JP4213133B2 - Manufacturing method of processing apparatus, manufacturing method of quartz product in processing apparatus, and measuring jig - Google Patents

Description

The present invention relates to a method of manufacturing a processing device, relates relates to the manufacturing method and the measurement jig quartz products in the processing unit, in particular measures the flatness of the sealing surface of the mirror-finished in the quartz product technology.

  In the manufacture of semiconductor devices, various types of processing apparatuses (semiconductor manufacturing apparatuses) are used to perform processes such as oxidation, diffusion, and CVD (Chemical Vapor Deposition) on an object to be processed such as a semiconductor wafer. As one of them, a batch type processing apparatus such as a vertical heat processing apparatus capable of processing a large number of objects to be processed at a time, for example, heat processing is known.

  This vertical heat treatment apparatus accommodates a holder that holds a number of objects to be processed in a quartz processing container having an open lower end, hermetically closes the opening with a lid, and a heater provided around the processing container Thus, the object to be processed is heated to perform a predetermined heat treatment in a predetermined processing gas atmosphere (see, for example, Japanese Patent Application Laid-Open No. 2003-257958). The processing vessel 2 has an opening (furnace port) at the lower end and a flange portion on the outer periphery on the lower end side, and the flange portion is supported by a metal flange presser. A lid is brought into contact with the open end of the processing container to close it. The lid is made of metal, for example, stainless steel, and an O-ring made of heat-resistant resin is attached to the lid via a mounting groove as an airtight material for sealing between the opening end of the processing container.

  However, in such a vertical heat treatment apparatus, since the inner surface (upper surface) of the metal lid is exposed in the processing container, the inner surface of the lid may be corroded by the processing gas having corrosiveness. There is a possibility of metal contamination of the workpiece. Further, since the O-ring is sandwiched between the open end of the processing container and the lid, outgas is generated from the O-ring when the processing container is evacuated, and is sucked into the processing container to be processed. May be a source of pollution.

  Therefore, in order to solve these problems, the applicant of the present application has first filed a vertical heat treatment apparatus in which the lid body is made of quartz (for example, the inner lid portion contacting the opening end of the processing vessel is made of quartz). (Japanese Patent Application No. 2004-46729, unpublished). In this case, as shown in FIG. 13, in order to seal between the contact surfaces (joint surfaces) 16 and 17 of the processing container 2 and the lid body 7, contact surfaces (also referred to as seal surfaces) 16, A mirror surface sealing structure is employed in which a mirror surface processing is applied to 17 and the sealing surfaces of the mirror processing are brought into close contact with each other to form a sealing portion (this is referred to as a mirror surface sealing portion). In order to improve the sealing performance of the mirror surface sealing portion, high flatness is required for the sealing surfaces 16 and 17.

JP 2003-257958 A

  By the way, in the case of mirror finishing, when the surface to be processed (seal surface) is smoothly finished by gas baking, the burner fire is applied too vigorously and a protruding portion (swelling portion) 70 is generated on the edge side of the seal surfaces 16 and 17. It is possible to do. On the other hand, examples of means for measuring flatness include a surface roughness meter and a three-dimensional measuring instrument.

  However, these measuring instruments are suitable for partial measurement. However, in the measurement of the sealing surface of the processing container or lid in the processing apparatus as described above, the sealing surface is a relatively large-diameter ring. It is difficult to measure the entire circumference at once. Therefore, it is difficult to detect and delete the protruding portion protruding from the reference surface in the entire circumference of the sealing surface.Therefore, variations in the sealing property due to the protruding portion occur in the mirror surface sealing portion of the processing container and the lid, and There is a possibility that the uniformity of processing of the processing body, for example, the uniformity of the film thickness may be deteriorated. Further, the protruding portion may cause scratches, chips, cracks, cracks, and the like, and may become a particle generation source.

  The present invention has been made in consideration of the above circumstances, and the flatness of the seal surface of the mirror surface seal portion can be easily measured at once over the entire circumference of the seal surface, improving the sealing performance of the mirror surface seal portion and It is an object of the present invention to provide a processing apparatus, a processing apparatus manufacturing method, a quartz product manufacturing method and a measuring jig capable of improving the uniformity of processing and eliminating the possibility of becoming a particle generation source.

To achieve the above object, out of the present invention, a manufacturing method of the processing apparatus according to claim 1 is made processing unit that performs predetermined processing by accommodating the object to be processed is of quartz products, quartz products mirror A manufacturing method of a processing apparatus having a mirror surface seal portion for closely contacting processing seal surfaces, wherein a measurement step for measuring the flatness of the seal surface of the quartz product using pressure-sensitive paper and the measurement result are predetermined. And an assembling process for selecting and assembling quartz products within the specified range.

