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JP4335522B2 - 皮膚を処置するための装置および方法 - Google Patents
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JP4335522B2 - 皮膚を処置するための装置および方法 - Google Patents

皮膚を処置するための装置および方法 Download PDF

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JP4335522B2
JP4335522B2 JP2002529979A JP2002529979A JP4335522B2 JP 4335522 B2 JP4335522 B2 JP 4335522B2 JP 2002529979 A JP2002529979 A JP 2002529979A JP 2002529979 A JP2002529979 A JP 2002529979A JP 4335522 B2 JP4335522 B2 JP 4335522B2
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Description

【０００１】
発明の分野
本発明は皮膚を処置するための方法および装置に関する。
発明の背景
用語「複合標的」はここでは、コントラストが付けられたかまたは顔料着色された成分並びにコントラストが付けられていないかまたは顔料着色されていない成分を有する皮膚の特徴をさすために使用される。例えば、毛髪は毛芯がコントラストが付けられた成分を構成し且つ毛包がコントラストが付けられていない成分を構成する複合標的である。皮膚の血管損傷が複合標的の別の例であり、そこでは血液がコントラストが付けられた成分を構成しそして損傷の壁がコントラストが付けられていない成分を構成する。皮膚外観の改良は、しばしば望ましくない複合標的の除去を含む。
【０００２】
複合標的の除去のために光熱分解が使用されてきた。この方法では、標的は標的内に浸透する可視光線または赤外線で照明されそしてコントラストが付けられた成分により選択的に吸収される。コントラストが付けられた成分はこのようにして加熱され、それがコントラストが付けられていない成分を加熱する。この加熱が標的の二成分を損傷し、これは理想的には破壊される。米国特許第５,７３５,８４４号は２ｍｓ〜１００ｍｓのパルスの単一波長を有する照射線を用いる望ましくない毛髪の除去を開示している。米国特許第５,６８３,２７４号は非干渉性の濾過光を用いる毛髪除去を開示している。米国特許第５,８８５,２７４号、第５,９６４,７４９号および第５,８１０,８０１号は、皮膚を滑らかにしそして１.８μより短い波長を有する老化斑点を除去するための干渉性および無干渉性の光源による皮膚加熱を開示している。
【０００３】
破壊しようとするためには、表皮の温度を損傷水準まで上昇させずに標的の温度を約７０℃に上昇させなければならない。しかしながら、多くの場合には周囲皮膚を損傷水準まで加熱せずに標的の二成分を標的を破壊するのに必要な温度に加熱することは熱分解によっては可能ではない。図１は毛髪を可視光線の短いパルスで照明した後の毛髪の周りの概略温度分布を示す。図１に示された理論曲線並びに以下で説明される図２および５に示された曲線は、例えば、Ｗｅｌｃｈ Ａ．Ｊ． ｅｔ ａｌ．， Ｐｒａｃｔｉｃａｌ Ｍｏｄｅｌｓ ｆｏｒ ｌｉｇｈｔ ｄｉｓｔｒｉｂｕｔｉｏｎ ｉｎ Ｌａｓｅｒ−Ｉｒｒａｄｉａｔｅｄ ｔｉｓｓｕｅ， ｉｎ Ｌａｓｅｒｓ ｉｎ Ｓｕｒｇｅｒｙ ａｎｄ Ｍｅｄｉｃｉｎｅ， ６：４８８−４９３， １９８７ に開示されているような光−組織相互作用に関する拡散式を用いそして例えば Ｓ． Ｇａｂｒｉｅｌ， ｅｔ ａｌ．