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JP4170980B2 - POLYMER PTC ELEMENT AND POLYMER PTC ELEMENT - Google Patents
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JP4170980B2 - POLYMER PTC ELEMENT AND POLYMER PTC ELEMENT - Google Patents

POLYMER PTC ELEMENT AND POLYMER PTC ELEMENT Download PDF

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JP4170980B2
JP4170980B2 JP2004377418A JP2004377418A JP4170980B2 JP 4170980 B2 JP4170980 B2 JP 4170980B2 JP 2004377418 A JP2004377418 A JP 2004377418A JP 2004377418 A JP2004377418 A JP 2004377418A JP 4170980 B2 JP4170980 B2 JP 4170980B2
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ptc element
polymer ptc
peak intensity
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density polyethylene
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義人 仁平
安隆 田口
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TDK Corp
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Description

本発明は、温度センサや過電流保護素子として用いられ、温度上昇により抵抗値が増大するPTC(Positive Temperature Coefficient)特性を有するポリマーPTC素体及びポリマーPTC素子に関する。   The present invention relates to a polymer PTC element body and a polymer PTC element which are used as a temperature sensor and an overcurrent protection element and have a PTC (Positive Temperature Coefficient) characteristic in which a resistance value increases as the temperature rises.

従来、PTCサーミスタ素子は、そのPTC特性(正の抵抗−温度特性)を利用して、例えば、自己制御型発熱体、温度センサ、限流素子、過電流保護素子(例えばリチウムイオン電池の過電流保護素子)として電子機器の回路保護等に利用されている。   Conventionally, a PTC thermistor element utilizes a PTC characteristic (positive resistance-temperature characteristic), for example, a self-control heating element, a temperature sensor, a current limiting element, an overcurrent protection element (for example, an overcurrent of a lithium ion battery). As a protection element), it is used for circuit protection of electronic equipment.

このPTCサーミスタ素子は、上記用途に利用する際には、主に、
(1)非動作時の室温抵抗値が低いこと
(2)非動作時の室温抵抗値と動作時の抵抗値との変化率が大きいこと
(3)繰り返し動作させた場合における抵抗値の変化量(使用初期の抵抗値と繰り返し動作後における抵抗値との差)が小さいこと
(4)低速遮断特性に優れること
(5)素子の発熱温度が低いこと
(6)小型化、軽量化及び低コスト化が図れること
といった特性が要求される。
When this PTC thermistor element is used for the above applications, mainly,
(1) Low room temperature resistance value during non-operation (2) Large rate of change between room temperature resistance value during non-operation and resistance value during operation (3) Amount of change in resistance value when repeatedly operated (Difference between the initial resistance value and the resistance value after repeated operation) is small (4) Excellent low-speed shut-off characteristics (5) Low heat generation temperature of the element (6) Miniaturization, weight reduction, and low cost It is required to have characteristics such as

このようなPTCサーミスタ素子として、従来より、セラミクス材料からなるサーミスタ素体を備えるものが用いられてきたが、このタイプのPTCサーミスタ素子は、上記要求特性(1)〜(6)のうち、特に(4)、(5)及び(6)の特性が好ましくなかった。   As such a PTC thermistor element, an element having a thermistor body made of a ceramic material has been conventionally used, and this type of PTC thermistor element is particularly preferable among the above required characteristics (1) to (6). The characteristics of (4), (5) and (6) were not preferable.

そこで、近年、そのセラミクス材料を用いたPTCサーミスタ素子よりも優れた特性を有するポリマーPTCサーミスタ素子(以下、ポリマーPTC素子とも称す。)が開発された。このポリマーPTC素子は、結晶性ポリマー(熱可塑性樹脂)中にC、Ni、Cu等の導電性微粒子を分散させたサーミスタ素体を用いたものであり、下記特許文献1及び特許文献2に開示されている。このポリマーPTC素子における抵抗値の増大は、周囲温度の上昇に伴って結晶性ポリマーが融解して膨張し、導電性微粒子により構築された導電経路が分断されるためであると考えられている。
米国特許第3243753号明細書 米国特許第3351882号明細書 特開2004−88079号公報 米国特許第5378407号明細書 特開平5−470503号公報 特公昭62−16523号公報 特開平1−231284号公報 特開平3−132001号公報 特開平9−27383号公報 特開平11−168005号公報
Therefore, in recent years, a polymer PTC thermistor element (hereinafter also referred to as a polymer PTC element) having characteristics superior to those of a PTC thermistor element using the ceramic material has been developed. This polymer PTC element uses a thermistor body in which conductive fine particles such as C, Ni, and Cu are dispersed in a crystalline polymer (thermoplastic resin), and is disclosed in Patent Document 1 and Patent Document 2 below. Has been. The increase in the resistance value in this polymer PTC element is considered to be because the crystalline polymer melts and expands as the ambient temperature increases, and the conductive path constructed by the conductive fine particles is broken.
US Pat. No. 3,243,753 US Pat. No. 3,351,882 JP 2004-88079 A US Pat. No. 5,378,407 Japanese Patent Laid-Open No. 5-470503 Japanese Examined Patent Publication No. 62-16523 JP-A-1-231284 Japanese Patent Laid-Open No. 3-132001 Japanese Patent Laid-Open No. 9-27383 Japanese Patent Laid-Open No. 11-168005

発明者らは、上記要求特性のうち、(2)及び(3)のさらなる特性向上を実現したポリマーPTC素子を、上記特許文献3において開示した。そして、その技術についての研究を重ねた結果、上記特許文献3で示している結晶性ポリマーとNi粉との加熱混練をおこなった後には、混練物中にNiCが生成されていることを発見し、このNiCの生成量が、動作温度の変化量及び非動作時の室温抵抗値と相関性を有することを新たに見出した。 The inventors have disclosed a polymer PTC element that realizes further improvement in characteristics (2) and (3) among the above required characteristics in Patent Document 3. As a result of repeated research on the technology, it was confirmed that Ni 3 C was generated in the kneaded product after the heat-kneading of the crystalline polymer and Ni powder shown in Patent Document 3 above. The present inventors discovered that the amount of Ni 3 C produced has a correlation with the amount of change in operating temperature and the room temperature resistance value during non-operation.

