JP4192145B2 - Process for producing reaction bonded silicon carbide - Google Patents
Process for producing reaction bonded silicon carbide Download PDFInfo
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- JP4192145B2 JP4192145B2 JP2004501336A JP2004501336A JP4192145B2 JP 4192145 B2 JP4192145 B2 JP 4192145B2 JP 2004501336 A JP2004501336 A JP 2004501336A JP 2004501336 A JP2004501336 A JP 2004501336A JP 4192145 B2 JP4192145 B2 JP 4192145B2
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 74
- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 70
- 238000000034 method Methods 0.000 title claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 127
- 229910052710 silicon Inorganic materials 0.000 claims description 107
- 239000010703 silicon Substances 0.000 claims description 107
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 32
- 229910052799 carbon Inorganic materials 0.000 claims description 32
- 239000011863 silicon-based powder Substances 0.000 claims description 20
- 239000011230 binding agent Substances 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 16
- 239000008187 granular material Substances 0.000 claims description 13
- 238000002844 melting Methods 0.000 claims description 13
- 230000008018 melting Effects 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- 229920001187 thermosetting polymer Polymers 0.000 claims description 11
- 239000005011 phenolic resin Substances 0.000 claims description 9
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 claims description 8
- 238000000465 moulding Methods 0.000 claims description 7
- 238000005245 sintering Methods 0.000 claims description 7
- 239000002002 slurry Substances 0.000 claims description 7
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 claims description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 4
- 229920005992 thermoplastic resin Polymers 0.000 claims description 4
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 claims description 3
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- 239000004014 plasticizer Substances 0.000 claims description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
- 229920001223 polyethylene glycol Polymers 0.000 claims description 3
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 3
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 3
- 239000011118 polyvinyl acetate Substances 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 239000011856 silicon-based particle Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- 239000003822 epoxy resin Substances 0.000 claims description 2
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 claims description 2
- 229920000647 polyepoxide Polymers 0.000 claims description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 claims 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 claims 1
- 229960001826 dimethylphthalate Drugs 0.000 claims 1
- 239000002245 particle Substances 0.000 description 14
- 230000035515 penetration Effects 0.000 description 9
- 230000002776 aggregation Effects 0.000 description 5
- 238000005054 agglomeration Methods 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 230000005484 gravity Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004931 aggregating effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- PWMUWZMKVYUQKK-UHFFFAOYSA-N dimethyl benzene-1,2-dicarboxylate;3,4-dimethylphthalic acid Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC.CC1=CC=C(C(O)=O)C(C(O)=O)=C1C PWMUWZMKVYUQKK-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000009837 dry grinding Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Description
本発明は、反応結合炭化ケイ素の製造方法に関し、詳しくは、反応結合炭化ケイ素全体にわたって溶融ケイ素を均一に供給する方法に関する。 The present invention relates to a method for producing reaction-bonded silicon carbide, and more particularly to a method for uniformly supplying molten silicon throughout the reaction-bonded silicon carbide.
反応結合(または、反応焼結)炭化ケイ素は、炭化ケイ素と炭素とから構成された予備成形体(preform)に溶融ケイ素を浸透させて製造する。浸透した溶融ケイ素は、予備成形体内に存在する炭素粒子と反応して炭化ケイ素になり、この炭化ケイ素が結合剤として作用して予備成形体内に存在する炭化ケイ素粒子を結合させ、炭化ケイ素粒子間に存在する空隙をケイ素で埋めた微細構造を有する。 Reaction bonded (or reaction sintered) silicon carbide is produced by infiltrating molten silicon into a preform composed of silicon carbide and carbon. The infiltrated molten silicon reacts with the carbon particles present in the preform to form silicon carbide, and this silicon carbide acts as a binder to bond the silicon carbide particles present in the preform, and between the silicon carbide particles. It has a fine structure in which voids existing in are filled with silicon.
