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JP4175724B2 - Method for manufacturing substrate for photovoltaic device - Google Patents
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JP4175724B2 - Method for manufacturing substrate for photovoltaic device - Google Patents

Method for manufacturing substrate for photovoltaic device Download PDF

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Publication number
JP4175724B2
JP4175724B2 JP08926399A JP8926399A JP4175724B2 JP 4175724 B2 JP4175724 B2 JP 4175724B2 JP 08926399 A JP08926399 A JP 08926399A JP 8926399 A JP8926399 A JP 8926399A JP 4175724 B2 JP4175724 B2 JP 4175724B2
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Japan
Prior art keywords
substrate
insulating
view
surface side
portions
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JP08926399A
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JP2000286433A (en
Inventor
雅之 大東
昌佳 前羽
雅夫 釣
佳典 海道
敏宏 野村
良信 高畠
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Sanyo Electric Co Ltd
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Sanyo Electric Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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Description

【0001】
【発明の属する技術分野】
本発明は、出力を基板の裏面側に取り出すための光起電力装置用基板の製造方法に関する。
【0002】
【従来の技術】
従来において、出力を基板の裏面側に取り出すための光起電力装置用基板の製造方法が、特開平10−93119号公報の第3実施例として、この公報の図11〜17に開示されている。この製造方法においては、出力を金属基板の裏面側に取り出すためにプレス加工法を用いて金属基板に開口を設けている。そして、このプレス時に発生する突起状のバリを埋めるように絶縁膜を配置し、この絶縁部材上に導電膜を配置して、出力を基板表面から裏面に導出している。このように、上記絶縁膜により、金属基板の突起状のバリが導電膜と接触して短絡することを防止していた。
【0003】
【発明が解決しようとする課題】
この従来の製造方法又は構造には、以下の問題点があった。図11は、この問題点を説明する要部断面図である。図において、21はその表面全域に絶縁膜22を形成した金属基板で、開口23の周囲にはプレス加工時に発生したバリ23bが存在する。24、25は、基板21の表面側、裏面側よりスクリーン印刷法により配置した絶縁膜であり、開口23内の側壁にも絶縁膜を配置することができる。なお、この開口23内の側壁にスクリーン印刷法により絶縁膜を配置する方法は、上記公報の段落番号25に詳細に説明されている。
【0004】
この従来の製造方法又は構造においては、実際に形成される絶縁膜の膜厚が、開口23の端部、即ち、バリ23bの部分では、薄くなり、バリ23bが大きい場合には、絶縁膜25の表面より、バリ23bの先端が出る。そして、この絶縁膜上に出力を取り出す導電膜26を形成すると、この導電膜と金属基板が短絡状態となり、正常に出力を取り出すことができない。
【0005】
本発明はこのような問題点を解決するために成されたものであり、バリが発生した金属基板であっても、基板と短絡することなく、裏面側に出力が取り出せる光起電力装置用基板及びその製造方法を提供することを目的とする。
【0006】
【課題を解決するための手段】
本発明の構成は、金属基板にプレス加工法により穴又は切欠状の抜き部を設ける工程と、前記抜き部を埋める絶縁部材を配置する工程と、前記抜き部を埋める絶縁部材に、前記基板の表面側から裏面側に至る開口を設ける工程と、前記基板の表面側から、前記開口の側壁を通って、前記基板の裏面側に至る導電膜を前記絶縁部材上に配置する工程とを有することを特徴とする。
【0007】
【発明の実施の形態】
本発明の第1実施例を、図1〜7を用いて詳細に説明する。
【0008】