この動作温度とは、PTCサーミスタ素子の抵抗値が急激に上昇するときの温度であり、PTCサーミスタ素子には、上記(1)〜(6)同様、この動作温度が使用初期と繰り返し動作後であまり変化しないことが求められている。また、過電流保護素子として機能していない非動作時における抵抗値(室温抵抗値)については、できる限り低いことが好ましい。   This operating temperature is a temperature at which the resistance value of the PTC thermistor element suddenly increases. The PTC thermistor element has an operating temperature at the initial stage of use and after repeated operation, as in (1) to (6) above. It is required that it does not change much. Further, it is preferable that the resistance value (room temperature resistance value) when not operating as an overcurrent protection element is as low as possible.

そこで、本発明は、上述の課題を解決するためになされたもので、非動作時における抵抗値が低く、且つ、動作−非動作の繰り返しによる動作温度変化が抑制されたポリマーPTC素体及びポリマーPTC素子を提供することを目的とする。   Accordingly, the present invention has been made to solve the above-described problems, and is a polymer PTC element body and a polymer that have a low resistance value during non-operation and that suppress an operation temperature change due to repeated operation-non-operation. An object is to provide a PTC element.

本発明に係るポリマーPTC素体は、熱可塑性樹脂とNi粉とが加熱混練されて作製され、且つ、X線回折角30〜60度の範囲内において、NiCの(002)面のピーク強度IのNiの(200)面のピーク強度Iに対する比(I/I)が0.0030〜0.0621の範囲内であることを特徴とする。
The polymer PTC element body according to the present invention is produced by heat-kneading a thermoplastic resin and Ni powder, and the peak of the (002) plane of Ni 3 C within an X-ray diffraction angle range of 30 to 60 degrees. the ratio to the peak intensity I B of (200) plane of the Ni intensity I a (I a / I B) is being in the range of from 0.0030 to 0.0621.

このポリマーPTC素体は、熱可塑性樹脂とNi粉体とが加熱混練されて作製されたものである。そして、その加熱混練の際には、熱可塑性樹脂中の炭素とNi粉とが反応して、NiCが生成されることを発明者らは見出した。そして、X線回折角30〜60度において、このNiCのNiに対するピーク強度比(NiCの(002)面のピーク強度IのNiの(200)面のピーク強度Iに対する比(I/I))が0.0030〜0.0621の範囲内であれば、ポリマーPTC素体に含有されているNiCの量が好適な量となっており、ポリマーPTC素体の非動作時における抵抗値が低くなり、且つ、動作−非動作の繰り返しによる動作温度変化が有意に抑制されることを発明者らは新たに見出した。
This polymer PTC body is produced by heat-kneading a thermoplastic resin and Ni powder. The inventors have found that during the heat-kneading, the carbon in the thermoplastic resin reacts with the Ni powder to produce Ni 3 C. Then, the X-ray diffraction angle 30 to 60 degrees, the ratio for the Ni 3 C peak intensity ratio of Ni (Ni 3 (200 of Ni peak intensity I A of C of (002) plane) surface of the peak intensity I B If (I A / I B )) is within the range of 0.0030 to 0.0621 , the amount of Ni 3 C contained in the polymer PTC element is a suitable amount, and the polymer PTC element The inventors newly found that the resistance value during non-operation becomes low, and that the change in operating temperature due to repeated operation-non-operation is significantly suppressed.

本発明に係るポリマーPTC素子は、互いに対向する一対の電極と、一対の電極間に配置されたポリマーPTC素体とを備え、ポリマーPTC素体は、熱可塑性樹脂とNi粉とが加熱混練されて作製され、且つ、X線回折角30〜60度の範囲内において、NiCの(002)面のピーク強度IのNiの(200)面のピーク強度Iに対する比(I/I)が0.0030〜0.0621の範囲内であることを特徴とする。
A polymer PTC element according to the present invention includes a pair of electrodes opposed to each other and a polymer PTC element body disposed between the pair of electrodes. The polymer PTC element body is obtained by heating and kneading a thermoplastic resin and Ni powder. made Te, and, within the scope of X-ray diffraction angle 30 to 60 degrees, Ni 3 C of (002) plane peak intensity I ratio to the peak intensity I B of (200) plane of Ni a (I a / I B ) is in the range of 0.0030 to 0.0621 .

このポリマーPTC素子は、一対の電極と、熱可塑性樹脂とNi粉体とが加熱混練されて作製されたポリマーPTC素体とを備えている。このポリマーPTC素体を加熱混練して作製する際には、熱可塑性樹脂中の炭素とNi粉とが反応して、NiCが生成されることを発明者らは見出した。そして、X線回折角30〜60度において、このNiCのNiに対するピーク強度比(NiCの(002)面のピーク強度IのNiの(200)面のピーク強度Iに対する比(I/I))が0.0030〜0.0621の範囲内であれば、ポリマーPTC素体に含有されているNiCの量が好適な量となっており、ポリマーPTC素体の非動作時における抵抗値が低くなり、且つ、動作−非動作の繰り返しによる動作温度変化が有意に抑制されることを発明者らは新たに見出した。 This polymer PTC element includes a pair of electrodes, and a polymer PTC element produced by heating and kneading a thermoplastic resin and Ni powder. The inventors have found that when the polymer PTC element body is prepared by heating and kneading, carbon in the thermoplastic resin reacts with Ni powder to produce Ni 3 C. Then, the X-ray diffraction angle 30 to 60 degrees, the ratio for the Ni 3 C peak intensity ratio of Ni (Ni 3 (200 of Ni peak intensity I A of C of (002) plane) surface of the peak intensity I B If (I A / I B )) is within the range of 0.0030 to 0.0621 , the amount of Ni 3 C contained in the polymer PTC element is a suitable amount, and the polymer PTC element The inventors newly found that the resistance value during non-operation becomes low, and that the change in operating temperature due to repeated operation-non-operation is significantly suppressed.

本発明によれば、非動作時における抵抗値が低く、且つ、動作−非動作の繰り返しによる動作温度変化が抑制されたポリマーPTC素体及びポリマーPTC素子が提供される。   ADVANTAGE OF THE INVENTION According to this invention, the resistance value at the time of non-operation and the polymer PTC element | base_body and polymer PTC element with which the operating temperature change by repetition of operation | movement non-operation was suppressed are provided.

