JP4175511B2 - Photoconductor manufacturing equipment - Google Patents

Description

  The present invention relates to a photoreceptor manufacturing apparatus.

  Conventionally, a dip coating method is known as one of methods for producing an electrophotographic photosensitive member. This dip coating method is a method in which a coating solution is applied to the surface of a substrate by immersing the substrate of the photoreceptor in the coating solution and then pulling it up.

  In such a dip coating method, basically, a coating solution reservoir tank that holds the coating solution and a coating bath in which the substrate is actually immersed are connected by a pipe, and a coating tank and the coating are applied using a liquid feed pump or the like. The coating liquid is circulated in a main circulation path formed between the liquid reservoir tank.

  By the way, when a fast-drying solvent is used in the coating solution, the solvent evaporates during circulation of the coating solution, and the solid content in the coating solution tends to change. In such a state, since the film thickness applied to the substrate tends to increase, a diluting means for diluting the solid content in the coating solution to a predetermined amount is required.

  Conventionally, in addition to the main circulation path, a dilution circulation path through which a part of the coating liquid circulating in the main circulation path circulates is provided, and the dilution liquid held in the dilution tank or the like for the coating liquid in this dilution circulation path There is a technique of diluting a coating liquid whose solid content has changed by supplying a liquid (see, for example, Patent Documents 1 to 3).

  However, in these techniques, mixing of the coating solution before and after dilution may be insufficient, resulting in a difference in the solid content concentration distribution in the coating tank. As a result, the film applied to the substrate may be different. There is concern that the thickness will be disturbed.

  As a countermeasure, a viscometer is arranged in the circulation path for dilution, and the dilution liquid is supplied downstream of the viscometer in the circulation direction of the coating liquid, and the supplied dilution liquid and the coating liquid whose solid content has changed are statically mixed. There is a technique in which mixing is performed using a mixer or the like. These liquids can be mixed efficiently and uniformly by mixing the supplied diluted liquid and the coating liquid having a changed solid content by a static mixer.

  In such a technique, a measuring tank having a specified capacity and a rotor that rotates in the measuring tank are provided, and the measuring tank is filled with a liquid to be measured for viscosity. The viscosity is measured by measuring the resistance value applied to the rotor when the rotor is rotated.

Japanese Patent Laid-Open No. 9-197690 Japanese Patent No. 2708893 Japanese Patent No. 2658001

  By the way, the static mixer needs to feed the liquid to be mixed at a high speed from the principle of mixing. That is, a large amount of liquid is required.

  On the other hand, however, in the viscometer, if the flow rate in the viscometer exceeds a certain level due to the principle of viscosity measurement, the correct viscosity measurement cannot be performed.

  More specifically, resistance is generated in the static mixer when pressure is applied to the static mixer according to the high flow rate required by the static mixer. Since the viscometer having the above-described structure is provided on the upstream side in the circulation direction of the coating liquid in the circulation path for dilution, if resistance occurs in the static mixer, the circulation direction of the coating liquid in the circulation path for dilution is higher than in the circulation direction of the coating liquid. As a result, the coating liquid stays on the side, so that the flow rate in the viscometer exceeds the capacity of the measuring tank. That is, if the viscometer and the static mixer are sequentially arranged along the circulation direction of the coating liquid in the circulation path for dilution, an appropriate flow rate cannot be secured in the viscometer.

  The object of the present invention is to accurately measure the viscosity with a viscometer and to apply a coating liquid and a diluent with a static mixer even when a viscometer and a static mixer are arranged in parallel in a single circulation path for dilution. It is to perform mixing well.

  According to a first aspect of the present invention, there is provided a photosensitive member manufacturing apparatus comprising: a tank that holds a coating liquid; a main circulation path that circulates the coating liquid held by the tank in a predetermined path; and the coating liquid that the tank holds. A dilution circulation path that circulates through a path different from the path, a liquid feeding means that sends the coating liquid held in the tank to the dilution circulation path, and a dilution circulation path that is provided in the dilution circulation path. A viscometer for measuring the viscosity of the circulating coating liquid, a static mixer provided on the downstream side of the dilution circulation path from the viscometer along the circulation direction of the coating liquid in the dilution circulation path, and the viscosity A diluent supplying means for supplying a diluent having a viscosity lower than the viscosity of the coating solution between the meter and the static mixer, and measuring the viscosity of the coating solution with the viscosity meter . Before dilution and the ability ranges coating solution comprising a inflow amount adjusting means for adjusting the flow rate of the coating liquid in the dilution circulation path such that the mixing extent possible by the static mixer.

