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JP4242751B2 - Deaerator for water supply - Google Patents
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JP4242751B2 - Deaerator for water supply - Google Patents

Deaerator for water supply Download PDF

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JP4242751B2
JP4242751B2 JP2003377705A JP2003377705A JP4242751B2 JP 4242751 B2 JP4242751 B2 JP 4242751B2 JP 2003377705 A JP2003377705 A JP 2003377705A JP 2003377705 A JP2003377705 A JP 2003377705A JP 4242751 B2 JP4242751 B2 JP 4242751B2
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water
tank
deaeration
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storage tank
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JP2005138033A (en
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満雄 松村
晃弘 松村
安広 松村
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長野エンジニア工業株式会社
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Description

本発明は、脱気槽に供給された被処理水に対して真空吸引することにより、被処理水から溶存酸素を除去して処理水を生成する給水用脱気装置に関する。   The present invention relates to a water supply deaeration device that generates dissolved water by removing dissolved oxygen from water to be treated by vacuum suction of the water to be treated supplied to a degassing tank.

一般に、ホテルやマンション等に設置される給水設備や給湯設備では、水道水中の溶存酸素により、ボイラ等の給湯機器や水道管の内部に錆が発生し、水道水の赤濁(赤水)や給湯機器等の寿命低下の原因となる。特に、食品製造等の分野で使用される蒸気ボイラ設備では、腐食による穴空き等が発生しやすく、数年程度の使用で修理や部品交換が必要になる場合も少なくない。   In general, in water supply facilities and hot water facilities installed in hotels and condominiums, dissolved oxygen in tap water causes rust to form inside hot water supply equipment such as boilers and water pipes. It may cause a decrease in the service life of the equipment. In particular, steam boiler equipment used in the field of food production and the like is likely to have holes due to corrosion, and repair and parts replacement are often required after several years of use.

このため、従来より、給水設備や給湯設備に供給される水道水(被処理水)中の溶存酸素を除去する脱気装置も提案されている。この種の脱気装置としては、その脱気原理によって、中空糸気体透過膜モジュールや脱気塔を用いた真空脱気方式や蒸気の熱源を利用して加熱により脱気する加熱脱気方式等の各種タイプが知られている。   For this reason, the deaeration apparatus which removes the dissolved oxygen in the tap water (to-be-processed water) supplied to water supply equipment and hot water supply equipment conventionally is proposed. As this type of deaerator, depending on the deaeration principle, a vacuum deaeration method using a hollow fiber gas permeable membrane module or a deaeration tower, a heating deaeration method for deaeration by heating using a steam heat source, etc. Various types of are known.

特に、真空脱気方式を用いた脱気装置としては、特開平10−151442号公報で開示される真空脱気装置が知られている。この脱気装置は、気密に形成された脱気塔内に気液接触材の充填層を形成し、脱気塔の上方から被処理水を供給し、充填層の下方から処理水を排出すると共に、真空手段により脱気塔内の気体を排出するようにした真空脱気装置において、気液接触材を下方から支持する支持部材の開口率を35パーセント以上に設定したものである。これにより、支持部材から落下する処理水の水膜形成が防止され、充填層支持部材の下方に空間が生じても、ここにおける酸素の再溶解が抑制される。
特開平10−151442号
In particular, as a degassing apparatus using a vacuum degassing system, a vacuum degassing apparatus disclosed in JP-A-10-151442 is known. This deaeration device forms a packed bed of gas-liquid contact material in an airtight deaeration tower, supplies treated water from above the deaeration tower, and discharges treated water from below the packed bed In addition, in the vacuum deaeration apparatus in which the gas in the deaeration tower is discharged by the vacuum means, the opening ratio of the support member that supports the gas-liquid contact material from below is set to 35% or more. Thereby, formation of a water film of treated water falling from the support member is prevented, and even if a space is formed below the packed bed support member, re-dissolution of oxygen here is suppressed.
JP-A-10-151442

しかし、上述した従来の脱気装置は、次のような問題点があった。   However, the conventional deaeration device described above has the following problems.

第一に、基本的な脱気作用は、処理水の噴射と真空吸引に頼るため、十分な脱気効果を得ることができない。   First, since the basic deaeration action depends on the jet of treated water and vacuum suction, a sufficient deaeration effect cannot be obtained.

第二に、主要部に複雑な構成部品が必要になり、また、部品点数も多くなるため、製造工数の増加に伴う生産性の低下や部品及び製造に伴うコストアップを招く。   Secondly, complex components are required in the main part and the number of parts increases, leading to a decrease in productivity due to an increase in manufacturing man-hours and an increase in costs associated with parts and manufacturing.

第三に、単位時間当たりの処理量が限られるため、大量の給水が要求されるホテルやマンション等では、給水需要に応じた複数台の脱気装置が必要となり、大幅な設備コストを強いられる。   Third, because the amount of treatment per unit time is limited, hotels and condominiums that require a large amount of water supply require multiple deaerators according to the water supply demand, which imposes significant equipment costs. .

本発明は、このような背景技術に存在する課題を解決した給水用脱気装置の提供を目的とするものである。   The object of the present invention is to provide a deaeration device for water supply that solves the problems existing in the background art.

