ一定の電流値を示した。
【0027】
単分域化処理の終わったMg-LN単結晶には肩部に小さなクラックが発生していたが、直胴部にはクラックがなかった。このMg-LN単結晶をZ面でカット・研磨し、エッチングを行って分極状態を調べたところ、反対向きの分極はなく、良好に単分域化されていた。また、このMg-LN結晶のキュリー点と融点を調べたところ、キュリー点は1221℃であり、融点は1230℃であった。
【0028】
(実施例3)
他の実施例を図1、図2および図5を用いて説明する。ノンドープのLN単結晶を用いて図1のようにセットし、図2に示した温度プログラム8でT1を1202℃、T2を1182℃として50℃/hrで1182℃まで昇温した。1182℃の保持に入ってから1時間後に1V/cmの電界を印加した。1182℃で3時間保持した後、印加した電界の大きさは維持したまま50℃/hrで1202℃まで昇温した。
【0029】
図5には上記単分域化処理を行ったときのLN単結晶1に流れた電流値および単分域化処理炉の温度プログラムと結晶近傍にセットした熱電対7により測定した温度を示す。1182℃での保持が終わり、ノンドープのLN単結晶1の温度上昇に伴い、ノンドープのLN単結晶1に流れる電流値11も大きくなった。しかし、実施例1のようにLN単結晶の温度が1202℃になっても電流値11が下がる現象は見られなかった。そこで、温度プログラム8を設定し直し、温度プログラム12のように再度50℃/hrで1207℃まで昇温した。ノンドープのLN単結晶の温度が1203℃に達したとき電流値が下がり、1204℃で再度電流値が大きくなり、1207℃になってからはほぼ一定の電流値を示した。
【0030】
単分域化処理の終わったLN単結晶にクラックはなかった。このLN単結晶をZ面でカット・研磨し、エッチングを行って分極状態を調べたところ、反対向きの分極はなく、良好に単分域化されていた。また、このLN結晶のキュリー点と結晶の組成を調べたところ、キュリー点は1203℃であり、モル比Li2O/(Li2O+Nb2O5)は0.498であった。
【0031】
上述した実施例では温度T2の保持時間を3時間、電界印加開始を温度T2での保持が始まってから1時間後、印加電界の大きさを1V/cmとしたが、本発明はこれらに縛られるものではない。温度T2の保持時間は1〜5時間であればよい。ただし、電界を印加してから単結晶中を流れる電流値が安定するには1時間程度の時間が必要であり、また温度T2は従来のCLN単結晶の単分域化処理温度よりは高温であるため、温度T2で長時間保持するとクラックの発生につながりやすい。したがって、温度T2の保持時間は2〜3時間程度が適当である。
【0032】
印加電圧は0.7V/cm以上であれば単分域化は可能であったが、2.5V/cmよりも印加電圧が大きくなるとクラックの発生率が高かった。したがって印加電圧の大きさは0.7〜2.5V/cmが適当である。
【0033】
上述の実施例では電界印加は温度T2の保持開始から1時間後に急峻に1V/cmの電界を印加したが、電界印加開始は温度T2の保持開始と同時でも良いし、また所定の印加電界まで1時間程度かけて緩やかに変化させても良い。また、昇温を開始するときから最終的に印加する電界の大きさの数%〜20%程度の電界を印加しておいても良い。これらにより、単分域化処理でクラックが発生することをさらに防ぐことができる。
【0034】
また、上述の実施例では昇温速度を50℃/hr、降温速度を1000℃までは30℃/hr、その後は50℃/hrとしたが、これら昇降温の速度はLN単結晶の直径や長さによって適宜最適な値を検討して、単分域化を行う必要があることはいうまでもない。
【0035】
(比較例)
ノンドープのLN単結晶を用いて図1のようにセットし、図2に示した温度プログラム8でT1を1202℃、T2を1182℃として50℃/hrで1190℃まで昇温した。1182℃の保持に入ってから1時間後に1V/cmの電界を印加した。1182℃で3時間保持した後、印加した電界の大きさは維持したまま50℃/hrで1202℃まで昇温した。
【0036】
には上記単分域化処理を行ったときのLN単結晶1に流れた電流値11および単分域化処理炉の温度プログラム8と結晶近傍にセットした熱電対7により測定した温度を示す。1182℃での保持が終わり、LN単結晶1の温度上昇に伴い、LN単結晶1に流れる電流値11も大きくなった。実施例1のようにLN単結晶1の温度10が1202℃になっても電流値11が下がる現象は見られなかったが、そのまま1210℃で1時間保持した後、電界印加の状態を維持したまま1000℃までは30℃/hr、その後は50℃/hrで降温した。
【0037】
このLN単結晶をZ面でカット・研磨し、エッチングを行って分極状態を調べたところ、アズグロウンのLN単結晶と同様に、LN単結晶の周辺部や中心付近の微少領域に反対向きの分極が存在し、単分域化できなかった。このLN結晶のキュリー点と結晶の組成を調べたところ、キュリー点は1212℃であり、モル比Li2O/(Li2O+Nb2O5)は0.498であった。
【0038】