  Therefore, even when a viscometer and a static mixer are placed in parallel in a single dilution circulation path, both accurate viscosity measurement by the viscometer and mixing of the coating liquid and dilution liquid by the static mixer are performed together. It can be performed well.

  According to a second aspect of the present invention, in the photosensitive member manufacturing apparatus according to the first aspect, the inflow amount adjusting means makes the liquid feeding amount for measuring the viscosity of the coating liquid smaller than the liquid feeding amount for diluting the coating liquid. The liquid feeding means is controlled as described above.

  Therefore, it is possible to realize both the accurate viscosity measurement by the viscometer and the mixing of the coating liquid and the dilution liquid by the static mixer by adjusting the liquid feeding amount by the liquid feeding means.

  According to a third aspect of the present invention, in the photoreceptor manufacturing apparatus according to the first aspect, the bypass path communicated with the circulation path for dilution to bypass the viscometer, and the bypass circuit or the viscometer. Path selection means for selectively allowing the coating liquid to flow, and the inflow amount adjusting means flows the coating liquid into the viscometer when measuring the viscosity of the coating liquid and applies the coating liquid when diluting the coating liquid. Controls the route selection means so as to flow into the bypass route.

  Therefore, by changing the route through which the coating liquid circulates, it is possible to realize both the accurate viscosity measurement by the viscometer and the mixing of the coating liquid and the dilution liquid by the static mixer.

  According to a fourth aspect of the present invention, in the photoreceptor manufacturing apparatus according to the first aspect, the diluting solution supply unit includes a diluting tank that holds the diluting solution, the diluting tank, and the diluting circulation path. And a communication passage communicating between the static mixer and the inflow amount adjusting means includes a liquid level detecting means for detecting a liquid level position of the dilution liquid in the dilution tank, and a viscosity of the coating liquid. At the time of measurement, the amount of the coating liquid sent out by the liquid feeding means is adjusted according to the liquid level position of the diluent in the dilution tank.

  Therefore, it is possible to indirectly detect the amount of coating liquid upstream in the circulation direction of the coating liquid from the static mixer by detecting the liquid level position of the dilution liquid in the dilution tank, and perform accurate viscosity measurement with a viscometer. it can.

  According to a fifth aspect of the present invention, in the photosensitive member manufacturing apparatus according to the first aspect, the inflow amount adjusting means is higher in the vertical direction than the liquid level of the coating liquid in the tank, and the direction in which the coating liquid flows. The static mixer is arranged so that the upstream side is positioned vertically upward and the downstream side is positioned vertically downward.

  Therefore, since the allowable flow rate of the static mixer increases due to the weight of the coating liquid acting on the coating liquid flowing through the static mixer, the accurate viscosity measurement by the viscometer and the coating liquid by the static mixer can be performed without increasing the number of parts. Both mixing with the diluting solution can be performed satisfactorily.

  According to a sixth aspect of the present invention, in the photosensitive member manufacturing apparatus according to the first aspect, the static mixer has a different target flow rate and is applied at a position higher along the vertical direction than the liquid level of the coating liquid in the tank. A plurality of the inflow amount adjusting means are disposed in the dilution liquid circulation path so that the upstream side is positioned vertically upward and the downstream side is positioned vertically downward along the liquid flow direction. One static mixer is selectively communicated.

  Therefore, since the allowable flow rate of the static mixer increases due to the weight of the coating liquid acting on the coating liquid flowing through the static mixer, the accurate viscosity measurement by the viscometer and the coating liquid by the static mixer can be performed without increasing the number of parts. Produces both mixing with a diluting solution and using multiple types of coating solutions with different viscosities in a single photoconductor manufacturing device rather than using a photoconductor manufacturing device corresponding to each viscosity individually. The cost at the time can be reduced.

  According to the photoreceptor manufacturing apparatus of the first aspect of the present invention, even when a viscometer and a static mixer are arranged in parallel in a single circulation path for dilution, accurate viscosity measurement with a viscometer and static Both the application liquid and the diluting liquid can be mixed well by the mixer.

