JP4255261B2

JP4255261B2 - Substrate storage container

Info

Publication number: JP4255261B2
Application number: JP2002275495A
Authority: JP
Inventors: 博三村; 敏嗣矢島
Original assignee: Shin Etsu Polymer Co Ltd
Current assignee: Shin Etsu Polymer Co Ltd
Priority date: 2002-09-20
Filing date: 2002-09-20
Publication date: 2009-04-15
Anticipated expiration: 2022-09-20
Also published as: JP2004111830A

Description

【０００１】
【発明の属する技術分野】
本発明は、半導体ウェーハやマスクガラス等の基板の収納、基板の輸送・保管、基板の加工等に使用される基板収納容器に関し、より詳しくは、基板の支持構造に関するものである。
【０００２】
【従来の技術】
近年、半導体業界では、生産性をより一層向上させるため、３００ｍｍという大口径サイズのシリコンウェーハやガラスウェーハからなる基板が使用され始めている。この基板は、水平方向に支持しても、垂直方向に起立させても、自重で撓み易いという特徴を有しているので、破損しないよう所定の基板収納容器に収納して安全に取り扱うことが求められる。
【０００３】
この種の基板収納容器は、例えば図１１に示すように、複数枚の基板Ｗを整列収納する容器本体１と、この容器本体１の開口正面を開閉する蓋体と、この蓋体の閉鎖時に容器本体１と蓋体との間に介在してシールするシールガスケットとから構成されている(特許文献１参照)。容器本体１は、その内部両側に基板Ｗを水平に支持する支持部材２０が配設され、内部背面にはリヤリテーナ３０が設けられている(図１０参照)。このリヤリテーナ３０は、基板Ｗの後部周縁を支持し、基板Ｗのローディングの際、基板Ｗの載置位置を決定する。また、蓋体の内面には、基板Ｗの前部周縁を個別に支持するフロントリテーナが装着されている。
【０００４】
これらリヤリテーナ３０とフロントリテーナとは、基板Ｗに接触して保護する観点から支持部材２０に比べてより柔軟性を有する材料を使用して形成され、基板Ｗとの接触部には複数の収納溝３１が所定の間隔で並設されている。各収納溝３１は、斜面からなる断面略Ｕ字形あるいは略Ｖ字形に形成され、中心高さが支持部材２０の基板載置位置よりも高い位置に設定されており、蓋体の閉鎖時に基板Ｗが支持部材２０から僅かに持ち上げられる際、基板Ｗと支持部材２０との接触摩擦を減少させ、磨耗粉による基板Ｗの汚染を抑制防止するよう機能する。
【０００５】
なお、基板Ｗは、基板収納容器からの取り出しや挿入に関し、生産工程では自動機により水平に取り扱われる。しかしながら、検査等の特別な工程では容器本体１の開口正面が上方に向けられ、垂直方向に起立した状態で手動あるいは自動で取り扱われる(図１１参照)。この場合、蓋体が取り外されると、基板Ｗは下方に位置するリヤリテーナ３０のみで支持されることとなる。
【０００６】
【特許文献１】
特開平２０００−１５９２８８号公報(図１、図２参照)
【０００７】
【発明が解決しようとする課題】
従来の基板収納容器は、以上のように構成されているので、図１０に示すように容器本体１から蓋体を取り外すと、基板Ｗがリヤリテーナ３０の収納溝３１の斜面から完全に滑り落ちずに途中で停止し、基板Ｗの載置位置が正規の位置からずれてローディングミスしたり、取り出しロボットの基板チャック用ハンドが基板Ｗと干渉して破損してしまうという問題がある。このような問題の原因としては、基板Ｗが大口径で撓み易いということがあげられるが、蓋体の取り外し時に基板Ｗと接触する支持部材２０の摩擦抵抗が大きいので、斜面を滑る際の抵抗になることもあげられる。加えて近年、基板Ｗの表面のみならず、基板Ｗの裏面もパーティクル対策の一環として鏡面加工されるので、鏡面同士の吸着により、基板Ｗと支持部材２０との摩擦抵抗が大きくなるのに拍車のかかることが考えられる。
【０００８】
さらに、容器本体の開口正面を上方に向け、基板Ｗを垂直方向に起立させた状態で取り扱う場合、基板Ｗをリヤリテーナ３０の浅い収納溝３１でのみ支持することとなるので、基板Ｗが前後方向のいずれかに傾いてしまう傾向がある。この場合には、基板Ｗが支持部材２０と接触したり、隣接する基板Ｗが異なる方向に倒れ、容器本体の開口側で基板同士が接触して破損や汚染を招くという問題がある。
【０００９】
本発明は、上記に鑑みなされたもので、支持部材の摩擦抵抗を小さくして基板の破損等を抑制し、しかも、基板を立てて取り扱う場合に、基板の傾きを抑制して基板が支持部材と接触したり、基板同士が接触して破損等するのを防ぐことのできる基板収納容器を提供することを目的としている。