この単分域化できなかったLN単結晶をT1を1207℃、T2を1187℃として再度単分域化処理を行った。しかし、このLN単結晶はカットしたときのエッジ部分からクラックが発生しており、直胴部にもそのクラックが進行していたため、このLN結晶からはウェハーを得ることができなかった。
【0039】
【発明の効果】
以上述べたように、本発明によれば、キュリー点よりもわずかに高い温度で確実に単分域化を行うことができる。そのため、モル比Li2O/(Li2O+Nb2O5)が0.495〜0.500のLiNbO3単結晶やこれにMgOやZnOなどがドープされたもののようにキュリー点と融点が近い単結晶でも、クラックの発生や融解を起こすことなく単分域化が行える。
【図面の簡単な説明】
【図1】本発明による単分域化のセット方法を示した図である。
【図2】本発明による単分域化の温度プログラムと電界印加プログラムを示した図である。
【図3】本発明による単分域化の一実施例における単分域化処理中の単結晶の温度と単結晶中を流れる電流値を示した図である。
【図4】本発明による単分域化の一実施例における単分域化処理中の単結晶の温度と単結晶中を流れる電流値を示した図である。
【図5】本発明による単分域化の一実施例における単分域化処理中の単結晶の温度と単結晶中を流れる電流値を示した図である。
【図6】本発明の比較例における単分域化処理中の単結晶の温度と単結晶中を流れる電流値を示した図である。
【図7】 LiNbO3単結晶の分域の状態を示した図である。
【図8】従来の単分域化のセット方法を示した図である。
【図9】従来の単分域化の温度プログラムと電界印加プログラムを示した図である。
【図10】 LiNbO3のモル比Li2O/(Li2O+Nb2O5)とキュリー点および融点との関係を示した図である。
【符号の説明】
1 LiNbO3単結晶、
2 LiTaO3粉末、
3 耐火物、
4,5 白金電極、
6 電流計、
7 熱電対、
8 温度プログラム、
9 電界印加プログラム、
10 LiNbO3単結晶の温度、
11 LiNbO3単結晶中を流れる電流値、
12 設定変更後の温度プログラム、
31 コングルエント組成のLiNbO3単結晶、
32 LNの粉末、
33 耐火物、
34,35 白金電極。
[0001]
BACKGROUND OF THE INVENTION
LiNbO invention, a method of single-domain of aligning the orientation of the spontaneous polarization of the ferroelectric single crystal in one direction, in particular the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5) is from 0.495 to 0.500 The present invention relates to a single domain method of three single crystals.
[0002]
[Prior art]
LiNbO 3 single crystals have a large electro-optic effect and nonlinear optical effect, and research and development of optical modulators and optical wavelength converters are active, and some of them have been commercialized. Conventionally, a single crystal of LiNbO 3 (hereinafter abbreviated as LN) is grown by the Czochralski method, and the crystal composition matches the melt with a molar ratio of Li 2 O / (Li 2 O + Nb 2 O 5 ) = 0.485. LiNbO 3 (hereinafter abbreviated as CLN) single crystals having a congruent melt composition, so-called congruent composition, have been grown. The grown asgrown CLN single crystal is in a multi-domain state. If the CLN single crystal is in a range, there will be problems such as cracking during wafer processing, and the device characteristics will be affected, for example, by changing the half-wave voltage when manufacturing devices such as optical modulators. Therefore, the grown CLN single crystal needs to be single-domained.
