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JP4211035B2 - Semiconductor device having temperature control function - Google Patents
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JP4211035B2 - Semiconductor device having temperature control function - Google Patents

Semiconductor device having temperature control function Download PDF

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JP4211035B2
JP4211035B2 JP2003422100A JP2003422100A JP4211035B2 JP 4211035 B2 JP4211035 B2 JP 4211035B2 JP 2003422100 A JP2003422100 A JP 2003422100A JP 2003422100 A JP2003422100 A JP 2003422100A JP 4211035 B2 JP4211035 B2 JP 4211035B2
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semiconductor device
peltier element
temperature
heat
control function
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JP2005183658A (en
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隆 江波戸
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Fujitsu Semiconductor Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2884Testing of integrated circuits [IC] using dedicated test connectors, test elements or test circuits on the IC under test

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Description

本発明は、ペルチェ素子が組み込まれて温度制御機能をもち、且つ、低温試験するのに好適なパッケージを備えた半導体装置に関する。   The present invention relates to a semiconductor device having a package in which a Peltier element is incorporated, has a temperature control function, and is suitable for a low temperature test.

一般に、半導体装置に於いては、その低温動作を保証する為、予め低温試験を実施するようにしているが、その際、液体窒素などの冷媒を用いて冷却したり、或いは、冷媒とコンプレッサとを用いて冷却を行なっている。   In general, in a semiconductor device, a low-temperature test is performed in advance in order to guarantee its low-temperature operation. At that time, cooling with a refrigerant such as liquid nitrogen, or a refrigerant and a compressor Is used for cooling.

その場合、試験装置に対して結露防止策を施す必要あり、また、テストチェンバ内全体を冷却する時間及び試験後に常温復帰させるまでの時間として1〜2時間を必要としている。 In that case, it is necessary to take measures to prevent dew condensation on the test apparatus, and it takes 1-2 hours as a time for cooling the entire inside of the test chamber and a time for returning to normal temperature after the test.

半導体装置を冷却するには、前記冷媒などを用いる手段の他、回路動作に伴う発熱をペルチェ素子を用いて抑制することが行なわれている(例えば、特許文献1、特許文献2、特許文献3、特許文献4を参照。)。   In order to cool the semiconductor device, in addition to the means using the refrigerant or the like, heat generation due to circuit operation is suppressed using a Peltier element (for example, Patent Document 1, Patent Document 2, and Patent Document 3). , See Patent Document 4).

特許文献1乃至特許文献4に開示された手段では、半導体装置にペルチェ素子、又は、ペルチェモジュールを接合して冷却する方法を採っている。   The means disclosed in Patent Documents 1 to 4 employ a method of cooling by joining a Peltier element or a Peltier module to a semiconductor device.

また、高効率で冷却を行なう為、半導体装置の製造プロセス技術を用いてICチップ内にペルチェ素子を形成することも行なわれていて、例えば特許文献5には半導体回路領域外であるICチップ周辺部分や背面にペルチェ素子を形成することが記載され、特許文献6には半導体回路領域上面をペルチェ素子で直接冷却することが記載され、特許文献7にはICチップ内にペルチェ素子を点在させて半導体回路を構成する素子を冷却することが記載されている。   In order to perform cooling with high efficiency, a Peltier element is also formed in an IC chip by using a manufacturing process technology of a semiconductor device. For example, Patent Document 5 discloses an IC chip periphery outside a semiconductor circuit region. Patent Document 6 describes that the upper surface of a semiconductor circuit region is directly cooled by a Peltier element, and Patent Document 7 describes that a Peltier element is scattered in an IC chip. It is described that the elements constituting the semiconductor circuit are cooled.

前記したように、ペルチェ素子を冷却などの温度印加手段として用いた半導体装置の実装構造では、ペルチェ素子を含めて封止した構造、ペルチェ素子の片方の面に接触させたヒートシンク、放熱器、ヒートパイプなどの放熱手段を半導体装置の封止樹脂に於ける上面や側面に取り付けた構造が知られている。   As described above, in the mounting structure of the semiconductor device using the Peltier element as a temperature application means such as cooling, the structure including the Peltier element is sealed, the heat sink that is in contact with one surface of the Peltier element, the radiator, the heat A structure in which heat radiating means such as a pipe is attached to an upper surface or a side surface of a sealing resin of a semiconductor device is known.