図1に示す工程において、まず、略矩形状でステンレス等の金属基板1(厚さ0.1〜0.5mm)上に、酸化シリコン又はポリイミド樹脂等の絶縁膜2(膜厚約10〜60μm)を形成する。次に、基板1の表面側(絶縁膜2側)より裏面側に打ち抜くプレス加工法を用いて、金属基板1の左下及び右下コーナー近傍に、円形の抜き部3a、3d(直径約0.7〜1.0mm)を設ける。ここで、図1(b)及び(c)に示すように、基板1の切断箇所には、基板1裏面より約10〜30μm程度の突起したバリ3ab、3dbが形成されてしまう。また、ここでは円形の抜き部3a、3dを設けているが、基板1の外周端に設けられた切欠状の抜き部であってもよい。
【0009】
次に、図2に示す工程においては、基板1側から順番に金属電極層、アモルファスシリコン等の半導体光活性層、透明電極層からなる略矩形状の光起電力素子A〜Dが形成される。これら光起電力素子A〜Dは、基板1の長手方向に沿って隣接して配置され、図示されていないが、例えば、特公昭58−21827号公報に開示される構造にて、各々が光起電力素子A〜Dの順に直列接続されている。加えて、光起電力素子A、Dの電極層より延出する出力端子Aa、Ddが、形成される。
【0010】
次に、図3に示す工程においては、基板1表面側より、抜き部3a、3dの外周部上及び内部に、絶縁部材4a、4d(膜厚約30〜60μm)を配置する。この形成方法は、基板1表面側より、スクリーン印刷法を用いて、未硬化のUV硬化樹脂等の絶縁部材4a、4dを、抜き部3a、3dの外周部上及びそれらの内部に印刷し、その後、UV光を照射することにより硬化させるものである。このとき、抜き部3a、3dの直径が、上記のように約0.7〜1.0mmであり、比較的小さいので、スクリーン印刷法にて、抜き部3a、3dの外周部上及び内部に、未硬化の樹脂を印刷し、硬化させることにより、抜き部3a、3dの内部にも絶縁部材4a、4dが配置、充てんされることになる。
【0011】
次に、図4に示す工程においては、替わって基板1裏面側より、抜き部3a、3dの外周部上及び抜き部3a、3d内の絶縁部材4a、4d上に、絶縁部材5a、5d(膜厚約30〜60μm)を配置する。この形成方法は、スクリーン印刷法を用いて、未硬化のUV硬化樹脂等の絶縁部材5a、5dを、印刷の後、UV光を照射することにより硬化させるものである。図示されるように、基板1裏面側に形成された絶縁部材5a、5dは、抜き部3a、3dに比較して、大面積の略矩形である。
【0012】
ここで、抜き部3a、3d内に絶縁部材4a、4dが充てんされ、絶縁部材4a、4d上に絶縁部材5a、5dを配置している。従って、従来で問題のあったような、抜き部3a、3dの端部で絶縁膜が薄くなり、バリの先端が絶縁膜を貫通するということがない。
【0013】
次に、図5に示す工程においては、YAGレーザ等のレーザ光を、抜き部3a、3dの中心部に位置する絶縁部材4a、5a、4d、5dに照射することにより、開口6a、6d(直径約10〜500μm)を形成する。なお、開口の直径が約100μm以下の場合は、レーザ光をスポット状に照射して開口を設け、また、開口の直径が約100μm以上になる場合には、レーザ光を円周上に走査することにより開口を設ける。
【0014】
次に、図6に示す工程では、基板1表面側に、開口6a、6dを埋め出力端子Aa、Ddに至る導電膜7a、7dを形成する。この形成方法は、スクリーン印刷法が用いられ、ポリイミド又はフェノール系のバインダーに銀、ニッケル、アルミニウム、銅又はカーボン等の粉末(粒径約3〜7μm)を含むもので、スクリーン印刷によりパタ−ニングされた後、150℃で熱硬化され、厚さ約10〜50μmに形成される。
【0015】
図7に示す工程では、替わって基板1裏面側において、絶縁部材5a、5d上及び開口6a、6d内の導電膜7a、7d上に、導電膜8a、8dを形成する。これにより、出力端子Aa、Ddと導電膜8a、8dが導通状態になり、光起電力装置が完成する。導電膜8a、8dの形成方法、材質は、導電膜7a、7dと同様である。そして、これら導電膜8a、8dの形状は、大面積の略矩形状であるので、別途用意されるリード部材(図示なし)を容易に接続することができる。ここで、導電膜8a、8dにおいて、導電性を優先させて粉末に金属材料を用いる場合、基板1裏面上において金属粉末が外気にさらされその表面が腐食することを防止するために、導電膜8a、8d上に腐食に強いカーボン粉末を含むカーボンペーストを形成してもよい(図示なし)。また、導電膜8a、8dの形状は、基板1の裏面側であるので、任意の形状を採用できる。
【0016】
ここで、抜き部3a、3d内に絶縁部材4a、4dが充てんされ、絶縁部材4a、4d上に絶縁部材5a、5dを配置している。従って、従来で問題のあったような、抜き部3a、3dの端部で絶縁膜が薄くなり、バリの先端が絶縁膜を貫通するということがない。従って、絶縁膜に開口6a、6dを設けて、基板1の表面側から、開口6a、6dの側壁を通って、裏面側に至る導電膜を配置しても、この導電膜が基板と導通することがなく、出力を正常に取り出すことができる。
【0017】
次に、本実施例の光起電力装置と、図11に開示される従来の光起電力装置にて、出力端子と基板との短絡状態を調査した。その結果、本実施例においては、短絡が一切発生しなかったのに対して、従来品においては78%の短絡が発生した。これにより、本実施例においては、確実に、出力端子と基板との短絡が防止できたことが確認できた。
