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JP4256282B2 - Heat sink material manufacturing method and heat sink ceramic package - Google Patents
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JP4256282B2 - Heat sink material manufacturing method and heat sink ceramic package - Google Patents

Heat sink material manufacturing method and heat sink ceramic package Download PDF

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JP4256282B2
JP4256282B2 JP2004050044A JP2004050044A JP4256282B2 JP 4256282 B2 JP4256282 B2 JP 4256282B2 JP 2004050044 A JP2004050044 A JP 2004050044A JP 2004050044 A JP2004050044 A JP 2004050044A JP 4256282 B2 JP4256282 B2 JP 4256282B2
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heat sink
plate
thickness
ceramic package
composite
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JP2005243819A (en
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豊 加地
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32Ceramic
    • C04B2237/36Non-oxidic
    • C04B2237/366Aluminium nitride

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Description

本発明は、ヒートシンク材の製造方法およびヒートシンク付きセラミックパッケージに関する。 The present invention relates to a method for manufacturing a heat sink material and a ceramic package with a heat sink.

電子部品用のヒートシンクには、従来からCu−W複合材やCu−Mo複合材が使用されてきた。Cu−W複合材は、W粉末の焼結体に溶融Cuを含浸させて圧延したものである。Cu−Mo複合材は、Mo粉末の成形体に溶融Cuを含浸させて圧延したものである。また、Mo板を一対のCu板で挟んで圧延したクラッド材(いわゆるCMCクラッド材)も使用されている。CMCクラッド材は、表層部がCuなので他部品との熱伝導性には優れるが、Moで構成された内層部が脆いので加工性が低いという弱点がある。   Conventionally, Cu—W composite materials and Cu—Mo composite materials have been used for heat sinks for electronic components. The Cu—W composite material is obtained by impregnating a sintered body of W powder with molten Cu and rolling it. The Cu—Mo composite material is obtained by impregnating molten Cu with a molten Cu powder and rolling it. A clad material (so-called CMC clad material) obtained by rolling a Mo plate between a pair of Cu plates is also used. The CMC clad material is excellent in thermal conductivity with other parts because the surface layer portion is Cu, but has a weakness that the workability is low because the inner layer portion made of Mo is brittle.

一方、最近になってCu−Mo複合体を一対のCu板で挟んで圧延した複合クラッド材(いわゆるCPCクラッド材)が提供され始めた(下記特許文献1)。このCPCクラッド材は、加工性および熱伝導性の両性質に優れるため、需要が拡大中である。
特開2001−358266号公報
On the other hand, recently, a composite clad material (so-called CPC clad material) obtained by rolling a Cu-Mo composite between a pair of Cu plates has been provided (Patent Document 1 below). This CPC clad material is excellent in both properties of workability and thermal conductivity, and therefore the demand is expanding.
JP 2001-358266 A

上記のようなヒートシンク材を用いて半導体チップ実装用のヒートシンク付きセラミックパッケージを製造する場合、所定の大きさに成形(切断)したヒートシンクと、別途作製したセラミックパッケージとをAgロウ材等でロウ付けする。また、ヒートシンク付きセラミックパッケージに半導体チップを実装するときにも、図1に示すごとく、半導体チップをヒートシンク上に直接またはCu薄板等を介してAu−Snロウ材等でロウ付けする。こうしたロウ付け工程を行なう際の熱履歴で、ヒートシンクに反りが発生するという問題がある。   When manufacturing a ceramic package with a heat sink for mounting a semiconductor chip using the heat sink material as described above, a heat sink molded (cut) to a predetermined size and a separately prepared ceramic package are brazed with an Ag brazing material or the like To do. Also, when a semiconductor chip is mounted on a ceramic package with a heat sink, as shown in FIG. 1, the semiconductor chip is brazed with Au—Sn brazing material or the like directly on the heat sink or via a Cu thin plate or the like. There is a problem that the heat sink is warped due to the thermal history during the brazing process.

