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JP4148487B2 - Quartz glass heat insulating member and manufacturing method thereof - Google Patents
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JP4148487B2 - Quartz glass heat insulating member and manufacturing method thereof - Google Patents

Quartz glass heat insulating member and manufacturing method thereof Download PDF

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Publication number
JP4148487B2
JP4148487B2 JP00568999A JP568999A JP4148487B2 JP 4148487 B2 JP4148487 B2 JP 4148487B2 JP 00568999 A JP00568999 A JP 00568999A JP 568999 A JP568999 A JP 568999A JP 4148487 B2 JP4148487 B2 JP 4148487B2
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quartz glass
heat insulating
insulating member
silica
glass heat
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JP2000203855A (en
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優 新保
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Coorstek KK
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Covalent Materials Corp
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00Re-forming shaped glass
    • C03B23/20Uniting glass pieces by fusing without substantial reshaping
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/06Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/06Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、主に半導体の熱処理装置に用いられる石英ガラス断熱部材及びその製造方法に関し、より詳細には熱処理炉の炉芯管の端部を閉鎖する蓋体、ウェーハボートの前後に取り付けられる熱遮蔽体、縦型熱処理炉の炉芯管内に装入されるウェーハボート載置台等として用いられる石英ガラス断熱部材及びその製造方法に関する。
【0002】
【従来の技術】
従来、この種の石英ガラス断熱部材としては、石英ガラスからなる中空の外殻内に石英ガラスウールを充填して真空封入したもの、あるいは減圧独立気泡からなる非晶質の石英ガラス発泡体の表面を石英ガラス層で覆ったもの(特開平6−252074号公報参照)が知られている。
前者の石英ガラス断熱部材は、石英ガラスからなる中空の外殻内にその開口部から石英ガラスウールを充填し、外殻内を排気した後、開口部を封止して製造されるものであり、後者の石英ガラス断熱部材は、所要形状のカーボンるつぼ内に石英ガラス粉を充填し、減圧下で加熱処理して石英ガラス粉を溶融発泡させて石英ガラス発泡体を得、これを予め作製しておいた石英ガラスからなる外殻に封入したり、あるいは発泡体の表面を酸水素ガスバーナーにより加熱溶融して製造されるものである。
【0003】
【発明が解決しようとする課題】
しかしながら、前者の石英ガラス断熱部材では、石英ガラスウールは、耐熱性が300〜400℃と比較的低く、このように比較的低い温度に長時間さらされると、強度が低下し、使用時や持ち運びの際の僅かな衝撃によってウールを構成するファイバーが次第に破損して粉末化し、断熱性能が著しく低下する不具合がある。
又、1000℃以上の温度では、ファイバー同士の焼結が始まって体積が収縮するため、赤外線放射(熱線)の散乱能力が低下し、断熱性能が著しく低下する不具合がある。
一方、その製造に際し、石英ガラスウールを外殻内にむらなく均等に充填するには非常な困難を伴う上、ウールは比表面積が極めて大きいために吸着ガスが多く、外殻内を必要な真空度にするのに長時間を要すると共に、減圧時に、ウールが吸引口に吸い寄せられて外殻内に大きな隙間を生ずる不具合がある。
【0004】
又、後者の石英ガラス断熱部材では、石英ガラスの軟化温度(1200℃)付近まで加熱された独立気泡内の残留ガスの圧力は、室温での値の5倍以上になるが、一度製造された独立気泡内のガスは、後から除去できないため、残留ガスの圧力が1/5気圧以上であったり、吸着ガスの加熱時の離脱等が原因で、加熱時の圧力が1気圧以上となると、独立気泡の膨れによって寸法の変化や装置の破損等を引き起こす不具合がある。
一方、その製造に際し、石英ガラス発泡体を外殻に封入する方法の場合、外殻の形状に合わせて発泡体を加工しなければならない。又、発泡体の表面を加熱溶融する場合、加熱の過程で独立気泡が膨張、破裂するため、十分な厚さの緻密層を形成させることが困難であると共に、滑らかな表面形状が得難く、気密性、寸法精度も不十分となる。
そこで、本発明は、長期間に亘って均質で高い断熱性を呈する石英ガラス断熱部材、及び製造を容易になし得る石英ガラス断熱部材の製造方法を提供することを目的とする。
【0005】
【課題を解決するための手段】
前記課題を解決するため、本発明の第1の石英ガラス断熱部材は、石英ガラスからなる中空の外殻内に粒状のシリカ多孔体を充填して真空封入したことを特徴とする。
又、第2の石英ガラス断熱部材は、第1のものにおいて、前記粒状のシリカ多孔体を互いに融着し、又は粒状のシリカ多孔体を互いに融着すると共に外殻に融着したことを特徴とする。
【0006】
一方、本発明の第1の石英ガラス断熱部材の製造方法は、石英ガラスからなる中空の外殻内にその開口部から粒状のシリカ多孔体を充填し、外殻内を真空排気した後、開口部を封止することを特徴とする。
又、第2の石英ガラス断熱部材の製造方法は、第1の方法において、前記外殻内の真空排気前に、真空排気と並行して又は真空排気後に1300〜1450℃の温度で加熱することを特徴とする。
【0007】
前記粒状のシリカ多孔体は、粒径0.5〜5mmであることが好ましい。
前記粒状のシリカ多孔体は、気孔率15〜60%であることが好ましい。
前記粒状のシリカ多孔体は、シリカ粒子を焼結してなるものであることが好ましい。
又、前記粒状のシリカ多孔体は、シリカ粉体に塩基性の第四アンモニウム化合物の水溶液を添加して造粒し、造粒体を1300〜1450℃の温度で焼成してなるものであることが好ましい。
前記塩基性の第四アンモニウム化合物の水溶液は、0.01〜5%の濃度で、シリカ粉体に対して外率で5〜25wt%添加されることが好ましい。
一方、上記水溶液は、シリカ分を含んでいることが好ましい。
前記シリカ分は、水溶液の0.1〜5wt%であることが望ましい。
【0008】
外殻内の真空度は5Torr以下が望ましい。5Torrを超えると、対流伝熱の除去効果が低減する。
【0009】
外殻内の真空排気前に、真空排気と並行して又は真空排気後に行われる加熱の温度が、1300℃未満であると、粒状のシリカ多孔体同士の融着、又は粒状のシリカ多孔体同士の融着及び粒状のシリカ多孔体と外殻の融着が行われず、1450℃を超えると、粒状のシリカ多孔体及び/又は外殻の変形を生ずる。望ましい加熱温度は、1350〜1450℃である。加熱は、真空排気と並行して行うのが望ましい。
【0010】
粒状のシリカ多孔体の粒径を0.5〜5mmとすることによって、流動性が良好となり、外殻内に隙間なく均一に充填することができ、断熱性が均一となる。しかも、より短時間で真空排気ができる。