【0018】
次に、本発明の第2実施例を、図8〜10を用いて詳細に説明する。図8に示す工程において、まず、略矩形状でステンレス等の金属基板11(厚さ0.1〜0.5mm)の表面側より裏面側に打ち抜くプレス加工法を用いて、金属基板1の左下及び右下コーナー近傍に、円形の抜き部13a、13d(直径約0.7〜1.0mm)を設ける。ここで、図8(b)及び(c)に示すように、基板11の切断箇所には、基板11裏面より約10〜30μm程度の突起したバリ13ab、13dbが形成されてしまう。また、ここでは円形の抜き部13a、13dを設けているが、基板11の外周端に設けられた切欠状の抜き部であってもよい。
【0019】
次に、図9に示す工程においては、基板11表面上に絶縁部材として絶縁膜12S(膜厚約30〜60μm)、基板11裏面上に絶縁部材としての絶縁膜12R(膜厚約30〜60μm)を配置する。これら絶縁膜の形成方法は、ポリイミド膜の母材であるワニスを、スピンコータ又はロールコータ等で均一に塗布し、100〜300℃まで段階的に昇温しながら処理することにより形成するものである。また、ワニスをコートするときに、基板11の抜き部13a、13b内部においてもワニスが入り込み、加熱処理の後、図9に示すように、抜き部13a、13b内部にも、絶縁膜が充てん、配置される。従って、従来で問題のあったような、抜き部13a、13dの端部で絶縁膜が薄くなり、バリの先端が絶縁膜を貫通するということがない。
【0020】
次に、第1実施例における絶縁部材4a、4d、5a、5dを配置せず、第1実施例の図2、5〜7と同じ工程を用いることにより、図10に示すように、第2実施例における光起電力装置を完成する。以下、第1実施例と同じ製造方法、構造のものは、同じ名称、符号を用いて、説明を省略する。
【0021】
第2実施例も、第1実施例と同様に、抜き部13a、13d内に絶縁膜12A、12Rである絶縁部材が充てんされている。従って、従来で問題のあったような、抜き部13a、13dの端部で絶縁膜が薄くなり、バリの先端が絶縁膜を貫通するということがない。従って、絶縁膜に開口6a、6dを設けて、基板11の表面側から、開口6a、6dの側壁を通って、裏面側に至る導電膜を配置しても、この導電膜が基板と導通することがなく、出力を正常に取り出すことができる。
【0022】
【発明の効果】
本発明は、金属基板にプレス加工法により穴又は切欠状の抜き部を設ける工程と、抜き部を埋める絶縁部材を配置する工程と、抜き部を埋める絶縁部材に、基板の表面側から裏面側に至る開口を設ける工程とを備えることにより、抜き部の端部で絶縁部材が薄くなることがなく、従って、抜き部の端部でプレス加工時に発生したバリが絶縁部材を貫通することがない。よって、その後の工程で、基板の表面側から開口の側壁を通って裏面側に至る導電膜を配置しても、この導電膜が基板と導通することがない。
【図面の簡単な説明】
【図1】本発明の第1実施例の第1工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図である。
【図2】本発明の第1実施例の第2工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図である。
【図3】本発明の第1実施例の第3工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図である。
【図4】本発明の第1実施例の第4工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図、(d)は底面図である。
【図5】本発明の第1実施例の第5工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図、(d)は底面図である。
【図6】本発明の第1実施例の第6工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図である。
【図7】本発明の第1実施例の第7工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図、(d)は底面図である。
【図8】本発明の第2実施例の第1工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図である。
【図9】本発明の第2実施例の第2工程を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図である。
【図10】本発明の第2実施例の完成図を示し、(a)は平面図、(b)は(a)におけるA−A拡大断面図、(c)はB―B拡大断面図、(d)は底面図である。
【図11】従来の光起電力装置用基板を示す要部断面図である。
【符号の説明】
1、11 金属基板
3a、3d、13a、13d 抜き部
4a、4d、5a、5d 絶縁部材
6a、6d 開口
7a、7d、8a、8d 導電膜
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for manufacturing a substrate for a photovoltaic device for extracting output to the back side of the substrate.