本発明は、上述した課題を解決するため、脱気槽2に供給された被処理水Woに対して真空吸引することにより、被処理水Woから溶存酸素を除去して処理水Wsを生成する給水用脱気装置1を構成するに際して、水平方向に長い筒状に形成した脱気槽2と、この脱気槽2の内部に水平方向に並べて配し、かつ底面部23とこの底面部23の周縁から立上げた側面部24を有することにより所定量の被処理水Woを溜めることができる複数の脱気処理皿3…と、各脱気処理皿3…に対して所定距離Hsの位置に配し、かつ脱気処理皿3…に溜まった被処理水Woの水面に対してそれぞれシャワー状の被処理水Woを吹付け衝突させることにより泡Bを発生させる複数の噴射ノズル4…と、脱気槽2における各噴射ノズル4…の相互間に設けることにより脱気槽2の内部に対して真空吸引を行う複数の真空吸引口6…と、複数の噴射ノズル4…にそれぞれ接続することにより各噴射ノズル4…の一又は二以上を選択して使用可能にする開閉バルブ5…と、脱気槽2の下方に配し、かつ通水管8…により脱気槽2に接続した水平方向に長い筒状に形成した貯水槽7と、貯水槽7に接続した貯水タンク9と、貯水槽7の水位Lwが上限レベルLuに達したなら当該貯水槽7から貯水タンク9に送水し、かつ貯水槽7の水位Lwが下限レベルLdに達したなら当該貯水槽7から貯水タンク9への送水を停止するととともに、貯水タンク9の水位Ltwが上限レベルLtuに達したなら被処理水Woに対する脱気処理を停止し、かつ貯水タンク9の水位Ltwが下限レベルLtdに達したなら被処理水Woに対する脱気処理を行うシーケンス制御部10と、貯水槽7から貯水タンク9に送水する送水ポンプ11から吐出する処理水Wsの一部を脱気槽2又は貯水槽7の内部に戻すリターン回路12とを備えることを特徴とする。   In order to solve the above-described problem, the present invention generates the treated water Ws by removing the dissolved oxygen from the treated water Wo by vacuum suctioning the treated water Wo supplied to the deaeration tank 2. When the deaeration device 1 for water supply is configured, a deaeration tank 2 formed in a horizontally long cylindrical shape, and arranged in the horizontal direction in the deaeration tank 2, and a bottom surface 23 and the bottom surface 23 A plurality of deaeration treatment trays 3 that can store a predetermined amount of water to be treated Wo by having side portions 24 raised from the peripheral edge of each, and a position at a predetermined distance Hs with respect to each deaeration treatment tray 3. And a plurality of spray nozzles 4 that generate bubbles B by spraying and colliding shower-like water to be treated Wo against the surface of the water to be treated Wo collected in the deaeration treatment dish 3. , Between the spray nozzles 4 in the deaeration tank 2 Are connected to the plurality of vacuum suction ports 6 for performing vacuum suction to the inside of the deaeration tank 2 and the plurality of spray nozzles 4. An open / close valve 5 that can be used, a water tank 7 that is disposed below the deaeration tank 2 and is connected to the deaeration tank 2 by a water pipe 8. When the water level Lw of the water storage tank 9 connected to the water tank 7 reaches the upper limit level Lu, the water is transferred from the water storage tank 7 to the water storage tank 9, and when the water level Lw of the water storage tank 7 reaches the lower limit level Ld When the water supply from the water storage tank 7 to the water storage tank 9 is stopped and the water level Ltw of the water storage tank 9 reaches the upper limit level Ltu, the deaeration process for the water to be treated Wo is stopped, and the water level Ltw of the water storage tank 9 is lower than the lower limit. If the level is reached A part of the treated water Ws discharged from the sequence controller 10 that performs the deaeration process on the treated water Wo and the water pump 11 that feeds water from the water tank 7 to the water tank 9 is returned to the inside of the degas tank 2 or the water tank 7. And a return circuit 12.

このような構成を有する本発明に係る給水用脱気装置1によれば、次のような顕著な効果を奏する。   According to the water supply deaeration device 1 according to the present invention having such a configuration, the following remarkable effects can be obtained.

(1) シャワー状の被処理水Woを脱気処理皿3…に溜まった被処理水Woに吹付けることにより多量の泡Bを発生させるため、効率的な脱気処理が可能となり、脱気効果を飛躍的に高めることができる。   (1) Since a large amount of bubbles B are generated by spraying shower-like water to be treated Wo on the water to be treated Wo collected in the deaeration treatment dish 3. The effect can be dramatically increased.

(2) 脱気槽2における各噴射ノズル4…の相互間に設けることにより脱気槽2の内部に対して真空吸引を行う複数の真空吸引口6…を備えるため、複数の噴射ノズル4…を配した場合であっても脱気槽2内における均一な真空吸引を行うことができる。   (2) Since a plurality of vacuum suction ports 6 for performing vacuum suction with respect to the inside of the deaeration tank 2 by being provided between the respective injection nozzles 4 in the deaeration tank 2, a plurality of injection nozzles 4. Even if it is a case, uniform vacuum suction in the deaeration tank 2 can be performed.

(3) 複数の噴射ノズル4…にそれぞれ接続することにより各噴射ノズル4…の一又は二以上を選択して使用可能にする開閉バルブ5…を備えるため、各種用途や各種給水状態に係る水量に対応して処理能力を容易に変更(増減)できる。   (3) Since each of the plurality of spray nozzles 4 is connected to each of the plurality of spray nozzles 4 to provide an open / close valve 5 that can be used by selecting one or more of the spray nozzles 4. The processing capacity can be easily changed (increased or decreased) in response to

(4) 主要部は噴射ノズル4…と脱気処理皿3…で構成できるため、構成部品の単純化及び部品点数の削減を実現でき、製造工数の低減に伴う生産性向上と部品及び製造上のコストダウンに寄与できる。   (4) Since the main part can be composed of the injection nozzles 4 ... and the deaeration treatment tray 3 ..., simplification of the component parts and reduction of the number of parts can be realized. Can contribute to cost reduction.