上記特許文献1には、上下のCu板とCu−Mo複合体との厚さ比率を調整したり、Cu−Mo複合体の圧延方法を工夫したりすることで、ヒートシンクに発生する反りを低減する技術が開示されている。ヒートシンクの反りが小さければ、セラミックパッケージとヒートシンクとの接合強度、さらには半導体チップとヒートシンクとの接合強度を確保しやすい。   In Patent Document 1, the warp generated in the heat sink is reduced by adjusting the thickness ratio between the upper and lower Cu plates and the Cu-Mo composite or by devising the rolling method of the Cu-Mo composite. Techniques to do this are disclosed. If the warp of the heat sink is small, it is easy to ensure the bonding strength between the ceramic package and the heat sink, and further the bonding strength between the semiconductor chip and the heat sink.

ところで、ヒートシンクの反りを小さくすることが望まれる一方、反り方向を制御したいという要望を持ったユーザも現れてきた。   By the way, while it is desired to reduce the warpage of the heat sink, there are users who have a desire to control the warping direction.

そこで本発明は、発生する反りの方向を制御できるヒートシンク材の製造方法を提供することを一つの課題とする。また、そのヒートシンク材を用いて作製したヒートシンク付きセラミックパッケージを提供することを他の一つの課題とする。 Accordingly, an object of the present invention is to provide a method of manufacturing a heat sink material that can control the direction of warping that occurs . It is another object to provide a ceramic package with a heat sink manufactured using the heat sink material.

課題を解決するための手段および発明の効果Means for Solving the Problems and Effects of the Invention

上記課題を解決するために本発明は、一対のCu板の間にCu−Mo複合体が介挿され相互に接合された構造を有するヒートシンク材において、一方のCu板と他方のCu板との厚さを異ならせたことを前提とする。 In order to solve the above-described problems, the present invention provides a heat sink material having a structure in which a Cu-Mo composite is interposed between a pair of Cu plates and bonded to each other, and the thickness between one Cu plate and the other Cu plate Assuming that

上記のヒートシンク材は、表裏で熱容量が相違するので、セラミックパッケージや半導体チップをロウ付けしたとき、反り方向に一定の規則性を有する。すなわち、反りの方向を予め予測できるとともに、反りの方向を積極的に制御できる。また、一方のCu板と他方のCu板との厚さを異ならせるに留めているので、一方の面側での熱伝導性の低下の問題も生じ難い。 Since the above heat sink materials have different heat capacities, the heat sink material has a certain regularity in the warping direction when a ceramic package or a semiconductor chip is brazed. That is, the direction of warpage can be predicted in advance, and the direction of warpage can be positively controlled. In addition, since the thickness of one Cu plate and the other Cu plate is kept different, the problem of a decrease in thermal conductivity on the one surface side hardly occurs.

本発明のヒートシンク材は、次のようにして製造することができる。すなわち、Mo粉末の成形体に溶融Cuを含浸して得られるCu−Mo複合体を一対のCu板で挟んで圧延することにより、Cu−Mo複合体とCu板との接合構造を有するヒートシンク材を製造する方法において、一方のCu板を上記圧延後において減厚し、他方のCu板と厚さを異ならせる。Cu−Mo複合体とCu板とのクラッド材を作製する際、Cu−Mo複合体をCu板で挟んで圧延を行なわないと、品質が不安定になる。したがって、上記本発明のごとく、圧延後に一方のCu板を減厚する方法が好適である。 The heat sink material of the present invention can be manufactured as follows. That is, a heat sink material having a joint structure between a Cu-Mo composite and a Cu plate by rolling a Cu-Mo composite obtained by impregnating molten Cu into a Mo powder compact with a pair of Cu plates. In this method, one Cu plate is reduced in thickness after the rolling, and the thickness is different from that of the other Cu plate. When producing a clad material of a Cu-Mo composite and a Cu plate, the quality becomes unstable unless the Cu-Mo composite is sandwiched between Cu plates and rolled. Therefore, a method of reducing the thickness of one Cu plate after rolling as in the present invention is preferred.