[0002]
[Prior art]
Conventionally, a method for manufacturing a substrate for a photovoltaic device for taking out the output to the back side of the substrate is disclosed as a third embodiment of Japanese Patent Laid-Open No. 10-93119 in FIGS. . In this manufacturing method, an opening is provided in the metal substrate using a press working method in order to extract the output to the back side of the metal substrate. Then, an insulating film is disposed so as to fill the protruding burrs generated at the time of pressing, and a conductive film is disposed on the insulating member, and the output is led out from the substrate surface to the back surface. Thus, the insulating film prevents the protruding burrs of the metal substrate from coming into contact with the conductive film and short-circuiting.
[0003]
[Problems to be solved by the invention]
This conventional manufacturing method or structure has the following problems. FIG. 11 is a cross-sectional view of an essential part for explaining this problem. In the figure, reference numeral 21 denotes a metal substrate having an insulating film 22 formed on the entire surface thereof, and there are burrs 23b generated during press working around the opening 23. Reference numerals 24 and 25 denote insulating films arranged by screen printing from the front surface side and the back surface side of the substrate 21, and the insulating films can also be arranged on the side walls in the opening 23. A method for disposing an insulating film on the side wall in the opening 23 by screen printing is described in detail in paragraph 25 of the above publication.
[0004]
In this conventional manufacturing method or structure, the thickness of the insulating film that is actually formed is thin at the end of the opening 23, that is, at the portion of the burr 23b. The tip of the burr 23b comes out from the surface. When the conductive film 26 for extracting output is formed on the insulating film, the conductive film and the metal substrate are short-circuited, and the output cannot be normally extracted.
[0005]
The present invention has been made to solve such problems, and even a metal substrate with burrs can be output to the back side without being short-circuited with the substrate. And it aims at providing the manufacturing method.
[0006]
[Means for Solving the Problems]
The structure of the present invention includes a step of providing a hole or a notch-shaped punched portion in a metal substrate by a pressing method, a step of disposing an insulating member that fills the punched portion, and an insulating member that fills the punched portion. Providing an opening from the front surface side to the back surface side, and disposing a conductive film extending from the front surface side of the substrate through the side wall of the opening to the back surface side of the substrate on the insulating member. It is characterized by.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
A first embodiment of the present invention will be described in detail with reference to FIGS.
[0008]
In the process shown in FIG. 1, first, an insulating film 2 (film thickness of about 10 to 60 μm) such as silicon oxide or polyimide resin is formed on a metal substrate 1 (thickness 0.1 to 0.5 mm) made of stainless steel or the like in a substantially rectangular shape. ). Next, circular punched portions 3a and 3d (with a diameter of about 0.1 mm) are formed in the vicinity of the lower left and lower right corners of the metal substrate 1 using a pressing method in which the substrate 1 is punched from the front surface side (insulating film 2 side) to the back surface side. 7 to 1.0 mm). Here, as shown in FIGS. 1B and 1C, burrs 3 ab and 3 db protruding about 10 to 30 μm from the back surface of the substrate 1 are formed at the cut portion of the substrate 1. In addition, the circular punched portions 3 a and 3 d are provided here, but a cutout-shaped punched portion provided at the outer peripheral end of the substrate 1 may be used.