粒状のシリカ多孔体が、粒径0.5mm未満であると、製造の際の真空吸引によって開口部から排出される一方、粒径5mmを超えると、粒子間の隙間が大きくなり、断熱性が低下する虞れがある。粒径1〜5mmが望ましく、より望ましくは3〜5mmである。
【0011】
粒状のシリカ多孔体は、気孔率15〜60%が望ましい。
気孔率が、15%未満であると、シリカ多孔体の断熱作用が小さくなるため、断熱部材としての断熱性が低下すると共に、製造に際して真空排気が困難となる。一方、60%を超えると、シリカ多孔体の機械的強度が低下するため、破損して粉末になり、断熱性低下の原因となると共に、製造に際して発塵等の不具合を生じる。より望ましい気孔率は、30〜50%である。
【0012】
粒状のシリカ多孔体は、平均気孔径0.5〜30μmが望ましい。
平均気孔径が、0.5μm未満であると、シリカ多孔体の断熱作用が小さくなるため、断熱部材としての断熱性が低下すると共に、製造に際して真空排気が困難となる。一方、30μmを超えると、シリカ多孔体の機械的強度が低下するため、破損して粉末になり、断熱性低下の原因となると共に、製造に際して発塵等の不具合を生じる。より望ましくは、平均気孔径1.5〜20μmである。
【0013】
粒状のシリカ多孔体が、シリカ粒子を焼結してなるものであることにより、焼結温度での耐熱性が安定し、かつ、その温度にさらされても断熱性が劣化することはない。
【0014】
シリカ粉体と塩基性の第四アンモニウム化合物の水溶液の混合物は、造粒中にシリカ粉体粒子の表層部が溶解して行き、造粒体を乾燥(室温〜130℃程度の温度)させると、溶解したシリカ分がシリカ粉体粒子表面に析出して粒子同士を接合し、つまり、バインダーとして機能し、造粒体を加熱すると、塩基性の第四アンモニウム化合物の水溶液は、高々200℃の温度で残留物を残さず分解、揮発してしまう一方、シリカ析出物は、焼結に至るまで安定に存在し、シリカ粉体粒子同士を結合している。しかも、シリカ析出物は、活性なため、骨格となる粉体粒子の粘性流動による変形に先立って焼結し、緻密なシリカの層を粒子間に形成する。
よって、造粒体の保形性がよく、焼結時の変形も低減されるため、形状の制御ができ、気孔径、気孔分布、気孔率を容易に制御できる。又、焼結体も十分な機械的強度を得ることができる。
【0015】
シリカ粉体は、粒径と粒度分布を適宜に選定することが望ましい。このようにすることによって粒状のシリカ多孔体の気孔径と気孔分布を制御することができる。粒径を大きく設定するに従って、気孔径を大きくすることができ、又、粒度分布を狭くする(粒度を均一にする)ことによって、粒状のシリカ多孔体の気孔分布を狭くする(気孔径を均一にする)ことができる。逆に、様々な粒度の原料粉体を使用すれば、気孔分布が広がる。
上記気孔の特性は、球状シリカ粉体を使用すると一層向上するが、粉砕品でも十分に目的を達成できる。
なお、シリカ粉体の粒径と粒度分布を揃えるには、原料粉体を篩い分けや沈降法、サイクロン分級等の方法で分粒して行う。
又、シリカ多孔体は、ナトリウム、カリウムの総和が5ppm以下、カルシウム、マグネシウムの総和が2ppm以下、鉄、クロム、ニッケル、銅の総和が1ppm以下であることが望ましい。これらの含有量を超えると、耐熱性が低下すると共に、特に高純度を必要とする用途に適用できなくなる。
【0016】
塩基性の第四アンモニウム化合物の水溶液が、0.01%未満の濃度であると、バインダーとして機能するシリカの溶解量が不足する。一方、5%を超える濃度であると、シリカの溶解が必要以上に進行し、かつ、溶液が取り扱い難くなる。
塩基性の第四アンモニウム化合物の水溶液の添加量が、シリカ粉体に対して外率で、5wt%未満であると、造粒が困難となる。一方、25wt%を超えると、造粒体から水分がしみ出す不具合がある。
第四アンモニウム化合物としては、水酸化テトラメチルアンモニウム、水酸化テトラエチルアンモニウム、コリン、アセチルコリン、水酸化テトラブチルアンモニウム、水酸化フェニルトリメチルアンモニウム等が用いられるが、その中でも、コリン及びその誘導体は、成形性が良好で、取り扱いが容易である等の利点がある。
【0017】
造粒は、振動造粒法が好ましい。振動造粒は、例えば、金属不純物による汚染を防止するため、プラスチックやセラミックス等からなる平底の容器を用い、この容器に揺動や回転等の運動を与えながら、容器内に収容したシリカ粉体に塩基性の第四アンモニウム化合物の水溶液をスプレー等の手段により添加してなされ、運動を続けて粒状に凝集させる。
【0018】
造粒体の焼成温度が、1300℃未満であると、十分な強度が得られない。一方、1450℃を超えると、シリカ粒子の流動、変形が進みすぎ、外形や気孔分布が制御できなくなる。
なお、同じ粒度のシリカ粉体を用いても、上記範囲内で焼成温度条件を調整することにより、多孔体の気孔率を制御することができる。焼成温度を高くするに従って、気孔率を小さくすることができる。又、気孔率が小さい程、高強度となる。よって、造粒体の機械的強度は、主として焼成温度に依存すると言える。
焼成に先立って造粒体を室内に静置するか、100℃前後に昇温する等して乾燥させた後、造粒体を電気炉等を用いて焼成し、焼結させる。
焼成雰囲気は、特に選ばないが、通常は空気中等の酸化性雰囲気において行う。
なお、造粒体の乾燥や焼成の段階では、清浄な装置や治具を用い、造粒体の汚染を防止するようにする。
【0019】
塩基性の第四アンモニウム化合物の水溶液に、シリカ粉末や可溶性シリカ化合物等のシリカ分を加えると、造粒体と焼結体の強度が更に向上する。
シリカ分が、塩基性の第四アンモニウム化合物の水溶液の0.1wt%未満であると、効果が現われない一方、5wt%を超えると、溶液の粘性が増加して成形性に支障を来す。
【0020】
外殻は、透明石英ガラスでも、多孔質不透明石英ガラスでもよい。但し、多孔質石英ガラスを用いる場合には、外表面を加熱溶融する等して、外表面の気孔が閉気孔となり、外部と内部が通気しないような状態とする。
その純度は、使用環境によって適宜選択すればよく、一般的には99%以上が望ましい。
又、形状は、内部に粒状のシリカ多孔体を充填するために中空であればよく、通常、断面形状が円形、方形等の中空の板状である。又、真空封入可能なように、気密性が必要である。
更に、肉厚は、溶接等の加工が可能で、断熱部材として使用するために十分な強度があればよく、特に限定されないが、断熱性の点からは薄い方が好ましく、1mm以上が望ましい。
【0021】
【発明の実施の形態】
以下、本発明の実施の形態について図面を参照して説明する。
図1は本発明に係る石英ガラス断熱部材の第1の実施の形態を示す断面図である。
この石英ガラス断熱部材1は、図2に示すように、横型熱処理炉(図示せず)における石英ガラス炉芯管2の両端部を気密に閉鎖する蓋体となるものであり、高純度の石英ガラスからなり、石英ガラス炉芯管2の端部に嵌合可能な中空の戴頭円錐体状を呈する外殻3を備えており、この外殻3の軸心部には、外殻3と同様の石英ガラスからなり、ガスの導入又は排出に用いるガス管4が気密に挿着されている。
そして、外殻3内には、粒径0.5〜5mm、気孔率15〜60%、平均気孔径0.5〜30μmの高純度の粒状のシリカ多孔体5が充填され、かつ、5Torr以下の圧力で真空封入されている。
【0022】
粒状のシリカ多孔体5は、シリカ粉体に、塩基性の第四アンモニウム化合物の0.01〜5%濃度の水溶液又はこれにシリカ分を0.1〜5wt%含んだものを外率で5〜25wt%添加して振動造粒し、造粒体を乾燥した後、空気中において1300〜1450℃の温度で焼成してなるものである。
得られた多孔体5は、Na、Kの合計が5ppm以下、Ca、Mgの合計が2ppm以下、Fe、Ni、Cr、Cuの合計が1ppm以下であった。
【0023】
上述した石英ガラス断熱部材1を製造するには、先ず、図3に示すように、ガス管4が挿着され、かつ、開口部6を備えた外殻3を製作し(第1工程)、次に、図4に示すように、開口部6から粒状のシリカ多孔体5を装入して充填した(第2工程)。
次いで、図5に示すように、開口部6に真空ポンプ(図示せず)の吸引管7を接続して真空排気した後、酸水素ガスバーナー8により開口部6を封止し(第3工程)、しかる後に、図6に示すように、酸水素ガスバーナー8によって封止部3aを仕上げて石英ガラス断熱部材1を得た(第4工程)。
なお、真空排気に際しては、吸着ガスの離脱を容易にするため、全体を加熱(通常、300〜400℃程度)する、いわゆるベーキングを施すことが好ましい。
【0024】
上記構成の石英ガラス断熱部材1においては、粒状のシリカ多孔体が、高い耐熱性と熱線散乱特性、及び低い熱伝導度を有しているので、真空封入による対流伝熱の除去効果も相俟って、長期間に亘って均質で高い断熱性を呈することができる。