， Ｔｈｅ ｄｉｅｌｅｃｔｒｉｃ ｐｒｏｐｅｒｔｉｅｓ ｏｆ ｂｉｏｌｏｇｉｃａｌ ｔｉｓｓｕｅｓ： ＩＩＩ． Ｐａｒａｍｅｔｒｉｃ ｍｏｄｅｌｓ ｆｏｒ ｄｉｅｌｅｃｔｒｉｃ ｓｐｅｃｔｒｕｍ ｏｆ ｔｉｓｓｕｅｓ． Ｐｈｙｓ． Ｍｅｄ． Ｂｉｏｌ． ４１：２２７１−２２９３， １９９６ に開示されているような組織内のＲＦ電流を計算するためのマックスウェル（Ｍａｘｗｅｌｌ）式を用いて得られる。上記文献の両者はここに引用することにより本発明の内容となる。芯の温度が６５℃より高い場合に、包の平均温度は約５５℃でしかない。それ故、毛芯により吸収される光学エネルギーは包を適切に加熱するには不充分である。周囲皮膚の温度を損傷水準まで上昇させずに、毛髪の温度をこれらの温度を越えて充分に上昇させることはできない。
【０００４】
米国特許第５,９１９,２１９号は、非選択的な皮膚加熱のための無線周波数（ＲＦ）エネルギーの使用を開示している。この方法では、ＲＦエネルギーが標的に適用され、それがコントラストが付けられていない成分を選択的に加熱する。コントラストが付けられていない成分はこのようにして加熱され、それがコントラストが付けられた成分を加熱する。しかしながら、多くの場合には周囲皮膚を損傷水準まで加熱せずに、標的の二成分を標的を破壊するのに必要な温度に加熱することはＲＦエネルギーを使用しては可能ではない。図２はＲＦエネルギーの短いパルス後の毛髪の周りの概略温度分布を示す。包の温度が５５℃より高い場合に、芯の温度は約５０℃でしかない。毛髪の周りの皮膚内の温度は約４０°である。周囲皮膚温度を損傷水準に上昇させずに、毛髪の温度をこれらの温度を越えて有意に上昇させることはできない。
発明の要旨
本発明は、ＲＦエネルギーおよび光（光学エネルギー）の組み合わせを用いる複合標的の同時の照射が周囲皮膚温度を損傷温度に上昇させずに複合標的のコントラストが付けられたおよびコントラストが付けられていない成分の両方を両方の成分を破壊する温度に同時に加熱しうるという予期せぬ発見に基づく。特定の理論により拘束しようとは望まないが、ＲＦおよび光学エネルギーの同時適用が光学照射だけで起きる標的のコントラストが付けられた部分からの熱損失を減じ、そして同様にＲＦエネルギーだけが使用される場合の標的のコントラストが付けられていない部分からの熱損失も減ずると信じられる。
【０００５】
本発明は、ＲＦおよび光学エネルギーが本質的に同時に皮膚に適用されて皮膚内の標的を加熱するような皮膚の複合標的の皮膚科処置用の方法および装置を提供する。「本質的に同時に」とは、２種の形態のエネルギーが同時に適用されるか、または標的の有意な冷却がエネルギーの第一および第二の適用間で起きないように互いに速やかに連続して適用されることを意味する。本発明は、例えば脱毛、皮膚の若返りおよび血管または顔料着色された損傷の如き複合標的の化粧処置のために使用することができる。装置は、ＲＦエネルギー発生用の１つもしくはそれ以上の電極対および光学エネルギーを発するための光源を有するアプリケーターを含む。パルス化されたＲＦエネルギーは皮膚に適用される電極により直接的にまたは伝導性物質を通して適用される。組織痙攣を防止するためにはＲＦの周波数は好ましくは少なくとも３００ｋＨｚである。可視光線は標的のコントラストが付けられた成分の色に最適であるとして好ましく選択された単一の波長または数種の波長を有することができ、そして典型的には５００〜１２００ｎｍの範囲内である。
【０００６】
ＲＦおよび光学エネルギーの適用中の熱発生は皮膚表面近くではより高い。皮膚内で均一に加熱するためには、表面は好ましくは処置中に冷却される。例えば氷またはエタノールの如き冷却された物質を皮膚に適用することによりまたは熱電冷却器を使用することにより、表面を冷却することができる。当技術で既知であるように皮膚の深層内への冷却の浸透を促進するためには、皮膚は好ましくは水和される。皮膚を表面で外部から冷却する場合には、ＲＦおよび光学エネルギーは標的を数ミリメートルの深度まで加熱しうる。
【０００７】
