JP4152966B2 - 光学層または層組織の物理的特性を決定するための方法 - Google Patents
光学層または層組織の物理的特性を決定するための方法 Download PDFInfo
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- JP4152966B2 JP4152966B2 JP2005146880A JP2005146880A JP4152966B2 JP 4152966 B2 JP4152966 B2 JP 4152966B2 JP 2005146880 A JP2005146880 A JP 2005146880A JP 2005146880 A JP2005146880 A JP 2005146880A JP 4152966 B2 JP4152966 B2 JP 4152966B2
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- 238000000034 method Methods 0.000 title claims abstract description 26
- 230000003287 optical effect Effects 0.000 title claims abstract description 12
- 230000000704 physical effect Effects 0.000 title claims description 5
- 230000008033 biological extinction Effects 0.000 claims abstract description 31
- 230000001419 dependent effect Effects 0.000 claims abstract description 5
- 238000005457 optimization Methods 0.000 claims description 33
- 230000005540 biological transmission Effects 0.000 claims description 25
- 238000011156 evaluation Methods 0.000 claims description 12
- 238000005259 measurement Methods 0.000 claims description 12
- 238000001228 spectrum Methods 0.000 claims description 5
- 238000000572 ellipsometry Methods 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 claims 2
- 239000000758 substrate Substances 0.000 description 18
- 239000000654 additive Substances 0.000 description 11
- 230000000996 additive effect Effects 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 229910010413 TiO 2 Inorganic materials 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000011326 mechanical measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Mathematical Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
現代数理科学辞典、編集委員会代表広中平祐、大阪書籍株式会社発行、1991年、第641−650頁
る。この最適化は、屈折率および消衰係数自体に関するさまざまに依存する値の代わりに屈折率の変分定数Knおよび消衰係数の変分定数Kkに加えて層厚に関する変分定数Kdを用いることにより、明らかに単純化されかつ迅速化される。この目的ために用いられる非線形最適化アルゴリズムは、数学において一般に公知であり、ここではより詳細に説明する必要がない。これらのアルゴリズムの例には、ネルダー−ミード(Nelder-Mead)のシンプレックス法(単体法)、パウエル(Powell)のアルゴリズム、または一般的アルゴリズムによる最適化が含まれる。
より得ることができる。調査すべき層に関するする現実の屈折率nは、透過および/または反射の測定値により求めることができる。加算的な変分定数についての平均値は、異なる波長に関する複数の変分定数に基づいて算出することができる。
k=k0+Kk
コーティングされた基板、たとえば建築物の大判のグレージングにわたる非常に多くの測定点において変分定数を求めることにより、ガラス表面またはコーティングの均質性についての情報が提供され得る。
Claims (10)
- スペクトルの透過および/または反射の測定によって光学層または層組織の物理的特性を定性的に決定する方法であって、
現実の透過値および/または反射値が測定され、
その透過および/または反射の測定のスペクトルに対応する前記層または層組織について、波長に依存する屈折率n0および/または消衰係数k0に関する基準値が既知の値から選択されるかまたは実験的に求められ、
理論上の反射値と透過値が、屈折率n 0 と消衰係数k 0 に関する前記基準値および層厚に関する目標値d 0 に基づいて決定され、
理論上の反射値および/または透過値と実験上の反射値および/または透過値とが整合させられ、
前記基準値に対して実際の屈折率nおよび/または消衰係数kによって示されかつ前記層を特徴付ける偏差が、波長無依存の変分定数KnおよびKkのそれぞれによって決定されることを特徴とする方法。 - 理論上の反射値および/または透過値が、測定された反射値および/または透過値に対して非線形最適化によって整合させられることを特徴とする請求項1に記載の方法。
- 屈折率n0と消衰係数k0および目標層厚d0に関する前記基準値は変分定数Kn、Kk、およびKdがそれぞれ与えられて前記非線形最適化に関する出発値として用いられ、前記最適化は前記変分定数Kn、KkおよびKdに関して行なわれることを特徴とする請求項2に記載の方法。
- 平均の前記変分定数Kn、KkおよびKdは、層の同一点において具体的に用いられる光の異なる波長での複数の測定に基づいて決定されることを特徴とする請求項3に記載の方法。
- 前記変分定数Kn、KkおよびKdは、層上の複数の点において求められ、層の表面領域
にわたる光学的な均質性を決定するために用いられることを特徴とする請求項1から請求項4のいずれかに記載の方法。 - 評価関数の最小値が最適化のために求められることを特徴とする請求項2から5のいずれかに記載の方法。
- 測定された反射値および/または透過値と、理論上の反射値および/または透過値との間の2乗距離の和が評価関数として用いられることを特徴とする請求項6に記載の方法。
- 最適化のために、一連の目標層厚が最適化アルゴリズムのための出発値として用いられ、前記評価関数の最小値を生じる結果が選択されることを特徴とする請求項2から7のいずれかに記載の方法。