(5) 単位時間当たりの処理量を大量に確保できることに加え、処理量を容易に変更できるため、各種用途や各種給水状態に対して柔軟に対応でき、汎用性に優れるとともに、貯水タンクを設置した場合における貯水タンクの小型化、更には貯水タンクにおける処理水Wsの劣化防止にも寄与できる。   (5) In addition to ensuring a large amount of treatment per unit time, the amount of treatment can be easily changed, so it can be flexibly adapted to various uses and various water supply conditions, is highly versatile, and has a water storage tank. In this case, the water storage tank can be reduced in size, and further, the deterioration of the treated water Ws in the water storage tank can be prevented.

(6) 貯水槽7から貯水タンク9に送水する送水ポンプ11から吐出する処理水Wsの一部を脱気槽2又は貯水槽7の内部に戻すリターン回路12を備えるため、貯水槽7から貯水タンク9への送水を円滑に行うことができる。   (6) Since a return circuit 12 is provided for returning a part of the treated water Ws discharged from the water pump 11 for feeding water from the water tank 7 to the water tank 9 to the inside of the deaeration tank 2 or the water tank 7, water is stored from the water tank 7. Water can be smoothly supplied to the tank 9.

次に、本発明に係る好適な実施例を挙げ、図面に基づき詳細に説明する。   Next, preferred embodiments according to the present invention will be given and described in detail with reference to the drawings.

まず、本実施例に係る給水用脱気装置1の構成について、図1〜図4を参照して説明する。   First, the structure of the deaeration device 1 for water supply which concerns on a present Example is demonstrated with reference to FIGS.

図1に示す給水用脱気装置1において、2は脱気槽を示す。この脱気槽2は、全体を密閉構造とし、剛性素材により水平方向に長い円筒状に形成する。脱気槽2の内部下面部には、複数の脚部21…を所定間隔置きに固定し、この脚部21…の上に、チャンネル状に折曲形成した処理皿支持部22を固定する。また、処理皿支持部22の上には、剛性素材で形成した複数(実施例は九つ)の脱気処理皿3…を水平方向に並べて固定する。一つの脱気処理皿3(他の脱気処理皿3…も同じ)は、図2及び図3に示すように、円形の底面部23とこの底面部23の周縁から立上げたリング形の側面部24を有する。なお、実施例の底面部23は、中心側を下方に湾曲させた例を示したが、平坦であってもよい。   In the water supply deaeration apparatus 1 shown in FIG. 1, reference numeral 2 denotes a deaeration tank. The deaeration tank 2 has a sealed structure as a whole, and is formed in a cylindrical shape that is long in the horizontal direction by a rigid material. A plurality of leg portions 21 are fixed to the inner lower surface of the deaeration tank 2 at predetermined intervals, and a processing dish support portion 22 formed in a channel shape is fixed on the leg portions 21. Further, a plurality (nine in the embodiment) of deaeration treatment dishes 3... Made of a rigid material are arranged on the treatment dish support portion 22 in a horizontal direction and fixed. One deaeration treatment dish 3 (the same applies to the other deaeration treatment dishes 3...), As shown in FIGS. 2 and 3, has a ring-shaped bottom surface portion 23 and a ring shape raised from the periphery of the bottom surface portion 23. It has a side part 24. In addition, although the bottom face part 23 of the Example showed the example which curved the center side below, it may be flat.

一方、各脱気処理皿3…の上方、即ち、脱気槽2の上面部には、各脱気処理皿3…に対応した複数の噴射ノズル4…を配設する。一つの噴射ノズル4(他の噴射ノズル4…も同じ)は、脱気槽2の上面部に、外部から内部に貫通する分岐管25を取付け、脱気槽2の内部に臨む分岐管25の先端(下端)に噴射ノズル4を取付ける。この場合、噴射ノズル4は、脱気処理皿3の底面部23における中心の真上に配し、かつ当該中心から所定距離Hsだけ離間させる。噴射ノズル4は、供給された被処理水Woをシャワー状に噴射する機能を有する。なお、噴射ノズル4は、内部の自然流をそのまま噴射口4oから噴射するタイプであってもよいし、内部で螺旋水流を発生させ、この螺旋水流を噴射口4oから噴射するタイプであってもよい。さらに、必要により噴射角度や噴射量等の噴射状態を調整できるタイプであってもよい。   On the other hand, a plurality of injection nozzles 4 corresponding to the deaeration treatment dishes 3 are arranged above the deaeration treatment dishes 3, that is, on the upper surface of the deaeration tank 2. One injection nozzle 4 (the same applies to the other injection nozzles 4...) Is provided with a branch pipe 25 penetrating from the outside to the top surface of the deaeration tank 2, and the branch pipe 25 facing the inside of the deaeration tank 2. Attach the injection nozzle 4 to the tip (lower end). In this case, the injection nozzle 4 is disposed immediately above the center of the bottom surface portion 23 of the deaeration treatment dish 3 and is separated from the center by a predetermined distance Hs. The spray nozzle 4 has a function of spraying the supplied water to be treated Wo in a shower shape. The injection nozzle 4 may be of a type in which an internal natural flow is directly injected from the injection port 4o, or a type in which a spiral water flow is generated inside and this spiral water flow is injected from the injection port 4o. Good. Furthermore, the type which can adjust injection states, such as an injection angle and an injection quantity, as needed may be sufficient.