【００１０】
【課題を解決するための手段】
本発明においては上記課題を解決するため、表裏面が鏡面加工された基板を収納するフロントオープンボックスタイプの容器本体と、この容器本体の開口した正面を開閉する蓋体とを備え、容器本体の内部両側に、基板の両側部周縁を水平に支持する複数の支持部材をそれぞれ配設し、蓋体には、基板を支持するフロントリテーナを取り付け、容器本体の開口した正面を蓋体が閉じる際、容器本体の背面側の傾斜面と蓋体のフロントリテーナとにより基板を容器本体の支持部材から持ち上げるものであって、
各支持部材を容器本体の前後方向に指向する棚板形に形成してその基板に接触する前部一側を基板の側部周縁に対応するよう湾曲させ、容器本体の内側面寄りに位置する支持部材の前部他側に基板用の飛び出し防止突起を形成し、支持部材の後部の基板ストッパ用の側壁には、接触する基板の挿脱位置を定める断面Ｖ字形の傾斜面を形成するとともに、支持部材の前部一側と傾斜面とには、算術表面粗さが平均粗さ（Ｒａ）で０．３μｍの低摩擦抵抗部をそれぞれ形成し、
複数の支持部材に支持された基板が水平方向に移動する場合の摩擦抵抗値を０．１５〜０．２５Ｎとしたことを特徴としている。
【００１１】
なお、容器本体の内部背面に、基板の後部周縁を収納溝を介して支持するリヤリテーナを取り付け、このリヤリテーナの収納溝を断面Ｕ字形あるいはＶ字形に形成するとともに、この収納溝に転倒規制部材を形成し、この転倒規制部材により、基板を収納した容器本体の正面が上方向に向けられた場合に起立した基板の転倒を規制することができる。
【００１２】
ここで特許請求の範囲における容器本体の開口一端面は蓋体で開閉されるが、この蓋体には、蓋体の周面から複数の係止爪等を出没させる施錠用のラッチ機構を内蔵しても良いし、そうでなくても良い。基板には、少なくとも単数複数枚の半導体ウェーハやフォトマスクガラス等が含まれる。さらに、算術平均粗さ(Ｒａ)とは、粗さ曲線からその平均線の方向に基準長さだけ抜き取り、この抜き取り部分の方向にＸ軸、縦倍率の方向にＹ軸をｙ＝ｆ(ｘ)で表した時に、所定の式で求められる値をいう。
【００１３】
【発明の実施の形態】
以下、図面を参照して本発明の好ましい実施形態を説明すると、本実施形態における基板収納容器は、図１ないし図９に示すように、複数枚の基板Ｗを整列収納する容器本体１と、この容器本体１の開口をシール可能に閉鎖する蓋体１０とを備え、容器本体１の内部両側に、基板Ｗの両側部周縁を支持する複数の支持部材２０をそれぞれ配設するとともに、各支持部材２０の基板接触領域２３の少なくとも一部に、支持部材２０の非基板接触領域よりも摩擦抵抗の小さい低摩擦抵抗部２４を形成し、容器本体１の内部他端面である内部背面には、基板Ｗの後部周縁を支持する複数のリヤリテーナ３０を並べて設置するようにしている。
【００１４】
複数枚の基板Ｗとしては、例えば複数枚の半導体ウェーハがあげられる。より詳しくは、３００ｍｍの(例えば、２５枚や２６枚等)のシリコンウェーハ等が使用される。
【００１５】
容器本体１は、図１、図４、図５に示すように、例えば透明のポリカーボネート等を使用して一端面である正面の開口したフロントオープンボックスタイプに形成される。この容器本体１は、その底部に、基板収納容器の種類を検知して区別するための貫通孔を有する平面略Ｙ字形のボトムプレート２が装着され、このボトムプレート２の前部両側と後部とに、断面略Ｖ字形を呈した加工装置用の位置決め部材３がそれぞれ形成される。また、容器本体１の天井にはハンドル４が着脱自在に装着され、このハンドル４がＯＨＴ(オーバーヘッドホイストトランスファー)と呼ばれる自動搬送機構に保持されることにより、基板収納容器が工程内を搬送される。
【００１６】
容器本体１の開口正面には図１や図５に示すように、蓋体嵌合用のリム部５が幅広に一体形成され、このリム部５の両側には、蓋体用の係止溝を備えた係止部６がそれぞれ一体的に突出形成される。また、容器本体１の外部両側には、手動搬送用の把持ハンドル７がそれぞれ着脱自在に装着される。
【００１７】
蓋体１０は、図１、図４、図７に示すように、四隅部が丸く湾曲した横長の略矩形に形成され、内面に容器本体１のリム部５と嵌合する段差部１１が突出形成されるとともに、この段差部１１には、複数枚の基板Ｗを所定のピッチで上下方向に水平に整列支持するフロントリテーナ１２が装着される。この蓋体１０は、その段差部１１にエンドレスのシールガスケット１３が嵌合され、このシールガスケット１３が蓋体閉塞時の密封性を確保する。蓋体１０の両側部には、容器本体１の係止部６に係合する一対の係止片１４がそれぞれ揺動可能に支持される。
【００１８】