反応結合炭化ケイ素を製造するために、炭化ケイ素/炭素予備成形体に溶融ケイ素を供給する方法としては、溶融ケイ素が入っている坩堝に予備成形体を浸し、浸った予備成形体の毛細管を通して溶融ケイ素が予備成形体全体に供給されるようにすることが一般的である。しかしながら、この場合、ケイ素を溶融するための加熱装置、溶融ケイ素を入れるための坩堝、溶融されたケイ素を坩堝から試片へ供給する装置などを必要とするため、製造過程が複雑で製造費用が高い。 In order to produce reaction bonded silicon carbide, molten silicon is supplied to the silicon carbide / carbon preform by immersing the preform in a crucible containing molten silicon and melting through the capillary of the soaked preform. In general, silicon is supplied to the entire preform. However, in this case, a heating device for melting silicon, a crucible for containing molten silicon, and a device for supplying molten silicon from a crucible to a specimen are required, so that the manufacturing process is complicated and the manufacturing cost is low. high.
簡単な形状の予備成形体の場合は、予備成形体の上部にケイ素粉末を積層しておき、ケイ素の溶融温度より高温で加熱処理を行って溶融ケイ素を予備成形体に浸透させる方法がある。この方法においては、溶融温度より高温で溶融ケイ素が形成されながらケイ素粉末が表面張力により凝集し、溶融ケイ素が一つの塊になると、溶融ケイ素が供給されるべき面積全体を覆うことができず、場合によっては、凝集した塊の自重により重力降下する可能性がある。 In the case of a preform having a simple shape, there is a method in which silicon powder is laminated on the preform, and heat treatment is performed at a temperature higher than the melting temperature of silicon to allow the molten silicon to permeate the preform. In this method, when the molten silicon is formed at a temperature higher than the melting temperature, the silicon powder aggregates due to surface tension, and when the molten silicon becomes one lump, the entire area to which the molten silicon is to be supplied cannot be covered, In some cases, gravity may drop due to the weight of the aggregated mass.
このような従来のケイ素供給方法においては、溶融ケイ素が凝集すると、もともと意図した接触点から遠くなり、溶融ケイ素の供給距離が非常に長くなり、浸透面積が減少するという欠点があり、ケイ素供給源の位置を予備成形体に対し一定の位置に固定すべきであるという欠点がある。且つ、溶融ケイ素は、非常に大きい表面張力を有し、粘度が低いため、凝集により表面積を減らそうとする傾向を有し、凝集体の大きさが大きくなるほど重力の影響を大きく受ける。このような溶融ケイ素の凝集は、ケイ素が浸透する面積を減少させることは勿論、浸透する位置を限定された領域に局限させる。反応結合炭化ケイ素を製造するためには溶融ケイ素の供給が必須であるが、従来の方法においては予備成形体全体にわたって均一に溶融ケイ素を供給することが難しかった。 In such a conventional silicon supply method, when the molten silicon agglomerates, it is far from the intended contact point, the supply distance of the molten silicon becomes very long, and the permeation area is reduced. There is a drawback that the position of the above should be fixed at a fixed position with respect to the preform. Moreover, since molten silicon has a very large surface tension and low viscosity, it has a tendency to reduce the surface area by agglomeration, and the larger the agglomerate size, the greater the influence of gravity. Such agglomeration of molten silicon not only reduces the area through which silicon penetrates, but also localizes the penetration location to a limited area. In order to produce reaction bonded silicon carbide, it is essential to supply molten silicon. However, in the conventional method, it has been difficult to supply molten silicon uniformly throughout the preform.
本発明の目的は、より経済的に反応結合炭化ケイ素を製造できる方法を提供することにある。
また、本発明の他の目的は、反応結合炭化ケイ素の製造時、ケイ素を均一に溶融させ、表面張力による溶融ケイ素の凝集を防止することにより、浸透面積を最大限に維持することにある。
また、本発明の更に他の目的は、溶融ケイ素の均一な空間的分布を維持して全浸透面にわたって均一な浸透速度を維持することにより、工程時間を短縮させることにある。
An object of the present invention is to provide a method capable of producing reaction bonded silicon carbide more economically.
Another object of the present invention is to maintain the maximum penetration area by uniformly melting silicon during the production of reaction-bonded silicon carbide and preventing agglomeration of the molten silicon due to surface tension.