また、一方のCu板と他方のCu板との厚さを異ならせるための具体的な手法としては、一方のCu板を、研磨、研削またはエッチングにより減厚する方法を示すことができる。これらの方法は、技術的な困難性も低く、コストも低廉である。また、高精度の板厚を管理することにも寄与し得る。なお、一方のCu板を上記圧延後において増厚し、他方のCu板と厚さを異ならせるという方法も同様に採用できる。その場合の具体的な手法としては、一方のCu板の表面にメッキ、蒸着、スパッタ等によりCu膜を形成する方法を示せる。メッキ膜を形成する方法ならば、厚さの異なるメッキ膜(いわゆる差厚メッキ)を形成するようにしてもよい。   Further, as a specific method for making the thickness of one Cu plate different from the other Cu plate, a method of reducing the thickness of one Cu plate by polishing, grinding or etching can be shown. These methods have low technical difficulty and low cost. It can also contribute to managing a highly accurate plate thickness. In addition, the method of increasing the thickness of one Cu plate after the rolling and making the thickness different from that of the other Cu plate can be similarly adopted. As a specific method in that case, a method of forming a Cu film on the surface of one Cu plate by plating, vapor deposition, sputtering or the like can be shown. If it is a method of forming a plating film, you may make it form the plating film (what is called differential thickness plating) from which thickness differs.

また、一対のCu板の間にCu−Mo複合体が介挿され相互に接合されるとともに、一方のCu板と他方のCu板との厚さが互いに異なるように構成されたヒートシンクと、ヒートシンクを構成する一対のCu板のうち、板厚の厚いCu板の主面上にロウ付けされたセラミックパッケージとを備えたヒートシンク付きセラミックパッケージを提供できる。このヒートシンク付きセラミックパッケージは、反り方向に一定の規則性を有する。すなわち、反りの方向を予め予測できるとともに、反りの方向を積極的に制御できる。また、一方のCu板と他方のCu板との厚さを異ならせるに留めているので、一方の面側での熱伝導性の低下の問題も生じ難い。
In addition, a Cu-Mo composite is interposed between a pair of Cu plates and joined together, and a heat sink and a heat sink are configured so that the thicknesses of one Cu plate and the other Cu plate are different from each other. Among the pair of Cu plates, a ceramic package with a heat sink provided with a ceramic package brazed onto the main surface of the thick Cu plate can be provided. This ceramic package with a heat sink has a certain regularity in the warping direction. That is, the direction of warpage can be predicted in advance, and the direction of warpage can be positively controlled. In addition, since the thickness of one Cu plate and the other Cu plate is kept different, the problem of a decrease in thermal conductivity on the one surface side hardly occurs.

好適な態様において、ヒートシンクを構成するCu板のうち、厚く調整されたCu板の主面上にセラミックパッケージをロウ付けすることができる。このようにすると、図3(a)に示すごとく、セラミックパッケージ5をロウ付けした側が凹状になる。すると、ヒートシンク3を支持体20に螺子止めしやすくなる。また、螺子21の締め具合を調整したりして、ヒートシンク3と支持体20とを密着させやすい。   In a preferred embodiment, the ceramic package can be brazed onto the main surface of the Cu plate adjusted to be thick among the Cu plates constituting the heat sink. If it does in this way, as shown to Fig.3 (a), the side which brazed the ceramic package 5 will become concave shape. Then, it becomes easy to screw the heat sink 3 to the support 20. In addition, the heat sink 3 and the support 20 are easily brought into close contact with each other by adjusting the tightening degree of the screw 21.

なお、セラミックパッケージはアルミナセラミック、窒化アルミニウムセラミックまたはガラスセラミックにて構成することが望ましい。   The ceramic package is preferably composed of alumina ceramic, aluminum nitride ceramic or glass ceramic.