以下、添付図面を参照して本発明に係るポリマーPTC素体及びポリマーPTC素子を実施するにあたり最良と思われる形態について詳細に説明する。なお、同一又は同等の要素については同一の符号を付し、説明が重複する場合にはその説明を省略する。   Hereinafter, with reference to the accompanying drawings, a mode that is considered to be the best in carrying out a polymer PTC element body and a polymer PTC element according to the present invention will be described in detail. In addition, the same code | symbol is attached | subjected about the same or equivalent element, and the description is abbreviate | omitted when description overlaps.

図1に示すように、ポリマーPTC素子(以下、単にPTC素子と称す。)10は、互いに対向された一対の電極12A,12Bと、これら一対の電極12A,12B間に配置されたポリマーPTC素体(以下、単にPTC素体と称す。)14とで構成されている。   As shown in FIG. 1, a polymer PTC element (hereinafter simply referred to as a PTC element) 10 includes a pair of electrodes 12A and 12B facing each other and a polymer PTC element disposed between the pair of electrodes 12A and 12B. And a body (hereinafter simply referred to as a PTC element body) 14.

各電極12A,12Bは、例えば、シート状の形状を有しており、PTC素子10の電極として機能する導電性を有するものであれば、材料、寸法等は特に限定されない。   Each electrode 12A, 12B has, for example, a sheet-like shape, and the material, dimensions, and the like are not particularly limited as long as they have conductivity that functions as an electrode of the PTC element 10.

PTC素体14は、熱可塑性樹脂とNi粉とを主成分とする成形体である。以下、このPTC素体14を作製する手順について、図2を参照しつつ説明する。   The PTC element body 14 is a molded body mainly composed of a thermoplastic resin and Ni powder. Hereinafter, a procedure for producing the PTC element body 14 will be described with reference to FIG.

まず、PTC素体14を作製するにあたり、原料となる熱可塑性樹脂及びNi粉を必要量だけ秤量し(S10)、これらが均一に混ざり合うように混合する(S12)。そして、得られた混合物に対し、熱処理として加熱混練をおこなう(S14)。   First, when producing the PTC element body 14, the thermoplastic resin and Ni powder as raw materials are weighed in a necessary amount (S10) and mixed so that they are uniformly mixed (S12). And the obtained mixture is heat-kneaded as a heat treatment (S14).

この混練の作業は、公知の混練技術を利用すればよく、ニーダ、押し出し機、ミル等の攪拌手段を用い、熱可塑性樹脂の融点以上の温度(好ましくは融点よりも5〜40℃だけ高い温度)で10〜120分程度おこなえばよい。   The kneading operation may be performed by using a known kneading technique, using a kneading means such as a kneader, an extruder, a mill, or the like, and a temperature equal to or higher than the melting point of the thermoplastic resin (preferably 5 to 40 ° C. higher than the melting point) ) For about 10 to 120 minutes.

この混練における溶融・混練温度、混練時間等の溶融・混練条件を調整することにより、PTC素体14中のNi粉の分散度(分散状態)を調節することができる。その調節の際、いわゆる適正な溶融・混練条件を、同じ試料の溶融・混練回数を複数回おこなう等によって見出す必要がある。そこで、このような適正な条件を見出す技術として、発明者らは、混練物中のNi粉の分散をその混練物の磁化で確認及び制御する方法を見出し、上記特許文献3に開示しているが、PTC素体14の作製にあたってもその方法を利用した。   By adjusting the melting / kneading conditions such as the melting / kneading temperature and kneading time in this kneading, the degree of dispersion (dispersion state) of the Ni powder in the PTC body 14 can be adjusted. At the time of the adjustment, it is necessary to find out so-called proper melting and kneading conditions by, for example, performing the same sample multiple times of melting and kneading. Therefore, as a technique for finding out such appropriate conditions, the inventors have found a method for confirming and controlling the dispersion of Ni powder in the kneaded material by the magnetization of the kneaded material, which is disclosed in Patent Document 3 above. However, the method was also used for producing the PTC element body 14.

以上のようにして得られた混練物を、ロール成形、またはプレス成形等で所定厚さのシート形状に成形すると共に(S16)、得られたシート状成形体の両面にNi、Cu、Au等からなる電極シートを熱圧着させる(S18)。なお、この熱圧着の前に、シート状成形体の両面を、Ni粉体を焼結させたりエッチングしたりして粗面化することで、電極シートがシート状成形体により強固に結合される。   The kneaded product obtained as described above is molded into a sheet shape having a predetermined thickness by roll molding or press molding (S16), and Ni, Cu, Au, etc. are formed on both sides of the obtained sheet-shaped molded body. The electrode sheet made of is thermocompression bonded (S18). In addition, before this thermocompression bonding, both surfaces of the sheet-shaped molded body are roughened by sintering or etching Ni powder, so that the electrode sheet is firmly bonded to the sheet-shaped molded body. .

その後、架橋処理をおこなう(S20)。架橋方法としては、放射線架橋、有機過酸化物による化学架橋、シランカップリング剤をグラフト化してシラノール基の縮合反応による水架橋など、公知の架橋方法を用いることができる。次いで、電極シートが取り付けられたシート状成形体を個々の素子形状に切断することにより(S22)、電極シートが電極12A,12Bとなり、またシート状成形体がPTC素体14となって、図1に示すPTC素子10が完成する。   Then, a crosslinking process is performed (S20). As a crosslinking method, a known crosslinking method such as radiation crosslinking, chemical crosslinking with an organic peroxide, or water crosslinking by grafting a silane coupling agent and condensation reaction of silanol groups can be used. Next, by cutting the sheet-shaped molded body to which the electrode sheet is attached into individual element shapes (S22), the electrode sheet becomes the electrodes 12A and 12B, and the sheet-shaped molded body becomes the PTC element body 14, 1 is completed.

以上で説明したPTC素体14の製造方法に用いられる熱可塑性樹脂は、結晶性ポリマーが好適であり、その融点は70〜170℃の範囲内であることが好ましい。   The thermoplastic resin used in the method for producing the PTC element body 14 described above is preferably a crystalline polymer, and its melting point is preferably in the range of 70 to 170 ° C.