Still another object of the present invention is to shorten the process time by maintaining a uniform spatial distribution of molten silicon and maintaining a uniform permeation rate over the entire permeation surface.
本発明の目的を達成するために、ケイ素粉末と、結合剤として熱硬化性樹脂とから構成されるケイ素供給体を用意し、炭化ケイ素/炭素予備成形体を用意し、反応焼結炉内で前記予備成形体の一面に前記ケイ素供給体を接触させ、前記ケイ素供給体内の溶融ケイ素を前記予備成形体の内部に浸透させるために真空または不活性雰囲気下でケイ素の溶融温度より高温で加熱する、反応結合炭化ケイ素の製造方法を提供する。 In order to achieve the object of the present invention, a silicon supplier composed of silicon powder and a thermosetting resin as a binder is prepared, a silicon carbide / carbon preform is prepared, and a reaction sintering furnace is used. The silicon supply is brought into contact with one surface of the preform, and heated at a temperature higher than the melting temperature of silicon in a vacuum or in an inert atmosphere in order to infiltrate the molten silicon in the silicon supply into the preform. A method for producing reaction bonded silicon carbide is provided.
本発明においては、反応結合炭化ケイ素の形状、大きさ、厚さに関係なく効率的に溶融ケイ素を供給でき、溶融ケイ素の凝集を防止でき、溶融ケイ素を均一に供給できる。 In the present invention, molten silicon can be efficiently supplied regardless of the shape, size, and thickness of the reaction bonded silicon carbide, the aggregation of the molten silicon can be prevented, and the molten silicon can be supplied uniformly.
本発明は、ケイ素粉末と結合剤としての熱硬化性樹脂とから構成される所定形状のケイ素供給体を用意するステップと、炭化ケイ素/炭素予備成形体を用意するステップと、反応焼結炉内で前記予備成形体に前記ケイ素供給体を接触させるステップと、前記ケイ素供給体内の溶融ケイ素を前記予備成形体の内部に浸透させるために真空または不活性雰囲気下でケイ素の溶融温度より高温で加熱処理するステップと、を含んでなる反応結合炭化ケイ素の製造方法を提供する。 The present invention includes a step of preparing a silicon supply body having a predetermined shape composed of silicon powder and a thermosetting resin as a binder, a step of preparing a silicon carbide / carbon preform, and a reaction sintering furnace. Contacting the preform with the silicon supply, and heating at a temperature higher than the melting temperature of silicon in a vacuum or inert atmosphere to allow the molten silicon in the silicon supply to penetrate into the preform. And a process for producing reaction bonded silicon carbide comprising the steps of:
前記ケイ素供給体は、粒径が10〜5000μmのケイ素粉末70〜99重量%と、結合剤として熱硬化性樹脂1〜10重量%とを溶媒に混合してスラリーを用意し、スラリーを乾燥させて顆粒を得て、この顆粒を所定の形状に成形して製造する。
結合剤としては、フェノール樹脂のように残留炭素量の多い熱硬化性樹脂を使用する。結合剤は、ケイ素供給体に熱間変形性を付与するために、ポリビニルブチラル(polyvinyl butyral:PVB)のような熱可塑性樹脂1〜10重量%を更に含むことができる。結合剤として、熱硬化性樹脂と共に熱可塑性樹脂を加えてケイ素供給体に熱可塑性を付与すると、接触する予備成形体の浸透面が平坦でなくとも、平坦でない浸透面全体に接触させることができる。更に、熱間変形性をより増大するために、1〜10重量%の可塑剤を添加すると、低い温度でもケイ素供給体を浸透面の形状に従って容易に変形させることができる。
The silicon supplier is a slurry prepared by mixing 70 to 99% by weight of silicon powder having a particle size of 10 to 5000 μm and 1 to 10% by weight of thermosetting resin as a binder in a solvent, and drying the slurry. The granules are obtained, and the granules are formed into a predetermined shape and manufactured.