以下、添付の図面を参照しつつ本発明の実施形態について説明する。
図1は、移動体の通信基地局等に使用される高周波回路部品100の断面模式図である。高周波回路部品100は、ヒートシンク付きセラミックパッケージ1に、半導体チップ13,13を実装したものである。ヒートシンク付きセラミックパッケージ1は、ヒートシンク3と、ヒートシンク3の主表面上にAgロウ材でロウ付けされたセラミックパッケージ5とを備える。セラミックパッケージ5は、枠状の形態を有するパッケージ本体11と、パッケージ本体11に取り付けられたリード7,9とを備える。
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
FIG. 1 is a schematic cross-sectional view of a high-frequency circuit component 100 used in a mobile communication base station or the like. The high-frequency circuit component 100 is obtained by mounting semiconductor chips 13 and 13 on a ceramic package 1 with a heat sink. The ceramic package 1 with a heat sink includes a heat sink 3 and a ceramic package 5 brazed on the main surface of the heat sink 3 with an Ag brazing material. The ceramic package 5 includes a package main body 11 having a frame shape and leads 7 and 9 attached to the package main body 11.

パッケージ本体11は、たとえばアルミナセラミック、窒化アルミニウムセラミックまたはガラスセラミックで構成される。リード7,9は、コバールや42アロイ(いずれも商品名)などの金属材料で構成されたものであり、パッケージ本体11の上面にロウ付けされている。パッケージ本体11は、下面側においてヒートシンク3にロウ付けされている。こうしたロウ付けには、Agロウ材(金属成分のうちAgを最も多く含むロウ材)が用いられる。半導体チップ13は、セラミックパッケージ5のキャビティ11p内におけるヒートシンク3上に、直接または厚さ300μm程度の金属薄板(Cu薄板がよい)を介して実装される。半導体チップ13の実装には、Au系ロウ材(たとえばAu−Snロウ材)が用いられる。また、半導体チップ13,13の電極とリード7,9とは、ボンディングワイヤにて接続される。   The package body 11 is made of, for example, alumina ceramic, aluminum nitride ceramic, or glass ceramic. The leads 7 and 9 are made of a metal material such as Kovar or 42 alloy (both are trade names), and are brazed to the upper surface of the package body 11. The package body 11 is brazed to the heat sink 3 on the lower surface side. For such brazing, an Ag brazing material (a brazing material containing the most Ag among metal components) is used. The semiconductor chip 13 is mounted on the heat sink 3 in the cavity 11p of the ceramic package 5 directly or via a metal thin plate (Cu thin plate is preferable) having a thickness of about 300 μm. An Au-based brazing material (for example, Au—Sn brazing material) is used for mounting the semiconductor chip 13. The electrodes of the semiconductor chips 13 and 13 and the leads 7 and 9 are connected by bonding wires.

ヒートシンク3は、Cu−Mo複合体30の上下にCu板32,34を配置して圧延し、それらCu−Mo複合体30およびCu板32,34を相互に接合したクラッド材(ヒートシンク材)から作製されたものである。ヒートシンク3は、表層部がCuにて構成されるので熱伝導性が良好である。図2に示すごとく、セラミックパッケージ5をロウ付けする側の第一Cu板32の厚さd(0.3mm)は、反対側の第二Cu板34の厚さd(0.1mm)よりも大である。また、Cu−Mo複合体30の厚さd(1.5mm)は、第一Cu板32の厚さdと第二Cu板34の厚さdとの和よりも大である。 The heat sink 3 is made of a clad material (heat sink material) in which Cu plates 32 and 34 are placed above and below the Cu-Mo composite 30 and rolled, and the Cu-Mo composite 30 and the Cu plates 32 and 34 are joined to each other. It was produced. The heat sink 3 has a good thermal conductivity because the surface layer portion is made of Cu. As shown in FIG. 2, the thickness d 1 (0.3 mm) of the first Cu plate 32 on the side where the ceramic package 5 is brazed is equal to the thickness d 3 (0.1 mm) of the second Cu plate 34 on the opposite side. Is bigger than. The thickness d 2 of the Cu-Mo complex 30 (1.5 mm) is greater than the sum of the thickness of the first Cu plate 32 d 1 and the thickness d 3 of the second Cu plate 34.