又、粒状のシリカ多孔体5が、1300〜1450℃という高温で焼結処理されており、その温度での耐熱性が安定しているので、高温にさらされても断熱性が劣化することがない。
一方、その製造に際し、粒状のシリカ多孔体5は、軽くて流動性に富むので、いかなる形状の外殻3内にも隙間なく均一に充填することができ、均質な断熱性を有する断熱部材を極めて容易に作製することができる。
【0025】
図7は本発明に係る石英ガラス断熱部材の第2の実施の形態を示す断面図である。
この石英ガラス断熱部材9は、縦型熱処理炉における石英ガラス炉芯管(共に図示せず)内に装入されるウェーハボート載置台の一部として用いられるものであり、高純度の石英ガラスからなり、直径30mm、高さ24mmの中空(肉厚1.5〜2mm)の円板状を呈する外殻10内に、平均粒径1.5mm、平均気孔径5μm、気孔率45%であって、前述した第1の実施の形態のものと同様にして得た同様の純度の粒状のシリカ多孔体11を充填し、かつ、0.003Torrの圧力で真空封入したものである。
【0026】
上述した石英ガラス断熱部材9を製造するには、先ず、図示は省略するが、高純度の石英ガラスからなり、外径30mm、内径27mm、高さ20mmの短円筒体の外周部に、同様に高純度の石英ガラスからなり、外径10mm、内径8mmの管状の開口部を形成した後、短円筒体の両端部に高純度の石英ガラスからなり、直径30mm、厚み2mmの2板の円板を気密に溶接して外殻10を作製した。
次に、開口部から外殻10内に、粒状のシリカ多孔体11を充填し、全体を300℃以上の温度でベーキングしながら、開口部から真空排気して0.003Torrの圧力となった時点で開口部を封止し、封止部10aに仕上げて石英ガラス断熱部材9を得た。
真空排気に要した時間(0.003Torrを達成するために要した時間)は、5分であった。
【0027】
一方、上記石英ガラス断熱部材9と比較するため、図8に示す従来の石英ガラス断熱部材12を製造した。
この石英ガラス断熱部材12は、第2の実施の形態のものと同様にウェーハボート載置台の一部として用いられるものであり、高純度の石英ガラスからなり、直径30mm、高さ24mmの中空(肉厚1.5〜2mm)の円板状を呈する外殻13内に、直径25μm、長さ5〜30mmの石英ガラスウールをほぼ充填し、かつ、0.1Torrの圧力で真空封入したものである。
【0028】
上述した石英ガラス断熱部材12を製造するには、先ず、図示は省略するが、高純度の石英ガラスからなり、外径30mm、内径27mm、高さ20mmの短円筒体の外周部に、同様に高純度の石英ガラスからなり、外径10mm、内径8mmの管状の開口部を形成した後、短円筒体の一端に、高純度の石英ガラスからなり、直径30mm、厚み2mmの円板を気密に溶接した。
次に、短円筒の他端を上にしてその中に石英ガラスウール14を充填した後、高純度の石英ガラスからなり、直径30mm、厚み2mmの円板を短円筒体の他端に溶接しようとしたところ、溶接部の近くにある石英ガラスウール14が溶接時に溶融付着し、気密性のある封止が困難であった。
そこで、石英ガラスウール14の充填密度を下げ、溶接部分との間に隙間を設けて上記円板を短円筒体の他端に気密に溶接して石英ガラスウール14入りの外殻13を作製した。
次いで、開口部から真空排気して0.1Torrの圧力となった時点で開口部を封止し、封止部13aに仕上げて石英ガラス断熱部材12を得た。
真空排気に要した時間(0.1Torrを達成するために要した時間)は、30分であった。
【0029】
上記2種の石英ガラス断熱部材9,12の性能を比較するため、He−Neレーザの光を一方の面から外殻10,13の高さ方向と平行に照射しながら走査し、透過した光の強度の面内の分布を調べたところ、本発明に係る石英ガラス断熱体9が、有効面(短円筒体の側壁の厚みを除く面)の範囲内で、5%以下のばらつきであったのに対し、従来の石英ガラス断熱部材12は、30%以上のばらつきがあった。
又、両者を1300℃の温度で10時間加熱した後、その性能や外観上の変化を調べたところ、本発明に係る石英ガラス部材9が全く変化がなかったのに対し、従来の石英ガラス断熱部材12は、石英ガラスウール14の一部に融着が生じ、かつ、断熱性能が低下していた。
【0030】
図9は本発明に係る石英ガラス断熱部材の第3の実施の形態を示す断面図である。
この石英ガラス断熱部材15は、横型ウェーハボート(図示せず)の前後に取り付けられる熱遮蔽体として用いられるものであり、高純度の石英ガラスからなり、直径30mm、高さ14mmの中空(肉厚2mm)の円板状を呈する外殻16内に、平均粒径3mm、平均気孔径5μm、気孔率45%であって、前述した第1の実施の形態のものと同様にして得た同様の純度の粒状のシリカ多孔体17を充填し、かつ、0.1Torrの圧力で真空封入したものである。
【0031】
上述した石英ガラス断熱部材15を製造するには、先ず、図示は省略するが、高純度の石英ガラスからなり、外径30mm、内径26mm、高さ10mmの短円筒体の外周部に、同様に高純度の石英ガラスからなり、外径10mm、内径8mmの管状の開口部を形成した後、短円筒体の両端部に、高純度の石英ガラスからなり、直径30mm、厚み2mmの2枚の円板を気密に溶接して外殻16を作製した。
次に、開口部から外殻16内に、粒状のシリカ多孔体17を充填し、開口部から真空排気して0.1Torrの圧力となった時点で開口部を封止し、封止部16aに仕上げて石英ガラス部材15を得た。
【0032】
一方、上記石英ガラス断熱部材15と比較するため、図10に示すように、高純度の石英ガラスからなり、直径30mm、厚さ2mmで、両面砂刷りの3板の円板18を、同様に高純度の石英ガラスからなる複数のスペーサ19を介して2mmの等間隔に溶接、固着し、横型ウェーハボート(図示せず)の前後に取り付けられる熱遮蔽体として用いられる従来の石英ガラス断熱部材20を製造した。
【0033】
上記2種の石英ガラス断熱部材15,20の性能を比較するため、1000℃の温度における輻射の透過率を測定したところ、本発明に係る石英ガラス断熱部材15が30%であったのに対し、従来の石英ガラス断熱部材20は、70%であり、断熱性が大きく劣っていた。
測定は、二つの輻射板間に石英ガラス断熱部材15,20を設置し、0.1Torrの真空雰囲気において1000℃の温度に昇温しておき、一方の輻射板に熱パルスを印加し、石英ガラス断熱部材15,20を通過した輻射によって、他方の輻射板が加熱される度合を測定する方法によった。
なお、本発明に係る石英ガラス断熱部材15は、1300℃の温度まで加熱しても、その性能や外観上の変化はなかった。
【0034】
上述した各実施の形態においては、粒状のシリカ多孔体5,11,17及び粒状のシリカ多孔体5,11,17と外殻3,10,16が互いに分離している場合について説明したが、これに限定されるものではなく、外殻3,10,16内の真空排気前に、真空排気と並行して又は真空排気後に外殻3,10,16とその中に充填された粒状のシリカ多孔体5,11,17を1300〜1450℃の温度で加熱することにより、粒状のシリカ多孔体5,11,17を互いに融着し、又は粒状のシリカ多孔体5,11,17を互いに融着すると共に外殻3,10,16に融着したものとしてもよいものである。
このようにすることにより、外部からの機械的衝撃によって粒状のシリカ多孔体5,11,17が移動して損耗することがなく、断熱性能を長期間に亘って保持することができる。
又、その製造に際し、粒状のシリカ多孔体5,11,17が真空ポンプによる吸引によって外部へ排出されたりすることがなくなる。
【0035】
【発明の効果】
以上説明したように、本発明の第1の石英ガラス断熱部材及びその製造方法によれば、粒状のシリカ多孔体が、高い耐熱性と熱線散乱特性、及び低い熱伝導度を有しているので、真空封入による対流伝熱の除去効果も相俟って、長期間に亘って均質で高い断熱性を呈することができる。
一方、粒状のシリカ多孔体が軽くて流動性に富むので、いかなる形状の外殻内にも隙間なく均一に充填することができ、均質な断熱性を有する断熱部材を極めて容易に製造することができる。
【0036】
又、第2の石英ガラス断熱部材及びその製造方法によれば、第1のもの及びその方法によって得られる作用効果の他、粒状のシリカ多孔体又は粒状のシリカ多孔体と外殻が一体化されるので、外部からの機械的衝撃によって粒状のシリカ多孔体が移動して損耗することがなく、断熱性能を長期間に亘って保持することができる。
一方、粒状のシリカ多孔体が真空吸引時に外部へ排出されることがないので、製造を容易に行うことができる。