また、脱気槽2の下方には、貯水槽7を配設する。貯水槽7は、全体を密閉構造とし、剛性素材により水平方向に長い円筒状に形成する。そして、この貯水槽7の上面部と脱気槽2の下面部を異なる位置に配した複数(実施例は二本)の通水管8…により接続する。実施例の通水管8…は、脱気槽2の支持機能も兼ねている。なお、脱気槽2と貯水槽7は、単一の槽により一体に形成することもできるが、脱気槽2と貯水槽7を分けることにより、脱気槽2における複数の脱気処理皿3…の組付等が容易になるなど、組立性及び設計自由度を高めることができるとともに、小型化にも寄与できる。貯水槽7の側面部(端面部又は周面部)には、上側から下側へ、満水検出器26f,上限レベル検出器26u,下限レベル検出器26d,渇水検出器26e及びアース器26gを所定間隔置きに順次付設する。これにより、上限レベル検出器26uは、貯水槽7に貯まった処理水Wsの水位Lwが上限レベルLuに達したことを検出できるとともに、下限レベル検出器26dは、同水位Lwが下限レベルLdに達したことを検出できる。さらに、満水検出器26f及び渇水検出器26eは、満水状態及び渇水状態をそれぞれ検出することができる。   A water storage tank 7 is disposed below the deaeration tank 2. The water storage tank 7 has a sealed structure as a whole, and is formed in a cylindrical shape that is long in the horizontal direction by a rigid material. And the upper surface part of this water storage tank 7 and the lower surface part of the deaeration tank 2 are connected by a plurality (two in the embodiment) of water pipes 8 arranged at different positions. The water pipes 8 of the embodiment also serve as a support function for the deaeration tank 2. In addition, although the deaeration tank 2 and the water storage tank 7 can also be integrally formed by a single tank, by separating the deaeration tank 2 and the water storage tank 7, a plurality of deaeration treatment dishes in the deaeration tank 2 Assembling and design flexibility can be enhanced, such as easy assembly of 3..., And can contribute to downsizing. From the upper side to the lower side, a full water detector 26f, an upper limit level detector 26u, a lower limit level detector 26d, a drought detector 26e, and a grounding device 26g are provided at predetermined intervals on the side surface (end surface or peripheral surface) of the water storage tank 7. Attached sequentially to the place. Thereby, the upper limit level detector 26u can detect that the water level Lw of the treated water Ws stored in the water tank 7 has reached the upper limit level Lu, and the lower limit level detector 26d allows the water level Lw to reach the lower limit level Ld. You can detect that it has been reached. Further, the full water detector 26f and the drought detector 26e can detect a full water condition and a drought condition, respectively.

他方、脱気槽2の外部に至る各分岐管25…は、それぞれ開閉バルブ(電磁弁)5…を介して本管27に接続するとともに、この本管27は、給水バルブ29を介して給水源(上水道設備等)28に接続する。開閉バルブ5…を設けることにより、複数の噴射ノズル4…の一又は二以上を選択して使用でき、この結果、各種用途や各種給水状態に係る水量に対応して処理能力を容易に変更(増減)できる。   On the other hand, the branch pipes 25 leading to the outside of the deaeration tank 2 are connected to the main pipe 27 via open / close valves (solenoid valves) 5. The main pipe 27 is supplied via the water supply valve 29. Connect to a water source (waterworks, etc.) 28. By providing the opening / closing valve 5 ..., one or more of the plurality of injection nozzles 4 ... can be selected and used. As a result, the processing capacity can be easily changed according to the amount of water related to various uses and various water supply states ( Increase or decrease).

さらに、脱気槽2の上面部における複数の位置、望ましくは各噴射ノズル4…の相互間には、脱気槽2の内部に対して真空吸引を行う真空吸引口6…を設ける。真空吸引口6…を複数の位置に分散させて設けることにより、複数の噴射ノズル4…を配した場合であっても脱気槽2内における均一な真空吸引を行うことができる。そして、各真空吸引口6…は、真空ライン30を介して真空ポンプ31に接続する。また、真空ライン30の中途には真空圧力を検出する真空圧力検出器32を接続する。   Further, vacuum suction ports 6 for performing vacuum suction with respect to the inside of the deaeration tank 2 are provided between a plurality of positions on the upper surface portion of the deaeration tank 2, preferably between the spray nozzles 4. By providing the vacuum suction ports 6 dispersed at a plurality of positions, uniform vacuum suction in the deaeration tank 2 can be performed even when a plurality of injection nozzles 4 are arranged. Each vacuum suction port 6 is connected to a vacuum pump 31 through a vacuum line 30. Further, a vacuum pressure detector 32 for detecting the vacuum pressure is connected in the middle of the vacuum line 30.

一方、貯水槽7の下面部には、送水ライン33の一端を接続するとともに、この送水ライン33の他側は、送水ポンプ11及び逆止弁37を介して別途の貯水タンク9に接続する。送水ライン33には、送水ポンプ11から吐出する処理水Wsの一部を脱気槽2(又は貯水槽7)の内部に戻すリターン回路12を付設する。リターン回路12は、送水ポンプ11の吐出側における送水ライン33と脱気槽2の内部を接続するリターン管34と、このリターン管34の中途に接続した開閉バルブ35を備える。この場合、リターン回路12により戻す水流量は、貯水タンク9に送水する水流量に対して1/10程度となるように、開閉バルブ35の開度或いはリターン管34の径などにより設定する。   On the other hand, one end of the water supply line 33 is connected to the lower surface portion of the water storage tank 7, and the other side of the water supply line 33 is connected to a separate water storage tank 9 via the water supply pump 11 and the check valve 37. The water supply line 33 is provided with a return circuit 12 that returns a part of the treated water Ws discharged from the water supply pump 11 to the inside of the deaeration tank 2 (or the water storage tank 7). The return circuit 12 includes a water supply line 33 on the discharge side of the water supply pump 11 and a return pipe 34 that connects the inside of the deaeration tank 2, and an open / close valve 35 that is connected in the middle of the return pipe 34. In this case, the flow rate of water returned by the return circuit 12 is set by the opening degree of the opening / closing valve 35 or the diameter of the return pipe 34 so as to be about 1/10 of the flow rate of water supplied to the water storage tank 9.