[0009]
Next, in the process shown in FIG. 2, substantially rectangular photovoltaic elements A to D each including a metal electrode layer, a semiconductor photoactive layer such as amorphous silicon, and a transparent electrode layer are sequentially formed from the substrate 1 side. . These photovoltaic elements A to D are arranged adjacent to each other along the longitudinal direction of the substrate 1 and are not shown. For example, each of the photovoltaic elements A to D has a structure disclosed in Japanese Patent Publication No. 58-21827. The electromotive force elements A to D are connected in series. In addition, output terminals Aa and Dd extending from the electrode layers of the photovoltaic elements A and D are formed.
[0010]
Next, in the process shown in FIG. 3, insulating members 4 a and 4 d (film thickness of about 30 to 60 μm) are disposed on the outer peripheral portions and inside of the extraction portions 3 a and 3 d from the surface of the substrate 1. This forming method uses the screen printing method from the surface side of the substrate 1 to print the insulating members 4a and 4d such as uncured UV curable resin on the outer peripheral portions of the punched portions 3a and 3d and inside thereof. Then, it hardens | cures by irradiating UV light. At this time, the diameter of the cutout portions 3a and 3d is about 0.7 to 1.0 mm as described above, and is relatively small. By printing and curing an uncured resin, the insulating members 4a and 4d are also arranged and filled in the inside of the extraction portions 3a and 3d.
[0011]
Next, in the process shown in FIG. 4, instead of the back side of the substrate 1, the insulating members 5a, 5d (on the outer peripheral portions of the punched portions 3a, 3d and on the insulating members 4a, 4d in the punched portions 3a, 3d ( A film thickness of about 30 to 60 μm is disposed. This forming method is to cure the insulating members 5a and 5d such as an uncured UV curable resin by irradiating with UV light after printing using a screen printing method. As illustrated, the insulating members 5a and 5d formed on the back surface side of the substrate 1 are substantially rectangular with a large area as compared with the punched portions 3a and 3d.
[0012]
Here, the insulating members 4a and 4d are filled in the extracted portions 3a and 3d, and the insulating members 5a and 5d are disposed on the insulating members 4a and 4d. Therefore, the insulating film is not thinned at the end portions of the extraction portions 3a and 3d, which has a problem in the past, and the tip of the burr does not penetrate the insulating film.
[0013]
Next, in the process shown in FIG. 5, by irradiating the insulating members 4a, 5a, 4d, and 5d positioned at the center of the extraction portions 3a and 3d with a laser beam such as a YAG laser, the openings 6a and 6d ( About 10 to 500 μm in diameter). When the diameter of the opening is about 100 μm or less, a laser beam is irradiated in a spot shape to provide the opening. When the diameter of the opening is about 100 μm or more, the laser light is scanned on the circumference. To provide an opening.
[0014]
Next, in the process shown in FIG. 6, conductive films 7 a and 7 d that fill the openings 6 a and 6 d and reach the output terminals Aa and Dd are formed on the surface of the substrate 1. This forming method uses a screen printing method, and contains powder (particle size: about 3 to 7 μm) such as silver, nickel, aluminum, copper, or carbon in a polyimide or phenol binder, and is patterned by screen printing. Then, it is heat-cured at 150 ° C. to form a thickness of about 10 to 50 μm.
[0015]
In the step shown in FIG. 7, instead, on the back side of the substrate 1, conductive films 8 a and 8 d are formed on the insulating members 5 a and 5 d and on the conductive films 7 a and 7 d in the openings 6 a and 6 d. As a result, the output terminals Aa and Dd and the conductive films 8a and 8d are brought into conduction, and the photovoltaic device is completed. The formation method and material of the conductive films 8a and 8d are the same as those of the conductive films 7a and 7d. And since the shape of these electrically conductive films 8a and 8d is a substantially rectangular shape with a large area, a separately prepared lead member (not shown) can be easily connected. Here, in the conductive films 8a and 8d, in the case where a metal material is used for the powder with priority on conductivity, the conductive film is used to prevent the metal powder from being exposed to the outside air and corroding its surface on the back surface of the substrate 1. A carbon paste containing carbon powder resistant to corrosion may be formed on 8a and 8d (not shown). Moreover, since the shape of the conductive films 8a and 8d is the back side of the substrate 1, any shape can be adopted.