【図面の簡単な説明】
【図1】本発明に係る石英ガラス断熱部材の第1の実施の形態を示す断面図である。
【図2】図1の石英ガラス断熱部材を用いた石英ガラス炉芯管の断面図である。
【図3】図1の石英ガラス断熱部材の製造方法の第1工程を示す断面図である。
【図4】図1の石英ガラス断熱部材の製造方法の第2工程を示す断面図である。
【図5】図1の石英ガラス断熱部材の製造方法の第3工程を示す断面図である。
【図6】図1の石英ガラス断熱部材の製造方法の第4工程を示す断面図である。
【図7】本発明に係る石英ガラス断熱部材の第2の実施の形態を示す断面図である。
【図8】従来の石英ガラス断熱部材の断面図である。
【図9】本発明に係る石英ガラス断熱部材の第3の実施の形態を示す断面図である。
【図10】従来の他の石英ガラス断熱部材の断面図である。
【符号の説明】
3 外殻
3a 封止部
5 シリカ多孔体
6 開口部
10 外殻
10a 封止部
11 シリカ多孔体
16 外殻
16a 封止部
17 シリカ多孔体
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a quartz glass heat insulating member mainly used in a semiconductor heat treatment apparatus and a method for manufacturing the same, and more specifically, a lid for closing an end of a core tube of a heat treatment furnace, heat attached to the front and rear of a wafer boat. The present invention relates to a quartz glass heat insulating member used as a shield, a wafer boat mounting table or the like inserted in a furnace core tube of a vertical heat treatment furnace, and a manufacturing method thereof.
[0002]
[Prior art]
Conventionally, as this type of quartz glass heat insulating member, a hollow outer shell made of quartz glass is filled with quartz glass wool and vacuum-sealed, or the surface of an amorphous quartz glass foam made of vacuum closed cells Is covered with a quartz glass layer (see JP-A-6-252074).
The former quartz glass heat insulating member is manufactured by filling a hollow outer shell made of quartz glass with quartz glass wool from its opening, exhausting the inside of the outer shell, and then sealing the opening. The latter quartz glass heat insulating member is filled with quartz glass powder in a carbon crucible of the required shape and heat-treated under reduced pressure to melt and foam the quartz glass powder to obtain a quartz glass foam, which is prepared in advance. It is manufactured by enclosing it in an outer shell made of quartz glass or by heating and melting the surface of the foam with an oxyhydrogen gas burner.
[0003]
[Problems to be solved by the invention]
However, in the former quartz glass heat insulating member, the quartz glass wool has a relatively low heat resistance of 300 to 400 ° C., and when exposed to such a relatively low temperature for a long time, the strength decreases, and it is used or carried. There is a problem in that the fibers constituting the wool are gradually broken and powdered by a slight impact, and the heat insulation performance is significantly lowered.
Further, at a temperature of 1000 ° C. or higher, since the fibers begin to sinter and the volume shrinks, the scattering ability of infrared radiation (heat rays) is lowered, and the heat insulation performance is remarkably lowered.
On the other hand, it is extremely difficult to uniformly fill the outer shell with quartz glass wool during its manufacture, and the wool has a very large specific surface area, so there is a large amount of adsorbed gas, and the vacuum inside the outer shell is necessary. In addition to taking a long time to reduce the temperature, there is a problem that during decompression, the wool is sucked into the suction port and a large gap is formed in the outer shell.
[0004]
In the latter quartz glass heat insulating member, the pressure of the residual gas in the closed cells heated to near the softening temperature (1200 ° C.) of the quartz glass is more than five times the value at room temperature, but once manufactured. Since the gas in the closed cells cannot be removed later, the pressure of the residual gas is 1/5 atm or higher, or when the pressure at the time of heating is 1 atm or higher due to separation of the adsorbed gas during heating, There is a problem that the expansion of the closed cell causes a change in dimensions or damage to the device.