因みに、特許文献に開示された発明は、ペルチェ素子を含む半導体装置全体が一体的に封止された構造に関するものであり、また、特許文献7に開示された発明は、パッケージにヒートシンクやファンなどの放熱手段が設置された構造に関するものである。
特開2001−230354号公報 特開平4−212442号公報 特開平4−142071号公報 特開平5−243437号公報 特開平5−152614号公報 特開平7−221351号公報 特開平11−135692号公報 犬石喜雄他著「半導体物性I」朝倉書店発行 第223頁
Incidentally, the invention disclosed in Patent Document 5 relates to a structure in which the entire semiconductor device including the Peltier element is integrally sealed, and the invention disclosed in Patent Document 7 includes a heat sink and a fan in the package. It relates to a structure in which heat dissipating means is installed.
JP 2001-230354 A JP-A-4-212442 Japanese Patent Laid-Open No. 4-142071 JP-A-5-243437 JP-A-5-152614 JP-A-7-221351 Japanese Patent Laid-Open No. 11-135692 Published by Yoshio Inuishi et al., “Semiconductor Properties I”, Asakura Shoten, page 223

前記背景の技術の項に挙げた従来の技術では、ペルチェ素子を組み込んだ半導体装置の実装構造或いは実装方法について、ペルチェ素子で動作中の半導体装置を冷却をすることに主眼をおいて対処していることから、半導体装置の試験、例えば、テストハンドラを用いて試験する場合に好適であるとは言い難い。   In the conventional technologies listed in the background section, the mounting structure or mounting method of a semiconductor device incorporating a Peltier element is addressed with a focus on cooling the semiconductor device that is operating with the Peltier element. Therefore, it is difficult to say that it is suitable for testing a semiconductor device, for example, using a test handler.

本発明では、ペルチェ素子が組み込まれて温度制御機能を有する半導体装置をテストハンドラで温度試験した場合に好結果が得られるパッケージをもった半導体装置を提供しようとする。   In the present invention, it is intended to provide a semiconductor device having a package in which a good result can be obtained when a semiconductor device having a temperature control function in which a Peltier element is incorporated is subjected to a temperature test by a test handler.

一般に、ペルチェ素子を組み込んだ半導体装置の温度試験を行なうには、ICチップの温度を一定に保つことが必要であり、また、ペルチェ素子が発生する熱を効率良く発散させることが不可欠である。   In general, in order to perform a temperature test of a semiconductor device incorporating a Peltier element, it is necessary to keep the temperature of the IC chip constant, and it is essential to efficiently dissipate the heat generated by the Peltier element.

半導体装置の試験に用いられるテストハンドラでは、半導体装置の上面をマッチプレート(部品の商品名 アドバンテスト社製)で押圧することで、半導体装置の端子をソケットボードに於ける信号印加の為の接触子に導電接触させるようにしている。   In a test handler used for testing a semiconductor device, the upper surface of the semiconductor device is pressed with a match plate (product name: Advantest) to contact the terminal of the semiconductor device to apply a signal to the socket board. Are in conductive contact.

マッチプレートは、通常、アルミニウム合金を材料とし、その面積は半導体装置の50倍〜100倍以上もあり、ペルチェ素子の放熱面と直接接触が可能ならば、巨大な放熱器として作用させることができるから、ペルチェ素子が発生する熱を効率良く発散させることができる。   The match plate is usually made of an aluminum alloy, and its area is 50 to 100 times that of a semiconductor device. If the match plate can directly contact the heat dissipation surface of the Peltier element, it can act as a huge heat sink. Therefore, the heat generated by the Peltier element can be efficiently dissipated.

然しながら、前記従来の技術に見られるような半導体装置の実装構造或いは実装方法では、表面に凹凸が存在し、ペルチェ素子の放熱面にマッチプレートを接触させることは困難である。   However, in the semiconductor device mounting structure or mounting method as seen in the prior art, there are irregularities on the surface, and it is difficult to bring the match plate into contact with the heat dissipation surface of the Peltier element.

そこで、本発明に依る半導体装置では、実装状態に於いて、パッケージの封止樹脂上面とペルチェ素子放熱面とが平坦な同一面に在る構造にしたので、ペルチェ素子放熱面にマッチプレートのプッシャ(部品の商品名 アドバンテスト社製)を直接接触させることができる。   Therefore, in the semiconductor device according to the present invention, since the upper surface of the sealing resin of the package and the Peltier element heat dissipation surface are in the same flat surface in the mounted state, the pusher of the match plate is placed on the Peltier element heat dissipation surface. (Product name of parts manufactured by Advantest) can be directly contacted.

通常、ペルチェ効果を利用して冷却を行なう半導体装置では、放熱器を取り付けることが必須である為、例えばフィンなどを実装した状態で半導体装置に荷重をかけて押圧することはできず、従って、この種の半導体装置をテストハンドラを用いて試験することはできなかった。   Normally, in a semiconductor device that performs cooling using the Peltier effect, it is essential to attach a radiator, so for example, it is not possible to apply pressure to the semiconductor device with fins mounted thereon, and therefore, This type of semiconductor device could not be tested using a test handler.