As the binder, a thermosetting resin having a large amount of residual carbon such as a phenol resin is used. The binder may further include 1 to 10% by weight of a thermoplastic resin such as polyvinyl butyral (PVB) to impart hot deformability to the silicon supply. When a thermoplastic resin is added together with a thermosetting resin as a binder to impart thermoplasticity to the silicon supply body, even if the permeation surface of the contacted preform is not flat, it can be brought into contact with the entire uneven permeation surface. . Furthermore, when 1 to 10% by weight of a plasticizer is added to further increase the hot deformability, the silicon supply body can be easily deformed according to the shape of the permeation surface even at a low temperature.
熱硬化性樹脂としては、フェノール樹脂の他にも、フルフリルアルコール樹脂(furfuryl alcohol resin)、エポキシ樹脂(epoxy resin)などを使用することができる。また、熱可塑性樹脂としては、PVBの他にも、ポリビニルアルコール(polyvinyl alcohol:PVA)、ポリ酢酸ビニル(polyvinyl acetate:PVAC)、ポリメチルメタクリレート(polymethyl methacrylate:PMMA)などを使用することができる。また、可塑剤としては、フタル酸ジブチル(di-butyl phthalate:DBP)、フタル酸ブチルベンジル(butyl-benzyl phthalate:BBP)、ポリエチレングリコール(polyethylene glycol:PEG)、フタル酸ジメチル(di-methyl phthalate:DMP)、フタル酸ジオクチル(di-octyl phthalate:DOP)、グリセロールなどを使用することができる。 As the thermosetting resin, in addition to the phenol resin, a furfuryl alcohol resin, an epoxy resin, or the like can be used. In addition to PVB, polyvinyl alcohol (PVA), polyvinyl acetate (PVAC), polymethyl methacrylate (PMMA), and the like can be used as the thermoplastic resin. As plasticizers, dibutyl phthalate (DBP), butyl benzyl phthalate (BBP), polyethylene glycol (PEG), dimethyl phthalate (di-methyl phthalate): DMP), di-octyl phthalate (DOP), glycerol, and the like can be used.
結合剤は、反応結合初期にケイ素供給体内でケイ素と反応して炭化ケイ素網目構造を形成し、この炭化ケイ素網目構造により、溶融ケイ素が一つの塊に凝集することを防止することができる。 The binder reacts with silicon in the silicon supply body at the initial stage of reaction bonding to form a silicon carbide network structure, and this silicon carbide network structure can prevent the molten silicon from agglomerating into one lump.
ケイ素供給体は、常温〜120℃の温度範囲で成形することにより供給体の強度を調節することができ、熱間変形のための成形処理は、60〜120℃が好ましい。ケイ素供給体におけるケイ素の割合を高めて成形すると、ケイ素粉末のネットワークにより加熱中に収縮が殆ど起こらないため、炭化ケイ素/炭素予備成形体に接触するケイ素供給体の初期接触面積全体が溶融ケイ素の浸透面積として作用する。
ケイ素供給体は、必要に応じて、炭化ケイ素/炭素予備成形体に常用接着剤により完全に結合させて使用することもできる。
A silicon supply body can adjust the intensity | strength of a supply body by shape | molding in the temperature range of normal temperature-120 degreeC, and 60-120 degreeC is preferable for the shaping | molding process for a hot deformation. Molding with a high silicon proportion in the silicon supply causes little shrinkage during heating due to the silicon powder network, so that the entire initial contact area of the silicon supply contacting the silicon carbide / carbon preform is made of molten silicon. Acts as an infiltration area.
If necessary, the silicon supplier can be used by completely bonding to the silicon carbide / carbon preform with a conventional adhesive.
ケイ素供給体と炭化ケイ素/炭素予備成形体との面接触状態で、ケイ素の溶融温度より高温、例えば、1410〜1550℃の範囲で加熱すると、溶融ケイ素が炭化ケイ素/炭素予備成形体に浸透しながら反応結合炭化ケイ素が製造される。 When the silicon supplier and the silicon carbide / carbon preform are in surface contact with each other and heated at a temperature higher than the melting temperature of silicon, for example, in the range of 1410 to 1550 ° C., the molten silicon penetrates the silicon carbide / carbon preform. However, reaction bonded silicon carbide is produced.