The processing apparatus manufacturing method according to claim 2 is the processing apparatus manufacturing method according to claim 1 , wherein when the measurement result is a quartz product exceeding a predetermined range, the sealing surface of the quartz product is set again. It is characterized by mirror finishing.

Method for manufacturing a processing apparatus according to claim 3 is a method of manufacturing a processing apparatus according to claim 1 or 2, wherein the mirror-polishing, gas and polishing step of polishing the sealing surface of the quartz product, a polished seal surface And a finishing step of finishing by baking.

The method for producing a quartz product in the processing apparatus according to claim 4 is a method for producing a quartz product having a mirror-finished sealing surface used in a processing apparatus that accommodates an object to be processed and performs a predetermined process. A polishing step for polishing the sealing surface of the quartz product, a finishing step for finishing the polished sealing surface by gas baking, and a step for measuring the flatness of the sealing surface by pressing a pressure-sensitive paper with a flat surface against the finished sealing surface. And a step of determining whether or not the quartz product is a non-defective product based on whether or not the measurement result is within a predetermined range.

The method for producing a quartz product in the processing apparatus according to claim 5 is the method for producing a quartz product in the processing apparatus according to claim 4 , wherein the quartz product has a measurement result exceeding a predetermined range. The sealing surface of the product is mirror-finished again.

The method for producing a quartz product in the processing apparatus according to claim 6 is the method for producing a quartz product in the processing apparatus according to claim 4 or 5 , wherein the mirror surface processing comprises: a polishing step for polishing a sealing surface of the quartz product; And a finishing step of finishing the sealed surface by gas baking.

The measuring jig according to claim 7 measures the flatness of the sealing surface of the mirror surface sealing portion of the quartz product that constitutes the processing portion of the processing apparatus that accommodates the object to be processed and performs predetermined processing, using pressure sensitive paper. A measuring jig, a fixing base for fixing the quartz product with its sealing surface exposed, a pressure-sensitive paper guide for positioning pressure-sensitive paper on the sealing surface of the quartz product, and a sealing surface of the quartz product And a pressing mechanism having a flat abutting body for abutting the pressure sensitive paper with a predetermined pressure.

According to the method for manufacturing a processing apparatus according to claim 1, the processing unit that accommodates an object to be processed and performs a predetermined process is made of a quartz product, and the quartz product has a mirror seal part. A measuring step of measuring the flatness of the sealing surface of the mirror seal portion of the quartz product using pressure-sensitive paper, and an assembling step of selecting and assembling a quartz product whose measurement result is within a predetermined range. Therefore, the flatness of the sealing surface of the mirror surface sealing part can be easily measured at once over the entire circumference of the sealing surface, improving the sealing property of the mirror surface sealing part and the uniformity of processing, and generating particles. The possibility of becoming a source can be eliminated.

According to the method for manufacturing a processing apparatus according to claim 2 , when the measurement result is a quartz product exceeding a predetermined range, the sealing surface of the quartz product is mirror-finished again, so that the protruding portion of the sealing surface Can be detected and deleted easily, the sealing performance of the mirror surface seal part and the uniformity of processing can be improved, scratches and chipping caused by the protruding part can be prevented, and it can be a source of particles Sex can be excluded.

According to the method for manufacturing a processing apparatus according to claim 3 , since the mirror surface processing includes a polishing step of polishing a sealing surface of a quartz product and a finishing step of finishing the polished sealing surface by gas baking. The sealing surface of the product can be easily mirror-finished, and the sealing performance of the mirror surface sealing portion can be improved.

According to the method for manufacturing a quartz product in the processing apparatus according to claim 4, the method for manufacturing a quartz product having a mirror-finished sealing surface used in a processing apparatus that accommodates an object to be processed and performs a predetermined process. The polishing process for polishing the sealing surface of the quartz product, the finishing process for finishing the polished sealing surface by gas baking, and the flatness of the sealing surface is measured by pressing the pressure-sensitive paper with a flat surface against the finished sealing surface. Since the method includes a step and a step of determining whether or not the quartz product is a non-defective product based on whether or not the measurement result is within a predetermined range, a quartz product with a high flatness of the sealing surface can be easily obtained.

According to the method for manufacturing a quartz product in the processing apparatus according to claim 5 , when the measurement result is a quartz product exceeding a predetermined range, the sealing surface of the quartz product is again mirror-finished. Can easily detect and remove the protruding portion of the mirror, improve the sealing performance of the mirror surface seal portion and improve the uniformity of processing, prevent scratches and chipping caused by the protruding portion, and generate particles The possibility of becoming.

