JP4325971B2 - Surface plate with adsorption mechanism - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a surface plate having a suction mechanism for mounting and fixing a substrate when processing a flat substrate.
[0002]
[Prior art]
In general, when a coating solution is applied to the surface of a flat substrate by, for example, a T-die, the substrate is kept horizontal and the gap between the substrate and the die head in order to make the coating film thickness uniform. Must be kept constant. For this reason, the substrate is usually placed on a surface plate for work. As such a surface plate, an expensive stone surface plate in which a suction groove is formed on the stage is often used.
[0003]
[Problems to be solved by the invention]
If the size of the substrate to be placed is always constant, the surface plate as described in the prior art processes the suction groove according to the size into a stage, and sucks the pipe by connecting it to the pump from there. As a result, the placed substrate can be fixed to the stage. However, when the size of the target substrate varies, there is a problem that the substrate straddles the groove and cannot be sucked. Therefore, there are cases in which suction holes with appropriate block divisions are processed on the stage, but if the substrate has some warping, the periphery will be lifted upward, and the film thickness at that portion will become thin. Happens. In particular, this tendency becomes stronger as the substrate becomes larger.
[0004]
The present invention has been made in view of such problems, and the object of the present invention is to provide an adsorption mechanism that can be fixed while adsorbing to the outer periphery of the substrate regardless of the size of the substrate to be adsorbed. To provide a surface plate.
[0005]
[Means for Solving the Problems]
Invention suction mechanism with platen is as claimed in claim 1, there adsorption mechanism with platen used to secure and places the substrate on the stage when subjected to processing in the flat plate-like substrate In addition, the pattern has holes in the vicinity of the corners and linear grooves in the other areas, and the stage is provided with a plurality of suction holes and a plurality of suction grooves for sucking and fixing the substrate. It is said.
[0007]
The surface plate with a suction mechanism according to a second aspect of the present invention is the surface plate with a suction mechanism according to the first aspect, wherein the suction groove and the suction surface to be operated correspond to the size of the substrate placed on the stage. It is characterized by a mechanism for selecting holes.
[0008]
A surface plate with a suction mechanism according to a third aspect of the invention is characterized in that in the surface plate with a suction mechanism according to the first or second aspect , the surface plate is a stone surface plate.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
Next, an embodiment of the present invention will be described with reference to the drawings with specific examples.
[0010]
FIG. 1 is a plan view showing an example of a surface plate with a suction mechanism according to the present invention. FIG. 1 shows a pattern when the stage of the surface plate is viewed from above. As shown in FIG. 1, the stage S is provided with straight suction grooves 1 at a central portion thereof at a relatively large interval in the vertical and horizontal directions, and a straight line is provided along the side except for the vicinity of the corner. A plurality of suction grooves 1 are provided in parallel at small intervals, and a plurality of suction holes 2 are provided near the corners. That is, a plurality of suction grooves 1 and a plurality of suction holes 2 are provided in a pattern in which holes near the corners of the stage S are holes and other portions are linear grooves.
[0011]
The suction groove 1 itself has suction holes 1a as shown in the drawing in order to exert suction power, and each suction hole 1a is connected to a suction pump. On the other hand, each of the suction holes 2 is connected to a suction pump. In the case of a stone surface plate, it is difficult to provide the suction holes 1a close to each other. Therefore, as shown in the drawing, the suction holes 1a may be provided at alternate positions for the suction grooves 1 along the side. . In the figure, the suction groove 1 is shown to be thin for easy viewing, but in actuality, it is provided with the width of the suction hole 1a.
[0012]
The illustrated surface plate has a mechanism for selecting holes and grooves to be selected corresponding to the size of the substrate placed on the stage S. Specifically, all the suction holes 2 and the suction holes 1a are connected to a suction pump, and a combination pattern of the suction holes 2 and the suction holes 1a to be operated by switching valves attached to a predetermined path is selected. That's fine.
[0013]
For example, although the minimum substrate size is shown by the dotted line in FIG. 1, when a substrate of this size is placed, the vertical and horizontal suction grooves 1 in the center and the innermost suction side along the side are provided. While selecting the groove 1, the innermost suction hole 2 is selected, and the substrate is sucked by this suction pattern. Similarly, when a substrate having a larger size is placed, the suction groove 1 and the suction hole 2 covered by the substrate are selected, and these are acted to suck the substrate.
[0014]
The surface plate having the configuration shown in FIG. 1 is designed to place a substrate having a size larger than the area occupied by the vertical and horizontal suction grooves 1 in the center. That is, the suction groove 1 in the central portion acts on any substrate. On the other hand, the parallel suction grooves 1 along the side edges are selected and acted when the substrate covering the same is placed.
[0015]
At the time of suction of the substrate, the single suction groove 1 along the side may be in a state that is not interrupted by the substrate. Therefore, in the case of a substrate whose size increases both vertically and horizontally as a glass substrate for a plasma display panel, the suction groove 1 along the side as shown in FIG. 1 must have the same length. For example, as shown in FIG. 2, it can be set as a pattern in which the outer suction groove 1 gradually becomes longer. In this case, the number of suction holes 2 can be reduced. And when the size of the board | substrate to handle is limited to several types, while setting the length of the groove | channel 1 for adsorption | suction along a side edge according to it, the hole 2 for adsorption | suction can also be set to an appropriate number. In the case of a stone surface plate, it is difficult to process the suction holes 2 and the suction holes 1a. Therefore, reducing these numbers leads to cost reduction.
[0016]
As described above, the present invention has been described in detail on the basis of the embodiment. However, the surface plate with the suction mechanism according to the present invention is not limited to the above-described embodiment, and does not depart from the spirit of the present invention. It goes without saying that various modifications are possible.
[0017]
【The invention's effect】
The surface plate with a suction mechanism of the present invention is a surface plate with a suction mechanism that is used to place and fix a substrate on a stage when processing a flat substrate, and the corner is a hole. The other part is a pattern with straight grooves, and the stage is equipped with a plurality of suction holes and a plurality of suction grooves for sucking and fixing the substrate. In addition, by changing the suction pattern together, the outer periphery of the substrate can be fixed while being sucked regardless of the size of the substrate to be sucked.
[Brief description of the drawings]
FIG. 1 is a plan view showing an example of a surface plate with a suction mechanism according to the present invention.
FIG. 2 is a plan view showing another example of a surface plate with a suction mechanism according to the present invention.
[Explanation of symbols]
S Stage 1 Suction groove 1a Suction hole 2 Suction hole

Claims (3)

A platen with a suction mechanism that is used to place and fix the substrate on the stage when processing a flat substrate, with holes near the corners and straight grooves in the other parts A surface plate with a suction mechanism, wherein the stage is provided with a plurality of suction holes and a plurality of suction grooves for sucking and fixing the substrate in the formed pattern . 2. The surface plate with a suction mechanism according to claim 1, further comprising a mechanism for selecting a suction groove and a suction hole to be applied in accordance with a size of a substrate placed on the stage. The surface plate with an adsorption mechanism according to claim 1 or 2 , wherein the surface plate is a stone surface plate.

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