[0003]
In recent years, for example, as disclosed in Japanese Patent No. 3049308, LiNbO 3 (hereinafter abbreviated as SLN) single crystal near the stoichiometric composition (stoichiometry composition) of Li 2 O / (Li 2 O + Nb 2 O 5 ) = 0.50 It is grown using the double crucible method. In Japanese Patent No. 3049308, it is said that it is single-domained with as-grown. However, as shown in FIG. 7 (a), there is actually polarization in the opposite direction in the vicinity of the single crystal surface or in a very small region inside. Further, when grown in the X-axis direction or the Y-axis direction, as shown in FIG. 7B, the polarization direction is divided into two regions. Therefore, it is necessary to make a single domain even in a SLN single crystal.
[0004]
There is an electric field cooling method as a single domain method. FIG. 8 shows a set diagram of a conventional single domain single crystal. As an example, here is shown the single domain of a CLN single crystal grown in the Z-axis direction. The CLN single crystal 31 is embedded in LN powder 32 (LiNbO 3 powder) placed in a refractory 33. Platinum electrodes 34 and 35 are set on the top and bottom of the LN powder 32. The refractory 33 on which these single crystals and platinum electrodes are set is set in a single domain treatment furnace. The platinum electrode 34 disposed on the top side of the single crystal is connected to a DC power source so that the platinum electrode 35 disposed on the bottom side is a negative electrode and the platinum electrode 35 disposed on the bottom side is a positive electrode.
[0005]
FIG. 9 shows a temperature program 36 and an electric field application program 37 of the single domain processing furnace. The temperature program corresponds to a graph of temperature and time controlled by the single domain processing, and the electric field application program corresponds to a graph of electric field magnitude and time controlled by the single domain processing. The CLN single crystal 31 is heated to a single domain treatment temperature T1 of 1170 to 1200 ° C. at 50 to 100 ° C./hr and held for 2 to 10 hours. 30 minutes to 1 hour after the start of holding at T1, an electric field of 1 to 3 V / cm is applied, and the applied electric field is 25 to 50 ° C / hr up to 1000 ° C, and then 50 to 100 ° C / hr. Single domains are achieved by lowering the temperature to room temperature. Usually, when performing single domain formation, the electric field is applied by raising the temperature to 20 ° C. to 50 ° C. higher than the Curie point of the single crystal. The unit ° C / hr represents the temperature change per hour.
[0006]
[Problems to be solved by the invention]
FIG. 10 shows the relationship between the Curie point and the melting point for the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ) of the LN crystal. The closer the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ) approaches 0.50, the higher the Curie point, but the lower the melting point. When the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ) is larger than 0.495, the temperature difference between the melting point and the Curie point is small, so when held at a temperature several tens of degrees higher as in the conventional method described above Crystals are dissolved. Furthermore, crystals obtained by doping these crystals with MgO, ZnO, or the like have a Curie point higher by several degrees C. to several tens of degrees C. than non-doped crystals.
[0007]
Further, in the conventional method to hold several hours at a single poling treatment temperature, but the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5) is at a temperature close to the melting point in the large LiNbO 3 single crystal than 0.495 Must be held for a long time. As a result, cracks are likely to occur in the crystal, resulting in poor yield.
[0008]
In addition, in the single domain treatment at a temperature lower than the Curie point, since the spontaneous polarization remains, it is necessary to apply a larger electric field. However, when a large electric field is applied, a large current flows through the single crystal, so that cracks occur and the yield deteriorates.
[0009]
Considering these, it is necessary to perform a single domain treatment at a temperature slightly higher than the Curie point, for example, 2 to 10 ° C. higher than the Curie point.
[0010]
However, since there is a temperature distribution in the furnace that performs the single domain treatment, and the temperature of the crystal changes depending on the size of the crystal and how it is set, set the set temperature to about 2 ° C higher than the Curie point. However, the crystal temperature is not necessarily higher than the Curie point. In addition, the Curie point of LiNbO 3 single crystal varies greatly depending on the slight difference in molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ), so it is set by the slight compositional difference between lots of single crystals. The Curie point may be higher than the temperature. Therefore, the single domain processing may not be completely completed.