- 複数の値が前記一連の目標層厚に関して用いられ、前記複数の値は技術的に不合理でない最小値と最大値との間でかつ決定されるべき層に対して予想され得る最小値と最大値との間で特に等間隔に配置されることを特徴とする請求項8に記載の方法。
- 屈折率および消衰係数に関する前記基準値はスペクトルの偏光解析法により得られることを特徴とする請求項1から請求項9のいずれかに記載の方法。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04021243A EP1632746B1 (de) | 2004-09-07 | 2004-09-07 | Verfahren zur Bestimmung von physikalischen Eigenschaften einer optischen Schicht oder eines Schichtsystems |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006078465A JP2006078465A (ja) | 2006-03-23 |
| JP4152966B2 true JP4152966B2 (ja) | 2008-09-17 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005146880A Expired - Fee Related JP4152966B2 (ja) | 2004-09-07 | 2005-05-19 | 光学層または層組織の物理的特性を決定するための方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7477385B2 (ja) |
| EP (1) | EP1632746B1 (ja) |
| JP (1) | JP4152966B2 (ja) |
| KR (1) | KR100767749B1 (ja) |
| CN (1) | CN1811378A (ja) |
| AT (1) | ATE374924T1 (ja) |
| DE (1) | DE502004005147D1 (ja) |
| PL (1) | PL1632746T3 (ja) |
| TW (1) | TWI266870B (ja) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7930657B2 (en) | 2008-01-23 | 2011-04-19 | Micron Technology, Inc. | Methods of forming photomasks |
| US20090296100A1 (en) * | 2008-05-29 | 2009-12-03 | Applied Materials, Inc. | Method for determining an optical property of an optical layer |
| EP2128603A1 (en) | 2008-05-29 | 2009-12-02 | Applied Materials, Inc. | A method for determining an optical property of an optical layer |
| FR2983762B1 (fr) * | 2011-12-09 | 2014-01-10 | Commissariat Energie Atomique | Procede de pilotage d'un robot et systeme de pilotage mettant en oeuvre un tel procede |
| CN102542107B (zh) * | 2011-12-28 | 2013-09-04 | 浙江大学 | 一种用于实现氟掺杂氧化锡镀膜玻璃表面色彩控制的方法 |
| CN103363909B (zh) * | 2012-03-26 | 2018-01-02 | 上海华虹宏力半导体制造有限公司 | 一种基于反射光谱拟合的快速钴硅化合物质量检测方法 |
| CN103575663B (zh) * | 2012-08-07 | 2016-06-29 | 中国科学院大连化学物理研究所 | 一种金属及半导体薄膜材料光学常数的标定方法 |
| US8830464B2 (en) * | 2012-11-06 | 2014-09-09 | Kla-Tencor Corporation | Film thickness, refractive index, and extinction coefficient determination for film curve creation and defect sizing in real time |
| WO2014152096A1 (en) * | 2013-03-15 | 2014-09-25 | Suncare Research Laboratories, Llc | In vitro determination of sunscreen protection based on image analysis of sunscreens applied to skin |
| WO2015032894A1 (en) * | 2013-09-09 | 2015-03-12 | Rockwool International A/S | System and interface for determining insulation thickness |
| CN105829926B (zh) | 2013-12-20 | 2019-11-26 | 肖特股份有限公司 | 光滤波器 |
| CN108474870A (zh) | 2016-03-09 | 2018-08-31 | 株式会社Lg化学 | 抗反射膜 |
| WO2018232338A1 (en) | 2017-06-16 | 2018-12-20 | AesculaTech, Inc. | Thermoresponsive polymers and uses thereof |
| JP6986100B2 (ja) * | 2018-01-18 | 2021-12-22 | 富士フイルム株式会社 | 膜厚測定方法 |
| CN109468597B (zh) * | 2019-01-08 | 2020-11-06 | 京东方科技集团股份有限公司 | 一种膜层厚度均一性调整方法及其调整装置 |
| CN111337227B (zh) * | 2020-04-30 | 2022-05-10 | 宜昌南玻显示器件有限公司 | 一种基于vba的基板光学常数计算方法 |
| KR102924514B1 (ko) * | 2021-01-21 | 2026-02-06 | 한국전력공사 | 광학 분석 장치 및 광학 분석 방법 |
| KR102752610B1 (ko) * | 2022-05-30 | 2025-01-09 | 한양대학교 산학협력단 | Euv 마스크 소재의 굴절계수 및 흡광계수 측정 장치 및 방법 |
| KR102886247B1 (ko) * | 2022-11-10 | 2025-11-17 | 한양대학교 산학협력단 | Euv용 시편의 광학상수 측정장치 및 측정방법 |