On the other hand, in the case of the method of encapsulating quartz glass foam in the outer shell, the foam must be processed in accordance with the shape of the outer shell. In addition, when the surface of the foam is heated and melted, closed cells expand and rupture during the heating process, so that it is difficult to form a dense layer with a sufficient thickness and it is difficult to obtain a smooth surface shape. Airtightness and dimensional accuracy are also insufficient.
Then, an object of this invention is to provide the manufacturing method of the quartz glass heat insulation member which can be easily manufactured and the quartz glass heat insulation member which exhibits a uniform and high heat insulation over a long period of time.
[0005]
[Means for Solving the Problems]
In order to solve the above-mentioned problems, the first quartz glass heat insulating member of the present invention is characterized in that a hollow outer shell made of quartz glass is filled with a granular porous silica and vacuum-sealed.
In the first quartz glass heat insulating member, the granular silica porous bodies are fused to each other, or the granular silica porous bodies are fused to each other and fused to the outer shell. And
[0006]
On the other hand, according to the first method for producing a quartz glass heat insulating member of the present invention, a hollow outer shell made of quartz glass is filled with a granular silica porous body from its opening, and the inside of the outer shell is evacuated and then opened. The portion is sealed.
The second method for manufacturing a quartz glass heat insulating member is the first method, wherein heating is performed at a temperature of 1300 to 1450 ° C. before, in parallel with, or after evacuating the outer shell. It is characterized by.
[0007]
The granular porous silica preferably has a particle size of 0.5 to 5 mm.
The granular silica porous body preferably has a porosity of 15 to 60%.
It is preferable that the granular silica porous body is formed by sintering silica particles.
Further, the granular silica porous body is obtained by granulating a silica powder by adding an aqueous solution of a basic quaternary ammonium compound, and firing the granulated body at a temperature of 1300 to 1450 ° C. Is preferred.
The aqueous solution of the basic quaternary ammonium compound is preferably added at an external rate of 5 to 25 wt% with respect to the silica powder at a concentration of 0.01 to 5%.
On the other hand, the aqueous solution preferably contains a silica component.
The silica content is preferably 0.1 to 5 wt% of the aqueous solution.
[0008]
The degree of vacuum in the outer shell is desirably 5 Torr or less. If it exceeds 5 Torr, the effect of removing convective heat transfer is reduced.
[0009]
When the temperature of the heating performed in parallel with or after evacuation before the evacuation in the outer shell is less than 1300 ° C., the fusion between the granular silica porous bodies, or between the granular silica porous bodies When the temperature exceeds 1450 ° C., deformation of the granular silica porous body and / or outer shell occurs. A desirable heating temperature is 1350 to 1450 ° C. Heating is preferably performed in parallel with evacuation.
[0010]
By making the particle diameter of the granular silica porous body 0.5 to 5 mm, the fluidity becomes good, the outer shell can be filled uniformly without any gap, and the heat insulation becomes uniform. Moreover, evacuation can be performed in a shorter time.
When the granular silica porous body has a particle size of less than 0.5 mm, it is discharged from the opening by vacuum suction during production. On the other hand, when the particle size exceeds 5 mm, the gap between the particles becomes large and the heat insulating property is increased. There is a risk of lowering. The particle size is preferably 1 to 5 mm, more preferably 3 to 5 mm.
[0011]
The granular porous silica preferably has a porosity of 15 to 60%.
When the porosity is less than 15%, the heat insulating action of the porous silica material is reduced, so that the heat insulating property as the heat insulating member is lowered and it is difficult to evacuate in manufacturing. On the other hand, if it exceeds 60%, the mechanical strength of the porous silica material is reduced, so that it is broken and becomes a powder, which causes a decrease in heat insulating properties and causes problems such as dusting during production. A more desirable porosity is 30 to 50%.
[0012]
The granular porous silica preferably has an average pore size of 0.5 to 30 μm.
When the average pore diameter is less than 0.5 μm, the heat insulating action of the porous silica material is reduced, so that the heat insulating property as a heat insulating member is lowered and evacuation becomes difficult at the time of production. On the other hand, when the thickness exceeds 30 μm, the mechanical strength of the porous silica material is reduced, so that the silica porous material is broken and becomes a powder, which causes a decrease in heat insulating properties and causes problems such as dust generation during production. More desirably, the average pore diameter is 1.5 to 20 μm.
[0013]
Since the granular silica porous body is formed by sintering silica particles, the heat resistance at the sintering temperature is stable, and the heat insulating property does not deteriorate even when exposed to the temperature.
[0014]
When a mixture of silica powder and an aqueous solution of a basic quaternary ammonium compound dissolves the surface layer of the silica powder particles during granulation, the granulation is dried (at a temperature of about room temperature to 130 ° C.). The dissolved silica content precipitates on the surface of the silica powder particles and joins the particles together. That is, when the granule is heated, the aqueous solution of the basic quaternary ammonium compound is at most 200 ° C. While it decomposes and volatilizes without leaving any residue at the temperature, the silica precipitates exist stably until sintering, and the silica powder particles are bonded to each other. In addition, since the silica precipitate is active, it is sintered prior to deformation due to viscous flow of the powder particles serving as a skeleton, thereby forming a dense silica layer between the particles.
Therefore, the shape-retaining property of the granulated body is good and deformation during sintering is reduced, so that the shape can be controlled and the pore diameter, pore distribution, and porosity can be easily controlled. In addition, the sintered body can obtain sufficient mechanical strength.
[0015]
It is desirable that the silica powder has an appropriate particle size and particle size distribution. By doing so, the pore diameter and pore distribution of the granular silica porous body can be controlled. As the particle size is set larger, the pore size can be increased, and the particle size distribution is narrowed (the particle size is made uniform), thereby narrowing the pore distribution of the granular silica porous material (the pore size is made uniform). Can). Conversely, the use of raw material powders of various particle sizes widens the pore distribution.
The characteristics of the pores are further improved when spherical silica powder is used, but the object can be sufficiently achieved even with a pulverized product.
In order to make the particle size and particle size distribution of the silica powder uniform, the raw material powder is classified by a method such as sieving, sedimentation, or cyclone classification.
The silica porous body preferably has a total sum of sodium and potassium of 5 ppm or less, a sum of calcium and magnesium of 2 ppm or less, and a total of iron, chromium, nickel and copper of 1 ppm or less. When these contents are exceeded, the heat resistance is lowered, and it becomes impossible to apply to applications requiring particularly high purity.
[0016]
When the aqueous solution of the basic quaternary ammonium compound has a concentration of less than 0.01%, the dissolved amount of silica that functions as a binder is insufficient. On the other hand, if the concentration exceeds 5%, the dissolution of silica proceeds more than necessary, and the solution becomes difficult to handle.
Granulation becomes difficult when the addition amount of the aqueous solution of the basic quaternary ammonium compound is less than 5 wt% in terms of the external ratio with respect to the silica powder. On the other hand, when it exceeds 25 wt%, there is a problem that moisture exudes from the granulated body.
As the quaternary ammonium compound, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, acetylcholine, tetrabutylammonium hydroxide, phenyltrimethylammonium hydroxide, etc. are used. Among them, choline and its derivatives are moldable. Has advantages such as being good and easy to handle.