ケイ素供給体のケイ素粉末は、炭化ケイ素/炭素予備成形体の炭化ケイ素粉末より粒子が大きい。本発明においては、ケイ素粉末と炭化ケイ素粉末との粒子サイズの差をできるだけ大きくすることにより、溶融ケイ素の浸透速度を増加させ、これにより、反応時間を大きく減少させる。本発明においては、ケイ素粉末と炭化ケイ素粉末とのサイズの比率が5:1〜25:1であることが好ましい。 The silicon powder of the silicon donor has larger particles than the silicon carbide powder of the silicon carbide / carbon preform. In the present invention, by increasing the particle size difference between the silicon powder and the silicon carbide powder as much as possible, the penetration rate of molten silicon is increased, thereby greatly reducing the reaction time. In the present invention, the size ratio of the silicon powder to the silicon carbide powder is preferably 5: 1 to 25: 1.
以下、図面を参照して本発明の製造方法及び特徴をより具体的に説明する。
ケイ素粉末とフェノール樹脂のような残留炭素率の高い熱硬化性樹脂とを混合して顆粒を製造し、この顆粒を必要なサイズ及び形状に成形してケイ素供給体を製造する。ケイ素供給体を、反応結合させようとする炭化ケイ素/炭素予備成形体の所望の位置に図1(a)のように接触させる。図1(a)において、上部はケイ素供給体10を示し、下部は炭化ケイ素/炭素予備成形体20を示す。ケイ素供給体は、ケイ素粒子11と熱硬化性樹脂12とから構成されており、炭化ケイ素/炭素予備成形体は、炭化ケイ素粒子21と炭素粒子22とから構成されている。
Hereinafter, the manufacturing method and features of the present invention will be described more specifically with reference to the drawings.
A granule is produced by mixing a silicon powder and a thermosetting resin having a high residual carbon ratio such as a phenol resin, and the granule is formed into a required size and shape to produce a silicon supply body. The silicon supplier is brought into contact with the desired position of the silicon carbide / carbon preform to be reactively bonded as shown in FIG. In FIG. 1 (a), the upper part shows the silicon supply body 10, and the lower part shows the silicon carbide / carbon preform 20. The silicon supplier is composed of silicon particles 11 and a thermosetting resin 12, and the silicon carbide / carbon preform is composed of silicon carbide particles 21 and carbon particles 22.
次に、ケイ素供給体と炭化ケイ素/炭素予備成形体の少なくとも一面を接触した状態で、反応焼結炉内で真空または不活性雰囲気下で加熱処理を行う。熱硬化性樹脂は、加熱処理過程中、約400〜500℃で熱分解して、図1(b)のようにケイ素供給体内に炭素粒子23が残るようになる。加熱処理温度を更に上昇させると、残留炭素は、焼成しながら局部的な緻密化を経て、ケイ素の溶融温度に達すると、溶融したケイ素粒子と反応して炭化ケイ素網目構造(図1(c)の13参照)を形成する。 Next, heat treatment is performed in a reaction sintering furnace in a vacuum or in an inert atmosphere in a state where at least one surface of the silicon supplier and the silicon carbide / carbon preform is in contact. The thermosetting resin is thermally decomposed at about 400 to 500 ° C. during the heat treatment process, so that the carbon particles 23 remain in the silicon supply body as shown in FIG. When the heat treatment temperature is further increased, the residual carbon undergoes local densification while firing, and when it reaches the melting temperature of silicon, it reacts with the molten silicon particles to form a silicon carbide network structure (FIG. 1 (c)). 13).
