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JP4280481B2 - Substrate support device - Google Patents
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JP4280481B2 - Substrate support device - Google Patents

Substrate support device Download PDF

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Publication number
JP4280481B2
JP4280481B2 JP2002303041A JP2002303041A JP4280481B2 JP 4280481 B2 JP4280481 B2 JP 4280481B2 JP 2002303041 A JP2002303041 A JP 2002303041A JP 2002303041 A JP2002303041 A JP 2002303041A JP 4280481 B2 JP4280481 B2 JP 4280481B2
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JP
Japan
Prior art keywords
substrate
substrate support
pins
movable
support plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002303041A
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Japanese (ja)
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JP2004140163A (en
Inventor
直輝 小田
右将 走浦
和伸 山口
博嗣 熊澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Tazmo Co Ltd
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Priority to JP2002303041A priority Critical patent/JP4280481B2/en
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To easily and freely arrange substrate support pins on an unused region on a substrate, to eliminate the need of a plurality of substrate supporting plates, to reduce cost and to reduce trouble of exchange in the substrate supporting device supporting a planar substrate to be processed. <P>SOLUTION: In the substrate supporting device, an upper substrate supporting plate 3 formed of thin magnetic body is overlapped on a lower substrate supporting plate 2 formed of an aluminum metal plate so as to form the substrate supporting plate 4, and fixed substrate supporting pins 5 and the movable substrate supporting pins 6 are arranged on the plate 4. The fixed pins 5 are fixed by screws 51, and the movable pins 6 have magnets inside and are fixed to the upper substrate supporting plate 3 by magnetic force. Positions of the movable pins 6 can easily be changed without using a tool. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、液晶表示器やPDP(プラズマ・ディスプレイ)等のフラット・パネル・ディスプレイ用基板を支持する基板支持装置に関する。
【0002】
【従来の技術】