[0017]
The granulation is preferably the vibration granulation method. For example, in order to prevent contamination by metal impurities, vibration granulation uses a flat-bottomed container made of plastic, ceramics, etc., and the silica powder accommodated in the container is given a motion such as rocking and rotating. An aqueous solution of a basic quaternary ammonium compound is added by means such as spraying, and the movement is continued to agglomerate into granules.
[0018]
If the firing temperature of the granulated body is less than 1300 ° C., sufficient strength cannot be obtained. On the other hand, when the temperature exceeds 1450 ° C., the flow and deformation of the silica particles proceed excessively, and the outer shape and pore distribution cannot be controlled.
Even when silica powder having the same particle size is used, the porosity of the porous body can be controlled by adjusting the firing temperature condition within the above range. As the firing temperature is increased, the porosity can be reduced. Also, the smaller the porosity, the higher the strength. Therefore, it can be said that the mechanical strength of the granulated body mainly depends on the firing temperature.
Prior to firing, the granulated body is left in the room or dried by raising the temperature to around 100 ° C., and then the granulated body is fired and sintered using an electric furnace or the like.
The firing atmosphere is not particularly selected, but is usually performed in an oxidizing atmosphere such as air.
At the stage of drying or firing the granulated body, a clean device or jig is used to prevent the granulated body from being contaminated.
[0019]
When a silica component such as silica powder or soluble silica compound is added to an aqueous solution of a basic quaternary ammonium compound, the strength of the granulated body and sintered body is further improved.
If the silica content is less than 0.1 wt% of the aqueous solution of the basic quaternary ammonium compound, the effect does not appear. On the other hand, if the silica content exceeds 5 wt%, the viscosity of the solution increases and the moldability is hindered.
[0020]
The outer shell may be transparent quartz glass or porous opaque quartz glass. However, in the case of using porous quartz glass, the outer surface is closed by pores by heating and melting the outer surface, and the outside and the inside are not vented.
The purity may be appropriately selected depending on the use environment, and is generally preferably 99% or more.
Further, the shape may be hollow so as to fill the inside with a granular silica porous body, and is usually a hollow plate shape having a circular or square cross-sectional shape. In addition, airtightness is necessary so that vacuum sealing is possible.
Further, the wall thickness is not particularly limited as long as it can be processed such as welding and has sufficient strength to be used as a heat insulating member, but is preferably 1 mm or more from the viewpoint of heat insulating properties.
[0021]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 is a sectional view showing a first embodiment of a quartz glass heat insulating member according to the present invention.
As shown in FIG. 2, the quartz glass heat insulating member 1 serves as a lid that hermetically closes both ends of the quartz glass furnace core tube 2 in a horizontal heat treatment furnace (not shown), and is a high-purity quartz. An outer shell 3 made of glass and having a hollow cone shape that can be fitted to the end of the quartz glass furnace core tube 2 is provided. A gas pipe 4 made of the same quartz glass and used for introducing or discharging gas is hermetically inserted.
The outer shell 3 is filled with a high-purity granular porous silica 5 having a particle size of 0.5 to 5 mm, a porosity of 15 to 60%, and an average pore size of 0.5 to 30 μm, and 5 Torr or less. It is sealed with a vacuum.
[0022]
The granular silica porous body 5 has an external ratio of 5 to 0.01% by weight of an aqueous solution of a basic quaternary ammonium compound in a concentration of 0.01 to 5% or a silica content of 0.1 to 5 wt%. After adding ~ 25 wt%, granulating by vibration and drying the granulated body, it is fired at a temperature of 1300 to 1450 ° C in the air.
The obtained porous body 5 had a total of Na and K of 5 ppm or less, a total of Ca and Mg of 2 ppm or less, and a total of Fe, Ni, Cr and Cu of 1 ppm or less.
[0023]
In order to manufacture the quartz glass heat insulating member 1 described above, first, as shown in FIG. 3, the outer shell 3 having the gas pipe 4 inserted and provided with the opening 6 is manufactured (first step), Next, as shown in FIG. 4, the granular silica porous body 5 was charged and filled from the opening 6 (second step).
Next, as shown in FIG. 5, a suction pipe 7 of a vacuum pump (not shown) is connected to the opening 6 and evacuated, and then the opening 6 is sealed with an oxyhydrogen gas burner 8 (third step). Thereafter, as shown in FIG. 6, the sealing portion 3a was finished with the oxyhydrogen gas burner 8 to obtain the quartz glass heat insulating member 1 (fourth step).
In order to facilitate the separation of the adsorbed gas during vacuum evacuation, it is preferable to perform so-called baking in which the whole is heated (usually about 300 to 400 ° C.).
[0024]
In the quartz glass heat insulating member 1 having the above configuration, the granular silica porous body has high heat resistance, heat ray scattering characteristics, and low thermal conductivity. Therefore, the effect of removing convective heat transfer by vacuum sealing is also considered. Thus, it is possible to exhibit a uniform and high heat insulating property over a long period of time.
In addition, since the porous silica 5 is sintered at a high temperature of 1300 to 1450 ° C. and the heat resistance at that temperature is stable, the heat insulating property may deteriorate even when exposed to a high temperature. Absent.
On the other hand, since the granular silica porous body 5 is light and rich in fluidity in the production thereof, the outer shell 3 having any shape can be uniformly filled without a gap, and a heat insulating member having a uniform heat insulating property can be obtained. It can be produced very easily.
[0025]
FIG. 7 is a cross-sectional view showing a second embodiment of the quartz glass heat insulating member according to the present invention.
This quartz glass heat insulating member 9 is used as a part of a wafer boat mounting table loaded in a quartz glass furnace core tube (both not shown) in a vertical heat treatment furnace, and is made of high-purity quartz glass. In the outer shell 10 having a hollow (wall thickness: 1.5 to 2 mm) disk shape having a diameter of 30 mm and a height of 24 mm, the average particle diameter is 1.5 mm, the average pore diameter is 5 μm, and the porosity is 45%. A granular porous silica 11 having the same purity obtained in the same manner as in the first embodiment is filled and vacuum-sealed at a pressure of 0.003 Torr.
[0026]
In order to manufacture the quartz glass heat insulating member 9 described above, first, although not shown in the drawing, the outer periphery of a short cylindrical body made of high-purity quartz glass having an outer diameter of 30 mm, an inner diameter of 27 mm, and a height of 20 mm is similarly applied. After forming a tubular opening with an outer diameter of 10 mm and an inner diameter of 8 mm, it is made of high-purity quartz glass, and is made of high-purity quartz glass at both ends of the short cylindrical body. The outer shell 10 was manufactured by hermetically welding.
Next, the granular silica porous body 11 is filled into the outer shell 10 from the opening, and the whole is baked at a temperature of 300 ° C. or higher and evacuated from the opening to a pressure of 0.003 Torr. Then, the opening was sealed and finished to a sealing portion 10a to obtain a quartz glass heat insulating member 9.
The time required for evacuation (time required to achieve 0.003 Torr) was 5 minutes.
[0027]
On the other hand, in order to compare with the said quartz glass heat insulation member 9, the conventional quartz glass heat insulation member 12 shown in FIG. 8 was manufactured.