[0011]
In the case of LiNbO 3 single crystal, a process such as cutting and polishing the crystal and etching the polished product is necessary to determine whether or not the single domain has been completely formed. It takes time to determine the quality of the digitization process. In addition, when the single domain treatment is incomplete, the single domain treatment must be performed again, and the temperature of the single crystal is raised to near the melting point, which may cause cracks. There is sex.
[0012]
The present invention has been made in view of the above circumstances, for example, a LiNbO 3 single crystal having a molar ratio Li 2 O / (Li 2 O + Nb 2 O 3 ) of 0.495 or more, such as a Curie point and a melting point. It is an object of the present invention to provide a method for surely performing the single domain without causing a decrease in yield such as cracks when the single crystal having a short distance is made into a single domain.
[0013]
[Means for solving problems]
Single poling method according to the invention, retains the ferroelectric single crystal at a lower temperature T2 than the Curie point of the ferroelectric single crystal an electric field is applied, applying the electric field to the ferroelectric single crystal raising the temperature at a state to the single-domain treatment temperature T1 is a temperature higher than the Curie point, after holding, then cooled to room temperature while applying an electric field to the ferroelectric single crystal, the temperature T2 is the a temperature lower 10 ~ 30 ° C. than the single poling treatment temperature T1, the holding time of the temperature T2 is 1 to 3 hours.
[0015]
Also, by monitoring the value of the current flowing in the single crystal when an electric field is applied, it is confirmed that the single domain treatment temperature T1 is higher than the Curie point of the ferroelectric single crystal. be able to. More specifically, in the single domain method according to the present invention, when an electric field is applied to the ferroelectric single crystal and the temperature is raised from the temperature T2 to the single domain processing temperature T1, the ferroelectric single unit is obtained. The temperature at which the value of the current flowing through the crystal decreases is taken as the Curie point. When the temperature is raised to the single-domain treatment temperature T1 after the holding at the temperature T2, the magnitude of the electric field does not change, so that the value of the current flowing through the single crystal increases as the temperature rises. However, when the temperature of the single crystal passes through the Curie point, the value of the current flowing through the single crystal becomes small despite the constant electric field. As the temperature rises further, the value of the current flowing through the single crystal increases again, and the current value hardly changes when held at the temperature T1.
[0016]
In the single-domaining method according to the present invention, the temperature T2 is preferably 10 ° C. to 30 ° C. lower than the single-domain processing temperature T1. The temperature T2 is set to a temperature that is 10 ° C to 30 ° C lower than the single-domain treatment temperature T1, because when the temperature is increased from T2 to T1, the electric field is not changed, even if the electric field is not changed. This is because the value of the current flowing through the film is only increased by 15% or less, and it is possible to prevent a large current from flowing through the single crystal and generating cracks in the crystal. In the claims and the detailed description of the invention, “10 to 30 ° C.” is expressed as synonymous with “within a range of 10 ° C. to 30 ° C.”. “15 minutes to 1 hour” is also synonymous with “range of 15 minutes or more and within 1 hour”.
[0017]
When the single-domain treatment temperature T1 is lower than the Curie point due to the temperature distribution in the furnace or a slight compositional deviation of the single crystal, the current value does not become small as described above. In that case, the single-domain processing temperature T1 is reset to a temperature T1 ′ that is higher by several degrees C., and the temperature is increased to T1 ′. As a result, a phenomenon that the current value becomes small is confirmed, and the single domain can be surely made.
[0018]
The single domain treatment temperature T1 at this time is desirably 2 ° C. to 10 ° C. higher than the Curie point of the ferroelectric single crystal. As a result, the temperature of the ferroelectric single crystal is unnecessarily excessively raised and becomes higher than the melting point, thereby preventing the single crystal from melting.
[0019]
Further, the retention time at the single-domain treatment temperature T1 is preferably 15 minutes to 1 hour. Even if the temperature in the furnace reaches T1, there is a time difference of 5 to 15 minutes until the temperature of the single crystal reaches T1, and if the holding time exceeds 1 hour, there is a high probability that the single crystal will crack. Become. By setting the holding time at the single-domain treatment temperature T1 to 15 minutes to 1 hour, the temperature of the single crystal itself can be held at T1, and the single-domain can be surely made into a single crystal. A decrease in yield due to the occurrence of cracks can be reduced.