貯水タンク9は、脱気槽2により溶存酸素が除去された処理水Wsを一時的に貯留する機能を有する。したがって、この貯水タンク9には、図示を省略したが、給水設備や給湯設備等に処理水Wsを供給する排水口(設備ライン)を備えている。また、貯水タンク9には、上限レベル検出器36u,下限レベル検出器36d及びアース器36gを付設する。この場合、各レベル検出器36u,36d及びアース器36gは、貯水タンク9の天面部にそれぞれ所定間隔をおいて取付ける。これにより、上限レベル検出器36uは、貯水タンク9に貯まった処理水Wsの水位Ltwが上限レベルLtuに達したことを検出できるとともに、下限レベル検出器36dは、同水位Ltwが下限レベルLtdに達したことを検出できる。   The water storage tank 9 has a function of temporarily storing the treated water Ws from which dissolved oxygen has been removed by the deaeration tank 2. Therefore, although not shown, the water storage tank 9 is provided with a drain port (equipment line) for supplying the treated water Ws to a water supply facility, a hot water supply facility, or the like. The water storage tank 9 is additionally provided with an upper limit level detector 36u, a lower limit level detector 36d, and a grounding device 36g. In this case, the level detectors 36u and 36d and the grounding device 36g are attached to the top surface portion of the water storage tank 9 at predetermined intervals. Accordingly, the upper limit level detector 36u can detect that the water level Ltw of the treated water Ws stored in the water storage tank 9 has reached the upper limit level Ltu, and the lower limit level detector 36d allows the same water level Ltw to reach the lower limit level Ltd. You can detect that it has been reached.

さらに、10は、シーケンス制御部であり、給水用脱気装置1を自動制御(シーケンス制御)する機能を備えている。このため、シーケンス制御部10の入力ポートには、前述した真空圧力検出器32,満水検出器26f,上限レベル検出器26u,下限レベル検出器26d,渇水検出器26e,アース器26g,上限レベル検出器36u,下限レベル検出器36d及びアース器36gをそれぞれ接続するとともに、シーケンス制御部10の出力ポートには、前述した開閉バルブ5…,給水バルブ29,開閉バルブ35,真空ポンプ31及び送水ポンプ11をそれぞれ接続する。   Further, reference numeral 10 denotes a sequence control unit, which has a function of automatically controlling (sequence control) the water supply deaeration device 1. Therefore, the input port of the sequence control unit 10 includes the vacuum pressure detector 32, the full water detector 26f, the upper limit level detector 26u, the lower limit level detector 26d, the drought detector 26e, the grounding device 26g, and the upper limit level detection. 36u, lower limit level detector 36d and grounding device 36g are connected to each other, and the above-mentioned opening / closing valve 5 ..., water supply valve 29, opening / closing valve 35, vacuum pump 31 and water pump 11 are connected to the output port of the sequence controller 10. Connect each.

図4には、給水用脱気装置1の外観構成を示す。なお、図4において、図1と同一部分には同一符号を付すことにより、その構成を明確にした。図4中、41は上面に各部品等を設置する基台、42…は貯水槽7を支持する支持脚部、43はトップカバー、44はコントロールボックスをそれぞれ示す。コントロールボックス44には、上述したシーケンス制御部10を内蔵するとともに、正面パネルには、前述した満水検出器26f及び渇水検出器26eが満水及び渇水を検出した際などに点灯する各種警報ランプ45…や運転スイッチ等の各種操作スイッチ46…を備える。   In FIG. 4, the external appearance structure of the deaeration device 1 for water supply is shown. In FIG. 4, the same parts as those in FIG. In FIG. 4, reference numeral 41 denotes a base on which components and the like are installed on the upper surface, 42... Support legs for supporting the water storage tank 7, 43 a top cover, and 44 a control box. The control box 44 incorporates the above-described sequence control unit 10, and the front panel has various alarm lamps 45 that are turned on when the above-described full-water detector 26f and drought detector 26e detect full or drought. And various operation switches 46 such as operation switches.

次に、本実施例に係る給水用脱気装置1の動作について、図1〜図4を参照しつつ図6に示すフローチャートに従って説明する。   Next, operation | movement of the deaeration device 1 for water supply which concerns on a present Example is demonstrated according to the flowchart shown in FIG. 6, referring FIGS. 1-4.

今、貯水槽7及び貯水タンク9は共に空の状態にあるものとする。また、噴射ノズル4…は全て使用し、全ての開閉バルブ5…が開に切換制御されているものとする。この状態では、給水バルブ29が閉、開閉バルブ35が閉、送水ポンプ11がオフ(送水ライン33が閉)になっている。   Now, it is assumed that the water tank 7 and the water tank 9 are both empty. Also, it is assumed that all the injection nozzles 4 are used and all the open / close valves 5 are controlled to be opened. In this state, the water supply valve 29 is closed, the open / close valve 35 is closed, and the water supply pump 11 is turned off (the water supply line 33 is closed).

運転を開始するには、コントロールボックス44に備える運転スイッチをオンにする。これにより、真空ポンプ31が作動(オン)し、脱気槽2内部に対する真空吸引が行われる(ステップS1)。脱気槽2の真空圧力は、真空圧力検出器32により検出され、この検出結果は、シーケンス制御部10に付与される。シーケンス制御部10は、真空圧力を監視し、予め設定した設定値(実施例は、−95〔kPa〕)に達したなら、給水バルブ29を開に切換制御する(ステップS1)。   To start operation, an operation switch provided in the control box 44 is turned on. Accordingly, the vacuum pump 31 is activated (turned on), and vacuum suction is performed on the inside of the deaeration tank 2 (step S1). The vacuum pressure in the deaeration tank 2 is detected by the vacuum pressure detector 32, and the detection result is given to the sequence controller 10. The sequence control unit 10 monitors the vacuum pressure, and when it reaches a preset set value (-95 [kPa] in the embodiment), it switches the water supply valve 29 to open (step S1).