こうした比率を採用することにより、セラミックパッケージ5や半導体チップ13をロウ付けしたときに、ヒートシンク3に発生する反りの方向を制御することができる。具体的には、ヒートシンク3に発生する反りの方向が、セラミックパッケージ5を配置した側(半導体チップ13の実装側)に凹状となるように制御することができる。反り方向を制御するべき一つの理由は、次のようなものである。   By adopting such a ratio, it is possible to control the direction of warpage generated in the heat sink 3 when the ceramic package 5 or the semiconductor chip 13 is brazed. Specifically, the direction of the warp generated in the heat sink 3 can be controlled to be concave on the side where the ceramic package 5 is disposed (the side on which the semiconductor chip 13 is mounted). One reason for controlling the warping direction is as follows.

図1の高周波回路部品100は、図3(a)の模式図に示すごとく、螺子やボルト等の締結部材21で支持体20(支持基板)に取り付けられて使用される。螺子孔やボルト孔は半導体チップ13を搭載する中央部を避けて、ヒートシンク3の外周部に設けられる。したがって、締結部材21は、ヒートシンク3の外周部を支持体20側に押さえ込む。このとき、図3(a)に示すごとく、ヒートシンク3に発生している反りがセラミックパッケージ5の配置側に凹状の場合、反りは自然に矯正される。また、支持体20とヒートシンク3とがしっかり密着するので、ヒートシンク3から支持体20への熱伝導性が良好である。   The high-frequency circuit component 100 of FIG. 1 is used by being attached to a support body 20 (support substrate) with a fastening member 21 such as a screw or a bolt as shown in the schematic diagram of FIG. The screw holes and bolt holes are provided on the outer peripheral portion of the heat sink 3, avoiding the central portion where the semiconductor chip 13 is mounted. Therefore, the fastening member 21 presses the outer peripheral portion of the heat sink 3 toward the support 20. At this time, as shown in FIG. 3A, when the warp generated in the heat sink 3 is concave on the side where the ceramic package 5 is disposed, the warp is naturally corrected. Moreover, since the support body 20 and the heat sink 3 adhere | attach firmly, the heat conductivity from the heat sink 3 to the support body 20 is favorable.

他方、図3(b)に示すごとく、反り方向を制御せずセラミックパッケージ5の配置側が凸状になったヒートシンク3’の場合、締結部材21をきつく締め込んでもヒートシンク3’と支持体20との間に、ヒートシンク3’の反りを反映した空隙が生じ、ヒートシンク3’と支持体20との密着が不十分になる。ヒートシンク3’から支持体20への熱伝導性は、図3(a)の本発明の場合に比して劣る。   On the other hand, as shown in FIG. 3 (b), in the case of the heat sink 3 'in which the warping direction is not controlled and the arrangement side of the ceramic package 5 is convex, even if the fastening member 21 is tightened, the heat sink 3' and the support 20 A gap reflecting the warp of the heat sink 3 ′ is generated between the heat sink 3 ′ and the heat sink 3 ′ and the support 20 are not sufficiently adhered. The thermal conductivity from the heat sink 3 'to the support 20 is inferior to that of the present invention in FIG.