According to the method for manufacturing a quartz product in the processing apparatus according to claim 6 , the mirror surface processing includes a polishing step for polishing the sealing surface of the quartz product and a finishing step for finishing the polished sealing surface by gas baking. The sealing surface of the quartz product can be easily mirror-finished, and the sealing performance of the mirror surface sealing portion can be improved.

According to the measurement jig of claim 7, the flatness of the sealing surface of the mirror surface sealing portion of the quartz product constituting the processing portion of the processing apparatus that accommodates the object to be processed and performs the predetermined processing is determined using the pressure sensitive paper. A measuring jig for measuring, a fixing base for fixing the quartz product with its sealing surface exposed, a pressure sensitive paper guide for positioning pressure sensitive paper on the sealing surface of the quartz product, Since it has a pressing mechanism with a flat contact body that makes the pressure sensitive paper contact the sealing surface with a predetermined pressure, the flatness of the sealing surface of the mirror surface sealing portion can be easily measured all around the sealing surface. It is possible to improve the sealing performance of the mirror surface sealing portion and the uniformity of processing, and eliminate the possibility of becoming a particle generation source.

  The best mode for carrying out the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a longitudinal sectional view showing a schematic configuration of a processing apparatus according to an embodiment of the present invention.

  In FIG. 1, reference numeral 1 denotes a vertical heat treatment apparatus exemplified as a processing apparatus. This vertical heat treatment apparatus 1 accommodates a plurality of objects to be processed, for example, semiconductor wafers w, as a processing unit that accommodates the object to be processed and performs a predetermined process. A processing container 2 that accommodates and performs a predetermined heat treatment is provided. The processing container 2 is formed of quartz (quartz glass) having heat resistance and corrosion resistance. The processing container 2 has an upper end formed in a dome shape, specifically, a reverse funnel shape, and a lower end opened as a furnace port 3. A flange portion 4 is provided on the outer peripheral portion on the opening end side of the processing container 2, and the flange portion 4 is fixed to a base plate (not shown) via a flange presser 5.

  An L-shaped exhaust pipe portion 6 is formed at the center of the top of the processing container 2, and an exhaust system exhaust pipe capable of reducing the inside of the processing container 2 to a predetermined pressure, for example, about 133 Pa, is connected to the exhaust pipe portion 6. ing. A cylindrical heater (not shown) capable of controlling the inside of the processing container 2 to a predetermined temperature, for example, 300 to 1200 ° C., is provided around the processing container 2.

  Below the processing container 2, a lid body 7 that opens and closes the furnace port (lower end opening) 3 of the processing container 2 is provided so as to be moved up and down by a lifting mechanism (not shown). Above the lid body 7, a quartz boat 8 is provided as a holder for holding a plurality of, for example, about 25 to 100 wafers w at a predetermined interval in the vertical direction. The boat 8 has a support column 9 at the lower center portion, and the support column 9 is connected to a rotation shaft portion 11 of a rotation introducing mechanism 10 provided at the center portion of the lid body 7. A thermo plug 12 is provided at a central portion of the lid 7 as a heat insulating means for suppressing heat radiation from the furnace port 3 so as not to interfere with the support column 9. The thermo plug 12 is provided with a plurality of leg posts 13 erected on the lid body 7, and a lower heater 14 and a leg post 13 each formed of a planar heating element provided substantially horizontally at the upper end of the leg posts 13. It is mainly composed of a plurality of heat shield plates 15 arranged at predetermined intervals in the height direction.

  The lid body 7 is made of quartz. Specifically, the lid body 7 covers an inner lid portion 7a made of quartz that is in contact with a contact surface (seal surface) 16 that is an open end of the processing container 2, and an outer surface of the inner lid portion 7a. It consists of a metal outer lid 7b. An upper end outer peripheral portion of the inner lid portion 7 a is formed inside an opening end outer peripheral portion of the processing container 2. A boss 18 that passes through the rotating shaft 11 is formed downward in the center of the inner lid 7a. An annular contact surface (seal surface) 17 that contacts the contact surface (seal surface) 16 that is the open end of the processing container 2 is formed on the peripheral edge of the inner lid portion 7a so as to protrude upward. Further, a flange portion 19 is formed on the outer peripheral lower side of the inner lid portion 7a.

  A rotation introducing mechanism 10 for rotating the boat 8 is provided at the center of the outer lid portion 7b. The rotation introducing mechanism 10 has a flange portion 20 fixed to the lower surface of the outer lid portion 7b, and a rotating shaft portion 11 protruding upward from the center of the flange portion 20. Between the lower end part of the boss | hub part 18 of the said inner side cover part 7a, and the flange part 20 of the said rotation introduction mechanism 10, the O-ring 21 which seals between these is provided.