  According to a second aspect of the present invention, in the photoreceptor manufacturing apparatus according to the first aspect, an accurate viscosity measurement by a viscometer by adjusting a liquid feeding amount by a liquid feeding means, and a coating liquid and a diluting liquid by a static mixer And coexistence with mixing can be realized.

  According to a third aspect of the present invention, in the photosensitive member manufacturing apparatus according to the first aspect, the path through which the coating liquid circulates is changed to accurately measure the viscosity with a viscometer, and the coating liquid and dilution liquid with a static mixer. And coexistence with mixing can be realized.

  According to a fourth aspect of the present invention, in the photosensitive member manufacturing apparatus according to the first aspect, the coating liquid on the upstream side in the circulation direction of the coating liquid from the static mixer is detected by detecting the liquid level position of the dilution liquid in the dilution tank. The amount can be detected indirectly and an accurate viscosity measurement can be made with a viscometer.

  According to the fifth aspect of the present invention, in the photosensitive member manufacturing apparatus according to the first aspect, the allowable flow rate of the static mixer increases due to the weight of the coating liquid acting on the coating liquid flowing through the static mixer. Without being accompanied, accurate viscosity measurement with a viscometer and mixing of a coating liquid and a diluent with a static mixer can both be performed satisfactorily.

  According to the invention described in claim 6, in the photosensitive member manufacturing apparatus according to claim 1, the allowable flow rate of the static mixer is increased by the dead weight of the coating liquid acting on the coating liquid flowing through the static mixer. Without being accompanied, both accurate viscosity measurement with a viscometer and mixing of a coating solution and a diluent with a static mixer are performed well, and a plurality of types of coating solutions having different viscosities in a single photoconductor manufacturing apparatus. By using it, it is possible to reduce the manufacturing cost as compared with the case where the photosensitive member manufacturing apparatus corresponding to each viscosity is used individually.

  A first embodiment for carrying out the present invention will be described with reference to FIGS. 1 to 3. The present embodiment shows an application example to a photoreceptor manufacturing apparatus provided with a coating liquid circulation device.

  FIG. 1 is a schematic view showing a photoconductor manufacturing apparatus according to a first embodiment for carrying out the present invention. As shown in FIG. 1, the photoreceptor manufacturing apparatus 1 of the present embodiment includes a coating tank 3 that holds a coating solution and has an opening 2 in the upper part, and a photoreceptor substrate ( And a dipping device (not shown) for taking in and out (not shown). In the photoreceptor manufacturing apparatus 1 of the present embodiment, the substrate of the photoreceptor is immersed in the coating solution held in the coating tank 3, and then the substrate is pulled up from the coating solution, whereby the coating solution is applied to the substrate. Apply. A two-liquid reservoir tank 6 is connected to the coating tank 3 through a liquid feeding path 5. In the present embodiment, a tank for holding the coating liquid is realized by the two-liquid reservoir tank 6. The liquid supply path 5 is constituted by liquid supply pipes 5a and 5b, and a liquid supply pump 7 is provided between the liquid supply pipes 5a and 5b. The coating liquid held in the two-liquid reservoir tank 6 is supplied to the coating tank 3 via the liquid feed pump 7.

  A coating liquid recovery tank 8 that recovers the coating liquid overflowed from the opening 2 of the coating tank 3 is provided outside the coating tank 3. At the bottom of the coating liquid recovery tank 8, there is provided the other end of an overflow liquid recovery path 9 whose one end communicates with the two-liquid reservoir tank 6. As a result, the coating liquid overflowed from the opening 2 of the coating tank 3 is returned to the two-liquid reservoir tank 6.

  Here, a main circulation path 10 for circulating the coating liquid so as to pass through the two-liquid reservoir tank 6, the liquid feeding pump 7, and the coating tank 3 is formed.

  In addition to the main circulation path 10, the photoconductor manufacturing apparatus 1 of the present embodiment includes a dilution circulation path 11 for mixing a diluent with the coating liquid held in the two-liquid reservoir tank 6. In addition to the two-liquid reservoir tank 6, the dilution circulation path 11 includes a liquid feed pump 12 as a liquid feed means, a viscometer 13, a static mixer 14, and a dilution that holds a diluent to be replenished to the static mixer 14. And a tank 15.