ロウ付け工程でヒートシンク3に発生する反りの原因は、主としてセラミックパッケージ5との熱膨張率差によるものである。材料が均質であればあるほど、反りの方向が図3(a)の方向になるのか、図3(b)の方向になるのか予測しづらい。上記したように、図3(a)の方向に多少の反りが発生していても問題は無いが、図3(b)の方向に反りが発生することは好ましくない。したがって、単に反りが小さいというだけでは不十分であり、本発明のごとく反り方向を制御することが重要性を持ってくる。   The cause of the warp generated in the heat sink 3 in the brazing process is mainly due to the difference in thermal expansion coefficient from the ceramic package 5. The more homogeneous the material, the harder it is to predict whether the direction of warpage will be in the direction of FIG. 3 (a) or the direction of FIG. 3 (b). As described above, there is no problem even if some warping occurs in the direction of FIG. 3A, but it is not preferable that warping occurs in the direction of FIG. Therefore, it is not sufficient that the warp is small, and it is important to control the warp direction as in the present invention.

次に、ヒートシンク3の製造方法について説明する。まず、Cu−Mo複合材を作製する。図4に示すごとく、Mo粉末をCIP法等の粉末成形方法により成形して、板状のMo粉末成形体40を得る。このMo粉末成形体40に、Cu板42を載せるとともに、不活性雰囲気中において両者をCuの融点を超える温度(約1300℃)で加熱し、溶融CuをMo粉末成形体40に含浸させる。こうして得られた予備複合体30’をローラで圧延して、圧延体として構成されたCu−Mo複合体30を得る。この圧延加工は、互いに直交する二軸方向(XY方向)について行なう。二軸方向に圧延することで、セラミックに近い低熱膨張率を実現できる。なお、一次圧延加工については、予備複合体30’を約200℃に加熱して行なう熱間加工とし、二次圧延加工は室温まで除冷して行なう冷間加工とする。また、Cu−Mo複合体30におけるCu含有率は、たとえば30質量%以上40質量%以下とする。   Next, a method for manufacturing the heat sink 3 will be described. First, a Cu—Mo composite material is produced. As shown in FIG. 4, Mo powder is shape | molded by powder shaping | molding methods, such as CIP method, and the plate-shaped Mo powder molded object 40 is obtained. A Cu plate 42 is placed on the Mo powder compact 40 and both are heated in an inert atmosphere at a temperature exceeding the melting point of Cu (about 1300 ° C.) to impregnate the Mo powder compact 40 with the molten Cu. The preliminary composite 30 ′ thus obtained is rolled with a roller to obtain a Cu—Mo composite 30 configured as a rolled body. This rolling process is performed in biaxial directions (XY directions) orthogonal to each other. By rolling in the biaxial direction, a low thermal expansion coefficient close to that of ceramic can be realized. The primary rolling process is a hot working performed by heating the preliminary composite 30 ′ to about 200 ° C., and the secondary rolling process is a cold working performed by cooling to room temperature. Moreover, Cu content rate in the Cu-Mo composite 30 shall be 30 to 40 mass%, for example.

次に、Cu−Mo複合体30の一方の面側に第一Cu板32、他方の面側に第二Cu板32を配置し、接合熱処理を施した後、圧延加工を行なう。第一Cu32と第二Cu板32とは、同一(同一の厚さ、材料)のものを使用する。接合熱処理では、Cu−Mo複合体30とCu板32,32との積層体44を、約800℃の不活性雰囲気中に数10分間保持する処理とする。接合熱処理後の圧延加工は、積層体44が室温に達する前に行なう(熱間圧延加工)。   Next, the first Cu plate 32 is disposed on one surface side of the Cu—Mo composite 30 and the second Cu plate 32 is disposed on the other surface side, and after performing a joint heat treatment, rolling is performed. The first Cu 32 and the second Cu plate 32 are the same (same thickness and material). In the bonding heat treatment, the laminate 44 of the Cu—Mo composite 30 and the Cu plates 32 and 32 is held in an inert atmosphere at about 800 ° C. for several tens of minutes. The rolling process after the bonding heat treatment is performed before the laminated body 44 reaches room temperature (hot rolling process).