  An annular rising portion 22 is formed at the peripheral edge of the outer lid 7b, and the flange portion 19 of the inner lid portion 7a is placed on the upper surface of the rising portion 22 via a heat-resistant resin sheet. Further, an annular flange retainer 23 for fixing the flange portion 19 of the inner lid portion 7a is detachably attached to the rising portion 22 with a screw. At the upper end of the flange retainer 23, an O-ring 24 made of a heat resistant resin, for example, Teflon (registered trademark) is provided to contact and seal the lower surface of the open end of the processing container 2. The flange retainer 23 is provided with a refrigerant passage (for example, a cooling water passage) 25 for cooling the O-ring 24.

An annular hollow chamber 26 is formed between the inner lid portion 7 a and the outer lid portion 7 b, and a planar heater 27 for heating the inner lid portion 7 a is provided in the hollow chamber 26. A refrigerant passage 28 is provided in a portion corresponding to the heater 27 of the outer lid portion 7b. Note that a gas introduction port (not shown) for introducing a processing gas or an inert gas (for example, N ₂ ) into the processing container is provided on the lower side wall portion or the flange portion 4 of the processing container ₂ .

  In order to seal (seal) the contact surfaces (joint surfaces) 16 and 17 between the quartz products of the processing container 2 and the lid body 7, the contact surfaces (also referred to as seal surfaces) 16 and 17 are mirror-finished. The mirror surface seal | sticker part 30 which is given and seals the sealing surfaces of mirror surface processing closely_contact | adhering is comprised.

  In the vertical heat treatment apparatus 1, the pressure sensitive paper 31 is used to determine the flatness of the sealing surfaces 16 and 17 of the processing container 2 and the lid 7 (in the embodiment, the inner lid portion 7a, the same applies hereinafter), which is the quartz product. The quartz products 2 and 7a within the range in which the measurement result is determined in advance are selectively used. In other words, in the manufacturing method of the vertical heat treatment apparatus 1, a measuring step of measuring the flatness of the sealing surfaces 16 and 17 of the processing container 2 and the lid body 7 which are quartz products using the pressure sensitive paper 31, And an assembling process for selecting and assembling the quartz products 2 and 7a whose measurement results are within a predetermined range. Moreover, in the manufacturing method of the quartz products 2 and 7a in the vertical heat treatment apparatus 1, a polishing process for polishing the seal surfaces 16 and 17 of the quartz products 2 and 7a, and a finishing process for finishing the polished seal surfaces by gas baking, Whether the quartz products 2 and 7a are non-defective products depending on the step of measuring the flatness of the sealing surface by pressing the pressure-sensitive paper 31 with a flat surface on the finished sealing surface and whether or not the measurement result is within a predetermined range. A step of determining whether or not.

  The method for measuring the flatness of the seal surfaces 16 and 17 using the pressure sensitive paper 31 will be conceptually described. As shown in FIG. 2, the surface plate 32 having a flat upper surface and the seal surface which is the open end of the processing container 2 are used. A pressure-sensitive paper 31 is sandwiched between the pressure-sensitive paper 31 and the open end of the processing container 2, that is, the sealing surface 16 is pressed against the surface plate 32 through the pressure-sensitive paper 31 with a predetermined pressure (pressing force), thereby measuring pressure distribution, that is, flatness. To do. When measuring the flatness of the sealing surface 17 of the lid 7, the processing container 2 may be replaced with the lid 7.

As shown in FIG. 3, the pressure sensitive paper 31 is composed of two sheets 31a and 31b that are overlapped, and a color former in which a color former packed in microcapsules is applied to the inner surface of one sheet (A film) 31a. This is a pressure measurement film (Fuji Photo Film, Fuji Prescale) in which a layer 33 is provided and a developer layer 34 coated with a developer is provided on the inner surface of the other sheet (B film) 31b. It is preferable. As the type of the pressure measurement film, it is preferable to use an extremely low pressure whose measurable pressure or pressing force is about ² to 6 kgf / cm ^2, for example.

  The principle of color development is that the microfilm of the color former layer 33 is destroyed by pressure, and the color former therein is adsorbed by the color developer of the color developer layer 34 and develops red color by a chemical reaction. According to the pressure measuring film 31, color is developed on the inner surface of the other sheet 31b at a density corresponding to the pressure. When the flatness of the seal surfaces 16 and 17 is high, the pressure distribution is uniform, so that the inner surface of the sheet 31b is uniformly thinly colored within the same range as the seal surface or not colored at all (this state is determined in advance). Within range). When the flatness of the seal surfaces 16 and 17 is low, that is, when there are protrusions and undulations on the seal surfaces 16 and 17, the pressure distribution is non-uniform, so the inner surface of the sheet 31 b corresponds to the protrusions. The color develops deeply or develops in spots (this state is assumed to exceed a predetermined range). In other words, the flatness of the sealing surfaces 16 and 17 can be measured or evaluated only by looking at the degree of color development or the pressure distribution of the sheet 31b.