この熱可塑性樹脂の具体例としては、(1)ポリオレフィン(例えば、ポリエチレン)、(2)少なくとも1種のオレフィン(例えばエチレン、プロピレン)と、少なくとも1種の極性基を含有するオレフィン性不飽和モノマ−に基づく繰り返し単位で構成されたコポリマ−(例えば、エチレン−酢酸ビニルコポリマ−)、(3)ハロゲン化ビニルおよびビニリデンポリマ−(例えば、ポリビニルクロライド、ポリビニルフルオライド、ポリビニリデンフルオライド)、(4)ポリアミド(例えば12−ナイロン)、(5)ポリスチレン、(6)ポリアクリロニトリル、(7)熱可塑性エラストマ−、(8)ポリエチレンオキサイド、ポリアセタ−ル、(9)熱可塑性変性セルロ−ス、(10)ポリスルホン類、(11)ポリメチル(メタ)アクリレ−ト等が挙げられる。   Specific examples of this thermoplastic resin include (1) polyolefin (eg, polyethylene), (2) at least one olefin (eg, ethylene, propylene), and at least one polar group-containing olefinically unsaturated monomer. (3) vinyl halide and vinylidene polymers (for example, polyvinyl chloride, polyvinyl fluoride, polyvinylidene fluoride), (4) ) Polyamide (eg 12-nylon), (5) polystyrene, (6) polyacrylonitrile, (7) thermoplastic elastomer, (8) polyethylene oxide, polyacetal, (9) thermoplastic modified cellulose, (10) ) Polysulfones, (11) Polymethyl (meth) Kurire - door, and the like.

より具体的には、(1)高密度ポリエチレン[例えば、商品名:ハイゼックス2100JP(三井化学社製)、Marlex6003(フィリップ社製)等]、(2)低密度ポリエチレン[例えば、商品名:LC500(日本ポリケム社製)、DYMH−1(ユニオン−カ−バイド社製)等]、(3)中密度ポリエチレン[例えば、商品名:2604M(ガルフ社製)等]、(4)エチレン−エチルアクリレ−トコポリマ−[例えば、商品名:DPD6169(ユニオン−カ−バイド社製)等]、(5)エチレン−アクリル酸コポリマ−[例えば、商品名:EAA455(ダウケミカル社製)等]、(6)ヘキサフルオエチレン−テトラフルオロエチレンコポリマ−[例えば、商品名:FEP100(デュポン社製)等]、(7)ポリビニリデンフルオライド[例えば、商品名:Kynar461(ペンバルト社製)等]等が挙げられる。   More specifically, (1) high density polyethylene [for example, trade name: Hi-Zex 2100JP (manufactured by Mitsui Chemicals), Marlex 6003 (manufactured by Philippe), etc.], (2) low density polyethylene [for example, trade name: LC500 ( Nippon Polychem Co., Ltd.), DYMH-1 (Union Carbide Co., Ltd.), etc.], (3) Medium density polyethylene [eg, trade name: 2604M (Gulf Co., Ltd.), etc.], (4) Ethylene-ethyl acrylate copolymer -[E.g., trade name: DPD6169 (manufactured by Union Carbide)], (5) ethylene-acrylic acid copolymer [e.g., trade name: EAA455 (made by Dow Chemical Co., Ltd.)], (6) hexafluo Ethylene-tetrafluoroethylene copolymer [for example, trade name: FEP100 (manufactured by DuPont), etc.], (7) Polyvinylil Nfuruoraido [for example, trade name: Kynar461 (Penbaruto Co., Ltd.), etc.], and the like.

熱可塑性樹脂は、以上で示した樹脂のうちの1種のみを用いても2種以上を併用してもよく、異なる種類の熱可塑性樹脂同士が架橋された構造を有するものを用いてもよい。   As the thermoplastic resin, only one kind of the above-described resins may be used, or two or more kinds may be used in combination, or those having a structure in which different kinds of thermoplastic resins are cross-linked may be used. .

なお、本実施形態においては、(1)高密度ポリエチレンと、(2)低密度ポリエチレンとを混合して分子量分布の裾野(分布領域)を広げたポリマー(混合ポリエチレン)を用いた。この混合の比率は、高密度ポリエチレンが5〜50wt%、低密度ポリエチレンが50〜95wt%とした。   In the present embodiment, a polymer (mixed polyethylene) in which (1) high density polyethylene and (2) low density polyethylene are mixed to broaden the base (distribution region) of the molecular weight distribution is used. The mixing ratio was 5 to 50 wt% for high density polyethylene and 50 to 95 wt% for low density polyethylene.

また、必要に応じて、上記混合ポリエチレン(結晶性ポリマ−)の熱劣化を防止するための酸化防止剤などを添加することもでき、このような酸化防止剤としては、例えば、フェノ−ル類、有機イオウ類、フォスファイト類等が挙げられる。さらに、低融点成分として、より低分子構造のポリエチレンやポリプロピレン等を同様に添加・混合することもできる。ただし、低分子構造のポリエチレン、ポリプロピレン等は、PTC素子10の動作−非動作における膨張と収縮との繰り返しによってPTC素子10内で変形し、場合によっては偏析する等の現象が起こるため、その適量の見極めが必要となる。   If necessary, an antioxidant for preventing thermal deterioration of the mixed polyethylene (crystalline polymer) can be added. Examples of such antioxidant include phenols. , Organic sulfurs, phosphites and the like. Furthermore, as a low melting point component, polyethylene or polypropylene having a lower molecular structure can be added and mixed in the same manner. However, polyethylene, polypropylene, and the like having a low molecular structure are deformed in the PTC element 10 due to repeated expansion and contraction in the operation-non-operation of the PTC element 10, and may cause segregation in some cases. Must be determined.

