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JP4195550B2 - Pellicle - Google Patents
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JP4195550B2 - Pellicle - Google Patents

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Publication number
JP4195550B2
JP4195550B2 JP2000399189A JP2000399189A JP4195550B2 JP 4195550 B2 JP4195550 B2 JP 4195550B2 JP 2000399189 A JP2000399189 A JP 2000399189A JP 2000399189 A JP2000399189 A JP 2000399189A JP 4195550 B2 JP4195550 B2 JP 4195550B2
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Japan
Prior art keywords
pellicle
fluororubber
pellicle frame
adhesive layer
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000399189A
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Japanese (ja)
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JP2002202587A (en
Inventor
孝志 河関
茂人 重松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
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Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP2000399189A priority Critical patent/JP4195550B2/en
Publication of JP2002202587A publication Critical patent/JP2002202587A/en
Application granted granted Critical
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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84Inspecting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、ペリクルに関し、特に、エキシマー光のような短波長光に対して耐光性のある粘着層を有し、防塵性および無発塵性に優れたペリクルに関する。
【0002】
【従来の技術】
ペリクル枠の内壁に粘着物質を塗布することは、ペリクル枠からの発塵を防止すると共に、ペリクル内側に浮遊しているまたは浮遊するようになった埃を固定しマスクへの付着を防ぐために有効である。しかしながら近年のマスク回路パターンの微細化に伴い、露光に用いる光源の短波長化がおこっている。短波長光は高エネルギーであるため、従来用いられていた材料では焦げる、蒸発する、固化する、流動化する等の劣化現象が起こってしまい、発塵を防止する、あるいは浮遊物を固定化する能力に問題が起こるようになっている。
【0003】
【発明が解決しようとする課題】
従って、本発明の主な目的は、埃等の浮遊物を固着させるのに優れた保持性能を発揮し、かつエキシマー光のような短波長光に対して優れた耐光性を有する粘着層をペリクル枠の内側に有するペリクルを提供することにある。
【0004】
【課題を解決するための手段】
本発明によれば、
ペリクル枠と、前記ペリクル枠に張設されたペリクル膜と、前記ペリクル枠の内側に設けられた粘着層とを有するペリクルであって、前記粘着層がフッ素ゴムを含むことを特徴とするペリクルが提供される。
【0005】
好ましくは、
前記フッ素ゴムが、下記式(1)、(2)および(3)
【化8】
−C− …(1)
【化9】
−C− …(2)
【化10】
−C− …(3)
で表される構造単位からなる共重合体であって、数平均分子量が10000〜40000の範囲にある共重合体である。数平均分子量が上記範囲より低い場合には、長期の保管および使用途中にペリクル内側の粘着層が流動する、さらに流動によって厚さが薄くなり異物保持力が低下する。逆に高い場合には、フッ素ゴム自体の異物保持力が低下するため好ましくない。
【0006】
さらに好ましくは、
前記フッ素ゴムが、下記式(4)
【化11】
−(C−(C−(C− …(4)
(ただし、a、b、cは、それぞれ正の整数である)
で表される含フッ素樹脂であり、さらにより好ましくは、1,1−ジフルオロエチレン・テトラフルオロエチレン・プロピレン共重合物である。
【0007】
また、好ましくは、
前記フッ素ゴムが、下記式(1)および(2)
【化12】
−C− …(1)
【化13】
−C− …(2)