  When the measurement result is a quartz product exceeding a predetermined range, the sealing surface 16 or 17 of the quartz product (processing vessel or lid) is mirror-finished again. This mirror processing includes a polishing step for polishing the sealing surface 16 or 17 of the quartz product and a finishing step for finishing the polished sealing surface by gas baking. In the polishing process, polishing may be performed by sprinkling an abrasive on the surface of the fixed plate and sliding the sealing surface of the quartz product on the fixed plate.

  According to the vertical heat treatment apparatus 1 configured as described above, the vertical heat treatment apparatus in which the processing unit that accommodates the object to be processed w and performs a predetermined process is made of a quartz product, and the quartz product has the mirror seal portion 30. The flatness of the sealing surfaces 16 and 17 of the mirror seal portion 30 of the quartz product is measured using the pressure sensitive paper 31, and the quartz product whose measurement result is within a predetermined range is selectively used. Therefore, the flatness of the sealing surfaces 16 and 17 of the mirror surface sealing portion 30 can be easily measured at once over the entire circumference of the sealing surface, and the sealing performance of the mirror surface sealing portion 30 and the uniformity of processing can be improved. As a result, it is possible to prevent scratches and chippings caused by the protruding portion, so that the possibility of becoming a particle generation source can be eliminated.

  Since the quartz product is the processing container 2 whose lower end is opened and the lid 7 that is in contact with the open end of the processing container 2, the flat surfaces of the sealing surfaces 16 and 17 of the processing container 2 and the lid 7 are used. The degree can be easily measured at once on the entire circumference of the sealing surface, the sealing property of the mirror surface sealing portion 30 and the uniformity of processing can be improved, and the possibility of becoming a particle generation source can be eliminated.

  The pressure sensitive paper 31 is composed of two sheets 31a and 31b that are superposed on each other, and a color former layer 33 coated with a color former packed in microcapsules is provided on the inner surface of one sheet, and the inner surface of the other sheet 31b. Is a pressure measuring film provided with a developer layer 34 coated with a developer, so that the flatness of the sealing surfaces 16 and 17 of the quartz product can be easily measured. It is possible to prevent the coloring agent from adhering to the sealing surfaces 16 and 17 of a certain processing container 2 or lid 7 to become a contamination source to the object to be processed w.

  Further, according to the method for manufacturing the vertical heat treatment apparatus 1, the vertical heat treatment apparatus 1 in which the processing unit that accommodates the object to be processed w and performs a predetermined process is made of a quartz product, and the quartz product has the mirror seal portion 30. A measuring step of measuring the flatness of the sealing surfaces 16 and 17 of the mirror seal portion 30 of the quartz product using the pressure sensitive paper 31, and a quartz product whose measurement result is within a predetermined range. Therefore, the flatness of the sealing surfaces 16 and 17 of the mirror surface seal portion 30 can be easily measured at once over the entire circumference of the seal surface, and the sealing performance of the mirror surface seal portion 30 can be measured. And the uniformity of processing can be improved, and the possibility of becoming a generation source of particles can be eliminated.

  When the measurement result is a quartz product that exceeds a predetermined range, the sealing surfaces 16 and 17 of the quartz product are mirror-finished again, so that the protruding portion 70 (see FIG. 13) of the sealing surfaces 16 and 17 is easy. Can be detected and removed by re-mirror surface processing, the sealing property of the mirror surface seal portion 30 can be improved and the uniformity of processing can be improved, scratches and chips caused by protruding portions can be prevented, and the generation source of particles The possibility of becoming.

  Since the mirror surface processing includes a polishing step for polishing the sealing surfaces 16 and 17 of the quartz product and a finishing step for finishing the polished sealing surfaces 16 and 17 by gas baking, the sealing surfaces 16 and 17 of the quartz product are formed. Mirror surface processing can be easily performed, and the sealing performance of the mirror surface seal portion 30 can be improved.

  According to the manufacturing method of the quartz products 2 and 7, the polishing step of polishing the seal surfaces 16 and 17 of the quartz products 2 and 7, the finishing step of finishing the polished seal surfaces by gas baking, and the finished seal surfaces A step of measuring the flatness of the sealing surface by pressing the pressure-sensitive paper 31 with a flat surface, and a step of determining whether or not the quartz products 2 and 7 are non-defective products depending on whether or not the measurement result is within a predetermined range. Since it is provided, a quartz product with a high flatness of the sealing surface can be easily obtained.