なお、熱可塑性樹脂の分子量は、重量平均分子量Mwで10万〜500万であることが好ましく、より好ましくは20万〜200万である。熱可塑性樹脂の重量平均分子量Mwが上記範囲より小さい場合には、ポリマーの劣化が早く、素子特性の経時変化や特性バラツキが大きくなる等の不具合が生じる。一方、熱可塑性樹脂の重量平均分子量Mwが上記範囲より大きい場合には、一般的な電子部品の実用的温度範囲にそぐわないものとなる。   In addition, it is preferable that the molecular weight of a thermoplastic resin is 100,000-5 million in the weight average molecular weight Mw, More preferably, it is 200,000-2 million. When the weight average molecular weight Mw of the thermoplastic resin is smaller than the above range, problems such as rapid deterioration of the polymer and increase in device characteristics over time and characteristic variations occur. On the other hand, when the weight average molecular weight Mw of the thermoplastic resin is larger than the above range, it is not suitable for the practical temperature range of general electronic components.

また、上述したPTC素体14の製造方法に用いられるNi粉としては、市販されている通常のNi粉を、単独粉、若しくは他種類の導電粉(C、WC、Fe等)と混合した混合粉として用いることもできる。Ni粉は、PTC素子10の小型化や低消費電力化に好適な導電性微粒子であり、経済性にも優れている。Ni粉以外の導電粉については、触媒作用が強かったり、抵抗が高すぎたり、経済性に乏しかったりといった理由でPTC素子10に用いるのにはあまり適していない。   Moreover, as Ni powder used for the manufacturing method of the PTC element | base_body 14 mentioned above, the normal Ni powder marketed is mixed with single powder or other kinds of conductive powder (C, WC, Fe, etc.) It can also be used as a powder. Ni powder is a conductive fine particle suitable for downsizing and low power consumption of the PTC element 10, and is excellent in economy. Conductive powders other than Ni powder are not very suitable for use in the PTC element 10 because of their strong catalytic action, too high resistance, and poor economic efficiency.

なお、Ni粉は、BET1点法で得られる比表面積が1〜20m・g−1の範囲となっているものが好ましい。また、Ni粉は、[Ni(CO)→ Ni + 4CO]により得られるNi粉が好ましい。上記分解反応により生成したNi粉は、その反応条件によって、粒子サイズや粒子形状を好適な範囲に制御することができるからである。 The Ni powder preferably has a specific surface area obtained by the BET 1-point method in the range of 1 to 20 m 2 · g −1 . The Ni powder is preferably Ni powder obtained by [Ni (CO) 4 → Ni + 4CO]. This is because the Ni powder produced by the decomposition reaction can control the particle size and particle shape within a suitable range depending on the reaction conditions.

そして、このNi粉は、上記熱可塑性樹脂(混合ポリエチレン)に対して含有率75〜90wt%で含有させることが好ましい。ここで、Ni粉の含有率が75wt%未満の場合には、PTC素子10の動作抵抗が高いものとなってしまうため、実用レベルのPTC素体14を作製することが難しい。一方、Ni粉の含有率が90wt%を超える場合には、PTC素子10内においてNi粉を部分的に凝集させることが困難となり、過電流によるショートが生じやすくなって、その結果、過電流防止素子として十分に機能しなくなる事態が招かれる。   And it is preferable to contain this Ni powder with the content rate of 75-90 wt% with respect to the said thermoplastic resin (mixed polyethylene). Here, when the Ni powder content is less than 75 wt%, the PTC element 10 has a high operating resistance, and it is difficult to produce a PTC element body 14 at a practical level. On the other hand, when the Ni powder content exceeds 90 wt%, it becomes difficult to partially agglomerate the Ni powder in the PTC element 10 and a short circuit due to overcurrent is likely to occur. The situation that it does not sufficiently function as an element is invited.

発明者らは、以上で説明した熱可塑性樹脂とNi粉とを加熱混練した際には、NiCが生成されることをこの度発見した。このようなNiCの生成は、図3に示す生成モデルのように、混練時の熱と(剪断)圧力との作用によって、熱可塑性樹脂中のCとNi粉のNiとが反応したためであると考えられる。すなわち、図3(a)に示すような側鎖状にラジカルが発生した熱可塑性樹脂中においては、Niイオンは図3(b)に示すようにラジカルの水素イオンとの間で置換される。そして、このNiイオンに置換されたラジカルが移動すると(図3(c)参照)、図3(d)に示したようにそのラジカルがNiCとして分離される。このようなラジカル移動とNiCの分離とが繰り返されることで、混練時には熱可塑性樹脂中に次々とNiCが生成される。すなわち、加熱混練の際には、ポリマー分子構造が低分子量化へと変化していくと共に、NiCが徐々に生成されていく。 The inventors have now discovered that Ni 3 C is produced when the thermoplastic resin described above and Ni powder are heated and kneaded. Such generation of Ni 3 C is due to the reaction between C in the thermoplastic resin and Ni in the Ni powder due to the action of heat and (shear) pressure during kneading as in the generation model shown in FIG. It is believed that there is. That is, in the thermoplastic resin in which radicals are generated in a side chain as shown in FIG. 3A, Ni ions are substituted with radical hydrogen ions as shown in FIG. 3B. Then, when the radical substituted with the Ni ions moves (see FIG. 3C), the radical is separated as Ni 3 C as shown in FIG. By such a separation of radical transfer and Ni 3 C are repeated, one after another Ni 3 C in a thermoplastic resin is produced during kneading. That is, during the heat-kneading, the polymer molecular structure is changed to lower molecular weight, and Ni 3 C is gradually generated.

発明者らは、このようにして生成されたNiCの生成量が、PTC素子10に及ぼす影響について、種々の実験をおこなった。なお、NiCの生成量は、X線回折装置によるNiC/Niのピーク強度比を求めることによって特定した。この特定には、NiCのピーク強度としてNiC(002)面のピーク強度を、Niのピーク強度としてNi(200)面のピーク強度を採用した。 We, the amount of the thus Ni 3 C, which has been generated is, the effects on the PTC element 10 was subjected to various experiments. The amount of Ni 3 C produced was determined by determining the peak intensity ratio of Ni 3 C / Ni using an X-ray diffractometer. This particular, the peak intensity of the Ni 3 C (002) plane as the peak intensity of the Ni 3 C, employing a peak intensity of Ni (200) surface as the peak intensity and Ni.