なお、容器本体１、ボトムプレート２、ハンドル４、一対の把持ハンドル７、蓋体１０は、例えばポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン、環状オレフィン樹脂からなる熱可塑性樹脂等を使用して成形される。また、把持ハンドル７は、図１のようなＵ字形でも良いし、基板収納容器に収納される基板Ｗが水平状態にある場合と垂直状態にある場合のいずれでも、作業員が安定して容器本体１を把持することができるよう、略直角に形成される２つの把持部を備えた逆Ｌ字形あるいはＬ字形等でも良い。
【００１９】
複数の支持部材２０は、図１、図５、図６、図７に示すように、容器本体１の内部両側に一体的に形成され、上下方向に所定のピッチで並設される。各支持部材２０は、基板Ｗの側部周縁に対応するよう自由一側部が湾曲した略棚板形に形成され、前部他側に飛び出し防止突起２１が基板Ｗの側部周縁に沿うよう形成されており、後部のストッパとなる側壁には、基板Ｗの挿抜位置を定める断面略Ｖ字形の傾斜面２２が形成される。飛び出し防止突起２１は、基板Ｗの厚さ相当の高さ、具体的には０．３〜０．７ｍｍの範囲の高さに形成される。
【００２０】
各支持部材２０の前部一側と後部の傾斜面２２、換言すれば、基板接触領域２３の少なくとも一部(図２と図３の囲んだ部分)は支持部材２０の非基板接触領域よりも摩擦抵抗の小さい低摩擦抵抗部２４とされ、この低摩擦抵抗部２４の算術表面粗さはＪＩＳＢ０６０１−２００１に準じて測定した場合に平均粗さ(Ｒａ)で０．２ａ(０．２μｍ)以上、好ましくは０．３ａ(０．３μｍ)〜６．３ａ(６．３μｍ)の範囲に設定される。低摩擦抵抗部２４は、支持部材２０の成形に使用する金型の表面を部分的に梨地や皮シボ等のシボ加工をしておき、これを成形時に支持部材表面に転写することにより形成することができる。金型に対するシボ加工は、サンドブラスト、放電加工、エッチング等により行われる。
【００２１】
低摩擦抵抗部２４の算術表面粗さが平均粗さ(Ｒａ)で０．２ａ(０．２μｍ)以上とされるのは、０．２ａ(０．２μｍ)未満の場合には、基板Ｗとの摩擦抵抗が大きいままとなり、容器本体１を縦置きから横置きに変更する際、基板Ｗがリヤリテーナ３０から円滑に移動せずに途中で停止し、基板Ｗが位置ずれしてピックアップできなくなったり、基板Ｗの破損を招くおそれがあるからである。
【００２２】
低摩擦抵抗部２４の算術表面粗さが好ましくは平均粗さ(Ｒａ)で０．３ａ(０．３μｍ)〜６．３ａ(６．３μｍ)の範囲なのは、成形条件やガス抜きの状態により転写精度が左右されるので、係る範囲とすれば量産時の安定性を図ることができるからである。また、平均粗さ(Ｒａ)が６．３ａ(６．３μｍ)を超える場合、摩擦抵抗は良好であるものの、成形後に金型から離型する際に支持部材２０を形成したシボの部分が損傷したり、抵抗になって金型から容易に離型できなくなるからである。
【００２３】
各リヤリテーナ３０は、図４、図５、図７ないし図９に示すように、相対向するフロントリテーナ同様、基板Ｗに個別に接触して保護する観点から支持部材２０に比べてより柔軟性を有する材料を使用して形成され、基板Ｗとの接触部には複数の収納溝３１が所定の間隔で並設されており、各収納溝３１には起立した基板Ｗの転倒を規制する転倒規制部材３２が一体的に設けられる。各収納溝３１は、斜面からなる断面略Ｕ字形あるいは略Ｖ字形に形成される。また、各転倒規制部材３２は、収納溝３１の水平方向の中心線から一方に位置する垂直壁３３と、中心線から他方に位置する傾斜面３４とから形成され、収納溝３１の断面形状を基板Ｗの水平方向における中心線に対して非対称とするよう機能する。
【００２４】
このようなリヤリテーナ３０は、容器本体１の開口正面に蓋体１０が嵌合閉鎖されると、フロントリテーナ１２と共に基板Ｗの周縁を収納溝３１を介して支持部材２０から掬い上げ、転倒規制部材３２の中心部で挟持する。また、容器本体１の開口正面から蓋体１０が取り外されると、基板Ｗの後部周縁を転倒規制部材３２の傾斜面２２により支持部材２０にスライドさせる。
【００２５】
上記構成によれば、蓋体１０の取り外し時に基板Ｗがリヤリテーナ３０から各支持部材２０にスライドするが、支持部材２０の基板接触領域２３に摩擦抵抗の小さい低摩擦抵抗部２４を形成しているので、基板Ｗがリヤリテーナ３０の収納溝３１の途中で停止することがない。したがって、基板Ｗの載置位置が正規の位置からずれてローディングミスしたり、取り出しロボットの基板チャック用ハンドが基板Ｗと干渉して破損してしまうという問題を解消することができる。
【００２６】
また、図９に示すように容器本体１の開口正面を上方に向け、基板Ｗを垂直方向に起立させた状態で取り扱う場合でも、リヤリテーナ３０の収納溝３１を形成する転倒規制部材３２が基板Ｗの水平方向における中心線に対して非対称なので、複数枚の基板Ｗを全て同一方向に傾けることができる。したがって、基板Ｗが支持部材２０と接触したり、隣接する基板Ｗが異なる方向に倒れ、容器本体１の開口側で基板同士が接触して破損や汚染を招くおそれを排除することが可能になる。
【００２７】