これにより、給水源28から各噴射ノズル4…に被処理水(水道水)Woが供給され、各噴射ノズル4…の噴射口4o…から、シャワー状の被処理水Woが勢いよく噴射する(ステップS2)。噴射した被処理水Woは、所定距離Hsだけ離間した各脱気処理皿3…の底面部23…に均一に吹付けられる(ステップS3)。この場合、図2に示すように、脱気処理皿3…には、所定量の被処理水Woが溜まるため、脱気処理皿3…に溜まった被処理水Woの水面に、シャワー状の被処理水Woが勢いよく衝突し、脱気処理皿3…上には多量の泡Bが発生する(ステップS4)。この結果、被処理水Wo中の溶存酸素等の気体成分は、泡Bとなって遊離するため、真空ポンプ31に吸引されることにより大気中に排出される。   Thereby, the to-be-treated water (tap water) Wo is supplied from the water supply source 28 to each of the injection nozzles 4... And the shower-like to-be-treated water Wo is ejected vigorously from the injection ports 4 o of each of the injection nozzles 4. Step S2). The sprayed water to be treated Wo is sprayed uniformly on the bottom surface portions 23 of the deaeration treatment dishes 3 separated by a predetermined distance Hs (step S3). In this case, as shown in FIG. 2, since a predetermined amount of water to be treated Wo accumulates in the deaeration treatment dishes 3..., A shower-like shape is formed on the surface of the water to be treated Wo collected in the deaeration treatment dishes 3. The to-be-processed water Wo collides vigorously, and a lot of bubbles B generate | occur | produce on the deaeration processing dish 3 ... (step S4). As a result, gas components such as dissolved oxygen in the water to be treated Wo are released as bubbles B, and are thus discharged into the atmosphere by being sucked into the vacuum pump 31.

一方、脱気処理皿3…上では、溶存酸素等の気体成分が除去された処理水Wsが生成され、この処理水Wsは脱気処理皿3…から落下する。処理水Wsは、脱気槽2の下面部を流れて通水管8…に至り、この通水管8…を通って貯水槽7に貯留される。そして、貯水槽7に貯留した処理水Wsの水位Lwが上昇し、上限レベルLuに達すれば、上限レベル検出器26uにより検出されるため、シーケンス制御部10は、送水ポンプ11をオン(送水ライン33を開)に制御するとともに、開閉バルブ35を開に切換制御する。これにより、貯水槽7内の処理水Wsは貯水タンク9に移送される(ステップS5,S6)。この際、リターン回路12により、貯水槽7から貯水タンク9に送水される処理水Wsの一部は脱気槽2の内部に戻される。この場合、リターン回路12を設けなければ、貯水槽7側が真空吸引されているため、送水ポンプ11を作動させても送水は円滑に行われないが、リターン回路12により負圧が小さくなり、貯水槽7から貯水タンク9への送水を円滑に行うことができる。また、貯水槽7内における処理水Wsの水位Lwが下降し、下限レベルLdに達すれば、下限レベル検出器26dにより検出されるため、シーケンス制御部10は、送水ポンプ11をオフ(送水ライン33を閉)に制御するとともに、開閉バルブ35を閉に切換制御する(ステップS7,S8)。よって、貯水槽7内における処理水Wsの水位Lwは、シーケンス制御部10により所定範囲内に維持される。   On the other hand, the treated water Ws from which gaseous components such as dissolved oxygen are removed is generated on the degassed treatment dishes 3. The treated water Ws falls from the degassed treatment dishes 3. The treated water Ws flows through the lower surface of the deaeration tank 2 to the water pipes 8, and is stored in the water tank 7 through the water pipes 8. Then, when the water level Lw of the treated water Ws stored in the water tank 7 rises and reaches the upper limit level Lu, it is detected by the upper limit level detector 26u, so the sequence control unit 10 turns on the water pump 11 (water supply line) 33 is controlled to open) and the open / close valve 35 is controlled to be opened. Thereby, the treated water Ws in the water storage tank 7 is transferred to the water storage tank 9 (steps S5 and S6). At this time, a part of the treated water Ws fed from the water tank 7 to the water tank 9 is returned to the inside of the deaeration tank 2 by the return circuit 12. In this case, if the return circuit 12 is not provided, the water storage tank 7 side is sucked in vacuum, so that the water supply is not smoothly performed even if the water supply pump 11 is operated, but the negative pressure is reduced by the return circuit 12 and the water storage Water can be smoothly supplied from the tank 7 to the water storage tank 9. In addition, when the water level Lw of the treated water Ws in the water tank 7 falls and reaches the lower limit level Ld, the lower limit level detector 26d detects the water level Lw, so the sequence control unit 10 turns off the water pump 11 (water supply line 33). And the open / close valve 35 is controlled to be closed (steps S7 and S8). Accordingly, the water level Lw of the treated water Ws in the water tank 7 is maintained within a predetermined range by the sequence control unit 10.