その結果、PTC素体14中に生成されたNiCは不安定な物質であると共に、NiCの生成量がPTC素子10の温度−抵抗曲線(R−T曲線)の挙動に大きく関与することが明らかになった。これは、NiCが、連鎖的に樹脂を攻撃して樹脂の劣化を促進させ、PTC素子10の熱特性および電気特性に悪影響を与える因子となっているためと考えられる。 As a result, Ni 3 C produced in the PTC element body 14 is an unstable substance, and the amount of Ni 3 C produced is greatly involved in the behavior of the temperature-resistance curve (RT curve) of the PTC element 10. It became clear to do. This is considered to be because Ni 3 C is a factor that adversely affects the thermal characteristics and electrical characteristics of the PTC element 10 by accelerating the degradation of the resin by chain attacking the resin.

そこで、発明者らはさらなる実験を重ね、その結果、NiCのピーク強度IのNiのピーク強度Iに対するピーク強度比(I/I)が0.001〜0.100の範囲内であれば、PTC素子10の温度−抵抗曲線が良好なものとなることを見出した。すなわち、ピーク強度比I/Iが上記範囲内であれば、PTC素子10に過電流を流してPTC素子を動作状態にさせた後に電流を通常にしてPTC素子10を非動作状態に戻すといった動作/非動作状態変化を1000回繰り返した後において、1000回繰り返した後の動作温度の元の動作温度に対する変化率(動作温度変化率)が20%以下に抑えられること、非動作時における室温抵抗値が低く(例えば、50mΩ以下)なっているを見出した。このように動作/非動作状態変化を1000回繰り返した後であっても、その動作温度変化率が20%以下となっており、且つ、非動作時における室温抵抗値が50mΩ以下であるPTC素子10であれば、高い信頼性を有する優れた素子といえる。 Therefore, we repeated further experiments, the range as a result, Ni 3 C peak intensity ratio to the peak intensity I B of Ni peak intensity I A of (I A / I B) is 0.001 to 0.100 It was found that the temperature-resistance curve of the PTC element 10 would be good if it was within the range. That is, if the peak intensity ratio I A / I B is within the above range, an overcurrent is passed through the PTC element 10 to bring the PTC element into an operating state, and then normalize the current to return the PTC element 10 to a non-operating state. After the operation / non-operation state change is repeated 1000 times, the rate of change of the operating temperature after 1000 times of operation to the original operating temperature (operating temperature change rate) can be suppressed to 20% or less. It was found that the room temperature resistance value was low (for example, 50 mΩ or less). Thus, even after the operation / non-operation state change is repeated 1000 times, the PTC element whose operation temperature change rate is 20% or less and the room temperature resistance value during non-operation is 50 mΩ or less. If it is 10, it can be said that it is an excellent element having high reliability.

なお、上記ピーク強度比I/Iが0.001未満の場合には、非動作時における室温抵抗値が大きくなり、過電流保護素子としての実用性が低下する。一方、上記ピーク強度比I/Iが0.100を超える場合には、動作−非動作の繰り返しによる動作温度変化率及び抵抗値変化率が大きくなる等の不具合がある。 Incidentally, the peak intensity ratio I A / I B is in the case of less than 0.001, the room-temperature resistance is increased at the time of non-operation, utility as an overcurrent protection element decreases. On the other hand, if the peak intensity ratio I A / I B is more than 0.100, the operation - there is a problem such as repeated by operating temperature change rate and resistance change rate of the non-operation increases.

以上で説明したように、発明者らは、ピーク強度比I/I(すなわち、NiCの生成量)を上記特定範囲に制御することで、非動作時における抵抗値が低く、且つ、動作−非動作の繰り返しによる動作温度変化が抑制されたPTC素子10が得られることを見出した。なお、NiCの生成量は、例えば、好適な熱可塑性樹脂の選定や混練条件の最適化によって制御される。 As described above, the inventors controlled the peak intensity ratio I A / I B (that is, the amount of Ni 3 C generated) to the specific range, thereby reducing the resistance value during non-operation, The present inventors have found that a PTC element 10 in which a change in operating temperature due to repeated operation-non-operation is suppressed can be obtained. The amount of Ni 3 C produced is controlled by, for example, selecting a suitable thermoplastic resin and optimizing kneading conditions.

また、PTC素体14に対する架橋処理(図2のS20)をおこなうことで、混練時に生成されたNiCが素子使用時に大量に増加して樹脂を攻撃してしまうような事態が有意に抑制されている。ただし、架橋度が高すぎると、上記NiCの影響は抑えられるものの、線膨張係数が変化するために設計通りの動作温度を得ることが困難となる。一方、架橋度が低いと、NiCの影響が大きくなってNiCが樹脂の劣化が促し、PTC素子10の抵抗値の経時変化等に悪影響を与える。そのため、本実施形態では、NiCの樹脂に対する連鎖的な影響力を抑止する効果が得られる最適架橋条件を採用した。 In addition, the cross-linking treatment (S20 in FIG. 2) for the PTC element body 14 significantly suppresses the situation where Ni 3 C generated during kneading increases in a large amount during device use and attacks the resin. Has been. However, if the degree of crosslinking is too high, the influence of Ni 3 C can be suppressed, but the linear expansion coefficient changes, making it difficult to obtain the designed operating temperature. On the other hand, if the degree of cross-linking is low, the influence of Ni 3 C becomes large, and Ni 3 C promotes the deterioration of the resin, which adversely affects the change in the resistance value of the PTC element 10 with time. For this reason, in this embodiment, the optimum cross-linking conditions that can obtain the effect of suppressing the chain influence on the resin of Ni 3 C are adopted.

なお、熱可塑性樹脂として、低密度ポリエチレンに高密度ポリエチレンを含有させたものを利用した場合、高密度ポリエチレンをまったく含まない熱可塑性樹脂に比べて、上述したNiCの生成量を抑えることが容易となる。 As the thermoplastic resin, when using those obtained by incorporating a high-density polyethylene to low density polyethylene, in comparison with the thermoplastic resin containing no high-density polyethylene, it is possible to suppress the generation amount of Ni 3 C described above It becomes easy.