本発明に依る温度制御機能を有する半導体装置に於いては、テストハンドラのマッチプレートで半導体装置に荷重を加えても、その荷重の多くは封止樹脂の面で支えられ、ペルチェ素子の放熱面に無理な荷重が加わることはなく、従って、テストハンドラのIC押圧機構(プッシャ)とペルチェ素子放熱面との良好な接触が可能である。これは、ペルチェ素子の放熱面に大面積の放熱器を取り付けたことと同等である為、ペルチェ素子に於ける熱は良好に発散させることができ、しかも、ペルチェ素子を有する半導体装置をテストハンドラで試験することが可能となり、多数個の半導体装置を一括して同時測定することができる。   In the semiconductor device having the temperature control function according to the present invention, even if a load is applied to the semiconductor device by the match plate of the test handler, most of the load is supported by the surface of the sealing resin, and the heat dissipation surface of the Peltier element Therefore, an excessive load is not applied to the IC, and therefore, the IC pressing mechanism (pusher) of the test handler and the Peltier element heat radiation surface can be in good contact with each other. This is equivalent to mounting a large area radiator on the heat dissipation surface of the Peltier element, so that the heat in the Peltier element can be dissipated well, and a semiconductor device having a Peltier element can be used as a test handler. This makes it possible to perform testing at the same time and simultaneously measure a large number of semiconductor devices.

また、ペルチェ素子を有する半導体装置をテストハンドラで試験することが可能であることから、テストハンドラの試験用チェンバにファンを取り付けて室温状態のままでチェンバ内に送風する状態とし、ペルチェ素子に流す電流の向きを反転させるだけで高温から低温までの温度変化を実現することが可能であり、従って、テストハンドラで半導体装置の温度試験を行なう際、試験用チェンバ内の雰囲気温度を変え、半導体装置に温度印加する為のヒータを設けたり、冷媒を用いるなどの必要はなく、試験用チェンバ内の気密性維持機構や結露防止機構なども不要である。   In addition, since it is possible to test a semiconductor device having a Peltier element with a test handler, a fan is attached to the test chamber of the test handler so that the air is blown into the chamber while maintaining the room temperature state, and flows to the Peltier element. It is possible to realize a temperature change from a high temperature to a low temperature simply by reversing the direction of the current. Therefore, when performing a temperature test of a semiconductor device with a test handler, the ambient temperature in the test chamber is changed, and the semiconductor device There is no need to provide a heater for applying a temperature to the chamber or use a refrigerant, and no airtightness maintenance mechanism or dew condensation prevention mechanism in the test chamber is required.

更にまた、本発明に依る温度制御機能を有する半導体装置は、実装時に半導体装置の電源とペルチェ素子の電源を共用する構成にすれば、動作時に於ける急激なチップ温度上昇は抑制され、また、それぞれを独立電源にすれば、より安定な冷却が可能となり、環境温度センサ装置からの信号を電源反転回路と接続することに依ってICチップを一定の温度差で冷却、加熱することが可能となり、環境温度とチップ温度とが対応付けられるので安定な動作をさせることができる。   Furthermore, if the semiconductor device having the temperature control function according to the present invention is configured to share the power supply of the semiconductor device and the power supply of the Peltier element at the time of mounting, a rapid increase in chip temperature during operation is suppressed, If each is an independent power supply, more stable cooling is possible, and it becomes possible to cool and heat the IC chip with a certain temperature difference by connecting the signal from the environmental temperature sensor device to the power inversion circuit. Since the environmental temperature and the chip temperature are associated with each other, a stable operation can be performed.

温度制御の為にペルチェ素子を組み込んだ半導体装置及びその実装方法に於いて、ペルチェ素子の放熱面とパッケージ上面とが同一面を成すように揃えることで、ハンドラマッチプレートを放熱器として利用することを可能とし、また、ペルチェ素子電源に反転回路を設けて電流の向きを制御することで、冷媒やコンプレッサを用いることなく温度試験の実施を可能にした。   In a semiconductor device incorporating a Peltier element for temperature control and its mounting method, the heat sinking surface of the Peltier element and the upper surface of the package are aligned so that the handler match plate can be used as a radiator. In addition, by providing an inverting circuit in the Peltier device power supply to control the direction of the current, the temperature test can be performed without using a refrigerant or a compressor.

図1は本発明の温度制御機能を有する半導体装置を例示する要部切断側面図であり、図に於いて、1はシリコンウェーハチップ、2はパッド、3は絶縁膜、4は絶縁膜、5は吸熱側金属膜、6は絶縁膜、7はペルチェ素子層、8は絶縁膜、9は放熱側金属膜、10、10n、10pはペルチェ素子電極引き出し配線、11は絶縁膜、12はペルチェ素子電源用パッド、13はデバイス信号用パッドをそれぞれ示している。   FIG. 1 is a cutaway side view illustrating a principal part of a semiconductor device having a temperature control function according to the present invention. In the figure, 1 is a silicon wafer chip, 2 is a pad, 3 is an insulating film, 4 is an insulating film, 5 Is a heat absorption side metal film, 6 is an insulation film, 7 is a Peltier element layer, 8 is an insulation film, 9 is a heat dissipation side metal film, 10, 10n, 10p are Peltier element electrode lead wires, 11 is an insulation film, 12 is a Peltier element Power supply pads 13 are device signal pads.