他方、貯水タンク9に処理水Wsが貯まり、処理水Wsの水位Ltwが上昇することにより上限レベルLtuに達すれば、上限レベル検出器36uにより検出されるため、シーケンス制御部10は、給水バルブ29を閉に切換制御し、脱気処理を停止する(ステップS9,S10)。この場合、真空ポンプ31は作動(オン)を継続してもよいし、必要により停止(オフ)させてもよい。また、給湯設備等において処理水Wsが使用され、貯水タンク9内における処理水Wsの水位Ltwが下降することにより下限レベルLtdに達すれば、下限レベル検出器36dにより検出されるため、シーケンス制御部10は、給水バルブ29を開に切換制御する(ステップS11,S1)。なお、真空ポンプ31が停止している場合には、給水バルブ29を開にする前に作動させる。これにより、脱気処理が再開される。よって、貯水タンク9内における処理水Wsの水位Ltwは、シーケンス制御部10により所定範囲内に維持されるとともに、給湯設備等に対する処理水Wsの十分かつ安定した供給が維持される。   On the other hand, when the treated water Ws is stored in the water storage tank 9 and the water level Ltw of the treated water Ws rises and reaches the upper limit level Ltu, the upper limit level detector 36u detects it. Is controlled to be closed, and the deaeration process is stopped (steps S9 and S10). In this case, the vacuum pump 31 may continue to operate (ON) or may be stopped (OFF) as necessary. Further, when the treated water Ws is used in a hot water supply facility or the like and the water level Ltw of the treated water Ws in the water storage tank 9 falls and reaches the lower limit level Ltd, it is detected by the lower limit level detector 36d. 10 switches the water supply valve 29 to open (steps S11 and S1). When the vacuum pump 31 is stopped, the vacuum pump 31 is operated before the water supply valve 29 is opened. Thereby, the deaeration process is resumed. Therefore, the water level Ltw of the treated water Ws in the water storage tank 9 is maintained within a predetermined range by the sequence control unit 10, and sufficient and stable supply of the treated water Ws to the hot water supply facility or the like is maintained.

このような本実施例に係る給水用脱気装置1によれば、シャワー状の被処理水Woを脱気処理皿3…に溜まった被処理水Woに吹付けることにより多量の泡Bを発生させるようにしたため、効率的な脱気処理が可能となり、脱気効果を飛躍的に高めることができる。また、主要部は噴射ノズル4…と脱気処理皿3…で構成できるため、構成部品の単純化及び部品点数の削減を実現でき、製造工数の低減に伴う生産性向上と部品及び製造上のコストダウンに寄与できる。しかも、単位時間当たりの処理量を大量に確保できることに加え、処理量を容易に変更できるため、各種用途や各種給水状態に対して柔軟に対応でき、汎用性に優れるとともに、貯水タンク9の小型化、更には貯水タンク9における処理水Wsの劣化防止にも寄与できる。   According to the water supply deaeration apparatus 1 according to the present embodiment, a large amount of bubbles B are generated by spraying the shower-like water to be treated Wo on the water to be treated Wo collected in the deaeration treatment dish 3. As a result, an efficient deaeration process is possible, and the deaeration effect can be greatly enhanced. Moreover, since the main part can be composed of the injection nozzles 4 and the deaeration treatment trays 3, the components can be simplified and the number of parts can be reduced. It can contribute to cost reduction. Moreover, in addition to ensuring a large amount of treatment per unit time, the amount of treatment can be easily changed, so that it can be flexibly adapted to various uses and various water supply conditions, and is excellent in versatility, and the water tank 9 is small. Furthermore, it can contribute to prevention of deterioration of the treated water Ws in the water storage tank 9.

図5は、水温が22〔℃〕,脱気槽2内部の真空圧力が−95〔kPa〕に設定した状態における噴射ノズル4から噴射する水流量〔リットル/分〕に対する処理水Ws(被処理水Wo)の溶存酸素濃度〔mg/リットル〕のデータを、特性線Cs(Co)で示したものである。この場合、被処理水(水道水)Woの溶存酸素濃度は、7.73〔mg/リットル〕である(特性線Co)。これに対して、本実施例に係る給水用脱気装置1により脱気処理を行った後の処理水Wsの溶存酸素濃度は、水流量10〔リットル/分〕において0.82〔mg/リットル〕,水流量15〔リットル/分〕において1.17〔mg/リットル〕,水流量20〔リットル/分〕において1.56〔mg/リットル〕まで低減される。このように、水流量は少ないほど脱気効果は高められ、水流量10〔リットル/分〕では、溶存酸素濃度が概ね1/10程度まで低減される。なお、このような水流量は、開閉バルブ5…の使用数量を選定するなどにより最適な値に設定することができる。   FIG. 5 shows treated water Ws (treated) with respect to the water flow rate [liter / minute] ejected from the ejection nozzle 4 in a state where the water temperature is set to 22 [° C.] and the vacuum pressure inside the deaeration tank 2 is set to −95 [kPa]. Data of dissolved oxygen concentration [mg / liter] of water Wo) is shown by a characteristic line Cs (Co). In this case, the dissolved oxygen concentration of the water to be treated (tap water) Wo is 7.73 [mg / liter] (characteristic line Co). On the other hand, the dissolved oxygen concentration of the treated water Ws after the deaeration process is performed by the feed water deaeration apparatus 1 according to the present embodiment is 0.82 [mg / l at a water flow rate of 10 [l / min]. ], It is reduced to 1.17 [mg / liter] at a water flow rate of 15 [liter / minute] and 1.56 [mg / liter] at a water flow rate of 20 [liter / minute]. Thus, the degassing effect is enhanced as the water flow rate decreases, and at a water flow rate of 10 [liter / min], the dissolved oxygen concentration is reduced to approximately 1/10. Such a water flow rate can be set to an optimum value by selecting the amount of the open / close valves 5.

以上、実施例について詳細に説明したが、本発明はこのような実施例に限定されるものではなく、細部の構成,形状,数量,素材等において本発明の要旨を逸脱しない範囲で任意に変更,追加,削除することができる。例えば、脱気処理皿3…の形状,大きさ,取付方法,数量、また、脱気処理皿3…と噴射ノズル4…の距離Hs等は、脱気効果を考慮して任意に選定或いは変更できる。さらに、開閉バルブ5…は、シーケンス制御部10により切換制御する場合を示したが、手動により操作するタイプであってもよい。   The embodiment has been described in detail above, but the present invention is not limited to such an embodiment, and the configuration, shape, quantity, material, etc. of the details are arbitrarily changed without departing from the gist of the present invention. , Can be added or deleted. For example, the shape, size, mounting method, quantity, etc. of the deaeration treatment dish 3... And the distance Hs between the deaeration treatment dish 3... And the injection nozzles 4. it can. Furthermore, the opening / closing valves 5... Have been shown to be switched by the sequence control unit 10, but may be manually operated types.