なお、上記以外の方法によってもPTC素子を作製することは可能である。例えば、溶媒に溶解可能な結晶性ポリマーであるPVDFなどは、PVDFを溶媒中で溶解した後、これに金属粉などを添加し、さらに混合し、これをシート化させながら乾燥させ、このシートを積層し、上下面に電極を形成させてPTC素子を得ることができる。この製法で得られるPTC素子は、熱や圧力を伴わない製法であるため上述したNiCは生成されないものの、製造工程中において樹脂の溶解性を保つ必要があるために、ポリマーの結晶性が低い。従って、このようなPTC素子は、混練によって得られるPTC素体14を用いた上述のPTC素子10に比べて、動作時と非動作時とで抵抗値変化が小さく、PTC素子としての信頼性が乏しい。 Note that the PTC element can also be manufactured by methods other than those described above. For example, for PVDF, which is a crystalline polymer that can be dissolved in a solvent, after the PVDF is dissolved in the solvent, a metal powder or the like is added thereto, further mixed, and dried while making it into a sheet. A PTC element can be obtained by laminating and forming electrodes on the upper and lower surfaces. The PTC element obtained by this manufacturing method is a manufacturing method that does not involve heat and pressure, so that the above-mentioned Ni 3 C is not generated. However, since it is necessary to maintain the solubility of the resin during the manufacturing process, the polymer crystallinity is low. Low. Accordingly, such a PTC element has a smaller change in resistance value during operation and non-operation than the above-described PTC element 10 using the PTC element body 14 obtained by kneading, and thus has a high reliability as a PTC element. poor.

以下、本発明の効果をより一層明らかなものとするため、実施例及び比較例を用いて説明する。   Hereinafter, in order to further clarify the effect of the present invention, description will be made using Examples and Comparative Examples.

まず、図4の表に示した7種のPTC素体試料(試料1〜4及び比較用試料11〜13)を準備した。つまり、低密度ポリエチレンと高密度ポリエチレンとの混合比率、Ni粉の含有率、混練条件及び放射線架橋の線量を変えた7種の試料を準備した。なお、Ni粉には、市販のNi粉(商品名:INCOType210、255、270ニッケルパウダ(インコ社製))を用いた。また、混練には、東洋精機製作所社製のラボプラストミルを用いた。   First, seven types of PTC element samples (samples 1 to 4 and comparative samples 11 to 13) shown in the table of FIG. 4 were prepared. That is, seven types of samples were prepared with different mixing ratios of low density polyethylene and high density polyethylene, Ni powder content, kneading conditions, and radiation crosslinking dose. As Ni powder, commercially available Ni powder (trade name: INCOType 210, 255, 270 nickel powder (manufactured by Inco)) was used. For kneading, a lab plast mill manufactured by Toyo Seiki Seisakusho was used.

そして、7種のPTC素体試料それぞれの上下面を厚さ15μmのNi箔(電極シート)で挟み、150℃で熱プレスをおこなって試料とNi箔とを熱圧着させ、全体で厚さ0.3mmの試料を得た。この試料を3×6mmの寸法にシャーリングして、さらに放射線架橋処理(架橋条件は図4の表のとおり)をおこない、図5の表に示すような7種のPTC素子試料(試料21〜24及び試料31〜33)を得た。   Then, the upper and lower surfaces of each of the seven types of PTC element samples were sandwiched between Ni foils (electrode sheets) having a thickness of 15 μm, and heat-pressed at 150 ° C. to thermally press the sample and the Ni foil. A 3 mm sample was obtained. This sample was sheared to a size of 3 × 6 mm, further subjected to radiation crosslinking treatment (crosslinking conditions are as shown in the table of FIG. 4), and seven types of PTC element samples (samples 21 to 24) as shown in the table of FIG. And samples 31 to 33) were obtained.

そして、各PTC素子試料におけるNiCの生成量(含有量)を特定するために、X線回折装置(リガク社製)を用い、回折角(2θ角)30〜60度の範囲でNiCの(002)面のピーク強度I(2θ:41.9°付近)とNiの(200)面のピーク強度I(2θ:51.9°付近)とを求め(図6参照)、これらのピーク強度比(I/I)を算出した。その結果、試料21〜24のピーク強度比IA/IBは0.001〜0.100の範囲内であり、それ以外の試料(試料31〜33)はその範囲外であった。 Then, in order to identify the amount of Ni 3 C of each PTC element samples (content), using X-ray diffraction apparatus (manufactured by Rigaku Corporation), Ni 3 in the range of diffraction angle (2 [Theta] angle) 30-60 degrees C (002) plane peak intensity I A (2θ: around 41.9 °) and Ni (200) plane peak intensity I B (2θ: around 51.9 °) were determined (see FIG. 6). These peak intensity ratios (I A / I B ) were calculated. As a result, the peak intensity ratios IA / IB of the samples 21 to 24 were in the range of 0.001 to 0.100, and the other samples (samples 31 to 33) were out of the range.

さらに、各PTC素子試料の非動作時の室温抵抗値を測定した。その測定値は図5の表に示したとおり、試料21〜24と試料31,32の抵抗値は5〜45mΩであり、50mΩ以下の素子小型化や低消費電力化に有利な値を示した。ただし、試料33は、152mΩと実用レベルを大きく超えた値を示した。   Furthermore, the room temperature resistance value of each PTC element sample when not operating was measured. As shown in the table of FIG. 5, the resistance values of Samples 21 to 24 and Samples 31 and 32 are 5 to 45 mΩ, which are advantageous for element miniaturization and lower power consumption of 50 mΩ or less. . However, the sample 33 showed a value far exceeding the practical level of 152 mΩ.

また、PTC素子試料毎に、動作/非動作状態変化を1回、100回、500回、1000回繰り返したときの動作温度(T、T100、T500、T1000)をそれぞれ測定した。より具体的には、図7に示すように、動作−非動作状態変化を1回、100回、500回、1000回おこなったときのPTC素子試料の温度−抵抗曲線を作成し、1×10Ωにおける温度を動作温度として測定した。なお、抵抗値については4端子法により測定した。そして、動作/非動作の状態変化を1回だけおこなったときの動作温度に対する、動作/非動作の状態変化を1000回繰り返した後の動作温度の変化率(動作温度変化率、(T−T1000)/T×100)をPTC素子試料毎に算出した。 For each PTC element sample, operating temperatures (T 1 , T 100 , T 500 , T 1000 ) were measured when the operating / non-operating state change was repeated once, 100 times, 500 times, and 1000 times. More specifically, as shown in FIG. 7, the temperature-resistance curve of the PTC element sample when the operation-non-operation state change is performed once, 100 times, 500 times, and 1000 times is created. the temperature was measured as the operating temperature in 2 Omega. The resistance value was measured by a four-terminal method. Then, the operating temperature change rate (operating temperature change rate, (T 1 −) after the operating / non-operating state change is repeated 1000 times with respect to the operating temperature when the operating / non-operating state change is performed only once. T 1000 ) / T 1 × 100) was calculated for each PTC element sample.