図2は本発明の温度制御機能を有する半導体装置を例示する要部切断斜面図であり、図1に於いて用いた記号と同記号は同部分を表すか或いは同じ意味を持つものとする。   FIG. 2 is a main part cutting slope view illustrating a semiconductor device having a temperature control function of the present invention. The same symbols as those used in FIG. 1 represent the same parts or have the same meaning.

図2は図1に見られる半導体装置を左斜め上方から見た図であって、電源反転回路などを明示する為、図1とは左右が逆になっている。図に於いて、14は電源反転回路、15は実装基板、16は実装基板側のパッド、17はボンディングワイヤ、50は温度制御機能を有する半導体装置をそれぞれ示している。   FIG. 2 is a view of the semiconductor device shown in FIG. 1 as viewed obliquely from the upper left, and the left and right sides of FIG. In the figure, 14 is a power inverting circuit, 15 is a mounting substrate, 16 is a pad on the mounting substrate side, 17 is a bonding wire, and 50 is a semiconductor device having a temperature control function.

図1及び図2に於いて、シリコンウェーハチップ1にはトランジスタやダイオードなど必要なデバイスが形成され、その表面は電源や信号を印加する為のパッド2を除き、絶縁膜3で覆い、且つ、表面を平坦化し、その上に図1ではペルチェ素子層7として表してあるペルチェ構造体を形成する。   In FIG. 1 and FIG. 2, necessary devices such as transistors and diodes are formed on a silicon wafer chip 1, and the surface thereof is covered with an insulating film 3 except for pads 2 for applying power and signals, and The surface is flattened, and a Peltier structure represented as a Peltier element layer 7 in FIG. 1 is formed thereon.

図3はペルチェ構造体を具体的に表す要部切断側面図、図4は図3に見られるペルチェ構造体の要部上面図、図5は図3並びに図4に見られるペルチェ構造体の要部下面図であり、図1並びに図2に於いて用いた記号と同記号は同部分を表すか或いは同じ意味を持つものとする。   3 is a cut-away side view of the principal part specifically showing the Peltier structure, FIG. 4 is a top view of the principal part of the Peltier structure seen in FIG. 3, and FIG. 5 is a principal view of the Peltier structure seen in FIGS. It is a partial bottom view, and the same symbols as those used in FIGS. 1 and 2 represent the same portions or have the same meaning.

各図に於いて、21はn型半導体、22はp型半導体、23は吸熱面側電極、24は放熱面側電極をそれぞれ示している。   In each figure, 21 indicates an n-type semiconductor, 22 indicates a p-type semiconductor, 23 indicates a heat absorption surface side electrode, and 24 indicates a heat dissipation surface side electrode.

このペルチェ構造体を作製するには、シリコンウェーハチップ1を覆う絶縁膜3上に吸熱側金属膜5と絶縁膜6とを順に形成し、絶縁膜6上に吸熱面側電極23を形成し、各吸熱面側電極23の両端それぞれにn型半導体21とp型半導体22を形成し、n型半導体21及びp型半導体22、p型半導体22及びn型半導体21を対にして接合する放熱面側電極24を形成し、各放熱面側電極24上に絶縁膜8を介して上面が平坦となるように放熱側金属膜9を形成して完成する。   In order to produce this Peltier structure, the heat absorption side metal film 5 and the insulation film 6 are formed in this order on the insulation film 3 covering the silicon wafer chip 1, and the heat absorption surface side electrode 23 is formed on the insulation film 6. An n-type semiconductor 21 and a p-type semiconductor 22 are formed at both ends of each endothermic surface-side electrode 23, and the n-type semiconductor 21 and the p-type semiconductor 22, and the p-type semiconductor 22 and the n-type semiconductor 21 are joined in pairs. The side electrodes 24 are formed, and the heat radiating side metal film 9 is formed on each heat radiating surface side electrode 24 through the insulating film 8 so that the upper surface is flattened.

また、ペルチェ構造体からは、nチャネル側及びpチャネル側各電極から金属膜からなる電極引き出し配線10n及び10pが引き出されてペルチェ素子電源用パッド12或いはデバイス信号用パッド13に結ばれる。   Further, from the Peltier structure, electrode lead-out wirings 10n and 10p made of a metal film are drawn out from the n-channel side and p-channel side electrodes and connected to the Peltier element power supply pad 12 or the device signal pad 13.