以上のようにして、Cu−Mo複合体30の表面側と裏面側とに等しい厚さのCu板32,32が接合された圧延板50’が作製される。次に、この圧延板50’について、一方の面側のCu板32の厚さを減じる減厚工程を行なう。具体的には、一方の面側のCu板32を、研削(ブラスト処理を含む)、研磨または化学エッチングもしくはそれらの組み合わせによって減厚する。減厚する厚さDは、たとえばCu板32の厚さの1/2以上2/3以下とすることができる。このようにして、減厚加工を施した一方の面側のCu板34と、他方の面側のCu板32との厚さが相違するヒートシンク材50を得ることができる。このヒートシンク材50を一定の大きさに打ち抜くことにより、ヒートシンク3が得られる。   As described above, the rolled plate 50 ′ in which the Cu plates 32 and 32 having the same thickness on the front surface side and the back surface side of the Cu—Mo composite 30 are joined is produced. Next, a thickness reduction process for reducing the thickness of the Cu plate 32 on one surface side is performed on the rolled plate 50 '. Specifically, the thickness of the Cu plate 32 on one surface side is reduced by grinding (including blasting), polishing, chemical etching, or a combination thereof. The thickness D to be reduced can be, for example, not less than ½ and not more than 2/3 of the thickness of the Cu plate 32. In this way, it is possible to obtain the heat sink material 50 in which the thicknesses of the Cu plate 34 on one side subjected to the thickness reduction process and the Cu plate 32 on the other side are different. The heat sink 3 is obtained by punching the heat sink material 50 into a certain size.

ヒートシンク材50を打ち抜いて得られるヒートシンク3には、表面研磨処理、バリ取り処理、Cuメッキ処理の各処理が施される。こうして作製されたヒートシンク3のCu板32側(減厚しない側)にAgロウ材を塗工したのち、別途作製したセラミックパッケージ5を載置してリフローすることにより、ヒートシンク付きセラミックパッケージ1が得られる。   The heat sink 3 obtained by punching out the heat sink material 50 is subjected to surface polishing, deburring, and Cu plating. After the Ag brazing material is coated on the Cu plate 32 side (the non-thinned side) of the heat sink 3 manufactured in this way, the ceramic package 5 manufactured separately is placed and reflowed to obtain the ceramic package 1 with a heat sink. It is done.

ところで、図4で示した製造方法は、一方の面側のCu板32を減厚する工程を含むものとしたが、この減厚工程の代わりに、該Cu板32を増厚する工程を行なうようにしてもよい。この増厚工程は、たとえばメッキ、蒸着またはスパッタにより、Cu板32の表面にCu膜を形成する工程とすることができる。たとえば、図4で製造方法を説明した圧延板50’を、所定の大きさに打ち抜いて得られる打ち抜き品に対し、表面研磨処理、バリ取り処理の各工程を施す。そしてこれら打ち抜き品の各々の片面側に、ドライフィルム(メッキレジスト)を貼着して、電解Cuメッキ工程を行なう。このようにすれば、一方の面側のCu板32と、他方の面側のCu板34との厚さが相違するヒートシンク3を容易に作製できる。   Incidentally, although the manufacturing method shown in FIG. 4 includes a step of reducing the thickness of the Cu plate 32 on one surface side, a step of increasing the thickness of the Cu plate 32 is performed instead of this thickness reduction step. You may do it. This thickening step can be a step of forming a Cu film on the surface of the Cu plate 32 by, for example, plating, vapor deposition, or sputtering. For example, the surface polishing process and the deburring process are performed on a punched product obtained by punching the rolled plate 50 ′ described in FIG. 4 into a predetermined size. Then, a dry film (plating resist) is adhered to one side of each of these punched products, and an electrolytic Cu plating process is performed. In this way, the heat sink 3 in which the thicknesses of the Cu plate 32 on one side and the Cu plate 34 on the other side are different can be easily manufactured.