この動作温度変化率は、図5の表に示したとおり、試料21〜24及び試料33では、動作温度変化率の絶対値が20%以下であった。ただし、試料31,32は、動作温度変化率の絶対値がそれぞれ25.9%、30.9%と実用レベルを大きく超えた値を示した。なお、図8のグラフは、各PTC素子試料におけるピーク強度比I/I(図8のグラフの横軸、NiC/Niピーク強度比)と動作温度(図8のグラフの縦軸)との関係を示したグラフである。 As shown in the table of FIG. 5, the operating temperature change rate of Samples 21 to 24 and Sample 33 was 20% or less in absolute value of the operating temperature change rate. However, Samples 31 and 32 showed values of the operating temperature change rate of 25.9% and 30.9%, which exceeded the practical level, respectively. The graph of FIG. 8, the vertical axis of (the horizontal axis, Ni 3 C / Ni peak intensity ratio in the graph of FIG. 8) a graph of the operating temperature (Fig. 8 peak intensity ratio I A / I B of each PTC element samples It is the graph which showed the relationship with).

以上で示した実験結果から、加熱混練時に生成されるNiCの生成量が上記特定範囲内にあるPTC素子(試料21〜24)においては、動作−非動作の繰り返しにおける動作温度変化率が小さく、且つ、室温抵抗値が低い、信頼性の高いものとなっていることは明らかである。 From the experimental results shown above, in the PTC elements (samples 21 to 24) in which the amount of Ni 3 C produced during heating and kneading is within the specific range, the operating temperature change rate in repeated operation-non-operation is It is clear that it is small and has a low room temperature resistance value and high reliability.

本発明の実施形態に係るポリマーPTC素子を示した図である。It is the figure which showed the polymer PTC element which concerns on embodiment of this invention. 図1に示したポリマーPTC素子を作製する手順を示したフロー図である。It is the flowchart which showed the procedure which produces the polymer PTC element shown in FIG. NiCの生成モデルを示した図である。It is a diagram showing a generation model of Ni 3 C. 本発明の実施例に用いた各PTC素体試料の構成及び処理条件を示した表である。It is the table | surface which showed the structure and process conditions of each PTC element | base_body sample used for the Example of this invention. 図4に示した各試料から得られたPTC素子試料の測定結果を示した表である。It is the table | surface which showed the measurement result of the PTC element sample obtained from each sample shown in FIG. 本発明の実施例に係るポリマーPTC素体のX線回折結果を示した図である。It is the figure which showed the X-ray-diffraction result of the polymer PTC body based on the Example of this invention. 本発明の実施例に係る試料の温度−抵抗曲線を示した図である。It is the figure which showed the temperature-resistance curve of the sample which concerns on the Example of this invention. 図5に示した各PTC素子試料の測定結果を示すグラフである。It is a graph which shows the measurement result of each PTC element sample shown in FIG.

符号の説明Explanation of symbols

10…ポリマーPTC素子、12A,12B…電極、14…ポリマーPTC素体。   DESCRIPTION OF SYMBOLS 10 ... Polymer PTC element, 12A, 12B ... Electrode, 14 ... Polymer PTC element | base_body.

Claims (4)

熱可塑性樹脂とNi粉とが加熱混練されて作製され、且つ、X線回折角30〜60度の範囲内において、NiCの(002)面のピーク強度IのNiの(200)面のピーク強度Iに対する比(I/I)が0.0030〜0.0621の範囲内である、ポリマーPTC素体。 A thermoplastic resin and Ni powder produced is heated and kneaded, and, within the scope of X-ray diffraction angle 30 to 60 degrees, (200) of Ni peak intensity I A of (002) plane of the Ni 3 C surface the ratio of the peak intensity I B (I a / I B ) is in the range of 0.0030 to 0.0621, the polymer PTC element body. 前記熱可塑性樹脂が、高密度ポリエチレンと低密度ポリエチレンとを混合した混合ポリエチレンを含み、その混合の比率は、高密度ポリエチレンが5〜50wt%、低密度ポリエチレンが50〜95wt%である、請求項1記載のポリマーPTC素体。   The thermoplastic resin includes mixed polyethylene obtained by mixing high-density polyethylene and low-density polyethylene, and the mixing ratio is 5 to 50 wt% for high-density polyethylene and 50 to 95 wt% for low-density polyethylene. 1. The polymer PTC element body according to 1. 互いに対向する一対の電極と、前記一対の電極間に配置されたポリマーPTC素体とを備え、
前記ポリマーPTC素体は、熱可塑性樹脂とNi粉とが加熱混練されて作製され、且つ、X線回折角30〜60度の範囲内において、NiCの(002)面のピーク強度IのNiの(200)面のピーク強度Iに対する比(I/I)が0.0030〜0.0621の範囲内である、ポリマーPTC素子。
A pair of electrodes facing each other and a polymer PTC element body disposed between the pair of electrodes,
The polymer PTC body is prepared by heat-kneading a thermoplastic resin and Ni powder, and the peak intensity I A of the (002) plane of Ni 3 C within an X-ray diffraction angle range of 30 to 60 degrees. the ratio of the peak intensity I B of (200) plane of the Ni (I a / I B) is in the range of .0030 to .0621, the polymer PTC element.
前記熱可塑性樹脂が、高密度ポリエチレンと低密度ポリエチレンとを混合した混合ポリエチレンを含み、その混合の比率は、高密度ポリエチレンが5〜50wt%、低密度ポリエチレンが50〜95wt%である、請求項3記載のポリマーPTC素子。
The thermoplastic resin includes mixed polyethylene obtained by mixing high-density polyethylene and low-density polyethylene, and the mixing ratio is 5 to 50 wt% for high-density polyethylene and 50 to 95 wt% for low-density polyethylene. 3. The polymer PTC element according to 3.
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