処置中の皮膚インピーダンスを監視するためにＲＦ電極を場合により使用することができる。皮膚温度の上昇はインピーダンスにおける変化をもたらすため、皮膚インピーダンスの監視により処置のパラメーターを変更して処置を最適化するように皮膚内の温度分布を達成することができる。皮膚内の温度分布は、冷却とＲＦおよび光学エネルギーの適用との間の遅延、パルスパラメーターの選択に依存する。それ故、冷却の適用時間とＲＦおよび光学エネルギーの適用時間との間の遅延を調節することにより皮膚内の温度分布を調節することができる。選択された皮膚温度特性に関する最適な遅延時間（ｔ）を決めるためにマイクロプロセッサーを使用することができる。これは当業界で既知であるように、例えば、式ｔ＝ｄ2／（４Ａ）を用いて計算することができ、ここでｄは冷却深度であり、それはこの場合には表皮の厚さ（０.１ｍｍ）にほぼ等しく、そしてＡは皮膚拡散度（約１.４×１０-3ｃｍ2／ｓｅｃ）である。交替にまたはそれに加えて、ＲＦエネルギーのパルス持続時間を当業界で既知であるように、例えば、Ross et al., theoretical considerations in laser hair removal. IN Dermatologic Clinics, W.B. Saunders Company, Volume 17, pages 333-335, 1999 に開示されているように調節することにより、温度分布を調節することができる。
【０００８】
本発明は、
（ａ）皮膚にＲＦエネルギーを与えるために適する１つもしくはそれ以上のＲＦ電極、および
（ｂ）皮膚に光学エネルギーを与えるために適する１つもしくはそれ以上の光源を含んでなる、皮膚にＲＦエネルギーおよび光学エネルギーを本質的に同時に適用するためのシステムを提供する。
【０００９】
本発明はまた、ＲＦエネルギーおよび光エネルギーを皮膚に本質的に同時に適用することを含んでなる皮膚の処置方法も提供する。
好ましい態様の詳細な記述
次に図３を参照すると、ＲＦおよび光学エネルギーを同時に適用するための本発明に従う装置が示されている。以下で詳細に記載されるアプリケーター７０３は一対のＲＦ電極および光源を含有する。アプリケーター７０３は人間７０５の皮膚に複合標的の領域に適用されるのに適する。アプリケーター７０３はケーブル７０２を介して調節装置７０１に連結されている。調節装置７０１は動力源７０８を含む。動力源７０８はＲＦ発生器７１５に連結されており、それはケーブル７０２中のワイヤーを介してアプリケーター７０３中のＲＦ電極に連結されている。動力源７０８もケーブル７０２中のワイヤーを介してアプリケーター７０３中の光源に連結されている。調節装置７０１は冷蔵装置７１２を含有し、それはアプリケーター７０３を冷却するための例えばエタノールまたは水の如き流体を冷却する。冷却された流体は冷蔵装置７１２からケーブル７０２中の第一の管を介してアプリケーターに流れ、そしてアプリケーター７０３からケーブル７０２中の第二の管を介して冷蔵装置に逆流する。調節装置７０１は例えばキーパッド７１０の如き入力装置を有し、それにより操作者は例えば周波数、パルス持続時間およびＲＦエネルギーの強度または光学エネルギーの波長および強度の如き処置のパラメーターの選択された値を入力することができる。調節装置７０１は場合により、装置の種々の機能を監視し且つ調節するためのプロセッサー７０９を含有する。例えば、プロセッサー７０９はアプリケーター７０３中の電極間の電気インピーダンスを監視しそして標的近くの温度分布を決めることができる。プロセッサー７０９はインピーダンス測定に基づき処置のパラメーターを決めることもできる。
【００１０】
図４はアプリケーター７０３を詳細に示す。アプリケーターは一対の電極４０１および４０２を含有し、それらがＲＦエネルギーを皮膚に適用する。光源４０３は光スペクトルを生成し、それは光案内４０４により皮膚表面に送られる。ハウジングおよび電極は、入り口４０５と出口４０６の間の管４０８中を流れる冷蔵装置７１２により冷却された流体により冷却される。入り口４０５および出口４０６はケーブル７０２中の第一および第二の管を介して冷蔵装置７１２に連結される。