電極引き出し配線10n及び10pがペルチェ素子電源用パッド12に結ばれる場合、途中に電源反転回路14を設けてあり、ペルチェ構造体への電流の向きを反転させることができるようにしてある。   When the electrode lead-out wirings 10n and 10p are connected to the Peltier element power supply pad 12, a power inversion circuit 14 is provided in the middle so that the direction of the current to the Peltier structure can be reversed.

前記説明した温度制御機能を有する半導体装置50は実装基板15に絶縁性接着剤を用いて固着し、ペルチェ素子電源用パッド12やデバイス信号用パッド13は実装基板15側のパッド16にボンディングワイヤ17で接続する。   The semiconductor device 50 having the temperature control function described above is fixed to the mounting substrate 15 using an insulating adhesive, and the Peltier element power supply pads 12 and the device signal pads 13 are bonded to the pads 16 on the mounting substrate 15 side by bonding wires 17. Connect with.

実装基板15に於けるパッド16は、実装基板15内のパターン配線を介して実装基板15の裏面側に固着されているハンダボール15A(図6参照)に依って外部と導通するようになっている。   The pads 16 on the mounting substrate 15 are electrically connected to the outside by solder balls 15A (see FIG. 6) fixed to the back surface side of the mounting substrate 15 via the pattern wiring in the mounting substrate 15. Yes.

図6は実装基板に実装され且つ封止された半導体装置を表す要部切断側面図、また、図7は図6に見られる半導体装置を表す要部上面図であり、図1乃至図5に於いて用いた記号と同記号は同部分を表すか或いは同じ意味を持つものとする。   6 is a cutaway side view of the main part showing the semiconductor device mounted and sealed on the mounting board, and FIG. 7 is a top view of the main part showing the semiconductor device shown in FIG. The same symbols as used in the above description represent the same parts or have the same meaning.

図に於いて、25は半導体装置に形成されたパッド12や13及びボンディングワイヤ17の一部などを含む周辺から実装基板15の表出面にかけて形成された樹脂モールドを示し、樹脂モールド25の上面はペルチェ素子層7の表面である放熱側金属膜9と揃うように、しかも、樹脂モールド25が放熱側金属膜9と接触しないように溝26をおいて形成されている。   In the figure, reference numeral 25 denotes a resin mold formed from the periphery including the pads 12 and 13 formed in the semiconductor device and a part of the bonding wire 17 to the exposed surface of the mounting substrate 15. A groove 26 is formed so that the resin mold 25 is not in contact with the heat dissipation side metal film 9 so as to be aligned with the heat dissipation side metal film 9 which is the surface of the Peltier element layer 7.

図6及び図7から明らかなように、本発明に依る半導体装置では、ペルチェ素子の放熱側金属膜9は表出され、また、ペルチェ素子吸熱側とシリコンウェーハチップ1などは樹脂モールド25で封止され、放熱側との接触はないから、放熱側金属膜9から発散される熱の回り込みの影響は低減される。   6 and 7, in the semiconductor device according to the present invention, the heat dissipation side metal film 9 of the Peltier element is exposed, and the heat absorption side of the Peltier element and the silicon wafer chip 1 are sealed with a resin mold 25. Since there is no contact with the heat radiating side, the influence of the heat radiated from the heat radiating side metal film 9 is reduced.

また、ペルチェ素子の放熱側金属膜9と樹脂モールド25の上面とは揃っているので、機能試験を実施する際、半導体装置の上面をテストハンドラのマッチプレートで押圧した場合には、マッチプレートのプッシャと放熱側金属膜9とが良好に接触し、マッチプレートが大面積の放熱器の役割を果たすので、室温の風を送ることでペルチェ素子の発熱を充分に放散させることができる。   Further, since the heat dissipation side metal film 9 of the Peltier element and the upper surface of the resin mold 25 are aligned, when the upper surface of the semiconductor device is pressed by the match plate of the test handler when performing the function test, The pusher and the heat-dissipation side metal film 9 are in good contact with each other, and the match plate functions as a large-area heat radiator. Therefore, the heat generated by the Peltier element can be sufficiently dissipated by sending room temperature wind.

更にまた、半導体装置には、ペルチェ素子電極引き出し配線10n及び10pとペルチェ素子電源との間に電源反転回路14を設けてあり、供給電流の向きを切り替えることで容易に吸熱側と放熱側と反転させることが可能であるから、半導体装置に低温から高温まで印加することができる。   Furthermore, the semiconductor device is provided with a power inversion circuit 14 between the Peltier element electrode lead wires 10n and 10p and the Peltier element power supply, and can easily be inverted between the heat absorption side and the heat dissipation side by switching the direction of the supply current. Therefore, the semiconductor device can be applied from a low temperature to a high temperature.