この網目構造は、ケイ素供給体内の溶融ケイ素を全体的に連結し、溶融ケイ素が一つの塊に凝集したり、一側に偏ったりすることを防止しながら、予備成形体とケイ素供給体とが接触した剪断面15に溶融ケイ素が均一に供給されるようにする役割をする。これにより、ケイ素供給体内の溶融ケイ素が炭化ケイ素/炭素予備成形体の内部に均一に浸透する。ケイ素供給体は、図1(c)に示すように、最終的に炭化ケイ素網目構造13のみを残すようになる。炭化ケイ素/炭素予備成形体の内部では、ケイ素供給体から浸透した溶融ケイ素が炭素粒子と反応して新しい炭化ケイ素粒子25を形成し、且つ、浸透した溶融ケイ素は、既に存在する炭化ケイ素粒子21間の空隙24を埋める。
一方、炭化ケイ素網目構造は、強度が非常に低いため容易に反応結合体から分離することができ、簡単な加工により、図1(d)に示すように反応結合炭化ケイ素を得ることができる。
This network structure connects the molten silicon in the silicon supply body as a whole, preventing the molten silicon from agglomerating into one lump or being biased to one side, while the preform and silicon supply are It serves to ensure that molten silicon is uniformly supplied to the contact shearing surface 15. Thereby, the molten silicon in the silicon supply body uniformly penetrates into the silicon carbide / carbon preform. As shown in FIG. 1 (c), the silicon supplier finally leaves only the silicon carbide network 13. Inside the silicon carbide / carbon preform, the molten silicon that has penetrated from the silicon supplier reacts with the carbon particles to form new silicon carbide particles 25, and the penetrated molten silicon is already present in the silicon carbide particles 21. The gap 24 between them is filled.
On the other hand, since the silicon carbide network structure has very low strength, it can be easily separated from the reaction bonded body, and reaction bonded silicon carbide can be obtained by simple processing as shown in FIG.
このように、ケイ素供給体を用いて反応結合炭化ケイ素を製造すると、ケイ素供給体内で結合剤から得られる炭素とケイ素粉末との反応が発熱反応であるため、ケイ素の均一な溶融を誘導することができ、表面張力による溶融ケイ素の凝集を防止することができる。従って、溶融ケイ素が炭化ケイ素/炭素予備成形体内に浸透する面積を最大限に維持することができる。 Thus, when reaction-bonded silicon carbide is produced using a silicon supplier, the reaction between the carbon obtained from the binder and the silicon powder in the silicon supplier is an exothermic reaction, thereby inducing uniform melting of silicon. And agglomeration of molten silicon due to surface tension can be prevented. Therefore, the area where molten silicon penetrates into the silicon carbide / carbon preform can be maintained to the maximum.
また、溶融ケイ素の均一な空間的分布が維持されて、全浸透面にわたって均一な浸透速度を維持することができ、よって、全体的な浸透時間、即ち、工程時間を最小化することができる。且つ、付加的な溶融ケイ素供給装置を必要としないため、加工装置及び窯道具(kiln furniture)費用を削減することができる。 Also, a uniform spatial distribution of molten silicon can be maintained to maintain a uniform penetration rate across the entire penetration surface, thus minimizing the overall penetration time, i.e. process time. In addition, since no additional molten silicon supply device is required, the processing equipment and kiln furniture costs can be reduced.
1〜10μmサイズの炭化ケイ素と、10〜40nmサイズのカーボンブラックを原料粉末として使用して、0〜30体積%のカーボンブラックが含まれるように混合し、フェノール樹脂を結合剤として添加して、炭化ケイ素/炭素予備成形体を製造した。 Using silicon carbide having a size of 1 to 10 μm and carbon black having a size of 10 to 40 nm as a raw material powder, mixing so as to contain 0 to 30% by volume of carbon black, adding a phenol resin as a binder, A silicon carbide / carbon preform was produced.
ケイ素供給体は、粒径70〜2000μmのケイ素粉末とフェノール樹脂結合剤を使用して製造した。
まず、フェノール樹脂を溶解できるアルコールに、原料粉末の重さに基づいて1〜15重量%のフェノール樹脂と0〜15重量%のDBPを溶解させた。この溶液にケイ素粉末を添加してスラリーを用意した。ケイ素粉末を添加した後は、強い攪拌、ミリングまたは超音波処理により均一に混合させ、凝集体を分離させる。用意したスラリーを約50〜80℃に加熱した蒸溜水に滴下すると、急激な溶媒置換が起こり、滴下されたスラリーは固化状態に変わる。継続的な攪拌により顆粒内の残留溶媒を最小化した後に、滴下顆粒を溶液から分離して乾燥し、必要な顆粒を得る。
The silicon supplier was manufactured using silicon powder having a particle size of 70 to 2000 μm and a phenol resin binder.