  Although illustration and description are omitted because it is a known technique, the static mixer 14 includes a spiral flow path. The static mixer 14 rotates and mixes the two kinds of introduced liquids when they are sent out through the flow path. The flow path of the static mixer 14 is configured such that no air is present, whereby the two types of liquids that have passed through the flow path are mixed without air being mixed therein.

  The liquid feed pump 12, the viscometer 13, and the static mixer 14 in the dilution circulation path 11 are sequentially arranged along the liquid feed direction by the liquid feed pump 12. An electromagnetic valve 15 a is provided between the viscometer 13 and the static mixer 14 in the dilution circulation path 11. The dilution tank 15 described above is communicated with the dilution circulation path 11 via the electromagnetic valve 15a and the communication path 15b. The electromagnetic valve 15a is appropriately opened and closed as necessary by a control system (not shown), so that the diluent held in the dilution tank 15 can be introduced into the static mixer 14 as appropriate. Here, the function as the diluent supply means is realized.

  The dilution circulation path 11 branches from the dilution circulation path 11 on the upstream side of the viscometer 13 along the liquid feeding direction by the liquid feeding pump 12, and the viscometer 13 along the liquid feeding direction by the liquid feeding pump 12. A bypass path 16 that joins the dilution circulation path 11 is communicated with the downstream side.

  Solenoid valves 17 and 18 are provided at a branch point and a junction point between the dilution circulation path 11 and the bypass path 16, respectively. As with the electromagnetic valve 15a described above, the opening and closing operations of the electromagnetic valves 17 and 18 are controlled by a control system (not shown).

  The two-liquid reservoir tank 6 is provided with a stirrer 19 for agitating the coating liquid in the two-liquid reservoir tank 6. As a result, the viscosity (concentration) of the coating liquid in the two-liquid reservoir tank 6 can be made uniform throughout the two-liquid reservoir tank 6.

  Here, the viscometer 13 will be described with reference to FIG. As shown in FIG. 4, the viscometer 13 of the present embodiment includes a casing 20 that forms the outer shape of the viscometer 13, a measuring tank 21 provided inside the casing 20, and a fluid in the measuring tank 21. And a rotor 22 that rotates within the coating liquid (in the present embodiment). The other end of the liquid feeding path 5b described above communicates with the bottom of the measuring tank 21. The rotor 22 is provided with a rotation drive mechanism (not shown) that rotates the rotor 22 and a detection mechanism (not shown) that detects a load applied to the rotating rotor 22. The viscometer 13 rotates the rotor 22 in a state where the coating liquid is flowing from the two-liquid reservoir tank 6 into the measuring tank 21 by the liquid feed pump 12 and detects the load applied to the rotating rotor 22. The viscosity of the coating liquid in the measuring tank 21 is detected.

  An overflow opening 23 is provided in the upper part of the measurement tank 21. In the viscometer 13, when a coating liquid larger than the capacity of the measurement tank 21 flows into the measurement tank 21, the coating liquid more than the capacity overflows from the opening 23.

  One end of a rear path 24 through which the coating liquid overflowed from the measurement tank 21 flows is communicated with the housing 20 of the viscometer 13. The other end of the rear path 24 communicates with the electromagnetic valve 15a described above.

Here, in the photoreceptor manufacturing apparatus 1 of the present embodiment, when diluting the coating solution in the dilution circulation path 11, the electromagnetic valve 15 a is controlled so that the dilution tank 15 communicates with the dilution circulation path 11. The solenoid valves 17 and 18 are controlled so that the coating fluid does not flow into the viscometer 13 by opening the bypass path 16. Here, a part of the function as the route selection means is realized. In addition, the photoconductor manufacturing apparatus 1 according to the present embodiment controls the liquid feed pump 12 so as to increase the liquid feed amount when the coating liquid is diluted in the dilution circulation path 11. Here, a part of the function as the inflow rate adjusting means is realized. In the present embodiment, the amount of liquid fed by the liquid feed pump 12 when the coating liquid is diluted in the dilution circulation path 11 is set to 400 cm ³ / min. As a result, the diluent can be mixed with the coating liquid without flowing the coating liquid into the viscometer 13.