なお、上記実施形態では支持部材２０の前部一側と後部の傾斜面２２に低摩擦抵抗部２４をそれぞれ形成したが、なんらこれに限定されるものではなく、支持部材２０やこの支持部材２０に連続する容器本体１の内部両側に形成しても良い。また、リヤリテーナ３０の収納溝３１の一部あるいは全部に低摩擦抵抗部２４を形成しても良い。
【００２８】
【実施例】
以下、本発明に係る基板収納容器の実施例について比較例と共に説明する。
実施例
基板収納容器の容器本体をポリカーボネートを用いて成形し、この容器本体の支持部材に、表面粗度が平均粗さ(Ｒａ)で０．３ａ(０．３μｍ)の低摩擦抵抗部をシボ加工により形成した。表面粗さは、プローブ接触方式の表面粗さ計(三豊製モデルサーフテスト５０１)を用いて測定した。
そして、支持部材に基板であるφ３００ｍｍのウェーハを支持させ、このウェーハを水平方向に移動させた場合の摩擦抵抗をフルスケール５０Ｎのプッシュプルゲージ(アイコーエンジニアリング社製ＡＷＦ−５０)により測定し、測定結果を表１にまとめた。この測定は、下から１段目、５段目、１０段目、１５段目、２０段目、２５段目の６箇所で行い、その平均値を算出した。
【００２９】
比較例
容器本体をポリカーボネートを用いて成形し、この容器本体の支持部材にシボ加工を施すことなく、支持部材の表面粗度を平均粗さ(Ｒａ)で０．１ａ(０．１μｍ)以下とした。
そして、支持部材にφ３００ｍｍのウェーハを支持させ、このウェーハを水平方向に移動させた場合の摩擦抵抗をフルスケール５０Ｎのプッシュプルゲージ(アイコーエンジニアリング社製ＡＷＦ−５０)により測定し、測定結果を表１にまとめた。測定は、下から１段目、５段目、１０段目、１５段目、２０段目、２５段目の６箇所で行い、その平均値を算出した。
【００３０】
【表１】

【００３１】
表１から明らかなように、実施例の支持部材とウェーハの摩擦抵抗が１／６に低下した。また、ウェーハがリヤリテーナの収納溝から支持部材に円滑にスライドするのを確認した。
【００３２】
【発明の効果】
以上のように本発明によれば、支持部材の摩擦抵抗を小さくして基板の破損等を抑制することができるという効果がある。
すなわち本発明によれば、蓋体の取り外し時に基板がスライドするが、支持部材に摩擦抵抗の小さい低摩擦抵抗部を形成しているので、基板の載置位置が正規の位置からずれることが少ない。したがって、ローディングミスしたり、取り出しロボットの基板チャック用ハンドが基板と干渉して破損してしまうという問題を解消することができる。また、基板を立てて取り扱う場合にも、基板の傾きを抑制して基板が支持部材と接触したり、基板同士が接触して破損等するのを有効に防ぐことができる。
また、低摩擦抵抗部の算術表面粗さを平均粗さ（Ｒａ）で０．３μｍとするので、金型を使用した量産時の安定性が期待できる。また、金型から離型する際に支持部材を形成したシボの部分が損傷したり、抵抗になって金型から容易に脱型できなくなるのを防ぐことが可能になる。
【図面の簡単な説明】
【図１】本発明に係る基板収納容器の実施形態を示す斜視全体説明図である。
【図２】本発明に係る基板収納容器の実施形態における支持部材を示す平面図である。
【図３】本発明に係る基板収納容器の実施形態における支持部材を示す正面図である。
【図４】図１の横断面説明図である。
【図５】図１の縦断面説明図である。
【図６】本発明に係る基板収納容器の実施形態における支持部材を示す模式説明図である。
【図７】本発明に係る基板収納容器の実施形態におけるリテーナが基板を支持する状態を示す模式説明図である。
【図８】本発明に係る基板収納容器の実施形態における容器本体から蓋体を取り外し、支持部材に基板を支持させる状態を示す模式説明図である。
【図９】本発明に係る基板収納容器の実施形態における容器本体を上向きにした状態を示す模式説明図である。
【図１０】従来の基板収納容器の支持部材が基板を水平に支持する状態を示す模式説明図である。
【図１１】従来の基板収納容器の開口正面を上方に向け、基板を立てた状態で取り扱う場合を示す断面説明図である。
【符号の説明】
１容器本体
１０蓋体
１３シールガスケット
２０支持部材
２２傾斜面
２３基板接触領域
２４低摩擦抵抗部
３０リヤリテーナ
３１収納溝(溝)
３２転倒規制部材
３３垂直壁
３４傾斜面
Ｗ基板[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate storage container used for storing a substrate such as a semiconductor wafer or mask glass, transporting and storing the substrate, processing the substrate, and the like, and more particularly to a substrate support structure.