[0016]
Here, the insulating members 4a and 4d are filled in the extracted portions 3a and 3d, and the insulating members 5a and 5d are disposed on the insulating members 4a and 4d. Therefore, the insulating film is not thinned at the end portions of the extraction portions 3a and 3d, which has a problem in the past, and the tip of the burr does not penetrate the insulating film. Therefore, even if openings 6a and 6d are provided in the insulating film and a conductive film is disposed from the front surface side of the substrate 1 through the side walls of the openings 6a and 6d to the back surface side, the conductive film is electrically connected to the substrate. The output can be taken out normally.
[0017]
Next, the short-circuit state between the output terminal and the substrate was investigated using the photovoltaic device of this example and the conventional photovoltaic device disclosed in FIG. As a result, in the present example, no short circuit occurred at all, whereas in the conventional product, a 78% short circuit occurred. Thereby, in the present Example, it has confirmed that the short circuit with an output terminal and a board | substrate could be prevented reliably.
[0018]
Next, a second embodiment of the present invention will be described in detail with reference to FIGS. In the process shown in FIG. 8, first, the lower left of the metal substrate 1 is formed using a pressing method in which the metal substrate 11 (thickness 0.1 to 0.5 mm), such as stainless steel, is punched from the front surface side to the back surface side. In the vicinity of the lower right corner, circular punched portions 13a and 13d (diameter of about 0.7 to 1.0 mm) are provided. Here, as shown in FIGS. 8B and 8C, burrs 13 ab and 13 db protruding about 10 to 30 μm from the back surface of the substrate 11 are formed at the cut portion of the substrate 11. In addition, although the circular punched portions 13 a and 13 d are provided here, a cutout-shaped punched portion provided at the outer peripheral end of the substrate 11 may be used.
[0019]
Next, in the process shown in FIG. 9, an insulating film 12S (film thickness of about 30 to 60 μm) as an insulating member on the surface of the substrate 11 and an insulating film 12R (film thickness of about 30 to 60 μm) as an insulating member on the back surface of the substrate 11 are used. ). These insulating films are formed by uniformly applying a varnish, which is a base material of a polyimide film, with a spin coater or a roll coater, etc., and processing while raising the temperature stepwise from 100 to 300 ° C. . Further, when coating the varnish, the varnish also enters inside the extracted portions 13a and 13b of the substrate 11, and after the heat treatment, as shown in FIG. 9, the inside of the extracted portions 13a and 13b is filled with an insulating film, Be placed. Therefore, the insulating film is not thinned at the end portions of the extraction portions 13a and 13d, which has a problem in the past, and the tip of the burr does not penetrate the insulating film.
[0020]
Next, the insulating members 4a, 4d, 5a, and 5d in the first embodiment are not disposed, and the same steps as those in FIGS. 2 and 5 to 7 in the first embodiment are used. As shown in FIG. The photovoltaic device in the embodiment is completed. Hereinafter, the same manufacturing method and structure as those of the first embodiment will be described using the same names and symbols.
[0021]
In the second embodiment, similarly to the first embodiment, the insulating portions 12A and 12R are filled in the extracted portions 13a and 13d. Therefore, the insulating film is not thinned at the end portions of the extraction portions 13a and 13d, which has a problem in the past, and the tip of the burr does not penetrate the insulating film. Therefore, even if the openings 6a and 6d are provided in the insulating film and a conductive film is provided from the front surface side of the substrate 11 to the back surface side through the side walls of the openings 6a and 6d, the conductive film is electrically connected to the substrate. The output can be taken out normally.
[0022]
【The invention's effect】
The present invention provides a step of providing a hole or a notch-shaped punched portion in a metal substrate by a pressing method, a step of disposing an insulating member that fills the punched portion, and an insulating member that fills the punched portion, from the front side to the back side of the substrate. The insulating member is not thinned at the end of the punched portion, and therefore, burrs generated during pressing at the end of the punched portion do not penetrate the insulating member. . Therefore, even if a conductive film extending from the front surface side of the substrate to the back surface side through the side wall of the opening is disposed in the subsequent process, the conductive film does not conduct to the substrate.