  4 is a schematic side view showing a measurement state of a processing container using a measuring jig, FIG. 5 is a schematic front view of the processing container, FIG. 6 is a schematic plan view of the processing container, and FIG. FIG. 8 is a schematic side view showing a state of measurement of the lid using the measuring jig, and shows a state when the pressure is released.

  This measuring jig 35 is used to measure the flatness of the sealing surfaces 16 and 17 of the quartz product constituting the processing unit of the processing apparatus 1, such as the processing container 2 and the mirror surface sealing unit 30 of the lid 7, using the pressure sensitive paper 30. In this measuring apparatus, a fixing base 36 for fixing the quartz product with the sealing surfaces 16 and 17 exposed, a pressure sensitive paper guide 37 for positioning the pressure sensitive paper 31 on the sealing surface of the quartz product, and the quartz A pressing mechanism 39 having a flat abutting body 38 that abuts the pressure sensitive paper 31 on the product seal surfaces 16 and 17 with a predetermined pressure is provided. The fixed base 36 includes a bottom plate 40 that is a base portion, and a base plate 42 that is horizontally supported and fixed at a predetermined height position on the top of the bottom plate 40 via four columns 41. The bottom plate 40 is preferably provided with a moving caster 43 and a fixing jack 44.

  The base plate 42 is formed with, for example, a circular opening 45 that can expose the sealing surface 16 of the processing container 2 downward, and an annular support receiving part 46 that can support the flange portion 4 of the processing container 2. ing. Around the support receiving portion 46 on the base plate 42, for example, four manual clamping mechanisms 47 that can be clamped between the support receiving portion 46 by pressing the flange portion 4 of the processing container 2 from above are disposed as appropriate. ing. A processing container guide 48 for restricting the flange portion 4 of the processing container 2 from four directions is disposed around the support receiving portion 46 on the base plate 42.

  The pressure sensitive paper guide portion 37 is composed of a horizontal guide plate disposed with a predetermined gap into which the pressure sensitive paper (pressure measuring film) 31 can be inserted below the base plate 42, and the opening 45 of the base plate 42. And corresponding circular openings (not shown). The pressure sensitive paper 31 can be inserted horizontally from the left to the right in FIG. 4 by the pressure sensitive paper guide 37 and set at the lower part of the seal surface 16 of the processing container 2.

  In this embodiment, the pressing mechanism 39 is configured manually. The pressing mechanism 39 includes an output shaft 51 supported by a bearing (ball spline bearing) 50 provided at a center portion on the bottom plate 40 via a support base 49 so as to be movable up and down, and a bearing 52 on the bottom plate 40. A horizontal rotation shaft 53 provided rotatably, a handle lever 54 provided at one end of the rotation shaft 53 for manually rotating the rotation shaft 53, and the rotation shaft 53. A link mechanism 55 is provided which is connected between the other end and the output shaft 51 and includes a first link 55a and a second link 55b which converts the rotational force of the rotating shaft 53 into a vertical upward pressing force.

  In order to transmit the pressing force uniformly from the output shaft 51 to the contact body 38, an output plate 56 is provided at the upper end portion of the output shaft 51 through a ball joint 57 so as to be swingable. The abutting body 38 is swingably provided via a plurality of, for example, four guide rods 58 and springs 59. The contact body 38 is formed in an annular shape corresponding to the sealing surface 16 of the processing container 2. The width of the contact surface of the contact body 38 is the same as or slightly larger than the seal surface 16. In FIG. 4, reference numerals 60 and 61 denote restricting members (stoppers) for restricting the rotation range of the first link 55a, and when the handle lever 54 is operated to the operating position, the first link 55a is in a position beyond the thought point. By being locked by the restricting member 61, it is held at the operating position and is not allowed to return to the standby position side without permission.

  When measuring the surface pressure of the seal surface 16, the processing container 2 is first lifted and set on the fixed base 36. In that case, the flange portion 4 of the processing container 2 is placed on the support receiving portion 46 of the base plate 42, and the flange portion 4 is clamped and fixed by the clamp mechanism 47. Next, the pressure sensitive paper 31 is inserted and set by the pressure sensitive paper guide 37. At this time, as shown in FIG. 7, the handle lever 54 is in the standby position, and the contact body 38 is in the retracted position away from the sealing surface 16 of the processing container 2. When the handle lever 54 is rotated to the operating position as shown in FIG. 4, the handle lever 54 is brought into contact with the contact plate 38 via the rotation shaft 53, the link mechanism 55, the output shaft 51, the ball joint 57, the output plate 56 and the spring 59. The pressing force is transmitted, and the contact plate 38 is uniformly pressed against the sealing surface 16 of the processing container 2 through the pressure sensitive paper 31. The pressing force acts by multiplying the operating force of the handle 54 by the lever ratio of the handle lever 54 and the first link 55a (the length of the handle lever / the length of the first link).