従来から、平板状基板の表面処理、搬送、保管等を行うために該基板を保持する基板支持装置において、基板を下方から複数のピンにより支持する構成にあっては、基板の中ほどを支持すると基板に基板支持ピン跡が付いてしまうので、通常、基板の有効エリア外、例えば基板周辺部分において基板支持が行われている。ところで、保持する基板サイズが大きくなると基板の中央部において自重により大きなたわみが発生してしまう。基板のたわみが発生すると、たわんだ部分が基板支持プレートに接してしまう場合がある。また、基板がたわんで変形することにより基板が支持位置からずれてしまい、正しい位置に支持できない場合もある。基板サイズの大型化は、最終使用状態の基板サイズが大きくなることの他に、生産性を上げるために、いわゆる多面取りが行われることによる。基板の多面取りは、大型基板に小型基板を配置して処理し、最終的に切断して複数の最終基板サイズを得る方法である。従って、他面取り用の大型基板には、周辺部以外に切断用等の不使用領域が存在する。そこで、たわみ対策として、基板の中ほどの不使用領域を狙って取りつけた基板支持ピンを有する基板支持装置を用いることが行われている。
【0003】
【発明が解決しようとする課題】
しかしながら、従来の、基板の中ほどの不使用領域を狙って支持する基板支持装置においては、基板支持ピンが基板支持プレートに固定されたものが用いられており、多面取り仕様の変更に対して柔軟に対応できないという問題がある。例えば、基板の多面取りの仕様が小型基板のサイズ変更に伴う多面取り数の変更のように変わることにより切断領域等の不使用領域が変わってしまう。このような場合、それぞれの仕様の処理基板毎に準備しておいた基板支持プレートを交換することで対処されている。基板サイズの大型化に対応して基板支持プレート自体も大きくなり、基板支持プレート全体を交換する段取り換えも容易でなく、その手間の軽減が望まれている。さらに、多種の基板受けプレートを用意しなければならないため、部品コストがかかるという問題がある。
【0004】
本発明は、上記の課題を解消するものであって、容易かつ自在に基板支持ピンを基板上の不使用領域を狙って配置でき、複数の基板支持プレートを必要とせず、コスト削減と段取り換えの手間の軽減を実現できる基板保持装置を提供することを目的とする。
【0005】
【課題を解決するための手段】
上記の課題を達成するために、請求項1の発明は、平面状の被処理基板を真空吸着することなく複数の基板支持ピンにより基板支持プレート上に隙間をおいて支持する基板支持装置において、前記基板支持プレートは外形が四角の平板から成り、前記基板支持ピンの一部又は全て前記基板支持プレート上に配置されて用いられる可動式の基板支持ピン(以下、可動ピンという)であって、前記可動ピンの少なくとも一部が複数の可動ピンを結合させた複合ピンであり、多種の基板サイズ又はパターンの多面取り仕様を有する被処理基板に対して任意の位置を支持し得るように、該可動ピンの位置を前記基板支持プレート上において任意に変更できるようにしたものである。
【0006】
上記構成においては、基板支持ピンの位置を基板支持プレート上において任意に変更できるようにしたので、多種の基板サイズ及びパターンの多面取り仕様を有する被処理基板に対して、それぞれ専用の基板支持プレートを準備する必要がなく、また、被処理基板の不使用領域を支持するための段取りも、基板支持ピンの位置を変えることにより容易に行うことができる。
【0007】
請求項2の発明は、請求項1記載の基板支持装置において、前記基板支持プレートは磁性体を含み、前記基板支持ピンは磁性を有し、前記基板支持プレートに磁力により固定されるものである。
【0008】
上記構成においては、基板支持ピンが磁力により基板支持プレートに固定されるので、基板支持ピンの位置の変更のための特別な道具も不要であり、手作業により容易に短時間で基板支持ピンの位置の変更を行うことができる。
【0009】
【発明の実施の形態】
以下、本発明の一実施形態に係る基板支持装置について、図面を参照して説明する。図面中の共通する部材には同一符号を付して重複説明を省略する。図1に示されるように、基板支持装置1はアルミ金属板からなる下基板支持プレート2の上に薄厚の鉄板やSUS430ステンレス鋼板等の磁性体からなる上部基板支持プレート3を重ねて基板支持プレート4を形成し、これらの上面に固定式基板支持ピン(以下、固定ピン)5及び可動式基板支持ピン(以下、可動ピン)6を配置する構成となっている。固定ピン5は、図2(a)に示されるように、下部にねじ孔54を有しており、図1に示すように、基板プレート4の下面から基板プレート4の孔52,53を通してねじ51によりねじ止め固定される。また、可動ピン6は、図2(b)に示されるように、上部品61、下部品62、及び両者の内部に設けられた磁石Mから構成されている。これらの基板支持ピンの上部は、被処理基板に接触する面積を必要最小とするため鋭角としているが、被処理基板を傷付けないためには適度の丸みを保たせた方がよい。
【0010】
上記構成の基板支持装置1を用いて、同一外形サイズの被処理基板から4面取り、及び9面取りする場合の多面取り被処理基板を支持する例を、図3及び図4を参照して説明する。まず、4面取りの場合、被処理基板7は、内部に4つの小型基板71〜74を有している。各小型基板間及び被処理基板7の外周には、切断用、仕上げ用、又は、ハンドリング用等の不使用領域(非製品領域)がある。このような不使用領域のうち、基板7の内部にある領域において、点P1〜P4を選び、この点に対応する基板支持プレート上に可動ピン6を配置する。また、固定ピン5は、基板7の外周部を支持するように基板支持プレート4の周辺部に固定されている。このように基板支持ピン5,6を配置して基板7を支持することにより、基板7を清浄に保って、基板中央部における自重によるたわみをなくすことができる。また、9面取りの場合、基板8のサイズは、4面取りの場合と同じであり、外周部の支持は、上記と共通位置の固定ピン5によって行われる。基板内部については、各小型基板81〜89の境界領域において、点Q1〜Q4を選び、この点に対応する基板支持プレート上に可動ピン6を配置して、中央部にたわみを発生させることなく基板8を支持することができる。