[0020]
The above-mentioned single domain method is particularly effective when the ferroelectric single crystal is a LiNbO 3 single crystal and the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ) is 0.495 to 0.500. It is. These crystals have a difference between the Curie point and the melting point of 50 ° C. or less. In addition, a single crystal in which at least one of MgO, ZnO, In 2 O 3 and Sc 2 O 3 is doped to the above LiNbO 3 single crystal has a higher Curie point than a non-doped one. The difference between the point and the melting point becomes even smaller. In the above-described method, since the single domain treatment can be performed at a temperature slightly higher than the Curie point of the single crystal, the single domain treatment is not failed, and the treatment can be performed at a temperature lower than the melting point. Therefore, the yield reduction due to the occurrence of cracks can be reduced.
[0021]
DETAILED DESCRIPTION OF THE INVENTION
Examples of the present invention will be described below. The present invention is not limited to these examples.
(Example 1)
Hereinafter, the present invention will be described in detail based on embodiments shown in the drawings. 1 and 2 show a single domain setting method, a temperature program, and an electric field application program according to an embodiment of the present invention. In Figure 1, the ferroelectric single crystal 1 is used LiNbO 3 single crystal grown in the Z-axis direction. As shown in FIG. 1, the LN single crystal 1 was embedded in a LiTaO 3 powder 2 put in a refractory 3. Platinum electrodes 4 and 5 were set on the top and bottom of the LiTaO 3 powder 2. Further, a thermocouple 7 was set immediately above the platinum electrode 4. This is to measure the temperature of the LN single crystal 1 during the single domain treatment. The refractory 3 on which these single crystals and platinum electrodes are set is set in a single domain treatment furnace. The platinum electrode 4 disposed on the top side of the single crystal is connected to a DC power source so that the platinum electrode 5 disposed on the bottom side is a negative electrode and the platinum electrode 5 disposed on the bottom side is a positive electrode. Further, the ammeter 6 monitors the value of the current flowing through the LN single crystal 1 during the single domain processing.
[0022]
The LN single crystal set in the single domain processing furnace was heated to 1182 ° C. at 50 ° C./hr, with T1 set to 1202 ° C. and T2 set to 1182 ° C. in the temperature program 8 shown in FIG. In addition, as shown in the electric field application program of FIG. 2, an electric field of 1 V / cm was applied one hour after entering 1182 ° C. After holding at 1182 ° C for 3 hours, the temperature of the applied electric field was maintained at 120 ° C at 50 ° C / hr while maintaining the magnitude of the applied electric field. After holding at 1202 ° C for 1 hour, 1000 ° C while maintaining the applied electric field The temperature was lowered at 30 ° C./hr until 50 ° C./hr.
[0023]
FIG. 3 shows the current value flowing through the LN single crystal 1 when the above single domain treatment is performed, the temperature program 8 of the single domain treatment furnace, and the temperature 10 measured by the thermocouple 7 set in the vicinity of the crystal. Show. When the holding at 1182 ° C. ends in the temperature program 8 and the temperature rise to 1202 ° C. starts, the temperature 10 of the LN single crystal 1 rises slightly later. As the temperature of the LN single crystal 1 rises, the current value 11 flowing in the LN single crystal 1 also increases, but when the temperature of the LN single crystal 1 reaches 1199 ° C, the current value 11 decreases and the current value at 1200 ° C Became larger again, and after 1202 ° C, the current value was almost constant.
[0024]
There was no crack in the LN single crystal after the single domain treatment. When this LN single crystal was cut and polished on the Z plane and etched to examine the polarization state, there was no polarization in the opposite direction and it was well divided into single domains. Further, when the Curie point and crystal composition of this LN crystal were examined, the Curie point was 1199 ° C. and the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ) was 0.497.
[0025]
(Example 2)
Similarly, another embodiment will be described with reference to FIGS. As the ferroelectric single crystal, a LiNbO 3 single crystal (hereinafter abbreviated as Mg-LN) doped with 2 mol% of MgO was used. The orientation of the grown crystal is the Z-axis direction. Similarly to Example 1, Mg-LN single crystal 1 was set as shown in FIG. In the temperature program 8 of FIG. 2, T1 was set to 1223 ° C., T2 was set to 1203 ° C., the temperature was raised to 1203 ° C. at 50 ° C./hr, and an electric field of 1 V / cm was applied 1 hour after the start of holding at 1203 ° C. After holding at 1203 ° C. for 3 hours, the temperature of the applied electric field was maintained at 15 ° C. at 50 ° C./hr while maintaining the magnitude of the applied electric field. After holding at 1223 ° C. for 1 hour, 1000 ° C. with the electric field applied maintained. The temperature was lowered at 30 ° C./hr until 50 ° C./hr. In the description of the embodiments, similar configurations are represented by the same reference numerals, but do not mean the same.