[0002]
[Prior art]
In recent years, in the semiconductor industry, a substrate made of a silicon wafer or glass wafer having a large diameter of 300 mm has begun to be used in order to further improve productivity. This board has the feature that it can easily be bent by its own weight even if it is supported in the horizontal direction or standing in the vertical direction, so it can be safely stored in a predetermined substrate storage container so as not to be damaged. Desired.
[0003]
For example, as shown in FIG. 11, this type of substrate storage container includes a container body 1 that stores and stores a plurality of substrates W, a lid that opens and closes the front of the container body 1, and when the lid is closed. It is comprised from the seal gasket which interposes and seals between the container main body 1 and a cover body (refer patent document 1). The container body 1 is provided with support members 20 that horizontally support the substrate W on both sides thereof, and a rear retainer 30 is provided on the inner back surface (see FIG. 10). The rear retainer 30 supports the rear peripheral edge of the substrate W, and determines the placement position of the substrate W when the substrate W is loaded. A front retainer that individually supports the front periphery of the substrate W is mounted on the inner surface of the lid.
[0004]
The rear retainer 30 and the front retainer are formed using a material that is more flexible than the support member 20 from the viewpoint of contacting and protecting the substrate W, and a plurality of storage grooves are formed in the contact portion with the substrate W. 31 are arranged in parallel at a predetermined interval. Each storage groove 31 is formed in a substantially U-shaped or substantially V-shaped cross section having an inclined surface, the center height is set to a position higher than the substrate placement position of the support member 20, and the substrate W is closed when the lid is closed. When the substrate is slightly lifted from the support member 20, the contact friction between the substrate W and the support member 20 is reduced, and functions to suppress and prevent contamination of the substrate W by wear powder.
[0005]
The substrate W is handled horizontally by an automatic machine in the production process with respect to removal and insertion from the substrate storage container. However, in a special process such as inspection, the front of the opening of the container body 1 is directed upward, and the container body 1 is handled manually or automatically while standing upright (see FIG. 11). In this case, when the lid is removed, the substrate W is supported only by the rear retainer 30 positioned below.
[0006]
[Patent Document 1]
JP 2000-159288 A (see FIGS. 1 and 2)
[0007]
[Problems to be solved by the invention]
Since the conventional substrate storage container is configured as described above, when the lid is removed from the container body 1 as shown in FIG. 10, the substrate W does not slide completely off the slope of the storage groove 31 of the rear retainer 30. However, there is a problem that the mounting position of the substrate W is deviated from the normal position and a loading error occurs, or the substrate chucking hand of the take-out robot interferes with the substrate W and is damaged. The cause of such a problem is that the substrate W has a large diameter and is easily bent. However, since the frictional resistance of the support member 20 that comes into contact with the substrate W when removing the lid is large, the resistance when sliding on the slope is large. Can also be raised. In addition, in recent years, not only the front surface of the substrate W but also the back surface of the substrate W is mirror-finished as part of particle countermeasures, so the frictional resistance between the substrate W and the support member 20 increases due to the adsorption of the mirror surfaces. It can be considered that it takes.
[0008]
Further, when the substrate W is handled in a state where the opening front of the container main body is directed upward and the substrate W is erected in the vertical direction, the substrate W is supported only by the shallow storage groove 31 of the rear retainer 30, so that the substrate W is moved in the front-rear direction. There is a tendency to lean to either. In this case, there is a problem that the substrate W comes into contact with the support member 20 or the adjacent substrates W fall down in different directions, and the substrates come into contact with each other on the opening side of the container body to cause damage or contamination.
[0009]
The present invention has been made in view of the above, and reduces the frictional resistance of the support member to suppress the breakage of the substrate. In addition, when the substrate is stood and handled, the substrate is supported by suppressing the tilt of the substrate. It is an object of the present invention to provide a substrate storage container that can be prevented from coming into contact with each other or from being damaged due to contact between substrates.
[0010]
[Means for Solving the Problems]
In order to solve the above-described problems, the present invention includes a front open box type container main body that stores a substrate whose front and back surfaces are mirror-finished, and a lid that opens and closes the front surface of the container main body. A plurality of support members that horizontally support the peripheral edges of both sides of the substrate are arranged on both sides of the inside, and a front retainer that supports the substrate is attached to the lid, and the lid closes the open front of the container body. The substrate is lifted from the support member of the container body by the inclined surface on the back side of the container body and the front retainer of the lid ,
Each support member is formed in a shelf plate oriented in the front-rear direction of the container body, and one front side that contacts the substrate is curved so as to correspond to the peripheral edge of the substrate, and is located closer to the inner surface of the container body. A protrusion preventing protrusion for the substrate is formed on the other side of the front part of the support member, and a sloped surface having a V-shaped cross section is formed on the substrate stopper side wall on the rear part of the support member to define the position of the contacting substrate. In addition, a low friction resistance portion having an arithmetic surface roughness of 0.3 μm in average roughness (Ra) is formed on the front side and the inclined surface of the support member, respectively.