【0011】
また、本基板支持装置1を用いた基板処理装置は、図5に示されるように、下部材Aと上部材Bとからなる。基板支持装置1は下部材Aの上部に載置され、基板7は基板支持装置1の固定ピン5及び可動ピン6に支持されている。ここで、基板処理装置100の下部材Aは、例えば、排気装置、排風装置、廃液装置、基板駆動装置等であり、上部材Bは、例えば、洗浄液シャワーノズル、現像液塗布ノズル、乾燥用送風機、薄膜形成装置,減圧乾燥装置等である。
【0012】
次に、上記基板支持装置1の詳細及びいくつかの変形例について説明する。図1において、基板支持プレート4は、従来のアルミ単体物であった基板支持プレートの厚みを薄くして下基板支持プレート2を形成し、鉄板等の磁性体からなる上部基板支持プレート3を重ねて、全体の厚みを従来の基板支持プレートと同じ厚みとしている。このように、上、下基板支持プレート2,3を合わせた板厚みが従来の基板支持プレートと同じであり、各支持ピンの高さを従来と同じにすることで、ピン可動式の基板支持装置1に従来の基板支持装置と互換性を持たせることができる。
【0013】
また、上基板支持プレート3の表面には、可動ピン6の配置変更を容易にするため、等間隔で格子状に溝a,bが彫られている。さらに、溝aと溝bの交点において特に基準点となる場所に円形溝cが彫られている。これらの溝を基準として、可動ピン6の配置変更をすることにより配置変更の作業性が向上する。また、上基板支持プレート3には発塵や腐食(錆)等を防くため、塗装、めっき処理、フッ素樹脂(ポリテトラフルオロエチレン等)コート処理等の表面処理が施される。
【0014】
また、上基板支持プレート3の特定の場所に、図6に示されるように、可動ピン6の外形よりもやや大きめの溝63を掘り、その溝に可動ピン6をはめ込むようにすることで、可動ピン6の位置ずれを防止することができる。
【0015】
また、基板支持プレート4には、図7に示されるように、位置決め用取付孔93を多数個設け、基板支持ピン9にはこの取付孔93に挿入して位置決めする突出部92を下面に設けることにより、基板支持ピン9を基板支持プレートの任意の位置決め用取付孔93に容易に挿入配置換えを行うことができる。
【0016】
また、上基板支持プレート3を磁力を持った金属プレートとし、可動ピンを鉄などの磁性体を埋め込んだものとすることにより上記と同様な効果が得られる。
【0017】
また、図8(a),(b)に示されるように、複数個の可動ピン10を結合部材11により結合させた複合ピンを用いることにより、複数の可動ピン10の配置換えを容易に行うことができる。可動ピン10は、磁石を有するものとすることもできるし、挿入用突出部を持たせたものでもよい。
【0018】
なお、本発明は、上記構成に限られることなく種々の変形が可能である。例えば、固定ピンを用いることなく、全て可動ピンにより被処理基板の支持を行うこともできる。また、被処理基板、さらに多面取りされる小型基板の形状は、上記説明における矩形とは限られず、本発明は任意の形状の平板基板に対して適用可能である。
【0019】
【発明の効果】
以上のように請求項1の発明によれば、多種多様な被処理基板に対し複数の基板受けプレートを製作しなくてよいため、部品代のコストダウンにつながり、また部品の保管管理の簡便化が図られる。また、不使用領域の異なる他の被処理基板を処理するに当たり基板支持位置の変更の段取り作業が、基板支持ピンの位置を変えることにより容易に行えるため作業効率が向上する。
【0020】
請求項2の発明によれば、プレート中ほどの可動式基板支持ピンの配置変更が必要な時、工具を必要とせずに取り外せるため簡単に配置変更が行える。
【図面の簡単な説明】
【図1】 本発明の一実施形態による基板支持装置の概要を説明する分解斜視図。
【図2】 (a)は同上装置に用いられる固定ピンの断面図、(b)は同上装置に用いられる可動ピンの断面図。
【図3】 同上装置の使用例を説明する模式的斜視図。
【図4】 同上装置の他の使用例を説明する模式的斜視図。
【図5】 同上装置を基板処理装置に組み込んだ状態を説明する模式的な断面図。
【図6】 本発明の一実施形態による可動ピンの配置構造を示す上基板支持プレートの断面図。
【図7】 本発明の一実施形態による可動ピンの他の配置構造を示す上基板支持プレートの断面図。
【図8】 (a)は本発明の一実施形態による2個の可動ピンを一体化した斜視図、(b)は同4個の可動ピンを一体化した斜視図。
【符号の説明】
1 基板支持装置
2 下基板支持プレート
3 上基板支持プレート
4 基板支持プレート
5 固定式基板支持ピン(固定ピン)
6 可動式基板支持ピン(可動ピン)
7,8 被処理基板
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate support device for supporting a flat panel display substrate such as a liquid crystal display or a PDP (plasma display).