  By the way, as described above, in the static mixer 14, it is necessary to feed a liquid to be mixed at a high speed from the principle of mixing, while in the viscometer 13, the flow rate in the viscometer 13 is determined from the principle of viscosity measurement. When the pressure exceeds a certain level, correct viscosity measurement cannot be performed. Therefore, when pressure is applied to the static mixer 14 in accordance with the high flow rate required by the static mixer 14, resistance is generated in the static mixer 14, and FIG. ), The flow rate in the viscometer 13 provided on the upstream side in the circulation direction of the coating liquid in the dilution circulation path 11 exceeds the capacity of the measurement tank 21. For this reason, in the conventional photoreceptor manufacturing apparatus 1, if the viscometer 13 and the static mixer 14 are sequentially arranged in the circulation path 11 for dilution along the circulation direction of the coating solution, the viscometer 13 is appropriate. A large flow rate cannot be ensured.

  In contrast, the photoconductor manufacturing apparatus 1 of the present embodiment controls the electromagnetic valve 15a so that the dilution tank 15 and the dilution circulation path 11 are closed when measuring the viscosity of the coating liquid in the dilution circulation path 11. In addition, the solenoid valves 17 and 18 are controlled so as to close the bypass path 16. Here, a part of the function as the route selection means is realized. As a result, all of the coating liquid that has flowed into the dilution circulation path 11 from the two-liquid reservoir tank 6 flows into the viscometer 13. In addition, the photoconductor manufacturing apparatus 1 of the present embodiment controls the rotation speed of the liquid feeding pump 12 so that the liquid level of the viscometer does not rise more than necessary when measuring the viscosity of the coating solution in the circulation path 11 for dilution. . Here, a part of the function as the inflow rate adjusting means is realized.

Thereby, as shown in FIG.3 (b), the capacity | capacitance of the coating liquid in the tank 21 for a measurement of the viscometer 13 can be made into the capacity | capacitance suitable for a viscosity measurement, and a viscosity measurement can be performed correctly. In the present embodiment, the amount of rotation of the liquid feeding pump 12 is adjusted so that the amount of liquid fed by the liquid feeding pump 12 when measuring the viscosity of the coating solution in the circulation path 11 for dilution is 100 cm ³ / min.

  Thereby, even when the viscometer 13 and the static mixer 14 are provided in parallel in the dilution circulation path 11, the coating solution and the diluent can be mixed well and the viscosity can be accurately measured.

  Next, a second embodiment of the present invention will be described with reference to FIG. Note that the same parts as those of the first embodiment are denoted by the same reference numerals, and description thereof is also omitted. The same shall apply hereinafter.

  FIG. 4 is a schematic view showing a photoconductor manufacturing apparatus according to the second embodiment of the present invention. As shown in FIG. 4, the photoconductor manufacturing apparatus 30 of the present embodiment does not have the bypass path 16 and the electromagnetic valves 17 and 18 in the photoconductor manufacturing apparatus 1 shown in FIG. A liquid level sensor 31 for detecting the liquid level is provided.

  The output of the liquid level sensor 31 changes according to the height of the liquid level of the coating liquid in the viscometer 13. The structure of the liquid level sensor 31 whose output changes depending on the height of the liquid level of the coating liquid in the viscometer 13 can be realized by using various known techniques, but will not be described here. The surface sensor 31 is connected to a control system, and an output from the liquid level sensor 31 corresponding to the level of the coating liquid in the viscometer 13 is input to the control system.

  The control system adjusts the pumping amount of the pump in accordance with the output change from the liquid level sensor 31 when measuring the viscosity, which will be described later.

  In the photoreceptor manufacturing apparatus 30 of the present embodiment, the liquid level in the viscometer 13 is monitored during the operation of the static mixer 14 during dilution, and it is detected that the liquid level in the viscometer 13 is higher than a specified value. In such a case, control is performed so that the rotation speed of the liquid feed pump 12 is lowered. As a result, the amount of the coating liquid fed into the viscometer 13 by the liquid feeding pump 12 is reduced, so that the liquid level of the coating liquid in the viscometer 13 can be lowered.

  On the other hand, when it is detected that the liquid level in the viscometer 13 is lower than the specified value, control is performed so that the rotation speed of the liquid feed pump 12 is increased. As a result, the amount of the coating liquid fed into the viscometer 13 by the liquid feeding pump 12 increases, so that the liquid level of the coating liquid in the viscometer 13 can be raised.

  As described above, according to the photoreceptor manufacturing apparatus 30 of the present embodiment, the level of the coating liquid in the viscometer 13 can be adjusted according to the detection result of the liquid level sensor 31. Here, the function as the inflow amount adjusting means is realized. As a result, the viscosity can always be measured correctly.