[0026]
Fig. 4 shows the current value that flowed into the Mg-LN single crystal 1 when the above single domain treatment was performed, the temperature program of the single domain treatment furnace, and the temperature measured by the thermocouple 7 set in the vicinity of the crystal. Show. When the holding at 1203 ° C. is finished and the temperature rise to 1223 ° C. is started, the temperature 10 of the Mg-LN single crystal 1 rises with a slight delay. As the temperature of the Mg-LN single crystal 1 rises, the current value 11 flowing through the Mg-LN single crystal 1 also increases, but the current value decreases when the temperature of the Mg-LN single crystal 1 reaches 1221 ° C. The current value increased again at 1222 ° C, and after reaching 1223 ° C, the current value was almost constant.
[0027]
The single-domain Mg-LN single crystal had a small crack in the shoulder, but no crack in the straight body. When this Mg-LN single crystal was cut and polished on the Z plane and etched to examine the polarization state, there was no polarization in the opposite direction, and it was well divided into single domains. Further, when the Curie point and melting point of the Mg-LN crystal were examined, the Curie point was 1221 ° C. and the melting point was 1230 ° C.
[0028]
(Example 3)
Another embodiment will be described with reference to FIGS. 1, 2, and 5. A non-doped LN single crystal was set as shown in FIG. 1, and T1 was set to 1202 ° C. and T2 was set to 1182 ° C. with the temperature program 8 shown in FIG. 2, and the temperature was raised to 1182 ° C. at 50 ° C./hr. An electric field of 1 V / cm was applied 1 hour after entering 1182 ° C. After maintaining at 1182 ° C. for 3 hours, the temperature was increased to 1202 ° C. at 50 ° C./hr while maintaining the magnitude of the applied electric field.
[0029]
FIG. 5 shows the current value flowing through the LN single crystal 1 when the above-mentioned single domain treatment is performed, the temperature program of the single domain treatment furnace, and the temperature measured by the thermocouple 7 set in the vicinity of the crystal. As the temperature of the non-doped LN single crystal 1 was increased, the current value 11 flowing through the non-doped LN single crystal 1 increased. However, even when the temperature of the LN single crystal reached 1202 ° C. as in Example 1, the phenomenon that the current value 11 decreased was not observed. Therefore, the temperature program 8 was reset and the temperature was raised again to 1207 ° C. at 50 ° C./hr as in the temperature program 12. When the temperature of the non-doped LN single crystal reached 1203 ° C, the current value decreased, and the current value increased again at 1204 ° C. After reaching 1207 ° C, the current value was almost constant.
[0030]
There was no crack in the LN single crystal after the single domain treatment. When this LN single crystal was cut and polished on the Z plane and etched to examine the polarization state, there was no polarization in the opposite direction and it was well divided into single domains. Further, when the Curie point and crystal composition of this LN crystal were examined, the Curie point was 1203 ° C. and the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ) was 0.498.
[0031]
In the above-described embodiments, the holding time of the temperature T2 is 3 hours, and the electric field application start is 1 hour after the start of the holding at the temperature T2, and the magnitude of the applied electric field is 1 V / cm. It is not something that can be done. The holding time of the temperature T2 may be 1 to 5 hours. However, it takes about 1 hour to stabilize the value of the current flowing in the single crystal after the electric field is applied, and the temperature T2 is higher than the single domain treatment temperature of the conventional CLN single crystal. For this reason, if it is held at temperature T2 for a long time, cracks are likely to occur. Therefore, the holding time of the temperature T2 is suitably about 2 to 3 hours.
[0032]
If the applied voltage was 0.7V / cm or more, it was possible to make a single domain, but the cracking rate was higher when the applied voltage was higher than 2.5V / cm. Accordingly, the magnitude of the applied voltage is suitably 0.7 to 2.5 V / cm.