なお、厚さが相違する2種類のCu板32,34を予め用意し、Cu−Mo複合体30にそれら厚さの相違するCu板32,34を接合し圧延することにより、一方の面側のCu板32と、他方の面側のCu板34との厚さが相違するヒートシンク3を作製するようにしてもよい。   In addition, by preparing two types of Cu plates 32 and 34 having different thicknesses in advance and joining and rolling the Cu plates 32 and 34 having different thicknesses on the Cu-Mo composite 30, one surface side You may make it produce the heat sink 3 from which the thickness of the Cu plate 32 of this and the Cu plate 34 of the other surface side differ.

ヒートシンク付きセラミックパッケージの断面図。Sectional drawing of the ceramic package with a heat sink. ヒートシンクの断面模式図。The cross-sectional schematic diagram of a heat sink. ヒートシンクの反りについて説明する断面模式図。The cross-sectional schematic diagram explaining the curvature of a heat sink. ヒートシンクの製造工程説明図。Manufacturing process explanatory drawing of a heat sink.

符号の説明Explanation of symbols

1 ヒートシンク付きセラミックパッケージ
3 ヒートシンク
5 セラミックパッケージ
11 パッケージ本体
30 Cu−Mo複合体
32 第一Cu板
34 第二Cu板
40 Mo粉末成形体
50 ヒートシンク材
DESCRIPTION OF SYMBOLS 1 Ceramic package with a heat sink 3 Heat sink 5 Ceramic package 11 Package main body 30 Cu-Mo composite body 32 1st Cu board 34 2nd Cu board 40 Mo powder compact 50 Heat sink material

Claims (3)

Mo粉末の成形体に溶融Cuを含浸して得られるCu−Mo複合体を、厚さが略等しい一対のCu板で挟んで圧延することにより、前記Cu−Mo複合体と前記Cu板との接合構造を有するヒートシンク材を製造する方法において、一方の前記Cu板を上記圧延後において減厚し、他方の前記Cu板と厚さを異ならせることを特徴とするヒートシンク材の製造方法。   By rolling a Cu-Mo composite obtained by impregnating molten Cu into a molded body of Mo powder between a pair of Cu plates having substantially the same thickness, the Cu-Mo composite and the Cu plate A method of manufacturing a heat sink material having a joining structure, wherein one of the Cu plates is reduced in thickness after the rolling, and the thickness is different from that of the other Cu plate. Mo粉末の成形体に溶融Cuを含浸して得られるCu−Mo複合体を、厚さが略等しい一対のCu板で挟んで圧延することにより、前記Cu−Mo複合体と前記Cu板との接合構造を有するヒートシンク材を製造する方法において、一方の前記Cu板を上記圧延後において増厚し、他方の前記Cu板と厚さを異ならせることを特徴とするヒートシンク材の製造方法。   By rolling a Cu-Mo composite obtained by impregnating molten Cu into a molded body of Mo powder between a pair of Cu plates having substantially the same thickness, the Cu-Mo composite and the Cu plate In the method of manufacturing a heat sink material having a joint structure, the thickness of one of the Cu plates is increased after the rolling, and the thickness is different from that of the other Cu plate. 一対のCu板の間にCu−Mo複合体が介挿され相互に接合されるとともに、一方の前記Cu板と他方の前記Cu板との厚さが互いに異なるように構成されたヒートシンクと、
前記ヒートシンクを構成する一対のCu板のうち、板厚の厚いCu板の主面上にロウ付けされたセラミックパッケージと、
を備えることを特徴とするヒートシンク付きセラミックパッケージ。
A heat sink configured such that a Cu-Mo composite is interposed between a pair of Cu plates and bonded to each other, and the thicknesses of one Cu plate and the other Cu plate are different from each other;
Of the pair of Cu plates constituting the heat sink , a ceramic package brazed onto the main surface of the thick Cu plate ;
A ceramic package with a heat sink.
JP2004050044A 2004-02-25 2004-02-25 Heat sink material manufacturing method and heat sink ceramic package Expired - Fee Related JP4256282B2 (en)

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