  Thus, the surface pressure measurement of the seal surface 16 is performed, and when the surface pressure measurement is completed, the handle lever 54 is returned to the standby position, and the contact body 38 is retracted downward from the seal surface 16 (see FIG. 7). The pressure sensitive paper 31 is extracted, the clamp mechanism 47 is released, and the processing container 2 is removed from the measurement jig 35. In the measurement jig 35, the processing container 2 and the pressure sensitive paper 31 are positioned in a predetermined direction, and the color development surface of the pressure sensitive paper 31 and the circumferential position of the seal surface 16 of the processing container 2 correspond to each other. When a point with a high concentration is detected, it can be seen that there is a protruding portion at the corresponding position on the seal surface 16 of the processing container 2. As a result of the measurement, if a ring-shaped thin uniform color appears on the pressure sensitive paper 31 or no color develops at all, an evaluation that it is within a predetermined range and the sealing surface 16 has high flatness is obtained. On the other hand, if a high-density point, a spotted pattern, or uneven color development appears on the pressure-sensitive paper, it deviates from the predetermined range, and there is a protruding portion on the seal surface 16 or irregularities and undulations. Thus, an evaluation (measurement result) that the sealing surface 16 has low flatness is obtained.

  As shown in FIG. 8, when the surface pressure of the sealing surface 17 of the lid body 7, that is, the inner lid portion 7a is measured with the measuring jig 35, the inner lid portion 7a is set with the sealing surface 17 facing downward. In this case, since the outer diameter of the inner lid portion 7a is smaller than the inner diameter of the opening 45 of the base plate 42 and cannot be directly supported by the support receiving portion 46, the peripheral lower surface portion of the inner lid portion 7a is supported by the support receiving portion 46. A first auxiliary ring 62 is attached, and a second auxiliary ring 63 is attached to the upper surface of the peripheral edge of the inner lid portion 7 a, and the second auxiliary ring 63 is pressed by the clamp mechanism 47. Note that the first auxiliary ring 62 and the second auxiliary ring 63 may be attached to the inner lid portion 7a in advance before measurement. In this case, it is preferable that the spacer 64 is sandwiched between the first auxiliary ring 62 and the second auxiliary ring 63, and the first auxiliary ring 62 and the second auxiliary ring 63 are connected to each other with screws.

  As described above, according to the measuring jig 35, the sealing surfaces 16 and 17 of the mirror surface sealing portion 30 of the quartz products 2 and 7 constituting the processing portion of the processing apparatus 1 that accommodates the object to be processed w and performs a predetermined processing. A measuring jig for measuring flatness using pressure-sensitive paper 31, and a fixing base 36 for fixing the quartz product with the sealing surfaces 16 and 17 exposed, and a pressure-sensitive paper on the sealing surface of the quartz product. Since the pressure sensitive paper guide portion 37 for positioning the pressure sensitive paper 31 and the pressing mechanism 39 having the flat contact body 38 for bringing the pressure sensitive paper 31 into contact with the sealing surface of the quartz product with a predetermined pressure are provided. The flatness of 30 seal surfaces 16 and 17 can be easily measured at once over the entire circumference of the seal surface, so that the sealing property of the mirror surface seal portion 30 and the uniformity of processing can be improved. Can eliminate the possibility.

  As a result of measuring the surface pressure using the measuring jig 35, if the judgment or evaluation is delicate, the cross-sections of the seal surfaces 16 and 17 using a surface roughness meter 65 as shown in FIGS. Measure the shape. The surface roughness meter 65 has a contact 65a facing in the direction of gravity, and the cross-sectional shape of the seal surfaces 16 and 17 is changed by moving the contact 65a in the radial direction in contact with the seal surfaces 16 and 17. It can be measured.

  When measuring the sealing surface 16 of the processing container 2, as shown in FIG. 9, a base plate 66 is placed on the flange portion 4 of the processing container 2 upside down, and the planar roughness is placed on the base plate 66. A total of 65 is set for measurement. When measuring the sealing surface 17 of the inner lid portion 7a, the inner lid portion 7a is placed on the first base plate 67 with the sealing surface 17 facing upward as shown in FIG. A second base plate 68 is placed on the surface 67, and a surface roughness meter 65 is set on the second base plate 68 to perform measurement.