【００１１】
ＲＦおよび光学エネルギーを少なくとも２ｍｍの直径を有する標的に適用するために図３に示されたシステムを用いると、下記の例示パラメーター値を使用することができる：
ＲＦエネルギーの周波数：約３００ｋＨｚ〜約１００ＭＨｚ。
ＲＦエネルギーの出力：約５〜約２００Ｗ。
照射の期間：約１〜約５００ｍｓｅｃ。
パルス繰り返し速度：毎秒約０.１〜約１０パルス。
光学エネルギーの強度：約５〜約１００ジュール／ｃｍ2。
光学エネルギーのパルス持続時間：約１〜２００ｍｓｅｃ。
【００１２】
図５は、これらの例示パラメーター値を有する図３および４のシステムを用いて得られる毛髪内の理論的温度分布を示す。毛芯内の温度は８５℃より高いが、周囲皮膚内の温度は４５℃より低い。
【図面の簡単な説明】
【図１】 光学エネルギー後の１００μｍ毛芯および包の周りの概略温度分布を示す図。
【図２】 ＲＦによる加熱後の１００μｍ毛芯および包の周りの概略温度分布を示す図。
【図３】 人間にＲＦおよび光学エネルギーを同時に適用するための本発明に従うシステムを示す図。
【図４】 ２つの電極、光源および冷却システムを有するアプリケーターを示す図。
【図５】 光学およびＲＦエネルギーの組み合わせで作成された１００ミクロン毛芯の周りの温度分布を示す図。

Claims (10)

  1. （ａ）皮膚標的領域を加熱するＲＦエネルギーを与えるために適する１つもしくはそれ以上のＲＦ電極、および
    （ｂ）皮膚標的領域を加熱する１２００ｎｍ以下の波長を有する光学エネルギーを与えるために適する１つもしくはそれ以上の光源を含んでなり、
    前記ＲＦ電極および光源が皮膚標的領域にエネルギーを本質的に同時に与え、実質的に前記標的領域の全体にわたって実質的に均一でありかつ前記ＲＦエネルギーだけまたは前記光学エネルギーだけの供給により付与される温度よりも高い温度まで前記標的領域の全体を加熱するために適するように構成されており、
    前記光学エネルギーは、コントラストが付けられた領域を加熱し、前記ＲＦエネルギーは、コントラストが付けられていない領域を加熱する、皮膚標的領域を処置するためのシステム。
  2. 皮膚を冷却するために適する冷却装置をさらに含んでなる請求項１に記載のシステム。
  3. 冷却装置が流体を冷却する冷蔵装置および流体を皮膚近くに流すための管を含んでなる請求項２に記載のシステム。
  4. 冷却装置が熱電冷却器を含んでなる請求項２に記載のシステム。
  5. ＲＦ電極対の１つもしくはそれ以上を越えるインピーダンスを測定するためのインピーダンスメーターをさらに含んでなる請求項１に記載のシステム。
  6. １回もしくはそれ以上のインピーダンス測定に基づき皮膚内の熱分布を測定するように構成されたプロセッサーをさらに含んでなる請求項５に記載のシステム。
  7. プロセッサーが１回もしくはそれ以上の測定に基づきＲＦエネルギーの１つもしくはそれ以上のパラメーターを測定するためにさらに構成されている請求項６に記載のシステム。
  8. １つもしくはそれ以上のパラメーターがＲＦエネルギーのパルス持続時間、ＲＦエネルギーの周波数、ＲＦエネルギーの能力、および皮膚の冷却とＲＦエネルギーの適用との間の遅延時間よりなる群から選択される請求項７に記載のシステム。
  9. ＲＦエネルギーまたは光学エネルギーの１つもしくはそれ以上のパラメーターを測定するための入力手段をさらに含んでなる請求項１に記載のシステム。
  10. １つもしくはそれ以上のパラメーターが、ＲＦエネルギーのパルス持続時間、ＲＦエネルギーの周波数、ＲＦエネルギーの能力、皮膚の冷却とＲＦエネルギーの適用との間の遅延時間、光学エネルギーの１つもしくはそれ以上の波長、および光学エネルギーの強度よりなる群から選択される請求項９に記載のシステム。
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