で表される構造単位からなる共重合体であって、数平均分子量が5000〜50000の範囲にある共重合体である。数平均分子量が上記範囲より低い場合には、長期の保管および使用途中にペリクル内側の粘着層が流動する、さらに流動によって厚さが薄くなり異物保持力が低下する。逆に高い場合には、フッ素ゴム自体の異物保持力が低下するため好ましくない。
【0008】
さらに好ましくは、
前記フッ素ゴムが、下記式(5)
【化14】
−(C−(C− …(5)
(ただし、a、bは、それぞれ正の整数である)
で表される含フッ素樹脂であり、さらにより好ましくは、テトラフルオロエチレン・プロピレン共重合物である。
【0009】
ペリクル枠の内側に粘着層を形成するには、上記いずれかのフッ素ゴム、例えば、式(4)記載の含フッ素樹脂を、溶媒に溶解して、塗布溶液を作成する。そして、この塗布溶液をペリクル枠の内側に塗布し、その後乾燥させて、粘着層を形成する。
【0010】
溶媒は特に限定されず、上記いずれかのフッ素ゴムを溶解してペリクル内壁に塗布できるものであればよい。溶媒としては、ケトン類、エステル類が好ましく用いられる。フッ素ゴムと溶媒との割合は、粘度が高すぎるときれいに塗布できないので、約5〜40wt%程度の濃度にして、約10cp〜100cpの粘度になるようにすることが好ましい。
【0011】
【実施例】
(実施例1)
フッ素ゴムとして、旭硝子社から購入した商品名:アフラス(1,1−ジフルオロエチレン・テトラフルオロエチレン・プロピレン共重合物[−(C−(C−(C−])を使用した。この数平均分子量は20400であった。溶剤はメチルエチルケトン(和光純薬、試薬特級)をもちいた。塗布溶液の調整は、アフラスをメチルエチルケトンに20重量%となるように加え、撹拌して溶解させた。その後PTFEフィルター(孔経:3ミクロン)にて、不溶解物及びゴミを濾過した。このようにして調整した塗布溶液を、0.5mmの横穴を開けた外径1.5mmの針を使用して、ペリクル枠内側に均一に引き延ばして塗布し、内壁コート層を作製した。
【0012】
次に、このペリクル枠内側に形成した内壁コート層の異物保持力を衝撃法により求めた。衝撃法は粒径105〜125ミクロンの標準粒子(材質はガラス)を付着させ、1mの高さからペリクル枠を落下させる。その後、付着させた標準粒子の脱落の有無を調べる方法により測定した。この方法による異物保持力の測定では、105〜125ミクロンの標準粒子の脱落は観られなかった。
【0013】
次に、このペリクル枠内側に形成した内壁コート層の耐光性を調べた。耐光性はArFエキシマレーザー光(浜松ホトニクス製 L5837、周波数500Hz、波長193nm、エネルギー密度1(mJ/cm)/pulse)を照射して、内壁コート層の化学構造の変化の有無を赤外吸収スペクトルを用いて測定すると共に、先程の衝撃法による異物保持力の測定をおこなった。照射エネルギー量は500、800、1200(J/cm)と変化させた。その結果、いずれも衝撃法による異物保持力は、未照射時の実験結果と変わらず、また新たな吸収ピークの生成、吸収ピークの消失は認められず、耐光性を有することがわかった。
(実施例2)
実施例1のフッ素ゴムをテトラフルオロエチレン・プロピレン共重合物[−(C−(C−]にする以外は実施例1と同様にペリクル内側に塗布し、異物保持力、耐光性を調べた。その結果、衝撃法によるテストは105〜125ミクロンの標準粒子の脱落はみられなかった。また耐光性テストでも異物保持力は変わらず、化学構造の変化も起こしていないことを確認した。
【0014】
(比較例)
ダイフロイル#100(CTFE(クロロトリフルオロエチレン)低重合体/ダイキン工業社製)を酢酸エチルに40重量%になるように溶解し、さらにCTFE低重合体に対してTHV樹脂が30:1の割合となるようにTHV Fluoroplastic THV200(THV(フッ化ビニリデン・テトラフルオロエチレン・ヘキサフルオロプロピレン共重合体)樹脂/住友3M社製)を加え、十分に撹拌する。
【0015】
このようにして調整した溶液を、実施例1と同様にしてペリクル枠内側に均一に引き延ばして塗布し、内壁コート層を作製した。
【0016】
次に、このペリクル枠内側に形成した内壁コート層の異物保持力を衝撃法により求めた。衝撃法は粒径105〜125ミクロンの標準粒子(材質はガラス)を付着させ、1mの高さからペリクル枠を落下させる。その後付着させた標準粒子の脱落の有無を調べる方法により測定した。この方法による異物保持力の測定では、105〜125ミクロンの標準粒子の脱落は観られなかった。次に、このペリクル枠内側に形成した内壁コート層の耐光性を調べた。耐光性はArFエキシマレーザー光(浜松ホトニクス製 L5837、周波数500Hz、波長193nm、エネルギー密度1(mJ/cm)/pulse)を照射した。すると、500J/cmに満たない照射エネルギー量で、内壁コート層が蒸発してしまい、ArF用ペリクルに必要とされる耐光性を有していないことが判明した。
【0017】
【発明の効果】
本発明によれば、埃等の浮遊物を固着させるのに優れた保持性能を発揮し、かつエキシマー光のような短波長光に対して優れた耐光性を有する粘着層をペリクル枠の内側に有するペリクルが提供される。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a pellicle, and more particularly, to a pellicle that has an adhesive layer that is light-resistant to short-wavelength light such as excimer light and is excellent in dust resistance and dust-free property.