[Brief description of the drawings]
1A and 1B show a first step of a first embodiment of the present invention, in which FIG. 1A is a plan view, FIG. 1B is an AA enlarged sectional view in FIG. 1A, and FIG. It is.
FIGS. 2A and 2B show a second step of the first embodiment of the present invention, where FIG. 2A is a plan view, FIG. 2B is an AA enlarged sectional view in FIG. It is.
FIGS. 3A and 3B show a third step of the first embodiment of the present invention, where FIG. 3A is a plan view, FIG. 3B is an enlarged cross-sectional view along A-A in FIG. It is.
FIGS. 4A and 4B show a fourth step of the first embodiment of the present invention, where FIG. 4A is a plan view, FIG. 4B is an AA enlarged sectional view in FIG. (D) is a bottom view.
FIGS. 5A and 5B show a fifth step of the first embodiment of the present invention, where FIG. 5A is a plan view, FIG. 5B is an AA enlarged sectional view in FIG. (D) is a bottom view.
6A and 6B show a sixth step of the first embodiment of the present invention, in which FIG. 6A is a plan view, FIG. 6B is an enlarged cross-sectional view taken along line AA in FIG. It is.
FIGS. 7A and 7B show a seventh step of the first embodiment of the present invention, wherein FIG. 7A is a plan view, FIG. 7B is an AA enlarged sectional view in FIG. (D) is a bottom view.
FIGS. 8A and 8B show a first step of the second embodiment of the present invention, where FIG. 8A is a plan view, FIG. 8B is an AA enlarged sectional view in FIG. It is.
9A and 9B show a second step of the second embodiment of the present invention, in which FIG. 9A is a plan view, FIG. 9B is an AA enlarged sectional view in FIG. 9A, and FIG. It is.
FIG. 10 shows a completed view of the second embodiment of the present invention, (a) is a plan view, (b) is an AA enlarged sectional view in (a), (c) is an BB enlarged sectional view, (D) is a bottom view.
FIG. 11 is a cross-sectional view of a principal part showing a conventional photovoltaic device substrate.
[Explanation of symbols]
1, 11 Metal substrates 3a, 3d, 13a, 13d Cutouts 4a, 4d, 5a, 5d Insulating members 6a, 6d Openings 7a, 7d, 8a, 8d

Claims (1)

金属基板にプレス加工法により穴の前記金属基板の裏面側にバリを有する抜き部を設ける工程と、
前記金属基板表面側から前記金属基板の裏面側にバリを有する抜き部を埋める絶縁部材を配置し、その後に
前記金属基板裏面側から前記金属基板の裏面側にバリを有する抜き部を埋める絶縁部材を配置する工程と、
前記金属基板の裏面側にバリを有する抜き部を埋める絶縁部材に、前記基板の表面側から裏面側に至る開口を設ける工程と、
前記基板の表面側から、前記開口の側壁を通って、前記基板の裏面側に至る導電膜を前記絶縁部材上に配置する工程と、
を有することを特徴とする光起電力装置用基板の製造方法。
Providing a metal substrate with a punched portion having a burr on the back side of the metal substrate by a pressing method;
An insulating member that fills a punched portion having a burr on the back side of the metal substrate from the metal substrate front side, and then fills a punched portion having a burr on the back side of the metal substrate from the back side of the metal substrate. A step of arranging
A step of providing an opening from the front surface side of the substrate to the back surface side in an insulating member that fills a punched portion having burrs on the back surface side of the metal substrate;
Disposing a conductive film from the front surface side of the substrate through the side wall of the opening to the back surface side of the substrate on the insulating member;
A method for producing a substrate for a photovoltaic device, comprising:
JP08926399A 1999-03-30 1999-03-30 Method for manufacturing substrate for photovoltaic device Expired - Lifetime JP4175724B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
JP08926399A JP4175724B2 (en) 1999-03-30 1999-03-30 Method for manufacturing substrate for photovoltaic device

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JP4175724B2 true JP4175724B2 (en) 2008-11-05

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