[0002]
[Prior art]
Conventionally, in a substrate support device that holds a substrate for surface treatment, transportation, storage, etc. of a flat substrate, the substrate is supported by a plurality of pins from below, and the middle of the substrate is supported. Then, since the substrate support pin mark is attached to the substrate, the substrate is usually supported outside the effective area of the substrate, for example, the peripheral portion of the substrate. By the way, when the size of the substrate to be held increases, a large deflection occurs due to its own weight in the central portion of the substrate. When the substrate is bent, the bent portion may come into contact with the substrate support plate. Further, when the substrate is bent and deformed, the substrate may be displaced from the support position, and may not be supported at the correct position. The increase in the substrate size is due to the fact that the substrate size in the final use state is increased, and so-called multi-sizing is performed in order to increase productivity. Multi-chamfering of substrates is a method in which a small substrate is placed on a large substrate, processed, and finally cut to obtain a plurality of final substrate sizes. Therefore, the large substrate for chamfering has a non-use area for cutting or the like other than the peripheral portion. Therefore, as a countermeasure against bending, a substrate support device having substrate support pins attached aiming at an unused area in the middle of the substrate is used.
[0003]
[Problems to be solved by the invention]
However, in the conventional substrate support device that supports the substrate in the middle of the unused area, a substrate support pin fixed to the substrate support plate is used. There is a problem that it is not possible to respond flexibly. For example, a non-use area such as a cutting area is changed by changing the multi-chamfering specification of the substrate like a change in the number of multi-chamfering accompanying a size change of the small substrate. Such a case is dealt with by replacing the substrate support plate prepared for each processing substrate of each specification. Corresponding to the increase in the size of the substrate, the substrate support plate itself becomes larger, and it is not easy to replace the substrate to replace the entire substrate support plate. Furthermore, since various kinds of substrate receiving plates have to be prepared, there is a problem that the component cost is increased.
[0004]
The present invention solves the above-mentioned problem, and can easily and freely arrange the substrate support pins aiming at the unused area on the substrate, does not require a plurality of substrate support plates, and reduces cost and replacement. It is an object of the present invention to provide a substrate holding device that can reduce the time and effort required.
[0005]
[Means for Solving the Problems]
In order to achieve the above object, the invention of claim 1 is a substrate support device for supporting a planar substrate to be processed with a plurality of substrate support pins with a gap on a substrate support plate without vacuum suction. The substrate support plate is a movable substrate support pin (hereinafter referred to as a movable pin) that is formed of a flat plate having a rectangular outer shape, and a part or all of the substrate support pin is disposed and used on the substrate support plate. The movable pin is a composite pin in which a plurality of movable pins are combined, and can support an arbitrary position with respect to a substrate to be processed having various chamfer specifications of various substrate sizes or patterns. is obtained by allowing arbitrarily changed in the position of the movable pin the substrate supporting plate.
[0006]
In the above configuration, since the position of the substrate support pin can be arbitrarily changed on the substrate support plate, the substrate support plate dedicated to each of the substrates to be processed having various substrate sizes and patterns of multiple chamfering specifications. In addition, the setup for supporting the unused area of the substrate to be processed can be easily performed by changing the position of the substrate support pins.
[0007]
According to a second aspect of the present invention, in the substrate support apparatus according to the first aspect, the substrate support plate includes a magnetic material, the substrate support pins have magnetism, and are fixed to the substrate support plate by a magnetic force. .
[0008]
In the above configuration, since the substrate support pin is fixed to the substrate support plate by magnetic force, a special tool for changing the position of the substrate support pin is not required, and the substrate support pin can be easily and quickly operated manually. The position can be changed.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a substrate support device according to an embodiment of the present invention will be described with reference to the drawings. Common members in the drawings are denoted by the same reference numerals, and redundant description is omitted. As shown in FIG. 1, the substrate support device 1 includes a substrate support plate in which an upper substrate support plate 3 made of a magnetic material such as a thin iron plate or SUS430 stainless steel plate is stacked on a lower substrate support plate 2 made of an aluminum metal plate. 4, and a fixed substrate support pin (hereinafter referred to as “fixed pin”) 5 and a movable substrate support pin (hereinafter referred to as “movable pin”) 6 are arranged on the upper surfaces thereof. As shown in FIG. 2A, the fixing pin 5 has a screw hole 54 in the lower portion. As shown in FIG. 1, the fixing pin 5 is screwed through the holes 52 and 53 of the substrate plate 4 from the lower surface. 51 is fixed with screws. Moreover, the movable pin 6 is comprised from the upper part 61, the lower part 62, and the magnet M provided in both inside, as FIG.2 (b) shows. The upper portions of these substrate support pins have an acute angle in order to minimize the area in contact with the substrate to be processed, but it is preferable to maintain an appropriate roundness so as not to damage the substrate to be processed.