[0002]
[Prior art]
Applying an adhesive substance to the inner wall of the pellicle frame is effective for preventing dust generation from the pellicle frame and fixing dust that floats or floats inside the pellicle and prevents it from adhering to the mask. It is. However, with the recent miniaturization of the mask circuit pattern, the wavelength of the light source used for exposure has been shortened. Because short-wavelength light is high energy, deterioration of the materials used in the past, such as scorching, evaporation, solidification, and fluidization, occurs to prevent dust generation or immobilize suspended matter. There is a problem with ability.
[0003]
[Problems to be solved by the invention]
Therefore, the main object of the present invention is to provide an adhesive layer that exhibits excellent holding performance for fixing floating substances such as dust and has excellent light resistance against short wavelength light such as excimer light. The object is to provide a pellicle having an inside of a frame.
[0004]
[Means for Solving the Problems]
According to the present invention,
A pellicle having a pellicle frame, a pellicle film stretched on the pellicle frame, and an adhesive layer provided inside the pellicle frame, wherein the adhesive layer contains fluororubber Provided.
[0005]
Preferably,
The fluororubber has the following formulas (1), (2) and (3)
[Chemical 8]
-C 2 F 4 - ... (1 )
[Chemical 9]
-C 3 H 6- (2)
Embedded image
-C 2 H 2 F 2 - ... (3)
A copolymer having a number average molecular weight in the range of 10,000 to 40,000. When the number average molecular weight is lower than the above range, the adhesive layer on the inner side of the pellicle flows during long-term storage and use. Further, the thickness decreases due to the flow and the foreign matter holding power decreases. On the other hand, if it is high, the foreign-matter holding power of the fluororubber itself decreases, which is not preferable.
[0006]
More preferably,
The fluororubber is represented by the following formula (4):
Embedded image
- (C 2 F 4) a - (C 3 H 6) b - (C 2 H 2 F 2) c - ... (4)
(Where a, b, and c are each a positive integer)
And more preferably a 1,1-difluoroethylene / tetrafluoroethylene / propylene copolymer.
[0007]
Also preferably,
The fluororubber has the following formulas (1) and (2)
Embedded image
-C 2 F 4 - ... (1 )
Embedded image
-C 3 H 6- (2)
A copolymer having a number average molecular weight in the range of 5,000 to 50,000. When the number average molecular weight is lower than the above range, the adhesive layer on the inner side of the pellicle flows during long-term storage and use. Further, the thickness decreases due to the flow and the foreign matter holding power decreases. On the other hand, if it is high, the foreign-matter holding power of the fluororubber itself decreases, which is not preferable.
[0008]
More preferably,
The fluororubber has the following formula (5)
Embedded image
- (C 2 F 4) a - (C 3 H 6) b - ... (5)
(Where a and b are each a positive integer)
And more preferably a tetrafluoroethylene / propylene copolymer.
[0009]
In order to form an adhesive layer on the inner side of the pellicle frame, any one of the above fluororubbers, for example, the fluororesin described in formula (4) is dissolved in a solvent to prepare a coating solution. Then, this coating solution is applied to the inside of the pellicle frame and then dried to form an adhesive layer.