図8は電源反転回路の一例を表す要部回路図であり、図1乃至図7に於いて用いた記号と同記号は同部分を表すか或いは同じ意味を持つものとする。図に於いて、27は“H”レベルか“L”レベルの信号が入力される制御端子であり、制御端子27の入力が“H”レベルであればペルチェ素子電極引き出し配線10nが(−)でペルチェ素子電極引き出し配線10pが(+)、制御端子27の入力が“L”レベルであればペルチェ素子電極引き出し配線10nが(+)でペルチェ素子電極引き出し配線10pが(−)である。   FIG. 8 is a principal circuit diagram showing an example of a power supply inverting circuit. The same symbols as those used in FIGS. 1 to 7 represent the same parts or have the same meaning. In the figure, reference numeral 27 denotes a control terminal to which a signal of "H" level or "L" level is input. If the input of the control terminal 27 is "H" level, the Peltier element electrode lead-out wiring 10n is (-). If the Peltier element electrode lead wire 10p is (+) and the input of the control terminal 27 is at "L" level, the Peltier element electrode lead wire 10n is (+) and the Peltier element electrode lead wire 10p is (-).

ペルチェ素子の単位時間あたりの発熱量或いは吸熱量Wは、
W=IIi・・・・(1)
II:ペルチェ係数
i:流す電流
で表される。非特許文献1に依れば、ペルチェ係数IIは、p型シリコンとn型シリコンとを組み合わせることで、400K以下の広い温度範囲で0.8J/C程度となる。
The amount of heat generation or endotherm W per unit time of the Peltier element is
W = IIi (1)
II: Peltier coefficient i: Expressed by a flowing current. According to Non-Patent Document 1, the Peltier coefficient II is about 0.8 J / C in a wide temperature range of 400K or less by combining p-type silicon and n-type silicon.

ペルチェ効果に依る温度変化ΔTは、吸熱、放熱が発生するpn結合面上のエネルギー変化ΔWと熱コンダクタンスGthを使って下記の式(2)で表される。
ΔT=ΔW/Gth・・・・(2)
The temperature change ΔT due to the Peltier effect is expressed by the following formula (2) using the energy change ΔW on the pn coupling surface where heat absorption and heat dissipation are generated and the thermal conductance G th .
ΔT = ΔW / G th (2)

例えば熱コンダクタンスGthが1mW/Kの場合、吸熱側の温度を−50℃に設定するには、放熱側の温度を室温25℃とすれば75℃の温度差になるから、式(1)並びに式(2)より、93mA程度の電流をペルチェ素子に流せば良いことになる。 For example, when the thermal conductance G th is 1 mW / K, in order to set the temperature on the heat absorption side to −50 ° C., if the temperature on the heat dissipation side is 25 ° C., a temperature difference of 75 ° C. results. In addition, from equation (2), a current of about 93 mA may be passed through the Peltier element.

前記計算は、ペルチェ素子自体の発熱がない場合であるから、吸熱側の温度を一定に保つには、熱量に応じてペルチェ素子に流れる電流を増す必要があり、その場合には、図8に示したような電源反転回路で電流制御を行なうことができる。   Since the above calculation is for the case where the Peltier element itself does not generate heat, it is necessary to increase the current flowing through the Peltier element in accordance with the amount of heat in order to keep the temperature on the heat absorption side constant. Current control can be performed by a power supply inverting circuit as shown.

図9は本発明の半導体装置を試験する場合を説明する為のテストハンドラの一部を表す要部切断説明図であり、図に於いて、51はテストチェンバ、52は空気送入ファン、53は空気送出ファン、54はマッチプレート、55はプッシャ、56はペルチェ素子一体型半導体装置、57は接触子、58はソケットボード、59は測定治具、60はテストヘッド、61は温度検出回路、62は電流制御回路、63は電源ユニット(ペルチェ素子供給用電源)をそれぞれ示している。   FIG. 9 is a cutaway explanatory view showing a part of a test handler for explaining a case of testing a semiconductor device of the present invention. In FIG. 9, 51 is a test chamber, 52 is an air inlet fan, 53 Is an air delivery fan, 54 is a match plate, 55 is a pusher, 56 is a Peltier element integrated semiconductor device, 57 is a contact, 58 is a socket board, 59 is a measurement jig, 60 is a test head, 61 is a temperature detection circuit, Reference numeral 62 denotes a current control circuit, and 63 denotes a power supply unit (power supply for supplying a Peltier element).

テストハンドラは半導体装置の試験治具への装着から試験後の払い出しまでを自動で行なう装置であり、図9にはテストハンドラに於けるテストチェンバ部分を簡略化して表してある。   The test handler is a device that automatically performs the mounting from the mounting of the semiconductor device to the test jig to the payout after the test. FIG. 9 shows a simplified test chamber portion in the test handler.