First, 1 to 15% by weight of phenol resin and 0 to 15% by weight of DBP were dissolved in alcohol capable of dissolving phenol resin based on the weight of the raw material powder. Silicon powder was added to this solution to prepare a slurry. After the silicon powder is added, the mixture is uniformly mixed by vigorous stirring, milling or ultrasonic treatment to separate the aggregates. When the prepared slurry is dropped into distilled water heated to about 50 to 80 ° C., rapid solvent replacement occurs, and the dropped slurry changes to a solidified state. After minimizing residual solvent in the granules by continuous stirring, the dropped granules are separated from the solution and dried to obtain the required granules.
また、他の方法として、所望の量のケイ素粉末とフェノール樹脂とを乾燥状態で混合した後、ボールミルで1〜8時間の間、乾式ミリングを行うと、比較的均一な混合状態の顆粒を得ることができる。しかしながら、最も好ましい混合状態は、前者の湿式混合法による顆粒から得ることができる。
製造された顆粒に、常温〜120℃の温度範囲で5〜400MPaの圧力を加えてケイ素供給体を製造した。
As another method, a desired amount of silicon powder and a phenol resin are mixed in a dry state, and then dry milling is performed in a ball mill for 1 to 8 hours to obtain granules in a relatively uniform mixed state. be able to. However, the most preferred mixing state can be obtained from the granules by the former wet mixing method.
A silicon supply body was produced by applying a pressure of 5 to 400 MPa to the produced granules in a temperature range of room temperature to 120 ° C.
反応焼結炉内で、カーボンブラックを0〜30.3体積%含有している50mm×50mmサイズの反応結合炭化ケイ素/炭素予備成形体に同サイズのケイ素供給体を面接触させた後、真空雰囲気下で1410〜1460℃の範囲で加熱処理を行って、溶融ケイ素を炭化ケイ素/炭素予備成形体に浸透させて反応結合炭化ケイ素を得た。 In a reaction sintering furnace, a 50 mm × 50 mm reaction bonded silicon carbide / carbon preform containing 0-30.3% by volume of carbon black was brought into surface contact with a silicon supply of the same size and then vacuumed. Heat treatment was performed in the range of 1410 to 1460 ° C. under an atmosphere, and molten silicon was permeated into the silicon carbide / carbon preform to obtain reaction bonded silicon carbide.
表1は、本実施例による反応結合炭化ケイ素の成形密度及び焼結密度を示すものである。
以上説明したように本発明によれば、ケイ素を溶融するための加熱装置、溶融ケイ素を入れるための坩堝及び炉から予備成形体への供給装置等の、従来において反応結合炭化ケイ素を製造するために必要な大部分の装備を必要とせず、ケイ素を溶融温度まで加熱できる反応焼結炉のみを必要とするため、経済的に反応結合炭化ケイ素を製造することができる。
また、本発明によれば、ケイ素供給体内に存在するケイ素粉末と結合剤から得た炭素との反応が発熱反応であるため、ケイ素を均一に溶融できる。更に、ケイ素供給体内に形成される炭化ケイ素網目構造により表面張力による溶融ケイ素の凝集を防止できるので、溶融ケイ素の浸透面積を最大限に維持することができる。加えて、溶融ケイ素の均一な空間的分布を維持して全浸透面にわたって均一な浸透速度を維持できるので、全体的な浸透時間、即ち、工程時間を最小化することができる。
As described above, according to the present invention, conventionally, for producing reaction-bonded silicon carbide, such as a heating device for melting silicon, a crucible for containing molten silicon, and a feeding device from a furnace to a preform, etc. The reaction-bonded silicon carbide can be produced economically because only the reaction sintering furnace capable of heating the silicon to the melting temperature is required without requiring most of the equipment required for the process.