The frictional resistance value when the substrate supported by the plurality of support members moves in the horizontal direction is 0.15 to 0.25N .
[0011]
A rear retainer that supports the rear peripheral edge of the substrate via a storage groove is attached to the inner rear surface of the container body, and the storage groove of the rear retainer is formed in a U-shaped or V-shaped cross section. The fall regulation member is formed, and the fall of the upright substrate can be regulated when the front surface of the container main body containing the substrate is directed upward.
[0012]
Here, the opening end surface of the container body in the claims is opened and closed by a lid body, and this lid body incorporates a locking latch mechanism for projecting a plurality of locking claws and the like from the peripheral surface of the lid body. You may or may not. The substrate includes at least one or more semiconductor wafers, photomask glass, and the like . Further, the arithmetic average roughness (Ra) means that a reference length is extracted from the roughness curve in the direction of the average line, the X-axis is in the direction of the extracted portion, and the Y-axis is in the direction of the vertical magnification, y = f (x ) Is a value obtained by a predetermined formula.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. As shown in FIGS. 1 to 9, a substrate storage container in the present embodiment includes a container body 1 for aligning and storing a plurality of substrates W, The container body 1 is provided with a lid 10 that closes the opening of the container body 1 in a sealable manner, and a plurality of support members 20 that support the peripheral edges of the both sides of the substrate W are disposed on both sides of the container body 1. A low frictional resistance portion 24 having a lower frictional resistance than the non-substrate contact area of the support member 20 is formed on at least a part of the substrate contact area 23 of the member 20. A plurality of rear retainers 30 that support the rear periphery of the substrate W are arranged side by side.
[0014]
Examples of the plurality of substrates W include a plurality of semiconductor wafers. More specifically, a 300 mm (for example, 25 or 26) silicon wafer or the like is used.
[0015]
As shown in FIGS. 1, 4, and 5, the container body 1 is formed in a front open box type having an opening at the front which is one end surface using, for example, transparent polycarbonate. The container body 1 is provided with a substantially Y-shaped planar bottom plate 2 having a through-hole for detecting and distinguishing the type of substrate storage container at the bottom, and both the front side and the rear side of the bottom plate 2. In addition, the positioning member 3 for a processing apparatus having a substantially V-shaped cross section is formed. Further, a handle 4 is detachably mounted on the ceiling of the container body 1, and the handle 4 is held by an automatic transport mechanism called OHT (overhead hoist transfer), whereby the substrate storage container is transported in the process. .
[0016]
As shown in FIGS. 1 and 5, a lid fitting rim 5 is integrally formed on the front surface of the container body 1 in a wide width. Locking grooves for the lid are formed on both sides of the rim 5. The provided locking portions 6 are integrally formed to protrude. In addition, grip handles 7 for manual conveyance are detachably mounted on both sides of the container body 1.
[0017]
As shown in FIGS. 1, 4, and 7, the lid body 10 is formed in a horizontally long substantially rectangular shape with rounded corners, and a stepped portion 11 that fits the rim portion 5 of the container body 1 protrudes on the inner surface. At the same time, the stepped portion 11 is provided with a front retainer 12 that horizontally aligns and supports a plurality of substrates W at a predetermined pitch. The lid 10 is fitted with an endless seal gasket 13 at the step portion 11, and the seal gasket 13 ensures the sealing performance when the lid is closed. A pair of locking pieces 14 that engage with the locking portions 6 of the container body 1 are supported on both sides of the lid 10 so as to be swingable.
[0018]
The container body 1, the bottom plate 2, the handle 4, the pair of grip handles 7, and the lid body 10 are formed using, for example, a thermoplastic resin made of polycarbonate, polyetherimide, polyetheretherketone, cyclic olefin resin, or the like. Is done. Further, the grip handle 7 may be U-shaped as shown in FIG. 1, and the container can be stably used by the operator regardless of whether the substrate W stored in the substrate storage container is in a horizontal state or in a vertical state. In order to be able to hold the main body 1, an inverted L shape or an L shape having two grip portions formed at substantially right angles may be used.
[0019]
As shown in FIGS. 1, 5, 6, and 7, the plurality of support members 20 are integrally formed on both inner sides of the container body 1, and are arranged in parallel at a predetermined pitch in the vertical direction. Each support member 20 is formed in a substantially shelf plate shape with one free side portion curved so as to correspond to the side edge of the substrate W, and the protrusion prevention protrusion 21 extends along the side edge of the substrate W on the other side of the front part. An inclined surface 22 having a substantially V-shaped cross section that defines the insertion / extraction position of the substrate W is formed on the side wall that is formed and serves as a stopper at the rear portion. The pop-out preventing protrusion 21 is formed to a height corresponding to the thickness of the substrate W, specifically, a height in the range of 0.3 to 0.7 mm.