図9では、プッシャ55が1個分しか表されていないが、実際には、大面積のマッチプレート54に多数のプッシャ55が配列して取り付けられていて、多数の半導体装置を一括して取り扱うことができる。   Although only one pusher 55 is shown in FIG. 9, actually, a large number of pushers 55 are arranged and attached to a large-area match plate 54, and a large number of semiconductor devices are handled in a lump. be able to.

テストハンドラに於ける半導体装置装着部では、JEDEC標準ICトレイにセットされた多数個の半導体装置が測定用トレイに並べられる。因みに、測定用トレイには、4個〜64個程度の半導体装置を同時に搭載することができる。   In the semiconductor device mounting portion in the test handler, a large number of semiconductor devices set on the JEDEC standard IC tray are arranged on the measurement tray. Incidentally, about 4 to 64 semiconductor devices can be simultaneously mounted on the measurement tray.

半導体装置が並べされた測定用トレイは、テストチャンバ51内に搬送されて測定治具59に装着され、半導体装置56とソケットボード58とが対応づけられ、プッシャ55の降下動作で半導体装置56が押し下げられ、ソケットボード58に取り付けられた接触子57に半導体装置56の信号端子が接触し、その際、テストハンドラからテストヘッドに信号が送られ、試験が開始される。   The measurement tray on which the semiconductor devices are arranged is transported into the test chamber 51 and mounted on the measurement jig 59, the semiconductor device 56 and the socket board 58 are associated with each other, and the semiconductor device 56 is moved by the pusher 55 descending. The signal terminal of the semiconductor device 56 contacts the contact 57 that is pushed down and attached to the socket board 58. At this time, a signal is sent from the test handler to the test head, and the test is started.

テストチェンバ51には空気送入ファン52及び空気送出ファン53を設けてあり、外からの空気をテストチェンバ51内に送入し且つ送出することで、マッチプレート54に伝達された熱は有効に発散されて室温と同等の一定温度に維持でき、従って、ペルチェ素子に電流を流した際の吸熱効果に経時変化が生じないようにすることができる。   The test chamber 51 is provided with an air inlet fan 52 and an air outlet fan 53, and the heat transmitted to the match plate 54 is effectively transmitted by sending air from outside into the test chamber 51 and sending it out. It is possible to maintain a constant temperature equivalent to the room temperature by being diffused, and therefore it is possible to prevent a change with time in the endothermic effect when a current is passed through the Peltier element.

この場合、半導体装置のチップ温度を例えば−30℃にする場合は、室温が25℃であれば、55℃の温度差が得られるようにペルチェ素子供給電流を制御するものであり、この場合のチップ温度の検出は、半導体装置の入出力端子に構成されるダイオードの順方向特性など適宜の手段を利用して容易に実現できる。   In this case, when the chip temperature of the semiconductor device is set to, for example, −30 ° C., if the room temperature is 25 ° C., the Peltier element supply current is controlled so that a temperature difference of 55 ° C. is obtained. The detection of the chip temperature can be easily realized by using an appropriate means such as a forward characteristic of a diode configured at an input / output terminal of the semiconductor device.

高温試験を行なう場合には、図8について説明した電源反転回路を用い、電流の方向を反転させれば良く、例えば、チップ温度を85℃にする場合は室温25℃に対して50℃の温度差が得られるようにペルチェ素子供給電流を制御すれば良い。   When performing a high temperature test, the power supply inversion circuit described with reference to FIG. 8 may be used to reverse the direction of the current. For example, when the chip temperature is set to 85 ° C., the temperature is 50 ° C. compared to 25 ° C. What is necessary is just to control a Peltier device supply current so that a difference may be obtained.

ペルチェ素子へ電流を供給する電源端子、接地端子、反転回路の制御端子を独立させておけば、実使用時の用途や使用目的に応じ、実装基板15の配線を利用して半導体装置の電源とペルチェ素子の電源を共用或いは独立して用いる選択をすることができる。   If the power supply terminal that supplies current to the Peltier element, the ground terminal, and the control terminal of the inverting circuit are made independent, the power supply of the semiconductor device can be made using the wiring of the mounting board 15 according to the actual use and purpose of use. It is possible to select to use the power source of the Peltier element in common or independently.

また、電源反転回路に於ける制御端子27は実働時の環境温度に応じ、“L”レベル或いは“H”レベルにすることでチップの冷却或いは加熱が可能であり、環境温度に対して半導体装置を安定に動作させることができ、その場合、環境温度センサ装置を設置し、センサからの信号を電源反転回路に送入する構成にすれば、環境温度に対し、より一層安定に半導体装置を動作させることができる。   Further, the control terminal 27 in the power inverter circuit can be cooled or heated by setting the “L” level or “H” level according to the environmental temperature at the time of actual operation. If the environment temperature sensor device is installed and the signal from the sensor is sent to the power inversion circuit, the semiconductor device can be operated more stably with respect to the environment temperature. Can be made.