According to the present invention, since the reaction between the silicon powder present in the silicon supply body and the carbon obtained from the binder is an exothermic reaction, silicon can be uniformly melted. Furthermore, since the silicon carbide network structure formed in the silicon supply body can prevent the molten silicon from aggregating due to the surface tension, the permeation area of the molten silicon can be maintained to the maximum. In addition, since the uniform spatial distribution of molten silicon can be maintained and a uniform penetration rate can be maintained across the entire penetration surface, the overall penetration time, ie, process time, can be minimized.
Claims (10)
炭化ケイ素/炭素予備成形体を用意するステップと、
反応焼結炉内で前記予備成形体の一面に前記ケイ素供給体を接触させるステップと、
前記ケイ素供給体内の溶融ケイ素を前記予備成形体の内部に浸透させるために、真空または不活性雰囲気下でケイ素の溶融温度より高温で加熱処理するステップと、
を含んでなる反応結合炭化ケイ素の製造方法。Providing a silicon supplier having a predetermined shape including silicon powder and any one thermosetting resin selected from a phenol resin, a furfuryl alcohol resin, and an epoxy resin as a binder;
Providing a silicon carbide / carbon preform,
Contacting the silicon supply with one side of the preform in a reaction sintering furnace;
Heat-treating at a temperature higher than the melting temperature of silicon under vacuum or inert atmosphere in order to infiltrate the molten silicon in the silicon supply body into the preform;
A process for producing reaction bonded silicon carbide comprising:
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| KR101154808B1 (en) * | 2010-07-26 | 2012-06-18 | 엘지이노텍 주식회사 | Silicon carbide and method for manufacturing the same |
| JP6651754B2 (en) | 2014-09-18 | 2020-02-19 | Toto株式会社 | Method for producing reaction sintered silicon carbide member |
| DE102015223236A1 (en) * | 2015-11-24 | 2017-05-24 | Sgl Carbon Se | Ceramic component |
| JPWO2023171502A1 (en) * | 2022-03-10 | 2023-09-14 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4154787A (en) * | 1977-07-25 | 1979-05-15 | Coors Porcelain Company | Method for manufacturing silicon carbide bodies |
| CA1092793A (en) * | 1978-07-03 | 1981-01-06 | Wendel G. Brown | Method for manufacturing silicone carbide bodies |
| CA1158259A (en) * | 1980-07-17 | 1983-12-06 | Francis J. Frechette | Composite material of silicon carbide and silicon and methods of producing |
| DE3361333D1 (en) * | 1982-04-30 | 1986-01-09 | Atomic Energy Authority Uk | Production of reaction-bonded silicon carbide bodies |
| DE3367764D1 (en) * | 1983-07-29 | 1987-01-08 | Hoechst Ceram Tec Ag | Method of making silicon-infiltrated reaction-bonded silicom carbide bodies |
| JPH02129071A (en) * | 1988-11-07 | 1990-05-17 | Tone Boring Co | Production of silicon carbide ceramics |
| JPH0784344B2 (en) * | 1991-11-20 | 1995-09-13 | 工業技術院長 | Method for producing carbon fiber reinforced silicon carbide composite ceramics |
| JPH08175871A (en) * | 1994-12-27 | 1996-07-09 | Kyocera Corp | Silicon carbide sintered body and method for manufacturing the same |
| JP4283358B2 (en) * | 1998-12-01 | 2009-06-24 | 東海高熱工業株式会社 | Method for producing reaction sintered silicon carbide sintered body |
| KR100355350B1 (en) * | 2000-02-11 | 2002-10-11 | 한국과학기술연구원 | Manufacturing method of near-net-shaped reaction-bonded silicon carbide |
| KR100355349B1 (en) * | 2000-02-11 | 2002-10-11 | 한국과학기술연구원 | Manufacturing method of reaction-bonded silicon carbide |
-
2002
- 2002-04-30 KR KR10-2002-0023774A patent/KR100471652B1/en not_active Expired - Fee Related
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2003
- 2003-04-28 JP JP2004501336A patent/JP4192145B2/en not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| KR20030085371A (en) | 2003-11-05 |
| KR100471652B1 (en) | 2005-03-08 |
| WO2003093194A1 (en) | 2003-11-13 |
| JP2005523872A (en) | 2005-08-11 |
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