This quartz glass heat insulating member 12 is used as a part of the wafer boat mounting table in the same manner as in the second embodiment, and is made of high-purity quartz glass and is a hollow (diameter 30 mm, height 24 mm) The outer shell 13 having a disk shape with a wall thickness of 1.5 to 2 mm is almost filled with quartz glass wool having a diameter of 25 μm and a length of 5 to 30 mm, and is vacuum-sealed at a pressure of 0.1 Torr. is there.
[0028]
In order to manufacture the above-described quartz glass heat insulating member 12, first, although not shown in the drawing, the outer periphery of a short cylindrical body made of high purity quartz glass having an outer diameter of 30 mm, an inner diameter of 27 mm, and a height of 20 mm is similarly applied. After forming a tubular opening made of high-purity quartz glass with an outer diameter of 10 mm and an inner diameter of 8 mm, a disc made of high-purity quartz glass made of high-purity quartz glass with a diameter of 30 mm and a thickness of 2 mm is hermetically sealed at one end of the short cylindrical body. Welded.
Next, after filling the quartz glass wool 14 with the other end of the short cylinder facing upward, a disk made of high purity quartz glass and having a diameter of 30 mm and a thickness of 2 mm will be welded to the other end of the short cylinder. As a result, the quartz glass wool 14 near the welded portion melted and adhered during welding, and it was difficult to achieve airtight sealing.
Therefore, the packing density of the quartz glass wool 14 was lowered, a gap was provided between the welded portions, and the disk was hermetically welded to the other end of the short cylindrical body to produce the outer shell 13 containing the quartz glass wool 14. .
Next, when the pressure was evacuated from the opening and the pressure became 0.1 Torr, the opening was sealed, and finished into a sealing portion 13a to obtain the quartz glass heat insulating member 12.
The time required for evacuation (time required to achieve 0.1 Torr) was 30 minutes.
[0029]
In order to compare the performance of the above-mentioned two types of quartz glass heat insulating members 9 and 12, the light transmitted through the He-Ne laser beam while being irradiated in parallel with the height direction of the outer shells 10 and 13 from one surface. The in-plane distribution of the strength of the quartz glass insulator 9 according to the present invention showed a variation of 5% or less within the range of the effective surface (the surface excluding the thickness of the side wall of the short cylindrical body). On the other hand, the conventional quartz glass heat insulating member 12 had a variation of 30% or more.
Also, after both were heated for 10 hours at a temperature of 1300 ° C., changes in performance and appearance were examined. Whereas the quartz glass member 9 according to the present invention was not changed at all, conventional quartz glass insulation The member 12 was fused to a part of the quartz glass wool 14 and the heat insulating performance was lowered.
[0030]
FIG. 9 is a sectional view showing a third embodiment of a quartz glass heat insulating member according to the present invention.
This quartz glass heat insulating member 15 is used as a heat shield attached to the front and rear of a horizontal wafer boat (not shown), is made of high purity quartz glass, and is hollow (thickness) with a diameter of 30 mm and a height of 14 mm. In the outer shell 16 having a disk shape of 2 mm), the average particle diameter is 3 mm, the average pore diameter is 5 μm, and the porosity is 45%, which is the same as that obtained in the same manner as in the first embodiment. It is filled with a granular porous silica 17 and vacuum-sealed at a pressure of 0.1 Torr.
[0031]
In order to manufacture the quartz glass heat insulating member 15 described above, first, although not shown in the drawing, it is similarly formed on the outer peripheral portion of a short cylindrical body made of high-purity quartz glass having an outer diameter of 30 mm, an inner diameter of 26 mm, and a height of 10 mm. After forming a tubular opening with an outer diameter of 10 mm and an inner diameter of 8 mm made of high purity quartz glass, two circles made of high purity quartz glass with a diameter of 30 mm and a thickness of 2 mm are formed at both ends of the short cylindrical body. The plate was air-tightly welded to produce the outer shell 16.
Next, the porous silica 17 is filled into the outer shell 16 from the opening, and the opening is sealed when the pressure is 0.1 Torr when the opening is evacuated and the sealing portion 16a is sealed. The quartz glass member 15 was obtained.
[0032]
On the other hand, for comparison with the quartz glass heat insulating member 15, as shown in FIG. 10, a three-plate disk 18 made of high-purity quartz glass, having a diameter of 30 mm, a thickness of 2 mm, and double-sided sand printing is similarly used. A conventional quartz glass heat insulating member 20 that is welded and fixed at an equal interval of 2 mm through a plurality of spacers 19 made of high purity quartz glass and used as a heat shield attached to the front and rear of a horizontal wafer boat (not shown). Manufactured.
[0033]
In order to compare the performance of the two types of quartz glass heat insulating members 15 and 20, the transmittance of radiation at a temperature of 1000 ° C. was measured, whereas the quartz glass heat insulating member 15 according to the present invention was 30%. The conventional quartz glass heat insulating member 20 was 70%, and the heat insulating property was greatly inferior.
In the measurement, quartz glass heat insulating members 15 and 20 are installed between two radiation plates, heated to a temperature of 1000 ° C. in a vacuum atmosphere of 0.1 Torr, a heat pulse is applied to one radiation plate, quartz quartz According to the method of measuring the degree to which the other radiation plate is heated by the radiation that has passed through the glass heat insulating members 15 and 20.
In addition, even if the quartz glass heat insulation member 15 which concerns on this invention was heated to the temperature of 1300 degreeC, the performance and the external appearance did not change.
[0034]
In each of the above-described embodiments, the case where the granular silica porous bodies 5, 11, 17 and the granular silica porous bodies 5, 11, 17 and the outer shells 3, 10, 16 are separated from each other has been described. However, the present invention is not limited to this, and the outer shells 3, 10, 16 and the granular silica filled in the outer shells 3, 10, 16 are filled before or after the vacuum evacuation. By heating the porous bodies 5, 11, and 17 at a temperature of 1300 to 1450 ° C., the granular silica porous bodies 5, 11, and 17 are fused to each other, or the granular silica porous bodies 5, 11, and 17 are fused to each other. At the same time, it may be fused to the outer shells 3, 10, 16.
By doing in this way, the granular silica porous bodies 5, 11, and 17 are not moved and worn by mechanical shock from the outside, and the heat insulating performance can be maintained for a long period of time.
Further, in the production thereof, the particulate silica porous bodies 5, 11, and 17 are not discharged to the outside by suction by a vacuum pump.
[0035]
【The invention's effect】
As described above, according to the first quartz glass heat insulating member and the method for producing the same of the present invention, the granular silica porous body has high heat resistance, heat ray scattering characteristics, and low thermal conductivity. Combined with the effect of removing convective heat transfer by vacuum encapsulation, it is possible to exhibit uniform and high heat insulation over a long period of time.
On the other hand, since the porous silica is light and rich in fluidity, it can be uniformly filled without any gaps in the outer shell of any shape, and a heat insulating member having uniform heat insulating properties can be manufactured very easily. it can.
[0036]
Further, according to the second quartz glass heat insulating member and the manufacturing method thereof, in addition to the first and the effects obtained by the method, the granular silica porous body or the granular silica porous body and the outer shell are integrated. Therefore, the granular porous silica is not moved and worn by mechanical shock from the outside, and the heat insulation performance can be maintained for a long period of time.