[0010]
With reference to FIGS. 3 and 4, an example of supporting a multi-sided substrate to be processed in the case of four-sided and nine-sided chamfering from a substrate to be processed having the same outer size by using the substrate support apparatus 1 having the above configuration will be described. . First, in the case of four-chamfering, the substrate 7 to be processed has four small substrates 71 to 74 inside. There is a nonuse area (non-product area) for cutting, finishing, or handling between the small substrates and the outer periphery of the substrate 7 to be processed. Among such unused areas, the points P1 to P4 are selected in the region inside the substrate 7, and the movable pins 6 are arranged on the substrate support plate corresponding to these points. The fixing pin 5 is fixed to the peripheral portion of the substrate support plate 4 so as to support the outer peripheral portion of the substrate 7. By arranging the substrate support pins 5 and 6 and supporting the substrate 7 in this way, the substrate 7 can be kept clean and the deflection due to its own weight at the center of the substrate can be eliminated. Further, in the case of nine chamfering, the size of the substrate 8 is the same as in the case of four chamfering, and the outer peripheral portion is supported by the fixing pins 5 at the same position as described above. With respect to the inside of the substrate, points Q1 to Q4 are selected in the boundary region between the small substrates 81 to 89, and the movable pin 6 is arranged on the substrate support plate corresponding to this point without causing deflection at the center. The substrate 8 can be supported.
[0011]
Further, the substrate processing apparatus using the substrate support apparatus 1 includes a lower member A and an upper member B as shown in FIG. The substrate support device 1 is placed on the upper part of the lower member A, and the substrate 7 is supported by the fixed pins 5 and the movable pins 6 of the substrate support device 1. Here, the lower member A of the substrate processing apparatus 100 is, for example, an exhaust device, an exhaust device, a waste liquid device, a substrate driving device, and the like, and the upper member B is, for example, a cleaning liquid shower nozzle, a developer coating nozzle, and a drying device. A blower, a thin film forming device, a vacuum drying device, or the like.
[0012]
Next, details of the substrate support apparatus 1 and some modifications will be described. In FIG. 1, a substrate support plate 4 is formed by lowering the thickness of a substrate support plate, which is a conventional aluminum single body, to form a lower substrate support plate 2, and an upper substrate support plate 3 made of a magnetic material such as an iron plate is stacked thereon. Thus, the entire thickness is the same as that of the conventional substrate support plate. In this way, the total thickness of the upper and lower substrate support plates 2 and 3 is the same as that of the conventional substrate support plate, and by making the height of each support pin the same as the conventional, the pin movable type substrate support The apparatus 1 can be made compatible with a conventional substrate support apparatus.
[0013]
In addition, grooves a and b are carved in a lattice shape at equal intervals on the surface of the upper substrate support plate 3 in order to make it easy to change the arrangement of the movable pins 6. Furthermore, the circular groove | channel c is carved in the place which becomes a reference point especially in the intersection of the groove | channel a and the groove | channel b. By changing the arrangement of the movable pins 6 with reference to these grooves, the workability of the arrangement change is improved. Further, the upper substrate support plate 3 is subjected to surface treatment such as coating, plating treatment, fluororesin (polytetrafluoroethylene, etc.) coating treatment in order to prevent dust generation, corrosion (rust), and the like.
[0014]
Further, as shown in FIG. 6, a groove 63 slightly larger than the outer shape of the movable pin 6 is dug in a specific place of the upper substrate support plate 3, and the movable pin 6 is fitted into the groove. The displacement of the movable pin 6 can be prevented.
[0015]
Further, as shown in FIG. 7, the substrate support plate 4 is provided with a large number of positioning mounting holes 93, and the substrate support pins 9 are provided with protrusions 92 that are inserted into the mounting holes 93 for positioning. Thus, the substrate support pins 9 can be easily inserted and rearranged in any positioning mounting hole 93 of the substrate support plate.
[0016]
Further, the same effect as described above can be obtained by using the upper substrate support plate 3 as a metal plate having magnetic force and the movable pins embedded with a magnetic material such as iron.
[0017]
Further, as shown in FIGS. 8A and 8B, by using a composite pin in which a plurality of movable pins 10 are coupled by a coupling member 11, the plurality of movable pins 10 can be easily rearranged. be able to. The movable pin 10 may have a magnet or may have an insertion protrusion.