[0010]
The solvent is not particularly limited, and any solvent can be used as long as it dissolves any of the above fluororubber and can be applied to the inner wall of the pellicle. As the solvent, ketones and esters are preferably used. Since the ratio between the fluororubber and the solvent cannot be neatly applied when the viscosity is too high, it is preferable to adjust the concentration to about 5 to 40 wt% so that the viscosity is about 10 cp to 100 cp.
[0011]
【Example】
(Example 1)
Product name purchased from Asahi Glass Co., Ltd. as a fluororubber: Afras (1,1-difluoroethylene / tetrafluoroethylene / propylene copolymer [— (C 2 F 4 ) a — (C 3 H 6 ) b — (C 2 H 2 F 2) c -] ) was used. The number average molecular weight was 20,400. The solvent used was methyl ethyl ketone (Wako Pure Chemicals, reagent special grade). The coating solution was prepared by adding aphras to methyl ethyl ketone so as to be 20% by weight, and stirring to dissolve. Thereafter, insoluble matters and dust were filtered with a PTFE filter (pore diameter: 3 microns). The coating solution prepared in this way was applied by extending uniformly inside the pellicle frame using a needle having an outer diameter of 1.5 mm with a 0.5 mm lateral hole, thereby producing an inner wall coating layer.
[0012]
Next, the foreign substance holding force of the inner wall coat layer formed inside the pellicle frame was determined by an impact method. In the impact method, standard particles (material is glass) with a particle size of 105 to 125 microns are attached, and the pellicle frame is dropped from a height of 1 m. Then, it measured by the method of investigating the presence or absence of omission of the attached standard particle. In the measurement of the foreign matter retention force by this method, no drop of standard particles of 105 to 125 microns was observed.
[0013]
Next, the light resistance of the inner wall coat layer formed inside the pellicle frame was examined. Light resistance is irradiated with ArF excimer laser light (L5837 manufactured by Hamamatsu Photonics, frequency 500 Hz, wavelength 193 nm, energy density 1 (mJ / cm 2 ) / pulse) to absorb the presence or absence of changes in the chemical structure of the inner wall coat layer. In addition to the measurement using the spectrum, the foreign matter retention force was measured by the impact method described above. The amount of irradiation energy was changed to 500, 800 and 1200 (J / cm 2 ). As a result, in all cases, the foreign matter holding power by the impact method was not different from the experimental result when not irradiated, and no new absorption peak was generated or no absorption peak disappeared.
(Example 2)
The fluororubber of Example 1 was applied to the inside of the pellicle in the same manner as in Example 1 except that the fluororubber was changed to a tetrafluoroethylene / propylene copolymer [-(C 2 F 4 ) a- (C 3 H 6 ) b- ]. The foreign matter holding power and light resistance were examined. As a result, in the impact test, no standard particles of 105 to 125 microns were removed. Also, it was confirmed in the light resistance test that the foreign matter holding power did not change and the chemical structure did not change.
[0014]
(Comparative example)
Daifloyl # 100 (CTFE (chlorotrifluoroethylene) low polymer / manufactured by Daikin Industries, Ltd.) was dissolved in ethyl acetate to a concentration of 40% by weight, and the ratio of THV resin was 30: 1 with respect to the CTFE low polymer. Then, add THV Fluoroplastic THV200 (THV (vinylidene fluoride / tetrafluoroethylene / hexafluoropropylene copolymer) resin / manufactured by Sumitomo 3M) and stir well.
[0015]
The solution prepared in this manner was applied to the inside of the pellicle frame uniformly in the same manner as in Example 1 to produce an inner wall coat layer.