[0020]
The inclined surface 22 on the front side and the rear side of each support member 20, in other words, at least a part of the substrate contact region 23 (the enclosed portion in FIGS. 2 and 3) is more than the non-substrate contact region of the support member 20. The low frictional resistance portion 24 has a low frictional resistance, and the arithmetic surface roughness of the low frictional resistance portion 24 is 0.2a (0.2 μm) in terms of average roughness (Ra) when measured according to JIS B 0601-2001. ) Or more, preferably 0.3a (0.3 [mu] m) to 6.3a (6.3 [mu] m). The low frictional resistance portion 24 is formed by partially embossing the surface of the mold used for molding the support member 20 with a texture such as a satin finish or a leather texture, and transferring this to the support member surface during molding. be able to. The embossing on the mold is performed by sandblasting, electric discharge machining, etching, or the like.
[0021]
The reason why the arithmetic surface roughness of the low frictional resistance portion 24 is 0.2a (0.2 μm) or more in terms of average roughness (Ra) is less than 0.2a (0.2 μm). When the container body 1 is changed from the vertical position to the horizontal position, the substrate W does not move smoothly from the rear retainer 30 and stops halfway, so that the substrate W is displaced and cannot be picked up. This is because the substrate W may be damaged.
[0022]
The arithmetic surface roughness of the low frictional resistance portion 24 is preferably in the range of 0.3a (0.3 μm) to 6.3a (6.3 μm) in terms of average roughness (Ra) depending on molding conditions and degassing conditions. This is because the accuracy is affected, and if it is within this range, stability during mass production can be achieved. In addition, when the average roughness (Ra) exceeds 6.3a (6.3 μm), the frictional resistance is good, but the embossed part where the support member 20 is formed is damaged when releasing from the mold after molding. This is because it becomes difficult to release from the mold due to resistance.
[0023]
As shown in FIGS. 4, 5, 7 to 9, each rear retainer 30 is more flexible than the support member 20 from the standpoint of individually contacting and protecting the substrate W, like the front retainers facing each other. A plurality of storage grooves 31 are juxtaposed at a predetermined interval at a contact portion with the substrate W, and the overturning regulation that restricts the falling of the substrate W standing up in each storage groove 31 is formed. The member 32 is provided integrally. Each storage groove 31 is formed in a substantially U-shaped or substantially V-shaped cross section including an inclined surface. Each of the overturning restriction members 32 is formed of a vertical wall 33 located on one side from the horizontal center line of the storage groove 31 and an inclined surface 34 located on the other side from the center line. It functions to be asymmetric with respect to the center line in the horizontal direction of the substrate W.
[0024]
When the lid 10 is fitted and closed in front of the opening of the container body 1, the rear retainer 30 as described above scoops up the peripheral edge of the substrate W together with the front retainer 12 from the support member 20 via the storage groove 31, and falls over. Clamp at the center of 32. Further, when the lid 10 is removed from the front of the opening of the container body 1, the rear periphery of the substrate W is slid onto the support member 20 by the inclined surface 22 of the overturning restriction member 32.
[0025]
According to the above configuration, the substrate W slides from the rear retainer 30 to each support member 20 when the lid 10 is removed, but the low friction resistance portion 24 having a low frictional resistance is formed in the substrate contact region 23 of the support member 20. Therefore, the substrate W does not stop in the middle of the storage groove 31 of the rear retainer 30. Therefore, it is possible to solve the problem that the mounting position of the substrate W is shifted from the normal position and a loading mistake occurs, or the substrate chucking hand of the take-out robot interferes with the substrate W and is damaged.
[0026]
Further, as shown in FIG. 9, even when handling the substrate W with the front surface of the container body 1 facing upward and the substrate W standing upright, the overturning restricting member 32 that forms the storage groove 31 of the rear retainer 30 is provided with the substrate W The plurality of substrates W can all be tilted in the same direction. Therefore, it is possible to eliminate the possibility that the substrate W comes into contact with the support member 20 or the adjacent substrates W fall in different directions and the substrates come into contact with each other on the opening side of the container body 1 to cause damage or contamination. .
[0027]
In the above-described embodiment, the low frictional resistance portions 24 are formed on the front inclined surface 22 and the rear inclined surface 22 of the support member 20, respectively. However, the present invention is not limited to this, and the support member 20 and the support member 20 are not limited thereto. You may form in the inside both sides of the container main body 1 which continues to. Further, the low frictional resistance portion 24 may be formed in part or all of the storage groove 31 of the rear retainer 30.
[0028]
【Example】
Examples of substrate storage containers according to the present invention will be described below together with comparative examples.
EXAMPLE The container body of the substrate storage container is molded using polycarbonate, and a low friction resistance portion having a surface roughness of 0.3a (0.3 μm) in average roughness (Ra) is formed on the support member of the container body. Formed by processing. The surface roughness was measured using a probe contact type surface roughness meter (Mitoyo model surf test 501).
Then, a support member is used to support a wafer of φ300 mm as a substrate, and the frictional resistance when this wafer is moved in the horizontal direction is measured with a full-scale 50 N push-pull gauge (AWF-50 manufactured by Aiko Engineering Co., Ltd.). The results are summarized in Table 1. This measurement was performed at six locations from the bottom to the 1st stage, 5th stage, 10th stage, 15th stage, 20th stage, and 25th stage, and the average value was calculated.