| KR102827170B1 (ko) * | 2023-03-24 | 2025-06-27 | 한양대학교 산학협력단 | Euv 노광공정용 종합 검사 장치 및 방법, 그리고 핀홀 모듈 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2840181B2 (ja) * | 1993-08-20 | 1998-12-24 | 大日本スクリーン製造株式会社 | 多層膜試料の膜厚測定方法 |
| JP2866559B2 (ja) * | 1993-09-20 | 1999-03-08 | 大日本スクリーン製造株式会社 | 膜厚測定方法 |
| JP3520379B2 (ja) * | 1994-11-29 | 2004-04-19 | 東レエンジニアリング株式会社 | 光学定数測定方法およびその装置 |
| KR19990070676A (ko) * | 1998-02-23 | 1999-09-15 | 윤종용 | 반도체소자의 두께측정방법 |
| IT1306911B1 (it) * | 1998-06-30 | 2001-10-11 | Stmicroelettronica Srl | Metodo per misurare lo spessore di uno strato di silicio danneggiatoda attacchi con plasma |
| KR20000018615A (ko) * | 1998-09-03 | 2000-04-06 | 윤종용 | 반도체소자의 제조장비 |
| US7304744B1 (en) * | 1998-12-24 | 2007-12-04 | Sharp Kabushiki Kaisha | Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light |
| US5999267A (en) * | 1999-03-08 | 1999-12-07 | Zawaideh; Emad | Nondestructive optical techniques for simultaneously measuring optical constants and thicknesses of single and multilayer films |
| US6485872B1 (en) * | 1999-12-03 | 2002-11-26 | Mks Instruments, Inc. | Method and apparatus for measuring the composition and other properties of thin films utilizing infrared radiation |
| DE10021379A1 (de) * | 2000-05-02 | 2001-11-08 | Leica Microsystems | Optische Messanordnung insbesondere zur Schichtdickenmessung |
| TW504565B (en) | 2000-11-17 | 2002-10-01 | Ind Tech Res Inst | Method of measuring optical constants and thickness of a film deposited on a transparent substrate by transmittance spectra |
| CN1808056B (zh) * | 2001-09-21 | 2011-09-14 | Kmac株式会社 | 利用二维检测器测量薄膜特性的装置及测量方法 |
| DE10204943B4 (de) * | 2002-02-07 | 2005-04-21 | Leica Microsystems Jena Gmbh | Verfahren zur Bestimmung von Schichtdicken |
| JP4413706B2 (ja) * | 2004-08-02 | 2010-02-10 | 株式会社堀場製作所 | 光学特性解析方法、試料測定装置、及び分光エリプソメータ |
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2004
- 2004-09-07 PL PL04021243T patent/PL1632746T3/pl unknown
- 2004-09-07 EP EP04021243A patent/EP1632746B1/de not_active Expired - Lifetime
- 2004-09-07 DE DE502004005147T patent/DE502004005147D1/de not_active Expired - Lifetime
- 2004-09-07 AT AT04021243T patent/ATE374924T1/de not_active IP Right Cessation
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2005
- 2005-05-03 TW TW094114219A patent/TWI266870B/zh active
- 2005-05-19 JP JP2005146880A patent/JP4152966B2/ja not_active Expired - Fee Related
- 2005-05-31 KR KR1020050046153A patent/KR100767749B1/ko not_active Expired - Fee Related
- 2005-08-17 CN CNA200510090606XA patent/CN1811378A/zh active Pending
- 2005-08-30 US US11/215,879 patent/US7477385B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US7477385B2 (en) | 2009-01-13 |
| CN1811378A (zh) | 2006-08-02 |
| US20060007430A1 (en) | 2006-01-12 |
| KR100767749B1 (ko) | 2007-10-18 |
| JP2006078465A (ja) | 2006-03-23 |
| TWI266870B (en) | 2006-11-21 |
| KR20060046318A (ko) | 2006-05-17 |
| EP1632746B1 (de) | 2007-10-03 |
| EP1632746A1 (de) | 2006-03-08 |
| ATE374924T1 (de) | 2007-10-15 |
| PL1632746T3 (pl) | 2008-03-31 |
| TW200609503A (en) | 2006-03-16 |
| DE502004005147D1 (de) | 2007-11-15 |
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