本発明の好適な実施例に係る給水用脱気装置のブロック回路図、The block circuit diagram of the deaeration device for water supply concerning the preferred example of the present invention, 同給水用脱気装置に備える脱気処理皿及び噴射ノズルの断面正面図、A cross-sectional front view of the deaeration treatment dish and the injection nozzle provided in the water supply deaeration device, 同給水用脱気装置に備える脱気処理皿の平面図、The top view of the deaeration processing dish with which the deaeration device for the water supply is provided, 同給水用脱気装置の外観正面図、External front view of the water supply deaeration device, 同給水用脱気装置により脱気処理した処理水の水流量に対する溶存酸素濃度のデータを示す特性図、The characteristic figure which shows the data of the dissolved oxygen concentration with respect to the flow rate of the treated water deaerated by the deaerator for water supply, 同給水用脱気装置の動作処理手順を示すフローチャート、The flowchart which shows the operation processing procedure of the deaeration device for the water supply,

符号の説明Explanation of symbols

1 給水用脱気装置
2 脱気槽
3… 脱気処理皿
4… 噴射ノズル
5… 開閉バルブ
6… 真空吸引口
7 貯水槽
8… 通水管
9 貯水タンク
10 シーケンス制御部
11 送水ポンプ
12 リターン回路
23 底面部
24 側面部
Wo 被処理水
Ws 処理水
Hs 所定距離
B 泡
DESCRIPTION OF SYMBOLS 1 Deaeration device for water supply 2 Deaeration tank 3 ... Deaeration processing dish 4 ... Injection nozzle 5 ... Opening / closing valve 6 ... Vacuum suction port 7 Water storage tank 8 ... Water pipe 9 Water storage tank 10 Sequence control part 11 Water supply pump 12 Return circuit 23 Bottom surface 24 Side surface Wo Water to be treated Ws Water to be treated Hs Predetermined distance B Bubble

Claims (1)

脱気槽に供給された被処理水に対して真空吸引することにより、前記被処理水から溶存酸素を除去して処理水を生成する給水用脱気装置において、水平方向に長い筒状に形成した脱気槽と、この脱気槽の内部に水平方向に並べて配し、かつ底面部とこの底面部の周縁から立上げた側面部を有することにより所定量の被処理水を溜めることができる複数の脱気処理皿と、各脱気処理皿に対して所定距離の位置に配し、かつ前記脱気処理皿に溜まった被処理水の水面に対してそれぞれシャワー状の被処理水を吹付け衝突させることにより泡を発生させる複数の噴射ノズルと、前記脱気槽における各噴射ノズルの相互間に設けることにより前記脱気槽の内部に対して真空吸引を行う複数の真空吸引口と、前記複数の噴射ノズルにそれぞれ接続することにより各噴射ノズルの一又は二以上を選択して使用可能にする開閉バルブと、前記脱気槽の下方に配し、かつ通水管により前記脱気槽に接続した水平方向に長い筒状に形成した貯水槽と、前記貯水槽に接続した貯水タンクと、前記貯水槽の水位が上限レベルに達したなら当該貯水槽から前記貯水タンクに送水し、かつ前記貯水槽の水位が下限レベルに達したなら当該貯水槽から前記貯水タンクへの送水を停止するととともに、前記貯水タンクの水位が上限レベルに達したなら被処理水に対する脱気処理を停止し、かつ前記貯水タンクの水位が下限レベルに達したなら被処理水に対する脱気処理を行うシーケンス制御部と、前記貯水槽から前記貯水タンクに送水する送水ポンプから吐出する処理水の一部を前記脱気槽又は前記貯水槽の内部に戻すリターン回路とを備えてなることを特徴とする給水用脱気装置。   Formed in a horizontally long cylinder shape in a degassing device for water supply that removes dissolved oxygen from the treated water and generates treated water by vacuum suction with respect to the treated water supplied to the deaeration tank A predetermined amount of water to be treated can be stored by having a degassing tank and a horizontal part arranged in the degassing tank in the horizontal direction and having a bottom surface and a side surface raised from the periphery of the bottom surface. A plurality of deaeration treatment trays are disposed at a predetermined distance with respect to each deaeration treatment pan, and shower-like water to be treated is blown against the surface of the water to be treated accumulated in the deaeration treatment pan. A plurality of injection nozzles for generating bubbles by causing collisions, and a plurality of vacuum suction ports for performing vacuum suction on the inside of the deaeration tank by being provided between the respective injection nozzles in the deaeration tank, Connect to each of the plurality of spray nozzles. An open / close valve that allows one or more of each injection nozzle to be selected and used, and is formed below the deaeration tank and connected to the deaeration tank by a water pipe and formed into a horizontally long cylinder The water tank connected to the water tank, and when the water level of the water tank reaches the upper limit level, water is supplied from the water tank to the water tank, and the water level of the water tank reaches the lower limit level. Then, the water supply from the water storage tank to the water storage tank is stopped, and when the water level of the water storage tank reaches the upper limit level, the deaeration process for the water to be treated is stopped, and the water level of the water storage tank reaches the lower limit level. If so, a part of the treated water discharged from the water supply pump that feeds water from the water storage tank to the water storage tank and a sequence control unit that performs a deaeration process on the water to be treated is stored in the deaeration tank or the water storage tank. Water deaerating apparatus characterized by comprising a be return circuit.
JP2003377705A 2003-11-07 2003-11-07 Deaerator for water supply Expired - Lifetime JP4242751B2 (en)

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JP4843330B2 (en) * 2006-02-17 2011-12-21 株式会社日本サーモエナー Oxygen absorber

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