[0033]
In the above-described embodiment, the electric field application steeply applied a 1 V / cm electric field one hour after the start of holding the temperature T2, but the electric field application may be started simultaneously with the start of holding the temperature T2 or until a predetermined applied electric field. It may be changed gradually over an hour. In addition, an electric field of about several to 20% of the magnitude of the electric field to be finally applied from the start of the temperature increase may be applied. By these, it can further prevent that a crack generate | occur | produces by a single domain process.
[0034]
Further, in the above-described examples, the rate of temperature increase was 50 ° C./hr, the rate of temperature decrease was 30 ° C./hr up to 1000 ° C., and then 50 ° C./hr. Needless to say, it is necessary to consider an optimum value according to the length and to perform single domain.
[0035]
(Comparative example)
A non-doped LN single crystal was used as shown in FIG. 1, and T1 was set to 1202 ° C. and T2 was set to 1182 ° C. with the temperature program 8 shown in FIG. 2, and the temperature was raised to 1190 ° C. at 50 ° C./hr. An electric field of 1 V / cm was applied 1 hour after entering 1182 ° C. After maintaining at 1182 ° C. for 3 hours, the temperature was increased to 1202 ° C. at 50 ° C./hr while maintaining the magnitude of the applied electric field.
[0036]
FIG. 6 shows the current value 11 flowing through the LN single crystal 1 when the above-mentioned single domain treatment is performed, the temperature program 8 of the single domain treatment furnace, and the temperature measured by the thermocouple 7 set in the vicinity of the crystal. Show. As the temperature of the LN single crystal 1 increased, the current value 11 flowing through the LN single crystal 1 increased. Even though the temperature 10 of the LN single crystal 1 reached 1202 ° C. as in Example 1, the current value 11 did not decrease, but the state of electric field application was maintained after holding at 1210 ° C. for 1 hour. The temperature was lowered to 30 ° C / hr up to 1000 ° C, and then lowered to 50 ° C / hr.
[0037]
When this LN single crystal was cut and polished on the Z-plane and etched to investigate the polarization state, polarization was reversed in the microscopic region near the center and near the center of the LN single crystal, similar to the as-grown LN single crystal. Existed and could not be made into a single domain. When the Curie point and crystal composition of this LN crystal were examined, the Curie point was 1212 ° C. and the molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ) was 0.498.
[0038]
The LN single crystal that could not be single-domained was subjected to single-domaining again at T1 of 1207 ° C and T2 of 1187 ° C. However, since this LN single crystal had cracks generated from the edge portion when cut, and the cracks also proceeded to the straight body portion, a wafer could not be obtained from this LN crystal.
[0039]
【The invention's effect】
As described above, according to the present invention, it is possible to reliably perform the single domain at a temperature slightly higher than the Curie point. Therefore, even a single crystal with a melting point close to the Curie point, such as a LiNbO 3 single crystal having a molar ratio Li 2 O / (Li 2 O + Nb 2 O 5 ) of 0.495 to 0.500 or MgO, ZnO, or the like is doped. It is possible to make a single domain without causing cracks or melting.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating a single domain setting method according to the present invention.
FIG. 2 is a diagram showing a single domain temperature program and electric field application program according to the present invention.
FIG. 3 is a diagram showing a temperature of a single crystal during a single domain treatment and a value of a current flowing through the single crystal in an example of single domain production according to the present invention.
FIG. 4 is a diagram showing a temperature of a single crystal during a single domain treatment and a value of a current flowing through the single crystal in an example of the single domain according to the present invention.
FIG. 5 is a diagram showing a temperature of a single crystal during a single domain treatment and a value of a current flowing through the single crystal in an example of single domain production according to the present invention.
FIG. 6 is a diagram showing the temperature of a single crystal during single domain treatment and the value of current flowing through the single crystal in a comparative example of the present invention.
FIG. 7 is a diagram showing a domain state of a LiNbO 3 single crystal.
FIG. 8 is a diagram illustrating a conventional single domain setting method.
FIG. 9 is a diagram showing a conventional single domain temperature program and electric field application program.
10 is a diagram showing the relation between the molar ratio Li2O / (Li2O + Nb2O5) and the Curie point and the melting point of the LiNbO 3.