On the other hand, since the porous silica is not discharged to the outside during vacuum suction, the production can be easily performed.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing a first embodiment of a quartz glass heat insulating member according to the present invention.
2 is a cross-sectional view of a quartz glass furnace core tube using the quartz glass heat insulating member of FIG. 1. FIG.
3 is a cross-sectional view showing a first step of the method for producing the quartz glass heat insulating member of FIG. 1. FIG.
4 is a cross-sectional view showing a second step of the method for manufacturing the quartz glass heat insulating member of FIG. 1. FIG.
5 is a cross-sectional view showing a third step of the method for manufacturing the quartz glass heat insulating member of FIG. 1. FIG.
6 is a cross-sectional view showing a fourth step of the method for manufacturing the quartz glass heat insulating member of FIG. 1. FIG.
FIG. 7 is a cross-sectional view showing a second embodiment of a quartz glass heat insulating member according to the present invention.
FIG. 8 is a cross-sectional view of a conventional quartz glass heat insulating member.
FIG. 9 is a cross-sectional view showing a third embodiment of a quartz glass heat insulating member according to the present invention.
FIG. 10 is a cross-sectional view of another conventional quartz glass heat insulating member.
[Explanation of symbols]
3 outer shell 3a sealing part 5 silica porous body 6 opening 10 outer shell 10a sealing part 11 silica porous body 16 outer shell 16a sealing part 17 silica porous body

Claims (16)

石英ガラスからなる中空の外殻内に粒状のシリカ多孔体を充填して真空封入したことを特徴とする石英ガラス断熱部材。A quartz glass heat insulating member characterized in that a hollow porous shell made of quartz glass is filled with a granular silica porous body and vacuum-sealed. 前記粒状のシリカ多孔体を互いに融着し、又は粒状のシリカ多孔体を互いに融着すると共に外殻に融着したことを特徴とする請求項1記載の石英ガラス断熱部材。2. The quartz glass heat insulating member according to claim 1, wherein the granular silica porous bodies are fused together, or the granular silica porous bodies are fused together and fused to the outer shell. 前記粒状のシリカ多孔体が、粒径0.5〜5mmであることを特徴とする請求項1又は2記載の石英ガラス断熱部材。The quartz glass heat insulating member according to claim 1 or 2, wherein the granular silica porous body has a particle diameter of 0.5 to 5 mm. 前記粒状のシリカ多孔体が、気孔率15〜60%であることを特徴とする請求項1、2又は3記載の石英ガラス断熱部材。The quartz glass heat insulating member according to claim 1, wherein the granular silica porous body has a porosity of 15 to 60%. 前記粒状のシリカ多孔体が、シリカ粒子を焼結してなるものであることを特徴とする請求項1、2、3又は4記載の石英ガラス断熱部材。The quartz glass heat insulating member according to claim 1, wherein the granular silica porous body is formed by sintering silica particles. 前記粒状のシリカ多孔体が、シリカ粉体に塩基性の第四アンモニウム化合物の水溶液を添加して造粒し、造粒体を1300〜1450℃の温度で焼成してなるものであることを特徴とする請求項1、2、3、4又は5記載の石英ガラス断熱部材。The granular silica porous body is obtained by granulating a silica powder by adding an aqueous solution of a basic quaternary ammonium compound, and firing the granulated body at a temperature of 1300 to 1450 ° C. The quartz glass heat insulating member according to claim 1, 2, 3, 4, or 5. 前記塩基性の第四アンモニウム化合物の水溶液が、0.01〜5%の濃度で、シリカ粉体に対して外率で5〜25wt%添加されることを特徴とする請求項6記載の石英ガラス断熱部材。The quartz glass according to claim 6, wherein the aqueous solution of the basic quaternary ammonium compound is added at an external rate of 5 to 25 wt% with respect to the silica powder at a concentration of 0.01 to 5%. Thermal insulation member. 前記水溶液が、シリカ分を含んでいることを特徴とする請求項6又は7記載の石英ガラス断熱部材。The quartz glass heat insulating member according to claim 6 or 7, wherein the aqueous solution contains a silica component. 石英ガラスからなる中空の外殻内にその開口部から粒状のシリカ多孔体を充填し、外殻内を真空排気した後、開口部を封止することを特徴とする石英ガラス断熱部材の製造方法。A method for producing a quartz glass heat insulating member comprising filling a hollow silica shell made of silica glass with a granular porous silica from its opening, evacuating the outer shell, and then sealing the opening . 前記外殻内の真空排気前に、真空排気と並行して又は真空排気後に1300〜1450℃の温度で加熱することを特徴とする請求項9記載の石英ガラス断熱部材の製造方法。The method for manufacturing a quartz glass heat insulating member according to claim 9, wherein heating is performed at a temperature of 1300 to 1450 ° C. in parallel with or after evacuation before evacuation of the outer shell. 前記粒状のシリカ多孔体が、粒径0.5〜5mmであることを特徴とする請求項9又は10記載の石英ガラス断熱部材の製造方法。The method for producing a quartz glass heat insulating member according to claim 9 or 10, wherein the granular silica porous body has a particle diameter of 0.5 to 5 mm. 前記粒状のシリカ多孔体が、気孔率15〜60%であることを特徴とする請求項9、10又は11記載の石英ガラス断熱部材の製造方法。The method for producing a quartz glass heat insulating member according to claim 9, 10 or 11, wherein the granular silica porous body has a porosity of 15 to 60%. 前記粒状のシリカ多孔体が、シリカ粒子を焼結してなるものであることを特徴とする請求項9、10、11又は12記載の石英ガラス断熱部材の製造方法。13. The method for producing a quartz glass heat insulating member according to claim 9, wherein the granular silica porous body is obtained by sintering silica particles. 前記粒状のシリカ多孔体が、シリカ粉体に塩基性の第四アンモニウム化合物の水溶液を添加して造粒し、造粒体を1300〜1450℃の温度で焼成してなるものであることを特徴とする請求項9、10、11、12又は13記載の石英ガラス断熱部材の製造方法。The granular silica porous body is obtained by granulating a silica powder by adding an aqueous solution of a basic quaternary ammonium compound, and firing the granulated body at a temperature of 1300 to 1450 ° C. The method for producing a quartz glass heat insulating member according to claim 9, 10, 11, 12, or 13. 前記塩基性の第四アンモニウム化合物の水溶液が、0.01〜5%の濃度で、シリカ粉体に対して外率で5〜25wt%添加されることを特徴とする請求項14記載の石英ガラス断熱部材の製造方法。The quartz glass according to claim 14, wherein the aqueous solution of the basic quaternary ammonium compound is added in an external ratio of 5 to 25 wt% with respect to the silica powder at a concentration of 0.01 to 5%. Manufacturing method of heat insulation member. 前記水溶液が、シリカ分を含んでいることを特徴とする請求項14又は15記載の石英ガラス断熱部材の製造方法。The method for producing a quartz glass heat insulating member according to claim 14 or 15, wherein the aqueous solution contains a silica component.
JP00568999A 1999-01-12 1999-01-12 Quartz glass heat insulating member and manufacturing method thereof Expired - Fee Related JP4148487B2 (en)

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