  Note that the liquid level adjustment according to the detection result of the liquid level sensor 31 is not limited to the constant level adjustment, and may be performed only at the time of viscosity measurement, for example.

  Next, a third embodiment of the present invention will be described with reference to FIG.

  FIG. 5 is a schematic view showing a photoconductor manufacturing apparatus according to the third embodiment of the present invention. As shown in FIG. 5, in the photoconductor manufacturing apparatus 40 of the present embodiment, the static mixer 14 is provided at a position higher than the liquid level of the coating liquid in the two-liquid reservoir tank 6, the bypass path 16 and The point from which the solenoid valves 17 and 18 are not provided differs from 1st Embodiment.

  The static mixer 14 is provided such that the upstream side is positioned on the upper side in the vertical direction and the downstream side is positioned on the lower side in the vertical direction along the flow direction of the coating liquid in the flow path. For this reason, in the photoreceptor manufacturing apparatus 40 of the present embodiment, a downward force in the vertical direction acts on the liquid mixed in the flow path of the static mixer due to the weight of the liquid itself. Thereby, the liquid feeding resistance in the static mixer 14 can be reduced. Here, the function as the inflow amount adjusting means is realized.

In the photoreceptor manufacturing apparatus 40 of the present embodiment, even when the liquid feeding amount by the liquid feeding pump 12 is increased to 400 cm ³ / min, the liquid level of the coating liquid in the viscometer 13 is increased (for measurement). Overflow from tank 21) was not observed.

  Thus, even when the viscometer 13 and the static mixer 14 are provided in the dilution circulation path 11 in order from the upstream side along the circulation direction of the coating liquid, the viscometer is not accompanied by an increase in the number of parts. While the viscosity of the coating solution is accurately measured by 13, the diluent can be mixed with this coating solution.

  Next, a fourth embodiment of the present invention will be described with reference to FIG.

  FIG. 6 is a schematic view showing a photoconductor manufacturing apparatus according to the fourth embodiment of the present invention. As shown in FIG. 6, the photoreceptor manufacturing apparatus 50 according to the present embodiment includes a plurality of static mixers 51, 52, and 53. Each of the static mixers 51, 52, 53 is provided so that each flow path is parallel (or substantially parallel) to the vertical direction. Further, each of the static mixers 51, 52, 53 is provided such that the upstream side is positioned on the upper side in the vertical direction and the downstream side is positioned on the lower side in the vertical direction along the flow direction of the coating liquid in the flow path. The static mixers 51, 52, and 53 have different flow rates of coating liquids that can be mixed.

  Each of the static mixers 51, 52, 53 is provided with electromagnetic valves 54, 55, 56 that are controlled to be opened and closed by a control system (not shown). The electromagnetic valves 34, 55, and 56 are configured so that the viscometer 13 and the two-liquid reservoir tank 6 communicate with each other via any one of the plurality of static mixers 51, 52, and 53. The opening and closing of the control system is driven and controlled. This makes it possible to vary the flow rate range (target flow rate range) of the coating liquid that can be mixed between the viscometer 13 and the two-liquid reservoir tank 6. Here, the function as the inflow amount adjusting means is realized.

  The control system is configured so that the flow rate can be adjusted while the coating liquid passing through the viscometer 13 reaches the two-liquid reservoir tank 6 via any one of the static mixers 51, 52 or 53. The open / close state of the electromagnetic valves 54, 55, 56 is controlled in accordance with the type of coating liquid.

  By adopting such a configuration, the open / close state of the electromagnetic valves 54, 55, 56 is controlled so that any one of the electromagnetic valves 54, 55, or 56 is selectively opened, whereby the coating solution Since the optimum static mixer 51, 52 or 53 can be selected according to the type, dilution of a plurality of types of coating solutions and accurate viscosity measurement can be performed in a single photoconductor manufacturing apparatus 50. That is, even when a large number of types of coating liquids are used in practice, the single photoconductor manufacturing apparatus 50 can cope with the cost reduction in manufacturing a photoconductor even when a plurality of types of coating liquids are used. Can be achieved.

  Next, examples of the present invention will be described with reference to Table 1. Table 1 shows the evaluation of the uniformity of the coating liquid after mixing the diluting liquid in each apparatus according to the presence or absence of the viscometer 13, the presence or absence of the circulation path for dilution, the presence or absence of the static mixer, and the like.