[0016]
Next, the foreign substance holding force of the inner wall coat layer formed inside the pellicle frame was determined by an impact method. In the impact method, standard particles (material is glass) with a particle size of 105 to 125 microns are attached, and the pellicle frame is dropped from a height of 1 m. Thereafter, the measurement was performed by a method for examining whether or not the attached standard particles were dropped. In the measurement of the foreign matter retention force by this method, no drop of standard particles of 105 to 125 microns was observed. Next, the light resistance of the inner wall coat layer formed inside the pellicle frame was examined. Light resistance was irradiated with ArF excimer laser light (L5837 manufactured by Hamamatsu Photonics, frequency 500 Hz, wavelength 193 nm, energy density 1 (mJ / cm 2 ) / pulse). Then, it was found that the inner wall coat layer evaporated with an irradiation energy amount of less than 500 J / cm 2 and did not have the light resistance required for an ArF pellicle.
[0017]
【The invention's effect】
According to the present invention, an adhesive layer that exhibits excellent holding performance for fixing floating substances such as dust and has excellent light resistance against short wavelength light such as excimer light is provided inside the pellicle frame. A pellicle is provided.

Claims (4)

ペリクル枠と、前記ペリクル枠に張設されたペリクル膜と、前記ペリクル枠の内側に設けられた粘着層とを有するペリクルであって、
前記粘着層がフッ素ゴムを含み、該フッ素ゴムが下記式(1)および(2)で表される構造単位を含む共重合体であって、数平均分子量が5000〜50000の範囲にある共重合体である、ペリクル。
Figure 0004195550
Figure 0004195550
A pellicle having a pellicle frame, a pellicle film stretched on the pellicle frame, and an adhesive layer provided inside the pellicle frame,
The adhesive layer contains a fluororubber, and the fluororubber is a copolymer containing structural units represented by the following formulas (1) and (2), wherein the number average molecular weight is in the range of 5000 to 50000 A pellicle that is a coalescence .
Figure 0004195550
Figure 0004195550
前記フッ素ゴムが、下記式(5)で表される含フッ素樹脂である請求項記載のペリクル。
Figure 0004195550
(ただし、a、bは、それぞれ正の整数である)
The fluororubber is a fluorine-containing resin represented by the following formula (5), according to claim 1 pellicle according.
Figure 0004195550
(Where a and b are each a positive integer)
前記フッ素ゴムが、下記式(1)、(2)および(3)で表される構造単位からなる共重合体であって、数平均分子量が10000〜40000の範囲にある共重合体である請求項1記載のペリクル。
Figure 0004195550
Figure 0004195550
Figure 0004195550
The fluororubber is a copolymer composed of structural units represented by the following formulas (1), (2) and (3), and is a copolymer having a number average molecular weight in the range of 10,000 to 40,000 . The pellicle according to claim 1.
Figure 0004195550
Figure 0004195550
Figure 0004195550
前記フッ素ゴムが、下記式(4)で表される含フッ素樹脂である請求項記載のペリクル。
Figure 0004195550
(ただし、a、b、cは、それぞれ正の整数である)
The pellicle according to claim 3 , wherein the fluororubber is a fluororesin represented by the following formula (4).
Figure 0004195550
(Where a, b, and c are each a positive integer)
JP2000399189A 2000-12-27 2000-12-27 Pellicle Expired - Lifetime JP4195550B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000399189A JP4195550B2 (en) 2000-12-27 2000-12-27 Pellicle

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Application Number Priority Date Filing Date Title
JP2000399189A JP4195550B2 (en) 2000-12-27 2000-12-27 Pellicle

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Publication Number Publication Date
JP2002202587A JP2002202587A (en) 2002-07-19
JP4195550B2 true JP4195550B2 (en) 2008-12-10

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2006028227A1 (en) * 2004-09-10 2008-05-08 三井化学株式会社 adhesive
JP4889510B2 (en) * 2007-01-16 2012-03-07 信越化学工業株式会社 Application method of adhesive to inner surface of pellicle frame
JP5304622B2 (en) 2009-12-02 2013-10-02 信越化学工業株式会社 Pellicle for lithography
KR101699635B1 (en) 2012-08-02 2017-01-24 미쓰이 가가쿠 가부시키가이샤 Pellicle
SG11201907482YA (en) 2017-02-17 2019-09-27 Mitsui Chemicals Inc Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method

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