  The measurement with the surface roughness meter 65 is preferably performed at a plurality of, for example, eight locations in the circumferential direction of the seal surfaces 16 and 17. Further, a surface roughness meter 65 is used to measure a portion where flatness is suspected in the measurement using the thermal paper 31. Thereby, the protrusion part in the sealing surfaces 16 and 17, a wave | undulation, etc. can be measured. If the measurement result is within a predetermined range, the quartz product is selected and the processing apparatus is assembled. Since the accuracy control of the sealing surface of the quartz product is performed in this way, the conventional processing apparatus performs processing as shown in FIG. 12 (a) and the sealing surface of the cap, as shown in FIG. 12 (b). In some cases, the sealing surface of the container has a protruding portion, which may cause variations in sealing performance. According to the present embodiment, the sealing surface of the cap as shown in FIG. In addition, as shown in (b) of the same figure, there is no protruding portion on the sealing surface of the processing container, the variation in sealing performance does not occur, and the uniformity of processing can be improved.

  As mentioned above, although embodiment thru | or example of this invention has been explained in full detail with drawing, this invention is not limited to the said embodiment thru | or example, Various in the range which does not deviate from the summary of this invention. Design changes can be made. For example, the pressing mechanism in the measuring jig is preferably a manual type, but may be an electric type, a hydraulic type or a pneumatic type. The processing apparatus is not limited to a batch type that processes a large number of objects to be processed at a time, and may be a single wafer type that processes objects to be processed one by one.

It is a longitudinal cross-sectional view which shows schematic structure of the processing apparatus which concerns on embodiment of this invention. It is a figure for demonstrating notionally the method of measuring the flatness of the joint surface of a processing container using a pressure sensitive paper. It is a figure which shows roughly the structure of a pressure sensitive paper. It is a schematic side view which shows the measurement condition of the processing container using a measuring jig. It is the same schematic front view. It is the same schematic plan view. It is a schematic side view which shows a state when the pressing force of the pressing mechanism of a measuring jig is cancelled | released. It is a schematic side view which shows the measurement condition of the cover body using a measurement jig. It is a figure which shows roughly the measurement condition of the processing container using a surface roughness meter. It is a figure which shows roughly the measurement condition of the cover body using a surface roughness meter. It is a figure which shows the measurement data of this Embodiment. It is a figure which shows the conventional measurement data. It is a figure explaining the malfunction in the joint surface of a quartz product.

Explanation of symbols

1 Vertical heat treatment equipment w Semiconductor wafer (object to be processed)
2 Processing container 7 Lid 16, 17 Seal surface 30 Mirror surface seal part 31 Pressure sensitive paper 33 Color developing agent layer 34 Developer layer 35 Measuring jig 36 Fixing base 37 Pressure sensitive paper guide part 39 Pressing mechanism

Claims (7)

Processing unit for performing predetermined processing by accommodating the object to be processed is composed of quartz products, quartz products A manufacturing method of a processing apparatus having a mirror surface seal portion is brought into close contact with the sealing surfaces of the mirror-finished, the quartz product A processing apparatus comprising : a measuring step for measuring the flatness of the sealing surface of the first surface using pressure-sensitive paper; and an assembling step for selecting and assembling a quartz product whose measurement result is within a predetermined range. Manufacturing method . 2. The method of manufacturing a processing apparatus according to claim 1, wherein when the measurement result is a quartz product exceeding a predetermined range, the sealing surface of the quartz product is mirror-finished again . 3. The method of manufacturing a processing apparatus according to claim 1, wherein the mirror finishing includes a polishing step of polishing a sealing surface of a quartz product and a finishing step of finishing the polished sealing surface by gas baking. A method for manufacturing a quartz product having a mirror-finished sealing surface used in a processing apparatus that accommodates an object to be processed and performs a predetermined processing, a polishing step for polishing the sealing surface of the quartz product, and polishing Depending on the finishing process of finishing the sealing surface by gas firing, the process of measuring the flatness of the sealing surface by pressing the pressure-sensitive paper flat on the finished sealing surface, and whether the measurement result is within a predetermined range method for manufacturing a silica product in the processing apparatus quartz product characterized by comprising a step of determining whether non-defective. 5. The method of manufacturing a quartz product in a processing apparatus according to claim 4, wherein when the measurement result is a quartz product exceeding a predetermined range, the sealing surface of the quartz product is mirror-finished again. The mirror-polishing, a polishing step of polishing the sealing surface of the quartz product, polished sealing surface of the quartz product in the processing apparatus according to claim 4 or 5 further characterized in that a step finishing finish by gas Baked Production method. A measuring jig for measuring the flatness of a sealing surface of a mirror surface sealing portion of a quartz product constituting a processing unit of a processing apparatus that accommodates an object to be processed and uses a pressure sensitive paper, the quartz product A pressure-sensitive paper guide for positioning the pressure-sensitive paper on the sealing surface of the quartz product, and the pressure-sensitive paper abutting at a predetermined pressure on the sealing surface of the quartz product. And a pressing mechanism having a flat contact body to be measured .

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