  In addition, the method described in patent documents 1-3 was used as a prior art.

  As can be seen from Table 1, it is understood that the uniformity of the coating solution is ensured in the coating solution diluted using the photoconductor manufacturing apparatus according to various embodiments of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing a photoreceptor manufacturing apparatus according to a first embodiment for carrying out the present invention. It is the schematic which shows a viscometer. It is the schematic explaining the inflow state of the coating liquid in a viscosity measurement, and a suitable measurement state. It is the schematic which shows the photoreceptor manufacturing apparatus of the 2nd Embodiment of this invention. It is the schematic which shows the photoreceptor manufacturing apparatus of the 3rd Embodiment of this invention. It is the schematic which shows the photoreceptor manufacturing apparatus of the 4th Embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Photoconductor manufacturing apparatus 6 Tank 10 Main circulation path 11 Dilution circulation path 12 Liquid feeding means 13 Viscometer 14 Static mixer 15 Dilution tank 15b Communication path 16 Bypass path 30 Photoconductor manufacturing apparatus 31 Liquid level detection means 40 Photoconductor manufacturing apparatus 50 Photoconductor manufacturing equipment

Claims (6)

A tank for holding the coating solution;
A main circulation path for circulating the coating liquid held by the tank in a predetermined path;
A dilution circulation path for circulating the coating liquid held by the tank through a path different from the main circulation path;
A liquid feeding means for feeding the coating liquid held by the tank to the circulation path for dilution;
A viscometer that is provided in the dilution circulation path and measures the viscosity of the coating liquid circulating in the dilution circulation path;
A static mixer provided on the downstream side of the circulation path for dilution from the viscometer along the circulation direction of the coating liquid in the circulation path for dilution;
A diluent supply means for supplying a diluent having a viscosity lower than the viscosity of the coating solution between the viscometer and the static mixer;
When measuring the viscosity of the coating solution, the flow rate of the coating solution in the circulation path for dilution is adjusted so that the viscosity can be measured by the viscometer, and the coating solution can be mixed by the static mixer when the coating solution is diluted. Inflow adjustment means;
A photoreceptor manufacturing apparatus comprising:   The photosensitive member manufacturing apparatus according to claim 1, wherein the inflow amount adjusting unit controls the liquid feeding unit so that a liquid feeding amount at the time of measuring the viscosity of the coating liquid is smaller than a liquid feeding amount at the time of dilution of the coating liquid. A bypass path communicated to bypass the viscometer with respect to the dilution circulation path;
Path selection means for selectively allowing a coating liquid to flow into the bypass circuit or the viscometer;
Comprising
2. The flow rate adjusting means controls the path selection means so that the coating liquid flows into the viscometer when measuring the viscosity of the coating liquid and the coating liquid flows into the bypass path when the coating liquid is diluted. The photoreceptor manufacturing apparatus according to claim. The diluent supply means has a dilution tank that holds the diluent, and a communication path that connects the dilution tank and the dilution circulation path between the viscometer and the static mixer,
The inflow amount adjusting means has a liquid level detecting means for detecting a liquid level position of the dilution liquid in the dilution tank. When measuring the viscosity of the coating liquid, the inflow amount adjusting means is arranged according to the liquid level position of the dilution liquid in the dilution tank. 2. The photosensitive member manufacturing apparatus according to claim 1, wherein the amount of the coating liquid sent out by the liquid means is adjusted.   The inflow amount adjusting means is located at a position higher along the vertical direction than the liquid surface of the coating liquid in the tank, and the upstream side is positioned above the vertical direction along the flowing direction of the coating liquid, and the downstream side is positioned below the vertical direction. The photoconductor manufacturing apparatus according to claim 1, wherein the static mixer is disposed so as to be positioned on the surface. The static mixers have different target flow rates, and are positioned higher in the vertical direction than the liquid level of the coating liquid in the tank, and the upstream side is positioned in the vertical direction along the direction in which the coating liquid flows, and the downstream side A plurality are arranged so as to be positioned on the lower side in the vertical direction,
The photoconductor manufacturing apparatus according to claim 1, wherein the inflow amount adjusting unit selectively communicates any one of the static mixers in the diluent circulation path.

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