本発明の温度制御機能を有する半導体装置を例示する要部切断側面図である。It is a principal part cutting side view which illustrates the semiconductor device which has the temperature control function of this invention. 本発明の温度制御機能を有する半導体装置を例示する要部切断斜面図である。It is a principal part cutting slope figure which illustrates the semiconductor device which has the temperature control function of this invention. ペルチェ構造体を具体的に表す要部切断側面図である。It is a principal part cutting side view showing a Peltier structure concretely. 図3に見られるペルチェ構造体の要部上面図である。It is a principal part top view of the Peltier structure seen in FIG. 図3並びに図4に見られるペルチェ構造体の要部下面図である。It is a principal part bottom view of the Peltier structure seen in FIG.3 and FIG.4. 実装基板に実装され且つ封止された半導体装置を表す要部切断側面図である。It is a principal part cutting side view showing the semiconductor device mounted in the mounting substrate and sealed. 図6に見られる半導体装置を表す要部上面図である。FIG. 7 is a main part top view showing the semiconductor device seen in FIG. 6. 電源反転回路の一例を表す要部回路図である。It is a principal part circuit diagram showing an example of a power supply inversion circuit. 本発明の半導体装置を試験する場合を説明する為のテストハンドラの一部を表す要部切断説明図である。It is principal part cutting explanatory drawing showing a part of test handler for demonstrating the case where the semiconductor device of this invention is tested.

符号の説明Explanation of symbols

1 シリコンウェーハチップ
2 パッド
3 絶縁膜
4 絶縁膜
5 吸熱側金属膜
6 絶縁膜
7 ペルチェ素子層
8 絶縁膜
9 放熱側金属膜
10、10n、10p ペルチェ素子電極引き出し配線
11 絶縁膜
12 ペルチェ素子電源用パッド
13 デバイス信号用パッド
14 電源反転回路
15 実装基板
15A ハンダボール
16 実装基板側のパッド
17 ボンディングワイヤ
50 温度制御機能を有する半導体装置
DESCRIPTION OF SYMBOLS 1 Silicon wafer chip 2 Pad 3 Insulating film 4 Insulating film 5 Endothermic metal film 6 Insulating film 7 Peltier element layer 8 Insulating film 9 Heat radiating side metal film 10, 10n, 10p Peltier element electrode lead-out wiring 11 Insulating film 12 For Peltier element power supply Pad 13 Device Signal Pad 14 Power Inversion Circuit 15 Mounting Board 15A Solder Ball 16 Mounting Board Side Pad 17 Bonding Wire 50 Semiconductor Device Having Temperature Control Function

Claims (3)

デバイスが組み込まれたウェーハチップの上に放熱側金属膜を表出したペルチェ素子モジュールが形成された半導体装置と、
該半導体装置が実装された実装基板と、
該実装基板の表出面から該半導体装置の表面一部を覆い且つ放熱側金属膜上面と揃った高さをもつ樹脂モールドとを備えてなり、
該樹脂モールドはパッド及び配線を封止し且つ該表出された放熱側金属膜との間に所要の間隙を維持してなること
を特徴とする温度制御機能を有する半導体装置。
A semiconductor device in which a Peltier element module that exposes a heat-dissipating metal film is formed on a wafer chip in which the device is incorporated;
A mounting substrate on which the semiconductor device is mounted;
A resin mold that covers a part of the surface of the semiconductor device from the exposed surface of the mounting substrate and has a height aligned with the upper surface of the heat dissipation side metal film ;
The semiconductor device having a temperature control function, wherein the resin mold seals pads and wirings and maintains a required gap between the exposed heat-dissipation-side metal film .
ペルチェ素子電源と該ペルチェ素子モジュールとの間に介挿された電源反転回路
を備えてなることを特徴とする請求項1記載の温度制御機能を有する半導体装置。
Power inverting circuit inserted between the Peltier element power supply and the Peltier element module
The semiconductor device having a temperature control function according to claim 1, comprising:
半導体装置に於けるウェーハチップ上にペルチェ素子モジュールの配線及び電源用或いは信号用のパッドが形成されてなること
を特徴とする請求項1或いは請求項2記載の温度制御機能を有する半導体装置。
Peltier element module wiring and power or signal pads are formed on a wafer chip in a semiconductor device.
The semiconductor device having a temperature control function according to claim 1 or claim 2, wherein the feature to.
JP2003422100A 2003-12-19 2003-12-19 Semiconductor device having temperature control function Expired - Fee Related JP4211035B2 (en)

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