[Explanation of symbols]
1 LiNbO 3 single crystal,
2 LiTaO 3 powder,
3 refractories,
4,5 platinum electrode,
6 Ammeter,
7 thermocouple,
8 Temperature program,
9 Electric field application program,
10 LiNbO 3 single crystal temperature,
11 Current value flowing in a LiNbO 3 single crystal,
12 Temperature program after setting change,
31 LiNbO 3 single crystal with congruent composition,
32 LN powder,
33 refractories,
34, 35 Platinum electrode.

Claims (8)

強誘電体単結晶のキュリー点よりも低い温度T2で前記強誘電体単結晶を保持して電界を印加し、
前記強誘電体単結晶に前記電界を印加した状態で前記キュリー点よりも高い温度である単分域化処理温度T1まで昇温、保持した後、
前記電界を印加した状態で室温まで冷却し、
前記温度 T2 は前記単分域化処理温度 T1 よりも 10 30 ℃低い温度であり、前記温度 T2 の保持時間は 1 3 時間であることを特徴とする強誘電体単結晶
の単分域化方法。
Holding the ferroelectric single crystal at a temperature T2 lower than the Curie point of the ferroelectric single crystal and applying an electric field;
After raising the temperature to a single domain treatment temperature T1, which is a temperature higher than the Curie point with the electric field applied to the ferroelectric single crystal, and holding,
Cool to room temperature with the electric field applied ,
The temperature T2 is a temperature lower by 10 to 30 ° C. than the single domain treatment temperature T1 , and the holding time of the temperature T2 is 1 to 3 hours. Method.
前記強誘電体単結晶に電界を印加し、前記温度 T2 から前記単分域化処理温度 T1 まで昇温するときに前記強誘電体単結晶に流れる電流値が減少する温度をもって前記キュリー点とすることを特徴とする請求項1に記載の強誘電体単結晶の単分域化方法。 The Curie point is defined as a temperature at which a current value flowing through the ferroelectric single crystal decreases when an electric field is applied to the ferroelectric single crystal and the temperature is raised from the temperature T2 to the single-domain processing temperature T1. The method of claim 1, wherein the ferroelectric single crystal is single-domained. 前記温度T2は前記単分域化処理温度T1よりも10℃〜30℃低い温度であることを特徴とする請求項1または2に記載の強誘電体単結晶の単分域化方法。  3. The method of claim 1, wherein the temperature T <b> 2 is lower by 10 ° C. to 30 ° C. than the single domain treatment temperature T <b> 1. 前記単分域化処理温度T1は、前記強誘電体単結晶のキュリー点よりも2℃〜10℃高い温度であることを特徴とする請求項1から3のいずれかに記載の強誘電体単結晶の単分域化方法。  4. The ferroelectric single layer according to claim 1, wherein the single domain treatment temperature T 1 is 2 ° C. to 10 ° C. higher than the Curie point of the ferroelectric single crystal. 5. A single domain method for crystals. 前記単分域化処理温度T1での保持時間が15分〜1時間であることを特徴とする請求項1から4のいずれかに記載の強誘電体単結晶の単分域化方法。  5. The method of single-domaining a ferroelectric single crystal according to claim 1, wherein the holding time at the single-domain processing temperature T1 is 15 minutes to 1 hour. 前記強誘電体単結晶がLiNbO3単結晶であることを特徴とする請求項1から5のいずれかに記載の強誘電体単結晶の単分域化方法。6. The method of claim 1, wherein the ferroelectric single crystal is a LiNbO 3 single crystal. 前記LiNbO3単結晶のモル比Li2O/(Li2O+Nb2O5)が0.495〜0.500であることを特徴とする請求項6に記載の強誘電体単結晶の単分域化方法。The method of claim 6, wherein the molar ratio of the LiNbO 3 single crystal Li 2 O / (Li 2 O + Nb 2 O 5 ) is 0.495 to 0.500. . 前記LiNbO3単結晶にMgO、ZnO、In2O3、Sc2O3のうち少なくとも1種類がドープされていることを特徴とする請求項6または7に記載の強誘電体単結晶の単分域化方法。The ferroelectric single crystal according to claim 6 or 7, wherein the LiNbO 3 single crystal is doped with at least one of MgO, ZnO, In 2 O 3 and Sc 2 O 3. Localization method.
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