[0018]
The present invention is not limited to the above-described configuration, and various modifications can be made. For example, the substrate to be processed can be supported by all movable pins without using fixed pins. Further, the shape of the substrate to be processed and the small substrate that is multi-faced is not limited to the rectangle in the above description, and the present invention can be applied to a flat plate substrate having an arbitrary shape.
[0019]
【The invention's effect】
As described above, according to the first aspect of the present invention, it is not necessary to manufacture a plurality of substrate receiving plates for a variety of substrates to be processed. This leads to cost reduction of components and simplification of storage management of components. Is planned. Further, when processing other substrates to be processed having different unused areas, the setup operation for changing the substrate support position can be easily performed by changing the position of the substrate support pins, so that the work efficiency is improved.
[0020]
According to the invention of claim 2, when it is necessary to change the arrangement of the movable substrate support pins in the middle of the plate, the arrangement can be easily changed because it can be removed without requiring a tool.
[Brief description of the drawings]
FIG. 1 is an exploded perspective view illustrating an outline of a substrate support apparatus according to an embodiment of the present invention.
FIG. 2A is a cross-sectional view of a fixed pin used in the above apparatus, and FIG. 2B is a cross-sectional view of a movable pin used in the apparatus.
FIG. 3 is a schematic perspective view for explaining an example of use of the apparatus.
FIG. 4 is a schematic perspective view for explaining another usage example of the apparatus.
FIG. 5 is a schematic cross-sectional view illustrating a state in which the apparatus is incorporated in a substrate processing apparatus.
FIG. 6 is a cross-sectional view of an upper substrate support plate showing an arrangement structure of movable pins according to an embodiment of the present invention.
FIG. 7 is a cross-sectional view of an upper substrate support plate showing another arrangement structure of movable pins according to an embodiment of the present invention.
FIG. 8A is a perspective view in which two movable pins according to an embodiment of the present invention are integrated, and FIG. 8B is a perspective view in which the four movable pins are integrated.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Substrate support device 2 Lower substrate support plate 3 Upper substrate support plate 4 Substrate support plate 5 Fixed substrate support pin (fixed pin)
6 Movable substrate support pins (movable pins)
7,8 Substrate to be processed

Claims (2)

平面状の被処理基板を真空吸着することなく複数の基板支持ピンにより基板支持プレート上に隙間をおいて支持する基板支持装置において、前記基板支持プレートは外形が四角の平板から成り、前記基板支持ピンの一部又は全て前記基板支持プレート上に配置されて用いられる可動式の基板支持ピン(以下、可動ピンという)であって、前記可動ピンの少なくとも一部が複数の可動ピンを結合させた複合ピンであり、多種の基板サイズ又はパターンの多面取り仕様を有する被処理基板に対して任意の位置を支持し得るように、該可動ピンの位置を前記基板支持プレート上において任意に変更できるようにしたことを特徴とする基板支持装置。In a substrate support apparatus that supports a planar substrate to be processed with a plurality of substrate support pins spaced apart from each other without vacuum suction, the substrate support plate comprises a flat plate having an outer shape, and the substrate support A part of or all of the pins are movable substrate support pins (hereinafter referred to as “movable pins”) that are used by being arranged on the substrate support plate, and at least a part of the movable pins is connected to a plurality of movable pins. and a composite pin, so that can support an arbitrary position relative to the target substrate having a multi-panel specifications board size or pattern of wide, the position of the movable pin can be arbitrarily changed in the substrate supporting plate A substrate support apparatus characterized by being configured as described above. 前記基板支持プレートは磁性体を含み、前記基板支持ピンは磁性を有し、前記基板支持プレートに磁力により固定されることを特徴とする請求項1記載の基板支持装置。  The substrate support apparatus according to claim 1, wherein the substrate support plate includes a magnetic material, the substrate support pins have magnetism, and are fixed to the substrate support plate by a magnetic force.
JP2002303041A 2002-10-17 2002-10-17 Substrate support device Expired - Fee Related JP4280481B2 (en)

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JP2008041760A (en) * 2006-08-02 2008-02-21 Sekisui Chem Co Ltd Installation equipment for surface treatment such as plasma treatment
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JP5334488B2 (en) * 2008-08-01 2013-11-06 光洋サーモシステム株式会社 Work support member and work support pin position adjusting method using the same
JP5232671B2 (en) * 2009-01-22 2013-07-10 株式会社アルバック Processing equipment
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JP5678177B2 (en) * 2011-04-13 2015-02-25 シャープ株式会社 Substrate support device and drying device
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