[0029]
Comparative Example The container body is molded using polycarbonate, and the surface roughness of the support member is 0.1a (0.1 μm) or less in terms of average roughness (Ra) without subjecting the support member of the container body to a texture. did.
Then, a φ300 mm wafer is supported on the support member, and the frictional resistance when this wafer is moved in the horizontal direction is measured with a full-scale 50N push-pull gauge (AWF-50 manufactured by Aiko Engineering Co., Ltd.). Summarized in 1. The measurement was performed from the first, fifth, tenth, fifteenth, twentieth, twenty-fifth, and twenty-fifth stages from the bottom, and the average value was calculated.
[0030]
[Table 1]

[0031]
As is clear from Table 1, the frictional resistance between the support member and the wafer in the example was reduced to 1/6. It was also confirmed that the wafer smoothly slid from the housing groove of the rear retainer to the support member.
[0032]
【The invention's effect】
As described above, according to the present invention, there is an effect that the frictional resistance of the support member can be reduced to suppress the breakage of the substrate.
That is, according to the present invention, the substrate slides when the lid is removed, but since the low frictional resistance portion having a low frictional resistance is formed on the support member, the substrate mounting position is less likely to deviate from the normal position. . Therefore, it is possible to solve the problem that loading mistakes and the substrate chucking hand of the take-out robot are damaged due to interference with the substrate. Further, when the substrates are handled upright, it is possible to effectively prevent the substrates from coming into contact with the supporting member by suppressing the inclination of the substrates or from being damaged due to contact between the substrates.
Moreover, since the arithmetic surface roughness of the low frictional resistance portion is 0.3 μm in terms of average roughness (Ra), stability during mass production using a mold can be expected. In addition, it is possible to prevent the embossed portion formed with the support member from being damaged when it is released from the mold, or it becomes a resistance and cannot be easily removed from the mold.
[Brief description of the drawings]
FIG. 1 is an overall perspective explanatory view showing an embodiment of a substrate storage container according to the present invention.
FIG. 2 is a plan view showing a support member in an embodiment of a substrate storage container according to the present invention.
FIG. 3 is a front view showing a support member in an embodiment of a substrate storage container according to the present invention.
FIG. 4 is an explanatory diagram of a cross section of FIG. 1;
FIG. 5 is an explanatory view of a longitudinal section of FIG. 1;
FIG. 6 is a schematic explanatory view showing a support member in an embodiment of a substrate storage container according to the present invention.
FIG. 7 is a schematic explanatory view showing a state in which the retainer supports the substrate in the embodiment of the substrate storage container according to the present invention.
FIG. 8 is a schematic explanatory view showing a state in which the lid body is removed from the container body in the embodiment of the substrate storage container according to the present invention and the substrate is supported by the support member.
FIG. 9 is a schematic explanatory view showing a state in which the container main body faces upward in the embodiment of the substrate storage container according to the present invention.
FIG. 10 is a schematic explanatory view showing a state in which a support member of a conventional substrate storage container supports a substrate horizontally.
FIG. 11 is a cross-sectional explanatory view showing a case where a substrate is handled in an upright state with the opening front of a conventional substrate storage container facing upward.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Container main body 10 Cover body 13 Seal gasket 20 Support member 22 Inclined surface 23 Substrate contact area 24 Low friction resistance part 30 Rear retainer 31 Storage groove (groove)
32 Falling restriction member 33 Vertical wall 34 Inclined surface W Substrate

Claims

It has a front open box type container main body that houses a substrate whose front and back surfaces are mirror-finished, and a lid that opens and closes the front surface of the container main body. A plurality of support members to be supported are respectively disposed on the lid body, and a front retainer for supporting the substrate is attached to the lid body, and when the lid body closes the open front surface of the container body, the inclined surface on the back side of the container body and the lid A substrate storage container for lifting the substrate from the support member of the container body by the front retainer of the body ,
Each support member is formed in a shelf plate oriented in the front-rear direction of the container body, and one front side that contacts the substrate is curved so as to correspond to the peripheral edge of the substrate, and is located closer to the inner surface of the container body. A protrusion preventing protrusion for the substrate is formed on the other side of the front part of the support member, and a sloped surface having a V-shaped cross section is formed on the substrate stopper side wall on the rear part of the support member to define the position of the contacting substrate. In addition, a low friction resistance portion having an arithmetic surface roughness of 0.3 μm in average roughness (Ra) is formed on the front side and the inclined surface of the support member, respectively.
A substrate storage container having a frictional resistance value of 0.15 to 0.25 N when a substrate supported by a plurality of support members moves in a horizontal direction .

A rear retainer that supports the rear peripheral edge of the substrate via a storage groove is attached to the inner rear surface of the container body, and the storage groove of the rear retainer is formed in a U-shaped or V-shaped cross section, and a fall restricting member is formed in the storage groove. 2. The substrate storage container according to claim 1 , wherein the fall regulation member regulates the fall of the upright substrate when the front surface of the container main body containing the substrate is directed upward.